INTENSITY MEASURING DEVICE, INTENSITY MEASURING SYSTEM AND INTENSITY MEASURING METHOD

Abstract

One aspect of the present invention relates to an intensity measuring device (30) connected to a sensor device (20) which outputs a signal waveform related to an elastic wave generated by shot peening, and which measures an intensity of the shot peening on the basis of the signal waveform. The intensity measuring device (30) is provided with a waveform acquisition unit (31) configured to acquire the signal waveform from the sensor device (20); a time-series data generation unit (32) configured to generate time-series data of an actual value of the signal waveform; an average value acquisition unit (33) configured to obtain an average value of the actual values ​​for a predetermined time on the basis of the time-series data; and an intensity acquisition unit (34). Figure for abstract: Fig.3

Description

Title of the invention: INTENSITY MEASURING DEVICE, INTENSITY MEASURING SYSTEM AND INTENSITY MEASURING METHOD References to related applications

[0001] The present application is based on Japanese Patent Application No. 2023-203194 filed on November 30, 2023, and claims the benefit of priority from that application. Technical field

[0002] The present disclosure relates to an intensity measuring device, an intensity measuring system and an intensity measuring method. Background

[0003] In shot peening such as shot blasting or shot peening, shot is projected onto a processing object. When shot peening is performed, it is necessary to cause the shot to collide with the processing object with an appropriate force so that the processing object is in a processing state appropriate to an application.

[0004] Generally, an intensity is used as an index quantitatively representing the strength of shot peening. The intensity corresponds to an arc height at the time when a rate of increase in arc height read from an arc height saturation curve per hammering time, which is created after measuring the arc height (amount of warping of the specimen) after shot peening a specimen for an arbitrary time, is within 10%. U.S. Patent Specification No. 2,350,440 discloses a metal plate used as a specimen for measuring intensity. The metal plate for measuring intensity is also called an Almen strip. Summary

[0005] Technical problem

[0006] In order to acquire the arc height saturation curve, it is necessary to measure the arc height by projecting the shot onto a plurality of Almen strips. The Almen strip is not preferable from the viewpoint of cost and environmental burden, because it cannot be reused and therefore generates waste. Furthermore, since it takes a lot of time and effort to measure an arc height value by using a micro-gauge to acquire the arc height saturation curve, the problem is that the intensity measurement is time-consuming.

[0007] Therefore, an objective of the present disclosure is to provide an intensity measuring device, an intensity measuring system and an intensity measuring method capable of efficiently measuring an intensity. Solution to the problem

[0008] According to one aspect, an intensity measuring device is connected to a sensor device that outputs a signal waveform related to an elastic wave generated by shot peening, and measures an intensity of the shot peening on the basis of the signal waveform. The intensity measuring device comprises a waveform acquisition unit, a time series data generation unit, an average value acquisition unit, and an intensity acquisition unit. The waveform acquisition unit acquires a signal waveform from the sensor device. The time series data generation unit generates time series data of an actual value of the signal waveform. The average value acquisition unit obtains an average value of the actual values ​​within a predetermined time period on the basis of the time series data.The intensity acquisition unit obtains an intensity of the shot treatment based on the average value of the actual values. Advantageous effects of the invention

[0009] According to various aspects of the present disclosure, an intensity can be effectively measured. Brief description of the drawings

[0010] [Fig.l] is a diagram schematically illustrating a shot blasting system according to one embodiment; [Fig.2A] is a perspective diagram of an exemplary sensor device, and [Fig.2B] is an exploded perspective diagram illustrating the main components of the sensor device; [Fig.3] is a diagram illustrating a functional configuration of an intensity measuring device; [Fig.4] is a diagram illustrating an example of a signal waveform output by the sensor device; [Fig.5] is a diagram illustrating a time change in an effective value of the signal waveform; [Fig.6] is a graph illustrating a relationship between an average value of the actual values ​​and a shot treatment intensity; [Fig.7] is a diagram illustrating a first example of configuration of the intensity measuring device; [Fig.8] is a diagram illustrating a second example configuration of the intensity measuring device; and [Fig.9] is a flowchart illustrating an intensity measurement method according to the embodiment. Detailed description

[0011] Hereinafter, an embodiment of the present disclosure will be described with reference to the drawings. In the following description, it should be noted that the same or equivalent elements are designated by the same reference signs, and redundant descriptions will not be repeated. The dimensional relationships of the drawings do not necessarily coincide with those of the description.

[0012] [Exemplary embodiment of the present disclosure] [Fig.l] is a diagram schematically illustrating a shot peening system according to one embodiment. A shot peening system 1 shown in [Fig.l] projects shot under a defined projection condition. It should be noted that in this specification, the processing of shot projection from a shot peening device is referred to as shot peening. Shot peening includes shot blasting for the purpose of removing incrustation, deburring, adjusting surface roughness, and the like, and shot peening for the purpose of applying compressive residual stress to a processing object.

[0013] As illustrated in [Fig.l], the shot peening system 1 comprises a shot peening device 10, a sensor device 20, and an intensity measuring device 30. The shot peening device 10 projects the shot onto the processing object and causes the shot to collide with the processing object, thereby processing a surface of the processing object. For example, the shot peening device 10 is a shot peening device that applies the compressive residual stress to the surface of the processing object. Examples of the processing object on which the shot peening is performed by the shot peening device 10 include automobile components such as cylinder heads and crankshafts, gears, and molds, but the processing object is not limited to these.Applying compressive residual stress to the surface of the processing object by shot peening treatment can improve the fatigue characteristics of the processing object.

[0014] The compressive residual stress to be applied to the processing object is determined according to the application of the processing object. In order to apply the required compressive residual stress to the processing object, it is necessary to perform shot peening with an appropriate force on the processing object. In In general, an intensity is used as an index quantitatively representing the strength of the shot peening treatment. The intensity corresponds to an arc height at the moment when a rate of increase in arc height read from an arc height saturation curve per peening time, which is created after measuring an arc height value after shot peening a specimen for an arbitrary time, is within 10%. A method for calculating intensity is defined in SAE J443 (2010).

[0015] The shot peening device 10 may be of the air type, where the shot is injected as a solid-gas two-phase flow with compressed air, or of the centrifugal type where the shot is projected by a centrifugal force due to the rotation of a wheel called a wheel. The shot peening device 10 illustrated in [Fig.l] is a direct pressure type shot peening device. The shot peening device 10 may be a suction type or gravity type shot peening device. The shot peening device 10 may be a wet shot peening device. The material of the shot 2 projected onto the treatment object may be, for example, an iron-based metal such as steel or iron, a non-ferrous metal such as stainless steel, or a non-metal such as glass or zirconia.The shape of the shot 2 may be spherical or may be obtained by rounding the corners of a granular material (called cut wire) obtained by cutting a wire drawing to a predetermined length. As shot 2, for example, steel balls are used. The material, shape and particle size of shot 2 are appropriately selected according to the compressive residual stress to be applied to the processing object.

[0016] As illustrated in [Fig.l], the shot processing device 10 comprises a shot tank 11, a shot feeder 12, a pressurizing tank 13, a compressor 14, a nozzle 15, and a control device 16. The shot tank 11 stores shot 2. The shot tank 11 is connected to the pressurizing tank 13 via the shot feeder 12. A poppet valve 64 that can be opened and closed is provided between the shot feeder 12 and the pressurizing tank 13. When the poppet valve 64 is opened, shot 2 stored in the shot tank 11 is supplied to the pressurizing tank 13 via the shot feeder 12.

[0017] The compressor 14 generates compressed air and supplies the compressed air to the pressurizing tank 13 and the nozzle 15. One end of a hose 61 is connected to the compressor 14. The other end of the hose 61 is connected to a hose 63 described later. A hose 62 branches from a position between one end and the other end of the hose 61. The hose 62 is connected to an air inlet port 13A of the pressure tank 13. The pipe 62 is provided with an air flow adjustment valve 68. The air flow adjustment valve 68 adjusts the flow rate of the compressed air flowing through the pipe 62. When the air flow adjustment valve 68 is opened, compressed air from the compressor 14 is supplied to the pressure tank 13 via the pipe 61 and the pipe 62. When the compressed air is supplied from the compressor 14 to the pressure tank 13, the interior of the pressure tank 13 is pressurized.

[0018] The pressurizing tank 13 has a shot outlet 13B through which the shot 2 spurts out. The shot outlet 13B is provided with a cut-off valve 60 that can be opened and closed. A pipe 63 is connected to the shot outlet 13B via the cut-off valve 60. The pipe 63 is provided with a shot quantity adjustment valve 65 that adjusts the amount of the shot 2 injected from the nozzle 15. The other end of the pipe 61 is connected to the pipe 63. The connection portion between the pipe 61 and the pipe 63 configures a mixing portion 25A in which the shot 2 supplied from the pressurizing tank 13 and the compressed air supplied from the compressor 14 are mixed. The mixing portion 25A is located on a downstream side of a branch portion 25B where the pipe 62 branches from the pipe 61 in the flow direction of the compressed air.

[0019] An air flow rate adjustment valve 66 is provided at a position between the mixing portion 25A and the branch portion 25B in the pipe 61. The air flow rate adjustment valve 66 adjusts a flow rate of the compressed air supplied from the compressor 14 to the nozzle 15. The compressed air whose flow rate has been adjusted by the air flow rate adjustment valve 66 is mixed with the shot 2 supplied from the pressurizing tank 13 in the mixing portion 25A and sent to the nozzle 15.

[0020] The nozzle 15 is provided at a tip of the pipe 63, and injects the shot 2 supplied from the pressurizing tank 13 in the form of a solid-gas two-phase flow with compressed air. The nozzle 15 is disposed inside a cabinet 70. The cabinet 70 defines a treatment chamber 70s which is a space serving for the treatment of a treatment object. In the case where shot treatment is performed on the treatment object, the treatment object is disposed in the treatment chamber 70s, the shot 2 is projected from the nozzle 15 onto the treatment object in the treatment chamber 70s, and the shot 2 is caused to collide with the treatment object.

[0021] The control device 16 is a computer comprising a processor, a storage device, an input device, a display device, a communication device, and the like, and controls the entire operation of the shot processing device 10. The control device 16 loads, for example, a program stored in the storage device, and executes the program loaded by the processor to implement various functions described later. With the control device 16, the operator can perform an instruction input operation or the like to manage the shot processing device 10 using the input device, and the operating state of the shot processing device 10 can be viewed and displayed by the display device.

[0022] The control device 16 determines a jetting condition of the shot 2 of the shot treatment device 10 and controls the shot treatment device 10 to jetting the shot 2 under the determined jetting condition. Here, the jetting condition is a condition set in the shot treatment device 10 for jetting the shot 2, and the examples include an injection pressure of the shot 2 and an injection amount of the shot 2.

[0023] Although not illustrated in [Fig. 1], the shot treatment device 10 may further comprise a dust collector, a screening device, and a circulation device for reusing the used shot 2. The dust collector is connected to the processing chamber 70s via the screening device, and sucks the shot 2 falling into the lower portion of the processing chamber 70s as well as the chips of the processing object to transfer the shot 2 and the chips to the screening device. The screening device is, for example, a cyclone-type screening device, and receives the shot 2 and the chips of the processing object and classifies them into particles that can be reused as shot 2 and particles that cannot be used as shot 2. The circulation device returns the reusable shot 2 to the shot tank 11 via a package elevator, a screw conveyor, a separator, and the like.

[0024] As described above, the shot 2 ejected from the nozzle 15 of the shot treatment device 10 collides with the treatment object. When the collision of the shot 2 causes a percussive and stretching force to act on the surface of the treatment object, a counter-force reaction force is generated in the treatment object. As a result, a compressive residual stress is applied to the treatment object.

[0025] In the shot peening system 1, in order to confirm whether an intensity of the shot peening matches a required intensity or not, the sensor device 20 is subjected to the shot peening before the shot peening is performed on the treatment object, and the intensity of the shot peening is measured. Then, it is periodically confirmed whether the measured intensity matches the required intensity or not. The intensity measurement is performed one or more times, for example, before the shot peening of the treatment object.

[0026] When the shot 2 collides with an object by the shot processing, a phenomenon called acoustic emission, in which the elastic energy inside of the object is emitted in the form of an elastic wave, occurs simultaneously with the deformation or destruction of the object. The elastic wave is a wave such as a vibration or a sound wave generated in the object by the collision of the shot 2. The sensor device 20 measures the elastic wave generated during the collision of the shot 2, and outputs a signal waveform (hereinafter referred to as "AE signal waveform") indicating the measured elastic wave.

[0027] [Fig.2A] is a perspective diagram of an exemplary sensor device 20, and [Fig.2B] is an exploded perspective diagram of the main components of the sensor device 20. As illustrated in [Fig.2A] and 2B, the sensor device 20 includes a collision member 21, a waveguide member 22, and an AE sensor 23. The collision member 21 is a plate made of a hard, abrasion-resistant material and has a surface 21a that receives shot 2 projected from the shot treatment device 10. The collision member 21 is attached to a cover 24 so that the surface 21a is exposed.

[0028] The waveguide member 22 has a substantially cylindrical shape and has a first surface 22a and a second surface 22b disposed on the opposite side of the first surface 22a. The first surface 22a is in contact with a surface of the collision member 21 opposite the surface 21a. When the shot 2 collides with the surface 21a of the collision member 21, an elastic wave generated in the collision member 21 propagates from the first surface 22a to the second surface 22b.

[0029] The AE sensor 23 is for example a piezoelectric element that measures an elastic wave. The AE sensor 23 is in contact with the second surface 22b of the waveguide member 22, measures the elastic wave propagated toward the second surface 22b of the waveguide member 22, and outputs an AE signal waveform indicating the measured elastic wave. The AE signal waveform is a voltage waveform indicating the amplitude of the elastic wave. The sensor device 20 outputs the AE signal waveform measured by the AE sensor 23 to the intensity measuring device 30.

[0030] It should be noted that the sensor device 20 may not include the collision member 21 depending on the material of the shot 2 or a projection condition. In this case, the first surface 22a of the waveguide member 22 is exposed from the cover 24, and the shot 2 collides with the first surface 22a of the waveguide member 22. Then, the AE sensor 23 measures the elastic wave propagating from the first surface 22a to the second surface 22b of the waveguide member 22.

[0031] The intensity measuring device 30 is communicatively connected to the sensor device 20 via a cable 26. It should be noted that the intensity measuring device 30 can be connected to the sensor device 20 by wireless communication. The intensity measuring device 30 measures (estimates) an intensity of the shot treatment based on the AE signal waveform output by the sensor device 20.

[0032] [Fig. 3] is a diagram illustrating a functional configuration of the intensity measuring device 30. As illustrated in [Fig. 3], the intensity measuring device 30 comprises a waveform acquisition unit 31, a time series data generation unit 32, an average value acquisition unit 33, an intensity acquisition unit 34 and a communication unit 35 as functional components.

[0033] The waveform acquisition unit 31 acquires an AE signal waveform from the sensor device 20. [Fig. 4] illustrates an example of the AE signal waveform outputted by the sensor device 20 when the shot 2 collides with the surface 21a of the sensor device 20. As illustrated in [Fig. 4], the AE signal waveform is a waveform whose amplitude fluctuates over time.

[0034] The time-series data generation unit 32 generates time-series data of an effective value of the AE signal waveform. The effective value means a root mean square of the amplitude of the AE signal waveform during a time duration T of the AE signal waveform. Specifically, when the amplitude of the AE signal waveform is represented as a function f(t) of a time t, an RMS effective value can be obtained from the following Equation (1).

[0035] [Equation 1] 11 fr RMS — - (1) Jo

[0036] [Fig.5] shows data indicating the effective value of the AE signal waveform shown in [Fig.4]. As shown in [Fig.5], it can be said that the effective value of the AE signal waveform consists of time-series data that changes with time.

[0037] The average value acquisition unit 33 obtains an average value of the actual values ​​during a predetermined time period L on the basis of the generated time series data of the actual value. The predetermined time period L is a set value which is defined by a designer, and is for example 3 seconds. For example, when the actual value at a time ti (i = 1, 2,..., and n) within the predetermined time period L is RMS;, an average value RMSavr of the actual values ​​can be obtained by the following Equation (2). It should be noted that in Equation (2), N is a number of samplings of the actual value acquired during a sampling period At, and can be represented by (tn - tl) / At,

[0038] [Equation 2] n RMSavr = -^RMSi (2) i=l

[0039] [Fig. 6] is a graph illustrating a relationship between the average value of the actual values ​​and the intensity of the shot peening treatment. The graph is generated, for example, on the basis of an experimental result of a previous shot peening treatment. As illustrated in [Fig. 6], there is a correlation between the average value of the actual values ​​and the intensity of the shot peening treatment. The intensity acquisition unit 34 acquires the intensity of the shot peening treatment on the basis of correlation data indicating the correlation between the average value of the actual values ​​and the intensity of the shot peening treatment.

[0040] For example, the intensity acquisition unit 34 draws an approximate straight line or an approximate curve indicating the correlation between the average value of the effective values ​​and the intensity of the shot peening treatment in the graph shown in [Fig. 6], and generates a model equation indicating the correlation between the average value of the effective values ​​and the intensity from the approximate straight line or the approximate curve. The model equation indicating the correlation between the average value of the effective values ​​and the intensity can be represented by a one-variable polynomial shown in the following Equation (3). Where, in Equation (3), an is a constant, x is an average value [V] of the effective values ​​of the signal waveform AE during the predetermined time L, and y is an intensity [mmN] of the shot peening treatment. It should be noted that Equation (3) can also be represented by the following Equation (4).

[0041] [Equation 3] y = anxn + a-^^x^1 4-----1 + a0 (3)

[0042] [Equation 4] n k=0

[0043] The constant an is defined according to characteristics of the shot 2 (material, diameter, hardness, etc.). The model equation is generated for each type of the shot 2. The intensity acquisition unit 34 obtains an intensity using a model equation according to the type of the shot 2. Typically, the model equation indicating the correlation between the average value of the effective values ​​and the intensity is represented by a linear equation indicated by the following Equation (5) or a quadratic equation indicated by the following Equation (6).

[0044] [Equation 5] y = a^x + aa (5)

[0045] [Equation 6] y = a2x2 + a^x + a0 (6 )

[0046] It should be noted that the intensity acquisition unit 34 can acquire the intensity corresponding to the average value of the effective values ​​by referring to a table in which the average value of the effective values ​​and the intensity are associated with each other without using the above-described Equation (4). In this case, the table in which the average value of the effective values ​​and the intensity are associated is prepared for each type of the shot 2.

[0047] The communication unit 35 outputs data indicating the intensity acquired by the intensity acquisition unit 34 to an external device 40 by wired communication or wireless communication (see [Fig.7]). The external device 40 is a computer for managing the intensity measuring device 30. The external device 40 may be a fixed or portable computer or workstation, or may be a portable terminal such as a notebook computer, a tablet terminal, a smartphone, or a PDA. The external device 40 displays the intensity outputted by the intensity measuring device 30 on a display device and presents the intensity to the operator of the shot peening system 1. In other words, the communication unit 35 configures an output unit that outputs the intensity of the shot peening.

[0048] As described above, the intensity measuring device 30 receives the signal waveform AE as input from the sensor device 20, and outputs the intensity of the shot treatment based on the signal waveform AE. The intensity y outputted by the intensity measuring device 30 satisfies Equation (4) described above.

[0049] (First configuration example) [Fig. 7] illustrates a first configuration example of the current measuring device 30 in which each function of the current measuring device 30 is mounted. As illustrated in [Fig. 7], the current measuring device 30 according to the first configuration example comprises, as physical components, a charge amplifier (amplifier) ​​41, a variable gain 42, a filter 43, an AD converter 44, a field-programmable gate array (FPGA) 45, a processor 46 and a communication device 47. For example, the charge amplifier 41, the variable gain 42, the filter 43, the AD converter 44, the FPGA 45, the processor 46 and the communication device 47 are mounted on a same substrate 50 and operate by means of the power supply of a battery 51.

[0050] The charge amplifier 41 is an amplifier circuit that amplifies a signal waveform AE. The charge amplifier 41 receives from the sensor device 20 an AE signal waveform via the cable 26, amplifies the AE signal waveform, and outputs the amplified AE signal waveform as a voltage signal. In other words, the charge amplifier 41 configures the waveform acquisition unit 31 which acquires the AE signal waveform from the sensor device 20. The variable gain 42 adjusts an amplification factor (gain) of the charge amplifier 41 according to the output of the charge amplifier 41.

[0051] The filter 43 eliminates a high-frequency component of the AE signal waveform amplified by the charge amplifier 4L. The AN converter 44 samples the AE signal waveform output by the filter 43 at a predetermined sampling frequency, and converts the AE signal waveform into digital data.

[0052] The FPGA 45 is an integrated circuit capable of programming a circuit configuration of a logic gate, and executes a predetermined operation according to a program at a high speed. The FPGA 45 calculates an effective value at each time from the digital data of the signal waveform AE, for example based on Equation (1), and generates time-series data of the effective value. The operation of the FPGA 45 is controlled by a switching signal received from a switch 53 via a trigger 54.

[0053] Further, the FPGA 45 calculates an average value of the actual values ​​based on the generated time series data of the actual value. For example, the FPGA 45 extracts a plurality of actual values ​​included in a predetermined time duration L from the time series data and calculates an average value of the plurality of actual values. In other words, the FPGA 45 configures the time series data generation unit 32 and the average value acquisition unit 33. The predetermined time duration L is stored in a memory 52 for example. The FPGA 45 stores the calculated average value of the actual values ​​in the memory 52. ​​The memory 52 may be constructed in the FPGA 45.

[0054] The processor 46 is configured by an arithmetic device such as a microcomputer or a PLC. The processor 46 reads the average value of the actual values ​​stored in the memory 52, and calculates an intensity of the shot treatment based on the average value of the actual values. For example, a model equation according to a type of the shot 2 is read from the memory 52, and an intensity corresponding to the average value of the actual values ​​is calculated using the model equation. Equation (4) described above is used as the model equation for calculating the intensity. In other words, the processor 46 configures the intensity acquisition unit 34.

[0055] It should be noted that the processing of generating the time-series data of the effective value, the processing of calculating the average value of the effective values ​​and the processing of calculating the intensity can be allocated either to the FPGA 45 or to the processor 46. For example, the FPGA 45 can execute the processing of generating the time-series data of the actual value, the processing of calculating the average value of the actual values ​​and the processing of calculating the intensity. In this case, the FPGA 45 configures the time-series data generation unit 32, the average value acquisition unit 33 and the intensity acquisition unit 34. Furthermore, only the processing of generating the time-series data of the actual value can be allocated to the FPGA 45, and the processing of calculating the average value of the actual values ​​and the processing of calculating the intensity can be allocated to the processor 46. In this case, the FPGA 45 configures the time-series data generation unit 32, and the processor 46 configures the average value acquisition unit 33 and the intensity acquisition unit 34.

[0056] The communication device 47 is a device that communicates with the external device 40 by wired communication or wireless communication. Examples of the wired communication or wireless communication include LAN, Bluetooth (registered trademark), Wi-Fi, and the like. The communication device 47 transmits to the external device 40 information indicating the calculated intensity of the shot treatment. The intensity received by the external device 40 is displayed on a display of the external device 40.

[0057] As described above, with the intensity measuring device 30 according to the first configuration example, since the processing of generating the time-series data of the effective value for which a large computational load is required is allocated to the FPGA 45, it is possible to increase an intensity measuring speed. Furthermore, since the charge amplifier 41, the variable gain 42, the filter 43, the AD converter 44, the FPGA 45, the processor 46, and the communication device 47 are mounted on the same substrate 50, the size of the intensity measuring device 30 can be reduced.

[0058] (Second configuration example) Next, a second configuration example of the current measuring device 30 will be described. [Fig. 8] illustrates a second configuration example of the current measuring device 30. As illustrated in [Fig. 8], the current measuring device 30 according to the second configuration example comprises, as physical components, the charge amplifier 41, the variable gain 42, the filter 43, the AD converter 44, the processor 46, the communication device 47 and an RMS-DC converter 48. The charge amplifier 41, the variable gain 42, the filter 43, the AD converter 44, the processor 46, the communication device 47 and the RMS-DC converter 48 are mounted on the same substrate 50, and operate by the power supply of the battery 51.

[0059] In other words, the current measuring device 30 according to the second configuration example is different from the current measuring device 30 according to the first configuration example in that the RMS-DC converter 48 is provided instead of the FPGA 45. Hereinafter, the differences from the current measuring device 30 according to the first configuration example will be mainly described, and the redundant descriptions will be omitted.

[0060] The RMS-DC converter 48 is a circuit that outputs an output value indicating an effective value of an AE signal waveform. For example, an input of the RMS-DC converter 48 is the AE signal waveform shown in [Fig. 4], and an output of the RMS-DC converter 48 is the effective value that changes with time, shown in [Fig. 5]. In the second configuration example, the RMS-DC converter 48 configures the time-series data generation unit 32.

[0061] In the embodiment, as illustrated in [Fig.8], the RMS-DC converter 48 is disposed between the filter 43 and the AN converter 44, receives the AE signal waveform outputted by the filter 43 as an input, and outputs an output value indicating the effective value of the AE signal waveform. The output value outputted by the RMS-DC converter 48 is a voltage value according to the effective value of the AE signal waveform which changes with time, and can be regarded as time-series data of the effective value. The AN converter 44 samples the output value outputted by the RMS-DC converter 48 at a predetermined frequency and converts the output value into digital data.

[0062] The processor 46 calculates an average value of the effective values ​​based on the digital data of the effective value output by the converter AN 44. For example, the processor 46 extracts a plurality of effective values ​​included in a predetermined duration L from the digital data of the effective value, and calculates an average value of the plurality of effective values.

[0063] Further, the processor 46 calculates an intensity of the shot treatment based on the calculated average value of the actual values. For example, the processor 46 reads a model equation according to a type of the shot 2 from the memory 52, and calculates an intensity corresponding to the average value of the actual values ​​using the model equation. The calculated intensity is transmitted to the external device 40 by the communication device 47.

[0064] As described above, with the intensity measuring device 30 according to the second configuration example, since the time-series data of the effective value is generated using the RMS-DC converter 48, it is possible to reduce the calculation amount of the processor 46. Therefore, it is possible to increase an intensity measuring speed.

[0065] As described above, with the intensity measuring device 30 described above, the intensity of the shot treatment is obtained from the average value of the effective values. Since there is a certain correlation between the average value of the effective values ​​and the intensity, the intensity of the shot treatment can be obtained from the average value of the effective values ​​without measuring an arc height of a test piece by using a micro-gauge. In particular, as shown in Equation (4), since the average value of the effective values ​​and the intensity can be represented by a relationship of a one-variable polynomial, the intensity of the shot treatment can be calculated from the average value of the effective values ​​without complicated calculation. Therefore, it is possible to reduce the computational burden of the intensity measuring device 30.Furthermore, since the effective value of the AE signal waveform fluctuates over time, when the intensity is obtained from an instantaneous value of the effective value, it is possible that the intensity deviating from an actual intensity is output. Therefore, by estimating the intensity using the average value of the effective values, an estimated value of the intensity can be brought closer to the actual intensity.

[0066] The operator of the shot-blasting system 1 compares an intensity (hereinafter referred to as "required intensity") required to apply a desired compressive residual stress with an intensity (hereinafter referred to as "measured intensity") measured by the intensity measuring device 30, and determines whether or not a difference between the required intensity and the measured intensity is within a specified management range. In the case where the difference between the required intensity and the measured intensity is within the specified management range, the shot 2 is blasted onto the processing object under the set blasting condition.

[0067] On the other hand, in the case where the difference between the required intensity and the measured intensity is not within the specified management range, the blasting condition of the shot treatment device 10 is corrected so that the difference between the required intensity and the measured intensity becomes small. For example, in the case where the measured intensity is smaller than the required intensity, the blasting condition is corrected so that the injection pressure or the injection amount of the shot 2 increases, and the shot 2 is blasted onto the treatment object under the corrected blasting condition. In the opposite case where the measured intensity is greater than the required intensity, the blasting condition is corrected so that the injection pressure or the injection amount of the shot 2 becomes small, and the shot 2 is blasted onto the treatment object under the corrected blasting condition.As a result, a desired compressive residual stress can be applied to the processing object.

[0068] Next, an intensity measurement method for measuring a shot treatment intensity using the intensity measurement device 30 described above will be described. [Fig.9] is a flowchart illustrating an intensity measurement method according to the embodiment.

[0069] In this method, first, the shot 2 is projected by the shot treatment device 10 onto the surface 21a of the sensor device 20 (step STI). When the shot 2 collides with the surface 21a, a part of the stress energy is emitted in the form of an elastic wave with deformation or destruction of the collision member 21. The sensor device 20 measures the elastic wave generated by the collision of the shot 2 and outputs the elastic wave in the form of an AE signal waveform.

[0070] Next, the waveform acquisition unit 31 of the intensity measurement device 30 acquires the AE signal waveform from the sensor device 20 (step ST2). Next, the time-series data generation unit 32 generates time-series data of an effective value of the AE signal waveform (step ST3). The time-series data of the effective value may be generated by calculating the effective value at each time by the FPGA 45 or the processor 46 on the basis of Equation (1) described above, or may be generated by using the RMS-DC converter 48.

[0071] Then, the average value acquisition unit 33 obtains an average value of the actual values ​​during a predetermined time period L (step ST4). The average value of the actual values ​​is acquired by the FPGA 45 or the processor 46 which extracts a plurality of actual values ​​included in the predetermined time period L from the actual value time data and calculates an average value of the plurality of actual values.

[0072] Next, the intensity acquisition unit 34 obtains an intensity of the shot treatment based on the average value of the actual values ​​(step ST5). For example, the intensity is calculated by the FPGA 45 or the processor 46 by applying the average value of the actual values ​​to Equation (4) described above.

[0073] Then, the communication unit 35 outputs the obtained intensity to the external device 40 (step ST6). The external device 40 displays the intensity measured by the sensor device 20 on the display device. The operator of the shot treatment system 1 sets the projection condition of the shot treatment device 10 based on the displayed intensity.

[0074] Although the intensity measuring device, the intensity measuring system and the intensity measuring method according to various embodiments have been described above, the present invention is not limited to the embodiments described above, and various modifications can be made without changing the essence. of the invention. In other words, it should be noted that the embodiments described above are intended to illustrate the present invention and are not intended to limit its scope.

[0075] For example, in the embodiment described above, the intensity measuring device 30 measures the intensity from the AE signal waveform outputted by the sensor device 20, but the intensity measuring device 30 can measure the intensity from the AE signal waveform outputted by any sensor. For example, as illustrated in [Fig. 1], in the case where the AE sensor 23 for measuring an elastic wave is provided in the nozzle 15 of the shot-peening device 10, the intensity measuring device 30 can measure the intensity of the shot-peening based on the AE signal waveform outputted from the AE sensor 23. In this case, the intensity of the shot-peening can be measured based on the AE signal waveform indicating the elastic wave generated in the nozzle 15 when the shot 2 is ejected.

[0076] Further, in the first example configuration shown in [Fig.7], at least a portion of the processing of generating the time-series data of the effective value, the processing of calculating the average value of the effective values, and the processing of calculating the intensity is allocated to the FPGA 45, but in the embodiment, at least a portion of these processings may be allocated to an application-specific integrated circuit (ASIC).

[0077] Furthermore, in the second configuration example shown in [Fig.8], the RMS-DC converter 48 is used instead of the FPGA 45, but the current measuring device 30 may include both the FPGA 45 and the RMS-DC converter 48, and at least part of the processing for calculating the average value of the effective values ​​and the processing for calculating the current may be allocated to the FPGA 45.

[0078] The above various embodiments can be combined within a range without contradiction.

[0079] [Modes included in this disclosure] This disclosure includes the methods set out in the following clauses.

[0080] (Clause 1) According to one aspect, an intensity measuring device is connected to a sensor device which outputs a signal waveform related to an elastic wave generated by shot peening, and which measures an intensity of the shot peening on the basis of the signal waveform. The intensity measuring device comprises a waveform acquisition unit configured to acquire the signal waveform from the sensor device; a time-series data generation unit configured to generate time-series data of an actual value of the signal waveform; an average value acquisition unit configured to obtain an average value of the actual values ​​over a period of time predetermined based on the time series data; and an intensity acquisition unit configured to obtain the intensity of the shot peening based on the average value of the actual values. There is a certain correlation between the average value of the actual values ​​and the intensity of the shot peening. With the intensity measuring device according to the present aspect, since the intensity is obtained from the average value of the actual values, the intensity of the shot peening can be acquired without measuring the arc height of a test piece using a micro-gauge. Therefore, the intensity can be easily measured in a short time.

[0081] (Clause 2) With the intensity measuring device described in Clause 1, the intensity acquisition unit can calculate an intensity y based on the following Equation (1),

[0082] [Equation 7] n y = akxk (1 ) k=a where ak is a constant and x is the average value of the actual values. As shown in Equation (1), the average value of the effective values ​​and the intensity of shot treatment can be represented by a relationship of a polynomial. By calculating the intensity of shot treatment using a simple calculation equation as described above, it is possible to reduce the calculation burden of the intensity.

[0083] (Clause 3) The intensity measuring device described in Clause 1 or 2 may further comprise a communication unit configured to send the intensity to an external device. By transmitting the intensity to the external device, it is possible to reduce the amount of data transfer to the external device compared to the case where the signal waveform is transmitted to the external device.

[0084] (Clause 4) The intensity measuring device described in one of clauses 1 to 3 may further comprise an amplifier configuring the waveform acquisition unit; an FPGA configuring the time-series data generation unit; and an AD converter, wherein the amplifier may amplify the signal waveform outputted from the sensor device, the AD converter may sample the amplified signal waveform and convert the signal waveform into digital data, and the FPGA may generate time-series data of the actual value from the digital data. In order to generate the time-series data of the actual value, a large amount of computation is required, which takes a long time. By allocating By processing the generation of time-series data from the actual value to the FPGA, it is possible to shorten the intensity measurement time.

[0085] (Clause 5) With the intensity measuring device described in Clause 4, the FPGA can calculate the average value of the actual values ​​in a predetermined time period from the time series data of the actual value. By allocating the processing of calculating the average value of the actual values ​​to the FPGA, it is possible to further shorten the intensity measurement time.

[0086] (Clause 6) With the current measuring device described in Clause 4 or 5, the amplifier, the FPGA and the AD converter can be arranged on a single substrate. In this case, it is possible to reduce the current measuring device.

[0087] (Clause 7) The intensity measuring device described in one of clauses 1 to 3 may further comprise an amplifier configuring the waveform acquisition unit; an RMS-DC converter configuring the time-series data generation unit; and an AD converter, the amplifier may amplify the signal waveform outputted by the sensor device, the RMS-DC converter may receive the signal waveform and output an output value indicating the effective value of the signal waveform that changes with time, and the AD converter may sample the output value and convert the effective value of the signal waveform into digital data. In this case, since the output value indicating the effective value of the signal waveform is outputted by the RMS-DC converter, it is possible to reduce the calculation load of the effective value of the signal waveform.Therefore, the intensity can be measured efficiently.

[0088] (Clause 8) The intensity measuring device described in Clause 7 may further comprise a processor configuring the average value acquisition unit and the intensity acquisition unit, and the processor may calculate the average value of the actual values ​​during the predetermined time on the basis of the digital data, and calculate the intensity of the shot treatment on the basis of the average value of the actual values. In this case, since the intensity is calculated on the basis of the output value outputted by the RMS-DC converter, it is possible to reduce the computational load of the processor.

[0089] (Clause 9) An intensity measuring device according to another aspect is connected to a sensor device which outputs a signal waveform related to an elastic wave generated by a shot peening treatment, and which measures an intensity of the shot peening treatment on the basis of the signal waveform. The intensity measuring device comprises a waveform acquisition unit configured to acquire the signal waveform from the sensor device; and an output unit configured to output the intensity of shot treatment based on the signal waveform, and an intensity y output by the output unit satisfies the following Equation (2),

[0090] [Equation 8] ny = akxk (2) k=0 where ak is a constant and x is an average value of the effective values ​​of the signal waveform over a predetermined duration. As described above, with the intensity measuring device according to the present aspect, since the intensity is obtained from the average value of the effective values, the intensity can be easily measured in a short time.

[0091] (Clause 10) An intensity measurement system according to one aspect comprises a sensor device configured to output a signal waveform related to an elastic wave generated by a shot peening treatment; a waveform acquisition unit configured to acquire the signal waveform from the sensor device; a time-series data generation unit configured to generate time-series data of an effective value of the signal waveform; an average value acquisition unit configured to obtain an average value of the effective values ​​over a predetermined time period on the basis of the time-series data; and an intensity acquisition unit configured to obtain an intensity of the shot peening treatment on the basis of the average value of the effective values.With the intensity measuring system, since the intensity is obtained from the average value of the effective values, the intensity can be easily measured in a short time.

[0092] (Clause 11) With the intensity measuring device described in Clause 10, the sensor device may comprise a collision member having a surface that receives shot, a waveguide member having a first surface in contact with the collision member and a second surface opposite the first surface, the waveguide member propagating the elastic wave generated by the collision of the shot from the first surface to the second surface, and an AE sensor that detects the elastic wave propagated toward the second surface and outputs the signal waveform. Since the AE sensor can be protected by measuring the elastic wave propagated toward through the waveguide member by the AE sensor, it is possible to prevent a failure of the AE sensor.

[0093] (Clause 12) With the intensity measuring device described in Clause 10, the sensor device may include a waveguide member having a first surface that receives shot and a second surface opposite the first surface, the waveguide member propagating the elastic wave generated by the collision of the shot from the first surface to the second surface, and an AE sensor which detects the elastic wave propagated to the second surface and outputs the signal waveform.

[0094] (Clause 13) An intensity measurement method according to one aspect comprises acquiring a signal waveform related to an elastic wave generated by shot peening from a sensor device; generating time series data of an effective value of the signal waveform; obtaining an average value of the effective values ​​for a predetermined time period on the basis of the time series data; and obtaining an intensity of the shot peening on the basis of the average value of the effective values. In the intensity measurement method, since the intensity is obtained from the average value of the effective values, the intensity can be easily measured in a short time. List of reference signs

[0095] 2 Shot 20 Sensor device 21 Collision organ 21a Surface 22 Waveguide organ 22a First surface 22b Second surface 23 AE Sensor 30 Intensity measuring device 31 Waveform Acquisition Unit 32 Time series data generation unit 33 Average Value Acquisition Unit 34 Intensity Acquisition Unit 35 Communication Unit 40 External device 41 Charge amplifier (amplifier) 45 FPGA 46 Processor 48 RMS-DC converter.

Claims

Claims

1. An intensity measuring device (30) connected to a sensor device (20) which outputs a signal waveform related to an elastic wave generated by shot peening, and which measures an intensity of the shot peening on the basis of the signal waveform, the intensity measuring device (30) comprising: a waveform acquisition unit (31) configured to acquire the signal waveform from the sensor device (20); a time-series data generation unit (32) configured to generate time-series data of an actual value of the signal waveform; an average value acquisition unit (33) configured to obtain an average value of the actual values ​​for a predetermined time on the basis of the time-series data; and an intensity acquisition unit (34) configured to obtain the intensity of the shot peening on the basis of the average value of the actual values.

2. The intensity measuring device (30) according to claim 1, wherein the intensity acquisition unit (34) calculates the intensity y on the basis of the following Equation (1), [Equation 1] where ak is a constant and x is the average value of the actual values.

3. An intensity measuring device (30) according to claim 1 or 2, further comprising a communication unit (35) configured to send the intensity to an external device (40).

4. The intensity measuring device (30) according to one of claims 1 to 3, further comprising: an amplifier (41) configuring the waveform acquisition unit (31); an FPGA (45) configuring the time-series data generation unit (32); and an AD converter (44), wherein the amplifier (41) amplifies the signal waveform outputted by the sensor device (20), the AD converter (44) samples the amplified signal waveform and converts the signal waveform into digital data, and the FPGA (45) calculates the effective value at each time from the digital data and generates time-series data of the effective value.

5. The intensity measuring device (30) according to claim 4, wherein the FPGA (45) calculates the average value of the actual values ​​during the predetermined time period based on the actual value at each time.

6. The intensity measuring device (30) according to claim 4 or 5, wherein the amplifier (41), the FPGA (45) and the AD converter (44) are arranged on the same substrate.

7. The intensity measuring device (30) according to one of claims 1 to 3, further comprising: an amplifier (41) configuring the waveform acquisition unit (31); an RMS-DC converter (48) configuring the time-series data generation unit (32); and an AD converter (44), wherein the amplifier (41) amplifies the signal waveform outputted from the sensor device (20), the RMS-DC converter (48) receives the signal waveform as an input and outputs an output value indicating the actual value of the signal waveform that changes with time, and the AD converter (44) samples the output value and converts the actual value of the signal waveform into digital data.

8. The intensity measuring device (30) according to claim 7, further comprising: a processor (46) configuring the average value acquisition unit (33) and the intensity acquisition unit (34), wherein the processor (46) calculates the average value of the actual values ​​during the predetermined time period on the basis of the digital data, and calculates the intensity of the shot treatment on the basis of the average value of the actual values.

9. An intensity measuring device (30) connected to a sensor device (20) which outputs a signal waveform related to an elastic wave generated by shot peening, and which measures an intensity of the shot peening on the basis of the signal waveform, the intensity measuring device (30) comprising: a waveform acquisition unit (31) configured to acquire the signal waveform from the sensor device (20); and an output unit configured to output the intensity of the shot peening on the basis of the signal waveform, wherein the intensity y outputted from the output unit satisfies the following Equation (2), [Equation 2] (2) where ak is a constant and x is an average value of the effective values ​​of the signal waveform during a predetermined time.

10. An intensity measurement system comprising: a sensor device (20) configured to output a signal waveform related to an elastic wave generated by a shot peening treatment; a waveform acquisition unit (31) configured to acquire the signal waveform from the sensor device (20); a time-series data generation unit (32) configured to generate time-series data of an actual value of the signal waveform; an average value acquisition unit (33) configured to obtain an average value of the actual values ​​for a predetermined time period on the basis of the time-series data; and an intensity acquisition unit (34) configured to obtain an intensity of the shot peening treatment on the basis of the average value of the actual values.

11. An intensity measurement system according to claim 10, wherein the sensor device (20) comprises: a collision member (21) having a surface which receives shot (2), a waveguide member (22) of which a first surface (22a) is in contact with the collision member (21) and a second surface (22b) is opposite the first surface (22a), the waveguide member (22) propagating the elastic wave generated by the collision of the shot (2) from the first surface (22a) to the second surface (22b), and an AE sensor (23) which detects elastic force propagated towards the second surface (22b) and which outputs the signal waveform.

12. An intensity measurement system according to claim 10, wherein the sensor device (20) comprises: a waveguide member (22) having a first surface (22a) that receives shot (2) and a second surface (22b) opposite the first surface (22a), the waveguide member (22) propagating the elastic wave generated by the collision of the shot (2) from the first surface (22a) to the second surface (22b), and an AE sensor (23) which detects elastic force propagated towards the second surface (22b) and which outputs the signal waveform.

13. A method of measuring intensity comprising: acquiring a signal waveform related to an elastic wave generated by shot processing from a sensor device (20); generating time-series data of an effective value of the signal waveform; obtaining an average value of the actual values ​​over a predetermined period of time based on the time series data; and obtaining an intensity of the shot treatment based on the average value of the actual values.

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