Eye patch (KE-R5II)
CN309730358SActive Publication Date: 2026-01-09SHENZHEN JINJIACHENG PHOTOGRAPHY EQUIP
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Patent Information
- Application Number
- CN202430758304.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-29
- Publication Date
- 2026-01-09
- Estimated Expiration
- 2039-11-29
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Figure 000007_ABST
Abstract
1. Name of the product in this design: Eye Mask (KE-R5II). 2. Purpose of this design: To assist in camera photography by attaching the eyepiece to the viewfinder of the camera. During shooting, it can prevent stray light interference and prevent unnecessary light from entering the viewfinder and interfering with the image. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1.
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