Shutter device, lithography apparatus, and article manufacturing method

Abstract

To provide a technique advantageous in improving rigidity of shutter blades.SOLUTION: A shutter device that allows exposure light to pass or blocks the light comprises: a rotation source which drives to rotate a rotation axis; a hub connected to the rotation axis; and shutter blades fixed to the hub, where the hub has a holding face holding the shutter blades, the holding face includes a first region and a second region which do not belong to the same plane, the shutter blades are fixed to the hub by a first fastening part in the first region and fixed to the hub by a second fastening part in the second region.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present invention relates to a shutter apparatus, a lithographic apparatus and a method for manufacturing an article. [Background technology]

[0002] In a lithography method for manufacturing an article such as a semiconductor device, an exposure apparatus may be used to transfer a pattern of an original to a substrate. In the exposure apparatus, a shutter apparatus may be used to control the exposure time or the amount of exposure. The shutter apparatus includes a shutter blade that blocks the exposure light. A state in which the exposure light is blocked by the shutter blade is a non-irradiation state in which the exposure light is not irradiated to the substrate, and a state in which the exposure light is not blocked by the shutter blade is an irradiation state in which the exposure light is irradiated to the substrate. The shutter apparatus may switch between the non-irradiation state and the irradiation state by rotating the shutter blade with a rotating source. In order to improve the throughput of the exposure apparatus, it is necessary to increase the rotation speed of the shutter blade, and therefore the shutter blade may be made lighter. However, if the shutter blade is made lighter, the rigidity of the shutter blade may be reduced.

[0003] Patent Document 1 describes a shutter blade device in which the shutter blade is fixed to the rotating shaft of a motor while being clamped by a boss and a presser plate. The shutter blade is fixed by a bolt that is screwed into the boss and the presser plate. The boss has a first pressing member including two first pressing portions that press a first surface of the shutter blade. The presser plate has a second pressing member including a second pressing portion that presses a second surface of the shutter blade. The second pressing portion is located at a position corresponding to between the two first pressing portions, so that the shutter blade is deformed, thereby increasing the rigidity of the shutter blade. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2008-141016 A Summary of the Invention [Problem to be solved by the invention]

[0005] In the configuration described in Patent Document 1, the first pressing portion and the second pressing portion for deforming the shutter blade are disposed at a position away from the bolt. Therefore, the force that can be applied to the shutter blade by the first pressing portion and the second pressing portion is limited, and the deformation of the shutter blade and the improvement of its rigidity due to the deformation may be limited.

[0006] An object of the present invention is to provide an advantageous technique for improving the rigidity of a shutter blade. [Means for solving the problem]

[0007] One aspect of the present invention relates to a shutter device that allows exposure light to pass through or blocks it, the shutter device comprising a rotation source that rotates a rotating shaft, a hub connected to the rotating shaft, and a shutter blade fixed to the hub, the hub having a holding surface that holds the shutter blade, the holding surface including a first region and a second region that do not belong to the same plane, the shutter blade being fixed to the hub in the first region by a first fastening portion, and being fixed to the hub in the second region by a second fastening portion. Effect of the Invention

[0008] According to the present invention, an advantageous technique is provided for improving the rigidity of the shutter blades. [Brief description of the drawings]

[0009] [Figure 1] FIG. 1 is a diagram showing the configuration of an exposure apparatus (lithography apparatus) according to an embodiment. [Diagram 2] FIG. 2 is a diagram showing the configuration of a shutter device according to an embodiment. [Diagram 3] FIG. 2 is a diagram showing a structure of a hub according to an embodiment. [Figure 4] FIG. 2 is a diagram showing the configuration of a shutter device according to an embodiment. [Diagram 5] 1 is an exaggerated view of the deformed state of the shutter blades. [Figure 6] FIG. [Figure 7] FIG. [Figure 8] FIG. [Figure 9] FIG. 13 is a view showing a fourth modified example. [Figure 10] FIG. 13 is a diagram showing a fifth modified example. [Figure 11] FIG. 13 is a diagram showing a sixth modified example. [Figure 12] FIG. 13 is a diagram showing a seventh modified example. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Hereinafter, the embodiments will be described in detail with reference to the attached drawings. Note that the following embodiments do not limit the invention according to the claims. Although the embodiments describe a number of features, not all of these features are essential to the invention, and the features may be combined in any manner. Furthermore, in the attached drawings, the same reference numbers are used for the same or similar configurations, and duplicated descriptions are omitted.

[0011] 1 shows the configuration of an exposure apparatus 100 according to one embodiment. The exposure apparatus 100 is an example of a lithography apparatus that uses light to transfer a pattern of an original 2 onto a substrate 3. Examples of lithography apparatus include an exposure apparatus and an imprint apparatus.

[0012] The exposure apparatus 100 may include a light source 1, a shutter device 4, an original stage 5, a projection optical system 6, and a substrate stage 7. The exposure apparatus 100 may also include a controller 13 that controls the operation of the exposure apparatus 100. The exposure apparatus 100 may be configured as a scanner (scanning exposure apparatus) or as a stepper. The light source 1 generates exposure light. As the light source 1, for example, a mercury lamp, a laser light source, or an EUV light source may be adopted.

[0013] The original stage 5 can be positioned in two-dimensional directions parallel to a plane (i.e., the XY plane) perpendicular to the optical axis (Z axis) of the projection optical system 6, and in rotation (i.e., the θZ direction) around the optical axis (Z axis), thereby positioning the original 2. The original stage 5 can be driven by a driving mechanism (not shown). A reflecting mirror 8 can be disposed on the original stage 5. A laser interferometer 10 can be disposed at a position facing the reflecting mirror 8. The two-dimensional position and rotation angle of the original stage 5 can be measured in real time by the laser interferometer 10, and the measurement results can be provided to the control unit 13. The control unit 13 can control the driving mechanism of the original stage 5 based on the measurement results by the laser interferometer 10, and position the original 2 held by the original stage 5.

[0014] The projection optical system 6 includes multiple optical elements and projects the pattern of the original 2 onto the substrate 3 at a predetermined magnification. A photosensitive agent (resist) is applied to the substrate 3, and a latent image pattern is formed in the photosensitive agent by projecting the pattern of the original 2 onto the photosensitive agent. The substrate stage 7 may include, for example, a Z stage that holds the substrate 3, an XY stage that supports the Z stage, and a base that supports the XY stage. The substrate stage 7 may be driven by a driving mechanism such as a linear motor.

[0015] A reflecting mirror 9 may be disposed on the substrate stage 7. A laser interferometer 11 may be disposed at a position facing the reflecting mirror 9. The position of the substrate stage 7 may be measured in real time by the laser interferometer 11, and the measurement results may be provided to a control unit 13. The control unit 13 may control a drive mechanism for the substrate stage 7 based on the measurement results by the laser interferometer 11, and position the substrate 3 held by the substrate stage 7.

[0016] When the exposure apparatus 100 is configured as a stepper, in an exposure process in which the substrate 3 is exposed with the substrate stage 7 settled, the exposure light generated by the light source 1 is irradiated onto the substrate 3. On the other hand, in a step process in which the substrate stage 7 is moved, the exposure light generated by the light source 1 is not irradiated onto the substrate 3. The shutter device 4 is disposed between the light source 1 and the original stage 5, and passes or blocks the exposure light. The shutter device 4 passes the exposure light in the exposure process, and blocks the exposure light in the step process. The shutter device 4 is configured to switch between irradiating and not irradiating the substrate 3 with the exposure light, and its operation is controlled by the control unit 13. The configuration of the shutter device 4 will be described below by way of example.

[0017] FIG. 2 is a diagram showing a configuration of a shutter device 4 of an embodiment. The shutter device 4 may include a rotation source 43 (e.g., a motor) that rotates a rotation shaft 44, a hub 42 connected to the rotation shaft 44, and a shutter blade 41 fixed to the hub 42. The shutter blade 41 has a blocking portion 411 that blocks the exposure light EL from the light source 1, and a passing portion 412 that passes the exposure light EL. In the example shown in FIG. 2, the shutter blade 41 has three blocking portions 411 and three passing portions 412, but the number of these portions can be determined arbitrarily. When starting exposure of the substrate 3, the control unit 13 rotates the shutter blade 41 to change from a blocking state in which the exposure light EL is blocked by the blocking portion 411 to a non-blocking state in which the exposure light EL is passed by the passing portion 412. On the other hand, when the exposure of the substrate 3 is to be ended, the control unit 13 rotates the shutter blade 41 again, changing the state from a non-blocking state in which the exposure light EL is passed by the passing portion 412 to a blocking state in which the exposure light EL is blocked by the blocking portion 411.

[0018] The structure of the hub 42 that holds the shutter blade 41 will be described below by way of example. FIG. 3 shows an example of the structure of the hub 42 according to one embodiment. FIGS. 4(a) to 4(c) show an example of the state in which the shutter blade 41 is attached to the hub 42 according to one embodiment. FIG. 4(a) shows the entire shutter blade 41, FIG. 4(b) shows a part of the shutter blade 41, and FIG. 4(c) shows a cross section taken along line AA of FIG. 4(b). Although FIG. 4(c) shows a gap between the hub 42 and the shutter blade 41, the hub 42 and the shutter blade 41 may be in contact with each other partially or entirely.

[0019] The shutter blade 41 may have at least one blade, preferably a plurality of blades 41a, 41b, 41c. Each of the plurality of blades 41a, 41b, 41c includes an area that functions as the blocking portion 411 described above. The hub 42 has a holding surface HS that holds the shutter blade 41. The shutter blade 41 is fixed to the hub 42 by a plurality of fastening portions 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, 19c. The shutter blade 41 may have a plurality of openings 51a, 52a, 53a, 51b, 52b, 53b, 51c, 52c, 53c. The plurality of fastening portions 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, 19c may include bolts that pass through these openings. Alternatively, all or part of the multiple fastening parts 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c may be configured by welding or adhesion. When welding or adhesion is applied, an opening for the bolt is not required. When a bolt is used as the fastening part, a toothed washer (lock washer) may be disposed between the shutter blade 41 and the seating surface of the bolt. The teeth of the toothed washer scratch the seating surface to increase the frictional force, thereby preventing the bolt from loosening.

[0020] The first side surface of the hub 42 will be described below. The holding surface HS of the hub 42 may include first regions 14a, 14b, and 14c that belong to the same plane (plane P). The holding surface HS may also include second regions 15a, 15b, and 15c that do not belong to the plane P to which the first regions 14a, 14b, and 14c belong. The first regions 14a, 14b, and 14c may be formed, for example, as planes (planar regions) that belong to the plane P. The second regions 15a, 15b, and 15c may be formed, for example, as curved surfaces.

[0021] The holding surface HS may include a first region 14a and a second region 15a that do not belong to the same plane (plane P). The holding surface HS may include a first region 14b and a second region 15b that do not belong to the same plane (plane P). The holding surface HS may include a first region 14c and a second region 15c that do not belong to the same plane (plane P). Here, examples of the form of the first region and the second region that do not belong to the same plane include (1) a form in which the first region belongs to the plane P and the second region does not belong to the plane P, or (2) a form in which the second region belongs to a plane and the first region does not belong to the plane P. Examples of the form in which a certain region does not belong to the plane P include (1) a form in which the region belongs to a plane parallel to the plane P, (2) a form in which the region belongs to a plane intersecting the plane P, or (3) a form in which the region is formed by a curved surface. 3 and 4 show an example in which the first regions 14a, 14b, and 14c are formed by planes belonging to the plane P, and the second regions 15a, 15b, and 15c are formed by curved surfaces spaced apart from the plane P. In FIG.

[0022] The blade 41a of the shutter blade 41 is fixed to the hub 42 by the first fastening portion 17a in the first region 14a, and is fixed to the hub 42 by the second fastening portion 18a in the second region 15a. The blade 41b of the shutter blade 41 is fixed to the hub 42 by the first fastening portion 17b in the first region 14b, and is fixed to the hub 42 by the second fastening portion 18b in the second region 15b. The blade 41c of the shutter blade 41 is fixed to the hub 42 by the first fastening portion 17c in the first region 14c, and is fixed to the hub 42 by the second fastening portion 18c in the second region 15c. When the shutter blade 41 is fixed to the hub 42, it may have a first contact portion CP1 that contacts the first regions 14a, 14b, and 14c and a second contact portion CP2 that contacts the second regions 15a, 15b, and 15c. Such a configuration is advantageous for improving the rigidity of the shutter blade 41 and reducing the assembly variation of the shutter device 4.

[0023] The shutter blade 41 has a plurality of first openings 51a, 51b, 51c and a plurality of second openings 52a, 52b, 52c. The first fastening portions 17a, 17b, 17c may include first bolts that pass through the first openings 51a, 51b, 51c, respectively, and are fastened to the screw holes 61a, 61b, 61c of the hub 42. The second fastening portions 18a, 18b, 18c may include a plurality of second bolts that pass through the second openings 52a, 52b, 53c, and are fastened to the screw holes 62a, 62b, 62c of the hub 42.

[0024] As described above, the first regions 14a, 14b, 14c and the second regions 15a, 15b, 15c are arranged so as not to belong to the same plane (plane P). Therefore, the blade 41a of the shutter blade 41 is fastened to the hub 42 by the first fastening portion 17a and the second fastening portion 18a, and is deformed by the force (fastening force) received from the first fastening portion 17a, the second fastening portion 18a, and the hub 42. Similarly, the blade 41b of the shutter blade 41 is fastened to the hub 42 by the first fastening portion 17b and the second fastening portion 18b, and is deformed by the force received from the first fastening portion 17b, the second fastening portion 18b, and the hub 42. Similarly, the blade 41c of the shutter blade 41 is fastened to the hub 42 by the first fastening portion 17c and the second fastening portion 18c, and is deformed by the forces received from the first fastening portion 17c, the second fastening portion 18c, and the hub 42. In other words, the shutter blade 41 is forcibly deformed by being fixed to the hub 42 by the fastening portions.

[0025] Fig. 5 shows an example of a state in which the shutter blade 41 is deformed. In Fig. 5, the deformation of the shutter blade 41 is emphasized. The shutter blade 41 is deformed by the force received from the fastening parts 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, 19c and the hub 42, and thus the moment of inertia of area is increased compared to the case in which such deformation is not performed. This improves the rigidity of the shutter blade 41.

[0026] When a shutter blade having a curved shape as illustrated in FIG. 5 is manufactured by press processing or a 3D printer, it is difficult to mirror-finish the shutter blade. On the other hand, according to this embodiment, the shutter blade 41 having a flat shape before being attached to the hub 42 is manufactured, and then it is attached to the hub 42 to deform it and improve its rigidity. Therefore, in this embodiment, it is easy to mirror-finish the shutter blade 41. By mirror-finishing the shutter blade 41, it is possible to suppress the absorption of exposure light by the shutter blade 41. This is advantageous for suppressing deformation and melting of the shutter blade 41 due to heat.

[0027] The hub 42 may be understood as having a second side as follows. In the second side, the holding surface HS includes a first region 14a, a second region 15a, and a third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b, the first region 14a and the third region 14b belong to a virtual plane (plane P), and the second region 15a does not belong to the virtual plane (plane P). The shutter blade 41 is fixed to the hub 42 by a third fastening portion 19a in the third region 14b. The second region 15a may be configured as a curved surface. Alternatively, the second region 15a may be configured as a plane parallel to the virtual plane (plane P). The second region 15a is, for example, recessed with respect to the first region 14a and the third region 14b. The shutter blade 41 has a plurality of third openings 53a, 53b, 53c. The third fastening portions 19a, 19b, and 19c may each include a first bolt that passes through the third openings 53a, 53b, and 53c. The third fastening portions 19a, 19b, and 19c may each include a third bolt that passes through the third openings 53a, 53b, and 53c and is fastened to the screw holes 63a, 63b, and 63c of the hub 42.

[0028] Modifications of the above embodiment will be described below. Matters not mentioned in the following description may follow the description of the above embodiment.

[0029] FIG. 6 shows a first modified example. FIG. 6 corresponds to the AA cross section of FIG. 4(b). As illustrated in FIG. 6, the first region 14a of the holding surface HS of the hub 42 may be configured with a first plane that belongs to a virtual plane (plane P), and the second region 15a of the holding surface HS may be configured with a second plane that does not belong to the virtual plane to which the first plane belongs. The second plane may or may not be parallel to the first plane. On the other side, the holding surface HS includes the first region 14a, the second region 15a, and the third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b, the first region 14a and the third region 14b belong to the virtual plane (plane P), and the second region 15a is configured with a second plane that does not belong to the virtual plane (plane P). The second region 15a is recessed with respect to the first region 14a and the third region 14b.

[0030] A second modified example is shown in FIG. 7. FIG. 7 corresponds to the AA cross section of FIG. 4(b). As illustrated in FIG. 7, the first region 14a of the holding surface HS of the hub 42 is configured by a first plane that belongs to a virtual plane (plane P), and the second region 15a of the holding surface HS is configured by a second plane that does not belong to the virtual plane to which the first plane belongs. The second plane may or may not be parallel to the first plane. On the other side, the holding surface HS includes the first region 14a, the second region 15a, and the third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b. The holding surface HS may have a convex shape configured by the first region 14a, the second region 15a, and the third region 14b.

[0031] A third modified example is shown in FIG. 8. FIG. 8 corresponds to the AA cross section of FIG. 4(b). As illustrated in FIG. 8, the holding surface HS includes a first region 14a, a second region 15a, and a third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b. The first region 14a, the second region 15a, and the third region 14b may be respectively configured as planes that are not parallel to each other. The holding surface HS may have a convex shape configured by the first region 14a, the second region 15a, and the third region 14b. The first region 14a and the third region 14b may be inclined regions.

[0032] A fourth modified example is shown in Fig. 9. Fig. 9 corresponds to the AA cross section of Fig. 4(b). The hub 42 may include a base 421 connected to the rotating shaft 44, and a spacer 30 disposed between the base 421 and the shutter blade 41. The surface of the base 421 includes the first region 14a (and the third region 14b), and the surface of the base 421 includes the second region 15a. In this way, by forming the hub 42 with the base 421 and the spacer 30, the manufacture of the hub 42 can be facilitated.

[0033] FIG. 10 shows a fifth modified example. FIG. 10 corresponds to the AA cross section of FIG. 4(b). The holding surface HS of the shutter blade 41 may include a curved surface 71 connecting the first region 14a and the second region 15a. The holding surface HS may also include a curved surface 72 connecting the second region 15a and the third region 14b. Such a configuration is advantageous for alleviating the stress applied to the shutter blade 41 by the boundary between the first region 14a and the second region 15a and / or the boundary between the second region 15a and the third region 14b. This may contribute to improving the durability of the shutter blade 41 or the shutter device 4. It is preferable that at least the portions of the first region 14a, the second region 15a, and the third region 14b where the screw holes 61a, 61b, and 61c are provided are flat. Such a configuration is also advantageous for alleviating the stress applied to the shutter blade 41.

[0034] FIG. 11 shows a sixth modified example. FIG. 11 corresponds to the AA cross section of FIG. 4(b). The sixth modified example is a modified example of the fifth modified example. The holding surface HS of the shutter blade 41 may have an asymmetric shape with respect to a virtual plane VP including the central axis of the rotating shaft 44 and the center of the second fastening portion 18a. The fifth modified example shown in FIG. 10 may be understood as an example in which the holding surface HS of the shutter blade 41 has a symmetric shape with respect to a virtual plane VP including the central axis of the rotating shaft 44 and the center of the second fastening portion 18a. In the fifth modified example shown in FIG. 10, the inclination angle of the part of the holding surface HS of the hub 42 that covers the curved surface 72 of the shutter blade 41 (the inclination angle with respect to the virtual plane VP and the plane perpendicular to the rotating shaft 44) is θ1. 11, the inclination angle (the inclination angle with respect to the imaginary plane VP and the plane perpendicular to the rotation axis 44) of the portion of the shutter blade 41 that covers the curved surface 72 of the holding surface HS of the hub 42 is θ2, where θ2<θ1. The shutter blade 41 of the fifth modification reduces the air resistance during rotation more than the shutter blade 41 of the fourth modification, and therefore reduces the lift force acting during rotation.

[0035] 12 shows a seventh modified example. In the seventh modified example, the shutter blade 41 is composed of a plurality of members, each of which includes one blade 60. In other words, the shutter blade 41 can include a plurality of blades 60 that are divisible and separable from one another when the fastening by the bolts 17 is released. The hub 42 has a flat surface 14 and a curved surface 15, and each blade 60 is fastened to the flat surface 14 and the curved surface 15 by the bolts 17, and is deformed thereby. By having the shutter blade 41 composed of a plurality of members, the processing cost can be reduced.

[0036] Hereinafter, an article manufacturing method for manufacturing an article using a lithography apparatus represented by the exposure apparatus 100 will be described. The article may be, for example, a semiconductor IC element, a liquid crystal display element, or a MEMS. The article manufacturing method may include a transfer step of transferring a pattern of an original to a substrate using a lithography apparatus, and a processing step of obtaining an article by processing the substrate that has undergone the transfer step. When the lithography apparatus is an exposure apparatus, the transfer step may include an exposure step of exposing a substrate (wafer, glass substrate, etc.) coated with a photosensitive agent, and a step of developing the substrate (photosensitive agent) that has undergone the exposure step. When the lithography apparatus is an imprint apparatus, the transfer step may include a contact step of contacting an original with an imprint material on a substrate, a curing step of curing the imprint material, and a separation step of separating the original from the cured imprint material. The processing step may include, for example, etching, resist stripping, dicing, bonding, packaging, and the like.

[0037] The disclosure in this specification and the accompanying drawings includes the following inventions. (Item 1) A shutter device that allows or blocks exposure light, A rotation source that rotates the rotation shaft; A hub connected to the rotating shaft; a shutter blade fixed to the hub; The hub has a holding surface that holds the shutter blade, the support surface includes a first region and a second region that are not coplanar; The shutter blade is secured to the hub in the first region by a first fastening portion and secured to the hub in the second region by a second fastening portion. A shutter device comprising: (Item 2) the shutter blade has a first opening and a second opening; The first fastening portion includes a first bolt passing through the first opening, and the second fastening portion includes a second bolt passing through the second opening. 2. The shutter device according to item 1, (Item 3) The shutter blade is fastened to the hub by the first fastening portion and the second fastening portion, and is deformed by a force received from the first fastening portion, the second fastening portion, and the hub. 3. The shutter device according to item 2, (Item 4) the shutter blade has a contact portion that contacts the first region and a contact portion that contacts the second region when the shutter blade is fixed to the hub; 4. The shutter device according to any one of items 1 to 3. (Item 5) The holding surface has a first region formed of a flat surface and a second region formed of a curved surface. 5. The shutter device according to any one of items 1 to 4. (Item 6) The first area is formed by a first plane, and the second area is formed by a second plane that does not belong to a virtual plane to which the first plane belongs. 5. The shutter device according to any one of items 1 to 4. (Item 7) The support surface further includes a third region; the second region is disposed between the first region and the third region, the first region and the third region belong to a virtual plane, The second region does not belong to the virtual plane, The shutter blade is fixed to the hub in the third region by a third fastening portion. 5. The shutter device according to any one of items 1 to 4. (Item 8) The second region is composed of a curved surface. 8. The shutter device according to item 7, (Item 9) The second region is formed by a plane parallel to the virtual plane. 8. The shutter device according to item 7, (Item 10) 10. The shutter device according to any one of items 7 to 9, wherein the second region is recessed with respect to the first region and the third region. (Item 11) The holding surface includes a curved surface connecting the first region and the second region, and a curved surface connecting the second region and the third region. 11. The shutter device according to item 10, (Item 12) The holding surface has an asymmetric shape with respect to a virtual plane including a central axis of the rotation shaft and a center of the second fastening portion. 12. The shutter device according to item 11, (Item 13) the first region, the second region, and the third region form a convex shape; 10. The shutter device according to any one of items 7 to 9, (Item 14) The support surface further includes a third region; the second region is disposed between the first region and the third region, the first region, the second region, and the third region are each formed of a plane that is not parallel to one another; The shutter blade is fixed to the hub in the third region by a third fastening portion. 5. The shutter device according to any one of items 1 to 4. (Item 15) The holding surface has a convex shape constituted by the first region, the second region, and the third region. 15. The shutter device according to item 14, (Item 16) the hub includes a base connected to the rotation shaft and a spacer disposed between the base and the shutter blade; a surface of the base includes the first region, and a surface of the spacer includes the second region; 5. The shutter device according to any one of items 1 to 4. (Item 17) The shutter blade is composed of a plurality of members. 17. A shutter device according to any one of items 1 to 16, characterized in that (Item 18) A lithography apparatus that transfers a pattern of a master onto a substrate using light, comprising: 18. An exposure apparatus comprising the shutter device according to any one of items 1 to 17, which is arranged to control irradiation of the substrate with exposure light. (Item 19) A transfer step of transferring a pattern of a master to a substrate using the lithography apparatus according to item 18; a processing step of obtaining an article by processing the substrate that has been subjected to the transfer step; A method for manufacturing an article, comprising:

[0038] The invention is not limited to the above-described embodiments, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0039] 4: shutter device, 41: shutter blade, 42: hub, 43: rotation source, 44: rotation shaft, HS: holding surface, 14a, 14b, 14c: first region, 15a, 15b, 15c: second region

Claims

1. A shutter device that allows or blocks exposure light, A rotation source that rotates the rotation shaft; A hub connected to the rotating shaft; a shutter blade fixed to the hub; The hub has a holding surface that holds the shutter blade, The holding surface includes a first region and a second region that are not coplanar, the shutter blade is secured to the hub in the first region by a first fastening portion and secured to the hub in the second region by a second fastening portion; A shutter device comprising:

2. the shutter blade has a first opening and a second opening; The first fastening portion includes a first bolt passing through the first opening, and the second fastening portion includes a second bolt passing through the second opening.

2. The shutter device according to claim 1 .

3. the shutter blade is fastened to the hub by the first fastening portion and the second fastening portion, and is deformed by a force received from the first fastening portion, the second fastening portion, and the hub; 3. The shutter device according to claim 2.

4. the shutter blade has a contact portion that contacts the first region and a contact portion that contacts the second region when the shutter blade is fixed to the hub; 2. The shutter device according to claim 1 .

5. The holding surface is configured such that the first region is a flat surface and the second region is a curved surface.

2. The shutter device according to claim 1 .

6. The first area is configured by a first plane, and the second area is configured by a second plane that does not belong to a virtual plane to which the first plane belongs.

2. The shutter device according to claim 1 .

7. The support surface further includes a third region; the second region is disposed between the first region and the third region, the first region and the third region belong to a virtual plane, The second region does not belong to the virtual plane, the shutter blade is secured to the hub by a third fastening portion at the third region; 2. The shutter device according to claim 1 .

8. The second region is composed of a curved surface.

8. The shutter device according to claim 7.

9. The second region is formed by a plane parallel to the virtual plane.

8. The shutter device according to claim 7.

10. The shutter device according to claim 7 , wherein the second region is recessed with respect to the first region and the third region.

11. The holding surface includes a curved surface connecting the first region and the second region, and a curved surface connecting the second region and the third region. The shutter device according to claim 10 .

12. The holding surface has an asymmetric shape with respect to a virtual plane including a central axis of the rotation shaft and a center of the second fastening portion. The shutter device according to claim 11 .

13. The first region, the second region, and the third region form a convex shape.

8. The shutter device according to claim 7.

14. The support surface further includes a third region; the second region is disposed between the first region and the third region, the first region, the second region, and the third region are formed of planes that are not parallel to each other, the shutter blade is secured to the hub by a third fastening portion at the third region; 2. The shutter device according to claim 1 .

15. The holding surface has a convex shape constituted by the first region, the second region, and the third region.

15. The shutter device according to claim 14.

16. the hub includes a base connected to the rotation shaft and a spacer disposed between the base and the shutter blade; a surface of the base includes the first region, and a surface of the spacer includes the second region; 2. The shutter device according to claim 1 .

17. The shutter blade is composed of a plurality of members.

2. The shutter device according to claim 1 .

18. A lithography apparatus that transfers a pattern of a master onto a substrate using light, comprising:

18. An exposure apparatus comprising a shutter device according to claim 1, arranged to control the irradiation of the exposure light onto the substrate.

19. A transfer step of transferring a pattern of a master onto a substrate using the lithography apparatus according to claim 18; a processing step of obtaining an article by processing the substrate that has been subjected to the transfer step; A method for manufacturing an article, comprising:

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