Wastewater treatment system and wastewater treatment method

Abstract

To provide wastewater treatment system and method that treat wastewater generated in a manufacturing process by an appropriate treatment method suited to a manufacturing step while reducing a load on treatment facilities, and efficiently perform detoxification of pollutants and recovery of useful substances.SOLUTION: A wastewater treatment system 1 includes: a plurality of treatment facilities 20a to 20c that treat wastewater generated in a plurality of manufacturing devices 10a to 10c that perform each step constituting a manufacturing process by a treatment method according to components contained in the wastewater; a plurality of wastewater lines 30a to 30c that can respectively send wastewater generated in the manufacturing devices to the plurality of treatment facilities; measurement means 40a to 40c that measure the components contained in the wastewater or an amount of the wastewater; switching means 50a to 50c that switch a water supply path of the wastewater from the manufacturing device to the treatment facilities; and control means that controls the switching of the water supply path. In a wastewater treatment method, the control means switches the water supply path on the basis of at least one or more of measurement results by the measurement means and step information that indicates step contents in a manufacturing step.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a wastewater treatment system and a wastewater treatment method for treating wastewater generated in a manufacturing process for manufacturing a product. [Background technology]

[0002] The semiconductor manufacturing process includes a front-end process of forming semiconductor elements on a wafer, and a back-end process of cutting the wafer with the semiconductor elements formed thereon into packages. The front-end process of the semiconductor manufacturing process includes various manufacturing steps such as film formation, resist application, exposure, development, etching, doping with impurities, removing resist, forming wiring and electrodes, and planarization. Semiconductor elements and circuits are formed by repeating the manufacturing steps from film formation to planarization.

[0003] In the semiconductor manufacturing process, wafers are cleaned to remove contamination sources such as components, particles, metals, and ions. Various types of functional cleaning water and ultrapure water are used in the cleaning process. Also, in manufacturing processes such as etching, water is often used as a solvent for chemical solutions. When cutting or polishing the wafer, water is sprayed to remove cutting debris, polishing debris, abrasive grains, and the like, and to cool the wafer. A large amount of water is used in the semiconductor manufacturing process, and wastewater containing various components is generated in each manufacturing process.

[0004] Wastewater generated in semiconductor manufacturing processes contains various components that can pollute the water environment, such as cleaning components, chemical components, particles, metals, and ions. It may also contain reusable components, such as fluorine compounds, acids, and alkalis. For this reason, wastewater generated in each manufacturing step in the semiconductor manufacturing process is treated with wastewater treatment in order to render the pollutants harmless or remove them and to recover useful substances.

[0005] 2. Description of the Related Art Conventionally, techniques have been proposed for efficiently treating wastewater generated in factories or facilities in accordance with processes carried out in the factories or facilities.

[0006] Patent Document 1 describes a wastewater treatment device that performs biological treatment on wastewater containing organic matter. This wastewater treatment device includes multiple adjustment tanks that store wastewater from a production facility, a measuring means that can measure the concentration of wastewater from the production facility in response to input of production information from the production facility including at least the production item and production process, a control means that controls distribution of the wastewater to the multiple adjustment tanks based on the measured concentration of the wastewater and a predetermined concentration standard value, and a delivery means that delivers the wastewater stored in the adjustment tanks to the wastewater treatment facility. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] Patent No. 7282730 Summary of the Invention [Problem to be solved by the invention]

[0008] In conventional semiconductor manufacturing processes, wastewater generated in each manufacturing step constituting the manufacturing process is primarily treated in a treatment facility suitable for treating the main components contained in the wastewater. Usually, the composition of components in the wastewater generated in each manufacturing step is roughly determined according to the content of the manufacturing step. Therefore, the wastewater generated in each manufacturing step is sent to a predetermined treatment facility corresponding to the manufacturing step and is treated to render harmless or remove the main components contained in the wastewater.

[0009] For example, in the semiconductor manufacturing process, RCA cleaning generates wastewater from SC-1 cleaning that contains ammonium ions. The cleaning process after etching generates wastewater that contains fluorine such as hydrofluoric acid. Methods for treating wastewater that contains ammonium ions include ion exchange, biological treatment, and stripping. Methods for treating wastewater that contains fluorine include coagulation precipitation using calcium and ion exchange.

[0010] However, in conventional semiconductor manufacturing processes, all wastewater generated in each manufacturing process is primarily treated in a treatment facility suitable for treating the main components contained in the wastewater. The wastewater generated in each manufacturing process often contains various subcomponents in addition to the main components. There are cases where a large amount of subcomponents that should be rendered harmless or removed remains in the wastewater after the primary treatment. In such cases, the primary treated wastewater is sent to another treatment facility suitable for treating the subcomponents and undergoes additional treatment such as secondary treatment or tertiary treatment.

[0011] The treatment facility for additional treatment is a facility that employs a treatment method capable of treating minor components. However, such treatment facilities may be installed for the primary treatment of wastewater generated in other manufacturing processes that constitute the manufacturing process. For example, in a semiconductor manufacturing process, there are cases where wastewater after primary treatment that contains low concentrations of acid generated in other manufacturing processes is sent to a treatment facility that treats wastewater containing acid.

[0012] In such a system, in a treatment facility installed to treat wastewater generated in a certain manufacturing process, wastewater generated in the certain manufacturing process is sent for primary treatment, and wastewater generated in other manufacturing processes is sent for additional treatment such as secondary treatment, tertiary treatment, etc. Since a large amount of wastewater generated in a plurality of manufacturing processes is sent to one treatment facility, there is a problem that the load on the treatment facility is large.

[0013] In such cases, it is necessary to install a treatment facility capable of receiving a large amount of wastewater, which requires increasing the capacity of the adjustment tank, treatment tank, etc. that constitute the treatment facility, enlarging the size of the drainage line, forming a comprehensive drainage line, etc. This leads to an increase in the size and complexity of the entire system, and to cumbersome operation of the system, resulting in problems such as inefficiency in rendering contaminants harmless or removing them and inefficient recovery of useful substances.

[0014] In Patent Document 1, the distribution of wastewater to a plurality of adjustment tanks is controlled based on the measured concentration value of the wastewater and a predetermined concentration standard value. However, all of the wastewater treatment facilities to which the wastewater stored in the adjustment tank is sent are assumed to perform biological treatment. The wastewater to be treated is wastewater containing organic matter discharged from a specified production facility and can be distributed and treated. With such a technology, it is difficult to efficiently treat the wastewater generated in each manufacturing process constituting the manufacturing process with an appropriate treatment method according to the components contained in the wastewater.

[0015] Therefore, an object of the present invention is to provide a wastewater treatment system and a wastewater treatment method that can treat wastewater generated in a manufacturing process using an appropriate treatment method according to the manufacturing process while reducing the load on the treatment equipment, thereby efficiently detoxifying pollutants and recovering useful substances. [Means for solving the problem]

[0016] In order to solve the above problem, the wastewater treatment system of the present invention is a wastewater treatment system that treats wastewater generated in a manufacturing process, and includes a plurality of treatment facilities that treat wastewater generated in a plurality of manufacturing devices for carrying out each manufacturing step that constitutes the manufacturing process using a treatment method corresponding to the components contained in the wastewater, a plurality of wastewater lines that are provided for each of the manufacturing devices and that can send wastewater generated in the manufacturing devices to each of the plurality of treatment facilities, a measurement means that is provided for each of the manufacturing devices and that measures the components contained in the wastewater generated in the manufacturing devices or the amount of the wastewater, a switching means that is provided for each of the wastewater lines and that switches the water supply path for the wastewater from the manufacturing devices to the treatment equipment, and a control means that controls the switching of the water supply path by the switching means, and the control means controls the switching of the water supply path for the wastewater from the manufacturing devices to the treatment equipment based on one or more of the measurement results by the measurement means and process information indicating the process contents in the manufacturing process.

[0017] In addition, the wastewater treatment method of the present invention is a wastewater treatment method for treating wastewater generated in a manufacturing process, which includes a plurality of treatment facilities that treat wastewater generated in a plurality of manufacturing devices for carrying out each manufacturing step that constitutes the manufacturing process using a treatment method corresponding to the components contained in the wastewater, and a plurality of wastewater lines that are provided for each of the manufacturing devices and can transport the wastewater generated in the manufacturing devices to each of the plurality of treatment facilities, and switches the water transport path for the wastewater from the manufacturing devices to the treatment facilities based on one or more of measurement results of the components contained in the wastewater generated in the manufacturing devices or the amount of the wastewater, and process information indicating the process content in the manufacturing process. Effect of the Invention

[0018] According to the present invention, a wastewater treatment system and a wastewater treatment method can be provided that can treat wastewater generated in a manufacturing process using an appropriate treatment method according to the manufacturing process while reducing the load on the treatment equipment, thereby efficiently rendering pollutants harmless and recovering useful substances. [Brief description of the drawings]

[0019] [Figure 1] 1 is a diagram showing a configuration of a wastewater treatment system according to an embodiment of the present invention. [Diagram 2] FIG. 1 is a diagram showing a configuration of a conventional wastewater treatment system. [Diagram 3] FIG. 2 is a diagram showing an example of the properties of wastewater generated in a manufacturing apparatus. [Figure 4] FIG. 2 is a diagram showing an example of a result of separation of wastewater by the wastewater treatment system according to the embodiment of the present invention. [Diagram 5] FIG. 2 is a diagram illustrating a control system in the wastewater treatment system according to the embodiment of the present invention. [Figure 6] FIG. 11 is a diagram showing an example of process information indicating process details related to wastewater in a manufacturing process. [Figure 7] 5 is a diagram illustrating the operation of a switching means in the wastewater treatment system according to the embodiment of the present invention. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0020] Hereinafter, a wastewater treatment system and a wastewater treatment method according to an embodiment of the present invention will be described with reference to the drawings. In the following drawings, common components are designated by the same reference numerals and duplicated descriptions will be omitted.

[0021] Fig. 1 is a diagram showing the configuration of a wastewater treatment system according to an embodiment of the present invention, in which arrows indicate water transport paths for wastewater and treated water. As shown in FIG. 1, the wastewater treatment system 1 of this embodiment includes a plurality of treatment equipment 20 (20a, 20b, 20c) that treats wastewater generated in a plurality of manufacturing apparatuses 10 (10a, 10b, 10c), a plurality of wastewater lines 30 (30a, 30b, 30c), measuring means 40 (40a, 40b, 40c), switching means 50 (50a, 50b, 50c), and control means (not shown).

[0022] The wastewater treatment system 1 is a system for treating wastewater generated in a manufacturing process for manufacturing a product. The wastewater treatment system 1 is provided in association with a manufacturing line for manufacturing the product. The manufacturing line is formed by a plurality of manufacturing devices 10 for carrying out each manufacturing step constituting the manufacturing process.

[0023] The manufacturing apparatuses 10 carry out manufacturing processes having different process contents according to a pre-planned production plan. By executing the production plan, a manufacturing process for manufacturing an intermediate product through a predetermined manufacturing process from raw materials, and a manufacturing process for manufacturing a final product through a predetermined manufacturing process from the intermediate product are carried out.

[0024] In each manufacturing apparatus 10 constituting the manufacturing line, waste liquid or waste water may be generated by carrying out each manufacturing process. Such waste liquid or waste water is discharged as wastewater from each manufacturing apparatus 10. The wastewater treatment system 1 treats the wastewater discharged from each manufacturing apparatus 10, neutralizing or removing contaminants contained in the wastewater generated in each manufacturing process, and recovering useful substances contained in the wastewater generated in each manufacturing process.

[0025] There is no particular limitation on the product manufactured by the manufacturing process to which the wastewater treatment system 1 is applied. The product manufactured by the manufacturing process to which the wastewater treatment system 1 is applied may be any of a final product, an intermediate product, other parts or components, secondary raw materials or secondary materials obtained by processing or fabricating raw materials, an assembled product in which multiple products are assembled together, and the like.

[0026] Specific examples of manufacturing processes to which the wastewater treatment system 1 can be applied include processes for manufacturing semiconductor elements, processes for manufacturing electronic products, processes for manufacturing microdevices, processes for manufacturing machines and machine parts, processes for manufacturing automobiles such as four-wheeled automobiles and motorcycles, processes for manufacturing pharmaceuticals, processes for manufacturing optical devices such as optical fibers, etc. As a manufacturing process, a semiconductor manufacturing process for manufacturing semiconductor elements is particularly preferable because it uses a large amount of water and generates a large amount of waste liquid and wastewater containing water.

[0027] The semiconductor manufacturing process includes, as manufacturing steps that generate wastewater, a step of cutting an ingot, a step of polishing a wafer, a step of forming a film on a wafer, a step of removing unnecessary photoresist transferred onto the wafer, a step of etching a wafer, a step of doping an impurity, a step of stripping the resist used for patterning, a step of forming wiring and electrodes, a step of planarizing a semiconductor wafer, a step of dicing a semiconductor wafer, etc. During or after these steps, cleaning steps that generate a large amount of wastewater are carried out.

[0028] Wastewater generated in the manufacturing process contains various components, such as pollutants to be rendered harmless or removed, and useful substances to be recovered. The components contained in the wastewater to be treated by the wastewater treatment system 1 may be organic or inorganic. Components to be treated include soluble substances including low molecular weight organic matter, high molecular weight organic matter, metal components, various ions, etc., suspended substances containing these, and solvent substances and dispersion medium substances that are the medium for these substances.

[0029] For example, in the case of cleaning a wafer, wastewater containing hydrogen peroxide, sulfuric acid, ammonia, hydrofluoric acid, hydrochloric acid, etc. is generated. In the case of etching, wastewater containing acids such as hydrofluoric acid, ammonium fluoride, nitric acid, acetic acid, sulfuric acid, phosphoric acid, etc., and alkalis such as potassium hydroxide and tetramethylammonium hydroxide, etc. is generated. In the case of polishing such as CMP, wastewater containing suspended matter such as silica, alumina, ceria, etc., electrolytes such as ammonium salts and potassium salts, acids such as nitric acid and hydrofluoric acid, alkalis such as ammonium hydroxide and potassium hydroxide, hydrogen peroxide, etc. is generated. In the process using gas for manufacturing, wastewater containing fluorine components, silica components, and various metal ions is generated from the exhaust gas scrubber. In the case of dicing, wastewater containing suspended matter, ions, etc. is generated. Such wastewater is the subject of treatment by the wastewater treatment system 1.

[0030] The manufacturing equipment 10 is an apparatus for carrying out each manufacturing step that constitutes the manufacturing process. The manufacturing equipment 10 carries out the manufacturing steps that are set in advance based on a production plan. The component composition of the wastewater generated by the manufacturing equipment 10 and the change over time in the amount of the wastewater correlate with the contents of the manufacturing process. Therefore, the wastewater generated by the manufacturing equipment 10 can be efficiently treated by sending it to an appropriate treatment facility 20 according to the contents of the manufacturing process.

[0031] As shown in FIG. 1, the manufacturing apparatus 10 can include a drainage tank 12. The drainage tank 12 receives various types of drainage water generated during the manufacturing process. However, it is preferable that the drainage water is not homogenized in the drainage tank 12 but is sequentially discharged outside the manufacturing apparatus 10. In the manufacturing apparatus 10, various treatments and processings according to the process contents are performed. The drainage water discharged for each treatment or processing can be efficiently treated by separating and sending it to an appropriate treatment facility 20.

[0032] The manufacturing apparatus 10 may be an apparatus for manufacturing an intermediate product or a final product, an apparatus for performing a predetermined treatment or processing on raw materials, intermediate products, or final products, or an apparatus for performing a predetermined treatment on devices, instruments, chemicals, functional substances, functional fluids, etc. used in these manufacturing processes. For example, a cleaning process in a semiconductor manufacturing process is included in the manufacturing process performed by the manufacturing apparatus 10.

[0033] In Fig. 1, the manufacturing equipment 10 is a series of three stages of equipment that generate wastewater. The manufacturing line is composed of a first manufacturing equipment 10a on the upstream side, a second manufacturing equipment 10b in the middle, and a third manufacturing equipment 10c on the downstream side. Raw materials and intermediate products in the manufacturing process are supplied to a predetermined manufacturing process in the order of the first manufacturing equipment 10a, the second manufacturing equipment 10b, and the third manufacturing equipment 10c.

[0034] However, the manufacturing apparatuses 10 can be provided in any number of stages or units, regardless of the configuration in FIG. 1. The manufacturing apparatuses 10 generating wastewater can be provided in any number of stages or units, up to two or more stages. The manufacturing apparatuses 10 may be installed in parallel to each other in each stage. The manufacturing apparatuses 10 installed in parallel can be connected to a common treatment facility 20.

[0035] The treatment equipment 20 is equipment that treats wastewater generated in the manufacturing equipment 10. A plurality of pieces of equipment are provided as the treatment equipment 20 so as to treat the main components contained in the wastewater generated in each manufacturing process. The treatment equipment 20 may be provided for each manufacturing equipment 10, or may be provided for each stage of the manufacturing equipment 10, etc.

[0036] Each treatment facility 20 treats the wastewater generated in the manufacturing apparatus 10 using a treatment method suitable for treating the components contained in the wastewater. A treatment method suitable for treating the components contained in the wastewater means a treatment method that has a relatively high ability to render harmless or separate the main components contained in the wastewater compared to other treatment methods. It is preferable that a plurality of treatment facilities suitable for treating the main components contained in the wastewater generated in each manufacturing process are installed as the treatment facility 20.

[0037] 1, three systems corresponding to a total of three stages of manufacturing equipment 10 are installed as processing equipment 20. The processing equipment 20 includes a first processing equipment 20a corresponding to the first manufacturing equipment 10a, a second processing equipment 20b corresponding to the second manufacturing equipment 10b, and a third processing equipment 20c corresponding to the third manufacturing equipment 10c. These manufacturing equipment 10 are installed as equipment using different processing methods so that they can process different components.

[0038] In the first treatment facility 20a, a treatment method suitable for treating the main components of the wastewater generated in the first manufacturing equipment 10a is adopted so that the main components can be efficiently treated. In the second treatment facility 20b, a treatment method suitable for treating the main components of the wastewater generated in the second manufacturing equipment 10b is adopted so that the main components can be efficiently treated. In the third treatment facility 20c, a treatment method suitable for treating the main components of the wastewater generated in the third manufacturing equipment 10c is adopted so that the main components of the wastewater generated in the third manufacturing equipment 10c can be efficiently treated.

[0039] In Fig. 1, the treatment facility 20 is composed of an adjustment tank 21, a treatment tank 22, and a treated water tank 23. The wastewater outlet of each manufacturing device 10 is connected to the adjustment tank 21 of each treatment facility 20. The adjustment tank 21, the treatment tank 22, and the treated water tank 23 are connected in series in this order.

[0040] The adjustment tank 21 is a tank that temporarily stores wastewater generated in the manufacturing apparatus 10. In the adjustment tank 21, the wastewater is homogenized, and the load on the treatment tank 22 is adjusted. In the adjustment tank 21, pretreatment of the treatment in the treatment tank 22 may be performed.

[0041] The treatment tank 22 is a tank that treats the wastewater delivered from the adjustment tank 21. In the treatment tank 22, the wastewater delivered from the adjustment tank 21 is treated by a treatment method suitable for treating the components contained in the wastewater according to the components. The treatment tank 22 may be composed of a tank that performs one type of treatment, or may be composed of tanks that perform multiple types of treatment. The treatment tank 22 may be composed of a single tank, or may be composed of multiple tanks. The treatment tank 22 may be provided as a closed container or tank such as a tank, or may be provided as an open container or tank.

[0042] The treated water tank 23 is a tank that temporarily stores the treated water delivered from the treatment tank 22. In the treated water tank 23, the release amount of the treated water treated in the treatment tank 22 is adjusted. The treated water received in the treated water tank 23 is released to the outside of the wastewater treatment system 1.

[0043] The treatment facility 20 may perform physical treatment, chemical treatment, biological treatment, or a combination of these on the wastewater. The treatment facility 20 may be designed in advance in terms of the treatment principle, the types of chemicals and equipment used in the treatment, the treatment conditions, etc., depending on the components of the wastewater discharged from each manufacturing apparatus 10.

[0044] For example, the treatment facility 20 may be one or more of a facility for carrying out a precipitation separation process, a facility for carrying out a coagulation precipitation process, a facility for carrying out a filtration process, a facility for carrying out an adsorption process, a facility for carrying out a crystallization process, a facility for carrying out an ion exchange process, a facility for carrying out a membrane separation process, a facility for carrying out an evaporation concentration process, a facility for carrying out a neutralization process, and a facility for carrying out a biological process. These processes can efficiently render or remove certain components contained in the wastewater harmless, or efficiently recover useful substances contained in the wastewater.

[0045] In the semiconductor manufacturing process, methods for treating wastewater containing ammonium ions include ion exchange, biological treatment, stripping, etc. Methods for treating wastewater containing fluorine include coagulation precipitation using calcium hydroxide, calcium carbonate, etc., fluoride crystallization, ion exchange, etc. Methods for treating wastewater containing suspended solids include precipitation separation, coagulation precipitation, etc. Methods for treating wastewater containing acid or alkali include neutralization, evaporation concentration, etc.

[0046] In Fig. 1, the treatment facility 20 is composed of an adjustment tank 21, a treatment tank 22, and a treated water tank 23, but may be configured as appropriate as long as it is provided with a treatment tank 22 suitable for treating a predetermined component. The treatment tanks 21 may be provided in any number of stages or units of two or more. The treatment tanks 22 may be installed in parallel with each other in each stage in the same system.

[0047] The drainage line 30 is a pipe for transporting wastewater, and is provided so that the wastewater generated in the manufacturing apparatus 10 can be transported to each of the multiple treatment facilities 20. The drainage line 30 is provided for each manufacturing apparatus 10 so that the wastewater generated for each manufacturing process can be transported to the treatment facility 20. In other words, the drainage line 30 is provided so as to connect the multiple manufacturing apparatuses 10 that generate wastewater to the multiple treatment facilities 20 with each other.

[0048] 1, three drainage lines 30 are installed corresponding to a total of three stages of manufacturing equipment 10 and three systems of processing equipment 20. The drainage lines 30 include a first drainage line 30a connecting each manufacturing equipment 10 to a first processing equipment 20a, a second drainage line 30b connecting each manufacturing equipment 10 to a second processing equipment 20b, and a third drainage line 30c connecting each manufacturing equipment 10 to a third processing equipment 20c.

[0049] A treated water line 32 is connected to the outlet side of the treatment facility 20. The treated water line 32 is a pipe for transporting treated water, and is provided so that the treated water treated in the treatment facility 20 can be transported outside the wastewater treatment system 1. The treated water line 32 can be provided for each treatment facility 20.

[0050] 1, three treated water lines 32 are installed corresponding to the three treatment facilities 20. The treated water lines 32 include a first treated water line 32a connected to the first treatment facility 20a, a second treated water line 32b connected to the second treatment facility 20b, and a third treated water line 32c connected to the third treatment facility 20c.

[0051] A return line 36 is connected to the treated water line 32 via a switching means 34 for switching the water supply path of the treated water. The return line 36 is a pipe for supplying the treated water, and is provided so that the treated water treated in the treatment equipment 20 can be returned to another treatment equipment 20. The treated water from which the main components have been treated in the treatment equipment 20 can be returned to the other treatment equipment 20 for additional treatment of secondary components remaining in the wastewater after the primary treatment.

[0052] In Fig. 1, three return lines 36 are provided corresponding to the three treatment facilities 20. Two first return lines 36a are connected to the first treated water line 32a via a first switching means 34a. Two second return lines 36b are connected to the second treated water line 32b via a second switching means 34b. Two third return lines 36c are connected to the third treated water line 32c via a third switching means 34c. Each system is connected to the inlet side of another treatment facility 20.

[0053] The measuring means 40 is composed of measuring instruments that measure the water quality and flow rate of the wastewater. The measuring means 40 measures components contained in the wastewater generated in the manufacturing equipment 10 and the amount of wastewater discharged from the manufacturing equipment 10. The measuring means 40 is provided for each manufacturing equipment 10 so that the wastewater from each manufacturing equipment 10 can be measured. The measuring means 40 may be provided in the manufacturing equipment 10 or in the drainage line 30. The measuring means 40 quantitatively determines the concentration of main components contained in the wastewater generated in the manufacturing equipment 10 and the flow rate of the wastewater discharged from the manufacturing equipment 10.

[0054] 1, three systems are installed as the measuring means 40 corresponding to a total of three stages of manufacturing equipment 10. The measuring means 40 includes a first measuring means 40a corresponding to the first manufacturing equipment 10a, a second measuring means 40b corresponding to the second manufacturing equipment 20a, and a third measuring means 40c corresponding to the third manufacturing equipment 10c.

[0055] The measuring means 40 may be a flow meter of an appropriate type such as an electromagnetic type, a vortex type, or an impeller type, or a measuring instrument for measuring a specific component such as a pH meter, an ORP meter, a density meter, a nitrogen concentration meter, a total carbon concentration meter, a carbon dioxide concentration meter, a fluorine ion concentration meter, or a phosphorus concentration meter. The measuring means 40 may be a measuring instrument for measuring the concentration of a main component contained in the wastewater, a measuring instrument for measuring the flow rate of the wastewater discharged from the manufacturing apparatus 10, or a combination of these. The principle of measuring the flow rate or concentration is not particularly limited, and a measuring instrument for measuring a physical quantity having a correlation therewith may be used.

[0056] The switching means 50 is a piping device installed in a pipe for transporting wastewater, and switches the water transport path of wastewater generated in the manufacturing apparatus 10 from the manufacturing apparatus 10 to the treatment facility 20. The switching means 50 is provided for each system of the wastewater line 30 so that the water transport path of the wastewater generated for each manufacturing apparatus 10 can be switched. The switching means 50 functions as a wastewater sorting means that sorts the wastewater generated in the manufacturing apparatus 10 by the time it is discharged from the manufacturing apparatus 10 by switching the water transport path for each manufacturing apparatus 10 in a time-division manner.

[0057] 1, nine switching means 50 are provided corresponding to the three drainage lines 30 for each of the three stages of production equipment 10. The switching means 50 include three first switching means 50a corresponding to the first production equipment 10a, three second switching means 50b corresponding to the second production equipment 20a, and three third switching means 50c corresponding to the third production equipment 10c.

[0058] 1, a two-way valve is installed on the drain line 30 as the switching means 50. However, various types of valves, piping equipment such as a manifold or pump, or a combination of these, can be used as the switching means 50. Various types of valves, such as a gate valve or a flow path switching valve, can be used.

[0059] In the wastewater treatment system 1, the water supply path from each manufacturing apparatus 10 constituting the production line to each treatment facility 20 is controlled to be switched based on the measurement results by the measuring means 40, process information indicating the process content in each manufacturing process, or both. The wastewater treatment method performed in the wastewater treatment system 1 switches the water supply path from the wastewater manufacturing apparatus 10 to the treatment facility 20 based on at least one of the measurement results of the components contained in the wastewater and the amount of the wastewater generated in the manufacturing apparatus 10, and the process information indicating the process content in the manufacturing process.

[0060] The wastewater discharged from each manufacturing apparatus 10 constituting the manufacturing line may have different component composition and amount depending on the process of the manufacturing process carried out by each manufacturing apparatus 10. By switching the water supply path from the manufacturing apparatus 10 to the treatment facility 20, the wastewater discharged from the manufacturing apparatus 10 is separated and subdivided, thereby reducing the load on the treatment facility 20. Furthermore, by switching the water supply path in a time-division manner, the wastewater can be separated and subdivided for each time it is discharged from the manufacturing apparatus 10, making it possible to efficiently treat wastewater whose component composition and amount vary with time using a treatment method appropriate for the components contained in the wastewater.

[0061] Fig. 2 is a diagram showing the configuration of a conventional wastewater treatment system. Fig. 2 shows the configuration of a conventional general wastewater treatment system that treats wastewater generated in a manufacturing process for manufacturing products. In Fig. 2, arrows indicate the water transport paths for wastewater and treated water with thicknesses according to the flow rates. As shown in FIG. 2, the conventional wastewater treatment system 5 includes a plurality of manufacturing devices 10, a plurality of treatment facilities 20, a wastewater line 35, and a treated water line 37, similar to the wastewater treatment system 1 described above.

[0062] In the conventional wastewater treatment system 5, all of the wastewater generated in each manufacturing device 10 is primarily treated in a predetermined treatment facility 20 that employs a treatment method suitable for treating the components contained in the wastewater. Usually, the composition of components in the wastewater generated in each manufacturing device 10 is roughly determined according to the process content of the manufacturing process carried out in the manufacturing device 10. The type and concentration of components to be rendered harmless or removed rarely fluctuate significantly while the manufacturing process is being carried out according to the production plan. Therefore, all of the wastewater generated in each manufacturing device 10 is sent to the predetermined treatment facility 20.

[0063] For example, in Fig. 2, wastewater containing a first component, a second component, and a third component is generated in each manufacturing apparatus 10. The symbol ◯ indicates that the component is in high concentration. The symbol △ indicates that the component is in medium concentration. The symbol × indicates that the component is in low concentration.

[0064] The wastewater generated by the first manufacturing device 10a has a high concentration of the first component, a medium concentration of the second component, and a low concentration of the third component. Therefore, a first treatment facility 20a that treats the wastewater by a treatment method suitable for the treatment of the first component is provided to correspond to the first manufacturing device 10a. The wastewater generated by the first manufacturing device 10a is sent to the first treatment facility 20a and is primarily treated by a treatment method suitable for the treatment of the first component.

[0065] The wastewater generated by the second manufacturing apparatus 10b has a low concentration of the first component, a high concentration of the second component, and a medium concentration of the third component. Therefore, a second treatment facility 20b is provided to treat the wastewater with a treatment method suitable for the treatment of the second component in order to correspond to the second manufacturing apparatus 10b. The wastewater generated by the second manufacturing apparatus 10b is sent to the second treatment facility 20b and is primarily treated with a treatment method suitable for the treatment of the second component.

[0066] The wastewater generated by the third manufacturing equipment 10c has a low concentration of the first component, a low concentration of the second component, and a high concentration of the third component. Therefore, a third treatment facility 20c is provided to treat the wastewater with a treatment method suitable for the treatment of the third component in order to correspond to the third manufacturing equipment 10c. The wastewater generated by the third manufacturing equipment 10c is sent to the third treatment facility 20c and is primarily treated with a treatment method suitable for the treatment of the third component.

[0067] There are cases where a large amount of secondary components that should be rendered harmless or removed remain in the primary treated wastewater. Therefore, when the primary treated wastewater needs to be treated for the secondary components, it is sent to another treatment facility 20 and undergoes additional treatment such as secondary treatment or tertiary treatment using a treatment method suitable for treating the secondary components. The wastewater generated in each manufacturing device 10 may have components in common with each other. In such cases, the additional treatment is performed in the treatment facility 20 used for the primary treatment of the wastewater generated in the other manufacturing device 10.

[0068] For example, in Fig. 2, wastewater generated in the first manufacturing equipment 10a is primarily treated in the first treatment facility 20a. Wastewater generated in the second manufacturing equipment 10b is primarily treated in the second treatment facility 20b. Wastewater generated in the third manufacturing equipment 10c is primarily treated in the third treatment facility 20c. However, since the second and third components that should be rendered harmless or removed remain in the wastewater that has been primarily treated in the first treatment facility 20a, treatment in the second and third treatment facilities 20b and 20c may be necessary.

[0069] In a configuration in which all of the wastewater generated in each manufacturing device is sent to a predetermined treatment facility, the treatment facility that performs primary treatment of wastewater generated in a certain manufacturing process not only receives the wastewater generated in that manufacturing process for primary treatment, but also receives wastewater generated in other manufacturing processes for additional treatment such as secondary treatment, tertiary treatment, etc. In such a configuration, all of the wastewater generated in a plurality of manufacturing processes is sent to one treatment facility, which causes a problem of a large load on the treatment facility.

[0070] 2, when the amounts of wastewater generated in the first manufacturing equipment 10a, the second manufacturing equipment 10b, and the third manufacturing equipment 10c are approximately the same, the amount of wastewater sent to the second treatment equipment 20b is approximately twice the amount of wastewater sent to the second treatment equipment 20b, and approximately three times the amount of wastewater sent to the third treatment equipment 20c. Since the load on the second treatment equipment 20b and the third treatment equipment 20c becomes large, it is necessary to provide equipment with a large capacity in advance in anticipation of the large load.

[0071] FIG. 3 is a diagram showing an example of the properties of wastewater generated in a manufacturing apparatus. FIG. 3 shows specific examples of the component composition and water volume of wastewater generated in each manufacturing apparatus forming a manufacturing line. The left table in FIG. 3 (manufacturing apparatus (1)) is an example corresponding to the first manufacturing apparatus 10a. The center table (manufacturing apparatus (2)) is an example corresponding to the second manufacturing apparatus 10b. The right table (manufacturing apparatus (3)) is an example corresponding to the third manufacturing apparatus 10c. The upper row shows the components used as chemicals and the like in the manufacturing process and the amount of water used. The lower row shows the component composition and water volume of wastewater generated by carrying out the manufacturing process.

[0072] As shown in Fig. 3, in the manufacturing process of a product, the amounts of chemicals, cleaning liquids, water, etc. used vary from one manufacturing step to another, and wastewater containing various components and having different component compositions is generated. In Fig. 3, the total amount of wastewater generated by each manufacturing device 10 is 300 m 3 In the conventional wastewater treatment system 5, all the wastewater generated in a plurality of manufacturing processes may be sent to one treatment facility, so the maximum length of the treatment facility 20 is 300 m. 3 There is a possibility that wastewater from the facility will be pumped.

[0073] In the configuration of the conventional wastewater treatment system 5, the load on each treatment facility 20 is large, and the treatment facility 20 needs to be able to receive a large amount of wastewater, which requires the adjustment tank and treatment tank constituting the treatment facility 20 to have a large capacity, the drainage line to be large-scaled, and the formation of a comprehensive drainage line, etc. This leads to an increase in the size and complexity of the entire system, and cumbersome operation of the system, making the detoxification or removal of pollutants and the recovery of useful substances inefficient.

[0074] In contrast, in the wastewater treatment system 1, the water supply path from the wastewater production equipment 10 to the treatment facility 20 is switched, so that the wastewater discharged from the production equipment 10 can be separated and subdivided so as to be sent to any one of the multiple treatment facilities 20. In addition, it becomes possible to switch the water supply path from the production equipment 10 to the treatment facility 20 in a time-division manner. Therefore, the load on the treatment facility 20 can be reduced more than before.

[0075] FIG. 4 is a diagram showing an example of the result of wastewater separation by the wastewater treatment system according to an embodiment of the present invention. FIG. 4 shows a specific example of the result of wastewater separation when wastewater having the component composition and water amount shown in FIG. 3 is treated by the wastewater treatment system 1. The left table (manufacturing apparatus (1)) in FIG. 4 is an example corresponding to the first manufacturing apparatus 10a. The center table (manufacturing apparatus (2)) is an example corresponding to the second manufacturing apparatus 10b. The right table (manufacturing apparatus (3)) is an example corresponding to the third manufacturing apparatus 10c. The upper row shows the components used as chemicals and the like in the manufacturing process and the amount of water used. The lower row shows the component composition and water amount of the wastewater that will be sent to the treatment facility as a result of the wastewater separation.

[0076] As shown in Fig. 4, by controlling the switching of the water supply path from each manufacturing apparatus 10 to each treatment facility 20 depending on the main component contained in the wastewater, it becomes possible to separate the wastewater generated in each manufacturing apparatus 10 into wastewater for each component. Therefore, by controlling the wastewater with reference to information indicating the component composition of the wastewater, it is possible to reduce the load on each treatment facility 20. Since the separated wastewater for each component can be treated by a treatment method suitable for the main component contained in the wastewater, it becomes possible to treat the wastewater more efficiently than when multiple components are mixed.

[0077] As shown in Fig. 1, the wastewater treatment system 1 is provided with a return line 36. According to the return line 36, in addition to the wastewater generated in the corresponding manufacturing process being sent to the treatment facility 20 to which the treated water is returned, wastewater generated in other manufacturing processes is sent to the treatment facility 20 to which the treated water is returned for primary treatment. However, in the wastewater treatment system 1, by switching the water supply path from the wastewater production equipment 10 to the treatment facility 20, the wastewater discharged from the production equipment 10 can be separated and subdivided, so that the load on the treatment facility 20 to which the treated water is returned can be reduced more than before.

[0078] Fig. 5 is a diagram illustrating a control system in a wastewater treatment system according to an embodiment of the present invention. Fig. 5 shows a schematic configuration of a control system for controlling the switching means 50 in the wastewater treatment system 1 shown in Fig. 1. Fig. 5 illustrates a case in which a total of n stages of production apparatuses 10 generating wastewater are installed in series. As shown in FIG. 5, a switching means 50 for switching the water supply path from the wastewater production device 10 to the treatment facility 20 can be controlled by a control means 60.

[0079] The control means 60 is a controller capable of controlling piping devices, and controls the switching of the water supply path by the switching means 50. The control means 60 controls the switching of the water supply path based on at least one of the measurement result 120 by the measurement means 40 and the process information 140 indicating the process contents in each manufacturing process that constitutes the manufacturing process.

[0080] The control means 60 can be installed in a distributed manner for each manufacturing apparatus 10. The measurement means 40 measures components contained in wastewater generated in the manufacturing apparatus 10 and the amount of wastewater discharged from the manufacturing apparatus 10 while a predetermined manufacturing process 110 is being performed in the manufacturing apparatus 10, and transmits these measurement results 120 to the control means 60. The measurement by the measurement means 40 may be performed continuously or intermittently at predetermined time intervals while the manufacturing process 110 is being performed.

[0081] The control means 60 can control the switching means 50 according to the discharge amount of a predetermined component contained in the wastewater generated in the manufacturing process 110, with reference to the measurement results 120 by the measurement means 40. By using the measurement results 120 as a basis, the water supply path can be appropriately switched according to the actual discharge amount measured for the wastewater. The type of component used as an index for control may be set in advance in the control means 60, or may be specified with reference to the process information 140.

[0082] As the measurement results 120 by the measuring means 40, only the measurement results of the concentrations of components contained in the wastewater generated by the manufacturing equipment 10 may be used, only the measurement results of the amount of wastewater generated by the manufacturing equipment 10 may be used, or both of these may be used. When only the measurement results of the concentrations of components contained in the wastewater are used as the measurement results 120, data on the amount of wastewater required to calculate the discharge amount for each component can be obtained by referring to the process information 140. On the other hand, when only the measurement results of the amount of wastewater are used as the measurement results 120, data on the concentrations of components required to calculate the discharge amount for each component can be obtained by referring to the process information 140.

[0083] Furthermore, the control means 60 can also refer to process information 140 indicating the process contents of each manufacturing step constituting the manufacturing process, and control the switching means 50 according to the discharge amount of a predetermined component expected to be contained in the wastewater generated in the manufacturing process 110. By using the process information 140 as a basis, the water supply path can be appropriately switched even when a component that is difficult to detect by the measurement means 40 or a component with a low concentration is discharged. When the process information 140 is referred to, the measurement result 120 can also be referred to in order to check the concentration of the main components contained in the wastewater and the flow rate of the wastewater discharged from the manufacturing apparatus 10 in real time.

[0084] The switching means 50 is preferably provided with a means for switching the water supply path of the wastewater generated in the manufacturing equipment 10 to a system for dilute wastewater. The treatment equipment 20 is preferably provided with a system for dilute wastewater in addition to systems corresponding to each manufacturing equipment 10. In the treatment equipment 20 for dilute wastewater, dilute wastewater having a low concentration of the component to be treated is treated by a treatment method suitable for treating dilute wastewater. Such a treatment method includes a membrane separation treatment method using a reverse osmosis membrane or the like. By providing a system for dilute wastewater, it is possible to switch to an efficient treatment destination even when the concentration of the component to be treated is low.

[0085] The manufacturing process 110 is a step that constitutes the manufacturing process, and is performed by the manufacturing apparatus 10. The contents of the manufacturing process 110 are planned by a production plan for the entire manufacturing process. The contents of the production plan include the type of product to be manufactured in the manufacturing process, the product specifications, the target production volume of the product, the target production speed of the product, etc.

[0086] A production plan for the entire manufacturing process is set for a manufacturing line formed by a plurality of manufacturing devices 10. The process contents of each manufacturing step 110 constituting the manufacturing process are specified by setting the production plan. Production plan information 130 indicating the production plan is stored in a storage device such as a management system that manages the manufacturing line.

[0087] The process contents of the manufacturing process 110 are set for each manufacturing apparatus 10 forming the manufacturing line. In the manufacturing process 110, wastewater is generated by performing a predetermined treatment or processing, and the amount of wastewater generated and the concentration of components contained in the wastewater are affected by the type of treatment or processing, the number of times the treatment or processing is performed, the time for the treatment or processing, the number of times the treatment or processing is repeated, etc. Therefore, by referring to the process contents related to the wastewater, it is possible to appropriately separate the wastewater. Process information 140 indicating the process contents is stored in the storage device of the manufacturing apparatus 10 or the management system as information for each manufacturing apparatus 10.

[0088] When switching the water supply path from the wastewater production equipment 10 to the treatment facility 20, the control means 60 can read out and refer to the process information 140 from the storage device and control the switching means 50 in accordance with the discharge amount of a predetermined component contained in the wastewater generated in the production process 110. Furthermore, when a change in the production plan occurs, the control means 60 can read out and refer to the production plan information 130 from the storage device, correct the component composition and amount of the wastewater generated in each production process 110, and control the switching means 50 in accordance with the discharge amount of the predetermined component contained in the wastewater.

[0089] In the control for switching the water supply path, it is preferable to refer to at least the process information 140 among the measurement result 120 by the measuring means 40 and the process information 140. By referring to the process information 140, it is possible to perform control based on estimation under the process contents set according to the production plan. Therefore, it is possible to appropriately switch the water supply path for the wastewater without actually measuring the concentration of the main components contained in the wastewater generated in the manufacturing equipment 10 or the flow rate of the wastewater discharged from the manufacturing equipment 10.

[0090] Fig. 6 is a diagram showing an example of process information showing process details related to wastewater in a manufacturing process. Fig. 6 shows a specific example of process information showing process details in a manufacturing process. As shown in FIG. 6, the process information 140 can be information indicating process details that are correlated with the component composition of wastewater generated in the manufacturing equipment 10 and the time-dependent change in the amount of wastewater.

[0091] The chemical liquid column of the process information 140 indicates information on the chemical liquid used for a specific treatment in the manufacturing process. The information on the chemical liquid may include the type of component, such as component A, component B, etc., and information on each component. The information on each component may include the concentration of the component contained in the wastewater, the treatment time for performing treatment using the component, the discharge time from the start to the end of discharge of the wastewater containing the component, etc. The information on the chemical liquid may include information on the amount of chemical liquid used, the amount of chemical liquid discharged, etc.

[0092] The cleaning column of the process information 140 indicates information on cleaning conditions used in a cleaning process carried out after a treatment using a chemical liquid. The information on cleaning conditions may include the order of cleaning, such as primary cleaning, secondary cleaning, etc., and information for each order of cleaning. The information for each order may include the flow rate of the cleaning liquid used for cleaning, the cleaning time from start to finish of cleaning, etc. The information on cleaning conditions may include information on the type of cleaning liquid used for cleaning, the composition of the cleaning liquid, the discharge time from start to finish of discharge of the cleaning liquid, etc.

[0093] Such information related to the functional liquid can be registered in advance as the process information 140. As the process information 140, information indicating the composition of the functional liquid used in each manufacturing process, the time of the treatment using the functional liquid carried out in each manufacturing process, and the flow rate of the functional liquid used in the treatment using the functional liquid carried out in each manufacturing process can be used.

[0094] By using such process information 140, it is possible to estimate the discharge time from the manufacturing equipment 10 for each component contained in the wastewater. By switching the water supply path using the switching means 50, it is possible to separate the wastewater generated in the manufacturing equipment 10 for each time it is discharged from the manufacturing equipment 10 and separate the wastewater for each component in a time-division manner, making it possible to operate the system so that the wastewater is treated by an appropriate treatment method for each component.

[0095] Fig. 7 is a diagram for explaining the operation of the switching means in the wastewater treatment system according to the embodiment of the present invention. Fig. 7 shows a specific example of a control method for switching the switching means 50 provided for each manufacturing apparatus 10 in a time-division manner. The switching means 50 is assumed to be an on-off valve that opens and closes the water supply path to each treatment facility 20. In Fig. 7, the horizontal axis indicates the time during which the manufacturing process 110 is performed, the upper side of the vertical axis indicates the discharge amount of each component contained in the wastewater, and the lower side of the vertical axis indicates the open / closed state of the switching means 50.

[0096] The switching means (1) is a switching means 50 that opens and closes a water supply path for supplying wastewater generated in the manufacturing apparatus 10 to a treatment facility 20 suitable for treating a first component. The switching means (2) is a switching means 50 that opens and closes a water supply path for supplying wastewater generated in the manufacturing apparatus 10 to a treatment facility 20 suitable for treating a second component. The switching means (3) is a switching means 50 that opens and closes a water supply path for supplying wastewater generated in the manufacturing apparatus 10 to a treatment facility 20 suitable for treating a third component. The switching means (4) is a switching means 50 that opens and closes a water supply path for supplying wastewater generated in the manufacturing apparatus 10 to a treatment facility 20 suitable for treating dilute wastewater.

[0097] 7, assume that wastewater containing a first component as a main component, wastewater containing a second component as a main component, and wastewater containing a third component as a main component are generated in this order in a manufacturing apparatus 10 by carrying out a manufacturing process 110. The concentrations of the components contained in such wastewater and the flow rate of the wastewater can be measured by the measuring means 40. The measurement result 120 by the measuring means 40 is transmitted to the control means 60.

[0098] The control means 60 refers to the measurement results 120 by the measurement means 40 and judges whether the emission amount of a predetermined component contained in the wastewater generated in the manufacturing process 110 is equal to or greater than a preset reference value. As the reference value, an allowable emission amount for rendering a pollutant harmless or removing the pollutant and recovering a useful substance can be set in advance for each of the main components contained in the wastewater. In Fig. 7, a reference value (1) corresponding to a first component and a reference value (2) corresponding to a second component are set.

[0099] When the determination result shows that the discharge amount of a predetermined component is equal to or greater than the standard value, the water supply route from the manufacturing equipment 10 to the treatment equipment 20 is switched so that the wastewater containing that component is sent to an appropriate treatment equipment 20. On the other hand, when the determination result shows that the discharge amount of a predetermined component is less than the standard value, the water supply route from the manufacturing equipment 10 to the treatment equipment 20 is switched so that the wastewater is sent to a treatment equipment 20 that is suitable for dilute wastewater.

[0100] 7, for example, at time t1, the discharge amount of the first component reaches the reference value (1) for the first component. In such a case, the switching means (1) is controlled to be in an open state, so that the wastewater generated in the manufacturing apparatus 10 is sent to the treatment facility 20 suitable for treating the first component. The switching means (1) can be controlled to be in a closed state to block the water supply path when other switching means are controlled to be in an open state, or when a preset operation time has elapsed.

[0101] 7, at time t2, the discharge amount of the second component reaches the reference value (2) for the second component. In such a case, the switching means (2) is controlled to be in an open state, so that the wastewater generated in the manufacturing apparatus 10 is sent to the treatment facility 20 suitable for treating the second component. The switching means (2) can be controlled to be in a closed state to block the water supply path when other switching means are controlled to be in an open state or when a preset operation time has elapsed.

[0102] Also, in FIG. 7, the switching means (3) is controlled at time t3. The third component is a component that cannot be measured by the measuring means 40, unlike the first and second components. In such a case, since the measurement result 120 by the measuring means 40 cannot be referred to, the time when the discharge amount of the component increases is determined in advance by referring to the process information 140 indicating the process contents in the manufacturing process. By controlling the switching means (3) to the open state at the previously determined time, the wastewater generated in the manufacturing device 10 is sent to the treatment facility 20 suitable for treating the third component. The switching means (3) can be controlled to the closed state to block the water supply path when other switching means are controlled to be open or when a preset operation time has elapsed. For example, in FIG. 7, the discharge of other components is substantially eliminated at time t4, so the switching means (3) is controlled to the closed state.

[0103] 7, during a period when the discharge amount of the main components contained in the wastewater is below the standard value or during a period when it is known that components that cannot be measured by the measuring means 40 are not discharged, the water supply path for supplying the water to the dilute wastewater treatment equipment 20 can be kept in an open state. In the dilute wastewater treatment equipment 20, the wastewater generated in the manufacturing apparatus 10 is treated by a treatment method suitable for treating dilute wastewater. An example of a treatment method suitable for treating dilute wastewater is a treatment aimed at recovering water.

[0104] According to the above wastewater treatment system 1 and wastewater treatment method, by switching the water supply path from the wastewater production equipment 10 to the treatment equipment 20, the wastewater discharged from the production equipment 10 is sent to the different treatment equipment 20 and treated. Therefore, the load on the treatment equipment 20 associated with the production line can be reduced. In addition, since the water supply path from the wastewater production equipment to the treatment equipment is switched based on one or more of the measurement results of the components contained in the wastewater or the amount of wastewater generated in the production equipment constituting the production process and the process information indicating the process content in the production process, the wastewater generated with the implementation of the production process can be separated according to the components contained in the wastewater and the process content. In particular, since it is possible to switch the time division in which the wastewater generated in the production equipment is separated according to the time at which it is discharged from the production equipment, the wastewater generated in the sequential production processes can be treated at the same time while reducing the load on each treatment equipment. Therefore, the wastewater generated in the production process for manufacturing a product can be treated by an appropriate treatment method according to the production process while reducing the load on the treatment equipment, and the pollutants contained in the wastewater can be detoxified and useful substances can be efficiently recovered.

[0105] According to the wastewater treatment system 1 and the wastewater treatment method described above, it is also possible to treat wastewater separated by time discharged from the manufacturing apparatus 10 in only one of the multiple treatment facilities 20. By controlling the switching means 34 with the control means 60, it is possible to switch between the treated water line 32 and the return line 36 as the water supply path to be used. Therefore, by treating wastewater separated by time in only one of the multiple treatment facilities 20, it is possible to further reduce the load on the treatment facility 20 and further shorten the cost and time required for treatment.

[0106] Although the embodiment of the present invention has been described above, the present invention is not limited to the above embodiment, and various modifications are possible within the scope of the present invention. For example, the present invention is not necessarily limited to having all the configurations of the above embodiment. It is possible to replace a part of the configuration of an embodiment with another configuration, add a part of the configuration of an embodiment to another form, or omit a part of the configuration of an embodiment. [Explanation of symbols]

[0107] 1 Wastewater treatment system 10 Manufacturing equipment 20 Processing Facilities 21 Adjustment tank 22 Treatment tank 23 Treatment tank 30 Drain line 32 Treated Water Line 34 Switching Method 35 Drain line 37 Treated Water Line 36 Return Line 40 Measurement means 50 Switching means (wastewater separation means) 110 Manufacturing process 120 Measurement results 130 Production planning information 140 Process information

Claims

1. A wastewater treatment system for treating wastewater generated in a manufacturing process, a plurality of treatment facilities for treating wastewater generated in a plurality of manufacturing devices for carrying out each of the manufacturing steps constituting the manufacturing process by a treatment method corresponding to components contained in the wastewater; A plurality of drainage lines are provided for each of the manufacturing apparatuses, and the drainage lines are capable of conveying the drainage generated in the manufacturing apparatuses to each of the plurality of treatment facilities; A measuring means provided for each of the manufacturing apparatuses for measuring components contained in wastewater generated in the manufacturing apparatus or the amount of the wastewater; A switching means is provided for each of the drainage lines, and switches a water supply path for the drainage from the production device to the treatment facility; A control means for controlling the switching of the water supply path by the switching means, The control means of the wastewater treatment system controls switching of the water supply path for the wastewater from the manufacturing equipment to the treatment facility based on one or more of the measurement results by the measurement means and process information indicating the process content in the manufacturing process.

2. The wastewater treatment system according to claim 1, a wastewater treatment system including a wastewater sorting means provided for each of the wastewater lines, which sorts the wastewater generated in the manufacturing equipment based on the time at which it is discharged from the manufacturing equipment.

3. The wastewater treatment system according to claim 2, The wastewater treatment system comprises a wastewater treatment facility in which the wastewater separated by time of discharge from the manufacturing apparatus is sent to each of the different treatment facilities and treated.

4. The wastewater treatment system according to claim 3, A wastewater treatment system in which the wastewater separated by time discharged from the manufacturing equipment is treated in only one of the plurality of treatment facilities.

5. The wastewater treatment system according to claim 1, A wastewater treatment system, wherein the process information is information indicating the process contents that are correlated with a component composition of wastewater generated in the manufacturing equipment and a change over time in the amount of wastewater.

6. The wastewater treatment system according to claim 5, A wastewater treatment system, wherein the process information is information indicating the composition of the functional liquid used in the manufacturing process, the time of the treatment using the functional liquid carried out in the manufacturing process, and the flow rate of the functional liquid used in the treatment using the functional liquid carried out in the manufacturing process.

7. The wastewater treatment system according to claim 1, The multiple treatment facilities are a wastewater treatment system consisting of one or more of equipment for performing precipitation separation treatment, equipment for performing coagulation sedimentation treatment, equipment for performing filtration treatment, equipment for performing adsorption treatment, equipment for performing crystallization treatment, equipment for performing ion exchange treatment, equipment for performing membrane separation treatment, equipment for performing evaporation concentration treatment, equipment for performing neutralization treatment, and equipment for performing biological treatment.

8. The wastewater treatment system according to claim 1, The wastewater treatment system, wherein the manufacturing process is a semiconductor manufacturing process for manufacturing semiconductor elements.

9. The wastewater treatment system according to claim 8, The manufacturing equipment is a wastewater treatment system that cleans wafers used in each manufacturing process constituting a semiconductor manufacturing process.

10. A wastewater treatment method for treating wastewater generated in a manufacturing process, comprising the steps of: a plurality of treatment facilities for treating wastewater generated in a plurality of manufacturing devices for carrying out each of the manufacturing steps constituting the manufacturing process by a treatment method corresponding to components contained in the wastewater; A wastewater treatment system including a plurality of wastewater lines provided for each of the manufacturing apparatuses and capable of conveying wastewater generated in the manufacturing apparatuses to each of the plurality of treatment facilities, A wastewater treatment method that switches the water supply path for the wastewater from the manufacturing equipment to the treatment facility based on one or more of measurement results of components contained in the wastewater generated in the manufacturing equipment or the amount of the wastewater, and process information that indicates the process content in the manufacturing process.

11. The wastewater treatment method according to claim 10, The wastewater treatment method further comprises separating the wastewater generated in the manufacturing equipment based on the time at which the wastewater is discharged from the manufacturing equipment.

12. The wastewater treatment method according to claim 11, The wastewater treatment method comprises sending the wastewater separated by time of discharge from the manufacturing apparatus to different treatment facilities for treatment.

13. The wastewater treatment method according to claim 12, The wastewater treatment method comprises treating the wastewater separated by time discharged from the manufacturing apparatus in only one of the plurality of treatment facilities.

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