Semiconductor epitaxial equipment (MOCVD equipment)
CN309335870SActive Publication Date: 2025-06-13ETA-SEMITECH (ANHUI) CO LTD
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Patent Information
- Application Number
- CN202430412801.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-03
- Publication Date
- 2025-06-13
- Estimated Expiration
- 2039-07-03
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Figure 000001_ABST
Abstract
1. Name of the Design Product: Semiconductor Epitaxial Equipment (MOCVD Equipment). 2. Use of the Design Product: Equipment for semiconductor thin film deposition. 3. Design Key Points of the Design Product: Lies in the shape. 4. Picture or Photograph Most Indicating the Design Key Points: Perspective view. 5. The top surface of the product has been shown in the perspective view, so the top view is omitted; the bottom of the product is not commonly seen during use, so the bottom view is omitted.
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