Edge Ring

JP1824511SActive Publication Date: 2026-04-15LAM RES CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
LAM RES CORP
Filing Date
2025-10-20
Publication Date
2026-04-15

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Abstract

The article relating to this application (hereinafter referred to as "the Article") is an edge ring used in a plasma processing system, positioned on the outer periphery of a semiconductor substrate supported by a substrate support.
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