Composition, film, optical filter, solid-state image sensor, image display device, infrared sensor, camera module, and compound

Abstract

To provide a composition which enables formation of a film with superior moisture resistance and low susceptibility to defects, and to provide the film, an optical filter, a solid-state image sensor, an image display device, an infrared sensor, a camera module, and a compound.SOLUTION: A composition is provided, comprising a compound represented by a formula (1) or (2), a curable compound, and a solvent.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to an indigo compound and a composition containing the same. The present invention also relates to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module using a composition containing an indigo compound. [Background technology]

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color imaging, such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light receiving section. For this reason, an infrared cut filter is sometimes used to correct visibility.

[0003] Infrared cut filters are produced using compositions containing infrared absorbers, such as indigo compounds.

[0004] Patent Document 1 describes the production of an infrared cut filter or the like using a composition containing a specific indigo boron compound. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2012-224593 Summary of the Invention [Problem to be solved by the invention]

[0006] In recent years, there has been a demand for further improvement in moisture resistance of films obtained using compositions containing infrared absorbers.

[0007] Furthermore, indigo boron compounds have a high degree of planarity and therefore have a strong cohesive force, which tends to cause aggregation in the film and defects in the film.

[0008] According to the investigations of the present inventors, it has been found that the film obtained using the composition containing the indigo boron compound disclosed in Patent Document 1 is prone to defects in the film. Furthermore, the moisture resistance is also insufficient.

[0009] Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent moisture resistance and suppressing the occurrence of defects. The present invention also provides a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound. [Means for solving the problem]

[0010] The present invention provides the following:

[0011] <1> a composition comprising a compound represented by formula (1) or formula (2), a curable compound, and a solvent; [ka] In formula (1), A 1 and A 2 each independently represents an aryl group, a heteroaryl group, or an alkyl group, X 1 ~X 4 each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R 1 ~R 8 each independently represents a hydrogen atom or a substituent, X 1 and X 2 , X 3 and X 4 may be linked together to form a ring; However, X 1 and X 2 at least one of the groups is a group represented by formula (X-1); In formula (2), A 11 and A 12 each independently represents an aryl group, a heteroaryl group, or an alkyl group, X 11 and X 12 each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R 11 ~R 18 each independently represents a hydrogen atom or a substituent, X 11 and X 12 may be linked together to form a ring; However, X 11 and X 12 at least one of the groups is a group represented by formula (X-1); [ka] In formula (X-1), * represents a linking hand, R X1 represents a substituent, A X1 represents an aryl group or a heteroaryl group. <2> R in the above formula (X-1) X1 is an alkyl group, an alkoxy group, an aryl group, a heteroaryl group or a halogen atom; <1> The composition described in <3> The curable compound includes a polymerizable compound. <1> or <2> The composition described in <4> Further, a photopolymerization initiator is contained. <1> ~ <3> The composition according to any one of the preceding claims. <5> A compound represented by the above formula (1) and a compound represented by the above formula (2), <1> ~ <4> The composition according to any one of the preceding claims. <6> <1> ~ <5> A film obtained by using the composition according to any one of the above. <7> <6> An optical filter having the film according to claim 1. <8> <6> A solid-state imaging device having the film according to claim 1. <9> <6> An image display device having the film according to claim 1. <10> <6> An infrared sensor having the film according to claim 1. <11> <6> A camera module having the membrane according to claim 1. <12> A compound represented by formula (1) or formula (2); [ka] In formula (1), A 1 and A 2 each independently represents an aryl group, a heteroaryl group, or an alkyl group, X 1 ~X 4 each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R 1 ~R 8 each independently represents a hydrogen atom or a substituent, X 1 and X 2 , X 3 and X 4 may be linked together to form a ring; However, X 1 and X 2 at least one of the groups is a group represented by formula (X-1); In formula (2), A 11 and A 12 each independently represents an aryl group, a heteroaryl group, or an alkyl group, X 11 and X 12 each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R 11 ~R 18 each independently represents a hydrogen atom or a substituent, X 11 and X 12 may be linked together to form a ring; However, X 11 and X 12 at least one of the groups is a group represented by formula (X-1); [ka] In formula (X-1), * represents a linking hand, R X1 represents a substituent, A X1 represents an aryl group or a heteroaryl group. [Effects of the Invention]

[0012] According to the present invention, a composition capable of forming a film having excellent moisture resistance and suppressed defect generation can be provided. The present invention also provides a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound. [Brief explanation of the drawings]

[0013] [Figure 1] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor. DETAILED DESCRIPTION OF THE INVENTION

[0014] The present invention will be described in detail below. In this specification, the symbol "to" is used to mean that the numerical values ​​before and after it are included as the lower limit and upper limit. In the description of groups (atomic groups) in this specification, when a notation does not specify whether they are substituted or unsubstituted, it encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups without a substituent (unsubstituted alkyl groups) but also alkyl groups with a substituent (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. In this specification, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In this specification, the weight average molecular weight and number average molecular weight are defined as values ​​converted into polystyrene by gel permeation chromatography (GPC) measurement. In this specification, Me in the chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved.

[0015] <Composition> The composition of the present invention is characterized by containing a compound represented by formula (1) or formula (2), a curable compound, and a solvent.

[0016] The composition of the present invention can form a film that has excellent moisture resistance and is suppressed from generating defects. The reason for this effect is presumed to be as follows. The compound represented by formula (1) or formula (2) contained in the composition of the present invention is X in formula (1). 1 and X 2 and at least one of X in formula (2). 11 and X 12At least one of the groups represented by formula (X-1) is an aryl or heteroaryl group having a substituent at the ortho position, which is presumably due to high steric hindrance around the boron atom and the resulting low susceptibility to nucleophilic attack on the boron atom. Therefore, it is presumed that the formation of boron-free products can be suppressed, thereby suppressing the occurrence of defects due to the boron-free products. Therefore, it is presumed that the use of the composition of the present invention can form a film in which defects are suppressed. Furthermore, it is presumed that the compounds represented by formula (1) or (2) have high steric hindrance around the boron atom, making nucleophilic attack on the boron atom less likely to occur, thereby suppressing hydrolysis of the compounds. Therefore, the films obtained using the compositions of the present invention have excellent moisture resistance and can suppress fluctuations in spectroscopic properties even when exposed to a humid environment for a long period of time.

[0017] The composition of the present invention can be used as a composition for an optical filter. Types of optical filters include infrared cut filters and infrared transmission filters. Since the compound represented by formula (1) or formula (2) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0018] Each component used in the composition of the present invention will be described below.

[0019] <<Specific Compound (Compound Represented by Formula (1) or Formula (2))>> The composition of the present invention contains a compound represented by formula (1) or formula (2). It is preferable that the composition of the present invention contains a compound represented by formula (1) because the effects of the present invention are more pronounced. Hereinafter, the compound represented by formula (1) or formula (2) is also referred to as a specific compound. The compound represented by formula (1) and the compound represented by formula (2) are also compounds of the present invention. [ka]

[0020] In formula (1), A 1 and A 2 each independently represents an aryl group, a heteroaryl group, or an alkyl group, X 1 ~X 4 each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R 1 ~R 8 each independently represents a hydrogen atom or a substituent, X 1 and X 2 , X 3 and X 4 may be linked together to form a ring; However, X 1 and X 2 at least one of the groups is a group represented by formula (X-1); In formula (2), A 11 and A 12 each independently represents an aryl group, a heteroaryl group, or an alkyl group, X 11 and X 12 each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R 11 ~R 18 each independently represents a hydrogen atom or a substituent, X 11 and X 12 may be linked together to form a ring; However, X 11 and X 12 at least one of the groups is a group represented by formula (X-1); [ka] In formula (X-1), * represents a linking hand, R X1 represents a substituent, A X1 represents an aryl group or a heteroaryl group.

[0021] -A in formula (1) 1 and A 2 , and A in Eq. (2) 11 and A 12 About- A in equation (1) 1 and A 2 , and A in Eq. (2) 11 and A 12 each independently represents an aryl group, a heteroaryl group, or an alkyl group, and is preferably an aryl group or a heteroaryl group.

[0022] A in equation (1) 1 and A 2 and the aryl group represented by A in formula (2). 11 and A 12 The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200), and the substituent is preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200). A in equation (1) 1 and A 2 and A in formula (2). 11 and A 12The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 10, more preferably 1 to 5. Types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200), and are preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200). A in equation (1) 1 and A 2 and the alkyl group represented by A in formula (2) 11 and A 12 The number of carbon atoms in the alkyl group represented by is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 12. The alkyl group may be linear, branched, or cyclic, and is more preferably linear or branched. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200), and an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200) is preferred.

[0023] -X in formula (1) 1 ~X 4 , and X in Eq. (2) 11 and X 12 About- X in equation (1) 1 ~X 4 , and X in Eq. (2) 11 and X 12each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom.

[0024] X in equation (1) 1 ~X 4 and the aryl group represented by X in formula (2). 11 and X 12 The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200). The substituent is preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200), more preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, or a halogen atom, and even more preferably an alkyl group, an alkoxy group, or a halogen atom.

[0025] X in equation (1) 1 ~X 4 and the heteroaryl group represented by X in formula (2). 11 and X 12The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 10, more preferably 1 to 5. Examples of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, groups represented by formula (R-100), and groups represented by formula (R-200). The substituent is preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200), more preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, or a halogen atom, and even more preferably an alkyl group, an alkoxy group, or a halogen atom.

[0026] X in equation (1) 1 ~X 4 and the alkoxy group represented by X in formula (2). 11 and X 12 The number of carbon atoms in the alkoxy group represented by is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 12. The alkoxy group may be linear, branched, or cyclic, and is more preferably linear or branched. The alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200), and the substituent is preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200).

[0027] X in equation (1) 1 ~X 4 and X in formula (2). 11 and X 12The number of carbon atoms in the aryloxy group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200), and the substituent is preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100), or a group represented by formula (R-200).

[0028] X in equation (1) 1 ~X 4 and X in formula (2). 11 and X 12 The halogen atom represented by the formula (I) includes a chlorine atom, a fluorine atom, a bromine atom and an iodine atom.

[0029] In formula (1), X 1 and X 2 At least one of the groups represented by formula (X-1) is 1 and X 2 At least one of and X 3 and X 4 It is preferable that at least one of these is independently a group represented by formula (X-1). In equation (2), X 11 and X 12 At least one of the above is a group represented by formula (X-1).

[0030] [ka] In formula (X-1), * represents a linking hand, R X1 represents a substituent, A X1 represents an aryl group or a heteroaryl group.

[0031] (X-1)R X1Examples of the substituent represented by include the groups exemplified as the substituent T described below, a group represented by formula (R-100), and a group represented by formula (R-200). An alkyl group, an alkoxy group, an aryl group, a heteroaryl group, or a halogen atom is preferred, and an alkyl group, an alkoxy group, or a halogen atom is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, and is more preferably linear or branched. The number of carbon atoms in the alkoxy group is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The alkoxy group may be linear, branched, or cyclic, and is more preferably linear or branched. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group is preferably a phenyl group. The number of carbon atoms constituting the ring of the heteroaryl group is preferably 1 to 10, and more preferably 1 to 5. Types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, and more preferably 1 or 2. The heteroaryl group is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings, and even more preferably a monocyclic ring. The halogen atom includes a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom.

[0032] A in formula (X-1) X1 The aryl group represented by the formula (I) preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and even more preferably 6 to 12 carbon atoms. A in formula (X-1) X1The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 10, more preferably 1 to 5. Types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, more preferably 1 or 2. The heteroaryl group is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings.

[0033] A in formula (X-1) X1 The aryl and heteroaryl groups represented by R X1 The substituent may have a substituent at a position other than the position where is bonded. Examples of the substituent include the groups exemplified for the substituent T described below, a group represented by formula (R-100) and a group represented by formula (R-200), and the substituent is preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a group represented by formula (R-100) or a group represented by formula (R-200), more preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group or a halogen atom, and even more preferably an alkyl group, an alkoxy group or a halogen atom.

[0034] In formula (1), X 1 and X 2 , X 3 and X 4 may be linked to each other to form a ring. In formula (2), X 11 and X 12 may be linked to each other to form a ring. The ring formed is preferably a 5- or 6-membered ring.

[0035] -R in Equation (1) 1 ~R 8 , R in Eq. (2) 11 ~R 18 About- R in Equation (1) 1 ~R 8 , and R in Eq. (2) 11 ~R 18R in formula (1) each independently represents a hydrogen atom or a substituent. 1 ~R 8 , and R in Eq. (2) 11 ~R 18 Examples of the substituent represented by include the groups listed as substituent T described later, the group represented by formula (R-100) described later, and the group represented by formula (R-200) described later, and are preferably an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a halogen atom, a group listed as substituent T described later, or a group represented by formula (R-200) described later.

[0036] -Regarding the Substituent T- Examples of the substituent T include the following groups: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), a cycloalkyl group (preferably a cycloalkyl group having 5 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an aryl group having 1 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), an alkoxy group (preferably an aryl group having 1 to 30 carbon atoms), an aryl group (preferably an aryl group having 1 to 30 carbon atoms), an aryl group (preferably an aryl group having 0 to 30 carbon atoms), an alkoxy group (preferably an aryl group having 1 to 30 carbon atoms), an aryl ...aryl group (preferably an aryl group having 1 to 30 carbon an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably or an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), a sulfamoylamino group (preferably a sulfamoyl group having 0 to 30 carbon atoms), amino group), carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms),An arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heteroarylsulfinyl group Examples of the substituent include an aryl group (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), an ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxy group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imido group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, and an imino group. When these groups are further substitutable, they may further have a substituent. Examples of the substituent include the groups described above for the substituent T, and groups represented by the following formulas (R-100) and (R-200).

[0037] -Regarding the group represented by formula (R-100)- -O-(R r1 -O) m -R r2 ···(R-100)

[0038] In formula (R-100), R r1 represents an alkylene group having 1 to 10 carbon atoms, and R r2 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms; and m represents an integer of 1 to 30.

[0039] -Regarding the group represented by formula (R-200)- -L R1 -(Y R1 ) n ···(R-200) In formula (R-200), L R1represents a single bond or an (n+1)-valent linking group, Y R1 represents an acid group or a basic group, n represents an integer of 1 to 4, and L R1 If is a single bond, n is 1.

[0040] L in formula (R-200) R1 represents a single bond or an (n+1)-valent linking group. R1 If is a basic group, L R1 is preferably an (n+1)-valent linking group.

[0041] L R1 The n+1-valent linking group represented by the formula (I) includes an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -CO-, -COO-, -OCO-, -SO2-, -NR L10 -, -N<, -NR L10 CO-, -CONR L10 -, -NR L10 SO2-, -SO2NR L10 - and combinations thereof. L10 represents a hydrogen atom, an alkyl group, or an aryl group.

[0042] The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, still more preferably 1 to 10, and particularly preferably 1 to 5. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, and even more preferably 6 carbon atoms. The heterocyclic group is preferably a single ring or a fused ring having 2 to 4 rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and still more preferably 3 to 12. The aliphatic hydrocarbon group, aromatic hydrocarbon group and heterocyclic group may have a substituent, such as an alkyl group or an aryl group.

[0043] Y in formula (R-200) R1 represents an acid group or a basic group. R1 The acid group represented by the formula (I) includes a carboxy group, a sulfo group, a phosphate group, a boronic acid group, an imidic acid group, and salts thereof. The atoms or atomic groups constituting the salt include alkali metal ions (Li + , Na + , K. + etc.), alkaline earth metal ions (Ca 2+ , Mg 2+ Examples of the imide acid group include -SO2NHSO2R X1 , -CONHSO2R X2 , -CONHCOR X3 or -SO2NHCOR X4 is preferred, -SO2NHSO2R X1 , -CONHSO2R X2 , or -SO2NHCOR X4 is more preferred, -SO2NHSO2R X1 or -CONHSO2R X2 is more preferred. X1 ~R X4 R each independently represents an alkyl group or an aryl group. X1 ~R X4 The alkyl group and aryl group represented by R may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom. X1 ~R X4 are each independently preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The number of carbon atoms in the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The number of carbon atoms in the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.

[0044] Y R1 Examples of the basic group represented by include an amino group, a pyridinyl group and its salts, an ammonium salt, and a phthalimidomethyl group. Examples of the atoms or atomic groups that constitute the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions. Examples of the amino group include -NR x11 R x12 and a cyclic amino group.

[0045] -NR x11 R x12 In the group represented by x11 and R x12 are each independently a hydrogen atom, an alkyl group, or an aryl group, and are preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. Examples of the substituent include the substituent T described above. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include the substituent T described above.

[0046] Examples of the cyclic amino group include a pyrrolidine group, a piperidine group, a piperazine group, and a morpholine group. These groups may further have a substituent. Examples of the substituent include the substituent T described above.

[0047] In formula (R-200), n represents an integer of 1 to 4, preferably 1 or 2, and more preferably 1.

[0048] The specific compound may be a pigment or a dye. The specific compound may also be a pigment derivative. When the specific compound is used as a pigment derivative, it is preferable that the specific compound is a compound having a group represented by formula (R-200) as a substituent.

[0049] Specific examples of the specific compound include compounds 1-1 to 1-18, 2-1 to 2-4, F-1, and F-3 shown below.

[0050] [ka] [ka] [ka] [ka] [ka]

[0051] The maximum absorption wavelength of the specific compound is more preferably in the wavelength range of 750 to 1500 nm, even more preferably in the wavelength range of 900 to 1300 nm, and particularly preferably in the wavelength range of 1000 to 1200 nm.

[0052] The specific compound is preferably used as an infrared absorber.

[0053] The content of the specific compound (compound represented by formula (1) or formula (2)) in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit of the content of the specific compound is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less. The composition of the present invention may contain only one specific compound or two or more specific compounds. When two or more specific compounds are contained, the total amount thereof is preferably within the above range. When the composition of the present invention contains two or more specific compounds, the composition of the present invention may contain both a compound represented by formula (1) and a compound represented by formula (2). When the composition of the present invention contains both a compound represented by formula (1) and a compound represented by formula (2), the ratio of the compound represented by formula (1) to the compound represented by formula (2) is preferably 0.01 to 100 parts by mass per 100 parts by mass of the compound represented by formula (1). The upper limit is preferably 50 parts by mass or less, more preferably 30 parts by mass or less. The lower limit is preferably 0.5 parts by mass or more, more preferably 1 part by mass or more.

[0054] <<Curable compound>> The composition of the present invention contains a curable compound. Examples of the curable compound include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Preferred are a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and more preferred are a (meth)acryloyloxy group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. Preferred is an epoxy group.

[0055] As the curable compound, it is preferable to use one that contains at least a resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

[0056] (polymerizable compound) Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. A compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

[0057] Examples of resin-type polymerizable compounds include resins containing repeating units having polymerizable groups.

[0058] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2,000,000. The upper limit of the weight-average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight-average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

[0059] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a trifunctional to 15-functional (meth)acrylate compound, more preferably a trifunctional to 6-functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0060] Examples of compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer). Furthermore, examples of compounds having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like can also be used.

[0061] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), and KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0062] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group and a urethane bond (hereinafter also referred to as a polymerizable compound having a urethane bond) as the compound having an ethylenically unsaturated bond-containing group. By using such a compound, the heat resistance of the resulting film can be further improved. The reason for this effect is presumed to be that the urethane bond portion forms a physically crosslinked structure due to intermolecular hydrogen bonding.

[0063] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylates obtained by reacting a (meth)acrylate having a hydroxy group with a polyfunctional isocyanate, and urethane (meth)acrylates obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and then reacting the resulting mixture with a (meth)acrylate having a hydroxy group.

[0064] Examples of the (meth)acrylate having a hydroxy group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxy group-containing polyol polyacrylate.

[0065] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and biuret derivatives, isocyanate nurate derivatives, and trimethylolpropane adducts thereof.

[0066] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A No. 2022-173080 can also be used.

[0067] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0068] As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used.For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, and the contents thereof are incorporated herein.Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0069] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0070] The compound having an ethylenically unsaturated bond-containing group may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0071] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0072] Examples of the compound having a cyclic ether group include a compound having an epoxy group and a compound having an oxetanyl group, and the compound having an epoxy group is preferred. Examples of the compound having an epoxy group include a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0073] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0074] Examples of compounds having a cyclic ether group that can be used include the compounds described in paragraphs 0034 to 0036 of JP 2013-011869 A, the compounds described in paragraphs 0147 to 0156 of JP 2014-043556 A, the compounds described in paragraphs 0085 to 0092 of JP 2014-089408 A, and the compounds described in JP 2017-179172 A.

[0075] Commercially available compounds having a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, and EPPN-502 (all manufactured by ADEKA Corporation), Celloxide 2021P, Celloxide 2081, Celloxide 2083, Celloxide 2085, EHPE3150, and EPOLEAD PB. 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adeka Glycirol Examples of suitable monomers include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (manufactured by NOF Corporation, epoxy group-containing polymers), OXT-101, OXT-121, OXT-212, and OXT-221 (all manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomers), and OXE-10 and OXE-30 (all manufactured by Osaka Organic Chemical Industry Ltd., oxetanyl group-containing monomers).

[0076] Compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs

[0134] to

[0147] of JP 2004-295116 A and paragraphs

[0095] to

[0126] of JP 2014-089408 A can also be used.

[0077] (resin) The composition of the present invention can use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. Resins are blended, for example, for purposes such as dispersing pigments and the like in the composition or as binders. Resins used primarily to disperse pigments and the like in the composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses. Resins having polymerizable groups also fall under the category of polymerizable compounds.

[0078] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0079] Examples of resins include (meth)acrylic resins, epoxy resins, enethiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. These resins may be used alone or in combination of two or more. Norbornene resins are preferred as cyclic olefin resins in terms of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, examples of the resin include the resins described in paragraphs 0091 to 0099 of WO 2022 / 065215, the blocked polyisocyanate resins described in JP 2016-222891 A, the resins described in JP 2020-122052 A, the resins described in JP 2020-111656 A, the resins described in JP 2020-139021 A, the resins described in JP 2017-138503 A containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, and the resins described in JP 2020 The alkali-soluble resin described in JP-A-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the copolymer containing an epoxy group and an acid group described in WO 2022 / 030445, the resin described in paragraphs 0199 to 0233 of JP-A-2020-186373, the alkali-soluble resin described in JP-A-2020-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in JP-A-2021-134350, and the copolymer described in JP-A-2020-041046 can also be used. In addition, a resin having a fluorene skeleton can also be preferably used as the resin.Examples of resins having a fluorene skeleton include those described in U.S. Patent Application Publication No. 2017 / 0102610. Also usable as the resin are those described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, alkali-soluble resins described in Japanese Patent Application Laid-Open No. 2020-186325, resins represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, resins described in Japanese Patent Application Laid-Open No. 2021-134350, and resins described in Japanese Patent Application Laid-Open No. 2022-174597.

[0080] It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0081] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0082] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol % or more is preferred, when the total amount of the acid groups and the basic groups is taken as 100 mol %. The acid groups possessed by the acidic dispersant (acidic resin) are preferably carboxy groups. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol % is preferred, when the total amount of the acid groups and the basic groups is taken as 100 mol %. The basic groups possessed by the basic dispersant are preferably amino groups.

[0083] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, please refer to paragraphs 0025 to 0094 of JP-A No. 2012-255128, the contents of which are incorporated herein by reference.

[0084] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0085] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

[0086] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0087] As the dispersant, the resin described in JP 2018-087939 A, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803 A, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803 A, and the like can also be used.

[0088] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0089] The content of the curable compound in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0090] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0091] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0092] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 70% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0093] When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0094] When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0095] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the composition is preferably 0.1 to 40% by mass. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The content of the resin as a dispersant is preferably 1 to 100 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more.

[0096] The composition of the present invention may contain only one type of curable compound or may contain two or more types of curable compounds. When two or more types of curable compounds are contained, the total amount thereof is preferably within the above range.

[0097] <<Solvent>> The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, see paragraph 0223 of International Publication No. 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable methyl alcohols include ethylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol or 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount can be reduced to 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0098] The metal content of the organic solvent is preferably low. For example, the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, organic solvents with metal contents at the mass ppt (parts per trillion) level may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0099] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0100] The organic solvent may contain isomers (compounds with the same number of atoms but different structures), and may contain only one type of isomer or multiple types of isomers.

[0101] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0102] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0103] <<Other infrared absorbers>> The composition of the present invention may contain an infrared absorber (another infrared absorber) other than the specific compound described above. By further containing the other infrared absorber, a film capable of blocking infrared rays over a wider wavelength range can be formed. The other infrared absorber may be a dye or a pigment (particle). Examples of the other infrared absorber include pyrrolopyrrole compounds, polymethine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides. At least one selected from squarylium compounds and phthalocyanine compounds is preferred.

[0104] Examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP 2009-263614 A, the compounds described in paragraphs 0037 to 0052 of JP 2011-068731 A, and the compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873 A. Examples of squarylium compounds include the compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169 A, the compounds described in paragraph 0040 of WO 2016 / 181987 A, the compounds described in JP 2015-176046 A, the compounds described in paragraph 0072 of WO 2016 / 190162 A, and the compounds described in JP 2016-07464 A. Examples of the compounds include the compounds described in paragraphs 0196 to 0228 of Japanese Patent Publication No. 2017-067963, paragraph 0124 of Japanese Patent Application Laid-Open No. 2017 / 135359, the compounds described in Japanese Patent Application Laid-Open No. 2017-114956, the compounds described in Japanese Patent No. 6197940, the compounds described in Japanese Patent Application Laid-Open No. 2016 / 120166, and the compounds described in Table 1 of the specification of U.S. Patent No. 11261172. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, compounds described in JP 2015-172004 A, compounds described in JP 2015-172102 A, compounds described in JP 2008-088426 A, compounds described in paragraph 0090 of WO 2016 / 190162 A, compounds described in JP 2017-031394 A, compounds described in JP 2021-134350 A, compounds described in WO 2021 / 085372 A, compounds described in WO 2022 / 181422 paragraphs 0188 to 0192 A, and the like. Examples of croconium compounds include compounds described in JP-A-2017-082029 and compounds described in JP-A-2016-079331.Examples of iminium compounds include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564. Examples of phthalocyanine compounds include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020 / 071470. Examples of naphthalocyanine compounds include the compounds described in paragraph 0093 of JP 2012-077153 A and the compounds described in JP 2022-173080 A. Examples of dithiolene metal complexes include the compounds described in Japanese Patent No. 5733804 A. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, see paragraph 0080 of JP 2016-006476 A, the contents of which are incorporated herein by reference. Examples of metal borides include lanthanum boride. Commercially available lanthanum boride products include LaB6-F (manufactured by Japan New Metals Co., Ltd.). Furthermore, as the metal boride, compounds described in International Publication No. 2017 / 119394 can also be used. Commercially available indium tin oxide products include F-ITO (manufactured by DOWA Hi-Tech Co., Ltd.).

[0105] Examples of the infrared absorber include squarylium compounds described in JP 2017-197437 A, squarylium compounds described in JP 2017-025311 A, squarylium compounds described in WO 2016 / 154782 A, squarylium compounds described in Japanese Patent No. 5884953 A, squarylium compounds described in Japanese Patent No. 6036689 A, squarylium compounds described in Japanese Patent No. 5810604 A, squarylium compounds described in paragraph 0 of WO 2017 / 213047 A, squarylium compounds described in Japanese Patent No. 5884953 A, squarylium compounds described in Japanese Patent No. 6036689 A, squarylium compounds described in Japanese Patent No. 5810604 A, squarylium compounds described in Japanese Patent No. 5884953 ... JP-A-2018-054760, paragraphs 0019 to 0075, pyrrole ring-containing compounds described in JP-A-2018-040955, paragraphs 0078 to 0082, pyrrole ring-containing compounds described in JP-A-2018-002773, paragraphs 0043 to 0069, squarylium compounds having an aromatic ring at the amide α-position described in JP-A-2018-041047, paragraphs 0024 to 0086 compounds, amide-linked squarylium compounds described in JP 2017-179131 A, compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP 2017-141215 A, dihydrocarbazole bis-type squarylium compounds described in JP 2017-082029 A, asymmetric compounds described in paragraphs 0027 to 0114 of JP 2017-068120 A, and compounds containing a pyrrole ring described in JP 2017-067963 A It is also possible to use organic compounds (carbazole type), phthalocyanine compounds described in Japanese Patent No. 6251530, compounds described in Japanese Patent Application Laid-Open No. 2019-127549, compounds described in International Publication No. 2022 / 059619, compounds described in Japanese Patent Application Laid-Open No. 2022-151682, compounds described in Japanese Patent Application Laid-Open No. 2022-188858, compounds described in Japanese Patent Application Laid-Open No. 2022-184710, compounds described in Japanese Patent Application Laid-Open No. 2022-189736, and the like.

[0106] As another infrared absorber, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used. M 1 a M2 b W c O d (P(O) n R m ) e M 1 , M 2 represents an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

[0107] The content of the other infrared absorbent is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass, relative to 100 parts by mass of the specific compound. The total content of the specific compound and other infrared absorbers is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more, based on the total solid content of the composition. The upper limit of the total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.

[0108] <<Pigment derivatives>> The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material that enhances the dispersibility of the pigment in the composition.

[0109] Examples of the pigment derivative include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

[0110] Examples of the dye structure include a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a quinacridone dye structure, an anthraquinone dye structure, a dianthraquinone dye structure, a benzisoindole dye structure, a thiazine indigo dye structure, an azo dye structure, a quinophthalone dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, a dioxazine dye structure, a perylene dye structure, a perinone dye structure, a benzimidazolone dye structure, a benzothiazole dye structure, a benzimidazole dye structure, and a benzoxazole dye structure. Of these, a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a phthalocyanine dye structure, a quinacridone dye structure, and a benzimidazolone dye structure are preferred, and a squarylium dye structure and a pyrrolopyrrole dye structure are more preferred.

[0111] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li + , Na + , K. + etc.), alkaline earth metal ions (Ca 2+ , Mg 2+ Examples of the carboxylic acid amide group include -NHCOR X1 As the sulfonamide group, a group represented by -NHSO2R is preferred. X2 As the imide acid group, a group represented by -SO2NHSO2R is preferred. X3 , -CONHSO2R X4 , -CONHCOR X5 or -SO2NHCOR X6 A group represented by the formula: -SO2NHSO2R is preferred. X3 is more preferable. X1 ~R X6 R each independently represents an alkyl group or an aryl group. X1 ~R X6The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0112] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0113] Specific examples of pigment derivatives include compounds described in paragraphs 0037 to 0054 of WO 2016 / 035695, compounds described in paragraphs 0061 to 0086 of WO 2017 / 146092, compounds described in paragraphs 0017 to 0068 of WO 2018 / 230387, compounds described in paragraphs 0085 to 0099 of WO 2020 / 054718, compounds described in paragraph 0099 of WO 2020 / 054718, compounds described in paragraph 0124 of WO 2022 / 085485, benzimidazolone compounds or salts thereof described in JP 2018-168244 A, compounds having an isoindoline skeleton described in the general formula (1) of Japanese Patent No. 6996282, and the like.

[0114] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

[0115] <<Photopolymerization initiator>> When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light in the ultraviolet to visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0116] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, benzyl dimethyl ketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, hexaarylbiimidazole compound, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound, or 3-aryl-substituted coumarin compound, more preferably a compound selected from oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds, and even more preferably an oxime compound.Further, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, the peroxide-based photopolymerization initiators described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, the photopolymerization initiators described in WO 2018 / 221177 A, the photopolymerization initiators described in WO 2018 / 110179 A, ​​the photopolymerization initiators described in JP 2019-043864 A, the photopolymerization initiators described in JP 2019-044030 A, the peroxide-based initiators described in JP 2019-167313 A, and the aminoacetophenone-based initiators having an oxazolidine group described in JP 2020-055992 A. initiators, oxime-based photopolymerization initiators described in JP 2013-190459 A, polymers described in JP 2020-172619 A, compounds represented by formula 1 described in WO 2020 / 152120 A, compounds described in JP 2021-181406 A, photopolymerization initiators described in JP 2022-013379 A, ​​compounds represented by formula (1) described in JP 2022-015747 A, fluorine-containing fluorene oxime ester-based photoinitiators described in JP 2021-507058 A, Chinese Patent Application Publication Initiators described in JP 110764367 A, initiators described in JP 2022-518535 A, initiators described in WO 2021 / 175855 A, compounds described in Taiwan Patent Application Publication No. 202200534 A, compounds described in JP 2022-078550 A, compounds described in Korean Patent Publication No. 10-2017-0087330 A, compounds described in WO 2022 / 075452 A, oxime ester compounds described in Chinese Patent Application Publication No. 110066225 A, Korean Patent Publication No. Examples of the photopolymerization initiator include compounds described in WO 2019 / 013112, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062, oxime ester-based photopolymerization initiators described in Japanese Patent No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in WO 2019 / 013112, and photopolymerization initiators described in JP 2023-033731 A.

[0117] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0118] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0119] Examples of oxime compounds include compounds described in paragraph 0142 of International Publication No. 2022 / 085485, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738, compounds represented by the general formula (1) of JP-A-2021-173858, and compounds described in paragraphs 0022 to 0024, compounds represented by the general formula (1) of JP-A-2021-170089, and compounds described in paragraphs 0117 to 0120, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, compounds described in Korean Patent Publication No. 10-2022-0076157, and compounds described in paragraphs 0042 to 0062 of International Publication No. 2019 / 013112 having a triarylamine or N-arylcarbazole skeleton. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation; photopolymerization initiator 2 described in JP 2012-014052 A). It is also preferable to use a compound that is not colorable or that is highly transparent and does not easily discolor as the oxime compound. Commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0120] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0121] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0122] [ka] In formula (OX-1), X 1a represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring, R 1a represents a hydrogen atom or an acyl group, R 2a represents an alkyl group or an aryl group, R 3a and R 4a each independently represents a hydrogen atom or an alkyl group, Alk 1 and Alk 2 each independently represents an alkyl group, R 3a and R 4a may be bonded to form a ring, Alk 1 and Alk 2 may be bonded to form a ring, n represents 0 or 1.

[0123] X in formula (OX-1) 1aExamples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded together via a single bond or a linking group, a divalent group in which two or more heterocyclic rings are bonded together via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocyclic ring are bonded together via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings together, heterocyclic groups together, or aromatic rings and heterocyclic rings include -CH2-, -O-, -CO-, -S-, -NR x - and combinations thereof. x represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0124] X in formula (OX-1) 1a is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6). [ka] R in the formula X1 ~R X9 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0125] R X1 ~R X9 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0126] R X1 ~R X9The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0127] R X1 ~R X9 The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0128] R X1 ~R X9 The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0129] R X1 ~R X9 The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0130] R in formula (OX-1) 1a represents a hydrogen atom or an acyl group, and is preferably an acyl group. R 1a The acyl group represented by is -C(O)-R 101 R is preferably a group represented by 101 represents an aryl group or a heterocyclic group, and is preferably an aryl group.

[0131] R101 The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, and more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. 101 The aryl group represented by is preferably a phenyl group, a methylphenyl group or a naphthyl group, more preferably a methylphenyl group or a naphthyl group.

[0132] R 101 The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0133] R in formula (OX-1) 2a represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. R 2a The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 2a The alkyl group represented by is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. R 2a The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0134] R in formula (OX-1) 3a and R4a each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. R 3a and R 4a The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 3a and R 4a may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0135] Alk of formula (OX-1) 1 and Alk 2 each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk 1 and Alk 2 may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0136] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0137] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0138] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0139] [ka] In formula (OX-2), R 1b and R 2b each independently represents a substituent, R 3b ~R 7b each independently represents a hydrogen atom or a substituent, and Ar 1b represents an aromatic ring group or a heterocyclic group which may have a substituent; n represents 0 or 1;

[0140] R 1b and R 2b Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0141] R 3b ~R 7b Examples of the substituent represented by include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and aryl group include those described above. R 3b ~R 7bis preferably a hydrogen atom.

[0142] Ar 1b represents an aromatic ring group or a heterocyclic group which may have a substituent, Ar 1b is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0143] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0144] [ka] In formula (OX-3), Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, R 1c ~R 3c each independently represents a substituent, L 1c is a single bond or CR 11c R 12c represents R 11c and R 12c each independently represents a hydrogen atom, an alkyl group, or an aryl group; X 1c represents -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0145] R 1c and R 2cExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. R 2c is preferably an alkyl group having a branched or cyclic structure.

[0146] R 3c Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0147] Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0148] Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0149] k represents 0 or 1, and is preferably 0.

[0150] m represents an integer of 0 to 4, preferably 0 or 1, and more preferably 1.

[0151] Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0152] [ka] [ka] [ka] [ka]

[0153] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g / L using ethyl acetate as a solvent.

[0154] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, resulting in good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, thereby improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0155] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0156] <<Curing agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of JP 2016-075720 A or a compound described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0157] <<Chromatic colorants>> The composition of the present invention can contain a chromatic colorant. Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which an inorganic pigment or an organic-inorganic pigment is partially substituted with an organic chromophore. Substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore makes it easier to design the hue.

[0158] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that are not aggregated.

[0159] The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in an X-ray diffraction spectrum obtained using CuKα radiation as an X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0160] The specific surface area of ​​pigments is 1 to 300 m 2 / g. The lower limit is 10m 2 / g or more is preferable, and 30m 2 / g or more is more preferable. The upper limit is 250m 2 / g or less, and 2 / g or less. The specific surface area value can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0161] The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments include the following.

[0162] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 178 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine type), 233 (quinoline type), 234 (amino ketone type), 235 (amino ketone type), 236 (amino ketone type), etc. (all yellow pigments), CIPigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments), CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,5 3:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150, 155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (all red pigments), CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type), etc. (all green pigments), CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc. (all purple pigments), CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0163] As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Other examples of green colorants that can be used include the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP 2020-070426 A, and the diarylmethane compounds described in JP 2020-504758 A.

[0164] As the blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0165] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP 2019-073695 A, and the methine dyes described in JP 2019-073696 A can be used.

[0166] As a red colorant, the compound described in paragraph 0034 of WO 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

[0167] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. Furthermore, the dyes can also include thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540.

[0168] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Application Laid-Open No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020 / 174991, isoindoline compounds or salts thereof described in Japanese Patent Application Laid-Open No. 2020-160279, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069442, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730, and compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730. Compounds represented by formula 1 described in Korean Patent Publication No. 0-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-180176, phenothiazine compounds described in Japanese Patent Application Laid-Open No. 2021-187913, halogenated zinc phthalocyanines described in International Publication WO 2022 / 004261, Halide zinc phthalocyanine described in Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, polymer dye described in Korean Patent Publication No. 10-2020-0061793, colorant described in JP 2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP 2020-090676 A, compounds described in JP 2020-055956 A, compounds described in JP 2021-031681 A, compounds described in JP 2022-056354 A, compounds described in U.S. Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP 2018-178039 A,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described in Journal of the Japan Color Materials Association (published in 2022) pages 80 to 84, compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, Korean Patent Publication No. 10-2017-0018993 Cyan pigments described in JP 2020-180176 A, isoindoline compounds described in JP 2023-013209 A, compounds described in JP 2023-013166 A, xanthene compounds described in WO 2023 / 286526 A, compounds described in JP 2021-155746 A, compounds described in JP 2021-155747 A, compounds described in JP 2021-155748 A, compounds described in JP 2021-155749 A, compounds described in WO 2018 / 051876 A, compounds described in JP 2020-083981 A, compounds described in JP 2023-056463 ​​A, compounds described in JP 2023-515473 A can also be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-like structure, or in both structures.

[0169] When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

[0170] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of chromatic colorants. Note that, "the composition of the present invention is substantially free of chromatic colorants" means that the content of chromatic colorants in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no chromatic colorants.

[0171] <<Coloring material that transmits infrared light but blocks visible light>> The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

[0172] The coloring material that blocks visible light is preferably a coloring material that absorbs light in the violet to red wavelength region. Furthermore, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Furthermore, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B): (A): Contains two or more chromatic colorants, and forms black by combining two or more chromatic colorants. (B): Contains an organic black colorant.

[0173] Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, CI Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in JP-A Nos. 01-170601 and 02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Color & Chemicals Co., Ltd.

[0174] When black is formed by combining two or more chromatic colorants, the combination of chromatic colorants may be, for example, the following embodiments (1) to (8). (1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant. (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant. (3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant. (4) An embodiment containing a yellow colorant and a purple colorant. (5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant. (6) An embodiment containing a purple colorant and an orange colorant. (7) An embodiment containing a green colorant, a purple colorant, and a red colorant. (8) An embodiment containing a green colorant and a red colorant.

[0175] When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass %. The lower limit is preferably 5 mass % or more, more preferably 10 mass % or more, even more preferably 20 mass % or more, and particularly preferably 30 mass % or more.

[0176] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of coloring materials that block visible light. Here, "the composition of the present invention is substantially free of coloring materials that block visible light" means that the content of coloring materials that block visible light in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no coloring materials that block visible light.

[0177] <<Surfactants>> The composition of the present invention may contain a surfactant. Various surfactants, such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants, can be used as the surfactant. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0178] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0179] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0180] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419 OIL (manufactured by Dow-Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, and KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.), and BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, and BYK-UV3510 (manufactured by BYK-Chemie). Compounds having the following structure can also be used as silicone surfactants. [ka]

[0181] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0182] <<Polymerization inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one type of polymerization inhibitor, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0183] <<Silane coupling agents>> The composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of the silane coupling agent include the compound described in paragraph 0177 of WO 2022 / 085485 and the compound described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, and more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0184] <<Ultraviolet absorber>> The composition of the present invention may contain an ultraviolet absorber, such as a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or a dibenzoyl compound. Examples of ultraviolet absorbers include compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, compounds described in paragraphs 0052 to 0072 of JP 2012-208374 A, compounds described in paragraphs 0317 to 0334 of JP 2013-068814 A, compounds described in paragraphs 0061 to 0080 of JP 2016-162946 A, compounds described in paragraphs 0059 to 0076 of WO 2016 / 181987 A, compounds described in paragraphs 0052 and 0074 of WO 2021 / 131355 A, Compounds described in paragraphs 0022 to 0024 of International Publication No. 2021 / 132247, compounds described in paragraph 0179 of International Publication No. 2022 / 085485, reactive triazine ultraviolet absorbers described in JP 2021-178918 A, ultraviolet absorbers described in JP 2022-007884 A, compounds described in Korean Patent Publication No. 10-2022-0014454, compounds described in JP 2023-013321 A, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 A can also be used. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF. Further, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0185] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, and ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be any of the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, WO 2017 / 006600, WO 2017 / 164024, and Korean Patent Publication No. 10-2019-0059371. The antioxidant content of the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The composition may contain only one antioxidant, or two or more antioxidants. When two or more antioxidants are contained, the total amount thereof is preferably within the above range.

[0186] <<Other ingredients>> The composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, compounds described in paragraph 0182 of WO 2022 / 085485 can be used. In addition, as chain transfer agents, thiol compounds described in JP 2020-109068 A can be used.

[0187] The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with ion-exchange resins, and purification with inorganic adsorbents such as hydrotalcite.

[0188] From the perspective of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably 0.05 ppb to 500 ppb, and even more preferably 0.1 ppb to 300 ppb, based on the total solids content of the composition. The composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using compounds that can be used as substitutes for perfluoroalkyl sulfonic acids and their salts, and compounds that can be used as substitutes for perfluoroalkyl carboxylic acids and their salts, a composition that is substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts, may be selected. Compounds that can be used as substitutes for restricted compounds include, for example, compounds that are exempt from restrictions due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above content does not preclude the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. The composition of the present invention may contain perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts, within the maximum allowable range.

[0189] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0190] <Containment Container> The container for storing the composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the container.

[0191] <Method for preparing the composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (application) to prepare the composition.

[0192] The preparation of the composition may include a process for dispersing the pigment. Mechanical forces used to disperse the pigment in the process include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. When grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads or increase the bead packing ratio to increase grinding efficiency. After the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, as described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, and in paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details on the materials, equipment, and processing conditions used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The composition may contain 1 to 10,000 ppm of the beads.

[0193] When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0194] <Membrane> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and can selectively transmit infrared rays of a specific wavelength or more.

[0195] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0196] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is sometimes formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include metal, metal oxide, and black matrix. If necessary, a primer layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0197] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include glass, resin, and other materials. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0198] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0199] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Moreover, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. Furthermore, the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0200] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength of over 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength of over 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength of over 1150 nm.

[0201] The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable that the film of the present invention and a color filter are laminated together to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0202] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication elements (for both transmission and reception), and image display devices.

[0203] <Membrane manufacturing method> The film of the present invention can be produced through a step of applying the composition of the present invention.

[0204] Examples of the support include those described above. As a method for applying the composition, known methods such as spin coating can be used. For example, the application method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0205] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0206] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0207] (When forming patterns using photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0208] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0209] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0210] Furthermore, the exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (for example, milliseconds or less).

[0211] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm 2 is preferable, and 0.05 to 1.0 J / cm 2 The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m 2 ~100,000W / m 2 (e.g., 5000W / m 2 , 15000W / m 2 , or 35,000 W / m 2 The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m 2, oxygen concentration 35% by volume, illuminance 20000W / m 2 etc.

[0212] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removal, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0213] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0214] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to heat the developed film to the above conditions. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0215] (When patterning using dry etching) The pattern formation by the dry etching method can be carried out by applying the composition to a support, forming a composition layer, curing the formed composition layer to form a cured layer, then forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas with the patterned photoresist layer as a mask. In forming the photoresist layer, it is preferable to perform a pre-baking treatment. For details on pattern formation by the dry etching method, please refer to the description in paragraphs 0010 to 0067 of JP 2013-064993 A, the contents of which are incorporated herein by reference.

[0216] <Optical filters> The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

[0217] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040-0070 and 0119-0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255-0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0218] The optical filter of the present invention may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Furthermore, the optical filter may be formed directly on various elements.

[0219] <Solid-state imaging element> The solid-state imaging device of the present invention has the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration having the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0220] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area and transfer electrodes made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes exposed; a device protection film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention disposed on the device protection film. Furthermore, the device protection film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film of the present invention (on the side closer to the support), or a light-focusing means disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in spaces partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than the pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A and JP 2014-179577 A.

[0221] <Image display device> The image display device of the present invention has the film of the present invention. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are found in, for example, "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are also found in, for example, "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). The liquid crystal display device to which the present invention can be applied is not particularly limited, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks. The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0222] <Infrared sensor> The infrared sensor of the present invention has the above-described film of the present invention. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0223] In Fig. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0224] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range. There are no particular limitations on the color filter 112, and conventionally known color filters for pixel formation can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0225] 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0226] <Camera module> The camera module of the present invention has the above-described film of the present invention. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, a camera module can have a configuration including a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0227] <Light-emitting element> The film of the present invention can also be used in a light-emitting device. The configuration of the light-emitting device is not particularly limited as long as it functions as a light-emitting device, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VICSELs). The film of the present invention may be formed directly on the light-emitting device or may be disposed on the light-emitting path.

[0228] <Optical communication element> The film of the present invention can also be used in optical communication elements. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path. [Example]

[0229] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In the structural formulas shown below, Me represents a methyl group, and Ph represents a phenyl group.

[0230] <Synthesis example> (Synthesis Example) Synthesis of Compound (1-1) Compound (1-1) was synthesized according to the following scheme. [ka]

[0231] -Synthesis process of intermediate a- Intermediate a was synthesized using indigo as a raw material according to the method described in JP 2012-224593 A.

[0232] -Synthesis process of intermediate b- Intermediate b was synthesized using 5,5-dimethyl-2-phenyl-1,3,2-dioxaborinane, 2-iodotoluene, and 2-aminoethanol as raw materials according to the method described in Bioorganic & Medicinal Chemistry (2013), 21(11), 3202-3213.

[0233] -Synthesis process of compound (1-1)- In a reaction vessel, 6.6 g (27.6 mmol) of intermediate b was stirred in 44 ml of 1,2-dichlorobenzene. At an external temperature of 40°C, 7.84 g (41.3 mmol) of titanium tetrachloride was added dropwise over 10 minutes and stirred for 30 minutes. 1.4 g (3.4 mmol) of intermediate a was added, and the temperature was raised to an external temperature of 125°C and heated for 60 minutes. The mixture was allowed to cool to an internal temperature of 30°C, and 50 ml of methanol was added dropwise while maintaining the internal temperature below 30°C. After the addition, the mixture was stirred for 30 minutes, and the crystals were filtered and washed with 70 ml of methanol. 50 ml of dimethylacetamide was added to the obtained crystals, and the mixture was heated and stirred at 100°C for 30 minutes, then allowed to cool to 30°C, and the crystals were filtered. 50 ml of methanol was added to the obtained crystals, and the mixture was heated to reflux for 30 minutes, allowed to cool to 30°C, and the crystals were filtered. The obtained crystals were dried with air at 50° C. to obtain 1.0 g of compound (1-1). Detailed identification data are shown below. ·MALDI(Matrix Assisted Laser Desorption / Ionization) TOF-MS(Time of Flight Mass Spectrometry):Calc.for [M+H]+ 769.4, found 769.4.

[0234] <Production of dispersion liquid> The types of infrared absorber, pigment derivative, dispersing resin, and solvent shown in the table below were mixed in the parts by mass shown below, and 117 parts by mass of zirconia beads with a diameter of 0.3 mm were added. The mixture was dispersed for 5 hours using a paint shaker, and the beads were separated by filtration to produce a dispersion. The infrared absorber used had been subjected to the following kneading and polishing treatment.

[0235] (Kneading and polishing treatment conditions) 10.6 parts by mass of infrared absorber, 149.4 parts by mass of grinding agent, and 28 parts by mass of binder were added to a Laboplastomill (manufactured by Toyo Seiki Seisakusho, Ltd.), and the temperature of the kneaded material in the device was controlled to 70°C, and the mixture was kneaded for 2 hours. The grinding agent was neutral anhydrous Glauber's salt E (average particle size (50% diameter by volume (D50)) = 20 μm, manufactured by Mitajiri Chemical Industry Co., Ltd.), and the binder was diethylene glycol. After kneading and grinding, the kneaded material was washed with 20 L of water at 24°C to remove the grinding agent and binder, and then treated in a heated oven at 80°C for 24 hours.

[0236] [Table 1] [Table 2]

[0237] The materials listed in the table above are as follows: (infrared absorber) 1-1 to 1-15, 2-1 to 2-4: Compounds 1-1 to 1-15, 2-1 to 2-4 shown as specific examples of the specific compounds described above Comparative compounds A to E: Compounds having the following structures [ka] IR-1 to IR-5: Compounds with the following structures [ka]

[0238] (pigment derivatives) F-1 to F-5: Compounds with the following structures [ka]

[0239] (Dispersed resin) E-1: Resin with the following structure (acid value = 99.1 mg KOH / g, weight average molecular weight = 38,000). The number attached to the main chain indicates the molar ratio of repeating units, and the number attached to the side chain indicates the number of repeating units. E-2: Resin with the following structure (acid value = 87.0 mg KOH / g, weight average molecular weight = 18,000). The number attached to the main chain indicates the molar ratio of repeating units, and the number attached to the side chain indicates the number of repeating units. E-3: Resin with the following structure (acid value = 85.0 mg KOH / g, weight average molecular weight = 22,000). The number attached to the main chain indicates the molar ratio of repeating units, and the number attached to the side chain indicates the number of repeating units. E-4: Resin with the following structure (acid value = 43 mg KOH / g, weight average molecular weight = 9000). The numbers attached to the side chains indicate the molar ratio of repeating units. E-5: Block resin with the following structure (amine value = 90 mg KOH / g, quaternary ammonium salt value = 30 mg KOH / g, weight average molecular weight = 9800). The numbers attached to the main chain indicate the molar ratio of repeating units. E-6: Resin with the following structure (acid value = 32.3 mg KOH / g, amine value = 45.0 mg KOH / g, weight average molecular weight = 22,900). The number attached to the main chain indicates the molar ratio of repeating units, and the number attached to the side chain indicates the number of repeating units. [ka]

[0240] (solvent) D-1: Propylene glycol monomethyl ether acetate

[0241] <Production of Composition> (Examples 1 to 73, Comparative Examples 1 to 5) The materials shown in the table below were mixed in the parts by mass shown in the table below, and then filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce each composition.

[0242] [Table 3] [Table 4]

[0243] [Table 5] [Table 6]

[0244] [Table 7] [Table 8]

[0245] (Examples 101 to 108, Comparative Examples 101 to 105) The materials were mixed in the ratios shown below and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce each composition. Infrared absorber or dispersion liquid shown in the table below: Parts by weight shown in the table Resin listed in the table below: 95.0 parts by mass 1.5 parts by mass of the hardener listed in the table below (if specified in the table) 0.01 parts by mass of surfactant listed in the table below 3.3 parts by mass of antioxidant listed in the table below Solvent listed in the table below: 200.0 parts by mass

[0246] [Table 9]

[0247] (Examples 201 to 108, Comparative Examples 201 to 205) The materials were mixed in the ratios shown below and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce each composition. Infrared absorber or dispersion liquid shown in the table below: Parts by weight shown in the table Resin listed in the table below: 95.0 parts by mass 3.3 parts by mass of antioxidant listed in the table below Solvent listed in the table below: 200.0 parts by mass

[0248] [Table 10]

[0249] (Dispersion liquid) Dispersions 1 to 34, Dispersions r1 to r5: Dispersions 1 to 34, Dispersions r1 to r5 described above

[0250] (infrared absorber) 1-16 to 1-18: Compounds 1-16 to 1-18 shown as specific examples of the specific compounds described above

[0251] (resin) G-1: Resin with the following structure (acid value 69.2 mgKOH / g, weight average molecular weight 10,000, the number attached to the main chain indicates the molar ratio of repeating units) G-2: Resin with the following structure (acid value 91.3 mgKOH / g, weight average molecular weight 41,000, the number attached to the main chain indicates the molar ratio of repeating units) G-3: Resin with the following structure (acid value 72.2 mg KOH / g, weight average molecular weight 19000, The numbers attached to the main chain indicate the molar ratio of repeating units. G-4: Resin with the following structure (acid value 110 mgKOH / g, weight average molecular weight 10,000, the number attached to the main chain indicates the molar ratio of repeating units) G-5: Resin with the following structure (acid value = 184 mg KOH / g, weight average molecular weight 9700, the number attached to the main chain indicates the molar ratio of repeating units) [ka]

[0252] G-6: Resin with the following structure (weight average molecular weight 137,000, number average molecular weight 32,000, glass transition temperature 165°C) [ka] G-7: Resin with the following structure (weight average molecular weight 188,000, number average molecular weight 75,000, glass transition temperature 285°C) [ka] G-8: Resin with the following structure (glass transition temperature 310°C, inherent viscosity 0.87) [ka]

[0253] E-1: Resin with the following structure (the repeating unit values ​​are mass ratios, weight average molecular weight 20,000, number average molecular weight 8,300, epoxy equivalent 284 g / eq, acid value 130 mg KOH / g, glass transition temperature 136°C) E-2: Resin with the following structure (the repeating unit values ​​are mass ratios, weight average molecular weight 26100, number average molecular weight 8600, epoxy equivalent 355g / eq, acid value 163mgKOH / g, glass transition temperature 133℃) E-3: Resin with the following structure (the repeating unit values ​​are mass ratios, weight average molecular weight 21100, number average molecular weight 8500, epoxy equivalent 355g / eq, acid value 130mgKOH / g, glass transition temperature 157℃) E-4: Resin with the following structure (the repeating unit values ​​are mass ratios, weight average molecular weight 18300, number average molecular weight 9100, epoxy equivalent 284g / eq, acid value 98mgKOH / g, glass transition temperature 134℃) E-5: Resin with the following structure (the repeating unit values ​​are mass ratios, weight average molecular weight 22900, number average molecular weight 8800, epoxy equivalent 316g / eq, acid value 130mgKOH / g, glass transition temperature 124℃) [ka]

[0254] (Photopolymerization initiator) C-1 to C-5: Compounds with the following structures [ka]

[0255] (polymerizable compound) B-1: A mixture of compounds with the following structure (the molar ratio of the compound on the left to the compound on the right is 7:3) B-2: Compound of the following structure B-3: A mixture of compounds having the following structure (containing 55 to 63 mol% of the compound on the left) B-4: Compound of the following structure [ka]

[0256] (ultraviolet absorber) H-1 to H-6: Compounds of the following structure [ka]

[0257] (antioxidant) I-1 to I-6: Compounds of the following structure [ka]

[0258] (surfactant) J-1: Compound having the following structure (weight average molecular weight = 14,000, in the following formula, % indicating the proportion of repeating units is mol %) [ka] J-2: FTX-218D (Neos Corporation, fluorine-based surfactant) J-3: Megafac F-554 (DIC Corporation, fluorine-based surfactant)

[0259] (polymerization inhibitor) K-1: p-Methoxyphenol

[0260] (additives) L-1 to L-3: Compounds with the following structures [ka]

[0261] (hardening agent) P-1: Trimellitic acid P-2: 2-ethyl-4-methylimidazole P-3: Methyltetrahydrophthalic anhydride

[0262] (solvent) D-1: Propylene glycol monomethyl ether acetate D-2: Propylene glycol monomethyl ether D-3: Cyclopentanone D-4: 3-Methoxy-N,N-dimethylpropanamide D-5: 3-butoxy-N,N-dimethylpropanamide D-6: methyl 3-methoxypropionate D-7: Dichloromethane D-8: Dimethylacetamide

[0263] <Membrane production> (Production Example 1) Method for producing films using the compositions of Examples 1 to 73 and Comparative Examples 1 to 5 Each composition was applied to a glass substrate by spin coating and heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed to 1000mJ / cm using an i-line stepper exposure system FPA-3000i5+ (Canon Corporation). 2 The entire surface was exposed to an exposure amount of 1.0 μm. Then, the film was heated at 180° C. for 5 minutes using a hot plate to produce a film with a thickness of 1.0 μm.

[0264] (Production Example 2) Method for producing films using the compositions of Examples 101 to 108 and Comparative Examples 101 to 105 Each composition was applied to a glass substrate by spin coating, heated on a hot plate at 100°C for 2 minutes, and then heated at 200°C for 8 minutes for curing treatment, to obtain a film with a thickness of 1.0 µm.

[0265] (Production Example 3) Method for producing a film using the compositions of Examples 201 to 208 and Comparative Examples 201 to 205 Each composition was cast onto a glass substrate, dried at 20°C for 8 hours, and then peeled off from the glass substrate. The peeled coating film was further dried under reduced pressure at 100°C for 8 hours to obtain a film with a thickness of 0.1 mm, length of 60 mm, and width of 60 mm.

[0266] <Performance evaluation> (defect) Each composition was placed in a sealed container and stored at 50°C for 3 days. After storage, the composition was used to form a film on a glass substrate in accordance with the above Production Examples 1 to 3. The resulting film was observed under an optical microscope, and the number of foreign matter defects (number of defects) occurring within an area of ​​100µm x 100µm was calculated. A: Fewer than 10 defects B: The number of defects is between 10 and 30 C: 30 or more defects

[0267] (moisture resistance) The resulting film was subjected to a moisture resistance test by leaving it for 24 hours in a high-temperature, high-humidity environment at 85°C and a relative humidity of 85%. The maximum absorbance (Absλmax) at wavelengths of 700 to 1500 nm and the minimum absorbance (Absλmin) at wavelengths of 400 to 700 nm were measured for each film before and after the moisture resistance test using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Corporation), and the absorbance ratio was calculated using the following formula: Absorbance ratio = Absλmax / Absλmin Next, the rate of change in absorbance ratio was calculated using the following formula, and the moisture resistance was evaluated according to the following criteria. Rate of change in absorbance ratio = |(absorbance ratio of film before moisture resistance test - absorbance ratio of film after moisture resistance test) / absorbance ratio of film before moisture resistance test| × 100 A: The rate of change in absorbance ratio is 5% or less B: The rate of change in absorbance ratio is more than 5% and 10% or less C: The rate of change in absorbance ratio exceeds 10%

[0268] [Table 11]

[0269] [Table 12]

[0270] [Table 13]

[0271] As shown in the above table, the examples were able to form films that were excellent in moisture resistance and in which the occurrence of defects was suppressed.

[0272] <Production of composition for forming infrared transmission filter> (Example 301) The materials were mixed in the ratios shown below and filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to produce a composition of Example 301 (composition for forming an infrared transmission filter). Composition of Example 1: 36.99 parts by weight Pigment dispersion 1-1: 46.5 parts by mass Pigment dispersion 1-2: 37.1 parts by mass Using the composition of Example 301, each performance evaluation was carried out in the same manner as in Example 1, and the same effects as in Example 1 were obtained. In addition, the film obtained using the composition of Example 301 was able to block light with wavelengths in the visible region and transmit at least a portion of light with wavelengths in the infrared region.

[0273] (Example 302) The materials were mixed in the ratios shown below and filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to produce a composition of Example 302 (composition for forming an infrared transmission filter). Composition of Example 3: 36.99 parts by weight Pigment dispersion 1-1: 46.5 parts by mass Pigment dispersion 1-2: 37.1 parts by mass Using the composition of Example 302, performance evaluations were carried out in the same manner as in Example 3, and the same effects as in Example 3 were obtained. In addition, the film obtained using the composition of Example 302 was able to block light with wavelengths in the visible region and transmit at least a portion of light with wavelengths in the infrared region.

[0274] (Example 303) The materials were mixed in the ratios shown below and filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to produce a composition of Example 303 (composition for forming an infrared transmission filter). Composition of Example 12: 22.67 parts by weight Pigment dispersion 2-1: 51.23 parts by mass Using the composition of Example 303, various performance evaluations were carried out in the same manner as in Example 12, and the same effects as in Example 12 were obtained. In addition, the film obtained using the composition of Example 303 was able to block light with wavelengths in the visible region and transmit at least a portion of light with wavelengths in the infrared region.

[0275] (Example 304) The materials were mixed in the ratios shown below and filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to produce a composition of Example 304 (composition for forming an infrared transmission filter). Composition of Example 25: 22.67 parts by weight Pigment dispersion 2-1: 51.23 parts by mass Using the composition of Example 304, each performance evaluation was carried out in the same manner as in Example 25, and the same effects as in Example 25 were obtained. In addition, the film obtained using the composition of Example 304 was able to block light with wavelengths in the visible region and transmit at least a portion of light with wavelengths in the infrared region.

[0276] Pigment Dispersion 1-1 A mixed liquid having the following composition was mixed and dispersed for 3 hours using zirconia beads with a diameter of 0.3 mm in a bead mill (high-pressure disperser with a pressure reducing mechanism, NANO-3000-10, manufactured by Nippon BEE Co., Ltd.) to prepare pigment dispersion liquid 1-1. Mixed pigment of red pigment (CI Pigment Red 254) and yellow pigment (CI Pigment Yellow 139): 11.8 parts by mass Dispersant (Disperbyk-111, manufactured by BYK Chemie): 9.1 parts by mass Propylene glycol monomethyl ether acetate: 79.1 parts by mass

[0277] Pigment Dispersion 1-2 A mixed liquid having the following composition was mixed and dispersed for 3 hours using zirconia beads with a diameter of 0.3 mm in a bead mill (high-pressure disperser with a pressure reducing mechanism, NANO-3000-10, manufactured by Nippon BEE Co., Ltd.) to prepare pigment dispersion liquid 1-2. Mixed pigment consisting of blue pigment (CI Pigment Blue 15:6) and purple pigment (CI Pigment Violet 23): 12.6 parts by mass Dispersant (Disperbyk-111, manufactured by BYK Chemie): 2.0 parts by mass Resin G-3: 3.3 parts by mass Cyclohexanone: 31.2 parts by mass Propylene glycol monomethyl ether acetate: 50.9 parts by mass

[0278] Pigment Dispersion 2-1 60 parts by mass of CI Pigment Black 32, 20 parts by mass of CI Pigment Blue 15:6, 20 parts by mass of CI Pigment Yellow 139, 80 parts by mass of a dispersant (manufactured by Lubrizol Japan Co., Ltd., Solsperse 76500, solids concentration 50% by mass), 120 parts by mass of a solution containing Resin G-3 (solids concentration 35% by mass), and 700 parts by mass of propylene glycol monomethyl ether acetate were mixed and dispersed for 8 hours using a paint shaker to obtain Pigment Dispersion 2-1. [Explanation of symbols]

[0279] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: flattening layer

Claims

1. a composition comprising a compound represented by formula (1) or formula (2), a curable compound, and a solvent; 【Chemical 1】 In formula (1), A １ and A ２ each independently represents an aryl group, a heteroaryl group, or an alkyl group, X １ ~X ４ each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R １ ~R ８ each independently represents a hydrogen atom or a substituent, X １ and X ２ , X ３ and X ４ may be linked to each other to form a ring; However, X １ and X ２ At least one of the above is a group represented by formula (X-1); In formula (2), A １１ and A １２ each independently represents an aryl group, a heteroaryl group, or an alkyl group, X １１ and X １２ each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R １１ ~R １８ each independently represents a hydrogen atom or a substituent, X １１ and X １２ may be linked to each other to form a ring; However, X １１ and X １２ At least one of the above is a group represented by formula (X-1); 【Chemistry 2】 In formula (X-1), * represents a linking bond. R Ｘ１ represents a substituent, A Ｘ１ represents an aryl group or a heteroaryl group.

2. R in the formula (X-1) Ｘ１ The composition of claim 1 , wherein is an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, or a halogen atom.

3. The composition according to claim 1 or 2, wherein the curable compound comprises a polymerizable compound.

4. The composition according to claim 1 or 2, further comprising a photopolymerization initiator.

5. The composition according to claim 1 or 2, comprising a compound represented by formula (1) and a compound represented by formula (2).

6. A film obtained using the composition according to claim 1 or 2.

7. An optical filter comprising the film according to claim 6.

8. A solid-state imaging device comprising the film according to claim 6.

9. An image display device comprising the film according to claim 6.

10. An infrared sensor comprising the film according to claim 6.

11. A camera module comprising the membrane of claim 6.

12. A compound represented by formula (1) or formula (2); 【Chemistry 3】 In formula (1), A １ and A ２ each independently represents an aryl group, a heteroaryl group, or an alkyl group, X １ ~X ４ each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R １ ~R ８ each independently represents a hydrogen atom or a substituent, X １ and X ２ , X ３ and X ４ may be linked to each other to form a ring; However, X １ and X ２ At least one of the above is a group represented by formula (X-1); In formula (2), A １１ and A １２ each independently represents an aryl group, a heteroaryl group, or an alkyl group, X １１ and X １２ each independently represents an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group, or a halogen atom; R １１ ~R １８ each independently represents a hydrogen atom or a substituent, X １１ and X １２ may be linked to each other to form a ring; However, X １１ and X １２ At least one of the above is a group represented by formula (X-1); 【Chemistry 4】 In formula (X-1), * represents a linking bond. R Ｘ１ represents a substituent, A Ｘ１ represents an aryl group or a heteroaryl group.

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