Vacuum processing device

Abstract

Vacuum Processing Device The invention relates to a vacuum processing device designed to comprise several chambers, such as a processing chamber (20), a feed chamber (10), and an outlet chamber (30), wherein, when the first and second internal valves (42, 43) located between the chambers are closed, the vacuum level in the processing chamber (20) is higher than that in the feed chamber (10) and the first outlet chamber (30), so that the feeding and discharge of material can be carried out through the feed chamber (10) and the outlet chamber (30). Since, at the same time, the vacuum level in the processing chamber (20) always remains at the level required for processing, the vacuum processing can continue during the feed or discharge operation to ensure continuous processing without interruption in the vacuum process. Figure to be published: Fig. 1

Description

Title of the invention: Vacuum processing device Scope of the invention

[0001] The present invention relates to a processing device and, in particular, a vacuum processing device, which is adapted for processing in the vacuum process and which allows for continuous processing and continuous production without interruption. Prior art

[0002] Vacuum is defined as the state of an object with a pressure less than 1 atmosphere. With the development of science and technology, processing chambers exhibiting a certain degree of vacuum are widely used in various fields. For example, they are used in detection devices such as transmission electron microscopy (TEM) and scanning electron microscopy (SEM), thin-film deposition devices, and other processes such as photolithography, where they reduce impurities in non-vacuum environments such as water vapor, dust, or gases in materials, thereby enabling improved detection, accuracy, and product yield.

[0003] To maintain a vacuum during the manufacturing process, the object to be processed must be placed in a vacuum device before processing and then brought into a vacuum. Once a processing cycle is complete, the feed and discharge process must be stopped before the vacuum is re-established and the next processing step can be started. However, since vacuuming is not only time-consuming and energy-intensive, but also requires interrupting the feed and discharge process, the overall utilization of the processing capacity is reduced in the vacuum process. Furthermore, vacuuming the processing device requires a considerable amount of additional energy, resulting in a high overall cost for the process.

[0004] The invention aims to efficiently solve the aforementioned problems and to propose a vacuum treatment device. Objective of the invention

[0005] The main objective of the present invention is to provide a vacuum processing device through which continuous, uninterrupted processing can be achieved in the vacuum process, the utilization of the capacity of the vacuum process can be improved efficiently and the manufacturing costs of the vacuum process can be considerably reduced.

[0006] The present invention relates to a vacuum processing device comprising a supply chamber, a processing chamber and a first outlet chamber, a first supply device being disposed in the supply chamber; the processing chamber and the supply chamber being connected to each other through a first internal valve that can be opened and closed, and a second supply device, a first outlet device and a processing zone located between the second supply device and the first outlet device being disposed in the processing chamber; the first outlet chamber and the processing chamber being connected to each other through a second internal valve that can be opened and closed, and a second outlet device being disposed in the first outlet chamber;the second infeed device comprising at least two interchangeable infeed zone material holders, such that, when a material to be processed is placed in one of the infeed zone material holders and is brought to the processing zone, the other infeed zone material holder stores or receives another material to be processed brought by the first infeed device through the first internal valve; the first outlet device comprising at least two interchangeable outlet zone material holders, such that, when one of the outlet zone material holders receives a processed material in the processing zone or a waste material, the other outlet zone material holder transfers the received processed material or the received waste material to the second outlet device through the second internal valve;When the first internal valve and the second internal valve are closed, the degree of vacuum in the treatment chamber is greater than the degree of vacuum in the inlet chamber and in the first outlet chamber.

[0007] The feed chamber may have a feed valve that can be opened and closed, through which a material to be treated is placed in the first feed device.

[0008] The first feed device can be moved between the feed valve and the first internal valve to transfer the material to be processed to the second feed device.

[0009] The opening and closing commands of the inlet valve and the first internal valve can be asynchronous.

[0010] The first outlet chamber may have a first outlet valve that can be opened and closed, the material being processed or the waste material being conveyed out of the first outlet chamber through the first outlet valve from the second outlet device.

[0011] The second outlet device can be moved between the first outlet valve and the second internal valve to receive the processed material or the waste material from the first outlet device.

[0012] The opening and closing commands of the first outlet valve and the second internal valve can be asynchronous.

[0013] The processing area may further include a cutting device for cutting the treated material into a plate-shaped piece of the required size.

[0014] The processing area may further include a receiving box for receiving the plate-shaped part.

[0015] The vacuum processing device according to the invention may further comprise a second outlet chamber continuously connected to the processing chamber, a third outlet device being able to be disposed in the second outlet chamber, the third outlet device serving to receive the plate-shaped part from the receiving box, and the first outlet device serving to receive scrap material resulting from cutting the processed material.

[0016] The second outlet chamber may further have a third internal valve that can be opened and closed, which is disposed between the treatment chamber and the second outlet chamber, the plate-shaped part being transferred from the treatment chamber to the third outlet device through the third internal valve.

[0017] The second outlet chamber may further have a second outlet valve that can be opened and closed to transport the plate-shaped part out of the vacuum processing device, the opening and closing controls of the second outlet valve and the third internal valve being able to be asynchronous.

[0018] One of the material to be treated, the treated material and the waste material can be a wound material.

[0019] In order to better understand the problems, technical content, features and advantageous effects of the present invention, concrete examples of implementation are described in detail below. Brief description of the drawings

[0020] [Fig.1] shows a schematic view of the vacuum processing device according to the invention;

[0021] [Fig.2A] shows a schematic view of the vacuum processing device of the invention in the supply state;

[0022] [Fig.2B] shows a schematic view of the vacuum processing device of the invention in the supply state;

[0023] [Fig.2C] shows a schematic view of the vacuum processing device of the invention in the supply state;

[0024] [Fig.2D] shows a schematic view of the vacuum processing device of the invention in the supply state;

[0025] [Fig.3A] shows a schematic view of the vacuum processing device of the invention, in which the processing is completed and the materials are delivered;

[0026] [Fig.3B] shows a schematic view of the vacuum processing device of the invention, in which the processing is completed and the materials are delivered;

[0027] [Fig.3C] shows a schematic view of the vacuum processing device of the invention, in which the processing is completed and the materials are delivered;

[0028] [Fig.3D] shows a schematic view of the vacuum processing device of the invention, in which the processing is completed and the materials are delivered;

[0029] [Fig.4] shows a schematic view of another example of an embodiment of the vacuum processing device according to the invention. Detailed description of the examples of implementation

[0030] To better understand the advantages, nature, and features of the present invention, exemplary embodiments are described in detail below with reference to the accompanying drawings. The present invention is described with reference to given exemplary embodiments and drawings, but the invention is not limited to them. These exemplary embodiments are provided solely to make this disclosure more comprehensive and easier to understand.

[0031] The terminology used herein serves only to describe specific embodiments and shall not limit the general idea of ​​the invention. Unless otherwise defined, all terms used in this document (including technical and scientific terms) shall have the same meaning as that which a person of average skill, specializing in the field to which the embodiments belong, would ascribe to them. It should also be specified that expressions, for example those defined in commonly used dictionaries, shall be interpreted as having a meaning consistent with their implication in the context of the relevant technique and not in an idealized or excessively formal sense, unless expressly defined otherwise in this description.

[0032] Throughout this description, a reference to "a single embodiment" or "any embodiment" means that a function, structure, or property described in the context of the embodiment is included in at least one embodiment of the present invention. Thus, the expressions "in a single embodiment" or "in any embodiment" used in various places in this description do not necessarily all refer to the same embodiment, but may refer to different embodiments. Furthermore, as a person with average technical knowledge can see in the present invention, the different functions, structures, or features can be appropriately combined in one or more embodiments.

[0033] Reference will be made to [Fig. 1], which shows the vacuum treatment device according to the invention. It comprises a supply chamber 10, a treatment chamber 20 and a first outlet chamber 30, a first supply device 11 being disposed in the supply chamber 10, the supply chamber 10 having a supply valve 41 that can be opened and closed and is continuously connected to the outside, and the treatment chamber 20 and the supply chamber 10 being continuously connected to each other through a first internal valve 42 that can be opened and closed, a second supply device 21,a first outlet device 23 and a treatment zone 22 located between the second inlet device 21 and the first outlet device 23 being disposed in the treatment chamber 20 and the first outlet chamber 30 and the other side of the treatment chamber 20 being continuously connected to each other by a second internal valve 43 that can be opened and closed, a second outlet device 31 being disposed in the first outlet chamber 30 and the first outlet chamber 30 having a first outlet valve 44 that can be opened and closed and continuously connected to the outside.

[0034] Reference will be made to Figures 1 and 2A. During operation, the inlet valve 41 is first opened. At this time, the first internal valve 42 located between the inlet chamber 10 and the treatment chamber 20 remains closed. Next, a material to be treated 71 is placed in the first inlet device 11 through the inlet valve 41. After placement, the inlet valve 41 is closed, and the interior of the inlet chamber 10 is simultaneously evacuated by means of a vacuum module 101, such that the degree of vacuum in the inlet chamber 10 is close to or equal to the degree of vacuum in the treatment chamber 20. Then, the first internal valve 42 located between the inlet chamber 10 and the treatment chamber 20 is opened. Reference will be made to Figures 1 and 2B.Because the first feed device 11 is movable between the feed valve 41 and the first internal valve 42, the material to be processed 71 can be transferred at that time to the second feed device 21 (see [Fig. 2C]). It should be noted here that the movement of the first feed device 11 is not limited to forward and backward, left and right, but can also be a vertical movement up and down, the first feed device 11 being arranged together with its movement mechanism in the feed chamber 10.

[0035] Reference will then be made to Figures 2C and 2D. The second feeding device 21 comprises at least two interchangeable feeding zone material supports 211, i.e., after the right-hand feeding zone material support 211 has received The material to be processed 71 can be moved to the left position to convey the material to the processing zone 22. At this point, the material holder in the right-hand feed zone 211 is emptied and can then store or receive another material to be processed 71, which is conveyed by the first feed device 11 through the first internal valve 42. The aforementioned method of transfer can be rotation, displacement, or transport, etc., but is not subject to any particular restrictions in the present invention. Furthermore, the figures only show two material holders in the feed zone 211, the number of which can also be increased as needed. Simultaneously, during processing, the required vacuum level for the treatment process is maintained in the processing chamber 20 by means of the vacuum module 201.

[0036] Reference will now be made to Figures 3A and 3B. The first outlet device 23 comprises at least two interchangeable outlet zone material holders 231. As shown in the Figures, material 72 processed in the processing zone 22 or waste material can be received by the right-hand outlet zone material holder 231 and then transferred to the left-hand outlet zone material holder 231. At this point, the right-hand outlet zone material holder 231 can still receive material 72 processed in the processing zone 22 or waste material. As illustrated in [Fig. 3C], the interior of the first outlet chamber 30 is evacuated by means of a vacuum module 301, such that the degree of vacuum in the first outlet chamber 30 is close to or equal to the degree of vacuum in the processing chamber 20.Next, the second internal valve 43, which can be opened and closed and is located between the first outlet chamber 30 and the processing chamber 20, is opened. The fact that the second outlet device 31 is movable between the first outlet valve 44 and the second internal valve 43 allows it to receive the processed material 72 or the waste material located in the material holder of the outlet area 231 on the left side of the first outlet device 23. The movement of the second outlet device 31 is not limited to forward and backward, left and right, but can also be a vertical movement up and down, the second outlet device 31 being arranged together with its movement mechanism in the first outlet chamber 30. Reference will be made to Figures 3B to 3D.In other words, the outlet zone material support 231, located on the left side of the first outlet device 23, can transfer the received processed material 72 or the received waste material to the second outlet device 31 through the second internal valve 43. Once the processed material 72 or the waste material has been transferred to the second outlet device 31 through the second internal valve 43 and the . second internal valve 43 has been closed, the processed material 72 or the waste material is delivered to the outside by opening the first outlet valve 44.

[0037] Reference will be made to [Fig. 1]. The feed zone material holder 211 of the second feed device 21 feeds a material to be processed 71 to the processing zone 22 for processing, then the processed material 72 or the waste material is received by the outlet zone material holder 231 of the first outlet device 23. Simultaneously, after the first feed device 11 of the feed chamber 10 has received a new material to be processed 71, the feed valve 41 is commanded to be closed, the feed chamber 10 being evacuated by means of the vacuum module 101, then the first internal valve 42 is commanded to be opened in order to bring a new material to be processed 71 to the other feed zone material holder 211 of the second feed device 21 (on the right side of the Figure).Therefore, when one of the material supports in the feed zone 211 (on the left side of the Figure) is loaded with a material to be processed 71 and brought to the processing zone 22, the other material support in the feed zone (on the right side of the Figure) is used to store or receive another material to be processed 71 which is brought by the first feed device 11 through the first internal valve 42.

[0038] Similarly, once a vacuum has been created in the first outlet chamber 30 by means of the vacuum module 301, the second internal valve 43 is controlled to open, the second outlet device 31 being able to receive the treated material 72 or the waste material in the outlet zone material holder 231 of the first outlet device 23. Since at that time the treated material 72 or the waste material is received by the outlet zone material holder 231 located on the left side of the Figure, the outlet zone material holder 231 located on the left side can continue to operate normally to receive a subsequent material 72, treated in the treatment zone 22, or a subsequent waste material.In other words, when one of the output zone supports 231 (located on the right of the Figure) receives material 72 processed in the processing zone 22 or waste material, the other output zone support 231 (located on the left of the Figure) transfers the received processed material 72 or waste material to the second output device 31 through the second internal valve 43. After the second output device 31 has received the processed material 72 or waste material, it commands the closure of the second internal valve 43 and the opening of the first output valve 44 to deliver the processed material 72 or waste material.

[0039] It therefore follows from the above description that continuous processing is carried out in the processing zone 22 of the processing chamber 20 and that it is not interrupted by the inlet and outlet of material, thus achieving the objective of continuous processing and uninterrupted production. Simultaneously, the opening commands The closing of the inlet valve 41 and the first internal valve 42 is asynchronous, as are the closing of the first outlet valve 44 and the second internal valve 43. In other words, when the first internal valve 42 and the second internal valve 43 are closed, the vacuum level in the processing chamber 20 is higher than the vacuum level in the inlet chamber 10 and the first outlet chamber 30. Therefore, during material inlet and outlet, only the inlet chamber 10 or the first outlet chamber 30 needs to be evacuated, without the need to evacuate the entire processing unit. The time and energy required for evacuation can thus be significantly reduced, effectively lowering process costs.

[0040] Reference will be made to [Fig. 4]. In addition, the processing zone 22 may include a cutting device 51. A processed material 72 is cut by the cutting device 51 into a plate-shaped piece 73 of the required size. Furthermore, the processing zone 22 includes a receiving box 24 which receives the plate-shaped piece 73 cut by the cutting device 51. Since the processed products are of different types, a second output chamber 60 may be provided, which serves to deliver the plate-shaped piece 73.The second output chamber 60 is continuously connected to the processing chamber 20, a third output device 61 being disposed in the second output chamber 60 and the third output device 61 serving to receive the plate-shaped part 73 from the receiving box 24, the first output device 23 being in this case designed to receive scrap material resulting from the cutting of the processed material 72.

[0041] The second outlet chamber 60 further includes a third internal valve 45 that can be opened and closed, which is located between the processing chamber 20 and the second outlet chamber 60. The plate-shaped part 73 is transferred from the processing chamber 20 to the third outlet device 61 through the third internal valve 45. The second outlet chamber 60 also has a second outlet valve 46 that can be opened and closed, which serves to evacuate the plate-shaped part 73 from the vacuum processing device. With regard to process control, the second outlet chamber 60 is similar to the first outlet chamber 30 described above. When the third internal valve 45 is closed, the second outlet chamber 60 is evacuated by means of the vacuum module 601 such that the internal vacuum level is close to or equal to the vacuum level in the processing chamber 20.Next, the third internal valve 45 is opened, then the plate-shaped part 73 is taken by the third outlet device 61. Once the third internal valve 45 is closed, the plate-shaped part 73 is transported out of the second outlet chamber 60 by means of. of the second outlet valve 46. Consequently, the opening and closing commands of the second outlet valve 46 and the third internal valve 45 are asynchronous. Therefore, when the first internal valve 42 and the third internal valve 45 are closed, the vacuum level in the treatment chamber 20 is higher than the vacuum level in the inlet chamber 10 and in the second outlet chamber 60.

[0042] The vacuum processing device according to the invention can be used for thin-film deposition processes. For example, battery electrode layers or interconnected components are coated in the processing area, a vacuum environment being used to reduce bubbles generated during the coating process, bubbles formed in the slurry, or doping impurities in the environment. This is, however, only one example and does not mean that the application of the present invention is limited to thin-film deposition processes. Furthermore, the material to be treated, the object to be treated, or the scrap material can be a sheet-shaped material, a coiled material, or a mixture thereof. For example, in the case of the material to be treated, it is a coiled material; in the case of the object to be treated, a sheet-shaped material; and in the case of the scrap material, a coiled material.

[0043] In summary, the present invention relates to a vacuum process device in which, by the design of the inlet chamber, the processing chamber, and the outlet chamber, and by the control of the internal and external valves, their individual vacuum conditions can be controlled to allow targeted vacuum suction and thus achieve the objective of material inlet and outlet. In this way, it is possible to carry out continuous processing in the vacuum process without interrupting the production line, which significantly increases capacity utilization and effectively reduces the manufacturing costs of the vacuum process.

[0044] The above description represents only preferred embodiments of the invention and is not intended to limit its scope. All equivalent changes and modifications which, in accordance with the description and drawings of the invention, can be made by a person skilled in the art in this field, fall within the scope of the present invention. List of reference figures

[0045]

[0046] 10 Intake chamber

[0047] 101 Vacuum Sealing Module

[0048] 11 First feed device

[0049] 20 Treatment chamber

[0050] 201 Vacuum sealing module

[0051] 21 Second feed device

[0052] 211 Feed zone material support

[0053] 22 Processing area

[0054] 23 First output device

[0055] 231 Exit zone material support

[0056] 24 Receiving box

[0057] 30 First exit chamber

[0058] 301 Vacuum Sealing Module

[0059] 31 Second output device

[0060] 41 Inlet valve

[0061] 42 First internal valve

[0062] 43 Second internal valve

[0063] 44 First outlet valve

[0064] 45 Third internal valve

[0065] 46 Second outlet valve

[0066] 51 Cutting device

[0067] 60 Second exit chamber

[0068] 601 Vacuum Sealing Module

[0069] 61 Third output device

[0070] 71 Material to be treated

[0071] 72 Treated material

[0072] 73 Plate-shaped part

Claims

1. Demands Vacuum processing device, comprising: a supply chamber (10), a first supply device (11) being disposed in said supply chamber (10); a treatment chamber (20), the treatment chamber (20) and the supply chamber (10) being connected to each other through a first internal valve (42) that can be opened and closed, and a second supply device (21), a first outlet device (23) and a treatment zone (22) located between the second supply device (21) and the first outlet device (23) being arranged in the treatment chamber (20); and a first outlet chamber (30), the first outlet chamber (30) and the treatment chamber (20) being connected to each other through a second internal valve (43) that can be opened and closed, and a second outlet device (31) being disposed in the first outlet chamber (30); in which the second feed device (21) has at least two interchangeable feed zone material holders (211), such that, when a material to be processed (71) is placed in one of the feed zone material holders (211) and is brought to the processing zone (22), the other feed zone material holder (211) stores or receives another material to be processed (71) brought by the first feed device (11) through the first internal valve (42); in which the first outlet device (23) has at least two interchangeable outlet zone material holders (231), such that, when one of the outlet zone material holders (231) receives material (72) processed in the processing zone (22) or waste material, the other outlet zone material holder (231) transfers the received processed material (72) or the received waste material to the second outlet device (31) through the second internal valve (43); in which, when the first internal valve (42) and the second internal valve (43) are closed, the degree of vacuum in the processing chamber (20) is greater than the degree of vacuum in the inlet chamber (10) and in the first outlet chamber (30).

2. Vacuum processing device according to claim 1, characterized in that the feed chamber (10) has a feed valve (41) which can be opened and closed, through which a material to be treated (71) is placed in the first feed device (11).

3. Vacuum processing device according to claim 2, characterized in that the first feed device (11) is movable between the feed valve (41) and the first internal valve (42) to transfer the material to be processed (71) to the second feed device (21).

4. Vacuum processing device according to claim 2, characterized in that the opening and closing controls of the inlet valve (41) and the first internal valve (42) are asynchronous.

5. Vacuum processing device according to claim 1, characterized in that the first outlet chamber (30) has a first outlet valve (44) which can be opened and closed, the material being processed (72) or the waste material being conveyed out of the first outlet chamber (30) through the first outlet valve (44) from the second outlet device (31).

6. Vacuum processing device according to claim 5, characterized in that the second outlet device (31) is movable between the first outlet valve (44) and the second internal valve (43) to receive the treated material (72) or the waste material from the first outlet device (23).

7. Vacuum processing device according to claim 5, characterized in that the opening and closing commands of the first outlet valve (44) and the second internal valve (43) are asynchronous.

8. Vacuum processing device according to claim 1, characterized in that the processing zone (22) further comprises a cutting device (51) for cutting the treated material (72) into a plate-shaped piece (73) of the required size.

9. Vacuum processing device according to claim 8, characterized in that the processing zone (22) further comprises a receiving box (24) for receiving the plate-shaped part (73).

10. Vacuum processing device according to claim 9, characterized in that it further comprises a second outlet chamber (60) continuously connected to the processing chamber (20), a third outlet device (61) being disposed in the second outlet chamber (60), the third outlet device (61) serving to receive the plate-shaped part (73) from the receiving box (24), and the first outlet device (23) serving to receive scrap material resulting from cutting the processed material (72).

11. Vacuum processing device according to claim 10, characterized in that the second outlet chamber (60) further has a third internal valve (45) which can be opened and closed, which is disposed between the processing chamber (20) and the second outlet chamber (60), the plate-shaped part (73) being transferred from the processing chamber (20) to the third outlet device (61) through the third internal valve (45).

12. Vacuum processing device according to claim 11, characterized in that the second outlet chamber (60) further has a second outlet valve (46) which can be opened and closed to transport the plate-shaped part (73) out of the vacuum processing device, the opening and closing controls of the second outlet valve (46) and the third internal valve (45) being asynchronous.

13. Vacuum processing device according to claim 1, characterized in that one of the material to be treated (71), the treated material (72) and the waste material is a wound material.

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