Liquid supply device, liquid supply method and memory medium

Abstract

To provide technology that can reduce contamination of process liquid in a circulation line.SOLUTION: A liquid supply device according to the present disclosure has a tank, a circulation line, a pump, and a supply line. The circulation line returns process liquid pumped from the tank to the tank. The circulation line consists of a main line with a pump, and first and second branch lines branching off from the main line. The first branch line comprises a first branch circulation line having a first heating mechanism, a first filter, a first drain line, and branching off from between the first heating mechanism and the first filter and returning the process liquid pumped from the tank to the tank, and a first valve switching the destination of the process liquid between the first drain line and the first branch line. The second branch line comprises a second branch circulation line having a second heating mechanism, a second filter, and a second drain line, and branching off from between the second heating mechanism and the second filter and returning the process liquid pumped from the tank to the tank, and a second valve switching the destination of the process liquid between the second drain line and the second branch line.SELECTED DRAWING: Figure 3

Description

[Technical field]

[0001] The present disclosure relates to a liquid supplying device, a liquid supplying method, and a storage medium. [Background technology]

[0002] Conventionally, there is known a liquid processing apparatus that circulates a processing liquid for substrates such as semiconductor wafers (hereinafter also referred to as wafers) through a circulation line and supplies the processing liquid to a liquid processing section through a branch line branching off from the circulation line. The circulation line of such a liquid processing apparatus is provided with a filter module (hereinafter also referred to as filter) that removes foreign matter from the processing liquid, and a temperature control section that controls the temperature of the processing liquid flowing through the circulation line (see Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2021-9956 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique capable of reducing contamination of a treatment liquid in a circulation line. [Means for solving the problem]

[0005] A liquid supplying apparatus according to an embodiment of the present disclosure includes a tank, a circulation line, a pump, and a supply line. The tank stores a processing liquid. The circulation line returns the processing liquid sent from the tank to the tank. The pump is provided in the circulation line. The supply line is connected to the circulation line and supplies the processing liquid to a liquid processing unit that performs liquid processing on a substrate. The circulation line includes a main line in which the pump is provided, and a first branch line and a second branch line branched from the main line. The supply line includes a first supply line connected to the first branch line and a second supply line connected to the second branch line. The first branch line includes, in order from upstream, a first heating mechanism, a first filter, and a first drainage line that drains the processing liquid flowing in the first branch line, as well as a first branch circulation line that branches between the first heating mechanism and the first filter and returns the processing liquid sent from the tank to the tank, and a first valve that switches the outflow destination of the processing liquid between the first drainage line and the first branch line. The second branch line includes, in order from upstream, a second heating mechanism, a second filter, and a second drainage line that drains the treatment liquid flowing into the second branch line, as well as a second branch circulation line that branches off between the second heating mechanism and the second filter and returns the treatment liquid delivered from the tank to the tank, and a second valve that switches the outflow destination of the treatment liquid between the second drainage line and the second branch line. Effect of the Invention

[0006] According to the present disclosure, contamination of the treatment liquid in the circulation line can be reduced. [Brief description of the drawings]

[0007] [Figure 1] FIG. 1 is a diagram showing a schematic configuration of a substrate processing system according to a first embodiment. [Diagram 2] FIG. 2 is a schematic diagram showing the configuration of the processing unit according to the first embodiment. [Diagram 3] FIG. 3 is a diagram showing a schematic configuration of a processing liquid supply source according to the embodiment. [Figure 4]FIG. 4 is a diagram showing an example of transition of the states of the pump, the first to fourth valves, the first heating mechanism, and the second heating mechanism. [Diagram 5] FIG. 5 is a schematic view showing an example of the operation of the treatment liquid supply source according to the first embodiment. [Figure 6] FIG. 6 is a schematic view showing an example of the operation of the treatment liquid supply source according to the first embodiment. [Figure 7] FIG. 7 is a schematic view showing an example of the operation of the treatment liquid supply source according to the first embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, a detailed description will be given of a liquid supplying device, a liquid supplying method, and a storage medium according to the present disclosure (hereinafter, referred to as "embodiments") with reference to the drawings. Note that the present disclosure is not limited to these embodiments. In addition, the embodiments can be appropriately combined as long as the processing contents are not contradictory. In addition, the same parts in the following embodiments are given the same reference numerals, and duplicated descriptions are omitted.

[0009] In addition, in the embodiments described below, expressions such as "constant", "orthogonal", "vertical" and "parallel" may be used, but these expressions do not necessarily mean "constant", "orthogonal", "vertical" and "parallel" strictly. In other words, each of the above expressions allows for deviations due to, for example, manufacturing accuracy and installation accuracy.

[0010] In addition, in order to make the explanation easier to understand, each of the drawings referred to below may show an orthogonal coordinate system that defines an X-axis direction, a Y-axis direction, and a Z-axis direction that are perpendicular to each other, and has the positive Z-axis direction as the vertically upward direction.

[0011] Conventionally, there is known a liquid processing apparatus that circulates a processing liquid for substrates such as semiconductor wafers (hereinafter also referred to as wafers) through a circulation line and supplies the processing liquid to a liquid processing section through a branch line branching off from the circulation line. The circulation line of such a liquid processing apparatus is provided with a filter module (hereinafter also referred to as a filter) that removes foreign matter from the processing liquid, and a temperature control section that controls the temperature of the processing liquid flowing through the circulation line.

[0012] In the circulation line, the circulation of the processing liquid may be stopped for maintenance or the like. When the circulation of the processing liquid is restarted after the circulation has been stopped, if the processing liquid is heated by the temperature control unit, the filter will thermally expand due to the effect of the temperature change of the processing liquid. This may cause particles captured in the filter to pass through the filter, resulting in contamination of the processing liquid in the circulation line.

[0013] Therefore, there is a need for a technology that can overcome the above-mentioned problems and reduce contamination of the treatment liquid in the circulation line.

[0014] (First embodiment) <Outline of the substrate processing system> First, a schematic configuration of a substrate processing system 1 according to a first embodiment will be described with reference to Fig. 1. Fig. 1 is a diagram showing a schematic configuration of the substrate processing system 1 according to the first embodiment.

[0015] 1, the substrate processing system 1 includes a loading / unloading station 2 and a processing station 3. The loading / unloading station 2 and the processing station 3 are provided adjacent to each other.

[0016] The carry-in / out station 2 includes a FOUP placement section 11 and a transport section 12. On the FOUP placement section 11, a plurality of FOUPs F are placed, each of which accommodates a plurality of substrates, in this embodiment, semiconductor wafers W (hereinafter referred to as wafers W), in a horizontal state.

[0017] The transfer section 12 is provided adjacent to the FOUP placement section 11, and includes therein a substrate transfer device 13 and a transfer section 14. The substrate transfer device 13 includes a wafer holding mechanism that holds the wafer W. The substrate transfer device 13 is capable of moving in the horizontal and vertical directions and rotating about a vertical axis, and transfers the wafer W between the FOUP F and the transfer section 14 using the wafer holding mechanism.

[0018] The processing station 3 is provided adjacent to the transport section 12. The processing station 3 includes a transport section 15 and a plurality of processing units 16. The plurality of processing units 16 are provided side by side on both sides of the transport section 15.

[0019] The transfer section 15 includes a substrate transfer device 17 therein. The substrate transfer device 17 includes a wafer holding mechanism that holds the wafer W. The substrate transfer device 17 is capable of moving in the horizontal and vertical directions and rotating about a vertical axis, and transfers the wafer W between the delivery section 14 and the processing unit 16 using the wafer holding mechanism.

[0020] The processing unit 16 is an example of a liquid processing section, and performs a predetermined liquid processing on the wafer W transferred by the substrate transfer device 17.

[0021] The substrate processing system 1 also includes a control device 4. The control device 4 is, for example, a computer, and includes a control unit 18 and a storage unit 19. The storage unit 19 stores programs for controlling various processes executed in the substrate processing system 1. The control unit 18 controls the operation of the substrate processing system 1 by reading out and executing the programs stored in the storage unit 19.

[0022] Such a program may be recorded in a computer-readable storage medium and installed from that storage medium into the storage unit 19 of the control device 4. Examples of computer-readable storage media include a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnet optical disk (MO), and a memory card.

[0023] In the substrate processing system 1 configured as described above, first, the substrate transfer device 13 in the load / unload station 2 removes the wafer W from the FOUP F placed on the FOUP placement section 11, and places the removed wafer W on the delivery section 14. The wafer W placed on the delivery section 14 is then removed from the delivery section 14 by the substrate transfer device 17 in the processing station 3, and carried into the processing unit 16.

[0024] The wafer W carried into the processing unit 16 is processed by the processing unit 16, and then carried out of the processing unit 16 by the substrate transfer device 17 and placed on the delivery section 14. Then, the processed wafer W placed on the delivery section 14 is returned to the FOUP F of the FOUP mounting section 11 by the substrate transfer device 13.

[0025] <Processing unit overview> Next, an overview of the processing unit 16 will be described with reference to Fig. 2. Fig. 2 is a schematic diagram showing the configuration of the processing unit 16 according to the first embodiment. The processing unit 16 includes a chamber 20, a substrate processing section 30, a liquid supply section 40, and a collection cup 50.

[0026] The chamber 20 accommodates a substrate processing unit 30, a liquid supply unit 40, and a collection cup 50. An FFU (Fan Filter Unit) 21 is provided on the ceiling of the chamber 20. The FFU 21 forms a downflow within the chamber 20.

[0027] Substrate processing unit 30 includes a holder 31, a support 32, and a drive unit 33, and performs liquid processing on a placed wafer W. Holder 31 holds wafer W (see FIG. 1) horizontally. Support 32 is a member extending in the vertical direction, with a base end rotatably supported by drive unit 33 and a tip end supporting holder 31 horizontally. Drive unit 33 rotates support 32 about a vertical axis.

[0028] The substrate processing unit 30 rotates the support column 32 using the drive unit 33, thereby rotating the holder 31 supported by the support column 32. This causes the wafer W held by the holder 31 to rotate.

[0029] The liquid supply unit 40 supplies a processing liquid to the wafer W. The liquid supply unit 40 is connected to a processing liquid supply source 70. The liquid supply unit 40 includes a plurality of nozzles. The plurality of nozzles are provided corresponding to, for example, a plurality of types of processing liquid. The plurality of nozzles eject, onto the wafer W, the plurality of types of processing liquid respectively supplied from the plurality of processing liquid supply sources 70.

[0030] Collection cup 50 is disposed to surround holder 31, and collects the processing liquid scattered from wafer W due to the rotation of holder 31. A drainage outlet 51 is formed at the bottom of collection cup 50, and the processing liquid collected by collection cup 50 is discharged from drainage outlet 51 to the outside of processing unit 16.

[0031] Further, an exhaust port 52 for discharging the gas supplied from the FFU 21 to the outside of the processing unit 16 is formed at the bottom of the collection cup 50.

[0032] <Overview of processing solution supply sources> Next, a schematic configuration of the processing liquid supply source 70 included in the substrate processing system 1 will be described with reference to Fig. 3. Fig. 3 is a diagram showing a schematic configuration of the processing liquid supply source 70 according to an embodiment. The processing liquid supply source 70 is an example of a liquid supply device.

[0033] 3, a processing liquid supply source 70 included in the substrate processing system 1 supplies processing liquid to the multiple processing units 16. In the first embodiment, for example, a processing liquid supply source 70 shown in FIG. 3 is provided for each of the multiple types of processing liquid.

[0034] 3, the processing liquid supply source 70 includes a tank 80, a circulation line 90, and a pump 100. The tank 80 stores the processing liquid. The processing liquid is, for example, IPA (isopropyl alcohol). Note that the processing liquid of the present disclosure is not limited to IPA, and various types of chemical liquids are applicable.

[0035] The circulation line 90 returns the treatment liquid sent from the tank 80 to the tank 80. The circulation line 90 includes a main line 91 on the upstream side and multiple (here, two) branch lines 92a, 92b on the downstream side (hereinafter also referred to as a "first branch line 92a" and a "second branch line 92b").

[0036] In the following description, the final letter of the reference numeral given to the components belonging to the first branch line 92a is "a," and the final letter of the reference numeral given to the components belonging to the second branch line 92b is "b." The components belonging to the first branch line 92a and the components belonging to the second branch line 92b are the same or substantially the same. When it is not necessary to distinguish between the components belonging to the first branch line 92a and the components belonging to the second branch line 92b, the final letters "a" and "b" may be deleted (for example, 93a and 93b are written as 93).

[0037] A pump 100 is provided in the main line 91. The pump 100 forms a circulating flow of the treatment liquid in the circulation line 90.

[0038] The main line 91 branches into a first branch line 92a and a second branch line 92b at a branch (branch point) set at its downstream end, i.e., downstream of the pump 100. The treatment liquid flowing out of the tank 80 passes through the main line 91, then flows into the first branch line 92a and the second branch line 92b, and returns to the tank 80 through the first branch line 92a and the second branch line 92b.

[0039] That is, in the processing liquid supply source 70 according to the first embodiment, the driving force generated by the pump 100 causes the processing liquid to circulate in both the first branch line 92a and the second branch line 92b of the circulation line 90. This makes it possible to reduce the number of pumps and the cost of the processing liquid supply source, compared to the case where a pump is provided in each of the first branch line 92a and the second branch line 92b.

[0040] The first branch line 92a includes, in order from the upstream side, a first heating mechanism 93a, a first flow meter 94a, a third valve 95a, a first filter 96a, a first circulation temperature sensor 97a, and a first valve 98a. The second branch line 92b includes, in order from the upstream side, a second heating mechanism 93b, a second flow meter 94b, a fourth valve 95b, a second filter 96b, a second circulation temperature sensor 97b, and a second valve 98b.

[0041] The heating mechanism 93 (first heating mechanism 93a, second heating mechanism 93b) heats the temperature of the processing liquid passing through the heating mechanism 93. The control unit 18 can adjust the temperature of the processing liquid by controlling the amount of heat applied to the processing liquid by the heating mechanism 93. The first heating mechanism 93a and the second heating mechanism 93b each include a plurality of heating modules arranged in parallel. The heating mechanism 93 is controlled by the control unit 18.

[0042] The number of heating modules belonging to one heating mechanism 93 can be determined taking into consideration the temperature control capacity required of the heating mechanism 93 and the allowable pressure drop in the heating mechanism 93. In the first embodiment, as shown in Fig. 3, the first heating mechanism 93a and the second heating mechanism 93b are each composed of four heating modules arranged in parallel.

[0043] The flowmeter 94 (first flowmeter 94a, second flowmeter 94b) measures the flow rate of the circulating flow of the processing liquid formed in the circulation line 90. The measurement result by the flowmeter 94 is output to the control unit .

[0044] The valves 95 (third valve 95a, fourth valve 95b) switch the destination of the processing liquid. Specifically, a first branch circulation line 105a connected to the tank 80 branches from the third valve 95a. The first branch circulation line 105a returns the processing liquid sent from the tank 80 to the first branch circulation line 92a to the tank 80. The third valve 95a switches the destination of the processing liquid in the first branch line 92a between the first branch circulation line 105a and the first filter 96a. For example, when the control unit 18 controls the third valve 95a to set the destination of the processing liquid to the first branch circulation line 105a, the processing liquid sent from the tank 80 returns to the tank 80 via the third valve 95a. Furthermore, for example, when the control unit 18 controls the third valve 95a to direct the treatment liquid to the first filter 96a, the treatment liquid delivered from the tank 80 flows into the first filter 96a via the third valve 95a. The control unit 18 can also control the third valve 95a to direct the treatment liquid to both the first branch circulation line 105a and the first filter 96a.

[0045] The first branch circulation line 105a is provided with a first branch temperature sensor 102a for detecting the temperature of the treatment liquid flowing through the first branch circulation line 105a. The detection result of the first branch temperature sensor 102a is output to the control unit .

[0046] Similarly, a second branch circulation line 105b connected to the tank 80 branches from the fourth valve 95b. The second branch circulation line 105b returns the processing liquid sent from the tank 80 to the second branch circulation line 92b to the tank 80. The fourth valve 95b switches the destination of the processing liquid in the second branch line 92b between the second branch circulation line 105b and the second filter 96b. For example, when the control unit 18 controls the fourth valve 95b to set the destination of the processing liquid to the second branch circulation line 105b, the processing liquid sent from the tank 80 returns to the tank 80 via the fourth valve 95b. Also, for example, when the control unit 18 controls the fourth valve 95b to set the destination of the processing liquid to the second filter 96b, the processing liquid sent from the tank 80 flows to the second filter 96b via the fourth valve 95b. The control unit 18 can also control the fourth valve 95b to allow the treatment liquid to flow to both the second branch circulation line 105b and the second filter 96b.

[0047] The second branch circulation line 105b is provided with a second branch temperature sensor 102b for detecting the temperature of the treatment liquid flowing through the second branch circulation line 105b. The detection result of the second branch temperature sensor 102b is output to the control unit .

[0048] In this manner, the processing liquid supply source 70 according to the first embodiment includes the first branch circulation line 105a and the second branch circulation line 105b. In a step of restarting a circulating flow of the processing liquid in the circulation line 90 after the circulation of the processing liquid has been stopped for maintenance or the like, the processing liquid can be heated while forming a circulating flow of the processing liquid flowing through the first branch circulation line 105a or the second branch circulation line 105b, thereby enabling a temperature raising process of the processing liquid to be performed without passing through the filter 96.

[0049] Therefore, according to the first embodiment, it is possible to reduce contamination of the processing liquid caused by particles passing through the filter 96 as the temperature of the processing liquid increases. Also, in the first embodiment, since the processing liquid does not flow through the filter 96 in which the particles are captured, it is possible to reduce contamination of the processing liquid during the temperature increase process.

[0050] The filters 96 (first filter 96a, second filter 96b) remove contaminants such as particles contained in the processing liquid passing through the filters 96. The first filter 96a and the second filter 96b may include a plurality of filter modules arranged in parallel. The number of filter modules belonging to one filter 96 can be determined in consideration of the filtering capacity required of the filter 96, the pressure drop allowed in the filter 96, and the like. In the first embodiment, as shown in FIG. 3, the first filter 96a and the second filter 96b are each composed of two filter modules arranged in parallel.

[0051] The circulation temperature sensor 97 (first circulation temperature sensor 97a, second circulation temperature sensor 97b) detects the temperature of the processing liquid flowing through the circulation line 90. The detection result by the circulation temperature sensor 97 is output to the control unit .

[0052] It is not necessary for the circulation temperature sensor 97 to detect the temperature of the treatment liquid flowing through the circulation line 90. For example, the circulation temperature sensor 97 may be provided on the filter 96, the circulation line 90 (the first branch line 92a, the second branch line 92b), or the drain line 99, and detect the temperature of the filter 96, the circulation line 90, or the drain line 99.

[0053] Further, although an example in which two temperature sensors, the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, are provided, this is not limiting, and only one of the two temperature sensors may be provided.

[0054] The valve 98 (first valve 98a, second valve 98b) switches the destination of the treatment liquid. Specifically, a first drainage line 99a connected to the drain unit DR branches from the first valve 98a. The first drainage line 99a drains the treatment liquid flowing into the first branch line 92a. The first valve 98a switches the destination of the treatment liquid in the first branch line 92a between the first drainage line 99a and the first branch line 92a. For example, when the control unit 18 controls the first valve 98a to set the destination of the treatment liquid to the first drainage line 99a, the treatment liquid sent from the tank 80 is drained via the first valve 98a. Also, for example, when the control unit 18 controls the first valve 98a to set the destination of the treatment liquid to the first branch line 92a, the treatment liquid sent from the tank 80 flows into the first branch line 92a via the first valve 98a. The control unit 18 can also control the first valve 98a to allow the treatment liquid to flow into both the first branch line 92a and the first drain line 99a.

[0055] Similarly, a second drainage line 99b connected to the drain unit DR branches from the second valve 98b. The second drainage line 99b drains the processing liquid flowing into the second branch line 92b. The second valve 98b switches the destination of the processing liquid in the second branch line 92b between the second drainage line 99b and the second branch line 92b. For example, when the control unit 18 controls the second valve 98b to set the destination of the processing liquid to the second drainage line 99b, the processing liquid sent from the tank 80 is drained through the second valve 98b. Also, for example, when the control unit 18 controls the second valve 98b to set the destination of the processing liquid to the second branch line 92b, the processing liquid sent from the tank 80 flows into the second branch line 92b through the second valve 98b. The control unit 18 can also control the second valve 98b to allow the treatment liquid to flow into both the second branch line 92b and the second drain line 99b.

[0056] A plurality of first supply lines 110a are connected to the first branch line 92a located downstream of the first valve 98a. One end of the first supply line 110a is connected to the first branch line 92a, and the other end is connected to the processing unit 16. The first supply line 110a supplies the processing liquid flowing through the first branch line 92a to the processing unit 16. A fifth valve 107a for opening and closing the first supply line 110a is provided in the middle of the first supply line 110a.

[0057] A plurality of second supply lines 110b are connected to the second branch line 92b located downstream of the second valve 98b. One end of the second supply line 110b is connected to the second branch line 92b, and the other end is connected to the processing unit 16. The second supply line 110b supplies the processing liquid flowing through the second branch line 92b to the processing unit 16. A sixth valve 107b for opening and closing the second supply line 110b is provided in the middle of the second supply line 110b.

[0058] 3 shows an example in which three first supply lines 110a are connected to the first branch line 92a, but the number of first supply lines 110a connected to the first branch line 92a is not limited to three. Similarly, the number of second supply lines 110b connected to the second branch line 92b is not limited to three.

[0059] In addition, here, the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b are switching valves that switch the destination of the processing liquid, but the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b do not necessarily need to be switching valves. For example, the first valve 98a may be composed of two opening and closing valves, an opening and closing valve provided in the first drainage line 99a and an opening and closing valve provided in the first branch line 92a downstream of the first drainage line 99a. The same applies to the second valve 98b, the third valve 95a, and the fourth valve 95b.

[0060] Next, an example of the operation of the substrate processing system 1 according to the first embodiment will be described with reference to Fig. 4. Fig. 4 is a diagram showing an example of the transition of states of the pump 100, the first valve 98a to the fourth valve 95b, the first heating mechanism 93a, and the second heating mechanism 93b. Figs. 5 to 7 are schematic diagrams showing an example of the operation of the processing liquid supply source 70 according to the first embodiment. The process shown in Fig. 4 is an example of the operation when the circulation of the processing liquid in the circulation line 90 is stopped due to maintenance or the like, and then the circulation of the processing liquid is started again.

[0061] First, the control unit 18 operates the pump 100, which had been stopped, to pump the treatment liquid from the tank 80 to the circulation line 90 (time T1). At the same time, the control unit 18 controls the third valve 95a to cause the treatment liquid to flow into the first branch circulation line 105a. As a result, the treatment liquid sent from the tank 80 flows into the first branch circulation line 105a via the third valve 95a, and is circulated back to the tank 80.

[0062] Next, the control unit 18 closes the third valve 95a to stop the outflow of the processing liquid to the first branch circulation line 105a (time T2). At the same time, the control unit 18 controls the fourth valve 95b to cause the processing liquid to flow into the second branch circulation line 105b. As a result, the processing liquid sent from the tank 80 flows into the second branch circulation line 105b via the fourth valve 95b, and is circulated so as to return to the tank 80.

[0063] Next, the control unit 18 controls the third valve 95a to cause the processing liquid to flow into the first branch circulation line 105a (time T3). As a result, the processing liquid sent from the tank 80 flows into the first branch circulation line 105a and the second branch circulation line 105b, and circulates back to the tank 80 (see FIG. 5).

[0064] Next, the control unit 18 judges whether the circulation flow rate of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b is stable or not based on the measured values ​​of the first flow meter 94a and the second flow meter 94b. Specifically, when the measured value of the first flow meter 94a falls within a preset threshold range, the control unit 18 judges that the circulation flow rate of the treatment liquid is stable, and starts heating by the first heating mechanism 93a. Similarly, when the measured value of the second flow meter 94b falls within a preset threshold range, the control unit 18 judges that the circulation flow rate of the treatment liquid in the second branch line 92b is stable, and starts heating by the second heating mechanism 93b. For example, as shown in FIG. 4, the control unit 18 operates the second heating mechanism 93b after the measured value of the second flow meter 94b falls within the threshold range (time T4). Thereafter, after the measurement value of the first flow meter 94a falls within the threshold range, the control unit 18 operates the first heating mechanism 93a (time T5).

[0065] Next, the control unit 18 judges whether the temperature of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b. Specifically, the control unit 18 judges that the temperature of the treatment liquid in the first branch circulation line 105a has stabilized when the measurement value of the first branch temperature sensor 102a falls within a preset threshold range in a preset monitoring time width. Similarly, the control unit 18 judges that the temperature of the treatment liquid in the second branch circulation line 105b has stabilized when the measurement value of the second branch temperature sensor 102b falls within a preset threshold range in a preset monitoring time width.

[0066] When the temperatures of the treatment liquid in the first branch line 92a and the second branch line 92b are stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid through the first branch circulation line 105a and the second branch circulation line 105b while causing the treatment liquid to flow into the drain line 99. For example, as shown in Fig. 4, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b fall within a preset threshold range in a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to cause the treatment liquid to flow into both the filter 96 and the branch circulation line 105 (time T6).

[0067] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to cause the processing liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the processing liquid sent from the tank 80 flows into the first branch circulation line 105a or the second branch circulation line 105b and circulates back to the tank 80, while flowing into the first filter 96a and the second filter 96b and being drained from the drainage line 99 (see FIG. 6).

[0068] Next, the control unit 18 determines whether or not to drain the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the measurement values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are equal to or higher than a threshold value, the control unit 18 controls the first valve 98a to the fourth valve 95b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110.

[0069] For example, as shown in FIG. 4, when the measured values ​​of both the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are equal to or greater than the threshold value, the control unit 18 controls the third valve 95a and the fourth valve 95b to switch the outflow destination of the processing liquid to the filter 96 (time T7). At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid to the supply line 110. As a result, the processing liquid sent from the tank 80 flows into the first branch line 92a and the second branch line 92b and returns to the tank 80 (see FIG. 7). Also, when the fifth valve 107a or the sixth valve 107b is open, the processing liquid is supplied from the supply line 110 to the processing unit 16.

[0070] In this way, the control unit 18 determines whether or not to drain the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the temperature of the processing liquid flowing through the circulation line 90 is equal to or higher than a threshold based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110.

[0071] Here, an example is shown in which the destination of the processing liquid is switched from the drain line 99 to the supply line 110 when the temperature of the processing liquid flowing through the circulation line 90 is equal to or higher than a threshold value, but the present invention is not limited to this. For example, when the temperature of the processing liquid flowing through the circulation line 90 is equal to or higher than a threshold value, the processing liquid may be continuously discharged until a predetermined time has elapsed. Specifically, when the temperature of the processing liquid flowing through the circulation line 90 is equal to or higher than a threshold value, the control unit 18 controls the first valve 98a and the second valve 98b to switch the destination of the processing liquid to the drain line 99 and the supply line 110. As a result, a certain amount of the processing liquid sent from the tank 80 is discharged from the drain line 99 while flowing through the branch line 92. After that, the control unit 18 switches the destination of the processing liquid to the supply line 110 when a predetermined time has elapsed.

[0072] After the drainage of the processing liquid heated by the heating mechanism 93 starts (time T6), the temperature of the processing liquid flowing through the circulation line 90 gradually increases. Thereafter, when the temperature of the processing liquid reaches or exceeds a threshold value, most of the particles captured in the filter 96 flow out. This reduces the possibility of contaminating the inside of the circulation line 90. By stopping the drainage at that point (time T7) and starting the circulation of the processing liquid into the circulation line 90, the amount of processing liquid to be drained can be minimized.

[0073] Furthermore, the control unit 18 controls the pump 100, the first heating mechanism 93a, and the second heating mechanism 93b to heat the treatment liquid while circulating it through the first branch circulation line 105a and the second branch circulation line 105b (time T5 to time T7).

[0074] In this way, the control unit 18 heats the treatment liquid while circulating it through the first branch circulation line 105a and the second branch circulation line 105b, so that the treatment liquid can be heated efficiently in a short time compared to when the treatment liquid is heated while circulating it throughout the entire circulation line 90.

[0075] Furthermore, when the control unit 18 determines that the temperatures of the treatment liquid flowing through the first branch circulation line 105a and the second branch circulation line 105b have stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b, it controls the pump 100 to send the treatment liquid to the filter 96 (time T6). This allows the treatment liquid to be sent to the circulation line 90 after the temperature of the treatment liquid has stabilized.

[0076] In addition, the control unit 18 controls the pump 100, the first valve 98a, and the second valve 98b to send the treatment liquid circulating through the first branch circulation line 105a and the second branch circulation line 105b to the first filter 96a and the second filter 96b, and to drain the treatment liquid that has passed through the first filter 96a and the second filter 96b into the first drainage line 99a and the second drainage line 99b (time T6 to time T7).

[0077] This allows the processing liquid to be drained when particles captured by the first filter 96a and the second filter 96b pass through due to a temperature change in the processing liquid, thereby reducing contamination of the processing liquid in the circulation line 90 by particles.

[0078] After the measured values ​​measured by the first flowmeter 94a and the second flowmeter 94b fall within their respective threshold ranges, the control unit 18 controls the third valve 95a to switch the outflow destination of the treatment liquid in the first branch circulation line 105a from the first branch circulation line 105a to the first filter 96a, and controls the fourth valve 95b to switch the outflow destination of the treatment liquid in the second branch circulation line 105b from the second branch circulation line 105b to the second filter 96b. This allows the treatment liquid to be sent to the first filter 96a and the second filter 96b after the flow rate of the treatment liquid has stabilized (time T4, time T5).

[0079] Moreover, after starting to feed the treatment liquid to the first branch circulation line 105a (time T1), the control unit 18 starts to feed the treatment liquid to the second branch circulation line 105b (time T2). By feeding the treatment liquid one by one in this way, the treatment liquid is more likely to become full of liquid than when feeding the treatment liquid to both lines simultaneously.

[0080] Furthermore, after the control unit 18 has drained the treatment liquid from the first drain line 99a and the second drain line 99b, it controls the first valve 98a and the second valve 98b to send the treatment liquid to the first branch line 92a and the second branch line 92b and return it to the tank 80 (time T7). This makes it possible to reduce the contamination of the inside of the tank 80 caused by particles captured by the filter 96 in the tank 80 flowing into the tank 80.

[0081] Furthermore, the control unit 18 circulates the treatment liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T6 to time T7) while circulating the treatment liquid in the circulation line 90. This makes it possible to prevent the treatment liquid from stagnation in the first branch circulation line 105a and the second branch circulation line 105b while the treatment liquid is circulating in the circulation line 90.

[0082] As described above, the processing liquid supply source 70 according to the first embodiment includes the first branch circulation line 105a and the second branch circulation line 105b. In this way, in a step of starting up a circulating flow of the processing liquid in the circulation line 90 again after the circulation of the processing liquid has been stopped for maintenance or the like, the processing liquid can be heated while forming a circulating flow of the processing liquid flowing through the first branch circulation line 105a or the second branch circulation line 105b, thereby enabling a temperature raising process of the processing liquid to be performed without passing through the filter 96.

[0083] Therefore, according to the first embodiment, it is possible to reduce contamination caused by particles passing through the filter 96 as the temperature of the processing liquid increases.

[0084] Here, an example has been shown in which the processing liquid being heated is discharged into the drain section DR via the drain line 99, and then a circulating flow of the processing liquid is formed through the circulation line 90, but the present disclosure is not limited to such an example.

[0085] For example, before starting circulation of the treatment liquid in the circulation line 90, the control unit 18 may heat the treatment liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b (time T4, time T5), and then repeatedly perform a process (time T6 to time T7) of sending the treatment liquid circulating in the first branch circulation line 105a and the second branch circulation line 105b to the filter 96 and draining the treatment liquid by flowing it into the drainage line 99.

[0086] This allows a larger number of particles trapped in the filter 96 to flow downstream, further reducing contamination of the processing liquid in the circulation line 90.

[0087] Second embodiment In the above-described first embodiment, an example has been shown in which it is determined whether or not to proceed with the next process based on the detection results of a plurality of temperature sensors, but it is not necessarily required to perform the determination process based on the results of the temperature sensors.

[0088] 4, the control unit 18 determines whether or not to drain the treatment liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, but is not limited to this example. For example, the control unit 18 may switch the outflow destination of the treatment liquid to the supply line 110 after a preset time has elapsed after starting to drain the treatment liquid from the drain line 99.

[0089] Also, for example, the processing liquid supply source 70 may include a flow meter between the valve 95 and the drainage line 99. Specifically, the processing liquid supply source 70 may include a flow meter between the third valve 95a and the first drainage line 99a. Also, the processing liquid supply source 70 may include a flow meter between the fourth valve 95b and the second drainage line 99b. In this case, after starting to drain the processing liquid from the drainage line 99, the control unit 18 may switch the outflow destination of the processing liquid to the supply line 110 after the measurement value of the flow meter falls within a threshold range.

[0090] The embodiments disclosed herein should be considered to be illustrative and not restrictive in all respects. Indeed, the above-described embodiments may be embodied in various forms. In addition, the above-described embodiments may be omitted, substituted, or modified in various forms without departing from the scope and spirit of the appended claims.

[0091] The present disclosure can have the following configurations. (1) A tank for storing a processing liquid; a circulation line that returns the treatment liquid sent from the tank to the tank; A pump provided in the circulation line; a supply line connected to the circulation line for supplying the processing liquid to a liquid processing section that performs liquid processing on a substrate; Equipped with the circulation line includes a main line provided with the pump, and a first branch line and a second branch line branched from the main line, the supply line includes a first supply line connected to the first branch line and a second supply line connected to the second branch line, the first branch line includes, in order from upstream, a first heating mechanism, a first filter, and a first drainage line for draining the treatment liquid flowing into the first branch line, a first branch circulation line branching off between the first heating mechanism and the first filter for returning the treatment liquid delivered from the tank to the tank, and a first valve for switching the outflow destination of the treatment liquid between the first drainage line and the first branch line; the second branch line includes, in order from upstream, a second heating mechanism, a second filter, and a second drainage line that drains the treatment liquid flowing into the second branch line, as well as a second branch circulation line that branches off between the second heating mechanism and the second filter and returns the treatment liquid delivered from the tank to the tank, and a second valve that switches the outflow destination of the treatment liquid between the second drainage line and the second branch line. (2) Further comprising a control unit, The liquid supplying device described in (1), wherein the control unit controls the pump, the first heating mechanism, and the second heating mechanism to heat the treatment liquid while circulating it through the first branch circulation line and the second branch circulation line. (3) The control unit controls the pump, the first valve, and the second valve to send the treatment liquid circulating through the first branch circulation line and the second branch circulation line to the first filter and the second filter, and to drain the treatment liquid that has passed through the first filter and the second filter into the first drainage line and the second drainage line. (4) a first flow meter disposed between the first heating mechanism and the first branch circulation line; a second flow meter disposed between the second heating mechanism and the second branch circulation line; a third valve that switches a destination of the treatment liquid in the first branch line between the first branch circulation line and the first filter; a fourth valve that switches a destination of the treatment liquid in the second branch line between the second branch circulation line and the second filter; Equipped with The liquid supplying device described in (2) or (3), wherein after the measurement values ​​measured by the first flow meter and the measurement values ​​measured by the second flow meter each fall within a threshold range, the control unit controls the third valve to switch the destination of the treatment liquid in the first branch circulation line from the first branch circulation line to the first filter, and controls the fourth valve to switch the destination of the treatment liquid in the second branch circulation line from the second branch circulation line to the second filter. (5) The liquid supplying device according to any one of (2) to (4), wherein the control unit starts supplying the treatment liquid to the first branch circulation line and then starts supplying the treatment liquid to the second branch circulation line. (6) The liquid supplying device described in (3), wherein the control unit controls the first valve and the second valve to send the processing liquid to the first branch line and the second branch line and return the processing liquid to the tank after draining the processing liquid from the first drain line and the second drain line. (7) In the liquid supplying device according to (1), heating the treatment liquid while circulating it through the first branch circulation line; heating the treatment liquid while circulating it through the second branch circulation line; A liquid supply method comprising: (8) sending the treatment liquid circulating through the first branch circulation line to the first filter, and discharging the treatment liquid that has passed through the first filter by flowing it into the first drainage line; The liquid supplying method according to (7), further comprising the steps of: sending the treatment liquid circulating through the second branch circulation line to the second filter, and draining the treatment liquid that has passed through the second filter into the second drainage line. (9) A computer-readable storage medium storing a program that operates on a computer and controls a liquid supplying device, The program, when executed, causes a computer to control the liquid supplying device so as to perform the liquid supplying method according to (7) or (8). [Explanation of symbols]

[0092] W wafer 1. Substrate Processing System 16 Processing unit (an example of a liquid processing unit) 18 Control Unit 30 Substrate processing section 70 Processing liquid supply source (an example of a liquid supply device) 80 Tank 90 Circulation Line 100 Pump 92a First Branch Line 92b 2nd branch line 93 Heating mechanism 96 Filters 99 Drainage Line 110 Supply Line

Claims

1. A tank for storing a processing liquid; a circulation line that returns the treatment liquid sent from the tank to the tank; A pump provided in the circulation line; a supply line connected to the circulation line for supplying the processing liquid to a liquid processing section that performs liquid processing on a substrate; Equipped with the circulation line includes a main line provided with the pump, and a first branch line and a second branch line branched from the main line, the supply line includes a first supply line connected to the first branch line and a second supply line connected to the second branch line, the first branch line includes, in order from upstream, a first heating mechanism, a first filter, and a first drainage line for draining the treatment liquid flowing into the first branch line; a first branch circulation line branching off between the first heating mechanism and the first filter for returning the treatment liquid delivered from the tank to the tank; and a first valve for switching the outflow destination of the treatment liquid between the first drainage line and the first branch line; the second branch line includes, in order from upstream, a second heating mechanism, a second filter, and a second drainage line that drains the treatment liquid flowing into the second branch line, as well as a second branch circulation line that branches off between the second heating mechanism and the second filter and returns the treatment liquid pumped from the tank to the tank, and a second valve that switches the outflow destination of the treatment liquid between the second drainage line and the second branch line.

2. Further comprising a control unit, The liquid supplying device according to claim 1 , wherein the control unit controls the pump, the first heating mechanism, and the second heating mechanism to heat the treatment liquid while circulating it through the first branch circulation line and the second branch circulation line.

3. 3. The liquid supply device according to claim 2, wherein the control unit controls the pump, the first valve, and the second valve to send the treatment liquid circulating through the first branch circulation line and the second branch circulation line to the first filter and the second filter, and to drain the treatment liquid that has passed through the first filter and the second filter into the first drainage line and the second drainage line.

4. a first flow meter disposed between the first heating mechanism and the first branch circulation line; a second flow meter disposed between the second heating mechanism and the second branch circulation line; a third valve that switches a destination of the treatment liquid in the first branch line between the first branch circulation line and the first filter; a fourth valve that switches a destination of the treatment liquid in the second branch line between the second branch circulation line and the second filter; Equipped with 3. The liquid supplying device of claim 2, wherein after the measurement values ​​measured by the first flow meter and the measurement values ​​measured by the second flow meter each fall within a threshold range, the control unit controls the third valve to switch the destination of the treatment liquid in the first branch circulation line from the first branch circulation line to the first filter, and controls the fourth valve to switch the destination of the treatment liquid in the second branch circulation line from the second branch circulation line to the second filter.

5. The liquid supplying device according to claim 2 , wherein the control unit starts to send the treatment liquid to the second branch circulation line after starting to send the treatment liquid to the first branch circulation line.

6. 4. The liquid supplying device according to claim 3, wherein the control unit controls the first valve and the second valve to send the processing liquid to the first branch line and the second branch line and return the processing liquid to the tank after draining the processing liquid from the first drain line and the second drain line.

7. 2. The liquid supply device according to claim 1, heating the treatment liquid while circulating it through the first branch circulation line; heating the treatment liquid while circulating it through the second branch circulation line; A liquid supply method comprising:

8. sending the treatment liquid circulating through the first branch circulation line to the first filter, and discharging the treatment liquid that has passed through the first filter by flowing it into the first drainage line; The liquid supplying method according to claim 7 , further comprising the steps of: sending the treatment liquid circulating through the second branch circulation line to the second filter, and draining the treatment liquid that has passed through the second filter by flowing it into the second drainage line.

9. A computer-readable storage medium storing a program that operates on a computer and controls a liquid supplying device, A storage medium, the program being configured to cause a computer to control the liquid supplying device so as to perform the liquid supplying method according to claim 7 or 8, when the program is executed.

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