Distribution valve and water heater including the same

Abstract

To provide a distribution valve which includes a flow rate adjustment function and expands a setting range of a distribution ratio in areas where flow rate adjustment is performed, and to provide a water heater including the distribution valve.SOLUTION: A distribution valve (10) includes: a valve body (11) having first and second outlets (13, 14) and an inlet (15); a cylindrical valve body (20) which is rotatably inserted and fitted into the valve body; and drive means (12) which rotates the valve body in a predetermined rotation range through a valve stem (22). First and second openings (23, 24) which continuously change the opening areas of the first and second outlets by rotation are formed in the peripheral wall part (21b) of the valve body, and third openings (27) which change the opening area of the inlet by rotation are formed at the bottom surface part (26a) of the valve body. A distribution ratio for distributing fluid flowing from the inlet into the valve body into the first outlet and the second outlet may vary. In the rotation range, a distribution ratio adjustment area in which the distribution ratio is adjusted and flow rate adjustment areas in which the flow rate of the fluid circulating in the valve body is adjusted, are set. In the flow rate adjustment areas (R1, R4) set in multiple areas in the rotation range, the distribution ratio is fixed to values different from each other.SELECTED DRAWING: Figure 9

Description

Technical Field

[0001] The present invention relates to a distribution valve having a function of adjusting the distribution ratio and total flow rate of a fluid and a blocking function of setting the total flow rate to zero, and a water supply device provided with this distribution valve.

Background Art

[0002] Conventionally, for example, a water supply device that uses combustion heat to heat low-temperature city water flowing through a heat exchanger and adjusts the temperature by mixing the heated high-temperature water and city water to supply hot water has been used. The water supply device controls the heating capacity to adjust the temperature of the high-temperature water, and adjusts the mixing ratio of the high-temperature water and city water to adjust the hot water supply temperature.

[0003] For example, Patent Documents 1 and 2 describe a mixing valve having a cylindrical valve body having an opening in the peripheral wall and an open bottom, and a valve body that rotatably houses this valve body. In the valve body, in a portion corresponding to the peripheral wall of the valve body, inlets for two fluids such as water and hot water are formed, and an outlet is formed in a portion corresponding to the bottom of the valve body. And this mixing valve changes the opening area of the peripheral wall with respect to the two inlets by rotating the valve body, adjusts the mixing ratio of the fluids introduced from the two inlets, or blocks the two inlets. Such a mixing valve can be applied as a mixing valve for mixing heated high-temperature water and unheated city water in a water supply device.

[0004] On the other hand, there is a type of water supply device that distributes the supplied city water to a heat exchanger and a bypass passage that bypasses this heat exchanger by a distribution valve, and mixes the heated high-temperature water and unheated city water to supply hot water. In such a water supply device, the mixing ratio of the high-temperature water and city water is adjusted by adjusting the distribution ratio in the distribution valve. For example, the mixing valve of Patent Documents 1 and 2 can be used as a distribution valve by using the outlet as the inlet of the city water and the two inlets as the two outlets of the city water, that is, by reversing the fluid flow direction.

Prior Art Documents

Patent Documents

[0005] [Patent Document 1] Japanese Patent No. 4933855 [Patent Document 2] Japanese Patent No. 6103198 [Summary of the Invention] [Problems to be Solved by the Invention]

[0006] For example, in a special case where the heating capacity is insufficient during high-temperature hot water supply, the total flow rate of the make-up water supplied to the hot water supply device, that is, the hot water supply flow rate, is reduced to cover the insufficient heating capacity, and hot water supply at a set temperature is performed. However, the mixing valves of Patent Documents 1 and 2 do not have a function of adjusting the total flow rate of the fluid. Therefore, a flow rate adjustment valve is generally arranged on the downstream side of the mixing valve or distribution valve of the hot water supply device, and the total flow rate is reduced by adjusting this flow rate adjustment valve.

[0007] On the other hand, for example, as in Japanese Patent Application No. 2023-181622, the applicant has already proposed a distribution valve having a flow rate adjustment function. The distribution valve having this flow rate adjustment function adjusts the opening area of the inlet in the rotation region of the valve body where the ratio of the opening areas of the two outlets is constant, that is, adjusts the total flow rate in the rotation region of the valve body where the distribution ratio is constant.

[0008] In the hot water supply device equipped with this distribution valve, in the rotation region where the total flow rate of the distribution valve is adjusted, since the distribution ratio is fixed, the hot water supply temperature is adjusted by adjusting the heating capacity. However, for hot water supply at a temperature lower than a predetermined temperature (for example, 40°C), the temperature of the combustion gas used for heating drops too much, and moisture in the combustion gas condenses in the heat exchanger that should not originally condense, which may cause problems. Therefore, the adjustment range of the hot water supply temperature is limited to a temperature higher than the predetermined temperature.

[0009] Therefore, a technique for expanding the adjustment range of the hot water supply temperature in the rotation region where the flow rate of the distribution valve is adjusted has been demanded. Thus, an object of the present invention is to provide a distribution valve having a flow rate adjustment function and an expanded setting range of the distribution ratio in the rotation region where the flow rate is adjusted, and a hot water supply device equipped with this distribution valve.

Means for Solving the Problem

[0010] The distribution valve according to the invention of claim 1 includes a valve body having a first outlet, a second outlet, and an inlet, a cylindrical valve element rotatably inserted into the valve body, and drive means for rotating the valve element within a predetermined rotation range via a valve shaft extending from the top surface portion of the valve element. On the peripheral wall portion of the valve element, a first opening and a second opening are formed which continuously change the opening areas of the first outlet and the second outlet by rotation. On the bottom surface portion of the valve element, a third opening is formed which changes the opening area of the inlet by rotation. In a distribution valve with a variable distribution ratio for distributing the fluid flowing into the valve body from the inlet to the first outlet and the second outlet, within the rotation range, a distribution ratio adjustment region for adjusting the distribution ratio and a flow rate adjustment region for adjusting the flow rate of the fluid flowing through the valve body are set. The flow rate adjustment region is set in a plurality of regions within the rotation range, and in these plurality of flow rate adjustment regions, the distribution ratios are fixed to different distribution ratios, respectively.

[0011] According to the above configuration, within the rotation range of the valve element of the distribution valve, a distribution ratio adjustment region and a flow rate adjustment region are set. In the distribution ratio adjustment region, the distribution ratio of the fluid distributed to the first outlet and the second outlet is adjusted by the rotation of the valve element. Also, in the flow rate adjustment region, although the distribution ratio is fixed, the flow rate (total flow rate) of the fluid flowing in from the inlet and flowing due to the rotation of the valve element is adjusted. Since a plurality of these flow rate adjustment regions are set within the rotation range with different distribution ratios, the flow rate can be adjusted with different distribution ratios. Therefore, the setting range of the distribution ratio of the distribution valve in the flow rate adjustment region can be expanded.

[0012] The distribution valve according to the invention of claim 2 is characterized in that, in the invention of claim 1, the flow rate adjustment region has a first flow rate adjustment region and a second flow rate adjustment region set so as to sandwich the distribution ratio adjustment region within the rotation range. According to the above configuration, a first flow rate adjustment region is set on one end side of the distribution ratio adjustment region, and a second flow rate adjustment region is set on the other end side. Therefore, the distribution ratios of the first and second flow rate adjustment regions can be fixed by approaching or matching the distribution ratios at both ends of the distribution ratio adjustment region. Therefore, when shifting from the distribution ratio adjustment region to the flow rate adjustment region and vice versa, fluctuations in the distribution ratio can be reduced, and fluctuations in the flow rate of the distributed fluid can be reduced.

[0013] The distribution valve of the invention according to claim 3 is, in the invention according to claim 2, characterized in that the opening area of the inlet is constant in the distribution ratio adjustment region, and the opening area of the inlet becomes smaller as the first flow rate adjustment region and the second flow rate adjustment region are farther away from the distribution ratio adjustment region. According to the above configuration, in the first flow rate adjustment region and the second flow rate adjustment region, the flow rate of the fluid flowing in from the inlet decreases as the distance from the distribution ratio adjustment region increases. Therefore, fluctuations in the flow rate during the transition from the distribution ratio adjustment region to the flow rate adjustment region and vice versa can be reduced.

[0014] The water supply device of the invention according to claim 4 includes a heat exchanger, a water supply passage for supplying low-temperature water to the heat exchanger, a hot water outlet passage for discharging high-temperature water heated by the heat exchanger, and a bypass passage branched from the water supply passage to bypass the heat exchanger and connected to the hot water outlet passage, and is characterized in that the distribution valve according to any one of claims 1 to 3 is disposed at the branch portion of the water supply passage and the bypass passage. According to the above configuration, in a water supply device that adjusts the temperature by mixing high-temperature water and make-up water to supply hot water, the supplied make-up water is distributed by a distribution valve to generate non-heated make-up water and heated high-temperature water. Since this distribution valve has a plurality of flow rate adjustment regions fixed at different distribution ratios within the rotation range of the valve body, high-temperature water and make-up water can be mixed at different distribution ratios, and the adjustment range of the hot water supply temperature in the flow rate adjustment region can be expanded.

Advantages of the Invention

[0015] According to the distribution valve of the present invention and the water supply device equipped with this distribution valve, it is possible to expand the setting range of the distribution ratio in the rotation region where the flow rate adjustment function is provided and the flow rate adjustment is performed, and it is possible to expand the adjustment range of the hot water supply temperature in the flow rate adjustment region.

Brief Description of the Drawings

[0016]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Figure 10

Modes for Carrying Out the Invention

[0017] Hereinafter, the modes for carrying out the present invention will be described based on examples.

Example

[0018] First, the hot water supply device to which the distribution valve of the present invention is applied will be described. As shown in FIG. 1, the water heater 1 has a combustion device 2 equipped with a burner, a blower fan, etc. and a heat exchanger 3, and is a combustion type water heater that heats the make-up water in the heat exchanger 3 by utilizing the heat (combustion heat) of the combustion gas generated in the combustion device 2. This water heater 1 includes a water supply passage 4 that supplies make-up water to the heat exchanger 3, a hot water outlet passage 5 that discharges the hot water from the heat exchanger 3, a distribution valve 10 installed in the water supply passage 4, a bypass passage 6 that branches from the water supply passage 4 at the distribution valve 10 and is connected to the hot water outlet passage 5, a control means 7 that performs hot water supply control, etc. The distribution valve 10 distributes the supplied make-up water to the heat exchanger 3 side and the bypass passage 6 side. The heat exchanger 3 has a sensible heat recovery heat exchanger and a latent heat recovery heat exchanger, and a neutralizer 9 is installed in the water heater 1 in order to neutralize and drain the strongly acidic drain water in which the moisture contained in the combustion gas condenses in the latent heat recovery heat exchanger.

[0019] A hot water temperature sensor 8a is installed in the hot water outlet passage 5 on the downstream side of the connection portion with the bypass passage 6. A water supply temperature sensor 8b and a water supply flow rate sensor 8c are installed in the water supply passage 4 on the downstream side of the distribution valve 10. The control means 7 controls the combustion heat amount generated in the combustion device 2 and the distribution ratio of the distribution valve 10 based on the detected temperature (water supply temperature) of the water supply temperature sensor 8b and the detected flow rate of the water supply flow rate sensor 8c so that the detected temperature (hot water temperature) of the hot water temperature sensor 8a becomes the set hot water temperature. The flow rate (total flow rate) of the make-up water flowing into and flowing through the distribution valve 10 is calculated by the detected flow rate of the water supply flow rate sensor 8c and the distribution ratio of the distribution valve 10.

[0020] The distribution valve 10 is controlled so that the distribution to the heat exchanger 3 side increases as the heating capacity required for hot water supply at the set hot water temperature increases. Further, the distribution valve 10 is controlled so that the total flow rate decreases or becomes zero as necessary.

[0021] Next, the distribution valve 10 will be described. As shown in FIG. 2, the distribution valve 10 is equipped with a drive unit 12 (driving means) having, for example, a stepping motor, on the valve body 11. Here, the distribution valve 10 is described as being equipped in the water heater 1 with the drive unit 12 facing upward. Arrows U, F, and L in the figure represent the upper, front, and left sides of the distribution valve 10, respectively. Note that the posture of the distribution valve 10 is appropriately changed according to the equipment to which it is attached.

[0022] The valve body 11 is formed of, for example, synthetic resin, has a first outlet 13 and a second outlet 14 on its side surface, and an inlet 15 on its bottom. The drive unit 12 is fixed to the mounting plate 16 on the upper part of the valve body 11 by a plurality of fastening members 17. The distribution valve 10 is interposed in the water supply passage 4 with the inlet 15 and the second outlet 14 connected to the water supply passage 4. A bypass passage 6 is connected to the first outlet 13. The incoming water indicated by arrow WI introduced into the inlet 15 upward is distributed into the incoming water supplied from the first outlet 13 to the bypass passage 6 as indicated by arrow WO1 and the incoming water supplied from the second outlet 14 to the heat exchanger 3 as indicated by arrow WO2.

[0023] As shown in FIGS. 3 and 4, a cylindrical valve body 20 formed of, for example, synthetic resin is rotatably inserted into a space formed in a cylindrical shape inside the valve body 11. A valve shaft 22 having the same central axis C as the valve body 20 extends from a top surface portion 21a covering the top surface of the valve body 20 to the outside of the valve body 11. A collar member 30 that rotatably supports the valve shaft 22 is inserted into the valve body 11 together with the valve body 20. The valve body 20 and the collar member 30 are prevented from falling off the valve body 11 by a mounting plate 16 fixed to the valve body 11 by a plurality of fastening members 18. In order to rotationally drive the valve body 20 via the valve shaft 22 by the drive unit 12 fixed to the mounting plate 16, serration processing is performed on a part of the valve shaft 22. Note that the internal structure of the drive unit 12 is omitted from the illustration and description.

[0024] Two O-rings 22a are mounted on the valve shaft 22 to provide a watertight seal between the shaft and the collar member 30. An O-ring 30a is also mounted on the outer periphery of the collar member 30 to provide a watertight seal between the collar member and the valve body 11. A rotation restricting portion 33 is formed on the insertion portion 32 of the collar member 30 through which the mounting plate 16 is inserted, to engage with the mounting plate 16 and prevent the collar member 30 from rotating as the valve body 11 rotates.

[0025] A valve seat member 40, for example made of synthetic resin, is inserted into the communication portion of the inlet 15 at the bottom of the valve body 11. The valve seat member 40 has a cylindrical portion 41 formed in a cylindrical shape, a top surface portion 42, and a sealing portion 43 that extends from the top surface portion 42 toward the valve element 20 and seals by contacting the bottom surface portion 26a of the valve element 20. A groove 44 is formed on the top surface portion 42 to surround the outer periphery of the sealing portion 43 along the base end portion of the sealing portion 43. The sealing portion 43 is formed in a cylindrical shape with a substantially fan-shaped opening, and the inner space of the inlet 15 and the inner space of the cylindrical valve element 20 can communicate through the inside of the cylindrical sealing portion 43 and the inside of the cylindrical portion 41.

[0026] Next, the valve element 20 will be described. As shown in FIGS. 3 and 5, the valve element 20 is formed by fitting a disc-shaped second valve element 26 having a bottom surface portion 26a into the open end of a first valve element 21 having a cylindrical peripheral wall portion 21b and a top surface portion 21a. A plurality of key grooves 21c are formed on the inner periphery of the peripheral wall portion 21b at this open end. A plurality of keys 26b corresponding to the plurality of key grooves 21c of the first valve element 21 are formed on the second valve element 26.

[0027] The plurality of key grooves 21c and the corresponding plurality of keys 26b prevent relative rotation between the first valve element 21 and the second valve element 26 and position them in the circumferential direction, so that the first valve element 21 and the second valve element 26 rotate integrally. The peripheral wall portion 21b slides against the inner peripheral surface surrounding the side surface of the space formed in a cylindrical shape inside the valve body 11 and functions as a sealing surface portion that closes the first outlet 13 and the second outlet 14 of the valve body 11. The bottom surface portion 26a functions as a sealing surface portion that closes the inlet 15 of the valve body 11.

[0028] The first valve body 21 has a first opening 23 for communicating the internal space of the valve body 20 with the first outlet 13 on the upper stage side (the top surface portion 21a side) of the peripheral wall portion 21b. Further, the first valve body 21 has a second opening 24 for communicating the internal space of the valve body 20 with the second outlet 14 on the lower stage side (the open end side) of the peripheral wall portion 21b. The first opening 23 and the second opening 24 are formed such that the opening widths (heights) in the axial direction change respectively when moving in the circumferential direction. Further, a plurality of reinforcing ribs 21d for reinforcing the peripheral wall portion 21b and the top surface portion 21a are formed to project into the internal space on the first valve body 21. By these reinforcing ribs 21d, the deformation of the first valve body 21 in the radial direction and the axial direction is suppressed.

[0029] The second valve body 26 has a plurality of third openings 27 for communicating the internal space of the valve body 20 with the inlet 15. The bottom surface portion 26a has an annular outer peripheral portion and a fan-shaped portion connecting between the annular outer peripheral portion and its central portion, and occupies about half of the projected area of the valve body 20 in the axial direction. In order to suppress the deformation (axial displacement) of this bottom surface portion 26a, a plurality of reinforcing ribs 26c connecting the annular outer peripheral portion and its central portion are radially formed on the bottom surface portion 26a on the side facing the internal space of the valve body 20.

[0030] As shown in FIG. 6, the first outlet 13 communicates with the internal space of the valve body 20 through a communication portion 13a opened in a semi-circular shape with a straight lower end and the first opening 23 of the valve body 20. Further, as shown in FIG. 7, the second outlet 14 communicates with the internal space of the valve body 20 through a communication portion 14a opened in a semi-circular shape with a straight upper end and the second opening 24 of the valve body 20. And, as shown in FIG. 8, the inlet 15 to which the valve seat member 40 is attached communicates with the internal space of the valve body 20 through the inside of the cylindrical portion 41 of the valve seat member 40, the inside of the fan-shaped seal portion 43, and the third opening 27 of the valve body 20.

[0031] The opening areas of the first opening 23 communicating with the first outlet 13 (the opening area of the first outlet 13), the opening area of the second opening 24 communicating with the second outlet 14 (the opening area of the second outlet 14), and the opening area of the third opening 27 communicating with the inlet 15 (the opening area of the inlet 15) change within predetermined ranges respectively set in advance by the rotation of the valve body 20. Here, as shown in FIGS. 6 and 7, when the opening areas of the first outlet 13 and the second outlet 14 are, for example, equal and minimum, and as shown in FIG. 8, when the opening area of the inlet 15 is half of that at full opening, the initial state of the rotation angle of the valve body 20 is set to 0 degrees. Note that the predetermined range is from maximum to zero (closed) at the inlet 15, and from non-zero minimum to maximum at the first outlet 13 and the second outlet 14. However, when the inlet 15 is closed, the first and second outlets 13 and 14 may also be closed.

[0032] When the valve body 20 in the initial state is rotated clockwise (clockwise when viewed from above), the opening areas of the first outlet 13 and the second outlet 14 increase while remaining equal to each other, and the opening area of the inlet 15 also increases. As a result, in a state where the distribution ratio is 1:1 between the first outlet 13 and the second outlet 14, that is, in a state fixed to a distribution ratio where the flow rate of the first outlet 13 is 0.5 with respect to the total flow rate, the total flow rate can be increased. As shown in FIG. 9, the region from the initial state with a rotation angle of 0 degrees to the rotation angle region where the distribution ratio is fixed is defined as the first flow rate adjustment region R1. The first flow rate adjustment region R1 is a region where the rotation angle is from 0 degrees to, for example, 65 degrees. Note that the fixed distribution ratio is not limited to the above and can be set as appropriate.

[0033] When further rotated, it shifts from the first flow rate adjustment region R1 through the unused region R2 to the distribution ratio adjustment region R3. The unused region R2 is a region where the rotation angle is, for example, from 65 degrees to 75 degrees, and is a region for eliminating the mismatch between the opening area of the inlet 15 and the opening areas of the first and second outlets 13 and 14 between the first flow rate adjustment region R1 and the distribution ratio adjustment region R3. Therefore, the unused region R2 is not used for controlling the distribution ratio and the total flow rate.

[0034] As the rotation angle increases in the distribution ratio adjustment region R3, the opening area of the inlet 15 remains maximum and constant, and the flow rate ratio of the first outlet 13 to the total flow rate changes from 0.7 to 0.1, that is, the distribution ratio between the first outlet 13 and the second outlet 14 changes from 7:3 to 1:9. As such, the opening area of the first outlet 13 decreases from the maximum while the opening area of the second outlet 14 increases. The distribution ratio adjustment region R3 is a region where the rotation angle ranges from, for example, 75 degrees to 220 degrees. Note that the range of the distribution ratio is not limited to the above and can be set as appropriate.

[0035] If it is further rotated, it shifts from the distribution ratio adjustment region R3 to the second flow rate adjustment region R4. In the second flow rate adjustment region R4, the flow rate ratio of the first outlet 13 to the total flow rate is 0.1, that is, the distribution ratio between the first outlet 13 and the second outlet 14 remains constant at 1:9. The opening area of the inlet 15 is changed from the maximum to zero, and the total flow rate is adjusted. The second flow rate adjustment region R4 is a region where the rotation angle ranges from, for example, 220 degrees to 300 degrees. Note that the range of the distribution ratio is not limited to the above and can be set as appropriate to a distribution ratio different from that of the first flow rate adjustment region R1.

[0036] The fixed distribution ratios in the second flow rate adjustment region R4 and the first flow rate adjustment region R1 are different. In the second flow rate adjustment region R4, the flow rate of the first outlet 13 with respect to the total flow rate is smaller than that in the first flow rate adjustment region R1. Therefore, in the water supply device 1 equipped with the distribution valve 10, when it is necessary to throttle the total flow rate, for example, during high-temperature water supply, the second flow rate adjustment region R4 where the flow rate of the first outlet 13 connected to the bypass passage 6 is small is used. Also, the distribution ratio adjustment region R3 is used during normal water supply. On the other hand, since the flow rate of the first outlet 13 with respect to the total flow rate in the first flow rate adjustment region R1 is larger than that in the second flow rate adjustment region R4, it is used for water supply at a lower temperature than water supply in the second flow rate adjustment region R4 while throttling the total flow rate.

[0037] When it is further rotated, it shifts from the second flow rate adjustment region R4 to the blocking region R5. In the blocking region R5, since the inlet 15 is blocked by the bottom surface portion 26a of the valve body 20, the opening area of the inlet 15 becomes zero, and the total flow rate becomes zero. The blocking region R5 is a region where the rotation angle is, for example, from 300 degrees to 315 degrees, and the rotation range of the valve body 20 is a range where the rotation angle is from 0 degrees to 315 degrees. Note that the rotation range and each region set within the rotation range are not limited to the above rotation angle range and can be set as appropriate.

[0038] As described above, the distribution valve 10 has a distribution ratio adjustment region R3 for adjusting the distribution ratio and a plurality of flow rate adjustment regions (first and second flow rate adjustment regions R1, R4) within the rotation range of the valve body 20. The first and second flow rate adjustment regions R1, R4 are set so as to sandwich the distribution ratio adjustment region R3. The first flow rate adjustment region R1 and the second flow rate adjustment region R4 are fixed to different distribution ratios. Further, the first and second flow rate adjustment regions R1, R4 are each set such that the total flow rate decreases, that is, the opening area of the inlet 15 decreases, as they are farther from the distribution ratio adjustment region R3.

[0039] FIG. 10 shows the range of the hot water supply temperature adjustable according to the inlet water temperature of the hot water supply device 1 equipped with the distribution valve 10 for each region set within the rotation range. The total flow rate is the maximum flow rate (here, 20 L / min) restricted by the distribution valve 10, and it is the case where, for example, the hot water supply faucet at the hot water supply destination is fully open. Note that the upper limit of the hot water outlet temperature is restricted to be between 60°C and 65°C for safety reasons.

[0040] In the distribution ratio adjustment region R3, since the total flow rate is large, the outlet temperature can be adjusted to a low temperature corresponding to the inlet temperature with the minimum heating capacity that does not cause condensation in the sensible heat recovery heat exchanger of the heat exchanger 3 where condensation does not normally occur. In the second flow rate adjustment region R4 that has been used for adjusting the conventional total flow rate, since the distribution ratio of the first outlet 13 is constant and small, the lower limit of the outlet temperature that can be adjusted with the minimum heating capacity that does not cause condensation in the sensible heat recovery heat exchanger is about 35°C to 40°C. On the other hand, in the first flow rate adjustment region R1, since the distribution ratio of the first outlet 13 is larger and constant than that in the second flow rate adjustment region R4, the proportion of the make-up water to be mixed increases. Therefore, in the first flow rate adjustment region R1, the lower limit of the outlet temperature that can be adjusted with the minimum heating capacity that does not cause condensation in the sensible heat recovery heat exchanger decreases, and the supply water temperature can be adjusted to a lower temperature than in the second flow rate adjustment region R4 while adjusting the total flow rate.

[0041] The operation and effects of the above-mentioned distribution valve 10 and the water supply device 1 equipped with this distribution valve 10 will be described. Within the rotation range of the valve body 20 of the distribution valve 10, a distribution ratio adjustment region R3 and a flow rate adjustment region are set. In the distribution ratio adjustment region R3, the distribution ratio of the fluid distributed to the first outlet 13 and the second outlet 14 is adjusted by the rotation of the valve body 20. Also, in the flow rate adjustment region, the distribution ratio is fixed, but the flow rate (total flow rate) of the fluid flowing in from the inlet 15 and flowing through the valve body 20 is adjusted by the rotation of the valve body 20. And since a plurality of flow rate adjustment regions (R1, R4) are set within the rotation range with different distribution ratios, the distribution valve 10 can adjust the inflow amount with different distribution ratios. Therefore, the setting range of the distribution ratio by the distribution valve 10 in the inflow amount adjustment region can be expanded.

[0042] Also, the first flow rate adjustment region R1 is set on one end side of the distribution ratio adjustment region R3, and the second flow rate adjustment region R4 is set on the other end side. Therefore, the distribution ratios of the first and second flow rate adjustment regions R1, R4 can be fixed by approaching or matching the distribution ratios at both ends of the distribution ratio adjustment region R3, respectively. Therefore, when shifting from the distribution ratio adjustment region R3 to the flow rate adjustment region (R1, R4) and vice versa, the fluctuation of the distribution ratio can be reduced, and the fluctuation of the flow rate of the distributed fluid can be reduced.

[0043] Moreover, in the first flow rate adjustment region R1 and the second flow rate adjustment region R4, the flow rate (total flow rate) decreases as the distance from the distribution ratio adjustment region R3 increases. Therefore, it is possible to reduce the fluctuation of the flow rate during the transition from the distribution ratio adjustment region R3 to the flow rate adjustment regions (R1, R4) and vice versa.

[0044] In addition, the water heater 1 in which the distribution valve 10 is disposed at the branch portion of the water supply passage 4 and the bypass passage 6 distributes the supplied raw water with the distribution valve 10 to generate non-heated raw water and heated high-temperature water when adjusting the temperature by mixing high-temperature water and raw water to supply hot water. Since this distribution valve 10 has a plurality of flow rate adjustment regions (R1, R4) fixed to different distribution ratios within the rotation range of the valve body 20, high-temperature water and raw water can be mixed at different distribution ratios, and the adjustment range of the hot water temperature in the flow rate adjustment region can be expanded.

[0045] The distribution valve 10 can also be applied to devices other than the water heater 1, and the fluid may be other than raw water. Further, by reversing the flow direction of the fluid, the distribution valve 10 can be used as a mixing valve having a function of adjusting the distribution ratio and the total flow rate and a blocking function. In addition, those skilled in the art can implement the above-described embodiment in various modified forms without departing from the spirit of the present invention, and the present invention includes such modified forms.

Explanation of Reference Numerals

[0046] 1: Water heater 3: Heat exchanger 4: Water supply passage 5: Hot water outlet passage 6: Bypass passage 7: Control means 10: Distribution valve 11: Valve body 12: Driving unit (driving means) 13: First outlet 14: Second outlet 15: Inlet 16: Mounting plate 20: Valve body 21: First valve body 21a: Top surface part 21b: Peripheral wall part 22: Valve shaft 23: First opening 24: Second opening 26: Second valve body 26a: Bottom surface part 27: Third opening 30: Color member 40: Valve seat member 41: Cylindrical part 43: Seal part

Claims

1. A distribution valve having a valve body with a first outlet, a second outlet, and an inlet, a cylindrical valve body rotatably inserted into the valve body, and drive means for rotating the valve body within a predetermined rotation range via a valve shaft extending from the top surface of the valve body. On the peripheral wall of the valve body, a first opening and a second opening are formed to continuously change the opening areas of the first outlet and the second outlet by rotation. On the bottom surface of the valve body, a third opening is formed to change the opening area of the inlet by rotation. In a distribution valve with a variable distribution ratio for distributing the fluid flowing into the valve body from the inlet to the first outlet and the second outlet, within the rotation range, a distribution ratio adjustment region for adjusting the distribution ratio and a flow rate adjustment region for adjusting the flow rate of the fluid flowing through the valve body are set, the flow rate adjustment region is set in a plurality of regions within the rotation range, and in these plurality of flow rate adjustment regions, the distribution ratio is fixed to different distribution ratios respectively. The distribution valve is characterized by this.

2. The distribution valve according to claim 1, wherein the flow rate adjustment region has a first flow rate adjustment region and a second flow rate adjustment region set so as to sandwich the distribution ratio adjustment region within the rotation range.

3. in the distribution ratio adjustment region, the opening area of the inlet is constant, the first flow rate adjustment region and the second flow rate adjustment region are characterized in that the opening area of the inlet becomes smaller as they are farther from the distribution ratio adjustment region. The distribution valve according to claim 2.

4. A hot water supply device comprising a heat exchanger, a water supply passage for supplying low-temperature water to the heat exchanger, a hot water outlet passage for discharging high-temperature water heated by the heat exchanger, and a bypass passage branched from the water supply passage and connected to the hot water outlet passage to bypass the heat exchanger, wherein the distribution valve according to any one of claims 1 to 3 is disposed at the branch portion of the water supply passage and the bypass passage. The hot water supply device is characterized by this.

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