Photosensitive composition, film, color filter, solid-state imaging element, and image display device

Abstract

To provide a photosensitive composition capable of forming a color filter excellent in pattern formation properties, etc.SOLUTION: A photosensitive composition includes a coloring material, an alkali-soluble resin, a polymerizable compound, and a polymerization initiator. The coloring material includes a green coloring material represented by the following formula, and a yellow coloring material containing a specific compound.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present invention relates to a photosensitive composition used for forming a color filter for use in a solid-state imaging device, an image display device, or the like. [Background technology]

[0002] In recent years, the demand for color filters used in liquid crystal displays, organic electroluminescence displays, digital cameras, smartphones, infrared sensors, etc. has been growing due to their widespread use. Color filters separate the light that passes through them, and these colors are then synthesized to form an image. For this reason, color filters are required to have high brightness, high contrast, and color reproducibility.

[0003] As colorants excellent in luminance, contrast and color reproducibility, the use of phthalocyanine compounds described in Patent Documents 1 to 4 has been investigated. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2019-113732 A [Patent Document 2] Patent Publication No. 2021-056382 [Patent Document 3] International Publication No. 2023 / 002875 Summary of the Invention [Problem to be solved by the invention]

[0005] As a result of thorough investigation of the phthalocyanine compounds described in Patent Documents 1 to 3, it was found that the brightness of color filters using these phthalocyanine compounds decreases when irradiated with light in a low-oxygen environment. It was also found that there are problems with pattern formability and electrical properties.

[0006] An object of the present invention is to provide a photosensitive composition capable of forming a color filter having excellent pattern formability, electrical properties, and light resistance in a low-oxygen environment. [Means for solving the problem]

[0007] The present invention relates to a photosensitive composition comprising a colorant (A), an alkali-soluble resin (B), a polymerizable compound (C), and a polymerization initiator (D), the color material (A) contains a green color material (A1) and a yellow color material (A2); The green colorant (A1) contains a green colorant (a1) represented by the following general formula (1): The photosensitive composition relates to a yellow colorant (A2), which comprises a yellow colorant (a2) containing two or more metal azo compounds having at least different metal species selected from the group consisting of metal azo compounds represented by the following general formula (2) and metal azo compounds having a tautomeric structure thereof, and a compound represented by the following general formula (3): General formula (1) [ka] (In general formula (1), X1~X 16 each independently represents a hydrogen atom, a halogen atom, or -Y1-R1, where Y1 represents a divalent linking group and R1 represents a monovalent organic group. 16 At least one of them represents a halogen atom, and at least one of them represents -Y1-R1. M represents a metal atom, a metal oxide, or a metal halide. General formula (2) [ka] (In general formula (2), R1 and R2 each independently represent -OH, -NH2, or -NHR5, R3 and R4 each independently represent =O or =NR5, and R5 each independently represent a hydrogen atom or an alkyl group which may have a substituent. Me is a metal atom selected from the group consisting of Ni, Zn, Cu, Al, Fe, Co, and Mn. General formula (3) [ka] (In the general formula (3), each R6 independently represents a hydrogen atom or an alkyl group which may have a substituent.) Effect of the Invention

[0008] According to the present invention, there can be provided a photosensitive composition capable of forming a color filter having excellent pattern formability, electrical properties, and light resistance in a low-oxygen environment. The present invention also can provide a film, a color filter, a solid-state imaging device, and an image display device. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] Hereinafter, the embodiment for carrying out the photosensitive composition of the present invention will be described in detail. Note that the present invention is not limited to the following embodiment, and can be modified within the scope of the problem that can be solved.

[0010] In this specification, unless otherwise specified, "(meth)acryloyl", "(meth)acrylic", "(meth)acrylic acid", "(meth)acrylate", or "(meth)acrylamide" respectively mean "acryloyl and / or methacryloyl", "acrylic and / or methacrylic", "acrylic acid and / or methacrylic acid", "acrylate and / or methacrylate", or "acrylamide and / or methacrylamide". In addition, "CI" means Color Index (CI; published by The Society of Dyers and Colourists). In this specification, a polymerizable unsaturated group is an ethylenically unsaturated double bond. As used herein, a monomer is a compound that will polymerize to form a resin. A monomer is in an unreacted state, and a monomer unit is a monomer that has been polymerized to form a polymer. In this specification, for low molecular weight compounds whose molecular weight can be specified, the molecular weight is a calculated value or measured by ESI-MS (electrospray ionization mass spectrometry), and for compounds having a molecular weight distribution, the molecular weight is a polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography using tetrahydrofuran as a solvent. In this specification, a numerical range expressed using "to" means a range that includes the numerical values ​​before and after "to" as the lower limit and upper limit.

[0011] <Photosensitive composition> A photosensitive composition according to one embodiment of the present invention is a photosensitive composition comprising a colorant (A), an alkali-soluble resin (B), a polymerizable compound (C), and a polymerization initiator (D), the color material (A) contains a green color material (A1) and a yellow color material (A2); The green colorant (A1) contains a green colorant (a1) represented by the following general formula (1): The yellow colorant (A2) is characterized in that it contains a yellow colorant (a2) containing two or more metal azo compounds having at least different metal species selected from the group consisting of metal azo compounds represented by the following general formula (2) and metal azo compounds having a tautomeric structure thereof, and a compound represented by the following general formula (3): General formula (1) [ka] (In general formula (1), X1~X 16 each independently represents a hydrogen atom, a halogen atom, or -Y1-R1, where Y1 represents a divalent linking group and R1 represents a monovalent organic group. 16 At least one of them represents a halogen atom, and at least one of them represents -Y1-R1. M represents a metal atom, a metal oxide, or a metal halide. General formula (2) [ka] (In general formula (2), R1 and R2 each independently represent -OH, -NH2, or -NHR5, R3 and R4 each independently represent =O or =NR5, and R5 each independently represent a hydrogen atom or an alkyl group which may have a substituent. Me is a metal atom selected from the group consisting of Ni, Zn, Cu, Al, Fe, Co, and Mn. General formula (3) [ka] (In the general formula (3), each R6 independently represents a hydrogen atom or an alkyl group which may have a substituent.)

[0012] The mechanism by which the photosensitive composition having the above-mentioned configuration can solve the problems of the present invention is not clear, but is speculated as follows.

[0013] It is presumed that the green colorant (a1) represented by general formula (1) (hereinafter, simply referred to as the green colorant (a1)) becomes excited when irradiated with light in a low-oxygen environment, and easily receives electrons from the surrounding electron-supplying components, resulting in a decrease in brightness. However, a yellow colorant (a2) (hereinafter, simply referred to as the yellow colorant (a2)) containing two or more metal azo compounds with at least different metal species selected from the group consisting of metal azo compounds represented by general formula (2) and metal azo compounds having tautomeric structures thereof, and a compound represented by general formula (3), is less likely to transfer electrons compared to other yellow colorants. Therefore, it is presumed that the supply of electrons to the green colorant (a1) is small, and the brightness is less likely to decrease. It is also presumed that the electrical properties are excellent due to the small amount of electron transfer. Furthermore, it is presumed that the yellow colorant (a2) is more transparent to light of about 365 nm, which is the dominant wavelength of ultra-high pressure mercury lamps used in the production of color filters, than other yellow colorants, and thus has excellent pattern formability because it can suppress the difference in photocurability between the upper and lower parts of the pattern.

[0014] Components that are or can be included in the photosensitive composition of one embodiment will be described in detail below.

[0015] Colorant The photosensitive composition of the present invention contains a colorant (A).

[0016] The color material (A) is not particularly limited, and examples thereof include chromatic color materials such as red color materials, yellow color materials, blue color materials, purple color materials, green color materials, and orange color materials, achromatic color materials such as white color materials and black color materials, near-infrared absorbing color materials, and fluorescent color materials. In this specification, the white colorant includes not only pure white but also light gray colorants close to white (for example, grayish white, light gray). The coloring material (A) may be either a pigment or a dye, or a pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment, or an inorganic pigment and an organic pigment may be used in combination. Further, examples of the pigment include an organic-inorganic composite.

[0017] The pigment is preferably used in a finely divided state. The method of finely dividing is not particularly limited, and for example, any of wet grinding, dry grinding, and dissolution precipitation can be used. Among these, salt milling treatment by a kneader method, which is a type of wet grinding, is preferred. The average primary particle size of the finely divided pigment determined by TEM (transmission electron microscope) is preferably 5 to 90 nm. From the viewpoint of dispersibility, the average primary particle size is more preferably 10 to 70 nm.

[0018] The content of the coloring material (A) is preferably from 0.5 to 80 mass %, and more preferably from 1 to 70 mass %, based on 100 mass % of the nonvolatile content of the photosensitive composition.

[0019] (Green colorant (A1)) The photosensitive composition of the present invention contains a green colorant (A1), and the green colorant (A1) contains a green colorant (a1) represented by the following general formula (1).

[0020] General formula (1) [ka]

[0021] In general formula (1), X1~X 16each independently represents a hydrogen atom, a halogen atom, or -Y1-R1, where Y1 represents a divalent linking group and R1 represents a monovalent organic group. 16 At least one of them represents a halogen atom, and at least one of them represents -Y1-R1. M represents a metal atom, a metal oxide, or a metal halide.

[0022] X1~X 16 Examples of the halogen atom in include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. From the viewpoint of color, the halogen atom preferably contains a fluorine atom.

[0023] The number of halogen atoms is preferably 4 to 12, and more preferably 6 to 10.

[0024] When there are two or more halogen atoms, those halogen atoms may be the same or different.

[0025] The divalent linking group in Y1 is not particularly limited, and examples thereof include an oxygen atom, a sulfur atom, -NH-, etc. Among these, an oxygen atom or a sulfur atom is preferred, and an oxygen atom is more preferred.

[0026] The monovalent organic group in R1 is not particularly limited as long as it is a group containing a carbon atom, and examples thereof include an alkyl group which may have a substituent, an aryl group which may have a substituent, and a heterocyclic group which may have a substituent.

[0027] The alkyl group which may have a substituent may be linear, branched, cyclic, or a combination thereof, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a hexyl group, a 2-ethylhexyl group, a cyclopentyl group, a cyclohexyl group, etc. In addition, in the alkyl group which may have a substituent, a part of -CH2- in the alkyl group may be substituted with an oxygen atom.

[0028] The aryl group which may have a substituent may be either a single ring or a condensed ring, and examples thereof include a phenyl group, a naphthyl group, and a biphenyl group.

[0029] The heterocyclic group which may have a substituent may be either a saturated ring or an unsaturated ring, and examples thereof include a pyridyl group, a pyrimidyl group, a furyl group, a tetrahydrofuryl group, a dioxolanyl group, an imidazolidinyl group, an oxazolidyl group, a piperidyl group, a morpholinyl group, and a thiomorpholinyl group.

[0030] When the alkyl group, aryl group, and heterocyclic group of R1 have a substituent, examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an aryl group, an aryloxy group, and an aryloxycarbonyl group.

[0031] When there are two or more -Y1-R1, those -Y1-R1 may be the same or different.

[0032] It is preferable that --Y1-R1 contains a group represented by the following general formula (4).

[0033] General formula (4) [ka]

[0034] In general formula (4), Z1 represents a single bond or an oxygen atom, R2 represents an alkyl group which may have a substituent or an aryl group which may have a substituent, and R3 represents a halogen atom, an alkyl group, or an alkoxy group. m is an integer of 1 to 3, and n is an integer of 0 to 2. When m is 2 or 3, multiple Z1s and R2s may be the same or different, and when n is 2, multiple R3s may be the same or different. Y1 represents a divalent linking group, and * represents a bond to the aromatic ring in general formula (1).

[0035] Z1 is preferably an oxygen atom.

[0036] The alkyl group in R2, which may have a substituent, may be linear, branched, cyclic, or a combination thereof, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a hexyl group, a 2-ethylhexyl group, a cyclopentyl group, and a cyclohexyl group.

[0037] Examples of the aryl group in R2 which may have a substituent include a phenyl group, a naphthyl group, and a biphenyl group.

[0038] When the alkyl group and aryl group of R2 have a substituent, examples of the substituent include an alkoxy group having 1 to 5 carbon atoms, a hydroxyl group, and the like.

[0039] m is preferably 1 or 2, more preferably 1. When m=1, -CO-Z1-R2 is preferably bonded to the 3rd or 4th position relative to -Y1-, more preferably bonded to the 4th position. When m=2, the two -CO-Z1-R2 are preferably bonded to the 3rd and 5th positions or the 2nd and 4th positions relative to -Y1-, more preferably bonded to the 2nd and 4th positions.

[0040] n is preferably 0 or 1, and more preferably 0.

[0041] Specific examples of the group represented by general formula (4) include groups represented by formulas (4-1) to (4-12). In the formulas, Y1 represents a divalent linking group, and * represents a bond. However, the present invention is not limited to these.

[0042] [ka]

[0043] X1~X 16 The number of -Y1-R1 in the formula (I) is preferably 4 to 12, and more preferably 6 to 10.

[0044] X1~X 16 X2, X3, X6, X7, X 10 , X 11 , X 14 , and X 15 Of these, it is preferable that at least four of them are -Y1-R1, and all of them are -Y1-R1, and X1, X4, X5, X8, X9, and X 12 , X 13 , and X 16 It is more preferable that is a halogen atom.

[0045] Examples of the metal atom in M ​​include iron, magnesium, nickel, cobalt, copper, palladium, zinc, vanadium, titanium, indium, and tin.

[0046] The metal oxide for M includes oxytitanium, oxyvanadium, and the like.

[0047] Examples of the metal halide in M ​​include aluminum chloride, indium chloride, germanium chloride, tin(II) chloride, tin(IV) chloride, and silicon chloride. Among these, from the viewpoints of light resistance and heat resistance, M is preferably zinc, copper, cobalt, or nickel, and more preferably zinc or copper.

[0048] The method for producing the green colorant (a1) is not particularly limited, and can be synthesized by a known method. For example, a method in which one selected from the group consisting of metals, metal oxides, and metal halides and a phthalonitrile compound are heated in an organic solvent to cause a cyclization reaction. The phthalonitrile compound can also be synthesized by a known method. Specifically, the methods described in JP-A-05-345861, JP-A-2010-077408, JP-A-2014-015542, JP-A-2023-003551, WO 2023 / 136027, etc. can be mentioned.

[0049] Specific examples of the green color material (a1) are (a1-1) to (a1-9) below, although the present invention is not limited thereto.

[0050] [ka]

[0051] [ka]

[0052] [ka]

[0053] [ka]

[0054] [ka]

[0055] The green color material (a1) can be used alone or in combination of two or more kinds.

[0056] The content of the green color material (a1) is preferably 50 to 100% by mass in 100% by mass of the green color material (A1).

[0057] The green color material (A1) may contain a green color material other than the green color material (a1) as long as the effects of the present invention are not impaired.

[0058] The green colorant other than the green colorant (a1) is not particularly limited, and a known compound can be used. For example, CI Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 37, 45, 48, 50, 51, 54, 55, 58, 59, 63, 64, 65, 66, etc. can be mentioned. Further examples include dyes such as CI Solvent Green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, 35, and CI Acid Green 1, 3, 5, 9, 16, 25, 27, 50, 58, 63, 65, 80, 104, 105, 106, 109, as well as lake compounds, salt-forming compounds, and polymers of these dyes. Among these, the green colorant other than the green colorant (a1) is preferably CI Pigment Green 7, 36, 58, 59, or 63 from the viewpoint of color reproducibility.

[0059] The content of the green color material (A1) is preferably 10 to 90 mass % in 100 mass % of the color material (A).

[0060] (Yellow color material (A2)) The photosensitive composition of the present invention contains a yellow colorant (A2), and the yellow colorant (A2) contains two or more metal azo compounds having at least different metal species selected from the group consisting of metal azo compounds represented by the following general formula (2) and metal azo compounds having tautomeric structures thereof, and a compound represented by the following general formula (3):

[0061] General formula (2) [ka]

[0062] In general formula (2), R1 and R2 each independently represent -OH, -NH2, or -NHR5, R3 and R4 each independently represent =O or =NR5, and R5 each independently represent a hydrogen atom or an alkyl group which may have a substituent.

[0063] The alkyl group in R5, which may have a substituent, may be linear, branched, cyclic, or a combination thereof, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a hexyl group, a 2-ethylhexyl group, a cyclopentyl group, and a cyclohexyl group.

[0064] When the alkyl group in R5 has a substituent, examples of the substituent include a halogen atom, a hydroxy group, an alkoxy group, a cyano group, and an amino group.

[0065] In general formula (2), R1 and R2 are each preferably -OH.

[0066] In general formula (2), R3 and R4 are each preferably =O.

[0067] In the general formula (2), Me is a metal atom selected from the group consisting of Ni, Zn, Cu, Al, Fe, Co, and Mn (hereinafter also referred to as a specific metal atom).

[0068] From the viewpoint of light resistance in a low-oxygen environment, Me is preferably at least one metal atom selected from the group consisting of Ni and Zn, Cu, Al, Fe, Co, and Mn, more preferably Ni and Zn or Cu, and particularly preferably Ni and Zn.

[0069] The molar ratio of two or more metal azo compounds having different metal species selected from the group consisting of metal azo compounds represented by general formula (2) and metal azo compounds having a tautomeric structure thereof can be calculated from the molar ratio of metal atoms. The molar ratio of the metal azo compounds is preferably, for example, 97:3 to 10:90, more preferably 90:10 to 10:90, for Ni to Zn or Cu. The total amount of metal atoms, Ni, Zn, and Cu, is preferably 95 to 100 mol% relative to 1 mol of all metal atoms.

[0070] The embodiment of containing at least two specific metal atoms includes an embodiment in which at least two specific metal atoms are contained in a common crystal lattice and an embodiment in which one type is contained in each of different crystal lattices. Among them, an embodiment in which at least two specific metal atoms are contained in a common crystal lattice is preferable. Whether the embodiment in which at least two specific metal atoms are contained in a common crystal lattice or an embodiment in which one type is contained in each of different crystal lattices can be determined by, for example, the X-ray diffraction method described in JP 2014-12838 A.

[0071] Me in the general formula (2) may contain metal atoms other than the specific metal atoms, such as Li, Cs, Mg, Na, K, Ca, Sr, Ba, La, Pr, Nd, Cd, Zr, and Ce.

[0072] General formula (3) [ka]

[0073] In formula (3), R6 each independently represents a hydrogen atom or an alkyl group which may have a substituent.

[0074] The alkyl group in R6, which may have a substituent, may be linear, branched, cyclic, or a combination thereof, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a hexyl group, a 2-ethylhexyl group, a cyclopentyl group, and a cyclohexyl group.

[0075] When the alkyl group in R6 has a substituent, examples of the substituent include a halogen atom, a hydroxy group, an alkoxy group, a cyano group, and an amino group.

[0076] In general formula (3), R6 is preferably a hydrogen atom.

[0077] The content of the compound represented by general formula (3) is preferably 0.1 to 4 mol, and more preferably 0.5 to 3 mol, per mol of two or more metal azo compounds having at least different metal species selected from the group consisting of metal azo compounds represented by general formula (2) and metal azo compounds having a tautomeric structure thereof.

[0078] The yellow coloring material (a2) is preferably an adduct formed between two or more metal azo compounds having different metal species selected from the group consisting of metal azo compounds represented by general formula (2) and metal azo compounds having a tautomeric structure thereof, and a compound represented by general formula (3). The adduct means a molecular assembly. The bond between these molecules may be, for example, due to intermolecular interaction, Lewis acid-base interaction, coordinate bond or chain bond. The adduct may also be a structure such as an inclusion compound in which a guest molecule is incorporated into a lattice constituting a host molecule. The adduct may also be a structure such as a complex intercalation crystal. A complex intercalation crystal is a chemically non-stoichiometric crystal compound consisting of at least two elements. The adduct may also be a mixed substitution crystal in which two substances form a co-crystal and the atoms of the second component are located at the regular lattice positions of the first component.

[0079] Examples of the yellow colorant (a2) include pigments described in JP-A-2014-12838, JP-A-2017-171912, JP-A-2017-171913, JP-A-2017-171914, JP-A-2017-171915, and JP-A-2022-61494.

[0080] The yellow colorant (a2) can be used alone or in combination of two or more kinds.

[0081] The content of the yellow color material (a2) is preferably 50 to 100% by mass in 100% by mass of the yellow color material (A2).

[0082] The yellow colorant (A2) may contain a yellow colorant other than the yellow colorant (a2) as long as the effects of the present invention are not impaired.

[0083] The yellow colorant other than the yellow colorant (a2) is not particularly limited, and known compounds can be used. For example, CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 126, 127, 128, 129, 137, 138, 139, 147, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 192, 193, 194, 196, 198, 199, 213, 214, 231, 233, 234, 235, 236, and the pigments described in JP-A-2012-226110. Further examples include CI Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, CI Solvent Yellow 4, 14, 15, 23, 24, 38, 62, 63, 68, 79, 82, 94, 98, 99, 162, dyes described in JP-A-2019-073695, JP-A-2019-073696, JP-A-2019-073697, and JP-A-2019-073698, as well as lake compounds, salt-forming compounds, and polymers of these dyes. Among these, the yellow colorant other than the yellow colorant (a2) is preferably CI Pigment Yellow 129, 138, 139, 185, 231, or 233 from the viewpoint of color reproducibility.

[0084] The content of the yellow color material (A2) is preferably 10 to 90 mass % in 100 mass % of the color material (A).

[0085] The mass ratio of the green color material (a1) to the yellow color material (a2) is preferably from 10:90 to 90:10, and more preferably from 20:80 to 80:20. The total content of the green color material (a1) and the yellow color material (a2) is preferably from 50 to 100% by mass, and more preferably from 60 to 100% by mass, based on 100% by mass of the color material (A).

[0086] The photosensitive composition of the present invention may contain, as the colorant (A), a colorant other than the green colorant (A1) and the yellow colorant (A2).

[0087] Examples of color materials other than the green color material (A1) and the yellow color material (A2) include chromatic color materials such as red color materials, blue color materials, purple color materials, and orange color materials, and achromatic color materials such as white color materials and black color materials.

[0088] Examples of red colorants include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63 ,63:1,63:2,64,64:1,68,69,81,81:1,81:2,81:3,81:4,83,88,90:1,101,101:1,104,108,108:1,109,112,113,114,122,123,144,146,147,149,151,166,168,169,170,172,173,174,175,176,177,178,179, 181,184,185,187,188,190,193,194,200,202,206,207,208,209,210,214,216,220,221,224,230,231,232,233,235,236,237,238,239,242,243,245,247,249,250,251,253,254,255,256,257,258,259,260 , 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276, 277, 278, 279, 280, 281, 282, 283, 284, 285, 286, 287, 291, 295, 296, 297, pigments described in JP 2014-134712 A, and pigments described in Japanese Patent No. 6368844. Further examples include dyes such as CI Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 150, 151, 158, 176, 183, 198, 211, 251, 216, 217, 249, 252, 257, 260, 266, and 274, as well as lake compounds, salt-forming compounds, and polymers of these dyes. Examples of blue colorants include pigments such as CI Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79, 80, 87, and 88. In addition, examples of dyes include CI Acid Blue 1, 7, 9, 15, 18, 23, 80, and 90, CI Solvent Blue 5, 35, 36, 37, 44, 45, 59, and 67, as well as lake compounds, salt-forming compounds, and polymers of these dyes. Examples of purple colorants include pigments such as CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61. In addition, examples of the purple colorant include dyes such as CI Basic Violet 1, 3, 7, 10, 11, 14, 16, and 25, CI Solvent Violet 8, 13, 14, 21, 27, 28, and 36, CI Acid Violet 9, 30, and 102, and CI Acid Red 51, 52, 87, 92, 94, 289, 388, and 463, as well as lake compounds, salt-forming compounds, and polymers of these dyes. Examples of orange colorants include pigments such as CI Pigment Orange 36, 38, 43, 64, 71, and 73. Examples of white colorants include CI Pigment White 1, 2, 3, 4, 5, 6, 6:1, 7, 8, 10, 11, 12, 13, 14, 15, 16, 17, 18, 18:1, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 30, 32, and 33. Examples of black coloring materials include CI Pigment Black 1, 6, 7, 12, 20, and 31.

[0089] Further examples include near-infrared absorbing pigments, near-infrared absorbing dyes, metal pigments, hollow resin pigments, fluorescent pigments, pearl pigments, conductive pigments, and the like.

[0090] [Alkali-soluble resin (B)] The photosensitive composition of the present invention contains an alkali-soluble resin (B).

[0091] The alkali-soluble resin (B) is not particularly limited as long as it dissolves in the alkali developer described below, and any known resin can be used. Examples of the resin include (meth)acrylic resin, styrene resin, styrene / (meth)acrylic resin, epoxy resin, urethane resin, polycarbonate resin, polyester resin, polyether resin, polyimide resin, polyamideimide resin, cyclic olefin resin, polysiloxane resin, etc.

[0092] Examples of the structure of the alkali-soluble resin (B) include a random structure, a block structure, a graft structure, a comb structure, a star structure, etc. Among these, a lactam structure is preferred from the viewpoint of developability.

[0093] The weight average molecular weight (Mw) of the alkali-soluble resin (B) is preferably from 3,000 to 50,000, and more preferably from 4,000 to 40,000.

[0094] The acid value of the alkali-soluble resin (B) is preferably from 30 to 200 mgKOH / g, more preferably from 40 to 180 mgKOH / g.

[0095] The alkali-soluble resin (B) can be used alone or in combination of two or more kinds.

[0096] The content of the alkali-soluble resin (B) is preferably from 1 to 90 mass %, and more preferably from 5 to 80 mass %, in 100 mass % of the nonvolatile content of the photosensitive composition.

[0097] (Alkali-soluble resin (B1) having a monomer unit (b1) having a homopolymer glass transition temperature of 0° C. or lower) From the viewpoint of pattern formability, the photosensitive composition of the present invention preferably contains, as the alkali-soluble resin (B), an alkali-soluble resin (B1) having a monomer unit (b1) whose homopolymer has a glass transition temperature of 0° C. or lower (hereinafter, also simply referred to as the alkali-soluble resin (B1)).

[0098] The alkali-soluble resin (B1) moderately softens when exposed to heat. Therefore, it is assumed that heat sagging occurs easily during the post-bake process, resulting in a good cross-sectional shape of the pattern. In addition, because it has flexibility, rigid parts formed by polymerization of the polymerizable compound (C) described below and flexible parts of the alkali-soluble resin (B1) exist in the film, which can effectively relieve external or internal stress. Therefore, it is assumed that the difference in cure shrinkage between the surface and the inside of the pattern is reduced, and the occurrence of wrinkles on the surface can be suppressed.

[0099] The alkali-soluble resin (B1) is not particularly limited, and known resins can be used. For example, a monomer forming a monomer unit (b1) having a homopolymer glass transition temperature of 0° C. or lower, and a copolymer with any other copolymerizable monomer can be used.

[0100] The glass transition temperature (hereinafter, also referred to as Tg) may be a measured Tg obtained by actual measurement. Specifically, the measured Tg may be a value measured by differential scanning calorimetry (DSC). However, if measurement is difficult due to decomposition of the resin, etc., the calculated Tg obtained by the following formula is applied. 1 / Tg=W1 / Tg1+W2 / Tg2+······+W n / Tg n Here, the resins to be calculated are W1 to W n n types of monomer components up to W n is the weight fraction of the nth monomer, Tg n is the glass transition temperature (absolute temperature) of the homopolymer of the nth monomer. The glass transition temperature of the homopolymer of each monomer (hereinafter also referred to as homopolymer) is the value shown in "Polymer Handbook, Third edition, John Wiley & Sons, 1989" edited by Brandrup, J. Immergut, EH.

[0101] [Monomer unit (b1) having a homopolymer glass transition temperature of 0°C or lower] Examples of monomers forming the monomer unit (b1) having a homopolymer glass transition temperature of 0° C. or lower include phenoxyethyl acrylate (−22° C.), lauryl acrylate (−3° C.), 2-ethylhexyl acrylate (−50° C.), butoxytriethylene glycol methacrylate (−72° C.), 2-(2-ethoxyethoxy)ethyl acrylate (−67° C.), n-hexyl acrylate (−57° C.), n-butyl acrylate (−48° C.), isobutyl acrylate (−40° C.), ethyl Examples of suitable acrylates include ethyl acrylate (-24°C), lauryl methacrylate (-65°C), n-hexyl methacrylate (-5°C), 2-ethylhexyl methacrylate (-10°C), 2-methoxyethyl acrylate (-50°C), tetrahydrofurfuryl acrylate (-12°C), 2-hydroxyethyl acrylate (-15°C), 4-hydroxybutyl acrylate (-60°C), 2-hydroxypropyl acrylate (-7°C), and 2-acryloyloxyethyl succinic acid (-40°C). Among these, monomers having a homopolymer glass transition temperature of -60 to -10°C are preferred.

[0102] The content of the monomer unit (b1) having a homopolymer glass transition temperature of 0° C. or lower is preferably 1 to 50 mol %, more preferably 5 to 40 mol %, of all the constituent units of the alkali-soluble resin (B1) from the viewpoint of pattern formability.

[0103] The alkali-soluble resin (B1) may have a monomer unit other than the monomer unit (b1) having a homopolymer glass transition temperature of 0° C. or less. The monomer unit other than the monomer unit (b1) having a homopolymer glass transition temperature of 0° C. or less is not particularly limited, and examples thereof include monomer units formed from a monomer copolymerizable with a monomer having a homopolymer glass transition temperature of 0° C. or less. For example, examples thereof include a polymerizable unsaturated group-containing monomer unit (b2), an acidic group-containing monomer unit (b3), an aliphatic condensed ring structure-containing monomer unit (b4), a hydroxyl group-containing monomer unit (b5), an epoxy group-containing monomer unit (b6), a blocked isocyanate group-containing monomer unit (b7), an aromatic ring-containing monomer unit (b8), and other unit units (b9). Among these, from the viewpoint of pattern formability, it is preferable to have a polymerizable unsaturated group-containing monomer unit (b2).

[0104] [Polymerizable unsaturated group-containing monomer unit (b2)] Methods for incorporating the polymerizable unsaturated group-containing monomer unit (b2) into the alkali-soluble resin (B1) include, for example, the following methods (i) to (iii).

[0105] <Method (i)> In the method (i), for example, a precursor having an epoxy group-containing monomer unit (b6) described later is first synthesized, and then a carboxyl group-containing monomer (modifying compound) is added to the epoxy group of the precursor.

[0106] Examples of the carboxyl group-containing monomer include acrylic acid, methacrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, etc. Among these, acrylic acid and methacrylic acid are preferred.

[0107] From the viewpoint of developability, the epoxy group of the epoxy group-containing monomer unit (b6) to which a carboxyl group of a carboxyl group-containing monomer has been added can be further reacted with an acid anhydride.

[0108] Examples of the acid anhydride include tetrahydrophthalic anhydride, phthalic anhydride, hexahydrophthalic anhydride, succinic anhydride, and maleic anhydride.

[0109] <Method (ii)> In the method (ii), for example, first, a polymer (precursor) having an acidic group-containing monomer unit (b3) in which the acidic group is a carboxyl group is synthesized, and then an epoxy group-containing monomer (modifying compound) is added to the carboxyl group of the precursor.

[0110] Examples of epoxy group-containing monomers include glycidyl (meth)acrylate, methyl glycidyl (meth)acrylate, 2-glycidoxyethyl (meth)acrylate, 3,4-epoxybutyl (meth)acrylate, and 3,4-epoxycyclohexyl (meth)acrylate.

[0111] <Method (iii)> In the method (iii), for example, a precursor having a hydroxyl group-containing monomer (b5) described later is first synthesized, and then the hydroxyl group of the precursor is reacted with the isocyanate group of an isocyanate group-containing monomer (modifying compound).

[0112] Examples of the isocyanate group-containing monomer include 2-(meth)acryloylethyl isocyanate, 2-(meth)acryloyloxyethyl isocyanate, and 1,1-bis[methacryloyloxy]ethyl isocyanate.

[0113] From the viewpoint of pattern formability, the content of the polymerizable unsaturated group-containing monomer unit (b2) is preferably from 5 to 80 mol %, and more preferably from 30 to 80 mol %, of all the constituent units of the alkali-soluble resin (B1).

[0114] [Acidic group-containing monomer unit (b3)] Examples of the acidic group-containing monomer include (meth)acrylic acid, crotonic acid, propiolic acid, cinnamic acid, itaconic acid, itaconic anhydride, maleic acid, monomethyl maleate, monoethyl maleate, monoisopropyl maleate, maleic anhydride, fumaric acid, 2-methacryloyloxyethyl succinic acid, 2-acryloyloxyethyl phthalic acid, 2-acryloyloxyethylhexyl hydrophthalic acid, p-styrenesulfonic acid, vinylsulfonic acid, 2-acrylamido-2-methylpropanesulfonic acid, tert-butylacrylamidosulfonic acid, and 2-(meth)acryloyloxyethyl acid phosphate. The acidic group-containing monomers can be used alone or in combination of two or more kinds.

[0115] In addition, the method of introducing the acidic group-containing monomer unit (b3) into the alkali-soluble resin (B1) may be a method of adding an acid anhydride (modifying compound) to the hydroxyl group contained in the resin (precursor) other than the method of copolymerizing the acidic group-containing monomer. Examples of the acid anhydride include succinic anhydride, phthalic anhydride, and 1,2,3,6-tetrahydrophthalic anhydride.

[0116] [Aliphatic condensed ring structure-containing monomer unit (a4)] Examples of the aliphatic condensed ring structure-containing monomer include isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentanyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, adamantyl (meth)acrylate, etc. Among these, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, and dicyclopentanyloxyethyl (meth)acrylate are preferred. The aliphatic fused ring structure-containing monomers can be used alone or in combination of two or more kinds.

[0117] [Hydroxyl group-containing monomer unit (b5)] Examples of hydroxyl group-containing monomers include 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl methacrylate, 2,3-dihydroxypropyl (meth)acrylate, glycerol mono(meth)acrylate, cyclohexanedimethanol mono(meth)acrylate, 2-hydroxy-3-phenoxypropyl acrylate, and 2-acryloyloxyethyl-2-hydroxyethyl phthalate. The hydroxyl group-containing monomers can be used alone or in combination of two or more kinds.

[0118] The method for introducing the hydroxyl group-containing monomer unit (b5) into the alkali-soluble resin (B1) may include, other than copolymerizing a hydroxyl group-containing monomer, a method for adding a compound having a carboxyl group (modifying compound) to an epoxy group contained in the resin (precursor), or a method for adding a compound having an epoxy group (modifying compound) to a carboxyl group contained in the resin (precursor).

[0119] [Epoxy group-containing monomer unit (b6)] Examples of the epoxy group-containing monomer include oxiranyl (meth)acrylate, glycidyl (meth)acrylate, 2-methylglycidyl (meth)acrylate, 2-ethylglycidyl (meth)acrylate, 2-oxiranylethyl (meth)acrylate, 2-glycidyloxyethyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 2-(3,4-epoxycyclohexyl)ethyl (meth)acrylate, 2-(3,4-epoxycyclohexylmethyloxy)ethyl (meth)acrylate, and 3-(3,4-epoxycyclohexylmethyloxy)propyl (meth)acrylate. The epoxy group-containing monomers can be used alone or in combination of two or more kinds.

[0120] [Blocked isocyanate group-containing monomer unit (b7)] The blocked isocyanate group-containing monomer is a compound in which the isocyanate group in the isocyanate group-containing monomer is protected with a compound that is eliminated by heat (hereinafter, also referred to as a blocking agent). The elimination temperature of the blocking agent is preferably 60 to 160°C, more preferably 80 to 140°C.

[0121] Examples of isocyanate group-containing monomers include 2-isocyanatoethyl (meth)acrylate, 2-isocyanatopropyl (meth)acrylate, 3-isocyanatopropyl (meth)acrylate, 2-isocyanato-1-methylethyl (meth)acrylate, 2-isocyanato-1,1-dimethylethyl (meth)acrylate, 4-isocyanatocyclohexyl (meth)acrylate, and methacryloyl isocyanate. Also usable are equimolar reaction products of 2-hydroxyalkyl (meth)acrylate and diisocyanate compound. Among these, 2-isocyanatoethyl (meth)acrylate and 2-isocyanatopropyl (meth)acrylate are preferred.

[0122] Examples of the blocking agent include oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, pyrazole compounds, mercaptan compounds, imidazole compounds, imide compounds, urea compounds, imine compounds, and bisulfite compounds.

[0123] Examples of the oxime compound include formaldoxime, acetaldoxime, acetoxime, methyl ethyl ketoxime, methyl isobutyl ketoxime, cyclohexanone oxime, benzophenone oxime, etc. Among these, methyl ethyl ketoxime is preferred. Examples of the lactam compound include ε-caprolactam, δ-valerolactam, γ-butyrolactam, and β-propiolactam. Examples of phenolic compounds include phenol, cresol, 2,6-xylenol, 3,5-xylenol, ethylphenol, p-tert-butylphenol, nonylphenol, methyl 2-hydroxybenzoate, methyl 4-hydroxybenzoate, p-naphthol, p-nitrophenol, etc. Among these, 3,5-xylenol, methyl 2-hydroxybenzoate, and methyl 4-hydroxybenzoate are preferred. Examples of the alcohol compound include methanol, ethanol, propanol, butanol, ethylene glycol, methyl cellosolve, butyl cellosolve, methyl carbitol, benzyl alcohol, phenyl cellosolve, and furfuryl alcohol. Examples of the amine compound include diphenylamine, phenylnaphthylamine, aniline, and carbazole. Examples of the active methylene compound include dimethyl malate, diethyl malate, dimethyl malonate, diethyl malonate, dibutyl malonate, di-tert-butyl malonate, methyl acetoacetate, ethyl acetoacetate, and acetylacetone, with diethyl malate and diethyl malonate being preferred. Examples of the pyrazole compound include pyrazole, methylpyrazole, and 3,5-dimethylpyrazole, with 3,5-dimethylpyrazole being preferred. Examples of the mercaptan compound include butyl mercaptan, thiophenol, and tert-dodecyl mercaptan. Examples of the imidazole compound include imidazole, 2-methylimidazole, 2-ethylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, and 1-benzyl-2-phenylimidazole. Examples of the imide compound include succinimide, maleimide, maleimide, and phthalimide. Examples of the urea compound include urea, thiourea, and ethyleneurea. Examples of the imine compound include ethyleneimine and polyethyleneimine. Examples of the bisulfite compound include sodium bisulfite and potassium bisulfite.

[0124] The blocking agents can be used alone or in combination of two or more kinds.

[0125] The blocking agent is preferably one or more selected from the group consisting of oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, pyrazole compounds, mercaptan compounds, imidazole compounds, and imide compounds, and from the viewpoint of the protection reaction and the deprotection reaction, is more preferably one or more selected from the group consisting of oxime compounds, phenol compounds, active methylene compounds, and pyrazole compounds.

[0126] Examples of the blocked isocyanate group-containing monomer include the following compounds and acrylate compounds thereof, but the present invention is not limited thereto. The blocked isocyanate group-containing monomers can be used alone or in combination of two or more kinds.

[0127] [ka]

[0128] Commercially available blocked isocyanate group-containing monomers include Karenz MOI-DEM (blocking agent desorption temperature: 85 to 95°C), MOI-BP (blocking agent desorption temperature: 105 to 115°C), and MOI-BM (125 to 135°C), all manufactured by Showa Denko K.K.

[0129] [Aromatic ring-containing monomer unit (b8)] Examples of aromatic ring-containing monomers include styrene, α-methylstyrene, vinylnaphthalene, phenyl(meth)acrylate, benzyl(meth)acrylate, paracumylphenol ethylene oxide (EO) or propylene oxide (PO) modified (meth)acrylate, phenol EO or PO modified (meth)acrylate, nonylphenol EO or PO modified (meth)acrylate, N-phenylmaleimide, and N-benzylmaleimide. The aromatic ring-containing monomers can be used alone or in combination of two or more kinds.

[0130] [Other monomer units (b9)] Examples of other monomers include acrylic acid esters such as methyl (meth)acrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, tert-butyl methacrylate, and cyclohexyl (meth)acrylate; (Meth)acrylamides such as (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl(meth)acrylamide, N-isopropyl(meth)acrylamide, diacetone(meth)acrylamide, or acryloylmorpholine; Vinyl ethers such as ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, or isobutyl vinyl ether; vinyl acetate or vinyl propionate or other vinyl fatty acids; N-substituted maleimides such as methylmaleimide, ethylmaleimide, 1,2-bismaleimidoethane 1,6-bismaleimidohexane, 3-maleimidopropionic acid, and 6,7-methylenedioxy-4-methyl-3-maleimidocoumarin; Examples of such dimethyl-2,2'-[oxybis(methylene)]bis-2-propenoate include diethyl-2,2'-[oxybis(methylene)]bis-2-propenoate, di(n-propyl)-2,2'-[oxybis(methylene)]bis-2-propenoate, di(isopropyl)-2,2'-[oxybis(methylene)]bis-2-propenoate, and di(2-ethylhexyl)-2,2'-[oxybis(methylene)]bis-2-propenoate. The other monomers can be used alone or in combination of two or more.

[0131] The alkali-soluble resin (B1) can be used alone or in combination of two or more kinds.

[0132] From the viewpoint of pattern formability, the content of the alkali-soluble resin (B1) is preferably from 10 to 100 mass %, and more preferably from 20 to 100 mass %, in 100 mass % of the alkali-soluble resin (B).

[0133] (Alkali-soluble resin (B2) other than alkali-soluble resin (B1)) The photosensitive composition of the present invention preferably contains an alkali-soluble resin (B2) other than the alkali-soluble resin (B1) as the alkali-soluble resin (B), which is hereinafter also simply referred to as the alkali-soluble resin (B2). However, the alkali-soluble resin (B2) does not contain a monomer unit (b1) whose homopolymer has a glass transition temperature of 0° C. or lower.

[0134] [Polymerizable compound (C)] The photosensitive composition of the present invention contains a polymerizable compound (C).

[0135] The polymerizable compound (C) may be a monomer or oligomer having a polymerizable unsaturated group. Examples of the polymerizable unsaturated group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a styryl group.

[0136] The polymerizable compound (C) is not particularly limited, and a known compound can be used. For example, a polymerizable compound (C1) having a urethane bond, a polymerizable compound (C2) having a hydroxyl group, a polymerizable compound (C3) having an acidic group, a lactone-modified polymerizable compound (C4), a polymerizable compound (C5) having an amine structure, a polymerizable compound (C6) having a dendrimer structure or a hyperbranch structure, and other polymerizable compounds (C7) can be mentioned. Among these, the polymerizable compound (C) preferably contains a polymerizable compound (C1) having a urethane bond from the viewpoint of pattern formability.

[0137] The polymerizable compound (C) may be used alone or in combination of two or more kinds.

[0138] The content of the polymerizable compound (C) is preferably from 1 to 80 mass %, and more preferably from 5 to 70 mass %, based on 100 mass % of the nonvolatile content of the photosensitive composition.

[0139] (Polymerizable compound (C1) having a urethane bond) It is speculated that the urethane bond has a moderate degree of flexibility, which relieves stress and suppresses the occurrence of wrinkles, and also improves adhesion to the substrate.

[0140] The polymerizable compound (C1) having a urethane bond is not particularly limited, and a known compound can be used. For example, urethane (meth)acrylate obtained by reacting a hydroxyl group-containing (meth)acrylate with a polyfunctional isocyanate, or urethane (meth)acrylate obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and then reacting the polyhydric alcohol with a hydroxyl group-containing (meth)acrylate, etc. can be mentioned.

[0141] Examples of the hydroxyl group-containing (meth)acrylate include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide (EO)-modified penta(meth)acrylate, dipentaerythritol propylene oxide (PO)-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol mono(meth)acrylate, glycerol di(meth)acrylate, glycerol tri(meth)acrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxyl group-containing polyol polyacrylate.

[0142] Examples of the polyfunctional isocyanate include aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate, aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate, and alicyclic diisocyanate such as isophorone diisocyanate, as well as biuret forms, isocyanurate forms, and trimethylolpropane adducts thereof.

[0143] Commercially available polymerizable compounds (C1) having a urethane bond include, for example, AH-600, UA-306H, UA-306T, UA-306I, UA-510H, and UF-8001G manufactured by Kyoeisha Chemical Co., Ltd., UA-1100H, U-6LPA, UA-33H, U-10HA, and U-15HA manufactured by Shin-Nakamura Chemical Co., Ltd., and EBECRYL1290 and KRM8452 manufactured by Daicel-Allnex Corporation.

[0144] The number of polymerizable unsaturated groups in the polymerizable compound (C1) having a urethane bond is preferably from 5 to 12, from the viewpoint of pattern formability.

[0145] The molecular weight of the polymerizable compound (C1) having a urethane bond is preferably from 500 to 3,000, and more preferably from 500 to 2,000, from the viewpoint of pattern formability.

[0146] The polymerizable compound (C1) having a urethane bond can be used alone or in combination of two or more kinds.

[0147] The content of the polymerizable compound (C1) having a urethane bond is preferably from 10 to 100 mass %, and more preferably from 20 to 100 mass %, in 100 mass % of the polymerizable compound (C), from the viewpoint of pattern formability.

[0148] From the viewpoint of pattern formability, the polymerizable compound (C1) having a urethane bond preferably contains at least one selected from the group consisting of alicyclic urethane (meth)acrylates and aromatic urethane (meth)acrylates, and more preferably contains an aromatic urethane (meth)acrylate.

[0149] It is speculated that the inclusion of a rigid alicyclic structure or aromatic ring structure allows for a more robust pattern to be obtained, and that the π-π interactions due to the aromatic ring structure further improve the effect.

[0150] The total content of the alicyclic urethane (meth)acrylate and the aromatic urethane (meth)acrylate is preferably from 10 to 100 mass%, and more preferably from 20 to 100 mass%, in 100 mass% of the polymerizable compound (C1) having a urethane bond.

[0151] [Alicyclic urethane (meth)acrylate] The alicyclic urethane (meth)acrylate is not particularly limited, and a known compound can be used. For example, the alicyclic urethane (meth)acrylate can be obtained by using a polyfunctional isocyanate having an alicyclic structure as the polyfunctional isocyanate of the polymerizable compound (C1) having a urethane bond.

[0152] Examples of the polyfunctional isocyanate having an alicyclic structure include cyclohexane-1,4-diisocyanate, isophorone diisocyanate, dimethylcyclohexyl diisocyanate, methylcyclohexyl diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, 1,3-bis(isocyanatemethyl)cyclohexane, methylcyclohexane diisocyanate, norbornane diisocyanate, bis(isocyanatemethyl)cyclohexane, etc. Also included are biuret forms, isocyanurate forms, trimethylolpropane adducts, etc. of these.

[0153] [Aromatic urethane (meth)acrylate] The aromatic urethane (meth)acrylate is not particularly limited, and a known compound can be used. For example, the aromatic urethane (meth)acrylate can be obtained by changing the polyfunctional isocyanate having an alicyclic structure of the above-mentioned alicyclic urethane (meth)acrylate to a polyfunctional isocyanate having an aromatic ring structure.

[0154] Examples of the polyfunctional isocyanate having an aromatic ring structure include 1,5-naphthylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 4,4'-diphenyldimethylmethane diisocyanate, 4,4'-dibenzyl isocyanate, dialkyl diphenylmethane diisocyanate, tetraalkyl diphenylmethane diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, xylylene diisocyanate, m-tetramethylxylylene diisocyanate, 4,4-diphenylmethane diisocyanate, tolylene diisocyanate, bischloromethyldiphenylmethane diisocyanate, 2,6-diisocyanate-benzyl chloride, and bis(isocyanate methyl)benzene. Further examples thereof include biuret forms, isocyanurate forms, and trimethylolpropane adducts.

[0155] From the viewpoint of developability, the polymerizable compound (C1) having a urethane bond preferably further has an acidic group. Examples of the acidic group include a sulfonic acid group, a carboxyl group, and a phosphoric acid group. Among these, a carboxyl group is preferred.

[0156] The method for introducing an acidic group into the polymerizable compound (C1) having a urethane bond can be, for example, synthesized by first reacting the hydroxyl group-containing (meth)acrylate with the polyfunctional isocyanate, and then adding a mercapto compound having a carboxyl group to the product.

[0157] Examples of the mercapto compound having a carboxyl group include mercaptoacetic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, o-mercaptobenzoic acid, 2-mercaptonicotinic acid, and mercaptosuccinic acid.

[0158] (Polymerizable compound having a hydroxyl group (C2)) Examples of the polymerizable compound (C2) having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 2,3-hydroxypropyl (meth)acrylate, glycerol mono(meth)acrylate, glycerol di(meth)acrylate, cyclohexanedimethanol mono(meth)acrylate, 2-hydroxy-3-phenoxypropyl acrylate, EO isocyanuric acid, or the like. Examples of the acrylic acid ester include PO-modified (meth)acrylate, isocyanuric acid EO or PO-modified di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, polypentaerythritol penta(meth)acrylate, dipentaerythritol EO or PO-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, and epoxy (meth)acrylate obtained by reacting an epoxy group of an epoxy compound with a carboxyl group of (meth)acrylic acid. Among these, glycerol di(meth)acrylate, pentaerythritol tri(meth)acrylate, and dipentaerythritol penta(meth)acrylate are preferred.

[0159] Examples of commercially available polymerizable compounds (C2) having a hydroxyl group include KAYARAD R-128H and R-167 manufactured by Nippon Kayaku Co., Ltd., ARONIX M-5700 and M-920 manufactured by Toagosei Co., Ltd., NK Ester 701A manufactured by Shin-Nakamura Chemical Co., Ltd., Light Ester HOP(N), HOA(N), HOP-A(N), HOB(N), and G-201P, Epoxy Ester M-600A, 40EM, 70PA, 200PA, 80MFA, 3002M(N), 3002A(N), and 3000A manufactured by Kyoeisha Chemical Co., Ltd., and OGSOL GA-5060P and GA-2800 manufactured by Osaka Gas Chemical Co., Ltd.

[0160] The polymerizable compound (C2) having a hydroxyl group can be used alone or in combination of two or more kinds.

[0161] (Polymerizable compound having an acidic group (C3)) Examples of the polymerizable compound (C3) having an acidic group include an esterification product of a free hydroxyl group-containing poly(meth)acrylate of a polyhydric alcohol and (meth)acrylic acid, and a dicarboxylic acid; an esterification product of a polycarboxylic acid and a monohydroxyalkyl (meth)acrylate, and the like.

[0162] Examples of the polyhydric alcohol include ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol, glycerin, trimethylolpropane, ditrimethylolpropane, pentaerythritol, and dipentaerythritol.

[0163] Examples of the dicarboxylic acid include malonic acid, succinic acid, maleic acid, glutaric acid, phthalic acid, and itaconic acid.

[0164] Examples of the polyvalent carboxylic acid include trimellitic acid and pyromellitic acid. Examples of monohydroxyalkyl (meth)acrylates include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, pentaerythritol triacrylate, and 2-hydroxy-3-acryloyloxypropyl methacrylate.

[0165] Commercially available polymerizable compounds (C3) having an acidic group include Aronix M-5300, M-5400, M-510, M-520, and M-521 manufactured by Toagosei Co., Ltd., and β-CEA manufactured by Daicel-Allnex Corporation.

[0166] The polymerizable compound (C3) having an acidic group can be used alone or in combination of two or more kinds.

[0167] (Lactone-modified polymerizable compound (C4)) The lactone-modified polymerizable compound (C4) is a compound having a structure modified with lactone in the molecule. The lactone-modified polymerizable compound (C4) is obtained by esterifying a polyhydric alcohol such as trimethylolethane, ditrimethylolethane, trimethylolpropane, ditrimethylolpropane, pentaethylthritol, tripentaerythritol, glycerin, diglycerol, or trimethylolmelamine with (meth)acrylic acid and ε-caprolactone or other lactone compound.

[0168] Commercially available lactone-modified polymerizable compounds (C4) include, for example, KAYARAD DPCA-20, DPCA-30, DPCA-60, and DPCA-120 manufactured by Nippon Kayaku Co., Ltd.

[0169] The lactone-modified polymerizable compounds (C4) can be used alone or in combination of two or more kinds.

[0170] (Polymerizable compound having an amine structure (C5)) The amine structure of the polymerizable compound (C5) having an amine structure may be any of a primary amine, secondary amine, and tertiary amine structures, but is preferably a secondary or tertiary amine structure, provided that the amine structure of the polymerizable compound (C5) having an amine structure does not include an amide structure, an imide structure, or a urethane structure in which a carbonyl group is directly bonded to a nitrogen atom.

[0171] Examples of the polymerizable compound (C5) having an amine structure include tris(acryloyloxyethyl)amine, tris(methacryloyloxyethyl)amine, tris(2-hydroxy-3-methacryloyloxypropyl)amine, and a Michael addition reaction product of a (meth)acrylate compound (X) and an amine compound (Y).

[0172] Examples of the (meth)acrylate compound (X) include glycerin tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, diglycerol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, penta ...hexa(meth)acrylate, diglycerol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol hexa(meth)acrylate, diglycerol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol hexa(meth)acrylate, diglycerol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol hexa(meth)acrylate, diglycerol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol hexa(meth)acrylate, diglycerol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, Examples of the alkylene oxide-modified tetra(meth)acrylate include phosphorus tri(meth)acrylate, diglycerol tetra(meth)acrylate, trimethylolpropane alkylene oxide-modified tri(meth)acrylate, ditrimethylolpropane alkylene oxide-modified tri- and tetra(meth)acrylate, pentaerythritol alkylene oxide-modified tri- and tetra(meth)acrylate, diglycerol alkylene oxide-modified tri- and tetra(meth)acrylate, and dipentaerythritol alkylene oxide-modified tetra-, penta- and hexa(meth)acrylate. Examples of the alkylene oxide unit in the alkylene oxide modification include ethylene oxide, propylene oxide, and butylene oxide. The (meth)acrylate compound (X) also includes a (meth)acrylate compound having an acidic group.

[0173] The (meth)acrylate compounds (X) can be used alone or in combination of two or more.

[0174] Examples of the amine compound (Y) include primary amines such as n-propylamine, n-butylamine, n-hexylamine, benzylamine, aminocaproic acid, monoethanolamine, 2-(2-aminoethoxy)ethanol, o-aminophenol, m-aminophenol, and p-aminophenol; Examples of the secondary amines include dimethylamine, diethylamine, dipropylamine, diisopropylamine, dibutylamine, cyclohexylamine, morpholine, piperidine, 1-methylpiperazine, proline, N-merylethanolamine, N-acetylethanolamine, diethanolamine, 3-anilinephenol, and 4-anilinephenol.

[0175] The amine compound (Y) can be used alone or in combination of two or more kinds.

[0176] The method for producing the Michael addition reaction product of the (meth)acrylate compound (X) and the amine compound (Y) is not particularly limited, and a known method can be used. For example, the methods described in International Publication No. 2006 / 075754, JP-A-2008-545859, JP-A-2017-066347, etc. can be mentioned.

[0177] The polymerizable compound (C5) having an amine structure may have an acidic group and / or a hydroxyl group. Examples of a method for introducing an acidic group and / or a hydroxyl group include a method of using a compound having an acidic group and / or a hydroxyl group in the (meth)acrylate compound (X) or the amine compound (Y), and a method of adding an acid anhydride after a Michael addition reaction.

[0178] The polymerizable compound (C5) having an amine structure may further have a urethane bond. The urethane bond may be introduced, for example, by a urethane reaction between a Michael addition reaction product (precursor) of the above-mentioned (meth)acrylate compound (X) and the above-mentioned amine compound (Y) having a hydroxyl group and a polyisocyanate compound (Z).

[0179] Examples of the polyisocyanate compound (Z) include polyisocyanate compounds having an aliphatic structure, such as butane-1,4-diisocyanate, hexamethylene diisocyanate, isopropylene diisocyanate, methylene diisocyanate, and 2,2,4-trimethylhexamethylene diisocyanate; Polyisocyanate compounds having an alicyclic structure, such as cyclohexane-1,4-diisocyanate, isophorone diisocyanate, dimethylcyclohexyl diisocyanate, methylcyclohexyl diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, 1,3-bis(isocyanatemethyl)cyclohexane, methylcyclohexane diisocyanate, norbornane diisocyanate, and bis(isocyanatemethyl)cyclohexane; Examples of the polyisocyanate compound include polyisocyanate compounds having an aromatic structure, such as 1,5-naphthylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 4,4'-diphenyldimethylmethane diisocyanate, 4,4'-dibenzyl isocyanate, dialkyl diphenylmethane diisocyanate, tetraalkyl diphenylmethane diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, xylylene diisocyanate, m-tetramethyl xylylene diisocyanate, 4,4-diphenylmethane diisocyanate, tolylene diisocyanate, bischloromethyl diphenylmethane diisocyanate, 2,6-diisocyanate-benzyl chloride, and bis(isocyanate methyl)benzene. Further, biuret, isocyanurate, adduct and allophanate forms of these compounds are also included.

[0180] The polyisocyanate compounds (Z) can be used alone or in combination of two or more kinds.

[0181] The method of the urethane reaction between the precursor and the polyisocyanate compound (Z) is not particularly limited, and a known method can be used. For example, the method described in JP-A-2018-517797 can be mentioned.

[0182] Commercially available polymerizable compounds (C5) having an amine structure include, for example, ARONIX MT-3041 and 3042 manufactured by Toagosei Co., Ltd., EBECRYL 80 and 7100 manufactured by Daicel-Allnex Corporation, and CN371NS, 372, 374, 383, 386, and 9906NS manufactured by Arkema.

[0183] The polymerizable compound (C5) having an amine structure can be used alone or in combination of two or more kinds.

[0184] (Polymerizable compound (C6) having a dendrimer structure or a hyperbranched structure) A compound having a dendrimer structure has a chemical structure in which the core-constituting chemical structure (hereinafter also referred to as the core portion) is regularly branched outward, and a polymerizable unsaturated group is bonded to the end of the branch, and the compound has a highly controlled spherical chemical structure and molecular weight. The hyperbranched structure has a chemical structure similar to that of the dendrimer structure.

[0185] Commercially available polymerizable compounds (C6) having a dendrimer structure or a hyperbranched structure include, for example, Viscoat #1000LT (dendrimer structure, average number of acryloyl groups: 14) and SIRUS-501 (dendrimer structure, average number of acryloyl groups: 18) manufactured by Osaka Organic Chemical Industry Co., Ltd., Miramer SP-1106 (dendrimer structure, average number of acryloyl groups: 18) and SP-1108 (dendrimer structure, average number of acryloyl groups: 13) manufactured by Miwon Specialty Chemical Co., Ltd., CN2301 (hyperbranched structure, average number of acryloyl groups: 9), CN2302 (hyperbranched structure, average number of acryloyl groups: 16), CN2303 (hyperbranched structure, average number of acryloyl groups: 6), CN2304 (hyperbranched structure, average number of acryloyl groups: 18), and Eternal Examples include Etercure 6361-100 (hyperbranched structure, average number of acryloyl groups: 8), 6362-100 (hyperbranched structure, average number of acryloyl groups: 12), 6363 (hyperbranched structure, average number of acryloyl groups: 16), and DR-E522 (hyperbranched structure, average number of acryloyl groups: 15), all manufactured by Materials.

[0186] The polymerizable compound (C6) having a dendrimer structure or a hyperbranched structure can be used alone or in combination of two or more kinds.

[0187] (Other polymerizable compounds (C7)) Examples of other polymerizable compounds (C7) include methyl (meth)acrylate, ethyl (meth)acrylate, cyclohexyl (meth)acrylate, polyethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, triethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, phenoxytetraethylene glycol (meth)acrylate, phenoxyhexaethylene glycol (meth)acrylate, trimethylolpropane EO or PO modified tri(meth)acrylate, isocyanuric acid. Examples of the methacrylic acid ester include EO- or PO-modified tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol EO- or PO-modified hexa(meth)acrylate, tricyclodecanyl (meth)acrylate, and (meth)acrylic acid ester of methylolated melamine; styrene, vinyl acetate, ethylene glycol divinyl ether, pentaerythritol trivinyl ether, (meth)acrylamide, N-vinyl formamide, and acrylonitrile.

[0188] Other commercially available polymerizable compounds (C7) include, for example, KAYARAD NPGDA, PEG400DA, FM-400, HX-200, HX-620, R-551, R-712, R-604, R-684, GPOD-303, TMPTA, T-1420(T), RP-1040, DPEA-12, and D-310 manufactured by Nippon Kayaku Co., Ltd., and Aronix M-101A, M-102, M-111, M-113, M-120, M-140, M-208, and M-21 manufactured by Toagosei Co., Ltd. 1B, M-220, M-225, M-270, M-240, M-309, M-310, M-321, M-350, M-360, M-408, M-460, Viscoat #150, #155, #160, #192, #MTG, #200, #196, #195, #230, #260, #310, #700HV, #295 manufactured by Osaka Organic Chemical Industry Co., Ltd., OGSOL manufactured by Osaka Gas Chemical Co., Ltd. Examples of such esters include EA-0200, EA-0300, Miramer HR6060, 6100, and 6200 manufactured by Miwon Specialty Chemical Co., Ltd., and NK Ester A-HD-N, A-NPG, A-200, A-400, APG-200, APG-400, A-DCP, ABE-300, A-BPE-4, A-BPE-10, A-TMPT, A-TMPT-9EO, A-GLY-3E, A-GLY-9E, A-TMMT, ATM-35E, and AD-TMP manufactured by Shin-Nakamura Chemical Co., Ltd.

[0189] Further examples include (meth)acrylates having a hydroxyl group and an acidic group, (meth)acrylates having a hydroxyl group and a urethane bond, and lactone-modified (meth)acrylates having a hydroxyl group.

[0190] The other polymerizable compounds (C7) can be used alone or in combination of two or more kinds.

[0191] [Polymerization initiator (D)] The photosensitive composition of the present invention contains a polymerization initiator (D).

[0192] The polymerization initiator (D) is not particularly limited, and any known compound can be used. For example, a compound that generates radicals by the action of light or heat to initiate or promote a radical polymerization reaction can be used. The polymerization initiator that generates radicals by light (hereinafter, also simply referred to as a photopolymerization initiator) is preferably a compound that generates radicals by light rays in the ultraviolet to visible light range. The polymerization initiator that generates radicals by heat (hereinafter, also simply referred to as a thermal polymerization initiator) may be a compound that generates radicals by the action of heat and light.

[0193] Examples of the photopolymerization initiator include α-hydroxyketone compounds such as 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methylpropiophenone, and 2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methyl-1-propanone; α-aminoketone compounds such as 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-(dimethylamino)-4'-morpholinobutyrophenone, and 2-dimethylamino-2-(4-methylbenzyl)-1-[4-(morpholinophenyl)-butan-1-one; Acylphosphine compounds such as bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide and diphenyl-2,4,6-trimethylbenzoylphosphine oxide; Oxime compounds such as 1,2-octanedione, 1-[4-(phenylthio)phenyl-, 2-(O-benzoyloxime)], ethanol, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(O-acetyloxime); triazine compounds such as 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-piperonyl-4,6-bis(trichloromethyl)-s-triazine, 2,4-bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphth-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxy-naphth-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2,4-trichloromethyl-(piperonyl)-6-triazine, and 2,4-trichloromethyl-(4'-methoxystyryl)-6-triazine; Examples of the quinone compounds include 9,10-phenanthrenequinone, camphorquinone, and ethylanthraquinone.

[0194] Commercially available products include Omnirad 127, 184, 1173, and 2959 manufactured by IGM Resins as α-hydroxyketone compounds, Omnirad 907, 369E, and 379EG manufactured by IGM Resins as α-aminoketone compounds, Omnirad 819 and TPO manufactured by IGM Resins as acylphosphine compounds, IRGACURE OXE-01, 02, 03, 04, and 05 manufactured by BASF Japan, Adeka Arcles N-1919, NCI-730, 831E, and 930 manufactured by ADEKA, TRONLY TR-PBG-301, 304, 305, 309, 314, 345, 358, 380, 365, 610, 3054, and 3057 manufactured by Changzhou Strong New Materials Co., Ltd., and IGM Examples of such adhesives include Omnirad 1312, 1314, and 1316 manufactured by Resins, SPI-02, 03, 04, 05, 06, and 07 manufactured by Samyang Corporation, and DFI-020, 306, and EOX-01 manufactured by Daito Chemistrys. Further, compounds described in JP 2007-210991 A, JP 2009-179619 A, JP 2010-037223 A, JP 2010-215575 A, JP 2011-020998 A, WO 2015 / 036910, JP 2019-507108 A, JP 2019-528331 A, WO 2021 / 175855 A, JP 2022-5115524 A, and the like are also included.

[0195] Examples of the thermal polymerization initiator include benzopinacol, 1,2-dimethoxy-1,1,2,2-tetraphenylethane, 1,2-dimethoxy-1,1,2,2-tetraphenylethane, 1,2-diphenoxy-1,1,2,2-tetraphenylethane, 1,2-dimethoxy-1,1,2,2-tetra(4-methylphenyl)ethane, 1,2-diphenoxy-1,1,2,2-tetra(4-methoxyphenyl)ethane, and 1,2-bis(trimethylsiloxy)-1,1,2,2-tetraphenylethane. pinacol compounds such as 1,2-bis(triethylsiloxy)-1,1,2,2-tetraphenylethane, 1,2-bis(tert-butyldimethylsiloxy)-1,1,2,2-tetraphenylethane, 1-hydroxy-2-trimethylsiloxy-1,1,2,2-tetraphenylethane, 1-hydroxy-2-triethylsiloxy-1,1,2,2-tetraphenylethane, and 1-hydroxy-2-tert-butyldimethylsiloxy-1,1,2,2-tetraphenylethane; azo compounds such as 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), dimethyl-2,2'-azobis(2-methylpropionate), 2,2'-azobis(2-methylbutyronitrile), 1,1'-azobis(cyclohexane-1-carbonitrile), 2,2'-azobis[N-(2-propenyl)2-methylpropionamide], 1-[(1-cyano-1-methylethyl)azo]formamide, 2,2'-azobis(N-butyl-2-methylpropionamide), and 2,2'-azobis(N-cyclohexyl-2-methylpropionamide); Examples of the organic peroxides include methyl ethyl ketone peroxide, cyclohexanone peroxide, 3,3,5-trimethylcyclohexanone peroxide, methylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane, 1,1-bis(tert-butylperoxy)cyclohexane, 2,2-bis(tert-butylperoxy)butane, succinic peroxide, and benzoyl peroxide.

[0196] The polymerization initiator (D) can be used alone or in combination of two or more kinds.

[0197] The content of the polymerization initiator (D) is preferably from 0.1 to 20 mass %, and more preferably from 0.5 to 10 mass %, based on 100 mass % of the nonvolatile content of the photosensitive composition.

[0198] (Oxime Compound (D1)) From the viewpoints of pattern formability and electrical properties, the photosensitive composition of the present invention preferably contains an oxime compound (D1) as the polymerization initiator (D).

[0199] Specific examples of the oxime compound (D1) are shown below as (D1-1) to (D1-16), although the present invention is not limited thereto.

[0200] [ka]

[0201] [ka]

[0202] [ka]

[0203] Among the oxime compounds (D1), from the viewpoints of pattern forming ability and electrical properties, the compound having an absorption coefficient of 5.0×10 at 365 nm in propylene glycol monomethyl ether acetate is 3 ~4.0×10 4 L / mol·cm compounds are preferred. In addition, the absorption coefficient of light at a wavelength of 365 nm in propylene glycol monomethyl ether acetate is 5.0 × 10 3 ~4.0×10 4 Among the compounds having a molecular weight of L / mol·cm, the above compounds (D1-1) to (D1-6) are more preferable, and compound (D1-1) is particularly preferable.

[0204] The oxime compound (D1) can be used alone or in combination of two or more kinds.

[0205] The content of the oxime compound (D1) is preferably from 40 to 100 mass%, and more preferably from 50 to 90 mass%, in 100 mass% of the polymerization initiator (D).

[0206] (Other compounds (D2)) From the viewpoint of pattern formability, the polymerization initiator (D) is preferably used in combination with the oxime compound (D1) and a compound other than the oxime compound (D1) (hereinafter also simply referred to as other compound (D2)).

[0207] The other compound (D2) is not particularly limited, and known compounds can be used, such as the above-mentioned α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds. Among these, from the viewpoint of electrical properties, the other compound (D2) is preferably a compound having a morpholinyl group.

[0208] Specific examples of the compound having a morpholinyl group are shown below as (D2-1) to (D2-4), however, the present invention is not limited thereto.

[0209] [ka]

[0210] Among the above compounds, from the viewpoint of electrical properties, (D2-2) and (D2-3) are preferred, and (D2-2) is more preferred.

[0211] The other compounds (D2) can be used alone or in combination of two or more.

[0212] The content of the other compound (D2) is preferably from 10 to 50 mass % in 100 mass % of the polymerization initiator (D).

[0213] The mass ratio of the oxime compound (D1) to the other compound (D2) is preferably 50:50 to 90:10.

[0214] [Thermosetting compound (E)] From the viewpoint of electrical properties, the photosensitive composition of the present invention preferably contains a thermosetting compound (E), which is presumably crosslinked by heating to improve electrical properties. In this specification, the thermosetting compound (E) is not included in the alkali-soluble resin (B) and the polymerizable compound (C).

[0215] The thermosetting compound (E) is not particularly limited, and known compounds can be used, such as compounds having an epoxy group, compounds having a blocked isocyanate group, compounds having an oxetanyl group, compounds having a methylol group, compounds having a phenol group, and compounds having an alkoxyalkyl group. Among these, it is preferable to contain a compound (E1) having an epoxy group from the viewpoint of electrical properties.

[0216] The thermosetting compound (E) can be used alone or in combination of two or more kinds.

[0217] The content of the thermosetting compound (E) is preferably from 0.5 to 40 mass %, and more preferably from 1 to 30 mass %, based on 100 mass % of the nonvolatile content of the photosensitive composition.

[0218] (Compound (E1) having an epoxy group) The epoxy group is a group having a three-membered cyclic ether structure, including an alicyclic epoxy group. The compound (E1) having an epoxy group is not particularly limited, and known compounds can be used. For example, polyglycidyl ether compounds of bisphenols such as bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, and hydrogenated bisphenol F diglycidyl ether; Polyglycidyl ether compounds of polyhydric alcohols, such as 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin triglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diglycidyl ether, and polypropylene glycol diglycidyl ether; Polyglycidyl ether compounds of polyether polyols obtained by adding alkylene oxides to polyhydric alcohols such as ethylene glycol, propylene glycol, and glycerin; 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-1-methylcyclohexyl-3,4-epoxy-1-methylhexanecarboxylate, 6-methyl-3,4-epoxycyclohexylmethyl-6-methyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-3-methylcyclohexylmethyl-3,4-epoxy-3-methylcyclohexanecarboxylate, 3,4-epoxy-5-methylcyclohexylmethyl-3,4-epoxy-5-methylcyclohexanecarboxylate, 2-(3,4-epoxycyclohexyl compounds having two or more 3,4-epoxycyclohexyl groups in the molecule, such as bis(3,4-epoxycyclohexylmethyl)-5,5-spiro-3,4-epoxy)cyclohexane-metadioxane, bis(3,4-epoxycyclohexylmethyl)adipate, 3,4-epoxy-6-methylcyclohexylcarboxylate, methylene bis(3,4-epoxycyclohexane), ethylene bis(3,4-epoxycyclohexanecarboxylate), dioctyl epoxyhexahydrophthalate, 1-epoxyethyl-3,4-epoxycyclohexane, butanetetracarboxylate tetra(3,4-epoxycyclohexylmethyl) modified ε-caprolactone; Examples include an adduct of 2,2-bis(hydroxymethyl)-1-butanol with 1,2-epoxy-4-(2-oxiranyl)cyclohexane.

[0219] Commercially available products of the compound (E1) having an epoxy group include, for example, Epicoat 807, 815, 825, 827, 828, 190P, and 191P manufactured by Yuka Shell Epoxy Co., Ltd., TECHMORE manufactured by Mitsui Chemicals, Inc. VG3101L, EPPN-201, 501H, 502H, EOCN-102S, 103S, 104S, 1020 manufactured by Nippon Kayaku Co., Ltd., Epicoat 1004, 1256, JER1032H60, 157S65, 157S70, 152, 154 manufactured by Japan Epoxy Resins Co., Ltd., Celloxide 2021, EHPE-3150, Epolead GT401 manufactured by Daicel Chemical Industries, Denacol EX-211, 212, 252, 313, 314, 321, 411, 421, 512, 521, 611, 612, 614, 614B, 622, 711, 721 manufactured by Nagase ChemteX Corporation, TEPIC-L, H, S manufactured by Nissan Chemical Industries, and EPICLON manufactured by DIC Corporation Examples include 830, 840, 850, 860, 1050, 3050, 4050, N-660, N-670, N-740, N-770, N865, HP-7200, HP-4700, HP-4770, HP-5000, HP-6000, and HP-9500.

[0220] The compound (E1) having an epoxy group is preferably a compound having 2 to 50 epoxy groups in the molecule.

[0221] The epoxy equivalent of the compound (E1) having an epoxy group is preferably 50 to 400 g / eq, more preferably 100 to 200 g / eq. The epoxy equivalent is defined as the mass of an epoxy compound containing one equivalent of an epoxy group.

[0222] From the viewpoint of electrical properties, the compound (E1) having an epoxy group preferably contains a compound represented by the following general formula (5).

[0223] General formula (5) [ka]

[0224] In formula (5), R represents a group obtained by removing m hydroxyl groups from an m-hydric alcohol, m represents an integer of 1 to 6, and n represents an integer of 1 to 30.

[0225] R represents a group obtained by removing m hydroxyl groups from an m-hydric alcohol. The group obtained by removing m hydroxyl groups from the m-hydric alcohol is preferably an alkyl group having 2 to 20 carbon atoms, which may be linear, branched, cyclic, or a combination of these. Examples of the alkyl group having 2 to 20 carbon atoms include an ethyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, a 2,2-dimethylpropyl group, a butyl group, an isobutyl group, a tert-butyl group, a 3,3-dimethylbutyl group, a pentyl group, an isopentyl group, a hexyl group, a heptyl group, an octyl group, an isooctyl group, a 2-ethylhexyl group, a nonyl group, an isononyl group, a decyl group, an isodecyl group, an undecyl group, a dodecyl group, a hexadecyl group, a cyclopentyl group, a cyclopentylmethyl group, a cyclohexyl group, and a cyclohexylmethyl group. Among these, a branched alkyl group having 3 to 12 carbon atoms is more preferable.

[0226] m represents an integer of 1 to 6, and n represents an integer of 1 to 30. When m is 2 or more, n in each group in parentheses in general formula (5) may be the same or different.

[0227] A specific example of the compound represented by the general formula (5) is a 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol. Commercially available products include EHPE-3150 and EHPE-3150CE manufactured by Daicel Corporation.

[0228] The compound (E1) having an epoxy group can be used alone or in combination of two or more kinds.

[0229] The content of the compound (E1) having an epoxy group is preferably from 0.5 to 40 mass %, and more preferably from 1 to 30 mass %, based on 100 mass % of the nonvolatile content of the photosensitive composition.

[0230] (Compound (E2) Having a Blocked Isocyanate Group)

[0231] The compound (E2) having a blocked isocyanate group is a compound in which the isocyanate group of a compound having an isocyanate group is protected with a blocking agent. The desorption temperature of the blocking agent of the blocked isocyanate group is preferably 60 to 160°C, more preferably 70 to 130°C, and particularly preferably 80 to 100°C.

[0232] The compound (E2) having a blocked isocyanate group can be obtained by reacting a compound having an isocyanate group with a blocking agent by a known method, for example, as described in JP-A-52-116420, JP-A-60-149572, JP-A-7-31953, JP-A-10-306136, JP-A-2012-012567, etc.

[0233] Examples of the blocking agent include the above-mentioned compounds. Among these, at least one selected from the group consisting of oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, pyrazole compounds, mercaptan compounds, imidazole compounds, and imide compounds is preferred, and at least one selected from the group consisting of oxime compounds, phenol compounds, active methylene compounds, and pyrazole compounds is more preferred.

[0234] Examples of the compound having an isocyanate group include compounds having an aliphatic structure, such as butane-1,4-diisocyanate, hexamethylene diisocyanate, isopropylene diisocyanate, methylene diisocyanate, and 2,2,4-trimethylhexamethylene diisocyanate; Compounds having an alicyclic structure, such as cyclohexane-1,4-diisocyanate, isophorone diisocyanate, dimethylcyclohexyl diisocyanate, methylcyclohexyl diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, 1,3-bis(isocyanatemethyl)cyclohexane, methylcyclohexane diisocyanate, norbornane diisocyanate, and bis(isocyanatemethyl)cyclohexane; Examples of the aromatic compounds include 1,5-naphthylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 4,4'-diphenyldimethylmethane diisocyanate, 4,4'-dibenzyl isocyanate, dialkyl diphenylmethane diisocyanate, tetraalkyl diphenylmethane diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, xylylene diisocyanate, m-tetramethyl xylylene diisocyanate, 4,4-diphenylmethane diisocyanate, tolylene diisocyanate, bischloromethyl diphenylmethane diisocyanate, 2,6-diisocyanate-benzyl chloride, and bis(isocyanate methyl)benzene. Further examples include biuret forms, isocyanurate forms, adduct forms, allophanate forms, and reaction products of these compounds with polyols.

[0235] The compound having an isocyanate group is preferably a biuret, isocyanurate, adduct or allophanate of a compound having an aliphatic structure or a compound having an alicyclic structure.

[0236] The compound (E2) having a blocked isocyanate group preferably has 1 to 20 blocked isocyanate groups, and more preferably has 2 to 15 blocked isocyanate groups.

[0237] The weight average molecular weight of the compound (E2) having a blocked isocyanate group is preferably from 300 to 5,000, and more preferably from 500 to 3,000.

[0238] The acid value of the compound (E2) having a blocked isocyanate group is preferably 10 mgKOH / g or less.

[0239] The compound (E2) having a blocked isocyanate group can be used alone or in combination of two or more kinds.

[0240] The content of the compound (E2) having a blocked isocyanate group is preferably from 0.5 to 40 mass %, and more preferably from 1 to 30 mass %, in 100 mass % of the nonvolatile content of the photosensitive composition.

[0241] [Pigment derivatives (F)] The photosensitive composition of the present invention may contain a pigment derivative (F), which allows the pigment to be stably dispersed when used as the coloring material (A).

[0242] The pigment derivative (F) is not particularly limited, and known compounds can be used. For example, compounds having a structure in which a part of the pigment is substituted with an acidic group, a basic group, a neutral group, etc. can be mentioned. Specifically, compounds having acidic substituents such as sulfo groups, carboxy groups, and phosphoric acid groups, and amine salts thereof, compounds having basic substituents such as sulfonamide groups or tertiary amino groups at the terminals, and compounds having neutral substituents such as phenyl groups and phthalimidoalkyl groups can be mentioned. Examples of pigments include diketopyrrolopyrrole compounds, phthalocyanine compounds, anthraquinone compounds, quinacridone compounds, dioxazine compounds, perinone compounds, perylene compounds, thiazine indigo compounds, triazine compounds, benzimidazolone compounds, benzoisoindole compounds, isoindoline compounds, isoindolinone compounds, quinophthalone compounds, naphthol compounds, squarylium compounds, threne compounds, and naphthalocyanine compounds.

[0243] Specifically, pyrrolopyrrole pigment derivatives are described in JP 2001-220520 A, WO 2009 / 081930 A, WO 2011 / 052617 A, WO 2012 / 102399 A, JP 2017-156397 A, and WO 2018 / 101189 A, phthalocyanine pigment derivatives are described in JP 2007-226161 A, WO 2016 / 163351 A, JP 2017-165820 A, and Japanese Patent No. 5753266 A, and anthraquinone pigment derivatives are described in JP 63-2 64674, JP09-272812A, JP10-245501A, JP10-265697A, JP2007-079094A, WO 2009 / 025325A; quinacridone pigment derivatives include JP48-54128A, JP03-9961A, and JP2000-273383A; dioxazine pigment derivatives include JP2011-162662A; thiazine indigo pigment derivatives include JP2007-314785A; triazine pigment derivatives include Examples of benzoisoindole pigment derivatives include JP-A-2009-57478, JP-A-2003-167112, JP-A-2006-291194, JP-A-2008-31281, and JP-A-2012-226110. Examples of naphthol pigment derivatives include Examples of squarylium pigment derivatives include those described in JP 2012-208329 A and JP 2014-5439 A; examples of azo pigment derivatives include those described in JP 2001-172520 A and JP 2012-172092 A; examples of acidic substituents include those described in JP 2004-307854 A; and examples of basic substituents include those described in JP 2002-201377 A, JP 2003-171594 A, JP 2005-181383 A, JP 2005-213404 A, and the like.In these documents, the term "derivative," "dye derivative," "dispersant," "dispersing aid," "pigment dispersant," or simply "compound" is sometimes used, but these terms are synonymous with the pigment derivative (F).

[0244] The pigment derivative (F) is preferably added during the micronization of the colorant (A) or during the dispersion treatment of the colorant (A). The average primary particle size of the pigment derivative (F) is preferably 5 to 200 nm.

[0245] The pigment derivative (F) can be used alone or in combination of two or more kinds.

[0246] The content of the pigment derivative (F) is preferably from 1 to 50 parts by mass, and more preferably from 2 to 40 parts by mass, based on 100 parts by mass of the colorant (A).

[0247] [Dispersion resin (G)] The photosensitive composition of the present invention may contain a dispersing resin (G), which allows the pigment to be stably dispersed when used as the coloring material (A). In this specification, the dispersing resin (G) is not included in the alkali-soluble resin (B).

[0248] The dispersing resin (G) is preferably a resin having an adsorptive group having a high affinity for the colorant (A). The adsorptive group preferably has at least one type of basic group and acidic group.

[0249] Examples of the basic group include a primary amino group, a secondary amino group, a tertiary amino group, a quaternary ammonium base, and a group containing a nitrogen atom such as a nitrogen-containing heterocycle.

[0250] Examples of the acidic group include a carboxyl group, a phosphoric acid group, and a sulfonic acid group.

[0251] Examples of the resin type of the dispersion resin (G) include urethane resins, polycarboxylates such as polyacrylates, unsaturated polyamides, polycarboxylic acids, polycarboxylate (partial) amine salts, polycarboxylate ammonium salts, polycarboxylate alkylamine salts, polysiloxanes, long-chain polyaminoamide phosphates, hydroxyl group-containing polycarboxylates, and modified products thereof, amides and salts thereof formed by the reaction of poly(lower alkylene imines) with polyesters having free carboxyl groups, water-soluble resins and water-soluble polymer compounds such as (meth)acrylic acid-styrene copolymers, (meth)acrylic acid-(meth)acrylic acid ester copolymers, styrene-maleic acid copolymers, polyvinyl alcohols, and polyvinylpyrrolidone, polyesters, modified polyacrylates, ethylene oxide / propylene oxide adducts, and phosphates.

[0252] Examples of the structure of the dispersing resin (G) include a random structure, a block structure, a graft structure, a comb structure, and a star structure. Among these, from the viewpoint of dispersion stability, the block structure, the graft structure, and the comb structure are preferred.

[0253] Commercially available dispersion resins (G) include, for example, Disperbyk-101, 103, 107, 108, 110, 111, 116, 130, 140, 154, 161, 162, 163, 164, 165, 166, 167, 168, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2009, 2010, 2020, 2025, 2050, 207, manufactured by BYK Japan Co., Ltd. 0,2095,2150,2155,2163,2164, Anti-Terra-U203,204, BYK-P104,P104S,220S, Lactimon, Lactimon-WS, SOLSPERSE-3000,9000,13000,13240,13650,13940,16000,17000,18000,20000,21000,24000,26000,27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 56000, 76500, etc. EFKA-46, 47, 48, 452, 4008, 4009, 4010, 4015, 4020, 4047, 4050, 4055, 4060, 4080, 4400, 4401, 4402, 4403, 4406, 4408, 4300, 4310, 4320, 4330, 4340, 450, 451, 453, 4540, 4550, 4560, 4800, 5010, 5065, 5066, 5070, 7500, 7554, 1101, 120, 150, 1501, 1502, 1503, etc., and Aji Super PA111, PB711, PB821, PB822, PB824, etc. manufactured by Ajinomoto Fine-Techno Co., Ltd. Further, the resins described in JP 2008-029901 A, JP 2009-155406 A, JP 2010-185934 A, JP 2011-157416 A, and paragraphs 0122 to 0155 of WO 2013175978 A, the resins described in paragraphs 0317 to 0321 of JP 2019-78878 A, and paragraph 00 of WO 2018 / 139534 A are also usable. 83, the resins described in paragraphs 0167 to 0191 of WO 2019 / 163505, the resins described in paragraphs 0299 ​​to 0310 of WO 2021 / 131927, the resins described in paragraphs 0080 to 0085 of WO 2022 / 102367, and the resins described in paragraphs 0099 to 0109 of WO 2022 / 172607.

[0254] The dispersing resin (G) can be used alone or in combination of two or more kinds.

[0255] The content of the dispersing resin (G) is preferably from 3 to 200 parts by mass, and more preferably from 5 to 100 parts by mass, based on 100 parts by mass of the coloring material (A).

[0256] [Sensitizer (H)] The photosensitive composition of the present invention may contain a sensitizer (H).

[0257] The sensitizer (H) is not particularly limited, and known compounds can be used. For example, polymethine dyes such as chalcone compounds, unsaturated ketones such as dibenzalacetone, 1,2-diketone compounds such as benzil and camphorquinone, benzoin compounds, fluorene compounds, naphthoquinone compounds, anthraquinone compounds, xanthene compounds, thioxanthene compounds, xanthone compounds, thioxanthone compounds, coumarin compounds, ketocoumarin compounds, cyanine compounds, merocyanine compounds, and oxonol compounds, acridine compounds, azine compounds, thiazine compounds, oxazine compounds, indoline compounds, azulene compounds, azulenium compounds, sucrose compounds, and the like. Examples of suitable compounds include allylium compounds, porphyrin compounds, tetraphenylporphyrin compounds, triarylmethane compounds, tetrabenzoporphyrin compounds, tetrapyrazinoporphyrazine compounds, phthalocyanine compounds, tetraazaporphyrazine compounds, tetraquinoxaliroporphyrazine compounds, naphthalocyanine compounds, subphthalocyanine compounds, pyrylium compounds, thiopyrylium compounds, tetraphylline compounds, annulene compounds, spiropyran compounds, spirooxazine compounds, thiospiropyran compounds, metal arene complexes, organic ruthenium complexes, and benzophenone compounds. Among these, thioxanthone compounds and benzophenone compounds are preferred from the viewpoint of pattern forming properties.

[0258] (Thioxanthone compounds) Examples of thioxanthone compounds include 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dichlorothioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 1-chloro-4-propoxythioxanthone, etc. Among these, 2,4-diethylthioxanthone is preferred.

[0259] (Benzophenone compounds) Examples of the benzophenone compounds include 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 2-aminobenzophenone, etc. Among these, 4,4'-bis(diethylamino)benzophenone is preferred.

[0260] The sensitizer (H) can be used alone or in combination of two or more kinds.

[0261] The content of the sensitizer (H) is preferably from 5 to 200 parts by mass, and more preferably from 10 to 150 parts by mass, based on 100 parts by mass of the polymerization initiator (D).

[0262] [Hardening agent (curing accelerator)] The photosensitive composition of the present invention can be used in combination with a curing agent (curing accelerator) to aid in the curing of the thermosetting compound (E). Examples of the curing agent include amine compounds, acid anhydrides, active esters, carboxylic acid compounds, and sulfonic acid compounds. Examples of the curing agent include amine compounds (e.g., dicyandiamide, benzyldimethylamine, 4-(dimethylamino)-N,N-dimethylbenzylamine, 4-methoxy-N,N-dimethylbenzylamine, 4-methyl-N,N-dimethylbenzylamine, etc.), quaternary ammonium salt compounds (e.g., triethylbenzylammonium chloride, etc.), blocked isocyanate compounds (e.g., dimethylamine, etc.), imidazole derivatives, bicyclic amidine compounds and their salts (e.g., imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-(2-cyanoethyl)-2-ethyl-4-methylimidazole, etc.), phosphorus compounds (e.g., triphenylphosphine, etc.), S-triazine derivatives (e.g., 2,4-diamino-6-methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino-S-triazine, 2-vinyl-4,6-diamino-S-triazine·isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-S-triazine·isocyanuric acid adduct, etc.).

[0263] The curing agents can be used alone or in combination of two or more kinds.

[0264] The content of the curing agent is preferably 0.01 to 15 parts by mass based on 100 parts by mass of the thermosetting compound (E).

[0265] [Thiol-based chain transfer agents (I)] The photosensitive composition of the present invention may contain a thiol-based chain transfer agent (I). When the thiol-based chain transfer agent (I) is used in combination with a polymerization initiator (D), it generates a thiyl radical that is not easily inhibited by oxygen during radical polymerization after irradiation with light, thereby improving the photosensitivity of the photosensitive composition.

[0266] The thiol chain transfer agent (I) is not particularly limited, and known compounds can be used. For example, monofunctional thiol compounds such as thiophenol, 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercapto-5-methoxybenzothiazole, 2-mercapto-5-benzimidazole, butanethiol, octanethiol, 1-dodecanethiol, methyl 3-mercaptopropionate, ethyl 3-mercaptopropionate, octyl 3-mercaptopropionate, and 2-ethylhexyl 3-mercaptopropionate; Monofunctional thiol compounds having a hydroxyl group or an acidic group, such as 2-mercaptoethanol, 1-thioglycerol, thioglycolic acid, 2-mercaptobenzoic acid, 3-mercaptobenzoic acid, 4-mercaptonicotinic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 4-mercaptobutanoic acid, octyl thioglycolate, mercaptosuccinic acid, 11-mercaptoundecanoic acid, and 2-mercaptoethanesulfonic acid; Examples of polyfunctional thiol compounds include hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglycolate, ethylene glycol bisthioglycolate, ethylene glycol bisthiopropionate, trimethylolpropane tristhioglycolate, trimethylolpropane tristhiopropionate, trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis thioglycolate, pentaerythritol tetrakis(3-mercaptopropionate), trimercaptopropionic acid tris(2-hydroxyethyl)isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercapto-s-triazine, and 2-(N,N-dibutylamino)-4,6-dimercapto-s-triazine.

[0267] The thiol chain transfer agent (I) can be used alone or in combination of two or more kinds.

[0268] The content of the thiol chain transfer agent (I) is preferably from 1 to 10% by mass based on 100% by mass of the nonvolatile content of the photosensitive composition.

[0269] [Silane coupling agents (J)] The photosensitive composition of the present invention may contain a silane coupling agent (J).

[0270] The silane coupling agent (J) is a compound having a hydrolyzable group and other functional groups. The hydrolyzable group is a group that is directly bonded to a silicon atom and generates a siloxane bond by at least one of hydrolysis and condensation reactions. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group. Among these, an alkoxy group is preferred. From the viewpoint of reactivity, the alkoxy group is preferably a methoxy group or an ethoxy group. Examples of the other functional groups include an epoxy group, an amino group, a vinyl group, a (meth)acryloyl group, an isocyanate group, an isocyanurate group, a mercapto group, an oxetanyl group, a styryl group, and a ureido group. In this specification, the silane coupling agent (J) is not included in the polymerizable compound (C).

[0271] The silane coupling agent (J) is not particularly limited, and known compounds can be used. For example, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, N-2-(aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, N-(vinylbenzyl)-2-aminoethyl-3-aminopropyltrimethoxysilane hydrochloride, vinyl Examples of the silyl trimethoxysilane include vinyl triethoxysilane, 3-methacryloxypropyl methyl dimethoxysilane, 3-methacryloxypropyl trimethoxysilane, 3-methacryloxypropyl methyl diethoxysilane, 3-methacryloxypropyl triethoxysilane, 3-acryloxypropyl trimethoxysilane, 3-isocyanate propyl triethoxysilane, tris-(trimethoxysilylpropyl) isocyanurate, 3-mercaptopropyl methyl dimethoxysilane, 3-mercaptopropyl trimethoxysilane, p-styryl trimethoxysilane, and 3-ureidopropyl trialkoxysilane.

[0272] Commercially available silane coupling agents (J) include, for example, KBM-302, KBM-402, KBM-403, KBE-402, KBE-403, KBM-4803, KBM-602, KBM-603, KBM-903, KBE-9103P, KBM-573, KBM-6803, KBM-1003, and KBE -1003, KBM-502, KBM-503, KBE-502, KBE-503, KBM-5803, X-12-1048, X-12-1050, KBE-9007N, KBM-9659, KBM-802, KBM-803, KBM-1043, KBE-585A, X-12-1048, X-12-50, etc.

[0273] The silane coupling agent (J) may be a polymer type, such as a polysiloxane type or an organic polymer type.

[0274] The polysiloxane type is a compound in which the hydrolyzable group and the other functional groups are bonded to a polymer having a polysiloxane skeleton in the main chain. Commercially available polysiloxane type products include KR-513, KR-516, KR-517, X-41-1805, and X-41-1810 manufactured by Shin-Etsu Chemical Co., Ltd.

[0275] The organic polymer type is a silane coupling agent (J) in which the hydrolyzable group and the other functional groups are bonded to an organic polymer whose main chain is an organic structure. Commercially available organic polymer type products include X-12-9815, X-12-9845, X-12-1154, X-12-972F, and X-12-1159L manufactured by Shin-Etsu Chemical Co., Ltd.

[0276] The silane coupling agent (J) can be used alone or in combination of two or more kinds.

[0277] The content of the silane coupling agent (J) is preferably from 0.1 to 10 mass % in 100 mass % of the nonvolatile content of the photosensitive composition.

[0278] [Polymerization inhibitor (K)] The photosensitive composition of the present invention may contain a polymerization inhibitor (K).

[0279] The polymerization inhibitor (K) is not particularly limited, and known compounds can be used. For example, alkyl catechol compounds such as catechol, resorcinol, 1,4-hydroquinone, 2-methyl catechol, 3-methyl catechol, 4-methyl catechol, 2-ethyl catechol, 3-ethyl catechol, 4-ethyl catechol, 2-propyl catechol, 3-propyl catechol, 4-propyl catechol, 2-n-butyl catechol, 3-n-butyl catechol, 4-n-butyl catechol, 2-tert-butyl catechol, 3-tert-butyl catechol, 4-tert-butyl catechol, and 3,5-di-tert-butyl catechol; 2-methyl resorcinol, 4-methyl resorcinol, 2-ethyl resorcinol, 4-ethyl resorcinol, 2-propyl resorcinol, 4-propyl resorcinol, and 2-n-butyl resorcinol; alkylresorcinol compounds such as resorcinol, 4-n-butylresorcinol, 2-tert-butylresorcinol, and 4-tert-butylresorcinol; alkylhydroquinone compounds such as methylhydroquinone, ethylhydroquinone, propylhydroquinone, tert-butylhydroquinone, and 2,5-di-tert-butylhydroquinone; phosphine compounds such as tributylphosphine, trioctylphosphine, tricyclohexylphosphine, triphenylphosphine, and tribenzylphosphine; phosphine oxide compounds such as trioctylphosphine oxide and triphenylphosphine oxide; phosphite compounds such as triphenylphosphite and trisnonylphenylphosphite; pyrogallol; and phloroglucinol.

[0280] The polymerization inhibitor (K) can be used alone or in combination of two or more kinds.

[0281] The content of the polymerization inhibitor (K) is preferably from 0.01 to 0.4% by mass in 100% by mass of the nonvolatile content of the photosensitive composition.

[0282] [Ultraviolet absorber (L)] The photosensitive composition of the present invention may contain an ultraviolet absorber (L).

[0283] The ultraviolet absorber (L) is not particularly limited, and known compounds can be used, such as benzotriazole-based organic compounds, triazine-based organic compounds, benzophenone-based organic compounds, salicylic acid ester-based organic compounds, cyanoacrylate-based organic compounds, and salicylate-based organic compounds.

[0284] Benzotriazole compounds include, for example, 2-(5-methyl-2-hydroxyphenyl)benzotriazole, 2-(2-hydroxy-5-tert-butylphenyl)-2H-benzotriazole, 2-[2-hydroxy-3,5-bis(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole, 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-5'-t-octylphenyl)benzotriazole, 5 % 2-methoxy-1-methylethyl acetate and 95% benzenepropanoic acid, 3-(2H-benzotriazol-2-yl)-(1,1-dimethylethyl)-4-hydroxy, C7-9 side and linear alkyl esters, 2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol, 2-(2H-benzotriazol-2-yl)-6-(1-methyl-1-phenylethyl)-4-(1,1,3,3-tetramethylbutyl)phenol, methyl 3-(3-(2H-benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl)propionate / polyethylene glycol 300 reaction products, 2-(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol, 2,2'-methylenebis[6-(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol], 2-(2H-benzotriazol-2-yl)-p-cresol, 2-(5-chloro-2H-benzotriazol-2-yl)-6-tert- Butyl-4-methylphenol, 2-(3,5-di-tert-amyl-2-hydroxyphenyl)benzotriazole, 2-[2-hydroxy-5-[2-(methacryloyloxy)ethyl]phenyl]-2H-benzotriazole, octyl-3-[3-tert-butyl-4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl]propionate, and 2-ethylhexyl-3-[3-tert-butyl-4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl]propionate.

[0285] Examples of commercially available products include TINUVIN P, PS, 234, 326, 329, 384-2, 900, 928, 99-2, and 1130 manufactured by BASF Japan Ltd., ADK STAB LA-29, LA-31RG, LA-32, and LA-36 manufactured by ADEKA CORPORATION, KEMISORB71, 73, 74, 79, and 279 manufactured by Chemipro Chemical Co., Ltd., and RUVA-93 manufactured by Otsuka Chemical Co., Ltd.

[0286] Examples of triazine compounds include 2,4-bis(2,4-dimethylphenyl)-6-(2-hydroxy-4-n-octyloxyphenyl)-1,3,5-triazine, 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine-2-yl]-5-[3-(dodecyloxy)-2-hydroxypropoxy]phenol, and the reaction product of 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine with (2-ethylhexyl)-glycidic acid ester. Examples of the compound include 2,4-bis[2-hydroxy-4-butoxyphenyl]-6-(2,4-dibutoxyphenyl)-1,3,5-triazine, 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-(hexyloxy)phenol, 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-[2-(2-ethylhexanoyloxy)ethoxy]phenol, and 2,4,6-tris(2-hydroxy-4-hexyloxy-3-methylphenyl)-1,3,5-triazine.

[0287] Examples of commercially available products include KEMISORB102 manufactured by Chemipro Chemicals, TINUVIN 400, 405, 460, 477, 479, and 1577ED manufactured by BASF Japan, Adeka STAB LA-46 and LA-F70 manufactured by ADEKA, and CYASORB UV-1164 manufactured by Sun Chemical.

[0288] Examples of benzophenone compounds include 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-methoxybenzophenone 5-sulfonic acid-3-water, 2-hydroxy-4-n-octoxybenzophenone, 2,2'-dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 4-dodecyloxy-2-hydroxybenzophenone, 2-hydroxy-4-octadecyloxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2,2',4,4'-tetrahydroxybenzophenone, and 2-hydroxy-4-methoxy-2'-carboxybenzophenone.

[0289] Examples of commercially available products include KEMISORB10, 11, 11S, 12, and 111 manufactured by Chemipro Chemicals, SEESORB 101 and 107 manufactured by Shipro Chemicals, Adeka STAB 1413 manufactured by ADEKA, and UV-12 manufactured by Sun Chemical.

[0290] Examples of the salicylate ester compounds include phenyl salicylate, p-octylphenyl salicylate, and p-tert-butylphenyl salicylate.

[0291] The content of the ultraviolet absorber (L) is preferably from 0.1 to 5% by mass in 100% by mass of the nonvolatile content of the photosensitive composition.

[0292] [Antioxidants (M)] The photosensitive composition of the present invention can contain an antioxidant (M).

[0293] The antioxidant (M) is not particularly limited, and known compounds can be used. For example, hindered phenol-based, hindered amine-based, phosphorus-based, sulfur-based, and hydroxylamine-based compounds can be mentioned. Among these, hindered phenol-based antioxidants, hindered amine-based antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants are preferred.

[0294] Examples of the hindered phenol antioxidant include 1,3,5-tris(3,5-di-tert-butyl-4-hydroxybenzyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, 1,1,3-tris-(2'-methyl-4'-hydroxy-5'-tert-butylphenyl)-butane, 4,4'-butylidene-bis-(2-tert-butyl-5-methylphenol), 3-(3,5-di-tert-butyl-4-hydroxyphenyl)stearyl propionate, pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, 3,9-bis[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy]-1,1-dimethylethyl]-2,4,8,10-tetraoxaspiro[5.5]Undecane, 1,3,5-tris(3,5-di-tert-butyl-4-hydroxyphenylmethyl)-2,4,6-trimethylbenzene, 1,3,5-tris(3-hydroxy-4-tert-butyl-2,6-dimethylbenzyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, 2,2'-methylenebis(6-tert-butyl-4-ethylphenol), 2,2'-thiodiethylbis-(3,5-di- tert-Butyl-4-hydroxyphenyl)-propionate, N,N-hexamethylenebis(3,5-di-tert-butyl-4-hydroxy-hydrocinnamamide), iso-octyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, 4,6-bis(dodecylthiomethyl)-o-cresol, calcium ester of 3,5-di-tert-butyl-4-hydroxybenzylphosphonic acid monoethyl ester salt, 4,6-bis(octylthiomethyl)-o-cresol, bis[3-(3-methyl-4-hydroxy-5-tert-butylphenyl)propionic acid]ethylenebisoxybisethylene, 1,6-hexanediol bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, 2,4-bis-(n-octylthio)-6-(4-hydroxy-3,5-di-tert-butylanilino)-1,3,5-trimethylanilino Azine, 2,2'-thio-bis-(6-tert-butyl-4-methylphenol), 2,5-di-t-amyl-hydroquinone, 2,6-di-tert-butyl-4-nonylphenol, 2,2'-isobutylidene-bis-(4,6-dimethyl-phenol), 2,2'-methylene-bis-(6-(1-methyl-cyclohexyl)-p-cresol), 2,4-dimethyl-6-(1-methyl-cyclohexyl)-phenol, etc.

[0295] Examples of commercially available products include ADK STAB AO-20, AO-30, AO-40, AO-50, AO-60, AO-80, and AO-330 manufactured by ADEKA CORPORATION, KEMINOX 101, 179, 76, and 9425 manufactured by Chemipro Corporation, IRGANOX 1010, 1035, 1076, 1098, 1135, 1330, 1726, 1425WL, 1520L, 245, 259, 3114, 5057, and 565 manufactured by BASF Japan Ltd., and Cyanox CY-1790 and CY-2777 manufactured by Sun Chemical Company.

[0296] Examples of the hindered amine antioxidant include tetrakis(1,2,2,6,6-pentamethyl-4-piperidyl)-1,2,3,4-butane tetracarboxylate, tetrakis(2,2,6,6-tetramethyl-4-piperidyl)1,2,3,4-butane tetracarboxylate, bis(1,2,2,6,6-pentamethyl-4-piperidyl)sebacate, bis(2,2,6,6-tetramethyl-4-piperidyl)sebacate, bis(1-undecanoxy-2,2,6,6-tetramethylpiperidin-4-yl)carbonate, and 1,2,2,6,6-pentamethyl-4-piperidyl tetramethyl-4-piperidyl methacrylate, 2,2,6,6-tetramethyl-4-piperidyl methacrylate, polycondensation product of dimethyl succinate and 1-(2-hydroxyethyl)-4-hydroxy-2,2,6,6-tetramethylpiperidine, poly[[6-[(1,1,3,3-tetramethylbutyl)amino]-s-triazine-2,4-diyl]-[(2,2,6,6-tetramethyl-4-piperidyl)imino]-hexamethylene-[(2,2,6,6-tetramethyl-4-piperidyl)imino]], 4-hydroxy-2,2,6,6-tetramethyl-1- Ester of piperidineethanol with 3,5,5-trimethylhexanoic acid, N,N'-4,7-tetrakis[4,6-bis{N-butyl-N-(1,2,2,6,6-pentamethyl-4-piperidyl)amino}-1,3,5-triazin-2-yl]-4,7-diazadecane-1,10-diamine, decanedioic acid bis(2,2,6,6-tetramethyl-1-(octyloxy)-4-piperidinyl)ester, reaction products of 1,1-dimethylethyl hydroperoxide with octane, bis(1,2,2,6,6-pentamethyl-4-pyridyl)[[3,5-bi 1,2,2,6,6-pentamethyl-4-pyridyl sebacate, poly[[6-morpholino-s-triazine-2,4-diyl]-[(2,2,6,6-tetramethyl-4-piperidyl)imino]-hexamethylene-[(2,2,6,6-tetramethyl-4-piperidyl)imino]], 2,2,6,6-tetramethyl-4-piperidyl-C12-21 and C18 unsaturated fatty acid esters, N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)-1,6-Hexamethylenediamine, 2-methyl-2-(2,2,6,6-tetramethyl-4-piperidyl)amino-N-(2,2,6,6-tetramethyl-4-piperidyl)propionamide, etc.

[0297] Examples of commercially available products include ADK STAB LA-52, LA-57, LA-63P, LA-68, LA-72, LA-77Y, LA-77G, LA-81, LA-82, LA-87, LA-402F, and LA-502XP manufactured by ADEKA CORPORATION, KAMISTAB 29, 62, 77, and 94 manufactured by Chemipro Chemicals Co., Ltd., Tinuvin 111FDL, 123, 144, 249, 292, and 5100 manufactured by BASF Japan Ltd., and Cyasorb UV-3346, UV-3529, and UV-3853 manufactured by Sun Chemical Co., Ltd.

[0298] Examples of phosphorus-based antioxidants include di(2,6-di-tert-butyl-4-methylphenyl)pentaerythritol diphosphite, distearyl pentaerythritol diphosphite, 2,2'-methylenebis(4,6-di-tert-butylphenyl)2-ethylhexyl phosphite, tris(2,4-di-tert-butylphenyl)phosphite, tris(nonylphenyl)phosphite, tetra(C12-C15 alkyl)-4,4'-isopropylidene diphenyl diphosphite, diphenyl mono (2-ethylhexyl)phosphite, diphenyl isodecyl phosphite, tris(isodecyl)phosphite, triphenyl phosphite, tetrakis(2,4-di-tert-butylphenyl)-4,4-biphenyl diphosphonite, tris(tridecyl)phosphite, phenyl isooctyl phosphite, phenyl isodecyl phosphite, phenyl di(tridecyl)phosphite, diphenyl isooctyl phosphite, diphenyl tridecyl phosphite, 4,4'-isopropylidenedipheno tris(diphenyl) phosphite, tris(nonylphenyl) phosphite, tris(dinonylphenyl) phosphite, tris(biphenyl) phosphite, di(2,4-di-tert-butylphenyl) pentaerythritol diphosphite, di(nonylphenyl) pentaerythritol diphosphite, phenyl bisphenol A pentaerythritol diphosphite, tetratridecyl 4,4'-butylidenebis(3-methyl-6-tert-butylphenol) diphosphite, hexatridecyl 1,1,3-tri Examples of such phosphite include bis(2-methyl-4-hydroxy-5-tert-butylphenyl)butane triphosphite, 3,5-di-tert-butyl-4-hydroxybenzyl phosphite diethyl ester, sodium bis(4-tert-butylphenyl)phosphite, sodium-2,2-methylene-bis(4,6-di-tert-butylphenyl)-phosphite, 1,3-bis(diphenoxyphosphonyloxy)-benzene, and ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite.

[0299] Examples of commercially available products include Adeka STAB PEP-36, PEP-8, HP-10, 2112, 1178, 1500, C, 135A, 3010, and TPP manufactured by ADEKA CORPORATION, IRGAFOS168 manufactured by BASF Japan Ltd., and HostanoxP-EPQ manufactured by Clariant Chemicals.

[0300] Examples of sulfur-based antioxidants include 2,2-bis{[3-(dodecylthio)-1-oxopropoxy]methyl}propane-1,3-diylbis[3-(dodecylthio)propionate], ditridecyl 3,3'-thiobispropionate, 2,2-thio-diethylenebis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], 2,4-bis[(octylthio)methyl]-o-cresol, and 2,4-bis[(laurylthio)methyl]-o-cresol.

[0301] Examples of commercially available products include Adeka STAB AO-412S and AO-503 manufactured by ADEKA CORPORATION, and KEMINOXPLS manufactured by Chemipro Chemicals.

[0302] The antioxidants (M) can be used alone or in combination of two or more kinds.

[0303] The content of the antioxidant (M) is preferably from 0.5 to 5.0% by mass based on 100% by mass of the nonvolatile content of the photosensitive composition.

[0304] [Leveling agent (N)] The photosensitive composition of the present invention can contain a leveling agent (N).

[0305] The leveling agent (N) is not particularly limited, and known compounds can be used. For example, silicone-based leveling agents, fluorine-based leveling agents, acrylic-based leveling agents, acetylene diol-based leveling agents, etc. can be mentioned.

[0306] Examples of commercially available silicone leveling agents include BYK-300, 306, 310, 313, 315N, 320, 322, 323, 330, 331, 333, 342, 345, 346, 347, 348, 349, 370, 377, 378, 3455, UV3510, and 3570 manufactured by BYK-Chemie Co., Ltd., and FZ-7002, 2110, 2122, 2123, 2191, and 560 manufactured by Dow Corning Toray Co., Ltd. X-22-4952, X-22-4272, X-22-6266, KF-351A, KF-354L, KF-355A, KF-945, KF-640, KF-642, KF-643, X-22-4515, KF-6004, KP-341 manufactured by Shin-Etsu Chemical Co., Ltd.; and TegoGlide 432, 440, 450, TegoWet 250, 260, 265, 270, 280 manufactured by Evonik.

[0307] Examples of commercially available fluorine-based leveling agents include Surflon S-242, 243, 420, 611, 651, and 386 manufactured by AGC Seimi Chemical Co., Ltd.; Megafac F-253, 477, 551, 552, 555, 558, 560, 570, 575, and 576, R-40-LM, R-41, RS-72-K, and DS-21 manufactured by DIC Corporation; FC-4430 and 4432 manufactured by Sumitomo 3M Limited; EF-PP31N09, EF-PP33G1, and EF-PP32C1 manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.; and Futergent 602A manufactured by Neos Corporation.

[0308] Commercially available acrylic leveling agents include, for example, BYK-350, 352, 354, 355, 358, 380, 381, 392, and 394 manufactured by BYK-Chemie Co., Ltd., and Polyflow 57, 77, and 95 manufactured by Kyoeisha Chemical Co., Ltd.

[0309] Commercially available acetylene diol leveling agents include, for example, Surfynol 420, 440, 465, 485, SE, DF110D, DE85, and Olfine E1004 and 1010 manufactured by Nissin Chemical Industry Co., Ltd.

[0310] The leveling agent (N) can be used alone or in combination of two or more kinds.

[0311] The content of the leveling agent (N) is preferably from 0.001 to 2.0 mass %, and more preferably from 0.005 to 1.0 mass %, based on 100 mass % of the nonvolatile content of the photosensitive composition.

[0312] (Block copolymer (N1)) From the viewpoint of pattern formability, the leveling agent (N) preferably contains a block copolymer (N1) having an A block containing a monomer unit (n1) represented by the following general formula (6), and a B block containing at least one monomer unit selected from the group consisting of a monomer unit (n2) represented by the following general formula (7) and a monomer unit (n3) represented by the following general formula (8).

[0313] General formula (6) [ka]

[0314] In general formula (6), R1's are each independently an alkyl group having 1 to 6 carbon atoms, or a group represented by -OSi(R5)3 (R5's are each independently an alkyl group having 1 to 3 carbon atoms). Each R2 is independently an alkyl group having 1 to 6 carbon atoms. R3 is an alkyl group having 1 to 6 carbon atoms. R4 is a hydrogen atom or a methyl group. L1 is a divalent organic group or a single bond. n is an integer from 1 to 70.

[0315] General formula (7) [ka]

[0316] In the general formula (7), R6 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms. R7 is a hydrogen atom or a methyl group. m is an integer from 1 to 4. o is an integer from 2 to 200.

[0317] General formula (8) [ka]

[0318] In the general formula (8), R8 is an alicyclic hydrocarbon group having 3 to 20 carbon atoms. R9 is a hydrogen atom or a methyl group.

[0319] [Monomer unit (n1) represented by general formula (6)] The monomer represented by the general formula (6) will be described below.

[0320] In general formula (6), R1's are each independently an alkyl group having 1 to 6 carbon atoms, or a group represented by -OSi(R5)3 (R5's are each independently an alkyl group having 1 to 3 carbon atoms). The alkyl group having 1 to 6 carbon atoms may be any of linear, branched, and combinations thereof. Examples include methyl, ethyl, butyl, n-propyl, n-butyl, n-pentyl, n-hexyl, isopropyl, and isobutyl groups. Among these, R1 is preferably a methyl group or a trimethylsiloxy group.

[0321] In general formula (6), R2's each independently represent an alkyl group having 1 to 6 carbon atoms. The alkyl group having 1 to 6 carbon atoms may be any of linear, branched, and combinations thereof. Examples include methyl, ethyl, butyl, n-propyl, n-butyl, n-pentyl, n-hexyl, isopropyl, and isobutyl groups. Among these, R2 is preferably a methyl group.

[0322] In the general formula (6), R3 is an alkyl group having 1 to 6 carbon atoms. The alkyl group having 1 to 6 carbon atoms may be any of linear, branched, and combinations thereof. Examples include methyl, ethyl, butyl, n-propyl, n-butyl, n-pentyl, n-hexyl, isopropyl, and isobutyl groups. Among these, R3 is preferably an alkyl group having 1 to 4 carbon atoms.

[0323] In general formula (6), R4 is a hydrogen atom or a methyl group.

[0324] In the general formula (6), L1 is a divalent organic group or a single bond. Among these, L1 is preferably a divalent organic group, more preferably an alkylene group having 1 to 50 carbon atoms or an alkyleneoxy group having 1 to 50 carbon atoms. The alkylene group having 1 to 50 carbon atoms may be any of linear, branched, and combinations thereof. Examples include methylene, ethylene, n-propyl, n-butylene, n-pentylene, n-hexylene, n-heptylene, n-octylene, isopropylene, 2-methylpropylene, 2-methylhexylene, and tetramethylethylene groups. Among these, methylene, ethylene, n-propylene, and isopropylene groups are preferred. Examples of the alkyleneoxy group having 1 to 50 carbon atoms include a methyleneoxy group, an ethyleneoxy group, a propyleneoxy group, an oxytrimethylene group, a butyleneoxy group, an oxytetramethylene group, a pentyleneoxy group, and a heptyleneoxy group.

[0325] A part of -CH2- in the alkylene group having 1 to 50 carbon atoms or the alkyleneoxy group having 1 to 50 carbon atoms may be substituted with a carbonyl group, a phenylene group, an amide bond or a urethane bond, and further, a hydroxyl group or the like may be substituted on the carbon atom.

[0326] In the general formula (6), n is an integer of 1 to 70. n is preferably an integer of 1 to 50, and more preferably an integer of 1 to 30.

[0327] Examples of the monomer represented by the general formula (6) include 3-(methacryloyloxy)propyltris(trimethylsiloxy)silane, α-(3-methacryloyloxy)propylpolydimethylsiloxane, etc. Commercially available products include Silaplane FM-0711, FM-0721, FM-0725, and FM-0701T manufactured by JNC Corporation, and X-22-174ASX, X-22-174BX, X-22-2426, and X-22-2404 manufactured by Shin-Etsu Chemical Co., Ltd.

[0328] The monomer represented by formula (6) can be used alone or in combination of two or more kinds.

[0329] The A block may contain a monomer unit other than the monomer unit (n1) represented by general formula (6). The other monomer units are formed from monomers copolymerizable with the monomer represented by formula (6).

[0330] The content of the monomer unit (n1) represented by the general formula (6) is preferably from 90 to 100 mass %, and more preferably from 95 to 100 mass %, in 100 mass % of the A block.

[0331] The content of the A block is preferably from 20 to 95 mass %, more preferably from 30 to 85 mass %, in 100 mass % of the block copolymer (N1).

[0332] [Monomer unit (n2) represented by general formula (7)] The monomer represented by the general formula (7) will be described below.

[0333] In the general formula (7), R6 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms. The alkyl group having 1 to 18 carbon atoms may be any of linear, branched, cyclic, and combinations thereof. Examples include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, amyl, isoamyl, pentyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, and octadecyl groups. Among these, R6 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and more preferably a hydrogen atom.

[0334] In general formula (7), R9 is a hydrogen atom or a methyl group.

[0335] In formula (7), m is an integer of 1 to 4. m is preferably 3 or 4.

[0336] In the general formula (7), o is an integer of 2 to 200. o is preferably an integer of 3 to 50.

[0337] Examples of the monomer represented by the general formula (7) include polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, polytrimethylene glycol mono(meth)acrylate, polytetramethylene glycol mono(meth)acrylate, poly(ethylene glycol·propylene glycol) mono(meth)acrylate, polyethylene glycol·polypropylene glycol mono(meth)acrylate, poly(ethylene glycol·tetramethylene glycol) mono(meth)acrylate, polyethylene glycol·polytetramethylene glycol mono(meth)acrylate, poly(propylene glycol·tetramethylene glycol) mono(meth)acrylate, polypropylene glycol·polytetramethylene glycol mono(meth)acrylate, poly(propylene glycol·1,2-butylene glycol) mono(meth)acrylate, polypropylene glycol·poly1,2-butylene glycol mono(meth)acrylate, poly(ethylene glycol·1,2-butylene glycol) Poly(ethylene glycol·poly 1,2-butylene glycol) mono(meth)acrylate, Poly(tetramethylene glycol·1,2-butylene glycol) mono(meth)acrylate, Polytetraethylene glycol·poly 1,2-butylene glycol mono(meth)acrylate, Poly 1,2-butylene glycol mono(meth)acrylate, Poly(ethylene glycol·trimethylene glycol) mono(meth)acrylate, Polyethylene glycol·polytrimethylene glycol mono(meth)acrylate, poly(propylene glycol·trimethylene glycol) mono(meth)acrylate, poly(1,2-butylene glycol·trimethylene glycol) mono(meth)acrylate, poly 1,2-butylene glycol·polytrimethylene glycol mono(meth)acrylate, poly(1,2-butylene glycol·tetramethylene glycol) mono(meth)acrylate, poly 1,2-butylene glycol·polytetramethylene glycol mono(meth)acrylate, etc.The above "poly(ethylene glycol-propylene glycol)" refers to a random copolymer of ethylene glycol and propylene glycol, and "polyethylene glycol-polyethylene glycol" refers to a block copolymer of ethylene glycol and propylene glycol. Commercially available products include NK Ester M-20G, M-40G, M-90G, M-130G, M-230G, AM-90G, AM-130G, and AM-230G manufactured by Shin-Nakamura Chemical Co., Ltd., and Blenmar PE-90, PE-200, PE-350, PP-500, PP-800, PP-1000, 50PEP-300, 55PET-800, 10PPB-500B, AE-200, AE-400, and AP-400 manufactured by NOF Corporation.

[0338] The monomer represented by formula (7) can be used alone or in combination of two or more kinds.

[0339] [Monomer unit (n3) represented by general formula (8)] The monomer represented by the general formula (8) will be described below.

[0340] In the general formula (8), R8 is an alicyclic hydrocarbon group having 3 to 20 carbon atoms. The alicyclic hydrocarbon group having 3 to 20 carbon atoms may have a substituent, such as an alkyl group, a hydroxyl group, a nitro group, an amino group, an alkoxy group, a halogen atom, or a combination thereof. Examples of the alicyclic hydrocarbon group having 3 to 20 carbon atoms include monocyclic and polycyclic alicyclic hydrocarbon groups. Examples of the monocyclic alicyclic hydrocarbon group include a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Examples of the polycyclic alicyclic hydrocarbon group include an isobornyl group, a norbornyl group, an adamantyl group, a tricyclodecyl group, a dicyclopentanyl group, a dicyclopentenyl group, a tricyclopentenyl group, a tricyclopentadiene group, and a dicyclopentadiene group. Among these, polycyclic alicyclic hydrocarbon groups are preferred, with an isobornyl group, a dicyclopentanyl group and an adamantyl group being more preferred, and an adamantyl group being even more preferred.

[0341] In general formula (8), R9 is a hydrogen atom or a methyl group.

[0342] Examples of the monomer represented by general formula (8) include cyclohexyl (meth)acrylate, methylcyclohexyl (meth)acrylate, 4-tert-butylcyclohexyl (meth)acrylate, 1,4-cyclohexanedimethanol mono(meth)acrylate, isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, dicyclopentenyl (meth)acrylate, 1-adamantyl (meth)acrylate, 2-adamantyl (meth)acrylate, 2-methyl-2-adamantyl (meth)acrylate, 3-hydroxy-1-adamantyl (meth)acrylate, 2-isopropyl-2-adamantyl (meth)acrylate, and dimethyladamantyl (meth)acrylate.

[0343] The monomer represented by formula (8) can be used alone or in combination of two or more kinds.

[0344] The total content of the monomer units (n2) represented by general formula (7) and (n3) represented by general formula (8) is preferably 90 to 100 mass%, and more preferably 95 to 100 mass%, in 100 mass% of the B block.

[0345] The B block may contain a monomer unit other than the monomer unit (n2) represented by the general formula (7) and the monomer unit (n3) represented by the general formula (8). The other monomer units are formed from a monomer copolymerizable with the monomer represented by the general formula (7) and the monomer represented by the general formula (8).

[0346] The content of the B block is preferably from 5 to 80 mass %, more preferably from 15 to 70 mass %, in 100 mass % of the block copolymer (N1).

[0347] The method for producing the block copolymer (N1) is not particularly limited, and any known method can be used, for example, living polymerization methods such as living radical polymerization and living anionic polymerization. Living radical polymerization is described, for example, in JP-A-9-62002 and JP-A-2002-31713, and in P. Lutz, P. Masson et al., Polym. Bull. 12, 79 (1984), BC Anderson, GD Andrews et al., Macromolecules, 14, 1601 (1981), K. Hatada, K. Ute, et al. al, Polym. J. 17, 977 (1985), 18, 1037 (1986), Koichi Migite, Koichi Hatada, Polymer Processing, 36, 366 (1987), Toshinobu Higashimura, Mitsuo Sawamoto, Polymer Research Papers, 46, 189 (1989), M. Kuroki, T. Aida, J. Am. Chem. Soc, 109, 4737 (1987), Takuzo Aida, Shohei Inoue, Organic Synthesis Chemistry, 43, 300 (1985), DY Sogoh, WRHertler et al, Macromolecules, 20, 1473 (1987), etc. Among these, reversible addition-fragmentation chain transfer polymerization (hereinafter, RAFT), atom transfer radical polymerization (hereinafter, ATRP), living radical polymerization using an iodine compound, and living radical polymerization using an organotellurium compound (hereinafter, TERP) are preferred. Specifically, it can be synthesized by the methods described in, for example, WO 2021 / 131726, WO 2022 / 050062, WO 2022 / 244586, etc.

[0348] The number and arrangement of A blocks and B blocks of the block copolymer (N1) are not particularly limited. For example, the block copolymer (N1) may have an arrangement such as an AB block copolymer, an ABA block copolymer, or a BAB block copolymer. Furthermore, blocks other than the A block and the B block may be included as long as the effects of the present invention are not impaired.

[0349] The weight average molecular weight of the block copolymer (N1) is preferably from 5,000 to 40,000.

[0350] The number average molecular weight of the block copolymer (N1) is preferably 2,000 to 20,000.

[0351] The average molecular weight distribution (weight average molecular weight / number average molecular weight) of the block copolymer (N1) is preferably from 1.0 to 3.0.

[0352] The block copolymer (N1) can be used alone or in combination of two or more kinds.

[0353] The content of the block copolymer (N1) is preferably from 10 to 100 mass %, and more preferably from 30 to 100 mass %, in 100 mass % of the leveling agent (N).

[0354] It is more preferable to use a block copolymer (N1) having an A block containing a monomer unit (n1) represented by general formula (6) and a B block containing a monomer unit (n2) represented by general formula (7) in combination with a block copolymer having an A block containing a monomer unit (n1) represented by general formula (6) and a B block containing a monomer unit (n3) represented by general formula (8) in the same manner. This provides excellent pattern forming properties and suppresses the generation of foreign matter derived from the green colorant (a1).

[0355] The mass ratio of the block copolymer having an A block containing a monomer unit (n1) represented by general formula (6) and a B block containing a monomer unit (n2) represented by general formula (7) to the block copolymer having an A block containing a monomer unit (n1) represented by general formula (6) and a B block containing a monomer unit (n3) represented by general formula (8) is preferably 10:90 to 90:10.

[0356] [Storage stabilizer (O)] The photosensitive composition of the present invention may contain a storage stabilizer (O).

[0357] The storage stabilizer (O) is not particularly limited, and known compounds can be used, such as quaternary ammonium chlorides such as benzyl trimethyl chloride and diethylhydroxyamine, organic acids such as lactic acid and oxalic acid and their methyl ethers, organic phosphines such as tert-butylpyrocatechol, tetraethylphosphine and tetraphenyl, and phosphites.

[0358] The content of the storage stabilizer (O) is preferably from 0.05 to 5% by mass based on 100% by mass of the nonvolatile content of the photosensitive composition.

[0359] [Organic solvent (P)] The photosensitive composition of the present invention can contain an organic solvent (P).

[0360] The organic solvent (P) is not particularly limited, and known compounds can be used. For example, 1,2,3-trichloropropane, 1-methoxy-2-propanol, ethyl lactate, 1,3-butanediol, 1,3-butylene glycol, 1,3-butylene glycol diacetate, 1,4-dioxane, 2-heptanone, 2-methyl-1,3-propanediol, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, 3-ethoxyethyl propionate, 3-methyl-1,3-butanediol, 3-methoxy-3-methyl-1-butanol, 3-methoxy-3-methyl butyl acetate, 3-methoxybutanol, 3-methoxybutyl acetate, 4-heptanone, m-xylene, m-diethylbenzene, m-dichlorobenzene, N,N-dimethylacetamide, N,N-dimethylformamide, n-butyl alcohol, n-butylbenzene, n-propyl acetate, N-methylpyrrolidone, o-xylene, toluene, o-chlorotoluene, benzene, o-diethylbenzene, o-dichlorobenzene, p-chlorotoluene, p-diethylbenzene, sec-butylbenzene, tert-butyl Benzene, γ-butyrolactone, isobutyl alcohol, isophorone, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monotertiary butyl ether, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol monopropyl ether, ethylene glycol monohexyl ether, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, diisobutyl ketone, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol monomethyl ether, cyclohexanol, cyclohexanol acetate, cyclohexanone,Dipropylene glycol dimethyl ether, dipropylene glycol methyl ether acetate, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, diacetone alcohol, triacetin, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol diacetate, propylene glycol phenyl ether, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, benzyl alcohol, methyl isobutyl ketone, methylcyclohexanol, n-amyl acetate, n-butyl acetate, isoamyl acetate, isobutyl acetate, propyl acetate, dibasic acid esters, etc.,

[0361] From the viewpoint of the environment, the photosensitive composition of the present invention preferably does not substantially contain organic solvents that are aromatic hydrocarbons (toluene, xylene, benzene, chlorobenzene, etc.) Substantially not containing means that the content of such organic solvents in the photosensitive composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, and more preferably 10 ppm by mass or less.

[0362] The organic solvent (P) can be used alone or in combination of two or more kinds.

[0363] The content of the organic solvent (P) is preferably such that the nonvolatile content of the photosensitive composition is 5 to 60% by mass.

[0364] The photosensitive composition of the present invention may contain components other than those described above. Examples of the other components include an acid generator, a salt generator, a curing catalyst, a semiconductor nanocrystal, a semiconductor material, an organic electroluminescent material, an insulating material, etc. The content of the other components may be appropriately set within a range that does not impair the effects of the present invention.

[0365] [Specific metal element content] The photosensitive composition of the present invention preferably has a total content of Li, Na, K, Mg, Ca, Fe, and Cr (hereinafter also referred to as specific metal elements) of 500 mass ppm or less.

[0366] A photosensitive composition in which the total amount of the specific metal elements is within the above range has excellent dispersion stability and sensitivity even after storage over time. The content of the specific metal elements can be measured by inductively coupled plasma emission spectrometry (ICP).

[0367] [Water content] The photosensitive composition of the present invention preferably has a water content of 2.0% by mass or less.

[0368] A photosensitive composition having a water content within the above range has excellent dispersion stability and sensitivity even after storage over time. The water content can be measured by a known method such as the Karl Fischer method.

[0369] [Method of producing photosensitive composition] The photosensitive composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the photosensitive composition, the components may be mixed at once, or each component may be dissolved or dispersed in the polymerizable compound (C) or the organic solvent (P) and then mixed successively. For example, a dispersion is produced by adding a color material (A), a dispersion resin (G), an organic solvent (P), etc., and carrying out a dispersion treatment. Then, an alkali-soluble resin (B), a polymerizable compound (C), a polymerization initiator (D), etc. are blended and mixed with the dispersion to produce the dispersion. The timing of blending each material is arbitrary. The dispersion process can also be carried out multiple times.

[0370] Examples of dispersing machines for carrying out the dispersion treatment include a two-roll mill, a three-roll mill, a ball mill, a horizontal sand mill, a vertical sand mill, an annular bead mill, and an attritor.

[0371] The average dispersed particle size (secondary particle size) of the particles in the dispersion is preferably from 30 to 200 nm, more preferably from 40 to 200 nm. If the particles have an appropriate particle size, a photosensitive composition having high dispersion stability is easily obtained.

[0372] The average dispersed particle size (secondary particle size) is measured, for example, using Nikkiso Microtrack UPA-EX150, which employs dynamic light scattering (FFT power spectrum method), with particle permeability set to absorption mode, particle shape set to non-spherical, and D50 particle size set to average size. The dilution solvent used for measurement is the organic solvent used for dispersion, and it is preferable to measure samples treated with ultrasonic waves immediately after sample preparation, as this tends to give results with less variation.

[0373] The photosensitive composition is preferably subjected to removal of coarse particles of 5 μm or more, preferably coarse particles of 1 μm or more, more preferably coarse particles of 0.5 μm or more, and mixed dust by means of centrifugation, filtration with a sintered filter or membrane filter, etc. The photosensitive composition of the present invention preferably does not substantially contain particles of 0.5 μm or more, and more preferably does not contain particles of 0.3 μm or less.

[0374] The photosensitive composition of the present invention is preferably used for forming a pattern by a photolithography method, although the present invention is not limited thereto.

[0375] <Membrane> The film of the present invention is a film formed from the above-mentioned photosensitive composition. The film is preferably a patterned film, but may also be used as a flat film without forming a pattern.

[0376] [Membrane manufacturing method] The method for producing the film is not particularly limited, and any known method can be used. For example, the film can be produced through a step of applying the photosensitive composition of the present invention onto a substrate and a step of drying the composition.

[0377] [Coating process] Examples of the substrate include substrates made of materials such as glass, resin, and silicone. The glass may be colorless and transparent, or colored glass such as blue glass may be used depending on the application. Examples of the resin include polyester-based resins such as polyester terephthalate, polyolefin-based resins such as polypropylene and polyethylene, polycarbonate resins, and epoxy resins. The thickness of the substrate is preferably 0.01 to 10 mm. An organic light-emitting layer may be formed on these substrates. Also, an imaging element such as a CCD or a CMOS may be formed on the substrate. Also, an undercoat layer may be provided on the substrate as necessary to improve adhesion with the upper layer, prevent diffusion of substances, and flatten the surface.

[0378] The coating method is not particularly limited, and any known method can be used, such as a dropping method, a slit coating method, a spray method, a roll coating method, a spin coating method, a casting coating method, an inkjet method, flexographic printing, screen printing, gravure printing, and offset printing.

[0379] The thickness of the membrane can be appropriately adjusted depending on the purpose, and is preferably 0.05 to 20.0 μm, more preferably 0.3 to 10.0 μm.

[0380] [Drying process] The method for drying the film applied to the substrate is not particularly limited, and any known method can be used, such as reduced pressure drying using a vacuum drying device, heat drying using a hot plate, an IR oven, a convection oven, or a combination of these methods.

[0381] The drying temperature and time can be appropriately adjusted. The drying temperature is preferably about 50 to 130° C., and the drying time is preferably about 5 seconds to 5 minutes.

[0382] Next, a pattern is formed. Examples of a method for forming a pattern include a photolithography method and a dry etching method. Among these, a photolithography method is preferable. When the film is used as a flat film, the step of forming a pattern is not necessary, and the entire surface can be exposed to light.

[0383] The method for forming the pattern will now be described in detail.

[0384] When a pattern is formed by a photolithography method, for example, the photosensitive composition of the present invention is applied onto a substrate, and the layer formed by drying is exposed to light in a pattern through a mask (exposure step), and the unexposed parts are removed with an alkaline developer (development step), and the pattern is then heat-treated (post-bake step).

[0385] [Exposure process] In the exposure process, the layer formed by coating and drying is exposed to a specific pattern through a mask using an exposure device such as a stepper. This allows the exposed portion to be cured. Examples of active energy rays used for exposure include ultraviolet rays such as g-rays (wavelength 436 nm), h-rays (wavelength 405 nm), and i-rays (wavelength 365 nm). Light with a wavelength of 300 nm or less can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm). When using light with a specific wavelength, an optical filter can also be used. In addition, the exposure may be performed by continuous irradiation with light, or by repeating irradiation and pause of light in a short cycle (for example, on the order of milliseconds or less) (pulse exposure). In addition, a plurality of active energy rays may be used in combination, or exposure may be performed in a plurality of steps.

[0386] [Development process] Next, an alkaline development process is carried out, whereby the unexposed portions of the layer are dissolved in an alkaline developer, and only the hardened portions remain, yielding a patterned film. Examples of the alkaline developer include aqueous solutions containing alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo-[5.4.0]-7-undecene, etc. Two or more of these alkaline compounds can be used in combination. The alkaline developer may contain a surfactant and an organic solvent in addition to the alkaline compound and water. The concentration of the alkaline developer is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. The pH of the alkaline developer is preferably 11 to 13, more preferably 11.5 to 12.5. When used at an appropriate pH, it suppresses roughening and peeling of the pattern and improves the remaining film rate after development. Examples of the developing method include a dipping method, a spraying method, a puddle method, etc. The developing temperature is preferably 15 to 40° C. After the alkaline development, it is preferable to wash with pure water.

[0387] [Post-bake process] After development, a heat treatment (post-baking) is performed, which improves the resistance of the film. The temperature is preferably 80 to 300° C., more preferably 100 to 260° C. The time is preferably about 2 minutes to 2 hours. When a material with low heat resistance is used for the substrate, when a substrate having an organic electroluminescence element as the light-emitting layer is used, or from the viewpoint of the environment, the temperature is preferably 180° C. or less.

[0388] <Color filters> The color filter of the present invention has the above-mentioned film. The color filter of the present invention can be produced by the same method as that for the above-mentioned film.

[0389] <Solid-state imaging element> The solid-state imaging device of the present invention has the above-mentioned color filter. The solid-state imaging device is not particularly limited as long as it has the color filter of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0390] The color filter of the present invention is provided on the device protective film. The color filter may be ... An imaging device including a solid-state imaging element of the present invention can be used for various purposes, such as digital cameras, electronic devices with imaging functions (such as mobile phones and smartphones), vehicle-mounted cameras, and surveillance cameras.

[0391] <Image display device> The image display device of the present invention has the above-mentioned color filter. Examples of the image display device include a liquid crystal display and an organic EL display. The form of the image display device is not particularly limited as long as it functions as an image display device. For example, the following liquid crystal display configuration can be given.

[0392] The liquid crystal display includes a color filter, a counter substrate having a TFT array substrate or the like, and a liquid crystal layer formed between the color filter and the counter substrate. Examples of driving methods for liquid crystal displays include the TN method, the IPS method, the OCB method, and the MVA method. The counter substrate can be appropriately selected according to the driving method. The liquid crystal layer can use various liquid crystals with different dielectric anisotropy and mixtures thereof according to the driving method.

[0393] Specifically, it is described in "Next Generation Liquid Crystal Display Technology" (by Uchida Tatsuo, published by Kogyo Chosakai Co., Ltd. in 1994), "Electronic Display Devices" (by Sasaki Akio, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (by Ibuki Yoshiaki, published by Sangyo Tosho Co., Ltd. in 1989). EXAMPLES

[0394] The present invention will be described in more detail below with reference to examples. However, the present invention is not limited to these examples. Note that "parts" means "parts by mass" and "%" means "% by mass", and in the description of the synthesis procedure in which "parts" and "moles" are mixed, "parts" may be read as "g". In addition, in the present invention, the non-volatile content or non-volatile content concentration refers to the mass remaining after standing in an oven at 110°C for 3 hours.

[0395] Before describing the examples, each measurement method will be described.

[0396] The weight average molecular weight (Mw), number average molecular weight (Mn), acid value (mgKOH / g), amine value (mgKOH / g), and extinction coefficient (L / mol cm) of the resin are measured as follows.

[0397] (Molecular weight) Number average molecular weight (Mn) and weight average molecular weight (Mw) were measured by gel permeation chromatography (GPC) equipped with an RI detector. The instrument used was an HLC-8220GPC (manufactured by Tosoh Corporation), with two separation columns connected in series, and both packings were "TSK-GEL SUPER HZM-N" connected in series. The oven temperature was 40°C, a tetrahydrofuran (THF) solution was used as the eluent, and the flow rate was 0.35 ml / min. The sample was dissolved in a solvent consisting of 1% by mass of the above eluent, and 20 microliters were injected. The molecular weight is a polystyrene equivalent value.

[0398] (Acid value) 80 ml of acetone and 10 ml of water were added to 0.5 to 1 g of sample solution, and the solution was stirred to dissolve uniformly. The solution was titrated with an automatic titrator ("COM-555" manufactured by Hiranuma Sangyo Co., Ltd.) using a 0.1 mol / L KOH aqueous solution as the titrant, and the acid value (mgKOH / g) was measured. The acid value per unit of nonvolatile content was calculated from the acid value of the solution and the concentration of nonvolatile content in the solution.

[0399] (amine value) The amine value is the total amine value (mgKOH / g) measured according to the method of ASTM D 2074 and converted into non-volatile content.

[0400] (Extinction coefficient) 0.001 g of polymerization initiator was dissolved in 0.01 L of propylene glycol monomethyl ether acetate to prepare a 0.1 mass% measurement solution. The 0.1 mass% measurement solution was then diluted with propylene glycol monomethyl ether acetate to prepare 0.01 mass% and 0.001 mass% measurement solutions. The absorbance of each concentration of the measurement solution was measured at a wavelength of 365 nm using a spectrophotometer (Hitachi High-Technologies Corporation, "U-3010"), and the extinction coefficient (L / mol cm) was calculated from the slope when the horizontal axis was the molar concentration and the vertical axis was the absorbance.

[0401] <Production of Colorant (A)> (Green colorant (a1-1)) In a flask equipped with a stirrer, condenser, dropping funnel, and thermometer, 5.0 parts of tetrafluorophthalonitrile, 2.9 parts of potassium fluoride, and 10 parts of acetone were added and stirred at room temperature until dissolved. After cooling with ice, an acetone solution of 6.65 parts of ethyl p-hydroxybenzoate was added dropwise from the dropping funnel over 2 hours, and the mixture was stirred for another 2 hours. After that, the mixture was stirred for about 12 hours while the temperature was raised to room temperature. After the reaction was completed, the reaction liquid was filtered and concentrated, and recrystallized by adding methanol. The obtained crystals were filtered and vacuum dried to obtain the following intermediate 1.

[0402] Intermediate 1 [ka]

[0403] In a flask equipped with a stirrer, a condenser, a gas inlet tube, and a thermometer, 6.2 parts of intermediate 1, 1.21 parts of zinc iodide, and 12 parts of benzonitrile were added, and the mixture was stirred under a nitrogen stream at 160°C for 10 hours to react. After cooling to room temperature, methyl cellosolve was added to the reaction solution, and the reaction solution was then dropped into a mixture of methanol and water, stirred for 30 minutes, and filtered. The resulting product was washed several times with methanol and vacuum dried to obtain the above-mentioned green color material (a1-1).

[0404] (Green colorant (a1-2)) In a flask equipped with a stirrer, a dropping funnel, a condenser, and a thermometer, 10.8 parts of tetrafluorophthalonitrile, 6.9 parts of potassium fluoride, and 25 parts of acetone were added and stirred at room temperature until dissolved. After cooling with ice, 25.4 parts of 3-chloro-4-hydroxybenzoic acid methoxyethyl ester dissolved in acetone was added dropwise from the dropping funnel over 2 hours, and the mixture was stirred for another 2 hours. After that, the mixture was stirred for about 12 hours while raising the temperature to room temperature. The reaction solution was filtered and concentrated, and recrystallized by adding methanol. The obtained crystals were filtered and vacuum dried to obtain the following intermediate 2.

[0405] Intermediate 2 [ka]

[0406] In a flask equipped with a stirrer, a condenser, a gas inlet tube, and a thermometer, 15.0 parts of intermediate 2, 1.93 parts of zinc iodide, and 23 parts of benzonitrile were added, and the mixture was reacted under nitrogen gas flow at 160°C for 10 hours while stirring. After cooling to room temperature, methyl cellosolve was added to the reaction solution, and the reaction solution was then dropped into a mixture of methanol and water, stirred for 30 minutes, and filtered. The resulting product was washed several times with methanol and vacuum dried to obtain the above-mentioned green color material (a1-2).

[0407] (Green colorant (a1-3)) In a flask equipped with a stirrer, a condenser, a dropping funnel, and a thermometer, 5.0 parts of tetrafluorophthalonitrile, 3.4 parts of potassium carbonate, and 100 parts of acetone were added and stirred at room temperature until dissolved. After cooling with ice, an acetone solution of 7.5 parts of p-chlorophenol was added dropwise from the dropping funnel over 2 hours, and the mixture was stirred for another 2 hours. After that, the mixture was stirred for about 12 hours while the temperature was raised to room temperature. The reaction solution was filtered and concentrated, and recrystallized by adding methanol. The obtained crystals were filtered and vacuum dried to obtain the following intermediate 3.

[0408] Intermediate 3 [ka]

[0409] In a flask equipped with a stirrer, a condenser, a gas inlet tube, and a thermometer, 6.0 parts of intermediate 3, 1.38 parts of zinc iodide, and 15 parts of benzonitrile were added, and the mixture was reacted under nitrogen gas flow at 160°C for 10 hours while stirring. After cooling to room temperature, methyl cellosolve was added to the reaction solution, and the reaction solution was then dropped into a mixture of methanol and water, stirred for 30 minutes, and filtered. The resulting product was washed several times with methanol and vacuum dried to obtain the above-mentioned green color material (a1-3).

[0410] (Green colorant (a1-4)) In a flask equipped with a stirrer, a dropping funnel, a condenser, and a thermometer, 10.0 parts of tetrafluorophthalonitrile and 40 parts of acetone were added and stirred at room temperature until dissolved. After cooling with ice, a mixed solution of 13.3 parts of octanol, 100 parts of tetrahydrofuran, and 11.6 parts of potassium tert-butoxide was added dropwise from the dropping funnel over 2 hours, and the mixture was stirred for another 2 hours. After that, the mixture was stirred for about 12 hours while raising the temperature to room temperature. The reaction solution was filtered and concentrated, and recrystallized by adding methanol. The obtained crystals were filtered and vacuum dried to obtain the following intermediate 4.

[0411] Intermediate 4 [ka]

[0412] In a flask equipped with a stirrer, a condenser, a gas inlet tube, and a thermometer, 4.21 parts of intermediate 4, 0.96 parts of zinc iodide, and 10 parts of benzonitrile were added, and the mixture was reacted under nitrogen gas flow at 160°C for 10 hours while stirring. After cooling to room temperature, methyl cellosolve was added to the reaction solution, and the reaction solution was then dropped into a mixture of methanol and water, stirred for 30 minutes, and filtered. The resulting product was washed several times with methanol and vacuum dried to obtain the above-mentioned green color material (a1-4).

[0413] (Green colorant (a1-5)) In a flask equipped with a stirrer, a condenser, a dropping funnel, and a thermometer, 20.0 parts of tetrafluorophthalonitrile, 150 parts of ethanol, and 20 parts of tetrahydrofuran were added and stirred at room temperature until dissolved. After cooling with ice, an ethanol solution of 6.6 parts of potassium hydroxide was added dropwise from the dropping funnel over 1 hour, and the mixture was stirred for another 1 hour. The reaction solution was filtered and concentrated, and recrystallized by adding methanol. The obtained crystals were filtered and dried in vacuum to obtain the following intermediate 5.

[0414] Intermediate 5 [ka]

[0415] In a flask equipped with a stirrer, condenser, dropping funnel, and thermometer, add 10.1 parts Intermediate 5, 2.88 parts of potassium fluoride, and 50 parts of acetone were added and stirred at room temperature until dissolved. After cooling on ice, an acetone solution of 7.46 parts of ethyl p-hydroxybenzoate was added dropwise from the dropping funnel over 2 hours, and the mixture was stirred for another 2 hours. The temperature was then raised to room temperature and the mixture was stirred for about 12 hours. The reaction solution was filtered and concentrated, and recrystallized by adding methanol. The obtained crystals were filtered and dried in a vacuum to obtain the following intermediate 6.

[0416] Intermediate 6 [ka]

[0417] In a flask equipped with a stirrer, a condenser, a gas inlet tube, and a thermometer, 12.4 parts of intermediate 6, 3.2 parts of zinc iodide, and 23 parts of benzonitrile were added, and the mixture was reacted under nitrogen gas flow at 160°C for 10 hours while stirring. After cooling to room temperature, methyl cellosolve was added to the reaction solution, and the reaction solution was then dropped into a mixture of methanol and water, stirred for 30 minutes, and filtered. The resulting product was washed several times with methanol and vacuum dried to obtain the above-mentioned green color material (a1-5).

[0418] (yellow color material (a2-1)) 46.2 parts of diazobarbituric acid and 38.4 parts of barbituric acid were added to 1,100 parts of distilled water at 85° C. Next, an aqueous potassium hydroxide solution was added to adjust the pH to about 5, and the mixture was stirred for 90 minutes to prepare an azobarbituric acid precursor. 0.3 mol of azobarbituric acid precursor and 1,500 parts of distilled water at 82°C were mixed, 10 parts of 30% hydrochloric acid were dropped, and 0.6 mol of melamine was added. Next, 0.15 mol of nickel chloride solution and 0.15 mol of zinc chloride solution were mixed and dropped, and the mixture was stirred at 82°C for 3 hours. Then, potassium hydroxide was added to adjust the pH to about 5.2, 100 parts of distilled water was added, and the mixture was heated to 90°C. Next, 21 parts of 30% hydrochloric acid were dropped, and the mixture was stirred for 12 hours. Then, potassium hydroxide was added to adjust the pH to about 5, and the product was taken out by filtration. The product was washed with ion-exchanged water and filtered. After drying at 80°C, it was pulverized to obtain a yellow colorant (a2-1) with a molar ratio of Ni to Zn of 50:50. 50 parts of the obtained yellow color material (a2-1), 500 parts of sodium chloride, and 60 parts of diethylene glycol were charged into a stainless steel gallon kneader (manufactured by Inoue Seisakusho Co., Ltd.) and kneaded at 60°C for 12 hours. Next, the kneaded mixture was poured into 3,000 parts of warm water, heated to about 80°C and stirred for 1 hour to form a slurry, which was then filtered. Thereafter, the mixture was washed with 1,000 parts of ion-exchanged water and filtered. After washing and filtering were repeated five times, the mixture was dried at 80°C for one day and pulverized to be fine.

[0419] (yellow color material (a2-2)) 46.2 parts of diazobarbituric acid and 38.4 parts of barbituric acid were added to 1,100 parts of distilled water at 85° C. Next, an aqueous potassium hydroxide solution was added to adjust the pH to about 5, and the mixture was stirred for 90 minutes to prepare an azobarbituric acid precursor. 0.3 mol of azobarbituric acid precursor and 1,500 parts of distilled water at 82°C were mixed, 10 parts of 30% hydrochloric acid were dropped, and 0.3 mol of melamine was added. Next, 0.195 mol of nickel chloride solution and 0.105 mol of zinc chloride solution were mixed and dropped, and the mixture was stirred at 82°C for 3 hours. Then, potassium hydroxide was added to adjust the pH to about 5.2, 100 parts of distilled water was added, and the mixture was heated to 90°C. Next, 21 parts of 30% hydrochloric acid were dropped, and the mixture was stirred for 12 hours. Then, potassium hydroxide was added to adjust the pH to about 5, and the product was taken out by filtration. The product was washed with ion-exchanged water and filtered. After drying at 80°C, it was pulverized to obtain a yellow colorant (a2-2) with a molar ratio of Ni to Zn of 65:35. The obtained yellow color material (a2-2) was pulverized in the same manner as in the yellow color material (a2-1).

[0420] (yellow color material (a2-3)) 46.2 parts of diazobarbituric acid and 38.4 parts of barbituric acid were added to 1,100 parts of distilled water at 85° C. Next, an aqueous potassium hydroxide solution was added to adjust the pH to about 5, and the mixture was stirred for 90 minutes to prepare an azobarbituric acid precursor. 0.3 mol of azobarbituric acid precursor and 1,500 parts of distilled water at 82°C were mixed, 10 parts of 30% hydrochloric acid were dropped, and 0.6 mol of melamine was added. Next, 0.21 mol of nickel chloride solution and 0.09 mol of copper chloride solution were mixed and dropped, and the mixture was stirred at 82°C for 3 hours. Then, potassium hydroxide was added to adjust the pH to about 5.2, 100 parts of distilled water was added, and the mixture was heated to 90°C. Next, 21 parts of 30% hydrochloric acid were dropped, and the mixture was stirred for 12 hours. Then, potassium hydroxide was added to adjust the pH to about 5, and the product was taken out by filtration. The product was washed with ion-exchanged water and filtered. After drying at 80°C, it was pulverized to obtain a yellow colorant (a2-3) with a molar ratio of Ni to Cu of 70:30. The obtained yellow color material (a2-3) was pulverized in the same manner as in the yellow color material (a2-1).

[0421] (yellow color material (a2-4)) 46.2 parts of diazobarbituric acid and 38.4 parts of barbituric acid were added to 1,100 parts of distilled water at 85° C. Next, an aqueous potassium hydroxide solution was added to adjust the pH to about 5, and the mixture was stirred for 90 minutes to prepare an azobarbituric acid precursor. 0.3 mol of azobarbituric acid precursor and 1,500 parts of distilled water at 82 ° C were mixed, 10 parts of 30% hydrochloric acid were dropped, and 0.6 mol of melamine was added. Next, 0.195 mol of nickel chloride solution, 0.09 mol of zinc chloride solution, and 0.015 mol of copper chloride solution were mixed and dropped, and stirred at 82 ° C for 3 hours. Then, potassium hydroxide was added to adjust the pH to about 5.2, 100 parts of distilled water was added, and the temperature was raised to 90 ° C. Next, 21 parts of 30% hydrochloric acid were dropped, and stirred for 12 hours. Then, potassium hydroxide was added to adjust the pH to about 5, and the product was taken out by filtration. The product was washed with ion-exchanged water and filtered. After drying at 80 ° C, it was pulverized to obtain a yellow colorant (a2-4) with a molar ratio of Ni, Zn, and Cu of 65:30:5. The obtained yellow color material (a2-4) was pulverized in the same manner as in the yellow color material (a2-1).

[0422] <Production of alkali-soluble resin (B)> (Alkali-soluble resin (B1-1)) 262.0 parts of propylene glycol monomethyl ether acetate (hereinafter, PGMAc) was placed in a reaction vessel equipped with a thermometer, a cooling tube, a nitrogen gas inlet tube, and a stirrer in a separable 4-neck flask, and heated to 120°C while injecting nitrogen gas into the vessel. At the same temperature, a mixture of 49.7 parts of 2-ethylhexyl acrylate (2-EHA), 99.4 parts of glycidyl methacrylate (GMA), 6.6 parts of dicyclopentanyl methacrylate (DCPMA), 19.0 parts of tert-butyl peroxy-2-ethylhexanoate as a polymerization initiator, and PGMAc was added dropwise from the dropping tube over 2.5 hours. After the dropwise addition was completed, the mixture was stirred at 120°C for another 2 hours to obtain a precursor. The atmosphere in the flask was then replaced with air, and 50.4 parts of acrylic acid (AA) as a modified compound, 0.6 parts of triphenylphosphine as a catalyst, and 0.2 parts of methylhydroquinone were added, and the mixture was reacted at 110°C for 10 hours. This caused the epoxy group of GMA to react with the carboxyl group of AA, generating hydroxyl groups through the cleavage of the epoxy group of GMA and simultaneously introducing polymerizable unsaturated groups (GMA+AA). Next, 21.3 parts of tetrahydrophthalic anhydride (THPA) was added as a modifying compound and reacted at 110°C for 4 hours. This caused a part of the hydroxyl groups of GMA+AA to react with THPA (GMA+AA+THPA). After that, PGMAc was added so that the non-volatile content was 30% by mass. The acid value was 38 mgKOH / g and the weight average molecular weight was 12,000. In Table 1, the blending amounts are expressed in mol%.

[0423] (Alkali-soluble resins (B1-2) to (B1-7)) Alkali-soluble resins (B1-2) to (B1-7) were synthesized by varying the type and amount of monomer and the amount of polymerization initiator so as to obtain the constituent molar ratios and weight average molecular weights shown in Table 1, and PGMAc was added to adjust the non-volatile content to 30 mass%.

[0424] [Table 1]

[0425] GMA+AA+SHA in Table 1 represents a polymerizable unsaturated group-containing monomer unit (b2) obtained by reacting some of the hydroxyl groups of GMA+AA with succinic anhydride (SHA).

[0426] (Alkali-soluble resin (B2-1)) 162.0 parts of PGMAc was placed in a reaction vessel equipped with a thermometer, a cooling tube, a nitrogen gas inlet tube, and a stirrer in a separable 4-neck flask, and heated to 120°C while injecting nitrogen gas into the vessel. At the same temperature, a mixture of 16.7 parts of styrene (St), 76.8 parts of glycidyl methacrylate (GMA), 66.1 parts of dicyclopentanyl methacrylate (DCPMA), 19.0 parts of tert-butylperoxy-2-ethylhexanoate as a polymerization initiator, and PGMAc was added dropwise from the dropping tube over 2.5 hours. After the dropwise addition was completed, the mixture was stirred at 120°C for another 2 hours to obtain a precursor. The atmosphere in the flask was then replaced with air, and 38.9 parts of acrylic acid (AA) as a modified compound, 0.6 parts of triphenylphosphine as a catalyst, and 0.2 parts of methylhydroquinone were added, and the mixture was reacted at 110°C for 10 hours. This caused the epoxy group of GMA to react with the carboxyl group of AA, generating hydroxyl groups through the cleavage of the epoxy group of GMA and simultaneously introducing polymerizable unsaturated groups (GMA+AA). Next, 40 parts of succinic anhydride (SHA) was added as a modifying compound and reacted at 110°C for 4 hours. This caused a part of the hydroxyl groups of GMA+AA to react with succinic anhydride (GMA+AA+SHA). After that, PGMAc was added so that the non-volatile content was 30% by mass. The acid value was 95 mgKOH / g and the weight average molecular weight was 5,000. In Table 2, the blending amounts are shown in mol%.

[0427] Alkali-soluble resins (B2-2) and (B2-3) were synthesized by changing the type and amount of monomer and the amount of polymerization initiator so as to obtain the constituent molar ratios and weight average molecular weights shown in Table 2, and PGMAc was added to adjust the non-volatile content to 30 mass%.

[0428] [Table 2]

[0429] HEMA+MOI in Table 2 represents a polymerizable unsaturated group-containing monomer unit (b2) in which 2-isocyanatoethyl methacrylate (MOI) is added to the hydroxyl group of 2-hydroxyethyl methacrylate (HEMA). Aronix M-110 is a paracumylphenol ethylene oxide modified acrylate manufactured by Toagosei Co., Ltd.

[0430] <Production of polymerizable compound (C)> (Polymerizable compound having a urethane bond (C1-1)) In a five-neck flask equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, a thermometer, and a dropping tube, 400 parts of pentaerythritol triacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 112 parts of hexamethylene diisocyanate and 112 parts of PGMAc was dropped from the dropping tube over 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the concentration was measured by IR at 2,180 cm. -1 The disappearance of the isocyanate absorption was confirmed. PGMAc was added so that the non-volatile content was 50 mass %, and an aliphatic urethane acrylate having 6 polymerizable unsaturated groups was obtained.

[0431] (Polymerizable compound having a urethane bond (C1-2)) In a five-neck flask equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, a thermometer, and a dropping tube, 400 parts of pentaerythritol triacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 148 parts of isophorone diisocyanate and 100 parts of PGMAc was dropped from the dropping tube over 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the concentration was measured by IR at 2,180 cm. -1 The disappearance of the isocyanate absorption was confirmed. PGMAc was added so that the non-volatile content was 50 mass %, and an alicyclic urethane acrylate having 6 polymerizable unsaturated groups was obtained.

[0432] (Polymerizable compound having a urethane bond (C1-3)) In a five-neck flask equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, a thermometer, and a dropping tube, 400 parts of pentaerythritol triacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 107 parts of 1,3-phenylenediisocyanate and 100 parts of PGMAc was dropped from the dropping tube over 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the concentration was measured by IR at 2,180 cm. -1 The disappearance of the isocyanate absorption was confirmed. PGMAc was added so that the non-volatile content was 50 mass %, and an aromatic urethane acrylate having 6 polymerizable unsaturated groups was obtained.

[0433] (Polymerizable compound having a urethane bond (C1-4)) In a five-neck flask equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, a thermometer, and a dropping tube, 400 parts of dipentaerythritol pentaacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 64 parts of hexamethylene diisocyanate and 64 parts of PGMAc was dropped from the dropping tube over 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the IR was measured at 2,180 cm. -1 The disappearance of the isocyanate absorption was confirmed. PGMAc was added so that the non-volatile content was 50 mass %, and an aliphatic urethane acrylate having 10 polymerizable unsaturated groups was obtained.

[0434] (Polymerizable compound having a urethane bond (C1-5)) In a five-neck flask equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, a thermometer, and a dropping tube, 400 parts of dipentaerythritol pentaacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 84 parts of isophorone diisocyanate and 84 parts of PGMAc was added dropwise from the dropping tube over 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the IR was measured at 2,180 cm -1 The disappearance of the isocyanate absorption was confirmed. The nonvolatile content was adjusted to 50 mass %, and an alicyclic urethane acrylate having 10 polymerizable unsaturated groups was obtained.

[0435] (Polymerizable compound having a urethane bond (C1-6)) In a five-neck flask equipped with a stirrer, reflux condenser, nitrogen inlet tube, thermometer, and dropping tube, 400 parts of dipentaerythritol pentaacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 66 parts of toluene diisocyanate (a mixture of 2,4 and 2,6 forms) and 100 parts of PGMAc was added dropwise from the dropping tube over a period of 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the IR reading was 2,180 cm. -1The disappearance of the isocyanate absorption was confirmed. PGMAc was added so that the non-volatile content was 50 mass %, and an aromatic urethane acrylate having 10 polymerizable unsaturated groups was obtained.

[0436] (Polymerizable compound having a urethane bond (C1-7)) In a five-neck flask equipped with a stirrer, reflux condenser, nitrogen inlet tube, thermometer, and dropping tube, 400 parts of pentaerythritol triacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 116 parts of toluene diisocyanate (a mixture of 2,4 and 2,6 isomers) and 100 parts of PGMAc was added dropwise from the dropping tube over a period of 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the concentration of 2,180 cm was measured by IR. -1 The disappearance of the isocyanate absorption was confirmed. Next, 66 parts of mercaptoacetic acid and 0.4 parts of 4-methoxyphenol were charged and reacted for 6 hours at a temperature of 50 to 60°C. PGMAc was added so that the non-volatile content became 50 mass%, and an aromatic urethane acrylate having an average of 5 polymerizable unsaturated groups and an acidic group was obtained.

[0437] (Polymerizable compound having a urethane bond (C1-8)) In a five-neck flask equipped with a stirrer, reflux condenser, nitrogen inlet tube, thermometer, and dropping tube, 400 parts of dipentaerythritol pentaacrylate, 100 parts of PGMAc, and 0.5 parts of N,N-dimethylbenzylamine were charged, and the temperature was raised to 70°C. A mixture of 66 parts of toluene diisocyanate (a mixture of 2,4 and 2,6 forms) and 61 parts of PGMAc was added dropwise from the dropping tube over a period of 2 hours. After the dropwise addition, the mixture was reacted at a temperature of 50 to 70°C for 8 hours, and the concentration was measured by IR at 2,180 cm. -1 The disappearance of the isocyanate absorption was confirmed. Next, 35 parts of mercaptoacetic acid and 0.6 parts of 4-methoxyphenol were charged and reacted at a temperature of 50 to 60°C for 6 hours. PGMAc was added so that the non-volatile content became 50 mass%, and an aromatic urethane acrylate having an average of 9 polymerizable unsaturated groups and an acidic group was obtained.

[0438] <Production of Dispersion Resin (G)> (Dispersed resin (G-1)) In a reactor equipped with a gas inlet tube, a condenser, an agitator, and a thermometer, 40 parts of methyl methacrylate, 10 parts of n-butyl methacrylate, and 13.2 parts of tetramethylethylenediamine as a catalyst were charged, and the mixture was stirred at 50°C for 1 hour while flowing nitrogen, and the inside of the system was replaced with nitrogen. Next, 9.3 parts of ethyl bromoisobutyrate as an initiator, 5.6 parts of cuprous chloride as a catalyst, and 100 parts of PGMAc were charged, and the temperature was raised to 110°C under a nitrogen stream to start polymerization of the first block (B block). After polymerization for 4 hours, the polymerization solution was sampled and the nonvolatile content was measured, and it was confirmed that the polymerization conversion rate was 98% or more based on the nonvolatile content. Next, 50 parts of PGMAc, 40 parts of dimethylaminoethyl methacrylate as a second block (A block) monomer, and 10 parts of methacryloyloxyethylbenzyldimethylammonium chloride were charged into the reactor, and the reaction was continued by stirring while maintaining 110°C under a nitrogen atmosphere. Two hours after the addition, the polymerization solution was sampled and the non-volatile content was measured, and it was confirmed that the polymerization conversion rate of the second block (A block) was 98% or more based on the non-volatile content. After cooling, PGMAc was added so that the non-volatile content was 30% by mass, and a dispersion resin (G-1) was prepared. The amine value was 169.8 mg KOH / g.

[0439] (Dispersion resin (G-2)) In a reaction apparatus equipped with a gas inlet tube, a condenser, an agitator, and a thermometer, 30 parts of methyl methacrylate, 30 parts of n-butyl methacrylate, 20 parts of hydroxyethyl methacrylate, and 13.2 parts of tetramethylethylenediamine were charged, and the mixture was stirred at 50°C for 1 hour while flowing nitrogen, and the inside of the system was replaced with nitrogen. Next, 9.3 parts of ethyl bromoisobutyrate, 5.6 parts of cuprous chloride, and 133 parts of PGMAc were charged, and the temperature was raised to 110°C under a nitrogen stream to initiate polymerization of the first block (B block). After polymerization for 4 hours, the polymerization solution was sampled and the nonvolatile content was measured, and it was confirmed that the polymerization conversion rate was 98% or more based on the nonvolatile content. Next, 61 parts of PGMAc and 20 parts of 1,2,2,6,6-pentamethylpiperidyl methacrylate (Hitachi Chemical Co., Ltd., Fancryl FA-711MM) as a second block (A block) monomer were added to the reactor, and the reaction was continued by stirring while maintaining 110°C under a nitrogen atmosphere. Two hours after the addition of 1,2,2,6,6-pentamethylpiperidyl methacrylate, a sample of the polymerization solution was taken to measure the non-volatile content, and it was confirmed that the polymerization conversion rate of the second block (A block) was 98% or more based on the non-volatile content. The reaction solution was cooled to room temperature to stop the polymerization. PGMAc was added so that the non-volatile content was 30%, and a dispersion resin (G-2) was prepared. The amine value was 57 mgKOH / g.

[0440] <Production of Leveling Agent (N)> (Block copolymer (N1-1)) In a nitrogen-substituted reaction vessel, 15.0 parts of 3-methacryloyloxypropyltris(trimethylsiloxy)silane and 79.0 parts of methyl ethyl ketone were charged, and the temperature was raised to 50°C while stirring under a nitrogen stream. Next, 4.2 parts of 2,2'-bipyridyl and 1.5 parts of cuprous chloride were charged, and the mixture was stirred at 50°C for 30 minutes. Then, 2.7 parts of ethyl 2-bromoisobutyrate were added, and the mixture was reacted at 50°C for 3 hours under a nitrogen stream to synthesize the A block portion, which is a polymer of 3-methacryloyloxypropyltris(trimethylsiloxy)silane. Next, 35.0 parts of poly(1,2-butylene glycol) monomethacrylate (average repeat number of 1,2-butylene glycol: 6) was added to the reaction system containing the A block, which is a polymer of 3-methacryloyloxypropyltris(trimethylsiloxy)silane, and the reaction was carried out at 50°C for 18 hours to synthesize the B block, which is a polymer of polypropylene glycol monomethacrylate (average repeat number of propylene glycol: 4 to 6). Then, 30 parts of activated alumina was added and stirred. After filtration, the mixture was distilled under reduced pressure to obtain a block copolymer (N1-1).

[0441] (Block copolymer (N1-2)) A nitrogen-substituted reaction vessel was charged with 32.4 parts of 1-adamantyl methacrylate and 75.0 parts of methyl ethyl ketone, and the temperature was raised to 50° C. while stirring under a rapid nitrogen flow, and then 3.2 parts of 2,2'-bipyridyl and 1.1 parts of cuprous chloride were charged and stirred for 30 minutes at 50° C. Thereafter, 2.0 parts of ethyl 2-bromoisobutyrate was added, and the mixture was reacted for 6 hours at 50° C. under a nitrogen stream to synthesize an A block portion, which is a polymer of 1-adamantyl methacrylate. Next, 67.6 parts of a monomer represented by the following chemical formula (9) was added to the reaction system containing the A block, which is a polymer of 1-adamantyl methacrylate, and reacted at 50°C for 20 hours to synthesize the B block, which is a polymer of the monomer represented by chemical formula (9). Then, 30 parts of activated alumina was added and stirred. After filtration, the mixture was distilled under reduced pressure to obtain a block copolymer (N1-2).

[0442] Chemical formula (9) [ka]

[0443] <Preparation of Dispersion> (Dispersion 1) The following raw materials were mixed and stirred until uniform, and then dispersed for 3 hours using zirconia beads with a diameter of 0.5 mm in an Eiger mill (Eiger Japan Co., Ltd. "Mini Model M-250 MKII"), followed by filtration through a filter with a pore size of 1.0 μm to prepare Dispersion 1. The non-volatile content was 25.0 mass%. The blending amount (parts) of each raw material was recorded as the non-volatile content, and the organic solvent contained in each raw material was recorded as the organic solvent (P). Yellow color material (A2-1): 15.0 parts Pigment derivative (F-1): 1.0 part Dispersion resin (G-1): 4.5 parts Dispersion resin (G-2): 4.5 parts Organic solvent (P-1): 75.0 parts

[0444] Dispersions 2 to 8 were prepared in the same manner as Dispersion 1, except that the raw materials and amounts shown in Table 3 were changed.

[0445] [Table 3]

[0446] The components listed in Table 3 are as follows:

[0447] Colorant (Green colorant other than green colorant (a1)) A1-1: CI Pigment Green 58 A1-2: CI Pigment Green 63

[0448] (Yellow colorant other than yellow colorant (a2)) A2-1: CI Pigment Yellow 233 A2-2: CI Pigment Yellow 138

[0449] The color materials (A1-1), (A1-2), (A2-1), and (A2-2) were all finely milled by salt milling, thoroughly washed with ion-exchanged water, and then dried before use.

[0450] [Pigment derivatives (F)] F-1: The following compound [ka]

[0451] [Organic solvent (P)] P-1: Propylene glycol monomethyl ether acetate

[0452] <Production of Photosensitive Composition> [Example 1] (Photosensitive composition 1) The following raw materials were mixed and stirred, and filtered through a filter with a pore size of 1.0 μm to obtain a photosensitive composition 1. The non-volatile content was 15.0 mass%. The blending amount (parts) of each raw material other than the dispersion is recorded as the non-volatile content, and the organic solvent contained in each raw material is recorded as organic solvent (P). In Table 4, the dispersion is also recorded by raw material. Green coloring material (a1-1): 4.10 parts Dispersion 1: 15.00 parts Alkali-soluble resin (B1-1): 2.30 parts Polymerizable compound having a urethane bond (C1-8): 3.00 parts Hydroxyl-containing polymerizable compound (C2-1): 0.40 parts Other polymerizable compounds (C7-1): 0.40 parts Oxime compound (D1-1): 0.45 parts Other compounds (D2-1): 0.15 parts Compound having an epoxy group (E1-1): 0.40 parts Silane coupling agent (J): 0.18 parts Block copolymer (N1-1): 0.01 part Block copolymer (N1-2): 0.01 part Organic solvent (P): 73.60 parts

[0453] [Examples 2 to 54 and Comparative Example 1] (Photosensitive composition 2-55) Photosensitive compositions 2 to 55 were produced in the same manner as in Example 1 using the raw materials and amounts shown in Tables 4-1 to 4-6.

[0454] [Table 4-1]

[0455] [Table 4-2]

[0456] [Table 4-3]

[0457] [Table 4-4]

[0458] [Table 4-5]

[0459] [Table 4-6]

[0460] The respective raw materials listed in Tables 4-1 to 4-6 are as follows.

[0461] [Polymerizable compound (C)] (Polymerizable compound having a hydroxyl group (C2)) C2-1: Dipentaerythritol pentaacrylate

[0462] (Other polymerizable compounds (C7)) C7-1: Dipentaerythritol hexaacrylate

[0463] [Polymerization initiator (D)] (Oxime Compound (D1)) D1-1: The above compound (D1-1) (absorption coefficient of light with a wavelength of 365 nm is 13,410 L / mol cm) D1-2: The above compound (D1-2) (absorption coefficient of light with a wavelength of 365 nm is 14,214 L / mol cm) D1-3: The above compound (D1-3) (absorption coefficient of light with a wavelength of 365 nm is 7,051 L / mol cm) D1-4: The above compound (D1-4) (absorption coefficient of light with a wavelength of 365 nm is 27,257 L / mol cm) D1-5: The above compound (D1-5) (absorption coefficient of light with a wavelength of 365 nm is 18,334 L / mol cm) D1-6: The above compound (D1-6) (absorption coefficient of light at a wavelength of 365 nm is 14,127 L / mol cm) D1-7: The above compound (D1-7) (absorption coefficient of light with a wavelength of 365 nm is 2,401 L / mol cm)

[0464] (Other compounds (D2)) D2-1: The above-mentioned compound (D2-1) D2-2: The above-mentioned compound (D2-2) D2-3: The above-mentioned compound (D2-3)

[0465] [Thermosetting compound (E)] (Compound (E1) having an epoxy group) E1-1: EHPE-3150 (manufactured by Daicel Corporation, a compound represented by general formula (5), with an average of 15 epoxy groups and an epoxy equivalent of 170 to 190 g / eq) E1-2: Denacol EX-611 (manufactured by Nagase ChemteX Corporation, average number of epoxy groups: 4, epoxy equivalent: 155-175g / eq)

[0466] [Silane coupling agents (J)] J-1: X-12-1048 (Shin-Etsu Chemical Co., Ltd.)

[0467] [Leveling agent (N)] (Leveling agents other than block copolymer (N1)) N2-1: BYK-330 (BYK-Chemie, polyether-modified polydimethylsiloxane)

[0468] [Organic solvent (P)] P-1: Propylene glycol monomethyl ether acetate P-2: Propylene glycol monomethyl ether P-3: 3-Methoxy-1-butanol P-4: Ethyl 3-ethoxypropionate P-5: Dipropylene glycol monomethyl ether acetate The above P-1, P-2, P-3, P-4, and P-5 were mixed in a mass ratio of 65:7:3:24:1 to prepare an organic solvent (P).

[0469] <Evaluation of Photosensitive Composition> The following evaluations were carried out on the obtained photosensitive compositions 1 to 55. The evaluation results are shown in Table 5.

[0470] [Pattern Formation (1): Adhesion] The obtained photosensitive composition was applied by spin coating to a glass substrate (Corning Eagle 2000) measuring 100 mm in length, 100 mm in width, and 0.7 mm in thickness so that the dry film thickness was 2.0 μm, and then dried on a hot plate at 70° C. for 2 minutes. Next, after cooling the substrate to room temperature, the substrate was illuminated with an ultra-high pressure mercury lamp at an illumination intensity of 30 mW / cm through a photomask with a stripe pattern with 5 μm intervals. 2 , 50mJ / cm 2 The substrate was then spray-developed using an aqueous developer containing 0.12% of a nonionic surfactant and 0.04% of potassium hydroxide at 23°C, washed with ion-exchanged water, air-dried, and post-baked in a clean oven at 230°C for 30 minutes. The spray development was carried out for the shortest time possible to form a pattern without leaving any residual development for each photosensitive composition coating, and this was determined as the appropriate development time. Among the patterns on the evaluation substrate, the fine line patterns with a width of 5 to 25 μm were observed with an optical microscope to confirm the remaining fine line patterns. The evaluation criteria are as follows, with 3 or more being considered practical. 5: Fine lines of 10 μm or less remain. 4: Fine lines of 15 μm or more remain. Fine lines of 10 μm or less do not remain. 3: Fine lines of 20 μm or more remain. Fine lines of 15 μm or less do not remain. 2: 25 μm fine lines remain. No fine lines of 20 μm or less remain. 1: No fine lines remain.

[0471] [Pattern Formation (2): Cross-sectional Shape] The obtained photosensitive composition was applied by spin coating to a glass substrate (Corning Eagle 2000) measuring 100 mm in length, 100 mm in width, and 0.7 mm in thickness so that the film thickness after drying would be 2.0 μm, and then dried on a hot plate at 70° C. for 2 minutes. Next, after cooling the substrate to room temperature, the substrate was irradiated with light at an illumination intensity of 30 mW / cm using an ultra-high pressure mercury lamp through a photomask having a 100 μm-wide stripe pattern. 2 , exposure dose 50mJ / cm 2The substrate was then spray-developed using an aqueous developer containing 0.12% by mass of a nonionic surfactant and 0.04% by mass of potassium hydroxide at 23°C, washed with ion-exchanged water, air-dried, and post-baked in a clean oven at 230°C for 30 minutes. The spray development was performed for the shortest time possible to form a pattern without leaving any residual development. The cross-sectional shape of the pattern was confirmed using a scanning electron microscope (Hitachi High-Tech Corporation "S-3000H"). For evaluation, SEM images of the cross section of a 100 μm wide stripe pattern were captured, and the taper angle between the substrate and the end of the pattern cross section was measured. The evaluation criteria are as follows, with 3 or more being considered practical. 5: Taper angle is between 40 degrees and 50 degrees 4: Taper angle is 50 degrees or more and less than 60 degrees 3: Taper angle is between 30 degrees and 40 degrees, or between 60 degrees and 70 degrees 2: Taper angle is between 20 degrees and 30 degrees, or between 70 degrees and 90 degrees 1: Taper angle less than 20 degrees or more than 90 degrees

[0472] [Pattern Formation (3): Surface Smoothness] Using an optical microscope (Olympus Optical Co., Ltd. "BX-51", magnification: 200 times), the surface of the pattern was confirmed on the substrate prepared in the pattern forming property (2). 3 or more is considered to be practical. 5: No wrinkles or irregularities are observed on the surface of the pattern. 4: Very slight wrinkles or unevenness are observed on the pattern surface. 3: Slight wrinkles or irregularities are observed on the pattern surface. 2: Wrinkles or unevenness are observed on the pattern surface. 1: Severe wrinkles and unevenness are observed on the surface of the pattern.

[0473] [Foreign matter evaluation] The obtained photosensitive composition was applied by spin coating to a glass substrate (Corning Eagle 2000) measuring 100 mm in length, 100 mm in width, and 0.7 mm in thickness so that the film thickness after drying would be 2.0 μm, and then dried on a hot plate at 70° C. for 2 minutes. Next, after cooling the substrate to room temperature, the substrate was irradiated with light at an illumination intensity of 30 mW / cm using an ultra-high pressure mercury lamp through a photomask having a 100 μm-wide stripe pattern. 2 , exposure dose 50mJ / cm 2 The substrate was then spray-developed using an aqueous developer containing 0.12% nonionic surfactant and 0.04% potassium hydroxide at 23°C, then washed with ion-exchanged water and air-dried. The spray development was carried out for the shortest time possible to form a pattern without leaving any residual development. The substrate was post-baked in a clean oven at 230°C for 30 minutes, and then further heated at 230°C for 3 hours. The number of foreign objects on the glass substrate between the pattern pixels was counted using a metallurgical microscope "BX60" (Olympus Systems). The magnification was set to 500x, and the number of foreign objects observable in any five fields of view was counted by cumulative calculation using the transmission light. The evaluation criteria are as follows, with 3 or more being considered practical. 5: Fewer than 5 foreign objects 4: 5 or more but less than 10 foreign objects 3: 10 or more but less than 20 foreign objects 2: The number of foreign objects is 20 or more but less than 50 1: 50 or more foreign objects

[0474] [Electrical characteristics evaluation] The obtained photosensitive composition was applied to a glass substrate having a transparent conductive film (ITO film) formed thereon using a spin coater so that the chromaticity value of the coating film after heat treatment was y=0.64 with a C light source, and the composition was dried on a hot plate at 70°C for 2 minutes. Then, an ultra-high pressure mercury lamp was used to apply the coating to the glass substrate at an illuminance of 30 mW / cm. 2 , 50mJ / cm 2 The film was exposed to light at 400 K and then heat-treated in a clean oven at 230°C for 30 minutes. After cooling, a magnetron sputtering device was used to deposit an Au vapor deposition agent onto the coating film to an area of ​​3.464 × 10 -4 m -2 Thus, a substrate for evaluating electrical characteristics was obtained. The luminance of the surface irradiated from the opposite side of the coating film of the obtained substrate for electrical characteristic evaluation was 1000 cd / m 2 The coating surface was irradiated with light under the conditions of 20Hz, and the dielectric tangent value at a frequency of 20Hz was measured using an impedance analyzer ("1260" manufactured by Solartron). The evaluation criteria are as follows, with 3 or more being considered practical. 5: Less than 0.065 4: 0.065 or more, less than 0.075 3: 0.075 or more, less than 0.090 2: 0.090 or more, less than 0.100 1:0.100 or more

[0475] [Evaluation of light resistance in a low-oxygen environment] The obtained photosensitive composition was applied to a 100 mm long x 100 mm wide, 0.7 mm thick glass (Corning Eagle 2000) using a spin coater so that the chromaticity value of the coating film after heat treatment was y = 0.64 with a C light source, and then dried on a hot plate at 70 °C for 2 minutes. Then, an ultra-high pressure mercury lamp was used to apply the coating to the glass at an illuminance of 30 mW / cm. 2 , 50mJ / cm 2 Thereafter, the substrate was spray-developed using an aqueous developer containing 0.12% by mass of a nonionic surfactant and 0.04% by mass of potassium hydroxide at 23°C, washed with ion-exchanged water, air-dried, and heat-treated in a clean oven at 230°C for 30 minutes. Next, an overcoat agent was applied onto the coating film using a spin coater, and the organic solvent was removed using a vacuum dryer. After that, the substrate was baked on a hot plate at 90°C for 2 minutes, and then heat-treated at 230°C for 30 minutes to obtain a substrate for evaluating light resistance in a low-oxygen environment. The initial brightness of the obtained evaluation substrate in the XYZ color system was measured using LVmicroZ (manufactured by Lambda Vision). After that, the substrate was irradiated with LED lighting for 200 hours, and the brightness was measured again. The brightness change rate was calculated using the following formula. A value of 3 or more is considered practical. Brightness change rate = |Brightness after 200 hours - initial brightness| / initial brightness x 100 5: Less than 3% 4: 3% or more, less than 5% 3: 5% or more, less than 10% 2: 10% or more, less than 15% 1:15% or more

[0476] [Table 5]

Claims

1. A photosensitive composition comprising a colorant (A), an alkali-soluble resin (B), a polymerizable compound (C), and a polymerization initiator (D), The color material (A) includes a green color material (A1) and a yellow color material (A2), The green color material (A1) contains a green color material (a1) represented by the following general formula (1): The photosensitive composition includes a yellow colorant (A2) containing two or more kinds of metal azo compounds having at least different metal species selected from the group consisting of metal azo compounds represented by the following general formula (2) and metal azo compounds having a tautomeric structure thereof, and a compound represented by the following general formula (3): General formula (1) 【Chemistry 1】 (In general formula (1), X １ ~X １６ each independently represents a hydrogen atom, a halogen atom, or -Y １ -R １ represents Y １ represents a divalent linking group, R １ represents a monovalent organic group. １ ~X １６ At least one of the groups represents a halogen atom, and at least one of the groups represents -Y １ -R １ Represents. M represents a metal atom, a metal oxide, or a metal halide. General formula (2) 【Chemistry 2】 (In general formula (2), R １ and R ２ are each independently —OH, —NH ２ , or -NHR ５ represents R ３ and R ４ are each independently =O or =NR ５ represents R ５ each independently represents a hydrogen atom or an alkyl group which may have a substituent. Me is a metal atom selected from the group consisting of Ni, Zn, Cu, Al, Fe, Co, and Mn. General formula (3) 【Chemistry 3】 (In general formula (3), R ６ each independently represents a hydrogen atom or an alkyl group which may have a substituent.

2. 2. The photosensitive composition according to claim 1, wherein a mass ratio of the green color material (a1) to the yellow color material (a2) is from 10:90 to 90:

10.

3. 2. The photosensitive composition according to claim 1, wherein the alkali-soluble resin (B) comprises an alkali-soluble resin (B1) having a monomer unit (b1) whose homopolymer has a glass transition temperature of 0° C. or lower.

4. The photosensitive composition according to claim 1 , wherein the polymerizable compound (C) includes a polymerizable compound (C1) having a urethane bond.

5. The photosensitive composition of claim 1 , further comprising a thermosetting compound (E).

6. A film formed from the photosensitive composition according to any one of claims 1 to 5.

7. A color filter comprising the film according to claim 6.

8. A solid-state imaging device comprising the color filter according to claim 7.

9. An image display device comprising the color filter according to claim 7.

Images