Reaction device

The reaction apparatus addresses the inefficiencies in existing systems by utilizing a multi-phase reaction vessel with integrated adjustment and recycling mechanisms, enabling continuous and efficient chemical reactions.

JP2025082886APending Publication Date: 2025-05-30DAIWA HOUSE INDUSTRY CO LTD +1
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Patent Information

Application Number
JP2023196404
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-11-20
Publication Date
2025-05-30

AI Technical Summary

Technical Problem

Existing reaction apparatuses face challenges in efficiently producing products due to the need to discharge liquid phases after reactions, which disrupts the reaction process and reduces productivity.

Method used

A reaction apparatus is designed with a reaction vessel that contains separate gas, first liquid, and second liquid phases, along with irradiation, stirring, and phase adjustment devices. This setup allows for efficient mixing, separation, and recycling of the phases, promoting continuous chemical reactions without the need for complete discharge.

Benefits of technology

The apparatus enables efficient production of products by maintaining continuous chemical reactions, recycling reactants, and optimizing phase separation, thereby enhancing productivity compared to batch-type processes.

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Abstract

To provide a reaction device which can efficiently produce a product.SOLUTION: A reaction device 1 for reacting raw material gas, a first solution and a second solution and producing a product includes: a reaction container 10 for forming a gas phase containing the raw material gas, a first liquid phase composed of the first solution and a second liquid phase composed of the second solution therein; an irradiation device 12 for irradiating the first solution and the second solution with light, and reacting the raw material gas, the first solution and the second solution; a gas phase adjustment device 20 which recovers the raw material gas contained in the gas phase in the reaction container 10, and can supply the raw material gas into the reaction container 10; a first liquid phase adjustment device 30 which recovers the first solution contained in the first liquid phase in the reaction container 10, and can supply the first solution into the reaction container 10; and a second liquid phase adjustment device 40 which recovers the second solution contained in the second liquid phase in the reaction container 10, and can supply the second solution into the reaction container 10.SELECTED DRAWING: Figure 1
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Description

Technical Field

[0001] The present invention relates to the technology of a reaction apparatus for causing a chemical reaction to occur on a reactant.

Background Art

[0002] Conventionally, the technology for causing a chemical reaction to occur on a reactant has been known. For example, in Patent Document 1, a method for producing a product at normal temperature and pressure by a chemical reaction using two liquid phases is known.

[0003] In the invention described in Patent Document 1, a chemical reaction is caused to occur to produce a product by irradiating each liquid phase with light in a state where an aqueous phase in which a substance used in the chemical reaction is dissolved in water and an organic phase in which a raw material is dissolved in an organic solvent are placed in a reaction vessel.

[0004] However, in the method described in Patent Document 1, when recovering the product after the reaction, it is necessary to recover the liquid phase (for example, the aqueous phase) in which the product is dissolved. Therefore, every time the product is recovered, it is necessary to discharge the liquid phase from the reaction vessel, and it is difficult to efficiently produce the product.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] The present invention has been made in view of the above circumstances, and the problem to be solved is to provide a reaction apparatus capable of efficiently producing a product.

Means for Solving the Problems

[0007] The problems to be solved by the present invention are as described above. Next, the means for solving these problems will be described.

[0008] That is, in claim 1, a reaction apparatus for reacting a raw material gas, a first solution, and a second solution different from the first solution to produce a product, the reaction apparatus including a gas phase containing the raw material gas, a first liquid phase composed of the first solution, and a second liquid phase composed of the second solution formed inside, a reaction vessel; an irradiation device that irradiates light onto the first solution and the second solution to react the raw material gas, the first solution, and the second solution; a gas phase adjustment device that recovers the raw material gas contained in the gas phase in the reaction vessel and can supply the raw material gas into the reaction vessel; a first liquid phase adjustment device that recovers the first solution contained in the first liquid phase in the reaction vessel and can supply the first solution into the reaction vessel; and a second liquid phase adjustment device that recovers the second solution contained in the second liquid phase in the reaction vessel and can supply the second solution into the reaction vessel.

[0009] In claim 2, a stirring device for stirring the first solution and the second solution that react with the raw material gas in the reaction vessel; and a control unit capable of executing control to operate the first liquid phase adjustment device and the second liquid phase adjustment device to recover the first solution and the second solution and control to supply the first solution and the second solution when the first liquid phase and the second liquid phase are separated after stirring by the stirring device.

[0010] In claim 3, the stirring device is provided at a position eccentric with respect to the center of the reaction vessel in a plan view.

[0011] In claim 4, the reaction vessel includes a baffle plate capable of promoting the generation of a vortex by the stirring of the stirring device.

[0012] In claim 5, an intermediate container capable of taking out a part of the first solution and the second solution in the reaction vessel is provided, and after stirring by the stirring device, the control unit takes out a part of the first solution and the second solution in a non-separated state into the intermediate container, and when the first liquid phase and the second liquid phase in the intermediate container are separated, the first liquid phase adjusting device and the second liquid phase adjusting device are operated to execute control for recovering the first solution and the second solution from the intermediate container.

Advantages of the Invention

[0013] The present invention has the effect of being able to efficiently produce a product.

Brief Description of the Drawings

[0014]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Embodiments for Carrying Out the Invention

[0015] Hereinafter, with reference to FIGS. 1 and 2, the configuration of the reaction apparatus 1 according to the first embodiment of the present invention will be described.

[0016] The reaction apparatus 1 causes a chemical reaction between a gas (raw material gas) serving as a raw material and a liquid in the reaction vessel 10. In this embodiment, as an example, an example of producing methanol by a chemical reaction in the reaction apparatus 1 will be described. In this embodiment, methane is employed as the raw material gas.

[0017] The liquid used in the above reaction includes a first solution and a second solution, which are two types of liquids with different specific gravities. In this embodiment, as the first solution, an aqueous solution containing a source of an oxidizing agent such as chlorine dioxide (chlorine dioxide radical) (for example, sodium chlorite) is adopted. Further, in this embodiment, as the second solution, a solvent (organic solvent) capable of dissolving a source gas such as a fluorinated solvent is adopted. Note that the second solution has a greater specific gravity than the first solution. For this reason, as shown in FIG. 1, the first solution and the second solution are separated within the reaction vessel 10.

[0018] The reaction apparatus 1 according to this embodiment can obtain a product by chemically reacting a source gas, a first solution, and a second solution within the reaction vessel 10. A detailed description of the chemical reaction within the reaction vessel 10 will be given later. The reaction apparatus 1 includes a reaction vessel 10, a gas phase adjustment device 20, a first liquid phase adjustment device 30, a second liquid phase adjustment device 40, and a control unit 50.

[0019] The reaction vessel 10 is for chemically reacting a source gas, a first solution, and a second solution. The reaction vessel 10 is formed in a substantially cylindrical shape capable of accommodating a source gas, a first solution, and a second solution therein. The reaction vessel 10 is formed with a relatively large depth dimension (vertical dimension) so that the separated first solution and second solution can be easily separated as will be described later. The reaction vessel 10 is formed of a material having resistance to solvents and source gases.

[0020] As shown in FIG. 1, inside the reaction vessel 10 containing a source gas, a first solution, and a second solution, a "gas phase", a "first liquid phase", and a "second liquid phase" are formed in order from above. The "gas phase" is a phase composed of a mixture of a source gas and other gases (gases volatilized from the liquid phase, air in the reaction vessel 10, etc.). The "first liquid phase" is a phase (aqueous phase) composed of the first solution. The "second liquid phase" is a phase (solvent phase) composed of the second solution. The reaction vessel 10 includes a stirring device 11 and an irradiation device 12.

[0021] The stirring device 11 stirs the first solution and the second solution in the reaction vessel 10. The stirring device 11 is provided inside the reaction vessel 10. The stirring device 11 includes a propeller or the like that rotates around a rotating shaft with its axis in the vertical direction. Note that the stirring device 11 is not limited to one equipped with a propeller, and various configurations capable of stirring the first solution and the second solution can be adopted. By operating the stirring device 11 to mix the first solution and the second solution, the contact area between the first solution and the second solution can be increased, and the reaction can be promoted. Note that the mixed first solution and second solution separate again when a predetermined time has elapsed after the stirring stops.

[0022] In the present embodiment, the stirring device 11 is arranged at a position eccentric with respect to the center in the plan view inside the reaction vessel 10. Thereby, it is easy to sufficiently mix the first solution and the second solution, and separation of each liquid phase can be promoted after the stirring stops. That is, when stirring is performed by the stirring device 11, vortices and bubbles are formed in the reaction vessel 10, improving the stirring effect. Further, when the stirring device 11 is arranged at a portion close to the inner wall of the reaction vessel 10, each liquid phase is likely to separate after the stirring stops. Therefore, by eccentrically arranging the stirring device 11 with respect to the center in the plan view of the reaction vessel 10 and arranging it at a portion relatively close to the inner wall, generation of vortices and the like can be promoted, the stirring effect can be improved, and separation of each liquid phase can be promoted after the stirring stops.

[0023] Also, in the present embodiment, as shown by the two-dot chain line in FIG. 1, a baffle plate 11a that obstructs the flow of each stirred solution is provided on the inner wall of the reaction vessel 10. The baffle plate 11a is formed in a long plate shape along the vertical direction. A plurality (for example, four) of baffle plates 11a are provided along the circumferential direction of the reaction vessel 10. By obstructing the flow of each solution with the baffle plate 11a, turbulent flow (up and down flow) can be generated when stirring is performed, promoting the generation of vortices and improving the stirring effect. Further, the baffle plate 11a can promote separation of each liquid phase after the stirring stops.

[0024] The irradiation device 12 irradiates light inside the reaction vessel 10. In this embodiment, a photoreaction is caused by irradiating light on the first solution and the second solution stirred inside the reaction vessel 10. The irradiation device 12 includes a light source that emits light having a wavelength necessary for the reaction. As the light source, an LED, a halogen, or the like can be adopted. As the above light source, various light sources capable of irradiating light having a wavelength necessary for the reaction can be adopted. In FIG. 1, an example of irradiating light from above by the irradiation device 12 is shown, but the installation position of the irradiation device 12 is not limited to the above position, and various installation positions such as the side surface and the bottom surface of the reaction vessel 10 can be adopted.

[0025] The gas phase adjustment device 20 adjusts the source gas that constitutes the gas phase inside the reaction vessel 10. The gas phase adjustment device 20 supplies the source gas to the reaction vessel 10 and recovers the source gas (gas in the gas phase) from the reaction vessel 10. Further, the gas phase adjustment device 20 removes impurities and by-products contained in the recovered gas. The source gas is supplied to the gas phase adjustment device 20 from a supply source such as a source tank. Further, the gas phase adjustment device 20 can supply not only the source gas but also other gases (for example, air, oxygen, etc.) used in the reaction.

[0026] As shown in FIG. 1, the gas phase adjustment device 20 includes a gas phase supply path 21 that is a path capable of supplying the source gas into the reaction vessel 10, and a gas phase recovery path 22 that is a path capable of recovering the source gas in the gas phase inside the reaction vessel 10. The gas phase supply path 21 is connected to a position in the reaction vessel 10 corresponding to the separated second liquid phase (a position lower than the height position of the upper end of the second liquid phase). Further, the gas phase recovery path 22 is connected to a position in the reaction vessel 10 corresponding to the gas phase (a position above the first liquid phase). The gas phase adjustment device 20 is provided with an appropriate pump (not shown) for circulating the source gas. Further, the gas phase adjustment device 20 is provided with a valve (not shown) capable of opening and closing the gas phase supply path 21 and the gas phase recovery path 22.

[0027] The raw material gas of the gas phase adjustment device 20 is supplied to the reaction vessel 10 through the gas phase supply path 21 by the operation of the pump and blown into the second liquid phase (second solution). At this time, bubbles of the raw material gas are formed in the second solution, and the raw material gas dissolves in the second solution. Note that the finer the bubbles are, the easier it is for the raw material gas to stay and dissolve in the second solution. Therefore, a mechanism for generating fine bubbles may be provided in the reaction vessel 10 or the like.

[0028] In addition, the gas phase in the reaction vessel 10 contains the raw material gas that remains undissolved. The gas in the gas phase is recovered into the reaction vessel 10 through the gas phase recovery path 22 by the operation of the pump. After the recovered gas is removed of impurities and by-products by the gas phase adjustment device 20, it is supplied to the reaction vessel 10 again. Thus, in this embodiment, the raw material gas is recycled.

[0029] The first liquid phase adjustment device 30 adjusts the first solution that constitutes the first liquid phase in the reaction vessel 10. The first liquid phase adjustment device 30 can adjust the amount, concentration, and pH of the first solution. In addition, the first liquid phase adjustment device 30 can separate the products contained in the first solution. The first solution is supplied to the first liquid phase adjustment device 30 from a predetermined supply source.

[0030] As shown in FIG. 1, the first liquid phase adjustment device 30 includes a first liquid phase path 31 which is a path through which the first solution can flow. The first liquid phase path 31 is connected to a position in the reaction vessel 10 corresponding to the separated first liquid phase (a position lower than the height position of the upper end of the first liquid phase).

[0031] The first liquid phase adjustment device 30 is provided with an appropriate pump (not shown) for circulating the first solution. In addition, the first liquid phase adjustment device 30 is provided with a valve (not shown) that can open and close the first liquid phase path 31 and a sensor (not shown) that can measure the amount of the first solution supplied to the reaction vessel 10.

[0032] By operating the pump of the first liquid phase adjustment device 30, the first solution with adjusted concentration or the like can be supplied from the first liquid phase adjustment device 30 into the reaction vessel 10. Further, by operating the pump, the first solution from the first liquid phase can be discharged from the reaction vessel 10 to the first liquid phase adjustment device 30. The first liquid phase adjustment device 30 can separate the product contained in the discharged first solution and discharge the product to a predetermined discharge destination. In the illustrated example, an example of supplying and discharging the first solution using one first liquid phase path 31 is shown, but each path for supplying and discharging the first solution may be provided separately.

[0033] The second liquid phase adjustment device 40 adjusts the second solution that constitutes the second liquid phase in the reaction vessel 10. The second liquid phase adjustment device 40 can adjust and regenerate the solvent amount of the second solution. Further, the second liquid phase adjustment device 40 can remove by-products of the second liquid phase (second solution). The second solution is supplied to the second liquid phase adjustment device 40 from a predetermined supply source.

[0034] As shown in FIG. 1, the second liquid phase adjustment device 40 includes a second liquid phase path 41 which is a path through which the second solution can flow. The second liquid phase path 41 is connected to a position in the reaction vessel 10 corresponding to the separated second liquid phase (a position lower than the height position of the upper end of the second liquid phase).

[0035] An appropriate pump (not shown) for flowing the second solution is provided in the second liquid phase adjustment device 40 or the second liquid phase path 41. Further, the second liquid phase adjustment device 40 is provided with a valve (not shown) that can open and close the second liquid phase path 41 and a sensor (not shown) that can measure the amount of the second solution supplied to the reaction vessel 10.

[0036] By operating the pump of the second liquid phase adjusting device 40, the second solution with the solvent amount and the like adjusted can be supplied from the second liquid phase adjusting device 40 into the reaction vessel 10. Further, by operating the pump, the second solution from the second liquid phase can be discharged from the reaction vessel 10 to the second liquid phase adjusting device 40. In the illustrated example, an example in which the supply and discharge of the second solution are performed using one second liquid phase path 41 is shown, but each path for supplying and discharging the second solution may be provided separately.

[0037] The control unit 50 shown in FIG. 2 is capable of executing processing of various kinds of information. The control unit 50 includes a CPU, a memory, and the like. As shown in FIG. 2, the control unit 50 is electrically connected to the reaction vessel 10 (stirring device 11 and irradiation device 12), the gas phase adjusting device 20, the first liquid phase adjusting device 30, and the second liquid phase adjusting device 40 of the reaction apparatus 1. The control unit 50 can control the operations of the gas phase adjusting device 20, the first liquid phase adjusting device 30, and the second liquid phase adjusting device 40, as well as the valves and pumps provided in each of the above devices. Further, the control unit 50 can acquire the measurement results of the sensors provided in each device of the reaction apparatus 1.

[0038] Hereinafter, the operation of the reaction apparatus 1 will be described. The reaction apparatus 1 (control unit 50) generates a product (methanol) by controlling each process shown in the flowcharts of FIGS. 3 and 4. The reaction apparatus 1 can generate the above product at normal temperature and normal pressure. It is assumed that at the start point of the following control, the inside of the reaction vessel 10 is empty and all the valves of the reaction apparatus 1 are closed.

[0039] First, the control unit 50 executes the "reaction preparation process" shown from step S101 to step S106 in FIG. 3. The reaction preparation process is a process for performing preparation before starting the reaction in the reaction vessel 10.

[0040] In the processes from step S101 to step S103, the control unit 50 fills the reaction vessel 10 with a preset amount (predetermined amount) of the first solution. More specifically, the control unit 50 opens the valve of the first liquid phase path 31 and operates the pump of the first liquid phase adjustment device 30 to start filling the reaction vessel 10 with the first solution (step S101). Further, the control unit 50 determines whether or not the reaction vessel 10 is filled with the predetermined amount of the first solution based on the measurement result of the sensor of the first liquid phase adjustment device 30 (step S102).

[0041] When the control unit 50 determines that the reaction vessel 10 is filled with the predetermined amount of the first solution (step S102: YES), the control unit 50 stops the pump of the first liquid phase adjustment device 30, closes the valve of the first liquid phase path 31, and stops filling the reaction vessel 10 with the first solution (step S103). After executing the process of step S103, the control unit 50 proceeds to the process of step S104. Further, when the control unit 50 determines that the reaction vessel 10 is not filled with the predetermined amount of the first solution (step S102: NO), the control unit 50 proceeds to the process of step S101 (continue filling the first solution).

[0042] In the processes from step S104 to step S106, the control unit 50 fills the reaction vessel 10 with a preset amount (predetermined amount) of the second solution. More specifically, the control unit 50 opens the valve of the second liquid phase path 41 and operates the pump of the second liquid phase adjustment device 40 to start filling the reaction vessel 10 with the second solution (step S104). Further, the control unit 50 determines whether or not the reaction vessel 10 is filled with the predetermined amount of the second solution based on the measurement result of the sensor of the second liquid phase adjustment device 40 (step S105).

[0043] When the control unit 50 determines that the reaction vessel 10 is filled with a specified amount of the second solution (step S105: YES), it stops the pump of the second liquid phase adjustment device 40, closes the valve of the second liquid phase path 41, and stops the filling of the second solution into the reaction vessel 10 (step S106). After executing the process of step S106, the control unit 50 proceeds to the process of step S107. Further, when the control unit 50 determines that the reaction vessel 10 is not filled with a specified amount of the second solution (step S105: NO), it proceeds to the process of step S104 (continue filling the second solution).

[0044] By performing the above reaction preparation step, a first liquid phase and a second liquid phase are formed in the reaction vessel 10. Note that at the stage when the reaction preparation step is completed, a gas phase containing the raw material gas is not formed.

[0045] Next, the control unit 50 executes the "reaction step" shown from step S107 to step S110 in FIG. 3. The reaction step is a step of causing a chemical reaction using the raw material gas, the first solution, and the second solution in the reaction vessel 10.

[0046] In the processes from step S107 to step S109, the control unit 50 operates each device used in the chemical reaction. More specifically, the control unit 50 operates the stirring device 11 of the reaction vessel 10 to start stirring the first solution and the second solution in the reaction vessel 10 (step S107). Further, the control unit 50 opens the valve of the gas phase adjustment device 20 (gas phase supply path 21 and gas phase recovery path 22) and operates the pump of the gas phase adjustment device 20 to start supplying the raw material gas into the reaction vessel 10 (step S108). Also, the control unit 50 operates the gas phase adjustment device 20 to adjust the raw material gas and perform recycling of the raw material gas. In addition, the control unit 50 operates the irradiation device 12 of the reaction vessel 10 to start irradiation of light in the reaction vessel 10 (step S109). After executing the process of step S109, the control unit 50 proceeds to the process of step S110.

[0047] In the process of step S110, the control unit 50 determines whether or not a specified time has elapsed. As the above-mentioned specified time, it is possible to adopt a time (period) estimated that the chemical reaction in the reaction vessel 10 has sufficiently progressed. The specified time can be set based on the amounts of the first solution and the second solution filled in the reaction preparation step. When the control unit 50 determines that the specified time has elapsed (step S110: YES), it proceeds to the process of step S111. On the other hand, when the control unit 50 determines that the specified time has not elapsed (step S110: NO), it proceeds to the process of step S119 (continue irradiation of light, etc.).

[0048] By performing the above reaction step, a chemical reaction using the raw material gas, the first solution, and the second solution is carried out in the reaction vessel 10. More specifically, in the reaction step, the raw material gas is blown into the first solution and the second solution stirred in the reaction vessel 10. As a result, chlorine dioxide (chlorine dioxide gas) generated from the raw material gas (methane gas) and the first solution, and oxygen in the reaction vessel 10 are dissolved in the second solution (fluorinated solvent) which is a solvent. In this state, by irradiating light from the irradiation device 12, a reaction occurs in the reaction vessel 10 to convert methane, which is the raw material gas, to methanol. The product (methanol) generated in the reaction vessel 10 does not dissolve in the second solution and moves to the first liquid phase after liquid phase separation.

[0049] Next, the control unit 50 executes the "reaction field regeneration step" shown from step S111 to step S117 in FIG. 4. The reaction field regeneration step is a step of recovering the product generated in the reaction vessel 10 and adjusting each liquid phase.

[0050] In the processes from step S111 to step S114, the control unit 50 stops each device operated in the reaction process and waits for a predetermined time. More specifically, the control unit 50 stops the light irradiation by the irradiation device 12 (step S111). Further, the control unit 50 closes the valve of the gas phase adjustment device 20 and stops the pump to stop the supply of the raw material gas into the reaction vessel 10 (step S112). Further, the control unit 50 stops the stirring by the stirring device 11 (step S113) and waits for a predetermined time in this state (step S114). As the above-mentioned predetermined time, a time estimated to be when the first liquid phase and the second liquid phase mixed by stirring are separated can be adopted. After executing the process of step S114, the control unit 50 proceeds to the process of step S115.

[0051] In the process of step S115, the control unit 50 determines whether or not the first liquid phase and the second liquid phase are separated. The control unit 50 makes the above determination based on the measurement result of a sensor (not shown) such as an optical sensor capable of measuring the separation state of the liquid phase provided in the reaction vessel 10. When the control unit 50 determines that each liquid phase is separated (step S115: YES), it proceeds to the process of step S116. On the other hand, when the control unit 50 determines that each liquid phase is not separated (step S115: NO), it proceeds to the process of step S114 (waits for a further predetermined time).

[0052] Note that in the above-described example, an example in which both the process of waiting for a predetermined time to separate each liquid phase (step S114) and the process of determining whether or not each liquid phase is separated (step S115) are executed is shown, but it is not limited to the above aspect. For example, only one of the above processes may be executed.

[0053] In the processes of step S116 and step S117, the control unit 50 operates the first liquid phase adjustment device 30 and the second liquid phase adjustment device 40 to recover the product and adjust each liquid phase. More specifically, the control unit 50 operates the first liquid phase adjustment device 30 to take out a part of the first solution of the first liquid phase, and performs adjustment (such as adjustment of the concentration of chlorine dioxide and pH) on the taken-out first solution and supplies it into the reaction vessel 10 (step S116). Thus, when the first liquid phase adjustment device 30 is operated, the first solution is recycled between the first liquid phase adjustment device 30 and the reaction vessel 10. Further, the first liquid phase adjustment device 30 extracts the product (methanol) from the taken-out first solution. The extracted product is discharged to an appropriate discharge destination (not shown).

[0054] Also, the control unit 50 operates the second liquid phase adjustment device 40 to take out a part of the second solution of the second liquid phase, and performs adjustment (such as adjustment of the solvent amount) on the taken-out second solution and supplies it into the reaction vessel 10 (step S117). Thus, when the second liquid phase adjustment device 40 is operated, the second solution is recycled between the second liquid phase adjustment device 40 and the reaction vessel 10. Further, the second liquid phase adjustment device 40 recovers the by-products (such as fixed substances) contained in the taken-out second solution. The recovered by-products are discharged to an appropriate discharge destination (not shown). After executing the process of step S117, the control unit 50 proceeds to the process of step S118.

[0055] By executing the regeneration process of the reaction field, the first liquid phase and the second liquid phase inside the reaction vessel 10 are regenerated into a state where the reaction process can be executed again. Also, the control unit 50 counts the number of executions of the regeneration process and the reaction process of the reaction field since the start of the control.

[0056] In the process of step S118, the control unit 50 determines whether the number of executions of the reaction field regeneration process (reaction process) is equal to a specified number of cycles. The above-specified number of cycles is set in advance. When the control unit 50 determines that the number of executions of the reaction field regeneration process is equal to the specified number of cycles, it ends the processing of the reaction apparatus 1. On the other hand, when the control unit 50 determines that the number of executions of the reaction field regeneration process is not equal to the specified number of cycles, it proceeds to the processing of step S107 and executes the reaction process again.

[0057] By executing the control as described above, the reaction apparatus 1 can continuously produce a product in a chemical reaction using two liquid phases. That is, by circulating and reusing the raw material gas, the first solution, and the second solution by the gas phase adjustment device 20, the first liquid phase adjustment device 30, and the second liquid phase adjustment device 40, respectively, the product can be continuously produced without discharging all the solutions in the reaction vessel 10. Thereby, for example, compared with a batch type, the product can be produced efficiently.

[0058] The above-described control mode is an example, and the content of each process can be changed as appropriate. For example, in the above example, an example (step S118) of repeating the reaction process and the reaction field regeneration process until the specified number of cycles is shown, but it is not limited to such a mode. For example, a sensor capable of measuring the concentration of the product generated in the reaction process is provided in the reaction vessel 10, and when the measured value of the sensor exceeds a predetermined threshold value, the reaction process is terminated and the first liquid phase adjustment device 30 is operated to recover the product. A configuration can be adopted.

[0059] The first embodiment of the present invention has been described above. However, the present invention is not limited to the above configuration, and various modifications are possible within the scope of the invention described in the claims.

[0060] Hereinafter, a second embodiment of the present invention will be described with reference to FIG. 5. In the description of the following other embodiments, differences from the first embodiment will be described, and descriptions of common configurations will be omitted as appropriate.

[0061] The reaction apparatus 1A according to the second embodiment is different from the reaction apparatus 1 according to the first embodiment in that an intermediate container 60 is provided between the reaction vessel 10, the first liquid-phase adjusting device 30A, and the second liquid-phase adjusting device 40A.

[0062] The intermediate container 60 is stirred and mixed in the reaction vessel 10, and the first solution and the second solution are supplied thereto, and the first solution and the second solution are separated. The intermediate container 60 is formed with a relatively large depth dimension so that the separated first solution and second solution can be easily separated.

[0063] The intermediate container 60 includes an intermediate path 61 that is a path through which the first solution and the second solution can flow. The intermediate path 61 is connected to a middle part in the vertical direction (for example, the position of the boundary between the first liquid phase and the second liquid phase in the separated state). The intermediate path 61 is provided with an appropriate pump (not shown) for flowing the first solution and the second solution, a valve (not shown) capable of opening and closing the intermediate path 61, and a sensor (not shown) capable of measuring the amount of each solution (the first solution and the second solution in the mixed state) supplied to the intermediate container 60.

[0064] In addition, the first liquid-phase adjusting device 30A according to the present embodiment includes a first liquid-phase extraction path 31a that is a path for extracting the first solution from the intermediate container 60 to the first liquid-phase adjusting device 30A side, and a first liquid-phase supply path 31b that is a path for supplying the first solution from the first liquid-phase adjusting device 30A into the reaction vessel 10. The first liquid-phase extraction path 31a is connected to a position in the intermediate container 60 corresponding to the separated first liquid phase (a position lower than the height position of the upper end of the first liquid phase). The first liquid-phase supply path 31b is also connected to a position in the intermediate container 60 corresponding to the separated first liquid phase (a position lower than the height position of the upper end of the first liquid phase).

[0065] Further, the second liquid phase adjustment device 40A according to the present embodiment includes a second liquid phase extraction path 41a which is a path for extracting the second solution from the intermediate container 60 to the second liquid phase adjustment device 40A side, and a second liquid phase supply path 41b which is a path for supplying the second solution from the second liquid phase adjustment device 40A into the reaction vessel 10. The second liquid phase extraction path 41a is connected to a position in the intermediate container 60 corresponding to the separated second liquid phase (a position lower than the height position of the upper end of the second liquid phase). Further, the second liquid phase supply path 41b is connected to a position in the intermediate container 60 corresponding to the separated second liquid phase (a position lower than the height position of the upper end of the second liquid phase).

[0066] Hereinafter, the operation of the reaction device 1A will be described. Also in the reaction device 1A, similarly to the reaction device 1 according to the first embodiment, a reaction preparation step and a reaction step are executed (see FIG. 3). The operation of the reaction device 1A appropriately changes the processing content of the reaction field regeneration step (see FIG. 4).

[0067] Specifically, after executing the reaction step, the control unit 50 of the reaction device 1A opens the valve of the intermediate path 61 and operates the pump to supply a part of the first solution and the second solution in the mixed state in the reaction vessel 10 to the intermediate container 60. At this time, in the reaction vessel 10, light irradiation, supply of the raw material gas, and stirring are continuously performed.

[0068] Further, after supplying the first solution and the second solution to the intermediate container 60, the control unit 50 waits until the first liquid phase and the second liquid phase are separated. The control unit 50 can execute a process of waiting for a predetermined time until each liquid phase is separated, substantially in the same manner as the processes of step S114 and step S115 of the reaction field regeneration step (see FIG. 4) according to the first embodiment.

[0069] Further, when the first liquid phase and the second liquid phase are separated, the control unit 50 withdraws the first solution and the second solution from the first liquid phase adjustment device 30A and the second liquid phase adjustment device 40A via the first liquid phase extraction path 31a and the second liquid phase extraction path 41a, respectively. The first liquid phase adjustment device 30A and the second liquid phase adjustment device 40A can adjust the withdrawn first solution and second solution. Further, the first liquid phase adjustment device 30A can recover the product from the withdrawn first solution. Further, the control unit 50 can supply the first solution and the second solution adjusted by the first liquid phase adjustment device 30A and the second liquid phase adjustment device 40A into the reaction vessel 10.

[0070] Further, when the control unit 50 executes the operation of withdrawing the first solution and the second solution via the intermediate container 60 for a specified number of cycles, the control unit 50 can end the processing of the reaction apparatus 1A.

[0071] According to the reaction apparatus 1A as described above, the first liquid phase and the second liquid phase can be separated in the intermediate container 60 and the product can be recovered without stopping the irradiation of light, the supply of the raw material gas, and the stirring in the reaction vessel 10. As a result, while the first liquid phase and the second liquid phase are separated in the intermediate container 60, the chemical reaction in the reaction vessel 10 can be continuously carried out, and the product can be produced more efficiently.

[0072] As described above, the reaction apparatuses 1 and 1A according to the present embodiment are reaction apparatuses 1 and 1A that react a raw material gas, a first solution, and a second solution different from the first solution to produce a product, a reaction vessel 10 in which a gas phase containing the raw material gas, a first liquid phase composed of the first solution, and a second liquid phase composed of the second solution are formed inside; an irradiation device 12 that irradiates light onto the first solution and the second solution to react the raw material gas, the first solution, and the second solution; a gas phase adjustment device 20 that can recover the raw material gas contained in the gas phase in the reaction vessel 10 and supply the raw material gas into the reaction vessel 10 (step S108); A first liquid phase adjusting device 30, 30A that recovers the first solution contained in the first liquid phase in the reaction vessel 10 and is capable of supplying the first solution into the reaction vessel 10 (step S116), A second liquid phase adjusting device 40, 40A that recovers the second solution contained in the second liquid phase in the reaction vessel 10 and is capable of supplying the second solution into the reaction vessel 10 (step S117), It is provided with.

[0073] By configuring in this way, products can be efficiently produced. That is, when producing products by a chemical reaction using two liquid phases, the gas phase adjusting device 20, the first liquid phase adjusting device 30, and the second liquid phase adjusting device 40 recycle the raw material gas, the first solution, and the second solution respectively, so that a chemical reaction can be carried out without discharging all the solutions in the reaction vessel 10, and products can be continuously produced. Thereby, for example, compared with a batch type, products can be efficiently produced.

[0074] Further, the reaction devices 1, 1A according to the present embodiment In the reaction vessel 10, a stirring device 11 that stirs the first solution and the second solution that react with the raw material gas, After stirring by the stirring device 11, when the first liquid phase and the second liquid phase are separated, the first liquid phase adjusting device 30, 30A and the second liquid phase adjusting device 40, 40A are operated to execute control for recovering the first solution and the second solution and control for supplying the first solution and the second solution (steps S114 to S117) A control unit 50, It is provided with.

[0075] By configuring in this way, by stirring with the stirring device 11, the contact area of the first solution and the second solution can be increased, and the reaction can be promoted. Further, after stirring by the stirring device 11, by recovering the first solution and the second solution in a state where the first liquid phase and the second liquid phase are separated, the first solution and the second solution can be preferably recycled.

[0076] Further, the stirring device 11 is provided at a position eccentric with respect to the center of the reaction vessel 10 in a plan view.

[0077] By configuring in this way, it is easy to sufficiently mix each solution, and separation of each liquid phase can be promoted after the stirring stops. That is, by eccentrically disposing the stirring device 11 with respect to the center in the plan view of the reaction vessel 10 and disposing it at a portion relatively close to the inner wall, generation of a vortex or the like is promoted, the stirring effect is improved, and separation of each liquid phase can be promoted after the stirring stops. Thereby, by shortening the waiting time (step S114) until each liquid phase separates after the stirring stops, the product can be generated more efficiently. In addition, by making it easy to separate each solution, the time until each liquid phase separates after the stirring stops becomes easy to grasp. Thereby, it becomes easy to set the above-mentioned waiting time (step S114), and as a result, it becomes easy to automate the generation of the product by the reaction device 1.

[0078] Further, the reaction vessel 10 is provided with a baffle plate 11a capable of promoting the generation of a vortex by the stirring of the stirring device 11.

[0079] By configuring in this way, generation of a vortex during stirring can be promoted, it is easy to sufficiently mix each solution, and separation of each liquid phase can be promoted after the stirring stops.

[0080] Further, the reaction device 1A according to the present embodiment is provided with an intermediate container 60 capable of taking out a part of the first solution and the second solution in the reaction vessel 10, The control unit 50 is after stirring by the stirring device 11, takes out a part of the first solution and the second solution that are not separated into the intermediate container 60, When the first liquid phase and the second liquid phase in the intermediate container 60 are separated, it is possible to execute control to operate the first liquid phase adjustment device 30A and the second liquid phase adjustment device 40A to recover the first solution and the second solution from the intermediate container 60.

[0081] By configuring in this way, the product can be produced more efficiently. That is, without stopping the irradiation of light, the supply of the raw material gas, and the stirring in the reaction vessel 10, the first liquid phase and the second liquid phase can be separated in the intermediate container 60, and the product can be recovered. As a result, while the first liquid phase and the second liquid phase are separated in the intermediate container 60, the chemical reaction in the reaction vessel 10 can be continuously carried out, and the product can be produced more efficiently.

[0082] As described above, each embodiment of the present invention has been described, but the present invention is not limited to the above-described embodiments. For example, the configuration of each part constituting the reaction apparatuses 1 and 1A is not limited to that described above, and can be changed as appropriate.

[0083] Also, in the above embodiment, an example in which the stirring device 11 is provided at a position eccentric with respect to the center of the reaction vessel 10 in plan view is shown, but it is not limited to such a mode, and the stirring device 11 may be provided at the center of the reaction vessel 10 in plan view.

[0084] Also, in the above embodiment, an example in which the baffle plate 11a is provided in the reaction vessel 10 is shown, but it is not limited to such a mode, and the baffle plate 11a may not be provided.

[0085] Also, in the above embodiment, an example in which the first liquid phase is formed on the upper side and the second liquid phase is formed on the lower side in the reaction vessel 10 is shown, but it is not limited to such a mode, and the first liquid phase may be formed on the lower side and the second liquid phase may be formed on the upper side.

[0086] In addition, in the above-described embodiment, an example in which the reaction process is carried out at normal temperature and pressure has been shown, but it is not limited to such a mode. For example, the inside of the reaction vessel 10 may be pressurized with a raw material gas and the reaction process may be carried out. Further, the reaction process may be carried out with the inside of the reaction vessel 10 heated or cooled.

[0087] In addition, in the above-described embodiment, an example in which methanol is produced as a product has been shown, but it is not limited to such a mode. For example, alcohol may be adopted as the product. Further, the product is not limited to the above-described example, and various products produced by a chemical reaction using two liquid phases (aqueous phase and solvent phase) can be adopted.

[0088] In addition, in the present embodiment, an example in which methane is adopted as the raw material gas has been shown, but it is not limited to such a mode. As the raw material gas, various gases corresponding to the product can be adopted. Further, in the present embodiment, an aqueous solution containing a source (sodium chlorite) of chlorine dioxide, which is an oxidizing agent, has been adopted as the first solution, but it is not limited to such a mode. As the first solution, various aqueous solutions constituting the aqueous phase can be adopted. Further, in the present embodiment, a fluorinated solvent has been adopted as the second solution, but it is not limited to such a mode. As the second solution, various solvents constituting the solvent phase can be adopted.

Explanation of Reference Numerals

[0089] 1 Reaction apparatus 10 Reaction vessel 20 Gas phase adjustment device 30 First liquid phase adjustment device 40 Second liquid phase adjustment device 50 Control unit

Claims

1. A reaction apparatus for reacting a raw material gas, a first solution, and a second solution different from the first solution to produce a product, comprising: A reaction vessel in which a gas phase containing the raw material gas, a first liquid phase composed of the first solution, and a second liquid phase composed of the second solution are formed inside; An irradiation device that irradiates light onto the first solution and the second solution to react the raw material gas, the first solution, and the second solution; A gas phase adjustment device that recovers the raw material gas contained in the gas phase in the reaction vessel and can supply the raw material gas into the reaction vessel; A first liquid phase adjustment device that recovers the first solution contained in the first liquid phase in the reaction vessel and can supply the first solution into the reaction vessel; A second liquid phase adjustment device that recovers the second solution contained in the second liquid phase in the reaction vessel and can supply the second solution into the reaction vessel; A reaction apparatus comprising the above.

2. A stirring device for stirring the first solution and the second solution that react with the raw material gas in the reaction vessel; After stirring by the stirring device, when the first liquid phase and the second liquid phase are in a separated state, a control unit capable of operating the first liquid phase adjustment device and the second liquid phase adjustment device to perform control for recovering the first solution and the second solution and control for supplying the first solution and the second solution; The reaction apparatus according to Claim 1, comprising the above.

3. The stirring device is: Provided at a position eccentric with respect to the center of the reaction vessel in a plan view. The reaction apparatus according to Claim 2.

4. The reaction vessel is: Equipped with a baffle plate capable of promoting the generation of vortices by the stirring of the stirring device. The reaction apparatus according to Claim 2 or Claim 3.

5. Comprising an intermediate container capable of taking out a part of the first solution and the second solution in the reaction vessel; The control unit is: After stirring by the stirring device, taking out a part of the first solution and the second solution in a non-separated state into the intermediate container; When the first liquid phase and the second liquid phase in the intermediate container are in a separated state, capable of operating the first liquid phase adjustment device and the second liquid phase adjustment device to perform control for recovering the first solution and the second solution from the intermediate container. The reaction apparatus according to Claim 2.

Citation Information

Patent Citations

  • Semiconductor pressure sensor and manufacture thereof

    JP1985080281A