Semiconductor device

JP2025039261APending Publication Date: 2025-03-21SUMITOMO ELECTRIC DEVICE INNOVATIONS
View PDF 3 Cites 0 Cited by

Patent Information

Application Number
JP2023146218
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-09-08
Publication Date
2025-03-21

Smart Images

  • Figure 2025039261000001_ABST
    Figure 2025039261000001_ABST
Patent Text Reader

Abstract

To provide a semiconductor device capable of restraining deterioration of characteristics.SOLUTION: A semiconductor device 100 includes a substrate 10 having a main surface 50 and a back surface opposite to the main surface, a first transistor including a first source electrode 12a, a first drain electrode 16a, and a first gate electrode 14a, a second transistor 35c including a second source electrode 12c, a second drain electrode 16c, and a second gate electrode 14c, a third transistor including a third source electrode electrically connected to the first source electrode and the second source electrode, a third drain electrode electrically connected to the first drain electrode and the second drain electrode, and a third gate electrode, a first gate wire, and a back metal layer that is provided on the back surface and electrically connected to the first source electrode and the second source electrode through a first via hole 20a and a second via hole that overlap the first source electrode and the second source electrode respectively as viewed in a thickness direction of the substrate.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Semiconductor device for power amplification

    JP2002299351A

  • Semiconductor device and method of manufacturing the same

    JP2022135899A

  • Transistor with Bypassed Gate Structure Field

    US20170271329A1