Polishing Pad

JP1797351SActive Publication Date: 2025-04-30FUJIBO HLDG
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Patent Information

Application Number
JP2024025662D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2024-12-11
Publication Date
2025-04-30
Estimated Expiration
2049-12-11

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    Figure 0001797351000001
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    Figure 0001797351000002
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    Figure 0001797351000003
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Abstract

This article is mainly used for polishing electronic devices and electronic components. This article is composed of an abrasive layer and a base layer, and the abrasive layer has recesses at equal intervals around its circumference. In addition, the abrasive layer has concentric grooves on its surface.
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