System and method for operating plasma jet configuration

Abstract

To provide a system for generating and controlling a non-thermal atmospheric pressure plasma.SOLUTION: A system (1) includes a discharge space (10) into which a working gas can be introduced via a first opening (12), and in which a plasma can be generated in the discharge space (10), and the discharge space (10) includes a discharge space (10) having a second opening (14) such that plasma can be discharged from the discharge space (10) through the second opening (14), and at least one high-voltage electrode (20) for generating an electromagnetic field to generate plasma in the discharge space (10).SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a system and method for generating and controlling non-thermal atmospheric pressure plasma.

Background Art

[0002] Non-thermal atmospheric pressure plasma is used especially for medical purposes. This field of application is also known as "plasma medicine".

[0003] In the present application, non-thermal atmospheric pressure plasma is also hereinafter referred to as plasma.

[0004] Plasma is understood to be a gas containing free electrons, radicals, ions, and neutral particles in a certain ratio. Depending on the type of working gas, reactive species such as active oxygen such as ozone (O3) are generated by the plasma. The reactive species have an antibacterial effect. Therefore, treatment with plasma can be useful for wound healing.

[0005] Plasma can be generated, for example, in a plasma jet device. In this case, plasma can be generated in a discharge space in an electromagnetic field, and this plasma is transported in the form of a plasma jet to the outside of the device, particularly the discharge space, by the gas flow rate.

[0006] Plasma jet devices are described in the prior art (Winter, J., Brandenburg, R., and Weltermann, K.-D. (2015), "Atmospheric pressure plasma jets: an overview of devices and new directions", Plasma Sources Sci. Technol., 24, 064001). Such devices are particularly suitable for treating small areas.

[0007] The control of the plasma jet of a plasma or plasma jet device is performed via electrical or electronic control of the applied electromagnetic field respectively. For example, the electromagnetic field is stopped by electrical or electronic control, and as a result, no more plasma is generated in the discharge space, and thus the plasma is not discharged from the discharge space as a plasma jet. By generating a new electromagnetic field, the plasma jet can be generated again.

[0008] Individual plasma jet devices emit a focused plasma jet and thus provide spot-like treatment. Therefore, these applications are insufficient when treating a wider area such as the wound treatment of burn patients.

[0009] In order to enable plasma treatment of a wide area, various solutions have been disclosed in the prior art. US Patent Application Publication No. 2009 / 0188626 (A1) discloses an apparatus in which a plurality of electrodes are arranged in a common dielectric container. US Patent Application Publication No. 2004 / 0123803 (A1) describes an apparatus in which gas from a plurality of nozzles is continuously introduced into the space between two electrodes, and another gas can be supplied to this space in pulses.

Prior Art Documents

Patent Documents

[0010]

Patent Document 1

Patent Document 2

[0011]

Non-Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0012] A plurality of individual plasma jets arranged side by side are also referred to as a plasma jet array in the context of this application. In the case of the simultaneous operation of the individual plasma jet devices of the plasma jet array, the electromagnetic fields of the individual plasma jet devices will affect each other if their electromagnetic fields are not properly shielded. Therefore, a great deal of effort is required for proper shielding, and thus such a device of the plasma jet array is very complicated and costly to manufacture.

[0013] In order to be simple and easy to use, attention is paid to a plasma jet array in which the generated plasma and / or the discharged plasma jet can be easily controlled, for example, switched on and / or off in a simple manner. Furthermore, a plasma jet array that is easy to control and inexpensive to manufacture is attracting attention.

Means for Solving the Problems

[0014] These problems are solved by the system according to claim 1 and the method according to claim 13. Advantageous embodiments of the device are described in the dependent claims. These embodiments and further embodiments are explained below.

Brief Description of the Drawings

[0015]

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Embodiments for Carrying Out the Invention

[0016] A first aspect of the present invention relates to a system for generating and controlling non-thermal atmospheric pressure plasma. This system has a discharge space into which an operating gas can be introduced through a first opening. Plasma can be generated in the discharge space, particularly from the introduced operating gas. The discharge space has a second opening, and thus the plasma can be discharged from the discharge space through this second opening.

[0017] This system has at least one high-voltage electrode for generating an electromagnetic field in the discharge space for generating plasma, particularly plasma ignited from the operating gas.

[0018] The plasma discharged through the second opening is controlled by a flow controller of the system, and this flow controller is configured to set the volumetric flow rate of the working gas passing through the first opening from the working gas source to the discharge space. This flow controller is further configured to assume at least a first state and a second state. In the first state, since no working gas is supplied from the working gas source to the discharge space, even if there is an electromagnetic field generated in the discharge space, especially by the high-voltage electrode, no plasma is discharged from the second opening. That is, in the first state, since no working gas is supplied from the working gas source to the discharge space, no plasma is discharged from the second opening even if there is an electromagnetic field in the discharge space. In the second state, the working gas from the working gas source is supplied to the discharge space. Plasma is generated in the discharge space, and the plasma is discharged from the second opening. In particular, the plasma is generated immediately from the volumetric flow rate of the working gas supplied from the first opening by the electromagnetic field generated by the high-voltage electrode. Therefore, by controlling the volumetric flow rate by the flow controller, the plasma jet discharged from the second opening can be directly and immediately controlled, and it is not necessary to continuously generate the primary plasma to ignite the secondary plasma.

[0019] With this type of control, in particular, the generation and continuous maintenance of the primary plasma in the discharge space become unnecessary, so the technical aspect of the system is greatly simplified.

[0020] The present invention describes how the adjustment of the volumetric flow rate of the working gas is achieved in an advantageous manner using a flow controller, and thus enables accurate dosing of the volumetric flow rate, i.e., time-resolved and position-resolved (in the case of multiple discharge spaces) dosing, by a flow controller that can be controlled particularly quickly. The adjustment of the volumetric flow rate is related not only to a simple "on" and "off" switching, but also to the targeted control of the plasma jet discharged from the second opening via the volumetric flow rate of the working gas. The same applies to the mixing with a trace amount of addition to the working gas.

[0021] The advantages of the present invention are particularly evident in a multi-jet device, i.e., a system according to the present invention having a plurality of discharge spaces.

[0022] When electrical energy is used for the operation / regulation of a plasma jet, this is always accompanied by electromagnetic interference, on the one hand by the control of a high-voltage source and on the other hand by the plasma itself. In an array of multiple plasma jets, there is always interference between them, which affects proper operation and the setting of desired / required plasma parameters. At present, it is not possible to eliminate, let alone reduce, the adverse effects of this electromagnetic interference without considerable technical effort. The approach of the present invention of supplying and optionally selectively adjusting the composition of the working gas can achieve simple and economically advantageous results. While the technical complexity in the electronic control of high-voltage generation is reduced, hydrodynamic complexity is added. However, especially in an array, the overall complexity of the system is still reduced and more problems are solved.

[0023] Non-thermal plasma is also called low-temperature plasma or cold plasma in the context of this application. Also, the plasma transported out of the discharge space through the second opening by the gas flow rate, especially the volume flow rate of the working gas, is also called a plasma jet or a plasma beam in the context of this specification.

[0024] The discharge space may be delimited by a wall. The wall may delimit the first opening. According to the present invention, the wall may delimit the second opening. The wall may be formed as a dielectric.

[0025] The discharge space particularly comprises a volume in which plasma can be generated.

[0026] When a voltage is applied to the high-voltage electrode, an electromagnetic field is generated. This generated electromagnetic field is also called the existing electromagnetic field in this application. Using this generated electromagnetic field or the existing electromagnetic field, non-thermal atmospheric pressure plasma can be generated.

[0027] Plasma can also be generated by a laser or an ion beam. However, parameters of the plasma such as temperature, leakage current, or species generation are quite difficult to control, and the technical effort increases as compared with the principle of the present invention.

[0028] According to one embodiment, a high-voltage electrode is disposed within the discharge space.

[0029] The discharge space can be fluidly connected to an operating gas source via a first opening. That is, the operating gas from the operating gas source can be introduced into the discharge space via the first opening.

[0030] The operating gas may contain, or may be any of, the following gases: hydrogen, argon, helium, nitrogen, oxygen, neon, krypton, or carbon dioxide. The operating gas may be a gas mixture containing at least one of the following gases: hydrogen, argon, helium, nitrogen, oxygen, neon, krypton, or carbon dioxide. In particular, the operating gas may contain argon or may be argon.

[0031] The flow controller can assume at least a first state and a second state. In the first state of the flow controller, the flow controller is configured such that no operating gas is introduced into the discharge space. That is, in the second state, it means that the gas supply (particularly, the supply of the operating gas) to the discharge space is blocked. The operating gas does not flow from the first opening through the discharge space toward the second opening. Further, the operating gas does not flow from the first opening toward the second opening and is not discharged from the discharge space. There is no volumetric flow rate of the operating gas within the discharge space. The plasma is not transported out of the second opening in the form of a plasma jet by the volumetric flow rate.

[0032] When the working gas is not introduced into the discharge space so that the plasma jet is not discharged from the discharge space, the working gas will not be discharged from the discharge space. Therefore, compared with the prior art device in which the working gas continuously flows out of the discharge space through the discharge space, the consumption of the working gas is advantageously reduced.

[0033] In the first state, this system may be configured such that no plasma is generated in the discharge space.

[0034] In the second state of the flow controller, the working gas is formed to be introduced into the discharge space. In particular, the working gas is introduced so as to flow into the discharge space from the first opening and flow through the discharge space in the direction of the second opening. In particular, the introduced working gas flows from the first opening toward the second opening and flows out of the second opening outside the discharge space.

[0035] Due to the volumetric flow rate of the working gas, the plasma generated in the discharge space is discharged from the discharge space as a plasma jet through the second opening.

[0036] By controlling the flow controller, it is possible to set whether the plasma is discharged from the discharge space as a plasma jet. That is, in the system according to the present invention, it means that hydrodynamic control of the discharge of the plasma from the discharge space is realized. That is, it is possible to perform hydrodynamic control of the plasma jet. Therefore, the plasma jet can be controlled in a simple manner without performing any control or adjustment of the electromagnetic field, and in particular, it is possible to control whether the plasma jet is discharged from the discharge space. The complexity of the electrical and / or electronic system is advantageously reduced. The overall complexity of the system is reduced.

[0037] According to one embodiment, this system includes at least one ground electrode. At least one high-voltage electrode and at least one ground electrode may be formed to generate an electromagnetic field for generating plasma in the discharge space.

[0038] This ensures that the generation of the plasma is independent of the distance to the surface to be treated. Otherwise, the surface to be treated would act as a counter electrode and have a significant impact on the plasma characteristics.

[0039] In one embodiment, the system has at least one high-voltage electrode and at least one ground electrode for generating an electromagnetic field for generating plasma in the discharge space.

[0040] The plasma discharged through the second opening is controlled by a flow controller of the system, which is configured to set the volumetric flow rate of the working gas passing through the first opening from the working gas source to the discharge space. The flow controller is further configured to assume at least a first state and a second state. In the first state, no working gas is supplied from the working gas source to the discharge space. As a result, even if an electromagnetic field is generated in the discharge space, especially by the ground electrode and the high-voltage electrode, no plasma is discharged from the second opening. That is, in the first state, no working gas is supplied from the working gas source to the discharge space, and as a result, even if there is an electromagnetic field in the discharge space, no plasma is discharged from the second opening. In the second state, the working gas is supplied from the working gas source to the discharge space. Plasma is generated in the discharge space, and the plasma is discharged from the second opening.

[0041] When a voltage is applied, an electromagnetic field can be generated between the high-voltage electrode and the ground electrode. This generated electromagnetic field is also referred to as the existing electromagnetic field in this application. Using this generated electromagnetic field or the existing electromagnetic field, non-thermal atmospheric pressure plasma can be generated.

[0042] In one embodiment, a ground electrode is arranged in the discharge space.

[0043] The advantage of the embodiment with the ground electrode is that the generation and / or setting of the electromagnetic field can be performed more accurately. Thereby, the characteristics of the generated plasma can also be set more precisely.

[0044] In one embodiment, the system is configured to achieve the regulation of the plasma by a corresponding regulation of the volumetric flow rate of the working gas, in particular exclusively by a corresponding regulation of the volumetric flow rate of the working gas and not in particular by the regulation of the electromagnetic field. In particular, the system is configured to generate only a continuous electromagnetic field in the discharge space. In one embodiment, the system is formed to generate only a continuous electromagnetic field in the discharge space, in particular during the regulation of the plasma.

[0045] The regulation of the plasma particularly means a variation of the plasma jet. The regulation of the plasma may mean that the plasma is converted from a state in which it is discharged from the discharge space, in particular as a plasma jet, to another state in which it is not discharged from the discharge space, i.e., no plasma jet is discharged from the discharge space anymore. The regulation of the plasma may be such that it changes the distance by which the plasma jet is discharged from the discharge space through the second opening. This distance may in particular be shortened to a shortest distance. If the distance becomes shorter than the shortest distance, the plasma is not discharged from the discharge space. Instead, this distance can also be increased.

[0046] One embodiment is characterized in that the regulation of the plasma is achieved by a corresponding regulation of the volumetric flow rate of the working gas. If there is no volumetric flow rate of the working gas, no plasma jet is discharged from the discharge space. If there is a volumetric flow rate of the working gas, the plasma jet can be discharged through the second opening of the discharge space.

[0047] The volumetric flow rate of the working gas can be pulsed. The pulsed volumetric flow rate of the working gas is a discontinuous volumetric flow rate whose quantity changes over time.

[0048] The plasma can be adjusted by adjusting the volume flow rate of the working gas. Furthermore, the consumption of the working gas can be controlled. In one embodiment, the consumption of the working gas is adjusted. In embodiments according to the present invention, the duration and / or effect of the leakage current are controlled. When the plasma (plasma jet) comes into contact with the surface, a leakage current may occur. If the plasma jet is not discharged from the discharge space, no leakage current to the surface will occur.

[0049] A continuous electromagnetic field is understood to be an electromagnetic field that is continuously switched on and persists, especially even when the volume flow rate of the working gas is not passing through the discharge space. In this sense, the term "continuous" is also considered to be permanent or unceasing (apart from the implicit time-dependence of the electromagnetic field due to changes in the electrical and magnetic parts of the electromagnetic field).

[0050] In one embodiment, the electromagnetic field is a continuous electromagnetic field. In particular, the electromagnetic field is continuous with respect to the amplitude of the electromagnetic field strength. In one embodiment, the electromagnetic field is constant on a time-average basis.

[0051] In one embodiment, it is characterized in that a continuous electromagnetic field is generated using a direct current voltage. According to the present invention, the direct current voltage applied to realize the adjustment of the plasma is not adjusted.

[0052] In another embodiment, the electromagnetic field is generated using an alternating current voltage. The alternating current voltage applied to adjust the plasma is not adjusted.

[0053] The electromagnetic field is used only to generate the plasma. According to the present invention, the electromagnetic field is not used to adjust the plasma. In particular, the electromagnetic field is not adjusted to adjust the plasma. In particular, the electromagnetic field is not adjusted to achieve the discharge of the plasma (plasma jet) from the discharge space and / or to terminate the discharge of the plasma from the discharge space. The discharge of the plasma jet from the discharge space can be controlled by the volume flow rate of the working gas.

[0054] According to a further embodiment, the flow controller is configured to regulate the volumetric flow rate of the working gas.

[0055] In one embodiment, the volumetric flow rate of the working gas can be set using the flow controller.

[0056] The flow controller may be formed as an individual directional control valve. The individual directional control valve can be switched individually between a first state (closed) and a second state (open).

[0057] In an alternative embodiment, the flow controller is a proportional valve. The proportional valve allows for a continuous transition of the valve opening. That is, the proportional valve performs a partial opening and / or closing to enable an accurate input of the working gas flow.

[0058] The regulation of the volumetric flow rate of the working gas can be performed by controlling the flow controller. For example, by shifting the flow controller from a first state to a second state, a volumetric flow rate of the working gas in the discharge space can be brought about that enables the plasma to be discharged from the discharge space as a plasma jet. Another regulation becomes possible by converting the flow controller from the second state to the first state. By shifting the flow controller from the second state to the first state, the volumetric flow of the working gas in the discharge space can be stopped so that the plasma is no longer discharged from the discharge space.

[0059] That is, the flow controller can be used to control the volumetric flow rate of the working gas. The volumetric flow rate of the working gas can be used to control the discharge of the plasma from the discharge space. The flow controller enables hydrodynamic control of the plasma. In particular, the plasma can be regulated without controlling the electromagnetic field. Thus, the discharge of the plasma from the discharge space becomes possible in a simple way without changing the applied electromagnetic field.

[0060] By accurately injecting the working gas, the distance at which the plasma jet is discharged from the discharge space can be precisely set and / or varied.

[0061] In one embodiment, the flow controller is electronically controlled. In one embodiment, the flow controller is electrically controlled. This means that the hydrodynamic control of the plasma is achieved by the electrical or electronic control of the flow controller.

[0062] One embodiment is characterized in that the flow controller has a short switching time. A short switching time means that the flow controller can quickly switch between individual states.

[0063] In one embodiment, the system is configured to shift the flow controller from a first state to a second state such that when an electromagnetic field is generated in the discharge space, plasma is generated in the discharge space and discharged from the discharge space through a second opening. In one embodiment, the system is configured to shift the flow controller from the second state to the first state such that when an electromagnetic field is generated in the discharge space, the plasma is not discharged from the discharge space. In one embodiment, the system is configured to shift the flow controller from the first state to the second state and also to shift the flow controller from the second state to the first state.

[0064] In other words, the flow controller is configured to switch on the plasma jet, i.e., the plasma is not previously discharged from the discharge space but is subsequently discharged from the discharge space as a plasma jet. In one embodiment, the system is configured to switch off the plasma jet. This means that the plasma jet was previously discharged from the discharge space but is subsequently not discharged from the discharge space.

[0065] One embodiment is characterized in that it has an active actuator formed such that the flow controller assumes at least a first state or a second state.

[0066] The active actuator is, for example, a valve, particularly an electromagnetic valve. The active actuator can be controlled electrically.

[0067] The active actuator may be formed as an individual direction control valve that assumes a first state or a second state. In one embodiment, the active actuator is formed as a proportional valve.

[0068] The active actuator can be a piezo valve. With a piezo valve, the flow rate of the working gas can be quickly and accurately input. The energy consumption of the piezo valve is extremely small. In this case, the battery lasts longer and the number of battery replacements or recharges is reduced, which is particularly advantageous when the system is used as a portable device. This expands the convenience and possible application range of the system, especially increasing the possibility of using the system portably.

[0069] In one embodiment, the working gas source constantly (uniformly over time) supplies the working gas. Using the active actuator, a pulsed volume flow rate of the working gas can be introduced into the discharge space over time.

[0070] In one embodiment, the flow controller includes a passive actuator formed such that it assumes at least one of a first state and a second state, and the passive actuator can transition from the first state to the second state particularly by the volume flow rate of the working gas.

[0071] The passive actuator can be a flutter valve or a check valve.

[0072] The active and / or passive actuator can be a microvalve. The microvalve advantageously enables the space-saving installation of a flow controller. That is, the space required for the system can be kept small. This is particularly advantageous when the system is used as a portable device.

[0073] According to a further embodiment, the system has an operating gas source with a flow controller.

[0074] The operating gas source can have, for example, a control element that can be used to set whether the operating gas flows out of the operating gas source. In one embodiment, the outflow rate of the operating gas, and thus the volumetric flow rate of the operating gas, is input using the control element. In one embodiment, the system is configured such that a pulsed volumetric flow rate of the operating gas is discharged from the operating gas source and flows into the discharge space.

[0075] In one embodiment, the system has an automatic control unit formed to control the flow controller. Using the automatic control unit, the flow controller can be automatically set to a first state or a second state. Further, in one embodiment, the automatic control unit is formed to shift the flow controller to the second state for a selected period, and as a result, the period during which the operating gas is introduced into the discharge space can be set.

[0076] Using the automatic control unit, it is possible to control whether the operating gas can flow into the discharge space. In one embodiment, the automatic control unit controls the volumetric flow rate of the operating gas.

[0077] In one embodiment, the automatic control unit comprises a microcontroller and a high-voltage coil.

[0078] The automatic control unit can control to be in the second state during the period when the flow controller is selected. That is, the automatic control unit can control the presence of the volumetric flow rate of the working gas in the discharge space during the selected period.

[0079] In one embodiment, the automatic control unit controls to turn on the switch of the plasma jet. The automatic control unit can control for how long the plasma jet turns on the switch. Further, in one embodiment, the automatic control unit controls the distance that the plasma jet is discharged from the discharge space through the second opening. In one embodiment, the automatic control unit controls to turn off the switch of the plasma jet. The automatic control unit may be configured such that the plasma jet had previously turned on the switch only for another period but then turns off the switch of the plasma jet for a certain period. In one embodiment, the automatic control unit is configured such that the plasma jet had previously had its switch turned off for another selected period but then turns on the switch of the plasma jet for the selected period.

[0080] One embodiment of the automatic control unit is formed to precisely input the working gas flowing into the discharge space, for example, by controlling a proportional valve.

[0081] The automatic control unit can be programmed.

[0082] The advantage of this embodiment is to automatically control when and for how long (i.e., the period) the plasma jet is discharged from the discharge space. Therefore, for example, the treatment time by the plasma jet can be automatically controlled.

[0083] In one embodiment, the automatic control unit is configured to adjust the volumetric flow rate of the working gas. In one embodiment, the system has a feedback mechanism for adjustment.

[0084] Advantageously, the feedback mechanism automatically detects and compensates for any fluctuations (deviations from the control value) of the plasma, for example by adjusting the volumetric flow rate of the working gas. The fluctuations are compensated so that a uniform plasma jet is discharged over time.

[0085] According to one embodiment, the system comprises a mixing device configured to mix additional gas with the working gas, such that the resulting gas mixture can be introduced into the discharge space. In particular, the system is configured such that the flow controller has the mixing device.

[0086] In one embodiment, the mixing device is configured to mix a plurality of gases with the working gas. In one embodiment, a gas mixture to be mixed with the working gas, in particular the gas mixture mixed in the mixing device, is provided.

[0087] The additional gas is in particular one of the following gases: hydrogen, oxygen, nitrogen, water vapor, argon, helium, neon, krypton, or carbon dioxide. The mixture of the mixing gas in particular contains one of the following gases: hydrogen, oxygen, nitrogen, water vapor, argon, helium, neon, krypton, or carbon dioxide. The mixture of the mixing gas may be air, in particular air in the atmosphere. In one embodiment, the mixture of the mixing gas is a humid gas. In particular, the mixture of the mixing gas may contain water vapor and at least one of the following gases: hydrogen, oxygen, nitrogen, water vapor, argon, helium, neon, krypton, or carbon dioxide.

[0088] Thus, a mixture of gases different from the working gas can be introduced into the discharge space, where other reactive species can be generated.

[0089] In one embodiment, the system is arranged to mix additional gas with the working gas for a selected time. Thus, the composition of the gas or gas mixture introduced into the discharge space can be set in a time-resolved manner. In one embodiment, the composition of the gas or gas mixture introduced into the discharge space can be controlled in a time-resolved manner.

[0090] In one embodiment, the system is configured to generate capacitively coupled plasma. In one embodiment, it is characterized in that it is configured to generate inductively coupled plasma. In one embodiment, the system is configured to generate microwave-induced plasma. In another embodiment, the system is configured to generate plasma using dielectrically hindered discharge.

[0091] In a further embodiment, the system has a plurality of discharge spaces, each discharge space having a respective first opening through which an operating gas can be introduced into the respective discharge space, and each discharge space having an assigned second opening through which plasma can be discharged from the respective discharge space. At least one high-voltage electrode for generating an electromagnetic field for generating plasma in each discharge space is assigned to each discharge space, such that in each discharge space, plasma can be generated independently of the other discharge spaces. The plasma discharged through the assigned second opening is controlled by a flow controller of the system having the respective discharge spaces, and each flow controller is configured to set the volumetric flow rate of the operating gas from the operating gas source through the respective first opening of each discharge space into the respective discharge space. Further, each flow controller is configured to assume at least a first state and a second state. In the first state, since no operating gas is supplied from the operating gas source to the respective discharge spaces, even if plasma is generated in each discharge space, no plasma is discharged from the assigned second opening of each discharge space. In the second state, the operating gas from the operating gas source is supplied to each of the plurality of discharge spaces, where plasma is generated and the plasma is discharged from the respective second openings.

[0092] In a further embodiment, the system has a plurality of discharge spaces, and each discharge space of the plurality of discharge spaces has a respective first opening through which an operating gas can be introduced into each discharge space of the plurality of discharge spaces. Each discharge space of the plurality of discharge spaces has an assigned second opening through which plasma can be discharged from each discharge space of the plurality of discharge spaces. Further, each discharge space of the plurality of discharge spaces has at least one high-voltage electrode assigned thereto for generating an electromagnetic field for generating plasma in each discharge space of the plurality of discharge spaces. Plasma can be generated independently in each discharge space of the plurality of discharge spaces from the other discharge spaces of the plurality of discharge spaces, and the plasma discharged through the assigned second opening is controlled by one of the plurality of flow controllers of the system assigned to each discharge space of the plurality of discharge spaces. Each flow controller of the plurality of flow controllers is configured to set the volumetric flow rate of the operating gas passing through the respective first opening of each discharge space of the plurality of discharge spaces from an operating gas source to each discharge space of the plurality of discharge spaces, and each flow controller of the plurality of flow controllers is further configured to adopt at least a first state and a second state. In the first state, in each discharge space of the plurality of discharge spaces, the operating gas is not supplied from the operating gas source to each discharge space of the plurality of discharge spaces so that even if an electromagnetic field is generated, the plasma is not discharged from the assigned second opening. In the second state, the operating gas from the operating gas source is supplied to each discharge space of the plurality of discharge spaces, plasma is generated therein, and the plasma is discharged from the second opening, respectively.

[0093] In each discharge space (of the plurality of discharge spaces), at least one high-voltage electrode for generating an electromagnetic field for generating plasma in each discharge space (of the plurality of discharge spaces) is assigned. In particular, at least one high-voltage electrode for generating an electromagnetic field for generating plasma in each discharge space (of the plurality of discharge spaces) is arranged in each discharge space (of the plurality of discharge spaces). As a result, plasma can be generated in each discharge space (of the plurality of discharge spaces) independently of the other discharge spaces (of the plurality of discharge spaces).

[0094] In particular, the high-voltage electrodes can be short-circuited to each other.

[0095] In one embodiment, the discharge spaces of the plurality of discharge spaces are formed similarly. In another embodiment, at least one discharge space of the plurality of discharge spaces is different from the other discharge spaces.

[0096] An advantage of a system having a plurality of discharge spaces is that a larger area, such as the surface of an object, can be treated with plasma without moving the system and / or the object to be treated.

[0097] Such a system can be used for the treatment of large-area surfaces, in particular heat-sensitive surfaces.

[0098] Each flow controller of the plurality of flow controllers can be controlled electrically or electronically. The control of the assigned flow controller controls the volumetric flow rate of the working gas in each discharge space and thus controls the plasma, in particular whether or not plasma in the form of a plasma jet is discharged from each discharge space. This means that the hydrodynamic control of the plasma, in particular the plasma jet, is effected through the electrical or electronic control of each flow controller.

[0099] Thereby, in a system having a plurality of discharge spaces, the technical complexity for controlling the plasma can be reduced. Perfect operation of the system becomes possible in a simple way.

[0100] One embodiment is characterized in that at least one ground electrode is assigned to each discharge space. In one embodiment, at least one high-voltage electrode and at least one ground electrode are arranged in their respective discharge spaces to generate an electromagnetic field for generating plasma. Thereby, the system is configured to immediately ignite the plasma by the electromagnetic field of the high-voltage electrode, particularly in the volumetric flow rate of the working gas.

[0101] In one embodiment, the system has a plurality of discharge spaces, and each discharge space of the plurality of discharge spaces has a respective first opening through which an operating gas can be introduced into each discharge space of the plurality of discharge spaces. Each discharge space of the plurality of discharge spaces has an assigned second opening through which plasma can be discharged from each discharge space of the plurality of discharge spaces. Further, each discharge space of the plurality of discharge spaces has at least one high-voltage electrode assigned thereto for generating an electromagnetic field for generating plasma in each discharge space of the plurality of discharge spaces, and at least one ground electrode. In each discharge space of the plurality of discharge spaces, plasma can be generated independently of the other discharge spaces of the plurality of discharge spaces, and the plasma discharged through the assigned second opening is controlled by one of the plurality of flow controllers of the system assigned to each discharge space of the plurality of discharge spaces. Each flow controller of the plurality of flow controllers is configured to set the volumetric flow rate of the operating gas passing through the respective first opening of each discharge space of the plurality of discharge spaces from an operating gas source to each discharge space of the plurality of discharge spaces, and each flow controller of the plurality of flow controllers is further configured to assume at least a first state and a second state. In the first state, the operating gas is not supplied from the operating gas source to each discharge space of the plurality of discharge spaces so that no plasma is discharged from the assigned second opening in each discharge space of the plurality of discharge spaces even when an electromagnetic field is generated in each discharge space of the plurality of discharge spaces. In the second state, the operating gas from the operating gas source is supplied to each discharge space of the plurality of discharge spaces, where plasma is generated and the plasma is discharged from the respective second opening.

[0102] In each discharge space (of a plurality of discharge spaces), at least one high-voltage electrode and at least one ground electrode for generating an electromagnetic field for generating plasma in each respective discharge space (of the plurality of discharge spaces) are assigned. In particular, at least one high-voltage electrode and at least one ground electrode for generating an electromagnetic field for generating plasma in each respective discharge space (of the plurality of discharge spaces) are arranged in each respective discharge space (of the plurality of discharge spaces) such that plasma can be generated in each respective discharge space (of the plurality of discharge spaces) independently of other discharge spaces (of the plurality of discharge spaces).

[0103] In one embodiment, the system has an automatic control system. The automatic control system is configured to independently control a plurality of flow controllers of the system such that the flow controller can assume at least a first state or a second state independently so that plasma is generated only in a selected discharge space and discharged only from a second opening of the selected discharge space.

[0104] The automatic control system can individually control each flow controller of the plurality of flow controllers. That is, each flow controller of the plurality of flow controllers can be controlled independently of other flow controllers.

[0105] In one embodiment, the automatic control system is configured to individually control each flow controller of the plurality of flow controllers such that each flow controller of the plurality of flow controllers can be controlled independently of the remaining flow controllers.

[0106] In one embodiment, the automatic control system is configured such that each flow controller of the plurality of flow controllers is controlled such that the plasma jet of each respective assigned discharge space exhibits a selected temporal pattern, i.e., a selected sequence of stages in which the plasma jet is discharged from each respective assigned discharge space and other stages in which the plasma jet is not discharged.

[0107] According to one embodiment, the automatic control system is configured to control the flow controllers of a plurality of flow controllers of the system independently of each other, such that a selected flow controller of the plurality of flow controllers adopts a second state during a first period and all other flow controllers of the plurality of flow controllers adopt a first state, and after the first period, during a second period, the selected flow controller of the plurality of flow controllers adopts the first state and another selected flow controller of the plurality of flow controllers adopts the second state, where the first and second periods are consecutive or temporarily overlap.

[0108] The automatic control system can control from which of the selected discharge spaces the plasma jet is discharged. In particular, the automatic control system is configured such that the plasma jet is discharged from a selected discharge space among the plurality of discharge spaces at any time.

[0109] In one embodiment, the automatic control system is configured to control those flow controllers of the plurality of flow controllers such that the first period and the second period follow each other without interruption. That is, in one embodiment, the automatic control system is configured to control these flow controllers of the plurality of flow controllers such that at any point in time, the plasma jet is discharged from exactly one of the plurality of discharge spaces.

[0110] In another embodiment, the automatic control system is configured to control those of the plurality of flow controllers such that a first period and a second period temporarily overlap, where in particular, the first period and the second period do not completely overlap. This means that in one embodiment, the system is configured such that in the overlapping period of the first period and the second period, one plasma jet is discharged from each of the two discharge spaces (to which the flow controller and the other flow controller are assigned). One embodiment shows that the overlapping period is short, in particular shorter than 1 second.

[0111] In one embodiment, each of the plurality of discharge spaces is formed so as to be connectable or connected to a common working gas source.

[0112] In each discharge space, the same reactive species can be generated.

[0113] This embodiment is particularly advantageous when used for large-area treatment using plasma, where the same species acts over the entire area.

[0114] According to a further embodiment, at least one of the plurality of flow controllers has a mixing device in which a further gas is mixed with the working gas, and the resulting gas mixture can be introduced into each of the plurality of discharge spaces. This means that the further gas can be mixed with the working gas in a spatially resolved manner, for example, in a discharge space arranged at a selected position with respect to other discharge spaces of the system. Thus, the effectiveness of this plasma can be adapted to specific requirements, for example, the treatment of a wide range of wounds, in a spatially resolved manner, for example, in a selected local area.

[0115] In a further embodiment, the system is formed to have at least one of the plurality of discharge spaces connectable or connected to a dedicated working gas source.

[0116] At least one discharge space can form an active species different from the active species that can be formed in other discharge spaces.

[0117] This embodiment is particularly advantageous when the system is used for large - area treatment by plasma, where this area has at least one sub - area on which at least one reactive species different from the reactive species generated in other discharge spaces acts. In other words, this means that for the treatment of at least one sub - area, the efficacy of the plasma can be adapted to meet the requirements.

[0118] One embodiment is characterized in that the second openings of the plurality of discharge spaces face the same direction.

[0119] In particular, the surface normals of the plurality of second openings face the same direction.

[0120] The advantage of such an arrangement is that with such a system, the plasma jet can be directed towards a certain surface.

[0121] According to a further embodiment, the second openings of the plurality of discharge spaces are positioned or can be positioned to face a central region.

[0122] In particular, the surface normals of the plurality of second openings face the central region.

[0123] In one embodiment, the second openings of the plurality of discharge spaces face the direction of a common volume.

[0124] With such a system, the plasma jet can be directed towards the surface of an object from various directions.

[0125] In one embodiment, the second openings of the plurality of discharge spaces are arranged on a common plane.

[0126] In one embodiment, the second openings of the plurality of discharge spaces are arranged on a common plane, and the second openings of the plurality of discharge spaces cover an area of at least 10 cm 2 , in particular at least 50 cm 2 , in particular at least 100 cm 2 .

[0127] According to a further embodiment, the system has at least two discharge spaces, in particular at least five discharge spaces, in particular at least ten discharge spaces, in particular at least twenty discharge spaces.

[0128] According to a further embodiment of the invention, at least one flow controller is continuously controllable such that the volumetric flow rate through each discharge space can be set continuously and individually.

[0129] According to a further embodiment of the invention, at least one flow controller is a proportional valve.

[0130] According to a further embodiment of the invention, the system is configured to adjust the volumetric flow rate of the working gas in each discharge space by means of a flow controller, the adjustment of the volumetric flow rate having more than two adjustment states, in particular the adjustment of the volumetric flow rate being continuously adjustable.

[0131] According to a further embodiment of the invention, each flow controller is configured to have a control time between 0.1 milliseconds and 1 second, so that the volumetric flow rate can be adjusted at each time resolution.

[0132] According to a further embodiment of the invention, the system comprises at least one associated sensor for each discharge space, the sensor being configured to detect plasma parameters and output a sensor signal indicative of the plasma parameters, and the system being configured to control at least one flow controller based on the sensor signal so as to set the plasma parameters to be achieved for the respectively assigned discharge space.

[0133] According to a further embodiment of the present invention, the system includes exactly one high-voltage electrode and no more than two ground electrodes for each discharge space.

[0134] According to a further embodiment of the present invention, the system is configured to generate capacitively coupled plasma, inductively coupled plasma, and / or microwave-induced plasma in the volumetric flow rate of the working gas supplied through the first opening.

[0135] According to a further embodiment of the present invention, each discharge space has a first opening and a second opening, which are exactly two openings.

[0136] Another aspect of the present invention relates to a method for generating and controlling non-thermal atmospheric pressure plasma using the system according to the present invention. Thereby, the method includes the following steps: - generating an electromagnetic field in the discharge space; - setting the flow controller to a first state or a second state, in the first state, no working gas is supplied from the working gas source to the discharge space, and as a result, even if an electromagnetic field is generated in the discharge space, no plasma is discharged from the discharge space, and in the second state, the working gas is supplied from the working gas source to the discharge space, plasma is generated in the discharge space, and the plasma is discharged from the second opening; including.

[0137] In one embodiment, the plasma is regulated.

[0138] One embodiment of the method includes the following steps: - generating an electromagnetic field in each of a plurality of discharge spaces; - A step of setting each of a plurality of flow controllers to a first state or a second state. In the first state, the working gas from the working gas source is not supplied to each of the plurality of discharge spaces. As a result, even if an electromagnetic field is generated in each of the plurality of discharge spaces, plasma is not discharged from each of the plurality of discharge spaces. In the second state, the working gas from the working gas source is supplied to each of the plurality of discharge spaces, plasma is generated in each of the plurality of discharge spaces, and the plasma is discharged from a second opening to which the plasma is assigned. The above step has.

[0139] In one embodiment, it is characterized in that the volume flow rate of the working gas supplied to a selected discharge space among the discharge spaces or the plurality of discharge spaces is adjusted to achieve plasma regulation while generating a continuous electromagnetic field in the selected discharge space among the discharge spaces or the plurality of discharge spaces.

[0140] According to one embodiment, one of the plurality of flow controllers is controlled to adopt the second state during a first period, and all the other flow controllers among the plurality of flow controllers are controlled to adopt the first state. After the first period, the flow controller among the plurality of flow controllers is converted to the first state, and another flow controller among the plurality of flow controllers is converted to the second state continuously or repeatedly with the first period to adopt the second state during a second period, while the remaining other flow controllers among the plurality of flow controllers remain in the first state.

[0141] This means that a plasma jet is discharged from the selected discharge space among the plurality of discharge spaces, while no plasma jet is discharged from the other discharge spaces.

[0142] A plurality of flow controllers can be controlled such that the selected different flow controllers are continuously converted from their respective first states to their respective second states. This means that the plasma jet can be continuously discharged from different selected discharge spaces, where the plasma jet is discharged only from one selected discharge space among a plurality of discharge spaces at a time, in particular.

[0143] According to one embodiment, the automatic control system controls a plurality of flow controllers such that each flow controller of the plurality of flow controllers switches between a first state and a second state and / or between the second state and the first state in a selected order independently of other flow controllers of the plurality of flow controllers.

[0144] Each flow controller of the plurality of flow controllers can be controlled independently of other flow controllers. In particular, each flow controller of the plurality of flow controllers can be controlled independently of other flow controllers such that the plasma jet is discharged from each discharge space (second state) or the plasma jet is not discharged (first state). Thereby, the automatic control system can control a plurality of flow controllers such that the plasma jet is discharged only from a selected discharge space among a plurality of discharge spaces at any given time.

[0145] The system according to the present invention can control the plasma jet in a simple manner. One embodiment of the system is configured such that a plurality of plasma beams are controlled and / or adjusted in a cooperative manner. The electrical and / or electronic complexity of the system is advantageously reduced compared to prior art systems. The overall complexity of the system can be reduced by the present invention. Thereby, the manufacturing cost of such a system can be reduced, which is economically advantageous.

[0146] Hereinafter, embodiments of the present invention, as well as features and advantages, will be described with reference to the drawings.

[0147] Description of the Drawings Figs. 1 and 2 show a system 1 for generating and controlling a non-thermal atmospheric pressure plasma (plasma) having a discharge space 10 and a flow controller 40, and the flow controller 40 assumes a first state (Fig. 1) and a second state (Fig. 2), respectively. Fig. 3 shows a further embodiment, in which the flow controller 40 is shown to be in the second state. Figs. 4 to 6 show further embodiments in which each flow controller assumes a first state in which no plasma jet is discharged.

[0148] The discharge space 10 has a first opening 12 and a second opening 14. In one embodiment according to the present invention, the discharge space 10 is partitioned by a dielectric 30 (Figs. 1, 2, 3). The dielectric 30 may be formed in a cylindrical shell shape.

[0149] The discharge space 10 extends along the longitudinal axis A. In the illustrated embodiment, the first opening 12 is located on the side opposite to the second opening 14.

[0150] The illustrated system 1 has a high voltage electrode 20 disposed in the discharge space 10 (Figs. 1 to 4). The ground electrode 22 is disposed outside the discharge space 10 by the dielectric 30, and the ground electrode 22 is disposed near the second opening 14 (Figs. 1 to 4). When a voltage is applied by the high voltage electrode 20 and the ground electrode 22, an electromagnetic field is generated in the discharge space 10 (Figs. 1 to 4).

[0151] In an embodiment, the high voltage electrode 20 and the ground electrode 22 are disposed outside the discharge space 10 by the dielectric 30 (Fig. 5).

[0152] The system 1 may have a microwave generator 202 and a microwave resonator 200 (Fig. 6).

[0153] The discharge space 10 may be connected to an operating gas source 50 by means of a conduit element 52, in particular a gas conduit element. The conduit element 52 can be fluidically connected on the one hand to the discharge space 10 and on the other hand to the operating gas source 50 (Figs. 1, 2, 5, 6). In particular, the conduit element 52 is arranged such that the operating gas from the operating gas source 50 can be introduced into the discharge space 10 through the conduit element 52 and through the first opening 12. In one embodiment, the operating gas source 50 is connected to a flow controller 40 by means of a conduit element 52, and the flow controller 40 is in turn connected to the discharge space 10 by means of another conduit element 52 (Figs. 3, 4).

[0154] The flow controller 40 can be used to control the volumetric flow rate 60 of the operating gas in the discharge space 10. In a first state, the flow controller 40 is arranged such that no operating gas flows into the discharge space 10 through the first opening 12 (Figs. 1, 4, 5, 6). In a second state, the operating gas from the operating gas source 50 can flow into the discharge space 10 through the first opening 12. The operating gas flows from the first opening 12 through the discharge space 10 towards the second opening 14 (Figs. 2, 3). The flow controller 40 can be a piezo valve (Fig. 4).

[0155] The system 1 shown in Fig. 5 has a mixing device 54, here the controller 40 has the mixing device 54. Furthermore, the system 1 has a further gas source 51. The further gas source 51 may be connected to the mixing device 54. In particular, the mixing device 54 is configured to mix the operating gas from the operating gas source 50 with a further gas from the further gas source 51, as a result of which a gas mixture is formed. The flow controller is configured such that the resulting gas mixture is supplied to the discharge space 10.

[0156] When an electromagnetic field is generated in the discharge space 10, plasma 5 is generated in the discharge space 10 and is discharged in the form of a plasma jet 6 from the discharge space 10 through the second opening 14 via the volumetric flow rate 60 of the operating gas (Figs. 2, 3).

[0157] In one embodiment according to the present invention, the flow controller 40 is controlled using the automatic control unit 70 (Figs. 1, 2, 5, 6). In particular, the state of the flow controller 40 can be set using the automatic control unit 70, that is, the automatic control unit 70 can control the flow controller 40 to be in the first state or the second state. In this way, by using the automatic control unit 70, it is possible to control whether or not the plasma jet is discharged from the discharge space.

[0158] Figs. 7 to 15 show embodiments according to the present invention of the system 1 for generating and controlling non-thermal atmospheric pressure plasma having a plurality of discharge spaces.

[0159] In Figs. 7 a) to f), embodiments of the system 1 in the form of a portable device 120 are shown from different viewpoints. The illustrated portable device 120 can be operated manually or by a robot. Figs. 7 d) to f) show the portable device 120 in a front view (d), a side view (e), and a perspective view (f). The illustrated portable device 120 has a housing 122. The portable device has a handle 140 and a headpiece 130. The headpiece 130 may have a plurality of recesses 132.

[0160] Figs. 7 a) to c) show the arrangement of the four discharge spaces 10a, 10b, 10c, 10d in a front view (a), a cross-sectional view (b), and a perspective view (c).

[0161] The four second openings 14a, 14b, 14c, 14d are arranged on a common plane. They face a common direction R, and the individual recesses 132 and the second openings 14a, 14b, 14c, 14d may be arranged in relation to each other such that the respective plasma jets of the respective second openings 14a, 14b, 14c, 14d can be discharged through the respective recesses 132.

[0162] Figs. 8 to 12 show an embodiment of the system 1 having a plurality of discharge spaces 10a, 10b, 10c. Each of the illustrated discharge spaces 10a, 10b, 10c has a respective first opening 12a, 12b, 12c and a respective second opening 14a, 14b, 14c. In each of the discharge spaces 10a, 10b, 10c, high-voltage electrodes 20a, 20b, 20c are disposed.

[0163] The vertical axes Aa, Ab, Ac of the respective discharge spaces 10a, 10b, 10c may be arranged parallel to each other (shown in Fig. 8).

[0164] The second openings 14a, 14b, 14c of each of the illustrated exemplary systems 1 (Figs. 8 to 12) are arranged in a common plane E. Each of the second openings 14a, 14b, 14c faces the same direction R. In particular, the surface normals Na, Nb, Nc face the same direction R (Figs. 8, 11). The vertical axes Aa, Ab, Ac can extend in the direction of the surface normals Na, Nb, Nc.

[0165] Figs. 8 and 9 show a system 1 for generating and controlling non-thermal atmospheric pressure plasma having three discharge spaces 10a, 10b, 10c. The discharge spaces 10a, 10b, 10c are connected to a common working gas source 50 via respective conduit elements 52a, 52b, 52c. The system 1 has flow controllers 40a, 40b, 40c, by which the introduction of the working gas from the working gas source 50 into each of the discharge spaces 10a, 10b, 10c is controlled.

[0166] The system 1 shown in Figs. 8 and 9 includes three discharge spaces 10a, 10b, 10c in which the diameters Da, Db, Dc of the respective second openings 14a, 14b, 14c are the same (Fig. 8).

[0167] FIG. 8 is a diagram showing the arrangement of the system 1 in which all of the three flow controllers 40a, 40b, and 40c are in the first state. This means that in any of the three discharge spaces 10a, 10b, and 10c, the working gas from the working gas source 50 is not introduced through the respective first openings 12a, 12b, and 12c.

[0168] FIG. 9 shows the arrangement in which the selected flow controller 40b is in its second state. The other two flow controllers 40a and 40c are in the first state respectively. In this configuration, the working gas is introduced into the selected discharge space 10b in which the gas supply is controlled using the selected flow controller 40b. The plasma 5 is generated in the selected discharge space 10b and is discharged as a plasma jet 6 from the assigned second opening 14b by the volume flow rate 60 of the working gas.

[0169] FIGS. 10 to 12 show the system 1 for generating and controlling a non-thermal atmospheric pressure plasma having two discharge spaces 10a and 10b, and the respective associated second openings 14a and 14b of the illustrated discharge spaces 10a and 10b have different diameters Da and Db.

[0170] FIG. 10 shows the arrangement of the system 1 in which the selected flow controller 40b is in the second state such that the plasma jet 6 is discharged from the second opening 14b of each discharge space 10b. The flow controllers 40a and 40b may both be connected to the automatic control system 72. The automatic control system 72 may control both of the flow controllers 40a and 40b. In particular, the automatic control system 72 controls the flow controllers 40a and 40b to be in the first state or the second state.

[0171] FIG. 11 shows an arrangement in which the discharge spaces 10a and 10b are connected to different working gas sources 50a and 50b through the respective conduit elements 52a and 52b. That is, the system has a plurality of working gas sources 50a and 50b. The flow controllers 40a and 40b may be controlled by a common automatic control system 72.

[0172] System 1 shown in FIG. 12 has another gas source 51 in addition to the working gas source 50 connected to both of the discharge spaces 10a, 10b. Further, the illustrated system 1 has a mixing device 54b. The flow controller 40b may have the mixing device 54b.

[0173] The additional gas source 51 can be connected to the mixing device 54b. By using the mixing device 54b, the working gas from the working gas source 50 is mixed with the additional gas from the additional gas source 51. This gas mixture is supplied to the discharge space 10b (by controlling the flow controller 40b).

[0174] FIGS. 13, 14 and 15 show exemplary arrangements of the system 1 having a plurality of discharge spaces 10, and the plurality of second openings 14 of the plurality of discharge spaces 10 face the central region Z. The plurality of discharge spaces 10 are connected to a common working gas source 50. The flow rate of the working gas is independently controlled in each of the plurality of discharge spaces 10 by using a plurality of flow controllers 40.

[0175] FIGS. 13 and 14 show a front view (FIG. 13) and a cross-sectional view (FIG. 14) of an exemplary arrangement in which a plurality of discharge spaces 10 are arranged in a cubic volume. The second opening 14 faces the direction of this cube. In one embodiment, the discharge spaces 10 are arranged on four faces of this cube (FIG. 13). The discharge spaces 10 are not arranged on two opposing surfaces (FIG. 14). Through these formed inlets 90, 92, the object 100 can be supplied to the central region Z along the moving direction B (FIG. 14).

[0176] FIG. 15 shows an exemplary arrangement from the front in which a plurality of discharge spaces 10 are arranged along a cylinder jacket. The second opening 14 faces the direction of the central region Z. The discharge spaces 10 can be arranged equidistantly from each other in the circumferential direction U.

Claims

1. A system (1) for generating and controlling a non-thermal atmospheric pressure plasma, comprising: The system (1) comprises a plurality of discharge spaces (10, 10a, 10b, 10c), each of which has a respective first opening (12, 12a, 12b, 12c) through which a working gas can be introduced into each of the discharge spaces (10, 10a, 10b, 10c), each of which has an assigned second opening (14, 14a, 14b, 14c) through which a plasma can be exhausted from each of the discharge spaces (10, 10a, 10b, 10c), and each of which has an assigned second opening (14, 14a, 14b, 14c) through which a plasma can be exhausted from each of the discharge spaces (10, 10a, 10b, 10c). At least one high voltage electrode (20, 20a, 20b, 20c) is assigned to each discharge space (10, 10a, 10b, 10c) for generating an electromagnetic field for generating a plasma (5) in the discharge space (10, 10a, 10b, 10c), so that in each discharge space (10, 10a, 10b, 10c), a plasma (5) can be generated independently of the other discharge spaces (10, 10a, 10b, 10c), and the plasma (5, 6) discharged through the assigned second opening (14, 14a, 14b, 14c) is discharged from the system assigned to each discharge space (10, 10a, 10b, 10c). Each of the flow controllers (40, 40a, 40b, 40c) is configured to set a volumetric flow rate (60) of the working gas from a working gas source (50, 50a, 50b) to a respective discharge space (10, 10a, 10b, 10c) through a respective first opening (12, 12a, 12b, 12c) of the respective discharge space (10, 10a, 10b, 10c), and each of the flow controllers (40, 40a, 40b, 40c) is configured to adopt at least a first state and a second state. In the first state, the working gas from the working gas source (50, 50a, 50b) is not supplied to each of the discharge spaces (10, 10a, 10b, 10c), so that in each of the discharge spaces (10, 10a, 10b, 10c), even if an electromagnetic field is generated in each of the discharge spaces (10, 10a, 10b, 10c), plasma is not discharged from the assigned second opening (14, 14a, 14b, 14c). In the second state, the working gas from the working gas source (50, 50a, 50b) is not supplied to each of the discharge spaces (10, 10a, 10b, 10c), so that in each of the discharge spaces (10, 10a, 10b, 10c), plasma is not discharged from the assigned second opening (14, 14a, 14b, 14c).a first opening (14, 14a, 14b, 14c) for generating a plasma therein, and the plasma (5, 6) is exhausted from an assigned second opening (14, 14a, 14b, 14c), the system (1) being configured to generate a capacitively coupled, inductively coupled, and / or microwave induced plasma in a working gas supplied through the first opening, the system (1) being configured to adjust a volumetric flow rate (60) of the working gas in each discharge space (10, 10a, 10b, 10c) by switching between a first state and a second state by means of a flow rate controller (40, 40a, 40b, 40c), and each flow rate controller (40, 40a, 40b, 40c) being configured to have a control time between 0.1 milliseconds and 1 second, such that the volumetric flow rate (60) can be adjusted with a respective time resolution.

2. 2. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to claim 1, characterized in that at least one ground electrode (22, 22a, 22b, 22c) is assigned to each discharge space (10, 10a, 10b, 10c), and at least one high voltage electrode (20, 20a, 20b, 20c) and at least one ground electrode (22, 22a, 22b, 22c) for generating an electromagnetic field for generating a plasma (5) are configured in each discharge space (10, 10a, 10b, 10c).

3. 3. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to claim 1 or 2, characterized in that the system (1) comprises an automatic control system (72) configured to independently control a plurality of flow controllers (40, 40a, 40b, 40c) of the system (1) such that the flow controllers (40, 40a, 40b, 40c) independently adopt at least a first state or a second state such that the plasma (5) is generated only in the selected discharge space (10, 10a, 10b, 10c) and is exhausted only from the second openings (14, 14a, 14b, 14c) of the selected discharge spaces (10, 10a, 10b, 10c).

4. The automatic control system (72) is configured to control the flow controllers (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) of the system (1) independently of one another, such that one flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopts a second state during a first period of time, and all other flow controllers (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopt a first state during a first period of time.

4. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma as claimed in claim 3, characterized in that after a first period, said flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopts the first state, and wherein after a first period, another flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopts a second state for a second period, and wherein the first and second periods are consecutive or temporarily overlapping.

5. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 4, characterized in that the system (1) is formed such that each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c) is connectable or connected to a common working gas source (50), or the system (1) is formed such that at least one discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c) is connectable or connected to its own working gas source (50a, 50b).

6. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 5, characterized in that the second openings (14, 14a, 14b, 14c) of the plurality of discharge spaces (10, 10a, 10b, 10c) face in the same direction (R) or the second openings (14, 14a, 14b, 14c) of the plurality of discharge spaces (10, 10a, 10b, 10c) are arranged or can be arranged to face a central region (Z).

7. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 6, characterized in that at least one flow controller (40, 40a, 40b, 40c) is continuously controllable such that the volumetric flow rate (60) through each discharge space (10, 10a, 10b, 10c) is continuously and individually settable.

8. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 7, characterized in that at least one flow controller (40, 40a, 40b, 40c) is a proportional valve.

9. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 8, characterized in that the system (1) is configured to adjust a volumetric flow rate (60) of the working gas in each discharge space (10, 10a, 10b, 10c) by means of a flow rate controller (40, 40a, 40b, 40c), and that the adjustment of the volumetric flow rate (60) has more than two adjustment states, in particular the adjustment of the volumetric flow rate (60) can be set continuously.

10. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 9, wherein the system (1) is configured such that a pulsed volumetric flow rate of the working gas is discharged from a working gas source (50, 50a, 50b) and flows into the discharge space (10, 10a, 10b, 10c).

11. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 10, characterized in that for each discharge space (10, 10a, 10b, 10c), the system (1) has at least one assigned sensor configured to detect plasma parameters and output a sensor signal indicative of the plasma parameter, wherein the system is configured to control at least one flow controller (40, 40a, 40b, 40c) based on the sensor signal such that the plasma parameters to be achieved for each assigned discharge space (10, 10a, 10b, 10c) are set.

12. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 11, characterized in that the system (1) has exactly one high voltage electrode and no more than two ground electrodes per discharge space (10, 10a, 10b, 10c).

13. The system (1) for generating and controlling a non-thermal atmospheric pressure plasma according to any one of claims 1 to 12, characterized in that each discharge space has exactly two openings, a first opening and a second opening.

14. A method for generating and controlling a non-thermal atmospheric pressure plasma using a system (1) according to any one of claims 1 to 13, comprising the following steps: generating an electromagnetic field in each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c); setting each flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) in a first state or a second state, in which in the first state, working gas from a working gas source (50, 50a, 50b) is not supplied to each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), so that in each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), an electromagnetic field is generated in each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), the step in which, even if plasma is generated in each of the discharge spaces (10, 10a, 10b, 10c), no plasma is discharged from each of the discharge spaces (10, 10a, 10b, 10c), and in the second state, the working gas from the working gas source (50, 50a, 50b) is supplied to each of the discharge spaces (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), plasma (5) is generated in each of the discharge spaces (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), and the plasma (5, 6) is discharged from the assigned second openings (14, 14a, 14b, 14c); The method comprising:

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