Reflector for substrate processing equipment

JP1733769SActive Publication Date: 2026-01-13KOKUSAI DENKI KK
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Patent Information

Application Number
JP2022017170D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2022-08-10
Publication Date
2026-01-13
Estimated Expiration
2047-08-10

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Abstract

The product of the present application is installed above an insulating plate placed below a wafer boat in a substrate processing apparatus for processing wafers, and by reflecting back infrared rays from inside the furnace, it prevents the center of the lower wafer from heating and prevents heat from escaping to the furnace opening.
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