long skirt
CN309993880SActive Publication Date: 2026-05-26YANCHENG INST OF IND TECH
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- YANCHENG INST OF IND TECH
- Filing Date
- 2025-12-16
- Publication Date
- 2026-05-26
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Long skirt. 2. Purpose of this design: Primarily for wearing. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. Other situations requiring explanation: The bottom view of this design product is for parts that are not easily seen or cannot be seen during use, so the bottom view is omitted; the top view of this design product is for parts that are not easily seen or cannot be seen during use, so the top view is omitted.
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