Magnetron sputtering equipment

CN309289047SActive Publication Date: 2025-05-13TRUTH EQUIP CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202430420996.6
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-07-05
Publication Date
2025-05-13
Estimated Expiration
2039-07-05

Smart Images

  • Figure 000012_ABST
    Figure 000012_ABST
Patent Text Reader

Abstract

1. The name of the product of this design: magnetron sputtering equipment. 2. Purpose of the product of this design: used for magnetron sputtering equipment for thin film deposition. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
Need to check novelty before this filing date? Find Prior Art