Receptacle for microelectronic device wafer(s), assembly and installation comprising such a receptacle

Abstract

The invention relates to a receptacle for holding a stack of microelectronic device(s) or solar cell(s) wafers, comprising a base support (22) on which one or more wafers are intended to be stacked and one or more uprights (23, 24) connected to said base support (22), said one or more uprights (23, 24) extending in a first direction substantially perpendicular to a principal plane of the base support (22) and being distributed around the periphery of the base support (22) to define a wafer reception area and guide the wafers. A given upright among said uprights of the receptacle comprises a gas conduit (45, 46) adapted to be connected to a gas supply source, in particular pressurized air, and a blow nozzle (31, 32, 34) configured to direct a flow of gas emanating from said conduit towards the reception area. Figure for the abbreviation: Figure 2

Description

Title of the invention: Receptacle for microelectronic device wafer(s), assembly and installation comprising such a receptacle. TECHNICAL FIELD OF THE INVENTION

[0001] The invention relates to the field of manufacturing microelectronic devices or solar cells, also called photovoltaic cells, obtained from one or more wafers, such as wafers made of semiconductor material.

[0002] In particular, the invention relates to a receptacle for holding a stack of wafers of microelectronic devices or solar cells, an assembly consisting of such a receptacle and one or more stacked wafers, as well as an installation comprising production equipment and such a receptacle. PRIOR TECHNOLOGY

[0003] Photovoltaic cells are typically composed of wafers, which can take the form of thin, rectangular blocks. These wafers are generally made from a semiconductor material, for example silicon, and in particular crystalline silicon.

[0004] During cell manufacturing, a stack of these wafers is placed in a receptacle, often referred to as a "basket." This receptacle is then placed in a production unit, where it is transported via one or more conveyors to a specific area of ​​the production unit where the wafers are unloaded from the receptacle. The receptacle thus allows for the simultaneous and secure transport of several wafers within the production unit.

[0005] In the unloading zone, the wafers are extracted one by one by means of a gripping device. The gripping device, which generally uses a suction cup or a Bernoulli gripper, grasps the wafer located at the top of the wafer stack. However, it is not uncommon for wafers to stick to each other, for example by capillary action. When the wafer at the top of the stack is grasped by the gripping device, the wafer(s) adhering to it may detach, fall, and be damaged during unloading.

[0006] To solve this problem, one solution is to blow a gas, usually pressurized air, between the wafers to facilitate their separation. The blowing is carried out in such a way that the detached wafers fall back into the receiving device without being damaged. To this end, blowing nozzles are installed in the discharge area of ​​the production equipment, above the receptacle.

[0007] However, although this blowing technique allows for the efficient separation of the plates, several improvements can still be made, particularly in terms of reliability and efficiency.

[0008] One of the problems encountered is that the position of the receptacle is not always constant in the discharge zone, which necessitates frequent adjustment of the nozzle positions to ensure efficient wafer separation. Furthermore, the nozzles are arranged so as not to obstruct the passage of the receptacle, but this positioning, while necessary to avoid hindering the receptacle's movement, does not allow for efficient wafer separation.

[0009] There is therefore a need to ensure reliable separation of stacked wafers despite the movement of the receptacle in the production equipment and the positioning constraints of the blow nozzles. Description of the invention

[0010] The present invention aims to remedy all or part of the disadvantages of the prior art mentioned above.

[0011] To this end, the invention relates, according to a first aspect, to a receptacle for holding a stack of microelectronic device or solar cell wafers, comprising: - a base support on which one or more plates are intended to be stacked and - one or more uprights connected to said base support, said one or more uprights extending in a first direction substantially perpendicular to a principal plane of the base support and being distributed around the periphery of the base support to delimit a receiving area for the plates and guide the plates, characterized in that at least one given upright among said uprights of the receptacle includes a gas conduit suitable for being connected to a gas supply source, in particular pressurized air, and a blowing nozzle.

[0012] According to the invention, the gas duct and the blow nozzle are directly integrated into the upright of the receptacle and therefore move with it. In other words, the gas duct and the blow nozzle are part of the receptacle and are positioned at the level of said upright. The blow nozzle can therefore be maintained in a specific position relative to the stack of wafers, regardless of the position of the receptacle in the production equipment.

[0013] It is therefore sufficient to adjust the blow nozzle to a position that allows for efficient separation of the wafers during the first use of the receptacle. In other words, it is possible to guarantee high separation efficiency of the pads with each use of the receptacle, without it being necessary to adjust the position of the blower nozzle between each use.

[0014] Thanks to the receptacle according to the invention, it is therefore possible to guarantee a reliable separation of the wafers despite the movement of the receptacle in the production equipment and without worrying about the positioning of the blow nozzle.

[0015] Preferred, simple, convenient and economical characteristics of the assembly according to the invention are presented below.

[0016] A slot may be provided in said given amount, said slot forming at least partially the blow nozzle.

[0017] The blowing nozzle can be orientable.

[0018] The blow nozzle is orientable between at least a first position in which the gas flow is directed towards the bottom support and at least a second position in which the gas flow is directed orthogonally to the given amount or opposite to the bottom support.

[0019] The blowing nozzle may include a slot formed in the given upright and an orientable guide member disposed at least partially in the slot.

[0020] The receptacle may include a blow nozzle adjustment element, said adjustment element being provided with a connection portion linked to the orientable guide element and a manipulation portion accessible to a user and linked to the connection portion so that when a user manipulates the manipulation portion, the orientable guide element is pivoted, thus changing the direction of the gas flow.

[0021] The blow nozzle can be located on the side of a free end of the given upright opposite another end of the upright connected to the base support.

[0022] The given amount may be hollow, the gas conduit extending inside said given amount.

[0023] The base support may be in the form of a frame, in particular rectangular or square, having at least three sides connected to each other, and in which the receptacle has as many uprights as the frame has sides, each side of the frame being connected to at least one upright and each upright being provided with a blow nozzle.

[0024] The given amount may include a first blow nozzle and a second blow nozzle separate from the first blow nozzle, the first blow nozzle and the second blow nozzle being configured to direct their respective gas flow in different directions.

[0025] The receptacle may include a side post positioned along one side of the frame, at a distance from an intersection of said side with adjacent sides, and a corner post positioned at the intersection of two adjacent sides of the frame, each of the side post and of the corner post being provided with a blow nozzle, the blow nozzle of the side post and the blow nozzle of the corner post being configured to direct their respective gas flow in different directions.

[0026] The receptacle may include a connecting member for fluidly connecting the gas conduit to the gas supply source, the connecting member having an orifice having a first end opening onto an external face of the base support, the external face being opposite the plate receiving area, and a second end, opposite the first end, opening into the gas conduit, the orifice having a conical shape whose diameter decreases in a direction from the first end to the second end.

[0027] The invention also relates, according to a second aspect, to an assembly consisting of a receptacle as described in accordance with the first aspect of the invention, of one or more plates stacked in a stacking direction substantially perpendicular to the main plane of the base support.

[0028] The invention also relates, according to a third aspect, to an installation comprising a production equipment and a receptacle as described in accordance with the first aspect of the invention, the production equipment comprising a conveyor configured to move the receptacle along a defined trajectory and a complementary connecting element configured to be fluidly connected on the one hand to the gas supply source and on the other hand to a receptacle connection element, in a removable manner, when the receptacle is in a predefined area of ​​the production equipment.

[0029] The installation may include a passage space corresponding to the trajectory of movement of the receptacle in the production equipment, and in which the complementary connecting member is mobile between a deployed position in which it is in the passage space to be fluidly connected to the connecting member of the receptacle and a retracted position in which it is outside the passage space. BRIEF DESCRIPTION OF THE FIGURES

[0030] Other advantages, purposes and special features of the present invention will become apparent from the following non-limiting description of at least one particular embodiment of the devices and methods of the present invention, with reference to the accompanying drawings.

[0031] Fig. 1 is a partial schematic view of an installation according to the invention.

[0032] Fig. 2 is a perspective view of a receptacle according to the invention.

[0033] Fig. 3 is a detail view of a side post of the receptacle of Fig. 2.

[0034] Fig. 4 is a view similar to that of Fig. 3, but in which a wall of the The side post is shown in transparency to show the inside of the side post.

[0035] Fig. 5 is a view similar to that of Fig. 4, from a different angle, and in which another wall of the side post is shown in transparency to show the inside of the side post.

[0036] Figure 6 is a detail view of Figure 4, showing a guide element arranged inside a groove, one wall of which is shown in transparency to show the guiding element.

[0037] Fig. 7 is a view similar to that of Fig. 2, from a different viewing angle.

[0038] Figure 8 is a block diagram representing a method for unloading receptacle plates in the installation of [Fig.1].

[0039] Figure 9 is a schematic view showing the movement of the receptacle on a production equipment, between a starting position and an ending position.

[0040] Fig. 10 is a view similar to that of Fig. 8, showing the receptacle in the arrival position.

[0041] Fig. 11 is a schematic view showing different gas flows emanating from different blow nozzles of the receptacle of Fig. 2. DETAILED DESCRIPTION OF THE INVENTION

[0042] The present description is given as a non-limiting example of an embodiment.

[0043] Fig. 1 represents an installation 1 for the manufacture of microelectronic devices or solar cells, such as photovoltaic cells intended for use in photovoltaic panels.

[0044] Microelectronic devices or solar cells are obtained from one or more wafers 2, for example made of semiconductor material, such as silicon and in particular crystalline silicon. The wafers are also known by the English name "wafer".

[0045] The installation 1 here comprises a first production equipment 3 for moving a stack of wafers 2 between a starting position and an arrival position and a second production equipment 4 for individually processing each wafer 2 of the stack.

[0046] The second production equipment 4 is, for example, configured to carry out a treatment, such as material deposition, etching or photolithography, for the purpose of manufacturing a microelectronic device or a solar cell.

[0047] The first production equipment 3 includes a conveyor 9 configured to move the stack of wafers 2 between the starting position and the arrival position along a defined path.

[0048] The conveyor 9 is here configured to move the stack of wafers 2 along a substantially horizontal direction, while the stack of wafers 2 extends in a substantially vertical direction when moved by the conveyor 9.

[0049] The second production equipment 4 here includes a conveyor 10 for moving the wafers 2 within the second production equipment.

[0050] Conveyors 9, 10 are, for example, belt conveyors comprising two parallel belts spaced apart. Other types of conveyors can of course be considered.

[0051] The installation 1 further includes a receptacle 20 for receiving the stack of plates 2.

[0052] The receptacle 20 is configured to transport several wafers 2 simultaneously within the first production equipment 3 in a secure manner, i.e. with a limited risk of wafers 2 falling.

[0053] The conveyor 9 is adapted to transport the receptacle 20 between the starting position and the arrival position within the first production equipment 3.

[0054] The trajectory of movement of the receptacle 20 defines a passage space 14, represented by a dotted line.

[0055] It is preferable that this passage space not be obstructed in order to facilitate the movement of the receptacle 20 from the starting position to the arrival position.

[0056] The installation includes a gripping device 5 configured to grasp the wafers 2 one by one in the receptacle 20 and to place them on the conveyor 10 of the second production equipment 4, when the receptacle 20 is in the arrival position on the first production equipment 3, illustrated in [Fig.1].

[0057] In particular, the gripping device 5 is configured to grasp the plate 2 which is at the top of the stack, i.e. the one furthest from the conveyor 9.

[0058] The gripping device 5 here comprises an articulated robotic arm 6 and a gripping head 7 carried by the robotic arm 6.

[0059] The gripping head 7 comprising suction cups 8 that can be connected to a vacuum source.

[0060] To prevent the wafer 2 located below the wafer located at the top of the stack from sticking to the latter when grasped by the gripping device 5, the receptacle 20 has blow nozzles 21 configured to direct a flow of gas towards the wafers 2, and more particularly between the wafers.

[0061] The first production equipment 3 includes a gas supply source 13 and complementary connection members 15 fluidly connected to the gas supply source 13 and configured to be fluidly connected to the blow nozzles 21, in particular when the receptacle 20 is in the inlet position.

[0062] Each additional connecting member 15 is movable between a deployed position to be fluidly connected to the blowing nozzles 21 and a retracted position.

[0063] In the deployed position, the additional connecting member 15 is located in the passage space 14 of the receptacle 20, while in the retracted position, the additional connecting member 15 is located outside the passage space 14 so as not to obstruct the passage of the receptacle 20.

[0064] The first production equipment 3 includes a lifting member 11 configured to move the wafers 2 in the receptacle 20 as the number of wafers in the stack decreases, to maintain at least the two wafers located at the top of the stack facing the gas flow emanating from the blow nozzles.

[0065] Holding the two pads at the top of the stack facing the gas flow ensures their separation, particularly when they are bonded by capillary action, by directing the gas directly onto the area of ​​adhesion. Thus, only the pad at the top of the stack is moved by the gripping device 5, and the risk of other pads falling is reduced or even eliminated.

[0066] The lifting member 11 is movable between a deployed position to lift the stack of plates 2 and a retracted position.

[0067] In the deployed position, the lifting member 11 is located in the passage space 14 of the receptacle 20, while in the retracted position, the lifting member 11 is located outside the passage space 14 so as not to obstruct the passage of the receptacle 20.

[0068] We will continue to describe in more detail an example of receptacle 20 of installation 1 with reference to figures 2 to 7.

[0069] With reference to [Fig.2], the receptacle 20 includes a base support 22 on which one or more plates are intended to be stacked and several uprights 23, 24 connected to the base support 22 to delimit a plate reception area and guide the plates.

[0070] The base support 22 has a frame shape, comprising sides 25 defining an opening 26 between them.

[0071] The opening 26 is adapted to allow the passage of the lifting tool 11 of the first production equipment 3, while preventing the passage of the plates 2.

[0072] In other words, the opening 26 has dimensions greater than the dimensions of the lifting tool 11 but less than the dimensions of the plates 22.

[0073] The amounts 23, 24 extend along a first direction substantially perpendicular to a principal plane of the fund support 22 and are distributed around the periphery of the fund support 22.

[0074] The uprights 23, 24, define, on the side of a free end opposite to another end connected to the bottom support 22, an opening for receiving and extracting the wafers.

[0075] Each upright 23, 24 here includes several blow nozzles 31, 32, 34, configured to direct a flow of gas towards the receiving area of ​​the receptacle 20.

[0076] The blow nozzles 31, 32, 34 are thus maintained in a determined position relative to the stack of wafers, regardless of the position of the receptacle 20 in the first production equipment.

[0077] The blow nozzles 31, 32, 34 are here integrated into the uprights 23, 24, that is to say they are part of the uprights.

[0078] It should be noted, however, that other configurations are possible provided that the blow nozzles 31, 32, 34 are part of the receptacle 20. For example, the blow nozzles can be positioned between two adjacent uprights, without being integrated into them.

[0079] In the example shown, the background support 22 has a square frame shape and thus has four sides 25. The opening 26 is also square.

[0080] The shape of the frame depends mainly on the shape of the plates. The receptacle 20 shown is thus particularly suitable for receiving square or pseudo-square plates.

[0081] Other frame shapes can however be envisaged, depending on the shape of the plates, such as rectangular, circular or triangular shapes.

[0082] The uprights include side uprights 23, here of which there are four, each positioned along a respective side of the frame and corner uprights 24, here of which there are four, each positioned at a respective intersection of two adjacent sides of the frame.

[0083] The blow nozzles 31, 32, 34 are located on the side of a free end of the uprights 23, 24 opposite another end of the uprights connected to the base support 22.

[0084] As previously stated, it is sufficient to direct a flow of gas between the two plates located at the top of the stack to eliminate the risk of falling when grasping the plate located at the top of the stack by the gripping device 5.

[0085] The arrangement of the blow nozzles 31, 32, 34 on the free end side of the uprights 23, 24 thus maximizes the number of pads in the receptacle 20, while having a low risk of falling due to adhesion between the pads.

[0086] Each corner post 24 has two panels 27 connected to each other, each panel 27 being aligned along one of the sides of the frame.

[0087] Each side post 23 here includes a non-orientable blow nozzle 31 and two orientable blow nozzles 32.

[0088] The adjustable blow nozzles 32 are arranged on either side of the non-adjustable blow nozzle 31.

[0089] Each corner post 24 here has two non-orientable blow nozzles 33, each arranged on a respective panel 27.

[0090] Unlike the non-orientable blow nozzles 31, 33, each orientable blow nozzle 32 is configured to allow a change in the direction of the gas flow, according to the needs of use.

[0091] Fig. 3 represents the free end of a lateral upright 23 comprising a first slot 32 and two second slots 36 arranged on either side of the first slot 32 in a direction perpendicular to the first direction.

[0092] The first slot 32 extends mainly along the first direction.

[0093] Thus, the first slot 32 is configured to generate an airflow distributed over an elongated area in the first direction, which is parallel to the stacking direction of the wafers.

[0094] This arrangement offers some flexibility to target the two plates located at the top of the stack.

[0095] In particular, the first slot 32 has a dimension, along this first direction, which represents only a part of the dimension of the side post 23 in this first direction, for example less than 50% (between 0% and 50%), less than 30% (between 0% and 30%), or even less than 20% (between 0% and 20%) of the dimension of the side post 23 in the first direction.

[0096] Choosing a slot dimension in the first direction less than 50% of the dimension of the lateral upright in this first direction represents an interesting compromise between the flexibility of gas flow distribution and its intensity.

[0097] Indeed, this means that the two plates located at the top of the stack can be in an area extending in the first direction and can represent up to 50% of the dimension of the lateral upright in this first direction and be reliably separated.

[0098] The blow nozzles 34 of the corner posts 24 are identical to the non-orientable blow nozzles 32 of the side posts 23.

[0099] Thus, the corner posts 24 include two slots identical to the first slots 32 of the side posts 23 and distributed over the panels 27.

[0100] The adjustable blow nozzles 31 each have a second slot 36 provided in the lateral upright 23 and an adjustable guide member 37 disposed at least partially in the second slot 36.

[0101] The second slot 36 extends mainly along the first direction.

[0102] The orientable guide member 37 is mounted freely in rotation in the second slot 36 around an axis substantially orthogonal to the first direction so that it can be moved along the first direction.

[0103] Thus, the guide element 37 is configured to direct an airflow in an elongated area in the first direction, which is parallel to the stacking direction of the pads.

[0104] The side post 23 includes an adjustment element 40 for manually changing the direction of the gas flow from the adjustable blow nozzles 31.

[0105] The adjustment member 40 includes a manipulation portion 41 which is directly accessible to a user of the receptacle, i.e. it is not necessary to dismantle the receptacle to access it.

[0106] In particular, the manipulation portion 41 of the adjustment member 40 is here arranged in projection from one face of the lateral upright 23 to facilitate its identification and use.

[0107] The manipulation portion 41 is mechanically connected to the orientable guide member 37.

[0108] The adjustment member 40 is thus configured so that when the user manipulates the manipulation portion, the orientable guide member 37 is pivoted, thus changing the direction of the gas flow.

[0109] Here, the adjustment member 40 is configured to act simultaneously on the direction of the gas flow from each adjustable blow nozzle 32. In an unshown variant, the side post has as many adjustment members as there are adjustable blow nozzles and each adjustment member is configured to act on the direction of the gas flow from a respective adjustable blow nozzle.

[0110] As can be seen in figures 4 to 6, the receptacle 20 includes a first gas conduit 45 adapted to be connected to the gas supply source.

[0111] The first gas conduit 45 is fluidly connected to the first slot 32, so that the gas emanating from the first gas conduit 45 is directed to the receiving area through the first slot 32.

[0112] The first slot 32 communicates directly with the first gas conduit 45, that is to say without the intermediary of a conduit or other.

[0113] The receptacle 20 further includes a second gas conduit 46, separate from the first gas conduit 45, suitable for connection to the gas supply source.

[0114] Here, the guiding element 37 is a channel, in particular of rectangular cross-section.

[0115] The adjusting member 40 further comprises a connection portion 42 connecting mechanically the manipulation portion 41 to each channel 37, so that when a user manipulates the manipulation portion 41, the guiding elements 47 are moved via the connection portion 42.

[0116] The connection portion 42 fluidly connects the second gas conduit 46 to the channel 37 of each orientable blow nozzle 31.

[0117] Thus, the gas emanating from the second gas conduit 47 is directed to the channel 37 of each adjustable blow nozzle 31 via the connection portion 42 of the adjustment member 40.

[0118] Here, the connecting portion 42 crosses the second gas conduit 46 and has an opening (not visible) leading into the interior of the second gas conduit to receive the gas and guide it to the channels 37.

[0119] Thanks to this arrangement, the connection portion 42 is configured to fluidly connect the second gas conduit 46 to the channels 37, while being able to be pivoted relative to the second gas conduit 46.

[0120] Thanks to the ability to move the channels 37 inside the second grooves 31, each second blow nozzle 31 is orientable in the first direction between at least a first position in which the gas flow is directed towards the bottom support and at least a second position in which the gas flow is directed away from the bottom support or orthogonally to the side post 23.

[0121] In other words, the gas flow comprises in the first position at least one component oriented towards the bottom support, while in the second direction it comprises at least one component oriented away from the bottom support or no component towards the bottom support or away from the bottom support.

[0122] In the example shown, the side post 23 is hollow, that is to say, it is formed by walls defining a cavity between them.

[0123] The first gas duct 45 and the second gas duct 46 extend inside the side post 23.

[0124] The gas conduits 45, 46 are thus protected and are not at risk of being caught by elements of the first production equipment.

[0125] The connection portion 42 of the adjustment member 40 is also disposed inside the side post 23, while the gripping portion 41 is disposed outside the side post.

[0126] It should be noted that in the example shown, all the side posts 23 are identical.

[0127] The corner posts 24 are also hollow and include, inside the posts, gas conduits suitable for being fluidly connected to the gas supply source and being fluidly connected to the slots.

[0128] As can be seen in [Fig.7], the receptacle 20 has connecting members 50, here two in number, for connecting the first and second gas conduits 45, 46 to the gas supply source.

[0129] The connecting members 50 are arranged on either side of the opening 26 of the frame.

[0130] Each connecting member here comprises an orifice 50 having a first end opening onto an external face of the base support 22, the external face being opposite the plate receiving area, and a second end opposite the first end, opening into the first gas conduit 45 and / or the second gas conduit 46.

[0131] Each orifice 50 here has a conical shape whose diameter decreases in a direction from the first end to the second end.

[0132] Each orifice can be connected to one or more conduits.

[0133] We will now describe, with reference to figures 8 to 10, a method of unloading 100 of a plate received in the receptacle 20, implemented by the installation of [Fig.1].

[0134] The unloading process 100 includes a prior step of supplying an assembly comprising the receptacle 20 and one or more stacked plates 2 received in the receiving area of ​​the receptacle, and a step of positioning this assembly on the conveyor 9 of the first production equipment 3, in a starting position, as shown in [Fig.9].

[0135] In particular, the stack of wafers rests on the base support 22 of the receptacle 20 and is thus transported securely within the first production equipment 3.

[0136] The unloading process 100 includes a step of moving 101 the assembly, formed by the receptacle 20 and the plates 2, by the conveyor 9 to an arrival position, represented in [Fig.10].

[0137] In order not to hinder the movement of the receptacle 20 between its starting position and its arrival position within the first production equipment, the lifting member 11 is in its retracted position.

[0138] In this position, the lifting member 11 is outside the passage space 14 of the receptacle 20.

[0139] When the receptacle 20 is in the arrival position ([Fig. 10]), the lifting member 11 is arranged opposite the opening 26 and the additional connecting members are arranged opposite the orifices 50.

[0140] The unloading process 100 includes a lifting step 101 of the stack of chips. This step is implemented when the chips located at the top of the stack are not (or no longer) at the level of the airflow emanating from the blow nozzles.

[0141] The lifting step 11 involves moving the lifting member 11, through the opening 26 of the receptacle 20, from a retracted position to a deployed position to hold the two plates located at the top of the stack opposite a flow of gas emanating from the blow nozzles 21.

[0142] The unloading process 100 further includes a fluid connection step 102, in a removable manner, of the receptacle 20 to the gas supply source.

[0143] The fluid connection step 102 involves moving the additional connection members 15 from their retracted position to their deployed position so that each can be inserted into a corresponding orifice 50 of the receptacle 20, and thus fluidly connect, in a removable manner, the gas supply source to the blow nozzles 31, 32, 34.

[0144] The conical shape of the orifices 50 makes it easier to insert the additional connecting elements 15 of the first production equipment 3 into the orifices 50 of the receptacle 20, in particular when the receptacle is not perfectly positioned.

[0145] The unloading process 100 further includes a first activation step 103 of the blowing by the blowing nozzles 31, 32, 34.

[0146] As shown by the dashed arrows in [Fig.9], the gas emanating from the complementary connecting members 15 passes successively through the orifice 50, the gas conduit 45, 46, then through the blow nozzle 21 before being directed to the receiving area of ​​the receptacle 20 where the stack of plates 2 is arranged.

[0147] The first activation step 103 may only include the activation of the non-orientable blow nozzles 32.

[0148] The unloading process 100 further includes a step of grasping 104 the wafer 2 located at the top of the stack of wafers by the gripping device 105.

[0149] The grasping step includes the approach of the grasping head 7 to the wafer located at the top of the wafer stack and the activation of the suction with the suction cups 8.

[0150] The unloading process 100 further includes a step of lowering 105 the stack of wafers.

[0151] The descent step 105 involves the movement of the lifting member 11, through the opening 26 of the receptacle 20, from a deployed position to a retracted position.

[0152] The unloading process 100 further includes a second activation step 106 of the blowing by the blowing nozzles 31, 32, 34.

[0153] The second activation step 106 may only include the activation of the adjustable blow nozzles 31, the adjustable blow nozzles 31 preferably being oriented towards the bottom support 22.

[0154] The unloading process 100 then includes a step of moving away 107 from the gripping device 105, in particular in order to deposit the wafer on the conveyor 10 of the second production equipment 4.

[0155] When all the stack 2 plates have been unloaded from the receptacle, the lifting member 11 and the additional connecting member 14 are moved to their retracted position and the receptacle 20 is evacuated from the first production equipment 3.

[0156] Fig. 11 illustrates the receptacle 20 in which the blow nozzles are configured to direct the gas flow according to a predefined configuration.

[0157] The non-steering blow nozzle 32 and the steerable blow nozzles 31 of each side post 23 are configured to direct the gas flow in different directions.

[0158] In particular, the non-steering blow nozzle 32 of each side post 23 is configured to direct the gas flow in a direction substantially orthogonal to said side post 23, while the steerable blow nozzles 33 of each side post 23 are configured to direct the gas flow towards the bottom support 22.

[0159] The blow nozzle 32 of each side post 23 and the blow nozzles of each corner post 27 are configured to direct the gas flow in different directions.

[0160] In particular, the non-steering blow nozzle 34 of each panel 27 of each corner post 24 is configured to direct the gas flow in a direction substantially orthogonal to said corner post 24 and substantially orthogonal to the gas flow emanating from the non-steering blow nozzle 23 of the side post 23 disposed on the same side of the frame along which said panel 27 extends.

[0161] The gas ducts 45, 46 and the blow nozzles 21, 31, 32, 34 are part of the receptacle 20 and are arranged at the level of the uprights 23, 24. Each blow nozzle 21, 31, 32, 34 can therefore be held in a specific position relative to to the stacking of wafers 2, regardless of the position of the receptacle 20 in the first production equipment 3.

[0162] It is therefore sufficient to adjust the blow nozzles 21, 31, 32, 34 in a position allowing efficient separation of the wafers 2 during the first use of the receptacle 20. In other words, it is possible to guarantee a high efficiency of separation of the wafers 2 at each use of the receptacle 20, without it being necessary to adjust the position of the blow nozzles 21, 31, 32, 34 between each use.

[0163] Thanks to the receptacle 20 according to the invention, it is therefore possible to guarantee a reliable separation of the wafers 2 despite the movement of the receptacle 20 in the first production equipment 3 and without worrying about the positioning of the blow nozzles 21, 31, 32, 34.

[0164] Variants not illustrated are described below.

[0165] The receptacle may include a single amount extending around the periphery of the fund support.

[0166] The receptacle may be devoid of corner posts and consist only of side posts.

[0167] Conversely, the receptacle may be devoid of side supports and consist only of corner supports.

[0168] Each amount may include a different number of blow nozzles, for example a single nozzle, or more than two.

[0169] Each amount may include only one or more non-adjustable nozzles or only one or more adjustable nozzles.

[0170] The amount may be without an adjusting element.

[0171] The nozzles and / or gas conduits may not be integrated into the uprights, and for example be arranged outside the uprights.

[0172] The guiding element may be formed, not by a channel, but by a blade mounted for rotation in the slot. The second gas conduit is then fluidly connected, not to the channel, but to the slot, for example via the connection portion of the regulating element.

Claims

Demands

1. A receptacle for holding a stack of wafers (2) of microelectronic devices or solar cell(s), comprising: - a base support (22) on which one or more wafers (2) are intended to be stacked and - one or more uprights (23, 24) connected to said base support (22), said one or more uprights (23, 24) extending in a first direction substantially perpendicular to a principal plane of the base support (22) and being distributed around the periphery of the base support (22) to delimit a wafer reception area and guide the wafers (2), characterized in that at least one given upright among said uprights (23, 24) of the receptacle comprises a gas conduit (45, 46) capable of being connected to a gas supply source (13), in particular pressurized air, and a blow nozzle (21, 31, 32, 34) configured to direct a flow of gas emanating from said conduit towards the receiving area.

2. Receptacle according to claim 1, in which a slot (32, 36) is provided in said given amount, said slot (32) forming at least partially the blow nozzle (21, 31, 32, 34).

3. Receptacle according to claim 1 or 2, in which the blow nozzle (21, 31) is orientable.

4. Receptacle according to claim 3, wherein the blow nozzle (21, 31) is orientable between at least a first position in which the gas flow is directed towards the bottom support (22) and at least a second position in which the gas flow is directed orthogonally to the given amount or opposite to the bottom support (22).

5. Receptacle according to any one of claims 1 to 4, in which the blow nozzle (21, 31, 32, 34) has a slot (36) formed in the given upright and a steerable guide member (37) disposed at least partially in the slot (36).

6. Receptacle according to claim 5, comprising an adjustment member (40) for the blow nozzle (21, 31), said adjustment member (40) being provided with a connection portion (42) connected to the orientable guide member (37) and a handling portion (41) accessible to a user and connected to the connection portion (42) of so that when a user manipulates the manipulation portion (42), the orientable guide element (37) is pivoted, thus changing the direction of the gas flow.

7. Receptacle according to any one of claims 1 to 6, wherein the blow nozzle (21, 31, 32, 34) is located on the side of a free end of the given upright opposite another end of the upright connected to the bottom support (22).

8. Receptacle according to any one of claims 1 to 7, wherein said given amount is hollow, the gas conduit (45, 46) extending inside said given amount.

9. Receptacle according to any one of claims 1 to 8, wherein the bottom support (22) is in the form of a frame, in particular rectangular or square, having at least three sides (25) connected to each other, and wherein the receptacle has as many uprights (23, 24) as the frame has sides (25), each side (25) of the frame being connected to at least one upright (23, 24) and each upright (23, 24) being provided with a blow nozzle (21, 31, 32, 34).

10. Receptacle according to any one of claims 1 to 9, wherein said given amount comprises a first blow nozzle (21, 31, 32, 34) and a second blow nozzle (21, 31, 32, 34) distinct from the first blow nozzle, the first blow nozzle (21, 31, 32, 34) and the second blow nozzle (21, 31, 32, 34) being configured to direct their respective gas flow in different directions.

11. Receptacle according to any one of claims 1 to 10, comprising a side post (23) positioned along one side (25) of the frame, at a distance from an intersection of said side (25) with adjacent sides, and a corner post (24) positioned at the intersection of two adjacent sides (25) of the frame, each of the side post (23) and the corner post (24) being provided with a blow nozzle (21, 31, 32, 34), the blow nozzle (21, 31, 32) of the side post (23) and the blow nozzle (21, 34) of the corner post (24) being configured to direct their respective gas flow in different directions.

12. Receptacle according to any one of claims 1 to 11, comprising a connecting member (50) for fluidly connecting the gas conduit (45, 46) to the supply source in gas (13), the connecting member (50) having an orifice having a first end opening onto an external face of the base support (22), the external face being opposite to the receiving area of ​​the plates (2), and a second end, opposite to the first end, opening into the gas conduit (45, 46), the orifice having a conical shape whose diameter decreases in a direction going from the first end to the second end.

13. Assembly consisting of a receptacle according to any one of claims 1 to 12, of one or more plates (2) stacked in a stacking direction substantially perpendicular to the main plane of the base support (22).

14. Installation comprising a production equipment (3) and a receptacle (20) according to any one of claims 1 to 12, the production equipment (3) comprising a conveyor (9) configured to move the receptacle (20) along a defined path and a complementary connecting member (15) configured to be fluidly connected on the one hand to the gas supply source (13) and on the other hand to a connecting member (50) of the receptacle (20), in a removable manner, when the receptacle (20) is in a predefined area of ​​the production equipment (3).

15. Installation according to claim 14, comprising a passage space (14) corresponding to the trajectory of movement of the receptacle (20) in the production equipment (3), and in which the complementary connecting member (15) is movable between a deployed position in which it is in the passage space to be fluidly connected to the connecting member (50) of the receptacle (20) and a retracted position in which it is outside the passage space (14).

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