The invention discloses an MEMS device and a manufacturing method thereof, and the method comprises the steps: forming a first MEMS structure: providing a first substrate, forming a first sensing layer on the first substrate, and sequentially forming a first cavity and a second sensing layer on the first sensing layer; forming a second MEMS structure: providing a second substrate, forming a third sensing layer on the second substrate, and sequentially forming a second cavity and a fourth sensing layer on the third sensing layer; bonding the second sensing layer and the fourth sensing layer to form a common sensing layer; the part, corresponding to the first cavity, of the first substrate is removed, and the first sensing layer forms a movable sensing layer. According to the MEMS device and the manufacturing method thereof provided by the invention, the stacked double-layer
capacitor structure is prepared by adopting a heterogeneous bonding mode, the process is simple, the implementation is high, the prepared device structure does not need to be plugged, the problem that the sensing layer is uneven due to hole plugging is avoided, and the reliability of the device is improved. The reliability problems of air leakage and the like of the hole blocking structure caused by repeated
pressure measurement motion of the upper-layer
pressure sensing film of the sealing cavity are also avoided, and the service life and the yield of the device are improved.