Exposure apparatus

Abstract

To provide an exposure apparatus capable of improving processing accuracy and energy efficiency.SOLUTION: An exposure apparatus 1000 includes: a light source 20 which emits pulse light having a predetermined oscillation frequency; a first spatial light modulator 60 where the pulse light is made incident, and an image to be formed is updated at a predetermined image update frequency; a stage which holds a subject to be exposed irradiated with light from the first spatial light modulator, and moves the subject to be exposed in a first direction for the first spatial light modulator; and an oscillator 4010 which outputs a clock having a predetermined frequency, where at least two of the predetermined oscillation frequency, the predetermined image update frequency, and movement of the stage are adjusted on the basis of the predetermined frequency of the clock.SELECTED DRAWING: Figure 36

Description

[Technical field]

[0001] The present invention relates to an exposure apparatus. This application claims priority to U.S. Provisional Patent Application No. 62 / 959,178, filed January 10, 2020, the contents of which are incorporated herein by reference. [Background technology]

[0002] Laser beams are used in a variety of fields. Summary of the Invention [Problem to be solved by the invention]

[0003] In devices using laser beams, improved processing accuracy and improved energy efficiency are constantly desired, such as reducing energy loss in the laser beam, properly controlling the output intensity of the laser beam, suppressing speckle, properly controlling the beam output timing, and / or properly controlling the output beam waveform. [Means for solving the problem]

[0004] In one aspect of the present invention, an exposure apparatus includes a light source that emits pulsed light having a predetermined oscillation frequency, a first spatial light modulator into which the pulsed light is incident and an image formed thereon is updated at a predetermined image update frequency, a stage that holds an exposure object that is irradiated with light from the first spatial light modulator and moves the exposure object in a first direction relative to the first spatial light modulator, and an oscillator that outputs a clock having a predetermined frequency, and at least two of the predetermined oscillation frequency, the predetermined image update frequency, and the movement of the stage are adjusted based on the predetermined frequency of the clock. [Brief description of the drawings]

[0005] [Figure 1] FIG. 1 is a schematic diagram showing various examples of a laser beam system (optical device) equipped with a laser light source. [Diagram 2]FIG. 2 is a schematic diagram showing various other examples of a laser beam system (optical device) including a laser light source. [Diagram 3] FIG. 3 is a diagram showing an example of pulse laser beam synthesis control. [Figure 4] FIG. 4 is a diagram showing an example of the synthesis control of CW laser beams. [Diagram 5] FIG. 5 is a diagram showing an example of an output beam. [Figure 6] FIG. 6 shows another example of an output beam. [Figure 7] FIG. 7 is a diagram showing an example in which a polygon mirror device is applied as a time division multiplexer (rotation device). [Figure 8] FIG. 8 is a diagram showing an example in which a polygon mirror device is applied as a time division multiplexer (rotation device). [Figure 9] FIG. 9 is a diagram showing an example in which an optical switch device is applied as a time division divider (rotation device). [Figure 10] FIG. 10 is a diagram showing an example in which an optical switch device is applied as a time division divider (rotation device). [Figure 11] FIG. 11 is a diagram showing an example in which an optical switch device is applied as a sub-divider (dynamic time divider) and a polygon mirror device is applied as a time divider (dynamic time divider). [Figure 12] FIG. 12 shows an example in which an electro-optic modulator is applied as a time divider and a polarizing beam splitter is applied as a sub-divider (static divider). [Figure 13] FIG. 13 shows an example in which an electro-optic modulator is applied as a sub-splitter (dynamic time-splitter) and a polarizing beam splitter is applied as a sub-splitter (static splitter). [Figure 14] FIG. 14 is a diagram showing an example including an aperture device disposed on the optical path. [Figure 15] FIG. 15 is a diagram showing a schematic overall configuration of an exposure apparatus. [Figure 16] FIG. 16 is a diagram showing an example of the configuration of an exposure apparatus. [Figure 17] FIG. 17 is a diagram for explaining the relationship between the repetition frequency of the laser beam and the operating frequency of the SLM. [Figure 18] FIG. 18 is a diagram for explaining a combination of a light source and an output module. [Figure 19] FIG. 19 is a diagram showing an example of the configuration of an exposure apparatus that does not include an SLM. [Figure 20] FIG. 20 is a diagram showing an example of the configuration of an exposure apparatus equipped with an SLM. [Figure 21] FIG. 21 is a diagram for explaining the relationship between the pattern line width and the light emission time. [Figure 22] FIG. 22 is a diagram for explaining energy loss of a beam. [Diagram 23] FIG. 23 is a diagram for explaining time division of beams. [Figure 24] FIG. 24 is a diagram for explaining the deviation of the projection positions among a plurality of SLMs based on the irradiation timing. [Diagram 25] FIG. 25 is a diagram for explaining mechanical and / or optical shift adjustment. [Figure 26] FIG. 26 is a diagram for explaining a shift adjustment corresponding to a scan operation. [Figure 27] FIG. 27 is a diagram for explaining a shift adjustment corresponding to another scan operation. [Figure 28] FIG. 28 is a diagram showing an example of the configuration of an exposure apparatus for shift adjustment. [Figure 29] FIG. 29 is a diagram showing an example of the configuration of an exposure apparatus. [Diagram 30] FIG. 30 is a diagram showing an example of the configuration of an exposure apparatus. [Diagram 31] FIG. 31 is a diagram showing an example of the configuration of an exposure apparatus. [Diagram 32] FIG. 32 is a diagram showing an example of the configuration of an exposure apparatus. [Diagram 33] FIG. 33 is a diagram showing an example of the configuration of an exposure apparatus. [Diagram 34] FIG. 34 is a diagram showing an example of the configuration of an exposure apparatus. [Diagram 35] FIG. 35 is a diagram showing an example of pattern exposure. [Diagram 36] FIG. 36 is a diagram showing an example of the configuration of an exposure apparatus related to synchronous control. [Figure 37] FIG. 37 is a diagram for explaining an example of rotation control of the polygon mirror. [Figure 38] FIG. 38 is a diagram for explaining an example of synchronous control of the polygon mirror. [Figure 39] FIG. 39 is a diagram for explaining the operation timing of a plurality of devices. [Diagram 40] FIG. 40 is a diagram for explaining an example of synchronous control of the rotating plates. [Diagram 41] FIG. 41 is a diagram for explaining an example of synchronous control of a rotating plate on which additional processing has been performed. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0006] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings. The following detailed description of the present invention is illustrative only and not limiting. The same or similar reference characters are used throughout the drawings and the following detailed description.

[0007] 1 and 2 are schematic diagrams showing various examples of a laser beam system (optical device) equipped with a laser light source. In each of the examples shown in Fig. 1(a), Fig. 1(b), Fig. 1(c), Fig. 1(d), Fig. 2(a), Fig. 2(b), Fig. 2(c), and Fig. 2(d), the laser beam system includes a laser light source 20.

[0008] In one embodiment, the laser beam system (optical device) includes a laser source 20, an output module 30, a controller 40, and a time divider 50 optically disposed between the laser source 20 and the output module 30.

[0009] Various types of laser light source 20 are applicable. For example, examples of the laser light source 20 include gas lasers (helium-neon lasers, argon lasers, carbon dioxide gas lasers, excimer lasers, nitrogen lasers, etc.), semiconductor lasers, solid-state lasers (YAG lasers, Nd (neodymium) lasers, ruby ​​lasers, fiber lasers, titanium lasers, etc.), metal lasers (copper deposition lasers, helium-cadmium lasers, gold deposition lasers, etc.), liquid lasers, etc. The technology of the present disclosure is applicable to various oscillation forms, such as pulse oscillation and continuous wave (CW) oscillation.

[0010] The output module 30 is set according to the application of the laser beam. For example, the laser beam is used in optical devices such as laser processing devices, laser melting devices, laser welding devices, laser marking devices, laser length measuring devices, semiconductor exposure devices, flat panel display exposure devices, circuit board exposure devices, laser illumination devices, laser display devices, laser detection devices, laser propulsion devices, laser inspection devices, laser microscopes, and laser medical devices. The technology of the present disclosure is applicable to devices in various fields, including these devices.

[0011] In certain embodiments, output module 30 includes a spatial light modulator (SLM) 60. For example, SLM 60 includes a liquid crystal element, a digital mirror device (digital micromirror device, DMD), a magneto-optic spatial light modulator (Magneto Optic Spatial Light Modulator, MOSLM), or the like.

[0012] The time divider (time distributor, dynamic time divider, optical time divider, optical switch, optical shutter, dynamic switch, dynamic shutter, dynamic separator, optical path switcher) 50 is controlled by the controller 40 and configured to divide the laser beam in time. For example, the time divider 50 may be a polygon mirror device, a galvano mirror device, an electro-optical modulator (EOM), an acousto-optical modulator (AOM), a vibration device, or other optical switch devices (such as a liquid crystal switch). The time-divided beam can be selectively used. Furthermore, the time-divided beams may be combined, mixed, and / or focused. For example, a selectively extracted beam from the time divider 50 enters the output module 30. In one example, the time-divided beam is guided to a plurality of optical paths for each predetermined span on the time axis. A plurality of time-divided beams (a plurality of distributed beams) are respectively supplied to a plurality of paths.

[0013] In a specific embodiment, the time divider 50 is controlled to drive synchronously with the SLM 60 of the output module 30. For example, a time-divided beam corresponding to the drive timing of the SLM 60 is supplied to the SLM 60. For example, the operation frequency (e.g., image update frequency) of the SLM 60 is generally lower than the repetition frequency of the pulse beam. Among the time-divided beams, a beam corresponding to the operation timing of the SLM 60 is selectively used. The remaining beams among the time-divided beams can be used for other purposes. In another embodiment, the time divider 50 can be controlled to drive asynchronously with the SLM 60 of the output module 30.

[0014] In a specific embodiment, the laser beam system includes a plurality of laser light sources 20. The number of the laser light sources 20 can be set arbitrarily. For example, the number of the laser light sources 20 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, or more. In one example, the beams from the plurality of laser light sources 20 are combined, mixed, and / or focused through a predetermined device and enter the time divider 50. The beams from the plurality of laser light sources 20 can have a relatively high energy value even after being divided by the time divider 50. In another example, the beams from the plurality of laser light sources 20 enter the time divider 50 independently. In one example, the beams from the plurality of pulsed laser light sources 20 are set to have substantially the same pulse width and peak value (pulse waveform, waveform profile) as each other. In another example, the beams from the plurality of pulsed laser light sources 20 are set to have at least one of the pulse width and peak value (pulse waveform, waveform profile) different from each other.

[0015] In a configuration in which multiple laser light sources 20 and an output module 30 having an SLM 60 are combined, for example, energy loss of the laser beam is reduced, energy efficiency is improved, output intensity of the laser beam is appropriately controlled, and / or speckle is suppressed. In one example, a beam from a time division multiplexer 50 is supplied to the SLM 60 at an appropriate timing. In the SLM 60 to which the beam is supplied only at an optimal time, energy loss in the SLM 60 is reduced, and a high-energy beam (high-power beam) is output from the output module 30.

[0016] In certain embodiments, the laser beam system includes a plurality of output modules 30. For example, a first time-shared beam is provided to a first output module 30, and a second time-shared beam is provided to a second output module 30. The number of output modules 30 can be set arbitrarily. For example, the number of output modules 30 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30, 35, 40, 45, 50, or more.

[0017] In a specific embodiment, each of the multiple output modules 30 includes an SLM 60. The multiple SLMs 60 are driven synchronously or asynchronously with respect to one another. In one example, the first, second, third, and fourth SLMs 60 are driven at the same timing corresponding to a certain time-shared beam. In another example, the first and second SLMs 60 are driven at the same timing corresponding to a first time-shared beam, and the third and fourth SLMs 60 are driven at a different timing corresponding to a second time-shared beam. In yet another example, the first SLM 60 is driven at a timing corresponding to the first time-shared beam, the second SLM 60 is driven at a different timing corresponding to the second time-shared beam, the third SLM 60 is driven at yet another timing corresponding to the third time-shared beam, and the fourth SLM 60 is driven at yet another timing corresponding to the fourth time-shared beam.

[0018] In a configuration in which the time division multiplexer 50 and the multiple SLMs 60 are combined, for example, the energy loss of the laser beam is reduced, the energy efficiency is improved, the output intensity of the laser beam is appropriately controlled, the beam output timing is appropriately controlled, and / or the output beam waveform is appropriately controlled. In one example, the beam from the laser light source 20 is guided to the multiple SLMs 60 so as to correspond to the drive timings of the multiple SLMs 60, respectively. Reducing the beam blocking period (beam non-use period) is advantageous for improving energy efficiency, reducing light leakage, and / or avoiding thermal effects.

[0019] In a specific embodiment, the laser beam system further includes a sub-divider (time distributor, dynamic time divider, optical time divider, optical switch, optical shutter, dynamic switch, dynamic shutter, dynamic separator, optical path switcher) 70 arranged optically between the laser light source 20 and the time divider 50, or between the time divider 50 and the output module 30. The sub-divider 70 includes a dynamic divider or a static divider, and is configured to polarize or divide the laser beam, or to divide the laser beam in terms of frequency or time. The dynamic divider means a configuration in which the laser beam is separated or divided by driving the divider, and the static divider means a configuration in which the laser beam is separated or divided without driving the divider. For example, the dynamic divider may be the same as the time divider described above. For example, the static divider may be a polarizing beam splitter, a half mirror, a dichroic mirror, a frequency separator, or the like. In one example, the time divider 50 and the static divider 70 are arranged on the optical axis in order along the traveling direction of the beam. In another example, a static divider 70 and a time divider 50 are arranged on the optical axis in sequence along the beam traveling direction. In yet another example, a time divider (front position, front stage time divider) 70 and a time divider (rear position, rear stage time divider) 50 are arranged on the optical axis in sequence along the beam traveling direction. In one example, multiple time dividers 50, 70 are combined. In another example, one time divider 50 and multiple static dividers 70 are combined. In yet another example, multiple time dividers 50 and one static divider 70 are combined. In yet another example, multiple time dividers 50 and multiple static dividers 70 are combined. The number of time dividers 50 and sub-dividers 70 can be set arbitrarily. For example, the total number of time dividers 50 and sub-dividers 70 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, or more.

[0020] In a configuration in which the time divider 50 and the static divider 70 are combined, for example, the energy loss of the laser beam is reduced, the energy efficiency is improved, the output intensity of the laser beam is appropriately controlled, the beam output timing is appropriately controlled, and / or the output beam waveform is appropriately controlled. In one example, the number of beam divisions is increased, and / or the beam is divided into multiple parts according to the wavelength band.

[0021] In a combined configuration of the time divider (front position) 70 and the time divider (rear position) 50, for example, the energy loss of the laser beam is reduced, the energy efficiency is improved, the output intensity of the laser beam is appropriately controlled, the beam output timing is appropriately controlled, and / or the output beam waveform is appropriately controlled. In one example, the number of beam divisions is expanded, and / or the use of non-stable and / or non-preferred zones in the time divider is avoided while suppressing the energy loss.

[0022] In one example, in a first span on the time axis, a time-divided beam from the front-position time divider 70 enters the rear-position time divider 50, and the stable zone and / or the preferred zone of the rear-position time divider 50 are used specifically and / or preferentially. On the other hand, in a second span on the time axis, the time-divided beam from the front-position time divider 70 does not substantially enter the rear-position time divider 50, and the use of the non-stable zone and / or the non-preferred zone of the rear-position time divider 50 is avoided. For example, the time-divided beam is alternately supplied to the first time divider 50 and the second time divider 50 at the rear position, thereby avoiding the use of the non-stable zone and / or the non-preferred zone of the time divider 50 while using the beam substantially continuously. In other words, each of the multiple time dividers 50 at the rear position has a stable zone (preferred zone) and a non-stable zone (non-preferred zone). The multiple time dividers 50 at the rear position are driven so that the stable states when driven have different timings from each other. The time-shared beams from the time-shared divider 70 in the front position are distributed so as to match the stable states of each time-shared divider 50 in the rear position.

[0023] In a particular embodiment, the output module 30 comprises an optical fiber. The optical fiber is configured to receive the multiple time-shared beams from the time divider 50 or the sub-divider 70. In one example, there is one optical fiber for one output module 30. In another example, there are multiple optical fibers for one output module 30. In this example, multiple time-shared beams from multiple optical fibers enter one output module 30.

[0024] In a particular embodiment, the laser beam system has a plurality of output modules 30. Each of the plurality of output modules 30 includes a fiber. For example, a time-shared beam with a first timing is provided to a first optical fiber, and a time-shared beam with a second timing is provided to a second optical fiber. In one example, one optical fiber is provided for each of the plurality of output modules 30. In another example, multiple optical fibers are provided for each of the plurality of output modules 30. In this example, multiple time-shared beams from multiple optical fibers are incident on each of the plurality of output modules 30.

[0025] Fig. 3 is a diagram showing an example of pulsed laser beam synthesis control. Fig. 4 is a diagram showing an example of CW laser beam synthesis control. Fig. 5 and Fig. 6 are diagrams showing examples of output beams. In each example, a power-controlled laser beam is output from the laser beam system.

[0026] In one example, a plurality of laser beams emitted from a plurality of light sources 20 are combined. The combination can be performed by an optical system including a lens, a beam splitter, a half, a mirror, or the like. The combined laser beams are incident on a time division unit 50, and a combined beam (a combined beam of a first pulse) corresponding to a first repeat timing is guided to a first optical fiber 80 via the time division unit 50 (FIG. 3(b), FIG. 4(b)). A combined beam (a combined beam of a second pulse) corresponding to a second repeat timing is guided to a second optical fiber 80 via the time division unit 50 (FIG. 3(c), FIG. 4(c)). A combined beam (a combined beam of a third pulse) corresponding to a third repeat timing is guided to a third optical fiber 80 via the time division unit 50 (FIG. 3(d), FIG. 4(d)). A combined beam (a combined beam of a fourth pulse) corresponding to a fourth repeat timing is guided to a fourth optical fiber 80 via the time division unit 50 (FIG. 3(e), FIG. 4(e)). The composite beam corresponding to the fifth repetition timing (fifth pulse composite beam) is guided to the fifth optical fiber 80 via the time division multiplexer 50 (FIGS. 3(f) and 4(f)). The first, second, third, fourth, and fifth repetition timings are time-shifted in sequence. This allows a high-energy (high-power) composite beam to be guided to each optical fiber 80. For example, in the output module 30 having the SLM 60, the composite beam is guided to the optical fiber 80 in accordance with the relatively slow operating timing of the SLM 60.

[0027] In another example, by applying a combination of time division and synthesis, the output powers of the multiple output modules 30 can be controlled to be different from each other. For example, a relatively high energy (high power) beam is output from the first output module 30 (FIG. 5(a)). A medium energy (medium power) beam is output from the second output module 30 (FIG. 5(b)). A relatively low energy (low power) beam is output from the third output module 30 (FIG. 5(c)).

[0028] In yet another example, a combination of time division and combining is applied to appropriately control the output beam waveform from one or more output modules 30 (FIGS. 6(a) and (b)) and / or the beam output timing from one or more output modules 30 (FIG. 6(c)).

[0029] In a specific embodiment, a rotation device (rotary switch) is applied as the time divider 50. The rotation device 50 is rotationally controlled by the controller 40 and configured to divide the laser beam in time.

[0030] In one example, a polygon mirror device is applied as the rotating device 50 (FIG. 7). A beam from the laser light source 20 is reflected by each of the multiple reflecting surfaces 52 of the polygon mirror 51 in the polygon mirror device 50. Each of the multiple output modules 30 has an optical fiber 80 having an entrance portion. In the polygon mirror device 50, the beam is divided in time according to the rotation angle of the polygon mirror 51. The beam reflected by the polygon mirror 51 heads toward one of the entrance portions (incident surfaces) of the multiple optical fibers 80 according to the rotation angle of the polygon mirror 51. That is, the angle of the reflecting surface of the polygon mirror 51 with respect to the beam changes as the polygon mirror 51 rotates, and the destination of the beam reflected by the reflecting surface changes with time. Therefore, the first pulse beam from the laser light source 20 is incident on the first optical fiber, and the second pulse beam is incident on the second optical fiber whose position is different from that of the first optical fiber. A large number of optical fibers 80 can be arranged for one polygon mirror 51. The time-division beam from the polygon mirror 51 is distributed to one of the multiple optical fibers 80. In other words, the polygon mirror 51 switches the optical fiber into which the beam is incident. In other words, the polygon mirror 51 switches the position of the optical path of the beam. At least one lens 85, 86 is arranged between the polygon mirror 51 and the optical fiber 80 as necessary (FIG. 8). For example, when the inlet (incident surface) of the optical fiber 80 and the reflecting surface of the polygon mirror 51 are conjugate, the deviation (positional deviation) of the incident position of the beam to the optical fiber 80 based on the rotation of the polygon mirror 51 is suppressed. Note that a slight change in the incident angle of the beam to the optical fiber 80 based on the rotation of the polygon mirror 51 is advantageous for suppressing speckles. Instead of a pulse beam, a CW beam can also be applied to this embodiment.

[0031] In another example, a disk-type optical switch device is applied as the rotating device 50 (FIG. 9). In the disk-type optical switch device 50, a beam is divided in time according to the rotation angle of the rotating plate 55. For example, a beam from the laser light source 20 is reflected or transmitted by the optical surfaces 56 and 57 of the rotating plate 55 in the optical switch device 50 according to the rotation angle of the rotating plate 55 (FIG. 9(a)). The rotating plate 55 has a transmitting surface 56 and a reflecting surface 57 arranged in the circumferential direction. For example, the beam transmitted through the rotating plate 55 heads toward the first path "A", and the beam reflected by the rotating plate 55 heads toward the second path "B" (FIG. 10). Also, for example, the beam from the laser light source 20 is reflected in different directions by the optical surfaces 56 and 57 of the rotating plate 55 in the optical switch device 50 according to the rotation angle of the rotating plate 55 (FIG. 9(b)). The rotating plate 55 has a first reflecting surface 56 and a second reflecting surface 57 whose orientations are different from each other. For example, the beam reflected by the first reflecting surface 56 of the rotating plate 55 travels along the first path "A", and the beam reflected by the second reflecting surface 57 of the rotating plate 55 travels along the second path "B". Also, for example, the beam from the laser light source 20 is reflected at different height positions of the rotating plate 55 depending on the rotation angle of the rotating plate 55 (FIG. 9(c)). The rotating plate 55 has the first reflecting surface 56 and the second reflecting surface 57 that are at different height positions in the rotation axis direction. For example, the beam reflected by the first reflecting surface 56 of the rotating plate 55 travels along the first path "A", and the beam transmitted through the first reflecting surface of the rotating plate 55 and reflected by the second reflecting surface 57 travels along the second path "B". Note that the number of beam splits in the rotary optical switch device 50 is not limited to two. The number of splits can be three, four, five, six, seven, eight, nine, ten, or more. For example, the rotating plate 55 can have three or more reflecting surfaces that are oriented in different directions.

[0032] In a specific embodiment, the above-mentioned disk-type optical switch device is applied as the sub-divider (dynamic time divider) 70, and the polygon mirror device is applied as the time divider (dynamic time divider) 50 (FIG. 11). In this embodiment, the use of the corners of the polygon mirror 51 as the non-stable and / or non-preferred zones 59 can be avoided. For example, in a first span on the time axis, the beam from the optical switch device 70 travels to a first position in the reflecting surface 52 of the polygon mirror device 50 via a path "A", and is specifically and / or preferentially reflected and time-divided by the stable zone 58 of the polygon mirror 51 (reflecting surface 52A). In a second span on the time axis, the beam from the optical switch device 70 travels to a reflecting surface 52B different from the reflecting surface 52A of the polygon mirror device 50 via a path "B", and is specifically and / or preferentially reflected and time-divided by the stable zone 58 of the polygon mirror 51 (reflecting surface 52B). A beam is alternately supplied to the reflecting surface 52A and the reflecting surface 52B of the polygon mirror 51. In the first time span, the beam does not enter the reflecting surface 52B, and the use of the unstable zone (corner portion) 59 of the polygon mirror 51 (reflecting surface 52A), that is, the portion (boundary portion) where the reflecting surfaces forming the polygon mirror 51 intersect, is avoided. In the second time span, the beam does not enter the reflecting surface 52A, and the use of the unstable zone (corner portion) 59 of the polygon mirror 51 (reflecting surface 52B) is avoided. By allocating the time-division beam, the beam is substantially continuously used, and the use of the unstable zone in the polygon mirror 51 (time divider 50) is avoided. The details of the avoidance of the use of the unstable zone in the polygon mirror 51 (time divider 50) will be described later. The reflecting surface 52A and the reflecting surface 52B are changed over time by the rotation of the polygon mirror 51. That is, the reflecting surface 52A is a surface through which the beam enters the polygon mirror device 50 via path "A". Moreover, the reflecting surface 52B is a surface through which the beam enters the polygon mirror device 50 via path "B".

[0033] In a specific embodiment, an electro-optic modulator (EOM, EO) is applied as the time divider 50, and a polarizing beam splitter (PBS) is applied as the sub-divider (static divider) 70 (FIG. 12). In one example, the EOM 50 and the PBS 70 are arranged in order on the optical axis along the traveling direction of the beam. In this form, the beam from the EOM 50 is split into multiple beams by the PBS 70 according to the wavelength band. For example, the p-polarized beam of the time-divided beam from the EOM 50 is transmitted through the PBS 70. The s-polarized beam of the time-divided beam from the EOM 50 is reflected by the PBS 70.

[0034] In a specific embodiment, an electro-optic modulator (EOM, EO) is applied as the sub-divider (dynamic time-divider) 70, a polarizing beam splitter (PBS) is applied as the sub-divider (static time-divider) 70, and a plurality of polygon mirror devices are applied as the time-divider 50 (FIG. 13). The polygon mirrors 51A and 51B of the plurality of polygon mirror devices are arranged so as to be in a parallel positional relationship with respect to the optical path. In one example, the EOM 70, the PBS 70, and the polygon mirror 50 are arranged in order on the optical axis along the traveling direction of the beam. In this embodiment, the beam from the EOM 70 is branched by the PBS 70 according to the wavelength band. The p-polarized beam transmitted through the PBS 70 is time-divided by the first polygon mirror 51A, and the s-polarized beam reflected by the PBS 70 is time-divided by the second polygon mirror 51B.

[0035] In a specific embodiment, the laser beam system further comprises an aperture device 90 arranged optically between the time divider 50 (or sub-divider 70) and the optical fiber 80 (or output module 30) (FIG. 14). The aperture device 90 has an aperture 91, and the area of ​​the aperture through which the beam passes is controlled by the controller 40. The aperture 91 has a plurality of apertures. In this embodiment, for example, among the beams from the time divider 50, the beam that passes through the first aperture of the aperture 91 enters the first fiber as a first time-shared beam, and the beam that passes through the second aperture enters the second fiber as a second time-shared beam. In addition, the light amount of each time-shared beam is adjusted by controlling the opening area of ​​the aperture 91. This embodiment is preferably applied to beams such as CW laser beams having a relatively long emission time.

[0036] In one embodiment, the laser beam system is applied to a photolithography system for manufacturing devices (electronic devices or microdevices) such as semiconductor elements, liquid crystal display elements, and organic EL elements. In one example, a one-shot exposure type exposure apparatus such as a stepper, or a scanning exposure type exposure apparatus such as a scanning stepper is used. For example, in the exposure apparatus, a predetermined pattern is formed in each shot area of ​​a substrate such as a wafer or a glass plate via a projection optical system.

[0037] In one example of an exposure apparatus, a pattern formed on a mask (or a reticle) held on a mask stage is transferred onto a substrate by irradiating the substrate with exposure light via a projection optical system.

[0038] In another example of an exposure apparatus, instead of a mask, spatial light modulators (SLMs) are used to generate a variable pattern in the object plane of the projection optics (maskless exposure apparatus).

[0039] With regard to at least a portion of the configuration of various exposure apparatuses, the disclosures of, for example, US2009 / 0117494A1, US2010 / 0099049A1, US2013 / 0222781A1, US2013 / 0278912A1, US2013 / 0314683A1, US2014 / 0320835A1, US2015 / 0077732A1, and US6552775B1 may be incorporated by reference into this specification.

[0040] In a specific embodiment, the laser beam system is applied to an exposure apparatus as a photography system for manufacturing flat panel displays (such as liquid crystal displays and organic electroluminescence displays).

[0041] 15 and 16 are diagrams showing a schematic configuration of one embodiment of a maskless exposure apparatus 1000. The exposure apparatus 1000 includes a light source module 1100 including a laser light source 20, a distribution module (combining and distribution module) 1200 including a time divider 50 and a sub-divider 70, an illumination system 1300 including an output module (including an optical fiber 80, an illumination optical system (illumination system) 1310, an SLM 60, and a projection optical system (projection lens) 1330) 30, a substrate stage 1400 on which a substrate (workpiece) 1410 is mounted, and a control system 1500 including a controller 40 and a data transmission unit.

[0042] In FIG. 15 and FIG. 16, the light source module 1100 emits a laser beam of optical energy. The beam from the light source module 1100 is incident on the illumination system 1310 via the distribution module 1200. The beam from the illumination system 1310 illuminates the SLM 60. The controller 40 generates pattern data based on an exposure pattern to be formed on the substrate 1410. The controller 40 transmits the pattern data to the SLM 60 and controls the SLM 60. The SLM 60 is controlled by the controller 40 and guides the beam from the illumination system to the substrate 1410 based on the pattern data (also simply expressed as image data or image). The projection lens 1330 projects the beam from the SLM 60 onto the substrate 1410 and forms an image on a predetermined area on the substrate 1410. When an exposure pattern is formed on the substrate 1410 by a plurality of SLMs 60, the controller 40 divides the generated pattern data for each SLM 60 and transmits the divided pattern data to each SLM 60.

[0043] In a scanning exposure apparatus using an SLM, a laser beam is emitted while a substrate stage 1400 on which a substrate is placed is moving, and the laser beam is guided to the SLM via an illumination optical system 1310. It is preferable that an image formed on the SLM is exposed by one emission of the laser beam. If an image formed on the SLM is exposed by two or more emissions of the laser beam, the same pattern data is projected onto the substrate for each emission. Since the substrate 1410 is also moving between the emissions of the laser beam by the substrate stage 1400, when the same pattern data is projected onto the substrate, the image is exposed as if it were flowing. If the scanning speed is increased to improve throughput, the moving distance between the emissions of the laser beam becomes longer, and the image flows more. To prevent the image from flowing while increasing the scanning speed to improve throughput, the time for one emission must be shortened. If the time for one emission is short, the energy of the laser beam irradiated onto the substrate 1410 via the SLM becomes low, and there is a possibility that the exposure energy is insufficient and exposure failure (photosensitivity failure) occurs. In general, the operating frequency of an SLM (e.g., image update frequency) is lower than the light emission repetition frequency (oscillation frequency) of a laser beam, for example, several kHz to several tens of kHz. In the comparative example of FIG. 17, the laser beam is 50 kHz (10 W) and the SLM is 10 kHz. As shown in the comparative examples of FIG. 17 and FIG. 18(a), a low oscillation frequency is desired to prevent image bleeding, and a high-energy light source that does not cause exposure defects is desired, but when wavelength conditions are also taken into consideration, the options for laser light sources are currently extremely limited. The above values ​​are merely examples, and the present invention is not limited thereto.

[0044] In one embodiment, as described above with reference to Figs. 3 and 4, a combination of synthesis and time division of multiple beams realizes a low-frequency, high-energy beam output. In the example of Fig. 18(b), the distribution module 1200 synthesizes and time-divides beams from five light sources 20. The beams emitted from the five light sources at a frequency of 50 kHz are synthesized to become a high-energy beam. The synthesized beam (50 kHz, high energy) is time-divided and guided by the distribution module 1200 to the five SLMs 60 (and the five projection lenses 1330). Therefore, a high-energy beam with a frequency of 10 kHz reaches each of the first to fifth SLMs. In both the comparative example of Fig. 18(a) and the example of Fig. 18(b), a total of 50 W light sources are used in five modules. In the comparative example of Fig. 17, the laser beam is 50 kHz (10 W) and the SLM is 10 kHz, so the light is distributed (distributed, switched) to five SLMs by distribution module 1200. The oscillation frequency of the laser beam is preferably an integer multiple of the image update frequency of the SLM. In other words, distribution module 1200 distributes the laser beam to the integer multiple number of SLMs. The above values ​​are merely examples, and the present invention is not limited thereto.

[0045] In one example, the intensity (e.g., pulse energy, average power) E2 of the laser beam irradiated to one SLM is equal to or greater than the intensity (e.g., pulse energy, average power) E1 of the laser beam emitted from one laser light source. For example, E2 / E1 can be about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30, 35, 40, 45, 50, 100 or more. In addition, the frequency (irradiation frequency) F2 of the beam irradiated to one SLM or the image update frequency F3 of the SLM is lower than the light emission repetition frequency (oscillation frequency, light source frequency) F1 of the laser light source. For example, F2 / F1 (or F3 / F1) can be about 1 / 2, 1 / 3, 1 / 4, 1 / 5, 1 / 6, 1 / 7, 1 / 8, 1 / 9, 1 / 10, 1 / 11, 1 / 12, 1 / 13, 1 / 14, 1 / 15, 1 / 16, 1 / 17, 1 / 18, 1 / 19, 1 / 20, 1 / 25, 1 / 30, 1 / 35, 1 / 40, 1 / 45, 1 / 50, 1 / 100 or less.

[0046] Alternatively, the combination of synthesis and time division of multiple beams can also be applied to a system (e.g., an exposure apparatus) that does not include an SLM, as shown in Fig. 19. In the example of Fig. 19 (exposure apparatus 1000), multiple time-divided beams (multiple distributed beams) are generated for each predetermined span on the time axis. A relatively low-frequency, high-energy beam is supplied to each of multiple modules 30.

[0047] As described above, the number of output modules 30 (distribution number) can be set arbitrarily. In the example of Fig. 20, the distribution module 1200 combines and time-shares beams from four light sources 20. The time-shared beams are supplied to four SLMs 60 (modules 30), respectively.

[0048] In the example of Fig. 21, the line width of the pattern is 2 μm, and the scanning speed is 400 mm / s. For example, when 10% of the line width of the pattern is allowed, the required light emission time is within 0.5 μs. The above values ​​are merely examples, and the present invention is not limited to these.

[0049] In the comparative example of FIG. 22(a), the operating frequency (image update frequency) of the SLM is 10 kHz. In the same specifications as the example of FIG. 21, 10 kHz corresponds to 100 μs. In a CW light source, when the required light emission time is 0.5 μs, if the SLM is irradiated with a beam after 0.5 μs, the image on the SLM has not been updated, so the same projected image is formed on the moving substrate 1410, and as described above, the image appears to be blurred. In order to prevent the image from blurring, the beam is blocked, for example, in the optical path from the CW light source to the SLM so that the beam is not irradiated to the SLM from 0.5 μs until the image on the SLM is next updated. In this case, the time from 0.5 μs until the image on the SLM is next updated is essentially a pause time. In this comparative example, the substrate 1410 is exposed to only 1 / 200 of the energy from the light source.

[0050] Similarly, in the comparative example of FIG. 22(b), the operating frequency (image update frequency) of the SLM is 10 kHz. Of the beams from the pulsed light source, only the beams with timings when the SLM and the pulsed light source are synchronized can be used. In this comparative example, when the frequency of the light source is 400 kHz, the operating frequency of the SLM / light source frequency=1 / 40, and only 1 / 40 of the energy from the light source is used. In other words, only one pulse out of 40 pulses oscillated from the pulsed light source irradiates the SLM, in other words, 39 pulses do not irradiate the SLM, and these 39 pulses do not contribute to the exposure of the substrate 1410. Therefore, in the comparative example of FIGS. 22(a) and (b), there is a possibility that exposure energy is insufficient and exposure failure (photosensitivity failure) occurs. The above values ​​are merely examples, and the present invention is not limited thereto.

[0051] In the example of FIG. 23, the time-shared beam from the distribution module 1200 is guided to a plurality of SLMs 60 (projection lenses 1330) including a first, second, and third SLM in a non-scanning direction (non-scanning direction, Y direction) intersecting with a scanning direction (scanning direction, X direction) in which the substrate 1410 is moved during exposure. The first, second, and third SLMs are arranged side by side in a non-scanning direction intersecting with a scanning direction in which the substrate 1410 is moved during exposure. The timing at which the beam is irradiated to the second SLM is different from the timing at which the beam is irradiated to the first SLM. Similarly, the irradiation timing of the third SLM is different from the irradiation timing of the first and second SLMs. For example, the irradiation timing is shifted sequentially in time in the plurality of SLMs 60. As a result, the substrate 1410 can be exposed by distributing the energy from the light source not contributing to the exposure shown in the comparative example of FIG. 22(a) and (b) to different SLMs.

[0052] As shown in Fig. 24, in an exposure apparatus, when the irradiation timing is different between multiple SLMs, the images on the SLMs are updated at the same timing, and the projection position (exposure position) of the pattern may shift depending on the difference in the timing of beam irradiation. For example, the projection position of the second pulse corresponding to the second SLM (SLM(2)) shifts in the scanning direction compared to the first pulse corresponding to the first SLM (SLM(1)). Also, the projection position of the third pulse corresponding to the third SLM (SLM(3)) shifts further in the scanning direction compared to the second pulse corresponding to the second SLM (SLM(2)).

[0053] As shown in FIG. 25, by adjusting the exposure apparatus mechanically and / or optically, the shift in the projection position (exposure position) of the pattern is compensated even when the irradiation timing is different between the multiple SLMs. In one example, the shapes, mounting positions, and / or attitudes of the multiple SLMs are mechanically set so that the projected images from the multiple SLMs have a predetermined positional relationship based on the deviation in the irradiation timing for the multiple SLMs. Alternatively and / or additionally, the exposure apparatus is optically set so that the projected images from the multiple SLMs have a predetermined positional relationship based on the deviation in the irradiation timing for the multiple SLMs. For example, the position of the projected image on the substrate 1410 is moved by adjusting an optical element in the projection optical system (projection lens) 1330, or the position of the projected image on the substrate 1410 is moved by moving the SLM relative to the beam.

[0054] As shown in FIG. 26, by adjusting the pattern drawing data supplied to the multiple SLMs, the shift in the projection position (exposure position) of the pattern is compensated even if the irradiation timing is different between the multiple SLMs. For example, data corresponding to the projection positions sequentially shifted in the scan direction is supplied to the multiple SLMs. In one example, based on the difference in the irradiation timing for the multiple SLMs, at least a part of the pattern data is corrected so that the projected images from the multiple SLMs have a predetermined positional relationship. For example, the pattern data supplied to at least one of the multiple SLMs includes correction data shifted in a predetermined direction with respect to a reference position set based on the difference in the irradiation timing. Alternatively and / or additionally, the pattern data may be shifted in a predetermined direction with respect to a reference position based on at least one of the moving speed of the substrate stage 1400, the display update frequency of the SLM, the oscillation frequency of the laser beam, the rotation speed of the polygon mirror device (rotating device) 50 as a time divider, the number of SLMs 60 (projection lenses 1330), etc.

[0055] 27, in an exposure apparatus in which the scanning direction (e.g., the movement direction of the substrate stage) is switched between the positive and negative directions (between one direction and its reverse direction) to expose one pattern onto a substrate 1410, pattern data supplied to multiple SLMs can be adjusted according to the scanning direction at the corresponding timing. For example, the pattern data supplied to at least one of the multiple SLMs includes first correction data shifted in the positive scanning direction with respect to a reference position, and second correction data shifted in the negative scanning direction with respect to the reference position.

[0056] Alternatively and / or additionally, in an exposure apparatus in which the scanning direction (e.g., the direction of movement of the substrate stage) switches between a + direction and a - direction (between one direction and its reverse direction), the exposure apparatus may be mechanically and / or optically adjusted each time the scanning direction switches.

[0057] As shown in FIG. 28, the exposure apparatus (optical apparatus) 1000 can include a drive mechanism 1510 for mechanical adjustment, and a drive mechanism 1520 for optical adjustment. The exposure apparatus 1000 can also include a database 1530 (or a storage unit) in which setting parameters and / or programs for data correction are stored. Such shift adjustment can be performed, for example, based on the output result of a reference system 1540 including a reference sensor or the like. Note that when the SLM is attached to the exposure apparatus 1000, if the attachment position is shifted in advance, the drive mechanism 1510 can be omitted. Also, even if the attachment position of the SLM is shifted in advance, the drive mechanism 1510 may be used to compensate for attachment errors.

[0058] In one example of the exposure apparatus 1000 in which the timings at which the beams are irradiated differ between the multiple SLMs, the control system 1500 can control at least one of (a-1) mechanical adjustment of the exposure apparatus 1000 using the driving mechanism 1510, (a-2) optical adjustment of the exposure apparatus 1000 using the driving mechanism 1520, and (a-3) correction of the pattern data using the database 1530, based on the irradiation timings of each of the multiple SLMs. For example, a shift adjustment that combines all of the above (a-1), (a-2), and (a-3) is performed. Alternatively, a shift adjustment based on a combination of one or two of the above (a-1), (a-2), and (a-3) is performed. In one example, the correction of the pattern data is applied to a relatively large shift adjustment and / or a relatively coarse shift adjustment, and the mechanical and / or optical adjustment is applied to a relatively small shift adjustment and / or a relatively fine shift adjustment. In another example, another method different from the above may be applied.

[0059] Alternatively and / or additionally, the shift adjustment may be performed based on the timing of using the beam. Even if a certain period (e.g., unused pulse) occurs during which the beam is unused, the shift adjustment compensates for the shift of the projection position (exposure position) of the pattern. For example, while avoiding the shift of the projection position of the pattern, a beam in a relatively unstable period is unused and a stable beam is selectively used.

[0060] In one embodiment, as shown in FIG. 29, the exposure apparatus 1000 includes a plurality of laser light sources 20, a plurality of output modules 30 each having a plurality of SLMs 60, and a polygon mirror device (rotating device) 50 disposed between the plurality of laser light sources 20 and the output module 30 as a time divider for dividing the laser beams emitted and synthesized from the plurality of laser light sources 20 in time. The beams from the laser light sources 20 are reflected by each of a plurality of reflecting surfaces 52 of a polygon mirror 51 in the polygon mirror device 50. The beams are divided in time according to the rotation angle of the polygon mirror 51. The beams reflected by the polygon mirror 51 are distributed to a plurality of SLMs 60 via a plurality of optical fibers 80 according to the rotation angle of the polygon mirror 51. In one example, the time-divided beams from the polygon mirror 51 are distributed to five SLMs 60. For example, beams corresponding to a first pulse, a sixth pulse, etc. are incident on the first SLM. Beams corresponding to the second pulse, the seventh pulse, etc. are incident on the second SLM.

[0061] In one embodiment, as shown in FIG. 30, the exposure apparatus 1000 includes a plurality of laser light sources 20, a plurality of output modules 30 each having a plurality of SLMs 60, a polygon mirror device (rotating device) 50 as a time divider arranged between the plurality of laser light sources 20 and the plurality of output modules 30 and dividing the laser beams emitted from the plurality of laser light sources 20 and synthesized in time, and an optical switch device 70 as a sub-divider 70 arranged between the plurality of laser light sources 20 and the polygon mirror device 50. In one example, in a first span on the time axis, a beam from the optical switch device 70 travels through a path "A" toward a first position of the polygon mirror device 50 and is reflected by the polygon mirror 51 (reflection surface 52A). In a second span on the time axis, a beam from the optical switch device 70 travels through a path "B" toward a second position of the polygon mirror device 50 and is reflected by the polygon mirror 51 (reflection surface 52B). Beams are alternately supplied to the first and second positions of the polygon mirror 51. The beam is further divided in time according to the rotation angle of the polygon mirror 51. That is, in this example, two time dividers are arranged in series along the optical path, and the beam is divided in time into two stages. In one example, the time-divided beam from the polygon mirror 51 is distributed to ten SLMs 60. For example, beams corresponding to the first pulse, the eleventh pulse, etc. are incident on the first SLM. Beams corresponding to the second pulse, the twelfth pulse, etc. are incident on the second SLM. In other words, the beam reflected by the reflecting surface 52A of the polygon mirror 51 is guided to the first SLM group (the first SLM to the fifth SLM in FIG. 30), and the beam reflected by the reflecting surface 52B is guided to the second SLM group (the sixth SLM to the tenth SLM in FIG. 30).

[0062] In one embodiment, as shown in FIG. 31, the exposure apparatus 1000 includes a plurality of laser light sources 20, a plurality of output modules 30 each having a plurality of SLMs 60, a plurality of polygon mirror devices (rotating devices) 50 arranged between the plurality of laser light sources 20 and the plurality of output modules 30 as a time divider for dividing the laser beams emitted from the plurality of laser light sources 20 and combined in time, and an optical switch device 70 arranged between the plurality of laser light sources 20 and the plurality of polygon mirror devices 50 as a sub-divider. The plurality of polygon mirrors 51A and 51B of the plurality of polygon mirror devices 50 are arranged so as to have a parallel positional relationship with respect to the optical path. In one example, in a first span on the time axis, the beam from the optical switch device 70 travels toward the polygon mirror 51A and is reflected by the reflecting surface of the polygon mirror 51A. In a second span on the time axis, the beam from the optical switch device 70 travels toward the polygon mirror 51B and is reflected by the reflecting surface of the polygon mirror 51B. The beam is further divided in time according to the rotation angles of the polygon mirrors 51A and 51B. In one example, the time-shared beam from polygon mirror 51A is distributed to five SLMs 60. The time-shared beam from polygon mirror 51B is distributed to another five SLMs 60. For example, beams corresponding to the first pulse, the eleventh pulse, etc. are incident on the first SLM. Beams corresponding to the sixth pulse, the sixteenth pulse, etc. are incident on the sixth SLM. In other words, the beam reflected by polygon mirror 51A is guided to the first SLM group (the first SLM to the fifth SLM in FIG. 31), and the beam reflected by polygon mirror 51B is guided to the second SLM group (the sixth SLM to the tenth SLM in FIG. 30).

[0063] In one embodiment, as shown in FIG. 32, the exposure apparatus 1000 includes a plurality of laser light sources 20, a plurality of output modules 30 having a plurality of SLMs 60, a plurality of optical switch devices 50 arranged between the plurality of laser light sources 20 and the plurality of output modules 30 as a time divider for dividing the laser beams emitted from the plurality of laser light sources 20 and combined in time, and an optical switch device 70 arranged between the plurality of laser light sources 20 and the plurality of optical switch polygon mirror devices 50 as a sub-divider. The plurality of optical members 55A, 55B, and 55C of the plurality of optical switch devices 50 are arranged so as to have a parallel positional relationship with respect to the optical path. In one example, in a first span on the time axis, the beam from the optical switch device 70 is directed to the optical member 55A and is time-divided by the optical member 55A. In a second span on the time axis, the beam from the optical switch device 70 is directed to the optical member 55B and is time-divided by the optical member 55B. In the third span on the time axis, the beam from the optical switch device 70 travels toward the optical member 55C and is time-divided by the optical member 55C. In one example, the time-divided beam from the optical member 55A is distributed to three SLMs 60. The time-divided beam from the optical member 55B is distributed to another three SLMs 60. The time-divided beam from the optical member 55C is further distributed to another three SLMs 60. For example, beams corresponding to the first pulse, the tenth pulse, etc. are incident on the first SLM. Beams corresponding to the fourth pulse, the thirteenth pulse, etc. are incident on the fourth SLM. Beams corresponding to the seventh pulse, the sixteenth pulse, etc. are incident on the seventh SLM. In other words, the time-shared beam by optical element 55A is guided to the first SLM group (the first to third SLMs in Figure 32), the time-shared beam by optical element 55B is guided to the second SLM group (the fourth to sixth SLMs in Figure 32), and the time-shared beam by optical element 55C is guided to the third SLM group (the seventh to ninth SLMs in Figure 32).

[0064] In one embodiment, as shown in FIG. 33, the exposure apparatus 1000 includes a laser light source 20, a plurality of SLMs 60, a plurality of polygon mirrors 51A, 51B, and 51C as time dividers arranged between the laser light source 20 and the plurality of SLMs 60, and a plurality of optical switch devices 70 (optical members 75A and 75B) as sub-dividers arranged between the laser light source 20 and the plurality of polygon mirrors 51A, 51B, and 51C. For example, the optical members 75A and 75B are rotating plates in which reflection areas and transmission areas are arranged side by side in the circumferential direction. In one example, a beam reflected by the optical member 75A in a first span on the time axis travels toward the polygon mirror 51A and is reflected by the reflection surface of the polygon mirror 51. In a second span on the time axis, a beam transmitted through the optical member 75A and reflected by the optical member 75B travels toward the polygon mirror 51B and is reflected by the reflection surface of the polygon mirror 51B. In the third span on the time axis, the beam transmitted through optical member 75B travels toward polygon mirror 51C and is reflected by the reflecting surface of polygon mirror 51C. The beam is further divided in time according to the rotation angles of polygon mirrors 51A, 51B, and 51C. The slight change in the incidence angle of the beam based on the rotation of polygon mirrors 51A-51C is advantageous in suppressing speckle.

[0065] In one embodiment, as shown in Fig. 34, the exposure apparatus 1000 includes a plurality of laser light sources 20, a plurality of SLMs 60, a plurality of polygon mirrors 51A, 51B, 51C, 51D, 51E, and 51F as time dividers arranged between the plurality of laser light sources 20 and the plurality of SLMs 60, and a plurality of optical switch devices 70 (optical members 75A, 75B, 75C, 75D, 75E, and 75F) as sub-dividers arranged between the plurality of laser light sources 20 and the plurality of polygon mirrors 51A-51F. For example, the optical members 75A-75F are AOMs (acousto-optic modulators). In one example, in a first span on the time axis, the beam branched by the optical member 75C heads toward the polygon mirror 51C, and the beam branched by the optical member 75F heads toward the polygon mirror 51F. In a second span on the time axis, the beam split by optical member 75B travels toward polygon mirror 51B, and the beam split by optical member 75E travels toward polygon mirror 51E. In a third span on the time axis, the beam split by optical member 75A travels toward polygon mirror 51A, and the beam split by optical member 75D travels toward polygon mirror 51D. The beam is further split in time according to the rotation angles of polygon mirrors 51A-51F. A slight change in the incidence angle of the beam based on the rotation of polygon mirrors 51A-51F is advantageous in suppressing speckle.

[0066] 35, the substrate 1410 is sequentially exposed to beams from multiple output modules in accordance with the timing of pulsed light emission. That is, multiple patterns are sequentially projected onto the substrate 1410 based on the beams from the multiple output modules (1, 2, 3, ... n) in accordance with the timing of pulsed light emission.

[0067] In one embodiment, the exposure apparatus 1000 includes a master clock (oscillator that generates a master clock) 4010 that serves as a reference for synchronization, as shown in Fig. 36. In the exposure apparatus 1000 of Fig. 36, at least each device of the laser light source 20, the time divider (e.g., polygon mirror device) 50, the sub-divider (e.g., optical switch device) 70, the SLM (e.g., DMD) 60, and the substrate stage 1400 is driven based on the master clock 4010. As shown in Fig. 37, an origin sensor 4020 is provided in each device as necessary.

[0068] 37, the control system 1500 obtains information about the rotation of the polygon mirror 51 based on output data from the origin sensor 4020. The control system 1500 can control each device based on information from each device and information from the master clock 4010.

[0069] 38, the control system 1500 adjusts the number of rotations of the polygon mirror 51 based on the rotation information of the polygon mirror 51 so as to match the clock frequency of the master clock 4010. Furthermore, the control system 1500 adjusts the phase of the polygon mirror 51 so as to match the clock timing of the master clock 4010. As a result, the rotation of the polygon mirror 51 is controlled in synchronization with the master clock 4010. The sub-divider (optical switch device 70) (FIG. 36) can also be adjusted in a similar manner.

[0070] Furthermore, the control system 1500 can control a trigger signal for starting image display in the SLM 60, that is, can control the image update frequency, with reference to the master clock 4010. The control system 1500 can control the operation of the substrate stage 1400 that supports the substrate with reference to the master clock 4010. The control system 1500 can also control the operation of the SLM stage 1430 that supports the SLM 60 so as to eliminate positional deviation from the substrate stage 1400. By operating the SLM stage 1430, as described above, the position of the projected image projected onto the substrate 1410 can be moved. By referring to the master clock 4010, the operation timing of each device is individually and appropriately adjusted, and the relationship of the operation timing between multiple devices is appropriately set, as shown in FIG.

[0071] Here, in the time divider 50 and the sub-divider 70, if a beam is incident on the boundary portion of the multiple regions provided for time division, the emitted beam may become unstable. For example, in the rotating plate 55 shown in Fig. 9(b) above, if a beam is incident on the top or bottom located at the boundary portion between the first reflecting surface 56 and the second reflecting surface 57, the reflected beam may be scattered or the direction of the beam may be disturbed.

[0072] 40, by appropriately controlling the rotation of the rotating plate 55 in accordance with the oscillation timing of the laser light source 20, the incidence of the beam on the boundary portion between the first reflecting surface 56 and the second reflecting surface 57 of the rotating plate 55 is avoided. For example, the rotation of the rotating plate 55 is controlled so that the optical boundary (the top or bottom) of the rotating plate 55 is located at the target irradiation position of the beam at the timing between the (n+1)th pulse and the (n+2)th pulse. This improves the utilization efficiency of the beam.

[0073] Alternatively and / or additionally, the optical boundary for division in the time divider 50 (or sub-divider 70) may be processed differently from other regions. In one example, as shown in Fig. 41, additional processing is performed near the boundary (near the bottom) between the first reflecting surface 56 and the second reflecting surface 57 of the rotating plate 55. For example, additional processing with relatively high accuracy is performed near the boundary of the rotating plate 55. Based on the high surface accuracy in the region near the optical boundary, the beam utilization efficiency is improved.

[0074] In the example of FIG. 41, steps 55A and 55B are formed as traces of additional processing near the boundary (near the bottom) between the first reflecting surface 56 and the second reflecting surface 57 of the rotating plate 55. By appropriately controlling the rotation of the rotating plate 55 according to the oscillation timing of the laser light source 20, the incidence of the beam on the steps 55A and 55B of the rotating plate 55 is avoided. For example, the rotation of the rotating plate 55 is controlled so that the step 55A of the rotating plate 55 is located at the target irradiation position of the beam at the timing between the (n)th pulse and the (n+1)th pulse. In addition, the rotation of the rotating plate 55 is controlled so that the step 55B of the rotating plate 55 is located at the target irradiation position of the beam at the timing between the (n+2)th pulse and the (n+3)th pulse.

[0075] In one embodiment, an exposure apparatus (1000) for exposing a predetermined pattern on a substrate includes a light source (20), a spatial light modulator (60) for spatially modulating the light from the light source (20) based on pattern data describing the predetermined pattern, a projection optical system (1330) for projecting a projection image of the spatially modulated light onto the substrate, and a front projection optical system (1330) for switching the optical path of the light sequentially emitted from the light source (20) and sequentially guiding it to a plurality of the spatial modulators (60). and an optical path switcher (50, 70) that switches the optical path of the light, the optical path switcher (50, 70) having a first switcher (70) that switches the optical path to either a first optical path or a second optical path, and a second switcher (50) that guides the light guided to the first optical path to a first group of spatial light modulators (60) among a plurality of spatial light modulators, and guides the light guided to the second optical path to a second group of spatial light modulators (60) among the plurality of spatial light modulators.

[0076] In one example, the first switch (70) has a first region that guides the light oscillated from the light source (20) within a first period to the first optical path, and a second region that guides the light oscillated from the light source (20) within a second period different from the first period to the second optical path.

[0077] For example, the first region reflects the light and the second region transmits the light.

[0078] For example, the first region is inclined at a first angle with respect to the light, reflects the light and guides the light to the first optical path, and the second region is inclined at a second angle different from the first angle with respect to the light, reflects the light and guides the light to the second optical path.

[0079] In another example, the second switch (50) has a first reflective surface (52A) that reflects the light to the first group of spatial light modulators (60) and a second reflective surface (52B) that reflects the light to the second group of spatial light modulators (60).

[0080] The second switch (50) has a first switch (50, 51A) that directs the light to the first group of spatial light modulators (60), and a second switch (50, 51B) that directs the light to the second group of spatial light modulators (60).

[0081] Alternatively and / or additionally, the exposure apparatus (1000) includes a data transmission unit (1500) that transmits the pattern data to the spatial light modulator (60), the spatial light modulator (60) having a first spatial light modulator (60) and a second spatial light modulator (60) arranged side by side in a second direction intersecting a first direction in which the substrate is moved during exposure, and the data transmission unit (1500) divides the pattern data into first pattern data to be transmitted to the first spatial light modulator (60) and second pattern data to be transmitted to the second spatial light modulator (60), and relatively shifts the positions of the first pattern data and the second pattern data in the first direction.

[0082] Alternatively and / or additionally, the exposure apparatus (1000) includes a data transmitting unit (1500) that transmits the pattern data to the spatial light modulator (60), the spatial light modulator (60) having a first spatial light modulator (60) and a second spatial light modulator (60), and the data transmitting unit (1500) divides the pattern data into first pattern data that is transmitted to the first spatial light modulator (60) and second pattern data that is transmitted to the second spatial light modulator (60), and shifts the positions of the first pattern data and the second pattern data relatively.

[0083] For example, the second switch (50) is a polygon mirror.

[0084] In one embodiment, an exposure apparatus (1000) exposes a predetermined pattern to a substrate moving in a first direction via a first spatial light modulator (60) and a second spatial light modulator (60) arranged side by side in a second direction intersecting the first direction. The exposure apparatus (1000) includes a light source (20), a data transmission unit (1500) that transmits pattern data described based on the predetermined pattern to the first spatial light modulator (60) and the second spatial light modulator (60), a first projection optical system (1330) that projects a projection image of the light onto the substrate, the light being spatially modulated by the first spatial modulator (60) based on first pattern data transmitted by the transmission unit (1500), and a second projection optical system (1330) that projects a projection image of the light onto the substrate, the light being spatially modulated by the first spatial modulator (60) based on first pattern data transmitted by the transmission unit (1500), the light being spatially modulated by the first spatial modulator (60) based on first pattern data transmitted by the transmission unit (1500). the second spatial light modulator (60) that spatially modulates the light based on the second pattern data obtained by the second projection optical system (1330) that projects a projection image of the second spatially modulated light onto the substrate; and an optical path switcher (50) that switches the optical path of the light sequentially emitted from the light source (20) and guides the light to the first spatial modulator (60) and then the second spatial modulator (60), and the data transmission unit (1500) divides the pattern data into the first pattern data and the second pattern data, and relatively shifts the positions of the first pattern data and the second pattern data in the first direction.

[0085] In one example, the exposure apparatus (1000) includes an oscillator (4010) that generates a master clock that synchronizes at least two of the light source (20), the spatial light modulator (60), and the optical path switcher (50).

[0086] For example, the exposure apparatus further includes a combiner (1200) that combines the light emitted from each of the multiple light sources (20), and the optical path switcher (50) switches the optical path of the light combined by the combiner (1200).

[0087] In one embodiment, a method for manufacturing a flat panel display includes exposing the substrate using the exposure apparatus (1000) described above, and developing the exposed substrate.

[0088] In one embodiment, a device manufacturing method includes exposing the substrate using the exposure apparatus (1000) described above, and developing the exposed substrate.

[0089] Incidentally, exposure apparatus 1000 can also be used, for example, as a semiconductor photolithography system that exposes an integrated circuit pattern onto a wafer, or a photolithography system that manufactures thin-film magnetic heads.

[0090] In the above-described embodiments, a combination of multiple beam synthesis and time division has been described to realize a low-frequency, high-energy beam output, but the present invention is not limited to this. When a high-energy beam is output from a laser light source, multiple beams do not need to be synthesized.

[0091] The combination of multiple beams includes the case where the optical axes of the laser beams emitted from multiple light sources coincide and are combined, and also includes the case where the optical axes of the laser beams emitted from multiple light sources do not coincide, but the case where the optical axes are sufficiently close to each other, a high-energy beam output is generated, or the beams are combined.

[0092] The above-mentioned photolithography system can be constructed by assembling the various subsystems so that a given mechanical, electrical, and optical accuracy is maintained. To maintain the various accuracy before and after assembly, each optical system is adjusted to achieve its optical accuracy. Similarly, all mechanical and electrical systems are adjusted to achieve their mechanical and electrical accuracy. The process of assembling each subsystem into the photolithography system includes mechanical interfaces, electrical circuit wiring connections, and pneumatic piping connections between each subsystem. There is also a process of assembling each subsystem prior to assembling the photolithography system from the various subsystems. Once the photolithography system is assembled using the various subsystems, any adjustments are made to ensure that the accuracy is maintained in the complete photolithography system. Furthermore, it is desirable to manufacture the exposure system in a clean room where temperature and cleanliness are controlled.

[0093] In addition, the substrate to be exposed is not limited to a glass plate, but may be other objects such as a wafer, a ceramic substrate, a film member, or a mask blank. In addition, when the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like substrate (a flexible sheet-like member). The exposure apparatus of this embodiment is particularly effective when the object to be exposed is a substrate with a side length or diagonal length of 500 mm or more.

[0094] Electronic devices such as liquid crystal display elements (or semiconductor elements) are manufactured through a step of designing the functions and performance of the device, a step of producing a mask (or reticle) based on this design step, a step of producing a glass substrate (or wafer), a lithography step of transferring the pattern of the mask (reticle) to the glass substrate by the exposure apparatus and exposure method of each of the above-mentioned embodiments, a development step of developing the exposed glass substrate, an etching step of removing by etching exposed members other than those portions where resist remains, a resist removal step of removing the resist that is no longer needed after etching, a device assembly step, an inspection step, etc. In this case, in the lithography step, the above-mentioned exposure method is executed using the exposure apparatus of the above-mentioned embodiment, and a device pattern is formed on the glass substrate, so that highly integrated devices can be manufactured with good productivity.

[0095] The disclosed system described above is capable of achieving objectives and providing advantages, and is merely illustrative of embodiments and is not intended to be limiting to the details of construction or design. [Explanation of symbols]

[0096] 20: laser light source, 30: output module, 40: controller, 50: time division multiplexer, 51: polygon mirror, 60: spatial light modulator (SLM), 70: sub-multiplexer, 80: optical fiber, 1000: exposure apparatus (optical apparatus), 1100: light source module, 1200: distribution module, 1300: illumination system, 1310: illumination system, 1330: projection lens, 1400: substrate stage, 1410: substrate, 1500: control system

Claims

1. a light source that emits pulsed light having a predetermined oscillation frequency; a first spatial light modulator on which the pulsed light is incident and on which an image formed is updated at a predetermined image update frequency; a stage that holds an exposure target to be irradiated with light from the first spatial light modulator and moves the exposure target in a first direction relative to the first spatial light modulator; an oscillator that outputs a clock having a predetermined frequency; At least two of the predetermined oscillation frequency, the predetermined image update frequency, and the movement of the stage are adjusted based on the predetermined frequency of the clock. Exposure equipment.

2. an image update timing of the first spatial light modulator is controlled based on the predetermined frequency of the clock; 2. The exposure apparatus according to claim 1.

3. A trigger signal for controlling the image update timing is input to the first spatial light modulator. The exposure apparatus according to claim 2 .

4. the predetermined oscillation frequency, the predetermined image update frequency, and the movement of the stage are adjusted based on the predetermined frequency of the clock; 4. The exposure apparatus according to claim 1.

5. the moving speed of the stage is set based on the emission time of one pulse of the pulsed light; 5. The exposure apparatus according to claim 1.

6. A second spatial light modulator; and a third spatial light modulator; and an optical path switcher; the pulsed light includes a first pulse, a second pulse, and a third pulse arranged at a predetermined time interval; the optical path switcher guides the first pulse to a first optical path in which the first spatial light modulator is disposed, guides the second pulse to a second optical path in which the second spatial light modulator is disposed, and guides the third pulse to a third optical path in which the third spatial light modulator is disposed; the optical path switcher switches between the first optical path, the second optical path, and the third optical path based on the predetermined frequency of the clock; The exposure apparatus according to any one of claims 1 to 5.

7. a first projection optical system that projects light from the first spatial light modulator onto the exposure target; a second projection optical system that projects the light from the second spatial light modulator onto the exposure target; a third projection optical system that projects the light from the third spatial light modulator onto the exposure target; 7. The exposure apparatus according to claim 6.

8. pattern data adjusted so that a projection position of a projection image on the exposure target is shifted in the first direction based on at least one of a moving speed of the stage, the predetermined image update frequency, and the predetermined oscillation frequency is transmitted to the first spatial light modulator, the second spatial light modulator, and the third spatial light modulator.

8. The exposure apparatus according to claim 7.

9. at least one of a position and an attitude of at least one of the first spatial light modulator, the second spatial light modulator, and the third spatial light modulator is set, or adjustment of at least one optical element of the first projection optical system, the second projection optical system, and the third projection optical system is set, so that a projection position of a projection image on the exposure target is shifted in the first direction based on at least one of a moving speed of the stage, the predetermined image update frequency, and the predetermined oscillation frequency.

8. The exposure apparatus according to claim 7.

Images