Magnetron sputtering equipment
CN309289047SActive Publication Date: 2025-05-13TRUTH EQUIP CO LTD
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Patent Information
- Application Number
- CN202430420996.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-05
- Publication Date
- 2025-05-13
- Estimated Expiration
- 2039-07-05
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Figure 000012_ABST
Abstract
1. The name of the product of this design: magnetron sputtering equipment. 2. Purpose of the product of this design: used for magnetron sputtering equipment for thin film deposition. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
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