Facial mask
CN309939602SActive Publication Date: 2026-04-21GUANGZHOU WEIER CRYPTO BIOTECHNOLOGY CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- GUANGZHOU WEIER CRYPTO BIOTECHNOLOGY CO LTD
- Filing Date
- 2025-10-13
- Publication Date
- 2026-04-21
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Facial Mask. 2. Intended use of this design: for use in face masks. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key features: the front view. 5. Other situations requiring explanation: This design is for a thin product, so the left, right, top, and bottom views are omitted.
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