Left end portion of a transfer chamber of a coating and developing apparatus
CN309877531SActive Publication Date: 2026-03-27TOKYO ELECTRON LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-14
- Publication Date
- 2026-03-27
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Figure 000006_ABST
Abstract
1. The name of the design product: the left end of the transfer chamber of the coating and developing device. 2. The use of the design product: the product as a whole is a coating and developing device for performing coating, developing, heat treatment and other treatments on substrates such as semiconductor wafers, and is applied to casting machinery. The part claimed is the left end of the transfer chamber of the coating and developing device. 3. The design points of the design product: the shape of the part claimed. 4. The picture or photograph best indicating the design points: perspective view 1. 5. The bottom surface of the design product is a part that is not easily visible or invisible during use, and the top view is omitted. 6. Other circumstances requiring explanation Other explanations: The design of the present application requires partial design protection. The part represented by the solid line is the part claimed for protection, and the part represented by the dashed line is not claimed for protection.
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