Electromagnetic wave traveling direction control member and measurement system

Abstract

To provide an electromagnetic wave traveling direction control member and a measurement system that improve an accuracy of an installation of an electromagnetic wave traveling direction control member.SOLUTION: In an electromagnetic wave traveling direction control member 100 for controlling a traveling direction of an electromagnetic wave, the electromagnetic wave traveling direction control member 100 has a marker 1, a mark 2 is disposed on the marker 1, and is used for detecting a relative posture of the electromagnetic wave traveling direction control member 100 with respect to an observation position.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to an electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave and a measurement system. [Background technology]

[0002] High frequencies used in fifth-generation (5G) communication systems have a tendency to propagate in a direction that is very direct, making the elimination of coverage holes (areas where radio waves cannot reach) a key issue. To improve the propagation environment and propagation area, electromagnetic wave direction control components, such as frequency selective surfaces (FSSs), reflect arrays, and transmit arrays, that utilize metasurface technology, have been investigated (e.g., Patent Documents 1-2, Non-Patent Documents 1-2). FSSs have the function of transmitting or reflecting electromagnetic waves of a specific frequency band. Reflect arrays have the function of reflecting electromagnetic waves of a specific frequency band in a direction different from the specular reflection direction. Transmit arrays have the function of refracting electromagnetic waves of a specific frequency band in a desired direction. By appropriately installing electromagnetic wave direction control components at base stations, it is possible to improve the propagation environment and propagation area. Electromagnetic wave direction control components are advantageous in terms of installation and running costs compared to adding base stations or relay stations. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 5371633 [Patent Document 2] Patent No. 5162677 [Non-patent literature]

[0004] [Non-Patent Document 1] Mayumi Yoshino et al., "Improvement of received power in non-line-of-sight environments using meta-surface reflectors in L-shaped corridors," IEICE Technical Report, A·P2020-5 (April 2020) [Non-patent document 2] Hiroki Matsuno et al., "Development of a visible light transmitting metasurface reflector," IEICE Technical Report, 2020, Vol. 120, No. 9, pp. 13-17 Summary of the Invention [Problem to be solved by the invention]

[0005] It is desirable for an electromagnetic wave direction control member to be able to reflect or refract electromagnetic waves of a specific frequency incident from a base station in a desired direction. Therefore, the electromagnetic wave direction control member is designed so that the incident direction of the electromagnetic wave and the reflected or refracted direction of the electromagnetic wave are in the desired directions. Specifically, the incident direction of the electromagnetic wave and the reflected or refracted direction of the electromagnetic wave are designed taking into consideration the positional relationship between the base station, the electromagnetic wave direction control member, and the coverage hole, etc.

[0006] For an electromagnetic wave direction control member to exhibit desired characteristics, it must be installed at the designed position and attitude (angle). In particular, the attitude (angle) of the electromagnetic wave direction control member affects the incident, reflection, and refraction directions of the electromagnetic wave. Therefore, if the attitude (angle) of the electromagnetic wave direction control member deviates from the designed values, it may be difficult to achieve improvements in the propagation environment and propagation area. For example, as shown in FIG. 26(a), in a case where a base station 601, an electromagnetic wave obstacle 602, and a coverage hole 603 are located, if the electromagnetic wave direction control member 100 is installed at the designed position and attitude (angle), the electromagnetic wave can be reflected toward the coverage hole 603. In this case, if the attitude (angle) of the electromagnetic wave direction control member 100 deviates from the designed value, the reflection direction of the electromagnetic wave deviates, preventing the electromagnetic wave from reaching the coverage hole 60, as shown in FIG. 26(b). Furthermore, for example, as shown in Figure 27(a), when the electromagnetic wave direction control member 100 is installed on the installation surface 510 at the designed position and attitude (angle), the electromagnetic wave can be reflected in the desired reflection direction by the electromagnetic wave direction control member 100. In this case, if the attitude (angle) of the electromagnetic wave direction control member 100 deviates from the designed value, the reflection direction of the electromagnetic wave will deviate, as shown in Figure 27(b). Therefore, it is important to install the electromagnetic wave direction control member in the designed attitude (angle).

[0007] Furthermore, for an electromagnetic wave direction control element to exhibit the desired characteristics, it is necessary to understand the positional relationship between the base station, the electromagnetic wave direction control element, and the coverage hole in advance. When measuring the positional relationship between the base station, the electromagnetic wave direction control element, and the coverage hole, it is possible to refer to design drawings of the base station or the building. However, the actual building may differ from the design drawings. Furthermore, in reality, there may be electromagnetic obstacles, or electrical equipment such as outlets and lights, or firefighting equipment may be present on the installation surface where the electromagnetic wave direction control element is to be installed. This can make it difficult to install the electromagnetic wave direction control element according to the design. In such cases, the position and attitude (angle) of the electromagnetic wave direction control element may deviate from the installation values. Therefore, it is important to actually measure the positional relationship between the base station, the electromagnetic wave direction control element, and the coverage hole.

[0008] To grasp the relative positions of a base station, an electromagnetic wave direction control member, and a coverage hole, for example, an origin and coordinate axes are determined on a layout diagram, the coordinates of necessary elements such as the positions of the base station and coverage hole are measured, and the position and attitude (angle) of the electromagnetic wave direction control member are calculated by drawing a diagram. In this process, the actual measurement requires extremely complicated steps such as marking the floor or wall, and distance measurement. Furthermore, because the position and attitude (angle) of the electromagnetic wave direction control member are calculated indirectly from the relative positions of the base station, the electromagnetic wave direction control member, and the coverage hole, it is difficult to grasp the attitude (angle) of the electromagnetic wave direction control member in real time on-site. Therefore, it is difficult to fine-tune the attitude (angle) of the electromagnetic wave direction control member on-site.

[0009] The present disclosure has been made in consideration of the above-described circumstances, and aims to provide an electromagnetic wave direction control member and a measurement system that can improve the accuracy of installation of the electromagnetic wave direction control member. [Means for solving the problem]

[0010] One embodiment of the present disclosure provides an electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave, the electromagnetic wave propagation direction control member having a marker, the marker being used to detect the relative attitude of the electromagnetic wave propagation direction control member with respect to an observation position.

[0011] Another embodiment of the present disclosure provides an electromagnetic wave direction control member that controls the direction of propagation of an electromagnetic wave, the electromagnetic wave direction control member having a marker on the electromagnetic wave incident side of the electromagnetic wave direction control member.

[0012] Another embodiment of the present disclosure provides a measurement system including: an electromagnetic wave direction control member having a marker and controlling the direction of propagation of an electromagnetic wave; an imaging unit that images the marker; and a calculation unit that calculates the relative position and attitude of the electromagnetic wave direction control member with respect to the imaging unit using an image of the marker captured by the imaging unit.

[0013] Another embodiment of the present disclosure provides a measurement system including a marker placed on an installation surface on which an electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave is installed, an imaging unit that images the marker, and a calculation unit that uses an image of the marker captured by the imaging unit to calculate the relative position and attitude of the installation surface with respect to the imaging unit. [Effects of the Invention]

[0014] The present disclosure provides an advantage in that it is possible to improve the accuracy of installation of the electromagnetic wave direction control member. [Brief explanation of the drawings]

[0015] [Figure 1] 1 is a schematic plan view illustrating an electromagnetic wave direction control member according to the present disclosure. FIG. [Figure 2] 1A and 1B are schematic plan and cross-sectional views illustrating a marker according to the present disclosure. [Figure 3] 1A to 1C are process diagrams illustrating a method for manufacturing a marker according to the present disclosure. [Figure 4] 1A and 1B are partially enlarged views showing the results of photographing the marks of the first embodiment and the reference example of the marker of the present disclosure. [Figure 5] 1 is a graph showing the change in light intensity with respect to the change in position at the boundary between the black of the first layer and the white of the second layer in the first embodiment of the marker of the present disclosure. [Figure 6] 1 is a schematic plan view illustrating a marker according to the present disclosure. [Figure 7] 1A and 1B are schematic plan and cross-sectional views illustrating a marker according to the present disclosure. [Figure 8] 1A to 1C are process diagrams illustrating a method for manufacturing a marker according to the present disclosure. [Figure 9] 1 is a schematic cross-sectional view illustrating a marker according to the present disclosure. [Figure 10] 1A and 1B are schematic plan and cross-sectional views illustrating a marker according to the present disclosure. [Figure 11] 1A and 1B are schematic plan and cross-sectional views illustrating a marker according to the present disclosure. [Figure 12] 1 is a schematic cross-sectional view illustrating a marker according to the present disclosure. [Figure 13] 1A and 1B are schematic plan and cross-sectional views illustrating a marker according to the present disclosure. [Figure 14] FIG. 10 is an enlarged view of the vicinity of the second pattern to explain the cause of the occurrence of unwanted moire. [Figure 15] 1A and 1B are schematic cross-sectional views illustrating a first pattern and a second pattern of a marker according to the present disclosure. [Figure 16] FIG. 1 is a diagram illustrating a marker according to the present disclosure as viewed from an oblique direction. [Figure 17] 1A and 1B are schematic plan and cross-sectional views illustrating a marker according to the present disclosure. [Figure 18] 10 is a graph showing the effect of a light diffusing layer of a marker according to the present disclosure. [Figure 19] FIG. 1 is a diagram illustrating a marker according to the present disclosure as viewed from an oblique direction. [Figure 20]1 is a schematic plan view illustrating a marker according to the present disclosure. [Figure 21] 1 is a schematic plan view illustrating a marker according to the present disclosure. [Figure 22] 1 is a schematic plan view illustrating an electromagnetic wave direction control member according to the present disclosure. FIG. [Figure 23] 1 is a schematic cross-sectional view illustrating an example of an electromagnetic wave direction control member according to the present disclosure. [Figure 24] FIG. 1 illustrates an example measurement system according to the present disclosure. [Figure 25] FIG. 1 illustrates an example measurement system according to the present disclosure. [Figure 26] 10A and 10B are schematic diagrams illustrating the installation of an electromagnetic wave direction control member. [Figure 27] 10A and 10B are schematic diagrams illustrating the installation of an electromagnetic wave direction control member. DETAILED DESCRIPTION OF THE INVENTION

[0016] Embodiments of the present disclosure will be described below with reference to the drawings and the like. However, the present disclosure can be implemented in many different forms and should not be construed as being limited to the description of the embodiments exemplified below. Furthermore, to clarify the explanation, the drawings may show the width, thickness, shape, etc. of each part schematically compared to the actual form, but these are merely examples and do not limit the interpretation of the present disclosure. Furthermore, in this specification and each drawing, elements similar to those described above with reference to the previous drawings may be designated by the same reference numerals, and detailed descriptions may be omitted as appropriate.

[0017] In this specification, when describing an arrangement in which another component is disposed on a certain component, the term "above" or "below" refers to both cases in which another component is disposed directly above or below the component so as to be in contact with the component, and cases in which another component is disposed above or below the component via another component, unless otherwise specified. When describing an arrangement in which another component is disposed above a certain component, the term "above" or "below" refers to both cases in which another component is disposed directly above or below the component so as to be in contact with the component, and cases in which another component is disposed above or below the component via another component, unless otherwise specified. Furthermore, in this specification, when describing an arrangement in which another component is disposed on the surface of a certain component, the term "on the surface" refers to both cases in which another component is disposed directly above or below the component so as to be in contact with the component, and cases in which another component is disposed above or below the component via another component, unless otherwise specified.

[0018] In this specification, the terms plate, sheet, film, etc. are used, but in general, these are used in order of thickness, that is, plate, sheet, film, and so on, and this specification will follow that order. However, since there is no technical meaning in this distinction, these terms can be used interchangeably as appropriate.

[0019] In this specification, "transparent" means that at least light of a wavelength to be used is transmitted. For example, even if a material does not transmit visible light, if it transmits infrared light, it is treated as transparent when used for infrared applications.

[0020] Furthermore, the specific numerical values ​​specified in this specification include a general error range, i.e., a difference of about ±10% is not substantially different, and a range slightly exceeding the numerical range should be interpreted as being substantially within the range of this specification.

[0021] The electromagnetic wave direction control member and measurement system according to the present disclosure will be described below.

[0022] A.Electromagnetic wave direction control member The electromagnetic wave direction control member in the present disclosure has two embodiments, which will be described below separately.

[0023] A-1. First embodiment of electromagnetic wave direction control member A first embodiment of an electromagnetic wave propagation direction control member in the present disclosure is an electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave, and has a marker that is used to detect the relative attitude of the electromagnetic wave propagation direction control member with respect to an observation position.

[0024] Fig. 1 is a schematic plan view illustrating an electromagnetic wave direction control member according to the present disclosure. As shown in Fig. 1, the electromagnetic wave direction control member 100 has a marker 1. The marker 1 has a substantially square shape in plan view, and a plurality of marks 2 are arranged on the marker 1. Specifically, circular marks 2 are arranged near each of the four corners of the marker 1, for a total of four marks 2 arranged at intervals.

[0025] The marker 1 is used to detect the relative attitude of the electromagnetic wave direction control member 100 with respect to the observation position. That is, the relative attitude of the marker 1 with respect to the observation position (camera) can be detected from the image of the marker 1 captured by the camera. Then, based on the relative attitude of the marker 1 with respect to the observation position (camera), the relative attitude of the electromagnetic wave direction control member 100 with respect to the observation position (camera) can be detected.

[0026] Furthermore, the marker 1 can be used to detect not only the relative attitude of the electromagnetic wave direction control member 100 with respect to the observation position, but also the relative position of the electromagnetic wave direction control member 100 with respect to the observation position. In this case, the relative position and attitude between the observation position (camera) and the marker 1 can be detected from the results of capturing an image of the marker 1 by a camera. Then, based on the relative position and attitude between the observation position (camera) and the marker 1, the relative position and attitude between the observation position (camera) and the electromagnetic wave direction control member 100 can be detected.

[0027] Therefore, when an electromagnetic wave direction control member is installed on the propagation path of the electromagnetic wave from the base station, it is possible to install the electromagnetic wave direction control member as designed based on the relative position and attitude of the electromagnetic wave direction control member with respect to the observation position (camera).

[0028] Furthermore, it is possible to detect the relative position and attitude of the electromagnetic wave direction control member in real time. Therefore, it is possible to actually measure the position and attitude of the electromagnetic wave direction control member on-site in real time, thereby shortening the time required for measurements to install the electromagnetic wave direction control member and reducing costs. Furthermore, it is possible to fine-tune the position and attitude of the electromagnetic wave direction control member on-site in real time, thereby shortening the time required for positioning the electromagnetic wave direction control member and reducing costs. Furthermore, it is also possible to detect deviations in position and attitude after the electromagnetic wave direction control member has been installed.

[0029] Therefore, the accuracy of installation of the electromagnetic wave direction control member can be improved, and the electromagnetic wave direction control member can be made to exhibit desired characteristics.

[0030] In this specification, the "position of an electromagnetic wave direction control member" refers to, for example, spatial coordinates (x1, y1, z1) in a three-dimensional spatial coordinate system (x, y, z) in real space, where a location representing the position of the electromagnetic wave direction control member exists. The location representing the position of the electromagnetic wave direction control member can be determined in advance. It is easy to understand if the location representing the position of the electromagnetic wave direction control member is, for example, the center of the electromagnetic wave direction control member or a corner (such as the lower left corner) of the electromagnetic wave incident surface of the electromagnetic wave direction control member. Here, the origin and axis directions of the three-dimensional spatial coordinate system in real space can be determined arbitrarily. For example, when an electromagnetic wave direction control member is installed indoors, the indoor floor can be defined as the xz plane, the wall on which the electromagnetic wave direction control member is installed as the xy plane, and the corner of the hallway can be defined as the origin. This setting makes it easy to intuitively grasp the positional relationship and compare it with a layout diagram.

[0031] The "attitude of the electromagnetic wave direction control member" refers to the degree to which the electromagnetic wave incident surface of the electromagnetic wave direction control member has rotated from a reference direction relative to each coordinate axis of a three-dimensional spatial coordinate system in real space, and is expressed, for example, by a roll angle, pitch angle, or yaw angle. The roll angle refers to the angle of rotation around the x-axis, the pitch angle refers to the angle of rotation around the y-axis, and the yaw angle refers to the angle of rotation around the z-axis. First, a landmark is determined that is necessary to define the attitude of the electromagnetic wave incident surface of the electromagnetic wave direction control member. This landmark is used to express the attitude of the object, for example, whether the object is tilted up or down or left or right relative to the front direction, or whether it is rotating left or right around the front direction as an axis. For example, when an electromagnetic wave direction control member is assumed to be installed relative to the electromagnetic wave incident surface of the electromagnetic wave direction control member, the expected horizontal direction is the h-axis direction (the horizontal right-hand direction as viewed from the electromagnetic wave incident surface side is the positive direction), the vertical direction perpendicular to the h-axis within the electromagnetic wave incident surface is the v-axis direction (the upward direction when installed is the positive direction), and the normal direction to the electromagnetic wave incident surface of the electromagnetic wave direction control member is the f-axis direction (the direction toward the back as viewed from the electromagnetic wave incident surface side is the positive direction). In this way, the orientation of the electromagnetic wave direction control member in a three-dimensional coordinate system in real space can be defined using the orientations of the h-axis, v-axis, and f-axis set in the electromagnetic wave direction control member itself. Next, a reference orientation is determined for expressing the orientation of the electromagnetic wave direction control member in terms of roll angle, pitch angle, and yaw angle. The state in which the h-axis, v-axis, and f-axis directions set in the electromagnetic wave direction control member are parallel to the x-axis, y-axis, and z-axis directions of the three-dimensional spatial coordinate system in real space, respectively, is set as the reference attitude, and the roll angle, pitch angle, and yaw angle at this time are each set to 0 degrees. By defining the reference attitude in this way, the attitude of the electromagnetic wave direction control member in a certain state can be expressed as a state in which it is rotated around the x-axis, y-axis, and z-axis from the reference attitude. The rotation angles at this time are represented by the roll angle, pitch angle, and yaw angle, respectively.

[0032] Furthermore, the "relative position of the electromagnetic wave direction control member" and the "relative attitude of the electromagnetic wave direction control member" are obtained by interpreting the above-mentioned "position of the electromagnetic wave direction control member" and "attitude of the electromagnetic wave direction control member" in terms of another three-dimensional spatial coordinate system (x, y, z) with the observation position (camera) as the origin, as well as roll angle, pitch angle, and yaw angle. For example, if a three-dimensional spatial coordinate system is set with the imaging direction of the camera as the z-axis, the horizontal direction of the camera as the x-axis, and the vertical direction of the camera as the y-axis, and with the observation position (camera) as the origin, the z-coordinate of the relative position of the electromagnetic wave direction control member represents the distance between the observation position (camera) and the electromagnetic wave direction control member.

[0033] When actually designing and installing an electromagnetic wave direction control member, position information and attitude information in a three-dimensional spatial coordinate system of real space are required, but this can be read off from the "relative position of the electromagnetic wave direction control member" and "relative attitude of the electromagnetic wave direction control member" obtained with the observation position as the reference. In this case, for example, when installing an electromagnetic wave direction control member indoors, the position and orientation of the observation position (camera) can be adjusted and the coordinate axes of the three-dimensional spatial coordinate system with the observation position as the reference can be set so that, for example, the indoor floor is on the xz plane and the wall surface on which the electromagnetic wave direction control member is installed is on the xy plane, thereby aligning them with the three-dimensional spatial coordinate system of real space, making the readoff easier.

[0034] In addition, in this specification, the "position of the marker" refers to the spatial coordinates (x1, y1, z1) at which the marker is located in a three-dimensional spatial coordinate system (x, y, z) in real space, for example.

[0035] The "marker attitude" refers to the degree to which the marker's surface has rotated from a reference orientation relative to each coordinate axis of a three-dimensional spatial coordinate system in real space, and is expressed, for example, by a roll angle, pitch angle, and yaw angle. For example, the horizontal orientation (h-axis) on the marker's surface, the vertical orientation (v-axis) perpendicular to the h-axis on the marker's surface, and the normal orientation (f-axis) to the marker's surface are pre-set to define the marker's attitude. Next, a reference attitude is determined to express the marker's attitude in terms of roll angle, pitch angle, and yaw angle. The state in which the h-axis, v-axis, and f-axis set for the marker are parallel to the x-axis, y-axis, and z-axis of the three-dimensional spatial coordinate system in real space, respectively, is set as the reference attitude, and the roll angle, pitch angle, and yaw angle at this time are each set to 0 degrees. The attitude of the marker in a certain state can be expressed as a state rotated around the x-axis, y-axis, and z-axis from the reference attitude. The rotation angles at this time are represented by the roll angle, pitch angle, and yaw angle, respectively.

[0036] The "relative position of the marker" and the "relative attitude of the marker" are defined in the same way as the "relative position of the electromagnetic wave direction control member" and the "relative attitude of the electromagnetic wave direction control member" described above.

[0037] Based on information about the position on the electromagnetic wave direction control member where the marker is attached, the "relative position of the electromagnetic wave direction control member" and the "relative attitude of the marker" can be obtained from the "relative position of the marker" and the "relative attitude of the marker." For example, when a marker is attached to the electromagnetic wave direction control member and the horizontal direction, vertical direction, and front and back set in the marker are aligned with the intended horizontal direction, intended vertical direction, and front and back of the electromagnetic wave incident surface of the electromagnetic wave control member, the "relative attitude of the marker" and the "relative attitude of the electromagnetic wave direction control member" are the same.

[0038] Hereinafter, the electromagnetic wave direction control member according to the present disclosure will be described in detail for each of its components.

[0039] 1. Marker The markers in the present disclosure are used to detect the relative attitude of the electromagnetic wave direction control member with respect to the observation position. Preferably, the markers are used to detect the relative position of the electromagnetic wave direction control member with respect to the observation position.

[0040] The markers are not particularly limited as long as they can detect the relative position and orientation of the electromagnetic wave direction control member relative to the observation position, and known markers can be used. For example, two-dimensional markers include AR markers printed with figures or the like that serve as position and orientation indicators for displaying AR (augmented reality). Three-dimensional markers include the marker described by Machida et al., "Prototype of a Space Proximity Operation Sensor," Space Artificial Intelligence Robot Automation Symposium, pp. 51-54 (1988), in which the mark for reading position and orientation is composed of four marks at the vertices of a rectangle and one mark at the vertex of a pole erected in the center, and the marker described in Japanese Patent Laid-Open Publication No. 5-312521, in which the mark for reading position and orientation is formed by drilling holes in a metal plate with high precision and embedding them with resin. Also usable are markers with two or more marks described in International Publication No. 2022 / 075303, which are used in systems that acquire position and orientation by measuring the three-dimensional position of each mark with a stereo camera.

[0041] The marker may have a base layer, a first layer of a first color arranged on the electromagnetic wave incident side of the base layer, and a second layer of a second color different from the first color arranged partially on the electromagnetic wave incident side of the first layer. In this case, since the second layer is partially arranged on the electromagnetic wave incident side of the first layer, the mark can be configured by an area where the first layer of the first color is observed and an area where the second layer of the second color is observed.

[0042] The marker may also have a base layer of a third color different from the first color, and a first layer of the first color, partially disposed on the electromagnetic wave incident side of the base layer. In this case, since the first layer is partially disposed on the electromagnetic wave incident side of the base layer, the mark can be configured by an area where the base layer of the third color is observed and an area where the first layer of the first color is observed. When the marker has a base layer and a first layer, the marker can be made thinner than when the marker has a base layer, a first layer, and a second layer. In this case, it is easier to attach the marker to the electromagnetic wave propagation direction control member.

[0043] In both cases where the marker has a base layer and a first layer, and where the marker has a base layer, a first layer, and a second layer, the base layer may be a glass substrate or a ceramic substrate, as described below, or may be a paper substrate or a resin film. When a paper substrate or a resin film is used for the base layer, the weight of the marker can be reduced. In this case, it is easier to attach the marker to the electromagnetic wave direction control member.

[0044] Furthermore, when the marker has a base layer and a first layer, the first layer may be formed by photolithography using a resist material, or by printing. Similarly, when the marker has a base layer, a first layer, and a second layer, the first layer and the second layer may be formed by photolithography using a resist material, or by printing. In the case of printing, the marker can be easily produced.

[0045] As described below, if the position and posture of the electromagnetic wave direction control member are detected and the marker remains attached to the electromagnetic wave direction control member after the electromagnetic wave direction control member is installed, the marker and mark are preferably made of a material and have a shape that do not affect the performance of the electromagnetic wave direction control member. For example, it is preferable that the marker not be made of a metal material, that is, that the marker contain a non-metallic material. Examples of non-metallic materials include dielectrics. Even if a dielectric is used for the marker, if its thickness is greater than the wavelength of the target electromagnetic wave, it may affect the performance of the electromagnetic wave direction control member. Therefore, it is preferable that the overall thickness of the marker be equal to or less than ¼ of the wavelength of the target electromagnetic wave.

[0046] Among these, it is preferable that the marker has a base layer, a first layer of a first color that is disposed on the electromagnetic wave incident side of the base layer, and a second layer of a second color different from the first color that is partially disposed on the electromagnetic wave incident side of the first layer. Specifically, it is preferable that the marker be any of the following first to sixth embodiments. The relative position and attitude of the electromagnetic wave direction control member can be detected with high accuracy. Furthermore, the marker is easy to manufacture.

[0047] (1) First embodiment of the marker FIG. 2(a) is a schematic plan view illustrating a first embodiment of a marker according to the present disclosure, and FIG. 2(b) is a cross-sectional view taken along line AA in FIG. 2(a). As shown in FIG. 2(a), the marker 1 has a substantially square shape in plan view, and multiple marks 2 are arranged on the marker 1. In this embodiment, the marker 1 has a substantially square shape in plan view, with the corners of the square chamfered. Furthermore, circular marks 2 are arranged near each of the four corners of the marker 1, for a total of four marks 2 arranged at intervals. It is preferable that at least three marks 2 be arranged. This is because, for example, by calculating three center-of-gravity positions of the marks 2 from the observation results of the marks 2, the relative position and orientation between the observation position (camera) and the marker 1 can be accurately detected. Furthermore, if the number of marks 2 is more than three, for example, even if some of the marks 2 are obscured due to some obstruction, the relative position and orientation between the observation position (camera) and the marker 1 can be detected from the observation results of the remaining marks 2. Furthermore, by using a plurality of marks 2, the accuracy of detecting the relative position and orientation between the observation position (camera) and the marker 1 can be improved.

[0048] When an electromagnetic wave direction control member is installed on the propagation path of an electromagnetic wave from a base station, the marker 1 can be attached to the electromagnetic wave incident surface of the electromagnetic wave direction control member and used to determine the position and orientation of the electromagnetic wave direction control member. That is, the relative position and orientation between the observation position (camera) and the marker can be accurately detected from the results of capturing an image of the marker 1 by a camera. Then, based on the relative position and orientation between the observation position (camera) and the marker, the relative position and orientation between the observation position (camera) and the electromagnetic wave direction control member can be accurately detected. Furthermore, the electromagnetic wave direction control member can be installed based on the relative position and orientation between the observation position (camera) and the electromagnetic wave direction control member.

[0049] The size of the marker 1 in a planar view is adjusted appropriately depending on the distance between the observation position (camera) and the electromagnetic wave direction control member and the magnification of the camera. For example, if the distance between the observation position (camera) and the electromagnetic wave direction control member is relatively far, the size of the marker 1 may be increased and the magnification of the camera may be increased. On the other hand, if the distance between the observation position (camera) and the electromagnetic wave direction control member is relatively close, the size of the marker 1 may be decreased and the magnification of the camera may be decreased. The size of the marker 1 in a planar view is preferably, for example, 100 mm × 100 mm or less. The marker 1 of this embodiment can detect its position and orientation with extremely high accuracy even with such a small size. Specific examples of the size of the marker 1 in a planar view include 10 mm × 10 mm, 20 mm × 20 mm, 40 mm × 40 mm, 44 mm × 44 mm, 60 mm × 60 mm, and 80 mm × 80 mm, and can be changed appropriately.

[0050] In this embodiment, the planar shape of the mark 2 may be a circle or a polygon such as a triangle or a rectangle, or may be another shape. The marker 1 is used to detect the relative position and attitude between the observation position and the marker 1, that is, the relative position and attitude between the observation position and the electromagnetic wave direction control member, depending on how the mark 2 is observed.

[0051] The marker 1 is configured as a thin plate by laminating a base layer 10, a first layer 20, a second layer 30, an adhesive layer 60, and a protective layer 70 in this order from the back side. In this specification, the term "laminated" does not only mean that the layers are directly stacked on top of each other, but also that the layers are stacked with another layer interposed therebetween. The upper side in FIG. 2(b) (the side on which the protective layer 70 is provided) is the observation side (front side).

[0052] The base layer 10 is made of a glass substrate. By making the base layer 10 of a glass substrate, it is possible to prevent the marker 1 from expanding and contracting due to temperature changes and moisture absorption. The linear expansion coefficient of a glass substrate is, for example, 31.7×10 -7 / °C, and dimensional changes due to temperature changes are very small. The linear expansion coefficient of ceramics is, for example, 28 x 10 -7 / °C, and dimensional change due to temperature change is very small, similar to glass. Therefore, a ceramic substrate may be used for the base layer. In order to suppress dimensional change due to temperature change, the base layer 10 has a linear expansion coefficient of 10 × 10 -6 / °C or less is preferable.

[0053] The thickness of the base material layer 10 is preferably 0.3 mm or more and 2.3 mm or less. If the thickness of the base material layer 10 is too small, it may break during cutting, making additional processing impossible. Furthermore, if the thickness of the base material layer 10 is too thick, when manufacturing markers with multiple surfaces as described below, the weight may be too large and transportation may become difficult.

[0054] The first layer 20 is formed of a resist material colored black (first color) and is laminated over the entire surface of the base layer 10. In FIG. 2(b), hatching indicates black, as in the other cross-sectional views below. In this specification, the term "resist material" refers to a photosensitive resin composition material containing a pigment or dye. The resist material constituting the first layer 20 of this embodiment is a resist material used in a photolithography process that has lost its photosensitivity as a result of a development process. Examples of resist materials used for the first layer 20 (when black) include PMMA, ETA, HETA, HEMA, and mixtures with epoxy. Examples of materials that can be colored black include carbon, blackened titanium, and nickel oxide.

[0055] In this embodiment, the first layer 20 is formed from a resist material, which allows the first layer 20 to have a very smooth surface, making it suitable as a base for forming the second layer 30 described below. Furthermore, an alignment mark (not shown) for forming the second layer can be formed on the outer periphery of the first layer 20, improving dimensional accuracy.

[0056] The thickness of the first layer 20 (in the case of black) is preferably 1 μm or more and 5 μm or less. If the thickness of the first layer 20 is too thin, it may be difficult to form a uniform film. Also, if the thickness of the first layer 20 is too thick, the curing reactivity of the resin with ultraviolet light may be insufficient.

[0057] The second layer 30 is formed of a resist material colored white (second color) and is laminated on the first layer 20 with partial openings. The resist material constituting the second layer 30 in this embodiment is a resist material in a state where the photosensitivity has been lost as a result of a development process performed on a photosensitive resist material used in a photolithography process. Examples of resist materials used for the second layer 30 (when white) include PMMA, ETA, HETA, HEMA, or mixtures with epoxy. Examples of materials that are colored white include titanium oxide, zirconia, and barium titanate. The second layer 30 has four openings 30a that are partially opened by a photolithography process described below and allow the first layer 20 to be visible. That is, the second layer 30 partially conceals the first layer 20, and the unconcealed areas (areas where the second layer 30 is not laminated) are the openings 30a. The area of ​​the first layer 20 visualized by this opening 30a is configured to be observable as an independent mark 2. Note that "independent marks" refers to multiple marks that are not connected to each other and can be individually recognized.

[0058] The thickness of the second layer 30 (when white) is preferably 3 μm or more and 100 μm or less. If the thickness of the second layer 30 is too thin, the underlying first layer 20 may be observed through the second layer 30, reducing contrast and possibly reducing the visibility of the mark 2 (ease of detection by automatic recognition). Furthermore, if the second layer 30 is too thick, when the mark 2 is observed from an oblique direction, the area where the first layer 20 is hidden by the second layer 30 at the periphery of the opening 30a increases, which may result in increased distortion of the shape of the observed mark 2.

[0059] For more accurate detection, the mark 2 preferably has a high contrast value between the color of the first layer 20 and the color of the second layer 30. In the configuration of this embodiment used under white light (visible light), it is preferable that the contrast value between the color (first color) of the first layer 20 and the color (second color) of the second layer 30 is 0.26 or more, and the blur value between the observed color (first color) of the first layer 20 and the color (second color) of the second layer 30 is 0.17 or more. The contrast value and blur value will be described later.

[0060] The adhesive layer 60 is an adhesive layer for attaching the protective layer 70 to the second layer 30. The adhesive layer 60 is made of a transparent adhesive so that the first layer 20 and the second layer 30 can be observed. The adhesive layer 60 can be made of, for example, PMMA, urethane, silicone, etc. The thickness of the adhesive layer 60 is preferably 0.5 μm or more and 50 μm or less. If the adhesive layer 60 is too thin, it is difficult to achieve uniform processing and it may not be able to absorb the unevenness of the underlying surface. Furthermore, if the adhesive layer 60 is too thick, it may be difficult to remove the solvent during thick coating processing and may be costly. The thickness of the adhesive layer 60 is the thickness at its thinnest point.

[0061] The protective layer 70 protects the first layer 20 and the second layer 30 and is attached to the second layer 30 via an adhesive layer 60. The protective layer 70 includes a resin substrate layer 71 and a surface layer 72. The resin substrate layer 71 can be made of, for example, vinyl chloride, polyethylene terephthalate, polycarbonate, cycloolefin polymer, triacetyl cellulose, or the like. The surface layer 72 can be made of, for example, an acrylic resin containing fine particles, sol-gel, siloxane, polysilazane, or the like, which has the property of diffusing light. If the surface of the resin substrate layer 71 is embossed or otherwise textured to impart light diffusion properties, the surface layer 72 can be omitted. By adding a light diffusion function to the protective layer 70 as described above, it can also function as a light diffusion layer.

[0062] The resin substrate layer 71 has an adhesive layer 60 laminated on one side and a surface layer 72 laminated on the other side. The resin substrate layer 71 is made of a transparent resin so that the first layer 20 and the second layer 30 can be observed. In this embodiment, it is assumed that the marker 1 will be used under visible light, and the adhesive layer 60 and the resin substrate layer 71 are configured to be transparent to white light. Specifically, the adhesive layer 60 and the resin substrate layer 71 each preferably have a total light transmittance of 50% or more in the light wavelength range of 400 nm to 700 nm. More preferably, when the adhesive layer 60 and the resin substrate layer 71 are measured together, the total light transmittance is preferably 50% or more in the light wavelength range of 400 nm to 700 nm.

[0063] The thickness of the resin substrate layer 71 is preferably 7 μm or more and 250 μm or less. If the thickness of the resin substrate layer 71 is too thin, lamination processing may be difficult. If the thickness of the resin substrate layer 71 is too thick, the resin substrate layer 71 may become too bulky and heavy, and may also be costly. The refractive index of the resin substrate layer 71 is preferably 1.45 or more and 1.55 or less.

[0064] The surface layer 72 may be a layer that combines anti-reflection and hard-coat functions. To prevent a decrease in visibility of the mark 2 due to reflection on the surface of the marker 1, the surface layer 72 preferably has a specular reflectance of 1.5% or less for light with a wavelength of 535 nm. For example, when using a ring-shaped light source surrounding the camera lens to observe the marker 1, the light source itself may be reflected off the surface of the marker 1 and observed. In such cases, the anti-reflection function of the surface layer 72 prevents or suppresses surface reflection, allowing the outline of the mark 2 to be more clearly recognized and enabling highly accurate detection. Furthermore, the hard-coat function of the surface layer 72 preferably has a pencil hardness of 1H or higher. The surface layer 72 can be formed using, for example, sol-gel, siloxane, polysilazane, etc. Specific methods of anti-reflection include an anti-reflection (AR) method and an anti-glare (AG) method. Under conditions where strong light, such as sunlight, does not specularly reflect, the AR method is preferred for recognizing the mark 2. Under conditions where strong light such as sunlight may be specularly reflected, the AG method is preferable for recognizing the mark 2. The AR method can be produced by known methods such as multilayer thin film interference and moth-eye methods. The AG method can be produced by known methods such as making the surface of the film uneven, incorporating light-diffusing particles into the film, or coating the surface of the film.

[0065] Furthermore, as a characteristic of the adhesive layer 60 and the protective layer 70 combined, a total light transmittance of 85% or more is preferable. If this total light transmittance is too low, a sufficient amount of light cannot be secured. Furthermore, as a characteristic of the adhesive layer 60 and the protective layer 70 combined, a haze value of 30% or more is preferable, more preferably 40% or more, and even more preferably 70% or more. If this haze value is lower than 70%, the anti-reflection effect begins to decrease, decreases further if it is 40% or less, and decreases significantly if it is 30% or less. On the other hand, a haze value of 95% or less is preferable. If this haze value is too high, the image of the mark observed may become blurred.

[0066] Next, a method for manufacturing the marker 1 of this embodiment will be described. FIG. 3 is a diagram showing the manufacturing process of the marker 1. Note that FIG. 3 shows the front and back (top and bottom) reversed to FIG. 2(b). First, a glass substrate is prepared, which serves as the base layer 10 (FIG. 3(a)). Next, a black-colored resist material that will become the material for the first layer 20 is applied to one surface of the base layer 10 (first layer forming step), pre-baked, and solidified, and then exposed to light from a light source LS (first developing step), and further developed and post-baked (first baking step) to stabilize the first layer 20 (FIG. 3(b)).

[0067] Next, a white-colored resist material, which will be the material for the second layer 30, is applied onto the first layer 20 (second layer formation step), and is pre-baked and solidified (FIG. 3(c)). Next, a mask M is brought into close contact with the solidified second layer 30, and a mark pattern is exposed onto the second layer 30 (second exposure step) (FIG. 3(d)). A mask pattern is formed in advance on the mask M, which transmits light except for the areas corresponding to the marks 2, and blocks light from the areas corresponding to the marks 2.

[0068] Next, the exposed second layer 30 is developed to remove the resist material at the position corresponding to the mark 2, thereby forming an opening 30a (second development step) (FIG. 3(e)). After development, the second layer 30 is post-baked (second bake step). Finally, a separately prepared film- or sheet-like protective layer 70 is attached to the second layer 30 with an adhesive layer 60, completing the marker 1 (FIG. 3(f)).

[0069] Because the marker 1 of this embodiment uses a resist material, the contour shape of the mark 2 can be created with great precision, enabling even more precise control depending on the shape of the mark 2 being observed. To clearly demonstrate this fact, the contour shape of the marker 1 of this embodiment and a reference example were actually created, and the results of a comparison are shown below. In the reference example, the shape of the mark 2 was printed on paper using a laser printer.

[0070] FIG. 4 is a partially enlarged view showing the results of photographing the mark 2 of this embodiment and a reference example. FIG. 4(a) shows this embodiment, and FIG. 4(b) shows a reference example. Note that FIG. 4 shows binarized images using an intermediate value between black and white as a threshold. Mark 2 was photographed using a digital microscope VHX-5500 (1 / 1.8-inch CMOS image sensor, effective pixels 1600 (H) × 1200 (V)) manufactured by Keyence Corporation. The distance between mark 2 and the tip of the lens during photographing was 15 mm.

[0071] 4, in the marker 1 of this embodiment, the outline shape of the periphery of the mark 2 is expressed by a very smooth curve (arc). In contrast, in the reference example, although it appears to be a circle from a distance, when enlarged, the outline shape is significantly deformed from the arc.

[0072] 4, the actual photographing results show that the Reference Example has a significant presence of intermediate gradations rather than two gradations of black and white. Therefore, particularly in the Reference Example, the shape perceived as the outer shape of the mark 2 is thought to change depending on the photographing conditions (observation conditions) and the method of distinguishing the boundary between black and white (threshold), which is undesirable. To facilitate comparison with the present embodiment, a graph was created based on the photographing data showing the change in light intensity relative to the change in position at the boundary between black and white.

[0073] FIG. 5 shows the change in light intensity with respect to the change in position at the boundary between the black of the first layer 20 and the white of the second layer 30. In FIG. 5, lower intensity on the vertical axis appears to be the black side, and higher intensity appears to be the white side. The horizontal axis corresponds to the pixels of the captured data, but the reference position is shifted so that the two broken line data do not overlap, so the absolute value itself is meaningless. The change in pixel value on this horizontal axis corresponds to the change in position, with 100 pixels equivalent to 1 mm. Note that the present embodiment and reference example in FIG. 5 are the same as the present embodiment and reference example shown in FIG. 4, respectively.

[0074] As explained above, the contrast value between the color of the first layer 20 (first color) and the color of the second layer 30 (second color) is preferably 0.26 or more. This is because if the contrast value is too small, it is considered that automatic detection of the mark 2 using a camera becomes difficult. Here, the contrast value is expressed as (Imax-Imin) / (Imax+Imin), where Imax is the maximum value of light intensity and Imin is the minimum value. In the example shown in FIG. 5, the contrast value of this embodiment is 0.98, and the contrast value of the reference example is 0.98, and no significant difference was observed between the two.

[0075] As explained above, the blur value between the observed color of the first layer 20 (first color) and the color of the second layer 30 (second color) is preferably 1.0 or greater. Since it is particularly undesirable for high-precision control to have a fuzzy mark boundary, it is preferable that the intensity change at the boundary between the black and white sides be rectangular or have a steep change. Based on the data in FIG. 5, the intensity change at the boundary between the black and white sides was quantified and compared. Specifically, the data in the ranges indicated by LA and LB in the broken line in FIG. 5 was quantified using its slope. Here, the ranges LA and LB were determined as ranges that could be adequately approximated by a straight line. That is, an approximate straight line was obtained for the range of large intensity change, and the ranges LA and LB were determined as the ranges within which the measurement data did not diverge. Within the ranges LA and LB, the slope value (blur value) of the intensity change was calculated as (intensity change amount) / (pixel change amount). As a result, in this embodiment, the slope value (blur value) of the intensity change was 1.29. On the other hand, in the reference example, the gradient value of the intensity change (blur value) was 0.87. As such, a clear difference was observed between the two, and the configuration of this embodiment is the more ideal and preferable form.

[0076] As described above, according to this embodiment, photolithography is used, so that highly accurate markers can be easily manufactured without requiring highly accurate machining. Furthermore, the thickness of the second layer 30 of the marker 1 of this embodiment can be made very thin, which prevents the shape of the mark 2 from being distorted even when observed from an oblique direction, and enables more accurate detection of the position and orientation.

[0077] (2) Second embodiment of the marker 6 is a schematic plan view illustrating a marker according to a second embodiment of the present disclosure. Marker 1B according to the second embodiment is similar to marker 1 according to the first embodiment, except that it has more marks 2. Therefore, parts that perform the same functions as those in the first embodiment described above are given the same reference numerals, and redundant explanations will be omitted where appropriate.

[0078] The marker 1B of the second embodiment has more marks 2 arranged thereon than in the first embodiment. Specifically, nine marks 2 are arranged at intervals in a grid pattern on the marker 1B. As explained above, it is preferable that at least three marks 2 be arranged. This is because, for example, by calculating three centroid positions of the marks 2 from the observation results of the marks 2, the relative position and orientation between the observation position (camera) and the marker 1 can be accurately detected. Furthermore, if the number of marks 2 is more than three, for example, even if some of the marks 2 are obscured due to some obstacle, the position and orientation can be detected from the observation results of the remaining marks 2. Furthermore, by using multiple marks 2, the accuracy of position and orientation detection can be improved.

[0079] In the second embodiment, the number of marks 2 is nine, which is significantly more than in the first embodiment. This, in addition to the above-mentioned effects, can further expect the following effects. For example, even if more than half of the area of ​​the marker 1B cannot be properly photographed (observed), resulting in many marks 2 that cannot be properly photographed (observed), the possibility of properly detecting the position and orientation can be increased by photographing (observing) the remaining marks 2. A situation in which more than half of the area of ​​the marker 1B cannot be properly photographed (observed) is, for example, a situation in which sunlight directly hits more than half of the area of ​​the marker 1B, while sunlight does not hit the remaining area. In such a case, if the exposure (gain) is adjusted appropriately for one side, the other side will be overexposed or underexposed. Another example is a case in which more than half of the area of ​​the marker 1B cannot be photographed (observed) because another object physically overlaps a part of the photographing optical axis.

[0080] Assuming a substantially square marker 1 as shown in FIG. 6, the number of marks 2 is preferably nine or more. This is because it is easier to arrange the marks 2 evenly. The number of marks 2 may be even greater. Furthermore, the marks 2 may be arranged evenly or randomly. Even in the case of random arrangement, the position and orientation can be easily detected by obtaining the arrangement data of the marks 2 on the marker 1B. Furthermore, by using random arrangement, even if the relationship between the marker 1B and the observation position is rotated by 180°, the relative position and orientation of the two can be accurately detected.

[0081] As described above, according to the second embodiment, the marker 1B has nine or more marks 2. Therefore, even under more severe imaging conditions (observation conditions), the position and orientation can be detected appropriately.

[0082] (3) Third embodiment of the marker Fig. 7(a) is a schematic plan view illustrating a third embodiment of a marker according to the present disclosure, and Fig. 7(b) is a cross-sectional view taken along line BB in Fig. 7(a). The marker 1C of the third embodiment has the same observed marking configuration as the first embodiment, but is similar to the marker 1 of the first embodiment except that the first layer 20C is white and the second layer 30C on the observation side is black, a planarizing layer 91 and an intermediate layer 92 are provided, and the protective layer 70C has a different configuration. Therefore, parts that perform the same functions as those of the first embodiment described above are designated by the same reference numerals, and redundant explanations will be omitted where appropriate.

[0083] The marker 1C of the third embodiment is configured as a thin plate by laminating a base layer 10, a first layer 20C, an intermediate layer 92, a second layer 30C, an adhesive layer 60, and a protective layer 70C in this order from the back side. A planarizing layer 91 is provided in the surrounding area where the second layer 30C is not provided.

[0084] The first layer 20C is formed from a resist material colored white (first color) and is laminated over the entire surface of the base layer 10. In this embodiment, the first layer 20C is formed from a resist material, which allows the surface of the first layer 20C to be formed very smoothly, making it preferable as a base for forming the second layer 30C described below. Furthermore, an alignment mark (not shown) for forming the second layer can be formed on the outer periphery of the first layer, thereby improving dimensional accuracy.

[0085] The thickness of the first layer 20C (in the case of white) is preferably 3 μm or more and 100 μm or less. If the thickness of the first layer 20C is too thin, the diffuse reflectance may be insufficient, the contrast may decrease, and the visibility of the mark 2 (ease of detection by automatic recognition) may decrease. Furthermore, if the thickness of the first layer 20C is too thick, it may be difficult to make the thickness uniform.

[0086] The second layer 30C is formed of a resist material colored black (second color). The second layer 30C is partially formed by a photolithography process described later, and four portions are provided to conceal the first layer 20C. The area of ​​the second layer 30C is configured to be observable as a mark 2 having an independent shape.

[0087] The thickness of the second layer 30C is preferably 1 μm or more and 5 μm or less. If the thickness of the second layer 30C is too thin, it may be difficult to form a uniform film. Furthermore, if the thickness of the second layer 30C is too thick, the curing reactivity of the resin with ultraviolet light may be insufficient. In the third embodiment, the second layer 30C is black, which provides high hiding power for the base. Therefore, the white color of the first layer 20C can be sufficiently hidden without increasing the thickness of the second layer 30C, making it possible to achieve the thin thickness described above. Furthermore, by making the second layer 30C thin, it is possible to suppress a decrease in measurement accuracy due to the observation of the end face of the second layer 30C, thereby improving measurement accuracy.

[0088] In the marker 1C of this embodiment, an intermediate layer 92 is disposed between the first layer 20C and the second layer 30C. The intermediate layer 92 is provided to resolve cases where the bonding strength between the first layer 20C and the second layer 30C is insufficient. When the second layer 30C is laminated directly on the first layer 20C, the first layer 20C may repel the second layer 30C. In such cases, the provision of the intermediate layer 92, which is less likely to be repelled, allows the second layer 30C to be laminated appropriately. Therefore, the intermediate layer 92 may be provided as needed, and may be omitted as in the first embodiment.

[0089] The intermediate layer 92 can be formed using, for example, an acrylic resin, etc. A thickness of about 1 μm to 2 μm is sufficient for the intermediate layer 92.

[0090] Since the first layer 20 or 20C is stacked on the base layer 10, and the second layer 30 or 30C is then stacked on top of that, steps are generated in the patterned second layer 30 or 30C. In the case of the second layer 30 of the first embodiment, the cross-sectional shape of the portion corresponding to the mark 2 is concave, and in the case of the second layer 30C of the third embodiment, the cross-sectional shape of the portion corresponding to the mark 2 is convex.

[0091] Therefore, when the protective layer 70 (described later) is attached, the adhesive layer 60 will fill the gap to some extent, but if the step is large, the adhesive layer will not be able to fill the gap, and an air gap (void) may form near the gap. The refractive index of the air gap is 1, which is significantly lower than the refractive index of the substrate, which is approximately 1.4 to 1.6. This causes light to be reflected at the interface between the materials, resulting in disturbance light when the mark 2 is detected by the camera, significantly reducing detection accuracy. Therefore, to prevent the air gap from forming, the thickness of the second layer 30, 30C is preferably 5 μm or less, more preferably 3 μm or less, and even more preferably 2 μm or less.

[0092] However, when the second layer 30 is white, as in the first embodiment described above, the hiding power of the base is inferior to that of black, so it may not be desirable to make it thinner, which could result in a larger step. Therefore, if the step cannot be reduced to 5 μm or less, a planarizing layer 91 can be provided in the area around the second layer 30, 30C where the second layer 30, 30C is not provided to prevent air from entering. The planarizing layer 91 is preferably formed from a transparent material that allows the mark 2 to be identified, and known materials such as acrylic and epoxy materials can be used. The third embodiment illustrates a configuration in which the planarizing layer 91 is provided to reduce the step. By providing the planarizing layer 91, the step between the second layer 30C and the planarizing layer 91 can be further reduced. In the third embodiment, the second layer 30C is black, has high hiding power, and can be formed thin, so the planarizing layer 91 may be omitted.

[0093] The protective layer 70C is a layer that protects the first layer 20C and the second layer 30C, and is attached onto the second layer 30C and the planarizing layer 91 via an adhesive layer 60. In the third embodiment, the protective layer 70C is exemplified as being formed of a single layer, and specifically, a matte film of vinyl chloride resin can be used.

[0094] Next, a method for manufacturing the marker 1C of this embodiment will be described. FIG. 8 is a diagram showing the manufacturing process of the marker 1C. Note that FIG. 8 shows the front and back (top and bottom) reversed to FIG. 7(b). First, a glass substrate is prepared, which serves as the base layer 10 (FIG. 8(a)). Next, a white-colored resist material that will become the material for the first layer 20 is applied to one surface of the base layer 10 (first layer forming step), pre-baked, and dried, and then exposed to light from a light source LS (first developing step), and further developed and post-baked (first baking step) to stabilize the first layer 20C (FIG. 8(b)).

[0095] Next, an intermediate layer 92 is formed on the first layer 20C, and a black-colored resist material that will become the material for the second layer 30C is applied on top of that (second layer formation process), pre-baked, and dried (FIG. 8(c)). Next, a mask M is brought into close contact with the dried second layer 30C, and a mark pattern is exposed onto the second layer 30C (second exposure process) (FIG. 8(d)). The mask M has a mask pattern formed in advance that transmits light at positions corresponding to the marks 2 and blocks light in other areas.

[0096] Next, the exposed second layer 30C is developed to remove and pattern the resist material from areas other than those corresponding to the mark 2 (around the mark 2) (second development step) (FIG. 8(e)). After development, the second layer 30C is post-baked (second bake step). A planarizing layer 91 is provided in areas where the second layer 30C is not formed (areas where the resist material has been removed). Finally, a separately prepared film- or sheet-like protective layer 70 is attached to the second layer 30C and the planarizing layer 91 with an adhesive layer 60, completing the marker 1C (FIG. 8(f)).

[0097] The marker 1C described in Figure 8 above can be manufactured by arranging multiple markers 1C side by side, i.e., as a multi-faceted marker body with multiple markers 1C attached. The markers 1C are then obtained by cutting out individual markers 1C from this multi-faceted marker body. The above manufacturing process uses a resist material and an exposure process, allowing for extremely high-precision manufacturing.

[0098] As described above, according to the third embodiment, the second layer 30C provided on the observation side is black, and the first layer 20C is white. This increases the hiding power of the base, allowing the thickness of the second layer 30C to be thinner than in the first embodiment. Therefore, when observing the mark 2 formed by the second layer 30C, the effect on measurement accuracy due to the observation of the side end surface of the second layer 30C can be minimized, enabling more accurate measurements. Furthermore, according to the third embodiment, the provision of the planarizing layer 91 can suppress the occurrence of voids due to the stacking of the adhesive layer 60, thereby suppressing a decrease in measurement accuracy.

[0099] In the markers 1, 1B, and 1C of the first to third embodiments described above, the protective layers 70 and 70C are laminated via the adhesive layer 60. This configuration ensures that the markers 1, 1B, and 1C have extremely high reliability. For example, if the markers 1, 1B, and 1C are hit by an object during use, the base layer 10 may crack because it is a glass substrate. However, because the protective layers 70 and 70C are laminated via the adhesive layer 60, the protective layers 70 and 70C function as shatterproof layers, preventing fragments of the base layer 10 from scattering. Furthermore, even if the base layer 10 cracks, the first layers 20 and 20C and the second layers 30 and 30C remain undamaged and can maintain their function as markers.

[0100] This is presumably because the bonding strength of the first layers 20, 20C and the second layers 30, 30C to the base layer 10 is weaker than the bonding strength to the adhesive layer 60, and the first layers 20, 20C and the second layers 30, 30C follow the adhesive layer 60, thereby avoiding damage. Therefore, it is preferable that the bonding strength of the first layers 20, 20C and the second layers 30, 30C to the base layer 10 is weaker than the bonding strength of the first layers 20, 20C and the second layers 30, 30C to the adhesive layer 60. It has been verified by a drop test using actual objects that the first layers 20, 20C and the second layers 30, 30C are not damaged even if the base layer 10 is cracked.

[0101] Furthermore, as described above, even if a crack occurs in the base layer 10, the crack cannot be seen from the observation side. Therefore, a damage detection sensor may be provided on the back side of the base layer 10. FIG. 9 is a diagram showing an embodiment in which an electrode layer 95 is provided. The electrode layer 95 can be configured on substantially the entire back side of the base layer 10 and can function as a damage detection sensor. The electrode layer 95 may be made of, for example, ITO, copper foil, aluminum foil, or the like, but it is necessary that the electrode layer 95 be damaged along with the base layer 10 when the base layer 10 is damaged. If the electrode layer 95 is damaged and its electrical resistance value changes, this change can be electrically monitored to detect damage to the base layer 10. Furthermore, by forming the electrode layer 95 from a material such as a highly reflective metal, external light and detection light can be reflected by the electrode layer 95, improving the visibility of the mark 2 in dark places. Note that when the electrode layer 95 is provided, the protective layer 70C may be omitted.

[0102] (4) Fourth embodiment of the marker FIG. 13(a) is a schematic plan view illustrating a fourth embodiment of a marker according to the present disclosure, and FIG. 13(b) is a cross-sectional view taken along line AA in FIG. 13(a). As shown in FIG. 13(a), the marker 1 has a square shape in plan view, and includes a mark 2 and moiré display areas 3 and 4. The marker 1 detects the relative position and orientation between the observation position and the marker 1 based on how the mark 2 is observed. Furthermore, the marker 1 enables more accurate position and orientation detection based on how the moiré displayed in the moiré display areas 3 and 4 is observed. The surface of the marker 1 shown in FIG. 13(a) is the front side (surface) from which the marker 1 is observed, and the opposite side is the back side (rear side). In FIG. 13(b), the side on which the protective layer 70 is provided is the front side (surface) from which the marker 1 is observed.

[0103] In the marker 1, a total of three marks 2 are arranged at intervals: two near the two upper corners and one near the center of the lower left and right sides in FIG. 13(a). The marks 2 are configured to be observable as marks of independent shapes. It is preferable to arrange at least three marks 2. This is because, for example, by calculating three center-of-gravity positions of the marks 2 from the observation results of the marks 2, the relative position and orientation between the observation position (camera) and the marker 1 can be accurately detected. Furthermore, if the number of marks 2 is more than three, for example, even if some of the marks 2 are obscured due to some obstacle, the position and orientation can be detected from the observation results of the remaining marks 2. Furthermore, by using multiple marks 2, the accuracy of position and orientation detection can be improved. Furthermore, in this embodiment, the planar shape of the marks 2 can be a circle or a polygon such as a triangle or a rectangle, but other shapes are also possible.

[0104] The moiré display areas 3 and 4 display a moiré M. FIG. 13(a) shows a state in which the moiré M is displayed in the center of each of the moiré display areas 3 and 4. The position at which this moiré M is displayed moves when the relative orientation between the marker 1 and the observation position changes. In this embodiment, the moiré display areas 3 and 4 have a rectangular shape in a plan view, and the position at which the moiré M is displayed moves along the longitudinal direction of the moiré display areas 3 and 4. The moiré display areas 3 and 4 are arranged so that their longitudinal directions are orthogonal to each other. The moiré display areas 3 and 4 have the same configuration except for the orientation in which they are arranged, so the following explanation will focus on the moiré display area 3.

[0105] 13(b), the marker 1 is configured in the shape of a thin plate and includes a base layer 10, a first layer 20, a second layer 30, a third layer 40, a reflective layer 50, an adhesive layer 60, and a protective layer 70. The order in which these layers are stacked from the back side is the reflective layer 50, the third layer 40, the base layer 10, the first layer 20, the second layer 30, the adhesive layer 60, and the protective layer 70.

[0106] The material and thickness of the base material layer 10 are similar to those of the base material layer 10 in the first embodiment of the marker.

[0107] The first layer 20 is formed from a resist material colored black (first color). The material and thickness of the first layer 20 are the same as those of the first layer 20 in the first embodiment of the marker. In this embodiment, the first layer 20 is formed from a resist material, which allows the surface of the first layer 20 to be formed very smoothly, making it preferable as a base for forming the second layer 30 described below. Furthermore, because the first layer 20 is formed from a resist material, the first pattern 23 described below can be produced accurately and easily.

[0108] The first layer 20 constitutes the portion of the mark 2 that appears black. The first layer 20 also constitutes a first pattern 23 for displaying moire in the moire display area 3. The first pattern 23 is arranged in an area that will become the moire display area 3 on one surface (front surface) of the base layer 10. In the first pattern 23, first display lines 21 are arranged at equal intervals in a fixed arrangement direction in the longitudinal direction of the moire display area 3. The areas between adjacent first display lines 21 where no first display line 21 is provided are first non-display areas 22, and the first display lines 21 and first non-display areas 22 are arranged alternately. The first pattern 23 is formed by photolithography.

[0109] The second layer 30 is formed of a resist material that is colored white (second color). The material and thickness of the second layer 30 are similar to those of the second layer 30 in the first embodiment of the marker.

[0110] The second layer 30 has three openings 31 that open at positions that will become marks 2 and make the first layer 20 visible, and two openings 32 that open at positions that will become moiré display areas 3 and 4 and make the first layer 20 and the third layer 40 visible. These openings 31 and 32 are formed by photolithography.

[0111] The third layer 40 is formed from a resist material colored black (first color). The material and thickness of the third layer 40 are the same as those of the first layer 20. Because the third layer 40 is formed from a resist material, the second pattern 43 described below can be formed accurately and easily.

[0112] The third layer 40 is provided with a second pattern 43 for displaying moiré in the moiré display region 3. The second pattern 43 is disposed opposite the first pattern 23 in an area that will become the moiré display region 3 on the back surface of the base layer 10. In this embodiment, the first pattern 23 is disposed on one surface of the base layer 10, and the second pattern 43 is disposed on the other surface. However, the first and second patterns may be disposed on different substrates and then bonded together. The second pattern 43 has second display lines 41 arranged at equal intervals in a fixed arrangement direction in the longitudinal direction of the moiré display region 3. The areas between adjacent second display lines 41 where no second display line 41 is provided are second non-display regions 42, and the second display lines 41 and second non-display regions 42 are arranged alternately. The second pattern 43 is formed by photolithography.

[0113] The reflective layer 50 is a layer that reflects light that reaches the marker 1 from the front side (observation side) through the opening 32 back to the front side. The reflective layer 50 can be made of, for example, PMMA, ETA, HETA, HEMA, or a mixture with epoxy. The reflective layer 50 is preferably white to enhance the contrast with the first display line 21 and the second display line 41. Examples of materials that can be colored white include titanium oxide, zirconia, and barium titanate.

[0114] The reflective layer 50 may be laminated in close contact with the marker 1 as in this embodiment, or may be a separate reflective member or the like disposed on the back surface of the marker 1. However, the configuration of this embodiment, in which the reflective layer 50 is laminated in close contact with the marker 1 as in this embodiment, is more desirable because it makes the moire M significantly easier to see. The reason for this will be explained below.

[0115] The moiré M that we want to observe is the moiré observed due to interference between the first display lines 21 and the second display lines 41. However, even when only the first display lines 21 or only the second display lines 41 are present, unwanted moiré (extraneous noise images) may occur depending on the conditions. Figure 14 is an enlarged view of the vicinity of the second pattern 43 to explain the cause of the unwanted moiré. Figure 14(a) shows a configuration in which the reflective layer 50 is laminated to fill the second non-display region 42. Figure 14(b) shows a configuration in which the reflective layer 50 is laminated without filling the second non-display region 42. Figure 14(c) shows a configuration in which the reflective layer 50 is laminated via a bonding layer 51 such as an adhesive layer. When the second non-display region 42 is not filled with the reflective layer 50, as in the configurations of Figures 14(b) and 14(c), the light L1 incident from the observation side is reflected by the edges of the second display lines 41, resulting in unwanted light L3 and L4 returning to the observation side. Since such unwanted light L3 and L4 also occur periodically, it is believed that unwanted moiré patterns occur. On the other hand, in a configuration in which the reflective layer 50 is laminated to fill the second non-display region 42 as shown in FIG. 14(a), light cannot reach the ends of the second display lines 41, and normal reflected light L2 returns to the viewing side, suppressing the occurrence of unwanted moiré patterns and enabling clear moiré patterns to be observed. Thus, if unwanted moiré patterns occur due to light scattered at the side portions of the second display lines 41, i.e., at the end faces of the second display lines 41 on the second non-display region 42 side and returning to the viewer's side, they are thought to interfere with the moiré patterns M that are intended to be seen, thereby hindering the observation of the moiré patterns M. Therefore, by providing the reflective layer 50 to fill the second non-display region 42, the above phenomenon can be avoided, allowing the moiré patterns M to be observed more clearly. For the above reasons, it is sufficient that the reflective layer 50 is provided in at least the second non-display area 42, but it is preferable that it is provided so as to cover the back side of the second display lines 41, as shown in Fig. 13(b). The reason for this is that the reflection of light from the edge portions on the back side of the second display lines 41 is suppressed, and the main component of the periodic reflected light can be eliminated.

[0116] The adhesive layer 60 is a layer of adhesive for attaching the protective layer 70 onto the second layer 30. The material and thickness of the adhesive layer 60 are similar to those of the adhesive layer 60 in the first embodiment of the marker.

[0117] The protective layer 70 is a layer that protects the first layer 20 and the second layer 30, and is attached onto the second layer 30 via an adhesive layer 60. The protective layer 70 has a resin substrate layer 71 and a surface layer 72. The material, characteristics, and thickness of the resin substrate layer 71 are similar to the material, characteristics, and thickness of the resin substrate layer 71 in the first embodiment of the marker. The material and characteristics of the surface layer 72 are similar to the material and characteristics of the surface layer 72 in the first embodiment of the marker. The combined characteristics of the adhesive layer 60 and the protective layer 70 are similar to the combined characteristics of the adhesive layer 60 and the protective layer 70 in the first embodiment of the marker.

[0118] As explained above, the first non-display area 22 is filled with the adhesive layer 60, but because the adhesive layer 60 and the protective layer 70 are transparent and the base layer 10 is also made of glass and is transparent, the second pattern 43 of the third layer 40 can be seen through the first non-display area 22. Therefore, when the marker 1 is observed from the front side, the first pattern 23 and the second pattern 43 are seen overlapping each other, and the moiré pattern M can be observed.

[0119] Conventionally, when moiré patterns are created by overlapping multiple patterns, as described in U.S. Patent No. 8,625,107, the pattern positioned on the observation side blocks light, resulting in the entire image being observed as being dark. Even when moiré patterns are created in a dark environment, the moiré patterns are often unclear, making it difficult to identify their location by photographing them with a camera. Therefore, in this embodiment, the first pattern 23 and the second pattern 43 are improved to enable the moiré patterns to be observed more clearly.

[0120] FIG. 15 is a diagram illustrating the details of the first pattern 23 and the second pattern 43. Note that FIG. 15 shows a cross section similar to FIG. 13(b), but illustrates only three layers: the base layer 10, the first layer 20, and the third layer 40. In this embodiment, the width of the first non-display region 22 is different from the width of the second non-display region 42. The first non-display region 22 is disposed on the observation side (front side), and the width of the first non-display region 22 is wider than the width of the second non-display region 42. Therefore, more light reaches the second pattern 43 through the first pattern 23, and more of the light that is reflected and returned to the observation side can reach the observation position through the first pattern 23. This allows the moire M to be observed more brightly.

[0121] Furthermore, the width of the first display lines 21 and the width of the second display lines 41 are different. This makes it possible to observe the moire M more clearly than when the first display lines 21 and the second display lines 41 have the same width. By making the width of the first display lines 21 narrower than the width of the second display lines in this way, more light passes through the first pattern 23, and the moire M can be observed more brightly.

[0122] Furthermore, the first pitch, which is the pitch at which the first display lines 21 are arranged, is different from the second pitch, which is the pitch at which the second display lines 41 are arranged. This makes it possible to observe the moire M more clearly. Furthermore, because the first pitch is wider than the second pitch, the width of the first non-display area 22 is consequently wider than the width of the second non-display area 42, and the moire M can be observed more brightly.

[0123] Next, an example of how to use the marker 1 of this embodiment will be described. FIG. 16 is a diagram showing the marker 1 as viewed from an oblique direction. FIG. 16 illustrates an example of the marker 1 being observed from the oblique direction indicated by arrow B in FIG. 13(b), but without tilting in the vertical direction in FIG. 13(a). When the marker 1 is observed from an oblique direction tilted from its normal direction, for example, as shown in FIG. 16, the moiré M in the moiré display area 3 is observed to move in the longitudinal direction of the moiré display area 3. Note that when the marker 1 is observed from an oblique direction tilted from its normal direction to the longitudinal direction of the moiré display area 4, the moiré M in the moiré display area 4 is observed to move in the longitudinal direction of the moiré display area 4. Therefore, by observing both the moiré M in the moiré display area 3 and the moiré M in the moiré display area 4, the relative orientation of the marker 1 and the observation position can be accurately detected.

[0124] Here, when the observation position of the moiré M is moved to a position significantly deviated from the normal direction of the marker 1, another moiré pattern is observed, and so on. Therefore, if the observation position is significantly deviated from the normal direction of the marker 1, the position and orientation may not be detected correctly. However, the marker 1 of this embodiment includes a mark 2. Detection of the position and orientation using the mark 2 is possible even when the observation position is significantly deviated from the normal direction of the marker 1. On the other hand, detection of the position and orientation using the moiré display areas 3 and 4 can be performed with even higher accuracy than detection of the position and orientation using the mark 2. Therefore, by using both position and orientation detection using the mark 2 and position and orientation detection using the moiré display areas 3 and 4, the range of application can be expanded compared to when only the moiré display areas 3 and 4 are used. In other words, even if the observation position is significantly deviated from the normal direction of marker 1, the position and orientation can be detected using mark 2, and the observation position can be automatically moved according to the detection results. At the stage where final, highly accurate position control is required, the position and orientation can be detected using moiré display areas 3 and 4.

[0125] As described above, according to the marker 1 of this embodiment, the width of the first non-display area 22 is wider than the width of the second non-display area 42, and therefore more light can be taken into the moiré display areas 3 and 4 and more light can be returned to the observation side, allowing the moiré M to be displayed brighter. Therefore, even if the moiré M displayed in the moiré display areas 3 and 4 is photographed with a camera or the like, its position can be obtained more accurately, and highly accurate position and orientation detection can be achieved.

[0126] (5) Fifth embodiment of the marker FIG. 17(a) is a schematic plan view illustrating a fifth embodiment of a marker according to the present disclosure, and FIG. 17(b) is a cross-sectional view taken along line AA in FIG. 17(a). As shown in FIG. 17(a), the marker 1 has a square shape in plan view, and includes a mark 2 and moiré display areas 3 and 4. The marker 1 detects the relative position and orientation between the observation position and the marker 1 based on how the mark 2 is observed. Furthermore, the marker 1 enables more accurate position and orientation detection based on how the moiré displayed in the moiré display areas 3 and 4 is observed. The surface of the marker 1 shown in FIG. 17(a) is the front side (surface) from which the marker 1 is observed, and the opposite side is the back side (rear side). In FIG. 17(b), the side on which the light diffusion layer 80 is provided is the front side (surface) from which the marker 1 is observed.

[0127] In the marker 1, a total of three marks 2 are arranged at intervals: two near the two upper corners and one near the center of the lower left and right sides in FIG. 17(a). The marks 2 are configured to be observable as marks of independent shapes. It is preferable that at least three marks 2 are arranged. This is because, for example, by calculating three center-of-gravity positions of the marks 2 from the observation results of the marks 2, the relative position and orientation between the observation position (camera) and the marker 1 can be accurately detected. Furthermore, if the number of marks 2 is more than three, for example, even if some of the marks 2 are obscured due to some obstacle, the position and orientation can be detected from the observation results of the remaining marks 2. Furthermore, by using multiple marks 2, the accuracy of position and orientation detection can be improved. Furthermore, in this embodiment, the planar shape of the marks 2 can be a circle or a polygon such as a triangle or a rectangle, but other shapes are also possible.

[0128] The moiré display areas 3 and 4 display a moiré M. FIG. 17(a) shows a state in which the moiré M is displayed in the center of both the moiré display areas 3 and 4. The position where this moiré M is displayed moves when the relative attitude between the marker 1 and the observation position changes. In this embodiment, the moiré display areas 3 and 4 have a rectangular shape in a plan view, and the position where the moiré M is displayed moves along the longitudinal direction of the moiré display areas 3 and 4. The moiré display areas 3 and 4 are arranged so that their longitudinal directions are orthogonal to each other. The moiré display areas 3 and 4 have the same configuration except for the arrangement direction, so the following explanation will focus on the moiré display area 3.

[0129] 17(b), the marker 1 is configured in the shape of a thin plate and includes a base layer 10, a first layer 20, a second layer 30, a third layer 40, a reflective layer 50, an adhesive layer 60, and a light diffusion layer 80. The order in which these layers are stacked from the back side is the reflective layer 50, the third layer 40, the base layer 10, the first layer 20, the second layer 30, the adhesive layer 60, and the light diffusion layer 80.

[0130] The material and thickness of the base material layer 10 are similar to those of the base material layer 10 in the first embodiment of the marker.

[0131] The first layer 20 is formed from a resist material colored black (first color). The material and thickness of the first layer 20 are the same as those of the first layer 20 in the first embodiment of the marker. In this embodiment, the first layer 20 is formed from a resist material, which allows the surface of the first layer 20 to be formed very smoothly, making it preferable as a base for forming the second layer 30 described below. Furthermore, because the first layer 20 is formed from a resist material, the first pattern 23 described below can be produced accurately and easily.

[0132] The first layer 20 constitutes the portion of the mark 2 that appears black. The first layer 20 also constitutes a first pattern 23 for displaying a moire pattern in the moire display area 3. The first pattern 23 is the same as the first pattern 23 in the fourth embodiment of the marker.

[0133] The second layer 30 is formed of a resist material that is colored white (second color). The material and thickness of the second layer 30 are similar to those of the second layer 30 in the first embodiment of the marker.

[0134] The second layer 30 has three openings 31 that open at positions that will become marks 2 and make the first layer 20 visible, and two openings 32 that open at positions that will become moiré display areas 3 and 4 and make the first layer 20 and the third layer 40 visible. These openings 31 and 32 are formed by photolithography.

[0135] The third layer 40 is formed from a resist material colored black (first color). The material and thickness of the third layer 40 are the same as those of the first layer 20. Because the third layer 40 is formed from a resist material, the second pattern 43 described below can be formed accurately and easily.

[0136] The third layer 40 is provided with a second pattern 43 for displaying a moire pattern in the moire display area 3. The second pattern 43 is similar to the second pattern 43 in the fourth embodiment of the marker.

[0137] The reflective layer 50 is a layer that reflects, to the front side, light that reaches the marker 1 from the front side (observation side) through the opening 32. The material and configuration of the reflective layer 50 are similar to the material and configuration of the reflective layer 50 in the fourth embodiment of the marker.

[0138] The adhesive layer 60 is a layer of adhesive for attaching the light diffusion layer 80 onto the second layer 30. The material and thickness of the adhesive layer 60 are the same as those of the adhesive layer 60 in the first embodiment of the marker. The adhesive layer 60 is provided only in the same area as the area in which the light diffusion layer 80 is provided.

[0139] The light diffusion layer 80 is provided in an island shape over the mark 2 and the moiré display areas 3 and 4 via the adhesive layer 60, covering them and extending slightly larger than them. Specifically, the light diffusion layer 80 is provided in an island shape extending 2 to 3 mm larger on one side (radius) than the mark 2. Similarly, the light diffusion layer 80 is provided in an island shape extending 2 to 3 mm larger on one side (expansion width on one side) than the moiré display areas 3 and 4. By providing the light diffusion layer 80 in an island shape and not providing the light diffusion layer 80 in other areas, it is possible to easily provide a light diffusion layer later as needed. Furthermore, when strong light, such as sunlight, is incident on only one island-shaped light diffusion layer 80, if the light diffusion layer 80 (including the resin base layer 81) is connected, the resin base layer 81 acts as a light guide plate, preventing the light from propagating to other island-shaped light diffusion layers 80 and affecting the other islands. The light diffusion layer 80 includes a resin substrate layer 81 and a surface layer 82 .

[0140] The resin substrate layer 81 has an adhesive layer 60 laminated on one side and a surface layer 82 laminated on the other side. The resin substrate layer 81 is made of a transparent resin so that the first layer 20 and the second layer 30 can be observed. In this embodiment, it is assumed that the marker 1 will be used under visible light, and the adhesive layer 60 and the resin substrate layer 81 are configured to be transparent to white light. Specifically, the adhesive layer 60 and the resin substrate layer 81 each preferably have a total light transmittance of 50% or more in a light wavelength range of 400 nm to 700 nm. More preferably, when the adhesive layer 60 and the resin substrate layer 81 are measured together, the total light transmittance is preferably 50% or more in a light wavelength range of 400 nm to 700 nm.

[0141] The thickness of the resin substrate layer 81 is preferably 7 μm or more and 250 μm or less. If the thickness of the resin substrate layer 81 is too thin, lamination processing may be difficult. If the thickness of the resin substrate layer 81 is too thick, the resin substrate layer 81 may become too bulky and heavy, and may also be costly. Furthermore, the refractive index of the resin substrate layer 81 is preferably 1.45 or more and 1.55 or less.

[0142] The surface layer 82 is a layer that exhibits a light diffusing effect. The surface layer 82 of this embodiment has a fine uneven shape on its surface, forming a so-called matte surface (rough surface). The surface layer 82 diffuses surface-reflected light due to this fine uneven shape. The surface layer 82 having such a fine uneven shape can be applied with various anti-reflection layers that are used in anti-glare films. For example, the surface layer 82 may be produced by embossing, by mixing translucent fine particles to form a rough surface, by dissolving the surface with a chemical to form a rough surface (a so-called chemical matte surface), or by a molding process using a moldable resin layer.

[0143] Furthermore, the surface layer 82 has a hard coating function. The hard coating function of the surface layer 82 preferably has a pencil hardness of 1H or more. By providing the surface layer 82 with a hard coating function, the light diffusion layer 80 can also function as a protective layer. Furthermore, the surface layer 82 preferably has a regular reflectance of 1.5% or less for light with a wavelength of 535 nm. This is because it is possible to suppress a decrease in the visibility of the mark 2 and the moire display areas 3 and 4 due to reflection on the surface of the marker 1.

[0144] Furthermore, as a characteristic of the adhesive layer 60 and the light diffusion layer 80 combined, it is preferable that the total light transmittance is 85% or more. If this total light transmittance is too low, a sufficient amount of light cannot be secured. Furthermore, as a characteristic of the adhesive layer 60 and the light diffusion layer 80 combined, it is preferable that the haze value is 30% or more, more preferably 40% or more, and even more preferably 70% or more. If the haze value is lower than 70%, the anti-reflection effect begins to decrease, decreases further if it is 40% or less, and decreases significantly if it is 30% or less. On the other hand, it is preferable that the haze value is 95% or less. If the haze value is too high, the image of the mark observed will be blurred.

[0145] FIG. 18 is a graph showing the effect of the light diffusion layer 80. To confirm the effect of providing the light diffusion layer 80, two types of markers were actually produced, one with the light diffusion layer 80 and one without. The two types of markers were then illuminated so that the reflected light was strong at the position of the mark 2 and returned to the camera, and photographed. The changes in light intensity around the black and white inversion area of ​​the mark 2 were quantified and shown in FIG. 18. As shown in FIG. 18, without the light diffusion layer 80, the reflection of the illumination light was directly displayed as a waveform, and no waveform corresponding to the shape of the mark 2 was observed. Note that the light intensity without the light diffusion layer 80 was too strong, exceeding the measurement limit (2.50E+02). In contrast, with the light diffusion layer 80, data was obtained that allowed the light intensity of the white portion and the light intensity of the black portion to be appropriately distinguished and recognized according to the position of the mark 2. When the light diffusion layer 80 was measured using a Murakami Color Laboratory HM-150 haze meter conforming to JIS K7136, the total light transmittance was 90.3% and the haze value was 75.1%. As can be seen from Figure 18, if the light diffusion layer is positioned so that it straddles the mark and its surrounding area, the shape (outline) of the mark can be clearly captured by a camera. However, if the light diffusion layer is positioned only on the mark with the same shape and size as the mark, the resin substrate layer of the light diffusion layer acts as a light guide plate, causing light to be emitted from the edge of the resin substrate layer, resulting in the problem of the mark shape (outline) becoming unclear.

[0146] Next, an example of how to use the marker 1 of this embodiment will be described. FIG. 19 is a diagram showing the marker 1 as viewed from an oblique direction. FIG. 19 illustrates an example of the marker 1 being observed from the oblique direction indicated by arrow B in FIG. 17(b), but without tilting in the vertical direction in FIG. 17(a). When the marker 1 is observed from an oblique direction tilted from its normal direction, for example, as shown in FIG. 19, the moiré M in the moiré display area 3 is observed to move in the longitudinal direction of the moiré display area 3. Note that when the marker 1 is observed from an oblique direction tilted from its normal direction to the longitudinal direction of the moiré display area 4, the moiré M in the moiré display area 4 is observed to move in the longitudinal direction of the moiré display area 4. Therefore, by observing both the moiré M in the moiré display area 3 and the moiré M in the moiré display area 4, the relative orientation of the marker 1 and the observation position can be accurately detected.

[0147] Here, when the observation position of the moiré M is moved to a position significantly deviated from the normal direction of the marker 1, another moiré pattern is observed, and so on. Therefore, if the observation position is significantly deviated from the normal direction of the marker 1, the position and orientation may not be detected correctly. However, the marker 1 of this embodiment includes a mark 2. Detection of the position and orientation using the mark 2 is possible even when the observation position is significantly deviated from the normal direction of the marker 1. On the other hand, detection of the position and orientation using the moiré display areas 3 and 4 can be performed with even higher accuracy than detection of the position and orientation using the mark 2. Therefore, by using both position and orientation detection using the mark 2 and position and orientation detection using the moiré display areas 3 and 4, the range of application can be expanded compared to when only the moiré display areas 3 and 4 are used. In other words, even if the observation position is significantly deviated from the normal direction of marker 1, the position and orientation can be detected using mark 2, and the observation position can be automatically moved according to the detection results. At the stage where final, highly accurate position control is required, the position and orientation can be detected using moiré display areas 3 and 4.

[0148] As described above, the relative position and orientation between the observation position and the marker 1 are expected to have various positional relationships. Therefore, there may be a positional relationship in which illumination light, sunlight, etc. are specularly reflected toward the observation position. Even in such a case, the marker 1 of this embodiment has a light diffusion layer 80, which can appropriately diffuse reflected light and increase the number of situations in which the marker mark 2 and the moire display areas 3 and 4 can be observed.

[0149] As described above, the marker 1 of this embodiment can improve situations in which it becomes difficult to recognize the indicators and other elements indicated by the marker 1 due to illumination light or sunlight, and can provide a marker that is easy to recognize even in environments where sunlight, illumination light, etc. hits the marker.

[0150] (6) Sixth embodiment of the marker 21 is a schematic plan view illustrating a sixth embodiment of a marker according to the present disclosure. The marker 1 of the sixth embodiment includes a mark 2, moiré display areas 3 and 4, and an identification mark 5. The marker 1 of the sixth embodiment is similar to the other embodiments described above, except that the arrangement of the mark 2 and the moiré display areas 3 and 4 is different, and that an identification mark 5 is provided. Therefore, parts that perform the same functions as those of the above-described embodiments are given the same reference numerals, and redundant explanations will be omitted where appropriate.

[0151] In this embodiment, marks 2 are provided near each of the four corners. Moiré display areas 3 are provided near each of the top and bottom edges in FIG. 21. Moiré display areas 4 are provided near each of the left and right edges in FIG. 21. An identification mark 5 is provided in the center of the marker 1.

[0152] The identification mark 5 is a pattern graphic (graphic for identification) that associates a specific meaning with the pattern of the mark and displays unique information by the pattern. For example, the identification mark 5 is associated with a unique number, alphabet, etc. for each different pattern. The identification mark 5 can be a two-dimensional barcode, a three-dimensional barcode, a QR code (registered trademark), ArUco, etc. As described above, various known identification codes can be used for the identification mark 5, but by using an identification mark 5 as in this embodiment, which has a reduced number of patterns and a large pattern, it can be easily detected by a camera.

[0153] Marker 1 of this embodiment is provided with identification mark 5, and therefore can be used not only to detect position and attitude as in the other embodiments described above, but also to identify an electromagnetic wave direction control member having marker 1. Note that, although Fig. 21 illustrates marker 1 with moiré display areas 3 and 4, the purpose of the moiré display areas is to measure the attitude of the marker with high precision, and so if the measurement precision provided by mark 2 alone is sufficient to achieve the desired precision, the moiré display areas can be omitted.

[0154] It is also preferable that the protective layers 70, 70C are laminated via the adhesive layer 60. Even if the marker 1 is hit by something, the protective layers 70, 70C function as shatterproof layers, preventing fragments of the base layer 10 from scattering. Furthermore, even if the base layer 10 is cracked, the first layers 20, 20C and the second layers 30, 30C will not be damaged and will be able to maintain their function as a marker.

[0155] (7) Transformation The present disclosure is not limited to the above-described embodiments, and various modifications and variations are possible, and these are also within the scope of the present disclosure.

[0156] (a) In the first to third embodiments, an example in which the mark 2 is black and its periphery is white has been described. However, this is not limiting, and for example, the mark 2 may be white and its periphery may be black. More specifically, for example, in the first embodiment, the first layer 20 may be white and the second layer 30 on the observation side may be black. FIGS. 10(a) and 10(b) are diagrams showing a modified embodiment in which the first layer 20 is white and the second layer 30 is black in the first embodiment. FIG. 10(a) is a schematic plan view of the marker, and FIG. 10(b) is a cross-sectional view taken along line AA in FIG. 10(a). As shown in FIG. 10(b), by making the first layer 20 of the first embodiment white and the second layer 30 on the observation side black, the mark 2 is white and its periphery is black, as in the marker 1 shown in FIG. 10(a).

[0157] Also, for example, in the third embodiment, the first layer 20C may be black and the second layer 30C on the observation side may be white. FIGS. 11(a) and 11(b) show a modified embodiment in which the first layer 20C is black and the second layer 30C is white in the third embodiment. FIG. 11(a) is a schematic plan view of the marker, and FIG. 11(b) is a cross-sectional view taken along line AA in FIG. 11(a). As shown in FIG. 11(b), by making the first layer 20C of the third embodiment black and the second layer 30C on the observation side white, the mark 2 appears white, as in the marker 1C shown in FIG. 11(a), with the surrounding area appearing black.

[0158] (b) In the first to third embodiments, an example has been described in which the mark 2 is displayed using two colors, black and white. However, the present disclosure is not limited to this, and other colors, such as blue and yellow, may be combined. Furthermore, a configuration in which more layers are stacked so that the mark 2 is observed in three or more colors may be used, for example, by adding a third layer observed in a third color. Furthermore, the color differences in the present disclosure are not limited to differences in color expressed by a combination of RGB, but may also include differences due to multi-tone expression of a single color.

[0159] (c) In the first to third embodiments, examples were described in which the mark 2 was observable under visible light. However, the present invention is not limited to this. For example, the mark 2 may be detected using light in a specific wavelength range, such as the infrared light range (near-infrared wavelength range of 780 nm or more). More specifically, the mark 2 may be observable in the near-infrared light range, but may be unobservable or inconspicuous in the white light (visible light) range. If the mark 2 is formed from a near-infrared absorbing material, the mark 2 becomes discernible by a near-infrared receiving element only when irradiated with near-infrared light, but is indiscernible to the human eye. Known near-infrared absorbing materials, such as ITO, ATO, cyanine compounds, phthalocyanine compounds, dithiol metal complexes, naphthoquinone compounds, diimmonium compounds, and azo compounds, can be used. This makes it possible to make the markers 1 and 1B less noticeable. In such a case, when observed using light in the specific wavelength range, it is preferable that the contrast value between the first color of the first layer 20 and the second color of the second layer 30 is 0.26 or more, and the contrast value between the first color and the second color under visible light is 1.0 or less. By doing so, the marker is inconspicuous under visible light, and highly accurate position and orientation detection can be achieved under light in the specific wavelength range.

[0160] (d) In the first to third embodiments, a configuration has been exemplified in which the protective layer 70 is attached by the adhesive layer 60. However, this is not limiting, and for example, the protective layer may be directly laminated on the second layer 30, or the protective layer may be omitted depending on the usage environment.

[0161] (e) In the first to third embodiments, an example has been described in which a mask M is used in the second exposure step of exposing the mark pattern onto the second layer 30. However, the present invention is not limited to this, and the mark pattern may be exposed by a direct writing method using laser light, for example.

[0162] (f) In the first to third embodiments, an example was described in which the first layer 20 was observable as a mark having an independent shape. However, this is not limiting, and for example, the second layer 30 may be configured to be observable as a mark having an independent shape. In addition, in this regard, the resist material forming the second layer 30 may be either positive or negative.

[0163] (g) In the first to third embodiments, a layer for improving adhesion, a layer for improving surface properties, or a layer for diffusing light to provide anti-glare properties may be inserted between each layer or on the outermost surface, etc., as appropriate.

[0164] (h) In the third embodiment, an example in which a planarizing layer 91 is provided has been described. Such a planarizing layer may also be provided in the first embodiment. FIG. 12 is a cross-sectional view showing a modified embodiment in which a planarizing layer 91 is provided in the opening 30a of the second layer 30 of the first embodiment. By providing the planarizing layer 91 in the opening 30a of the second layer 30 as shown in FIG. 12, it is possible to prevent the formation of voids. Furthermore, in the embodiment of FIG. 16 and the third embodiment, an example in which the height of the planarizing layer 91 is lower than that of the second layers 30 and 30C has been shown, but the planarizing layer 91 may be slightly higher than the second layers 30 and 30C, and more preferably, the planarizing layer 91 is the same height as the second layers 30 and 30C.

[0165] (i) In the fourth embodiment, an example was described in which the first layer 20 is black and the second layer 30 is white. This is not a limitation, and for example, the first layer 20 may be white and the second layer 30 may be black. The combination is not limited to black and white, and other colors such as blue and yellow may also be used.

[0166] (j) In the fourth embodiment, an example was described in which the black portion of the mark 2 and the first pattern 23 were formed by the first layer 20. This is not limiting, and for example, the mark 2 and the first pattern 23 may be provided on different layers.

[0167] (k) In the fourth embodiment, a configuration in which the protective layer 70 is attached by the adhesive layer 60 is exemplified. However, the present invention is not limited to this, and for example, the protective layer may be directly laminated on the second layer 30, or the protective layer may be omitted depending on the usage environment.

[0168] (l) In the fourth embodiment, an example was described in which the moiré display area 3 and the moiré display area 4 are arranged so that their longitudinal directions are perpendicular to each other. This is not limiting, and for example, an additional moiré display area may be added. In this case, the longitudinal direction of the additional moiré display area may be arranged so that it intersects with the moiré display area 3 and the moiré display area 4 at an angle of 45 degrees, for example. By using such a configuration, the accuracy of position and orientation detection can be further improved.

[0169] (m) In the fifth embodiment, the light diffusion layer is described as being formed by attaching a sheet-like member. However, the present invention is not limited to this, and the light diffusion layer may be formed by applying a resin or the like to form the light diffusion layer.

[0170] (n) In the fifth embodiment, the light diffusion layer has been described with an example in which it has fine irregularities on its surface. However, the present invention is not limited to this. For example, the light diffusion layer may have light diffusion particles inside, or may have both fine irregularities on its surface and light diffusion particles inside.

[0171] (o) In the fifth embodiment, an example was given in which the light diffusion layer was provided partially in an island shape. However, the present invention is not limited to this, and the light diffusion layer may be provided over the entire surface of the marker.

[0172] (p) In the fifth embodiment, an example was described in which the first layer 20 is black and the second layer 30 is white. This is not a limitation, but for example, as shown in FIG. 20 , the first layer 20 may be white and the second layer 30 may be black. The combination is not limited to black and white, and may include other colors, such as blue and yellow. Furthermore, a configuration in which more layers are stacked so that three or more colors are observed may be added, for example, by adding a third layer that is observed in a third color. Furthermore, the color differences in the present invention are not limited to differences in color expressed by a combination of RGB, but may also include differences due to multi-tone expression of a single color.

[0173] (q) In each embodiment, an example has been described in which both the first layer 20 and the second layer 30 are made of a resist material. However, this is not limiting, and the first layer 20 and the second layer 30 may be made by, for example, laminating a thermosetting resin in the required area by an inkjet method. Even in such a case, the linear expansion coefficient of the base layer 10 is 10 × 10 -6 / °C or less, sufficient accuracy can be ensured depending on the application.

[0174] (8) Marker placement In the electromagnetic wave direction control member, the marker may be detachably or non-detachably arranged. Among these, it is preferable that the marker be detachably arranged. This is because by detecting the position and attitude of the electromagnetic wave direction control member and removing the marker after installing the electromagnetic wave direction control member, it is possible to prevent the marker from affecting the reflection and refraction of the electromagnetic wave when controlling the direction of the electromagnetic wave with the electromagnetic wave direction control member. On the other hand, if the position and attitude of the electromagnetic wave direction control member are changed frequently, the marker may be left attached after detecting the position and attitude of the electromagnetic wave direction control member and installing the electromagnetic wave direction control member.

[0175] When the marker is non-removably attached or when the marker is to remain attached, it is preferable that the marker does not contain a metallic material, i.e., contains a non-metallic material. This is because the effect of the marker on the reflection and refraction of electromagnetic waves can be reduced. Examples of non-metallic materials include dielectrics. Even when a dielectric is used for the marker, if the thickness is greater than the wavelength of the target electromagnetic waves, it may affect the reflection and refraction of the electromagnetic waves. Therefore, it is preferable that the overall thickness of the marker is equal to or less than ¼ of the wavelength of the target electromagnetic waves.

[0176] When the marker is disposed detachably, a method of attaching the marker to the electromagnetic wave direction control member may be a method using an adhesive. Specifically, an adhesive tape or an adhesive sheet may be used. More specifically, a double-sided adhesive tape, a masking tape, a mending tape, or a masking tape may be used. The adhesive preferably has removability.

[0177] When a marker is attached to an electromagnetic wave direction control member using an adhesive, a single-sided adhesive sheet may be attached to the outer periphery of the marker from above the electromagnetic wave incident side of the marker, and the marker may be attached to the electromagnetic wave direction control member, or a double-sided adhesive sheet may be attached to the side of the marker opposite the electromagnetic wave incident side or to the electromagnetic wave incident side of the electromagnetic wave direction control member, and the marker may be attached to the electromagnetic wave direction control member. When a marker is attached to an electromagnetic wave direction control member using an adhesive, the marker is easier to remove than when the marker is attached to the electromagnetic wave direction control member via an adhesive.

[0178] When an adhesive sheet is attached to a marker, it is preferable to attach it so as not to cover the mark for measuring position and orientation, the moiré display area, and the figure for identification (identification mark). That is, it is preferable that the adhesive sheet is arranged so that the positions where the mark for measuring position and orientation, the moiré display area, and the figure for identification (identification mark) are arranged do not overlap with the position where the adhesive sheet is arranged in a planar view. Specifically, it is preferable that the adhesive sheet is arranged on the outer periphery of the surface of the marker opposite the electromagnetic wave incident side or on the outer periphery of the surface of the marker on the electromagnetic wave incident side. Furthermore, the position where the adhesive sheet is attached to the marker may be the entire outer periphery of the marker or may be a part of the outer periphery of the marker. Since this makes it easier to remove the marker, it is preferable to attach the adhesive sheet to a part of the outer periphery of the marker. Furthermore, the adhesive sheet may be attached to the edges of the marker, the corners of the marker, or the edges and corners of the marker. When adhesive sheets are attached to the sides of a marker, the adhesive sheets may be attached to two opposing sides of the marker, three sides of the marker, or four sides of the marker.

[0179] On the other hand, when the marker is arranged so as not to be detachable, methods for attaching the marker to the electromagnetic wave direction control member include a method using a pressure sensitive adhesive or adhesive.

[0180] Furthermore, the position of the marker in the electromagnetic wave direction control member is not particularly limited. When the shape of the electromagnetic wave direction control member in a plan view is rectangular, the electromagnetic wave direction control member is often designed and installed so that two of the four sides of the electromagnetic wave direction control member are horizontal and the remaining two are vertical. In this case, it is preferable to align the direction of the side of the electromagnetic wave direction control member that is intended to be horizontal with the horizontal direction of the marker, or to align the direction of the side of the electromagnetic wave direction control member that is intended to be vertical with the vertical direction of the marker. This allows for easy conversion of the relative position and orientation between the observation position and the marker to the relative position and orientation between the observation position and the electromagnetic wave direction control member. In this case, it is more preferable to align the side of the electromagnetic wave direction control member with the side of the marker. This is because it is easy to align the horizontal direction of the side of the electromagnetic wave direction control member with the horizontal direction of the marker, or to align the vertical direction of the side of the electromagnetic wave direction control member with the vertical direction of the marker.

[0181] The marker 1 may be placed at a corner of the electromagnetic wave propagation direction control member 100 as shown in Fig. 1, or may be placed near the center of the left and right sides of the lower side of the electromagnetic wave propagation direction control member 100 as shown in Fig. 22(a), or may be placed at the center of the electromagnetic wave propagation direction control member 100 as shown in Fig. 22(b). Although not shown, the marker 1 may be placed near the center of the left and right sides of the electromagnetic wave propagation direction control member 100, or may be placed near the center of the left and right sides of the electromagnetic wave propagation direction control member 100.

[0182] 2. Hidden layer In the electromagnetic wave direction control member of the present disclosure, as illustrated in Figure 23, a concealing layer 101 that is opaque to visible light and transparent to near-infrared light may be arranged on the electromagnetic wave incident side of the marker 1.

[0183] The concealing layer is disposed on the electromagnetic wave incident side of the marker. Furthermore, since the concealing layer only needs to be disposed on the electromagnetic wave incident side of the marker, when the electromagnetic wave direction control member has a protective member on the outermost surface on the electromagnetic wave incident side, as described below, the concealing layer may be disposed between the marker and the protective member. Furthermore, the protective member may also function as the concealing layer. When the protective member also functions as the concealing layer, the marker is disposed on the side of the protective member opposite the electromagnetic wave incident side. In this case, the protective member is opaque to visible light and transparent to near-infrared light. Furthermore, the marker may be disposed on the electromagnetic wave incident side surface of the protective member, and the concealing layer may be disposed on the electromagnetic wave incident side surface of the marker. In such a case, the presence of the marker can be made less noticeable by making the design and texture of the concealing layer similar to or in harmony with the design and texture of the protective member.

[0184] The concealing layer is opaque to visible light and transparent to near-infrared light. That is, the concealing layer has a concealing property for visible light but not for near-infrared light. Examples of materials for the concealing layer, i.e., materials that have a concealing property for visible light but not for near-infrared light, are exemplified below.

[0185] The material for the concealing layer can be, for example, a material similar to that of the optical article for infrared communication described in JP 2010-72616 A. The material described in JP 2010-72616 A comprises a transparent binder resin uniformly dispersed with fine particles having a refractive index different from that of the binder resin, the fine particles scattering and reflecting light in the visible light range to produce a white color, and the average particle size of the fine particles is set to have wavelength dependency that increases the transmittance of light on the long wavelength side, and the transmittance in the infrared communication wavelength range is set to 12% or more.

[0186] The material for the hiding layer can be, for example, a material similar to the black pigment composition described in JP 2019-207303 A. The material described in JP 2019-207303 A contains a pigment that does not contain a red pigment, a binder resin, and an organic solvent, and the pigment contains at least one pigment selected from the group consisting of CI Pigment Green 62 and CI Pigment Green 63, a purple pigment, and a yellow pigment. As a result, this material has excellent hiding properties in the visible light region with wavelengths of 400 nm to 700 nm, appears black in visible light, and has high transmittance in the near-infrared region with wavelengths of 800 nm or more.

[0187] The material for the concealing layer can be, for example, a material similar to the infrared-transmitting member described in JP 2018-44991 A. The material described in JP 2018-44991 A contains a color pigment other than a black pigment and a resin binder, and has a transmittance of 80% or more for at least one of light having a wavelength of 850 nm and light having a wavelength of 940 nm, and a transmittance of 0.01% or less for light having a wavelength greater than 380 nm and less than 780 nm. This material can be modified to produce a variety of colors observed in visible light by changing the color of the color pigment. Examples of color pigments include red pigments, yellow pigments, blue pigments, green pigments, and purple pigments, and these color pigments can be mixed together.

[0188] The color of the concealing layer observed in visible light can be white, black, or various other colors by appropriately selecting the above-mentioned example materials. The parallel light transmittance (transmittance at a wavelength of 555 nm) of the concealing layer in visible light is preferably 30% or less. This is to make the marker unrecognizable to the human eye. Furthermore, the near-infrared light transmittance (transmittance at a wavelength of 940 nm) of the concealing layer is preferably 10% or more. This is to obtain good photographic results by the photographing unit.

[0189] By disposing the concealing layer on the electromagnetic wave incident side of the marker, the marker can be made invisible in visible light. As described above, the appearance (color) of the concealing layer in visible light can be changed depending on the material. Therefore, by using a concealing layer whose color is close to the color of the electromagnetic wave direction control member, the marker does not stand out in visible light. Therefore, the marker does not give an unpleasant feeling or spoil the aesthetic appearance, and can be easily used.

[0190] 3.Electromagnetic wave direction control components The electromagnetic wave direction control member in the present disclosure is a member that controls the direction of propagation of an electromagnetic wave. The electromagnetic wave direction control member may be a reflective electromagnetic wave direction control member that reflects electromagnetic waves, or a transmissive electromagnetic wave direction control member that transmits electromagnetic waves.

[0191] The reflective electromagnetic wave direction control member is not particularly limited as long as it can reflect electromagnetic waves and control the direction of propagation of the electromagnetic waves. Examples include a reflector that reflects electromagnetic waves in a specular reflection direction and a reflector that reflects electromagnetic waves in a direction other than the specular reflection direction. An example of a reflector that reflects electromagnetic waves in a specular reflection direction is FSS. Examples of reflectors that reflect electromagnetic waves in a direction other than the specular reflection direction include reflectarrays and frequency-selective reflectors that reflect electromagnetic waves of a specific frequency band in a direction other than the specular reflection direction. Reflectarrays are also called metasurface reflectors. Examples of frequency-selective reflectors that reflect electromagnetic waves of a specific frequency band in a direction other than the specular reflection direction include the frequency-selective reflectors described in International Publication Nos. 2022-186385, 2023-027195, 2023-210566, and 2024-005011. The reflective electromagnetic wave direction control member can be selected appropriately depending on the purpose of use and the environment of use.

[0192] The reflective electromagnetic wave direction control member may have a reflecting member that reflects electromagnetic waves, and the reflecting member may have a reflection phase control function that controls the reflection phase of the electromagnetic waves. The reflecting member may have a wavelength selection function that reflects only electromagnetic waves in a specific frequency band. The reflecting member may also have a dielectric substrate and a plurality of reflecting elements arranged on the electromagnetic wave incident side of the dielectric substrate. The reflecting member may have a plurality of reflecting elements with different sizes and shapes arranged therein. In either reflecting member, it is possible to change the reflection phase of the electromagnetic waves by changing the size and shape of the reflecting elements. The reflecting member may also have a reflecting portion that reflects the electromagnetic waves, and a dielectric layer that is arranged on the electromagnetic wave incident side of the reflecting member, has a concavo-convex structure in which a plurality of unit structures having a thickness distribution in which the thickness increases in a predetermined direction are arranged, and transmits the electromagnetic waves.

[0193] Furthermore, the reflective electromagnetic wave direction control member may have a reflecting member that reflects electromagnetic waves and a protective member arranged on the electromagnetic wave incident side of the reflecting member. The material of the protective member is, for example, a resin. That is, when the protective member is a resin sheet, the protective member has at least a resin layer. Furthermore, when the protective member is a resin sheet, the protective member can also impart design to the electromagnetic wave direction control member. In this case, the protective member may have, for example, at least a resin layer and a design layer, or may have at least a resin layer that also serves as a design layer. Furthermore, as described above, when the protective member also serves as a concealing layer, the protective member is opaque to visible light and transparent to near-infrared light.

[0194] The transmission-type electromagnetic wave direction control member is not particularly limited as long as it can transmit electromagnetic waves and control the direction of propagation of the electromagnetic waves, and examples thereof include frequency-selective refraction plates that refract electromagnetic waves of a specific frequency band in a desired direction. Examples of frequency-selective refraction plates that refract electromagnetic waves of a specific frequency band in a desired direction include dielectric lens antennas, metasurface lenses, and metasurface refraction plates. The transmission-type electromagnetic wave direction control member is selected appropriately depending on the purpose of use and the environment of use.

[0195] In particular, it is preferable that the electromagnetic wave direction control member is a frequency selective reflector that reflects electromagnetic waves of a specific frequency band in a direction different from the specular reflection direction, or a frequency selective refraction plate that refracts electromagnetic waves of a specific frequency band in a desired direction.

[0196] A-2. Second embodiment of electromagnetic wave direction control member A second embodiment of an electromagnetic wave direction control member in the present disclosure is an electromagnetic wave direction control member that controls the direction of propagation of an electromagnetic wave, and has a marker on the electromagnetic wave incident side of the electromagnetic wave direction control member.

[0197] Fig. 1 is a schematic plan view illustrating an electromagnetic wave direction control member according to the present disclosure. As shown in Fig. 1, the electromagnetic wave direction control member 100 has a marker 1. The marker 1 has a substantially square shape in plan view, and a plurality of marks 2 are arranged on the marker 1. Specifically, circular marks 2 are arranged near each of the four corners of the marker 1, for a total of four marks 2 arranged at intervals.

[0198] The marker 1 can be used to detect the relative attitude of the electromagnetic wave direction control member 100 with respect to the observation position. That is, the relative attitude of the marker 1 with respect to the observation position (camera) can be detected from the image of the marker 1 captured by the camera. Then, based on the relative attitude of the marker 1 with respect to the observation position (camera), the relative attitude of the electromagnetic wave direction control member 100 with respect to the observation position (camera) can be detected.

[0199] Furthermore, the marker 1 can be used to detect not only the relative attitude of the electromagnetic wave direction control member 100 with respect to the observation position, but also the relative position of the electromagnetic wave direction control member 100 with respect to the observation position. In this case, the relative position and attitude between the observation position (camera) and the marker 1 can be detected from the results of capturing an image of the marker 1 by a camera. Then, based on the relative position and attitude between the observation position (camera) and the marker 1, the relative position and attitude between the observation position (camera) and the electromagnetic wave direction control member 100 can be detected.

[0200] Therefore, when an electromagnetic wave direction control member is installed on the propagation path of the electromagnetic wave from the base station, it is possible to install the electromagnetic wave direction control member as designed based on the relative position and attitude of the electromagnetic wave direction control member with respect to the observation position (camera).

[0201] Furthermore, it is possible to detect the relative position and attitude of the electromagnetic wave direction control member in real time. Therefore, it is possible to actually measure the position and attitude of the electromagnetic wave direction control member on-site in real time, thereby shortening the time required for measurements to install the electromagnetic wave direction control member and reducing costs. Furthermore, it is possible to fine-tune the position and attitude of the electromagnetic wave direction control member on-site in real time, thereby shortening the time required for positioning the electromagnetic wave direction control member and reducing costs. Furthermore, it is also possible to detect deviations in position and attitude after the electromagnetic wave direction control member has been installed.

[0202] Therefore, the accuracy of installation of the electromagnetic wave direction control member can be improved, and the electromagnetic wave direction control member can be made to exhibit desired characteristics.

[0203] Details of the second embodiment of the electromagnetic wave direction control member are the same as those of the first embodiment of the electromagnetic wave direction control member described above.

[0204] In the electromagnetic wave direction control member of the present disclosure, as exemplified in FIG. 23, a concealing layer 101 that is transparent to near-infrared light may be disposed on the electromagnetic wave incident side of the marker 1. In this case, a near-infrared absorbing material is used for the mark of the marker 1. In this case, the marker 1 is detected using near-infrared light. The marker 1 can only be detected when irradiated with near-infrared light, and cannot be recognized by the human eye. This makes it possible to make the marker 1 inconspicuous. In other words, the marker is inconspicuous under visible light, and the position and orientation of the marker can be detected under near-infrared light.

[0205] The shielding layer is only required to be transparent to near-infrared light, and is preferably opaque to visible light. The shielding layer is similar to the shielding layer in the first embodiment of the electromagnetic wave direction control member described above.

[0206] B. Measurement System The measurement system in the present disclosure has two embodiments, each of which will be described separately below.

[0207] B-1. First embodiment of measurement system A first embodiment of a measurement system in the present disclosure includes an electromagnetic wave direction control member having a marker and controlling the direction of propagation of an electromagnetic wave, an imaging unit that images the marker, and a calculation unit that calculates the relative position and attitude of the electromagnetic wave direction control member with respect to the imaging unit using the image of the marker captured by the imaging unit.

[0208] 24 is a diagram illustrating a first embodiment of the measurement system. The measurement system 500A includes an electromagnetic wave direction control member 100 having the above-described marker 1, an imaging unit (camera) 201, and a calculation unit 202.

[0209] The photographing unit (camera) 201 is provided to photograph the marker 1. A camera is used as the photographing unit 201. The camera is not particularly limited, but a USB camera is preferably used. The magnification of the camera is adjusted appropriately depending on the size of the marker 1 in a plan view and the distance between the camera and the electromagnetic wave direction control member. For example, if the distance between the camera and the electromagnetic wave direction control member is relatively long, the size of the marker 1 may be increased and the magnification of the camera may be increased. When the magnification of the camera is increased, a telephoto lens may be used. On the other hand, for example, if the distance between the camera and the electromagnetic wave direction control member is relatively short, the size of the marker 1 may be reduced and the magnification of the camera may be reduced.

[0210] When the measurement system of this embodiment is implemented, and the marker is removed after the electromagnetic wave direction control member is installed, the wavelength for reading the marker is not particularly limited, but is usually visible light. That is, a visible light camera is used. On the other hand, when a concealing layer is disposed on the electromagnetic wave incident side of the marker in the electromagnetic wave direction control member, the wavelength for reading the marker is near-infrared light. That is, a near-infrared camera is used. In this case, if the amount of light is insufficient, an infrared light or the like is used in combination as appropriate.

[0211] Using an image of the marker 1 captured by the image capturing unit (camera) 201, the computing unit 202 computes the relative position and orientation between the image capturing unit (camera) 201 and the marker 1, and also computes the relative position and orientation between the image capturing unit (camera) 201 and the electromagnetic wave direction control member 100. Specifically, the computing unit 202 can obtain the position coordinates, yaw angle, pitch angle, and roll angle of the electromagnetic wave direction control member in a three-dimensional spatial coordinate system in which the camera position is the origin, the camera's imaging direction is the z-axis, and the horizontal and vertical directions of the camera perpendicular to the z-axis are the x-axis and y-axis, respectively. Furthermore, by adjusting the camera position so that the xy plane of the three-dimensional spatial coordinate system with the camera as the origin is parallel to the installation surface on which the electromagnetic wave direction control member is to be installed, it is possible to easily measure the in-plane rotation on the installation surface (rotation around the z-axis), positional deviation on the installation surface, and lift from the installation surface.

[0212] The method used by the calculation unit 202 to calculate the position and orientation of the marker 1 using the captured image of the marker 1 is, for example, the method described in "Fundamentals and Latest Trends of AR Marker Technology" by Hideyuki Tanaka, Journal of the Institute of Electrical, Information and Communication Engineers, Vol. 97, No. 8, 2014, pp. 734-740. This technology is also published at the following internet URL: "Detection of ArUco Markers" [searched June 6, 2022], internet<URL:https: / / docs.opencv.org / 4.x / d5 / dae / tutorial_aruco_detection.html> This web page describes the Pose Estimation section, and if you consider the centers of the four marks 2 as the coordinate vectors of the four corners of the ArUco Marker, you can easily calculate it using functions from OpenCV (Open Source Computer Vision Library).

[0213] The calculation unit 202 is configured by installing a computer program in a computer. More specifically, the calculation unit 202 is configured by installing an application program for the measurement system in a computer. The computer may be a general-purpose smartphone, a tablet terminal, a laptop computer, or the like. In this specification, the term "computer" refers to an information processing device equipped with a control unit, a storage device, and the like.

[0214] Typically, the relative position and orientation of the marker are measured in a three-dimensional coordinate system with the camera as the origin. In this case, it is recommended to install the camera so that the xz plane of the three-dimensional coordinate system with the camera as the origin is horizontal. Furthermore, when acquiring information about the position and orientation of the electromagnetic wave direction control member with the base station as the reference, it is recommended to install the camera directly below the base station, for example. By installing the camera directly below the base station, it becomes easier to convert the position and orientation of the electromagnetic wave direction control member in the three-dimensional coordinate system with the camera as the origin into the position and orientation from the base station. In this case, it is recommended to adjust the horizontal direction of the camera so that the center of the marker installed at the desired location as the reference installation position, such as the planned installation location of the electromagnetic wave direction control member, is x, y = 0, 0 in the three-dimensional coordinate system with the camera as the origin, and then adjust the elevation angle of the camera and the height of the camera. Installing the camera in this manner makes it easier to intuitively grasp the relative position and orientation of the base station and the marker from the values ​​indicating the relative position and orientation between the camera and the marker. When adjusting the camera height, the camera height should be recorded. In a three-dimensional spatial coordinate system with the camera as the origin, if the center of the marker at the desired installation position does not equal x, y = 0, 0, as described below, another reference point whose positional relationship with the camera is known can be set on the installation surface, a second marker can be placed at that reference point, and the relative position and orientation of the second marker with respect to the camera can be measured to correct the coordinate system. Furthermore, if it is difficult to install the camera directly below the base station, a reference position whose positional relationship with the base station is known can be set, and the relative position and orientation of the marker can be measured to correct the coordinate system. In this way, when correcting the coordinate system, such as when installing the camera at a reference position other than directly below the base station or when using a second marker, the coordinate system correction can be simplified by installing the camera so that the x-y plane in the three-dimensional spatial coordinate system with the camera as the origin is parallel to the installation surface, as described above.

[0215] When installing the electromagnetic wave direction control member, the markers are photographed with a camera while the electromagnetic wave direction control member is aligned with the installation surface, and the relative position and attitude of the electromagnetic wave direction control member are calculated using the image of the markers while the electromagnetic wave direction control member is moved. Then, when the position and attitude of the electromagnetic wave direction control member reach predetermined values ​​determined in advance by design, the electromagnetic wave direction control member is fixed to the installation surface.

[0216] Here, in order to determine predetermined values ​​for the position and attitude of the electromagnetic wave direction control member, a second embodiment of the measurement system described below may be executed before installing the electromagnetic wave direction control member to measure the relative position and attitude between the camera and the installation surface in advance, or it is not necessary to measure the relative position and attitude between the camera and the installation surface in advance.

[0217] If the relative position and orientation between the camera and the installation surface are not measured in advance, a reference point whose positional relationship with the camera is known can be set on the installation surface, a second marker can be placed at the reference point, and the relative position and orientation of the second marker relative to the camera can be measured to obtain a correction value between the target value for reading the position and orientation of the marker attached to the electromagnetic wave direction control member and a predetermined value determined in advance through design. In this case, if the camera is installed so that the xz plane of a three-dimensional spatial coordinate system with the camera as the origin is horizontal, obtaining the correction value is easy. The reference point on the installation surface can be, for example, a point on the installation surface whose height from the floor and horizontal distance from a wall or a wall corner are known.

[0218] As described above, according to the measurement system 500A of this embodiment, by providing the marker 1 on the electromagnetic wave direction control member 100, it is possible to measure the relative position and attitude of the electromagnetic wave direction control member 100. Therefore, when installing an electromagnetic wave direction control member on the propagation path of an electromagnetic wave from a base station, it is possible to install the electromagnetic wave direction control member as designed based on the relative position and attitude of the electromagnetic wave direction control member with respect to the camera, and the positional relationship between the camera and the base station.

[0219] Furthermore, it is possible to detect the relative position and attitude of the electromagnetic wave direction control member in real time. Therefore, it is possible to measure the position and attitude of the electromagnetic wave direction control member on-site in real time, thereby shortening the time required for measurements to install the electromagnetic wave direction control member. Furthermore, it is possible to fine-tune the position and attitude of the electromagnetic wave direction control member on-site in real time, thereby shortening the time required for positioning the electromagnetic wave direction control member. Furthermore, it is also possible to detect deviations in position and attitude after the electromagnetic wave direction control member has been installed.

[0220] Therefore, the accuracy of installation of the electromagnetic wave direction control member can be improved, and the electromagnetic wave direction control member can be made to exhibit desired characteristics.

[0221] B-2. Second embodiment of the measurement system A second embodiment of the measurement system of the present disclosure includes a marker placed on an installation surface on which an electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave is installed, an imaging unit that photographs the marker, and a calculation unit that uses the image of the marker photographed by the imaging unit to calculate the relative position and attitude of the installation surface with respect to the imaging unit.

[0222] The second embodiment of the measurement system is mainly implemented for the purpose of obtaining target values ​​for the position and attitude that serve as a guide when adjusting the installation position of the electromagnetic wave direction control member, and information on the relative position and attitude between the base station and the planned installation area of ​​the electromagnetic wave direction control member, which is necessary for designing the electromagnetic wave direction control member.

[0223] 25 is a diagram illustrating a second embodiment of the measurement system. Measurement system 500B includes marker 1 placed on installation surface 510 on which an electromagnetic wave direction control member that controls the direction of propagation of electromagnetic waves is to be installed, an imaging unit (camera) 201, and a calculation unit 202. Marker 1 is placed in planned installation area 511 on installation surface 510 for the electromagnetic wave direction control member.

[0224] The marker 1 is the same as the marker included in the electromagnetic wave direction control member described above. One or more markers may be placed on the installation surface. When more than one marker is placed on the installation surface, the relative position and orientation between each marker and the camera can be measured, and the relative positions and orientations between the markers can be calculated from the obtained measurement values.

[0225] When the second embodiment of the measurement system is implemented to measure the relative position and orientation between the installation surface and the camera, and then the measurement system is temporarily removed and the relative position and orientation between the installation surface and the camera are measured again when an electromagnetic wave propagation direction control member is installed, it is preferable to keep the position and orientation of the camera unchanged before and after the re-measurement. Therefore, it is preferable to record information about the marker, such as its height from the floor and its horizontal distance from a wall or a wall corner, so that the marker can be placed at the same position on the installation surface later. Furthermore, when re-measuring, it is preferable to place the marker at the same position on the installation surface and adjust the position and orientation of the camera so that the relative position and orientation between the marker and the camera are the same as those measured before the re-measurement.

[0226] The installation surface is not limited to a wall, but may also be a movable structure such as a stand, a partition, etc. Among these, it is preferable that the installation surface is immovable, such as a wall.

[0227] The photographing unit (camera) 201 is provided to photograph the marker 1. A camera is used as the photographing unit 201. The camera is not particularly limited, but a USB camera is preferably used. The magnification of the camera is adjusted appropriately according to the size of the marker 1 in a planar view and the distance between the camera and the installation surface. For example, if the distance between the camera and the installation surface is relatively long, the size of the marker 1 may be increased and the magnification of the camera may be increased. When the magnification of the camera is increased, a telephoto lens may be used. On the other hand, for example, if the distance between the camera and the installation surface is relatively short, the size of the marker 1 may be reduced and the magnification of the camera may be reduced.

[0228] The wavelength for reading the marker is not particularly limited, but is usually visible light, i.e., a visible light camera is used.

[0229] The calculation unit 202 uses the image of the marker 1 captured by the photographing unit (camera) 201 to calculate the relative position and attitude between the photographing unit (camera) 201 and the marker 1, and further calculates the relative position and attitude between the photographing unit (camera) 201 and the installation surface 510.

[0230] The method of calculating the position and orientation of the marker 1 using the captured image of the marker 1 performed by the calculation unit 202 is the same as that of the first embodiment of the measurement system.

[0231] The calculation unit 202 is the same as that in the first embodiment of the measurement system.

[0232] The position of the marker on the installation surface is not particularly limited. If there is a landmark on the installation surface, the marker may be placed on the landmark. Examples of landmarks on the installation surface include wall corners, waist walls, wall joints, and objects installed on the wall. Furthermore, if the planned installation area on the installation surface where the electromagnetic wave direction control member will be installed has been roughly determined, the marker may be placed within the planned installation area. In this case, the values ​​of the position and orientation relative to the camera obtained from the marker may be used as target values ​​at the time of installation.

[0233] Typically, the relative position and orientation of the marker are measured in a three-dimensional coordinate system with the camera as the origin. In this case, it is recommended to install the camera so that the xz plane of the three-dimensional coordinate system with the camera as the origin is horizontal. Furthermore, when acquiring information on the position and orientation of the planned installation area of ​​the electromagnetic wave direction control member with the base station as the reference, it is recommended to install the camera directly below the base station, for example. By installing the camera directly below the base station, it becomes easier to convert the position and orientation of the planned installation area of ​​the electromagnetic wave direction control member in the three-dimensional coordinate system with the camera as the origin into the position and orientation from the base station. In this case, it is recommended to adjust the horizontal direction of the camera, make the elevation angle of the camera horizontal, and adjust the height of the camera so that the center of the marker installed at the desired installation location, such as the planned installation area of ​​the electromagnetic wave direction control member, is at x, y = 0, 0 in the three-dimensional coordinate system with the camera as the origin. Installing the camera in this manner makes it easier to intuitively grasp the relative position and orientation of the base station and marker from the values ​​indicating the relative position and orientation between the camera and marker. When adjusting the height of the camera, the height of the camera should be recorded. In a three-dimensional spatial coordinate system with the camera as the origin, if the center of the marker at the desired installation position does not equal x, y = 0, 0, as described below, another reference point whose positional relationship with the camera is known can be set on the installation surface, a second marker can be placed at that reference point, and the relative position and orientation of the second marker with respect to the camera can be measured to correct the coordinate system. Furthermore, if it is difficult to install the camera directly below the base station, a reference position whose positional relationship with the base station is known can be set, and the relative position and orientation of the marker can be measured to correct the coordinate system. In this way, when correcting the coordinate system, such as when installing the camera at a reference position other than directly below the base station or when using a second marker, the coordinate system correction can be simplified by installing the camera so that the x-y plane in the three-dimensional spatial coordinate system with the camera as the origin is parallel to the installation surface, as described above.

[0234] The reference point on the installation surface can be, for example, a point on the installation surface whose height from the floor and horizontal distance from the wall are known. If there is a mark on the installation surface, the mark may be used as the reference point. Examples of marks on the installation surface include wall corners, waist walls, wall joints, and objects installed on the wall. The height of the base station from the floor can be obtained from drawings or measured with a laser rangefinder.

[0235] To measure the position and orientation of the installation surface using the coverage hole as the reference, for example, a camera can be installed at a representative point within the coverage hole. In this case, in a three-dimensional coordinate system with the camera as the origin, the horizontal direction of the camera can be adjusted so that the center of a marker installed at a desired reference installation location, such as the planned installation area for an electromagnetic wave direction control member, is at x, y = 0, 0. The elevation angle of the camera can then be leveled and the camera height adjusted. Installing the camera in this manner makes it easier to intuitively grasp the relative position and orientation of the marker and the representative point within the coverage hole from the values ​​indicating the relative position and orientation between the camera and the marker. When adjusting the camera height, the camera height should be recorded. If the center of the marker at the desired reference installation location does not coincide with x, y = 0, 0 in the three-dimensional coordinate system with the camera as the origin, a different reference point with a known positional relationship to the camera can be set on the installation surface, as described below, and a second marker can be placed at that reference point. The relative position and orientation of the second marker relative to the camera can then be measured and the coordinate system corrected. Furthermore, if it is difficult to install a camera at a representative point within a coverage hole, a reference position whose positional relationship with the representative point is known can be established, and the relative position and orientation of the reference position and marker can be measured to correct the coordinate system. In this way, when correcting the coordinate system, such as when installing a camera at a reference position other than the representative point of the coverage hole or when using a second marker, it is easier to correct the coordinate system by installing the camera so that the xy plane in a three-dimensional spatial coordinate system with the camera as the origin is parallel to the installation surface, as described above.

[0236] The reference point on the installation surface can be, for example, a point on the installation surface whose height from the floor and horizontal distance from the wall are known. If there is a landmark on the installation surface, the landmark can also be used as the reference point. As mentioned above, examples of landmarks on the installation surface include wall corners, waist walls, wall joints, and objects installed on the wall. The height from the floor of the representative point of the coverage hole can be determined at the time of design, but it is generally preferable that the height be close to the height from the floor of the mobile terminal when a person uses it, specifically, approximately 1 m to 2 m.

[0237] As described above, according to the measurement system 500B of this embodiment, by providing the marker 1 on the installation surface 510, the relative position and orientation of the installation surface 510 can be measured. Therefore, the positional relationship between the base station, the electromagnetic wave direction control member, and the coverage hole can be easily measured. This reduces the time required for measurements to install the electromagnetic wave direction control member, and reduces costs. Furthermore, by measuring the position and orientation of the installation surface in advance, the accuracy of installation of the electromagnetic wave direction control member can be improved. Therefore, the electromagnetic wave direction control member can exhibit desired characteristics.

[0238] The present disclosure is not limited to the above-described embodiments. The above-described embodiments are merely examples, and any configuration that is substantially identical to the technical idea described in the claims of the present disclosure and that provides similar effects is included within the technical scope of the present disclosure.

[0239] The present disclosure provides the following inventions. [1] An electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave, having a marker, The electromagnetic wave direction control member, wherein the marker is used to detect the relative attitude of the electromagnetic wave direction control member with respect to an observation position. [2] The electromagnetic wave direction control member according to [1], wherein the marker is used to detect the relative position of the electromagnetic wave direction control member with respect to the observation position. [3] The electromagnetic wave direction control member according to [1] or [2], wherein the marker is detachably arranged. [4] The electromagnetic wave direction control member according to [1] or [2], having a shielding layer on the electromagnetic wave incident side of the marker, the shielding layer being opaque to visible light and transparent to near-infrared light. [5] The electromagnetic wave direction control member according to [1], [2] or [4], wherein the marker contains a non-metallic material. [6] The electromagnetic wave propagation direction control member according to any one of [1] to [5], which is a frequency selective reflector that reflects the electromagnetic wave in a direction different from the specular reflection direction, or a frequency selective refraction plate that refracts the electromagnetic wave in a desired direction. [7] The above marker is a substrate layer; a first layer of a first color, the first layer being disposed on the electromagnetic wave incident side of the base layer; a second layer that is partially disposed on the electromagnetic wave incident side of the first layer and has a second color different from the first color; The electromagnetic wave direction control member according to any one of [1] to [6], [8] The electromagnetic wave direction control member according to [7], wherein the second layer contains a resist material. [9] The electromagnetic wave direction control member according to [8], wherein the first layer contains a resist material.

[10] The linear expansion coefficient of the base layer is 10 × 10 -6 / °C or less.

[11] The electromagnetic wave direction control member according to any one of [7] to

[10] , wherein the substrate layer contains glass.

[12] In the marker, one of the first layer or the second layer has a mark; The electromagnetic wave direction control member according to any one of [7] to

[11] , wherein three or more of the marks are arranged.

[13] The electromagnetic wave direction control member according to

[12] , wherein a graphic for identification is arranged on the marker.

[14] An electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave, The electromagnetic wave direction control member has a marker on the incident side of the electromagnetic wave.

[15] The electromagnetic wave direction control member according to

[14] , wherein a shielding layer that is transparent to near-infrared light is disposed on the electromagnetic wave incident side of the marker.

[16] the electromagnetic wave direction control member has a reflecting member that reflects the electromagnetic wave, The electromagnetic wave direction control member according to

[14] or

[15] , wherein a plurality of reflecting elements having different dimensions are arranged in the reflecting member.

[17] the electromagnetic wave direction control member includes a reflecting member that reflects the electromagnetic wave, and a protective member that is disposed on an incident side of the reflecting member upon which the electromagnetic wave is incident, The electromagnetic wave direction control member according to any one of

[14] to

[16] , wherein the marker is disposed on the electromagnetic wave incident side of the protection member.

[18] an electromagnetic wave propagation direction control member having a marker and controlling the propagation direction of the electromagnetic wave; an imaging unit that images the marker; a calculation unit that calculates a relative position and attitude of the electromagnetic wave direction control member with respect to the imaging unit using an image of the marker captured by the imaging unit; A measurement system comprising:

[19] a marker disposed on an installation surface on which an electromagnetic wave propagation direction control member for controlling the propagation direction of the electromagnetic wave is installed; an imaging unit that images the marker; a calculation unit that calculates a relative position and orientation of the installation surface with respect to the photographing unit using an image of the marker photographed by the photographing unit; A measurement system comprising:

[20] The measurement system according to

[18] or

[19] , wherein the marker is detachably arranged. [twenty one] The measurement system according to any one of

[18] to

[20] , wherein the electromagnetic wave propagation direction control member is a frequency selective reflector that reflects the electromagnetic wave in a direction different from the specular reflection direction, or a frequency selective refraction plate that refracts the electromagnetic wave in a desired direction. [twenty two] The above marker is a substrate layer; a first layer of a first color, the first layer being disposed on the electromagnetic wave incident side of the base layer; a second layer that is partially disposed on the electromagnetic wave incident side of the first layer and has a second color different from the first color; The measurement system according to any one of

[18] to

[20] , comprising: [twenty three] The measurement system according to

[22] , wherein the second layer contains a resist material. [twenty four] The measurement system according to

[23] , wherein the first layer contains a resist material. [twenty five] The linear expansion coefficient of the base layer is 10 × 10 -6 The measurement system according to any one of

[22] to

[24] , wherein the temperature is 1 / °C or less.

[26] The measurement system according to any one of

[22] to

[25] , wherein the substrate layer contains glass.

[27] In the marker, the first layer or the second layer has a mark; A measurement system according to any one of

[22] to

[26] , wherein three or more of the marks are arranged.

[28] The measurement system according to

[27] , wherein the marker has a graphic for identification. [Explanation of symbols]

[0240] 1, 1B, 1C markers 2 marks 3, 4 Moire display area 5 Identification Mark 10 Base material layer 20, 20C First layer 21 1st display line 22 1st hidden area 23 First Pattern 30, 30C Second layer 30a opening 31, 32 Opening 40 Third Layer 41 2nd display line 42 2nd hidden area 43 Second Pattern 50 reflective layer 60 Adhesive layer 70 protective layer 71 Resin base material layer 72 Surface layer 80 Light diffusion layer 81 Resin base material layer 82 Surface layer 91 Planarization layer 92 Middle Class 100 Electromagnetic wave direction control member 201 Photography Department 202 Arithmetic section 500A, 500B Measurement System 510 Installation surface

Claims

1. An electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave, having a marker, The electromagnetic wave direction control member, wherein the marker is used to detect the relative attitude of the electromagnetic wave direction control member with respect to an observation position.

2. 2. The electromagnetic wave direction control member according to claim 1, wherein the marker is used to detect the relative position of the electromagnetic wave direction control member with respect to the observation position.

3. The electromagnetic wave direction control member according to claim 1 , wherein the marker is detachably disposed.

4. 2. The electromagnetic wave direction control member according to claim 1, further comprising a shielding layer on the electromagnetic wave incident side of the marker, the shielding layer being opaque to visible light and transparent to near-infrared light.

5. The electromagnetic wave direction control member according to claim 1 , wherein the marker contains a non-metallic material.

6. 2. The electromagnetic wave direction control member according to claim 1, which is a frequency selective reflector that reflects the electromagnetic wave in a direction different from a specular reflection direction, or a frequency selective refraction plate that refracts the electromagnetic wave in a desired direction.

7. The marker is a substrate layer; a first layer of a first color, the first layer being disposed on the electromagnetic wave incident side of the base layer; a second layer partially disposed on the electromagnetic wave incident side of the first layer and having a second color different from the first color; The electromagnetic wave direction control member according to claim 1 ,

8. The electromagnetic wave propagation direction control member according to claim 7 , wherein the second layer contains a resist material.

9. The electromagnetic wave propagation direction control member according to claim 8 , wherein the first layer contains a resist material.

10. The linear expansion coefficient of the base layer is 10×10 －６ 8. The electromagnetic wave direction control member according to claim 7, wherein the temperature is 1000 K / °C or less.

11. The electromagnetic wave direction control member according to claim 7 , wherein the base layer contains glass.

12. In the marker, one of the first layer or the second layer has a mark; The electromagnetic wave direction control member according to claim 7 , wherein three or more of the marks are arranged.

13. The electromagnetic wave direction control member according to claim 12 , wherein the marker has an identification graphic arranged thereon.

14. An electromagnetic wave propagation direction control member that controls the propagation direction of an electromagnetic wave, The electromagnetic wave direction control member has a marker on the electromagnetic wave incident side of the electromagnetic wave direction control member.

15. 15. The electromagnetic wave direction control member according to claim 14, wherein a shielding layer that is transparent to near-infrared light is disposed on the electromagnetic wave incident side of the marker.

16. the electromagnetic wave direction control member has a reflecting member that reflects the electromagnetic wave, 15. The electromagnetic wave direction control member according to claim 14, wherein a plurality of reflecting elements having different sizes are arranged in the reflecting member.

17. the electromagnetic wave direction control member includes a reflecting member that reflects the electromagnetic wave and a protective member that is disposed on an incident side of the reflecting member to which the electromagnetic wave is incident, The electromagnetic wave direction control member according to claim 14 , wherein the marker is disposed on the electromagnetic wave incident side of the protection member.

18. an electromagnetic wave propagation direction control member having a marker and controlling the propagation direction of the electromagnetic wave; an imaging unit that images the marker; a calculation unit that calculates a relative position and attitude of the electromagnetic wave direction control member with respect to the imaging unit using an image of the marker captured by the imaging unit; A measurement system comprising:

19. a marker disposed on an installation surface on which an electromagnetic wave propagation direction control member for controlling the propagation direction of the electromagnetic wave is installed; an imaging unit that images the marker; a calculation unit that calculates a relative position and orientation of the installation surface with respect to the photographing unit using an image of the marker photographed by the photographing unit; A measurement system comprising:

20. 20. The measurement system according to claim 18 or 19, wherein the marker is arranged in a detachable manner.

21. 20. The measurement system according to claim 18 or 19, wherein the electromagnetic wave propagation direction control member is a frequency selective reflector that reflects the electromagnetic wave in a direction different from a specular reflection direction, or a frequency selective refraction plate that refracts the electromagnetic wave in a desired direction.

22. The marker is a substrate layer; a first layer of a first color, the first layer being disposed on the electromagnetic wave incident side of the base layer; a second layer partially disposed on the electromagnetic wave incident side of the first layer and having a second color different from the first color; 20. The measurement system according to claim 18 or 19, comprising:

23. 23. The measurement system of claim 22, wherein the second layer comprises a resist material.

24. 24. The measurement system of claim 23, wherein the first layer comprises a resist material.

25. The linear expansion coefficient of the base layer is 10×10 －６ 23. The measurement system of claim 22, wherein the temperature is 1000 K / °C or less.

26. 23. The measurement system of claim 22, wherein the substrate layer comprises glass.

27. In the marker, one of the first layer or the second layer has a mark; The measurement system according to claim 22 , wherein three or more of the marks are arranged.

28. 28. The measurement system of claim 27, wherein the marker has an identifying graphic disposed thereon.

Images