Semiconductor device
JP2025039261APending Publication Date: 2025-03-21SUMITOMO ELECTRIC DEVICE INNOVATIONS
Patent Information
- Application Number
- JP2023146218
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-09-08
- Publication Date
- 2025-03-21
Smart Images

Figure 2025039261000001_ABST
Abstract
To provide a semiconductor device capable of restraining deterioration of characteristics.SOLUTION: A semiconductor device 100 includes a substrate 10 having a main surface 50 and a back surface opposite to the main surface, a first transistor including a first source electrode 12a, a first drain electrode 16a, and a first gate electrode 14a, a second transistor 35c including a second source electrode 12c, a second drain electrode 16c, and a second gate electrode 14c, a third transistor including a third source electrode electrically connected to the first source electrode and the second source electrode, a third drain electrode electrically connected to the first drain electrode and the second drain electrode, and a third gate electrode, a first gate wire, and a back metal layer that is provided on the back surface and electrically connected to the first source electrode and the second source electrode through a first via hole 20a and a second via hole that overlap the first source electrode and the second source electrode respectively as viewed in a thickness direction of the substrate.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
Semiconductor device for power amplification
JP2002299351A
Semiconductor device and method of manufacturing the same
JP2022135899A
Transistor with Bypassed Gate Structure Field
US20170271329A1