Solar battery module and manufacturing method of solar battery module

Abstract

To provide a solar battery module and a manufacturing method for the solar battery module that protects a perovskite layer from external air and moisture, thereby increasing durability.SOLUTION: A solar battery module according to an embodiment includes a laminate, a protective layer, and a sealing material. The laminate is formed by laminating a first electrode, a first photoactive layer, an intermediate conductive layer, a second photoactive layer made of a photoactive material having a perovskite crystal structure, and a second electrode. The protective layer covers at least the end faces of the second photoactive layer. The sealing material seals the laminate via the protective layer. The water vapor permeability coefficient of the protective layer is smaller than the water vapor permeability coefficient of the sealing material.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] FIELD OF THE INVENTION Embodiments of the present invention relate to a solar cell module and a method for manufacturing a solar cell module. [Background technology]

[0002] Known photoelectric conversion elements include those having a photoactive layer made of a material with a perovskite crystal structure (hereinafter referred to as a perovskite layer) as the photoactive layer.

[0003] In multilayer junction photovoltaic devices with perovskite layers, the perovskite layer is exposed at the edge due to its structure. Therefore, the perovskite layer is susceptible to damage from moisture generated from the encapsulant during encapsulation and from the vacuum and overheating conditions. Therefore, vacuum lamination is generally performed at low temperatures and for short periods of time to avoid damaging the perovskite layer. However, if the lamination conditions deviate from those recommended for the encapsulant, the crosslinking rate and gelation rate may be insufficient, preventing the encapsulant from achieving its intended performance. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] International Publication No. 2016 / 158838 Summary of the Invention [Problem to be solved by the invention]

[0005] The problem to be solved by the present invention is to provide a solar cell module in which the perovskite layer is protected from outside air and moisture and durability is improved, and a method for manufacturing the solar cell module. [Means for solving the problem]

[0006] The solar cell module of the embodiment includes a laminate, a protective layer, and a sealing material. The stack is formed by stacking a first electrode, a first photoactive layer, an intermediate conductive layer, a second photoactive layer made of a photoactive material having a perovskite crystal structure, and a second electrode. A protective layer covers at least the end faces of the second photoactive layer. The sealing material seals the laminate via the protective layer. The water vapor transmission coefficient of the protective layer is less than the water vapor transmission coefficient of the encapsulant. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a cross-sectional view showing a solar cell module according to a first embodiment. [Figure 2] FIG. 2 is a cross-sectional view showing a solar cell module according to a second embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, a solar cell module and a method for manufacturing a solar cell module according to an embodiment will be described with reference to the drawings.

[0009] [Solar cell module] (First embodiment) FIG. 1 shows a solar cell module 1 according to a first embodiment. The solar cell module 1 shown in FIG. 1 comprises a stack 7 including a first electrode 2, a first photoactive layer 3, an intermediate conductive layer 4, a second photoactive layer 5 made of a photoactive material having a perovskite crystal structure, and a second electrode 6 stacked together; a protective layer 8 covering the stack 7; and an encapsulant 9 sealing the stack 7 via the protective layer 8. The second electrode 6 comprises a transparent electrode layer 10 and a metal electrode layer 11. A first substrate 12 is provided on a surface 9a of the encapsulant 9 facing the first electrode 2. A second substrate 13 is provided on a surface 9b of the encapsulant 9 facing the second electrode 6. A first extraction electrode 14 is connected to the first electrode 2. A second extraction electrode 15 is connected to the metal electrode layer 11 of the second electrode 6. In the solar cell module 1 shown in Figure 1, light is taken in from the second electrode 6 side, and electricity is generated in the first photoactive layer 3 and the second photoactive layer 5, respectively, and the generated current is extracted from the first extraction electrode 14 and the second extraction electrode 15.

[0010] On the end face 7a of the laminate 7, the end face 3a of the first photoactive layer 3, the end face 4a of the intermediate conductive layer 4, the end face 5a of the second photoactive layer 5, and the end face 10a of the transparent electrode layer 10 are located.

[0011] In the solar cell module 1 shown in FIG. 1, a first buffer layer 16 may be provided between the second photoactive layer 5 and the protective layer 8, more specifically, between the intermediate conductive layer 4 and the second photoactive layer 5.

[0012] In the solar cell module 1 shown in FIG. 1, a second buffer layer 17 may be provided between the second photoactive layer 5 and the protective layer 8, more specifically, between the second electrode 6 and the second photoactive layer 5.

[0013] In the solar cell module 1 shown in FIG. 1, an anti-reflection layer 18 may be provided between the second photoactive layer 5 and the protective layer 8, more specifically, between the metal electrode layer 11 and the transparent electrode layer 10.

[0014] At the end surface 7a of the laminate 7, an end surface 16a of the first buffer layer 16, an end surface 17a of the second buffer layer 17, and an end surface 18a of the antireflection layer 18 are located.

[0015] The first electrode 2 can be made of any conventionally known material as long as it is conductive. Examples of materials that can be used for the first electrode 2 include gold, silver, copper, platinum, aluminum, titanium, iron, and palladium, with aluminum or silver being preferred.

[0016] The first photoactive layer 3 is composed of a crystalline silicon layer of a first conductivity type. The crystalline silicon constituting the first photoactive layer 3 can have a structure similar to that of silicon generally used in photovoltaic cells. Specific examples include crystalline silicon containing crystalline silicon such as single crystal silicon, polycrystalline silicon, and heterojunction silicon. The crystalline silicon may also be a thin film cut from a silicon wafer. The silicon wafer may be n-type silicon crystal doped with phosphorus, arsenic, or the like, or p-type silicon crystal doped with boron, gallium, or the like. Because electrons in p-type silicon crystal have a long diffusion length, p-type crystalline silicon is preferred as the first conductivity type crystalline silicon.

[0017] The thickness of the first photoactive layer 3 is preferably 50 μm to 500 μm, and more preferably 100 to 300 μm.

[0018] The intermediate conductive layer 4 is disposed so as to be in contact with the first photoactive layer 3. The intermediate conductive layer 4 electrically connects the bottom cell, which is mainly made of the first photoactive layer 3, to the top cell, which is mainly made of the second photoactive layer 5, while isolating them, and also has the function of guiding light that is not absorbed by the second photoactive layer 5 to the first photoactive layer 3.

[0019] The material of the intermediate conductive layer 4 can be selected from transparent or semi-transparent conductive materials. Examples of such materials include conductive metal oxide films. Specifically, indium oxide, zinc oxide, tin oxide, and their composites, such as indium tin oxide (ITO) and indium zinc oxide (IZO), can be used. The transparent conductive layer 204b made of such metal oxides can be formed by a commonly known method. Specifically, it can be formed by sputtering.

[0020] The total thickness of the intermediate conductive layer 4 is preferably 5 nm to 70 nm. If it is thinner than 5 nm, there will be many film defects, resulting in insufficient isolation of the layers adjacent to the intermediate conductive layer 4. If it is thicker than 70 nm, the light transmittance will decrease due to the diffraction effect, which may lead to a decrease in the amount of power generation on the first photoactive layer 3 side.

[0021] The second photoactive layer 5 is made of a photoactive material having a perovskite crystal structure. The perovskite crystal structure refers to the same crystal structure as perovskite. Typically, the perovskite structure is composed of ions A, B, and X, and may take on a perovskite structure when ion B is smaller than ion A. The chemical composition of this crystal structure can be expressed by the following general formula (1):

[0022] ABX3(1)

[0023] Here, A can be a primary ammonium ion. Specifically, CH3NH3 + (hereinafter referred to as MA), C2H5NH3 + , C3H7NH3 + , C4H9NH3 + , and HC(NH2)2 + (hereinafter referred to as FA), etc., + is preferable, but not limited to this. + , 1,1,1-trifluoro-ethylammonium iodide (FEAI) are also preferred, but are not limited to these.

[0024] Also, B is a divalent metal ion, Pb 2+ or Sn 2+ Preferably, but not limited to, X is a halogen ion, for example, F - , Cl - , Br - , I - , and At - Selected from Cl - , Br - , I - is preferred, but is not limited to this.

[0025] The materials that make up ions A, B, and X may each be a single material or a mixture. The constituent ions do not necessarily need to match the stoichiometric ratio of ABX3 to function.

[0026] The ions A constituting the perovskite of the second photoactive layer 5 preferably have an atomic weight or the sum of the atomic weights (molecular weight) of the ions constituting the ions of 45 or more. It is even more preferable to include ions of 133 or less. Because ions A satisfying these conditions have low stability alone, they may be mixed with common MA (molecular weight 32). However, mixing MA approaches the band gap of silicon (1.1 eV), which is undesirable for a tandem ion that splits wavelengths to improve efficiency, as this reduces the overall characteristics. Furthermore, if ions A are a combination of multiple ions and include Cs, it is more preferable that the ratio of the number of Cs to the total number of ions A is 0.1 to 0.9.

[0027] This crystal structure has a unit lattice such as a cubic, tetragonal, or rectangular crystal, with A at each vertex, B at the body center, and X at each face center of the cubic crystal centered around this. In this crystal structure, an octahedron consisting of one B and six Xs contained in the unit lattice is easily distorted by interaction with A, undergoing a phase transition to a symmetrical crystal. It is presumed that this phase transition dramatically changes the physical properties of the crystal, causing electrons or holes to be released from the crystal, resulting in electricity generation.

[0028] Increasing the thickness of the second photoactive layer 5 increases the amount of light absorption and the short-circuit current density (Jsc), but the carrier transport distance increases, which tends to increase loss due to deactivation. Therefore, there is an optimal thickness to obtain maximum efficiency. Specifically, the thickness of the second photoactive layer 5 is preferably 30 to 1000 nm, and more preferably 60 to 600 nm.

[0029] The transparent electrode layer 10 is a transparent or semi-transparent conductive layer. The transparent electrode layer 10 may have a structure in which multiple materials are laminated. Furthermore, since a transparent electrode transmits light, it can be formed on the entire surface of the laminate.

[0030] Materials for the transparent electrode layer 10 include conductive metal oxide films and translucent metal thin films. Specifically, films made of conductive glass (such as NESA) made of indium oxide, zinc oxide, tin oxide, and their composites, such as indium tin oxide (ITO), indium zinc oxide (IZO), fluorine-doped tin oxide (FTO), and indium zinc oxide are used. Aluminum, gold, platinum, silver, copper, and other metals are also used. Metal oxides such as ITO and IZO are particularly preferred. Transparent electrode layer 10 made of such metal oxides can be formed by commonly known methods. Specifically, it is formed by sputtering.

[0031] The thickness of the transparent electrode layer 10 is preferably 30 to 300 nm. If the thickness of the transparent electrode layer 10 is thinner than 30 nm, the conductivity tends to decrease and the resistance tends to increase. High resistance may cause a decrease in photoelectric conversion efficiency. On the other hand, if the thickness of the transparent electrode layer 10 is thicker than 300 nm, the flexibility of the electrode tends to decrease. As a result, if the thickness is too thick, cracks may occur when stress is applied. The transparent electrode layer 10 may have a single-layer structure or a multi-layer structure in which layers made of materials with different work functions are stacked.

[0032] The metal electrode layer 11 may be made of any conductive material, specifically, gold, silver, copper, platinum, aluminum, titanium, iron, palladium, or the like.

[0033] The metal electrode layer 11 has a shape in which a plurality of metal wires are arranged substantially in parallel. The thickness of the metal electrode layer 11 is preferably, for example, 30 to 300 nm. If the thickness of the metal electrode layer 11 is thinner than 30 nm, the conductivity tends to decrease and the resistance tends to increase. High resistance may cause a decrease in photoelectric conversion efficiency. If the thickness of the metal electrode layer 11 is 100 nm or less, it is preferable because it has optical transparency and can improve power generation efficiency and light emission efficiency. The metal electrode layer 11 may have a single layer structure or a multi-layer structure in which layers made of different materials are stacked.

[0034] In the solar cell module 1 shown in FIG. 1, the water vapor permeability coefficient of the protective layer 8 is smaller than the water vapor permeability coefficient of the sealing material 9 .

[0035] The water vapor permeability coefficient of the protective layer 8 is 0.1 g mm / m, which is lower than that of general sealing materials. 2 / day or less is preferable, and 0.08g·mm / m 2 / day or less is more preferable, and 0.02g·mm / m 2 / day or less is more preferable. If the water vapor transmission coefficient of the protective layer 8 exceeds the upper limit, the second photoactive layer 5 cannot be protected from the outside air and moisture.

[0036] The material of the protective layer 8 is not particularly limited as long as it has a water vapor permeability coefficient within the above range, but a paraxylylene-based polymer or an amorphous fluoropolymer is preferred because of its low water vapor permeability coefficient, excellent light transparency, and excellent adhesion to the second photoactive layer 5. The water vapor permeability coefficient of the paraxylylene-based polymer is 0.08 g mm / m 2 / day, and the water vapor permeability coefficient of amorphous fluoropolymer is 0.02 g·mm / m 2 / day. Furthermore, the water vapor transmission coefficient quantifies the permeability of the film material, but by using a material with high surface energy, it is possible to prevent the outflow of low molecular weight components such as water from the outside and the perovskite constituents from the inside. Surface energy can be measured by contact angle. The contact angle of EVA, a common sealing material, is 88.1°, while the contact angle of paraxylylene polymers is 114-149° and that of amorphous fluoropolymers is 112-114°.

[0037] A paraxylylene-based polymer is represented by the following formula (1), where C is carbon and X is selected from hydrogen or a halogen. One or more types of halogen are selected from chlorine, fluorine, etc. Some of the hydrogens bonded to the carbons constituting the six-membered ring can be substituted with halogen. One or more types of halogen are selected from chlorine, fluorine, etc. n represents a repeating structure. The following formula (2) represents a structure in which X is hydrogen and some of the hydrogens bonded to the carbons constituting the six-membered ring are substituted with chlorine, and represents a more preferred structure of a paraxylylene-based polymer. n represents a repeating structure.

[0038] [ka]

[0039] [ka]

[0040] The amorphous fluoropolymer is not particularly limited, but preferably has the structure shown in formula (3) below in the main chain. X represents an end group and contains carbon, oxygen, hydrogen, nitrogen, or silicon, with -CF3, -COOH, -CONH-C3H6-Si(OC2H5)3, -CONH-C2H4-N(C2H4-NH2)2, etc. being particularly preferred. n represents a repeating structure.

[0041] [ka]

[0042] The water vapor permeability coefficient of the material of the protective layer 8 can be measured, for example, by introducing water vapor onto one side of a film-shaped sample, passing through the film, and calculating the amount of water vapor detected on the opposite side of the film.

[0043] The thickness of the protective layer 8 is preferably 0.01 μm to 10 μm, more preferably 0.05 μm to 4 μm, and even more preferably 0.4 μm to 0.9 μm. If the thickness of the protective layer 8 is less than the lower limit, not only does the reduced thickness of the protective layer 8 increase gas permeation, but pinholes are more likely to occur, resulting in an insufficient water vapor permeability coefficient. Furthermore, this reduces the effectiveness of preventing the intrusion of low-molecular-weight components such as moisture generated during vacuum lamination and subsequent power generation. It also reduces the effectiveness of preventing the outflow of perovskite-forming components during vacuum lamination and subsequent power generation. These factors can lead to a deterioration in solar cell performance immediately after sealing and a shortened power generation time. If the thickness of the protective layer 8 exceeds the upper limit, the increased thickness of the protective layer 8 reduces gas permeation and pinhole occurrence, resulting in an adequate water vapor permeability coefficient, but reduces light transmission and the power generation capacity of the solar cell.

[0044] 1 illustrates an example in which the protective layer 8 covers the entire laminate 7, but the solar cell module of the embodiment is not limited to this. In the solar cell module of the embodiment, it is sufficient that the protective layer covers at least the end face of the second photoactive layer.

[0045] The sealing material 9 is not particularly limited, but examples thereof include ethylene vinyl acetate copolymer (EVA), polyolefin elastomer (POE), olefin-based thermoplastic elastomer (TPO), polyethylene, ionomer, silicone, and the like.

[0046] The water vapor permeability coefficient of the sealing material 9 is 10 g·mm / m 2 / day or less is preferable, and 1g·mm / m 2 / day or less is more preferable, and 0.9g·mm / m 2 / day or less is more preferable. When the water vapor transmission coefficient of the sealing material 9 is equal to or less than the upper limit, an inexpensive material can be used for the sealing material 9. Since the sealing material 9 is a material used for the entire module, the module can be manufactured inexpensively.

[0047] The water vapor permeability coefficient of the sealing material 9 can be measured by the same method as that for measuring the water vapor permeability coefficient of the material of the protective layer 8.

[0048] The thickness of the sealing material 9 is preferably 20 μm or more and 1000 μm or less, more preferably 200 μm or more and 500 μm or less, and even more preferably 300 μm or more and 500 μm or less. If the thickness of the sealing material 9 is above the lower limit, the mass increases and the module becomes rigid. If the thickness of the sealing material 9 is below the upper limit, the mass decreases and the flexibility of the module improves.

[0049] The first buffer layer 16 is a layer that transports and preferentially extracts electrons or holes, and functions as a hole transport layer or an electron transport layer.

[0050] The second buffer layer 17 is a layer that transports and preferentially extracts electrons or holes, and functions as a hole transport layer or an electron transport layer.

[0051] When the second buffer layer 17 functions as a hole transport layer or an electron transport layer, it is preferable that the second buffer layer 17 be made of an inorganic oxide. When the second buffer layer 17 functions as a hole transport layer, it is preferable that the second buffer layer 17 be made of titanium oxide. When the second buffer layer 17 functions as an electron transport layer, it is preferable that the second buffer layer 17 be made of tin oxide.

[0052] When the second buffer layer 17 is used as a hole injection layer, its thickness is preferably 30 nm or less, and may be 15 to 25 nm. This is because the film resistance as a hole injection layer can be reduced and the conversion efficiency can be increased. On the other hand, the thickness as a hole injection layer can be 5 nm or more.

[0053] When the second buffer layer 17 is used as an electron transport layer, its thickness is preferably 30 nm or less, and may be 15 to 25 nm. This is because the film resistance as an electron transport layer can be reduced and the conversion efficiency can be increased. On the other hand, the thickness as an electron transport layer can be 5 nm or more.

[0054] The antireflection layer 18 is made of one or more of halogen compounds such as lithium fluoride and magnesium fluoride, silicon nitride, etc. By providing the antireflection layer 18, it is possible to suppress the reflection of sunlight on the light-receiving surface side of the solar cell module 1.

[0055] The first substrate 12 and the second substrate 13 sandwich the laminate 7 coated with the protective layer 8 and the sealing material 9 to protect the laminate 7. Examples of the first substrate 12 include a glass substrate and a back sheet for a solar cell. Examples of the second substrate 13 include a glass substrate.

[0056] The first extraction electrode 14 and the second extraction electrode 15 are made of one or more conductive materials such as aluminum, silver, copper, and carbon.

[0057] In the solar cell module 1 shown in FIG. 1, the end surface 5a of the second photoactive layer 5 is covered with a protective layer 8 having a water vapor permeability coefficient lower than that of a typical sealing material. This protects the second photoactive layer 5 from outside air and moisture. Furthermore, because the protective layer 8 is formed inside the sealing material 9 and the water vapor permeability coefficient of the protective layer 8 is lower than that of the sealing material 9, the second photoactive layer 5 is not exposed to moisture generated from the sealing material 9 during sealing. Therefore, the second photoactive layer 5 is not damaged by moisture.

[0058] (Second embodiment) Figure 2 shows a solar cell module 100 of the second embodiment. In Figure 2, the same components as those in the solar cell module 1 shown in Figure 1 are denoted by the same reference numerals, and their description will be omitted. In addition to the solar cell module 1 shown in Figure 1, the solar cell module 100 shown in Figure 2 is provided with a second protective layer 101 that covers the protective layer (first protective layer) 8.

[0059] Examples of materials for the second protective layer 101 include materials similar to those for the first protective layer 8. The materials for the first protective layer 8 and the second protective layer 101 may be the same or different. When the materials for the first protective layer 8 and the second protective layer 101 are different, it is preferable that the water vapor permeability coefficient of the material for the first protective layer 8 is smaller than that of the material for the second protective layer 101. For example, it is preferable that the material for the first protective layer 8 is a paraxylylene-based polymer and the material for the second protective layer 101 is an amorphous fluoropolymer. In this case, the first protective layer 8 suppresses water vapor permeation, and the second protective layer 101 physically protects the second photoactive layer 5 and the laminate 7. In other words, pinholes generated in the first protective layer 8 can be covered by the second protective layer 101, thereby improving gas barrier properties through structural innovation.

[0060] The thickness of the second protective layer 101 is preferably 0.01 μm to 10 μm, more preferably 0.05 μm to 4 μm, and even more preferably 0.4 μm to 0.9 μm. If the thickness of the second protective layer 101 is less than the lower limit, not only will the reduced thickness of the protective layer 8 increase gas permeation, but pinholes will occur more frequently, resulting in an insufficient water vapor permeability coefficient. Furthermore, this will result in a decrease in the effectiveness of preventing the intrusion of low-molecular-weight components such as moisture generated during vacuum lamination and subsequent power generation. This will also result in a decrease in the effectiveness of preventing the outflow of components that constitute the perovskite during vacuum lamination and subsequent power generation. These factors can result in a decrease in solar cell performance immediately after sealing and a shortened power generation time. If the thickness of the second protective layer 101 is less than the upper limit, the increased thickness of the protective layer 8 reduces gas permeation and pinhole generation, resulting in an adequate water vapor permeability coefficient, but also a decrease in light transmission, resulting in a decrease in the power generation output of the solar cell.

[0061] The solar cell module 100 shown in Fig. 2 may have three or more protective layers. When three or more protective layers are provided, the materials of all the protective layers may be the same or different.

[0062] In the solar cell module 100 shown in FIG. 2, by providing the first protective layer 8 and the second protective layer 101, pinholes in the first protective layer 8 can be covered, and durability can be further improved.

[0063] The solar cell module of the embodiment can also be applied to a solar cell module having only one photoactive layer.

[0064] [Solar cell module manufacturing method] The manufacturing method of the solar cell module of the embodiment is a method of manufacturing the solar cell module of the embodiment, and includes a protective layer forming step of forming a protective layer on at least an end face of the second photoactive layer, and a sealing step of sealing the laminate with a sealing material via the protective layer by vacuum lamination.

[0065] A method for manufacturing a solar cell module according to an embodiment will be described with reference to FIG. In the protective layer forming step, the material of the protective layer 8 is applied to the end surface 7a of the laminate 7, and the material is cured to form the protective layer 8.

[0066] The amount of material to be applied for the protective layer 8 is not particularly limited, but is set so that the thickness of the protective layer 8 falls within a predetermined range.

[0067] The material for the protective layer 8 can be applied by, for example, synthesizing it from pyrolysis gas of the raw material, dipping, spin coating, or die coating.

[0068] In the sealing step, the laminate 7 is sealed with a sealing material 9 via the protective layer 8 by vacuum lamination.

[0069] In the manufacturing method of the solar cell module of the embodiment, the protective layer formation step is preferably performed before the sealing step. The second photoactive layer 5 and the laminate 7 are covered with a protective layer 8 having a low water vapor permeability coefficient, and then the laminate 7 is sealed with a sealing material 9 via the protective layer 8 by vacuum lamination. This reduces damage to the second photoactive layer 5 caused by moisture generated from the sealing material 9 during the sealing step. Furthermore, by covering the second photoactive layer 5 and the laminate 7 with the protective layer 8, the second photoactive layer 5 is prevented from being directly exposed to a reduced pressure during the sealing step, thereby reducing damage to the second photoactive layer 5 that would occur under vacuum and overheating conditions. While vacuum lamination is typically performed at a low temperature and for a short period of time, in the manufacturing method of the solar cell module of the embodiment, the second photoactive layer 5 and the laminate 7 are covered with a protective layer 8 having a low water vapor permeability coefficient, and the sealing step is performed under conditions that reduce moisture damage. This allows the same lamination conditions as those used for conventional silicon solar cells to be used. Furthermore, there are no restrictions on the lamination process of the encapsulant, and the inherent performance of the encapsulant can be exhibited without insufficient crosslinking rate or gelation rate.

[0070] Although several embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their modifications are included within the scope and spirit of the invention, as well as within the scope of the invention described in the claims and their equivalents. [Explanation of symbols]

[0071] 1...solar cell module, 2...first electrode, 3...first photoactive layer, 4...intermediate conductive layer, 5...second photoactive layer, 6...second electrode, 7...laminated body, 8...protective layer, 9...encapsulant, 10...transparent electrode layer, 11...metal electrode layer, 12...first substrate, 13...second substrate, 14...first extraction electrode, 15...second extraction electrode, 16...first buffer layer, 17...second buffer layer, 18...anti-reflection layer.

Claims

1. a stacked body including a first electrode, a first photoactive layer, an intermediate conductive layer, a second photoactive layer made of a photoactive material having a perovskite crystal structure, and a second electrode; a protective layer covering at least an end face of the second photoactive layer; a sealant that seals the laminate via the protective layer, The water vapor permeability coefficient of the protective layer is smaller than the water vapor permeability coefficient of the encapsulant.

2. The solar cell module according to claim 1 , wherein at least one of a buffer layer and an anti-reflection layer is provided between the second photoactive layer and the protective layer.

3. The water vapor permeability coefficient of the protective layer is 0.1 g mm / m ２ The solar cell module according to claim 1 , wherein the average power consumption is 100 W / day or less.

4. The solar cell module according to claim 1 , wherein the material of the protective layer is a paraxylylene-based polymer or an amorphous fluoropolymer.

5. 5. The solar cell module according to claim 4, comprising two or more protective layers, wherein the material of at least one of the protective layers is a paraxylylene-based polymer, and at least one of the protective layers outside the paraxylylene-based polymer protective layer is an amorphous fluoropolymer.

6. A method for manufacturing a solar cell module comprising: a stacked body formed by stacking a first electrode, a first photoactive layer, an intermediate conductive layer, a second photoactive layer made of a photoactive material having a perovskite crystal structure, and a second electrode; a protective layer covering at least an end face of the second photoactive layer; and a sealing material sealing the stacked body via the protective layer, a protective layer forming step of forming a protective layer on at least an end surface of the second photoactive layer; and a sealing step of sealing the laminate with a sealing material via the protective layer by vacuum lamination.

7. The method for manufacturing a solar cell module according to claim 6 , wherein the protective layer forming step is performed before the sealing step.

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