30 results about "Fluorinated gases" patented technology

The application discloses a device for reducing fluorine-containing gas pollutant emission in electroslag remelting and a use method, which comprises a flue gas recovery cover (1), a flue gas discharge pipeline (7) and a purification tank (10). The flue gas recovery cover (1) is respectively provided with a remelted slag discharging hole (2), a self-consuming mother electrode (6) passing hole and a flue gas discharge pipeline (7) mounting hole. The flue gas discharge pipeline (7) is arranged through the flue gas discharge pipeline (7) mounting hole, one end of the flue gas discharge pipeline (7) is located in a closed space formed by the flue gas recovery cover (1) and a crystallizer (5), and the other end is inserted into the purification tank (10). A fan (8) is arranged on the flue gas discharge pipeline (7). Through the device, the fluorine-containing flue gas is recovered, and the fluorine-containing flue gas is converted into calcium fluoride by using an alkali solution. The device can realize the cyclic and repeated use of part of the calcium fluoride, greatly reduces the concentration of fluorine-containing harmful gas in the air environment of an electroslag remelting operation site, and makes the concentration of the fluorine-containing harmful gas reduce from the original 5.6 mg / m 3 to 0.02 mg / m 3 .

The invention discloses a wet-process phosphoric acid defluorination residue recycling coupling device and a production method, the coupling device is arranged in a wet-process phosphoric acid production system, and the coupling device comprises a spiral mixing reactor (1), a mixing reactor (2) and a fluorine-containing gas washing and recycling device (3) which are sequentially arranged and connected; the production method comprises the following steps: adding concentrated sulfuric acid with the temperature of 80-90 DEG C into the wet-process phosphoric acid defluorination residues and silica fume in a spiral mixing reactor according to the mass ratio of 100: (5-10), reacting for 40-60 minutes, controlling the reaction temperature to be 90-100 DEG C, returning slurry B to a wet-process phosphoric acid production pre-extraction system, and separating and purifying the slurry B to obtain the wet-process phosphoric acid defluorination residues. Fluorine-containing gases SiF and HF generated by the mixing reaction are sent to a fluorine-containing gas washing and recycling device through a waste gas main pipe to be washed to obtain a 8-15% fluosilicic acid solution. The coupling device is coupled with an existing wet-process phosphoric acid production system, a large number of newly-added equipment and procedures are reduced, the whole process is free of three-waste emission, the method is simple in process, the fluorine recovery rate is larger than or equal to 83%, meanwhile, phosphorus is efficiently recovered, and pollution of fluorine resources to the environment is reduced.

An etching method includes: a) preparing, within a chamber, a substrate including a mask film containing ruthenium and having a predetermined pattern formed in the mask film, and a silicon-containing film provided under the mask film; b) supplying a process gas including a hydrocarbon-containing gas and a fluorine-containing gas into the chamber; and c) etching the silicon-containing film through the mask film using plasma generated from the process gas supplied into the chamber.

The invention provides a method and apparatus for efficiently and accurately filling vials with gaseous materials such as a fluorinated gas, with or without concomitantly filling the vials with another liquid or solid material. Also provided is a filling system for simultaneously filling a vial with a gaseous material and a liquid material using the apparatus.

The application relates to a preparation method of a fluorine oxide solid electrolyte and the fluorine oxide solid electrolyte. The preparation method comprises the following steps: grinding a lithium source material, a lanthanum source material, a material containing a doped element, a pore-forming agent and a solvent in a grinding machine to obtain a mixed slurry; performing spray granulation on the mixed slurry to obtain initial microparticles; placing the initial microparticles in a boiling bed reactor, performing sintering under an air atmosphere to remove the pore-forming agent and residual solvent, obtaining porous microparticles, switching the atmosphere to a fluorine-containing gas to perform sintering again, making the fluorine-containing active body decomposed from the fluorine-containing gas react with the porous microparticles, naturally cooling to room temperature under an inert gas atmosphere, obtaining a fluorine oxide solid electrolyte block, and performing crushing treatment to obtain the fluorine oxide solid electrolyte. The fluorine oxide solid electrolyte prepared by the preparation method has the characteristics of high compactness and high ionic conductivity, can be widely applied in lithium batteries, and is especially applied in full solid-state lithium batteries.

The invention discloses a treatment system and process for fluorine-containing gas. The treatment system comprises a reaction unit, the reaction unit comprises at least two reactors which are connected in series to provide a space for catalytic decomposition and chemical adsorption of fluorine-containing organic matters, and the multiple reactors are vertically arranged; the gas inlet unit is used for selectively conveying fluorine-containing gas and hydrogen chloride to the reactor; the discharging unit is used for receiving the metal fluoride discharged from the reactor at the lowermost end; the feeding unit is used for conveying a catalyst to the reactor at the uppermost end; and the tail gas treatment unit is used for receiving gas discharged from the reactor. According to the technical scheme, the requirement that the catalyst is frequently replaced during continuous reaction is met, and on the basis that fluorine-containing organic matter in gas is removed through catalytic decomposition, chemical adsorption is further carried out, and a fluoride salt product with a high additional value is formed.

This invention relates to the field of industrial process management and optimization scheduling technology, and particularly to a method for tracking and optimizing carbon emission flows in a multi-product co-production process in the fluorochemical industry. First, a directed graph model of the product chain with process units as vertices is constructed. A multi-dimensional carbon emission flow calculation model is established, including direct carbon flows from fuel combustion, indirect carbon flows from purchased electricity and heat, direct carbon flows from the process itself, and carbon flows from the emission of fluorinated greenhouse gases. A dynamic evolution algorithm for node carbon potential and an iterative algorithm for reverse tracing of branch carbon flows are employed to achieve accurate tracking of spatiotemporally coupled carbon flows throughout the entire process. Using the time-varying carbon intensity coefficient as the core parameter, a dual-objective optimization scheduling model is established to minimize both total system carbon emissions and overall operating costs. An adaptive penalty mechanism with carbon constraints is introduced to solve for the optimal scheduling scheme, constructing a rolling optimization closed-loop control link for the production process. This invention effectively solves the problems of calculating carbon flows from the emission of fluorinated gases and allocating carbon flows among multiple products in the fluorochemical industry, achieving a synergistic improvement in carbon emission reduction and economic benefits.

The quartz wafer chemical polishing annealing method disclosed by the embodiment of the present application comprises the following steps: step 1, placing a quartz wafer to be polished in an annealing furnace, and heating to a first preset temperature under a vacuum environment or under an inert gas; step 2, continuing to heat to a second preset temperature, and filling fluorine-containing gas, and reacting for a first preset time, so that the fluorine-containing gas is pyrolyzed to generate fluorine radicals to perform chemical polishing on the surface of the quartz wafer; step 3, performing purging by using an inert gas, and removing SiF4 and residual fluoride generated in the reaction; and step 4, maintaining an inert gas atmosphere, keeping warm for a second preset time, and then cooling, to complete the chemical polishing annealing on the surface of the quartz wafer. The present application is a full dry process, and the quartz wafer is not contacted with any liquid from the wafer loading to the furnace discharge, so that mechanical damage and secondary pollution of the 3215 wafer are avoided, and surface purification can be completed at the same time of annealing.

A process for treating gases comprising fluorinated compounds is disclosed. The process comprises passing a dilute fluorinated compound gas stream comprising a fluorinated compound to a scrubber to scrub it of reactive gases. A scrubbed gas stream is discharged from the scrubber and fed to an adsorption unit to adsorb one or more fluorinated compounds onto an adsorbent. One or more fluorinated compounds are desorbed from the adsorbent. A concentrated gas stream comprising a higher concentration of the fluorinated compounds than the feed gas stream is discharged from the adsorption unit.

The application discloses a kind of fluorine-containing insulating gas trace decomposition component detection method and system, it is related to trace decomposition component gas detection technical field, obtain fluorine-containing gas sample and multiple training gas data, and all training gas data are preprocessed, generate gas feature set, gas feature set is used to train preset trace decomposition component classification model, generate target trace decomposition component classification model, trace decomposition component detection is carried out to fluorine-containing gas sample by the double-layer sensing device of pre-construction, generate trace decomposition component data, component detection is carried out to trace decomposition component data using target trace decomposition component classification model, obtain the detection data corresponding to fluorine-containing gas sample.The technical problem that the trace decomposition component gas in existing electrical equipment is mainly detected by sensor based on nanomaterial, but the interference of fluorine-containing gas to sensor is ignored, and the trace decomposition component in fluorine-containing gas cannot be accurately detected.

A process for the production of a pattern collapse free wet clean for semiconductor devices is provided. By using a post reactive ion etch (RIE) with a fluorine containing gas such as C2F6, followed by a clean in a single wafer clean (SWC) with dilute hydrofluoric acid (HF) or ammonia and HF solution, a substrate with multiple high aspect ratio shallow trench isolation (STI) features free of pattern collapse can be obtained.

Methods for selectively etching Si relative to SiGe are provided. The methods utilize a sulfur-containing additive gas in combination with a nitrogen-containing gas and a fluorine-containing gas under certain controlled operating conditions and process sequences. The methods can occur in a cyclic manner including purging after each etch step, until the desired thickness of the Si layer is obtained.

The invention discloses a difunctional carbon material for perfluorinated compounds and a preparation method and application thereof, and belongs to the technical field of environmental multi-medium pollutants. The preparation method of the difunctional carbon material comprises the following steps: mixing a carbon-based material with basic salt, introducing inert gas, carrying out high-temperature activation treatment, washing, and drying to obtain the difunctional carbon material, the carbon-based material is at least one of activated carbon, biochar and carbon nanotubes. The difunctional carbon material prepared by the invention can efficiently adsorb perfluorinated compounds at room temperature, mineralize and degrade the perfluorinated compounds at low temperature, and block environmental recycling; meanwhile, the difunctional carbon material is good in stability, can be recycled, can achieve the defluorination rate of 80% or above with low energy consumption in pyrolysis so as to inhibit toxic fluorine-containing gas from escaping, and has the characteristics of being low in cost, simple to operate, environment-friendly, easy to industrialize and the like.

The application discloses a greenhouse gas analysis system and an analysis method thereof, which comprises a sample inlet system, a chromatographic column separation system and a detection system. The chromatographic column separation system comprises a first chromatographic column, a second chromatographic column, a third chromatographic column and a fourth chromatographic column. The detection system comprises a hydrogen flame ion detector, a thermal conductivity detector and an electron capture detector. The first chromatographic column, the second chromatographic column and the third chromatographic column are connected in parallel, the third chromatographic column and the fourth chromatographic column are connected in series, the first chromatographic column is connected with the hydrogen flame ion detector, the second chromatographic column is connected with the electron capture detector, and the fourth chromatographic column is connected with the thermal conductivity detector. The application realizes the detection and analysis of methane, carbon dioxide, nitrous oxide and fluorine-containing gases such as sulfur hexafluoride by using different principles of different detectors. Finally, the chromatographic signal response is completed through a signal output system, and sample detection and analysis are realized through data analysis and calculation, so that accurate and reliable value traceability is provided for the monitoring of the concentration change characteristics of atmospheric environment greenhouse gases.

The invention discloses a treatment system and process for fluorine-containing gas. The treatment system comprises: a reaction unit comprising at least two reactors connected in series to provide a space for catalytic decomposition and chemical adsorption of fluorine-containing organic matters; the gas inlet unit is used for selectively conveying fluorine-containing gas and hydrogen chloride to the plurality of reactors; the discharging unit is used for selectively receiving the metal fluoride discharged from the plurality of reactors; the feeding unit is used for selectively conveying a catalyst into the plurality of reactors; and the tail gas treatment unit is used for selectively receiving gas discharged from the plurality of reactors. According to the technical scheme, the requirement that the catalyst is frequently replaced during continuous reaction is met, and on the basis that fluorine-containing organic matter in gas is removed through catalytic decomposition, chemical adsorption is further carried out, and a fluoride salt product with a high additional value is formed.

The invention discloses a method and a device for separating fluorinated gas based on an ionic liquid extraction agent and double-parallel evaporator organic Rankine cycle coupling process. Through screening of the ionic liquid extraction agent, efficient separation of the fluorinated gas mixture is achieved, and the purity of the product can reach 99.5% or above; the organic Rankine cycle system with the double parallel evaporators is used for recovering waste heat, the heat efficiency of waste heat recovery can reach 23% or above, the total energy consumption of the system and the using amount of the extracting agent are obviously reduced, the purity is obviously improved compared with a traditional process, and an efficient and environment-friendly technical scheme is provided for recycling and reusing of the hydrofluorocarbon / hydrofluoroolefin mixed refrigerant. The application prospect is good.

The invention provides a method for preparing indium trifluoride in a continuous gas phase, which comprises the following steps of: performing atomization, sublimation or fluidization pretreatment on an indium source in an inert carrier gas atmosphere to form a gaseous or superfine particle indium source material flow; continuously introducing the indium source material flow and fluorine-containing gas into a continuous reactor with a function of mechanically updating a reaction interface, and carrying out gas-phase fluorination reaction at the reaction temperature of 500-900 DEG C to generate a gas-solid mixture containing indium trifluoride solid and tail gas; wherein the feeding molar ratio of an indium element in the indium source to a fluorine element in the fluorine-containing gas is 1: (3.0-6.5); and performing continuous gas-solid separation on the gas-solid mixture obtained in the step S2. Through specific reactor selection and process parameter coupling, the preparation difficulties that the efficiency is low, the energy consumption is high, the product consistency is poor and the metal indium is easy to sinter and coat when the indium trifluoride is prepared by an existing intermittent method are overcome, the safe and continuous production of the indium trifluoride is realized, and the product purity reaches the electronic grade standard.

The invention relates to a preparation method of high-purity calcium fluoride. The preparation method comprises the following steps: 1) heat treatment: carrying out first-stage heat treatment on a calcium fluoride raw material under inert gas protection or a vacuum environment; 2) deep deoxidation: introducing fluorine-containing gas into the calcium fluoride material obtained in the step 1) to carry out a second-stage thermal reaction; and 3) cooling and post-processing: stopping heating after the reaction is finished, and cooling the material to room temperature under the protection of inert gas atmosphere to obtain the product. According to the method, the strong oxidizing property of the fluorine-containing gas and the synergistic effect under high temperature and high pressure are utilized, oxygen impurities in calcium fluoride can be deeply removed, the oxygen content of the finally obtained high-purity calcium fluoride product is reduced to 18 ppm or below from about 356 ppm, and the requirement of the high-end optical field can be completely met.

This application relates to a process for preparing fluorinated liquids, specifically a method and apparatus for preparing perfluorohexane. The method involves first reacting hexafluoropropylene with a fluorine-containing gas to obtain crude perfluorohexane; then subjecting the crude perfluorohexane to primary and secondary alkaline washing, followed by water removal; and finally, primary and secondary condensation. The primary condensation yields the product perfluorohexane, while the secondary condensation recovers hexafluoropropylene for recycling. The apparatus comprises a reaction tower, a buffer tank, a primary alkaline washing tower, a secondary alkaline washing tower, a drying tower, a first cold trap, and a second cold trap, connected in sequence. This application features a simple production process, high hexafluoropropylene conversion rate, high product purity, and low overall cost, demonstrating good economic benefits and application prospects.

A method of chemically etching an underlying material includes selectively modifying the underlying material (e.g., a silicon-containing material, like silicon carbide) using lightweight ions (e.g., hydrogen ions, helium ions, etc.) to form a modified region of the underlying material and chemically etching the modified region using a halogen-containing etchant gas (e.g., a fluorine-containing gas, like sulfur hexafluoride). The underlying material is exposed through openings in a resist layer, which may contain carbon and / or a metal, such as a chemically amplified resist or a metal oxide resist. The selective modification step may implant the lightweight ions into the underlying material. Plasma may be used during one or both of the selective modification step and the chemical etching step. Bias power may be applied during the selective modification step and may be higher than bias power applied during the chemical etching step, which may be zero.

A method comprises a step of placing a catalytic material in a first area on a first surface of an object to be processed, in which: the first surface is made of an element of which a boiling point of a fluoride is 550° C. or lower; the catalytic material contains an organic compound containing a polar functional group, and the catalytic material includes, in a cross-sectional view, a first side surface having a first height H1 and a second side surface having a second height H2, the first and second side surfaces being opposed to each other, in which H1>H2>0 μm; a step of irradiating the catalytic material with irradiation light containing deep ultraviolet light having a wavelength of 380 nm or shorter; and a step of exposing the object to be processed to a fluorine-containing gas at 80° C. or higher.

A process for treating gases comprising fluorinated compounds is disclosed. The process comprises passing a dilute fluorinated compound gas stream comprising a fluorinated compound to a scrubber to scrub it of reactive gases. A scrubbed gas stream is discharged from the scrubber and fed to an adsorption unit to adsorb one or more fluorinated compounds onto an adsorbent. One or more fluorinated compounds are desorbed from the adsorbent. A concentrated gas stream comprising a higher concentration of the fluorinated compounds than the feed gas stream is discharged from the adsorption unit.

The invention relates to a device for removing hydrogen fluoride in an electroslag remelting process and a use method of the device. The device comprises a flue gas recovery cover, a crystallizer, a consumable mother electrode, a flue gas discharge pipeline, a purification reaction tank and limestone particle powder, the flue gas recovery cover is buckled at the top of the crystallizer, and a blanking hole is formed in one side of the flue gas recovery cover; the bottom of the consumable mother electrode is inserted into high-temperature liquid slag in the crystallizer from the center of the top of the flue gas recovery cover; a flue gas discharge pipeline is arranged on one side of the top of the flue gas recovery cover; the outer end of the flue gas discharge pipeline is connected to the bottom of the purification reaction tank; and the limestone particle powder is arranged in the purification reaction tank. According to the invention, the fluorine-containing gas can be recovered in a chemical reaction manner, and the content of the fluorine-containing gas in the field environment is reduced from 3.0-5.0 mg / m < 3 > to 0.02 mg / m < 3 > or less, so that the requirement on the concentration of the fluorine-containing gas in the atmosphere specified in the national standard is met, and the production operation environment is effectively protected.

In order to satisfactorily etch a SiOCN film, the present invention provides a method for etching a SiOCN film formed on a substrate, wherein the SiOCN film is etched through exposure to plasma generated from an etching gas containing an oxygen-containing gas, hydrogen gas, and a fluorine-containing gas that does not contain N.

The invention relates to a method for directly bonding a first microelectronic device (100) on a second microelectronic device (200) comprising a provision of a first device having a first flat surface (110), and of a second device having a second flat surface (210), a treatment of at least first and second surfaces with a plasma gas comprising at least one first fluorinated gas, having an atomic percentage F of fluorine, a transfer of the first and second devices to a piece of bonding equipment, an immersion of the first and second surfaces in a bonding atmosphere (1) and a bonding of the first and second surfaces under the bonding atmosphere. The atomic percentage F of fluorine and the relative humidity RH are synergistically controlled, such that a bonding speed Vc is less than or equal to 15 mm / s and more specifically, less than 10 mm / s.

The etching method disclosed in this application includes a step (a) in which a substrate is prepared in a chamber of a plasma processing apparatus. The substrate includes a silicon-containing film. The etching method further includes a step (b) in which the silicon-containing film is etched by chemical species from the plasma formed from a process gas in the chamber. The process gas includes a phosphorus-containing gas, a fluorine-containing gas, and a hydrogen-containing gas. The hydrogen-containing gas contains at least one selected from the group consisting of hydrogen fluoride, H2, ammonia, and hydrocarbons.

The present application belongs to the technical field of chemical substance extraction, and particularly relates to a method for preparing lanthanum-samarium alloy from molten salt electrolysis lanthanum-samarium slag, which comprises: selecting a graphite electrolytic cell, taking inert metal tungsten as a cathode, taking graphite as an anode, taking LaF3-SmF3-LiF as a molten salt electrolyte system, adding completely oxidized lanthanum-samarium slag into the electrolyte system, and co-depositing lanthanum-samarium alloy at the cathode. The method for preparing lanthanum-samarium alloy from molten salt electrolysis lanthanum-samarium slag has simple whole production process, low requirement for equipment, large lanthanum-samarium slag treatment capacity, continuous and stable production, only produces carbon dioxide, carbon monoxide and a small amount of fluorine-containing gas in the electrolysis process, has small environmental pollution, simultaneously reduces the production cost of metallic samarium, and improves the economic benefit of enterprises.

The application belongs to the technical field of functional polymer materials, and discloses a fluorinated microporous organic polymer with high specific surface area and a preparation method thereof. The fluorinated microporous organic polymer is prepared by a Friedel-Crafts reaction of a double-end or triple-end trifluoroacetyl-containing monomer and a phenyl-substituted benzene monomer in the presence of an acid catalyst; and the trifluoroacetyl-containing monomer is obtained by reacting a bromine-containing raw material with n-butyllithium and methyl trifluoroacetate at low temperature. The raw material and the catalyst used in the application are cheap and easy to obtain, the polymerization process is simple and safe, no noble metal catalyst is needed, and the post-treatment operation is simple. The fluorinated microporous organic polymer prepared has a large specific surface area, and can be widely applied in the fields of CO2 and volatile organic gas, especially fluorine-containing gas, capture, heterogeneous catalysis, heavy metal ion and toxic dye enrichment and recovery.

There is an etching method for etching a carbon-containing silicon oxide film formed on a substrate by exposing the carbon-containing silicon oxide film to plasma generated from an etching gas containing a fluorine-containing gas, an oxygen-containing gas, and a hydrogen gas.

The invention discloses a treatment method of fluorine-containing waste gas, which comprises the following steps: introducing fluorine-containing waste gas containing fluorine-containing gas into an adsorber filled with a modified activated carbon adsorbent at an air speed of 50-5000h <-1 >, the pressure of the adsorber is 0.05-0.5 MPa, the temperature of an adsorbent bed layer is 10-120 DEG C, the fluorine-containing gas comprises hexafluoroethane, and the fluorine-containing gas comprises hexafluoroethane. Nanometer zero-valent metal and a hydrophobic material are loaded on the surface of the modified activated carbon adsorbent, and the nanometer zero-valent metal is selected from at least one of Fe, Co and Mn. The treatment method disclosed by the invention is simple in process and low in investment cost, the fluorine-containing gas in the fluorine-containing waste gas can be efficiently enriched, and greenhouse gas emission is reduced.