Wafer dusting robot
CN309717032SActive Publication Date: 2026-01-02JIANWEI SEMICONDUCTOR (SHENZHEN) CO LTD
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Patent Information
- Application Number
- CN202530336363.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-12
- Publication Date
- 2026-01-02
- Estimated Expiration
- 2040-06-12
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: wafer dust removal robot. 2. The use of the design product: equipment for detecting and removing dust, impurity particles and other pollutants on the surface of the wafer. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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