Bubble concentration adjustment device

Abstract

To provide an air bubble concentration adjustment device and a tank system which can adjust concentration of air bubbles contained in an air bubble mixed liquid.SOLUTION: An air bubble concentration adjustment device includes an air bubble generation part which has a plurality of flow channels flowing liquid, and enables generation of air bubbles having an air bubble diameter of less than 1 μm in the liquid, in at least one flow channel, and a flow ratio control part for changing the flow ratio of the liquid flowing through the plurality of flow channels so that the concentration of the air bubbles can be adjusted by mixing the liquid flowing out from the plurality of flow channels.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a bubble concentration adjusting device and a tank system.

Background Art

[0002] There is a demand for using a bubble generator that generates a gas-liquid mixture containing bubbles with a bubble diameter of 1 μm or less in various industrial fields. Patent Document 1 proposes providing a bubble generator in a tank provided in a circulation system of an air conditioning system and removing contaminants in the circulation system with the gas-liquid mixture stored in the tank.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In the technology proposed in Patent Document 1, there is room for improvement from the viewpoint of adjusting the bubble concentration contained in the bubble mixture stored in the tank.

[0005] An object of the present invention is to provide a bubble concentration adjusting device and a tank system that enable adjustment of the bubble concentration contained in a bubble mixture.

Means for Solving the Problems

[0006] The present invention summarizes the invention described in the following (1) to (6).

[0007] (1) having a plurality of flow paths through which a liquid flows, at least one of the flow paths is provided with a bubble generating unit capable of generating bubbles with a bubble diameter of less than 1 μm in the liquid, A flow rate ratio control unit is provided for changing the flow rate ratio of the liquid flowing through a plurality of the flow paths so that the concentration of the bubbles can be adjusted by mixing the liquid flowing out from the plurality of the flow paths. Bubble concentration adjusting device. (2) In the bubble concentration adjusting device according to (1) above, It is provided with a scale display unit showing the concentration of the bubbles, The flow rate ratio control unit changes the flow rate ratio according to the concentration of the bubbles displayed on the scale display unit. Bubble concentration adjusting device. (3) In the bubble concentration adjusting device according to (2) above, It has an inlet for receiving the liquid, The flow rate ratio control unit changes the flow rate ratio according to the pressure, flow velocity and flow rate of the liquid received from the inlet. Bubble concentration adjusting device. (4) In the bubble concentration adjusting device according to (3) above, The inlet is common to a plurality of the flow paths, The flow rate ratio control unit changes the flow rate ratio by changing the distribution ratio of the liquid distributed to each of the plurality of the flow paths among the liquid supplied from the inlet. Bubble concentration adjusting device. (5) The bubble concentration adjusting device according to (1) above, and A tank for storing the liquid, are provided, The bubble concentration adjusting device and the tank are arranged such that the liquid is supplied to the tank after passing through the bubble concentration adjusting device. Tank system. (6) A tank for storing a liquid, and A flow path for flowing the liquid, are provided, The flow path is provided with a bubble generating unit that generates bubbles having a bubble diameter of less than 1 μm in the liquid, Both the upstream end and the downstream end of the flow path are connected to the tank, A timer is provided for determining the time for the liquid to flow through the flow path. Tank system.

Advantages of the Invention

[0008] According to the present invention, it is possible to provide a bubble concentration adjusting device and a tank system that can adjust the amount of bubbles contained in a gas-liquid mixture.

Brief Description of the Drawings

[0009]

Figure 1

Figure 2

Figure 3

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Figure 9

Figure 10

Mode for Carrying Out the Invention

[0010] Embodiments of the present invention will be described in the order of [1. Bubble concentration adjustment device] and [2. Tank system]. In [2. Tank system], the description will be given in the order of the first embodiment, the second embodiment, and the third embodiment.

[0011] Note that the present invention is not limited to the embodiments described below.

[0012] [1. Bubble concentration adjustment device] The bubble concentration adjustment device according to the present invention has a structure for controlling the amount (bubble concentration) of bubbles contained in a liquid having bubbles.

[0013] [Configuration] As shown in FIG. 1, the bubble concentration adjustment device 10 includes a plurality of flow paths 11, a flow rate ratio control unit 12, and a bubble generation unit 13.

[0014] (Flow path) The flow path 11 is configured to allow a liquid to flow, and specifically, a structure formed by the piping member 20 can be exemplified. The sizes of the plurality of flow paths 11 (the sizes of the longitudinal cross-sections of the flow paths 11 by a plane having the longitudinal direction of the flow paths 11 as the normal direction) may be the same as each other, or some of the flow paths 11 may have different sizes from other flow paths 11. Also, the number of the flow paths 11 is not particularly limited, and may be two or three or more. In the example of FIG. 1, two flow paths 11 are provided. When the two flow paths 11 are the first flow path 11A and the second flow path 11B, both are constituted by the piping member 20 having the same size of the longitudinal cross-section. That is, in the example of FIG. 1, the case where the sizes of the longitudinal cross-sections of the plurality of flow paths 11 are the same is illustrated. Continuing the description of the bubble concentration adjusting device 10 with reference to the example of FIG. 1. In FIG. 1, the arrow F indicates the flow of the liquid flowing in from the inlet 14 described later, the arrow FP1 indicates the flow of the liquid flowing through the first flow path 11A, and the arrow FP2 indicates the flow of the liquid flowing through the second flow path 11B. This is the same for FIGS. 3A to 3D, FIGS. 4A to 4C, and FIGS. 6 to 8 (in FIGS. 6 to 8, the arrows FP1 and FP2 indicate the flows of the liquid flowing through the first flow path 270A and the second flow path 270B, respectively).

[0015] (Inlet) In the bubble concentration adjusting device 10, in the example of FIG. 1, an inlet 14 for receiving a liquid is formed, and the liquid can flow into the inlet 14 from an external liquid supply source (not shown). The liquid flowing in from the inlet 14 in the direction of arrow F can flow from the upstream end to the downstream end of the flow path 11 regardless of which flow path 11 it enters. The inlet 14 may be formed individually without being common to the plurality of flow paths 11, but it is preferable that the inlet 14 is common to the plurality of flow paths 11. That the inlet 14 is common means that the liquid flowing in from the same inlet 14 flows through any of the plurality of flow paths 11. When the inlets are common to the plurality of flow paths 11, as shown in FIG. 1, the inlet is specified at one location. If there is one inlet, it becomes easy to adjust the bubble concentration of the liquid (the liquid (mixed liquid) defined when assuming the entire liquid flowing out from the outlet) obtained via the bubble concentration adjusting device 10 by controlling the movement of the liquid flowing in from the one inlet.

[0016] In the bubble concentration adjusting device 10, it is preferable that the liquid stably flows from the external liquid supply source of the bubble concentration adjusting device 10 into the inlet 14 and then into the flow path 11 in a state where its pressure, flow velocity, and flow rate satisfy a predetermined range. From the viewpoint of more surely realizing this, when using the bubble concentration adjusting device 10, as a structure (referred to as an inflow assisting structure) for flowing the liquid from the inlet 14 toward the flow path 11, a structure in which a device such as a pump is arranged outside the inlet 14 or a structure in which the position of the supply source is higher than the inlet 14 by a predetermined position or more is preferably adopted.

[0017] The presence of the inflow assisting structure when using the bubble concentration adjusting device 10 can exhibit a high effect particularly when the bubble generating unit 13 described later is a cavitation type device (bubble generating device). This is because when the bubble generating unit is a cavitation type device, the liquid sent to the bubble sending device has a pressure, flow velocity, and flow rate that satisfy a predetermined range, so that the bubble sending device can more surely generate bubbles such as fine bubbles (including ultrafine bubbles and microbubbles) in the liquid.

[0018] (Inflow passage) In the example of Fig. 1, the bubble concentration adjusting device 10 has an inflow passage 15 formed at its upstream end and configured to receive the liquid flowing in from the inflow port 14, and is connected to the upstream ends of the first flow passage 11A and the second flow passage 11B at the downstream end of the inflow passage 15 (the opposite end along the direction of arrow F with respect to the end that becomes the inflow port 14). However, in the example of Fig. 1, the first flow passage 11A, the second flow passage 11B, and the inflow passage 15 are connected via a flow rate control member 16 described later. That is, in the example of Fig. 1, the bubble concentration adjusting device 10 is connected to the flow rate control member 16 at the downstream end of the inflow passage 15, and branches from the flow rate control member 16 to the first flow passage 11A and the second flow passage 11B. The liquid flowing through either the first flow passage 11A or the second flow passage 11B is configured to flow in from the common inflow port 14. The arrangement structure of the inflow passage 15 and the plurality of flow passages 11 is an example in Fig. 1 and is not limited to this structure. As will be described later, the inflow passage 15 may be integrated with the first flow passage 11A or the second flow passage 11B. In this case, as described in Modification Example 3 to be described later, a part of the first flow passage 11A or a part of the second flow passage 11B also serves as the inflow passage 15, and the structure is such that the second flow passage 11B branches from the first flow passage 11A, or the first flow passage 11A branches from the second flow passage 11B.

[0019] The inflow passage 15 may be provided with the above-described inflow assisting structure. For example, a pump or the like may be provided in the middle of the inflow passage 15. By providing a pump or the like in the middle of the inflow passage 15, it becomes easy to stabilize the pressure, flow velocity, and flow rate of the liquid flowing in the inflow passage 15 within a predetermined range.

[0020] (Liquid) The liquid flowing through the flow path 11 is not particularly limited, and examples thereof include a solvent, a solution, dispersion, or mixture obtained by dissolving, dispersing, or mixing a compound or the like in a solvent (such as a solution, dispersion, and mixture). Examples of the solvent include water and organic solvents. Examples of water include tap water, well water, seawater, pure water, ultrapure water, water that has passed through a supercritical state (supercritical-pass water), and the like. Examples of organic solvents include alcohols and oils. Examples of the compound or the like dissolved in the solvent include inorganic compounds such as covalently bonded substances of carbon dioxide, nitrogen, and oxygen, inorganic electrolytes such as sodium chloride, and various organic compounds such as aliphatic hydrocarbons, aromatic hydrocarbons, alcohols, peptides, and fatty acids.

[0021] The liquid flowing through the flow path 11 may be determined according to the use of the gas-liquid mixture containing fine bubbles and ultra-fine bubbles as bubbles. The use of the gas-liquid mixture may be determined according to its effect. As the effects of containing fine bubbles and ultra-fine bubbles as bubbles in the liquid, effects related to solubility, separation, detergency, fluidity, improvement of the quality of medical diagnosis, etc. can be cited. The effects related to solubility by bubbles can include improvement of the effect of ozone water, improvement of the miscibility of oil and additives, promotion of emulsification of oil and water, oxygen enrichment of liquid fertilizer by containing oxygen-containing bubbles, improvement of the water quality of water for fish farming, etc. The effects related to separability by bubbles can include purification of contaminated soil and water purification. The effects related to detergency can include improvement of the detergency of precision instruments, household appliances, food, and the human body, and improvement of the detergency in the cleaning process in the production line. The effects related to improvement of efficiency by bubbles can include fuelization by promoting the emulsification of oil (such as waste oil) and water with bubbles. The effects related to improvement of the quality of medical diagnosis by bubbles can include improvement of the effectiveness of ultrasonic treatment by the combined use of ultrasonic waves and bubbles, etc. The bubble concentration adjusting device 10 is applicable when generating a gas-liquid mixture for realizing these various effects by bubbles, and the liquid flowing through the bubble concentration adjusting device 10 can include the liquid used when generating a gas-liquid mixture for realizing various effects by bubbles. More specifically, examples of the liquid flowing through the flow path 11 can include liquids used in foods such as juices and sugar water, cleaning solutions used in hospitals, etc., liquids used in medical applications such as physiological saline, and various liquid fuels such as gasoline, light oil, kerosene, and jet fuel.

[0022] (Flow rate ratio control unit) The flow rate ratio control unit 12 provided in the bubble concentration adjusting device 10 has a flow rate control member 16. In FIG. 1, the flow rate ratio control unit 12 is shown by a broken line for convenience of explanation. The same applies to FIGS. 3 and 4, etc.

[0023] The flow rate ratio control unit 12 is a part for adjusting the flow rate of the liquid flowing through the flow path 11. That is, the flow rate ratio control unit 12 can also be referred to as a flow rate ratio variable unit. The flow rate ratio control unit 12 can change the flow rate ratio of the liquid flowing through the plurality of flow paths so that the concentration of bubbles (bubble concentration) can be adjusted by mixing the liquids flowing out from the plurality of flow paths. In this case, the flow rate (cm 3 / sec) of the liquid flowing through the flow path 11 represents the volume (cm 3 ) of the liquid flowing into the flow path per unit time (second). In the example of FIG. 1, the flow rate ratio is the ratio of the amount (flow rate) of the liquid flowing through the first flow path to the amount (flow rate) of the liquid flowing through the second flow path among the liquids flowing into the inlet. The flow rate ratio is defined as WA:WB when the amount (flow rate) of the liquid flowing through the first flow path is WA and the amount (flow rate) of the liquid flowing through the second flow path is WB. In particular, according to the bubble concentration adjusting device 10, the flow rate ratio control unit 12 controls (changes) the flow rate ratio so that the concentration of fine bubbles (sometimes referred to as fine bubble concentration) described later as the bubble concentration or the concentration of ultra-fine bubbles (sometimes referred to as ultra-fine bubble concentration) described later can be adjusted.

[0024] The flow rate ratio control unit 12 is configured to be able to change the flow rate ratio according to the overall bubble concentration of the liquid flowing out from the outlet per unit time. The flow rate ratio control unit 12 is not particularly limited as long as it has a structure capable of changing and controlling the flow rate of the liquid flowing through each flow path 11. In the example of FIG. 1, it is the part having the distribution valve 21. Also, in the example of FIG. 1, the overall liquid flowing out per unit time refers to the liquid obtained by combining the liquid flowing out from the outlet of the first flow path 11A per unit time and the liquid flowing out from the outlet of the second flow path per unit time.

[0025] (Flow rate control member) The flow rate control member 16 is a member capable of controlling the flow of the liquid flowing through the flow path 11. In the example of FIG. 1, the flow rate control member 16 is the distribution valve 21.

[0026] (Distribution valve) The distribution valve 21 shown in the example of FIG. 1 is provided at a position connected to the downstream end of the receiving channel 15, the upstream end of the first channel 11A, and the upstream end of the second channel 11B. The distribution valve 21 controls the distribution ratio of the liquid supplied from the inlet 14 to each of the plurality of channels 11. In the example of FIG. 1, the structure of the distribution valve 21 is not particularly limited as long as it has a structure capable of changing the ratio of the amount of liquid flowing into the first channel 11A to the amount of liquid flowing into the second channel 11B (a structure capable of changing the distribution ratio). The distribution valve 21 is configured to be able to change the ratio ((WA / WT):(WB / WT)) of the amount of liquid flowing into the first channel (flow rate WA) to the amount of liquid flowing into the second channel (flow rate WB) among the total flow rate (WT) of the liquid flowing from the inlet 14 into the receiving channel 15. In the example of FIG. 1, the flow rate ratio generally coincides with the distribution ratio, and the change in the flow rate ratio is realized by controlling the distribution ratio (for example, changing the distribution ratio).

[0027] In addition, in the case where the bubble generation unit described later is a cavitation type device, etc., the concentration of fine bubbles that become bubbles generated in the liquid passing through the bubble generation unit is said to depend on the flow velocity, pressure, and flow rate of the liquid. For this reason, regarding the case where the bubble generation unit is a cavitation type device, when the flow velocity, pressure, flow rate, etc. of the liquid supplied to the inlet 14 are different, or when the inner diameter of the piping member 20 is different between the first channel 11A and the second channel 11B, etc., even with the same distribution ratio, the bubble concentration in the entire liquid finally flowing out from the outlet of the bubble concentration adjustment device 10 may be different. From this perspective, in the bubble concentration adjustment device 10, it is preferable to construct a database such as a correspondence table showing the correspondence between the flow velocity, pressure, and flow rate of the liquid supplied to the inlet 14, and / or the flow rate ratio in the flow rate ratio control unit 12, and the concentration of fine bubbles (bubble concentration) in the entire liquid finally flowing out. Also, the flow rate ratio control unit 12 is preferably configured to be able to control the flow rate ratio of the liquid flowing through the plurality of channels 11 according to the pressure, flow velocity, and flow rate of the liquid received from the inlet 14.

[0028] (Bubble generation unit) At least one of the plurality of flow paths 11 is provided with a bubble generation unit 13. The bubble generation unit 13 generates bubbles in the liquid flowing through the flow path 11 in which it is provided. In the example of FIG. 1, the bubble generation unit 13 is provided in the first flow path 11A, and the bubble generation unit 13 generates bubbles in the liquid flowing through the first flow path 11A. As a result, the liquid flowing through the first flow path 11A becomes a gas-liquid mixture in which bubbles are dispersed in the liquid component after passing through the bubble generation unit 13.

[0029] (Bubbles) At least a part of the bubbles generated by the bubble generation unit 13 has a bubble diameter of less than 1 μm (the average bubble diameter of at least a part of the bubbles is less than 1 μm), but it is preferable that all of the bubbles generated by the bubble generation unit 13 have a diameter of less than 1 μm (the average bubble diameter of all the generated bubbles is less than 1 μm). In addition, bubbles with a bubble diameter of 100 μm or less may be referred to as fine bubbles, those with a diameter of 1 μm or more and 100 μm or less may be referred to as microbubbles, and those with a bubble diameter of less than 1 μm may be referred to as ultrafine bubbles or nanobubbles. The term "fine bubbles" shall be used as a term indicating a concept including microbubbles and ultrafine bubbles. It is preferable that at least a part of the bubbles generated by the bubble generation unit 13 are ultrafine bubbles. For example, in the example of FIG. 1, at least a part of the bubbles generated by the bubble generation unit 13 for the liquid flowing through the first flow path 11A are ultrafine bubbles. And the gas-liquid mixture as the liquid having bubbles formed in the first flow path 11A is in a state where ultrafine bubbles are dispersed in the liquid. Note that this does not exclude the gas-liquid mixture formed in the first flow path 11A from containing bubbles other than ultrafine bubbles, and the gas-liquid mixture may contain microbubbles or the like.

[0030] (Components in the bubble) The gas component inside the bubbles generated in the bubble generation unit 13 is not particularly limited and may be a gas taken into the bubble generation unit 13 from the outside, or a gasifiable component dissolved in the liquid fed into the bubble generation unit 13. Examples of the gasifiable component dissolved in the liquid include, for example, when the liquid is water, dissolved carbon dioxide dissolved in water, oxygen (dissolved oxygen) dissolved in water, nitrogen (dissolved nitrogen), etc.

[0031] (Bubble diameter) The bubble diameter shall indicate the diameter of the bubble. Also, the average bubble diameter of the bubbles shall indicate the average value of the diameters of the bubbles. The average bubble diameter can be determined from the bubble diameter distribution. The average bubble diameter of some bubbles can be determined from the bubble diameter distribution. The bubble diameter can be determined when measuring the bubble diameter distribution. The bubble diameter and the average bubble diameter can be determined using a technique for measuring the bubble diameter distribution (particle size distribution) of the bubbles contained in the gas-liquid mixture. Examples of the technique for measuring the bubble diameter distribution (particle size distribution) include a method using a laser diffraction / scattering type particle size distribution measuring device, etc. In addition, as a method for specifying the bubble diameter distribution, a particle size analysis - particle trajectory analysis method (particle tracking analysis method) conforming to JIS Z 8829:2021, etc. can also be mentioned.

[0032] (Bubble concentration) The bubble concentration (number / cm 3 ) of the gas-liquid mixture generated in the bubble generation unit 13 is not particularly limited, but even when assuming a mixed liquid obtained by mixing the liquids flowing out of the plurality of flow paths 11 so as to dilute the bubble concentration (that is, also in the mixed liquid of the liquid flowing out of the first flow path 11A and the liquid flowing out of the second flow path 11B in FIG. 1), from the viewpoint of maintaining the effect of the bubbles in the mixed liquid to a certain extent, the bubble concentration of the bubbles less than 1 μm in the gas-liquid mixture is preferably 20 million number / cm 3 or more, more preferably 50 million number / cm 3 or more, and even more preferably 60 million number / cm 3 or more. When the number of bubbles less than 1 μm contained in the liquid is 20 million number / cm 3If it is as described above, the gas-liquid mixture can exhibit an anti-fouling effect, and there are 50 million bubbles with a diameter of less than 1 μm per cm 3 If it is as described above, the cleaning effect of the biofilm (an aggregate formed by microorganisms, etc. on the solid phase surface) can be exhibited, and there are 60 million bubbles with a diameter of less than 1 μm per cm 3 If it is as described above, these effects can be further enhanced. Since the bubble concentration of the mixed liquid can be increased to the bubble concentration of the gas-liquid mixture, each effect obtained when the gas-liquid mixture satisfies the above bubble concentration range can also be realized for the mixed liquid.

[0033] The upper limit of the bubble concentration of the gas-liquid mixture generated in the bubble generation section 13 is not particularly limited. However, from the viewpoint of the ease of stable generation of bubbles, the upper limit of the bubble concentration of the gas-liquid mixture is preferably 5 billion per cm 3 It is preferably this value. The bubble concentration can be determined using the methods exemplified as the methods for specifying the bubble diameter and the average bubble diameter of the above-described bubbles.

[0034] (Electric potential of bubbles) The bubbles contained in the gas-liquid mixture preferably have a negative potential. The charged state of the negative potential of the bubbles is such that the bubble generation section 13 described later is a cavitation type bubble generator (for example, the bubble generator 100), and it can be realized according to the magnitude of the static electricity accompanying cavitation in the liquid fluid in the liquid flow path of the bubble generator 100 and the friction of the fluid in the flow path (friction between the member forming the flow path and the bubbles). The magnitude of the negative potential can be determined according to various conditions such as the diameter of the bubbles.

[0035] (Manufacture of gas-liquid mixture) As described above, the gas-liquid mixture can be manufactured, for example, by the liquid component that is the raw material of the gas-liquid mixture passing through the bubble generation section 13.

[0036] The bubble generation unit 13 is configured to generate fine bubbles such as ultrafine bubbles as bubbles in a liquid and form a gas-liquid mixture in which the bubbles are dispersed in the liquid. As such a bubble generation unit, apparatuses (bubble generation apparatuses) to which various bubble generation mechanisms such as a cavitation type, a micropore type, an ultrasonic type, a swirling flow type, a static mixer type, a Venturi type, a vapor aggregation type, a pressure dissolution type, and a gas-liquid mixing shear type are applied as needed can be exemplified.

[0037] However, from the viewpoint of efficiently generating fine bubbles such as ultrafine bubbles having a negative potential as the bubbles contained in the gas-liquid mixture, it is preferable to adjust the gas-liquid mixture by using a cavitation type apparatus as the bubble generation unit 13. As the cavitation type apparatus, an apparatus as shown in the following "Example of Bubble Generation Apparatus" can be used. Next, an example of a bubble generation apparatus applicable as the bubble generation unit 13 will be described with reference to FIGS. 2A to 2D.

[0038] (Example of Bubble Generation Apparatus) As shown in FIGS. 2A to 2D, the bubble generation apparatus 100 includes a receiving unit 110 that receives a liquid component (referred to as a raw material liquid) serving as a raw material, a bubble generation mechanism 120 that generates a gas-liquid mixture in which bubbles are dispersed in the raw material liquid supplied from the receiving unit 110, and a discharging unit 130 that discharges the gas-liquid mixture. FIGS. 2A to 2D are diagrams for explaining an embodiment of the bubble generation apparatus. Note that FIG. 2D is a schematic enlarged cross-sectional view for showing an enlarged state of a region SP surrounded by a broken line in FIG. 2C. When the bubble generation apparatus 100 is applied as the bubble generation unit 13 shown in the example of FIG. 1, the raw material liquid is the liquid flowing through the first flow path 11A among the liquids supplied from the inlet 14. Further, the gas-liquid mixture flowing out from the discharging unit 130 further flows toward the outlet (not shown) of the first flow path 11A.

[0039] (Bubble Generation Mechanism) The bubble generation mechanism 120 has a flow path forming body 121 and a plurality of collision bodies 124. The flow path forming body 121 forms a liquid flow path 122 on the inner peripheral surface 121A side thereof and has a throttle structure 123. The throttle structure 123 has a first portion 123A having a portion where the cross-sectional diameter of the inner peripheral surface 121A (the cross-sectional diameter defined in the cross-sectional plane assuming a plane with the longitudinal direction of the liquid flow path 122 as the normal direction) becomes smaller from the upstream end 125 (inlet) toward the downstream end 126 (outlet), and a second portion 123B having a portion where the cross-sectional diameter of the inner peripheral surface 121A becomes larger from the upstream end 125 toward the downstream end 126. The first portion 123A is located upstream of the second portion 123B. The plurality of collision bodies 124 project inward from the inner peripheral surface 121A of the flow path forming body 121 and are adjacent to each other with the segment region 150 interposed therebetween. The plurality of collision bodies 124 are arranged at a position between (or at the boundary of) the first portion 123A and the second portion 123B in the longitudinal direction of the liquid flow path 122. However, this does not prohibit the plurality of collision bodies 124 from being formed in either the first portion 123A or the second portion 123B. The segment region 150 indicates a region of the cross-sectional area of the inner peripheral surface 121A that is divided by the collision bodies 124 adjacent to each other in the circumferential direction of the inner peripheral surface 121A. The plurality of collision bodies 124 are arranged so as to form a gap portion 151 that narrows the flow path between their tips. Further, the bubble generation mechanism 120 is configured such that the flow path forming body 121 can pass the raw material liquid from the upstream end 125 to the downstream end 126. As described above, it is preferable that a pump (not shown) for supplying the raw material liquid is installed on the upstream side and / or the downstream side of the bubble generation device 100. This pump supplies the raw material liquid to the bubble generation device 100 so that the water pressure, flow velocity, and water volume of the raw material liquid are each equal to or greater than a predetermined value. In the bubble generation device 100, the concentration of the generated fine bubbles (such as microbubbles and ultrafine bubbles) differs depending on the pressure, flow velocity, and flow rate of the liquid flowing through the liquid flow path 122. In the bubble generation device 100, by increasing at least one of the pressure, flow velocity, and flow rate of the liquid, a high concentration of fine bubbles can be generated in the liquid.

[0040] (Production of gas-liquid mixture) By using the bubble generator 100, a bubble mixture can be obtained as follows. A raw material liquid is injected as a liquid fluid from the receiving part 110 of the bubble generator 100. The receiving part 110 is connected to the upstream end 125 (inlet) of the bubble generating mechanism 120, and the raw material liquid flows into the bubble generating mechanism 120 from the upstream end 125. In the bubble generating mechanism 120, the raw material liquid moves through the first part 123A of the throttle structure 123 in the direction generally from the upstream end 125 toward the downstream end 126 (in the direction of arrow LF), thereby increasing the flow velocity. It moves to the gap part 151 formed at the arrangement position of the collision body 124, and a part of the raw material liquid further proceeds through the gap part 151 toward the downstream end 126. At this time, since a part of the raw material liquid moves from the segment region 150 toward the downstream end 126, the fluid resistance in the throttle structure 123 does not increase excessively, and the negative pressure generation effect is enhanced. And as a part of the raw material liquid passes through the gap part 151, a cavitation effect occurs in the raw material liquid, and components (for example, dissolved oxygen) dissolved in the raw material liquid are vaporized into bubbles. The size of the bubbles and the size of the gap part 151 are adjusted according to conditions such as the structure of the collision body 124. Thus, a gas-liquid mixture is generated as a liquid in which bubbles having a desired bubble diameter are dispersed in the raw material liquid. The generated gas-liquid mixture can flow out from the downstream end 126 via the discharge part 130.

[0041] The bubbles dispersed in the gas-liquid mixture obtained by the bubble generator 100 are formed by the cavitation generated in the raw material liquid as described above, and are gasified components accompanying the cavitation of the components dissolved in the raw material liquid. In such bubbles, the vaporized components of oxygen (dissolved oxygen) and nitrogen (dissolved nitrogen) dissolved in the water constituting the raw material liquid are contained in the bubbles. Note that the gas components in the bubbles may be determined according to the content of the effects required as the effects of the gas-liquid mixture. For example, when the removal effect of the biofilm is required as the gas-liquid mixture, it is preferable that the oxygen component in the bubbles is small. Considering enhancing the required effects, it is preferable that the bubble generator 100 is provided with a gas supply structure.

[0042] As described above, the bubble generator 100 shown in FIG. 2 may be provided with a gas supply structure (not shown) that introduces gas from the outside into the liquid flow path 122 according to the situation such as the effects required for the gas-liquid mixture. Regarding the point that the gas supply structure may be provided as needed, the same applies to the case where the bubble generator 100 is applied as the bubble generation units 13 and 280 provided in each example of FIGS. 1, 3A to 3D, 4A to 4C, and 6 to 10. When the bubble generator 100 is provided with a gas supply structure that takes in external gas (for example, nitrogen, carbon dioxide, etc.) into the liquid flow path 122, the supplied gas flows toward the downstream end 126 in accordance with the flow of the raw material liquid in the state of bubbles in the raw material liquid at the taken-in position. Further, the bubbles formed by the gas supplied to the raw material liquid via the gas supply structure are finely divided in the gap portion 151 and the segment region 150 due to the collision between the collision body 124 and the bubbles, etc., and are further refined, and can be made into bubbles with a bubble diameter of less than 1 μm, for example.

[0043] The above-described bubble generator 100 can be applied as the bubble generation unit 13 of the bubble concentration adjustment device 10.

[0044] (Outlet) In the bubble concentration adjustment device 10, outlets (not shown) for the liquid flowing in the flow paths 11 are provided on the downstream end sides of the plurality of flow paths 11. In the example of FIG. 1, an outlet for the liquid flowing in the first flow path in the direction of arrow FP1 is formed at the downstream end of the first flow path, and an outlet for the liquid flowing in the second flow path in the direction of arrow FP2 is formed at the downstream end of the second flow path. The first flow path and the second flow path are not connected to each other at their respective downstream end sides, and outlets are formed for each of them.

[0045] [Operation and Effects of Bubble Concentration Adjustment Device] In the bubble concentration adjusting device 10, the liquid supplied from the inflow port 14 to the receiving flow path 15 is divided by the flow rate ratio control unit 12 into a plurality of flow paths 11 (the first flow path 11A and the second flow path 11B), and the amount (flow rate) of the liquid flowing through each flow path 11 is determined according to the control of the flow rate ratio. At least one flow path 11 (the first flow path 11A) is provided with a bubble generation unit 13, and bubbles are generated in the liquid flowing through the bubble generation unit 13. Since the flow rate of the liquid flowing through the flow path 11 (the first flow path 11A) provided with the bubble generation unit 13 is specified according to the state of the control of the flow rate ratio by the flow rate ratio control unit 12, the amount of bubbles generated in the liquid is specified. And the bubble concentration of the mixed liquid is specified when assuming the mixed liquid obtained by combining the liquids flowing out from the outlets of the plurality of flow paths 11. That is, according to the above-described bubble concentration adjusting device 10, according to the control of the flow rate ratio by the flow rate ratio control unit 12, the bubble concentration of the liquid obtained by mixing the liquids flowing out from the outlet of the bubble concentration adjusting device 10 is determined. Therefore, according to the bubble concentration adjusting device 10, a liquid having a desired bubble concentration can be obtained according to the control of the flow rate ratio.

[0046] According to the bubble concentration adjusting device 10, by mixing the liquid containing high-concentration fine bubbles as the liquid passing through the bubble generation unit 13 of the first flow path 11A and the liquid flowing through the second flow path 11B branched by the distribution valve 21, the concentration of the fine bubbles can be adjusted by diluting the liquid containing high-concentration fine bubbles. Therefore, compared with the case of adjusting the liquid containing fine bubbles with a bubble generating device without adopting a structure such as the distribution valve 21 as in the prior art, in the bubble concentration adjusting device 10, a large amount of the liquid containing fine bubbles with the adjusted concentration can be obtained. Note that the liquid containing the above-described fine bubbles obtained by the bubble concentration adjusting device 10 contains micro fine bubbles at least in part.

[0047] When provided with a single flow path for flowing a liquid from an inlet and a bubble generator in the single flow path, and simply adjusting the bubble concentration by factors such as flow rate, flow velocity, and pressure, there is a risk that it may be necessary to reduce the flow rate of the liquid flowing in from the inlet in order to obtain a liquid containing fine bubbles of a desired concentration. In such a case, the amount that can be supplied to a tank or the like per unit time decreases, and it takes a long time to accumulate in the tank. In contrast, the bubble concentration adjusting device 10 can obtain a liquid containing fine bubbles of a desired concentration (including micro fine bubbles at least in part) while maintaining the flow rate of the liquid flowing in from the inlet, and can suppress the risk of a decrease in the amount that can be supplied to a tank or the like per unit time.

[0048] [Modification Example of Bubble Concentration Adjusting Device] (Modification Example 1) In the bubble concentration adjusting device 10 (bubble concentration adjusting device 10A in FIG. 3A), as shown in FIG. 3A, it may be configured such that the liquids flowing through the plurality of flow paths 11 merge on the downstream side. This is referred to as Modification Example 1. FIG. 3A is a schematic configuration diagram for explaining an embodiment of the bubble concentration adjusting device 10A according to Modification Example 1. In the example of Modification Example 1 shown in FIG. 3A, there is one outlet, and a common outlet is provided for the plurality of flow paths 11. In the example of FIG. 3, at a position SC on the downstream side of the bubble generating portion 13 in the first flow path 11A, the first flow path 11A and the second flow path 11B are connected. The downstream position SC is the position where the liquids flowing through the plurality of flow paths 11 merge on the downstream side.

[0049] (Modification Example 2) In the bubble concentration adjustment device 10 (bubble concentration adjustment device 10B in FIG. 3B), as shown in FIG. 3B, a plurality of flow paths 11 may be provided with bubble generation units 13. This is referred to as Modification Example 2. FIG. 3B is a schematic configuration diagram for explaining an embodiment of the bubble concentration adjustment device 10B according to Modification Example 2. In the example of Modification Example 2 shown in FIG. 3B, bubble generation units 13 are provided in the first flow path 11A and the second flow path 11B. When three or more flow paths 11 are formed, bubble generation units may be provided in two of the flow paths 11, or bubble generation units 13 may be provided in three flow paths 11 (none of which are shown). In this case, among the liquids flowing through the flow paths 11 (the flow paths 11 provided with the bubble generation units 13) branched by the distribution valve 21, fine bubbles can be generated at a higher concentration in the liquid with at least one of the flow velocity and the flow rate being larger. This can enhance the feasibility when the bubble generation unit is a cavitation type device.

[0050] (Modification Example 3) In the bubble concentration adjustment device 10 shown in the example of FIG. 1, the flow rate ratio control unit 12 had a structure in which the flow rate control member 16 was provided so as to connect the lower end of the receiving flow path 15, the upstream end of the first flow path 11A, and the upstream end of the second flow path 11B. However, the flow rate ratio control unit 12 is not limited to this. The bubble concentration adjustment device 10 (denoted as bubble concentration adjustment device 10C in FIG. 3C) may, as shown in FIG. 3C, have the flow rate control member 16 provided at a position deviated from the position of the lower end of the receiving flow path 15 in the flow rate ratio control unit 12. This is referred to as Modification Example 3. FIG. 3C is a schematic configuration diagram for explaining an embodiment of the bubble concentration adjustment device 10C according to Modification Example 3.

[0051] In the bubble concentration adjustment device according to Modification Example 3 shown in the example of FIG. 3C, the receiving flow path is integrated with the first flow path, and the portion from the upstream end of the first flow path to a predetermined position SV along the longitudinal direction of the first flow path also serves as the receiving flow path. Further, the predetermined position SV of the first flow path is the position where the second flow path branches from the first flow path. The upstream end of the second flow path is connected to the predetermined position SV of the first flow path. The flow rate ratio control unit 12 is configured with a structure in which the flow rate control member 16 and the second flow path branch from the first flow path.

[0052] As the flow control member 16, a control valve 22 is provided instead of the distribution valve 21 shown in the example of FIG. 1. The control valve 22 is a valve that controls the flow rate of the liquid flowing through the flow path 11 in which it is installed, and it is preferable that the control valve 22 has a function of opening and closing the flow path 11. In the example of Modification 3 shown in FIG. 3C, the control valve 22 serving as the flow control member 16 is provided in the second flow path 11B, and controls the amount of liquid flowing in the second flow path 11B in the direction of arrow FP2 toward the downstream end. In this example, when the amount of liquid flowing into the second flow path 11B among the liquid flowing through the receiving flow path 15 (the portion upstream of the predetermined position SV of the first flow path 11A) is changed, the amount of liquid flowing through the first flow path 11A is also changed accordingly. Therefore, by controlling the control valve 22, the ratio of the amount of liquid flowing through the first flow path 11A to the amount of liquid flowing through the second flow path 11B is determined.

[0053] In the example of FIG. 3C, the control valve 22 was provided in the second flow path 11B. However, in Modification 3, as shown in another example of the bubble concentration adjusting device 10C shown in FIG. 3D (denoted as the bubble concentration adjusting device 10D in FIG. 3D), the control valve 22 may be provided in the first flow path 11A. Also for the bubble concentration adjusting device 10D, by controlling the control valve 22, the ratio of the amount of liquid flowing through the first flow path 11A to the amount of liquid flowing through the second flow path 11B is determined.

[0054] Further, in Modification 3, as shown in another example of the bubble concentration adjusting device 10C shown in FIG. 4A (denoted as the bubble concentration adjusting device 10E in FIG. 4A), the control valve 22 may be provided in both the first flow path 11A and the second flow path 11B. In this case, the flow rate ratio control unit 12 has a plurality of flow control members 16, and has a plurality of control valves 22 as the plurality of flow control members 16.

[0055] (Modification 4) In the bubble concentration adjusting device 10, as shown in FIG. 5A, the flow rate ratio control unit 12 may include an operation unit 42, and the operation unit 42 may be provided with a scale display unit 40 having a scale 41 as a concentration display unit indicating the bubble concentration corresponding to the flow rate ratio. This is referred to as Modification Example 3. FIG. 5A is a diagram for explaining an example of the scale display unit 40 of the flow rate ratio control unit 12 used in an embodiment of the bubble concentration adjusting device 10 according to Modification Example 6.

[0056] The operation unit 42 of the flow rate ratio control unit 12 is configured to be able to perform an operation for changing the flow rate ratio. The operation unit 42 may be integrally formed with the flow rate control member 16 or may be formed separately from the flow rate control member 16. In the example of Modification Example 6 shown in FIG. 5A, a knob 42A is provided on the operation unit 42. In the example of FIG. 5A, the knob 42A is rotatably provided. When the rotational position of the knob 42A is changed by rotating the knob 42A, the flow rate ratio control unit 12 changes the flow rate ratio of the liquid flowing through the first flow path and the liquid flowing through the second flow path so as to be a flow rate ratio determined corresponding to the value of the scale 41 (the value shown at the outer position along the longitudinal direction of the knob 42A). For convenience of explanation, in FIG. 5A, the numbers from 1 to 5 are described as the values of the scale 41, but this is only an example. Also, in FIG. 5A, the rotation direction of the knob 42A is indicated by an arrow RT.

[0057] On the scale display section 40, as the scale 41, there is provided a design (notation such as numbers or marks that can be visually identified) that represents information corresponding to the bubble concentration of the liquid (gas-liquid mixture) for the entire liquid flowing out from the outlet. The flow rate ratio can be pre-associated with the bubble concentration. The bubble concentration referred to here indicates the bubble concentration of the bubbles contained in the mixed liquid determined when assuming a mixed liquid obtained by mixing the liquids that have passed through the plurality of flow paths 11. When the bubble generation section 13 is a cavitation type device, in particular, it is preferable that the flow rate ratio is pre-associated with the bubble concentration according to the pressure, flow velocity, and flow rate of the liquid flowing into the flow path 11. Further, the flow rate ratio is associated with the state of the flow rate control member 16. On the scale display section 40, the bubble concentration determined from the state of each flow rate control member 16 corresponding to the state of the flow rate control member 16 is described as the value of the scale 41. The flow rate ratio control section 12 changes the flow rate ratio according to the concentration of the bubbles displayed on the scale display section 40 (the value indicated on the scale 41). Therefore, when the value of the scale 41 is determined, the target bubble concentration is specified, the flow rate ratio corresponding to the pressure, flow velocity, and flow rate of the liquid flowing into the flow path 11 is determined, and the state of the flow rate control member 16 is controlled so as to generally realize that flow rate ratio. Thereby, the flow rate ratio control section 12 changes the flow rate ratio according to the scale 41 of the scale display section 40.

[0058] Note that the scale display section 40 may have the scale 41 with equally spaced scales or a logarithmic scale. Also, in the example of FIG. 5A, the scale 41 was configured with a fixed design, but in the scale display section 40, the scale 41 may be configured with a digital display. It is sufficient that the scale 41 of the flow rate ratio control section 12 corresponds to the concentration of the fine bubbles finally contained in the liquid for the entire liquid flowing out from the outlet.

[0059] For example, in the example of FIG. 1, the flow rate ratio of the liquid flowing through the first flow path 11A to the liquid flowing through the second flow path 11B is the ratio of (the flow rate of the liquid flowing through the first flow path 11A):(the flow rate of the liquid flowing through the second flow path 11B), which is WA:WB, and the bubble concentration (number / cm 3) is N1, and when the bubble concentration of the liquid flowing through the second flow path 11B is approximately 0 (zero), the bubble concentration (NT) of the liquid (mixed liquid) determined for the entire liquid flowing out from the outlet is defined as N1×(WA / (WA + WB)). In the example of FIG. 1, the correspondence between the bubble concentration NT of the mixed liquid and WA:WB is previously associated. Also, since the rotation position of the knob corresponds to WA:WB, the rotation position of the knob can be associated with the bubble concentration NT. On the scale display unit 40, the value of the scale 41 is provided at a predetermined position so that the rotation position of the knob 42A and the bubble concentration NT can be recognized. For example, in FIG. 5A, the scale 41 indicates 2, and the flow rate control member 16 changes the flow rates of the liquid flowing through the first flow path 11A and the liquid flowing through the second flow path 11B as necessary so as to be WA:WB for realizing the value corresponding to the bubble concentration NT being 2.

[0060] In Modification 4, it is not limited to the case where the bubble concentration NT is associated with the rotation position of the knob 42A. For example, as shown in FIG. 5B, the knob 42A may be omitted, and the operation unit 42 of the flow rate ratio control unit 12 may be provided with an input unit 44 for the bubble concentration instead of the scale display unit 40 as a concentration display unit. The operation unit 42 previously records data on the correspondence between the flow rate ratio and the bubble concentration according to the pressure, flow velocity, and flow rate of the liquid flowing into the flow path 11. When the value of the bubble concentration is input at the input unit 44, the operation unit 42 determines the flow rate ratio according to conditions such as the pressure, flow velocity, and flow rate of the liquid based on the input value of the bubble concentration, and controls the state of the flow rate control member 16 so as to obtain the determined flow rate ratio.

[0061] That is, a computer storing a database such as a correspondence table showing the correspondence between various conditions regarding the liquid flowing into the flow path 11, such as "the pressure, flow velocity, and flow rate of the liquid, and the flow rate ratio", and the concentration of fine bubbles (bubble concentration) of the entire liquid flowing out from the outlet is provided in the bubble concentration adjusting device 10, and the input unit 44 is connected to the computer. The computer may control the state of the distribution valve 21 (the state of the flow rate control member 16) by referring to a database such as a correspondence table showing the correspondence between the above-described various conditions regarding the liquid flowing into the flow path 11 and the concentration of fine bubbles based on the value of the fine bubble concentration (bubble concentration value) input by the input unit 44. Note that the operation unit 42 preferably includes a display unit 43 on which the value input by the input unit 44 is displayed.

[0062] According to Modification Example 4, an operation for obtaining a liquid having a bubble concentration according to the operator's request can be performed while the operator visually recognizes it, and the possibility of erroneously generating a liquid having a bubble concentration unintended by the operator can be suppressed.

[0063] (Modification Example 5) With respect to the bubble concentration adjusting device 10 of Modification Example 4 (denoted as the bubble concentration adjusting device 10F in FIG. 4B), further, as shown in FIG. 4B, the flow rate ratio control unit 12 may have a state confirmation unit 30. This is referred to as Modification Example 5. FIG. 4B is a schematic configuration diagram for explaining an embodiment of the bubble concentration adjusting device 10F according to Modification Example 5.

[0064] The state confirmation unit 30 has a structure capable of confirming whether or not the states of the plurality of flow paths 11 are in a state where the bubble concentration (bubble concentration of the mixed liquid) determined by the operation unit 42 can be realized. In the example of FIG. 4B, the state confirmation unit 30 includes a flow rate sensor (first flow rate sensor 31A) for measuring the flow rate of the liquid flowing through the first flow path 11A and a flow rate sensor (second flow rate sensor 31B) for measuring the flow rate of the liquid flowing through the second flow path.

[0065] In the bubble concentration adjustment device 10F shown in the example of FIG. 4B, based on the measured values of the first flow rate sensor 31A and the second flow rate sensor 31B, the bubble concentration (bubble concentration based on actual measurement) of the entire liquid (mixed liquid) flowing out from the outlet is determined. In the bubble concentration adjustment device 10F, as shown in the example of FIG. 4B, a measurement result display unit 33 may be provided. The measurement result display unit 33 displays information (for example, a number indicating the difference value between the bubble concentration based on actual measurement and the value determined by the operation unit 42, etc.) for recognizing the presence or absence of a difference between the bubble concentration based on actual measurement and the bubble concentration determined by the operation unit 42. In the example of FIG. 4B, the first flow rate sensor 31A, the second flow rate sensor 31B, the measurement result display unit 33, and the operation unit 42 are wired-connected via wiring or the like so as to be able to transmit signals, but this is just an example, and they may be wirelessly connected so as to be able to transmit signals. The same applies to FIGS. 4C, 7, 9, and 10.

[0066] (Modification Example 6) In the bubble concentration adjustment device 10 (denoted as bubble concentration adjustment device 10G in FIG. 4C), as shown in FIG. 4C, a sensor 34 may be connected to the bubble generation unit 13. This is referred to as Modification Example 6. FIG. 4B is a schematic configuration diagram for explaining an embodiment of the bubble concentration adjustment device 10F according to Modification Example 6.

[0067] (Sensor) The sensor 34 is not particularly limited as long as it can detect any one or more of the pressure, flow velocity, and flow rate of the liquid flowing through the bubble generation unit 13. By comparing the state of the liquid flowing through the bubble generation unit 13 assuming that the bubble generation unit 13 is operating normally with the state of the liquid measured by the sensor 34, the normal operation of the bubble generation unit 13 can be confirmed.

[0068] [2. Tank System] The tank system of the present invention will be described.

[0069] [2-1. First Embodiment] [Configuration] As shown in FIG. 6, the tank system 200 according to the first embodiment includes a tank 210 as a tank body for storing a liquid (stored liquid GL) and a bubble concentration adjusting device 220. The bubble concentration adjusting device 220 includes a plurality of flow paths 270 (first flow path 270A, second flow path 270B), a flow rate control member 290, a flow rate ratio control unit 295, an inlet 260, an outlet 250, and a bubble generation unit 280, and the bubble concentration adjusting device 10 (including each modification) described in the above [1. Bubble concentration adjusting device] can be applied. The plurality of flow paths 270 (first flow path 270A, second flow path 270B), the flow rate control member 290, the flow rate ratio control unit 295, the inlet 260, the outlet 250, and the bubble generation unit 280 respectively correspond to the plurality of flow paths 11 (first flow path 11A, second flow path 11B), the flow rate control member 16, the flow rate ratio control unit 12, the inlet 14, the outlet (not shown), and the bubble generation unit 13 in the bubble concentration adjusting device 10. Therefore, a detailed description of each configuration of the bubble concentration adjusting device 220 is omitted. Note that FIG. 6 is a schematic configuration diagram for explaining the configuration of an example of the tank system according to the first embodiment. In the example of FIG. 6, the case where the bubble concentration adjusting device 10 shown in FIG. 1 is applied as the bubble concentration adjusting device 220 is illustrated.

[0070] (Tank) The tank 210 is not particularly limited as long as it has a space 230 capable of storing a liquid (stored liquid GL) inside. In the example of FIG. 6, the tank 210 has a structure with an opening 240 on the upper surface side, but this is just an example. Examples of the tank 210 include water storage tanks installed in various buildings such as buildings and condominiums, facilities such as pools, bathtubs provided in bathrooms and bathhouses, tanks for storing the cooling medium of a cooling device, storage tanks for storing liquids connected to various devices and sent to the devices, storage units mounted on cleaning devices, fuel storage tanks capable of storing emergency fuel, etc., water tanks for aquaculture of fish, etc., and water tanks for hydroponics.

[0071] (Arrangement of Tank and Bubble Concentration Adjusting Device) In the tank system 200, as long as the bubble concentration adjusting device 220 and the tank 210 are arranged such that the liquid is supplied to the tank 210 after passing through the bubble concentration adjusting device 220, the structure for arranging the tank 210 and the bubble concentration adjusting device 220 is not particularly limited. In the example of FIG. 6, the outlet 250 of the bubble concentration adjusting device 220 is located below the opening on the upper surface side of the tank 210 (inside the space 230), but this is just an example. As long as the liquid with bubbles (fine bubbles and ultra-fine bubbles) formed by passing through the first flow path 270A of the bubble concentration adjusting device 220 and the liquid passing through the second flow path 270B are supplied to the tank 210.

[0072] (Stored liquid discharge unit) In the first embodiment, as shown in FIG. 6, a stored liquid discharge unit 300 may be provided. The stored liquid discharge unit 300 is not particularly limited as long as it has a structure for allowing the liquid (stored liquid GL) stored in the tank 210 to flow out to the outside. The stored liquid discharge unit 300 has a discharge flow path 310 for sending the stored liquid to the outside. Further, if necessary, a pump 320 for sending the stored liquid GL into the discharge flow path 310 may be provided. The discharge flow path 310 can be formed using, for example, a pipe made of the same material as the piping member 20 constituting the flow path 11.

[0073] [Function and effect] In the tank system 200 according to the first embodiment, since the above-described bubble concentration adjusting device 220 is provided, the gas-liquid mixture with the adjusted bubble concentration flowing out from the outlet 250 can flow into the tank, and the gas-liquid mixture can be stored in the tank 210. Therefore, in the tank system 200 according to the first embodiment, it is possible to use the liquid (gas-liquid mixture) adjusted to various bubble concentrations according to the user's request as the stored liquid GL in the tank 210.

[0074] [Modification of the first embodiment] (Modification 1 of the first embodiment) In the tank system 200 (tank system 200A in FIG. 7) according to the first embodiment, as shown in FIG. 7, an inflow rate control structure 330 may be provided. This is referred to as Modification 1 of the first embodiment. FIG. 7 is a schematic configuration diagram for showing the configuration of an example of the tank system 200A according to Modification 1 of the first embodiment.

[0075] (Inflow rate control structure) The inflow rate control structure 330 includes a concentration sensor 331 that measures the bubble concentration in the stored liquid in the tank. Examples of the concentration sensor 331 include a sensor that applies the laser diffraction / scattering method. As the concentration sensor, a sensor device using a green laser can be used. In FIG. 7, reference numeral 332 is a wiring. The wiring 332 in FIG. 7 transmits a signal for controlling the state of the flow rate control member 290.

[0076] In the inflow control structure 330, the bubble concentration in the tank 210 is measured by the concentration sensor 331. When the value specified by the concentration sensor 331 becomes a different concentration from the desired concentration, the flow rate control member 290 is changed so that the bubble concentration of the entire liquid flowing from the outlet 250 of the bubble concentration adjusting device 220 into the tank 210 (the mixed liquid obtained by combining the liquids flowing through each of the plurality of flow paths) becomes a predetermined concentration, thereby controlling the flow rate ratio control unit 295. For example, when the bubble concentration M1 in the tank 210 is smaller than the desired bubble concentration M2, the state of the flow rate control member 290 is controlled as needed, and the gas-liquid mixture with a bubble concentration M3 flowing through the first flow path 270A from the bubble concentration adjusting device 220 is poured into the tank. The bubble concentration M3 is set to be higher than the bubble concentration M2. Then, when the bubble concentration in the tank 210 rises to M2, the input of the gas-liquid mixture from the bubble concentration adjusting device 220 is stopped. Also, when the bubble concentration M1 in the tank 210 is higher than the desired bubble concentration M4, the state of the flow rate control member 16 is controlled as needed, and the liquid flowing through the second flow path 270B from the bubble concentration adjusting device 220 (the bubble concentration is smaller than M4 or zero) is poured into the tank. Then, when the bubble concentration in the tank 210 drops to M4, the input of the gas-liquid mixture from the bubble concentration adjusting device 220 is stopped.

[0077] (Operation and Effect) When the bubble diameter is a fine bubble of, for example, less than 1 μm, such bubbles are supposed to exist in the liquid for a certain period. Therefore, according to the tank system 200 according to Modification 1 of the first embodiment, when changing the bubble concentration of the liquid (stored liquid GL) flowing from the outlet 250 into the tank 210, readjustment of the bubble concentration can be performed by adding a liquid with a different bubble concentration to the tank 210.

[0078] According to the tank system 200 according to Modification 1 of the first embodiment, by using in combination the position sensor described in Modification 2 of the first embodiment to be described later, it is also possible to set the bubble concentration to a desired value while setting the amount of the stored liquid in the tank 210 to a desired amount.

[0079] (Modification Example 2 of the First Embodiment) In the tank system 200A according to Modification Example 1 of the first embodiment, it may be configured to detect the liquid level in the tank 210 and replenish the liquid from the bubble concentration adjusting device 220 according to the liquid level in the tank 210 (not shown). This is referred to as Modification Example 2 of the first embodiment. Modification Example 2 of the first embodiment may be configured in the same manner as Modification Example 1 of the first embodiment, except that the concentration sensor 331 is used as a position sensor for detecting the position of the liquid level in the tank 210. According to Modification Example 2 of the first embodiment, it is possible to maintain a state in which a certain amount of the gas-liquid mixture with the adjusted bubble concentration is stored in the tank 210.

[0080] [2-2. Second Embodiment] [Configuration] The tank system 200 according to the first embodiment (denoted as the tank system 200B in FIG. 8) includes, as shown in FIG. 8, a tank for storing liquid (denoted as the tank 210A in FIG. 8) and a bubble concentration adjusting device 220. The bubble concentration adjusting device 220 can apply the bubble concentration adjusting device 10 described in the above [1. Bubble Concentration Adjusting Device] (including each modification example other than Modification Example 1 shown in FIG. 3A). Therefore, a detailed description of the bubble concentration adjusting device 220 is omitted. Note that FIG. 8 is a schematic configuration diagram for explaining the configuration of an example of the tank system according to the first embodiment. In the example of FIG. 8, the case where the bubble concentration adjusting device 10 shown in FIG. 1 is applied as the bubble concentration adjusting device 220 is illustrated.

[0081] (Tank) The tank 210A has a space 230 inside for storing liquid, and the internal space 230 is separated into a plurality of compartments, forming a plurality of space portions. In the example of FIG. 8, the internal space of the tank is partitioned into a first space portion 231A and a second space portion 231B as the space portions. In the example of FIG. 8, the tank 210A has a structure with an open upper surface side, but this is just an example. As the tank 210A, as described in the first embodiment, it can be a water storage tank installed in various buildings such as buildings and condominiums, a tank for storing a cooling medium of a cooling device, a storage tank for storing liquid connected to various devices and sent out to the devices, a storage unit mounted on a cleaning device, a fuel storage tank that can store emergency fuel, an aquarium for aquaculture of fish and the like, a water tank for hydroponics, and the like.

[0082] (Arrangement of Tank and Bubble Concentration Adjusting Device) In the tank system 200B, if the bubble concentration adjusting device 220 and the tank 210A are arranged such that the liquid is supplied from each outlet 250 to each space portion (the first space portion 231A and the second space portion 231B) of the tank 210A after passing through the bubble concentration adjusting device 220, the structure for arranging the tank 210A and the bubble concentration adjusting device 220 is not particularly limited. In the example of FIG. 8, the outlet 250 of the first flow path 270A is located directly above the first space portion 231A, and the outlet 250 of the second flow path 270B is located directly above the second space portion 231B, but this is just an example.

[0083] (Storage Liquid Discharge Unit) In the second embodiment, as shown in FIG. 8, a storage liquid discharge unit 300 (denoted as storage liquid discharge unit 300A in FIG. 8) is provided. The storage liquid discharge unit 300A is not particularly limited as long as it has a structure for allowing the storage liquid stored in each space portion (the first space portion 231A and the second space portion 231B) in the tank 210 to flow out to the outside. The storage liquid discharge unit 300A has a discharge flow path 310 for sending out the storage liquid in the tank 210A to the outside. The discharge flow path 310 can be formed using, for example, a pipe or the like made of the same material as the piping member 20 constituting the flow path 11. Further, in the example of FIG. 8, the discharge flow path 310 has a first discharge flow path 310A for flowing the storage liquid stored in the first space portion 231A and a second discharge flow path 310B for flowing the storage liquid stored in the second space portion 231B. The first discharge flow path 310A and the second discharge flow path 310B are connected at a predetermined position and extend outside the tank 210A. The portion of the discharge flow path 310 that extends outside starting from the position where the first discharge flow path 310A and the second discharge flow path 310B are connected is referred to as a mixed storage liquid discharge path 310C. A liquid obtained by mixing the storage liquid in the first space portion 231A and the storage liquid in the second space portion 231B can flow through the mixed storage liquid discharge path 310C. Further, in the example of FIG. 8, a pump 320 for sending the storage liquid into the discharge flow path 310 is provided in the mixed storage liquid discharge path 310C. Further, as shown in FIG. 8, a control valve 321 configured to be able to change the liquid volume of the storage liquid flowing through the first discharge flow path 310A may be provided in the first discharge flow path 310A.

[0084] [Operation and Effect] In the tank system 200B according to the second embodiment, the above-described bubble concentration adjusting device 220A is provided, and the liquid flowing out from each outlet 250 can be stored in each space portion of the tank 210A. When taking out the liquid from the tank 210A, the liquid (gas-liquid mixture, etc.) stored in each space portion can be mixed and the liquid can be made to flow out to the outside. Therefore, in the tank system 200B according to the second embodiment, it is possible to make the liquid (gas-liquid mixture) adjusted to various bubble concentrations flow out to the outside of the tank 210A according to the user's request.

[0085] [2-3. Third Embodiment] [Configuration] The tank system 200 (denoted as tank system 200C in FIG. 9) according to the third embodiment has, as shown in FIG. 9, a tank 210B for storing a liquid, a flow path 340 for flowing the liquid, and a bubble generation unit 341. The tank 210B that can be used in the third embodiment is the same as the tank 210B described in the first embodiment, so a detailed description thereof will be omitted. Further, the bubble generation unit 341 is a device capable of generating bubbles having a bubble diameter of less than 1 μm in the liquid (stored liquid) in the tank 210B, and the same as the bubble generation unit 13 provided in the bubble concentration adjusting device 10 described in the above [1. Bubble Concentration Adjusting Device] may be applied, so a detailed description thereof will be omitted. Note that FIG. 9 is a schematic configuration diagram for explaining the configuration of an example of the tank system 200C according to the third embodiment.

[0086] (Flow Path) In the third embodiment, both the upstream end PA and the downstream end PB of the flow path 340 are connected to the space 230 in the tank 210B, and the liquid (stored liquid GL) in the tank 210B can flow through the flow path 340 in the direction of arrow FS and circulate between the tank 210B and the flow path 340. Further, a bubble generation unit 341 is provided in the flow path 340, and when the liquid flowing into the flow path 340 from the upstream end PA side of the flow path 340 passes through the bubble generation unit 341, bubbles are generated in the liquid. The flow path 340 can be formed using, for example, a pipe or the like formed of the same material as the pipe member 20 constituting the flow path 11.

[0087] (Stored liquid discharge unit) In the third embodiment, as shown in FIG. 9, a stored liquid discharge unit 300 may be provided. Since the stored liquid discharge unit 300 can have the same structure as that described in the first embodiment and the like, a detailed description thereof is omitted.

[0088] (Circulation flow rate control valve) In the tank system 200C, as shown in the example of FIG. 9, a circulation flow rate control valve 342 configured to be able to change the flow rate of the liquid (stored liquid GL) passing through the flow path 340 may be provided. The circulation flow rate control valve 342 may be applied with the same configuration as the control valve 22 described in Modification Example 3 of the bubble concentration adjustment device 10.

[0089] (Timer) In the tank system 200C, as shown in the example of FIG. 9, when the above-described circulation flow rate control valve 342 is provided, it is preferable that a timer 343 for setting the time for maintaining the state of the circulation flow rate control valve 342 such that the liquid flows through the flow path 340 is provided. The timer 343 is preferably a timer switch that controls the state of the circulation flow rate control valve 342 when the set time elapses. Further, it is preferable that the circulation flow rate control valve 342 has a function of opening and closing the flow path 340. In this case, in the tank system 200C, the opening state of the flow path 11 can be controlled so that the liquid flows through the flow path 11 only for the time determined by the timer 343.

[0090] In the tank system 200C according to the third embodiment, as the time of the timer 343, a time corresponding to a desired fine bubble concentration or ultrafine bubble concentration can be set. As the time determined by the timer 343, the time required until the bubble concentration (particularly, fine bubble concentration or ultrafine bubble concentration) of the stored liquid GL becomes a desired value is set, so that a gas-liquid mixture having bubbles (particularly, fine bubbles or ultrafine bubbles) at a desired concentration can be obtained as the stored liquid GL.

[0091] [Operation and Effect] According to the tank system 200C according to the third embodiment, the stored liquid GL in the tank 210B flows into the flow path 340 from the upstream end PA side of the flow path 340, further passes through the bubble generation unit 341, and is returned from the downstream end PB of the flow path 340 to the tank 210B. Therefore, according to the third embodiment, the stored liquid GL in the tank 210B can be made into a liquid containing bubbles generated by the bubble generation unit 341. Further, by circulating the stored liquid GL in the flow path 340, the bubble concentration of the stored liquid GL can be increased according to the operation time of the bubble generation unit 341.

[0092] [Modification Example of the Third Embodiment] The tank system 200 (denoted as tank system 200D in FIG. 10) according to the third embodiment may include a liquid inflow unit 350 as shown in FIG. 10. This form is referred to as a modification example of the third embodiment. FIG. 10 is a schematic configuration diagram for explaining the configuration of an example of the tank system 200D according to the modification example of the third embodiment.

[0093] (Liquid Supply Unit) In a modification of the third embodiment, the liquid inflow unit 350 is not particularly limited as long as it can pour liquid from an external liquid supply source (not shown) into the tank 210B. The liquid inflow unit 350 has an inflow channel 351 for sending the liquid to the tank 210B. Further, if necessary, an inflow amount control valve 353 having a function of opening and closing the inflow channel 351 and a pump (not shown) for sending the stored liquid from an external liquid supply source into the inflow channel 351 may be provided. The inflow amount control valve 353 may be one having the same configuration as the control valve 22 described in Modification 3 of the bubble concentration adjustment device 10. In addition to the liquid inflow unit 350, except for the configuration of the inflow flow rate sensor 352 and the timer 343A described later, the tank system 200D according to the modification of the third embodiment has the same structure as the tank system 200C according to the third embodiment. Therefore, regarding the tank system 200D according to the modification of the third embodiment, except for the liquid inflow unit 350 and other configurations except for the configuration of the inflow flow rate sensor 352 and the timer 343A described later, detailed description thereof will be omitted. 。

[0094] (Inflow flow rate sensor) In the tank system 200D according to the modification of the third embodiment, as shown in FIG. 10, it is preferable to provide an inflow flow rate sensor 352 for detecting the flow rate (inflow amount) of the liquid flowing into the tank 210. The inflow flow rate sensor 352 can employ the same ones as the first flow rate sensor 31A, the second flow rate sensor 31B, etc. shown in Modification 5 described in [1. Bubble concentration adjustment device] above.

[0095] (Timer) In the tank system 200D, a timer 343 (denoted as timer 343A in FIG. 10) defines a time T1 for maintaining the state of the circulation flow control valve 342 and a time T2 for maintaining the state of the inflow amount control valve 353. The times T1 and T2 are determined based on the measured value of the inflow flow sensor 352, the amount of the stored liquid GL passing through the bubble generation unit 341, the desired bubble concentration (the target concentration of the bubble concentration of the stored liquid GL), and the desired amount of the stored liquid GL (the target volume of the stored liquid GL). For example, the difference between the current amount of the stored liquid GL and the target volume of the stored liquid GL and the difference between the current bubble concentration and the target concentration of the stored liquid GL are determined, and based on the measured value of the inflow flow sensor 352, the time for operating the bubble generation unit 341 can be specified as time T1, and the time for the liquid to flow from the liquid inflow unit 350 into the tank 210 can be specified as time T2.

[0096] In the tank system according to the modification of the third embodiment, the timer 343A is preferably a timer switch that changes the state of the circulation flow control valve 342 to close the inside of the flow path 340 upon the elapse of the set time T1, and changes the state of the inflow amount control valve 353 to close the inside of the inflow flow path 351 upon the elapse of the set time T2. In this case, the liquid flows through the inside of the flow path 340 and the inside of the inflow flow path 351 only within the times (T1, T2) defined by the timer 343A.

[0097] According to the tank system 200D according to the modification of the third embodiment, even if the bubble concentration of the stored liquid GL in the tank 210 fluctuates with the inflow of the liquid into the tank 210, it is possible to operate the bubble generation unit 341 until the bubble concentration of the stored liquid GL rises to a predetermined value, and it becomes easy to adjust the bubble concentration of the stored liquid GL.

[0098] According to the description of this specification, the following inventions can be grasped. (A1) having a plurality of flow paths for flowing a liquid, at least one of the flow paths is provided with a bubble generation unit capable of generating bubbles having a bubble diameter of less than 1 μm in the liquid, A flow rate ratio control unit for changing the flow rate ratio of the liquid flowing through the plurality of flow paths is provided so that the concentration of the bubbles can be adjusted by mixing the liquids flowing out from the plurality of flow paths. Bubble concentration adjusting device. (A2) In the bubble concentration adjusting device according to (A1) above, It is provided with a scale display unit showing the concentration of the bubbles, The flow rate ratio control unit changes the flow rate ratio according to the concentration of the bubbles displayed on the scale display unit. Bubble concentration adjusting device. (A3) In the bubble concentration adjusting device according to (A2) above, It has an inlet for receiving the liquid, The flow rate ratio control unit changes the flow rate ratio according to the pressure, flow velocity and flow rate of the liquid received from the inlet. Bubble concentration adjusting device. (A4) In the bubble concentration adjusting device according to (3) above, The inlet is common to the plurality of flow paths, The flow rate ratio control unit changes the flow rate ratio by changing the distribution ratio of the liquid distributed to each of the plurality of flow paths among the liquids supplied from the inlet. Bubble concentration adjusting device. (A5) In the bubble concentration adjusting device according to any one of (A1) to (A4) above, the bubbles are formed by cavitation generated in the liquid. Bubble concentration adjusting device. (A6) In the bubble concentration adjusting device according to any one of (A1) to (A5) above, a pump for sending the liquid from the inlet toward the plurality of flow paths is provided. Bubble concentration adjusting device. (A7) The bubble concentration adjusting device according to any one of (A1) to (A6) above, And a tank for storing the liquid, The bubble concentration adjusting device and the tank are arranged so that the liquid is supplied to the tank after passing through the bubble concentration adjusting device. Tank system. (A8) A tank for storing a liquid, and a flow path through which the liquid flows, wherein the flow path is provided with a bubble generation part that generates bubbles having a bubble diameter of less than 1 μm in the liquid, both the upstream end and the downstream end of the flow path are connected to the tank, and a timer for determining the time during which the liquid flows through the flow path is provided. Tank system. (A9) In the tank system according to (A7) above, it has a concentration sensor for measuring the bubble concentration of the liquid in the tank, and the flow rate ratio control part is controlled based on the value measured by the concentration sensor. Tank system. (A10) In the tank system according to (A8) above, the time of the timer is determined according to the desired fine bubble concentration or ultra-fine bubble concentration in the liquid stored in the tank. Tank system.

Explanation of symbols

[0099] 10: Bubble concentration adjusting device 11: Flow path 11A: First flow path 11B: Second flow path 12: Flow rate ratio control part 13: Bubble generation part 14: Inlet 15: Receiving flow path 16: Flow rate control member 20: Pipe member 21: Distribution valve 22: Control valve 40: Scale display part 41: Scale 100: Bubble generation device 200: Tank system 210: Tank 280: Bubble generation part 341: Bubble generation part 342: Circulation flow control valve 343: Timer

Claims

1. It has multiple channels through which liquid flows, Having an inlet for receiving the aforementioned liquid, The aforementioned inlet is common to multiple aforementioned flow paths, At least one of the flow channels includes a bubble generating unit capable of generating bubbles with a diameter of less than 1 μm in the liquid, A flow rate ratio control unit for changing the flow rate ratio of the liquids flowing through multiple channels so that the concentration of the bubbles can be adjusted by mixing the liquids flowing out from multiple channels, It comprises a scale display unit that indicates the concentration of the bubbles, The flow rate ratio control unit changes the flow rate ratio according to the concentration of the bubbles displayed on the scale display unit. Bubble concentration adjustment device.

2. In the bubble concentration adjustment device according to claim 1, Each of the aforementioned flow paths has a flow sensor for measuring the flow rate of the liquid flowing through it. The system includes a status confirmation unit that displays a value for the total bubble concentration of the outflowing liquid, determined based on the measurement value of the flow sensor. Bubble concentration adjustment device.

3. In the bubble concentration adjustment device according to Claim 1 or Claim 2, The flow rate ratio control unit changes the flow rate ratio according to the pressure, flow velocity, and flow rate of the liquid received from the inlet. Bubble concentration adjustment device.

4. In the bubble concentration adjustment device according to Claim 1 or Claim 2, The bubble generation unit is of the cavitation type. Bubble concentration adjustment device.

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