Handling system for microlithographic photomasks, inspection system and processing system with a handling system

Abstract

A handling system for microlithographic photomasks (17) comprising an articulated robot arm (26) and an alignment device (30). The alignment device (30) is designed to rotate a photomask held by the alignment device (30) about a vertical axis (51) in a first movement sequence and to turn it around a horizontal axis (52) in a second movement sequence. The invention also relates to an inspection system with a handling system and a processing system with a handling system.

Description

[0001] The invention relates to a handling system for microlithographic photomasks. The invention further relates to a processing system with a handling system and an inspection system with a handling system.

[0002] Photomasks are used in microlithographic projection exposure systems for the fabrication of integrated circuits with extremely small structures. The photomask, illuminated with very short-wavelength, deep ultraviolet or extreme ultraviolet radiation (DUV or EUV radiation), is projected onto a lithography object to transfer the mask structure.

[0003] For a high-quality image produced on the lithographic object, the photomask must be dimensionally accurate and free from impurities. Therefore, photomasks can be inspected before initial use or during maintenance and, if necessary, reworked, cleaned, or corrected. Various inspection and processing systems are used, to which the photomasks are transferred for the required steps. These processes are typically carried out under vacuum.

[0004] Contamination can be caused, for example, by outgassing from components in the vicinity of photomasks, leading to the deposition of contaminants on the photomask's surface. This is particularly problematic in areas of the photomask where the structures for the subsequent chips are located. A risk of contamination can also arise from foreign particles, such as those originating from the mask's contact points. These are often made of plastic and therefore have a higher outgassing rate. Under the influence of UV light, plastic particles can decompose into carbon, which can lead to a degradation of the photomask's reflectivity as well as that of optical components.

[0005] Before a photomask is inserted into an inspection / processing system, it must be ensured that the photomask is correctly aligned. Depending on its initial state, the photomask is rotated around a vertical axis and / or flipped around a horizontal axis. Only then does the movement sequence for inserting the photomask into the inspection or processing system begin.

[0006] It is known that six-axis robots, possessing all the necessary degrees of freedom, are used for motion sequences involving the translation and alignment of photomasks. However, space is often limited in the vicinity of inspection and machining systems, leaving insufficient room for six-axis robots.

[0007] Complex systems are also known in which different system components are used for different parts of the motion sequence. For example, a first system component may be responsible for translational movements in a horizontal plane, a second system component for rotation about a vertical axis, and a third system component for rotating the photomask about a horizontal axis.

[0008] The invention is based on the objective of presenting a handling system, an inspection system, and a processing system with which these disadvantages are avoided. This objective is achieved by the features of the independent claims. Advantageous embodiments are specified in the dependent claims.

[0009] A handling system for microlithographic photomasks according to the invention comprises an articulated robot arm and an alignment device. The alignment device is designed to rotate a photomask held by the alignment device about a vertical axis in a first movement sequence and to rotate it about a horizontal axis in a second movement sequence. The terms "first movement sequence" and "second movement sequence" do not imply any restriction regarding the temporal sequence of the movements.

[0010] The invention recognizes that this approach reduces complexity compared to known systems. Given the type of joints required for the handling system according to the invention, it becomes easier to design the joints in such a way as to prevent outgassing if photomasks are handled under vacuum conditions.

[0011] The articulated robot can comprise a robot base, a first articulated arm attached to the robot base via a first pivot joint, a second articulated arm attached to the first articulated arm via a second pivot joint, and a third articulated arm attached to the second articulated arm via a third pivot joint.

[0012] A pivot joint is a joint that allows rotation around exactly one axis. This limitation to a single degree of freedom of movement necessitates a simple encapsulation of the joint, which is advantageous for preventing outgassing. The axes of the first, second, and third pivot joints of the articulated robot arm can be aligned parallel to each other, so that by actuating the pivot joints, a distal end of the third articulated arm can be moved in an XY plane. The XY plane can be a horizontal plane.

[0013] Each of the swivel joints can be equipped with a joint actuator, allowing the position of the swivel joint to be changed by actuating the joint actuator. The joint actuators can be controlled by control signals.

[0014] The articulated robot can include a linear actuator to change the height position of the third articulated arm in the Z-direction. The linear actuator can be located between the robot base and the first articulated arm. When the height position of the first articulated arm is changed, the height position of the second articulated arm, which is supported by the first, also changes. The linear actuator is also limited to one degree of freedom, which is advantageous for preventing outgassing.

[0015] The alignment device can include a holding device for a photomask. The holding device can be designed such that the photomask is held in the holding device regardless of its orientation to gravity. In one embodiment, the holding device comprises a first clamping jaw and a second clamping jaw. The holding device can include an actuator to adjust the distance between the first and second clamping jaws. In a first state of the holding device, the distance between the clamping jaws can be greater than the distance between two opposite ends of the photomask to be held. In a second state of the holding device, the clamping jaws can rest against both ends of the photomask, so that the photomask is held between the clamping jaws.

[0016] The holding device can have a starting position in which it is designed to grasp and lift a photomask resting on a structure. The photomask resting on the structure can be horizontally oriented. The holding device can grip two opposite edges of the photomask to lift it.

[0017] Inspection and processing systems are often designed so that a photomask must be inserted in a specific orientation. Assuming a photomask approximately rectangular in shape, there are four positions, rotated by 90°, in which the edges of the photomask are aligned parallel to both the X and Y directions. Rotating the photomask around the Z axis may be necessary to align it correctly among these four possible positions.

[0018] Correct alignment also requires that the correct surface of the photomask faces upwards. If the photomask is incorrectly oriented on the structure, it must be rotated 180° around a horizontal axis to achieve the correct orientation. This results in a total of eight different possible orientations for a photomask that has been captured with the holding device.

[0019] The handling system can include a sensor device to detect the orientation of the photomask. The photomask can be marked with markers that allow for orientation identification. For example, if one of the four corners of the photomask is marked, the marker can be used to unambiguously determine which of four possible rotational positions the photomask has in the plane. Similarly, a marker can be used to determine whether the photomask needs to be flipped. The sensor device can be designed to detect the orientation of the photomask using such markers. For example, the sensor device can include an optical sensor that responds to the markers.

[0020] The sensor device can be an integral part of the alignment device. This has the advantage that information about a photomask held in the alignment device can be obtained directly from the sensor device.

[0021] The alignment device can include a first rotary drive to rotate the holding device around the vertical axis. The first rotary drive can have four rotational positions, each differing by 90°. Control commands can be stored in a control unit of the handling system to actuate the first rotary drive accordingly. The first rotary drive can be equipped with a fine adjustment mechanism, allowing the various rotational positions to be preset with high accuracy. Adjustment of the alignment device can then be performed directly via the drive axis instead of through a fine mechanical adjustment. The axis of the first rotary drive can form a right angle with a plane defined by a photomask held in the holding device. The axis of the first rotary drive can intersect the photomask at its center, so that the photomask is balanced relative to the axis.This has the advantage that a small torque from the first rotary drive is sufficient to rotate the holding device with the photomask held in it.

[0022] The first rotary drive can comprise a motor with a rotor and a stator. The motor can be a stepper motor. The stator can be held in place by a structure of the alignment device. The first rotary drive can include an encoder that provides information about the motor's rotational position. The first rotary drive forms an actuator of the handling system with a single degree of freedom of movement.

[0023] A direct coupling can exist between the rotor and the holding device or a structural component of the alignment device that supports the holding device, so that the holding device rotates directly with the rotor. If the axis of the motor of the first rotary drive is aligned parallel to the vertical axis around which the photomask is rotated, a small axial dimension of the motor is advantageous for a low overall height. A small axial dimension is generally more easily achieved with an external rotor motor than with an internal rotor motor. A larger motor diameter can be accepted in return.

[0024] It is also possible that a gearbox is arranged between the motor of the first rotary drive and the holding device. The motor's axis can then have a different orientation than the axis around which the holding device rotates. For example, there could be an angle of 90° between the two axes. If the motor's axis is horizontally oriented, an internal rotor motor can be advantageous, as it allows for a smaller diameter than an external rotor motor.

[0025] The alignment device can include a second rotary drive to rotate the holding device around a horizontal axis. This second rotary drive can have a first rotation position and a second rotation position rotated 180° relative to it. Control commands can be stored in a control unit of the handling system to actuate the second rotary drive accordingly. The second rotary drive can be equipped with a fine adjustment mechanism, allowing the various rotation positions to be preset with high accuracy. Adjustment of the alignment device can then be performed directly via the drive axis instead of through a fine mechanical adjustment. The axis of the second rotary drive can lie in a plane defined by a photomask held in the holding device. The axis of the second rotary drive can intersect the photomask at its center, so that the photomask is balanced relative to the axis.This has the advantage that a small torque from the second rotary drive is sufficient to turn over the holding device with the photomask held in it.

[0026] The second rotary drive can comprise a motor with a rotor and a stator. The motor can be a stepper motor. The second rotary drive can include an encoder that provides information about the motor's rotational position. The stator can be held on a structure of the alignment device. There can be a direct coupling between the rotor and the holding device or a structural component of the alignment device that supports the holding device, so that the holding device rotates directly with the rotor.

[0027] A low profile is often desired for the alignment device. If the motor's axis is parallel to the horizontal axis around which the photomask is rotated, a small motor diameter contributes to a low profile. For this purpose, it is advantageous to use an internal rotor motor, which generally allows for smaller diameters than external rotor motors. A larger axial dimension can then be accepted as a trade-off.

[0028] It is also possible that a gearbox is arranged between the motor of the second rotary drive and the holding device. The motor's axis can then have a different orientation than the axis around which the holding device rotates. For example, there could be an angle of 90° between the two axes. If the motor's axis is vertically oriented, an external rotor motor can be advantageous, as it allows for smaller axial dimensions than an internal rotor motor.

[0029] The first rotary drive can be held on a structural component of the alignment device, which is rotated by the second rotary drive. Alternatively, the second rotary drive can be held on a structural component of the alignment device, which is rotated by the first rotary drive.

[0030] The handling system may include a control unit designed to control the rotary drives of the alignment device and / or the articulated drives of the swivel joints with control signals.

[0031] The articulated robot arm and the alignment device can be separate components of the handling system. The alignment device can be arranged in a fixed position, so that it remains in an unchanged position relative to the robot base of the articulated robot arm when the articulated robot arm is actuated.

[0032] The third articulated arm of the articulated robot can be configured as an end effector, designed to receive a photomask from the alignment device and / or transfer a photomask to the alignment device. The third articulated arm can be equipped with a support element on which a photomask carried by the third articulated arm rests. The articulated robot can be configured to transfer the photomask to the holding device of the alignment device and to receive the photomask back from the holding device of the alignment device after the photomask has been correctly aligned by the alignment device.

[0033] To transfer the photomask to the holding device, the articulated robot arm can move the photomask horizontally until it is positioned horizontally above or below the holding device. The robot arm's linear motor can then raise or lower the photomask until it reaches a height where it can be gripped by the holding device. The third articulated arm can then be moved laterally, allowing the alignment device to align the photomask without colliding with any components of the robot arm. The subsequent transfer from the holding device to the robot arm can then be performed accordingly. Finally, the robot arm can transfer the photomask to the process chamber or a pre-chamber of the process chamber of the inspection or machining system.

[0034] In an alternative embodiment, the articulated robot arm and the alignment device are elements of a handling system designed as a single unit. The alignment device can be attached to the third articulated arm of the articulated robot arm. Thus, the position of the alignment device changes along with the third articulated arm when the articulated robot arm is actuated.

[0035] One axis of rotation of the alignment device can be aligned parallel to the longitudinal direction of the third articulated arm. This can be the axis of rotation of the second rotary drive, which rotates the photomask by 180°.

[0036] The photomask can rest on a support station before being picked up by the handling system's holding device. The handling system's articulated robot can move the holding device horizontally until it is in a position to grasp the photomask. The robot's linear drive can then raise the holding device to lift the photomask from the support station.

[0037] The alignment device can be activated to bring the photomask into the correct orientation. The articulated robot arm can then be activated to transfer the photomask to a process chamber or an ante-chamber of a process chamber within the inspection or machining system. A support station can be located within the process chamber or ante-chamber of the process chamber, onto which the photomask is placed. To do this, the holding device with the photomask is moved to a position above the support station by activating the articulated robot arm. Then, the linear drive of the articulated robot arm is activated to move the holding device downwards and place the photomask onto the support station.

[0038] The support device can be designed such that, in each of the eight possible orientations of the photomask, a support structure can be moved laterally beneath the photomask, allowing the photomask to be placed on the support structure and released from the holding device of the alignment device. Subsequently, the support structure and the alignment device can be spatially separated. For these steps, the alignment device can be moved relative to the support structure, or vice versa.

[0039] The invention also relates to an inspection system for microlithographic photomasks, comprising a handling system according to the invention and a process chamber for performing an examination on a photomask. The handling system is designed to transfer the photomask to the process chamber or a pre-chamber of the process chamber.

[0040] The invention also relates to a processing system for microlithographic photomasks, comprising a handling system according to the invention and a process chamber for performing a processing step on a photomask. The handling system is designed to transfer the photomask to the process chamber or a pre-chamber of the process chamber.

[0041] The invention is described below by way of example with reference to advantageous embodiments in the accompanying drawings. They show: Fig. 1: an inspection system according to the invention; Fig. 2: an embodiment of a handling system according to the invention; Fig. 3: the handling system made of Fig. 2 in a different view; Fig. 4: Components of the handling system made of Fig. 2, Fig. 3; Fig. 5: the view according to Fig. 4 in a different state of the handling system; Fig. 6: a photomask on a display station; Fig. 7: the view according to Fig. 4 in an alternative embodiment of the invention; Fig. 8: an alternative embodiment of a handling system according to the invention; Fig. 9: a component of the handling system made of Fig. 8; Fig. 10: a schematic representation of a machining system according to the invention; Fig. 11: an alternative embodiment of a machining system according to the invention.

[0042] Microlithographic photomasks 17 are generally intended for use in a microlithographic projection exposure system (not shown). In the microlithographic projection exposure system, the photomask 17 is illuminated with deep ultraviolet or extreme ultraviolet radiation (DUV radiation / EUV radiation) to image a structure formed on the photomask 17 onto the surface of a lithographic object in the form of a wafer. The wafer is coated with a photoresist that reacts to the EUV radiation. An inspection system is used to check whether the photomask meets the specifications and is free of contaminants. A processing system is used to rework photomasks or to correct defects in photomasks.

[0043] A handling system according to the invention serves to pick up microlithographic photomasks 17 within an inspection system or processing system, to bring them into the correct orientation and to put them down again.

[0044] An example of an inspection system is shown in Fig. Figure 1 is shown schematically. In the inspection system, the photomask 17 is arranged such that an EUV beam path 15 emanating from an EUV radiation source 14 is directed onto the photomask 17 via an illumination system 16. The illumination system 16 shapes the EUV radiation into a beam that illuminates an inspection area on the surface of the photomask 17 with uniform brightness. The photomask 17 can be rectangular with side lengths, for example, between 100 mm and 200 mm. An XY positioner 19 can move the photomask in the XY plane to bring different inspection areas of the photomask into the path of the EUV beam path.

[0045] The EUV beam path 15, reflected at the photomask 17, continues via a projection lens 22 to an EUV camera 23, which is equipped with an image sensor 24. The projection lens maps the field of view of the photomask 17 onto the image sensor 24 of the EUV camera 23. The EUV radiation source 14, the illumination system 15, the photomask 17, the projection lens 22, and the EUV camera 23 are arranged in a process chamber 18, in which a vacuum is maintained during operation of the measuring device.

[0046] The inspection system comprises a transfer chamber 20 into which a photomask 17 to be examined is inserted at atmospheric pressure. The transfer chamber 20 is brought to a vacuum corresponding to that of the vacuum chamber 18 before the photomask 17 is removed from the transfer chamber 20.

[0047] The photomask 17 is transferred to the transfer gate 20 by a handling system 21 located in an anteroom 25 of the inspection system. The handling system 21 is designed to position the photomask 17 correctly. There are eight possible orientations for the photomask 17: four positions resulting from a 90° rotation about a vertical axis 51, and four corresponding positions resulting from a 180° rotation about a horizontal axis 52. When inserted into the anteroom 25, the photomask 17 can be in any of the eight possible orientations. For inspection within the system, exactly one of the eight possible orientations is permitted.

[0048] The handling system 21 detects the orientation of the photomask 17 in the pre-chamber 25 and, if necessary, aligns the photomask 17 by rotating it appropriately around the vertical axis 51 (Z-axis) and by rotating it around a horizontal axis 52. The photomask 17 is then transferred to the process chamber 18 of the inspection system.

[0049] The handling system 21 comprises, according to Fig. 2 An articulated robot 26 with a robot base 34, a first articulated arm 27, a second articulated arm 28, and a third articulated arm 29. The first articulated arm 27 is attached to the robot base 34 via a first pivot joint 31. The second articulated arm 28 is attached to the first articulated arm 27 via a second pivot joint 32. The third articulated arm 29 is attached to the second articulated arm 28 via a third pivot joint 33. The third articulated arm 29 carries an alignment device 30. The axes of the pivot joints 31, 32, 33 are aligned perpendicularly, see Figure 2. Fig. 3, so that by actuating the pivot joints 31, 32, 33, the alignment device 30, carried by the third articulated arm 29, can be moved into different positions within the XY plane. The articulated robot 26 further comprises a linear drive 35 formed between the robot base 34 and the first articulated arm 27, with which the height position of the alignment device 30 can be changed.

[0050] According to Fig. The alignment device 30 comprises a holding device 39 with two clamping jaws 40, between which the photomask 17 is held. The clamping jaws 40 can be brought closer together by means of an actuator, for example in the form of a Lorentz actuator, to grip a photomask 17, or moved apart to release a photomask 17. The holding device 39 is attached to the third articulated arm 29 of the articulated robot 26 via a second rotary drive 38, a structural component 37, and a first rotary drive 36. By actuating the first rotary drive 36, the photomask 17 is rotated about a vertical axis. The first rotary drive 36 can move to four different angular positions, each with a rotation angle of 90° between them.

[0051] The second rotary drive 38 allows the structural component 37, together with the first rotary drive 36 and the photomask 17, to be rotated 180° about a horizontal axis 52. With the two rotation positions of the second rotary drive 38 and the four rotation positions of the first rotary drive 36, the alignment device 30 provides a total of eight different orientations into which the photomask 17 can be placed. Fig. Figure 5 shows one of the possible orientations in which the photomask 17 is opposite the state in Fig. 4 is rotated 180° around the horizontal axis 52 and rotated 90° around the vertical axis 51.

[0052] In Fig. Figure 6 shows a support station 41 on which the alignment device 30 can place the photomask 17 after it has been brought into the correct orientation. The support station 41 comprises support structures 42 that define point-like areas on which the placed photomask 17 rests. In an alternative embodiment, the support station has inclined support surfaces whose distance from each other corresponds to the width of the photomask 17. The photomask rests on the support surfaces of the support station with two opposing edges. The edges of the photomask 17 can be chamfered, resulting in planar contact between the edges of the photomask and the support surfaces of the support station.

[0053] In the alternative embodiment in Fig. The alignment device 30 comprises two sensor elements 43, which determine the current orientation of the photomask 17. The sensor elements 43 are optical sensors that respond to markers attached to the photomask 17. Based on the measured values ​​of the sensor elements 43, it is possible to unambiguously determine which of the eight possible orientations the photomask 17 is in. The photomask 17 can therefore be transferred to the alignment device 30 in any orientation, without the alignment device 30 requiring any further information to proceed.

[0054] In Fig. Figure 8 shows an embodiment in which the alignment device 30 is a separate device from the articulated robot arm 26. The alignment device 30 rests on the floor via a housing 46. The photomask 17 is held by the clamping jaws 40 on a frame bracket 39, which is attached to the housing 46 via a first rotary drive 36. A second rotary drive 38 is provided between the clamping jaws 40 and the frame bracket 39, with which the photomask 17 can be rotated 180° about a horizontal axis. By actuating the first rotary drive 36, the frame bracket 39 is rotated together with the photomask 17 about a vertical axis. The first rotary drive 36 is designed to move to four positions, each differing by 90° from the others. The alignment device 30 thus provides eight different orientations into which the photomask 17 can be placed.

[0055] The articulated arm robot 26 includes a receiving fork 44 as its end effector ( Fig. 9), which is attached to the third articulated arm 29 of the articulated robot 26. Upward-pointing support projections 45 are attached to the picking fork 44. To pick up a photomask 17 from a support station 41, the third articulated arm 29 of the articulated robot 26 is moved until the support projections 45 are positioned below the photomask 17. The photomask 17 is lifted from the support station 41 by the linear drive 35. The picking fork 44 is moved into the Fig. The robot is moved to the position shown in Figure 8, in which the receiving fork 44 is arranged between two struts of the frame bracket 39 of the alignment device 30 and in which the photomask 17 is positioned between the clamping jaws 40 of the holding device 30. The clamping jaws 40 are moved so that the photomask 17 is held between them. The articulated robot 26 retracts the receiving fork 44 so that the alignment device 30 can be actuated without collision with any parts of the articulated robot 26.

[0056] By actuating the first rotary drive 36 and the second rotary drive 38, the photomask 17 is brought into the correct orientation. Subsequently, the photomask 17 is removed from the alignment device 30 in a corresponding sequence and transferred to the next support station 41 of the inspection system. The photomask 17 is now correctly oriented to be examined in the process chamber of the inspection system.

[0057] As in Fig. Figure 8 shows the frame bracket 39 of the alignment device 30 designed such that in every orientation of the photomask 17 space is available within which the receiving fork 44 can be moved in from the side so that the receiving fork 44 takes up a position below the photomask 17.

[0058] In Fig. Figure 10 schematically shows a process chamber 47 of a processing system for DUV photomasks. In process chamber 47, the photomasks are treated with an electron beam, which inscribes specific structures into the substrate of the photomask.

[0059] The photomask 17 to be processed is provided via a support station 41. The handling system 21 lifts the photomask 17 from the support station 41. The alignment device 30 brings the photomask 17 into the correct orientation and then transfers it into a pre-chamber 48 of the process chamber 47 by actuating the articulated arm robot 26.

[0060] From the preliminary chamber 48, the case can be transferred to the trial chamber 47.

[0061] The processing system in Fig. The handling system 21 is arranged between a lock chamber 49 and the process chamber 47. The handling system 21 is designed to transfer the photomask 17 directly to the process chamber 47.

[0062] In all embodiments, each actuator of the handling system according to the invention has exactly one degree of freedom. The actuators can therefore be well encapsulated, so that outgassing is avoided even under the vacuum conditions in which the handling system is operated.

Claims

[1] Handling system for microlithographic photomasks (17), comprising an articulated arm robot (26) and an alignment device (30), wherein the alignment device (30) is designed to rotate a photomask held by the alignment device (30) with a first movement sequence about a vertical axis (51) and to turn it with a second movement sequence about a horizontal axis (52). [2] Handling system according to claim 1, wherein the articulated arm robot (26) comprises a robot base (34), a first articulated arm (27) attached to the robot base (34) via a first pivot joint (31), a second articulated arm (28) attached to the first articulated arm (27) via a second pivot joint (32), and a third articulated arm (29) attached to the second articulated arm (28) via a third pivot joint (33). [3] Handling system according to claim 1 or 2, wherein the alignment device (30) comprises a holding device (39) designed to hold a photomask (17) independently of the alignment with respect to gravity. [4] Handling system according to one of claims 1 to 3, wherein the rotation about the vertical axis (51) is driven by a first rotary drive (36) and wherein the first rotary drive (36) is designed to move to four rotational positions which differ by 90°. [5] Handling system according to claim 4, wherein the vertical axis (51) intersects a photomask (17) held in the holding device (39) in the center. [6] Handling system according to one of claims 1 to 5, wherein the rotation about the horizontal axis (52) is driven by a second rotary drive (38) and wherein the second rotary drive (38) is designed to move to two rotational positions which differ by 180°. [7] Handling system according to claim 6, wherein the horizontal axis (51) lies in a plane spanned by a photomask (17) held in the holding device (39). [8] Handling system according to one of claims 1 to 7, comprising a sensor device (43) for detecting the orientation of the photomask (17). [9] Handling system according to claim 8, wherein the sensor device (43) is a component of the alignment device (30). [10] Handling system according to one of claims 1 to 9, wherein the third articulated arm (29) of the articulated arm robot (26) is designed as an end effector (44) which is designed to receive a photomask (17) from the alignment device (30) and / or to transfer a photomask (17) to the alignment device (30). [11] Handling system according to one of claims 1 to 10, wherein the articulated arm robot (26) and the alignment device (30) are elements of a handling system designed as a unitary device. [12] Handling system according to claim 11, wherein the alignment device (30) is arranged on the third articulated arm (29) of the articulated arm robot (26). [13] Handling system according to claim 12, wherein the alignment device (30) has an axis of rotation which is aligned parallel to the longitudinal direction of the third articulated arm (29). [14] Handling system according to one of claims 1 to 13, wherein the support device (30) is designed such that in each of the eight possible orientations of the photomask (17) a support structure (42, 45) can be moved from the lateral direction under the photomask (17). [15] Inspection system for microlithographic photomasks (17), comprising a handling system (21) and a process chamber (18) for carrying out an examination on a photomask (17), wherein the handling system (21) is designed to transfer the photomask (17) to the process chamber (18) or a pre-chamber (25) of the process chamber (18), and wherein the handling system is designed according to one of claims 1 to 14. [16] Processing system for microlithographic photomasks (17), comprising a handling system (21) and a process chamber (47) for carrying out a processing step on a photomask (17), wherein the handling system (21) is designed to transfer the photomask (17) to the process chamber (47) or a pre-chamber (48) of the process chamber (47), and wherein the handling system is designed according to one of claims 1 to 14.

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