Semiconductor device

JP2025039260APending Publication Date: 2025-03-21SUMITOMO ELECTRIC DEVICE INNOVATIONS
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Patent Information

Application Number
JP2023146217
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-09-08
Publication Date
2025-03-21

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Abstract

To provide a semiconductor device capable of restraining deterioration of characteristics.SOLUTION: A semiconductor device 100 includes a substrate 10, a first source electrode 12c, a first drain electrode 16c, a first gate electrode 14c, a first transistor 35c, a second source electrode 12d provided in the first source electrode, a second drain electrode 16d, a second gate electrode 14d, a second transistor 35d, a first gate wire 24 that is provided on a main surface 50, sandwiches the second source electrode with the second gate electrode, provided in the first source electrode as viewed in a second direction Y, and electrically connected to the first gate electrode, and a back surface metal layer 28 that is provided on a back surface 52 and electrically connected to the first source electrode and the second source electrode via a first via hole and a second via hole 20c that overlap the first source electrode and the second source electrode respectively as viewed in a thickness direction Z of the substrate.SELECTED DRAWING: Figure 2
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Citation Information

Patent Citations

  • Semiconductor device for power amplification

    JP2002299351A

  • Semiconductor device and method of manufacturing the same

    JP2022135899A

  • Transistor with Bypassed Gate Structure Field

    US20170271329A1