Exposure apparatus

Abstract

To provide an exposure apparatus capable of significantly increasing a production efficiency of an exposure process.SOLUTION: An exposure apparatus 1 scans light beams L1 to L6 to form an exposure pattern on exposure parts WR of substrates W1, W2, W3. The exposure apparatus 1 has a first substrate conveyance mechanism 11 and a second substrate conveyance mechanism 12 of a Roll to Roll method which can be independently controlled to be driven. A first exposure unit 35 and a second exposure unit 36 are arranged in a facing manner with the exposure parts WR of the substrates W1, W2, W3 conveyed by the first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12 laid between the units. In the substrates W1, W2 conveyed by the first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12, the exposure parts WR are separate and parallelly arranged. The exposure apparatus 1 of the above-described configuration is capable of performing double-sided exposure of a single substrate W3, and can simultaneously perform single-sided exposure of the substrates W1, W2, let alone single-sided exposure of each of the substrates W1, W2.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to an exposure apparatus.

Background Art

[0002] There has been conventionally known an exposure apparatus capable of simultaneously exposing both the front and back surfaces of a substrate provided with photosensitive layers on both the front and back surfaces by exposure units arranged on both the front surface side and the back surface side of the substrate. This exposure apparatus intermittently conveys a long photosensitive film (referred to as a substrate) with a substrate feeding roll and a substrate winding roll, and forms an exposure pattern on both the front and back surfaces of the substrate by the exposure units (see, for example, Patent Document 1).

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] The exposure apparatus described in Patent Document 1 above can simultaneously expose both the front and back surfaces of a substrate having photosensitive layers on both the front and back surfaces. Further, this exposure apparatus is configured such that for a substrate having an exposure layer only on one surface of the substrate, single-sided exposure can also be performed by the exposure unit arranged on one surface side. However, this exposure apparatus has a configuration of one set of a substrate conveyance mechanism including a substrate feeding roll, a substrate winding roll, guide rollers, and conveyance rollers. That is, since this exposure apparatus can only convey one substrate, it is impossible to perform single-sided exposure of two substrates simultaneously. Therefore, for example, considering a changeover setup for dealing with a plurality of types of substrates, it is difficult to further improve the productivity of the exposure process.

[0005] Therefore, the present invention has been made to solve such problems, and aims to realize an exposure apparatus capable of significantly enhancing the productivity of the exposure process.

Means for Solving the Problems

[0006] [1] The exposure apparatus of the present invention is an exposure apparatus that scans a light beam to form an exposure pattern on an exposure surface of a substrate, and includes a Roll to Roll type first substrate conveyance mechanism and a second substrate conveyance mechanism that can be independently driven and controlled, and the exposure units of the substrates conveyed by the first substrate conveyance mechanism and the second substrate conveyance mechanism are arranged to face each other with the exposure portions of the substrates interposed therebetween, and a first exposure unit arranged on the first substrate conveyance mechanism side and a second exposure unit arranged on the second substrate conveyance mechanism side. The substrates conveyed by the first substrate conveyance mechanism and the second substrate conveyance mechanism respectively have the exposure portions spaced apart and arranged in parallel. This is the gist of the present invention.

[0007] [2] In the exposure apparatus of the present invention, it is preferable that at least one of the first exposure unit and the second exposure unit further has an exposure unit position adjustment mechanism capable of moving forward and backward toward the exposure portion of the substrate.

[0008] [3] In the exposure apparatus of the present invention, a first air injection unit arranged between the exposure portions of the substrates conveyed by the first substrate conveyance mechanism and the second substrate conveyance mechanism respectively, a second air injection unit arranged between the substrate conveyed by the first substrate conveyance mechanism and the first exposure unit, and a third air injection unit arranged between the substrate conveyed by the second substrate conveyance mechanism and the second exposure unit are further provided. The first air injection unit, the second air injection unit, and the third air injection unit preferably have openings through which the light beam irradiated from the first exposure unit or the second exposure unit can pass.

[0009] [4] In the exposure apparatus of the present invention, the first air injection unit, the second air injection unit, and the third air injection unit each have an air injection member provided with a large number of air injection holes on the surface facing each substrate, and it is preferable that the pressures of the air injected toward each substrate facing the first air injection unit, the second air injection unit, and the third air injection unit are the same.

[0010] [5] In the exposure apparatus of the present invention, it is preferable that the first air injection unit has an air injection unit position adjustment mechanism capable of moving the second air injection unit or the third air injection unit forward and backward toward the first air injection unit.

[0011] [6] In the exposure apparatus of the present invention, it is preferable that at least a sealing material having a high light transmittance is embedded in the opening on the substrate side.

Advantages of the Invention

[0012] The exposure apparatus described above has a first substrate transfer mechanism and a second substrate transfer mechanism that can be independently driven. The first exposure unit and the second exposure unit are arranged to face each other on both the front and back sides of the substrate. For example, for a substrate having an exposure layer (exposed portion) on both sides, the exposure apparatus can perform double-sided exposure on the substrate by the opposing first exposure unit and second exposure unit.

[0013] Further, the exposure apparatus is configured such that each of the first substrate transfer mechanism and the second transfer mechanism can transfer the substrate. For example, when performing single-sided exposure on each of the substrates being transferred simultaneously, the exposed portion of one substrate is set on the first substrate transfer mechanism facing the first exposure unit, and the exposed portion of the other substrate is set facing the second exposure unit. By doing so, the exposure apparatus can simultaneously perform single-sided exposure on each of the two substrates by the opposing first exposure unit or second exposure unit. Also, it is possible to perform single-sided exposure on only one substrate by one of the first exposure unit or the second exposure unit.

[0014] The above-described conventional exposure apparatus can perform double-sided exposure or single-sided exposure on one substrate. In contrast, the exposure apparatus of the present invention can perform double-sided exposure on one substrate, and can not only perform single-sided exposure on each substrate, but also simultaneously perform single-sided exposure on two substrates. Therefore, it is possible to significantly improve the production efficiency of the exposure process, including reducing the setup time related to the exposure process.

Brief Description of the Drawings

[0015]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Embodiments for Carrying Out the Invention

[0016] Hereinafter, the exposure apparatus 1 according to the embodiment of the present invention will be described with reference to the drawings.

[0017] (Configuration of the exposure apparatus 1) FIG. 1 is a front view showing a configuration example of the exposure apparatus 1. FIG. 1 shows an example when the substrates W1 and W2 are conveyed and single-sided exposure is performed. In each of the figures described below, the left-right direction when viewing the exposure apparatus 1 from the front is defined as the X direction, the depth direction (the width direction of each substrate) is defined as the Y direction, and the direction perpendicular to the X-Y plane (i.e., the vertical direction) is defined as the Z direction or the up-down direction for explanation. The exposure apparatus 1 includes a first substrate conveyance mechanism 11 disposed on the left side of the center line P in the X direction and a second substrate conveyance mechanism 12 disposed on the right side. The first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12 are so-called Roll to Roll type substrate conveyance mechanisms. Each substrate described below is a long film having a photosensitive layer (not shown) such as a resist formed on one side or both sides. In the following description, the substrates W1, W2, and the substrate W3 described in FIG. 5 may be collectively referred to simply as the substrate W.

[0018] The first substrate conveyance mechanism 11 conveys the substrate W1, and the second substrate conveyance mechanism 12 conveys the substrate W2. The first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12 are configured to be independently driven and controlled. The first substrate conveyance mechanism 11 includes a substrate feed roll 15 and a substrate take-up roll 16 that are spaced apart in the vertical direction. The first substrate conveyance mechanism 11 is composed of a guide roller 17, a conveyance roller 18, a guide roller 19, and a substrate take-up roll 16 in order from the substrate feed roll 15 side.

[0019] The substrate W1 is conveyed downward in the vertical direction by the guide roller 17 and the conveyance roller 18. The plane of the range in which the substrate W1 is conveyed in the vertical direction is represented by a vertical plane portion W1a. The vertical plane portion W1a includes regions before and after the substrate conveyance direction at the position where the light beams L1 to L3 (see FIG. 2) are scanned. The substrate feed roll 15, the substrate take-up roll 16, and the conveyance roller 18 each have a drive motor (not shown). The guide roller 17 and the conveyance roller 18 apply a tension such that no elongation occurs in the substrate W1. In FIG. 1, the conveyance direction of the substrate W1 is indicated by an arrow.

[0020] The second substrate transfer mechanism 12 has a configuration symmetric to the first substrate transfer mechanism 11 with respect to the center line P. The second substrate transfer mechanism 12 has a substrate feed roll 25 and a substrate take-up roll 26 that are spaced apart in the vertical direction. The second substrate transfer mechanism 12 is composed of a guide roller 27, a transfer roller 28, a guide roller 29, and a substrate take-up roll 26 in order from the substrate feed roll 25 side. The substrate W2 is transferred downward in the vertical direction by the guide roller 27 and the transfer roller 28. The plane in the range where the substrate W2 is transferred in the vertical direction is represented by a vertical plane portion W2a. The vertical plane portion W2a includes regions before and after the substrate transfer direction at positions where the light beams L4 to L6 (see FIG. 2) are scanned. The substrate feed roll 25, the substrate take-up roll 26, and the transfer roller 28 each have a drive motor (not shown). The guide roller 27 and the transfer roller 28 apply a tension such that no elongation occurs in the substrate W2. In FIG. 1, the transfer direction of the substrate W2 is indicated by an arrow.

[0021] The first substrate transfer mechanism 11 and the second substrate transfer mechanism 12 each have a space 32 between the vertical plane portions W1a and W2a of the substrates W1 and W2 that they transfer. That is, the exposure apparatus 1 is configured such that the substrates W1 and W2 can be transferred without contacting each other.

[0022] The exposure apparatus 1 has a first exposure unit 35 and a second exposure unit 36. The first exposure unit 35 is disposed between a substrate delivery roll 15 and a substrate winding roll 16 on the side of the first substrate transfer mechanism 11. On the other hand, the second exposure unit 36 is disposed between a substrate delivery roll 25 and a substrate winding roll 26 on the side of the second substrate transfer mechanism 12. The first exposure unit 35 and the second exposure unit 36 are disposed opposite to each other with the vertical plane portion W1a of the substrate W1 and the vertical plane portion W2a of the substrate W2 interposed therebetween. The first exposure unit 35 is composed of exposure heads 37A and 37B arranged side by side in the Y direction and an exposure head 37C disposed above the exposure heads 37A and 37B. The second exposure unit 36 is composed of exposure heads 38A and 37B arranged side by side in the Y direction and an exposure head 38C disposed above the exposure heads 38A and 38B. The configurations of the first exposure unit 35 and the second exposure unit 36 will be described with reference to FIG. 2.

[0023] In the present embodiment, the first exposure unit 35 and the second exposure unit 36 are disposed opposite to each other and have the same configuration. However, the configuration example shown in FIG. 1 is just an example, and in the first exposure unit 35 and the second exposure unit 36, the number and arrangement of the exposure heads and the like can be arbitrarily combined. Although not shown, the exposure heads 37A to 37C and the exposure heads 38A to 38C are each composed of an optical system including a light source, a polygon mirror, and an fθ lens Y and the like. Each of the above exposure heads scans light beams L1 to L6 (see FIG. 2), which are exposure lights, in the Y direction and irradiates the photosensitive layers of the vertical plane portions W1a and W2a of the substrate W1 or the substrate W2. The first exposure unit 35 and the second exposure unit 36 appropriately adjust the scanning speed and scanning range of the light beams L1 to L6 and the conveyance speed of the substrates W1 and W2 to form a desired exposure pattern (not shown).

[0024] In addition, the exposure apparatus 1 includes exposure unit position adjustment mechanisms 40 and 41 for moving the first exposure unit 35 and the second exposure unit 36 vertically in and out toward the vertical plane portions W1a and W2a. The exposure unit position adjustment mechanisms 40 and 41 are composed of an X-axis movement mechanism 42 and a drive motor 43. In the case of the configuration shown in FIG. 1, the exposure unit position adjustment mechanism 40 is configured to be adjustable so that the focal lengths of the exposure heads 37A, 37B, and 37C with respect to the exposure portion WR (see FIG. 2) of the vertical plane portion W1a are optimized. Further, the exposure unit position adjustment mechanism 41 is configured to be adjustable so that the focal lengths of the exposure heads 38A, 38B, and 38C with respect to the exposure portion WR (see FIG. 2) of the vertical plane portion W2a are optimized. The exposure unit position adjustment mechanisms 40 and 41 are arranged on the upper table 22 of the gantry 21.

[0025] The exposure apparatus 1 further includes an air injection mechanism 45 between the first exposure unit 35 and the second exposure unit 36. The air injection mechanism 45 includes a first air injection unit 46 arranged between the vertical plane portion W1a of the substrate W1 and the vertical plane portion W2a of the substrate W2 (between the conveyance path of the substrate W1 and the conveyance path of the substrate W2). Further, the air injection mechanism 45 includes a second air injection unit 47 arranged between the vertical plane portion W1a and the first exposure unit 35 (between the conveyance path of the substrate W1 and the first exposure unit 35). Furthermore, the air injection mechanism 45 includes a third air injection unit 48 arranged between the vertical plane portion W2a and the second exposure unit 36 (between the conveyance path of the substrate W2 and the second exposure unit 36). The first air injection unit 46, the second air injection unit 47, and the third air injection unit 48 are arranged at positions that do not contact the vertical plane portions W1a and W2a, and are configured to be able to inject air onto both the front and back surfaces of the vertical plane portions W1a and W2a from each air injection unit. The air injection mechanism 45 is provided to ensure flatness while maintaining the vertical plane portions W1a and W2a in a vertical posture. The configuration of the air injection mechanism 45 will be described with reference to FIGS. 3 and 4.

[0026] FIG. 2 is an explanatory diagram schematically showing the configurations of the first exposure unit 35 and the second exposure unit 36. FIG. 2(a) is a front view of the first exposure unit 35 as seen from the vertical plane portion W1a side (see FIG. 1), and FIG. 2(b) is a plan view of the situation where the first exposure unit 35 and the second exposure unit 36 perform exposure as seen from above. Further, FIG. 2(c) shows an example of the formation of exposure lines LS1, LS2, and LS3 by the first exposure unit 35, and FIG. 2(d) shows an example of the formation of exposure lines LS4, LS5, and LS6 by the second exposure unit 36. As shown in FIG. 2(a), the first exposure unit 35 is composed of exposure heads 37A and 37B arranged side by side in the Y direction, and an exposure head 37C arranged above the exposure heads 37A and 37B.

[0027] As described above, the first exposure unit 35 and the second exposure unit 36 have the same configuration. In FIG. 2(a), the front configuration of the second exposure unit 36 as seen from the vertical plane portion W2a side (see FIG. 1) is shown by reference numerals in parentheses. That is, the second exposure unit 36 is composed of exposure heads 38A and 38B arranged side by side in the Y direction, and an exposure head 38C arranged above the exposure heads 38A and 38B.

[0028] As shown in FIG. 2(b), an air injection mechanism 45 is arranged between the first exposure unit 35 and the second exposure unit 36. The air injection mechanism 45 is composed of a first air injection unit 46 arranged at the center in the X direction, a second air injection unit 47 arranged on the first exposure unit 35 side, and a third air injection unit 48 arranged on the second exposure unit 36 side. A gap through which the substrate W1 passes is provided between the first air injection unit 46 and the second air injection unit 47. On the other hand, a gap through which the substrate W2 passes is provided between the first air injection unit 46 and the third air injection unit 48.

[0029] In the first exposure unit 35, the exposure head 37A irradiates the substrate W1 with the light beam L1 and scans horizontally in the Y direction. Similarly, the exposure head 37B irradiates the substrate W1 with the light beam L2 and scans horizontally in the Y direction, and the exposure head 37C irradiates the substrate W1 with the light beam L3 and scans horizontally in the Y direction. In the second exposure unit 36, the exposure head 38A irradiates the substrate W2 with the light beam L4 and scans horizontally in the Y direction. Similarly, the exposure head 38B irradiates the substrate W2 with the light beam L5 and scans horizontally in the Y direction, and the exposure head 38C irradiates the substrate W2 with the light beam L6 and scans horizontally in the Y direction.

[0030] FIG. 2(c) shows the exposure situation of the substrate W1. The exposure head 37A can form an exposure line LS1 on the exposure surface WS where the photosensitive layer is formed by scanning the light beam L1, the exposure head 37B can form an exposure line LS2 by scanning the light beam L2, and the exposure head 37C is arranged so as to be able to form an exposure line LS3 by scanning the light beam L3. The exposure lines LS1, LS2, and LS3 are made to slightly overlap in the Y direction (width direction), and by appropriately adjusting the substrate conveyance speed and the light beam scanning speed, an arbitrary exposure pattern can be formed.

[0031] As shown in FIG. 2(d), the exposure head 38A can form an exposure line LS4 on the exposure surface WS where the photosensitive layer is formed by irradiating the substrate W2 with the light beam L4 and scanning horizontally in the Y direction, the exposure head 38B can form an exposure line LS5 by irradiating the light beam L5 and scanning horizontally in the Y direction, and the exposure head 38C is arranged so as to be able to form an exposure line LS6 by irradiating and scanning the light beam L6. The exposure lines LS4, LS5, and LS6 are made to slightly overlap in the Y direction (width direction), and by appropriately adjusting the substrate conveyance speed and the light beam scanning speed, an arbitrary exposure pattern can be formed. In the following description, the light beams L1 to L6 may be collectively referred to simply as the light beam L.

[0032] Note that the first exposure unit 35 and the second exposure unit 36 can have different configurations. The exposure apparatus 1 can form different exposure patterns on the substrates W1 and W2 by appropriately adjusting the light beam scanning distance, the light beam scanning speed, and the substrate conveyance speed, respectively. When the regions where the exposure lines LS1 to LS6 are formed are defined as the exposure section WR, the exposure section WR is a vertical plane and must maintain flatness. Therefore, an air injection mechanism 45 is provided to maintain the verticality and flatness of the exposure section WR. The exposure section WR on the substrate W1 is within the vertical plane portion W1a shown in FIG. 1, and the exposure section WR on the substrate W2 is within the vertical plane portion W2a shown in FIG. 1.

[0033] FIG. 3 is a perspective view showing a configuration example of the air injection mechanism 45. The air injection mechanism 45 includes a first air injection unit 46, and second and third air injection units 47 and 48 disposed on both sides with the first air injection unit 46 interposed therebetween. A space S1 in which the substrate W1 can be conveyed is provided between the first air injection unit 46 and the second air injection unit 47. Also, a space S2 in which the substrate W2 can be conveyed is provided between the first air injection unit 46 and the third air injection unit 48. The first air injection unit 46 is fixed to the upper table 22 (see FIG. 1) by a frame (not shown).

[0034] The first air injection unit 46 has air cylinders 50 and 51 as an air injection unit position adjustment mechanism on the surface on the side of the third air injection unit 48. The air cylinders 50 and 51 are fixed to the diagonal corners of the first air injection unit 46. The air cylinders 50 and 51 have rods 52 and 52 that penetrate the first air injection unit 46, and the tip ends of the rods 52 are fixed to the second air injection unit 47. The air cylinders 50 and 51 have the same configuration, and FIG. 3 omits the illustration of the rod 52 of the air cylinder 51. By driving the air cylinders 50 and 51, the rods 52 and 52 expand and contract, enabling the second air injection unit 47 to move forward and backward toward the first air injection unit 46. In the present embodiment, the air cylinders 50 and 51 are used as the drive source for the second air injection unit 47, but the drive source is not particularly limited as long as the drive stroke and drive speed of the second air injection unit 47 can be controlled with high precision and miniaturization is possible.

[0035] Further, the first air injection unit 46 has guide posts 53 and 54 that are erected toward the third air injection unit 48 below the air cylinder 50 and above the air cylinder 51. The guide posts 53 and 54 slidably penetrate the third air injection unit 48.

[0036] Further, the first air injection unit 46 has air cylinders 55 and 56 as an air injection unit position adjustment mechanism on the surface on the side of the second air injection unit 47. The air cylinders 55 and 56 are fixed to the diagonal corners of the first air injection unit 46 at positions that do not intersect with the air cylinders 50 and 51. The air cylinders 55 and 56 have rods 57 and 57 that penetrate the first air injection unit 46, and the tip ends of the rods 57 and 57 are fixed to the third air injection unit 48. The air cylinders 55 and 56 have the same configuration, and by driving the air cylinders 55 and 56, the rods 57 and 57 can be extended and retracted, enabling the third air injection unit 48 to move forward and backward toward the first air injection unit 46. In this example, the air cylinders 55 and 56 are used as the drive source for the third air injection unit 48, but the drive source is not particularly limited as long as the drive stroke and drive speed of the third air injection unit 48 can be controlled with high precision and miniaturization is possible.

[0037] Further, the first air injection unit 46 has guide posts 58 and 59 planted toward the second air injection unit 47 above the air cylinder 55 and below the air cylinder 56. The guide posts 58 and 59 slidably penetrate the second air injection unit 47. FIG. 3 omits the illustration of the guide post 59.

[0038] The air injection mechanism 45 can freely move the second air injection unit 47 forward and backward toward the first air injection unit 46 by driving the air cylinders 50 and 51. At this time, since the movement of the second air injection unit 47 is guided by the guide posts 58 and 59 planted on the first air injection unit 46, the second air injection unit 47 can be moved forward and backward while maintaining a high-precision parallelism with respect to the first air injection unit 46. Similarly, the air injection mechanism 45 can freely move the third air injection unit 48 forward and backward toward the first air injection unit 46 by driving the air cylinders 55 and 56. At this time, since the movement of the third air injection unit 48 is guided by the guide posts 53 and 54 planted on the first air injection unit 46, the third air injection unit 48 can be moved forward and backward while maintaining a high-precision parallelism with respect to the first air injection unit 46.

[0039] In FIG. 3, the third air injection unit 48 has openings 60, 61, and 62 through which the light beams L4, L5, and L6 (see FIG. 2) irradiated by the second exposure unit 36 pass. The opening 60 has a size and shape that include the scanning range of the light beam L4, the opening 61 has a size and shape that include the scanning range of the light beam L5, and the opening 62 has a size and shape that include the scanning range of the light beam L6. Referring to FIG. 4, the first air injection unit 46 has openings 73, 74, and 75 through which the light beams L1, L2, L3, L4, L5, and L6 irradiated by the first exposure unit 35 and the second exposure unit 36 can pass. The second air injection unit 47 has openings 84, 85, and 86 through which the light beams L1, L2, and L3 irradiated by the first exposure unit 35 can pass. The third air injection unit 48 has openings 60, 61, and 62 through which the light beams L4, L5, and L6 irradiated by the second exposure unit 36 can pass.

[0040] (Configuration of the first air injection unit 46) Figure 4 is a cross-sectional view showing the first air injection unit 46, the second air injection unit 47, and the third air injection unit 48 cut along the cutting line A-A in Figure 3. Note that Figure 4 omits the illustration of the air cylinders 50, 51, 55, 56, and the guide posts 53, 54, 58, 59, etc. The first air injection unit 46 is composed of a support member 65 at the central part in the Y direction and air injection members 66 and 67 arranged on both sides of the support member 65 in the Y direction. The support member 65 is formed with recesses 69 and 70 surrounded by a peripheral wall portion 68a or a peripheral wall portion 68b which are the outer peripheral edge portions in the thickness direction on both the front and back sides. And at the bottom of the recess 69, a protrusion 71a with a flat tip, a protrusion 71b spaced apart from the protrusion 71a in the X direction (the back side of the paper surface), and a protrusion 71c arranged above the protrusions 71a and 71b are formed. Also, at the bottom of the recess 70, a protrusion 72a with a flat tip, a protrusion 72b spaced apart from the protrusion 72a in the X direction (the back side of the paper surface), and a protrusion 72c arranged above the protrusions 72a and 72b are formed.

[0041] The protrusions 71a and 72a are both arranged at positions facing the opening 60 (see Figure 3), the protrusions 71b and 72b are both arranged at positions facing the opening 61 (see Figure 3), and the protrusions 71c and 72c are both arranged at positions facing the opening 62 (see Figure 3).

[0042] The air injection member 66 is abutted against the protrusions 71a, 71b, and 71c in the recess 69 and fixed to the inner surface of the peripheral wall portion 68a. Similarly, the air injection member 67 is abutted against the protrusions 72a, 72b, and 72c in the recess 70 and fixed to the inner surface of the peripheral wall portion 68b. The outer surface 66a of the air injection member 66 is preferably at the same surface position as the peripheral wall portion 68a. Also, the outer surface 67a of the air injection member 67 is preferably at the same surface position as the peripheral wall portion 68b.

[0043] The first air injection unit 46 has an opening 73 that penetrates the air injection member 66, the protrusions 71a and 72a, and the air injection member 67, an opening 74 that penetrates the air injection member 66, the protrusions 71b and 72b, and the air injection member 67, and further has an opening 75 that penetrates the air injection member 66, the protrusions 71c and 72c, and the air injection member 67. The openings 73, 74, and 75 are through-holes through which each light beam L (see FIG. 2) irradiated from the first exposure unit 35 or the second exposure unit 36 passes.

[0044] The support member 65 has a compressed air supply hole 76 that communicates the recess 69 with the outside and supplies compressed air into the recess 69, and a compressed air supply hole 77 that communicates the recess 70 with the outside and supplies compressed air into the recess 70. The compressed air supply holes 76 and 77 are connected to a compressed air supply device (not shown). Further, the air injection members 66 and 67 have a number of air injection holes (not shown) capable of injecting the supplied compressed air toward the substrate W1 or the substrate W2. The air injection holes are arranged substantially evenly over the entire surfaces of the air injection members 66 and 67. In FIG. 4, the injection state of the air is represented by arrows. The spaces formed in the recesses 69 and 70 after the air injection members 66 and 67 are attached to the support member 65 may be referred to as air chambers 69 and 70. Since the protrusions 71a, 71b, 71c, 72a, 72b, and 72c partially protrude into the air chambers 69 and 70, the air chambers 69 and 70 are configured as a single communicating chamber.

[0045] The air injection members 66 and 67 can, for example, use porous ceramics, be provided with a large number of small-diameter holes penetrating in the thickness direction, or be provided with a large number of slit-shaped holes penetrating in the thickness direction. Further, a sealing material 78 having a high light transmittance is embedded in the openings 73, 74, and 75. The sealing material 78 is managed so as to be at the same surface position as the outer surfaces 66a and 67a of the air injection members 66 and 67. When compressed air is supplied to the air chambers 69 and 70, the inside of the openings 73, 74, and 75 is in a negative pressure state with respect to the surrounding air chambers 69 and 70. When the inside of the openings 73, 74, and 75 is in a negative pressure state with respect to the surroundings, in the case where the substrates W1 and W2 are, for example, films having a thickness of several tens of μm, the substrates W1 and W2 may sway and lose flatness. However, by providing the sealing material 78, the pressure inside the air chambers 69 and 70 becomes uniform, so that it is possible to maintain the flatness of the substrates W1 and W2. Note that the pressure inside the air chambers 69 and 70 is managed to be the same.

[0046] (Configuration of the Second Air Injection Unit 47) As shown in FIG. 4, the second air injection unit 47 includes a support member 80 and an air injection member 81 disposed on the first air injection unit 46 side of the support member 80. A recess 82 is formed in the support member 80 and is surrounded by a peripheral wall portion 80a provided on the first air injection unit 46 side and serving as an outer peripheral edge in the thickness direction. At the bottom of the recess 82, a protrusion 83a having a flat tip, a protrusion 83b spaced apart from the protrusion 83a in the X direction (the back side of the paper surface), and a protrusion 83c disposed above the protrusions 83a and 83b are formed. The protrusion 83a is disposed at a position facing the opening 60 (see FIG. 3), the protrusion 83b is disposed at a position facing the opening 61 (see FIG. 3), and the protrusion 83c is disposed at a position facing the opening 62 (see FIG. 3).

[0047] The air injection member 81 is brought into contact with the protrusions 82a, 82b, and 82c in the recess 82 and fixed to the inner surface of the peripheral wall portion 80a. The outer surface 81a of the air injection member 81 is preferably at the same surface position as the peripheral wall portion 80a.

[0048] The second air injection unit 47 has an opening 84 that penetrates the support member 80, the protrusion 83a, and the air injection member 81, an opening 85 that penetrates the support member 80, the protrusion 83b, and the air injection member 81, and an opening 86 that penetrates the support member 80, the protrusion 83c, and the air injection member 81. The openings 84, 85, and 86 are through-holes through which each light beam L (see FIG. 2) irradiated from the first exposure unit 35 passes.

[0049] The support member 80 has a pressure air supply hole 87 that communicates the recess 82 with the outside and supplies pressure air into the recess 82. The pressure air supply hole 87 is connected to a pressure air supply device (not shown). Further, the air injection member 81 has a number of air injection holes (not shown) capable of injecting the supplied pressure air toward the substrate W1. The air injection holes are arranged substantially evenly over the entire surface of the air injection member 81. In FIG. 4, the injection state of the air is represented by arrows. The space formed in the recess 82 after the air injection member 81 is attached to the support member 80 may be referred to as an air chamber 82. Since the protrusions 83a, 83b, and 83c partially protrude into the air chamber 82, the air chamber 82 has a single-chamber configuration in which it is in communication.

[0050] The air injection member 81 can be made of, for example, porous ceramic, provided with a number of small-diameter holes penetrating in the thickness direction, or provided with a number of slit-shaped holes penetrating in the thickness direction. Further, a sealing material 78 having a high light transmittance is embedded in the openings 84, 85, and 86. The sealing material 78 is managed so as to be at the same surface position as the outer surface 81a of the air injection member 81. When pressure air is supplied to the air chamber 82, if the inside of the openings 84, 85, and 86 becomes a negative pressure with respect to the surroundings, when the substrate W1 is, for example, a film having a thickness of several tens of μm, the substrate W1 may sway and lose its flatness. However, by providing the sealing material 78, the pressure inside the air chamber 82 becomes uniform, so that it becomes possible to maintain the flatness of the substrate W1. Note that the pressure inside the air chamber 82 is managed to be the same as that of the air chamber 69.

[0051] The distance D1 between the outer surface 66a of the air injection member 66 and the substrate W1 is fixed if the thickness of the substrate W1 is constant. As described above, since the second air injection unit 47 can move forward and backward toward the first air injection unit 46, it is possible to adjust the distance D2 between the outer surface 81a of the air injection member 81 and the substrate W1. Therefore, since it is possible to make the distance D1 and the distance D2 the same, it is possible to make the air pressures injected from the first air injection unit 46 and the second air injection unit 47 toward the substrate W1 the same, and at least the verticality and planarity of the exposed portion WR (see FIG. 2) of the vertical plane portion W1a (see FIG. 1) of the substrate W1 can be maintained.

[0052] (Configuration of the Third Air Injection Unit 48) As shown in FIG. 4, the third air injection unit 48 includes a support member 90 and an air injection member 91 disposed on the side of the first air injection unit 46 of the support member 90. The support member 90 is formed with a recess 92 provided on the side of the first air injection unit 46 and surrounded by a peripheral wall portion 90a that is the outer peripheral edge in the thickness direction. At the bottom of the recess 92, a protrusion 93a with a flat tip, a protrusion 93b spaced apart from the protrusion 93a in the X direction (the back side of the paper), and a protrusion 93c disposed above the protrusions 93a and 93b are formed. The protrusion 93a is disposed at a position facing the opening 60 (see FIG. 3), the protrusion 93b is disposed at a position facing the opening 61 (see FIG. 3), and the protrusion 93c is disposed at a position facing the opening 62 (see FIG. 3).

[0053] The air injection member 91 is brought into contact with the protrusions 93a, 93b, and 93c in the recess 92 and fixed to the inner surface of the peripheral wall portion 90a. The outer surface 91a of the air injection member 91 is preferably at the same surface position as the peripheral wall portion 90a.

[0054] The third air injection unit 48 has an opening 60 that penetrates the support member 90, the protrusion 93a, and the air injection member 91, an opening 61 that penetrates the support member 90, the protrusion 93b, and the air injection member 91, and an opening 62 that penetrates the support member 90, the protrusion 93c, and the air injection member 91. The openings 60, 61, and 62 are through-holes through which each light beam L (see FIG. 2) irradiated from the second exposure unit 36 passes.

[0055] The support member 90 has a pressure air supply hole 97 that communicates the concave portion 92 with the outside and supplies pressure air into the concave portion 92. The pressure air supply hole 97 is connected to a pressure air supply device (not shown). Further, the air injection member 91 has a number of air injection holes (not shown) capable of injecting the supplied pressure air toward the substrate W2. In FIG. 4, the injection state of the air is represented by arrows. The space formed in the concave portion 92 after the air injection member 91 is attached to the support member 90 may be referred to as an air chamber 92. Since the protrusions 93a, 93b, and 93c partially protrude into the air chamber 92, the air chamber 92 has a one-chamber configuration in which they communicate.

[0056] The air injection member 91 can be formed, for example, using a porous ceramic, providing a number of small-diameter holes penetrating in the thickness direction, or providing a number of slit-shaped holes penetrating in the thickness direction. Further, a sealing material 78 having a high light transmittance is embedded in the openings 60, 61, and 62. The sealing material 78 is managed to be at the same surface position as the outer surface 91a of the air injection member 91. When pressure air is supplied to the air chamber 92 and the inside of the openings 60, 61, and 62 becomes a negative pressure state with respect to the surroundings, when the substrate W1 is, for example, a film having a thickness of several tens of μm, the substrate W1 may shake and lose its flatness. However, by providing the sealing material 78, the pressure inside the air chamber 92 becomes uniform, so that it is possible to maintain the flatness of the substrate W2. Note that the pressure in the air chamber 92 is managed to be the same as that in the air chamber 70.

[0057] The distance D3 between the outer surface 67a of the air injection member 67 and the substrate W2 is fixed if the thickness of the substrate W2 is constant. As described above, since the third air injection unit 48 can move forward and backward toward the first air injection unit 46, it is possible to adjust the distance D4 between the outer surface 91a of the air injection member 91 and the substrate W2. Therefore, since it is possible to make the distance D3 and the distance D4 the same, the air pressures injected from the first air injection unit 46 and the third air injection unit 48 toward the substrate W2 can be made the same, and at least the verticality and planarity of the exposed portion WR (see FIG. 2) of the vertical plane portion W2a (see FIG. 1) of the substrate W2 can be maintained.

[0058] (Application Example) The exposure apparatus 1 is composed of a first substrate transfer mechanism 11, a second substrate transfer mechanism 12, a first exposure unit 35, and a second exposure unit 36. Therefore, by appropriately switching the driving of the first substrate transfer mechanism 11 and the second substrate transfer mechanism 12 and the driving of the first exposure unit 35 and the second exposure unit 36, it becomes possible to apply to a plurality of cases described below. That is, the exposure apparatus 1 can be applied to simultaneously performing single-sided exposure of the substrates W1 and W2, performing single-sided exposure of the substrates W1 and W2 individually, and performing double-sided exposure on a substrate W3 (see FIG. 5) having exposure surfaces WS1 and WS2 on both sides. Various application examples will be described with reference to FIG. 5.

[0059] FIG. 5 is an explanatory diagram schematically showing an application example of the exposure apparatus 1. FIGS. 5(a) to 5(e) show the first to fifth application examples. Note that the substrates W1 and W2 are not particularly distinguished, and the substrate transported by the first substrate transport mechanism 11 is defined as the substrate W1, and the substrate transported by the second substrate transport mechanism 12 is defined as the substrate W2. FIG. 5(a) shows an application example in which the single sides of the substrates W1 and W2 can be exposed simultaneously. The substrate W1 is transported by the first substrate transport mechanism 11, and the substrate W2 is transported by the second substrate transport mechanism 12. The light beams L1, L2, L3 (see FIG. 2) irradiated by the first exposure unit 35 pass through the second air injection unit 47 and expose the exposure surface WS of the substrate W1. On the other hand, the light beams L4, L5, L6 (see FIG. 2) irradiated by the second exposure unit 36 pass through the third air injection unit 48 and expose the exposure surface WS of the substrate W2.

[0060] At this time, the first air injection unit 46 and the second air injection unit 47 inject air toward the substrate W1 (see FIG. 4), and the first air injection unit 46 and the third air injection unit 48 inject air toward the substrate W2.

[0061] FIG. 5(b) shows an application example in which the single side of the substrate W1 transported by the first substrate transport mechanism 11 can be exposed. The second substrate transport mechanism 12 and the second exposure unit 36 do not operate. The light beams L1, L2, L3 (see FIG. 2) irradiated by the first exposure unit 35 pass through the second air injection unit 47 and expose the exposure surface WS of the substrate W1. Although not shown, it is also possible to set the substrate W1 on the first substrate transport mechanism 11 so that the exposure surface WS of the substrate W1 faces the second exposure unit 36. In such a case, the first exposure unit 35 is stopped, and the light beams L4, L5, L6 (see FIG. 2) are irradiated from the second exposure unit 36. The light beams L4, L5, L6 can pass through the third air injection unit 48 and the first air injection unit 46 to expose the exposure surface WS of the substrate W2. Also at this time, the first air injection unit 46 and the second air injection unit 47 are injecting air toward the substrate W1.

[0062] FIG. 5(c) shows an application example in which one-sided exposure of the substrate W2 conveyed by the second substrate conveyance mechanism 12 is possible. The first substrate conveyance mechanism 11 and the first exposure unit 35 do not operate. The light beams L4, L5, L6 (see FIG. 2) irradiated by the second exposure unit 36 pass through the third air injection unit 48 and expose the exposure surface WS of the substrate W2. Although not shown, it is possible to set the substrate W2 on the second substrate conveyance mechanism 12 so that the exposure surface WS of the substrate W2 faces the first exposure unit 35. In such a case, the second exposure unit 36 is stopped, and the light beams L1, L2, L3 (see FIG. 2) are irradiated from the first exposure unit 35. The light beams L1, L2, L3 can pass through the second air injection unit 47 and the first air injection unit 46 to expose the exposure surface WS of the substrate W2. At this time, the first air injection unit 46 and the third air injection unit 48 are injecting air toward the substrate W2.

[0063] Note that, due to reasons such as production management, there may be a time difference in the exposure processes of the substrates W1 and W2. In such a case, as shown in FIG. 5(a) in advance, both the substrates W1 and W2 are set on the first substrate conveyance mechanism 11 or the second substrate conveyance mechanism 12. Then, the substrate W1 is exposed by the first exposure unit 35, and thereafter, one-sided exposure of the substrate W2 can be performed by the second exposure unit 36. In this way, since it is possible to set the substrates W1 and W2 on the first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12 in advance, the setup time can be halved.

[0064] FIG. 5(d) shows an application example enabling double-sided exposure of a substrate W3 having exposure surfaces WS1 and WS2 on both the front and back surfaces, which is conveyed by the second substrate conveyance mechanism 12. The first substrate conveyance mechanism 11 is not operating. The light beams L1, L2, and L3 (see FIG. 2) irradiated by the first exposure unit 35 pass through the second air injection unit 47 and the first air injection unit 46, and expose the exposure surface WS1 of the substrate W2. Then, the light beams L4, L5, and L6 irradiated by the second exposure unit 36 pass through the third air injection unit 48, and expose the exposure surface WS2 of the substrate W3. At this time, the first air injection unit 46 and the third air injection unit 48 are injecting air toward the substrate W2.

[0065] FIG. 5(e) shows an application example enabling double-sided exposure of a substrate W3 having exposure surfaces WS1 and WS2 on both the front and back surfaces, which is conveyed by the first substrate conveyance mechanism 11. The second substrate conveyance mechanism 12 is not operating. The light beams L1, L2, and L3 (see FIG. 2) irradiated by the first exposure unit 35 pass through the second air injection unit 47, and expose the exposure surface WS1 of the substrate W3. Then, the light beams L4, L5, and L6 irradiated by the second exposure unit 36 pass through the third air injection unit 48 and the first air injection unit 46, and expose the exposure surface WS2 of the substrate W3. At this time, the first air injection unit 46 and the third air injection unit 48 are injecting air toward the substrate W2.

[0066] The exposure apparatus 1 described above has a first substrate conveyance mechanism 11 and a second substrate conveyance mechanism 12 that can be independently driven and controlled. The exposure apparatus 1 has a first exposure unit 35 and a second exposure unit 36 that are arranged to face each other with the exposure portions WR of the substrates W1, W2, or substrate W3 conveyed by the first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12 interposed therebetween. Then, the conveyed substrates W1, W2 are conveyed with the exposure portions WR spaced apart and parallel to each other. The exposure apparatus 1 configured in this way can drive by appropriately switching between the first substrate conveyance mechanism 11 and the second substrate conveyance mechanism 12, and can drive by appropriately switching between the first exposure unit 35 and the second exposure unit 36.

[0067] The above-described conventional exposure apparatus can perform double-sided exposure or single-sided exposure of one substrate. In contrast, the exposure apparatus 1 according to the present embodiment can perform double-sided exposure of one substrate W3, and can not only perform single-sided exposure of each of the substrates W1 and W2, but also simultaneously perform single-sided exposure of the substrates W1 and W2. Therefore, it is possible to significantly improve the production efficiency of the exposure process, including reducing the setup time related to the exposure process.

[0068] Each of the first exposure unit 35 and the second exposure unit 36 has exposure unit position adjustment mechanisms 40 and 41 that can move forward and backward toward the exposure portion WR of each substrate W to be exposed. Since each substrate W is conveyed by the first substrate conveyance mechanism 11 or the second substrate conveyance mechanism 12, the Y-direction position of the exposure portion WR is different. Also, the thickness of each substrate W to be conveyed may be different. Therefore, by having the exposure unit position adjustment mechanisms 40 in the first exposure unit 35 and the second exposure unit 36, it is possible to appropriately adjust the focus of the light beam L with respect to the exposure portion WR. However, when conveying the substrate W only by the first substrate conveyance mechanism 11, the exposure unit position adjustment mechanism 41 is sufficient, and when conveying the substrate W only by the second substrate conveyance mechanism 12, the exposure unit position adjustment mechanism 40 is sufficient.

[0069] The exposure apparatus 1 has a first air injection unit 46 disposed between the exposure portion WR of the substrate W1 and the exposure portion WR of the substrate W2, a second air injection unit 47 disposed between the substrate W1 and the first exposure unit 35, and a third air injection unit 48 disposed between the substrate W2 and the second exposure unit 36. The first air injection unit 46 has openings 73, 74, and 75 through which the light beams L1 to L6 irradiated from the first exposure unit 35 and the second exposure unit 36 pass. The second air injection unit 47 has openings 84, 85, and 86 through which the light beams L1, L2, and L3 irradiated from the first exposure unit 35 pass. The third air injection unit 48 has openings 60, 61, and 62 through which the light beams L4, L5, and L6 irradiated from the second exposure unit 36 pass.

[0070] The first air injection unit 46 and the second air injection unit 47 inject air from both the front and back sides of any one of the substrates W1, W2, and W3 conveyed by the first substrate conveyance mechanism 11, enabling non-contact conveyance of the exposed portions WR of the substrates W1, W2, and W3. Also, the first air injection unit 46 and the third air injection unit 48 inject air from both the front and back sides of any one of the substrates W1, W2, and W3 conveyed by the second substrate conveyance mechanism 12, enabling non-contact conveyance of the exposed portion WR of any one of the substrates W1, W2, and W3. The first air injection unit 46 has openings 73, 74, and 75, the second air injection unit 47 has openings 84, 85, and 86, and the third air injection unit 48 has openings 60, 61, and 62. The openings 73, 84, 60; the openings 74, 85, 61; and the openings 75, 86, 62 are each arranged in a straight line. By configuring in this way, the light beams L1, L2, L3 irradiated from the first exposure unit 35 and the light beams L4, L5, L6 irradiated from the second exposure unit 36 enable single-sided exposure of the substrates W1 and W2 and double-sided exposure of the substrate W3.

[0071] Also, each of the first air injection unit 46, the second air injection unit 47, and the third air injection unit 48 has air injection members 66, 67, 81, and 91 provided with a number of air injection holes (not shown) on the surface facing the exposed portion WR of each substrate. The air injection members 66, 67, 81, and 91 inject air of the same pressure over substantially the entire surface of at least the range that becomes the exposed portion WR of each substrate W. By this, it becomes possible to maintain the verticality and planarity of the exposed portion WR, and it becomes possible to form a desired exposure pattern with high precision.

[0072] In addition, the first air injection unit 46 has air cylinders 50, 51, 55, 56 as an air injection unit position adjustment mechanism capable of moving the second air injection unit 47 and the third air injection unit 48 forward and backward toward the first air injection unit 46. The air cylinders 50, 51 move the second air injection unit 47 forward and backward, and the air cylinders 55, 56 move the third air injection unit 48 forward and backward. With such a configuration, it becomes possible to appropriately adjust the positions of the second air injection unit 47 and the third air injection unit 48 with respect to the exposed portion WR of the substrate W. Note that the position of the first air injection unit 46 is fixed. Therefore, it becomes possible to adjust the distance D1 between the first air injection unit 46 and the substrate W1 to be the same as the distance D2 between the first air injection unit 46 and the second air injection unit 47, and to adjust the distance D3 between the first air injection unit 46 and the substrate W2 to be the same as the distance D4 between the first air injection unit 46 and the third air injection unit 48. This makes it possible to inject air of the same pressure into the substrates W1, W2, W3, and to maintain the flatness of the exposed portion WR of each substrate W.

[0073] Further, sealing materials 78, such as glass, having a high light transmittance are embedded in the openings 73, 74, 75 provided in the air injection members 66, 67, the openings 84, 85, 86 provided in the air injection member 81, and the openings 60, 61, 62 provided in the air injection member 91, at least on the side facing the substrate W. When compressed air is supplied to the air chambers 69, 70, a negative pressure state is created in each of the above openings with respect to the surrounding air chambers 69, 70, 82, 92. When a negative pressure state is created in each of the above openings with respect to the surroundings, if the substrate W is, for example, a film having a thickness of several tens of μm, the substrate W may sway and the flatness may not be maintained. However, by providing the sealing material 78, it becomes possible to prevent a negative pressure from being created in each opening with respect to the surrounding air chambers 69, 70, 82, 92, and to maintain the flatness of the substrate W.

[0074] The exposure apparatus 1 of the embodiment described above configures the first substrate transfer mechanism 11 and the second substrate transfer mechanism 12 such that the exposure unit WR is vertical. Then, the first exposure unit 35 and the second exposure unit 36 are arranged horizontally with the exposure unit WR therebetween. However, it is also possible to configure the first substrate transfer mechanism 11 and the second substrate transfer mechanism 12 such that the exposure unit WR is horizontal, and to arrange the first exposure unit 35 and the second exposure unit 36 vertically with the exposure unit WR therebetween. Even if the exposure apparatus 1 is configured such that the exposure unit WR is horizontal, by providing the first air injection unit 46, the second air injection unit 47, and the third air injection unit 48, it is possible to maintain the horizontality and planarity of the exposure unit WR even if the substrates W1, W2, and W3 are thin films having a thickness of about several tens of μm.

Explanation of Reference Numerals

[0075] 1... exposure apparatus, 11... first substrate transfer mechanism, 12... second substrate transfer mechanism, 35... first exposure unit, 36... second exposure unit, 40, 41... exposure unit position adjustment mechanism, 46... first air injection unit, 48... third air injection unit, 60, 61, 62, 73, 74, 75, 84, 85, 86... openings, 66, 67, 81, 91... air injection members, 78... sealing material, L, L1 to L6... light beams, W, W1, W2, W3... substrates, WR... exposure unit, WS, WS1, WS2... exposure surfaces

Claims

1. An exposure apparatus for forming an exposure pattern on an exposure surface of a substrate by scanning a light beam, A first substrate conveyance mechanism and a second substrate conveyance mechanism of a Roll to Roll system that can be independently driven and controlled, The exposure units of the substrate conveyed by each of the first substrate conveyance mechanism and the second substrate conveyance mechanism are arranged to face each other with the exposure portions of the substrate interposed therebetween, a first exposure unit disposed on the first substrate conveyance mechanism side, and a second exposure unit disposed on the second substrate conveyance mechanism side, The substrates conveyed by each of the first substrate conveyance mechanism and the second substrate conveyance mechanism have the exposure portions spaced apart and arranged in parallel, An exposure apparatus characterized by the above.

2. In the exposure apparatus according to Claim 1, At least one of the first exposure unit and the second exposure unit further has an exposure unit position adjustment mechanism capable of moving forward and backward toward the exposure portion of the substrate, An exposure apparatus characterized by the above.

3. In the exposure apparatus according to Claim 1, A first air injection unit disposed between the exposure portions of the substrates conveyed by each of the first substrate conveyance mechanism and the second substrate conveyance mechanism, A second air injection unit disposed between the substrate conveyed by the first substrate conveyance mechanism and the first exposure unit, A third air injection unit disposed between the substrate conveyed by the second substrate conveyance mechanism and the second exposure unit, and further has, The first air injection unit, the second air injection unit, and the third air injection unit have openings through which the light beam irradiated from the first exposure unit or the second exposure unit can pass, An exposure apparatus characterized by the above.

4. In the exposure apparatus according to Claim 3, The first air injection unit, the second air injection unit, and the third air injection unit each have an air injection member provided with a plurality of air injection holes on the surface facing each of the substrates. The pressures of the air injected by the first air injection unit, the second air injection unit, and the third air injection unit toward each of the substrates facing each other are the same. An exposure apparatus characterized by the above.

5. In the exposure apparatus according to claim 3, The first air injection unit has an air injection unit position adjustment mechanism capable of moving the second air injection unit or the third air injection unit forward and backward toward the first air injection unit. An exposure apparatus characterized by the above.

6. In the exposure apparatus according to claim 3, At least a sealing material having a high light transmittance on the substrate side is embedded in the opening. An exposure apparatus characterized by the above.

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