Precursor delivery vessel, precursor delivery system, and precursor deposition device

Abstract

To provide a precursor delivery vessel, a precursor delivery system, and a precursor deposition device.SOLUTION: Disclosed is a vapor phase precursor delivery system for delivering a vapor phase precursor and for depositing a layer in a vapor phase deposition device. A precursor delivery vessel is constructed and arranged so as to store a solid precursor and deliver a vapor phase precursor in a vessel outlet; and the system includes a plate for providing a hole capable of conveying gas between a chamber and a part of the vessel for storing the solid precursor.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present disclosure generally relates to a precursor delivery system for providing a vapor phase precursor from a container, the system being provided with a holder constructed and arranged to hold the container and to deliver the vapor phase precursor at a vapor phase outlet. The present disclosure may also relate to a precursor delivery container constructed and arranged to store a solid precursor and to deliver the vapor phase precursor at a container outlet.

[0002] The present disclosure further relates to a precursor deposition apparatus, such as, for example, a vertical furnace, comprising a precursor delivery system for depositing a layer on a substrate. [Background technology]

[0003] Gas phase precursor delivery systems for delivering gas phase precursors for depositing layers on a substrate in a reactor of a vapor deposition apparatus can present certain challenges. One of these challenges is that the precursor delivery system can deliver less vapor, and precursor delivery can actually become a bottleneck to the productivity of the deposition apparatus.

[0004] The vapor pressure of the solid precursor may be very low, so the precursor delivery system may deliver less precursor. The delivery of the precursor may depend on the level of the top surface of the solid precursor in the container. The level of the solid precursor in the container may decrease during use of the system, so less solid precursor may sublime in the system. The top surface of the solid precursor may also be sculpted by the gas flow, so the gas flow has less contact with the solid precursor and less amount of solid precursor may sublime in the system. Summary of the Invention [Means for solving the problem]

[0005] It may be an object to provide a precursor delivery vessel that is constructed and arranged to store solid precursors and deliver vapor phase precursors.

[0006] As a result, a precursor delivery vessel may be provided that is constructed and arranged to store a solid precursor and deliver a vapor phase precursor at a vessel outlet. The vessel outlet may be constructed and arranged in fluid communication with the vessel inlet via a chamber defined by a top plate and a bottom plate. The bottom plate may be constructed and arranged to be supported on an upper surface of the solid precursor and movable with an upper surface of the solid precursor within the vessel. The bottom plate may be provided with holes to allow gas transfer between the chamber and the portion of the vessel in which the solid precursor is stored, and to allow sublimated precursor from the solid precursor to enter the chamber.

[0007] According to a further embodiment, a precursor delivery system for providing a gas phase precursor from a solid precursor may be provided. The system may comprise a container constructed and arranged to store the solid precursor and provided with a container inlet and a container outlet. The container outlet may be constructed and arranged in fluid communication with the container inlet via a chamber constructed and arranged to be supported on top of the solid precursor and move with the solid precursor level in the container. The system may further comprise a holder constructed and arranged to hold the container, an inert gas source constructed and arranged to connect to the container inlet to deliver inert gas to the container, and a gas phase outlet constructed and arranged to connect to the container outlet for delivery of the gas phase precursor. The chamber may be defined by a top plate and a bottom plate constructed and arranged to be supported on a surface of the solid precursor. The bottom plate may be provided with holes to allow gas transfer between the part of the container in which the solid precursor is stored and the chamber and to allow sublimated precursor from the solid precursor to enter the chamber.

[0008] According to yet further embodiments, a delivery system for providing a vapor phase precursor from a solid precursor may be provided. The system may include a holder constructed and arranged to hold a container for storing the solid precursor and constructed and arranged to provide a container inlet and a container outlet, an inert gas source constructed and arranged to connect to the container inlet and deliver inert gas to the container, and a vapor phase outlet constructed and arranged to connect to the container outlet for delivery of the vapor phase precursor. The holder may be constructed and arranged to allow movement of the container.

[0009] According to yet further embodiments, a vapor deposition apparatus may be provided. The apparatus may include a vapor precursor delivery system for delivering a vapor precursor for depositing a layer on a substrate. The apparatus may be a vertical furnace including a reactor constructed and arranged to load a boat having a plurality of substrates. The vapor precursor delivery system may be constructed and arranged to deliver a vapor precursor for depositing a layer on a plurality of substrates in the reactor.

[0010] This Summary is provided to introduce selected concepts in a simplified form. These concepts are described in more detail in the Detailed Description of Example Embodiments of the Disclosure below. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. [Brief description of the drawings]

[0011] [Figure 1] 1A and 1B disclose a precursor delivery system according to the prior art. [Diagram 2] FIG. 2 discloses a precursor delivery system according to one embodiment. [Diagram 3] FIG. 3 discloses a top view on the bottom plate for the delivery system of FIG. [Figure 4]FIG. 4 discloses a precursor delivery system provided in a holder constructed and arranged to hold a container. [Diagram 5] FIG. 5 discloses how a container can be transferred to a holder constructed and arranged to hold the container. [Figure 6] FIG. 6 discloses a precursor delivery system according to a further embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] It will be appreciated that elements in the figures are illustrated for simplicity and clarity and have not necessarily been drawn to scale, for example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help improve understanding of the illustrated embodiments of the present disclosure.

[0013] Although certain specific embodiments and examples are disclosed below, it will be understood by those skilled in the art that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention, and obvious modifications and equivalents thereof, and therefore it is not intended that the scope of the disclosed invention should be limited by the specific disclosed embodiments described below.

[0014] As used herein, the term "substrate" may refer to any underlying material(s), including any underlying material(s) that may be modified or upon which a device, circuit, or film may be formed. A "substrate" may be continuous or non-continuous, rigid or flexible, solid or porous, and combinations thereof. A substrate may be in any form, such as a powder, plate, or workpiece. Substrates in the form of plates may include wafers of various shapes and sizes. Substrates may be made of semiconductor materials, including, for example, silicon, silicon germanium, silicon oxide, gallium arsenide, gallium nitride, and silicon carbide.

[0015] For example, the substrate in powder form may have applications for pharmaceutical manufacturing. The porous substrate may include a polymer. Examples of workpieces may include medical devices (e.g., stents and syringes), jewelry, tooling devices, components for battery manufacturing (e.g., anodes, cathodes, or separators), or components of photovoltaic cells, etc.

[0016] The continuous substrate may extend beyond the boundaries of the process chamber in which the deposition process occurs. In some processes, the continuous substrate may move through the process chamber, such that the process continues until the end of the substrate is reached. The continuous substrate may be fed from a continuous substrate feeding system to enable the production and output of the continuous substrate in any suitable form.

[0017] Non-limiting examples of continuous substrates may include sheets, nonwoven films, rolls, foils, webs, flexible materials, bundles of continuous filaments or fibers (e.g., ceramic or polymeric fibers). Continuous substrates may also include carriers or sheets onto which the non-continuous substrates are placed.

[0018] 1A and 1B disclose a prior art vapor phase precursor delivery system 1 with a vessel inlet 3 and a vessel outlet 5. The vapor phase precursor delivery system 1 may include a vessel 7 constructed and arranged to store a precursor 9. A gas flow 11 may be created in the vessel 7 with an inert gas, such as nitrogen, between the gas inlet 3 and the gas outlet 5 through a headspace 15 above the precursor 9 level. The gas flow 11 may pick up a portion of the precursor 9 that has sublimated 17 into the gas flow 11, which may be transported out of the vessel 7 via the vessel outlet 5.

[0019] Sublimation of precursor 9 may depend on the level of the top surface of precursor 9 in vessel 7. As the level of precursor 9 in vessel 7 during use of system 1 may drop from a relatively full vessel 7 in FIG. 1A to a relatively empty vessel 7 in FIG. 1B, the amount of sublimated precursor 9 in system 1 may also be less. This may be caused by a larger head space 15 creating a larger vertical concentration gradient in head space 15 and less sublimation from precursor 9. Gas flow 11 may be further away from precursor 9 and therefore may have a lower concentration of precursor when gas flow 11 reaches vessel outlet 5. A precursor deposition apparatus with a gas phase precursor delivery system and receiving a lower concentration of precursor may be less productive.

[0020] 2 discloses a precursor delivery system 1 according to one embodiment. A precursor delivery vessel 7 may be constructed and arranged to store and sublimate a solid precursor 9 and deliver a gas phase precursor at a vessel outlet 5. The vessel outlet 5 may be constructed in fluid communication with a chamber 19 provided with a top plate 21 and a bottom plate 23. The bottom plate 23 may be constructed and arranged to be supported on an upper surface of the solid precursor 9. The chamber 19 may be movable together with an upper surface of the solid precursor 9 within the vessel 7.

[0021] Figure 3 discloses a top view on a bottom plate for the delivery system of Figure 2. The bottom plate 23 may be provided with holes to allow gas transport between the chamber 19 and the part of the vessel 7 in which the solid precursor 9 is stored. The holes need to be adapted to the particle size of the solid precursor 9 so that the bottom plate remains supported on it.

[0022] Sublimated precursor from the solid precursor 9 may enter the chamber 19 through holes in the bottom plate 23. The bottom plate 23 may be of a mesh structure to allow uniform sublimation of the solid precursor.

[0023] The chamber 19 may be provided with a wall 25 connected to the top plate 21 and the bottom plate 23 to define the chamber 19. The wall 25 may be circular. Alternatively, the wall may be omitted such that the interior vessel surface of the vessel 7 defines the chamber 19.

[0024] The vessel may be provided with a spring 27, for example between the inner surface of the vessel 7 and the top plate 21. The spring 27 may press the bottom plate 23 against the upper surface of the solid precursor 9 in the vessel 7. As the solid precursor 9 sublimes, the spring 27 may unwind while continuously pressing the bottom plate against the solid precursor 9.

[0025] The container 7 may be provided with linear guide surfaces on the interior of the container to linearly guide the chamber 19. A guide may be necessary to avoid the chamber 19 getting stuck within the container during its movement through the interior of the container 7. The guide surfaces may be provided on the outer surfaces of guide posts 29, which may be centrally located within the container 7. The guide posts 29 may mate with guide holes 31 in the bottom plate 23 and / or top plate 21.

[0026] Alternatively, the guide surface may be provided by an internal surface of the vessel 7. The internal surface may cooperate with the top plate 21, the bottom plate 23, or the wall 25 to guide the chamber 19.

[0027] If the solid precursor 9 is not sublimated uniformly, the chamber 19 may get stuck in the vessel 7. This may happen if the flow to the vessel outlet 5 carves an optimal path through the solid precursor 9, which minimizes its flow resistance. The walls of this carved path may prevent the bottom plate 23 from moving further downwards if the precursor sublimes. Ultimately, this may result in reduced sublimation of the precursor 9 and may not sublimate the precursor remaining in the vessel 7, both of which may be undesirable.

[0028] The vessel 7 may comprise an actuator 33 constructed and arranged to move the solid precursor 9 within the vessel. The solid precursor may be in the form of particles, and by moving the vessel 7 and the particles, the particles may redistribute themselves within the vessel 7. Thereby, the top surface of the solid precursor 9 may become / remain flat. The bottom plate 23 may start / continue to move again. Sublimation 17 may be enhanced.

[0029] The actuator 33 may be constructed and arranged to provide linear movement. The actuator 33 may be constructed and arranged to provide reciprocating movement. The reciprocating movement may have a frequency of 0.1 to 10,000 Hz.

[0030] The actuator 33 may be provided with a controller 35 to switch the movement on and off between 1 and 0.01 Hz. This may save energy in the tool or reduce harmonic vibrations. The actuator may be constructed and arranged to move the vessel to displace solid particles within the vessel 7.

[0031] To provide the linear reciprocating movement, the actuator 33 may be a linear motor. The linear motor may comprise a coil and a magnet. The coil may be powered with an alternating current to provide the reciprocating movement. The linear motor may apply a force to a weight only to create a vibratory motion in the container 7. The container may be supported by flexible springs or rubber to allow vibration but not transmit the vibration to other components.

[0032] Vessel 7 may be provided with a vessel inlet 3 constructed in fluid communication with vessel outlet 5 through chamber 19 and via at least one flexible tube to provide a flow of pick-up gas through chamber 19 to carry vapor precursor out of chamber 19 while allowing movement of the chamber within the vessel. Vessel 7 may be provided with a heater 37. Heater 37 may be constructed and arranged to sublimate solid precursor 9.

[0033] The solid precursor 9 may be a metal chloride such as hafnium tetrachloride (HfCl4), tantalum pentachloride (TaCl5), molybdenum pentachloride (MoCl5), zirconium tetrachloride (ZrCl4), or molybdenum dioxide dichloride (MoO2Cl2) for depositing transition metals. Molybdenum dioxide dichloride (MoO2Cl2) may have a relatively high vapor pressure such that its behavior may be different.

[0034] The container may be provided with a level measuring device for measuring the level of precursor 9. When the level of precursor 9 becomes too low, the container 7 may be refilled.

[0035] The vessel 7 may be provided with a lifting device constructed and arranged to move the chamber 19 upwards when the solid precursor is substantially finished and may require refilling. The lifting device may reload the spring 27. The lifting device may have a linear drive to move the chamber 19. The linear drive may be, for example, a motor and spindle cooperating with a moving nut provided to the chamber 19. A controller may be provided to control the movement of the chamber 19 by the lifting device.

[0036] The vessel 7 may be provided with a fill port 39 for filling the vessel 7 with fresh precursor 9 when the chamber 19 is moved to the upper position by the lifting device, and a lid 38 may be provided to cover the fill port 39. Fresh precursor may be provided in the vessel 7 below the chamber 19. The chamber 19 may be lowered onto the top surface of the solid precursor 9 and normal operation may be assumed.

[0037] The chamber 19 may be constructed and arranged to create a constant gas flow in the chamber 19 at a substantially constant level from the surface of the precursor 9 in the container 7. During use of the system 1, the level of the precursor 9 in the container 7 may drop from a relatively full container 7 to a relatively empty container 7. However, the amount of vaporized 17 precursor 9 in the system may remain constant as the gas flow is kept at a constant distance from the surface of the precursor 9 as the chamber 19 moves with the precursor level. This is advantageous as the amount of precursor in the gas flowing out of the gas outlet 5 also remains constant.

[0038] The connecting tube of the vessel outlet 5 may be flexible and may be constructed and arranged to allow movement of the chamber 19 relative to the vessel 7 and to allow movement of the vessel 7 caused by the actuator 33. The connecting tube of the vessel inlet 3 may also be flexible and may be constructed and arranged to allow movement of the vessel 7 caused by the actuator 33. For example, the connecting tube may be made of a flexible material, such as rubber or polytetrafluoroethylene (PTFE).

[0039] The container 7 may be mounted in a frame using a flexible material, such as rubber or polytetrafluoroethylene (PTFE), to allow movement of the container 7 by the actuator 33 and also to allow the solid precursor 9 to reposition itself within the container 7.

[0040] 4 discloses a precursor delivery system 1 provided in a holder 41 constructed and arranged to hold a container 7. The holder 41 may be movably suspended from a support frame 40 via a flexible rope 42 or by means of a hinge.

[0041] The vessel 7 may be constructed and arranged to store the solid precursor 9 and may be provided with a vessel outlet 5. The vessel outlet 5 may be constructed and arranged in fluid communication with a chamber 19 constructed and arranged to be supported on top of the solid precursor 9 and to move with the solid precursor level in the vessel 7. The chamber 19 may be defined by a top plate 21 and a bottom plate 23 constructed and arranged to be supported on a surface of the solid precursor 9. The bottom plate 23 may be provided with holes to allow gas transfer between the portion of the vessel 7 in which the solid precursor 9 is stored and the chamber 19 to allow sublimated precursor from the solid precursor to enter the chamber.

[0042] The support frame 40 may be provided with a gas phase outlet 43 constructed and arranged to be connectable to the vessel outlet 5 for delivery of gas phase precursor. This allows for easy exchange of the vessel 7 from the holder 41 when it is empty and may be replaced with a new full vessel 7.

[0043] The system 1 may be provided with a rotational actuator 49 constructed and arranged to move the solid precursor 9 in the container 7 by applying a force between the support frame 40 and the holder 41 to move the container 7 and the precursor 9. The rotational actuator 49 may be a motor connected to the container 7 with a pair of hinges 53 to transfer the rotational motor to a linear reciprocating movement.

[0044] The support frame 40, actuator 49, and holder 41 are constructed and arranged to move the vessel 7 with a rotational or tilting movement to evenly distribute the precursor 9 within the vessel 7. The actuator 49 may be constructed and arranged to rotate between 1-100 RPM. The actuator 49 may be provided with a controller 47 to turn the movement on and off between 1-0.01 Hz. This may save energy or reduce harmonic vibrations in the tool.

[0045] The support frame 40 may be provided with an inert gas source 45 constructed and arranged to enable connection of the container inlet 3 to deliver inert gas to the container 7. The inert gas source 45 may be connected to the chamber 19 using a flexible tube, or the gas holder outlet 43 may be connected to the chamber 19 using a flexible tube, to enable movement of the container 7.

[0046] Figure 5 discloses how a container 7 can be moved to a holder 41 constructed and arranged to hold the container 7 to form the precursor delivery system of Figure 4. The support frame 40 may be provided with a gas phase outlet 43 constructed and arranged to be connectable to the container outlet 5 of the container 7 for delivery of the gas phase precursor 9. The support frame 40 may be provided with an inert gas source 45 constructed and arranged to be connectable to the container inlet 3 of the container 7 for delivering inert gas to the container 7. This allows for easy exchange of the container 7 from the holder 41 when the container 7 is empty and may be replaced with a new full container 7.

[0047] FIG. 6 discloses a precursor delivery system according to a further embodiment. The precursor delivery vessel 7 may be constructed and arranged to store and sublimate the solid precursor 9 and deliver the gas phase precursor at the vessel outlet 5. The vessel 7 may be provided with a vessel inlet 3 constructed in fluid communication with the chamber 19 through at least a tube to provide a flow of pick-up gas to the solid precursor 9 through the holes in the bottom plate 23 and the chamber 19. The vessel outlet 5 may be constructed in fluid communication with the chamber 19 through the solid precursor 9 and the holes in the bottom plate 23. The holes need to be adapted to the particle size of the solid precursor so that the solid precursor 9 remains supported on the bottom plate 23. The bottom plate 23 may be of a mesh structure to allow uniform sublimation of the solid precursor.

[0048] The vessel 7 may be provided with a heater. The heater may be constructed and arranged to sublimate the solid precursor 9.

[0049] The container 7 can be moved into a holder 41 constructed and arranged to hold the container 7. The support frame 40 may be provided with a gas phase outlet 43 constructed and arranged to be connectable to the container outlet 5 of the container 7 for delivery of the gas phase precursor 9. The support frame 40 may be provided with an inert gas source 45 constructed and arranged to be connectable to the container inlet 3 of the container 7 for delivery of inert gas to the container 7. This allows for easy exchange of the container 7 from the holder 41 when the container 7 is empty and may be replaced with a new full container 7.

[0050] The holder 41 may be movably suspended from the support frame 40 via a flexible rope 42 or by means of a hinge. A rotary actuator 49 may be provided constructed and arranged to move the solid precursor 9 within the container 7 by applying a force between the support frame 40 and the holder 41 to move the container 7 and the precursor 9. The rotary actuator 49 may be a motor connected to the container 7 by means of a pair of hinges 53 to transfer the rotary motor to a linear reciprocating movement. The support frame 40, the actuator 49, and the holder 41 may be constructed and arranged to move the container 7 by means of a rotational or tilting movement to distribute the precursor 9 evenly within the container 7.

[0051] The gas phase precursor delivery system 1 may be used in a gas phase deposition apparatus to deliver a gas phase precursor for depositing a layer on a substrate. The gas phase deposition apparatus may be a vertical furnace with a reactor constructed and arranged to load a boat with a plurality of substrates, and the gas phase precursor delivery system is constructed and arranged to deliver a gas phase precursor for depositing a layer on a substrate in the reactor. A vertical furnace suitable for using the gas phase precursor delivery system 1 may be described, for example, in U.S. Pat. No. 7,732,350 B2, which is incorporated herein by reference.

[0052] The illustrations presented herein are not meant to be actual representations of any particular materials, structures, or devices, but merely idealized representations used to describe embodiments of the present disclosure.

[0053] The illustrated and described implementations are illustrative of the present invention and its best mode, and are not intended to otherwise limit the scope of aspects and implementations in any manner. Indeed, for the sake of brevity, conventional manufacturing, association, preparation, and other functional aspects of the system may not be described in detail. Furthermore, the connecting lines shown in the various figures are intended to represent example functional relationships and / or physical couplings between the various elements. Many alternative or additional functional relationships or physical connections may be present in an actual system and / or may not be present in some embodiments.

[0054] It should be understood that the configurations and / or approaches described herein are exemplary in nature, and that these specific embodiments or examples are not to be construed in a limiting sense, as numerous variations are possible. The specific routines or methods described herein may represent one or more of any number of processing strategies. Thus, various illustrated operations may be performed in the order illustrated, in other orders, or omitted in some cases.

[0055] The subject matter of the present disclosure includes all novel and non-obvious combinations and subcombinations of the various processes, systems, and configurations, and other features, functions, operations and / or properties disclosed herein, as well as all equivalents thereof. [Explanation of symbols]

[0056] 1. Precursor Delivery System 3 Container entrance 5 Container outlet 7 Precursor Delivery Container 9. Solid Precursors 19 Chamber 21 Upper Plate 23 Bottom Plate 25. Wall 27 Spring 29 Guide Post 31 Guide hole 33 Actuator 35 Controller 37 Heater 38 Lid 39 Filling port 40 Support Frame 41 Holder 42 Flexible Rope 43 Gas phase outlet 45 Inert Gas Source 47 Controller 49 Rotary Actuator 53 Hinge

Claims

1. 1. A precursor delivery vessel constructed and arranged to store a solid precursor and deliver a gas phase precursor at a vessel outlet, the precursor delivery vessel being constructed in fluid communication with a chamber defined by a top plate and a bottom plate constructed and arranged to be supported on an upper surface of the solid precursor and movable with the upper surface of the solid precursor within the vessel, the bottom plate being provided with holes that allow gas transfer between the chamber and a portion of the vessel in which the solid precursor is stored and that allow precursor sublimated from the solid precursor to enter the chamber.

2. 10. The vessel of claim 1, wherein the bottom plate is a mesh structure to allow for uniform sublimation of the solid precursor.

3. The container of claim 1 , wherein the chamber is further defined by a wall connected to the top plate and the bottom plate.

4. The vessel of claim 1 , wherein the vessel is provided with a spring between an inner surface of the vessel and the chamber to press the bottom plate against the top surface of the solid precursor within the vessel.

5. 10. The container of claim 1, wherein the container is provided with linear guide surfaces in the interior of the container for linearly guiding the chamber during its movement through the interior of the container.

6. 10. The vessel of claim 1, comprising an actuator constructed and arranged to move the solid precursor within the vessel.

7. The container of claim 6 , wherein the actuator is constructed and arranged to provide linear movement.

8. The container of claim 6 , wherein the actuator is constructed and arranged to provide reciprocating movement.

9. 7. The container of claim 6, wherein the actuator is constructed and arranged to provide a reciprocating movement having a frequency of 0.1 to 10,000 Hz.

10. 7. The container of claim 6, wherein the actuator is provided with a controller for switching the movement on and off between 1 and 0.01 Hz.

11. The vessel is provided with a vessel inlet constructed in fluid communication with the vessel outlet through the chamber and via at least one flexible tube to provide a flow of pick-up gas through the chamber for carrying the vapor phase precursor out of the chamber while allowing movement of the chamber within the vessel, and to supply the vessel with hafnium tetrachloride (HfCl) for depositing a transition metal. ４ ), Tantalum Pentachloride (TaCl ５ ), molybdenum pentachloride (MoCl ５ ), zirconium tetrachloride (ZrCl ４ ), or molybdenum dioxide dichloride (MoO ２ C ２ 10. The vessel of claim 1, wherein a heater is provided constructed and arranged to retain and sublimate a metal chloride such as .

12. a lifting device constructed and arranged to lift the chamber when the solid precursor is substantially finished; a fill port for refilling the vessel with a solid precursor when the chamber is raised; 10. The container of claim 1, further comprising: a lid for covering the fill port.

13. 1. A precursor delivery system for providing a vapor phase precursor from a solid precursor, the system comprising: a vessel constructed and arranged to store a solid precursor and provided with a vessel outlet, said vessel outlet constructed and arranged in fluid communication with a chamber supported above said solid precursor and constructed and arranged to move with said solid precursor level within said vessel; a holder constructed and arranged to hold said container; and a vapor outlet constructed and arranged to connect to the vessel outlet for delivery of the vapor precursor, wherein the chamber is defined by a top plate and a bottom plate constructed and arranged to be supported on an upper surface of the solid precursor, and the bottom plate is provided with holes to allow gas transfer between a portion of a vessel in which the solid precursor is stored and the chamber to allow sublimated precursor from the solid precursor to enter the chamber.

14. 14. The system of claim 13, wherein the system comprises an actuator constructed and arranged to move the solid precursor within the vessel.

15. 15. The system of claim 14, wherein the system is provided with a support frame that supports an actuator, and the holder and the actuator are constructed and arranged to apply a force between the support frame and the holder to move the container and the solid precursor.

16. The system of claim 15 , wherein the support frame, actuator, and holder are constructed and arranged to move the container in a rotational or tilting movement.

17. 1. A precursor delivery system for providing a vapor phase precursor from a solid precursor, the system comprising: a holder constructed and arranged to hold a container for storing and sublimating a solid precursor; an inert gas source constructed and delivered to connect to said container and deliver inert gas to said container; a vapor outlet constructed and arranged to connect to said container for delivery of said vapor precursor, wherein said holder is constructed and arranged to allow movement of said container.

18. 20. The system of claim 17, wherein the system comprises an actuator constructed and arranged to apply a force to the container to move the container.

19. A precursor deposition apparatus comprising the precursor delivery system of claim 13 for delivering a gas phase precursor for depositing a layer on a substrate.

20. 20. The apparatus of claim 19, wherein the apparatus is a vertical furnace comprising a reactor constructed and arranged to load a boat having a plurality of substrates, and the precursor delivery system is constructed and arranged to deliver a gas phase precursor for depositing a layer on the plurality of substrates in the reactor.

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