Gas inlet pipe for substrate processing equipment
CN309392708SActive Publication Date: 2025-07-18KOKUSAI DENKI KK
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Patent Information
- Application Number
- CN202130089437.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2020-08-18
- Filing Date
- 2021-02-07
- Publication Date
- 2025-07-18
- Estimated Expiration
- 2031-02-07
Smart Images
Figure 000007_ABST
Abstract
1. Name of the Design Product: Gas Inlet Pipe for Substrate Processing Apparatus. 2. Use of the Design Product: Vertically support a gas supply nozzle in a processing chamber of a substrate processing apparatus for processing wafers and introduce gas into the gas supply nozzle. 3. Design Key Points of the Design Product: Lies in the shape. 4. Picture or Photograph Most Indicating the Design Key Points: Perspective View.
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