Resistance furnace
CN309325633SActive Publication Date: 2025-06-06SHANXI TIANCHENG SEMICON MATERIAL CO LTD
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Patent Information
- Application Number
- CN202430670405.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-24
- Publication Date
- 2025-06-06
- Estimated Expiration
- 2039-10-24
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Figure 000007_ABST
Abstract
1. The name of the product of this design: resistance furnace. 2. Purpose of the product of this design: Equipment used for the growth of silicon carbide single crystals, a resistance furnace that provides suitable temperature, atmosphere and temperature gradient for single crystal growth. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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