Composition, film, optical filter, and solid-state image sensor

Abstract

To provide a composition which enables formation of a film with superior solvent resistance, and to provide the film, an optical filter, and a solid-state imager sensor.SOLUTION: A composition is provided, comprising: an infrared-absorbing pigment; a compound B containing two or more groups represented by a formula (BI-1) within a molecule and having a molecular weight of 4000 or less, the compound being designed to generate an isocyanate group when heated at 170°C for 5 minutes; a resin C containing at least one group selected from a hydroxy group and carboxy group; and a solvent.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a composition containing an infrared absorbing dye, and also to a film, an optical filter, and a solid-state imaging device using the composition containing the infrared absorbing dye. [Background technology]

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color imaging, such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light receiving section. For this reason, an infrared cut filter is sometimes used to correct visibility.

[0003] The infrared cut filter is produced using a composition containing an infrared absorbing dye and a resin.

[0004] Patent Document 1 describes the production of an infrared cut filter or the like using a photosensitive composition that includes a near-infrared absorbing dye (A), a resin (B), a polymerizable compound (C), and a photopolymerization initiator (D), in which the resin (B) includes a resin (B1) having a blocked isocyanate group-containing monomer unit (b1) and an acidic group-containing monomer unit (b2). [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2023-050814 Summary of the Invention [Problem to be solved by the invention]

[0006] Since dye compounds have narrower band gaps as their absorption wavelengths increase, it has been difficult to achieve a HOMO (Highest Occupied Molecular Orbital)-LUMO (Lowest Unoccupied Molecular Orbital) level that allows for compatibility with various resistances (heat, light, radicals, oxidation, reduction, etc.). Therefore, infrared-absorbing dyes are easily decomposed by heat and other factors. For this reason, when forming a film using a composition containing an infrared-absorbing dye and a resin, efforts have been made to form the film at lower temperatures.

[0007] However, when a film is formed by film formation at a low temperature, the film may have insufficient curing properties, and there is room for further improvement in the solvent resistance of the resulting film.

[0008] According to the investigations of the present inventors, it has been found that even with the composition disclosed in Patent Document 1, the solvent resistance of the resulting film is insufficient, and there is room for further improvement.

[0009] Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent solvent resistance, and a film, an optical filter, and a solid-state imaging device. [Means for solving the problem]

[0010] The present invention provides the following:

[0011] <1> an infrared absorbing dye; Compound B, which contains two or more groups represented by formula (BI-1) in the molecule and generates an isocyanate group when heated at 170°C for 5 minutes, and has a molecular weight of 4000 or less; a resin C having at least one group selected from a hydroxy group and a carboxy group; a composition comprising: a solvent; [ka] In formula (BI-1), the wavy line represents a bond, and R represents a residue derived from a compound selected from an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, a pyrazole compound, a mercaptan compound, an imidazole compound, a triazole compound, and an imide compound. <2> R in the above formula (BI-1) is a group represented by any one of formulas (RB-1) to (RB-5). <1> the composition according to [ka] In the formula, * represents a bond, and R B-1 ~R B-11 each independently represents a hydrogen atom or a substituent, R B-1 and R B-2 may be bonded to each other to form a ring, R B-10 and R B-11 may be bonded to each other to form a ring. <3> The compound B is a compound represented by formula (b-1) or formula (b-2): <1> or <2> the composition according to [ka] In formula (b-1), R b1 and R b2 each independently represents a group represented by the above formula (BI-1), L b1 represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group; In formula (b-2), R b11 represents a group represented by the above formula (BI-1), R b12 represents a hydrogen atom or a substituent, L b11 represents a linking group having a valence of m+n, L b21 and L b22 each independently represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group, m represents an integer of 2 or more, n represents an integer of 0 or greater, m+n is an integer of 3 or greater. <4> L in the above formula (b-2) b11 is a group represented by any one of formulas (L-1) to (L-5), <3> the composition according to [ka] The wavy lines in the formula represent bonds. <5> The molecular weight of the compound B is 2500 or less. <1> ~ <4> The composition according to any one of the preceding claims. <6> The compound B is a compound that generates an isocyanate group when heated at 70 to 150°C for 5 minutes. <1> ~ <5> The composition according to any one of the preceding claims. <7> The infrared absorbing dye is at least one selected from a pyrrolopyrrole compound, a squarylium compound, a croconium compound, a polymethine compound, an indigo compound, a phthalocyanine compound, a naphthalocyanine compound, an iminium compound, a quaterrylene compound, an aminium compound, an azo compound, an anthraquinone compound, a porphyrin compound, an oxonol compound, and a hexaphyrin compound. <1> ~ <6> The composition according to any one of the preceding claims. <8> The composition satisfies the condition of formula (1-1): <1> ~ <7> the composition according to any one of the preceding claims; 0.2≦((B 1 ×M b1 ) / (C 1 ×M c1 ))≦2.0 (1-1) In formula (1-1), B 1 is the content (mmol / g) of the group represented by formula (BI-1) in compound B, M b1 is the content (mass%) of compound B in the composition, C 1 is the total content of hydroxyl groups and carboxyl groups in resin C (mmol / g), M c1 is the content (mass %) of resin C in the composition. <9> Further, the polymerizable compound <1> ~ <8> The composition according to any one of the preceding claims. <10> <1> ~ <9> A film obtained by using the composition according to any one of the above. <11> <10> An optical filter having the film according to claim 1. <12> <10> A solid-state imaging device having the film according to claim 1. [Effects of the Invention]

[0012] According to the present invention, it is possible to provide a composition capable of forming a film having excellent solvent resistance. The present invention also provides a film, an optical filter, and a solid-state imaging device. [Brief explanation of the drawings]

[0013] [Figure 1] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor. DETAILED DESCRIPTION OF THE INVENTION

[0014] The present invention will be described in detail below. In this specification, the symbol "to" is used to mean that the numerical values ​​before and after it are included as the lower limit and upper limit. In the description of groups (atomic groups) in this specification, when a notation does not specify whether they are substituted or unsubstituted, it encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups without a substituent (unsubstituted alkyl groups) but also alkyl groups with a substituent (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. In this specification, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In this specification, the weight average molecular weight and number average molecular weight are defined as values ​​converted into polystyrene by gel permeation chromatography (GPC) measurement. In this specification, Me in the chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved.

[0015] <Composition> The composition of the present invention comprises: an infrared absorbing dye; Compound B, which contains two or more groups represented by formula (BI-1) in the molecule and generates an isocyanate group when heated at 170°C for 5 minutes, and has a molecular weight of 4000 or less; a resin C having at least one group selected from a hydroxy group and a carboxy group; and a solvent.

[0016] The composition of the present invention can form a film having excellent solvent resistance, particularly when the film is formed at a low temperature of 150°C or less (preferably 120°C or less).

[0017] Although the detailed reasons for such effects are unclear, it is presumed that they are due to the following. Since the composition of the present invention contains an infrared-absorbing dye and further contains the compound B, heat escape is prevented when the composition is heated and cured. The heat is effectively utilized to facilitate elimination of the group R from the group represented by formula (BI-1) in the compound B to generate an isocyanate group, and curing of the composition proceeds rapidly, allowing a sufficiently cured film to be formed even when heated at a relatively low temperature. Furthermore, since the compound B is a relatively low-molecular-weight compound having two or more groups represented by formula (BI-1), it is presumed that the isocyanate group generated from the compound B can react with the hydroxyl group or carboxyl group of the resin C to form a dense crosslinked structure. For these reasons, it is presumed that the use of the composition of the present invention allows the formation of a film with excellent solvent resistance.

[0018] Generally, infrared absorbing dyes tend to have low light resistance, but the composition of the present invention, despite containing an infrared absorbing dye, can form a film with excellent light resistance in which fluctuations in spectral characteristics due to light irradiation are suppressed. The reason for this effect is presumably due to the formation of a dense crosslinked structure in the film by compound B and resin C.

[0019] Furthermore, the composition of the present invention can also form a film having excellent adhesion to the support. In particular, when forming a pattern by photolithography, even if the pattern size is further reduced, a film having excellent adhesion to the support can also be formed. The reason for such an effect is presumed to be that a dense crosslinked structure is formed in the film by compound B and resin C.

[0020] The composition of the present invention preferably satisfies the condition of formula (1-1), more preferably satisfies the condition of formula (1-2), and further preferably satisfies the condition of formula (1-3). According to this embodiment, compound B and resin C can form a denser crosslinked structure in the film, and a film with better solvent resistance can be formed.

[0021] 0.2≦((B 1 ×M b1 ) / (C 1 ×M c1 ))≦2.0 (1-1) 0.25≦((B 1 ×M b1 ) / (C 1 ×M c1 ))≦1.8 (1-2) 0.3≦((B 1 ×M b1 ) / (C 1 ×M c1 ))≦1.5 (1-3) In formulas (1-1) to (1-3), B 1 is the content (mmol / g) of the group represented by formula (BI-1) in compound B, M b1 is the content (mass%) of compound B in the composition, C 1 is the total content of hydroxyl groups and carboxyl groups in resin C (mmol / g), M c1 is the content (mass %) of resin C in the composition.

[0022] The composition of the present invention can be used as a composition for an optical filter. Types of optical filters include infrared cut filters and infrared transmission filters. Since the compound represented by formula (1) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0023] Each component used in the composition of the present invention will be described below.

[0024] <<Infrared absorbing dye>> The composition of the present invention contains an infrared absorbing dye. The infrared absorbing dye is preferably a compound having a maximum absorption wavelength in the wavelength range of 700 to 2000 nm. The maximum absorption wavelength of the infrared absorbing dye is preferably in the wavelength range of 700 to 1800 nm, more preferably in the wavelength range of 700 to 1600 nm, and even more preferably in the wavelength range of 700 to 1200 nm.

[0025] The infrared absorbing colorant may be either a pigment or a dye. In the case of a dye, the solubility in 100 g of propylene glycol methyl ether acetate at 25° C. is preferably 1 g or more, more preferably 2 g or more, and even more preferably 5 g or more.

[0026] Examples of the infrared absorbing dye include pyrrolopyrrole compounds, squarylium compounds, croconium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, iminium compounds, quaterrylene compounds, aminium compounds, azo compounds, anthraquinone compounds, porphyrin compounds, oxonol compounds, and hexaphyrin compounds, and the dye is preferably at least one selected from pyrrolopyrrole compounds, squarylium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, and naphthalocyanine compounds.

[0027] Examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP 2009-263614 A, the compounds described in paragraphs 0037 to 0052 of JP 2011-068731 A, and the compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873 A. Examples of squarylium compounds include the compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169 A, the compounds described in paragraph 0040 of WO 2016 / 181987 A, the compounds described in JP 2015-176046 A, the compounds described in paragraph 0072 of WO 2016 / 190162 A, and the compounds described in JP 2016-07464 A. Examples of the compounds include the compounds described in paragraphs 0196 to 0228 of Japanese Patent Publication No. 2017-067963, paragraph 0124 of Japanese Patent Application Laid-Open No. 2017 / 135359, the compounds described in Japanese Patent Application Laid-Open No. 2017-114956, the compounds described in Japanese Patent No. 6197940, the compounds described in Japanese Patent Application Laid-Open No. 2016 / 120166, and the compounds described in Table 1 of the specification of U.S. Patent No. 11261172. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, compounds described in JP 2015-172004 A, compounds described in JP 2015-172102 A, compounds described in JP 2008-088426 A, compounds described in paragraph 0090 of WO 2016 / 190162 A, compounds described in JP 2017-031394 A, compounds described in JP 2021-134350 A, compounds described in WO 2021 / 085372 A, compounds described in WO 2022 / 181422 paragraphs 0188 to 0192 A, and the like. Examples of croconium compounds include compounds described in JP-A-2017-082029 and compounds described in JP-A-2016-079331.Examples of iminium compounds include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564. Examples of phthalocyanine compounds include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020 / 071470. Examples of the naphthalocyanine compound include the compounds described in paragraph 0093 of JP-A No. 2012-077153 and the compounds described in JP-A No. 2022-173080.

[0028] Examples of the infrared absorbing dye include squarylium compounds described in JP-A-2017-197437, squarylium compounds described in JP-A-2017-025311, squarylium compounds described in WO 2016 / 154782, squarylium compounds described in Japanese Patent No. 5884953, squarylium compounds described in Japanese Patent No. 6036689, squarylium compounds described in Japanese Patent No. 5810604, squarylium compounds described in paragraphs 0090 to 0107 of WO 2017 / 213047, squarylium compounds described in Japanese Patent No. pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of JP-A No. 2018-054760, pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP-A No. 2018-040955, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP-A No. 2018-002773, squarylium compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of JP-A No. 2018-041047, amide-linked squarylium compounds described in JP-A No. 2017-179131, JP-A No. 2017-14121 compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP-A No. 5, dihydrocarbazole bis-type squarylium compounds described in JP-A No. 2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of JP-A No. 2017-068120, pyrrole ring-containing compounds (carbazole type) described in JP-A No. 2017-067963, phthalocyanine compounds described in JP-A No. 6251530, compounds described in JP-A No. 2019-127549, compounds described in WO 2022 Compounds described in JP 2022-151682 A, compounds described in JP 2022-188858 A, compounds described in JP 2022-184710 A, compounds described in JP 2022-189736 A, compounds described in WO 2023 / 052770 A, compounds described in JP 2022-189736 A, compounds described in JP 2023-007400 A, compounds described in JP 2023-109541 A, etc. can also be used.

[0029] The content of the infrared absorbing dye in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 1% by mass or more, still more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit of the content of the infrared absorbing dye is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less. The composition of the present invention may contain only one type of infrared absorbing dye, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0030] <<Specific compound (compound B)>> The composition of the present invention contains compound B (hereinafter also referred to as specific compound), which has two or more groups represented by formula (BI-1) in the molecule and generates an isocyanate group when heated at 170°C for 5 minutes, and has a molecular weight of 4000 or less. [ka]

[0031] In formula (BI-1), the wavy line represents a bond, and R represents a residue derived from a compound selected from an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, a pyrazole compound, a mercaptan compound, an imidazole compound, a triazole compound, and an imide compound.

[0032] In this specification, the "temperature at which an isocyanate group is generated by heating" refers to the temperature of an endothermic peak associated with the deprotection reaction of the group R in the group represented by formula (BI-1), as measured by DSC (Differential Scanning Calorimetry) analysis using a differential scanning calorimeter. A suitable differential scanning calorimeter is, for example, a differential scanning calorimeter (model: DSC6200) manufactured by Seiko Instruments Inc. However, the differential scanning calorimeter is not limited to the above-mentioned differential scanning calorimeter. The generation of isocyanate groups can be confirmed by infrared absorption spectroscopy. -1 It shows strong absorption in the range.

[0033] The molecular weight of the specific compound is preferably 2,500 or less, and more preferably 1,500 or less.

[0034] The specific compound preferably has 2 to 6 groups represented by formula (BI-1) in the molecule, and more preferably has 2 to 4 groups represented by formula (BI-1).

[0035] The group represented by formula (BI-1) is a group having a structure in which an isocyanate group is protected with a compound selected from an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, a pyrazole compound, a mercaptan compound, an imidazole compound, a triazole compound, and an imide compound (hereinafter, these compounds are collectively referred to as a blocking agent), and does not exhibit reactivity as an isocyanate group at room temperature (for example, 10 to 30°C), but upon heating or the like, a group derived from the blocking agent (R in formula (BI-1)) is eliminated from the group represented by formula (BI-1), thereby generating an isocyanate group.

[0036] The group represented by formula (BI-1) contained in the specific compound is preferably a group capable of generating an isocyanate group upon heating at 70 to 150°C for 5 minutes. That is, the specific compound is preferably a compound that generates an isocyanate group upon heating at 70 to 150°C for 5 minutes. The lower limit of the temperature at which the isocyanate group is generated is preferably 75°C or higher, more preferably 80°C or higher, from the viewpoint of storage stability. The upper limit of the temperature at which the isocyanate group is generated is preferably 130°C or lower, more preferably 120°C or lower, from the viewpoint of curability.

[0037] R in formula (BI-1) represents a residue derived from a compound selected from an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, a pyrazole compound, a mercaptan compound, an imidazole compound, a triazole compound, and an imide compound. From the viewpoint of ease of the protection reaction and the deprotection reaction, R is preferably a residue derived from a compound selected from an oxime compound, a lactam compound, an active methylene compound, and a pyrazole compound, more preferably a residue derived from a compound selected from an oxime compound, an active methylene compound, and a pyrazole compound, and even more preferably a residue derived from an active methylene compound.

[0038] Examples of the oxime compound include acetoxime, formaldoxime, cyclohexaneoxime, methyl ethyl ketoneoxime, cyclohexanoneoxime, and benzophenoneoxime. Examples of lactam compounds include ε-caprolactam and γ-butyrolactam. Examples of the phenolic compounds include phenol, naphthol, cresol, xylenol, and halogen-substituted phenols. Examples of the alcohol compound include methanol, ethanol, propanol, butanol, cyclohexanol, ethylene glycol monoalkyl ether, propylene glycol monoalkyl ether, and alkyl lactate. Examples of the amine compound include primary amines and secondary amines. The amine compound may be any of aromatic amines, aliphatic amines, and alicyclic amines, and specific examples include aniline, diphenylamine, ethyleneimine, and polyethyleneimine. Examples of the active methylene compound include diethyl malonate, dimethyl malonate, ethyl acetoacetate, di-n-butyl malonate, di-2-ethylhexyl malonate, and methyl acetoacetate. Examples of the pyrazole compound include pyrazole, methylpyrazole, dimethylpyrazole, 4-bromo-3,5-dimethylpyrazole, and 4-nitro-3,5-dimethylpyrazole. Examples of the mercaptan compound include alkyl mercaptans and aryl mercaptans. Examples of the imidazole compound include imidazole, 2-methylimidazole, 2-ethylimidazole, and 2-ethyl-4-methylimidazole. The triazole compound includes 1,2,4-triazole and the like. Examples of the imide compound include maleimide, succinimide, phthalimide, and derivatives thereof.

[0039] The molecular weight of R in formula (BI-1) is preferably 40 to 500, more preferably 50 to 300, and even more preferably 50 to 260. When the molecular weight of R is 40 or more, elimination of R at room temperature can be suppressed, and the storage stability of the composition can be improved. When the molecular weight of R is 500 or less, R can be eliminated by heat treatment at a low temperature (for example, 150°C or less), which makes it easy to proceed with the curing reaction and form a sufficiently cured film. Therefore, a film with excellent solvent resistance can be formed.

[0040] R in formula (BI-1) is preferably a group represented by any one of formulas (RB-1) to (RB-5). [ka] In the formula, * represents a bond, and R B-1 ~R B-11 each independently represents a hydrogen atom or a substituent, R B-1 and R B-2 may be bonded to each other to form a ring, R B-10 and R B-11 may be bonded to each other to form a ring.

[0041] R B-1 ~RB-6 , R B-10 and R B-11 is preferably a substituent. R B-7 ~R B-9 is preferably a hydrogen atom or a substituent. R B-1 ~R B-11 Examples of the substituent represented by include an alkyl group, an aryl group, a halogen atom, and a nitro group, and an alkyl group is preferred.

[0042] R in formula (RB-1) B-1 and R B-2 may be bonded to each other to form a ring. R in formula (RB-5) B-10 and R B-11 may be bonded to each other to form a ring. The ring formed above is preferably a 5-membered or 6-membered ring.

[0043] R in formula (BI-1) is preferably a residue derived from a compound selected from methyl ethyl ketone oxime, dimethylpyrazole, diethyl malonate, dimethyl malonate, ethyl acetoacetate, and methyl acetoacetate, and more preferably a residue derived from a compound selected from dimethylpyrazole, diethyl malonate, and ethyl acetoacetate.

[0044] Specific examples of the group represented by R in formula (BI-1) include the groups shown below: In the formula, * represents a bond.

[0045] [ka]

[0046] Specific examples of the group represented by formula (BI-1) include the groups shown below: In the formula, the wavy line represents a bond.

[0047] [ka]

[0048] The specific compound is preferably a compound represented by formula (b-1) or formula (b-2). [ka]

[0049] In formula (b-1), R b1 and R b2 each independently represents a group represented by the above formula (BI-1), L b1 represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group; In formula (b-2), R b11 represents a group represented by the above formula (BI-1), R b12 represents a hydrogen atom or a substituent, L b11 represents a linking group having a valence of m+n, L b21 and L b22 each independently represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group, m represents an integer of 2 or more, n represents an integer of 0 or greater, m+n is an integer of 3 or greater.

[0050] R in formula (b-1) b1 , R b2 and R in formula (b-2) b11 each independently represents a group represented by the above formula (BI-1).

[0051] L in formula (b-1) b1 , L in formula (b-2) b21 and L b22 each independently represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, and more preferably 6 to 15 carbon atoms. The cyclic aliphatic hydrocarbon group is preferably a 5- to 7-membered ring aliphatic hydrocarbon group, more preferably a 5- or 6-membered ring aliphatic hydrocarbon group, and even more preferably a 6-membered ring aliphatic hydrocarbon group. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, more preferably 6 to 15. The branched aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, more preferably 3 to 15. The branched aliphatic hydrocarbon group preferably has 2 to 10 branches, more preferably 2 to 6 branches.

[0052] L in formula (b-1) b1 , L in formula (b-2) b21 and L b22 The divalent linking group represented by is Aromatic hydrocarbon groups; cyclic aliphatic hydrocarbon groups; a branched aliphatic hydrocarbon group; and A group that combines a linear or branched aliphatic hydrocarbon group with at least one selected from an aromatic hydrocarbon group and a cyclic aliphatic hydrocarbon group. Examples include:

[0053] L in formula (b-1) b1 , L in formula (b-2) b21 and L b22 Specific examples of the divalent linking group represented by the formula include the groups shown below: The wavy line in the formula represents a bond. [ka]

[0054] L in formula (b-2) b11 represents a linking group having a valence of m+n. Examples of the linking group having a valence of m+n include a hydrocarbon group, a heterocyclic group, and -NR L101 -, -N<, -SO-, -SO2-, -CO-, -O-, -COO-, -OCO-, -S-, -NR L101 CO- and -CONR L101 - and groups combining two or more of these. L101represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and is preferably a hydrogen atom. Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and even more preferably 1 to 15 carbon atoms. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The cyclic aliphatic hydrocarbon group may be a monocyclic ring or a condensed ring. The cyclic aliphatic hydrocarbon group may have a crosslinked structure. The aromatic hydrocarbon group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and even more preferably 6 to 10 carbon atoms. The hydrocarbon group may have a substituent. The heterocyclic group may be a non-aromatic heterocyclic group or an aromatic heterocyclic group. The heterocyclic group is preferably a 5- or 6-membered ring. Examples of heteroatoms constituting the ring of the heterocyclic group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heterocyclic group may be a monocyclic group or a condensed ring. The heterocyclic group may have a substituent.

[0055] L in formula (b-2) b11 is preferably a group represented by any one of formulas (L-1) to (L-5), and more preferably a group represented by formula (L-1), formula (L-3) or formula (L-5). [ka] The wavy lines in the formula represent bonds.

[0056] R in formula (b-2) b12 represents a hydrogen atom or a substituent. b12 Examples of the substituent represented by include an alkyl group, an aryl group, and a group represented by formula (R-101). -NHCO-L b201 -R b201 ···(R-101)

[0057] In formula (R-101), L b201 represents a single bond or a divalent linking group, and R b201represents a hydrogen atom or a substituent. L b201 Examples of the divalent linking group represented by include a hydrocarbon group, a heterocyclic group, -CO-, -O-, -NH-, -COO-, -OCO-, -S-, -, and groups formed by combining two or more of these. R b201 Examples of the substituent represented by include an alkyl group, an aryl group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0058] In formula (b-2), m represents an integer of 2 or greater, and preferably an integer of 3 or greater. The upper limit of m is preferably 6 or less, more preferably 5 or less, and even more preferably 4 or less. In formula (b-2), n represents an integer of 0 or more, preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0. In formula (b-2), m+n is an integer of 3 or more, preferably an integer of 3 to 6, more preferably 3 or 4, and even more preferably 3.

[0059] The method for producing the specific compound is not particularly limited, and may be produced by a known method or may be produced with reference to a known method. For example, it can be produced with reference to the method described in paragraph 0296 of WO 2021 / 241557.

[0060] Specific examples of the specific compound include compounds A-1 to A-16 and B-1 to B-16 shown below. The molecular weight of each compound is shown in the "molecular weight" column, the content (mmol / g) of the group represented by the above formula (BI-1) of each compound is shown in the "BI group content" column, and the formation temperature (°C) of the isocyanate group of each compound is shown in the "NCO formation temperature" column.

[0061] [ka] [Table 1]

[0062] [ka] [Table 2]

[0063] The abbreviations in the above table are as follows: * and wavy lines in the following structural formulas each represent a bond. [ka] [ka] [ka] [ka] [ka]

[0064] The content of the specific compound in the total solid content of the composition is preferably 0.1 to 80% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 70% by mass or less, and more preferably 60% by mass or less. The composition of the present invention may contain only one type of specific compound, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0065] <<Resin>> The composition of the present invention contains a resin. The resin is blended, for example, to disperse pigments and the like in the composition or as a binder. Resins used primarily to disperse pigments and the like in the composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses.

[0066] The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0067] Examples of resins include (meth)acrylic resins, epoxy resins, enethiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. These resins may be used alone or in combination of two or more. Norbornene resins are preferred as cyclic olefin resins in terms of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, examples of the resin include the resins described in paragraphs 0091 to 0099 of WO 2022 / 065215, the resins described in JP 2020-122052 A, the resins described in JP 2020-111656 A, the resins described in JP 2020-139021 A, the resins described in JP 2017-138503 A containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, and the alkali metal acrylate resins described in JP 2020-186325 A. Water-soluble resins, resins represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, copolymers containing epoxy groups and acid groups described in International Publication No. 2022 / 030445, resins described in paragraphs 0199 to 0233 of Japanese Patent Application Publication No. 2020-186373, alkali-soluble resins described in Japanese Patent Application Publication No. 2020-186325, resins represented by Formula 1 described in Korean Patent Application Publication No. 10-2020-0078339, resins described in Japanese Patent Application Publication No. 2021-134350, and copolymers described in Japanese Patent Application Publication No. 2020-041046 can also be used. Furthermore, resins having a fluorene skeleton can also be preferably used as the resin. Examples of resins having a fluorene skeleton include resins described in U.S. Patent Application Publication No. 2017 / 0102610.Further, examples of the resin include the resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, the alkali-soluble resins described in JP 2020-186325 A, the resins represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339 A, the resins described in JP 2021-134350 A, the resins described in JP 2022-174597 A, and the resins described in WO 2022 / 014444. Copolymers containing epoxy groups and acid groups described in JP-A-2030445, resins described in JP-A-2018-135514, resins described in JP-A-2023-033156, resins described in JP-A-2023-030386, resins described in JP-A-2023-027753, resins described in JP-A-2023-074038, and resins described in JP-A-2023-079666 can also be used.

[0068] (Specific resin (resin C)) The composition of the present invention contains a resin C (hereinafter also referred to as a specific resin) having at least one group selected from a hydroxy group and a carboxy group. The specific resin may be a binder or a dispersant.

[0069] The weight average molecular weight of the specific resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0070] The total content of hydroxy groups and carboxy groups in the specific resin is preferably 8 mmol / g or less, more preferably 4 mmol / g or less, and the lower limit is preferably 0.2 mmol / g or more, more preferably 0.3 mmol / g or more.

[0071] The specific resin may be a resin having only one of a hydroxy group and a carboxy group, or may be a resin having both a hydroxy group and a carboxy group. The specific resin is preferably a resin having a carboxy group. When the specific resin is a resin having both hydroxy groups and carboxy groups, the molar ratio of the hydroxy groups to the carboxy groups in the specific resin is preferably 0.01 to 100 moles of carboxy groups per mole of hydroxy groups. The upper limit is preferably 90 moles or less, more preferably 70 moles or less. The lower limit is preferably 0.05 moles or more, more preferably 0.1 moles or more.

[0072] The specific resin may further have an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group that the specific resin has include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group.

[0073] When the specific resin has an ethylenically unsaturated bond-containing group, the content of the ethylenically unsaturated bond-containing group in the specific resin (hereinafter referred to as C=C value) is preferably 0.1 to 2.5 mmol / g. The upper limit is preferably 2.0 mmol / g or less, more preferably 1.8 mmol / g or less. The lower limit is preferably 0.2 mmol / g or more, more preferably 0.3 mmol / g or more.

[0074] The specific resin is preferably a resin containing a repeating unit having at least one group selected from a hydroxy group and a carboxy group in a side chain. The repeating unit having at least one group selected from a hydroxy group and a carboxy group in a side chain is preferably a repeating unit represented by formula (C1-1). [ka]

[0075] In the formula, Y c11 represents a trivalent linking group, L c11 represents a single bond or a divalent linking group, A c11 represents a group having at least one group selected from a hydroxy group and a carboxy group.

[0076] Y c11Examples of the trivalent linking group represented by include a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, and a polystyrene linking group. A poly(meth)acrylic linking group or a polyalkyleneimine linking group is preferred, and a poly(meth)acrylic linking group is more preferred.

[0077] L c11 Examples of the divalent linking group represented by the formula (I) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of these groups.

[0078] A c11 represents a group having at least one group selected from a hydroxy group and a carboxy group. c11 may be a hydroxy group or a carboxy group, or an organic group having at least one group selected from a hydroxy group and a carboxy group as a substituent. Examples of the organic group include hydrocarbon groups and heterocyclic groups. Examples of the hydrocarbon group include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, and groups combining these.

[0079] The content of the repeating unit represented by formula (C1-1) is preferably 1 mol% or more, more preferably 1 to 95 mol%, of all repeating units in the specific resin. The upper limit is preferably 90 mol% or less, more preferably 80 mol% or less. The lower limit is preferably 2 mol% or more, more preferably 5 mol% or more.

[0080] The specific resin may further contain a repeating unit having an ethylenically unsaturated bond-containing group. When the specific resin contains a repeating unit having an ethylenically unsaturated bond-containing group, the content of the repeating unit having an ethylenically unsaturated bond-containing group is preferably 1 to 80 mol% of all repeating units of the specific resin. The upper limit is preferably 70 mol% or less, more preferably 60 mol% or less. The lower limit is preferably 2 mol% or more, more preferably 5 mol% or more.

[0081] The specific resin may contain a repeating unit having a graft chain. In this specification, the graft chain refers to a polymer chain that branches off from the main chain of the repeating unit. The graft chain preferably has 40 to 10,000 atoms excluding hydrogen atoms, more preferably 50 to 2,000 atoms excluding hydrogen atoms, and even more preferably 60 to 500 atoms excluding hydrogen atoms.

[0082] The graft chain preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, polystyrene structures, polyurethane structures, polyurea structures, and polyamide structures; more preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, and polystyrene structures; even more preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, and poly(meth)acrylic structures; still more preferably contains repeating units of a polyester structure or a polyether structure; and particularly preferably contains repeating units of a polyester structure. The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an alkoxy group, and an alkylthioether group. Among these, from the viewpoint of improving the dispersibility of the pigment, a group having a steric repulsion effect is preferred, and an alkyl group or an alkoxy group having 5 to 30 carbon atoms is preferred. The alkyl group and alkoxy group may be linear, branched, or cyclic, and linear or branched is preferred.

[0083] The weight-average molecular weight of the repeating unit having a graft chain is preferably 1,000 or more, more preferably 1,000 to 10,000, and even more preferably 1,000 to 7,500. In this specification, the weight-average molecular weight of the repeating unit having a graft chain is a value calculated from the weight-average molecular weight of the raw material monomers used in the polymerization of the repeating unit. For example, the repeating unit having a graft chain can be formed by polymerizing a macromonomer. Here, the macromonomer refers to a polymer compound having a polymerizable group introduced at the polymer terminal. When the repeating unit having a graft chain is formed using a macromonomer, the weight-average molecular weight of the macromonomer corresponds to the repeating unit having a graft chain.

[0084] When the specific resin contains a repeating unit having a graft chain, the content of the repeating unit having a graft chain is preferably 1 to 60 mol% of all repeating units of the specific resin. The upper limit is preferably 50 mol% or less, more preferably 40 mol% or less. The lower limit is preferably 2 mol% or more, more preferably 5 mol% or more.

[0085] (other resins) The composition of the present invention may further contain a resin other than the specific resin described above (hereinafter also referred to as "other resin"). The other resin may be a binder or a dispersant.

[0086] The other resin is preferably a graft resin. Examples of the graft resin include a resin having a repeating unit with a graft chain. Examples of the graft chain include those described above.

[0087] The other resin is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less, a side chain having 40 to 10,000 atoms, and a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0088] The other resin is preferably a resin having a structure in which a plurality of polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

[0089] The other resin is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0090] The resin content of the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less. The content of the specific resin contained in the resin is preferably 50% by mass or more, more preferably 75% by mass or more, and even more preferably 90% by mass or more.

[0091] <<Solvent>> The composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, see paragraph 0223 of International Publication No. 2015 / 166779, the contents of which are incorporated herein by reference. Ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable methyl alcohols include ethylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol or 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount can be reduced to 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0092] The metal content of the organic solvent is preferably low. For example, the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, organic solvents with metal contents at the mass ppt (parts per trillion) level may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0093] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0094] The organic solvent may contain isomers (compounds with the same number of atoms but different structures), and may contain only one type of isomer or multiple types of isomers.

[0095] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0096] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0097] <<Pigment derivatives>> The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material that enhances the dispersibility of the pigment in the composition.

[0098] Examples of the pigment derivative include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

[0099] Examples of the dye structure include a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a quinacridone dye structure, an anthraquinone dye structure, a dianthraquinone dye structure, a benzisoindole dye structure, a thiazine indigo dye structure, an azo dye structure, a quinophthalone dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, a dioxazine dye structure, a perylene dye structure, a perinone dye structure, a benzimidazolone dye structure, a benzothiazole dye structure, a benzimidazole dye structure, and a benzoxazole dye structure. Of these, a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a phthalocyanine dye structure, a quinacridone dye structure, and a benzimidazolone dye structure are preferred, and a squarylium dye structure and a pyrrolopyrrole dye structure are more preferred.

[0100] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li + , Na + , K. + etc.), alkaline earth metal ions (Ca 2+ , Mg 2+ Examples of the carboxylic acid amide group include -NHCOR X1 As the sulfonamide group, a group represented by -NHSO2R is preferred. X2 As the imide acid group, a group represented by -SO2NHSO2R is preferred. X3 , -CONHSO2R X4 , -CONHCOR X5 or -SO2NHCOR X6 A group represented by the formula: -SO2NHSO2R is preferred. X3 is more preferable. X1 ~R X6 R each independently represents an alkyl group or an aryl group. X1 ~R X6 The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0101] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0102] Specific examples of pigment derivatives include compounds described in paragraphs 0037 to 0054 of WO 2016 / 035695, compounds described in paragraphs 0061 to 0086 of WO 2017 / 146092, compounds described in paragraphs 0017 to 0068 of WO 2018 / 230387, compounds described in paragraphs 0085 to 0099 of WO 2020 / 054718, compounds described in paragraph 0099 of WO 2020 / 054718, compounds described in paragraph 0124 of WO 2022 / 085485, benzimidazolone compounds or salts thereof described in JP 2018-168244 A, compounds having an isoindoline skeleton described in the general formula (1) of Japanese Patent No. 6996282, and the like.

[0103] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

[0104] <<Polymerizable compounds>> The composition of the present invention preferably contains a polymerizable compound. Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group. The polymerizable compound is preferably a radically polymerizable compound.

[0105] The polymerizable compound is preferably a monomer. The molecular weight of the polymerizable compound is preferably 100 to 2500. The upper limit is preferably 2000 or less, more preferably 1500 or less. The lower limit is preferably 150 or more, more preferably 250 or more.

[0106] The polymerizable compound is preferably a compound containing three or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond-containing groups, and even more preferably a compound containing 3 to 6 ethylenically unsaturated bond-containing groups. The polymerizable compound is preferably a trifunctional to 15functional (meth)acrylate compound, and more preferably a trifunctional to hexafunctional (meth)acrylate compound. Specific examples of the polymerizable compound include the compounds described in paragraphs 0075 to 0083 of International Publication No. 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0107] Preferred polymerizable compounds include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454 and SR499, commercially available from Sartomer).Examples of polymerizable compounds include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA, manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), and 8UH-1 006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), Aronix MT-3041, 3042 (manufactured by Toagosei Co., Ltd., polymerizable compounds containing amines), Aronix M-510, 520 (manufactured by Toagosei Co., Ltd., polymerizable compounds with acidic groups), Etercure 6361-100 (Eternal Examples of polymerizable compounds that can be used include EBECRYL80 (a tetrafunctional monomer containing an amine, manufactured by Daicel-Olknes Co., Ltd.), EBECRYL7100 (a bifunctional monomer containing an amine, manufactured by Daicel-Olknes Co., Ltd.), CN371NS (a bifunctional monomer containing an amine, manufactured by Arkema), HOA-MPL (2-acryloyloxyethyl-phthalic acid, manufactured by Kyoeisha Chemical Co., Ltd.), HOA-MPE (2-acryloyloxyethyl-2-hydroxyethyl-phthalic acid, manufactured by Kyoeisha Chemical Co., Ltd.), polymerizable compounds having a dendrimer structure or a hyperbranched structure described in JP 2023-043479 A, ​​and polymerizable compounds described in JP 2023-529984 A.

[0108] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group and a urethane bond as the polymerizable compound. By using such a compound, the heat resistance of the resulting film can be further improved. It is presumed that the reason for such an effect is that the urethane bond portion forms a physical crosslinked structure due to intermolecular hydrogen bonding. As the polymerizable compound having an ethylenically unsaturated bond-containing group and a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP 2022-173080 A can also be used.

[0109] A compound having a caprolactone structure can also be used as the polymerizable compound. Regarding the polymerizable compound having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, the contents of which are incorporated herein by reference. Examples of the compound having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0110] A compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used as the polymerizable compound. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0111] The polymerizable compound may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0112] It is also preferable to use a polymerizable compound that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0113] The content of the polymerizable compound in the total solid content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less. The composition of the present invention may contain only one polymerizable compound or may contain two or more polymerizable compounds. When two or more polymerizable compounds are contained, the total amount thereof is preferably within the above range.

[0114] <<Photopolymerization initiator>> When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light in the ultraviolet to visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0115] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, benzyl dimethyl ketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, hexaarylbiimidazole compound, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound, or 3-aryl-substituted coumarin compound, more preferably a compound selected from oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds, and even more preferably an oxime compound.Further, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, the peroxide-based photopolymerization initiators described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, the photopolymerization initiators described in WO 2018 / 221177 A, the photopolymerization initiators described in WO 2018 / 110179 A, ​​the photopolymerization initiators described in JP 2019-043864 A, the photopolymerization initiators described in JP 2019-044030 A, the peroxide-based initiators described in JP 2019-167313 A, and the aminoacetophenone-based initiators having an oxazolidine group described in JP 2020-055992 A. initiators, oxime-based photopolymerization initiators described in JP 2013-190459 A, polymers described in JP 2020-172619 A, compounds represented by formula 1 described in WO 2020 / 152120 A, compounds described in JP 2021-181406 A, photopolymerization initiators described in JP 2022-013379 A, ​​compounds represented by formula (1) described in JP 2022-015747 A, fluorine-containing fluorene oxime ester-based photoinitiators described in JP 2021-507058 A, Chinese Patent Application Publication Initiators described in JP 110764367 A, initiators described in JP 2022-518535 A, initiators described in WO 2021 / 175855 A, compounds described in Taiwan Patent Application Publication No. 202200534 A, compounds described in JP 2022-078550 A, compounds described in Korean Patent Publication No. 10-2017-0087330 A, compounds described in WO 2022 / 075452 A, oxime ester compounds described in Chinese Patent Application Publication No. 110066225 A, Korean Patent Publication No. Examples of the photopolymerization initiator include compounds described in WO 2019 / 013112, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062, oxime ester-based photopolymerization initiators described in Japanese Patent No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in WO 2019 / 013112, and photopolymerization initiators described in JP 2023-033731 A.

[0116] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0117] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0118] Examples of oxime compounds include compounds described in paragraph 0142 of International Publication No. 2022 / 085485, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738, compounds represented by the general formula (1) of JP-A-2021-173858, and compounds described in paragraphs 0022 to 0024, compounds represented by the general formula (1) of JP-A-2021-170089, and compounds described in paragraphs 0117 to 0120, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, compounds described in Korean Patent Publication No. 10-2022-0076157, and compounds described in paragraphs 0042 to 0062 of International Publication No. 2019 / 013112 having a triarylamine or N-arylcarbazole skeleton. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation; photopolymerization initiator 2 described in JP 2012-014052 A). It is also preferable to use a compound that is not colorable or that is highly transparent and does not easily discolor as the oxime compound. Commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0119] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0120] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0121] [ka] In formula (OX-1), X 1a represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring, R 1a represents a hydrogen atom or an acyl group, R 2a represents an alkyl group or an aryl group, R 3a and R 4a each independently represents a hydrogen atom or an alkyl group, Alk 1 and Alk 2 each independently represents an alkyl group, R 3a and R 4a may be bonded to form a ring, Alk 1 and Alk 2 may be bonded to form a ring, n represents 0 or 1.

[0122] X in formula (OX-1) 1aExamples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded together via a single bond or a linking group, a divalent group in which two or more heterocyclic rings are bonded together via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocyclic ring are bonded together via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings together, heterocyclic groups together, or aromatic rings and heterocyclic rings include -CH2-, -O-, -CO-, -S-, -NR x - and combinations thereof. x represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0123] X in formula (OX-1) 1a is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6). [ka] R in the formula X1 ~R X9 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0124] R X1 ~R X9 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0125] R X1 ~R X9The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0126] R X1 ~R X9 The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0127] R X1 ~R X9 The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0128] R X1 ~R X9 The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0129] R in formula (OX-1) 1a represents a hydrogen atom or an acyl group, and is preferably an acyl group. R 1a The acyl group represented by is -C(O)-R 101 R is preferably a group represented by 101 represents an aryl group or a heterocyclic group, and is preferably an aryl group.

[0130] R101 The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. 101 The aryl group represented by is preferably a phenyl group, a methylphenyl group or a naphthyl group, more preferably a methylphenyl group or a naphthyl group.

[0131] R 101 The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0132] R in formula (OX-1) 2a represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. R 2a The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 2a The alkyl group represented by is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. R 2a The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0133] R in formula (OX-1) 3a and R4a each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. R 3a and R 4a The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 3a and R 4a may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0134] Alk of formula (OX-1) 1 and Alk 2 each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk 1 and Alk 2 may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0135] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0136] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0137] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0138] [ka] In formula (OX-2), R 1b and R 2b each independently represents a substituent, R 3b ~R 7b each independently represents a hydrogen atom or a substituent, and Ar 1b represents an aromatic ring group or a heterocyclic group which may have a substituent; n represents 0 or 1;

[0139] R 1b and R 2b Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0140] R 3b ~R 7b Examples of the substituent represented by include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and aryl group include those described above. R 3b ~R 7bis preferably a hydrogen atom.

[0141] Ar 1b represents an aromatic ring group or a heterocyclic group which may have a substituent, Ar 1b is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0142] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0143] [ka] In formula (OX-3), Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, R 1c ~R 3c each independently represents a substituent, L 1c is a single bond or CR 11c R 12c represents R 11c and R 12c each independently represents a hydrogen atom, an alkyl group, or an aryl group; X 1c represents -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0144] R 1c and R 2cExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. R 2c is preferably an alkyl group having a branched or cyclic structure.

[0145] R 3c Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0146] Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0147] Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0148] k represents 0 or 1, and is preferably 0.

[0149] m represents an integer of 0 to 4, preferably 0 or 1, and more preferably 1.

[0150] Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0151] [ka] [ka] [ka] [ka]

[0152] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g / L using ethyl acetate as a solvent.

[0153] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, resulting in good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, thereby improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0154] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0155] <<Compounds with cyclic ether groups>> The composition of the present invention may contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. The epoxy group may be an alicyclic epoxy group. The alicyclic epoxy group refers to a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are condensed. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of epoxy compounds include compounds having one or more epoxy groups in one molecule, and compounds having two or more epoxy groups are preferred. The epoxy compound is preferably a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups contained in the epoxy compound can be, for example, 10 or less, or can be 5 or less. The lower limit of the number of epoxy groups contained in the epoxy compound is preferably 2 or more.

[0156] Examples of compounds having a cyclic ether group include the compounds described in paragraphs 0034 to 0036 of JP 2013-011869 A, paragraphs 0147 to 0156 of JP 2014-043556 A, and paragraphs 0085 to 0092 of JP 2014-089408 A, the compounds described in JP 2017-179172 A, the xanthene-type epoxy resins described in JP 2021-195421 A, and the xanthene-type epoxy resins described in JP 2021-195422 A can be used.

[0157] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 2000, or even less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the compound having a cyclic ether group is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0158] Commercially available compounds having a cyclic ether group include, for example, EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers).

[0159] The content of the compound having a cyclic ether group in the total solid content of the composition is preferably 0.1 to 20% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less. Only one type of compound having a cyclic ether group may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0160] <<Curing agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of JP 2016-075720 A or a compound described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0161] <<Chromatic colorants>> The composition of the present invention can contain a chromatic colorant. Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which an inorganic pigment or an organic-inorganic pigment is partially substituted with an organic chromophore. Substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore makes it easier to design the hue.

[0162] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that are not aggregated.

[0163] The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in an X-ray diffraction spectrum obtained using CuKα radiation as an X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0164] The specific surface area of ​​pigments is 1 to 300 m 2 / g. The lower limit is 10m 2 / g or more, and 2 / g or more is more preferable. The upper limit is 250m 2 / g or less, and 2 / g or less. The specific surface area value can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0165] The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments include the following.

[0166] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 178 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine type), 233 (quinoline type), 234 (amino ketone type), 235 (amino ketone type), 236 (amino ketone type), etc. (all yellow pigments), CIPigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments), CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,5 3:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150, 155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (all red pigments), CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type), etc. (all green pigments), CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc. (all purple pigments), CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0167] As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Other examples of green colorants that can be used include the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP 2020-070426 A, and the diarylmethane compounds described in JP 2020-504758 A.

[0168] As the blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0169] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP 2019-073695 A, and the methine dyes described in JP 2019-073696 A can be used.

[0170] As a red colorant, the compound described in paragraph 0034 of WO 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

[0171] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. Furthermore, the dyes can also include thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540.

[0172] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Application Laid-Open No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020 / 174991, isoindoline compounds or salts thereof described in Japanese Patent Application Laid-Open No. 2020-160279, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069442, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730, and compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730. Compounds represented by formula 1 described in Korean Patent Publication No. 0-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-180176, phenothiazine compounds described in Japanese Patent Application Laid-Open No. 2021-187913, halogenated zinc phthalocyanines described in International Publication WO 2022 / 004261, Halide zinc phthalocyanine described in Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, polymer dye described in Korean Patent Publication No. 10-2020-0061793, colorant described in JP 2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP 2020-090676 A, compounds described in JP 2020-055956 A, compounds described in JP 2021-031681 A, compounds described in JP 2022-056354 A, compounds described in U.S. Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP 2018-178039 A,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described in Journal of the Japan Color Materials Association (published in 2022) pages 80 to 84, compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, Korean Patent Publication No. 10-2017-0018993 Cyan pigments described in JP 2020-180176 A, isoindoline compounds described in JP 2023-013209 A, compounds described in JP 2023-013166 A, xanthene compounds described in WO 2023 / 286526 A, compounds described in JP 2021-155746 A, compounds described in JP 2021-155747 A, compounds described in JP 2021-155748 A, compounds described in JP 2021-155749 A, compounds described in WO 2018 / 051876 A, compounds described in JP 2020-083981 A, compounds described in JP 2023-056463 ​​A, compounds described in JP 2023-515473 A can also be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-like structure, or in both structures.

[0173] When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

[0174] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of chromatic colorants. Note that, "the composition of the present invention is substantially free of chromatic colorants" means that the content of chromatic colorants in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no chromatic colorants.

[0175] <<Coloring material that transmits infrared light but blocks visible light>> The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

[0176] The coloring material that blocks visible light is preferably a coloring material that absorbs light in the violet to red wavelength region. Furthermore, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Furthermore, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B): (A): Contains two or more chromatic colorants, and forms black by combining two or more chromatic colorants. (B): Contains an organic black colorant.

[0177] Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, CI Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in JP-A Nos. 01-170601 and 02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Color & Chemicals Co., Ltd.

[0178] When black is formed by combining two or more chromatic colorants, the combination of chromatic colorants may be, for example, the following embodiments (1) to (8). (1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant. (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant. (3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant. (4) An embodiment containing a yellow colorant and a purple colorant. (5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant. (6) An embodiment containing a purple colorant and an orange colorant. (7) An embodiment containing a green colorant, a purple colorant, and a red colorant. (8) An embodiment containing a green colorant and a red colorant.

[0179] When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass %. The lower limit is preferably 5 mass % or more, more preferably 10 mass % or more, even more preferably 20 mass % or more, and particularly preferably 30 mass % or more.

[0180] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of coloring materials that block visible light. Here, "the composition of the present invention is substantially free of coloring materials that block visible light" means that the content of coloring materials that block visible light in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no coloring materials that block visible light.

[0181] <<Surfactants>> The composition of the present invention may contain a surfactant. Various surfactants, such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants, can be used as the surfactant. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0182] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0183] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0184] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419 OIL (manufactured by Dow-Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, and KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.), and BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, and BYK-UV3510 (manufactured by BYK-Chemie). Compounds having the following structure can also be used as silicone surfactants. [ka]

[0185] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0186] <<Polymerization inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one type of polymerization inhibitor, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0187] <<Silane coupling agent>> The composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of the silane coupling agent include the compound described in paragraph 0177 of WO 2022 / 085485 and the compound described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, and more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0188] <<Ultraviolet absorber>> The composition of the present invention may contain an ultraviolet absorber, such as a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or a dibenzoyl compound. Examples of ultraviolet absorbers include compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, compounds described in paragraphs 0052 to 0072 of JP 2012-208374 A, compounds described in paragraphs 0317 to 0334 of JP 2013-068814 A, compounds described in paragraphs 0061 to 0080 of JP 2016-162946 A, compounds described in paragraphs 0059 to 0076 of WO 2016 / 181987 A, compounds described in paragraphs 0052 and 0074 of WO 2021 / 131355 A, Compounds described in paragraphs 0022 to 0024 of International Publication No. 2021 / 132247, compounds described in paragraph 0179 of International Publication No. 2022 / 085485, reactive triazine ultraviolet absorbers described in JP 2021-178918 A, ultraviolet absorbers described in JP 2022-007884 A, compounds described in Korean Patent Publication No. 10-2022-0014454, compounds described in JP 2023-013321 A, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 A can also be used. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF. Further, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0189] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, and ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be any of the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, WO 2017 / 006600, WO 2017 / 164024, and Korean Patent Publication No. 10-2019-0059371. The antioxidant content of the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The composition may contain only one antioxidant, or two or more antioxidants. When two or more antioxidants are contained, the total amount thereof is preferably within the above range.

[0190] <<Other ingredients>> The composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, compounds described in paragraph 0182 of WO 2022 / 085485 can be used. In addition, as chain transfer agents, thiol compounds described in JP 2020-109068 A can be used.

[0191] The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with ion-exchange resins, and purification with inorganic adsorbents such as hydrotalcite.

[0192] From the perspective of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably 0.05 ppb to 500 ppb, and even more preferably 0.1 ppb to 300 ppb, based on the total solids content of the composition. The composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using compounds that can be used as substitutes for perfluoroalkyl sulfonic acids and their salts, and compounds that can be used as substitutes for perfluoroalkyl carboxylic acids and their salts, a composition that is substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts, may be selected. Compounds that can be used as substitutes for restricted compounds include, for example, compounds that are exempt from restrictions due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above content does not preclude the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. The composition of the present invention may contain perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts, within the maximum allowable range.

[0193] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0194] <Containment Container> The container for storing the composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the container.

[0195] <Method for preparing the composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (application) to prepare the composition.

[0196] The preparation of the composition may include a process for dispersing the pigment. Mechanical forces used to disperse the pigment in the process include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. When grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads or increase the bead packing ratio to increase grinding efficiency. After the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, as described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, and in paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details on the materials, equipment, and processing conditions used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The composition may contain 1 to 10,000 ppm of the beads.

[0197] When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0198] <Membrane> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and can selectively transmit infrared rays of a specific wavelength or more.

[0199] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0200] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is sometimes formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include metal, metal oxide, and black matrix. If necessary, a primer layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0201] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include glass, resin, and other materials. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0202] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0203] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Moreover, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. Furthermore, the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0204] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength of over 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength of over 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength of over 1150 nm.

[0205] The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable that the film of the present invention and a color filter are laminated together to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0206] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication devices (for both transmission and reception), and image display devices.

[0207] <Membrane manufacturing method> The film of the present invention can be produced through a step of applying the composition of the present invention.

[0208] Examples of the support include those described above. As a method for applying the composition, known methods such as spin coating can be used. For example, the application method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0209] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0210] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0211] (When forming patterns using photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0212] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0213] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0214] Furthermore, the exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (for example, milliseconds or less).

[0215] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm 2 is preferable, and 0.05 to 1.0 J / cm 2 The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m 2 ~100,000W / m 2 (e.g., 5000W / m 2 , 15000W / m 2 , or 35,000 W / m 2 The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m 2, oxygen concentration 35% by volume, illuminance 20000W / m 2 etc.

[0216] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removal, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0217] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0218] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to heat the developed film to the above conditions. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0219] (When patterning using dry etching) Pattern formation by dry etching can be performed by applying the composition of the present invention to a support, curing the resulting composition layer to form a cured layer, forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas as a mask. Prebaking is preferably performed to form the photoresist layer. For details about pattern formation by dry etching, see paragraphs 0010 to 0067 of JP 2013-064993 A, the contents of which are incorporated herein by reference.

[0220] <Optical filters> The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

[0221] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040-0070 and 0119-0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255-0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0222] The optical filter of the present invention may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Furthermore, the optical filter may be formed directly on various elements.

[0223] <Solid-state imaging element> The solid-state imaging device of the present invention has the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration having the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0224] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area and transfer electrodes made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes exposed; a device protection film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention disposed on the device protection film. Furthermore, the device protection film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film of the present invention (on the side closer to the support), or a light-focusing means disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in spaces partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than the pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A and JP 2014-179577 A.

[0225] <Image display device> The film of the present invention can also be used in image display devices. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display devices to which the present invention can be applied. For example, the present invention can be applied to various types of liquid crystal display devices described in "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks. The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0226] <Infrared sensor> The film of the present invention can also be used in an infrared sensor. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. One embodiment of the infrared sensor will be described below with reference to the drawings.

[0227] In Fig. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0228] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range. There are no particular limitations on the color filter 112, and conventionally known color filters for pixel formation can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0229] 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0230] <Camera module> The film of the present invention can also be used in a camera module. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, a camera module can be configured to have a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0231] <Light-emitting element> The film of the present invention can also be used in a light-emitting device. The configuration of the light-emitting device is not particularly limited as long as it functions as a light-emitting device, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VICSELs). The film of the present invention may be formed directly on the light-emitting device or may be disposed on the light-emitting path.

[0232] <Optical communication element> The film of the present invention can also be used in optical communication elements. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path. [Example]

[0233] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In the structural formulas shown below, Me is a methyl group, i-Pr is an isopropyl group, and Ph is a phenyl group.

[0234] <Preparation of dye solution> A dye solution was prepared by mixing 8 parts by mass of the coloring matter (dye) shown in the table below and 92 parts by mass of the solvent shown in the table below.

[0235] [Table 3]

[0236] The materials listed in the table above are as follows:

[0237] (dye) DSQ-1: Compound with the following structure (infrared absorbing pigment, dye) [ka] DSQ-3: Compound with the following structure (infrared absorbing pigment, dye) [ka] DSQ-5: Compound with the following structure (infrared absorbing pigment, dye) [ka] DSQ-8: Compound with the following structure (infrared absorbing pigment, dye) [ka] DSQ-17: Compound with the following structure (infrared absorbing pigment, dye) [ka] DCY-1: Compound with the following structure (infrared absorbing pigment, dye) [ka] DCY-3: Compound with the following structure (infrared absorbing pigment, dye) [ka] DCY-4: Compound with the following structure (infrared absorbing pigment, dye) [ka] DCY-16: Compound with the following structure (infrared absorbing pigment, dye) [ka] DPP-1: Compound with the following structure (infrared absorbing pigment, dye) [ka]

[0238] (solvent) S-1: Propylene glycol monomethyl ether acetate

[0239] <Preparation of dispersion liquid> 2 parts by mass of a colorant (pigment) shown in the table below, 0.4 parts by mass of a derivative shown in the table below, 9 parts by mass of a dispersant shown in the table below, 28.6 parts by mass of a solvent shown in the table below, and 40 parts by mass of zirconia beads with a diameter of 0.3 mm were mixed, and the mixture was subjected to a dispersion treatment for 5 hours using a paint shaker. The beads were then separated by filtration to produce a dispersion.

[0240] [Table 4]

[0241] The materials listed in the table above are as follows:

[0242] (colorant) PCY-1: Compound with the following structure (infrared absorbing dye, pigment) [ka] PIN-1: A mixture of compounds having the following structure (mixing ratio: (PIN-1-a):(PIN-1-b):(PIN-1-c)=81:17:2, infrared absorbing dye, pigment) [ka] PPC-1: A mixture of compounds with the following structure (mixing ratio: (PPC-1-a):{(PPC-1-b)+(PPC-1-c)}:(PPC-1-d):(PPC-1-e)=7:19:59:15, infrared absorbing dye, pigment) [ka] PPP-1: Compound with the following structure (infrared absorbing dye, pigment) [ka]

[0243] (derivative) PCYS-1: a compound with the following structure PAZS-1: a compound with the following structure [ka]

[0244] (dispersant) D-1: A solution of a resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight-average molecular weight: 38,900, carboxyl group content: 1.770 mmol / g) adjusted to a solids concentration of 20% by mass with a mixed solution of propylene glycol monomethyl ether acetate: propylene glycol monomethyl ether = 9:1 (mass ratio) [ka] D-2: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the This represents the number of repeating units. Weight-average molecular weight: 21,000, carboxyl group content: 0.643 mmol / g, hydroxyl group content: 0.027 mmol / g, amine value: 47.0 mg KOH / g) in a mixed solution of propylene glycol monomethyl ether acetate: propylene glycol monomethyl ether = 9:1 (mass ratio) with a solids concentration adjusted to 20 mass%. [ka]

[0245] (solvent) S-1: Propylene glycol monomethyl ether acetate

[0246] <Production of Composition> Each material was mixed in one of the following proportions according to Formulations 1 to 4, and then filtered through a 0.45 μm nylon filter (manufactured by Nippon Pall Co., Ltd.) to produce each composition. In the table below, the ratio of the product of the content (mmol / g) of the group represented by formula (BI-1) of the specific compound and the content (% by mass) of the specific compound in the composition to the product of the content (mmol / g) of hydroxyl and carboxyl groups in the resin having at least one group selected from hydroxyl and carboxyl groups and the content (% by mass) of the resin having at least one group selected from hydroxyl and carboxyl groups in the composition is shown in the "Ratio 1" column. Dispersants D-1 and D-2 and resins E-1 to E-4 are materials that fall under the category of "resins having at least one group selected from hydroxyl and carboxyl groups."

[0247] <Prescription 1> Dispersion liquid shown in the table below: 16 parts by weight Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.45 parts by mass of a polymerizable compound listed in the table below 0.45 parts by mass of photopolymerization initiator listed in the table below Polymerization inhibitor (p-methoxyphenol) 0.001 parts by mass 0.0075 parts by weight of surfactant listed in the table below 23 parts by weight of solvent listed in the table below

[0248] <Prescription 2> Dispersion liquid shown in the table below: 16 parts by weight Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.40 parts by mass of a polymerizable compound shown in the table below 0.40 parts by mass of photopolymerization initiator listed in the table below Polymerization inhibitor (p-methoxyphenol) 0.001 parts by mass 0.0075 parts by weight of surfactant listed in the table below Other additives listed in the table below: 0.10 parts by mass 23 parts by weight of solvent listed in the table below

[0249] <Prescription 3> 15 parts by weight of the dye solution shown in the table below Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.45 parts by mass of a polymerizable compound listed in the table below 0.45 parts by mass of photopolymerization initiator listed in the table below Polymerization inhibitor (p-methoxyphenol) 0.001 parts by mass 0.00075 parts by weight of surfactant listed in the table below 23 parts by weight of solvent listed in the table below

[0250] <Prescription 4> 15 parts by weight of the dye solution shown in the table below Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.40 parts by mass of a polymerizable compound shown in the table below 0.40 parts by mass of photopolymerization initiator listed in the table below Polymerization inhibitor (p-methoxyphenol) 0.001 parts by mass 0.00075 parts by weight of surfactant listed in the table below Other additives listed in the table below: 0.10 parts by mass 23 parts by weight of solvent listed in the table below

[0251] <Prescription 5> Dispersion liquid shown in the table below: 16 parts by weight Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.0075 parts by weight of surfactant listed in the table below 24 parts by weight of solvent listed in the table below

[0252] <Prescription 6> 15 parts by weight of the dye solution shown in the table below Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.0075 parts by weight of surfactant listed in the table below 24 parts by weight of solvent listed in the table below

[0253] <Prescription 7> Dispersion liquid shown in the table below: 16 parts by weight Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.0075 parts by weight of surfactant listed in the table below Other additives listed in the table below: 0.10 parts by mass 24 parts by weight of solvent listed in the table below

[0254] <Prescription 8> 15 parts by weight of the dye solution shown in the table below Resins listed in the table below... Blend amounts listed in the table below Specific compounds listed in the table below... Blend amounts listed in the table below 0.0075 parts by weight of surfactant listed in the table below Other additives listed in the table below: 0.10 parts by mass 24 parts by weight of solvent listed in the table below

[0255] [Table 5] [Table 6] [Table 7] [Table 8]

[0256] The materials listed in the table above are as follows:

[0257] (dispersion) Dye solutions 1 to 10: Dye solutions 1 to 10 described above Dispersions 1 to 4: Dispersions 1 to 4 described above

[0258] (resin) E-1: Resin with the following structure (weight average molecular weight 14,000, carboxyl group content 1.375 mmol / g, the numbers attached to the main chain represent the mass ratio of the repeating unit.) [ka] E-2: Resin with the following structure (weight average molecular weight 40,000, carboxy group content 1.785 mmol / g, hydroxy group content 0 mmol / g, the numbers attached to the main chain represent the mass ratio of the repeating unit.) [ka] E-3: Resin with the following structure (weight average molecular weight 14,000, carboxy group content 1.392 mmol / g, hydroxy group content 1.392 mmol / g, the numbers attached to the main chain represent the mass ratio of the repeating unit) [ka] E-4: 257.3 g of propylene glycol monomethyl ether acetate was placed in a flask equipped with a stirrer, a dropping funnel, a condenser, a thermometer, and a gas inlet tube, and the mixture was stirred while purging with nitrogen and heated to 78° C. Next, a mixture of 22.4 g of dicyclopentanyl methacrylate, 17.2 g of methacrylic acid, 49.8 g of methyl methacrylate, and 63.0 g of malonic acid-2-[[[2-methyl-1-oxo-2-propenyl]oxy]ethyl]amino]carbonyl]-1,3-diethyl ester, and a solution of 11.0 g of 2,2'-azobis(2,4-dimethylvaleronitrile) dissolved in 78.7 g of propylene glycol monomethyl ether acetate were each added dropwise from the dropping funnel to the flask. After the dropwise addition was completed, the mixture was stirred at 78°C for 3 hours to synthesize a resin having the following structure (weight average molecular weight 9500, carboxy group content 1.339 mmol / g, hydroxy group content 0.730 mmol / g, and having a group represented by formula (BI-1)). [ka]

[0259] (Specific compound) A-1 to A-4, A-7 to A-10, A-12, A-14, A-16, B-2, B-7, B-8, B-10, B-12 to B-16: Compounds A-1 to A-4, A-7 to A-10, A-12, A-14, A-16, B-2, B-7, B-8, B-10, B-12 to B-16 shown as specific examples of the specific compound described above (all of these compounds contain two or more groups represented by formula (BI-1) in the molecule, and are compounds that generate an isocyanate group upon heating at 170°C for 5 minutes, and have a molecular weight of 4000 or less).

[0260] (polymerizable compound) M-1: Aronix M-305 (manufactured by Toagosei Co., Ltd., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. The pentaerythritol triacrylate content is 55% by mass to 63% by mass.) M-2: KAYARAD DPHA (a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.)

[0261] (Photopolymerization initiator) C-1 to C-3: Compounds with the following structures [ka]

[0262] (surfactant) H-1: Megafac RS-72-K (DIC Corporation, fluorine-based surfactant) H-2: Compound with the following structure (silicone surfactant, number average molecular weight 1800) [ka]

[0263] (additives) Ad-1 to Ad-2: Compounds having the following structure (antioxidants) Ad-3 to Ad-5: Compounds having the following structure (ultraviolet absorbers) Ad-6: Compound having the following structure (silane coupling agent) Ad-7: Compound (epoxy resin) with the following structure [ka]

[0264] (solvent) S-1: Propylene glycol monomethyl ether acetate

[0265] <Membrane production> (Production Example 1) Method for producing a film using the compositions of Examples 101 to 148 and Comparative Example 101 Each composition was applied to a glass substrate by spin coating, and then heated at 70°C for 1 minute using a hot plate to obtain a composition layer. The obtained composition layer was then heated at 500 mJ / cm using an i-line stepper. 2 The film was exposed at an exposure dose of 1000 ppm. The substrate was then spray-developed using an aqueous developer containing 0.12% of a nonionic surfactant and 0.04% of potassium hydroxide at 23°C, washed with ion-exchanged water, and air-dried. The exposed composition layer was then cured by heating at 120°C for 30 minutes using a hot plate to produce a film with a thickness of 1.5 μm.

[0266] (Production Example 2) Method for producing a film using the compositions of Examples 101 to 148 and Comparative Example 101 In Production Example 1, an i-line stepper was used, and 500 mJ / cm 2 Films having a thickness of 1.5 μm and having patterns (thin lines) with widths of 1 μm, 2 μm, 3 μm, 4 μm, or 5 μm were produced in the same manner as in Production Example 1, except that exposure was performed through a photomask with a stripe pattern having widths of 1 to 5 μm in 1 μm increments when exposing at an exposure dose of 1 μm.

[0267] (Production Example 3) Method for producing a film using the compositions of Examples 201 to 248 and Comparative Example 201 Each composition was applied to a glass substrate by spin coating, and then heated on a hot plate at 70°C for 1 minute to obtain a composition layer. The obtained composition layer was then cured by heating on a hot plate at 120°C for 30 minutes to produce a film with a thickness of 1.5 μm.

[0268] <Evaluation of Solvent Resistance> The films obtained in Production Examples 1 and 3 were immersed in propylene glycol monomethyl ether acetate at 23°C for 30 minutes, then washed with ion-exchanged water and air-dried. The optical density (OD) of the films was measured before and after immersion in propylene glycol monomethyl ether acetate, and the OD change rate was calculated using the following formula. Based on the OD change rate value, the solvent resistance was evaluated according to the following criteria. OD change rate = (|OD1-OD2| / OD1) x 100 OD1: Optical density of the film before immersion in propylene glycol monomethyl ether acetate OD2: Optical density of the film after immersion in propylene glycol monomethyl ether acetate -Evaluation criteria- A:OD change rate is less than 2% B: OD change rate is 2% or more but less than 4% C:OD change rate is 4% or more but less than 6% D:OD change rate is 6% or more

[0269] <Evaluation of Adhesion> The film obtained in Production Example 2 was observed with a scanning electron microscope (SEM) to confirm the minimum line width at which the thin lines remained without any defects, and the adhesion was evaluated according to the following criteria. -Evaluation criteria- A: Thin wires with a width of 2 μm or less remaining without any defects B: There are defects in thin wires with a width of 2 μm or less, but thin wires with a width of 3 μm or more remain without any defects. C: 5 μm wide thin wire with defects

[0270] <Evaluation of light resistance> The films obtained in Production Examples 1 and 3 were irradiated with light at 100,000 Lux for 50 hours using a xenon arc lamp light resistance tester. The spectral transmittance of the film was measured before and after light irradiation, and the spectral fluctuation rate ΔT was calculated using the following formula, and the light resistance was evaluated according to the following criteria. Spectral fluctuation rate ΔT = (|T02-T12| ÷ T02) × 100 T02: Transmittance at the maximum absorption wavelength of the film before light irradiation T12: Transmittance at the maximum absorption wavelength of the film after light irradiation -Evaluation criteria- A: Spectral fluctuation rate ΔT is less than 5% B: Spectral fluctuation rate ΔT is 5% or more and less than 8% C: Spectral fluctuation rate ΔT is 8% or more

[0271] [Table 9]

[0272] [Table 10]

[0273] As shown in the above table, the films obtained using the compositions of the examples had excellent solvent resistance. [Explanation of symbols]

[0274] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: flattening layer

Claims

1. an infrared absorbing dye; Compound B, which contains two or more groups represented by formula (BI-1) in the molecule and generates an isocyanate group when heated at 170°C for 5 minutes, and has a molecular weight of 4,000 or less; a resin C having at least one group selected from a hydroxy group and a carboxy group; a composition comprising: 【Chemical 1】 In formula (BI-1), the wavy line represents a bond, and R represents a residue derived from a compound selected from an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, a pyrazole compound, a mercaptan compound, an imidazole compound, a triazole compound, and an imide compound.

2. The composition according to claim 1, wherein R in formula (BI-1) is a group represented by any one of formulas (RB-1) to (RB-5): 【Chemistry 2】 In the formula, * represents a bond, and R Ｂ－１ ~R Ｂ－１１ each independently represents a hydrogen atom or a substituent, R Ｂ－１ and R Ｂ－２ may be bonded to each other to form a ring, R Ｂ－１０ and R Ｂ－１１ may be bonded to each other to form a ring.

3. The composition according to claim 1 or 2, wherein the compound B is a compound represented by formula (b-1) or formula (b-2): 【Chemistry 3】 In formula (b-1), R ｂ１ and R ｂ２ each independently represents a group represented by formula (BI-1), L ｂ１ represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group; In formula (b-2), R ｂ１１ represents a group represented by formula (BI-1), R ｂ１２ represents a hydrogen atom or a substituent, L ｂ１１ represents a linking group having a valence of m+n, L ｂ２１ and L ｂ２２ each independently represents a divalent linking group having an aromatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, or a branched aliphatic hydrocarbon group, m represents an integer of 2 or more; n represents an integer of 0 or more; m+n is an integer of 3 or more.

4. L in the formula (b-2) ｂ１１ is a group represented by any one of formulas (L-1) to (L-5); 【Chemistry 4】 The wavy lines in the formula represent bonds.

5. The composition according to claim 1 or 2, wherein the molecular weight of said compound B is 2,500 or less.

6. 3. The composition according to claim 1, wherein the compound B is a compound that generates an isocyanate group upon heating at 70 to 150°C for 5 minutes.

7. 3. The composition according to claim 1, wherein the infrared absorbing dye is at least one selected from the group consisting of a pyrrolopyrrole compound, a squarylium compound, a croconium compound, a polymethine compound, an indigo compound, a phthalocyanine compound, a naphthalocyanine compound, an iminium compound, a quaterrylene compound, an aminium compound, an azo compound, an anthraquinone compound, a porphyrin compound, an oxonol compound, and a hexaphyrin compound.

8. The composition according to claim 1 or 2, which satisfies the condition of formula (1-1); 0.2≦((B １ ×M ｂ１ ) / (C １ ×M ｃ１ ))≦2.0 ・・・(1-1) In formula (1-1), B １ is the content (mmol / g) of the group represented by formula (BI-1) in compound B, M ｂ１ is the content (mass%) of compound B in the composition, C １ is the total content (mmol / g) of hydroxy groups and carboxy groups in Resin C, M ｃ１ is the content (mass%) of resin C in the composition.

9. The composition according to claim 1 or 2, further comprising a polymerizable compound.

10. A film obtained using the composition according to claim 1 or 2.

11. An optical filter comprising the film of claim 10.

12. A solid-state imaging device comprising the film according to claim 10.

Images