Photonic device comprising a component layer arranged on a support substrate and method for preparing such a photonic device
Patent Information
- Application Number
- FR2024000469
- Authority / Receiving Office
- FR · FR
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-01-17
- Publication Date
- 2025-07-18
- Estimated Expiration
- 2044-01-17
AI Technical Summary
Existing methods for integrating photonic devices with hybrid waveguides are complex and sensitive to damage from etching processes, limiting the integration of components like germanium photodetectors and silicon nitride waveguides, and require precise control of dielectric thickness for optical coupling.
A method involving a component layer with an edge waveguide on a support substrate, a dielectric layer covering the waveguide's peripheral contour but not its central part, and a heterogeneous structure on the central part, allowing for simple integration of components like gain structures and electro-optical modulators while minimizing damage risk.
Enables efficient and less damaging integration of heterogeneous structures with silicon waveguides, maintaining optical coupling and allowing for the inclusion of additional photonic components, reducing complexity and sensitivity to etching damage.
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Abstract
Citation Information
Patent Citations
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