Automated system for removable reaction portion of epitaxial reactor

Abstract

To provide an automated handler for handling removable reaction sites for preventive maintenance operations.SOLUTION: In the present invention, a reaction portion may be used in a reactor for epitaxial deposition of a semiconductor film on a substrate. The present invention further relates to a removable reaction portion of the reactor adapted to cooperate with an automated handler, and to an assembly incorporating the reaction portion and the automated handler.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to the field of automation, and more specifically, to an automatic handling machine for handling a removable reaction part for preventive maintenance operations, the reaction part being used in a reactor for epitaxial deposition of a semiconductor film on a substrate.

[0002] The present invention further relates to a removable reaction part of a reactor adapted to cooperate with the above-described automatic handling machine, and an assembly incorporating the above-described machine.

Background Art

[0003] An epitaxial growth apparatus for the semiconductor industry may include a reactor that houses a reaction / deposition chamber in which a chemical vapor deposition process occurs. As a result of the deposition process, some parts of the chamber will be subject to the accumulation of unwanted products and will need to be cleaned or replaced after reaching a certain thickness in order to avoid affecting the quality and performance of the reaction and deposition processes.

[0004] As a result, the consumable parts within the reaction chamber, as well as the walls and components that make up the reaction chamber itself, require preventive maintenance operations that necessarily involve periodically entering the chamber to remove, service, or replace said parts and components.

[0005] These operations greatly affect the downtime and throughput of the reactor, and are particularly problematic in hot-wall reactors for depositing SiC, where maintenance operations are performed frequently, once or more times a week, and necessarily involve several hours of reactor downtime.

[0006] The above problems are also seen in the advantageous reactor designs used in the art, such as those described in European Patent Application Publication No. 1570107 and International Publication No. 2021105841, which were selected for their excellent heat distribution profiles and ease of assembly.

[0007] In these cases, the removal, cleaning, and replacement of the corresponding parts of the reaction chamber are mostly performed manually, which is a time-consuming process. In fact, the replacement or cleaning of parts requires the operator to enter the individual parts located inside the machine and inside the reaction chamber.

[0008] Overall, the process requires complete cooling of the reactor and the reaction chamber, unwanted exposure of the latter (reaction chamber) to air, and an operator present at all stages.

[0009] In the best scenario where the reactor is of the removable type, it is possible to completely withdraw the reactor from the machine via mechanical means. However, the process still presents the above-mentioned drawbacks. That is, access to the chamber is still performed manually, the reactor is exposed to air, its movement (and handling) is cumbersome and requires manual labor, and thus it is not automated or not automatable. In particular, the downtime is still disadvantageously long because it takes at least 8 hours for all the necessary operations to be completed.

[0010] In some of the latest generation of reactors, the handling of the substrate holder is performed automatically. Therefore, any additional automation system should be adapted so as not to interfere with the automated means for handling the substrate holder to fit into the limited space available in the machine.

[0011] Therefore, for regular preventive maintenance operations, it is desirable, but not limited thereto, to automate the insertion and replacement process of the reaction part in the reactor.

[0012] Furthermore, it is desirable to provide an automatic handling machine and assembly suitable for performing the automatic handling of the removable reaction part of the reaction chamber and avoiding its exposure to air. It is further desirable to provide a removable reaction part of the reaction chamber adapted to cooperate with the automatic handling machine.

[0013] Furthermore, it is desirable to provide a handling machine that, if present, has the ability not to interfere with the automatic handling of the substrate holder. SUMMARY OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION

[0014] This application claims priority to Italian Patent Application No. 102023000024663, filed on November 21, 2023, the entire content of which is incorporated herein by reference. In particular, but not by way of limitation, the incorporation by reference is made with respect to claims 1 to 16, FIGS. 1 to 3, and the corresponding sections of the specification of Italian Patent Application No. 102023000024663.

[0015] This application also claims priority to Italian Patent Application No. 102023000024660, filed on November 21, 2023, the entire content of which is incorporated herein by reference. In particular, but not by way of limitation, the incorporation by reference is made with respect to claims 1 to 22, FIGS. 1 to 4, and the corresponding sections of the specification of Italian Patent Application No. 102023000024660.

[0016] An object of the present invention is to overcome the drawbacks of the prior art. More specifically, an object of the present invention is to provide a handling machine suitable for performing the handling of a removable reaction part of a reaction chamber and preferably avoiding its exposure to air.

[0017] A further object of the present invention is, alternatively, to provide a handling machine having the ability to perform the automatic handling of the reaction part and the substrate holder.

[0018] An additional object of the present invention is to provide a reaction chamber with a removable reaction section, the removable reaction section being adapted to cooperate with the above-described automatic handling machine, and the reaction chamber being suitable for the deposition of SiC and GaN films on a semiconductor substrate in a hot-wall cross-flow reactor.

[0019] A further object of the present invention is to provide an assembly suitable for performing automatic handling of a reaction section for preventive maintenance operations with reduced downtime.

[0020] The above-described main object is achieved by the present invention as described in the appended claims, which form an essential part of this specification.

[0021] It should be noted that the use of reference signs in the claims does not limit these ranges. The sole purpose of the reference signs is to make it easier to understand the claims.

[0022] This summary is provided to introduce selected concepts in a simplified form. These concepts are further described in the detailed description of the exemplary embodiments of the following disclosure. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

Brief Description of the Drawings

[0023]

Figure 1

Figure 2

Figure 3

Modes for Carrying Out the Invention

[0024] Of course, the elements in the drawings are illustrated for simplicity and clarity and are not necessarily drawn to scale. For example, some dimensions of the elements in the drawings may be omitted, or on the other hand, may be exaggerated relative to other elements to aid in understanding the illustrated embodiments of the present disclosure.

[0025] Certain embodiments and examples are disclosed below, but it will be understood by those skilled in the art that the invention extends beyond the specifically disclosed embodiments and / or uses of the present invention, as well as obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the disclosed invention should not be limited by the specific disclosed embodiments described below.

[0026] Cylindrical epitaxial reactors described in European Patent Application Publication No. 1570107 and US Patent Application Publication No. 2022411961, etc., have proven commercial success due to the uniformity and efficiency of heating of the reaction chamber, simplification of the structure, and quality of the deposited film. For SiC and GaN epitaxial film deposition, they can operate at temperatures of 1000 - 1800°C.

[0027] These cylindrical reactors typically extend relatively uniformly along the long axis horizontal direction and exhibit an essentially circular cross-section.

[0028] They comprise a reaction chamber formed by one or more structural elements. Two of these structural elements may exhibit high sensitivity, for example, made of graphite and may exhibit a semi-circular shape. They may be heated by induction means such as one or more induction coils wound around the reactor. Other structural elements of the reaction chamber are made of the same or different materials such as SiC and can provide a preferential current flow to the sensitive elements and promote this inductive heating. When using the term sensitivity, here and below, it means a material having high sensitivity that can be efficiently heated by induction.

[0029] The reaction chambers described in European Patent Application Publication No. 1570107 and US Patent Application Publication No. 2022 / 411961 are formed by the assembly of the above components. The assembly creates an essentially parallelepiped-shaped internal space where the actual reaction takes place. This simple parallelepiped shape cannot be separated from the constituent sensitive elements and moved integrally. In fact, the chamber exhibits a substantially circular cross-section and an overall complex contour of the intersection lines, which makes handling difficult.

[0030] A cylindrical reactor as described in the above non-limiting example is provided for illustrative purposes only, and requires a long downtime for preventive maintenance operations that become necessary due to the accumulation of deposition material on the inner surface of the reaction chamber, which inner surface includes the surface of disposable or removable parts, such as those used to rotate, support, and align a substrate and / or to improve the hydrodynamics inside the reaction chamber (directing the flow of carrier gas, precursor gas, and exhaust gas).

[0031] The inventors have devised an alternative reaction chamber design that can integrally extract the reaction part where deposition occurs and is adapted to cooperate with an automatic handling machine.

[0032] According to this new design, the reaction chamber comprises (a) an essentially hollow sensitive casing that extends along the major axis direction (x) and is characterized by an inner surface and an outer surface, and (b) a removable reaction part having inner and outer surfaces, interconnected or connectable to each other, and including four walls that extend along the major axis direction.

[0033] The reaction part is also characterized by two open or partially open sides, an upstream side and a downstream side. These sides are parallel to a cross-section (yz) perpendicular to the major axis direction.

[0034] The removable reaction part may have a box-shaped configuration with four walls that are essentially parallel to the long axis. However, these may also be slightly tapered towards the upstream or downstream side. Their cross-sections in the transverse plane may present a linear contour, or may be curved or bent.

[0035] One of the four walls of the reaction part is a bottom wall provided with a receiving area adapted to receive the substrate holder. The side faces (upstream or downstream) may be openable or may be characterized by an upstream wall and / or a downstream wall.

[0036] In either case, the upstream side is provided with an upstream opening suitable for receiving the flow of carrier gas and precursor gas for epitaxial deposition. Similarly, the downstream side is provided with a downstream opening suitable for discharging the flow of exhaust gas. These openings may occupy the entire upstream / downstream side face or, if present, may be holes that cross the corresponding upstream wall and / or downstream wall.

[0037] The reaction part according to the invention is mechanically connected to the susceptor casing by releasable coupling means, which can be used to support and / or fix and / or align the reaction part with respect to the susceptor casing. The reaction part and the releasable coupling means are adapted to withdraw the reaction part from the susceptor casing or to insert it into the susceptor casing.

[0038] This makes it possible to simply remove and replace the reaction part without having to reach inside it from within the reactor machine or move the entire reactor and the sensitive elements outside the machine into this interior and the components and expose them to air.

[0039] The susceptor casing is adapted to be heated by induction and, for this effect, may advantageously be made of graphite. The reaction part is mainly heated by the susceptor casing through irradiation from the susceptor casing.

[0040] The sensitive casing may exhibit a hollow prismatic or cylindrical shape with a cross-section that is polygonal, circular, oval, or elliptical in cross-section. An essentially circular cross-section may advantageously allow for a uniform heat distribution.

[0041] Advantageously, the sensitive casing may be open on one or both sides of the cross-section (yz) to facilitate entry into the reaction section. The opening may advantageously be closed by a heat-insulating lid during operation.

[0042] Furthermore, to adapt to the heat irradiation profile, the sensitive casing may exhibit a variable thickness either in the longitudinal direction and / or in the cross-section (yz).

[0043] The four walls of the reaction section may include a top wall and two side walls. Either the top wall or the bottom wall may be beneficially connectable to the two side walls, as well as upstream and downstream, via releasable coupling means. This allows for easy access to the interior of the chamber (the disposable graphite part and / or the inner surface of the wall) for maintenance and / or replacement.

[0044] The releasable coupling means may advantageously be selected from non-permanent mechanical interlock or fastening mechanisms such as hook and loop mechanisms, snap fasteners, or any other male-female fastening / joining means suitable for quick and easy release.

[0045] On the inner surface of the sensitive casing, grooves or protrusions may be provided that are adapted to support, position, and / or removably fix the reaction section thereon.

[0046] The reaction section may also advantageously be provided on its outer surface with protrusions or grooves adapted to releasably engage with grooves or protrusions on the inner surface of the susceptor casing through a non-permanent mechanical interlock or fastening mechanism. Such mechanisms include, inter alia, any mechanism having a releasable, i.e., non-permanent, interlock shape, such as any joint in which the protruding part is adapted to latch onto a corresponding recess or hoop, including hook mechanisms and loop mechanisms, snap fasteners, etc.

[0047] The top and bottom walls of the reaction section can be made of graphite, while the side walls and / or the upstream and downstream sides, if only partially open, are made of graphite or silicon carbide.

[0048] Advantageously, all the walls of the reaction chamber can be made of graphite, but the inner surface of the reaction section may be entirely or partially covered or coated with SiC, TaC, or other materials to protect the graphite parts during deposition or cleaning operations.

[0049] The reaction section may further comprise a removable cover of heat-insulating material located over the downstream opening, wholly or partially aligned with the downstream opening, and provided with at least one opening suitable for discharging the exhaust gas flow. The openings of the cover and the downstream opening may optionally be additionally adapted to allow insertion and withdrawal of the substrate holder. The removable cover may further be coupled to at least one of the four walls via releasable fastening means.

[0050] According to another embodiment, the reaction section further comprises a first transition piece, optionally removable, positioned over the upstream opening adapted to be coupled to the precursor gas liner.

[0051] Most importantly, the reaction part of the reaction chamber is mechanically coupled and adapted to cooperate with the end effector of the automatic handling machine described below so as to be withdrawn from / inserted into the sensitivity casing integrally and automatically. It is further provided with engaging means such as indentations, protrusions, hooks, loops, or sliding parts. Thereby, the removal of the reaction part can be upgraded from manual to automatic.

[0052] The reaction part is compact and adapted to be handled. For example, the reaction part may be 200 - 400 mm × 30 - 50 mm in cross-section and 200 - 500 mm in the major axis direction. The reaction part may typically have a weight of 2 - 10 kg, preferably 2.5 - 6 kg. The sensitivity casing may be 200 - 500 mm in the major axis direction and may have a diameter in the transverse direction and / or 210 - 450 mm as its main length.

[0053] According to a first aspect, the present invention relates to an automatic handling machine for handling a removable reaction part of a reactor suitable for epitaxial deposition of a semiconductor film on a substrate.

[0054] The automatic handling machine is provided with a selective handling assembly comprising: (i) a first end effector adapted to be mechanically coupled to the removable reaction part and move it along the major axis direction (x) (specifically, withdraw it from or insert it into the reactor); and (ii) a second end effector adapted to be mechanically coupled to the substrate holder and move it along the major axis direction.

[0055] The selective handling assembly comprises at least a first actuator adapted to move the first end effector and the second end effector from an extended position to a retracted position and vice versa along the major axis direction (x).

[0056] The second end effector is adapted to withdraw the substrate holder from or insert it into the removable reaction part, whereas the first end effector is adapted to withdraw the removable reaction part from or insert it into the reactor.

[0057] The term "actuator" means a device or part of a machine that enables the achievement of physical movement and can be used to convert an electrical, mechanical, gas, or hydraulic input into a linear or rotational movement, or into a continuous combination of both.

[0058] The above-described automatic handling machine enables the automatic handling of both the substrate holder and the removable reaction part of the reaction chamber, thereby providing a unique compact solution that is space-efficient and does not require the presence and / or manual labor of an operator at the original position.

[0059] In a first embodiment, in the automatic handling machine according to the present invention, the first end effector and the second end effector are mechanically constrained with respect to each other, so that when the first end effector is in the extended position, the second end effector is in the retracted position, and vice versa.

[0060] The above-described embodiment ensures that the handling of the substrate holder and the reaction part do not interfere with each other.

[0061] In a second embodiment, in the automatic handling machine according to the present invention, the actuator is a stepping motor or a servo motor.

[0062] Furthermore, the selective handling assembly may advantageously include two pulleys coupled to a belt adapted to be operated by an actuator and engage and move the first and second end effectors, but this is not necessarily required.

[0063] The first end effector and / or the second end effector can be a gripper such as a rod, a prong, a fork, a shovel, or a combination thereof.

[0064] To withstand the weight of the reaction part, the first end effector may be a metal material or a ceramic material such as aluminum or silicon carbide in oxide or nitride form, or titanium, stainless steel, and alloys thereof. The second end effector can be made of silicon carbide, borosilicate glass, sapphire glass, or quartz in order to avoid contamination of the substrate.

[0065] According to another embodiment, the automatic handling machine according to the present invention further comprises traction and tension means coupled to the selective handling assembly. The traction and tension means can be a linear motor and, in any case, are adapted to move the selective handling assembly from a first handling position to at least a second handling position along the major axis direction.

[0066] The first handling position is located inside the reactor and is suitable for the first end effector or the second end effector of the selective handling assembly to engage with the reaction part or the substrate holder. The second handling position is located outside the reactor.

[0067] According to a further embodiment, the automatic handling machine according to the present invention further comprises electric means coupled to the selective handling assembly and adapted to move the selective handling assembly along the vertical direction (z) (with respect to the ground on which the reactor is installed during operation).

[0068] The automatic handling machine preferably comprises a screen, the main surface of which is oriented in a plane perpendicular to the longitudinal axis direction, and the first end effector and the second end effector are adapted to move in the longitudinal axis direction through the main surface or across any of their side surfaces. The first end effector (or the second end effector) protrudes from one of the main surfaces of the screen when in the extended position, while the second end effector (or the first end effector) and the actuator in the retracted position retract to the back side of the main surface.

[0069] Advantageously, the screen, which can be made of quartz, protects the actuator from the heat of the reaction chamber and further improves this cleanliness.

[0070] According to a second aspect, the present invention relates to a reaction chamber provided with the above-mentioned removable reaction part and suitable for epitaxial deposition of a semiconductor film on a substrate. Here, in the new chamber design of the present invention, it is recalled that the reaction chamber comprises an essentially hollow sensitive casing extending along the longitudinal axis direction (x) and having an inner surface and an outer surface. This chamber has an inner surface and an outer surface and further comprises a removable reaction part including (i) four walls extending along the longitudinal axis direction and (ii) an upstream side and a downstream side parallel to the cross-section (yz) perpendicular to the longitudinal axis direction.

[0071] The four walls of the reaction part comprise a bottom wall provided with a receiving area adapted to receive a substrate holder. The upstream side is provided with an upstream opening suitable for receiving the flow of carrier gas and precursor gas for epitaxial deposition, and the downstream side is provided with a downstream opening suitable for discharging the flow of exhaust gas.

[0072] The reaction part is mechanically connected to the sensitive casing by releasable coupling means and is integrally movable relative to the sensitive casing.

[0073] The reaction part is provided with engaging means such as a dent or a protrusion adapted to cooperate with the first end effector of the automatic handling machine according to any of the above embodiments.

[0074] In the present invention, the reaction part and the automatic handling machine, in particular, this selective handling assembly can advantageously be designed to cooperate with each other through the coupling between the engaging means of the reaction part and the first end effector of the automatic handling machine. Since the reaction part is removable from this sensitive casing, the automatic handling machine can easily release this releasable coupling means by applying a force in the longitudinal or vertical direction (and, optionally, any other direction in the cross-section). Thereby, the reaction part can be easily withdrawn from or inserted into the reactor, which facilitates and automates the preventive maintenance operation.

[0075] According to a third aspect, the present invention relates to an assembly for moving and handling a reaction part for the preventive maintenance operation of a reactor.

[0076] The assembly comprises (i) a reactor, an automatic handling machine according to any of the above-described embodiments, (ii) a transfer chamber, (iii) a unit handling chamber, and (iv) optionally a load lock chamber, as described below.

[0077] The reactor of the assembly is suitable for epitaxial deposition of a semiconductor film on a substrate, preferably SiC or GaN. The reactor is preferably a hot wall cross-flow reactor. This reactor comprises a reaction chamber having a reaction part integrally removable from a sensitive casing such as a removable reaction part according to the present invention, provided with means adapted to cooperate with the automatic handling machine.

[0078] The reactor preferably features one or more insulation components and may include an insulation system that encloses the reaction chamber. The reactor may also include a liner suitable for directing the process gas in the reaction section and may be connected to the reaction section using releasable coupling means.

[0079] The reactor may be protected by an enclosure such as a double-walled quartz tube that allows for the flow of a cooling fluid in the gap between these two walls. As will be apparent to those skilled in the art, other elements typically used in reactors as described above may be present and are assumed to be present.

[0080] One or more induction coils may be located outside the reactor to heat the susceptor casing and directly or indirectly the reaction section of the reaction chamber.

[0081] The transfer chamber features a first opening provided with a first shut-off valve adapted to receive or deliver the reaction section from / to the reactor via one or more automated machines or manually, and a second opening provided with a second shut-off valve.

[0082] The unit handling chamber is installed in communication with the transfer chamber through the second opening and the second shut-off valve and is adapted to receive or deliver the reaction section from / to the transfer chamber via electromechanical means.

[0083] The unit handling chamber is adapted to adjust the reaction section and is provided with a resealable access such as a door, hatch, porthole, or valve suitable for removal and insertion of the reaction section by an operator or automated handling means.

[0084] When using the term "conditioning", it means various operations or cycles suitable for preparing the reaction section prior to insertion into the reactor. Additionally or alternatively, the operations or cycles are adapted to make the reaction section suitable for entry by an operator or machine and to be removed from the assembly for removal or cleaning of parts. Possible cycles prior to removal of the reaction section for cleaning may include creating a vacuum of less than 10 millibars and refilling under an inert gas such as argon, nitrogen, helium, or xenon. In addition to or instead of inert gas refilling, the reaction section may be purged with an inert gas, with argon being the preferred inert gas.

[0085] Alternative cycles suitable for performing on a new / clean reaction section prior to insertion into the reactor may include a heating step and a vacuum degassing step (in which case the vacuum is preferably less than 1 millibar, even more preferably less than 10 -3 millibars).

[0086] In the assembly according to the invention, the transfer chamber may also advantageously be adapted to receive or deliver the substrate holder from / to the reactor through the first opening via electromechanical means. The assembly according to this embodiment may optionally and advantageously comprise a load lock chamber installed in communication with the transfer chamber through a third opening and a third shut-off valve.

[0087] Thus, the load lock chamber can receive or deliver the substrate holder from / to the transfer chamber through the third opening via electromechanical means. The load lock chamber may further comprise a resealable access path suitable for removal and insertion of the substrate holder by an operator or automated handling means.

[0088] This embodiment advantageously provides for automated handling of both the reaction section and the substrate.

[0089] The presence of a chamber in communication with the reactor allows for avoidance of exposure of the reaction section to air during removal from / insertion into the reactor, and the presence of automated handling means provides a fully automated process that can reduce the reactor downtime by up to 70%.

[0090] Description of the Drawings The drawings presented herein do not represent the actual appearance of any particular material, structure, or device, but are merely idealized representations used to describe embodiments of the present disclosure. Specifically, these are not intended to limit the scope of the aspects and implementation forms in any way. In fact, for the sake of brevity, conventional manufacturing, related, preparation, and other functional aspects of the system may not be described in detail. Further, the connecting lines shown in the various drawings are intended to represent exemplary functional relationships and / or physical connections between the various elements. Many alternative or additional functional relationships, or physical connections, may exist in the actual system and / or may not exist in some embodiments.

[0091] FIG. 1 schematically shows a selective handling assembly (3010) of an automated handler according to an embodiment of the present invention in two different settings illustrated in Panels I and II.

[0092] In both panels, the automated handler is adapted to handle a removable reaction section of a reactor suitable for epitaxial deposition of a semiconductor film on a substrate (typically mounted on a substrate holder), such as the removable reaction section of the reaction chamber shown in FIG. 2.

[0093] The selective handling assembly (3010) comprises a first end effector (3100) including two stainless steel prongs adapted to cooperate with and mechanically couple to the removable reaction section and move it along the long axis direction (x). The first end effector is specifically adapted to withdraw or insert the removable reaction section into the reactor.

[0094] The selective handling assembly (3010) also comprises a second end effector (3200) including two quartz prongs mechanically coupled to the substrate holder and adapted to move along the longitudinal axis. The second end effector is specifically adapted to withdraw the substrate holder from or insert it into the removable reaction part.

[0095] The selective handling assembly comprises at least a first actuator (not shown) adapted to move the first end effector and the second end effector from the extended position to the retracted position and vice versa along the longitudinal axis (x). In particular, the first end effector and the second end effector are mechanically constrained with respect to each other such that when the first end effector is in the extended position, the second end effector is in the retracted position and vice versa.

[0096] The first end effector is connected to a first sliding element (3150) which is in turn coupled to the actuator through a pulley and belt mechanism (not shown).

[0097] The second end effector is connected to a second sliding element (3250) which is in turn coupled to the actuator through a pulley and belt mechanism (not shown).

[0098] Panel I specifically shows the above-described selective handling assembly with the second end effector in the extended position protruding through this main visible face from the screen (4000). Since the two end effectors are constrained with respect to each other, the first end effector, like the actuator, is here in the retracted position behind the screen.

[0099] Panel II shows the above-described selective handling assembly with a first end effector in the extended position that protrudes from the front surface of the screen (4000) from below this bottom side. In this case, the second end effector is in the retracted position on the back side of the screen, similar to the actuator.

[0100] Figure 2 schematically shows a cross-section in the cross-section (yz) of one embodiment of the reaction chamber (100) of the present invention. The reaction chamber is suitable for epitaxial deposition of a semiconductor film on a substrate and includes a hollow sensitive casing (200) and a reaction section (300).

[0101] The sensitive casing extends along the long axis direction (x) perpendicular to the cross-section. The sensitive casing is characterized by an inner surface (250) and an outer surface and houses a removable reaction section (300).

[0102] The reaction section (300) has a box shape. This includes four walls (310, 320, 330, 340) that extend along the long axis direction. The four walls include a top wall (320), two side walls (330, 340), and a bottom wall (310). The bottom wall (310) is provided with a receiving area (311) adapted to receive a substrate holder (315).

[0103] The reaction section further includes an upstream side (not shown) and a downstream side (360) parallel to the cross-section (yz). In this embodiment, the downstream side is a wall provided with a downstream opening (361) suitable for receiving the flow of carrier gas and precursor gas for epitaxial deposition. The upstream side is completely open and corresponds to the upstream opening indicated by the dashed line (351). The upstream opening is suitable for discharging the flow of exhaust gas. The reaction section is mechanically connected to the sensitive casing via releasable coupling means (331, 332). This reaction section can be integrally movable with respect to the sensitive casing, thereby facilitating this insertion and extraction from / to the sensitive casing and shortening the time required for preventive maintenance operations.

[0104] To further facilitate preventive maintenance operations, the top wall (320) is connected to the two side walls and to the upstream and downstream sides via releasable coupling means (321), such as a male-female interlock mechanism.

[0105] The handling of the reaction section can be facilitated and automated by providing engagement means, such as recesses (371, 372), adapted to couple with a first end effector of an automated handling machine according to the invention, such as those partially illustrated in FIG. 1, on this reaction section. In this case, the first end effector may have a shape such as a fork provided with two prongs adapted to couple with the recesses (371, 372).

[0106] FIG. 3 shows a simplified schematic view of an assembly (2000) according to an embodiment of the invention. The assembly is designed to facilitate the movement and handling of the reaction section for preventive maintenance operations of the reactor. The assembly comprises (i) a reactor (1000), (ii) a system of connection chambers (2100, 2200, 2300) coupled to the reactor, and (iii) an automated handling machine (3000) including a selective handling assembly (3010) of FIG. 1.

[0107] The automated handling machine is simplified herein as this main functional building block (identifiable by the reticular pattern), coupled to the selective handling assembly, and adapted to move along the longitudinal axis from a first handling position inside the reactor to at least a second handling position outside the reactor (preferably corresponding to the transport chamber (2100)). The automated handling machine further comprises traction and tension means (3400). The traction and tension means may be a magnetic motor.

[0108] The automatic handling machine further comprises vertical electric means (3500) coupled to the selective handling assembly. Generally, the coupling between the vertical electric means and the selective handling assembly may be either direct or indirect. For example, the coupling may be effected via traction and tension means as shown in the drawings of the present application.

[0109] The automatic handling machine may extend into the transport chamber or may be installed outside the chamber, but may also be arranged within the housing to avoid exposure of this load to air. In all cases, this automatic handling machine can be coordinated with further electric means within the transport chamber to transport the reaction part and / or the substrate holder to / from the reactor via the transport chamber.

[0110] In this figure, the automatic handling machine is shown in a configuration where the second end effector is in the extended position, i.e., installed inside the reactor and inside the reaction part respectively through the openings in the downstream drum (700) and the reaction part openings (401, 361). In this position, the second end effector may engage with the substrate holder and move the substrate holder.

[0111] The reactor comprises a double-walled quartz tube and is wound by a coil (not shown) for induction heating. The reactor further comprises a heat insulation system (1100) wound around the reaction chamber. The reaction chamber includes a susceptor casing (200) and a reaction part (300).

[0112] The reaction part is characterized by a first transition part (500) positioned above the upstream opening (351) and coupled to the liner (1200). The reaction part further comprises a removable cover (400) of heat insulation material provided with one opening (401) positioned above the downstream side (360) and aligned with the downstream opening (361). The reaction part comprises engagement means (371, 372) adapted to couple with the first end effector of the selective handling assembly (3010) of the automatic handling machine (3000).

[0113] The reactor can be connected to the system of connection chambers (2100, 2200, 2300) via a downstream drum (700) provided with an opening such as a port hole, door, or valve and resealing means.

[0114] The system of chambers comprises a transfer chamber (2100) provided with a first shut-off valve (2111) and having a first opening (2110) adapted to receive or send a reaction part from / to the reactor through the downstream drum via one or more automated machines (or, if possible to be avoided, manually). The transfer chamber is also characterized by a second opening (2120) provided with a second shut-off valve (2121).

[0115] The system of connection chambers (2100, 2200, 2300) also comprises a unit handling chamber (2200) installed in communication with the transfer chamber through the second opening (2120) and the second shut-off valve (2121). The unit handling chamber is adapted to receive or send a reaction part from / to the transfer chamber via electromechanical means and is provided with a resealable access path (2210) suitable for extraction and insertion of the reaction part (300) by an operator or automated handling means.

[0116] The unit handling chamber may be used to adjust the reaction part before withdrawing it from the assembly or before inserting it into the reactor through the transfer chamber.

[0117] The system of connection chambers (2100, 2200, 2300) also comprises a load lock chamber (2300) installed in communication with the transfer chamber through a third opening (2130) and a third shut-off valve (2131). The load lock chamber is adapted to receive or send a substrate holder from / to the transfer chamber through the third opening via electromechanical means (not shown).

[0118] Advantageously, the assembly according to this embodiment comprises an automatic handler (3000) provided with a first end effector suitable for engaging with the reaction part, pulling it out of the sensitive casing, and inserting it into the transport chamber, and vice versa.

[0119] The automatic handler is also provided with a second end effector suitable for engaging with the substrate holder and inserting or pulling it into / from the reaction part, thereby providing a fully automated system.

[0120] The subject matter of the present disclosure includes not only all novel and non-obvious combinations and sub-combinations of the various processes, systems, and configurations disclosed herein, as well as other features, functions, operations, and / or characteristics, but also all equivalents thereof.

[0121] In the specification and claims of this application, the word "comprise" and its variations such as "comprising" and "comprises" do not exclude the presence of other additional elements, components, or steps.

[0122] The discussion of documents, acts, materials, devices, articles, etc. is included in the text only for the purpose of providing the background of the present invention, but this material or a part thereof should not be understood as constituting general knowledge in the field related to the present invention prior to the priority date of each of the claims appended to this application.

Claims

1. 1. An automated handler for handling removable reaction parts of a reactor suitable for epitaxial deposition of semiconductor films on substrates, comprising: a first end effector mechanically coupled to the removable reaction portion and adapted to move the removable reaction portion along a longitudinal axis; a second end effector in mechanical communication with the substrate holder and adapted to move the substrate holder along the longitudinal axis; the selective handling assembly includes at least a first actuator adapted to longitudinally move the first end effector and the second end effector from an extended position to a retracted position and the first end effector and the second end effector from a retracted position to an extended position; the second end effector is adapted to extract or insert the substrate holder into or from the removable reaction part; The first end effector is adapted to extract or insert the removable reaction part from or into the reactor.

2. the first end effector and the second end effector are mechanically constrained relative to one another; when the first end effector is in an extended position, the second end effector is in a retracted position; The automated handler of claim 1 , wherein when the first end effector is in a retracted position, the second end effector is in an extended position.

3. 3. The automated handler of claim 1, wherein the actuator is a stepper motor or a servo motor.

4. The selective handling assembly includes: Two pulleys, Operated by the actuator, 3. The automated handler of claim 1, comprising two pulleys engaged with the first and second end effectors and coupled to a belt adapted to move the first and second end effectors.

5. 3. The automated handler of claim 1, wherein the first end effector and / or the second end effector is a gripper.

6. 6. The automated handler of claim 5, wherein the gripper is selected from the group consisting of one or more of a rod, a prong, a fork, a shovel, and combinations thereof.

7. the first end effector comprises a metallic material or a ceramic material; The automated handler of claim 1 or 2, wherein the second end effector comprises silicon carbide, borosilicate glass, sapphire glass, or quartz.

8. 8. The automated handler of claim 7, wherein the first end effector comprises aluminum or silicon carbide in the form of an oxide or nitride, or titanium, stainless steel, or alloys thereof.

9. 3. The automated handling machine of claim 1 or 2, further comprising towing and pulling means coupled to the selective handling assembly and adapted to move the selective handling assembly along the longitudinal axis from a first handling position to at least a second handling position.

10. 10. The automated handler of claim 9, wherein the traction and pulling means comprises a linear motor.

11. 3. The automated handler of claim 1, further comprising vertical motorized means coupled to the selective handling assembly and adapted to move the assembly along a vertical direction.

12. A screen having a major surface oriented in a cross-sectional plane perpendicular to the longitudinal direction, the screen is adapted to allow both the first end effector and the second end effector to move in the longitudinal direction either through the major surface or through a boundary of the major surface; The automated handling machine of claim 1 or 2 further comprises a screen (4000), wherein the screen is positioned such that the first end effector or the second end effector in an extended position protrudes from the main surface, and the first end effector or the second end effector and the actuator in a retracted position are retracted to the rear side of the main surface.

13. The automated handler of claim 12 , wherein the screen comprises quartz.

14. 1. A reaction chamber for epitaxial deposition of a semiconductor film on a substrate, comprising: a hollow susceptible casing extending along a longitudinal axis and characterized by an inner surface and an outer surface; a removable reaction section having an inner surface and an outer surface, and including (i) four walls extending along said longitudinal axis, and (ii) an upstream side and a downstream side parallel to a cross-sectional plane perpendicular to said longitudinal axis; the four walls of the removable reaction part include a bottom wall provided with a receiving area adapted to receive a substrate holder; the upstream side comprises an upstream opening suitable for receiving a flow of carrier gas and precursor gas for the epitaxial deposition; the downstream side comprises a downstream opening adapted to discharge a flow of exhaust gas; The removable reaction part is mechanically connected to the sensitive casing via a releasable coupling means and is movable integrally with the sensitive casing; A reaction chamber, wherein the removable reaction part is provided with engagement means adapted to cooperate with the first end effector of an automated handler according to claim 1 or 2.

15. 1. An assembly for moving and handling a removable reaction part for preventive maintenance operations of a reactor, comprising: A reactor for epitaxial deposition of a semiconductor film on a substrate, the reactor comprising a reaction chamber having a reaction portion integrally removable from a sensitive casing; An automatic handling machine according to claim 1 or 2; a transfer chamber including a first opening provided with a first gate valve adapted to receive and / or deliver the removable reaction part from and to the reactor via the automated handler, and a second opening provided with a second gate valve; a unit handling chamber disposed in communication with the transfer chamber through the second opening and the second gate valve and adapted to receive and / or deliver the removable reaction part from and to the transfer chamber via motorized mechanical means; An assembly, wherein the unit handling chamber is adapted to accommodate the removable reaction part and is provided with a resealable access suitable for removal and insertion of the removable reaction part by an operator or automated handling means.

16. the transfer chamber is further adapted to receive and / or deliver a substrate holder from and to the reactor through the first opening via the automated handler; the assembly further comprising a load lock chamber in communication with the transfer chamber through a third opening and a third gate valve; 16. The assembly of claim 15, wherein the load lock chamber is adapted to receive the substrate holder from and / or deliver the substrate holder to the transfer chamber via the motorized mechanical means through the third opening.

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