57 results about "Fluorinated gases" patented technology

The application discloses a device for reducing fluorine-containing gas pollutant emission in electroslag remelting and a use method, which comprises a flue gas recovery cover (1), a flue gas discharge pipeline (7) and a purification tank (10). The flue gas recovery cover (1) is respectively provided with a remelted slag discharging hole (2), a self-consuming mother electrode (6) passing hole and a flue gas discharge pipeline (7) mounting hole. The flue gas discharge pipeline (7) is arranged through the flue gas discharge pipeline (7) mounting hole, one end of the flue gas discharge pipeline (7) is located in a closed space formed by the flue gas recovery cover (1) and a crystallizer (5), and the other end is inserted into the purification tank (10). A fan (8) is arranged on the flue gas discharge pipeline (7). Through the device, the fluorine-containing flue gas is recovered, and the fluorine-containing flue gas is converted into calcium fluoride by using an alkali solution. The device can realize the cyclic and repeated use of part of the calcium fluoride, greatly reduces the concentration of fluorine-containing harmful gas in the air environment of an electroslag remelting operation site, and makes the concentration of the fluorine-containing harmful gas reduce from the original 5.6 mg / m 3 to 0.02 mg / m 3 .

The invention discloses a triphenyl phosphate standard substance structure identification method, and relates to the technical field of fluorine-containing gas emission reduction, and the method comprises the following steps: obtaining a standardized analysis sample through fluorine-containing matrix separation, target substance enrichment and solvation treatment; a multi-dimensional chromatographic system and a heart cutting technology are adopted, and temperature programming optimization is combined to realize separation and purification of a sample; carrying out multi-dimensional structure analysis and confirmation by using gas chromatography-mass spectrometry, infrared spectroscopy and nuclear magnetic resonance technologies; a five-stage progressive identification algorithm is constructed, and systematic identification is realized by combining a confidence evaluation system and a fluorine-containing interference correction technology; establishing a structural integrity verification and purity quantitative evaluation standard, and outputting a standardized identification report; a method applicability database is established through multi-type fluorine-containing environment verification and process condition adaptability testing. The method effectively solves the problem of accurate identification of triphenyl phosphate in a complex fluorine-containing matrix, and realizes effective removal of interference components such as light gas, hydrofluorocarbon, perfluorinated compounds and the like.

To provide a method for manufacturing a component that allows for the formation of recessed structures more quickly. [Solution] A method for manufacturing a member having a recessed structure, comprising: a first step of preparing a workpiece containing silicon; and a second step of forming a catalyst material on a part of the surface of the workpiece. The method comprises a third step of exposing the workpiece to a mixed gas of a fluorine-containing gas and an oxidizing gas in an environment of 250°C or higher, thereby forming a recessed structure in the portion of the workpiece where the catalyst material is formed.

The invention discloses a wet-process phosphoric acid defluorination residue recycling coupling device and a production method, the coupling device is arranged in a wet-process phosphoric acid production system, and the coupling device comprises a spiral mixing reactor (1), a mixing reactor (2) and a fluorine-containing gas washing and recycling device (3) which are sequentially arranged and connected; the production method comprises the following steps: adding concentrated sulfuric acid with the temperature of 80-90 DEG C into the wet-process phosphoric acid defluorination residues and silica fume in a spiral mixing reactor according to the mass ratio of 100: (5-10), reacting for 40-60 minutes, controlling the reaction temperature to be 90-100 DEG C, returning slurry B to a wet-process phosphoric acid production pre-extraction system, and separating and purifying the slurry B to obtain the wet-process phosphoric acid defluorination residues. Fluorine-containing gases SiF and HF generated by the mixing reaction are sent to a fluorine-containing gas washing and recycling device through a waste gas main pipe to be washed to obtain a 8-15% fluosilicic acid solution. The coupling device is coupled with an existing wet-process phosphoric acid production system, a large number of newly-added equipment and procedures are reduced, the whole process is free of three-waste emission, the method is simple in process, the fluorine recovery rate is larger than or equal to 83%, meanwhile, phosphorus is efficiently recovered, and pollution of fluorine resources to the environment is reduced.

The invention relates to the technical field of equipment control, in particular to a rare earth electrolysis feeding control method and system based on the fluorine ion quantity, and the method mainly comprises the steps that the fluorine gas concentration in the electrolysis process in the current collection period is obtained, and the current fluorine ion detection concentration is obtained through the fluorine gas concentration; and constructing a PID control model, and outputting a control signal for the feeding equipment according to the PID control model based on the fluorine ion concentration. According to the scheme, the fluorine ion or fluorine-containing gas emission amount is collected, the fluorine-containing gas or fluorine ion emission amount is relatively stable during normal electrolysis, and once material shortage and fluorine-containing gas or fluorine ion emission data are abnormal and obvious, abnormal electrolysis can be judged in time, response can be made in time (the starting point is different from that of the disclosed feeding control technology), and the feeding control accuracy is improved. And data are fed back in time and output of the charging machine is controlled. According to the method, whether material shortage exists in current electrolysis or not is judged, the feeding amount is accurately controlled through fluorine data, furnace caking caused by excessive material feeding due to the fact that materials exist in a furnace is avoided, and rare earth fluoride can be prevented from participating in electrolysis due to material shortage in the furnace.

An etching method includes: a) preparing, within a chamber, a substrate including a mask film containing ruthenium and having a predetermined pattern formed in the mask film, and a silicon-containing film provided under the mask film; b) supplying a process gas including a hydrocarbon-containing gas and a fluorine-containing gas into the chamber; and c) etching the silicon-containing film through the mask film using plasma generated from the process gas supplied into the chamber.

The invention provides a method and apparatus for efficiently and accurately filling vials with gaseous materials such as a fluorinated gas, with or without concomitantly filling the vials with another liquid or solid material. Also provided is a filling system for simultaneously filling a vial with a gaseous material and a liquid material using the apparatus.

The application relates to a preparation method of a fluorine oxide solid electrolyte and the fluorine oxide solid electrolyte. The preparation method comprises the following steps: grinding a lithium source material, a lanthanum source material, a material containing a doped element, a pore-forming agent and a solvent in a grinding machine to obtain a mixed slurry; performing spray granulation on the mixed slurry to obtain initial microparticles; placing the initial microparticles in a boiling bed reactor, performing sintering under an air atmosphere to remove the pore-forming agent and residual solvent, obtaining porous microparticles, switching the atmosphere to a fluorine-containing gas to perform sintering again, making the fluorine-containing active body decomposed from the fluorine-containing gas react with the porous microparticles, naturally cooling to room temperature under an inert gas atmosphere, obtaining a fluorine oxide solid electrolyte block, and performing crushing treatment to obtain the fluorine oxide solid electrolyte. The fluorine oxide solid electrolyte prepared by the preparation method has the characteristics of high compactness and high ionic conductivity, can be widely applied in lithium batteries, and is especially applied in full solid-state lithium batteries.

The invention relates to a preparation method of an oxyfluoride solid electrolyte and the oxyfluoride solid electrolyte. The preparation method comprises the following steps: putting a lithium source material, a lanthanum source material, a doped element-containing material, a pore-forming agent and a solvent into a grinding machine for grinding treatment to obtain mixed slurry; carrying out spray granulation on the mixed slurry to obtain initial particles; placing the initial particles in a fluidized bed reactor, sintering in an air atmosphere to remove the pore-forming agent and the residual solvent so as to obtain porous particles, switching the atmosphere into fluorine-containing gas, then sintering, enabling a fluorine-containing active body decomposed by the fluorine-containing gas to react with the porous particles, and naturally cooling to room temperature in an inert gas atmosphere, thereby obtaining the porous particles. And crushing the oxyfluoride solid electrolyte block to obtain the oxyfluoride solid electrolyte. The oxyfluoride solid electrolyte prepared by the preparation method provided by the invention has the characteristics of high density and high ionic conductivity, and can be widely applied to lithium batteries, especially all-solid-state lithium batteries.

A method for etching a titanium-containing layer on a workpiece is provided. In one example, the method includes placing the workpiece on a workpiece support in a processing chamber. The workpiece includes a first layer and a second layer. The first layer is a titanium-containing layer. The method includes introducing a process gas into the processing chamber. The process gas includes an ozone gas and a fluorine-containing gas. The method includes exposing the first layer and the second layer on the workpiece to the process gas to at least partially etch the first layer at a greater etch rate relative to the second layer.

The invention discloses a treatment system and process for fluorine-containing gas. The treatment system comprises a reaction unit, the reaction unit comprises at least two reactors which are connected in series to provide a space for catalytic decomposition and chemical adsorption of fluorine-containing organic matters, and the multiple reactors are vertically arranged; the gas inlet unit is used for selectively conveying fluorine-containing gas and hydrogen chloride to the reactor; the discharging unit is used for receiving the metal fluoride discharged from the reactor at the lowermost end; the feeding unit is used for conveying a catalyst to the reactor at the uppermost end; and the tail gas treatment unit is used for receiving gas discharged from the reactor. According to the technical scheme, the requirement that the catalyst is frequently replaced during continuous reaction is met, and on the basis that fluorine-containing organic matter in gas is removed through catalytic decomposition, chemical adsorption is further carried out, and a fluoride salt product with a high additional value is formed.

There is provided a gas treatment apparatus for performing gas treatment on a substrate. The gas treatment apparatus includes: a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing gas and an alkaline gas; and a gas introduction member configured to cause the fluorine-containing gas and the alkaline gas supplied from the gas supply mechanism to merge with each other and introduce a mixed gas in which the fluorine-containing gas and the alkaline gas are mixed into the chamber. A portion of the gas introduction member including a merging point of the fluorine-containing gas and the alkaline gas is made of an aluminum-based material. A resin coating is formed on at least the portion including the merging point.

To provide a manufacturing method that enables the precise and rapid production of a component having a recessed structure that closely resembles a vertical structure. [Solution] A manufacturing method according to one embodiment of the present invention is a method for manufacturing a member having a recessed structure, comprising: a first step of preparing a workpiece containing an element whose fluoride boiling point is 550°C or lower; a second step of forming a catalyst material on a part of the surface of the workpiece; and a third step of exposing the workpiece to an etching gas in an environment of 80°C or higher to form a recessed structure on the portion of the workpiece where the catalyst material has been formed, wherein the etching gas includes a fluorine-containing gas and an acidic gas, and the acidic gas has a lower acid dissociation constant than hydrogen fluoride.

This invention relates to the field of industrial process management and optimization scheduling technology, and particularly to a method for tracking and optimizing carbon emission flows in a multi-product co-production process in the fluorochemical industry. First, a directed graph model of the product chain with process units as vertices is constructed. A multi-dimensional carbon emission flow calculation model is established, including direct carbon flows from fuel combustion, indirect carbon flows from purchased electricity and heat, direct carbon flows from the process itself, and carbon flows from the emission of fluorinated greenhouse gases. A dynamic evolution algorithm for node carbon potential and an iterative algorithm for reverse tracing of branch carbon flows are employed to achieve accurate tracking of spatiotemporally coupled carbon flows throughout the entire process. Using the time-varying carbon intensity coefficient as the core parameter, a dual-objective optimization scheduling model is established to minimize both total system carbon emissions and overall operating costs. An adaptive penalty mechanism with carbon constraints is introduced to solve for the optimal scheduling scheme, constructing a rolling optimization closed-loop control link for the production process. This invention effectively solves the problems of calculating carbon flows from the emission of fluorinated gases and allocating carbon flows among multiple products in the fluorochemical industry, achieving a synergistic improvement in carbon emission reduction and economic benefits.

A method for selective plasma etching of silicon oxide relative to silicon nitride is described. The method includes providing a substrate containing a silicon oxide film and a silicon nitride film, and selectively etching the silicon oxide film relative to the silicon nitride film by: a1) exposing the substrate to a plasma-excited passivation gas containing carbon, sulfur, or both carbon and sulfur, wherein the plasma-excited passivation gas is free of fluorine or hydrogen, and b1) exposing the substrate to a plasma-excited etching gas containing a fluorine-containing gas. The method can further include an additional step a2) between a1) and b1): exposing the substrate to a plasma-excited additional passivation gas containing a fluorocarbon gas, a hydrofluorocarbon gas, a hydrochlorocarbon gas, a hydrochlorofluorocarbon gas, or a hydrocarbon gas or a combination thereof.

The scheme belongs to the technical field of gas analysis and particularly relates to an analysis device for fluorine-containing gas. The device comprises a first passage, a second passage, a third passage and a fourth passage. A normal nitrogen gas inlet pipeline, a first pressure reducing valve, a first pressure gauge, a first valve, a check valve and a Venturi tube are sequentially arranged on the first passage. The inlet of the normal nitrogen gas inlet pipeline, the first pressure reducing valve, the first pressure gauge, the first valve, the check valve and the Venturi tube are connected through pipelines. The second passage comprises a fluorine gas inlet pipeline, a sixth valve, a fourth valve, a second pressure reducing valve, a second pressure gauge, a seventh valve and an analyzer which are sequentially arranged. The scheme is simple and convenient to operate, has high controllability and safety, air in the pipeline is sucked into the injection port of the Venturi tube, and then the air is discharged from the outlet of the Venturi tube, so that the air in the pipeline is efficiently and completely replaced, and the analysis result is more accurate and real.

The quartz wafer chemical polishing annealing method disclosed by the embodiment of the present application comprises the following steps: step 1, placing a quartz wafer to be polished in an annealing furnace, and heating to a first preset temperature under a vacuum environment or under an inert gas; step 2, continuing to heat to a second preset temperature, and filling fluorine-containing gas, and reacting for a first preset time, so that the fluorine-containing gas is pyrolyzed to generate fluorine radicals to perform chemical polishing on the surface of the quartz wafer; step 3, performing purging by using an inert gas, and removing SiF4 and residual fluoride generated in the reaction; and step 4, maintaining an inert gas atmosphere, keeping warm for a second preset time, and then cooling, to complete the chemical polishing annealing on the surface of the quartz wafer. The present application is a full dry process, and the quartz wafer is not contacted with any liquid from the wafer loading to the furnace discharge, so that mechanical damage and secondary pollution of the 3215 wafer are avoided, and surface purification can be completed at the same time of annealing.

A process for treating gases comprising fluorinated compounds is disclosed. The process comprises passing a dilute fluorinated compound gas stream comprising a fluorinated compound to a scrubber to scrub it of reactive gases. A scrubbed gas stream is discharged from the scrubber and fed to an adsorption unit to adsorb one or more fluorinated compounds onto an adsorbent. One or more fluorinated compounds are desorbed from the adsorbent. A concentrated gas stream comprising a higher concentration of the fluorinated compounds than the feed gas stream is discharged from the adsorption unit.

The application discloses a method for preparing MXene and metal fluoride-MXene composite materials in a gas-solid phase reaction. The method comprises the following steps: in a protective atmosphere heating environment, fluorine-containing gas is reacted with a MAX phase material, so that the metal fluoride-MXene composite material is obtained. The metal fluoride-MXene composite material is soaked in lye, and after completion, the obtained solid product is washed and dried, so that the MXene material is obtained. The preparation method of the application realizes rapid and efficient etching of the A element layer in the solid MAX phase by using fluorine-containing gas released by pyrolysis of fluorine-containing organic matter, so that a metal fluoride-MXene nanosheet composite structure is obtained, and waste of the A element is avoided. The novel metal fluoride-MXene and MXene obtained by the non-liquid phase method not only retain the advantages of high reactivity and high conductivity of the two-dimensional MXene, but also exhibit excellent structural stability.

The application discloses a kind of fluorine-containing insulating gas trace decomposition component detection method and system, it is related to trace decomposition component gas detection technical field, obtain fluorine-containing gas sample and multiple training gas data, and all training gas data are preprocessed, generate gas feature set, gas feature set is used to train preset trace decomposition component classification model, generate target trace decomposition component classification model, trace decomposition component detection is carried out to fluorine-containing gas sample by the double-layer sensing device of pre-construction, generate trace decomposition component data, component detection is carried out to trace decomposition component data using target trace decomposition component classification model, obtain the detection data corresponding to fluorine-containing gas sample.The technical problem that the trace decomposition component gas in existing electrical equipment is mainly detected by sensor based on nanomaterial, but the interference of fluorine-containing gas to sensor is ignored, and the trace decomposition component in fluorine-containing gas cannot be accurately detected.

A process for the production of a pattern collapse free wet clean for semiconductor devices is provided. By using a post reactive ion etch (RIE) with a fluorine containing gas such as C2F6, followed by a clean in a single wafer clean (SWC) with dilute hydrofluoric acid (HF) or ammonia and HF solution, a substrate with multiple high aspect ratio shallow trench isolation (STI) features free of pattern collapse can be obtained.

Methods for selectively etching Si relative to SiGe are provided. The methods utilize a sulfur-containing additive gas in combination with a nitrogen-containing gas and a fluorine-containing gas under certain controlled operating conditions and process sequences. The methods can occur in a cyclic manner including purging after each etch step, until the desired thickness of the Si layer is obtained.

The invention discloses a difunctional carbon material for perfluorinated compounds and a preparation method and application thereof, and belongs to the technical field of environmental multi-medium pollutants. The preparation method of the difunctional carbon material comprises the following steps: mixing a carbon-based material with basic salt, introducing inert gas, carrying out high-temperature activation treatment, washing, and drying to obtain the difunctional carbon material, the carbon-based material is at least one of activated carbon, biochar and carbon nanotubes. The difunctional carbon material prepared by the invention can efficiently adsorb perfluorinated compounds at room temperature, mineralize and degrade the perfluorinated compounds at low temperature, and block environmental recycling; meanwhile, the difunctional carbon material is good in stability, can be recycled, can achieve the defluorination rate of 80% or above with low energy consumption in pyrolysis so as to inhibit toxic fluorine-containing gas from escaping, and has the characteristics of being low in cost, simple to operate, environment-friendly, easy to industrialize and the like.

A method for removing fluorine gas from a fluorine-containing gas containing fluorine gas and a fluorine-containing compound gas is provided. A method for removing fluorine gas from a fluorine-containing gas containing fluorine gas and a fluorine-containing compound gas includes a removal step in which the fluorine-containing gas is brought into contact with at least one metal salt selected from the group consisting of metal chlorides, metal bromides, and metal iodides.

The application discloses a greenhouse gas analysis system and an analysis method thereof, which comprises a sample inlet system, a chromatographic column separation system and a detection system. The chromatographic column separation system comprises a first chromatographic column, a second chromatographic column, a third chromatographic column and a fourth chromatographic column. The detection system comprises a hydrogen flame ion detector, a thermal conductivity detector and an electron capture detector. The first chromatographic column, the second chromatographic column and the third chromatographic column are connected in parallel, the third chromatographic column and the fourth chromatographic column are connected in series, the first chromatographic column is connected with the hydrogen flame ion detector, the second chromatographic column is connected with the electron capture detector, and the fourth chromatographic column is connected with the thermal conductivity detector. The application realizes the detection and analysis of methane, carbon dioxide, nitrous oxide and fluorine-containing gases such as sulfur hexafluoride by using different principles of different detectors. Finally, the chromatographic signal response is completed through a signal output system, and sample detection and analysis are realized through data analysis and calculation, so that accurate and reliable value traceability is provided for the monitoring of the concentration change characteristics of atmospheric environment greenhouse gases.

A process includes providing a reactor containing a compound of the formula SiOx, wherein 0 ≤ x ≤ 2, and receiving, at the reactor, fluorinated gas. The process also includes obtaining a gaseous mixture formed at an elevated temperature in the reactor and removing silicon tetrafluoride from the gaseous mixture. An apparatus includes a reactor containing a compound of the formula SiOx, wherein 0 ≤ x ≤ 2, a component for receiving fluorinated gas at the reactor, a heating element for heating the compound of the formula SiOx and the fluorinated gas in the reactor, and a separation component for removing silicon tetrafluoride from a gaseous mixture formed in the reactor. A process of semiconductor manufacturing includes defluorinating exhaust gas using the process. A system for semiconductor manufacturing includes a set of components for carrying out the process.

The invention discloses a treatment system and process for fluorine-containing gas. The treatment system comprises: a reaction unit comprising at least two reactors connected in series to provide a space for catalytic decomposition and chemical adsorption of fluorine-containing organic matters; the gas inlet unit is used for selectively conveying fluorine-containing gas and hydrogen chloride to the plurality of reactors; the discharging unit is used for selectively receiving the metal fluoride discharged from the plurality of reactors; the feeding unit is used for selectively conveying a catalyst into the plurality of reactors; and the tail gas treatment unit is used for selectively receiving gas discharged from the plurality of reactors. According to the technical scheme, the requirement that the catalyst is frequently replaced during continuous reaction is met, and on the basis that fluorine-containing organic matter in gas is removed through catalytic decomposition, chemical adsorption is further carried out, and a fluoride salt product with a high additional value is formed.

The invention discloses a method and a device for separating fluorinated gas based on an ionic liquid extraction agent and double-parallel evaporator organic Rankine cycle coupling process. Through screening of the ionic liquid extraction agent, efficient separation of the fluorinated gas mixture is achieved, and the purity of the product can reach 99.5% or above; the organic Rankine cycle system with the double parallel evaporators is used for recovering waste heat, the heat efficiency of waste heat recovery can reach 23% or above, the total energy consumption of the system and the using amount of the extracting agent are obviously reduced, the purity is obviously improved compared with a traditional process, and an efficient and environment-friendly technical scheme is provided for recycling and reusing of the hydrofluorocarbon / hydrofluoroolefin mixed refrigerant. The application prospect is good.

The invention provides a method for preparing indium trifluoride in a continuous gas phase, which comprises the following steps of: performing atomization, sublimation or fluidization pretreatment on an indium source in an inert carrier gas atmosphere to form a gaseous or superfine particle indium source material flow; continuously introducing the indium source material flow and fluorine-containing gas into a continuous reactor with a function of mechanically updating a reaction interface, and carrying out gas-phase fluorination reaction at the reaction temperature of 500-900 DEG C to generate a gas-solid mixture containing indium trifluoride solid and tail gas; wherein the feeding molar ratio of an indium element in the indium source to a fluorine element in the fluorine-containing gas is 1: (3.0-6.5); and performing continuous gas-solid separation on the gas-solid mixture obtained in the step S2. Through specific reactor selection and process parameter coupling, the preparation difficulties that the efficiency is low, the energy consumption is high, the product consistency is poor and the metal indium is easy to sinter and coat when the indium trifluoride is prepared by an existing intermittent method are overcome, the safe and continuous production of the indium trifluoride is realized, and the product purity reaches the electronic grade standard.

The invention provides a waste photovoltaic panel segmented pyrolysis recovery system and process, the recovery system comprises a reaction cylinder, an external heating furnace, a burner and a gas purification device, the position of a feed port of the reaction cylinder is slightly higher than the position of a discharge port, the reaction cylinder rotates in the axial direction, materials in the reaction cylinder move towards the discharge port, and the gas purification device is arranged in the outer heating furnace. The reaction cylinder comprises a low-temperature pyrolysis area and a high-temperature pyrolysis area, the outer heating furnace covers the outer side of the reaction cylinder, the outer heating furnace is provided with a low-temperature section and a high-temperature section, a high-temperature pyrolysis gas outlet of the reaction cylinder is connected with the combustor, and a flue gas outlet of the combustor is connected with the high-temperature section of the outer heating furnace. The energy consumption required by pyrolysis can be reduced, and the recovery rate and purity of the material can be improved. According to the invention, the pyrolysis gas can be effectively recovered, the heat value of the pyrolysis gas is fully utilized, and the fluorine-containing gas is concentrated in the high-temperature pyrolysis area for treatment, so that the treatment efficiency of the fluorine-containing gas is improved, and the consumption of chemicals for treating the fluorine-containing gas is reduced.