76 results about "Fluorinated gases" patented technology

The application discloses a device for reducing fluorine-containing gas pollutant emission in electroslag remelting and a use method, which comprises a flue gas recovery cover (1), a flue gas discharge pipeline (7) and a purification tank (10). The flue gas recovery cover (1) is respectively provided with a remelted slag discharging hole (2), a self-consuming mother electrode (6) passing hole and a flue gas discharge pipeline (7) mounting hole. The flue gas discharge pipeline (7) is arranged through the flue gas discharge pipeline (7) mounting hole, one end of the flue gas discharge pipeline (7) is located in a closed space formed by the flue gas recovery cover (1) and a crystallizer (5), and the other end is inserted into the purification tank (10). A fan (8) is arranged on the flue gas discharge pipeline (7). Through the device, the fluorine-containing flue gas is recovered, and the fluorine-containing flue gas is converted into calcium fluoride by using an alkali solution. The device can realize the cyclic and repeated use of part of the calcium fluoride, greatly reduces the concentration of fluorine-containing harmful gas in the air environment of an electroslag remelting operation site, and makes the concentration of the fluorine-containing harmful gas reduce from the original 5.6 mg / m 3 to 0.02 mg / m 3 .

The invention discloses a triphenyl phosphate standard substance structure identification method, and relates to the technical field of fluorine-containing gas emission reduction, and the method comprises the following steps: obtaining a standardized analysis sample through fluorine-containing matrix separation, target substance enrichment and solvation treatment; a multi-dimensional chromatographic system and a heart cutting technology are adopted, and temperature programming optimization is combined to realize separation and purification of a sample; carrying out multi-dimensional structure analysis and confirmation by using gas chromatography-mass spectrometry, infrared spectroscopy and nuclear magnetic resonance technologies; a five-stage progressive identification algorithm is constructed, and systematic identification is realized by combining a confidence evaluation system and a fluorine-containing interference correction technology; establishing a structural integrity verification and purity quantitative evaluation standard, and outputting a standardized identification report; a method applicability database is established through multi-type fluorine-containing environment verification and process condition adaptability testing. The method effectively solves the problem of accurate identification of triphenyl phosphate in a complex fluorine-containing matrix, and realizes effective removal of interference components such as light gas, hydrofluorocarbon, perfluorinated compounds and the like.

The utility model discloses an on-line analysis system for efficiently treating fluorine-containing gas, which is characterized by comprising an alkali washing tank (1), a water washing tank (5), a vacuum pump (7), a cyclone separator (8), a condenser (11), a dryer (16), a gas chromatograph (21) and a water collecting tank (25) which are sequentially connected through pipelines, an outlet pipeline of the cyclone separator (8) passes through a cyclone separator outlet three-way ball valve (10), and an outlet pipeline of the gas chromatograph (21) is connected with the water collecting tank (25). One path is connected with a condenser (11), and the other path is connected with a condenser outlet three-way ball valve (13) and a second needle valve (15) and then goes to a waste gas treatment system; and the water collecting tank (25) is connected with a fluorine-containing gas return system to form a loop. The system can realize rapid gas replacement and complete drying, is easy to maintain, can effectively improve the accuracy of analysis results, and reduces the labor cost.

The invention provides a silicon tetrafluoride purification method and a preparation method of modified activated carbon for deep purification of silicon tetrafluoride, and belongs to the technical field of silicon tetrafluoride purification. The silicon tetrafluoride purification method comprises the following steps that silicon tetrafluoride raw material gas is sequentially adsorbed with activated carbon and a molecular sieve, and primary purified silicon tetrafluoride is obtained; introducing ammonia gas into the primarily purified silicon tetrafluoride for reaction, carrying out gas-solid separation, and removing impurities from the obtained gas component by using modified activated carbon to obtain secondarily purified silicon tetrafluoride; a modification method of the modified activated carbon comprises the following steps: reacting activated carbon with fluorine-containing gas at 80-100 DEG C; and rectifying the secondarily purified silicon tetrafluoride to obtain the high-purity silicon tetrafluoride. The purity of the purified silicon tetrafluoride gas reaches 6N grade or above, the time for the modified activated carbon to reach adsorption saturation is long, the service cycle is long, and the production cost can be effectively reduced.

To provide a method for manufacturing a component that allows for the formation of recessed structures more quickly. [Solution] A method for manufacturing a member having a recessed structure, comprising: a first step of preparing a workpiece containing silicon; and a second step of forming a catalyst material on a part of the surface of the workpiece. The method comprises a third step of exposing the workpiece to a mixed gas of a fluorine-containing gas and an oxidizing gas in an environment of 250°C or higher, thereby forming a recessed structure in the portion of the workpiece where the catalyst material is formed.

The invention discloses a wet-process phosphoric acid defluorination residue recycling coupling device and a production method, the coupling device is arranged in a wet-process phosphoric acid production system, and the coupling device comprises a spiral mixing reactor (1), a mixing reactor (2) and a fluorine-containing gas washing and recycling device (3) which are sequentially arranged and connected; the production method comprises the following steps: adding concentrated sulfuric acid with the temperature of 80-90 DEG C into the wet-process phosphoric acid defluorination residues and silica fume in a spiral mixing reactor according to the mass ratio of 100: (5-10), reacting for 40-60 minutes, controlling the reaction temperature to be 90-100 DEG C, returning slurry B to a wet-process phosphoric acid production pre-extraction system, and separating and purifying the slurry B to obtain the wet-process phosphoric acid defluorination residues. Fluorine-containing gases SiF and HF generated by the mixing reaction are sent to a fluorine-containing gas washing and recycling device through a waste gas main pipe to be washed to obtain a 8-15% fluosilicic acid solution. The coupling device is coupled with an existing wet-process phosphoric acid production system, a large number of newly-added equipment and procedures are reduced, the whole process is free of three-waste emission, the method is simple in process, the fluorine recovery rate is larger than or equal to 83%, meanwhile, phosphorus is efficiently recovered, and pollution of fluorine resources to the environment is reduced.

The invention relates to the technical field of equipment control, in particular to a rare earth electrolysis feeding control method and system based on the fluorine ion quantity, and the method mainly comprises the steps that the fluorine gas concentration in the electrolysis process in the current collection period is obtained, and the current fluorine ion detection concentration is obtained through the fluorine gas concentration; and constructing a PID control model, and outputting a control signal for the feeding equipment according to the PID control model based on the fluorine ion concentration. According to the scheme, the fluorine ion or fluorine-containing gas emission amount is collected, the fluorine-containing gas or fluorine ion emission amount is relatively stable during normal electrolysis, and once material shortage and fluorine-containing gas or fluorine ion emission data are abnormal and obvious, abnormal electrolysis can be judged in time, response can be made in time (the starting point is different from that of the disclosed feeding control technology), and the feeding control accuracy is improved. And data are fed back in time and output of the charging machine is controlled. According to the method, whether material shortage exists in current electrolysis or not is judged, the feeding amount is accurately controlled through fluorine data, furnace caking caused by excessive material feeding due to the fact that materials exist in a furnace is avoided, and rare earth fluoride can be prevented from participating in electrolysis due to material shortage in the furnace.

An etching method includes: a) preparing, within a chamber, a substrate including a mask film containing ruthenium and having a predetermined pattern formed in the mask film, and a silicon-containing film provided under the mask film; b) supplying a process gas including a hydrocarbon-containing gas and a fluorine-containing gas into the chamber; and c) etching the silicon-containing film through the mask film using plasma generated from the process gas supplied into the chamber.

The invention provides a method and apparatus for efficiently and accurately filling vials with gaseous materials such as a fluorinated gas, with or without concomitantly filling the vials with another liquid or solid material. Also provided is a filling system for simultaneously filling a vial with a gaseous material and a liquid material using the apparatus.

The application relates to a preparation method of a fluorine oxide solid electrolyte and the fluorine oxide solid electrolyte. The preparation method comprises the following steps: grinding a lithium source material, a lanthanum source material, a material containing a doped element, a pore-forming agent and a solvent in a grinding machine to obtain a mixed slurry; performing spray granulation on the mixed slurry to obtain initial microparticles; placing the initial microparticles in a boiling bed reactor, performing sintering under an air atmosphere to remove the pore-forming agent and residual solvent, obtaining porous microparticles, switching the atmosphere to a fluorine-containing gas to perform sintering again, making the fluorine-containing active body decomposed from the fluorine-containing gas react with the porous microparticles, naturally cooling to room temperature under an inert gas atmosphere, obtaining a fluorine oxide solid electrolyte block, and performing crushing treatment to obtain the fluorine oxide solid electrolyte. The fluorine oxide solid electrolyte prepared by the preparation method has the characteristics of high compactness and high ionic conductivity, can be widely applied in lithium batteries, and is especially applied in full solid-state lithium batteries.

The invention relates to a preparation method of an oxyfluoride solid electrolyte and the oxyfluoride solid electrolyte. The preparation method comprises the following steps: putting a lithium source material, a lanthanum source material, a doped element-containing material, a pore-forming agent and a solvent into a grinding machine for grinding treatment to obtain mixed slurry; carrying out spray granulation on the mixed slurry to obtain initial particles; placing the initial particles in a fluidized bed reactor, sintering in an air atmosphere to remove the pore-forming agent and the residual solvent so as to obtain porous particles, switching the atmosphere into fluorine-containing gas, then sintering, enabling a fluorine-containing active body decomposed by the fluorine-containing gas to react with the porous particles, and naturally cooling to room temperature in an inert gas atmosphere, thereby obtaining the porous particles. And crushing the oxyfluoride solid electrolyte block to obtain the oxyfluoride solid electrolyte. The oxyfluoride solid electrolyte prepared by the preparation method provided by the invention has the characteristics of high density and high ionic conductivity, and can be widely applied to lithium batteries, especially all-solid-state lithium batteries.

The present invention discloses a fluorine-containing gas degradation device and method based on a warm plasma nozzle arc. In the fluorine-containing gas degradation device based on a warm plasma nozzle arc, a high-voltage DC power supply is used to break down a carrier gas to generate a warm plasma, which ionizes and decomposes the fluorine-containing gas and reacts with an active gas to inhibit the composite reaction of the fluorine-containing gas. The device includes a gas control input system to control the input flow of the carrier gas, fluorine-containing gas, and active gas; a warm plasma generator to generate a DC arc, and the resulting warm plasma jet is rapidly cooled after passing the Laval nozzle; and an exhaust gas treatment system in which the generated acidic gas products are absorbed by an adsorbent. A buffer tank is connected to the exhaust gas outlet and a circulation pump to circulate and degrade the fluorine-containing gas multiple times, and the exhaust gas is discharged after passing the exhaust gas inspection.

The invention discloses a fluorine-containing gas degradation device and method based on inductively coupled thermal plasma. In the fluorine-containing gas degradation device based on inductively coupled thermal plasma, an air intake control system controls the flow rates of carrier gas, cooling gas, fluorine-containing gas and active gas respectively; an inductively coupled plasma reactor generates and constrains a thermal plasma region, and a cavity vibration generator is fixed on the outer wall of the reaction chamber to prevent solid powder from adhering; a tail gas treatment system uses a conical powder collector to process solid products, and a spray tower to process acidic gas products, and discharges after being tested to meet standards. The device uses a high-frequency AC power supply and an induction coil to generate inductively coupled thermal plasma in the reaction chamber, and the fluorine-containing gas is completely decomposed and reacts with the active gas under the action of local high temperature, thereby suppressing the self-recovery characteristics of the fluorine-containing gas.

A method for etching a titanium-containing layer on a workpiece is provided. In one example, the method includes placing the workpiece on a workpiece support in a processing chamber. The workpiece includes a first layer and a second layer. The first layer is a titanium-containing layer. The method includes introducing a process gas into the processing chamber. The process gas includes an ozone gas and a fluorine-containing gas. The method includes exposing the first layer and the second layer on the workpiece to the process gas to at least partially etch the first layer at a greater etch rate relative to the second layer.

The invention discloses a treatment system and process for fluorine-containing gas. The treatment system comprises a reaction unit, the reaction unit comprises at least two reactors which are connected in series to provide a space for catalytic decomposition and chemical adsorption of fluorine-containing organic matters, and the multiple reactors are vertically arranged; the gas inlet unit is used for selectively conveying fluorine-containing gas and hydrogen chloride to the reactor; the discharging unit is used for receiving the metal fluoride discharged from the reactor at the lowermost end; the feeding unit is used for conveying a catalyst to the reactor at the uppermost end; and the tail gas treatment unit is used for receiving gas discharged from the reactor. According to the technical scheme, the requirement that the catalyst is frequently replaced during continuous reaction is met, and on the basis that fluorine-containing organic matter in gas is removed through catalytic decomposition, chemical adsorption is further carried out, and a fluoride salt product with a high additional value is formed.

The invention discloses a greenhouse gas analysis system and an analysis method thereof.The greenhouse gas analysis system comprises a sample injection system, a chromatographic column separation system and a detection system, the chromatographic column separation system comprises a first chromatographic column, a second chromatographic column, a third chromatographic column and a fourth chromatographic column, and the detection system comprises a hydrogen flame ionization detector, a thermal conductivity detector and an electron capture detector; the first chromatographic column, the second chromatographic column and the third chromatographic column are connected in parallel, the third chromatographic column and the fourth chromatographic column are connected in series, the first chromatographic column is connected with the hydrogen flame ionization detector, the second chromatographic column is connected with the electron capture detector, and the fourth chromatographic column is connected with the thermal conductivity detector; according to the invention, detection and analysis of fluorine-containing gases such as methane, carbon dioxide, nitrous oxide and sulfur hexafluoride are realized by using different detectors and different principles, chromatographic signal response is completed through the signal output system, and sample detection and analysis are realized through data analysis and calculation. And accurate and reliable quantity value traceability is provided for monitoring the change characteristics of the concentration of the greenhouse gas in the atmospheric environment.

There is provided a gas treatment apparatus for performing gas treatment on a substrate. The gas treatment apparatus includes: a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing gas and an alkaline gas; and a gas introduction member configured to cause the fluorine-containing gas and the alkaline gas supplied from the gas supply mechanism to merge with each other and introduce a mixed gas in which the fluorine-containing gas and the alkaline gas are mixed into the chamber. A portion of the gas introduction member including a merging point of the fluorine-containing gas and the alkaline gas is made of an aluminum-based material. A resin coating is formed on at least the portion including the merging point.

The present invention relates to the field of solar cell technology, and discloses a CdTe power generation glass and a preparation method thereof. The power generation glass structure includes an ultra-white float glass layer, a transparent conductive layer, a power generation layer, a back contact layer, and a back electrode layer stacked in sequence from bottom to top. In the activation process of the power generation layer, a fluorine source is used instead of a chlorine source, which solves the problem of uneven activation caused by uneven coating of the chlorine source. The improvement of activation uniformity improves battery efficiency and stability. A mass flow meter is used to control the amount of fluorinated gas introduced, and the fluorinated gas is directly introduced into the activation equipment to facilitate the control of gas distribution uniformity, thereby ensuring the uniform distribution of the fluorinated source. The combination of compressed air and a high-power fan can conveniently control the flow direction of the fluorinated gas and the proportion of the atmosphere, thereby improving the uniformity of film activation and avoiding product appearance problems caused by excessive activation, which meets the requirements of BIPV products.

To provide a manufacturing method that enables the precise and rapid production of a component having a recessed structure that closely resembles a vertical structure. [Solution] A manufacturing method according to one embodiment of the present invention is a method for manufacturing a member having a recessed structure, comprising: a first step of preparing a workpiece containing an element whose fluoride boiling point is 550°C or lower; a second step of forming a catalyst material on a part of the surface of the workpiece; and a third step of exposing the workpiece to an etching gas in an environment of 80°C or higher to form a recessed structure on the portion of the workpiece where the catalyst material has been formed, wherein the etching gas includes a fluorine-containing gas and an acidic gas, and the acidic gas has a lower acid dissociation constant than hydrogen fluoride.

This invention relates to the field of industrial process management and optimization scheduling technology, and particularly to a method for tracking and optimizing carbon emission flows in a multi-product co-production process in the fluorochemical industry. First, a directed graph model of the product chain with process units as vertices is constructed. A multi-dimensional carbon emission flow calculation model is established, including direct carbon flows from fuel combustion, indirect carbon flows from purchased electricity and heat, direct carbon flows from the process itself, and carbon flows from the emission of fluorinated greenhouse gases. A dynamic evolution algorithm for node carbon potential and an iterative algorithm for reverse tracing of branch carbon flows are employed to achieve accurate tracking of spatiotemporally coupled carbon flows throughout the entire process. Using the time-varying carbon intensity coefficient as the core parameter, a dual-objective optimization scheduling model is established to minimize both total system carbon emissions and overall operating costs. An adaptive penalty mechanism with carbon constraints is introduced to solve for the optimal scheduling scheme, constructing a rolling optimization closed-loop control link for the production process. This invention effectively solves the problems of calculating carbon flows from the emission of fluorinated gases and allocating carbon flows among multiple products in the fluorochemical industry, achieving a synergistic improvement in carbon emission reduction and economic benefits.

A method for selective plasma etching of silicon oxide relative to silicon nitride is described. The method includes providing a substrate containing a silicon oxide film and a silicon nitride film, and selectively etching the silicon oxide film relative to the silicon nitride film by: a1) exposing the substrate to a plasma-excited passivation gas containing carbon, sulfur, or both carbon and sulfur, wherein the plasma-excited passivation gas is free of fluorine or hydrogen, and b1) exposing the substrate to a plasma-excited etching gas containing a fluorine-containing gas. The method can further include an additional step a2) between a1) and b1): exposing the substrate to a plasma-excited additional passivation gas containing a fluorocarbon gas, a hydrofluorocarbon gas, a hydrochlorocarbon gas, a hydrochlorofluorocarbon gas, or a hydrocarbon gas or a combination thereof.

An object is to provide a method for producing a positive electrode active material with low production cost. Alternatively, an object is to provide a manufacturing device capable of manufacturing a positive electrode active material with low production cost. In the method for producing the positive electrode active material, it is preferable that the material to be heated is heated in a fluoride-containing atmosphere, that is, the material to be heated is heated in a state in which the partial pressure of the fluoride gas in a heating furnace is high. Fluorinated gas is supplied into the heating furnace for circulation. The material to be heated is stirred during heating.

The scheme belongs to the technical field of gas analysis and particularly relates to an analysis device for fluorine-containing gas. The device comprises a first passage, a second passage, a third passage and a fourth passage. A normal nitrogen gas inlet pipeline, a first pressure reducing valve, a first pressure gauge, a first valve, a check valve and a Venturi tube are sequentially arranged on the first passage. The inlet of the normal nitrogen gas inlet pipeline, the first pressure reducing valve, the first pressure gauge, the first valve, the check valve and the Venturi tube are connected through pipelines. The second passage comprises a fluorine gas inlet pipeline, a sixth valve, a fourth valve, a second pressure reducing valve, a second pressure gauge, a seventh valve and an analyzer which are sequentially arranged. The scheme is simple and convenient to operate, has high controllability and safety, air in the pipeline is sucked into the injection port of the Venturi tube, and then the air is discharged from the outlet of the Venturi tube, so that the air in the pipeline is efficiently and completely replaced, and the analysis result is more accurate and real.

The quartz wafer chemical polishing annealing method disclosed by the embodiment of the present application comprises the following steps: step 1, placing a quartz wafer to be polished in an annealing furnace, and heating to a first preset temperature under a vacuum environment or under an inert gas; step 2, continuing to heat to a second preset temperature, and filling fluorine-containing gas, and reacting for a first preset time, so that the fluorine-containing gas is pyrolyzed to generate fluorine radicals to perform chemical polishing on the surface of the quartz wafer; step 3, performing purging by using an inert gas, and removing SiF4 and residual fluoride generated in the reaction; and step 4, maintaining an inert gas atmosphere, keeping warm for a second preset time, and then cooling, to complete the chemical polishing annealing on the surface of the quartz wafer. The present application is a full dry process, and the quartz wafer is not contacted with any liquid from the wafer loading to the furnace discharge, so that mechanical damage and secondary pollution of the 3215 wafer are avoided, and surface purification can be completed at the same time of annealing.

A process for treating gases comprising fluorinated compounds is disclosed. The process comprises passing a dilute fluorinated compound gas stream comprising a fluorinated compound to a scrubber to scrub it of reactive gases. A scrubbed gas stream is discharged from the scrubber and fed to an adsorption unit to adsorb one or more fluorinated compounds onto an adsorbent. One or more fluorinated compounds are desorbed from the adsorbent. A concentrated gas stream comprising a higher concentration of the fluorinated compounds than the feed gas stream is discharged from the adsorption unit.

The application discloses a method for preparing MXene and metal fluoride-MXene composite materials in a gas-solid phase reaction. The method comprises the following steps: in a protective atmosphere heating environment, fluorine-containing gas is reacted with a MAX phase material, so that the metal fluoride-MXene composite material is obtained. The metal fluoride-MXene composite material is soaked in lye, and after completion, the obtained solid product is washed and dried, so that the MXene material is obtained. The preparation method of the application realizes rapid and efficient etching of the A element layer in the solid MAX phase by using fluorine-containing gas released by pyrolysis of fluorine-containing organic matter, so that a metal fluoride-MXene nanosheet composite structure is obtained, and waste of the A element is avoided. The novel metal fluoride-MXene and MXene obtained by the non-liquid phase method not only retain the advantages of high reactivity and high conductivity of the two-dimensional MXene, but also exhibit excellent structural stability.

The application discloses a kind of fluorine-containing insulating gas trace decomposition component detection method and system, it is related to trace decomposition component gas detection technical field, obtain fluorine-containing gas sample and multiple training gas data, and all training gas data are preprocessed, generate gas feature set, gas feature set is used to train preset trace decomposition component classification model, generate target trace decomposition component classification model, trace decomposition component detection is carried out to fluorine-containing gas sample by the double-layer sensing device of pre-construction, generate trace decomposition component data, component detection is carried out to trace decomposition component data using target trace decomposition component classification model, obtain the detection data corresponding to fluorine-containing gas sample.The technical problem that the trace decomposition component gas in existing electrical equipment is mainly detected by sensor based on nanomaterial, but the interference of fluorine-containing gas to sensor is ignored, and the trace decomposition component in fluorine-containing gas cannot be accurately detected.

The invention discloses a nitriding technology for a metal surface, and relates to the technical field of metal surface heat treatment processing technologies, and the nitriding technology comprises the following steps: (1) carrying out pre-oxidation treatment on a metal part after sand blasting treatment; (2) carrying out sand blasting treatment on the metal surface; (3) pure water is used for spraying and washing the metal part, and blow-drying treatment is carried out; (4) putting the metal piece into a nitriding furnace and then sealing; (5) heating in a nitriding furnace: uniformly heating to 450 DEG C at the heating efficiency of 10 DEG C / min, and keeping the temperature for 1 hour; (6) simultaneously introducing oxygen and fluoride-containing gas or fluorine-containing gas atmosphere into the nitriding furnace; (7) introducing ammonia gas for nitriding, and meanwhile, continuously and uniformly heating to 520-550 DEG C at the heating efficiency of 10 DEG C / min, and then carrying out heat preservation treatment; (8) high-pressure air is used for spraying and sweeping the metal part; (9) vacuumizing treatment is carried out, and ammonia gas is introduced again after vacuumizing; (10) after nitriding is completed, heating equipment is turned off, and discharging is conducted after cooling to the normal temperature; the nitriding efficiency is high, the white bright layer is thin, and the mold brittleness is low.

A process for the production of a pattern collapse free wet clean for semiconductor devices is provided. By using a post reactive ion etch (RIE) with a fluorine containing gas such as C2F6, followed by a clean in a single wafer clean (SWC) with dilute hydrofluoric acid (HF) or ammonia and HF solution, a substrate with multiple high aspect ratio shallow trench isolation (STI) features free of pattern collapse can be obtained.

Methods for selectively etching Si relative to SiGe are provided. The methods utilize a sulfur-containing additive gas in combination with a nitrogen-containing gas and a fluorine-containing gas under certain controlled operating conditions and process sequences. The methods can occur in a cyclic manner including purging after each etch step, until the desired thickness of the Si layer is obtained.