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Device and method for eliminating fluorinated gases

A gas, fluorination technology, applied in chemical instruments and methods, separation methods, plasma and other directions, can solve problems such as paralysis and hinder the smooth progress of semiconductor engineering equipment

Inactive Publication Date: 2008-10-08
严桓燮
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If these molecules are removed in a vacuum, even if it is a successful method, there is a problem that these RF equipment may cause problems such as hindering the smooth progress of other semiconductor engineering equipment or completely paralyzing them because they are attached to the semiconductor process line implemented in a vacuum

Method used

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  • Device and method for eliminating fluorinated gases
  • Device and method for eliminating fluorinated gases
  • Device and method for eliminating fluorinated gases

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] Figure 6 and Figure 7 It uses an infrared tube analyzer (FTIR) to measure nitrogen trifluoride (NF) before and after passing through a high-temperature plasma flame. 3 ) analysis results chart. The device used is as figure 2 device with the structure shown.

[0063] In the embodiment, air containing NF3 is injected by a blower, compressed air is used for swirl gas, and methane is used for injecting fuel.

[0064] At this time, the flow rate of injected air and compressed air is 500 liters per minute and 50 liters per minute, methane is 15 liters per minute, NF 3 600 ml per minute. by NF 3 After the polluted gas passes through the high-temperature plasma flame in the discharge tube, the remaining NF remaining in the exhaust gas is measured by an infrared spectrophotometer. 3 According to the quantitative results, it can be known that under the above-mentioned implementation conditions, more than 99% are decomposed by the high-temperature plasma flame.

Embodiment 2

[0066] Figure 8 and Figure 9 It uses an infrared tube analyzer (FTIR) to measure the sulfur hexafluoride (SF) before and after passing through a high-temperature plasma flame. 6 ) analysis results chart. The device used is as figure 2 device with the structure shown.

[0067] In this example the injection gas is SF 6 , Nitrogen and oxygen are mixed and injected with a gas mixing device, compressed air is used for swirl gas, and methane is used for fuel. At this time, the injected nitrogen and oxygen and compressed air flows are 120 liters and 30 liters per minute, SF 6 100 ml per minute. By SF 6 After the polluted gas passes through the high-temperature plasma flame in the discharge tube, the SF remaining in the exhaust gas is measured by an infrared spectrometer 6 Quantitative results, it can be known that under the above factual conditions, more than 99% are decomposed by high temperature plasma flame

[0068] Figure 10 Shown is a graph of decomposition efficien...

Embodiment 3

[0071] Figure 11 and Figure 12 It uses an infrared tube analyzer (FTIR) to measure nitrogen tetrafluoride (CF) before and after passing through a high-temperature plasma flame. 4) analysis results chart. The device used is as figure 2 device with the structure shown.

[0072] In this example the injected gas is CF 4 , Nitrogen and oxygen are mixed and injected with a gas mixing device, compressed air is used for swirl gas, and methane is used for fuel. At this time, the injected nitrogen and oxygen and compressed air flows are 40 liters and 30 liters per minute, CF 4 50 ml per minute are infused. by CF 4 After the polluted gas passes through the high-temperature plasma flame generated in the discharge tube, the amount of CF4 remaining in the exhaust gas is measured by an infrared spectrometer. It can be known that under the above-mentioned factual conditions, more than 98% of it is destroyed by the high-temperature plasma flame. break down

[0073] Figure 13 Shown...

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Abstract

The invention relates to a device for removing fluorinated series gas and a method thereof. The device and the method of the invention is that: during the process of configuring, manufacturing and washing the high-tech industrial devices such as computers or semiconductors, etc. which use fluorinated serials gas, the gas polluted by the unreacted fluorinated series gas is led into plasmatorch with high temperature and high capacity to remove fluorinated series gas through thermal decomposition or plasmatorch chemical reaction.

Description

technical field [0001] The invention relates to the technology of a treatment device for cleaning waste gas of semiconductors by using a high-temperature plasma flame. Background technique [0002] One of the main culprits of global warming is industrial gas used in advanced industries. The representative gas is the fluorinated series gas. For example, once these gases are released into the atmosphere, they will exist in the atmosphere for a long time, blocking the infrared rays that should be emitted from the surface of the earth, and functioning as a greenhouse gas that increases the temperature of the surface atmosphere. [0003] Therefore, international regulations are being strengthened that the fluorinated gases used in the industry should be completely destroyed before being discharged into the atmosphere. As the Kyoto Protocol came into effect on February 16, 2005, reducing greenhouse gases is not only an environmental regulation, but also an economic regulation, w...

Claims

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Application Information

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IPC IPC(8): B01D53/70B01D53/74H05H1/00B01J19/12F23G7/06
CPCY02E20/12
Inventor 严桓燮
Owner 严桓燮
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