Transport device, transport system and method for transporting an element of a microlithography system

Abstract

A transport device (2) for transporting an element of a microlithography system (3) is shown and described, comprising: a lifting device (6) for raising and / or lowering the element of the microlithography system (3), a support element (8) for supporting and contacting the element of the microlithography system (3), and one or more air cushions (4), wherein the support element (8) can be raised and / or lowered by means of the lifting device (6), and wherein the transport device (2) is movable by means of the one or more air cushions (4). In order to enable the assembly or disassembly of an element of the microlithography system (3) to be as force-free as possible, it is proposed that the support element (8) be movable, preferably displaceable, relative to the lifting device (6).

Description

[0001] The present invention relates to a transport device for transporting an element of a microlithography system, comprising: a lifting device for raising and / or lowering the element of a microlithography system, a support element for supporting and contacting the element of a microlithography system, and one or more air cushions, wherein the support element can be raised and / or lowered by means of the lifting device, and wherein the transport device is movable by means of the one or more air cushions.

[0002] The present invention further relates to a transport system for transporting an element of a microlithography system, comprising: a transport device, and one or more guide rails for guiding the transport device.

[0003] The present invention further relates to a method for transporting an element of a microlithography system, comprising the following steps: a) providing a transport device according to any one of claims 1 to 14, preferably a transport system according to claim 15, b) providing an element of a microlithography system, and c) transporting the element of a microlithography system by means of the transport device.

[0004] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process can be performed using a projection exposure system, which includes, among other things, illumination optics and / or projection optics. The structure of a mask (reticule) illuminated by the illumination optics is projected by the projection optics onto a substrate, such as a wafer (especially a silicon wafer), coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection optics. This transfers the mask structure onto the photosensitive coating of the substrate.

[0005] One of the goals in the development of microlithography systems is to lithographically fabricate increasingly smaller structures on the substrate, for example, to achieve higher integration densities in semiconductor devices. One approach is to work with shorter wavelengths of electromagnetic radiation. For example, optical systems have been developed that use electromagnetic radiation from the so-called "deep ultraviolet" (DUV) range, preferably with operating wavelengths in the range between 150 nm and 400 nm, particularly 365 nm, 248 nm, or 193 nm, or from the extreme ultraviolet (EUV) range, preferably with operating wavelengths in the range between 5 nm and 30 nm, particularly 13.5 nm.

[0006] When installing or removing components of a microlithography system, for example, during initial setup or when replacing optical elements, the components are transported to or from the system using a transport device. For certain components, the transport device also lifts the component towards the system to allow for installation from below. Alternatively, during removal, the component is lowered using the transport device.The transport device used must be able to absorb the often high weight forces of the element of a microlithography system without creating an excessively high specific ground pressure that could damage the substrate, especially the floor of a cleanroom.

[0007] Transport devices from other technical fields, which exhibit a relatively low specific ground pressure and also include a lifting device for raising an object, are known from the prior art. For example, DE 3824563 A1 discloses a transport device with air cushions and a lifting device for raising railway wagons.

[0008] However, when assembling and disassembling elements of a microlithography system, it is essential that the assembly and disassembly are carried out with as little force as possible, so that there is no tension and consequently no damage to the element of the microlithography system or to the microlithography system itself.

[0009] Against this background, the present invention is based on the objective of providing a transport device, a transport system and a method for transporting an element of a microlithography system, which enable assembly or disassembly of an element of a microlithography system to be carried out with as little force as possible.

[0010] The aforementioned problem is solved according to the invention in the transport device by the fact that the support element is movable, preferably displaceable, relative to the lifting device.

[0011] The aforementioned problem is further solved according to the invention in the transport system by the fact that the transport device is a transport device according to one of claims 1 to 14.

[0012] The aforementioned problem is further solved according to the invention by the claimed method for transporting an element of a system for microlithography.

[0013] The following describes various embodiments of the transport device, the transport system, and the method, with each embodiment applying independently to the transport device, the transport system, and the method, respectively. Furthermore, the individual embodiments can be combined with one another as desired.

[0014] The transport device for moving an element of a microlithography system comprises a lifting device for raising and / or lowering the element of the microlithography system. This allows the element of the microlithography system to be moved to or away from a desired position of the system in a structurally simple manner. The lifting device may include one or more lifting spindles and / or one or more lifting cylinders, preferably pneumatic and / or hydraulic. This simplifies rapid and / or precise lifting and lowering. The lifting and / or lowering by means of the lifting device can preferably be performed along a lifting direction. The lifting device may also be designed to perform a transverse movement of the element of the microlithography system. The transverse movement preferably occurs obliquely, and in particular perpendicularly, to the lifting direction.The lifting device can therefore be used, for example, to carry out a step-like movement of the element of a microlithography system, comprising raising and / or lowering, a subsequent lateral movement and a subsequent raising and / or lowering of the element of a microlithography system.

[0015] The transport device also includes a support element for supporting and contacting the microlithography system component. This support element facilitates precise and secure positioning of the microlithography system component on the transport device. The support element can be designed to connect to, and preferably fix, the microlithography system component. Advantageously, the support element is arranged on and / or above the lifting device and / or is connected to the lifting device.

[0016] Furthermore, the transport device comprises one or more air cushions. This allows for a low specific ground pressure. Simultaneously, precise and low-friction movement of the transport device can be achieved, particularly during manual operation. When using rollers to move the transport device, the frictional forces and the resulting displacement forces would be significantly higher than with air cushions. Moreover, when using rollers to move the transport device, precise positioning is generally difficult due to hysteresis. The air volume in the one or more air cushions can be adjusted, preferably by means of at least one pump.

[0017] The transport device is also designed so that the support element can be raised and / or lowered by means of the lifting device. For this purpose, the lifting device may be designed to be retracted and / or extended and / or moved upwards and / or downwards.

[0018] Furthermore, the transport device is designed to be movable by means of one or more air cushions. Advantageously, the transport device is movable relative to the surface, particularly the surface on which it is mounted, by means of these air cushions. The air cushions are preferably arranged on the underside of the transport device. To ensure stable alignment of the transport device during movement by means of the air cushions, it is advantageous that the air cushions are arranged, preferably on the underside of the transport device, with even distribution between them.

[0019] Furthermore, the support element is designed to be movable, preferably displaceable, relative to the lifting device. This allows the support element, and thus the microlithography system component mounted on it, to move relative to the lifting device and preferably also to the rest of the transport device during assembly and disassembly. Slight inaccuracies in the positioning of the support device can therefore be compensated for during assembly or disassembly, ensuring that the microlithography system component can be mounted or dismounted without force when being lifted into or lowered from its installation position on the microlithography system, thus preventing stress and / or damage.Unwanted fits, particularly interference fits, at at least one point between the element of a microlithography system and the microlithography system itself, due to a slightly inaccurate arrangement of the transport device, can thus be avoided, for example. The support element is advantageously movably mounted on the lifting device, preferably floating. The support element is preferably movable, and more preferably displaceable, in a compensating direction relative to the lifting device. The compensating direction advantageously extends obliquely, preferably perpendicularly, to the lifting direction. Alternatively or additionally, the support element can be movable, preferably relative to the lifting device, along at least one, preferably at least two, and in particular at least three, translational degrees of freedom and / or along at least one, preferably at least two, and in particular at least three, rotational degrees of freedom.This simplifies force-free assembly or disassembly of the element of a microlithography system.

[0020] In one embodiment of the transport device, it is provided that the transport device comprises one or more movable alignment elements for aligning the position and / or orientation of the transport device, preferably relative to the surface, and / or for supporting the transport device on the surface, and that, preferably, the one or more alignment elements are each movable between an alignment position for aligning the position and / or orientation of the transport device and / or for supporting the transport device on the surface and a home position. This support enables the transport device to be positioned stably. By aligning the position and / or orientation, any tilting of the transport device can be compensated for, which in turn simplifies the precise assembly or disassembly of the element of a microlithography system using the transport device.On the other hand, the transport device can be moved closer to the microlithography system, thereby requiring, for example, a small stroke by the lifting device to bring the microlithography system element into the desired installation position. The one or more alignment elements can preferably be extendable, preferably in the direction of, and / or retractable, preferably in the direction of, and / or in the home position. The one or more alignment elements can be designed to be spaced apart from the substrate in the home position. The one or more alignment elements can preferably be moved independently and / or simultaneously, in particular retractable and / or extendable. Independent movement simplifies precise positioning and / or orientation of the transport device.The one or more alignment elements are advantageously extended in the alignment position, preferably relative to the base body of the transport device, and / or retracted in the home position, preferably relative to and / or within the base body of the transport device.

[0021] In the context of this disclosure, the “orientation” of an object, such as the transport device, is understood to mean the angular position of the object with respect to one or more independent axes of rotation, while the “position” is understood to mean the arrangement of the object along independent spatial directions of a coordinate system.

[0022] In one embodiment of the transport device, the transport device comprises a primary measuring device for determining the position and / or orientation of the transport device, preferably for determining the position and / or orientation of the support element; a secondary measuring device for determining a distance from the transport device, preferably for determining a distance from the transport device to a microlithography system; and / or a tertiary measuring device for determining a force acting on the lifting device and / or the support element. The primary and secondary measuring devices simplify the precise alignment of the transport device.The tertiary measuring device simplifies the determination of whether, during the lifting of a microlithography system element, the element is moved beyond its intended installation position and, for example, pressed against the microlithography system, thus increasing the force on the lifting device and / or the support element. Alternatively or additionally, it can also be determined during the lowering process whether the element is still partially supported by the microlithography system, for example, due to unresolved connections or tilting, such that the force on the lifting device and / or the support element is less than the weight of the microlithography system element. The primary measuring device can include at least one tilt sensor and / or be configured to determine the position and / or orientation absolutely and / or relative to the horizontal.

[0023] In one embodiment of the transport device, the lifting device is provided that it has a frame structure and / or that it has one or more lifting mechanisms, wherein the frame structure can preferably be raised and / or lowered by means of the one or more lifting mechanisms. The one or more lifting mechanisms preferably effect the movement, in particular the raising and / or lowering, by means of the lifting device. The one or more lifting mechanisms may advantageously comprise one or more lifting spindles and / or one or more, preferably pneumatic and / or hydraulic, lifting cylinders. The support element is advantageously movably mounted on the frame structure, preferably floating, and / or movable relative to the frame structure, preferably displaceable.The support element can be movable, preferably relative to the frame structure, along at least one, preferably at least two, and in particular at least three, translational degrees of freedom and / or along at least one, preferably at least two, and in particular at least three, rotational degrees of freedom. This simplifies force-free assembly or disassembly of the element in a microlithography system.

[0024] In one embodiment of the transport device, the transport device, preferably the lifting device, comprises a locking device. This locking device has one or more movable locking elements for blocking movement, preferably an upward and / or downward movement, of the lifting device. Preferably, the one or more locking elements are movable between a locking position for blocking movement of the lifting device and an unlocking position for releasing movement of the lifting device. This allows, firstly, the lifting device to be secured, enabling work to be carried out safely below the lifting device and / or the element of a microlithography system. Secondly, this allows the position of the lifting device and / or the element of a microlithography system to be maintained precisely.The one or more locking elements are advantageously extended in the locking position, preferably relative to the base body of the transport device, and / or retracted in the unlocking position, preferably relative to and / or within the base body of the transport device. Preferably, the locking position is configured to block an upward and / or downward movement of the lifting device, and / or the unlocking position is configured to release an upward and / or downward movement of the lifting device. The one or more locking elements can each be designed, at least partially, as rods, allowing for a structurally simple design. Furthermore, the one or more locking elements can preferably be movable independently of one another and / or simultaneously, in particular retractable and / or extendable.Simultaneous deployment allows for quick and comprehensive, stable protection.

[0025] In one embodiment of the transport device, the one or more locking elements are designed to extend at least partially through the lifting device, and / or in the locked position, the one or more locking elements extend at least partially through the lifting device, and / or in the unlocked position, the one or more locking elements are spaced apart from the lifting device. This allows for a simple and secure way to block movement of the lifting device and maintain its position. Advantageously, the one or more locking elements are designed to extend through the frame structure and / or the one or more lifting elements (the lifting elements will be discussed in more detail below).Alternatively or additionally, it is provided that in the locked position, the one or more locking elements extend at least partially through the frame structure and / or the one or more lifting elements, and / or in the unlocked position, the one or more locking elements are spaced apart from the frame structure and / or the one or more lifting elements. Advantageously, the lifting device, preferably the frame structure, comprises one or more openings, preferably one or more through-openings, for extending the one or more locking elements.

[0026] Alternatively or additionally, it can be provided that the one or more locking elements are movable by means of a locking element drive, preferably pneumatic and / or hydraulic, preferably in the direction of the locking position and / or in the direction of the unlocking position. This simplifies the operation of the transport device, in particular of the locking element, and also allows the locking element to be moved quickly and precisely into the desired position. The locking elements can be moved into the locking position and / or into the unlocking position, in particular by means of the locking element drive.

[0027] In one embodiment of the transport device, it is provided that the transport device includes one or more guide elements for guiding the transport device on one or more guide rails and / or that the transport device includes one or more drive rollers for driving the transport device. The guide elements simplify precise transport using the transport device, particularly since moving the transport device solely by means of air cushions cannot achieve the desired accuracy in some cases. The one or more guide elements can be designed to interact with one or more guide rails and / or can each be designed as a guide shoe. The one or more drive rollers simplify the movement of the transport device, as manual movement of the transport device can preferably be dispensed with.The one or more drive rollers can in turn be driven by one or more drive roller drives.

[0028] In one embodiment of the transport device, the transport device comprises a base body, and preferably, the lifting device, one or more lifting elements, one or more air cushions, one or more alignment elements, the primary measuring device, the secondary measuring device, the tertiary measuring device, one or more drive rollers, and / or one or more guide elements are arranged at least partially on the base body. Alternatively or additionally, the locking device and / or the holding device can be arranged at least partially on the base body (the holding device will be discussed in more detail below). The base body can be U-shaped at least partially, and / or the base body, preferably the U-shaped section of the base body, can surround the lifting device at least partially.The base body ensures sufficient stability of the transport device, while the U-shaped section can provide a free space below the lifting device, which simplifies working below the lifting device, the support element and / or the element of a system for microlithography.

[0029] In one embodiment of the transport device, the transport device, preferably the lifting device, comprises one or more stackable lifting elements, and preferably at least one of the lifting elements can be arranged at least partially on and / or below the frame structure, and / or at least one of the lifting elements can be arranged on the base body. The lifting elements enable stable lifting and lowering by the lifting device, even over a large stroke, particularly compared to other lifting cylinders or lifting spindles. For example, lifting cylinders become unstable beyond a certain stroke because the piston rod is extended far beyond the cylinder. Furthermore, the lifting elements can theoretically be stacked to any height, whereas the stroke of a lifting cylinder is limited by the length of the piston rod and / or the length of the cylinder.Alternatively or additionally, it can be provided that at least one of the lifting elements can be arranged at least partially below the support element. The one or more lifting elements can be connected to each other in a positive-locking and / or force-locking manner, thus simplifying the provision of a stable stack of lifting elements.

[0030] In one embodiment of the transport device, the transport device, preferably the lifting device, comprises a holding device with one or more holding elements for holding at least one of the lifting elements, and preferably, the one or more holding elements are movable between a holding position for holding at least one of the lifting elements and a starting position. This simplifies stacking or unstacking the lifting elements, particularly from bottom to top, since already stacked lifting elements can then be held stably in position by means of the holding elements, and a new lifting element can be placed, particularly below the holding elements, or removed. In the starting position, the one or more holding elements are preferably spaced apart from the one or more lifting elements.The one or more retaining elements can preferably be movable independently of one another and / or simultaneously, in particular retractable and / or extendable. Advantageously, the one or more retaining elements are extended in the holding position, preferably relative to the base body of the transport device, and / or retracted in the initial position, preferably relative to and / or within the base body of the transport device. The one or more retaining elements are preferably provided in addition to the one or more locking elements. This increases the safety of the transport device, as a plurality of elements then hold the lifting elements and block movement of the lifting device.The one or more holding elements are preferably designed to hold at least one of the lifting elements in position, and / or the holding position is designed to hold at least one of the lifting elements in position. This simplifies precise holding of the lifting device and thus of the element of a microlithography system. The one or more holding elements can each be designed, at least partially, as rods, allowing the holding elements to be provided in a structurally simple manner.

[0031] In one embodiment of the transport device, the one or more lifting elements can be raised and / or lowered by means of one or more lifting devices. This simplifies stacking or unstacking the lifting elements, as the lifting device handles the raising and lowering movement of the lifting elements.

[0032] Alternatively or additionally, it can be provided that at least one lifting element of the one or more lifting elements is movable by means of the one or more lifting devices between a stacking position for arranging and / or removing the at least one lifting element below the support element and / or the frame structure and a locking position, preferably for being held by means of the one or more retaining elements. This also simplifies the stacking or unstacking of the lifting elements. The lifting element is preferably arranged further away from the ground in the locking position than in the stacking position. In the stacking position, the one or more lifting devices are preferably each retracted and / or in the locking position, the one or more lifting devices are preferably each extended.In the stacked position, at least one lifting element can be arranged on the lifting device, whereby the lifting element can then be stacked from bottom to top against another lifting element of the one or more lifting elements and / or arranged from bottom to top against the frame structure. Likewise, in the stacked position, the at least one lifting element can be unstacked from another lifting element and / or removed from the frame structure. In the locked position, the lifting element is preferably connected to another lifting element of the one or more lifting elements and / or to the frame structure, preferably locked to it, and thus contributes to raising or lowering by means of the lifting device. The locked position can also be provided for holding the at least one lifting element in position by means of one or more retaining elements.

[0033] In one embodiment of the transport device, the one or more retaining elements are provided that they can be extended at least partially through at least one lifting element of the one or more lifting elements, and / or that in the holding position and / or the detent position, the one or more retaining elements extend at least partially through at least one lifting element of the one or more lifting elements. This allows the one or more lifting elements to be held in a structurally simple and secure manner. Advantageously, the one or more lifting elements each comprise one or more openings, preferably one or more through-openings, for extending the one or more retaining elements and / or the one or more locking elements.

[0034] Alternatively or additionally, the device may provide that one or more holding elements can be moved, preferably in the direction of the holding position and / or in the direction of the starting position, by means of a holding element drive, preferably pneumatic and / or hydraulic. This simplifies the operation of the transport device, in particular the holding elements, and also allows the holding elements to be moved quickly and precisely into the desired position. The holding elements can be moved, in particular, into the holding position and / or into the starting position by means of the holding element drive.

[0035] In one embodiment of the transport device, the one or more lifting elements each have at least one projection for creating a positive-locking connection with another lifting element and / or at least one recess for creating a positive-locking connection with another lifting element. This provides a stable positive-locking connection. The at least one projection can be arranged on a first, preferably upper, side of the respective lifting element, and / or the at least one recess can be arranged on a second, preferably lower and / or opposite, side of the respective lifting element.

[0036] Alternatively or additionally, it can be provided that the one or more lifting elements each comprise at least one, preferably movable, locking pin for engaging in a locking groove of another lifting element and / or at least one locking groove for interacting with a, preferably movable, locking pin of another lifting element. This also provides a stable, positive-locking connection that can be easily engaged or disengaged by the movement of the locking pin. The at least one locking pin can be arranged on a first, preferably upper, side of the respective lifting element and / or the at least one locking groove can be arranged on a second, preferably lower and / or opposite, side of the respective lifting element.

[0037] In one embodiment of the transport device, the transport device includes a monitoring device configured to monitor the position of one or more locking elements and / or the position of one or more holding elements. This increases the safety of the transport device by monitoring whether the locking elements or holding elements are in their intended positions, thus ensuring that the desired movement of the lifting device is not blocked or that safe work beneath the lifting device is possible by blocking and / or holding the lifting device. It can be particularly advantageous if the monitoring device is configured to detect whether the one or more locking elements are in and / or out of the locked and / or unlocked position.Alternatively or additionally, the monitoring device can be configured to detect whether the one or more holding elements are in and / or outside the holding position and / or starting position.

[0038] The transport system for transporting an element of a microlithography system comprises: a transport device, and one or more guide rails for guiding the transport device, wherein the transport device is a transport device according to any one of claims 1 to 14. The guide rails facilitate precise movement of the transport device and thus precise transport of an element of a microlithography system. One or more position stops can be arranged on the one or more guide rails to limit movement of the transport device along the one or more guide rails. The position stops facilitate precisely positioning the transport device in a desired position. The one or more guide elements of the one or more guide rails can be arranged on, preferably at least partially on, the guide rail.

[0039] The method for transporting an element of a microlithography system comprises the following step: a) providing a transport device according to any one of claims 1 to 14, preferably a transport system according to claim 15. This enables the assembly or disassembly of an element of a microlithography system to be carried out with minimal force and with maximum precision. Reference is further made to the preceding descriptions of the transport device and the transport system.

[0040] The method further comprises the following step: b) providing a microlithography system component. The provided microlithography system component is preferably an optical element, preferably comprising at least one lens and / or at least one mirror. However, other microlithography system components are also conceivable. Furthermore, in step b), a microlithography system can be provided, wherein the microlithography system component is preferably to be mounted on or removed from the microlithography system.

[0041] The method further comprises the following step: c) Transporting the element of a microlithography system by means of the transport device. The transport is preferably effected at least section by means of one or more air cushions and / or takes place at least section by means of one or more guide rails. The element of a microlithography system can preferably be transported to and / or away from a microlithography system.

[0042] One embodiment of the method is preferably characterized by the following step: d) Determining the distance of the transport device, preferably the support element, and / or the element of a microlithography system to the microlithography system, preferably by means of the secondary measuring device. This allows the distance of the transport device, preferably the support element, and / or the element of a microlithography system from the microlithography system to be determined. Based on this, the position and / or orientation of the transport device can be adjusted.

[0043] Alternatively or additionally, the method is preferably characterized by the following step: e) Supporting the transport device on the surface, preferably by means of one or more alignment elements and / or taking into account the distance determined in step d). This allows a stable position of the transport device to be created and / or the position, in particular the height of the support element, to be adjusted relative to the microlithography system. For example, before raising and / or lowering the element of a microlithography system by means of the lifting device, the support element can be brought to the desired height so that the lifting device only has to raise and / or lower the support element a short distance.

[0044] Alternatively or additionally, the method is preferably characterized by the following step: f) Determining the position and / or orientation of the transport device, preferably by means of the primary measuring device. This allows, in particular, the determination of the orientation and / or position of the transport device, for example, an undesired tilting of the transport device, the absolute position of the transport device and / or the relative position of the transport device to the microlithography system.

[0045] Alternatively or additionally, the method is preferably characterized by the following step: g) Aligning the position and / or orientation of the transport device, preferably by means of one or more alignment elements and / or taking into account the position and / or orientation of the transport device determined in step f). This eliminates tilting of the transport devices and / or brings the transport device into the desired position, in particular for raising and / or lowering the element of a microlithography system.

[0046] One embodiment of the method is preferably characterized by the following step: h) Lifting, lowering, and / or laterally moving the element of a microlithography system, preferably by means of the lifting device, in particular by means of one or more lifting devices. This allows the element of a microlithography system to be moved into a desired installation position on the microlithography system and / or removed from an installation position on the microlithography system. The lifting and / or lowering preferably occurs along the lifting direction. The lateral movement, preferably by means of the lateral movement, is preferably carried out obliquely, in particular perpendicularly, to the lifting direction.The lifting device can thus, for example, perform a step-like movement of the element of a microlithography system, comprising raising and / or lowering, a subsequent lateral movement and a subsequent raising and / or lowering of the element of a microlithography system.

[0047] Alternatively or additionally, the method is preferably characterized by the following step: i) Blocking a movement of the lifting device, preferably by means of one or more locking elements. This simplifies safe working below the lifting device and simultaneously allows the element of a microlithography system to be held in a desired position. Blocking a movement of the lifting device preferably includes blocking a movement of one or more lifting elements.

[0048] Alternatively or additionally, the method is preferably characterized by the following step: j) Holding at least one lifting element of the one or more lifting elements by means of the one or more holding elements. This simplifies the safe addition or removal of another lifting element from the stack of lifting elements. Alternatively or additionally, this also contributes to holding the element of a microlithography system in a desired position. Advantageously, in step j), the lowest lifting element of a stack of lifting elements is held by means of the one or more holding elements.

[0049] In one embodiment of the method, it is provided that in step h) at least one lifting element of the one or more lifting elements is raised and / or lowered by means of the one or more lifting devices. This allows the lifting or lowering of the element of a microlithography system by means of the lifting device and / or the lifting elements to be brought into the position for stacking and / or unstacking.

[0050] Alternatively or additionally, it is provided that in step h) at least one lifting element of the one or more lifting elements is arranged on at least one lifting device of the one or more lifting devices and / or on another lifting element of the one or more lifting elements. This allows the at least one lifting element to be stacked with further lifting elements by means of the lifting device.

[0051] Alternatively or additionally, it is provided that in step h) at least one lifting element of the one or more lifting elements is removed from at least one lifting device of the one or more lifting devices and / or from another lifting element of the one or more lifting elements. This allows the at least one lifting element to be destacked.

[0052] Alternatively or additionally, it is planned that in step h) several of the one or more lifting elements are stacked on top of each other.

[0053] Alternatively or additionally, it is provided that in step h), at least one lifting element of the one or more lifting elements is held at least temporarily by means of the one or more holding elements. This simplifies the safe addition or removal of another lifting element from the stack of lifting elements. Alternatively or additionally, this also contributes to holding the element of a microlithography system in a desired position. Advantageously, in step h), the lowest lifting element of a stack of lifting elements is held at least temporarily by means of the one or more holding elements.

[0054] Further features and advantages of the transport device, the transport system and the method will become apparent from the following description of exemplary embodiments, with reference to the attached drawing.

[0055] The drawing shows Fig. 1a a transport system comprising a first embodiment of a transport device in a front view, Fig. 1b the transport system from Fig. 1a, wherein the alignment elements are in an alignment position, Fig. 2a a safety element of the transport device of the Fig. 1a in a secure position in a cutaway front view of the transport device, Fig. 2b the safety element of the Fig. 2a in an unlocked position in a cutaway front view of the transport device, Fig. 3a a transport system comprising a second embodiment of a transport device in a front view, Fig. 3b the transport system from Fig. 3a, wherein additional lifting elements were added to the stack of lifting elements, Fig. 4a a safety element and two holding elements of the transport device of the Fig. 3a in a safety position and a holding position in a perspective view, Fig. 4b one of the holding elements of the Fig. 4a in a starting position in a perspective view, and Fig. 5 Two stacked lifting elements in a sectional view.

[0056] Fig. Figure 1a shows a transport system 1 comprising a first embodiment of a transport device 2 in a front view.

[0057] The transport device 2 is designed for transporting an element of a microlithography system 3. To enable movement of the transport device 2, it comprises several air cushions 4, which, in the illustrated embodiment, are arranged on the underside of the transport device 2. To position the element of the microlithography system 3 into a desired installation position from below on a microlithography system 5, the transport device 2 includes a lifting device 6 which can raise and lower the element of the microlithography system 3. The raising and lowering is performed in the Fig. 1a shown embodiment of the transport device 2 by means of several lifting devices 7, for example lifting cylinders as in Fig. As shown in 1a, the raising and lowering is described in the Fig. 1a indicated by double arrows adjacent to the lifting devices 7). Other lifting devices 7, for example lifting spindles, can also be used. In the Fig. Figure 1a shows the lifting device 7 in a partially extended state.

[0058] The transport device 2 also includes a support element 8 for supporting and contacting the element of a microlithography system 3. The support element 8 can be raised and lowered by means of the lifting device 6 and is also movably mounted relative to the lifting device 6, in particular the frame structure 10 of the lifting device 6, by means of a bearing 9. This mobility allows the support element 8, and thus also the element of a microlithography system 3, to perform compensatory movements, in the case shown here (the mobility is indicated by double arrows adjacent to the support element 8), translational movements. For example, if the transport device 2 is positioned slightly inaccurately, the element of a microlithography system 3 can then be moved force-free into a desired installation position 11 on the microlithography system 5 by means of these compensatory movements.

[0059] To stably support the transport device 2 on the ground and to precisely adjust its position, particularly along the vertical axis, as well as its orientation, the transport device 2 comprises several movable alignment elements 12 (the mobility is indicated by double arrows next to the alignment elements 12). Fig. 1a the alignment elements 12 are in a basic position spaced away from the ground.

[0060] Furthermore, the transport device 2 includes a guide element 13 in the form of a guide shoe. The guide element 13 is guided on a guide rail 14 of the transport system 1, so that the transport device 2 can be guided precisely to a desired position. Additionally, the transport device 2 includes a drive roller 15 by means of which the transport device 2 can be driven. However, it is also conceivable to omit the drive roller 15 and, for example, to push the transport device 2 manually.

[0061] The transport device 2 also comprises a plurality of measuring devices 16, 17, 18. These include, firstly, a primary measuring device 16 for determining the position and / or orientation of the transport device 2. Based on the determination of the position and / or orientation of the transport device 2, the position and / or orientation of the transport device 2 can be aligned using the alignment elements 12. This can be done either automatically or manually, with the results of the determination of the position and / or orientation of the transport device 2 being displayed to the operator on a display device 19, and the alignment elements 12 being controlled manually based on this display. In the embodiment shown, the primary measuring device 16 comprises several sensors, the exact number of which is not important in this case.

[0062] Furthermore, the transport device 2 shown includes a secondary measuring device 17 for determining the distance between the transport device 2 and the microlithography system 5. Based on the determination of the distance between the transport device 2 and the microlithography system 5, the position of the transport device 2, particularly along the vertical axis, can be aligned using the alignment elements 12, and in particular, the distance between the transport device 2 and the desired installation position 11 can be reduced. This can be done either automatically or manually, with the results of the distance determination being displayed to the operator on a display device 19, and the alignment elements 12 can then be manually controlled based on this display.

[0063] Furthermore, the transport device 2 shown includes a tertiary measuring device 18 for determining a force acting on the lifting device 6 and / or the support element 8. This makes it possible, for example, to determine whether the element of a microlithography system 3 has been moved beyond the desired installation position 11 and is thereby unintentionally pressed against the microlithography system 5, increasing the force on the lifting device 6 and the support element 8.Similarly, when lowering using the lifting device 6, it can be determined whether the element of a microlithography system 3 is still partially attached to the microlithography system 5, for example due to unresolved connections between the element of a microlithography system 3 and the microlithography system 5, so that the force on the lifting device 6 and the support element 8 is less than the weight of the element of a microlithography system 3.

[0064] In the illustrated embodiment of the transport device 2, the transport device 2 has a U-shaped base body 20, wherein the lifting device 6 is arranged at least partially in the space between the legs of the U-shaped base body 20. This allows work to be carried out below the lifting device 6, in particular on the element of a system for microlithography 3.

[0065] Fig. 1b shows transport system 1 from Fig. 1a, wherein the alignment elements 12 are in an alignment position. For this purpose, the alignment elements 12 were extended and supported against the ground. This ensures that the transport device 2 is stable and aligned in its position and orientation.

[0066] Furthermore, the lifting devices 7 of the lifting device 6 were extended further, so that the element of a system for microlithography 3 is now in a desired installation position 11 on the system of microlithography 5.

[0067] In the Fig. Figure 1b now shows the locking device 21, in particular the locking elements 22 of the locking device 21. The locking elements 22 are shown in the locked position, in which the locking elements 22 extend through the frame structure 10 of the lifting device 6, thereby blocking any movement of the lifting device 6. This ensures safe working conditions under the lifting device 6 and also holds the lifting device 6 and the support element 8 attached to it in position.

[0068] Fig. Figure 2a shows a safety element 22 of the transport device 2 of the Fig. 1a in a secured position in a sectional front view of the transport device. This corresponds to the one in Fig. 1b shows the position of one of the locking elements 22. Here, the locking element 22 is extended and reaches through the frame structure 10 of the lifting device 6, so that movement of the lifting device 6 is blocked.

[0069] Fig. 2b shows the safety element of the Fig. 2a in an unlocked position in a cutaway front view of the transport device. This corresponds to the position of the locking elements 22 in Fig. 1a. Here, the locking element 22 is retracted and spaced apart from the lifting device 6, in particular the frame structure 10 of the lifting device 6. The movement between the locked position and the unlocked position can be effected by means of a preferably pneumatic locking element drive. Movement of the lifting device 6 is permitted in the unlocked position shown.

[0070] Fig. Figure 3a shows a transport system comprising a second embodiment of a transport device 2 in a front view.

[0071] The transport device 2 of the second embodiment according to Fig. 3a essentially corresponds to the transport device 2 of the first embodiment according to Fig. 1a, so that the same reference numerals are used for the same components below and in particular the differences of the transport device 2 of the second embodiment compared to the transport device 2 of the first embodiment are discussed.

[0072] In the Fig. In the embodiment of the transport device 2 shown in 3a, the alignment elements 12 are already arranged in the alignment position, according to the Fig. 1b.

[0073] In this embodiment, the lifting device 6 of the transport device 2 comprises several lifting elements 23, wherein in the Fig. 3a Several of the lifting elements 23 are already stacked on top of each other in two stacks. By stacking the lifting elements 23, the lifting device 6 can lift the support element 8, and thus the element of a system for microlithography 3, significantly higher and more stably than would be possible with lifting cylinders alone.

[0074] The lifting elements 23 are stacked on top of each other below the frame structure 10 and below the support element 8 for lifting. To effect lifting, further lifting elements 23 are fed from below the frame structure 10, or, if a lifting element 23 has already been added, to the stack of lifting elements 23. The lifting elements 23 to be added, and, if lifting elements 23 are already stacked, the entire stack of lifting elements 23, are moved from bottom to top by means of the lifting devices 7 and held in a detent position by means of a holding device 24 with several holding elements 25. The lifting devices 7 can then be retracted and further lifting elements 23 can be added in a stacked position (see Fig. 3b), wherein the further lifting elements 23 are arranged on the lifting devices 7. The holding element 25 can then be moved from the holding position as described in Fig. As shown in 3a, the device must be moved into a retracted starting position. This will be explained below in the following sections. Fig. 4a and Fig. 4b will be discussed in more detail. The supplied lifting elements 23, and also the entire stack of lifting elements 23, can then be lifted again by means of the lifting devices 7 and subsequently held by means of the holding elements 25. This process is then repeated until the support element 8, and thus also the element of a system for microlithography 3, is at the desired height by means of the lifting.

[0075] To lower the support element 8, and thus the element of a microlithography system 3, the previously described process can be reversed. For this purpose, the lower lifting elements 23 of the respective stack of lifting elements 23, and thus the entire stack of lifting elements 23, are lowered by means of the lifting device 7. The penultimate lifting elements 23 of each stack of lifting elements 23 are then held by the retaining elements 25, so that the lowest and / or last lifting elements 23 of the respective stack of lifting elements 23 can be removed. The lifting devices 7 are then extended again and, after the retaining elements 25 have been retracted into their initial position, can lower the stack of lifting elements 23 again. This process is then repeated until the support element 8, and thus preferably also the element of a microlithography system 3, is at the desired height.

[0076] Fig. Figure 3b shows transport system 1. Fig. 3a, wherein an additional lifting element 23 was added to the stack of lifting elements 23 in each case. Here, another lifting element 23 was added from below to the respective stacks of lifting elements 23 in a stacked position. This in connection with Fig. The lifting procedure described in 3a can then be continued by inserting the holding elements 25 and lifting the lifting element 23 and thus the stack of lifting elements 23 by means of lifting using the lifting devices 7.

[0077] Fig. Figure 4a shows a securing element 22 and two retaining elements 25 of the transport device of the Fig. 3a in a safety position and a holding position in a perspective view. For clarity, only two of the lifting elements 23 of one of the stacks of lifting elements 23 are shown. Fig. 3a shown.

[0078] The locking element 22 extends in the Fig. 3a In the locking position, the lower lifting element 23 extends through a through-opening 26 in the lower lifting element 23. The two retaining elements 25 also extend through their respective through-openings 26 in the lower lifting element 23 in a locking position. The lifting elements 23, and thus also the support element 8, are therefore securely held, and movement of the lifting device 7 is blocked.

[0079] Furthermore, two projections 27 and a locking pin 28 can already be seen on the upper lifting element 23, which are related to the Fig. 5 will be discussed further.

[0080] Fig. Figure 4b shows one of the retaining elements 25 of the Fig. 4a in a starting position in a perspective view. The [item] is also located in Fig. 4a The still recognizable safety element 22 in an unlocked position and the further, no longer recognizable, second holding element 25 in the starting position.

[0081] In the illustrated initial position, the respective holding element 25 is spaced apart from the lifting elements 23. Furthermore, the locking element 22 is spaced apart from the lifting elements 23 in the unlocked position. In this arrangement, the lifting elements 23 can then be raised or lowered by means of the lifting device 7.

[0082] Fig. Figure 5 shows two stacked lifting elements 23 in a sectional view. These are lifting elements 23 as in the transport device 2 of the second embodiment according to Fig. 3a and Fig. 3b shown.

[0083] Several projections 27 are arranged on the upper surfaces of each lifting element 23, and several recesses 29 are provided on the underside of each lifting element 23. The projections of one lifting element 23 can be arranged in a recess 29 of another lifting element 23, so that a positive-locking connection between the lifting elements 23 can be provided in a structurally simple manner.

[0084] Furthermore, a movable, in particular sliding, locking pin 28 is arranged on the upper side of each lifting element 23, and a locking groove 30 is arranged on the underside of each lifting element 23. The locking pin 28 of one lifting element 23 can engage in the locking groove 30 of another lifting element 23, so that a releasable and / or lockable positive-locking connection can be provided. Reference symbol list 1 Transport system 2 Transport device 3 Elements of a microlithography system 4 air cushions 5 Microlithography system 6 Lifting device 7 Lifting device 8 support element 9 Storage 10 Framework structure 11 Installation position 12 alignment elements 13 Guide element 14 Guide rail 15 Drive roller 16 Primary measuring device 17 Secondary measuring device 18 Tertiary measuring device 19 Display device 20 basic shapes 21 Safety device 22 Safety element 23 Lifting element 24 Holding device 25 retaining element 26 Passage opening 26' Passage opening 27 lead 28 locking pins 29 recess 30 Locking groove QUOTES INCLUDED IN THE DESCRIPTION

[0000] This list of documents cited by the applicant was automatically generated and is included solely for the reader's convenience. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions. Cited patent literature

[0000] DE 3824563 A1

[0007]

Claims

[1] Transport device (2) for transporting an element of a microlithography system (3), comprising: - a lifting device (6) for raising and / or lowering the element of a system for microlithography (3), - a support element (8) for supporting and contacting the element of a system for microlithography (3), and - one or more air cushions (4), - wherein the support element (8) can be raised and / or lowered by means of the lifting device (6), - wherein the transport device (2) is movable by means of the one or more air cushions (4), characterized by that the support element (8) is movable, preferably displaceable, relative to the lifting device (6). [2] Transport device (2) according to claim 1, characterized by, that the transport device (2) comprises one or more movable alignment elements (12) for aligning the position and / or orientation of the transport device (2), preferably relative to the ground, and / or for supporting the transport device (2) on the ground, and that, preferably, the one or more alignment elements (12) are each movable between an alignment position for aligning the position and / or orientation of the transport device (2) and / or for supporting the transport device (2) on the ground and a home position. [3] Transport device (2) according to claim 1 or claim 2, characterized by , that - the transport device (2) comprises a primary measuring device (16) for determining the position and / or orientation of the transport device (2), preferably for determining the position and / or orientation of the support element (8), - that the transport device (2) comprises a secondary measuring device (17) for determining a distance from the transport device (2), preferably for determining a distance from the transport device (2) to a microlithography system (5), and / or - that the transport device (2) includes a tertiary measuring device (18) for determining a force acting on the lifting device (6) and / or the support element (8). [4] Transport device (2) according to one of claims 1 to 3, characterized by , that - the lifting device (6) has a frame structure (10), and / or - that the lifting device (6) has one or more lifting devices (7), wherein preferably the frame structure (10) can be raised and / or lowered by means of the one or more lifting devices (7). [5] Transport device (2) according to one of claims 1 to 4, characterized by , that - the transport device (2), preferably the lifting device (6), comprises a securing device (21), - that the locking device (21) has one or more movable locking elements (22) for blocking a movement, preferably for blocking an upward movement and / or a downward movement, of the lifting device (6), and - that, preferably, the one or more locking elements (22) are movable between a locking position to block a movement of the lifting device (6) and an unlocking position to release a movement of the lifting device (6). [6] Transport device (2) according to claim 5, characterized by , that - the one or more safety elements (22) are extendable at least section by section through the lifting device (6), - that in the locking position the one or more locking elements (22) extend at least sectionally through the lifting device (6) and / or in the unlocking position the one or more locking elements (22) are spaced apart from the lifting device (6) and / or - that the one or more locking elements (22) are movable by means of a locking element drive, preferably pneumatic and / or hydraulic, preferably in the direction of the locking position and / or in the direction of the unlocking position. [7] Transport device (2) according to any one of claims 1 to 6, characterized by , that the transport device (2) comprises one or more guide elements (13) for guiding the transport device (2) on one or more guide rails (14) and / or that the transport device (2) comprises one or more drive rollers (15) for driving the transport device (2). [8] Transport device (2) according to any one of claims 1 to 7, characterized by , that - the transport device (2) has a base body (20), and - that, preferably, the lifting device (6), the one or more lifting devices (7), the one or more air cushions (4), the one or more alignment elements (12), the primary measuring device (16), the secondary measuring device (17), the tertiary measuring device (18), the one or more drive rollers (15) and / or the one or more guide elements (13) are arranged at least sectionally on the base body (20). [9] Transport device (2) according to any one of claims 1 to 8, characterized by that the transport device (2), preferably the lifting device (6), comprises one or more stackable lifting elements (23) and that, preferably, - at least one lifting element (23) of which one or more lifting elements (23) can be arranged at least sectionally on and / or below the frame structure (10) and / or - at least one lifting element (23) of which one or more lifting elements (23) can be arranged on the base body (20). [10] Transport device (2) according to any one of claims 1 to 9, characterized by , that - the transport device (2), preferably the lifting device (6), a holding device (24) with one or more holding elements (25) for holding at least one lifting element (23) comprising one or more lifting elements (23), and - that, preferably, the one or more holding elements (23) are each movable between a holding position for holding at least one lifting element (23) of the one or more lifting elements (23) and a starting position. [11] Transport device (2) according to claim 9 or claim 10, characterized by , that - which can be raised and / or lowered by means of the one or more lifting devices (7), and / or - that at least one lifting element (23) of the one or more lifting elements (23) is movable by means of the one or more lifting devices (7) between a stacking position for arranging and / or removing the at least one lifting element (23) below the support element (8) and / or the frame structure (10) and a detent position, preferably for being held by means of the one or more holding elements (25). [12] Transport device (2) according to claim 10 or claim 11, characterized by , that - the one or more retaining elements (25) are extendable at least sectionally through at least one lifting element (23) of the one or more lifting elements (23), - that in the holding position and / or the detent position the one or more holding elements (25) extend at least partially through at least one lifting element (23) of the one or more lifting elements (23), and / or - that the one or more retaining elements (25) are movable by means of a retaining element drive, preferably pneumatic and / or hydraulic, preferably in the direction of the holding position and / or in the direction of the starting position. [13] Transport device (2) according to any one of claims 9 to 12, characterized by , that - each of the one or more lifting elements (23) having at least one projection (27) for forming a positive-locking connection with another lifting element (23) and / or at least one recess (29) for forming a positive-locking connection with another lifting element (23) and / or - that the one or more lifting elements (23) each comprise at least one, preferably movable, locking pin (28) for engaging in a locking groove (30) of another lifting element (23) and / or at least one locking groove (30) for cooperating with a, preferably movable, locking pin (28) of another lifting element (23). [14] Transport device (2) according to any one of claims 1 to 13, characterized by , that the transport device (2) includes a monitoring device and that the monitoring device is configured to monitor the position of the one or more locking elements (22) and / or the position of the one or more holding elements (25). [15] Transport system (1) for transporting an element of a microlithography system (3), comprising: - a transport device (2), and - one or more guide rails (14) for guiding the transport device (2) characterized by, that the transport device (2) is a transport device (2) according to one of claims 1 to 14. [16] Method for transporting an element of a microlithography system (3), comprising the following steps: a) Providing a transport device (2) according to any one of claims 1 to 14, preferably a transport system (1) according to claim 15, b) Providing an element of a microlithography system (3), and c) Transporting the element of a microlithography system (3) using the transport device (2). [17] Method according to claim 16, characterized by at least one of the following steps: d) Determining the distance of the transport device (2), preferably the support element (8), and / or the element of a microlithography system (3) to a microlithography system (5), preferably by means of the secondary measuring device (17), e) Supporting the transport device (2) on the ground, preferably by means of the one or more alignment elements (12) and / or taking into account the distance determined in step d), f) Determining the position and / or orientation of the transport device (2), preferably by means of the primary measuring device (16), and / or g) Aligning the position and / or orientation of the transport device (2), preferably by means of the one or more alignment elements (12) and / or taking into account the position and / or orientation of the transport device (2) determined in step f). [18] Method according to claim 16 or claim 17, characterized by at least one of the following steps: h) Lifting, lowering and / or laterally moving the element of a microlithography system (3), preferably by means of the lifting device (6), in particular by means of the one or more lifting devices (7), i) Blocking a movement of the lifting device (6), preferably by means of one or more locking elements (22), and / or j) Holding at least one lifting element (23) of the one or more lifting elements (23) by means of the one or more holding elements (25). [19] Method according to claim 18, characterized by that - in step h) at least one lifting element (23) of one or more lifting elements (23) is raised and / or lowered by means of one or more lifting devices (7), - that in step h) at least one lifting element (23) of the one or more lifting elements (23) is arranged on at least one lifting device (7) of the one or more lifting devices (7) and / or on another lifting element (23) of the one or more lifting elements (23), - that in step h) at least one lifting element (23) of the one or more lifting elements (23) is removed from at least one lifting device (7) of the one or more lifting devices (7) and / or from another lifting element (23) of the one or more lifting elements (23), - that in step h) several of the one or more lifting elements (23) are stacked on top of each other, and / or - that in step h) at least one lifting element (23) of the one or more lifting elements (23) is held at least temporarily by means of the one or more holding elements (23).

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