Optoelectronic measuring device for frequency-resolved measurement of the intensity of electromagnetic radiation

Abstract

Optoelectronic measuring device (1) for frequency-resolved measurement of the intensity of electromagnetic radiation (10), comprising multiple measurement channels (M1, M2, ..., M m ), wherein a first of the measurement channels (M1) has a first spectral sensitivity and another of the measurement channels (M2, ..., M m ) exhibits another spectral sensitivity that differs from the first spectral sensitivity, and several collimators (K1, K2, ..., K k ) to collimate the electromagnetic radiation (10), wherein - through each of the collimators (K1, K2, ..., K k ) a separate optical path to one or more of the measurement channels (M1, M2, ..., M m ) runs and each of the measurement channels (M1, M2, ..., M m ) is arranged, an intensity of the collimators (K1, K2, ..., K) is arranged, an intensity of the collimators (K1, K2, ..., K k ) collimated electromagnetic radiation (10) to measure, - the optoelectronic measuring device (1) more collimators (K1, K2, ..., K k ) as measuring channels (M1, M2, ..., M m ) includes, and - the optoelectronic measuring device (1) comprises a radiation distribution means (3) which is set up and arranged to direct the electromagnetic radiation (10) onto the collimators (K1, K2, ..., K k ) to distribute, wherein the radiation distribution means (3) comprises a scattering element and / or an optical fiber.

Description

[0001] The invention relates to an optoelectronic measuring device for frequency-resolved measurement of the intensity of electromagnetic radiation and an associated method. Such optoelectronic measuring devices are also referred to as spectrometers.

[0002] Such an optoelectronic measuring device can comprise several measuring channels, wherein a first of the measuring channels has a first spectral sensitivity and a further of the measuring channels has a further spectral sensitivity that differs from the first spectral sensitivity.

[0003] The publication DE 20 2017 007 509 U1 describes an optical system for collecting distance measurements in a field.

[0004] The task is to provide a particularly sensitive and compact optoelectronic measuring device for frequency-resolved measurement of the intensity of electromagnetic radiation, as well as a corresponding method for frequency-resolved measurement of the intensity of electromagnetic radiation.

[0005] This problem is solved by an optoelectronic measuring device and a method for frequency-resolved measurement according to the independent patent claims.

[0006] Such an optoelectronic measuring device for frequency-resolved measurement of the intensity of electromagnetic radiation comprises at least two measuring channels, wherein a first of the measuring channels has a first spectral sensitivity and a further of the measuring channels has a further spectral sensitivity that differs from the first spectral sensitivity. Furthermore, the optoelectronic measuring device comprises at least two collimators for collimating the electromagnetic radiation.

[0007] Each collimator has a separate optical path leading to one or more of the measurement channels. Furthermore, each measurement channel is configured to measure the intensity of the electromagnetic radiation collimated by one or more of the collimators.

[0008] The use of multiple collimators allows for an increase in the sensitivity of the optoelectronic measuring device for a given size, compared to the use of only one collimator.

[0009] According to one embodiment, the optoelectronic measuring device comprises at least 5, at least 10, or at least 50 measuring channels.

[0010] According to one embodiment, the optoelectronic measuring device comprises at least 5, at least 10, or at least 50 collimators.

[0011] According to one embodiment, all of the measurement channels have different spectral sensitivities. In other words, each measurement channel has a spectral sensitivity that differs from the spectral sensitivities of all other measurement channels.

[0012] According to one embodiment, at least one of the collimators comprises or consists of a collimating lens and an aperture diaphragm. Particularly preferably, the collimators, or at least several of them, each comprise or consist of an aperture diaphragm and a collimating lens. The aperture diaphragm can be arranged in an optical path upstream of the collimating lens; that is, the collimating lens is arranged to collimate electromagnetic radiation transmitted through the aperture diaphragm.

[0013] An aperture diaphragm (also called a diaphragm or aperture stop) is a device that limits an opening width, in this case, the opening width of the collimator. Such an aperture diaphragm has a membrane that is opaque to electromagnetic radiation, but contains at least one opening through which the electromagnetic radiation passes.

[0014] According to one embodiment, an aperture diaphragm of at least one of the collimators is monolithically connected to the lens of that collimator. Particularly preferably, in the collimators, or at least in several of the collimators, an aperture diaphragm of the respective collimator is monolithically connected to the lens of that collimator. In particular, the aperture diaphragm can comprise or consist of a layer on the lens. This simplifies the manufacture of the collimator. The aperture diaphragm can be produced by coating the collimation lens with the layer.

[0015] According to one embodiment, the collimators, or at least two of the collimators, each comprise a collimation lens and an aperture diaphragm, wherein the aperture diaphragms of the at least two collimators share a common diaphragm membrane. This simplifies the manufacture of the collimators.

[0016] According to one embodiment, the collimators, or at least two of the collimators, each comprise a collimation lens and an aperture diaphragm, wherein the collimation lenses of the collimators are monolithic. This simplifies the manufacture of the collimation lenses; for example, they can be produced together in an injection molding process. Furthermore, a lens array formed from such monolithic lenses can be easily positioned and handled.

[0017] According to one embodiment, the collimators, or at least two of the collimators, each comprise a collimation lens and an aperture diaphragm, wherein the aperture diaphragms of the collimators share a common diaphragm membrane and the collimation lenses of the collimators are monolithic. The common diaphragm membrane can be monolithically bonded to the monolithically bonded collimation lenses. In particular, the common diaphragm membrane can comprise or consist of a layer on the monolithically bonded collimation lenses. Accordingly, the diaphragm membrane can be produced by coating the monolithically bonded collimation lenses with the layer.

[0018] According to one embodiment, the optoelectronic measuring device further comprises at least one radiation absorption element arranged between two of the collimators. This prevents crosstalk between the collimators and improves collimation. Ideally, the optoelectronic measuring device comprises k collimators and at least k-1 radiation absorption elements. Then, a radiation absorption element can be arranged between all collimators.

[0019] Such a radiation absorption element is particularly advantageous when arranged between two collimators, each comprising a collimation lens and an aperture diaphragm as described above. The radiation absorption element can be arranged between the aperture diaphragm membranes and the (optionally monolithic) collimation lenses, or between a common aperture diaphragm membrane of the aperture diaphragms and the (optionally monolithic) collimation lenses. Alternatively or additionally, it can also be arranged between the collimation lenses of the two collimators.

[0020] According to one embodiment, at least one of the measuring channels comprises a radiation detection element and a spectral filter. Preferably, one or more of the measuring channels each comprise a radiation detection element and a spectral filter. The spectral filter can be arranged to filter the electromagnetic radiation before it is detected by the radiation detection element.

[0021] According to one embodiment, the optoelectronic measuring device comprises exactly one associated collimator per measuring channel, wherein the measuring channel is arranged to detect the electromagnetic radiation collimated by the respective associated collimator. For example, the measuring channels are arranged to predominantly detect the electromagnetic radiation collimated by the respective associated collimator, i.e., at least 50%, 70%, or even 90% of the electromagnetic radiation detected by the respective measuring channel originates from the associated collimator. Alternatively, the measuring channels can be arranged to detect only the electromagnetic radiation collimated by the respective associated collimator, i.e., 100% of the electromagnetic radiation detected by the respective measuring channel originates from the associated collimator.

[0022] The optoelectronic measuring device comprises more collimators than measuring channels. This means that the optoelectronic measuring device comprises at least two measuring channels, wherein a first of the measuring channels has a first spectral sensitivity and a further of the measuring channels has a further spectral sensitivity that differs from the first spectral sensitivity, and furthermore more collimators for collimating the electromagnetic radiation than measuring channels, wherein a separate optical path to one or more of the measuring channels passes through each of the collimators and each of the measuring channels is arranged to measure an intensity of the electromagnetic radiation collimated by means of one or more of the collimators.

[0023] According to one embodiment, several, preferably 2, 5, or 25, measuring channels, or each measuring channel, are assigned exactly n collimators, where n is a natural number greater than or equal to two, such that these measuring channels are arranged to detect the electromagnetic radiation collimated by the respective assigned collimators. For example, the measuring channels are arranged to predominantly detect the electromagnetic radiation collimated by the assigned collimators, i.e., at least 50%, at least 70%, or even at least 90% of the electromagnetic radiation detected by the respective measuring channel originates from the assigned collimators. Alternatively, the measuring channels can be arranged to detect only the electromagnetic radiation collimated by the respective assigned collimators, i.e., 100% of the electromagnetic radiation detected by the respective measuring channel originates from the assigned collimators.The increased number of collimators allows the size of the optoelectronic measuring device to be further reduced, while simultaneously ensuring that the collimators affect the intensity of the electromagnetic radiation uniformly across all measuring channels.

[0024] According to one embodiment, the optoelectronic measuring device further comprises at least one scattering element. This element can be arranged in an optical path upstream of one or more of the collimators. This means that the collimators, or at least several collimators, are arranged to collimate the electromagnetic radiation scattered by the scattering element.

[0025] The optoelectronic measuring device comprises at least one radiation distribution means configured and arranged to distribute electromagnetic radiation incident on the optoelectronic measuring device onto the collimators or at least several of the collimators. This can be the previously described scattering element, or the radiation distribution means can include such a scattering element. Alternatively or additionally, the radiation distribution means can, for example, also include or consist of an optical fiber, the optical fiber being arranged to distribute the electromagnetic radiation onto the collimators.

[0026] According to one embodiment, a method for frequency-resolved measurement of the intensity of electromagnetic radiation comprises the step of measuring the intensity of the electromagnetic radiation using at least two measurement channels, wherein a first of the measurement channels has a first spectral sensitivity and a further of the measurement channels has a further spectral sensitivity that differs from the first spectral sensitivity, and the step of collimating the electromagnetic radiation using at least two collimators prior to the step of measuring the intensity. A separate optical path to one or more of the measurement channels passes through each of the collimators, and each of the measurement channels measures the intensity of the electromagnetic radiation collimated by one or more of the collimators.

[0027] In this method, more collimators are used to collimate the electromagnetic radiation than measurement channels are used to measure the intensity.

[0028] The previously described optoelectronic measuring device can be used in this procedure.

[0029] Various embodiments of the solution according to the invention are explained in more detail below with reference to the drawings.

[0030] They show schematically: Fig. 1: an optoelectronic measuring device according to a first example, Fig. 2: an optoelectronic measuring device according to a second example, Fig. 3: crosstalk between collimators of the optoelectronic measuring device according to the second example, Fig. 4: an optoelectronic measuring device according to a third example, Fig. 5: an optoelectronic measuring device according to a fourth example, Fig. 6: an optoelectronic measuring device according to a first embodiment, Fig. 7: an optoelectronic measuring device according to a second embodiment, Fig. 8: an optoelectronic measuring device according to a fifth example, Fig. 9: an optoelectronic measuring device according to a sixth example, Fig. 10: the steps of a procedure for frequency-resolved measurement of the intensity of electromagnetic radiation.

[0031] An optoelectronic measuring device 1 according to a first example is schematically shown in Fig. Figure 1 shows the apparatus. It comprises a housing 2 in which a first collimator K1, a second collimator K2, a first measuring channel M1, and a second measuring channel M2 are arranged. The first collimator K1 comprises a first aperture diaphragm A1 and a first collimating lens L1. The second collimator K2 accordingly comprises a second aperture diaphragm A2 and a second collimating lens L2. The first aperture diaphragm A1 comprises a first diaphragm B1, and the second aperture diaphragm A2 comprises a second diaphragm B2. The first aperture diaphragm A1 is arranged in an optical path upstream of the first collimating lens L1; that is, the electromagnetic radiation 10 is first transmitted through the first aperture diaphragm A1 and then through the first collimating lens L1. This also applies analogously to the second aperture diaphragm A1 and the second collimating lens L2.

[0032] Between the aperture membranes B1, B2 and between the collimation lenses L1, L2, a housing section 2a is arranged, which serves as a holder for the aperture membranes B1, B2 and the collimation lenses L1, L2.

[0033] The first measurement channel M1 comprises a first spectral filter F1 and a first radiation detection element D1. Similarly, the second measurement channel M2 comprises a second spectral filter F2 and a second radiation detection element D2.

[0034] Detectors have a sensitive spectral range. This is the wavelength range in which electromagnetic radiation is detected. A detector can have a wavelength-dependent sensitivity, also called spectral sensitivity, so that different wavelengths of the same intensity generate detector signals of varying strengths, e.g., voltages or currents.

[0035] The two spectral filters F1 and F2 have different filter characteristics, so that the measurement channels M1 and M2 have different spectral sensitivities. Accordingly, the intensity of the electromagnetic radiation 10 can be measured with frequency resolution using the optoelectronic measuring device 1.

[0036] By collimating the electromagnetic radiation 10, it can be ensured that the measurement channels M1 and M2 have essentially independent spectral sensitivities depending on the angle of incidence of the electromagnetic radiation 10, even if the filter characteristics of the spectral filters F1, F2 exhibit a strong angular dependence.

[0037] The spectral filters F1 and F2 may be bandpass filters. The filter characteristics of bandpass filters can exhibit a strong angular dependence, especially when multilayer interference filters are used as bandpass filters.

[0038] The radiation detection elements D1 and D2 are part of a detector array 4. A scattering element 3 for scattering the electromagnetic radiation 10 is arranged in front of the collimators K1 and K2. The radiation detection elements D1 and D2 can be identical silicon photodiodes.

[0039] The optoelectronic measuring device 1 has several collimators K1 and K2. It has exactly one collimator K1, K2 for each measuring channel M1, M2. The collimators K1 and K2 are not "optically connected in series," meaning that the electromagnetic radiation 10 does not first pass through one of the collimators K1, K2 and then through the other. Rather, the collimators K1, K2 are "optically connected in parallel." This does not mean that the collimators K1, K2 must be aligned parallel to each other, but rather that a separate optical path leads through each collimator K1, K2 to one or more of the measuring channels M1, M2.

[0040] Accordingly, both the electromagnetic radiation 10 transmitted through the first collimator K1 and the electromagnetic radiation 10 transmitted through the second collimator K2 are available for measurement.

[0041] Compared to an optoelectronic measuring device with a collimator, collimators K1, K2 with a lower height can be used. The height of the optoelectronic measuring device 1 is the sum of the focal length f of the collimating lenses L1, L2, the thickness t of the lenses, and the working distance a, which is equal to the distance between the collimating lenses L1, L2 and the spectral filters F1, F2 and can be zero. Accordingly, the height of the optoelectronic measuring device 1 is limited by the focal length f of the lenses and the thickness t of the lenses L1, L2.

[0042] Using only one collimator, to detect the same intensity of electromagnetic radiation with the optoelectronic measuring device as in the first example, the aperture diaphragm would have to be chosen to be larger than in the present example. To obtain the same beam divergence after the collimators as in the present example, the focal length of the lens would have to be increased, and the lens itself would also have to be made larger, thus increasing its thickness. Accordingly, by using several collimators K1, K2, compared to using only one collimator as in the prior art, the height (focal length f and thickness t) of the optoelectronic measuring device 1 is reduced. Likewise, by using several collimators K1, K2, the sensitivity of the optoelectronic measuring device 1 can be increased by directing more electromagnetic radiation 10 to the measuring channels M1, M2.

[0043] In Fig. Figure 2 shows an optoelectronic measuring device 1 according to a second example. This device is essentially analogous to the one shown in the first example. However, instead of two measuring channels M1, M2, this device has m measuring channels M1, M2, ..., M m , where m is a natural number greater than or equal to two, 9 measurement channels are shown here.

[0044] Moreover, instead of two collimators K1, K2, it has k collimators K1, K2, ..., K k , where k equals m, i.e., the optoelectronic device has as many collimators as measuring channels. In this case, there are nine collimators K1, K2, ..., K k depicted.

[0045] All of the measurement channels M1, M2, ..., M m They exhibit different spectral sensitivities. In other words, the measurement channels M1, M2, ..., M m Each exhibits a spectral sensitivity that differs from the spectral sensitivity of all other measurement channels M1, M2, ..., Mm differs.

[0046] Consequently, with the optoelectronic measuring device 1 according to the second example, when using more than 2 measuring channels, a frequency-resolved measurement of the intensity of the electromagnetic radiation 10 can be carried out with a more accurate spectral resolution than with the optoelectronic measuring device 1 according to the first example. When using more than 2 collimators K1, K2, ..., K k This can be done without increasing the height (especially focal length f and thickness t) of the optoelectronic measuring device 1.

[0047] As mentioned, the optoelectronic measuring device 1 can alternatively have a different number m of measuring channels M and a different number k of collimators K than the nine shown measuring channels and collimators.

[0048] For example, it can have at least 5, or at least 10, or at least 50 measuring channels M and collimators K.

[0049] In contrast to the first example, in which there are two aperture diaphragms B1, B2, between which a housing section 2a is arranged, which serves as a holder for the aperture diaphragms B1, B2, the collimators K1, K2, K9 have a common aperture diaphragm B, and the intermediate housing section 2a is omitted.

[0050] The collimation lenses L1, L2, ..., L k They are monolithic, meaning they are made from a single piece. For example, they can be manufactured together using an injection molding process. A collimation lens L1, L2, ..., L made from such monolithic lenses k The formed lens array can be easily positioned and handled.

[0051] Accordingly, in contrast to the optoelectronic measuring device 1 according to the first example, no housing section 2a is arranged between the collimation lenses L1, L2.

[0052] As in Fig. As shown in 3, in the optoelectronic measuring device 1 according to the first and second examples, despite the collimators K1, K2, ..., K k In addition, light falls obliquely onto the measuring channels M1, M2, ..., M m accordingly, electromagnetic radiation 10, which is emitted at a particularly oblique angle from one of the aperture apertures A1, A2, ..., A k exits, onto the collimation lens L1, L2, ..., L k of another collimator K1, K2, ..., K k meet. In Fig. Figure 3 shows how electromagnetic radiation 10, which exits the first aperture diaphragm A1 at a particularly oblique angle, strikes the second collimation lens L2 and is therefore projected obliquely and uncollimated onto the measuring channels M1, M2, ..., M mThis applies to the optoelectronic measuring device 1 according to the first example, which, however, is in Fig. 3 is not shown.

[0053] To prevent such crosstalk between the collimators K1, K2, ..., K k To prevent this, at least one additional radiation absorption element 5 can be placed between the collimators K1, K2, ..., K k be arranged. The in Fig. The optoelectronic measuring device 1 shown in Figure 4, according to a third example, is essentially constructed analogously to the optoelectronic measuring device 1 according to the second example. However, unlike the optoelectronic measuring device 1 according to the second example, it has such radiation absorption elements 5 between the collimators K1, K2, ..., K1. k on. Here, between all k collimators K1, K2, ..., K kA radiation absorption element 5 of this type is arranged. Thus, the optoelectronic measuring device k-1 comprises radiation absorption elements 5. In the present example, the radiation absorption elements 5 are located between the common aperture diaphragm B of the aperture diaphragms A1, A2, ..., A k and the collimation lenses L1, L2, ..., L k arranged.

[0054] The in Fig. The optoelectronic measuring device 1 shown in Figure 5, according to a fourth example, is essentially analogous to the optoelectronic measuring device 1 according to the second example. However, unlike the optoelectronic measuring device 1 according to the second example, the common aperture diaphragm B of the collimators K1, K2, ..., K is... k a layer on the surface formed by the monolithically connected collimation lenses L1, L2, ..., L kformed lens array. Accordingly, it is monolithic with the collimating lenses L1, L2, ..., L k The collimation lenses L1, L2, ..., L are connected. k preferably designed such that its focal point is located in the plane of the aperture membrane B.

[0055] The in Fig. The optoelectronic measuring device 1 shown in the fourth example, unlike the optoelectronic measuring device 1 shown in the third example, does not have any radiation absorption elements 5. Alternatively, radiation absorption elements 5 can also be provided in the optoelectronic measuring device 1 according to the fourth example, for example between the collimation lenses L1, L2, ..., L k the collimators K1, K2, ..., K k .

[0056] The previously discussed optoelectronic measuring devices 1 according to examples one to four comprise M1, M2, ..., M per measuring channel.m exactly one assigned collimator K1, K2, ..., K k The measuring channel is M1, M2, ..., M m arranged, predominantly by means of the respective assigned collimator K1, K2, ..., K k to detect collimated electromagnetic radiation 10, i.e. at least 50% of that emitted by the respective measurement channel M1, M2, ..., M m The detected electromagnetic radiation 10 originates from the assigned collimator K1, K2, ..., K k Accordingly, the optoelectronic measuring device 1, according to embodiments one to four, comprises the same number of measuring channels M1, M2, ..., M m such as collimators K1, K2, ..., K k .

[0057] The in Fig. The optoelectronic measuring device 1 shown in Figure 6, according to a first embodiment, is essentially constructed analogously to the optoelectronic measuring device 1 according to the second example. In contrast to the optoelectronic measuring device 1 according to the second example, the optoelectronic measuring device 1 according to the first embodiment comprises collimators K1, K2, ..., K1. k and m of the measuring channels M1, M2, ..., M m , which are arranged, an intensity of the collimators K1, K2, ..., K k to measure collimated electromagnetic radiation 10, where k and m are natural numbers and k > m and m ≥ 2. Nine collimators and eight measurement channels are shown here.

[0058] The in Fig. The optoelectronic measuring device 1 shown in Figure 7, according to a second embodiment, is essentially constructed analogously to the optoelectronic measuring device 1 according to the second example. In contrast to the optoelectronic measuring device 1 according to the second example, in the optoelectronic measuring device 1 according to the second embodiment, each measuring channel M1, M2, ..., M m exactly 2 collimators K1, K2, ..., K k assigned in such a way that the measuring channels M1, M2, ..., M m are arranged, predominantly by means of the assigned collimators K1, K2, ..., K k to detect collimated electromagnetic radiation 10, i.e. at least 50% of that emitted by the respective measurement channel M1, M2, ..., M m The detected electromagnetic radiation 10 originates from the assigned collimators K1, K2, ..., K k .

[0059] Alternatively, the at least two measuring channels M1, M2, ..., M can be used. mexactly n collimators K1, K2, ..., K k be assigned, where n is a natural number greater than two.

[0060] By using multiple collimators K1, K2, ..., K k per measurement channel M1, M2, ..., M m According to the first and second embodiments, the height of the collimators K1, K2, ..., K k (Focal length f and lens thickness t) can be further reduced. Moreover, this can increase the sensitivity of the optoelectronic measuring device 1, since more electromagnetic radiation 10 reaches the measuring channels M1, M2, ..., M m can be guided by assigning a fixed number of collimators K1, K2, ..., K k for each measurement channel M1, M2, ..., M m According to the second embodiment, the collimators K1, K2, ..., K k relative to the measuring channels M1, M2, ..., M m for all measurement channels M1, M2, ..., M mThey should be aligned in the same way to easily ensure that all measurement channels M1, M2, ..., M m the same intensity of electromagnetic radiation 10 is present.

[0061] The in Fig. The optoelectronic measuring device 1 shown in Figure 8, according to a fifth example, is essentially analogous to the optoelectronic measuring device 1 according to the second example. In contrast to the optoelectronic measuring device 1 according to the second example, the optoelectronic measuring device 1 according to the fifth example comprises k collimators K1, K2, ..., K k and m of the measuring channels M1, M2, ..., M m , which are arranged, an intensity of the collimators K1, K2, ..., K k To measure collimated electromagnetic radiation 10, where k < m and k ≥ 2. Nine collimators and ten measurement channels are shown here.

[0062] The in Fig. The optoelectronic measuring device 1 shown in Figure 9, according to a sixth example, is essentially constructed analogously to the optoelectronic measuring device 1 according to the second example. In contrast to the optoelectronic measuring device 1 according to the second example, in the optoelectronic measuring device 1 according to the sixth example, each collimator K1, K2, ..., K k exactly two measuring channels M1, M2, ..., M m assigned in such a way that the measuring channels M1, M2, ..., M m are arranged predominantly by means of the two assigned collimators K1, K2, ..., K k to detect collimated electromagnetic radiation 10, i.e. at least 50% of that emitted by the respective measurement channel M1, M2, ..., M m The detected electromagnetic radiation 10 originates from the assigned collimators K1, K2, ..., K k .

[0063] Alternatively, at least two collimators K1, K2, ..., K can be used. kexactly n measuring channels M1, M2, ..., M m be assigned, where n is a natural number greater than two.

[0064] By using multiple measurement channels M1, M2, ..., M m per collimator K1, K2, ..., K k According to the fifth and sixth examples, collimators K1, K2, ..., K can be used in comparison to the optoelectronic measuring device 1 according to the second example. k Savings can be achieved, thereby reducing manufacturing costs. This is accomplished by assigning a fixed number of measuring channels M1, M2, ..., M m to each collimator K1, K2, ..., K k According to the sixth example, the collimators K1, K2, ..., K k relative to the measuring channels M1, M2, ..., M m be aligned in such a way that all measuring channels M1, M2, ..., M m the same intensity of electromagnetic radiation 10 is present.

[0065] The optoelectronic measuring devices 1 described above according to the first and second embodiments and fifth and sixth examples can also be modified, in particular, such that, as described in connection with the third example, absorption elements 5 are placed between the collimators K1, K2, ..., K k can be arranged. In addition, the aperture diaphragm B of the collimators K1, K2, ..., K k , as described in connection with the fourth example, a layer on the collimation lenses L1, L2, ..., L k include or consist of.

[0066] The optoelectronic measuring devices 1 described above, according to the first and second embodiments and the fifth and sixth examples, can, analogously to the second to fourth examples, have at least 5, at least 10, or at least 50 measuring channels M. Likewise, they can have at least 5, at least 10, or at least 50 collimators K.

[0067] The optoelectronic measuring devices 1 described above, according to the second to sixth examples and the first and second embodiments, can in particular also be modified such that, as described in connection with the first example, the collimating lenses L1, L2, ..., L k are not monolithically connected to each other. Moreover, they can also be modified such that the collimators K1, K2, ..., K k do not have a common aperture membrane B, but each collimator K1, K2, ..., K k has its own aperture membrane B.

[0068] In all embodiments and examples, the collimation lenses L1, L2, ..., L used in the respective embodiment or example can be k They have different optical properties. Preferably, they have identical optical properties. The collimators K1, K2, ..., K can also be... kEach embodiment or example has identical optical properties. The collimation lenses L1, L2, ..., L k In all embodiments and examples, the collimating lenses can comprise glass and / or plastic, or consist of glass or plastic. In all embodiments and examples, the collimating lenses are L1, L2, ..., L k transparent to the electromagnetic radiation to be measured.

[0069] In Fig. Figure 10 shows a method for frequency-resolved measurement of the intensity of electromagnetic radiation.

[0070] It includes: S0: “Start”, S1: “Collimating the electromagnetic radiation (10) using at least two collimators (K1, K2, ..., K k )", S2: “Measuring the intensity of electromagnetic radiation (10) using at least two measurement channels”, SE: "End".

[0071] Step S2 is executed after step S1. In step S2, one of the measurement channels (M1) has a first spectral sensitivity, and another of the measurement channels (M2, ..., M) has a first spectral sensitivity. m ) another spectral sensitivity that differs from the first spectral sensitivity.

[0072] Steps S1 and S2 are performed such that each of the collimators (K1, K2, ..., K) k ) a separate optical path to one or more of the measurement channels (M1, M2, ..., M m ) runs and each of the measurement channels (M1, M2, ..., M m ) the intensity of the collimators (K1, K2, ..., K) k ) collimated electromagnetic radiation (10) measures.

[0073] The process uses more collimators (K1, K2, ..., K) k ) to collimate the electromagnetic radiation (10) are used as measuring channels (M1, M2, ..., M m) can be used to measure intensity.

[0074] The method can employ an optoelectronic measuring device (1) according to one of the previously described embodiments. Reference symbol list 1 optoelectronic measuring device 2 cases 2a Housing section 3 scattering element 4 detector array 5 radiation absorption elements 10 electromagnetic radiation K1, K2, ..., K k Collimator 1, Collimator 2, ..., Collimator k A 1, A2, ..., A k Aperture stop 1, aperture stop 2, ..., aperture stop k B1, B2 diaphragm 1, diaphragm 2 B common aperture membrane L1, L2, ..., L k Collimation lens 1, collimation lens 2, ..., collimation lens k M1, M2, ..., M m Measuring channel 1, measuring channel 2, ..., measuring channel m D1, D2, ..., Dm Radiation detection element 1, radiation detection element 2, ..., radiation detection element m F1, F2, ..., F m Spectral filter 1, spectral filter 2, ..., spectral filter m f Focal length t thickness a working range

Claims

[1] Optoelectronic measuring device (1) for frequency-resolved measurement of the intensity of an electromagnetic radiation (10), comprising multiple measurement channels (M1, M2, ..., M m ), wherein a first of the measurement channels (M1) has a first spectral sensitivity and another of the measurement channels (M2, ..., M m ) exhibits another spectral sensitivity that differs from the first spectral sensitivity, and several collimators (K1, K2, ..., K k ) to collimate the electromagnetic radiation (10), wherein - through each of the collimators (K1, K2, ..., K k ) a separate optical path to one or more of the measurement channels (M1, M2, ..., M m ) runs and each of the measurement channels (M1, M2, ..., M m ) is arranged, an intensity of the collimators (K1, K2, ..., K) is arranged, an intensity of the collimators (K1, K2, ..., K k ) collimated electromagnetic radiation (10) to measure, - the optoelectronic measuring device (1) more collimators (K1, K2, ..., K k ) as measuring channels (M1, M2, ..., M m ) includes, and - the optoelectronic measuring device (1) comprises a radiation distribution means (3) which is set up and arranged to direct the electromagnetic radiation (10) onto the collimators (K1, K2, ..., K k ) to distribute, wherein the radiation distribution means (3) comprises a scattering element and / or an optical fiber. [2] Optoelectronic measuring device according to claim 1, wherein the collimators (K1, K2, ..., K k ) each exactly one collimation lens (L1, L2, ..., L k ) and exactly one aperture stop (A1, A2, ..., A k exhibit. [3] Optoelectronic measuring device (1) according to claim 2, wherein an aperture diaphragm (B, B1, B2) of the aperture diaphragm (A1, A2, ..., A k ) with the collimation lens (L1, L2, ..., L k) is monolithically connected, wherein the aperture membrane (B) preferably forms a layer on the collimation lens (L1, L2, ..., L k ) includes. [4] Optoelectronic measuring device (1) according to one of the preceding claims, wherein the collimators (K1, K2, ..., K k ) each a collimation lens (L1, L2, ..., L k ) and an aperture stop (A1, A2, ..., A k ) include the aperture stops (A1, A2, ..., A k ) have a common aperture diaphragm (B). [5] Optoelectronic measuring device (1) according to one of the preceding claims, wherein the collimators (K1, K2, ..., K k ) each a collimation lens (L1, L2, ..., L k ) and an aperture stop (A1, A2, ..., A k ) include the collimation lenses (L1, L2, ..., L k ) are monolithically connected. [6] Optoelectronic measuring device (1) according to claim 5, wherein the aperture apertures (A1, A2, ...Ak ) have a common aperture membrane (B) which forms a layer on the monolithically connected collimation lenses (L1, L2, ..., L k ) includes. [7] Optoelectronic measuring device (1) according to one of the preceding claims, wherein the optoelectronic measuring device (1) further comprises at least one radiation absorption element (5) located between two of the collimators (K1, K2, ..., K k ) is arranged. [8] Optoelectronic measuring device (1) according to one of the preceding claims, wherein the measuring channels (M1, M2, ..., M m ) each exactly one interconnected radiation detection element (D1, D2, ..., D m ) as well as a spectral filter (F1, F2, ..., F m exhibit. [9] Optoelectronic measuring device (1) according to one of the preceding claims, wherein each of the radiation detection elements is a continuous photodiode. [10] Optoelectronic measuring device (1) according to one of the preceding claims, wherein several of the measuring channels (M1, M2, ..., M m ) exactly n collimators, where n is a natural number greater than or equal to two, are assigned such that these measuring channels (M1, M2, ..., M m ) are arranged by means of the respective assigned collimators (K1, K2, ..., K k ) to detect collimated electromagnetic radiation (10). [11] Optoelectronic measuring device (1) according to one of the preceding claims, wherein the optoelectronic measuring device (1) has at least 5 or at least 10 or at least 50 measuring channels (M1, M2, ..., M m ) has or at least 5 or at least 10 or at least 50 collimators (K1, K2, ..., K k ) exhibits. [12] Method for frequency-resolved measurement of the intensity of electromagnetic radiation (10) comprising the step: - Measuring (S2) the intensity of the electromagnetic radiation (10) using multiple measurement channels (M1, M2, ..., M m ), wherein a first of the measurement channels (M1) has a first spectral sensitivity and another of the measurement channels (M2, ..., Mm) exhibits a further spectral sensitivity that differs from the first spectral sensitivity, - Collimation (S1) of the electromagnetic radiation (10) by means of several collimators (K1, K2, ..., K k ) before the step of measuring (S2) the intensity, wherein through each of the collimators (K1, K2, ..., K k ) a separate optical path to one or more of the measurement channels (M1, M2, ..., M m ) runs and each of the measurement channels (M1, M2, ..., M m ) the intensity of the collimators (K1, K2, ..., K) k ) collimated electromagnetic radiation (10) measures, wherein more collimators are used to collimate the electromagnetic radiation than measuring channels are used to measure the intensity and wherein the electromagnetic radiation (10) is directed from a beam distribution means (3) onto the collimators (K1, K2, ..., K) k ) is distributed, wherein the radiation distribution means (3) comprises a scattering element and / or an optical fiber. [13] Method according to claim 12, wherein an optoelectronic measuring device (1) according to any one of claims 1 to 11 is used for frequency-resolved measurement of the intensity of the electromagnetic radiation (10).

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