CONTACT CLEANING SYSTEM

Abstract

Embodiments of the present invention provide a conveyor for a contact cleaning system, wherein the conveyor has a feeder and a discharge conveyor spaced apart from the feeder by a distance (A), wherein the feeder and / or the discharge conveyor is positioned relative to the other feeder or discharge conveyor between a retracted position in which the distance (A) is a first distance (A Reinigung ) is, and an extended position in which the distance (A) is smaller than the first distance (A) Reinigung ) is, are movable.

Description

TECHNICAL FIELD

[0001] The present invention relates to a conveyor for a contact cleaning system, and more particularly, but not exclusively, to a conveyor for a contact cleaning system having an infeed conveyor and a discharge conveyor movable between a retracted position and an extended position. The present invention also relates to a contact cleaning system comprising the conveyor. BACKGROUND

[0002] Contact cleaning systems typically include a conveyor that transports a substrate to be cleaned to contact cleaning rollers. Contact cleaning rollers have a contact surface made of an elastomeric material. The contact cleaning rollers rotate, and when the contact surface comes into contact with a surface of the substrate, the contact surface collects dirt or other contaminants and removes them from the substrate surface.

[0003] For example, prior art contact cleaning systems include an upper set of contact cleaning rollers positioned above the conveyor surface. The contact cleaning rollers clean only one upper surface of the substrate as it passes beneath the contact cleaning rollers. If both the upper and lower surfaces of the substrate need to be cleaned, the substrate must be flipped over and conveyed back along the conveyor. Flipping the substrate over and placing it back on the conveyor requires manual handling of the substrate, which can result in additional debris being deposited on the substrate surface.

[0004] Other examples of prior art contact cleaning systems simultaneously clean the top and bottom surfaces of the substrate. These contact cleaning systems also include a lower set of contact cleaning rollers arranged in a plane of the conveyor. The lower set of contact cleaning rollers is positioned directly below the upper set of contact cleaning rollers, so that both the upper and lower sets of contact cleaning rollers simultaneously clean the top and bottom surfaces of the substrate as the substrate passes between the upper and lower sets of contact cleaning rollers. A feed conveyor conveys the substrate to the contact cleaning rollers, and the substrate is transferred to the lower contact cleaning rollers, which support the substrate as it passes through.The contact cleaning rollers rotate to clean the substrate surface and to transfer the substrate through the contact cleaning rollers and onto a conveyor that carries the substrate away from the contact cleaning rollers.

[0005] These contact cleaning systems can operate in a cleaning mode where both the upper and lower sets of contact cleaning rollers contact the substrate. They can also operate in a bypass mode where the lower contact cleaning rollers are moved away from the plane of the conveyors. This may be desirable when only an upper surface of the substrate is to be cleaned, or when the substrate is to bypass cleaning altogether. In bypass mode, substrates are cantilevered during the transition from the infeed conveyor to the outfeed conveyor.

[0006] An object of the invention is to at least mitigate one or more of the problems of the prior art. SUMMARY OF THE INVENTION

[0007] Aspects and embodiments of the invention provide a conveyor for a contact cleaning system and a contact cleaning system as claimed in the appended claims.

[0008] According to one aspect of the invention, a conveyor for a contact cleaning system is provided, the conveyor comprising a feed conveyor and a discharge conveyor spaced from the feed conveyor by a distance (A), the feed conveyor and / or the discharge conveyor being movable relative to the other of the feed conveyor and the discharge conveyor between a retracted position in which the distance (A) is a first distance (A Reinigung ) and an extended position in which the distance (A) is smaller than the first distance (A Reinigung ) is movable.

[0009] Advantageously, a substrate conveyed from the feed conveyor to the discharge conveyor remains supported by the conveyor in the extended position of the feed conveyor and / or the discharge conveyor.

[0010] In certain embodiments, the infeed conveyor and the outfeed conveyor may be configured to receive at least one contact cleaning roller therebetween when the infeed conveyor and the outfeed conveyor are in the retracted position. The infeed conveyor and the outfeed conveyor may be configured to receive at least one contact cleaning roller therebetween when the infeed conveyor and the outfeed conveyor are in the retracted position, such that a substrate may be supported by the at least one contact cleaning roller as it is conveyed from the infeed conveyor to the outfeed conveyor.

[0011] Advantageously, the feed conveyors and discharge conveyors are adjustable such that at least one contact cleaning roller can be accommodated between them in the retracted position and the feed conveyors and discharge conveyors can support a substrate without at least one contact cleaning roller being present in the extended position.

[0012] In certain embodiments, the infeed conveyor, the outfeed conveyor, and a surface of the at least one contact cleaning roller are coplanar in the retracted position such that a substrate conveyed from the infeed conveyor to the outfeed conveyor via the at least one contact cleaning roller remains on a plane.

[0013] Advantageously, the feed conveyor, the discharge conveyor, and at least one contact cleaning roller convey the substrate along a flat surface. This can prevent damage to the substrate.

[0014] In certain embodiments, the distance (A) may be less than a length of a substrate to be carried on the conveyor when the infeed and outfeed conveyors are in the extended position. The distance (A) may be less than a length of a substrate to be carried on the conveyor when the infeed and outfeed conveyors are in the extended position, so that the substrate can be carried by both the infeed conveyor and the outfeed conveyor when the substrate is conveyed from the infeed conveyor to the outfeed conveyor.

[0015] Advantageously, the distance (A) can be selected or adjusted depending on the length of the substrate, and the substrate is supported by the feed conveyor and the discharge conveyor without falling between the conveyors, which can lead to damage to the substrate.

[0016] In certain embodiments, the distance (A) in the extended position may be a minimum distance (A min ) be.

[0017] In certain embodiments, the minimum distance (A min ) can be between about 0.5 mm and about 50 mm. Preferably, the minimum distance (A min ) approximately 25 mm to approximately 45 mm. Preferably, the minimum distance (A min ) about 30 mm to about 40 mm, for example about 39 mm.

[0018] In certain embodiments, the distance (A) in the retracted position may be a maximum distance (A max ) be.

[0019] In certain embodiments, the maximum distance (A max ) approximately 90 mm to approximately 110 mm. Preferably, the maximum distance (A max ) should be approximately 102 mm.

[0020] In certain embodiments, the feeder may include a feeder tensioning mechanism configured to maintain the feeder in a tensioned configuration in both the retracted position and the extended position.

[0021] In certain embodiments, the discharge conveyor may include a discharge conveyor tensioning mechanism configured to maintain the discharge conveyor in a tensioned configuration in both the retracted position and the extended position.

[0022] In certain embodiments, the infeed conveyor and the outfeed conveyor may include a tensioning mechanism configured to maintain both the infeed conveyor and the outfeed conveyor in a tensioned configuration in both the retracted position and the extended position.

[0023] Advantageously, the tensioning mechanism ensures that the feed conveyor and / or the discharge conveyor remain tensioned when the feed conveyor and / or the discharge conveyor move between the retracted and extended positions.

[0024] In certain embodiments, the tensioning mechanism, the infeed conveyor tensioning mechanism, and / or the outfeed conveyor tensioning mechanism may include a series of pulleys arranged to support the respective conveyor, for example, the infeed conveyor or the outfeed conveyor, in a tensioned configuration. The series of pulleys may be attached to a frame of the infeed conveyor or a frame of the outfeed conveyor. At least one of the series of pulleys may be arranged to move relative to the frame of the infeed conveyor or the frame of the outfeed conveyor between a first position and a second position to maintain the infeed conveyor or the outfeed conveyor in a tensioned configuration while the infeed conveyor or the outfeed conveyor is moving.

[0025] In certain embodiments, the conveyor may include at least one mechanical adjustment device configured to move the infeed conveyor and / or the outfeed conveyor between the retracted position and the extended position.

[0026] In certain embodiments, the conveyor further comprises at least one pneumatic adjustment device configured to move the infeed conveyor and / or the outfeed conveyor between the retracted position and the extended position.

[0027] In certain embodiments, the conveyor further comprises at least one electromechanical adjustment device configured to move the infeed conveyor and / or the outfeed conveyor between the retracted position and the extended position.

[0028] Advantageously, the position of the feed conveyor and / or the discharge conveyor can be automatically adjusted between the retracted and extended positions without manual intervention by an operator.

[0029] The feed conveyor and / or the discharge conveyor may comprise a frame. The frame may comprise a static frame section and a movable frame section slidably connected to the static frame section. The feed conveyor and / or the discharge conveyor may be supported on both the static frame section and the movable frame section. The movable frame section may be slidably arranged relative to the static frame section to move toward the other of the feed conveyor and the discharge conveyor.

[0030] According to a further aspect of the invention, a contact cleaning system is provided comprising the conveyor, the conveyor being configured to support a substrate on a conveying surface, and comprising at least one of: one or more upper contact cleaning rollers positioned above the conveying surface, the one or more upper contact cleaning rollers being movable between a cleaning position in which a surface of the one or more upper contact cleaning rollers is arranged to contact an upper surface of a substrate conveyed from the infeed conveyor to the outfeed conveyor, and a retracted position in which the surface of the one or more upper contact cleaning rollers is retracted upwardly, away from the infeed conveyor and the outfeed conveyor, and one or more lower contact cleaning rollers positioned below the conveying surface,wherein the one or more lower contact cleaning rollers are movable between a cleaning position in which a surface of the one or more lower contact cleaning rollers is coplanar with the infeed conveyor and the outfeed conveyor, and a retracted position in which the surface of the one or more lower contact cleaning rollers is retracted below a plane of the infeed conveyor and the outfeed conveyor; and wherein the infeed conveyor is arranged to convey the substrate to the one or more upper contact cleaning rollers and / or the one or more lower contact cleaning rollers.

[0031] Advantageously, by moving the infeed conveyors and / or outfeed conveyors and moving the one or more lower contact cleaning rollers and / or upper contact cleaning rollers, the contact cleaning system can be adjusted so that an upper surface of a substrate, a lower surface of a substrate, both upper and lower surfaces of a substrate can be cleaned, or so that the substrate can bypass all contact cleaning rollers.

[0032] In certain embodiments, the infeed and outfeed conveyors, the one or more lower contact cleaning rollers, and the one or more upper contact cleaning rollers may be movable between an upper and lower cleaning mode, an upper cleaning mode, and a bypass mode of the contact cleaning system. In the upper and lower cleaning mode, the one or more upper contact cleaning rollers are in the cleaning position, the one or more lower contact cleaning rollers are in the cleaning position, and the infeed conveyor and / or the outfeed conveyor are in the retracted position. In the upper cleaning mode, the one or more upper contact cleaning rollers are in the cleaning position, the one or more lower contact cleaning rollers are in the retracted position, and the infeed conveyor and / or the outfeed conveyor are in the extended position.In the bypass mode, the one or more upper contact cleaning rollers are in the retracted position, the one or more lower contact cleaning rollers are in the retracted position, and the infeed conveyor and / or the outfeed conveyor are in the extended position.

[0033] In certain embodiments, the infeed conveyor and the outfeed conveyor may be in the retracted position while the one or more lower contact cleaning rollers are in the retracted position. The distance between the infeed conveyor and the outfeed conveyor may be sized to accommodate the one or more lower contact cleaning rollers between them.

[0034] Advantageously, the feed conveyor conveys a substrate to the one or more lower contact cleaning rollers to enable cleaning of the lower surface of the substrate.

[0035] In certain embodiments, the contact cleaning system may include the one or more upper contact cleaning rollers and the one or more lower contact cleaning rollers.

[0036] Advantageously, both the top and bottom surfaces of a substrate can be cleaned simultaneously when the one or more lower contact cleaning rollers and the one or more upper contact cleaning rollers are both in the cleaning position. Accordingly, the contact cleaning system is in the upper and lower cleaning modes.

[0037] Within the scope of this application, it is expressly intended that the various aspects, embodiments, examples, and alternatives recited in the preceding paragraphs, in the claims, and / or in the following description and drawings, in particular their individual features, may be used individually or in any combination. Thus, all embodiments and / or features of each embodiment may be used in any manner and / or combination, provided these features are compatible. The applicant reserves the right to amend an originally filed claim or to file a new claim accordingly, including the right to amend an originally filed claim so that it depends on another claim and / or includes a feature of another claim even though it is not originally claimed in that manner. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] One or more embodiments of the invention are described below, by way of example only, with reference to the accompanying drawings, in which: Fig. Figure 1 shows a contact cleaning system according to the present invention in an upper and lower cleaning mode; Fig. 2 the contact cleaning system of Fig. 1 in an upper cleaning mode; Fig. 3 the contact cleaning system of Fig. 1 in a bypass mode; Fig. 4 an enlarged view of the contact cleaning system of Fig. 1 in the upper and lower cleaning mode; and Fig. 5 an enlarged view of the contact cleaning system of Fig. 1 in the upper cleaning mode. DETAILED DESCRIPTION

[0039] The Fig. 1 to 3 show a contact cleaning system 100 according to the present invention. The contact cleaning system 100 includes two lower contact cleaning rollers 102 and two upper contact cleaning rollers 104. The contact cleaning system 100 further includes an infeed conveyor 106 arranged to convey a substrate toward the lower and upper contact cleaning rollers 102, 104, and an outfeed conveyor 108 arranged to convey the substrate away from the lower and upper contact cleaning rollers 102, 104.

[0040] The feed conveyor 106 and the discharge conveyor 108 are arranged in a plane. In other words, an upper surface of the feed conveyor 106 is at the same level as an upper surface of the discharge conveyor 108. Both the feed conveyor 106 and the discharge conveyor 108 are movable relative to each other between a retracted position, as shown in Fig. 1, and an extended position as shown in the Fig. 2 and Fig. 3, as explained in more detail below. In alternative embodiments, only the infeed conveyor 106 or the outfeed conveyor 108 is movable between the retracted and extended positions.

[0041] The infeed conveyor 106 includes an infeed tensioning mechanism 110 that holds the infeed conveyor 106 in a tensioned configuration in both the retracted and extended positions. The outfeed conveyor 108 includes an outfeed tensioning mechanism 112 that holds the outfeed conveyor 108 in a tensioned configuration in both the retracted and extended positions. Details of the infeed and outfeed tensioning mechanisms 110, 112 are discussed in more detail below.

[0042] The two lower contact cleaning rollers 102 are arranged below the level of the feed and discharge conveyors 106, 108. The two lower contact cleaning rollers 102 are movable between a cleaning position in which a surface of each of the lower contact cleaning rollers 102 is coplanar with the feed conveyor 106 and the discharge conveyor 108, as shown in Fig. 1, and a retracted position in which the surface of each of the lower contact cleaning rollers 102 is retracted or retracted below the plane of the feed and discharge conveyors 106, 108, as shown in the Fig. 2 and Fig. 3. In other words, when the lower contact cleaning rollers 102 are in the cleaning position, the surface of each of the lower contact cleaning rollers 102 is on the same plane as the upper surface of the infeed conveyor 106 and the upper surface of the outfeed conveyor 108. When the lower contact cleaning rollers 102 are in the retracted position, the surface of each of the lower contact cleaning rollers 102 is below the upper surface of the infeed conveyor 106 and the upper surface of the outfeed conveyor 108. In the cleaning position, the lower contact cleaning rollers 102 can clean a lower surface of the substrate as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108.A surface of the lower contact cleaning rollers 102 is located in the plane of the infeed and outfeed conveyors 106, 108, so that the substrate remains in the same plane as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108. In the retracted position, the lower contact cleaning rollers 102 do not contact the substrate as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108.

[0043] The two upper contact cleaning rollers 104 are arranged above the surface of the feed conveyor and discharge conveyor 106, 108. The upper contact cleaning rollers 104 are also movable between a cleaning position in which a surface of each of the upper contact cleaning rollers 104 is arranged to contact an upper surface of a substrate being conveyed from the feed conveyor to the discharge conveyor, as shown in Fig. 1 and Fig. 2, and a retracted position in which the surface of each of the upper contact cleaning rollers 104 is retracted or retracted upwards, away from the infeed and discharge conveyors 106, 108, as shown in Fig. 3. In the cleaning position, the upper contact cleaning rollers 104 can clean an upper surface of the substrate as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108. In the retracted position, the upper contact cleaning rollers 104 do not contact the substrate as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108.

[0044] The lower and upper contact cleaning rollers 102, 104 have an elastomeric outer layer. The elastomeric outer layer collects dirt from a surface of the substrate when the substrate comes into contact with the elastomeric outer layer.

[0045] Each of the upper contact cleaning rollers 104 and the lower contact cleaning rollers 102 is movable along a substantially vertical axis toward and away from the plane of the infeed and discharge conveyors 106, 108.

[0046] The contact cleaning system 100 also includes two adhesive rollers 114. A first adhesive roller 114 is positioned in contact with the two lower contact cleaning rollers 102. A second adhesive roller 114 is positioned in contact with the two upper contact cleaning rollers 104. One surface of each of the adhesive rollers 114 includes an adhesive that collects and removes dirt from the elastomeric outer layer of the respective lower or upper contact cleaning rollers 102, 104.

[0047] Fig. Figure 1 shows the contact cleaning system 100 in an upper and lower cleaning mode. In the upper and lower cleaning modes, both the upper and lower surfaces of a substrate conveyed through the O-contact cleaning system 100 are cleaned.

[0048] The feed conveyor 106 and the discharge conveyor 108 are in a retracted position. The distance (A) between the feed conveyor 106 and the discharge conveyor 108 is a first distance (A Reinigung ). As in Fig. 1, the feed conveyor and discharge conveyor 106, 108 are completely retracted from each other, so that the first distance (A Reinigung ) a maximum distance (A max ). The first distance (A Reinigung ) can be smaller than the maximum distance (A max ). For example, the first distance (A Reinigung) may be any suitable distance that allows the two lower contact cleaning rollers 102 to be accommodated between the feed conveyor 106 and the discharge conveyor 108.

[0049] As in Fig. 1, each of the lower contact cleaning rollers 102 and the upper contact cleaning rollers 104 is in the cleaning position in the upper and lower cleaning modes. The lower contact cleaning rollers 102 are arranged coplanar with the infeed conveyor 106 and the outfeed conveyor 108, such that a substrate is conveyed from the infeed conveyor 106 over the lower contact cleaning roller 102 and to the outfeed conveyor 108. The upper contact cleaning rollers 104 oppose the lower contact cleaning rollers 102, and the substrate is received between the lower contact cleaning rollers 102 and the upper contact cleaning rollers 104. The upper contact cleaning rollers 104 are positioned to contact an upper surface of the substrate, while the lower contact cleaning rollers 102 simultaneously contact the lower surface of the substrate.Thus, both the upper and lower surfaces of the substrate are cleaned as the substrate is conveyed from the feed conveyor 106 to the discharge conveyor 108 via the lower and upper contact cleaning rollers 102, 104.

[0050] Fig. Figure 2 shows the contact cleaning system 100 in an upper cleaning mode. In the upper cleaning mode, only the upper surface of a substrate conveyed through the contact cleaning system 100 is cleaned.

[0051] The feed conveyor 106 and the discharge conveyor 108 are in an extended position. The distance (A) between the feed conveyor 106 and the discharge conveyor 108 is smaller than the first distance (A Reinigung ). As in Fig. 2, the feed conveyor and discharge conveyor 106, 108 are fully extended towards each other, so that the distance (A) is a minimum distance (A min ). The distance between the feed conveyor 106 and the

[0052] However, the discharge conveyor 108 may be any distance that is smaller than the first distance (A Reinigung ). For example, the distance (A) may be any suitable distance that allows a substrate to be conveyed across the gap between the infeed conveyor 106 and the outfeed conveyor 108. In other words, the distance (A) in the extended position is less than the length of the substrate, so that the substrate is supported by both the infeed conveyor 106 and the outfeed conveyor 108 while being conveyed between them.

[0053] As in Fig. 2, the lower contact cleaning rollers 102 are in the retracted position and the upper contact cleaning rollers 104 are in the cleaning position in the upper cleaning mode. The lower contact cleaning rollers 102 are retracted from the plane of the infeed conveyor 106 and the outfeed conveyor 108, so that a substrate is conveyed from the infeed conveyor 106 to the outfeed conveyor 108, bypassing the lower contact cleaning roller 102. The upper contact cleaning rollers 104 are arranged above the infeed conveyor 106 and the outfeed conveyor 108. The upper contact cleaning rollers 104 are positioned to contact an upper surface of the substrate as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108. Accordingly, the upper surface of the substrate is cleaned as the substrate is conveyed from the infeed conveyor 106 to the outfeed conveyor 108.

[0054] Alternatively, both the lower and upper contact cleaning rollers 102, 104 can be moved to the retracted position. In this configuration, the substrate is conveyed from the infeed conveyor 106 to the outfeed conveyor 108, bypassing all contact cleaning rollers 102, 104 in a bypass mode, as shown in FIG. Fig. 3 is described.

[0055] Fig. Figure 3 shows the contact cleaning system 100 in a bypass mode. In the bypass mode, the substrate bypasses the upper contact cleaning rollers 104 and the lower contact cleaning rollers 102 of the contact cleaning system 100 and is conveyed through the contact cleaning system 100 on the infeed conveyor 106 and the outfeed conveyor 108.

[0056] The feed conveyor 106 and the discharge conveyor 108 are in an extended position. The distance (A) between the feed conveyor 106 and the discharge conveyor 108 is smaller than the first distance (A Reinigung ). As in Fig. 3, the feed conveyor and discharge conveyor 106, 108 are fully extended towards each other, so that the distance (A) is a minimum distance (A min ). However, the distance between the feed conveyor 106 and the discharge conveyor 108 may be any distance that is smaller than the first distance (A Reinigung ). For example, the distance (A) may be any suitable distance that allows a substrate to be conveyed across the gap between the infeed conveyor 106 and the outfeed conveyor 108. In other words, the distance (A) in the extended position is less than the length of the substrate, so that the substrate is supported by both the infeed conveyor 106 and the outfeed conveyor 108 while being conveyed between them.

[0057] As in Fig. 3, the lower contact cleaning rollers 102 are in the retracted position and the upper contact cleaning rollers 104 are in the retracted position. The lower contact cleaning rollers 102 are retracted from the plane of the infeed conveyor 106 and the outfeed conveyor 108, so that a substrate is conveyed from the infeed conveyor 106 to the outfeed conveyor 108, bypassing the lower contact cleaning roller 102. The upper contact cleaning rollers 104 are arranged above the infeed conveyor 106 and the outfeed conveyor 108. The upper contact cleaning rollers 104 are retracted such that they do not come into contact with an upper surface of the substrate as it is conveyed from the infeed conveyor 106 to the outfeed conveyor 108. Thus, neither the upper surface of the substrate nor the lower surface of the substrate is cleaned while the substrate is conveyed from the feed conveyor 106 to the discharge conveyor 108.

[0058] In other words, in this configuration, the substrate is conveyed from the feed conveyor 106 to the discharge conveyor 108, bypassing all contact cleaning rollers 102, 104. The substrate is therefore not cleaned.

[0059] The Fig. 4 and Fig. 5 shows an enlarged view of the feed conveyor 106. Fig. 4 shows the feed conveyor 106 in the retracted position and Fig. 5 shows the feed conveyor 106 in the extended position.

[0060] The feed conveyor 106 has a static frame section 116 and a movable frame section 118. The movable frame section 118 can move between a retracted position near the static frame section 116, as shown in Fig. 4, and an extended position away from the static frame section 116, as shown in Fig. 5. The movable frame section 118 is extendable horizontally away from the static frame section 116 and toward the discharge conveyor 108 along the plane of the feed conveyor 106. The movable frame section 118 is slidably attached to the static frame section 116 by longitudinally extending rods.

[0061] The movable frame section 118 is actuatable by an adjustment device. In some examples, the adjustment device may be an automatic adjustment device. The adjustment device is, for example, a pneumatic adjustment device. In another example, the adjustment device is a mechanical adjustment device. In another example, the adjustment device is an electromechanical adjustment device. The adjustment means may be coupled to the infeed conveyor 106, the discharge conveyor 108, or both the infeed conveyor and the discharge conveyor 106, 108.

[0062] The feed conveyor 106 is attached to the static frame section 116 and the movable frame section 118 by a series of pulleys 120. The series of pulleys 120 is part of a feed conveyor tensioning mechanism 110 that holds the feed conveyor 106 in a tensioned position in both the retracted and extended positions. The pulleys 120 rotate to move the feed conveyor 106 such that the feed conveyor 106 conveys a substrate thereon to the lower contact cleaning rollers 102 and / or the upper contact cleaning rollers 104. One of the pulleys 120a is attached to the movable frame section 118 such that the feed conveyor 106 is moved from the retracted position to the extended position when the movable frame section 118 is moved from the retracted position to the extended position. As shown in Fig. 1 and Fig. 2, another of the pulleys 120b is slidably mounted on the static frame portion 116. The pulley 120b slides relative to the static frame portion 116 to compensate for the movement of the pulley 120a mounted on the movable frame portion 118 to maintain the same tension on the feed conveyor 106 when the feed conveyor 106 is in the retracted position and in the extended position.

[0063] The discharge conveyor 108 (as shown in the Fig. 1 and Fig. 2) also includes a static frame section 116 and a movable frame section 118 that operates in the same manner as described above. The discharge conveyor 108 is attached to the static frame section 116 and the movable frame section 118 by a series of pulleys 120 in the same manner as described above.

[0064] All features disclosed in this patent application (including all accompanying claims, abstracts and drawings) and / or all steps of a method or process so disclosed may be combined in any combination, except for combinations in which at least some of these features and / or steps are mutually exclusive.

[0065] Any feature disclosed in this specification (including all accompanying claims, abstracts, and drawings) may be replaced by alternative features serving the same, equivalent, or comparable purpose, unless expressly stated otherwise. Thus, unless expressly stated otherwise, each disclosed feature is only one example of a general set of equivalent or comparable features.

[0066] The invention is not limited to the details of the aforementioned embodiments. The invention extends to any novel feature or combination of the features disclosed in this patent application (including the appended claims, abstract, and drawings) or to any novel feature or combination of the steps of any method or process so disclosed. The claims are intended to cover not only the above embodiments, but also all embodiments that fall within the scope of the claims. Specific embodiments of the invention are described in the following sentences: 1. Conveyor for a contact cleaning system, the conveyor comprising: a feeder; and a discharge conveyor spaced from the feed conveyor by a distance (A); wherein the feed conveyor and / or the discharge conveyor are movable relative to the other of the feed conveyor or the discharge conveyor between a retracted position in which the distance (A) is a first distance (A Reinigung ) and an extended position in which the distance (A) is smaller than the first distance (A Reinigung ) is movable. 2. The conveyor of claim 1, wherein the infeed conveyor and the outfeed conveyor are configured to receive at least one contact cleaning roller therebetween when the infeed conveyor and the outfeed conveyor are in the retracted position. 3. The conveyor according to sentence 2, wherein the feed conveyor, the discharge conveyor and a surface of the at least one contact cleaning roller are coplanar in the retracted position such that a substrate conveyed from the feed conveyor to the discharge conveyor via the at least one contact cleaning roller remains on a plane. 4. A conveyor according to any one of clauses 1 to 3, wherein the distance (A) is less than a length of a substrate to be carried on the conveyor when the feed conveyor and the discharge conveyor are in the extended position. 5. Conveyor according to one of the sentences 1 to 4, wherein the distance (A) in the extended position is a minimum distance (A min ) is. 6. Conveyor according to one of the sentences 1 to 5, wherein the distance (A) in the retracted position is a maximum distance (A max ) is. 7. The conveyor of any one of clauses 1 to 6, wherein the feed conveyor includes a feed conveyor tensioning mechanism configured to maintain the feed conveyor in a tensioned configuration in both the retracted position and the extended position. 8. The conveyor of any one of clauses 1 to 7, wherein the discharge conveyor includes a discharge conveyor tensioning mechanism configured to maintain the discharge conveyor in a tensioned configuration in both the retracted position and the extended position. 9. The conveyor of any one of clauses 1 to 8, wherein the conveyor further comprises at least one of a mechanical adjustment device, a pneumatic adjustment device, or an electromechanical adjustment device configured to move the infeed conveyor and / or the outfeed conveyor between the retracted position and the extended position. 10. Contact cleaning system comprising: a conveyor according to any one of sentences 1 to 9, wherein the conveyor is configured to support a substrate on a conveying surface; and at least one of: one or more upper contact cleaning rollers positioned above the conveying surface, wherein the one or more upper contact cleaning rollers are movable between a cleaning position in which a surface of the one or more upper contact cleaning rollers is arranged to contact an upper surface of a substrate conveyed from the feed conveyor to the discharge conveyor, and a retracted position in which the surface of the one or more upper contact cleaning rollers is retracted upwards, away from the feed conveyor and discharge conveyor, and one or more lower contact cleaning rollers positioned below the conveyor surface, wherein the one or more lower contact cleaning rollers are movable between a cleaning position in which a surface of the one or more lower contact cleaning rollers is coplanar with the infeed conveyor and the discharge conveyor, and a retracted position in which the surface of the one or more lower contact cleaning rollers is retracted below a plane of the infeed conveyor and the discharge conveyor; and wherein the feed conveyor is arranged to convey the substrate to the one or more upper contact cleaning rollers and / or the one or more lower contact cleaning rollers. 11. The contact cleaning system of clause 10, wherein the infeed conveyor and the outfeed conveyor are in the retracted position when the one or more lower contact cleaning rollers are in the cleaning position, and the distance between the infeed conveyor and the outfeed conveyor is sized to accommodate the one or more lower contact cleaning rollers therebetween. 12. The contact cleaning system of clause 10 or 11, comprising the one or more upper contact cleaning rollers and the one or more lower contact cleaning rollers.

Claims

[1] Conveyor for a contact cleaning system, the conveyor comprising: a feeder; and a discharge conveyor spaced from the feed conveyor by a distance (A); wherein the feed conveyor and / or the discharge conveyor are movable relative to the other of the feed conveyor or the discharge conveyor between a retracted position in which the distance (A) is a first distance (A Reinigung ) and an extended position in which the distance (A) is smaller than the first distance (A Reinigung ) is movable. [2] The conveyor of claim 1, wherein the infeed conveyor and the outfeed conveyor are configured to receive at least one contact cleaning roller therebetween when the infeed conveyor and the outfeed conveyor are in the retracted position. [3] The conveyor of claim 2, wherein the infeed conveyor, the outfeed conveyor, and a surface of the at least one contact cleaning roller are coplanar in the retracted position such that a substrate conveyed from the infeed conveyor to the outfeed conveyor via the at least one contact cleaning roller remains on a plane. [4] A conveyor according to any one of claims 1 to 3, wherein the distance (A) is less than a length of a substrate to be carried on the conveyor when the feed conveyor and the discharge conveyor are in the extended position. [5] Conveyor according to one of claims 1 to 4, wherein the distance (A) in the extended position is a minimum distance (A min ) is. [6] Conveyor according to one of claims 1 to 5, wherein the distance (A) in the retracted position is a maximum distance (A max ) is. [7] A conveyor according to any one of claims 1 to 6, wherein the feeder includes a feeder tensioning mechanism configured to maintain the feeder in a tensioned configuration in both the retracted position and the extended position. [8] A conveyor according to any one of claims 1 to 7, wherein the discharge conveyor includes a discharge conveyor tensioning mechanism configured to maintain the discharge conveyor in a tensioned configuration in both the retracted position and the extended position. [9] A conveyor according to any one of claims 1 to 8, wherein the conveyor further comprises at least one of the following: a mechanical adjustment device, a pneumatic adjustment device, or an electromechanical adjustment device configured to move the infeed conveyor and / or the outfeed conveyor between the retracted position and the extended position. [10] Contact cleaning system comprising: a conveyor according to any one of claims 1 to 9, wherein the conveyor is configured to support a substrate on a conveying surface; and at least one of: one or more upper contact cleaning rollers positioned above the conveying surface, wherein the one or more upper contact cleaning rollers are movable between a cleaning position in which a surface of the one or more upper contact cleaning rollers is arranged to contact an upper surface of a substrate conveyed from the feed conveyor to the discharge conveyor, and a retracted position in which the surface of the one or more upper contact cleaning rollers is retracted upwards, away from the feed conveyor and discharge conveyor, and one or more lower contact cleaning rollers positioned below the conveyor surface, wherein the one or more lower contact cleaning rollers are movable between a cleaning position in which a surface of the one or more lower contact cleaning rollers is coplanar with the infeed conveyor and the discharge conveyor, and a retracted position in which the surface of the one or more lower contact cleaning rollers is retracted below a plane of the infeed conveyor and the discharge conveyor; and wherein the feed conveyor is arranged to convey the substrate to the one or more upper contact cleaning rollers and / or the one or more lower contact cleaning rollers. [11] The contact cleaning system of claim 10, wherein the infeed conveyor and the outfeed conveyor are in the retracted position when the one or more lower contact cleaning rollers are in the cleaning position, and the distance between the infeed conveyor and the outfeed conveyor is sized to accommodate the one or more lower contact cleaning rollers therebetween. [12] A contact cleaning system according to claim 10 or 11, comprising the one or more upper contact cleaning rollers and the one or more lower contact cleaning rollers.

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