System and method for generating plasma using microwaves

Abstract

A plasma generator and method for generating plasma are disclosed. An electrode in the reaction zone is energized by a high voltage power supply electrically isolated from the electrode. A first conductor array, preferably a coil, is electrically coupled to the power supply and electrically isolated from the electrode. A second conductor array, preferably a coaxial coil nested within the first conductor array, is electrically coupled to the electrode. Electromagnetic induction between the first and second conductor arrays is used to energize the electrode and generate a plasma in the reaction zone. One or more microwaves are further directed to the plasma to form a microwave plasma, either in parallel or in series. Such plasmas are used to reform a hydrocarbon feedstock into low C hydrocarbons, carbon, or hydrogen. A plasma generator combining an inductive plasma with a continuous microwave plasma is further contemplated.

Description

[Technical field]

[0001] This application claims the benefit of priority to U.S. Provisional Patent Application No. 63 / 195946, filed June 2, 2021. This specification and all other external references referenced herein are incorporated by reference in their entirety.

[0002] The field of the invention is plasma systems. [Background technology]

[0003] The Background Description includes information that may be useful in understanding the present invention. No admission is made that any of the information provided herein is prior art or relevant to the presently claimed invention, or that any publication specifically or implicitly referenced is prior art.

[0004] All publications herein are incorporated by reference to the same extent as if each individual publication or patent application was specifically and individually indicated to be incorporated by reference. In the event that a definition or use of a term in an incorporated reference is inconsistent or conflicts with a definition of that term provided herein, the definition of that term provided herein shall apply and the definition of that term in the reference shall not apply.

[0005] It is becoming increasingly desirable to use plasmas to treat or modify fluids, gases, and their contents. For example, plasmas can be applied to hydrocarbon feedstocks to advantageously generate lighter hydrocarbons, carbon, or hydrogen. Such systems may use one or more plasmas, or multiple types of plasmas. These high energy systems are susceptible to adverse electrical feedback or interference that can damage parts of the system or one or more power sources. There do not appear to be any economical, robust, or commercially practical solutions to prevent such detrimental feedback or interference.

[0006] Thus, there remains a need for systems and methods that improve the durability or performance of plasma devices for modifying fluids or gases. Summary of the Invention

[0007] A plasma generator is disclosed. The reaction zone has a first electrode and a low-turn coil outside the reaction zone. A high-turn coil is disposed within the low-turn coil and is electrically coupled to the first electrode. The high-turn coil typically has a higher number of turns than the low-turn coil. A microwave emitter is further directed toward the reaction zone.

[0008] Guidance systems or components of the subject matter of the present invention are described in U.S. Provisional Patent Application No. 62 / 942,986 and International Application No. PCT / US2020 / 063088, both of which are incorporated by reference in their entireties.

[0009] In some embodiments, the low-turn coil is electrically insulated from the first electrode, for example by a dielectric material. Preferably, the low-turn coil is electrically coupled to a high voltage power supply.

[0010] The high-turn coil is disposed outside the reaction zone and in some embodiments is separated from the reaction zone by a wall, although the high-turn coil can also be disposed within the reaction zone. For example, the high-turn coil can be encapsulated in a closed container that includes a high dielectric strength insulating material. Such high dielectric strength insulating materials include glass, quartz, transformer oil, insulating magnetic particles, ferroelectric particles, or tar. In some embodiments, the high-turn coil is electrically coupled to the first electrode by a conductive feedthrough that protrudes into the inner chamber.

[0011] In preferred embodiments, the low-turn coil and the high-turn coil are coaxial and extend along a common axis. A second electrode may be further disposed within the reaction zone such that the first and second electrodes generate a plasma within the reaction zone. The first and second electrodes are preferably electrically isolated from the low-turn coil. A power source is further electrically coupled to the low-turn coil and, in some embodiments, is electrically isolated from the first electrode. A microwave emitter is typically directed toward the plasma within the reaction zone.

[0012] Additional plasma generators are contemplated. The reaction zone includes a first electrode and a primary conductor array is disposed outside the reaction zone. The primary conductor array is preferably electrically insulated from the first electrode. The secondary conductor array is electrically coupled to the first electrode and a microwave emitter is oriented at or toward the reaction zone. The first electrode is typically electrically coupled to the secondary conductor array and in some embodiments is the secondary conductor array, or at least a portion thereof.

[0013] The primary conductor array is typically arranged in a pattern, such as a spiral, coil, concentric circles, ellipses, triangles, squares, higher order polygons, irregular shapes, or combinations thereof, and may extend or propagate radially or coaxially. The secondary conductor array is preferably arranged in a pattern that mirrors or approximates the pattern of the primary conductor array. In some embodiments, the secondary conductor array is arranged in a pattern that is denser than the pattern of the primary conductor array, e.g., with less space between each portion of the array compared to the primary conductor array. It is contemplated that current passing through the primary conductor array induces current in the secondary conductor array.

[0014] In some embodiments, the primary conductor array includes a first coil and the secondary conductor array includes a second coil, preferably such that the second coil has a greater number of turns than the first coil. Advantageously, the first coil and the second coil are coaxial and extend along a common axis. A second electrode may be further disposed in the reaction zone such that the first and second electrodes generate a plasma either individually or in combination. The first and second electrodes are preferably electrically insulated from the primary conductor array. A power source is further electrically coupled to the primary conductor array and electrically insulated from the first electrode.

[0015] Further plasma generators are contemplated, in which the reaction zone has a first electrode and the wave emitter is directed toward the reaction zone, the power source energizes the first electrode but is electrically isolated from the first electrode, and the first electrode is typically grounded.

[0016] In some embodiments, it is contemplated that the power source energizes the first electrode via electromagnetic induction between the first conductor array and the second conductor array, the first conductor array being electrically coupled to the power source and the second conductor array being electrically coupled to the first electrode. In a preferred embodiment, the second conductor array, or at least the first electrode, or both, are electrically insulated from the power source. It is further contemplated that the first conductor array is electrically coupled to the power source and electrically insulated from the first electrode. The second electrode can be further disposed in the reaction zone such that the first and second electrodes generate a plasma. In some embodiments, the first and second electrodes are electrically insulated from the power source.

[0017] The wave emitter preferably generates one of sound waves, gamma waves, x-rays, UV waves, infrared waves, microwaves, or radio waves that are directed towards the reaction zone or plasma.

[0018] While it is preferred to decouple the electrode from its power source using electromagnetic induction to prevent electrical overload, inrush, or interference, it is also contemplated that alternative or additional methods may be used to perform such decoupling or otherwise protect the power source from damage. For example, a choke coil may be attached to the electrode to attenuate radio frequency (RF) propagating back to the power source. Such a method still allows direct current (DC) and low frequency waves to pass. A ferrite rod may be placed in the center of the choke coil, and another concentric coil may use the mutual inductance of the ferrite rod as a way to sense in real time whether the choke is attenuating the RF.

[0019] A method of generating plasma is further contemplated. A power source is used to energize a first electrode, which is preferably electrically insulated from the power source. The energized first electrode is then used to generate plasma. A wave is then directed to the plasma. The wave can be one of, or a combination of, sound waves, gamma rays, x-rays, UV waves, infrared waves, microwaves, or radio waves. The wave can be directed by pointing a wave emitter or by using a waveguide to direct the wave to the reaction zone or plasma.

[0020] A second electrode may further be used to generate the plasma. Preferably, the second electrode is electrically isolated from the power source, but the power source energizes the second electrode. For example, energizing the first electrode uses electromagnetic induction between the first conductor array and the second conductor array, the first conductor array being electrically coupled to the power source and the second conductor array being electrically coupled to the first electrode, preferably insulated from each other.

[0021] Various objects, features, aspects and advantages of the present subject matter will become more apparent from the following detailed description of preferred embodiments, taken in conjunction with the accompanying drawings in which like numerals represent like elements. [Brief description of the drawings]

[0022] [Figure 1A] 1 illustrates an exemplary inductive feedthrough system of some embodiments.

[0023] [Figure 1B] 1 illustrates a top perspective view of an inductive feedthrough system of some embodiments.

[0024] [Figure 1C] 1 illustrates another top perspective cross-sectional view of an inductive feedthrough system of some embodiments.

[0025] [Figure 1D] 1 illustrates a side cross-sectional view of an inductive feedthrough system of some embodiments.

[0026] [Figure 2A] 1 illustrates an alternative inductive feedthrough system of some embodiments.

[0027] [Figure 2B] 1 illustrates a side cross-sectional view of an alternative inductive feedthrough system of some embodiments.

[0028] [Figure 2C] 1 illustrates a top perspective view of an alternative inductive feedthrough system of some embodiments.

[0029] [Figure 3A] 1 illustrates another inductive feedthrough system.

[0030] [Figure 3B] 3B shows a side cross-sectional view of the feed-through system of FIG. 3A.

[0031] [Figure 4] 1 illustrates a guidance system of the present subject matter.

[0032] [Diagram 5] 2 illustrates another guidance system in accordance with the present subject matter.

[0033] [Figure 6] 1 illustrates a plasma generator in accordance with the present subject matter.

[0034] [Figure 7] 1 illustrates a waveguide according to the present subject matter.

[0035] [Figure 8] 1 illustrates a further waveguide in accordance with the present subject matter.

[0036] [Figure 9] 1 illustrates another plasma generator in accordance with the present subject matter.

[0037] [Figure 10A] 1 shows diagrams of various plasma generators of the subject invention; [Figure 10B] 1 shows diagrams of various plasma generators of the subject invention; DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0038] The following description includes information that may be useful in understanding the present invention. No admission is made that any of the information provided herein is prior art or relevant to the presently claimed invention, or that any publication specifically or implicitly referenced is prior art.

[0039] The present subject matter provides apparatus, systems, and methods for delivering high voltage power to a plasma generating device via an inductive feedthrough. For example, step-up transformers, high dielectric strength materials, electrostatic or electromagnetic pickups, fluid flow configurations, and electrical loads may be used by the present subject matter. In some embodiments, a low-turn primary coil is wound around an insulating material and connected to a high voltage power source. A secondary high-turn coil is disposed within the medium being excited (solid, liquid, gas, plasma, and / or mixture) and may be directly connected to the electrode assembly or may be encapsulated in a closed vessel containing a high dielectric strength insulating material (such as glass, quartz, transformer oil, insulating magnetic particles, ferroelectric particles, and / or tar) and connected to the electrode assembly by a short conductive feedthrough, e.g., protruding from the insulating vessel into the medium being excited. The plasma created by the electrode assembly (non-thermal or thermal) is preferably surrounded by primary and secondary coils such that the electromagnetic and electrostatic fields generated from the plasma induce a broad spectrum of frequencies on the primary and secondary coils, which then form a direct feedback to the plasma electrode assembly, regardless of electrical filtering and / or additional circuitry.

[0040] Such an inductive feedthrough system can be applied in many ways. For example, it can be applied to process complex materials (e.g., fuel streams, air streams, exhaust streams, mixed streams, hydrocarbon streams, etc., in liquid, solid, gas, or plasma phases, or combinations thereof) using low complexity equipment, such as reforming a hydrocarbon, natural gas, or methane stream into carbon and hydrogen, which is preferably stored or used in a fuel cell. Certain high-speed chemical processes require complex feedback processes. Advantageously, the inductive feedthrough system of the present subject matter changes its influence field faster using direct feedback than is achieved with the complex feedback processes known in the art. The present subject matter can also be applied to energy transmission systems to suppress corona losses or voltage breakdown of transformers, transmission lines, or feedthroughs. From another perspective, transformers, transmission lines, and feedthroughs are integrated into a single device by the present subject matter, resulting in reduced complexity, increased power efficiency, and improved feedback response.

[0041] In some embodiments, an induction system can be used to decouple or insulate the electrodes in the reaction zone from the power source. This can be particularly useful and effective in preventing electrical feedback or interference at the electrodes from damaging the power source or other parts of the system. For example, such decoupling can be effective in preventing microwave energy or other radio frequency energy directed at or near the electrodes from damaging the power source or other parts of the system.

[0042] The subject matter of the present invention can also be applied to energy production. The direct feedback function of the inductive feedthrough system self-regulates the kinetic and potential energy of the plasma, optimizing the power factor between the power source, the device, and the load. The figure of merit is increased through coupling closed electric, magnetic, and photon fields with open near and far field electric, magnetic, and photon fields.

[0043] It can also be applied in propulsion, e.g., spacecraft propulsion. Inductive feedthrough systems allow for increased hydrodynamic control of the medium via direct electrohydrodynamic (EHD) and magnetohydrodynamic (MHD) feedback. Small pressure differences during particle-particle interactions are condensed into larger ion acoustic displacements, compressed into plasmas, generating complex waves, which are used to accelerate the impact of energetic and neutral particles by inductive feedthrough systems.

[0044] In some embodiments, the electrode assembly is disposed within the inner chamber of the reaction chamber. The electrode assembly is connected to the low turn coil, and a first electrode on the high turn coil is further connected to ground. A second electrode on the high turn coil is insulated from ground. In some embodiments, the first electrode and the second electrode are not the same. The assembly may include a third electrode connected to the low turn coil, typically positioned upstream of the first or second electrode. In a preferred embodiment, the low turn coil is disposed around an outer wall of the reaction chamber, and the high turn coil is disposed around an outer wall of the inner chamber. In some embodiments, the high turn coil is disposed around an inner wall of the inner chamber.

[0045] The present subject matter further contemplates methods, systems, and devices for a plasma generator that reforms a feedstock (e.g., hydrocarbons, low C (<5) hydrocarbons, natural gas, methane, etc.) into products (e.g., hydrogen, carbon, hydrocarbons with lower C than the feedstock, etc.). A first reaction zone receives the feedstock and includes a first electrode configured to generate a plasma (e.g., DBD plasma, arc plasma, glide arc plasma, etc.) in the first reaction zone by magnetic induction (e.g., the electrode is energized via a pair of induction coils). A first microwave waveguide (or emitter) is directed to a second reaction zone downstream of the first reaction zone. Preferably, the first microwave waveguide energizes the plasma and propagates it (allows it to propagate, diffuse, extend, etc.) into the second reaction zone.

[0046] Some embodiments include an induction coil around a third reaction zone downstream of the second reaction zone, the induction coil energizing the plasma and propagating it from the second reaction zone to the third reaction zone, the induction coil being insulated from the third reaction zone.

[0047] The second microwave waveguide is optionally directed to a third reaction zone downstream of the second reaction zone, whereby the second microwave waveguide energizes and propagates the plasma to the third reaction zone. In such a case, an induction coil is further disposed around a fourth reaction zone downstream of the third reaction zone. The induction coil energizes and propagates the plasma from the third reaction zone to the fourth reaction zone. Preferably, the induction coil is insulated from the fourth reaction zone.

[0048] The embodiment further includes a pair of coils configured to radially surround the first reaction zone and induce magnetic induction therein, e.g., to energize the first electrode. The pair of coils typically includes a low-turn coil radially outside the first reaction zone and a high-turn coil radially surrounded by the low-turn coil, the high-turn coil being electrically coupled to the first electrode. Generally, the high-turn coil has a higher number of turns than the low-turn coil. The low-turn coil is electrically insulated from the first electrode and electrically coupled to a high voltage power supply. The high-turn coil is disposed outside the reaction zone. The low-turn coil and the high-turn coil are generally coaxial, extending partially along a common axis and partially overlapping.

[0049] A second electrode may be further disposed within the first reaction zone and energized by a high-turn coil such that the first and second electrodes generate a plasma. The first and second electrodes are typically nested, extending along a common axis and overlapping.

[0050] Further systems, methods, and devices for a plasma generator for reforming a feedstock into a product are contemplated. A first microwave waveguide is directed to the plasma in a first reaction zone that receives the feedstock. An induction coil is disposed around a second reaction zone downstream of the first reaction zone. The microwave waveguide energizes the plasma in the first reaction zone, and the induction coil at least partially energizes and propagates (e.g., extends, diffuses, activates, etc.) the plasma to the second reaction zone. The induction coil is insulated from the second reaction zone. Preferably, the electrodes are not in direct communication with the feedstock or the plasma in the second reaction zone.

[0051] In some embodiments, the second microwave waveguide is directed to the plasma in the reaction zone upstream of the first reaction zone. The second microwave waveguide energizes the plasma and propagates it from the upstream reaction zone to the first reaction zone. Alternatively or in combination, a second (or additional) microwave waveguide is directed to the plasma in the reaction zone between the first reaction zone and the second reaction zone, whereby the second microwave waveguide energizes the plasma and propagates it from the first reaction zone to the second reaction zone. Furthermore, the second (or additional) microwave waveguide may additionally or alternatively be directed to the plasma in the reaction zone downstream of the second reaction zone.

[0052] The electrodes may further be disposed in communication with the feedstock, e.g., upstream of the first reaction zone. A pair of coils may also be disposed upstream of the first reaction zone and configured to cause magnetic induction (e.g., energize the electrodes, generate an inductive plasma, etc.). The pair of coils typically includes a low-turn coil and a high-turn coil, where the high-turn coil is radially surrounded by the low-turn coil and is electrically coupled to the electrode, the high-turn coil having a higher number of turns than the low-turn coil. Preferably, the low-turn coil is electrically insulated from the electrode and coupled to a high voltage power supply.

[0053] In some embodiments, the electrode is a first electrode of two or more electrodes, e.g., a second electrode is in communication with the feedstock upstream of the first reaction zone and energized by a high-turn coil, whereby the first and second electrodes generate a plasma. In such cases, the first and second electrodes are nested, extend along a common axis, and at least partially overlap.

[0054] Further systems, methods, and devices for plasma generators are contemplated. An inlet is configured to couple with a source of a feed stream comprising a hydrocarbon gas. A reaction zone having a first electrode is disposed downstream of the inlet and encloses a volume for the passage of the feed. A power source provides power to the first electrode. An outlet is disposed downstream of the reaction zone for outputting reactive species comprising hydrogen or carbon, or both, for further processing. A microwave emitter is directed into the reaction zone between the first electrode and the outlet.

[0055] In some embodiments, the reaction zone includes a first segment that receives the feed stream from an inlet. A plasma in the first segment reacts with the feed stream to generate reactive species. The first segment is typically configured to transport the reactive species to a second segment of the reaction zone, while the energy emitted by the microwave emitter is directed to the second segment. The reaction zone can include an additional segment disposed between the second segment and the outlet. Similarly, a low-turn coil can be disposed (at least partially) along one of the segments of the reaction zone with a high-turn coil within the low-turn coil. The high-turn coil typically has a higher number of turns than the low-turn coil. In some embodiments, the high-turn coil is disposed along the first segment upstream of the second segment, and alternatively or in combination, can be disposed within the volume of the reaction zone.

[0056] A power source may further be included, whereby the power source, the low turn coil, and the high turn coil are configured to generate a magnetic field having a strength between 1,000 Gauss and 100,000 Gauss.

[0057] The microwave emitter may be one of several emitters, such as a first microwave emitter, where a second or more microwave emitters are included. The second microwave emitter may be arranged in series or parallel with the first microwave emitter and may be disposed downstream (or upstream) of the first microwave emitter.

[0058] A filtering structure, for example one of a porous substrate, a permeable layer, a semi-permeable layer, a selectively permeable layer, or a gradient, or a combination thereof, may further be disposed to interact with the reactive species. Similarly, a directing structure, for example one of a rotor, a capillary, or a cavity, or a combination thereof, may be disposed to interact with the reactive species.

[0059] 1A illustrates an example of an inductive feedthrough system 100. The inductive feedthrough system 100 includes an outer chamber 105 and an inner chamber 110. As shown, the inner chamber 110 is at least partially disposed within the outer chamber 105. Preferably, the entire inner chamber 110 is disposed within the outer chamber 105. In some embodiments, the outer chamber 105 is made largely of an insulating material, such as glass, quartz, or the like. In some embodiments, the inner chamber 110 is also made largely of an insulating material, such as glass, quartz, or the like.

[0060] The inductive feedthrough system 100 also includes a primary coil 115 and a secondary coil 120. Both the primary coil 115 and the secondary coil 120 include a majority of highly conductive materials. Examples of coils that can be used as the primary coil 115 and the secondary coil 120 include copper wire, lithographically deposited conductors, tubes with conductive media, etc. In some embodiments, the primary coil 115 is wound around the outer wall of the outer chamber 105. The primary coil 115 is also connected to a high voltage power supply 125. In some embodiments, the secondary coil 120 is wound around the outer wall of the inner chamber 110. As shown, the secondary coil 120 has a higher number of turns than the primary coil 115, such that when placed close to each other, the primary coil 115 and the secondary coil 120 work together to form a step-up transformer.

[0061] Preferably, the secondary coil 120 has a substantially greater number of turns (e.g., two times, three times, four times, etc.) than the primary coil 115. The primary coil 115 and the secondary coil 120 are not physically connected to one another. In some embodiments, the secondary coil 120 is encapsulated in a closed container comprising a high dielectric strength insulating material (such as glass, quartz, transformer oil, insulating magnetic particles, ferroelectric particles, and / or tar), and the closed container is disposed around the outer wall of the inner chamber 110.

[0062] Preferably, the power supply 125 provides a voltage in the range of 500 volts (V) to 50,000 V to the primary coil 115. Through the step-up transformation aspect of the primary coil 115 and secondary coil 120, the secondary coil 120 is induced to carry a higher voltage in the range of 500 V to 1 megavolt. With this power input and output, the coil configuration can generate a magnetic field with a strength of 1,000 Gauss to 100,000 Gauss. One advantage is that this system can provide very high voltages to the electrodes without transmitting such high voltages through power lines to avoid power leakage.

[0063] In some embodiments, the inductive feedthrough system 100 also includes an electrode assembly 130. The electrode assembly 130 is preferably disposed within the inner chamber 110. The electrode assembly 130 is connected to the secondary coil 120 such that the secondary coil 120 can be used to power the electrode assembly 130. In some of these embodiments, the inductive feedthrough system 100 includes a short conductive feedthrough that passes through the closed encapsulation and directly connects the secondary coil 120 to the electrode assembly 130. The electrode assembly 130 includes at least one electrode configured to emit electromagnetic energy within the inner chamber 110.

[0064] 1A depicts an electrode assembly 130 disposed within the inner chamber 110, it should be understood that no electrodes may be disposed within the chamber 110. In such applications, the primary and secondary coils 115 and 120 are used to energize or propagate a plasma within the excitation zone 135, such as a plasma from upstream of the excitation zone (e.g., a glide arc plasma, a microwave plasma, etc.). In such embodiments, induction between the primary coil 115 and the secondary coil 120 can extend or modify or otherwise provide feedback to such plasma while preferably avoiding accumulation or deposition of contaminants or by-products from the flow within the excitation zone.

[0065] The inner chamber 110 also includes an inlet 135 and an outlet 140 so that matter excited by the electromagnetic energy generated by the electrode assembly 130 can pass through an excitation zone 145 of the inner chamber 110. Matter that can pass through the excitation zone 145 can include solids, liquids, gases, plasma, or mixtures of any of these materials (e.g., air, water / water vapor, industrial fluids, and internal combustion engine exhaust gases). In some embodiments, the excitation zone 145 is empty (except for the matter to be excited), but the excitation zone can further include a filler material to hold, channel, filter, or direct the matter or portions thereof (e.g., a porous substrate, a permeable layer, a semi-permeable layer, a selectively permeable layer, a rotor, a capillary, a cavity, etc.).

[0066] Material may pass through inner chamber 110 of inductive feedthrough system 100 following the direction indicated by the arrows. The housings of outer chamber 105 and inner chamber 110 insulate primary coil 115 from secondary coil 120 and also insulate both coils from excitation zone 145. Under this configuration, inductive feedthrough system 100 emits a plasma (either thermal or non-thermal) in excitation zone 145 to excite material passing through excitation zone 145. Electromagnetic and electrostatic fields generated from the plasma and excited material may induce a wide spectrum of frequencies (vibrations) that are fed back to primary coil 115 and secondary coil 120.

[0067] The feedback on the primary coil 115 and secondary coil 120 can be detected as an electrical drive waveform that can be used to (1) identify the type of material being excited within the excitation zone 145, (2) identify the energy density of the plasma generated by the electrode assembly 130, (3) increase the coefficient of performance of the plasma generation, (4) increase the chemical selectivity of the plasma process, and (5) modulate the power to transmit and receive information via the plasma antenna. The present subject matter enables this detection without the use of any additional circuitry or complex feedback systems.

[0068] In some embodiments, the inductive feedthrough system 100 can also include a magneto-hydrodynamic cell (not shown) configured to harvest energy from the movement of the charged particles flowing within the excitation zone 145. In some embodiments, the magneto-hydrodynamic cell is disposed within the excitation zone 145 or downstream of the excitation zone 145. The magneto-hydrodynamic cell of some embodiments can be comprised of two electrodes disposed within a charged medium. The electrodes can be a motorized electrode assembly as well as another electrode assembly disposed within the same excitation zone 145. The charged particles moving through the excitation zone 145 can induce voltages on the secondary coil 120 and the primary coil 115. The magneto-hydrodynamic cell of some embodiments has complementary magnetic, electric, acoustic, thermionic, and / or photonic members that directly convert the movement of the charged particles within the plasma into electrical power and simultaneously focus the electromagnetic, electrostatic, acoustic, thermionic, and photonic emissions of the plasma in such a manner as to establish and / or modulate instabilities within the plasma.

[0069] In some cases, electromagnetic radiation emitted from the excited material in the excitation zone 145 is redirected back to the excited material or absorbed by the assembly. The electrode assembly 130, the insulating materials used in the outer chamber 110, and the electromagnetic coils 115 and 120 essentially reflect back to the plasma a portion of the electromagnetic spectrum emitted from the plasma. This electromagnetic radiation emitted and reflected onto the plasma assists in ionizing the medium by lowering the work function of the electrodes through ultraviolet light that reflects onto the electrode assembly, and the photons reflected onto the plasma inform the plasma about other photoionization processes occurring in selective regions of the plasma, as well as non-ionized gases before and after the plasma.

[0070] In some embodiments, the inductive feedthrough system 100 also includes a capacitive / static inductive coupling. Conductive plates are housed inside and outside the insulating housings of the outer chamber 105 and inner chamber 110 to deliver high voltage DC to the electrodes and simultaneously provide direct capacitive feedback to the plasma. In some embodiments, the inductive feedthrough system 100 includes two internal conductive plates, each connected to an electrode terminal.

[0071] In some embodiments, the inductive feedthrough system 100 also includes an inductive coupling, which may be implemented as a feedback electromagnetic coil disposed near or within the ionized medium (within the excitation zone 145) to measure, influence, or provide feedback directly to the secondary coil 120 and / or the primary coil 115.

[0072] In some embodiments, the inductive feedthrough system 100 also includes a negative resistive coupling: a dielectric vessel containing an ionizable medium (e.g., a gas, liquid, solid, plasma, or mixtures thereof) that can be used to measure, influence, or provide feedback directly to the secondary coil 120 and / or the primary coil 115.

[0073] In some embodiments, the inductive feedthrough system 100 also includes a magnetohydrodynamic / electrohydrodynamic coupling. An electrode disposed in the plasma stream is surrounded by a magnetic field generated by the primary coil 115 and the secondary coil 120, a DC permanent magnetic field, or other external magnetic field source. The magnetohydrodynamic / electrohydrodynamic coupling can be used as a feedback mechanism for the primary coil 115 and / or the secondary coil 120, or can be used to generate power directly from the charge separation of the moving charged particles.

[0074] In some embodiments, the inductive feedthrough system 100 also provides photonic feedback to the electrode assembly, insulating chamber, and electromagnetic coil by retroreflecting a portion of the radiated electromagnetic spectrum emitted from the plasma back onto the plasma. The inductive feedthrough system 100 can also include a semiconductive sensor capable of measuring chemical optical emissions from the plasma to determine chemical reactions, electrical feedback, and thermal signatures.

[0075] 1B shows a top perspective view of the inductive feedthrough system 100. The primary coil 115 is clearly visible wrapped around the outer wall of the outer chamber. The dielectric medium ports 150 and 155 are also more clearly visualized. While a variety of dielectric media (and phases) are suitable for use in the present inventive subject matter, in a preferred embodiment, the dielectric medium is a liquid dielectric. The dielectric medium ports 150 and 155 allow the dielectric medium to fill the outer chamber 105 with a liquid dielectric.

[0076] 1C shows another perspective top cross-sectional view of the inductive feedthrough system 100. In this view, the insulating layers 160, 165, 170, and 175 are more clearly depicted. In this embodiment, the primary coil 115 is wrapped around the insulating layer 160, while the insulating layer 165 constitutes part of the wall defining the outer chamber 105. The insulating layer 170 constitutes another wall of the outer chamber 105, around which the secondary coil 120 is wrapped. The insulating layer 175 constitutes part of the wall defining the excitation zone 145.

[0077] FIG. 1D illustrates a side cross-sectional view of inductive feedthrough system 100.

[0078] 1A-1D illustrate one embodiment of the present subject matter in which the secondary coil wraps around an outer wall of the inner chamber of the inductive feedthrough system. However, in some embodiments, the secondary coil can be disposed within the inner chamber such that the material surrounds the secondary coil as it passes through the excitation zone.

[0079] 2A illustrates an example of such an inductive feedthrough system 200. The inductive feedthrough system 200 includes a chamber 205 having an inlet 210 configured to allow a material to enter the chamber 205 and an outlet 215 configured to allow a material to exit the chamber 205. The inductive feedthrough system 200 also includes a primary coil 220 and a secondary coil 225. The primary coil 220 is disposed on an outer wall of the chamber 205, while the secondary coil 225 is disposed within the chamber 205.

[0080] Similar to inductive feedthrough system 100, secondary coil 225 preferably has a substantially greater number of turns (e.g., two times, three times, four times, etc.) than primary coil 220. Primary coil 220 and secondary coil 225 are not physically connected to one another. In some embodiments, secondary coil 225 is encapsulated in a closed container comprising a high dielectric strength insulating material (such as glass, quartz, transformer oil, insulating magnetic particles, ferroelectric particles, and / or tar), and the closed container is disposed within chamber 205.

[0081] In some embodiments, the inductive feedthrough system 200 optionally includes an electrode assembly. The electrode assembly includes at least one electrode configured to emit electromagnetic energy within an excitation zone 235 of the chamber 205. The electrode assembly is preferably disposed within the chamber 205. Unlike the inductive feedthrough system 100, the secondary coil 225 of the inductive feedthrough system 200 is disposed within the electrode assembly 230 and is optionally connected directly to the electrode assembly.

[0082] FIG. 2B illustrates a side cross-sectional view of inductive feedthrough system 200.

[0083] FIG. 2C illustrates a top perspective view of inductive feedthrough system 200.

[0084] 3A depicts a side profile view of a spacecraft thruster 300. The spacecraft thruster 300 propels a spacecraft using the inductive feedthrough system of the present subject matter. The thruster 300 includes an outer wall 305 and an inner wall 310, each preferably an insulator. A primary coil 315 is wound around a portion of the outer wall 305 and a secondary coil 320 is wound around a portion of the inner wall 310. As previously mentioned, the primary coil 315 is a low turn coil and the secondary coil 320 is a high turn coil. A high voltage connector 325 is used to energize the primary coil 315 with a high voltage source. An electrode assembly 330 is disposed on the inner surface of the inner wall 310.

[0085] 3B depicts a side cross-sectional view of the thruster 300. In this perspective view, the high voltage connector 36 that energizes the primary coil 315 can also be seen. The electrode assembly 330 includes a low turn coil electrode 332 connected to the primary coil 315 and a high turn coil electrode 334 connected to the secondary coil 320. In some embodiments, one of the electrodes 334 is grounded. A reaction zone 350 is also depicted within the inner wall 310. An inlet 340 and an outlet 345 allow propellant (e.g., gas, fluid, mass, etc.) to pass through the reaction zone 350 and generate thrust.

[0086] FIG. 4 depicts the inductive system 400 of the present subject matter. Importantly, the power supply 410 is not physically coupled to the electrode 420. Rather, the power supply sends current through a set of primary coils 430, which then drives current in a set of secondary coils 440 that ultimately energize the electrode 420 to generate plasma. The secondary set of coils 440 preferably has a higher number of turns than the primary coils 430, allowing the secondary set of coils 440 to drive an increased voltage to the electrode 420. Note also that the secondary coils and / or electrode are grounded by a ground 450, which drives any electrical feedback or interference to ground rather than passing it on to the primary coils 430 or power supply 410, preventing damage to the system 400.

[0087] Figure 5 depicts an induction system 500 similar to Figure 4. Here, a power supply 510 drives a current into a primary coil 530, which in turn induces a current in a secondary coil 540. The induced current energizes a capacitively coupled electrode 520 to generate a plasma.

[0088] FIG. 6 depicts a plasma generator 600 of the present subject matter. A set of low-turn coils 620 are energized by a power source (not shown). The low-turn coils 620 then impart current to a set of nested high-turn coils 630 via electromagnetic induction. The high-turn coils 630 are electrically coupled to an outer electrode 650 and an inner electrode 640 nested within the outer electrode 650. When energized, the two electrodes generate a plasma in a zone 660, such as a dielectric barrier discharge plasma, a glide arc plasma, or a rotating glide arc plasma, etc. Feedstock (e.g., hydrocarbons less than 12C, carbon less than 6C, carbon less than 4, 3, or 2C, natural gas, methane, etc.) is fed into the system at an inlet 610 and driven toward the outer electrode 650 or the inner electrode 640, or toward the plasma generated therefrom in the zone 660.

[0089] A waveguide, e.g., microwave guide 670, is used to drive microwaves toward the plasma so that the plasma extends into zone 680, and to generate a microwave plasma in zone 680. The plasma and microwave plasma energize the feedstock and reform the feedstock into its constituent parts, e.g., carbon and hydrogen, or low C (e.g., less than 6, 5, 4, 3, or 2) hydrocarbons. The reactive species (e.g., components of the feedstock, carbon, hydrogen, etc.) then pass through outlet 690, where they can be further processed, separated, purified, collected, or used (e.g., hydrogen used by a fuel cell to generate electricity). As depicted, it is preferable to use a dielectric material in the coils 620 or 630, or in the parts of the system that contact the electrodes 640 and 650.

[0090] FIG. 7 depicts a system 700 of the present subject matter. An inlet 710 is coupled to a feedstock (e.g., low C hydrocarbons, natural gas, etc.) to deliver the feedstock to the system. The feedstock is first processed in a treatment and ignition system 720. The treatment and ignition system 720 may include one or more electrodes as disclosed herein to generate one or more plasmas (e.g., DBD plasma, glide arc, etc.). The feedstock and plasma are directed downstream along a reactor tube 730 that intersects reaction zones 750 and 770. A waveguide splitter 740 directs the microwave action reaction zone 750 to energize and propagate (e.g., diffuse, extend, expand, etc.) the plasma into and through the reaction zone 750. Waveguide splitter 740 further directs the microwaves to reaction zone 760 to energize and propagate (eg, diffuse, extend, expand, etc.) the plasma into and through reaction zone 760 .

[0091] As the feedstock passes through reaction tube 730 (and reaction zones 750 and 760), it is reformed by the plasma along reaction tube 730 (e.g., sequential plasma, separate plasmas in each zone, combinations thereof, etc.) to hydrogen, carbon, or lower C hydrocarbons than the feedstock. The treated feedstock and reformed products then pass to outlet 770 where they are further directed (i) to additional reaction chambers having a full-extending plasma (e.g., additional microwave plasma, induction plasma, combinations thereof, etc.) to reform the feedstock or products, or (ii) for separation, sorting, or purification of the constituent products (e.g., carbon sorting, hydrogen compression / storage, further reforming of lower C hydrocarbons, etc.).

[0092] 8 depicts a system 800 of the present subject matter, which is similar to system 700, with the addition of a third microwave waveguide directed to the plasma and feedstock within the reactor tube. An inlet 810 is coupled to the feedstock (e.g., low C hydrocarbons, natural gas, etc.) to deliver the feedstock to the system. A reactor tube 830 extends from the inlet 810 to an outlet 820 and intersects reaction zones 850, 860, and 870.

[0093] The feedstock is first processed in a processing and ignition system 840. The processing and ignition system 840 can include one or more electrodes as disclosed herein to generate one or more plasmas (e.g., DBD plasma, glide arc, etc.). The feedstock and plasma are directed downstream along the reactor tube 830. A waveguide emitter 852 directs the microwave action reaction zone 850 to energize and propagate (e.g., diffuse, extend, expand, etc.) the plasma from 840 into and through the reaction zone 850. A waveguide emitter 862 further directs microwaves to the reaction zone 860 to energize and propagate (e.g., diffuse, extend, expand, etc.) the plasma into and through the reaction zone 860. Waveguide emitter 872 further directs microwaves to reaction zone 870 to energize and propagate (eg, diffuse, extend, expand, etc.) the plasma into and through reaction zone 870 .

[0094] As the feedstock passes through reaction tube 830 (and reaction zones 850, 860, and 870), it is reformed by the plasma along reaction tube 830 (e.g., sequential plasma, separate plasma in each zone, combinations thereof, etc.) to hydrogen, carbon, or hydrocarbons with lower C than the feedstock. The treated feedstock and reformed products then pass to outlet 820 where they are either (i) directed to additional reaction chambers with plasmas (e.g., additional microwave plasma, induction plasma, combinations thereof, etc.) extending throughout (or present in each zone individually) to reform the feedstock or products, or (ii) further directed for separation, sorting, or purification of the constituent products (e.g., carbon sorting, hydrogen compression / storage, further reforming of lower C hydrocarbons, etc.).

[0095] 9 depicts a system 900 of the inventive subject matter. A feed inlet 910 delivers feed from a feed source to a reaction tube 920, which extends to an outlet 930 and intersects with reaction zones 940 and 950. In some embodiments, the feed inlet receives feed that has been processed upstream (e.g., partially reformed to carbon, hydrogen, low C hydrocarbons, etc.), or plasma (e.g., DBD plasma, glide arc plasma, induction plasma, microwave plasma, etc.), or both. A waveguide 942 directs microwaves into the reaction zone 940 to form a microwave plasma (e.g., with an igniter or by energizing / propagating a plasma extending into zone 940 from upstream) or otherwise energize the plasma.

[0096] Feedstock flows from zone 940 to reaction zone 950. In some embodiments, a plasma in zone 940 exists therein, but preferably, the plasma from zone 940 extends or otherwise propagates into reaction zone 950. An inductive coil 952 is disposed around reaction zone 950 and is insulated from the feedstock and plasma (i.e., the electrodes are not exposed to the feedstock or plasma in zone 950). The inductive coil 952 energizes and inductively couples to the plasma from zone 940 to provide feedback from the plasma system and to otherwise control or manipulate the plasma in zone 950.

[0097] The feedstock is reformed as it passes through the reaction tube 920, primarily by the plasma (sequential plasma in preferred cases) in reaction zones 940 and 950. Preferably, the reaction species or products, including hydrogen and carbon, exit outlet 930 for further processing, sorting, or separation, or a combination thereof. In some embodiments, additional microwave or induction coils are disposed downstream of outlet 930 to further process and reform any remaining feedstock or low C hydrocarbons into the desired product hydrogen or carbon.

[0098] FIG. 10A depicts a diagram 1000A of a system of the present subject matter. A feedstock inlet 1010A supplies a feedstock (e.g., natural gas) to an igniter 1020A. The igniter 1020A includes one or more electrodes to generate a plasma (e.g., DBD plasma, glide arc plasma, combinations thereof, etc.) within the igniter 1020A as disclosed herein. The plasma from the igniter 1020A and feedstock then passes to a reaction zone 1030A where an induction coil is used to energize the plasma and form an inductive plasma within the zone 1030A.

[0099] The feedstock and products (e.g., hydrogen, carbon, low C hydrocarbons) and plasma preferably enter reaction zone 1040A, where microwaves are directed into the zone to energize the plasma and form a microwave plasma in the zone. The feedstock and products (e.g., hydrogen, carbon, low C hydrocarbons) and plasma preferably enter reaction zone 1050A, where microwaves are further directed into the zone to energize the plasma and form a microwave plasma in the zone. The feedstock and products then enter zone 1060A, where a filter filters the products from each other and any remaining feedstock, or a directing structure further diverts the feedstock or products into separate channels for further processing. The desired products then exit outlet 1070A for collection, purification, or storage, while the remaining feedstock is redirected for further processing by circulating back to inlet 1010A or downstream to a further reaction zone.

[0100] FIG. 10B depicts a diagram 1000B demonstrating various configurations of microwave and induction plasma contemplated by the present subject matter. 1010B provides feedstock to the system. Any one, or most, or all of zones 1020B, 1030B, 1040B, 1050B, or 1060B may be zones having induction plasma (e.g., via induction coil) or microwave plasma (e.g., via microwave), which may be separate within each zone or may extend continuously between the zones. Preferably, zone 1020B includes one or more electrodes for generating plasma (e.g., DBD, glide arc, etc.), while zone 1060B includes a filter for separating desired products (hydrogen, carbon) from the remaining feedstock.

[0101] As used throughout this description and the claims that follow, the meanings of "a," "an," and "the" include plural references unless the context clearly dictates otherwise. Also, as used in this description, the meaning of "in" includes "in" and "on," unless the context clearly dictates otherwise.

[0102] As used herein, and unless the context dictates otherwise, the term "coupled to" is intended to include both direct coupling (wherein the two elements that are coupled to each other contact each other) and indirect coupling (wherein at least one additional element is located between the two elements). Thus, the terms "coupled to" and "coupled with" are used interchangeably.

[0103] Unless the context dictates to the contrary, all ranges set forth herein should be construed as inclusive of their endpoints, and open-ended ranges should be construed as inclusive of commercially practical values. Similarly, unless the context dictates to the contrary, all lists of values ​​should be considered to include intermediate values.

[0104] The recitation of ranges of values ​​herein is merely intended to serve as a shorthand way of referring individually to each individual value falling within the range. Unless otherwise indicated herein, each individual value is incorporated herein as if set forth individually herein. All methods described herein may be performed in any suitable order unless otherwise indicated herein or otherwise clearly contradicted by context. Any and all examples provided with respect to specific embodiments herein, or the use of exemplary language (e.g., "etc.") are intended merely to better clarify the invention and do not impose limitations on the scope of the invention as otherwise claimed. No language in this specification should be construed as indicating any non-claimed element essential to the practice of the invention.

[0105] Groupings of alternative elements or embodiments of the invention disclosed herein should not be construed as limitations. Each group member may be referenced and claimed individually or in any combination with other members of the group or other elements found herein. One or more members of a group may be included in or deleted from a group for reasons of convenience and / or patentability. When any such inclusion or deletion occurs, the specification is deemed to include the group as modified to satisfy the written description of all Markush groups used in the appended claims herein.

[0106] The following description provides a number of exemplary embodiments of the subject matter of the present invention. Although each embodiment represents a single combination of the elements of the present invention, the subject matter of the present invention is considered to include all possible combinations of the elements disclosed. Thus, if one embodiment includes elements A, B, and C, and a second embodiment includes elements B and D, the subject matter of the present invention is also considered to include other remaining combinations of A, B, C, or D, even if not explicitly disclosed.

[0107] It will be apparent to those skilled in the art that many more modifications than those already described are possible without departing from the inventive concept herein. Accordingly, the subject matter of the present invention should not be limited except as by the scope of the appended claims. Moreover, in interpreting both the specification and the claims, all terms should be interpreted in the broadest possible manner consistent with the context. In particular, the terms "comprises" and "comprising" should be interpreted as referring to an element, component, or step in a non-exclusive manner, indicating that a referenced element, component, or step may be present in, utilized with, or combined with other elements, components, or steps not expressly referenced. When a claim herein refers to at least one of a selection from the group consisting of A, B, C... and N, the text should be interpreted as requiring only one element from the group, not A+N, or B+N, etc.

Claims

1. A plasma generator for reforming a raw material, comprising: a first microwave waveguide tube directed toward a first plasma in a reaction zone; a second plasma coupled to the first plasma; and the first microwave waveguide tube supplies energy to the first plasma in the reaction zone. A plasma generator.

2. An inductor coil supplies energy to the second plasma, and the inductor coil is insulated from the second plasma. The generator according to claim 1.

3. The generator according to claim 1, further comprising a second microwave waveguide tube directed toward one of the first plasma or the second plasma.

4. The second microwave waveguide tube supplies energy to the first plasma and propagates the first plasma to the second plasma. The generator according to claim 3.

5. The generator according to claim 1, further comprising a second microwave waveguide tube directed toward a plasma between the reaction zone and the second plasma.

6. The second microwave waveguide tube supplies energy to the first plasma and propagates toward the second plasma. The generator according to claim 5.

7. The generator according to claim 1, further comprising a second microwave waveguide tube directed toward a plasma downstream of the second plasma.

8. The generator according to claim 1, further comprising an electrode communicating with the raw material or a product of the raw material.

9. The electrode is disposed upstream of the reaction zone. The generator according to claim 8.

10. The generator according to claim 8, further comprising a pair of coils upstream of the reaction zone configured to cause magnetic induction.

11. The pair of coils includes: a rotor coil; and a high-turn coil radially surrounded by the rotor coil and electrically coupled to the electrode, the high-turn coil having a higher number of turns than the rotor coil. The generator according to claim 10.

12. The rotor coil is electrically insulated from the electrode. The generator according to claim 11.

13. The rotor coil is electrically coupled to a high-voltage power source. The generator according to claim 11. **Claim 14**: The electrode is a first electrode and communicates with the raw material or the product of the raw material upstream of the first reaction zone. The generator according to claim 11, further comprising a second electrode energized by the high-turn coil, wherein the first electrode and the second electrode generate the first plasma. **Claim 15**: The generator according to claim 14, wherein the first electrode and the second electrode are nested and extend along a common axis. **Claim 16**: A plasma generator, comprising: An inlet configured to couple with a source of a raw material stream; A reaction zone disposed downstream of the inlet, the reaction zone surrounding a volume for passage of the raw material; An outlet disposed downstream of the reaction zone for outputting reaction species; A first electrode disposed between the inlet and the outlet; A microwave emitter directed toward the reaction zone. A plasma generator. **Claim 17**: The reaction zone comprises: A first segment that receives the raw material stream from the inlet; Plasma within the first segment that reacts with the raw material stream to generate the reaction species. The first segment is configured to convey the reaction species to a second segment of the reaction zone. The generator according to claim 16, wherein the microwave emitter is directed toward the second segment. **Claim 18**: The generator according to claim 17, wherein the reaction zone comprises an additional segment disposed between the second segment and the outlet. **Claim 19**: The generator according to claim 17, further comprising a low-turn coil disposed along one of the segments of the reaction zone and a high-turn coil within the low-turn coil, the high-turn coil having a higher number of turns than the low-turn coil. **Claim 20**: The generator according to claim 19, further comprising a power source, wherein the power source, the low-turn coil, and the high-turn coil are configured to generate a magnetic field having an intensity of 1,000 gauss to 100,000 gauss. **Claim 21**: The generator according to claim 19, wherein the high-turn coil is disposed along the first segment upstream of the second segment. **Claim 22**: The generator according to claim 19, wherein the high-turn coil is disposed within the volume of the reaction zone.

23. The generator according to claim 19, wherein the microwave emitter is a first microwave emitter and further comprises a second microwave emitter.

24. The generator according to claim 23, wherein the second microwave emitter is disposed downstream of the first microwave emitter.

25. The generator according to claim 23, wherein the second microwave emitter is arranged in series with the first microwave emitter.

26. The generator according to claim 23, wherein the second microwave emitter is arranged in parallel with the first microwave emitter.

27. The generator according to claim 16, further comprising a filter disposed to interact with the reaction species.

28. The generator according to claim 27, wherein the filtration structure includes a porous substrate, a permeable layer, a semi-permeable layer, a selectively permeable layer, or a gradient.

29. The generator according to claim 16, further comprising an orientation structure disposed to interact with the reaction species.

30. The generator according to claim 29, wherein the orientation structure comprises a rotor, a capillary, or a cavity.