Mask manufacturing apparatus

Abstract

To provide a technique capable of restraining a mask body from protruding from a conveyance path.SOLUTION: A mask manufacturing apparatus comprises: a conveyance part which forms a conveyance path for conveying a mask body; and an urging part which has a stationary part fixed vertically above the conveyance path, a free end positioned vertically below the stationary part, and vertical elasticity, and in which the side of the free end extends to the downstream side in the conveyance direction of the mask body with respect to the stationary part.SELECTED DRAWING: Figure 3

Description

[Technical field]

[0001] The present invention relates to a mask manufacturing apparatus. [Background technology]

[0002] 2. Description of the Related Art In recent years, disposable masks have become known that have ear straps attached to a mask body made of laminated sheets of nonwoven fabric or the like (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2020-2483 A Summary of the Invention [Problem to be solved by the invention]

[0004] The mask body is formed by stacking multiple sheets. Therefore, the mask body is very light and may protrude from the transport path or become misaligned during transport in the manufacturing device. If the mask body protrudes from the transport path or becomes misaligned within the transport path, it may cause the following mask body to become clogged in the transport path.

[0005] An object of the present invention is to provide a technique capable of preventing the mask body from protruding from the transport path. [Means for solving the problem]

[0006] An apparatus for manufacturing a mask according to one aspect of the present invention comprises: a conveying section that forms a conveying path for conveying the mask body; a biasing portion having a fixed portion fixed above the transport path in the vertical direction, a free end located below the fixed portion in the vertical direction, and elasticity in the vertical direction, the free end side extending downstream of the fixed portion in the transport direction of the mask body; Equipped with. Effect of the Invention

[0007] According to the present invention, it is possible to prevent the mask body from protruding from the transport path. [Brief description of the drawings]

[0008] [Figure 1] FIG. 1 is a perspective view of the appearance of a mask according to the first embodiment. [Diagram 2] FIG. 2 is a plan view of the mask according to the first embodiment. [Diagram 3] FIG. 3 is a diagram showing a mask manufacturing apparatus according to the first embodiment. [Figure 4] FIG. 4 is a diagram showing a mask manufacturing apparatus according to the first embodiment. [Diagram 5] FIG. 5 is a diagram showing a mask manufacturing apparatus according to the second embodiment. [Figure 6] FIG. 6 is a diagram showing a mask manufacturing apparatus according to the second embodiment. [Figure 7] FIG. 7 is a diagram showing a mask manufacturing apparatus according to the third embodiment. [Figure 8] FIG. 8 is a diagram showing a mask manufacturing apparatus according to the third embodiment. [Figure 9] FIG. 9 is a diagram showing a mask manufacturing apparatus according to the fourth embodiment. [Figure 10] FIG. 10 is a diagram showing a mask manufacturing apparatus according to the fourth embodiment. [Figure 11] FIG. 11 is a diagram showing a mask manufacturing apparatus according to the fifth embodiment. [Figure 12] FIG. 12 is a diagram showing a mask manufacturing apparatus according to the fifth embodiment. [Figure 13] FIG. 13 is a diagram showing a storage unit of a mask manufacturing apparatus according to the fifth embodiment. [Figure 14] FIG. 14 is a diagram showing a mask manufacturing apparatus according to the sixth embodiment. [Figure 15] FIG. 15 is a diagram showing a mask manufacturing apparatus according to the sixth embodiment. [Figure 16]FIG. 16 is a diagram showing a mask manufacturing apparatus according to a first modified example of the sixth embodiment. [Figure 17] FIG. 17 is a diagram showing a mask manufacturing apparatus according to a second modification of the sixth embodiment. [Figure 18] FIG. 18 is a diagram showing a mask manufacturing apparatus according to the seventh embodiment. [Figure 19] FIG. 19 is a diagram showing a mask manufacturing apparatus according to the eighth embodiment. [Figure 20] FIG. 20 is a diagram showing a mask manufacturing apparatus according to the ninth embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] A mask and a mask manufacturing apparatus according to an embodiment of the present invention will be described below with reference to the drawings. Note that the configurations of the following embodiments are examples, and the present invention is not limited to the configurations of these embodiments.

[0010] <Embodiment 1> FIG. 1 is an external perspective view of a mask according to this embodiment. FIG. 2 is a plan view of the mask 1 as viewed from the non-skin side. The mask 1 has a left-right direction that corresponds to the left-right direction of the wearer when worn by the wearer (hereinafter, abbreviated as "worn state"), and a width direction that is perpendicular to the left-right direction. The width direction corresponds to the top and bottom of the wearer. The mask 1 has a length along the left-right direction and a width along the width direction perpendicular to the left-right direction. In addition, in the worn state of the mask 1, the side facing the wearer's skin (inner side when worn) is the skin side, and the opposite side to the skin side (outer side when worn) is the non-skin side. Furthermore, the direction connecting the skin side and the non-skin side is the thickness direction. In addition, the view from the thickness direction is a plan view.

[0011] As shown in FIG. 1 and FIG. 2, the mask 1 has a mask body 2, ear straps 3, 4, edge tapes 5, 6, and a nose fitter 7. More specifically, the mask body 2 is formed in a state where several layers of sheet-like breathable material are laminated, and has a size that can cover the mouth and nose of the wearer. The ear straps 3, 4 are formed of a string-like elastic material. As shown in FIG. 1 and FIG. 2, the edge tapes 5, 6 are attached to both ends of the left and right direction of the skin side and non-skin side of the mask body 2. Then, the edge tapes 5, 6 attached to the mask body 2 on the non-skin side and the respective ends of the ear straps 3, 4 are heat-welded, so that the ear straps 3, 4 form annular loops on both the left and right sides of the mask body 2. As shown in FIG. 2, the welding areas 15, 16 of the edge tapes 5, 6 to which the ends of the ear straps 3, 4 are heat-welded are designed to have the same width as the areas of the other edge tapes 5, 6.

[0012] The string-like elastic material constituting the ear straps 3, 4 is formed, for example, from a woven band of rubber thread and cotton, a woven net of resin filaments, elastic nonwoven fabric, etc. Both ends of such string-like material are heat-welded to the welding areas 15, 16 of the edge tapes 5, 6 on the left and right sides of the mask body 2 on the non-skin-facing side, as shown in Fig. 2, to form the ear straps 3, 4 in a loop shape on the left and right sides of the mask body 2, with one end of the material as the starting point and the other end of the material as the ending point.

[0013] The mask body 2 is made of various sheets such as breathable nonwoven fabrics, and is a laminate of multiple sheets. The multiple sheets are ultrasonically welded (ultrasonic sealed) to each other at welding parts 9U, 9D, 9L, and 9R near the top, bottom, left, and right edges in FIG. 2. Note that thermal welding using an embossing roll may be used instead of ultrasonic welding. Alternatively, various joining techniques such as sewing with sewing thread, adhesion with hot melt adhesive, heat sealing, and the like may be applied. When the sheets constituting the mask body 2 are made of a thermoplastic resin such as polypropylene, it is preferable to bond them by thermal welding.

[0014] The mask body 2 has pleats 8 extending in the left-right direction. In this embodiment, four pleats are formed. The pleats 8 are also attached to the edge tapes at the ends on both the left and right sides. The pleats 8 are prevented from unfolding by the pleats 5 and 6, and are maintained in this state. Therefore, when the mask 1 is not worn, the mask body 2 can be made flat and not bulky. On the other hand, when the mask 1 is worn, the mask body 2 is stretched vertically to unfold the pleats 8. When the pleats 8 are unfolded, the mask body 2 assumes a dome-like three-dimensional shape that bulges toward the non-skin side. This forms a space between the mask body 2 and the wearer's mouth, making it easier for the wearer to breathe.

[0015] The nose fitter 7 is a member fixed to the mask body 2 in a state where the longitudinal direction extends in the left-right direction of the mask body 2 at the upper part of the mask body 2. The nose fitter 7 is fixed to the mask body 2 in a state where it is sandwiched between the sheet-like breathable materials constituting the mask body 2. Alternatively, the nose fitter 7 may be fixed to the surface of the mask body 2. The nose fitter 7 is a plastically deformable material that has a strength sufficient to be deformed into an appropriate shape when pressed by the wearer's finger, and maintains its shape even when released from the pressure. By providing such a nose fitter 7 at the upper part of the mask body 2 in FIG. 1 and FIG. 2, the wearer can close the gap between the nose and the mask body 2.

[0016] Next, the mask manufacturing device according to the present embodiment will be described. FIG. 3 is a schematic diagram showing the mask manufacturing device according to the present embodiment. FIG. 3 shows the mask manufacturing device M as viewed from the right side of the transport direction of the mask body 2. The mask manufacturing device M includes a transport device M1 that transports the mask body. The transport device M1 forms, for example, a transport path M10 that transports the mask body 2 in a fixed direction (transport direction). The transport path M10 is, for example, configured with a belt conveyor. The mask body 2 is formed by stacking three layers of nonwoven fabric. In the mask manufacturing device M, processing such as attaching ear straps is performed while transporting the mask body 2 by the transport device M1. Note that, below, a process before the ear straps are attached to the mask body 2 is illustrated.

[0017] The mask manufacturing device M according to this embodiment includes a biasing unit M2 having elasticity in the vertical direction. The biasing unit M2 absorbs the force of the mask body that tries to move vertically upward from the transport path M10, and suppresses the movement of the mask body 2 placed on the transport path M10 relative to the transport path M10. As a result, the biasing unit M2 suppresses the mask body 2 from jumping out of the transport path M10 of the transport device M1 or being displaced. The biasing unit M2 is made of resin and has a long and thin band-like shape, and is capable of elastic deformation. For example, a cable tie for bundling wiring can be used for the biasing unit M2. The biasing unit M2 has a fixed portion M20 fixed above the transport path M10 in the vertical direction, and a free end M21 located below the fixed portion M20 in the vertical direction. The fixed part M20 is a part that fixes the biasing part M2 to the metal rod B that extends on the conveying path M10 in a direction perpendicular to the conveying direction (CD direction) by being wound around the rod B. The biasing part M2 has a band-shaped band part and a hollow cube-shaped head part provided at the tip of the band part. The biasing part M2 is wound around the rod B, and the band part is passed through the hollow cube-shaped head part with a claw formed inside from the free end M21 side. A sawtooth-shaped recess is provided on the surface of the band part, and the claw is caught in the recess to form the fixed part M20 that wraps around and fixes the rod B. The free end M21 side of the biasing part M2 fixed to the rod B extends vertically downward from the fixed part 20 to the downstream side in the conveying direction.

[0018] 4 is a view of the mask manufacturing apparatus M shown in FIG. 3 as viewed from above in the vertical direction. In FIG. 4, the urging portion M2 is illustrated by hatching slanting upward to the right. The free end M21 side of the urging portion M2 extends downstream in the transport direction from the fixed portion M20. As shown in FIG. 4, in this embodiment, two urging portions M2 are arranged side by side in the CD direction. This allows the mask manufacturing apparatus M to press down both sides of the mask body 2, thereby preventing the mask body 2 from jumping out of the transport path M10 on both sides.

[0019] 3, in this embodiment, the free end M21 of the urging part M2 is disposed at the position of the mask body 2 transported on the transport path M10. In other words, the free end M21 is disposed at the same vertical position as the mask body 2. The urging part M2 can hold the mask body 2 downward on the free end M21 side with the free end M21, thereby keeping the position of the mask body 2 constant with respect to the transport path M10. Note that since the urging part M2 is elastically deformable, the mask body 2 can move from the fixed part M20 side to the free end M21 between the urging part M2 and the transport path M10 without getting caught by the urging part M2.

[0020] In the mask manufacturing apparatus, if the mask body jumps out of the transport path, floats up, or is misaligned, the mask body gets caught in the transport path, causing the following mask body to get clogged in the transport path. The mask manufacturing apparatus M according to this embodiment can regulate the position of the mask body 2 by the biasing unit M2 so that the mask body 2 flows correctly through the transport path M10. The biasing unit M2 can prevent the mask body 2 from jumping out of the transport path M10, floating up, or getting misaligned. Therefore, the mask manufacturing apparatus M can prevent the mask body 2 from getting clogged in the transport path.

[0021] It is also possible to provide a suction mechanism on the transport path that sucks the mask body downward, and transport the mask body while sucking it, thereby keeping the position of the mask body constant relative to the transport path. However, providing a suction mechanism increases the equipment costs of the mask manufacturing apparatus and complicates the device configuration. On the other hand, the mask manufacturing apparatus M according to this embodiment is equipped with the biasing unit M2, so there is no need to provide a suction mechanism on the transport path M10. The mask manufacturing apparatus M can simplify the device configuration while suppressing increases in equipment costs.

[0022] It is also possible to attach a rod extending in the CD direction to the transport path to prevent the mask body from jumping out of the transport path. However, since such a rod is arranged with a gap between the transport path and the mask body, the mask body can move within the gap, and there is a risk that the mask body will be misaligned along the transport path. In addition, if the rod is brought too close to the transport path, a problem occurs in that the mask body will be caught by the rod. On the other hand, the mask manufacturing device M according to this embodiment is equipped with a biasing unit M2. The mask body 2 is transported below the free end M21 of the biasing unit M2, so the transport of the mask body 2 is not hindered. Therefore, the mask body 2 according to this embodiment can prevent the mask body 2 from clogging the transport path.

[0023] <Embodiment 2> Next, a mask manufacturing apparatus according to the second embodiment will be described. Fig. 5 and Fig. 6 are diagrams showing the mask manufacturing apparatus according to the second embodiment. Fig. 5 shows the mask manufacturing apparatus M as viewed from the right side in the transport direction of the mask body 2. Fig. 6 shows the mask manufacturing apparatus M as viewed from above toward the downstream side in the transport direction of the mask body 2. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the first embodiment described above are denoted by the same reference numerals and their description will be omitted.

[0024] In the mask manufacturing apparatus M according to the present embodiment, the transport device M1 includes a plurality of storage units M11 arranged in the transport direction, each of which stores a mask body 2, and walls M12 and M13 arranged at the front and rear of the storage unit M11 in the transport direction and convex upward in the vertical direction. The storage unit M11 is partitioned by the adjacent walls M12 and M13 into a size that can store only one mask body 2. The transport device M1 transports the mask body 2 by moving the storage unit M11 in the transport direction using a belt conveyor or the like. The wall M12 is disposed on the rear side (upstream side) of the corresponding storage unit M11, and the wall M13 is disposed on the front side (downstream side) of the corresponding storage unit M11. The walls M12 and M13 are convex upward in the vertical direction from the transport path M10, and prevent the mask body 2 from protruding out of the storage unit M11.

[0025] In the state shown in Figs. 5 and 6, the biasing portion M2 extends across two adjacent storage portions M11 in the front and rear. The biasing portion M2 is fixed to a metal rod B or plate P extending in the CD direction on the transport path M10. The transport device M1 has a recess M14 provided in a region corresponding to the portion where the biasing portion M2 extends. The recess M14 is a region recessed with respect to the upper ends of the walls M12 and M13, and in this embodiment, is a region where the walls M12 and M13 are not formed. The recess M14 may be provided by forming a part of the walls M12 and M13 in a recessed shape downward.

[0026] The storage section M11 moves in the transport direction as needed. In this embodiment, by providing the recess M14 in an area corresponding to the portion where the urging section M2 extends, even if the urging section M2 cannot be provided in all of the storage sections M11, the mask body 2 in the storage section M11 can be pressed by the urging section M2. Therefore, the mask manufacturing apparatus M according to this embodiment can keep the position of the mask body 2 constant with respect to the transport path M10. The recess M14 is provided on both sides of all of the wall sections M12, M13. This makes it possible to prevent the wall sections M12, M13 from interfering with the urging section M2 even if the storage section M11 moves in the transport direction.

[0027] 5, the wall portion M12 provided on the rear side has a claw portion that protrudes toward the inside of the storage portion M11. The claw portion can prevent the mask body 2 from jumping out of the storage portion M11 when the mask body 2 is lifted vertically upward.

[0028] <Embodiment 3> Next, a mask manufacturing apparatus according to a third embodiment will be described. FIGS. 7 and 8 are diagrams showing the mask manufacturing apparatus according to the third embodiment. FIG. 7 shows the mask manufacturing apparatus M according to this embodiment as viewed from the right side in the transport direction of the mask body 2. FIG. 8 is a diagram showing the mask manufacturing apparatus M according to this embodiment as viewed vertically from above. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the above-mentioned embodiments are denoted by the same reference numerals and their description will be omitted.

[0029] The mask manufacturing apparatus according to this embodiment includes a laser processing device M3 (an example of the "processing device" in this application) that is disposed vertically above the transport path M10 and laser processes the mask body 2. The laser processing device M3 has a condenser lens M3A, and performs laser processing on the mask body 2 located at a focal point adjusted by the condenser lens M3A. For example, the laser processing device M3 can print patterns, characters, and the like on the mask body 2 by cutting an irradiated portion located at the focal point.

[0030] 8, when the mask manufacturing apparatus M is viewed from above, the free end M21 of the biasing portion M2 is located around the processing area where the mask body 2 is processed by the laser processing apparatus M3. According to the mask manufacturing apparatus M of this embodiment, the position of the mask body 2 with respect to the transport path M10 can be kept constant when processing the mask body 2. The mask manufacturing apparatus M of this embodiment can prevent the processing area of ​​the mask body 2 from being misaligned, thereby suppressing processing defects of the mask body 2.

[0031] As shown in Figs. 7 and 8, a light-reducing wall M4 is disposed downstream of the laser processing device M3. The light-reducing wall M4 is appropriately installed to prevent an operator from directly viewing the light-emitting part of the laser processing device M3. The light-reducing wall M4 is fixed onto the transport path M10 with a gap sufficient to allow the mask body 2 and the biasing part M2 to pass underneath. The biasing part M2 can extend forward and backward through the gap between the light-reducing wall M4 and the transport path M10. Therefore, the mask manufacturing device M according to this embodiment can increase the degree of freedom in installing the light-reducing wall M4.

[0032] The laser processing device M3 may be a processing device that cuts the mask body 2 by laser light. The biasing unit M2 can press the mask body 2 against the transport path M10, so that the vertical position of the mask body 2 against the transport path M10 can be kept constant. This allows the focus of the laser light irradiated by the laser processing device M3 to be adjusted to the mask body 2, so that the laser processing device M3 can satisfactorily perform processing such as printing and cutting on the mask body 2.

[0033] <Embodiment 4> Next, a mask manufacturing apparatus according to a fourth embodiment will be described. Figs. 9 and 10 are diagrams showing the mask manufacturing apparatus according to the fourth embodiment. Fig. 9 shows the mask manufacturing apparatus M according to this embodiment as viewed from the right side in the transport direction of the mask body 2. Fig. 10 is a diagram showing the mask manufacturing apparatus M according to this embodiment as viewed vertically from above. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the above-mentioned embodiments are denoted by the same reference numerals and their description will be omitted.

[0034] The mask manufacturing apparatus according to this embodiment includes an imaging inspection device M5 (an example of the "inspection device" in this application) that is disposed vertically above the transport path M10 and inspects the mask body 2 by photographing it. The imaging inspection device M5 photographs the mask body 2 and inspects whether pleating and welding have been performed in the specified positions. The imaging inspection device M5 may also photograph the mask body 2 to inspect the attachment state of the ear straps, or may photograph the mask body 2 to confirm that there are no unnecessary wrinkles in the mask body 2.

[0035] 10, when the mask manufacturing apparatus M is viewed from above, the free end M21 of the biasing unit M2 is located around the photographing area (an example of the "inspection area" in the present application) where the mask body 2 is photographed by the photographing and inspection device M5. According to the mask manufacturing apparatus M of this embodiment, the position of the mask body 2 with respect to the transport path M10 can be kept constant during inspection of the mask body 2. The mask manufacturing apparatus M of this embodiment can suppress inspection defects of the mask body 2 by preventing the inspection area of ​​the mask body 2 from shifting position. In addition, since the biasing unit M2 can hold the mask body 2 with respect to the transport path M10, the vertical position of the mask body 2 with respect to the transport path M10 can also be kept constant. This allows the focal point of the photographing and inspection device M5 to be adjusted to the mask body 2, so that the photographed image can be photographed without being blurred, and therefore the inspection of the mask body 2 by the photographing and inspection device M5 can be accurately performed.

[0036] <Embodiment 5> Next, a mask manufacturing apparatus according to a fifth embodiment will be described. Fig. 11 and Fig. 12 are diagrams showing the mask manufacturing apparatus according to the fifth embodiment. Fig. 11 shows the mask manufacturing apparatus M as viewed vertically from above. Fig. 12 shows the mask manufacturing apparatus M as viewed from above toward the downstream side in the transport direction of the mask body 2 in the second direction. Note that the same components as those in the above-mentioned embodiments are given the same reference numerals and their description will be omitted.

[0037] In the mask manufacturing apparatus M according to this embodiment, the transport device M1 has a transport device M100 (an example of the "first transport section" in the present application) that transports the mask body 2 in one direction, and a transport device M200 (an example of the "second transport section" in the present application) that is provided at the rear of the transport device M100 and transports the mask body 2 in a second direction perpendicular to the first direction on a plane. The transport device M100 discharges the mask body 2 toward the transport device M200, and the transport device M200 continues to transport the mask body 2 discharged from the transport device M100.

[0038] The transport device M100 forms a transport path M101 for transporting the mask body 2 in one direction (transport direction). The transport path M101 is, for example, configured with a belt conveyor. The transport device M100 is similar to the transport device M1 in the first embodiment.

[0039] The conveying device M200 forms a conveying path M201 for conveying the mask body 2 in the second direction (conveying direction). The conveying device M200 has a plurality of storage units M202 arranged in the second direction, each of which stores the mask body 2, and wall units M203 and M204 arranged at the front and rear of the storage unit M202 in the conveying direction and convex upward in the vertical direction. The storage unit M202 is partitioned by the adjacent wall units M203 and M204 into a size that can accommodate only one mask body 2. The conveying device M200 conveys the mask body 2 by moving the storage unit M202 in the second direction using a belt conveyor or the like. The wall unit M203 is arranged on the rear side (upstream side) of the corresponding storage unit M202, and the wall unit M204 is arranged on the front side (downstream side) of the corresponding storage unit M202. The walls M203 and M204 are convex upward in the vertical direction from the transport path M201, and prevent the mask body 2 from protruding from the storage unit M202. The transport device M200 forms the transport path M201 above the storage units M202 that are continuously arranged. The transport device M200 is the same as the transport device M1 in the second embodiment.

[0040] As shown in FIG. 11 and FIG. 12, the conveying device M100 includes a feed roller M102 for sending out the mask body 2 to the conveying device M200. The feed roller M102 is disposed near the exit of the conveying path M101. The mask body 2 is discharged toward the storage unit M202 by the feed roller M102. The timing at which the feed roller M102 sends out the mask body 2 is synchronized with the timing at which the storage unit M202 of the conveying device M200 passes through a position facing the feed roller M102. This allows the mask body 2 to be sent out to the storage unit M202 by the feed roller M102. As shown in FIG. 12, the conveying path M101 of the conveying device M100 and the conveying path M201 of the conveying device M200 are configured to have approximately the same height in the vertical direction. The conveying device M1 can prevent the mask body 2 from falling between the conveying paths when the mask body 2 moves from the conveying path M101 to the conveying path M201.

[0041] The conveying device M200 also has a guard plate M206 for preventing the mask body 2 sent out from the conveying device M100 from jumping out beyond the storage section M202. The guard plate M206 is disposed opposite the conveying path M101 and extends vertically upward toward the conveying path M101.

[0042] In addition, in the mask manufacturing apparatus M according to this embodiment, the biasing unit M2 is arranged across the transport device M100 and the transport device M200. In this biasing unit M2, the fixed unit M20 is arranged on the transport device M100 side, and the free end M21 is arranged on the transport device M200 side. More specifically, the fixed unit M20 is fixed to a metal rod B extending on the transport path M101 near the exit of the transport path M101. This rod B extends in the CD direction in one direction. The biasing unit M2 extends toward the transport path M201, and the free end M21 is arranged below the guard plate M206. In the mask manufacturing apparatus M according to this embodiment, the biasing unit M2 can also prevent the mask body 2 sent out from the transport device M100 from jumping out beyond the storage unit M202. Note that the biasing unit M2 may be provided to omit the arrangement of the guard plate M206.

[0043] In the mask manufacturing apparatus M according to this embodiment, a biasing unit M2 is also arranged on the transport device M200. For example, the biasing unit M2 is fixed to a part of the guard plate M206. The biasing unit M2 is also fixed to a metal plate P extending on the transport path M201. The configuration of these biasing units M2 is the same as that of the second embodiment. The transport device M200 has a recess M205 provided in an area corresponding to the portion where the biasing unit M2 extends. The recess M205 is an area recessed with respect to the upper ends of the walls M203 and M204, and in this embodiment, the recess M205 is provided on the wall M203. , M204 are not formed. The recess M205 may be provided by forming a part of the wall portions M203, M204 in a concave shape downward.

[0044] The storage section M202 moves in two directions as needed. In this embodiment, by providing the recess M205 in an area corresponding to the portion where the urging section M2 extends, even if the urging section M2 cannot be provided in all of the storage sections M202, the mask body 2 in the storage section M202 can be pressed by the urging section M2. Therefore, the mask manufacturing apparatus M according to this embodiment can keep the position of the mask body 2 constant with respect to the transport path M201. The recess M205 is provided on both sides of all of the wall sections M203 and M204. This makes it possible to prevent the wall sections M203 and M204 from interfering with the urging section M2 even if the storage section M202 moves in the transport direction.

[0045] Fig. 13 is a diagram showing the storage unit M202 of the mask manufacturing apparatus M according to this embodiment as viewed from the right side in the second direction. Fig. 13 shows only one storage unit M202. The wall M203 provided on the rear side has a claw portion M203A that protrudes toward the inside of the storage unit M202. The claw portion M203A prevents the mask body 2 from jumping out of the storage unit M202 when the mask body 2 is vertically raised upward.

[0046] Also, the wall M204 provided on the front side in the second direction has a lower vertical height than the wall M203 provided on the rear side in the second direction. That is, the wall M203 provided with the claws M203A has a higher vertical height than the wall M204 without the claws. This is because the bottom surface of the storage section M202 is inclined so that the front side is lower. Therefore, the rear side of the mask body 2 is higher in the vertical direction, and the mask manufacturing apparatus M can prevent the mask body 2 from popping out of the storage section M202 by the claws M203A even if the rear side of the mask body 2 is lifted up. If the mask body 2 pops out of the storage section M202, it will cause the mask body 2 to clog in the transport path. The mask manufacturing apparatus M according to this embodiment can prevent the mask body 2 from popping out of the storage section M202, thereby preventing the mask body 2 from clogging in the transport path.

[0047] <Embodiment 6> Next, a mask manufacturing apparatus according to a sixth embodiment will be described. Fig. 14 is a diagram showing the mask manufacturing apparatus according to the sixth embodiment. Fig. 14 shows the mask manufacturing apparatus M as viewed from the left side in the transport direction. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the above-mentioned embodiments are denoted by the same reference numerals and the description thereof will be omitted.

[0048] The mask manufacturing apparatus M according to this embodiment includes a pleat forming device that is provided in a conveying device M100 and forms pleats extending in one direction in the mask body. The process of forming pleats in the mask body is performed at a stage before the mask body is cut into mask pieces. As shown in FIG. 14, a continuous mask body 2S is conveyed by the conveying device M100. The conveying device M100 shown in FIG. 14 is a device that conveys the mask body 2 by a plurality of rolls.

[0049] The mask manufacturing device M includes a feed roll M30, a crease forming roll M31, a pleat forming plate M32, and a press device M33. The pleat forming device is a device that includes the crease forming roll M31, the pleat forming plate M32, and the press device M33. The feed roll M30 feeds the mask body 2S in one direction. This allows the pleat forming process to be performed while transporting the mask body 2S in a fixed direction. In addition, the width of the mask body 2S is narrowed between the feed roll M30 and the crease forming roll M31 that is disposed downstream of the feed roll M30. When the mask body 2S is fed from the feed roll M30, The width of the mask body 2S is narrowed by being sent out so as to fit within the CD-direction length of the crease-forming roll M31.

[0050] The crease forming roll M31 has a roll M310 arranged above the mask body 2S and an anvil roll M311 arranged below the mask body 2S. The roll M310 and the anvil roll M311 are arranged facing each other with a gap that allows the mask body 2S to pass through. The roll M310 and the anvil roll M311 rotate in opposite directions at the same speed. The roll M310 has a convex portion C formed corresponding to the position where the crease 80 is to be formed. The position where the crease 80 is to be formed coincides with the position where the mask body 2S is folded when forming pleats. The crease is formed in the mask body 2S by the mask body 2S passing between the roll M310 and the anvil roll M311.

[0051] A pleat forming plate M32 is disposed at a predetermined distance downstream of the crease forming roll M31. The conveying speed of the mask body 2S in the crease forming process is adjusted to be the same as the conveying speed of the mask body 2S in the subsequent process.

[0052] The pleat forming plate M32 has a plate-like shape extending substantially parallel to the conveyance direction of the mask body 2S and from one side to the other in the width direction of the mask body 2S. The pleat forming plate M32 has four plates extending from one side to the other in the width direction of the sheet S, and is formed by overlapping these four plates in the thickness direction. The pleat forming plate M32 forms pleats 8 by folding the mask body 2S by pushing the mask body 2S to the other side at the positions of the creases 80.

[0053] A press device M33 is disposed downstream of the pleat forming plate M32. The press device M33 has a press roll M330 disposed above the mask body 2S and an anvil roll M331 disposed below the mask body 2S. The press roll M330 and the anvil roll M331 rotate in opposite directions at the same speed. The mask body 2S is pressed by passing between the press roll M330 and the anvil roll M331. The pleat forming device fixes the pleats 8 by pressing the mask body 2S. After that, the mask manufacturing device M forms the mask body 2 by cutting the continuous mask body 2S into the size of one mask.

[0054] 15 shows the mask manufacturing device M as seen from above toward the downstream side in the conveying direction of the mask body 2 in the second direction. The mask manufacturing device M cuts the continuous mask body with the pleats formed into the size of one mask, and then sends out the mask body 2 to the conveying device M200.

[0055] The mask manufacturing apparatus M according to this embodiment includes a fitting portion M207 that is provided on the bottom surface of the storage portion M202 and fits with the pleats 8. For example, an adhesive tape having an uneven surface can be used for the fitting portion M207. The fitting portion M207 is convex vertically upward with respect to the bottom surface of the storage portion M202, so that it can fit with the pleats 8 of the mask body 2. The fitting portion M207 has a dynamic friction coefficient greater than that of the bottom surface of the storage portion M202. Therefore, the fitting portion M207 suppresses slipping on the bottom surface of the storage portion M202, and prevents the mask body 2 sent out by the feed roller M102 of the conveying device M100 from passing through the storage portion M202.

[0056] The fitting portion M207 engages with the pleats 8 of the mask body 2. The fitting portion M207 has a larger static friction coefficient than the bottom surface of the storage portion M202. Therefore, the fitting portion M207 prevents the mask body 2 from shifting in position within the storage portion M202 during transportation. This allows the mask manufacturing apparatus M to prevent the mask body from shifting in position in the transportation direction.

[0057] In addition, at the downstream end of the conveying device M100 and the conveying device M200, the mask body 2 is conveyed with the pleats 8 facing downward in the vertical direction. In the mask 1 shown in FIG. 1, the pleats 8 face the non-skin side, so the direction in which the pleats 8 face is the non-skin side of the mask body 2. In this embodiment, the fitting portion M207 is disposed on the rear side in the second direction in the storage portion M202. In this manner, by disposing the fitting portion M207 on the rear side, it is possible to prevent the mask body 2S from shifting backward (downstream). Even if the mask body 2S shifts backward, the mask manufacturing device M is provided with the claw portion M203A shown in FIG. 13, so that it is possible to prevent the mask body 2 from jumping out backward from the storage portion M202.

[0058] Moreover, the fitting portion M207 is not provided on the entire bottom surface of the storage portion M202, but on a part of the bottom surface. This does not prevent the movement of the mask body 2 from the transport device M100 to the transport device M200. Note that, as in this embodiment, when the mask body 2 discharged from the transport device M100 to the transport device M200 can be prevented from jumping out of the storage portion M202 by the fitting portion M207, the biasing portion M2 arranged across the transport device M100 and the transport device M200 can be omitted.

[0059] <Variation 1> Next, a description will be given of a mask manufacturing apparatus according to a first modified example of the sixth embodiment. Fig. 16 shows the mask manufacturing apparatus M as viewed from above toward the downstream side in the transport direction of the mask body 2 in the second direction.

[0060] In this modification, the fitting portion M207 is disposed at the front side in the second direction in the storage portion M202. By disposing the fitting portion M207 at the front side in this manner, it is possible to prevent the mask body 2 from being displaced toward the front stage of the conveying device M200 when the mask body 2 is sent from the conveying device M100 to the conveying device M200.

[0061] <Variation 2> Next, a description will be given of a mask manufacturing apparatus according to Modification 2 of Embodiment 6. Fig. 17 shows the mask manufacturing apparatus M as viewed from above toward the downstream side in the transport direction of the mask body 2 in the second direction.

[0062] In this modification, the fitting parts M207 are arranged at the front and rear sides in two directions in the storage part M202. The front fitting part M207 fits with the upper pleat of the mask body 2, and the rear fitting part M207 fits with the lower pleat of the mask body 2. In this way, a plurality of fitting parts M207 may be provided corresponding to a plurality of pleats.

[0063] <Embodiment 7> Next, a mask manufacturing apparatus according to a seventh embodiment will be described. Fig. 18 is a diagram showing the mask manufacturing apparatus according to the seventh embodiment. Fig. 18 shows the mask manufacturing apparatus M as viewed from the right side in the transport direction. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the above-mentioned embodiments are denoted by the same reference numerals and the description thereof will be omitted.

[0064] In this embodiment, the urging section M2 is formed of, for example, a conductive resin material. Therefore, the urging section M2 has conductivity. The mask manufacturing apparatus M also includes a charge removing member M40 connected to the urging section M2. A conductive member such as a wire is used for the charge removing member M40. One end of the charge removing member M40 is connected to the urging section M2, and the other end is grounded. This allows the mask manufacturing apparatus M to remove static electricity charged to the mask body 2 via the urging section M2 and the charge removing member M40. Note that the charge removing member M40 may be attached to multiple urging sections M2. The mask manufacturing apparatus M according to this embodiment urges the mask body 2 to the biasing section M2. It is possible to remove static electricity while pressing down.

[0065] <Embodiment 8> Next, a mask manufacturing apparatus according to an eighth embodiment will be described. Fig. 19 is a diagram showing the mask manufacturing apparatus according to the eighth embodiment. Fig. 19 shows the mask manufacturing apparatus M as viewed from the right side in the transport direction. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the above-mentioned embodiments are denoted by the same reference numerals and their description will be omitted.

[0066] The mask manufacturing apparatus M according to the present embodiment includes a static eliminator M41 that blows static elimination air containing ions generated by a discharge phenomenon onto the mask body 2. The static eliminator M41 blows static elimination air toward the area where the free end M21 of the biasing unit M2 is located. The static eliminator M41 may blow static elimination air toward the periphery of the area where the free end M21 is located. The mask manufacturing apparatus M according to the present embodiment can suppress the mask body 2 from protruding from the transport path M10, which is caused by static electricity. In addition, the mask manufacturing apparatus M can prevent the mask body 2 from floating up by the biasing unit M2, and can hold the position of the mask body 2 relative to the transport path M10, thereby blowing static elimination air onto the mask body 2 without misalignment. This allows the mask manufacturing apparatus M to properly eliminate static electricity from the mask body 2.

[0067] <Embodiment 9> Next, a mask manufacturing apparatus according to a ninth embodiment will be described. Fig. 20 is a diagram showing the mask manufacturing apparatus according to the ninth embodiment. Fig. 20 shows the mask manufacturing apparatus M as viewed from the right side in the transport direction. The mask manufactured by the mask manufacturing apparatus M according to this embodiment is the same as the mask 1 described in the first embodiment. The same components as those in the above-mentioned embodiments are denoted by the same reference numerals and the description thereof will be omitted.

[0068] The mask manufacturing apparatus M according to this embodiment includes an air device M50 that blows air vertically from above onto the mask body 2. The air device M50 blows air to press the mask body 2 downward. The mask manufacturing apparatus M can also prevent the mask body 2 from floating up from the transport path M10 by blowing air.

[0069] The features included in each of the embodiments and applications disclosed above can be combined with each other. [Explanation of symbols]

[0070] 1: Mask 2: Mask body 2S: Mask body 3: Ear straps 4: Ear straps 5: Edge tape 6: Edge tape 7: Nose fitter 8: Pleats M: Mask manufacturing equipment M1: Transport device M10: Transport path M100:Transportation device M101: Transport path M102: Feed roller M11: Storage section M12: Wall M13: Wall part M14: Concave M2: Biasing part M20: Fixed part M200:Transportation device M201: Transport path M202: Storage area M203: Wall part M203A: Claw part M204: Wall part M205: Recess M206: Guard plate M207: Fitting part M21: Free end M3: Laser processing equipment M3A: Condenser lens M30: Delivery roll M31: Roll for forming creases M310: Roll M311: Anvil roll M32: Pleats forming plate M33: Press equipment M330: Press roll M331: Anvil roll M4: Light-reducing wall M40: Antistatic material M41: Static eliminator M5: Photographic inspection device M50: Air device B: Bar P: board

Claims

1. a conveying section that forms a conveying path for conveying the mask body; a biasing portion having a fixed portion fixed above the transport path in the vertical direction, a free end located below the fixed portion in the vertical direction, and elasticity in the vertical direction, the free end side extending downstream of the fixed portion in the transport direction of the mask body; A mask manufacturing apparatus comprising:

2. The free end of the biasing portion is disposed at a position of the mask body transported on the transport path.

2. An apparatus for manufacturing a mask according to claim 1.

3. The conveying unit is a storage section arranged in a plurality of rows in the transport direction and configured to store the mask body; Wall portions are provided at the front and rear of the storage portion in the transport direction and are convex upward; a recess provided in a region corresponding to a portion along which the biasing portion extends and recessed with respect to an upper end of the wall portion; have 3. An apparatus for manufacturing a mask according to claim 1 or 2.

4. a processing device disposed above the transport path in the vertical direction and configured to process the mask body; When viewed from the top, the free end of the urging portion is located around a processing area where the mask body is processed by the processing device.

3. An apparatus for manufacturing a mask according to claim 1 or 2.

5. an inspection device disposed above the transport path and configured to inspect the mask body; When viewed from above, the free end of the biasing portion is located around an inspection area where the mask body is inspected by the inspection device.

3. An apparatus for manufacturing a mask according to claim 1 or 2.

6. The conveying unit is A first conveying unit that conveys the mask body in one direction; a second conveying unit provided downstream of the first conveying unit and configured to convey the mask body in a second direction perpendicular to the first direction on a plane; having The conveying paths of the first conveying section and the second conveying section are configured to have substantially the same height in the vertical direction, the urging portion is disposed across the first transport section and the second transport section, the fixed portion of the urging portion is disposed on the first transport section side, and the free end of the urging portion is disposed on the second transport section side; 3. An apparatus for manufacturing a mask according to claim 1 or 2.

7. The second conveying unit is A storage section that is provided in a plurality of rows in the two directions and stores the mask body; Wall portions provided at the front and rear of the storage portion in the two directions; a recess provided in a region corresponding to a portion along which the biasing portion extends and recessed with respect to an upper end of the wall portion; The mask manufacturing apparatus according to claim 6 , further comprising:

8. The wall portion provided on the rear side in the second direction has a claw portion that protrudes toward the inside of the storage portion, 8. An apparatus for manufacturing a mask according to claim 7.

9. The wall portion provided on the front side in the second direction has a lower height in the vertical direction than the wall portion provided on the rear side in the second direction. The mask manufacturing apparatus according to claim 8 .

10. a pleat forming device provided in the first conveying section and configured to form pleats in the mask body extending along the one direction; A fitting portion provided on a bottom surface of the storage portion and fitting with the pleat; The mask manufacturing apparatus according to claim 7 , comprising:

11. At the downstream end of the first conveying section and the second conveying section, the mask body is conveyed with the pleats facing downward, The fitting portion is disposed on the bottom surface of the storage portion and on the rear side in the second direction. The mask manufacturing apparatus according to claim 10.

12. At the downstream end of the first conveying section and the second conveying section, the mask body is conveyed with the pleats facing downward, The fitting portion is disposed on the bottom surface of the storage portion and on the front side in the second direction. The mask manufacturing apparatus according to claim 10.

13. The fitting portion has a coefficient of friction greater than that of the bottom surface of the storage portion. The mask manufacturing apparatus according to claim 10.

14. The pleat forming device forms a plurality of the pleats in the mask body, The fitting portion is provided in a plurality of portions corresponding to the plurality of pleats, The mask manufacturing apparatus according to claim 10.

15. The biasing portion is conductive, A static eliminator connected to the biasing portion is provided.

3. An apparatus for manufacturing a mask according to claim 1 or 2.

16. A static elimination device is provided which blows air for static elimination toward the region where the free end of the urging portion is located and / or the periphery of the region.

3. An apparatus for manufacturing a mask according to claim 1 or 2.

17. An air device is provided for blowing air onto the mask body from above.

3. An apparatus for manufacturing a mask according to claim 1 or 2.

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