Composition, film, optical filter, solid-state image sensor, image display device, infrared sensor, and camera module

Abstract

To provide a composition which enables formation of a film that is capable of blocking infrared rays in a wide wavelength range and offers superior heat resistance, light resistance, and moisture resistance, and to provide the film, an optical filter, a solid-state image sensor, an image display device, an infrared sensor, and a camera module.SOLUTION: A composition disclosed herein contains an infrared absorbing dye, a curable compound, and a solvent, the infrared absorbing dye containing a compound represented by a formula (1), where the compound represented by the formula (1) exhibits solubility less than 500 mg / L for propylene glycol methyl ether acetate at 25°C.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a composition containing an infrared absorbing dye, and also to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module, which use the composition containing the infrared absorbing dye. [Background technology]

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color imaging, such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light receiving section. For this reason, an infrared cut filter is sometimes used to correct visibility.

[0003] Infrared cut filters are produced using compositions containing infrared absorbing dyes, such as pyrrolopyrrole compounds.

[0004] Patent Document 1 describes the formation of a light absorbing layer of an optical filter using a composition containing a specific pyrrolopyrrole compound. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2020-064201 Summary of the Invention [Problem to be solved by the invention]

[0006] In recent years, films obtained using compositions containing infrared absorbing dyes have been required to have further improved heat resistance, light resistance, and moisture resistance, and are also desired to block infrared rays over a wider wavelength range.

[0007] According to the investigations of the present inventors, it has been found that the heat resistance, light resistance, and moisture resistance of the film obtained using the pyrrolopyrrole compound disclosed in Patent Document 1 are insufficient and there is room for further improvement. Furthermore, it has also been found that there is room for improvement in the infrared shielding property.

[0008] Therefore, an object of the present invention is to provide a composition capable of blocking infrared rays over a wide wavelength range and capable of forming a film having excellent heat resistance, light resistance, and moisture resistance. Another object of the present invention is to provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module. [Means for solving the problem]

[0009] The present invention provides the following:

[0010] <1> A composition comprising an infrared absorbing dye, a curable compound, and a solvent, The infrared absorbing dye contains a compound represented by formula (1), The compound represented by the formula (1) has a solubility in propylene glycol methyl ether acetate at 25°C of less than 500 mg / L. composition; [ka] In formula (1), L 1 represents an n-valent linking group, R 1 and R 2 each independently represents an alkyl group, an aryl group, or a heteroaryl group, X 1 and X 2 are each independently N or CR X1 represents R X1 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i1 , -SO2R i1 , -OSO2R i1 , a halogen atom, a sulfo group, or a hydroxy group; R i1 represents a substituent, Ar 1 represents an aryl group or a heteroaryl group, Y 1 and Y 2 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y1 R Y2 or a metal atom, and R Y1 and R Y2 each independently represents a hydrogen atom or a substituent, R Y1 and R Y2 may be bonded to form a ring, n represents an integer of 2 or more. <2> L in the above formula (1) 1 is a group containing at least one selected from an aromatic hydrocarbon group and a heterocyclic group, <1> The composition described in <3> In the above formula (1), n ​​is 2. <1> or <2> The composition described in <4> The compound represented by the formula (1) is a compound represented by the formula (2): <1> ~ <3> the composition according to any one of the preceding claims; [ka] In formula (2), A 1 , A 2 and B 1 each independently represents a cyclic structure containing two or more π electrons, m represents an integer of 0 to 4; R 3 ~R 6 each independently represents an alkyl group, an aryl group, or a heteroaryl group, X 4 ~X 7 are each independently N or CR X1 represents R X1 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i1 , -SO2R i1 , -OSO2R i1 , a halogen atom, a sulfo group, or a hydroxy group; R i1 represents a substituent, Ar 3and Ar 4 each independently represents an aryl group or a heteroaryl group, Y 3 ~Y 6 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y1 R Y2 or a metal atom, and R Y1 and R Y2 each independently represents a hydrogen atom or a substituent, R Y1 and R Y2 may be bonded to form a ring. <5> The curable compound includes a graft resin. <1> ~ <4> The composition according to any one of the preceding claims. <6> Further, it contains a pigment derivative, The pigment derivative includes a compound represented by formula (101): <1> ~ <5> the composition according to any one of the preceding claims; [ka] In formula (101), L 101 represents an n-valent linking group, R 101 and R 102 each independently represents an alkyl group, an aryl group, or a heteroaryl group, X 101 and X 102 are each independently N or CR X101 represents R X101 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i101 , -SO2R i101 , -OSO2R i101 , a halogen atom, a sulfo group, or a hydroxy group; R i101 represents a substituent, Ar 101 represents an aryl group or a heteroaryl group, Y 101 and Y 102 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y101 R Y102or a metal atom, and R Y101 and R Y102 each independently represents a hydrogen atom or a substituent, R Y101 and R Y102 may be bonded to form a ring, n represents an integer of 2 or more, L 501 represents a single bond or a linking group with a valence of (s+1), R 501 represents an acid group or a basic group, s represents an integer of 1 to 4, and t represents an integer of 1 or more; L 501 If is a single bond, s is 1, If s is 2 or more, multiple R 501 may be the same or different, If t is 2 or more, multiple R 501 and L 501 may be the same or different. <7> The curable compound includes a polymerizable compound. <1> ~ <6> The composition according to any one of the preceding claims. <8> Further, a photopolymerization initiator is contained. <1> ~ <7> The composition according to any one of the preceding claims. <9> <1> ~ <8> A film obtained by using the composition according to any one of the above. <10> <9> An optical filter having the film according to claim 1. <11> <9> A solid-state imaging device having the film according to claim 1. <12> <9> An image display device having the film according to claim 1. <13> <9> An infrared sensor having the film according to claim 1. <14> <9> A camera module having the membrane according to claim 1. [Effects of the Invention]

[0011] According to the present invention, there is provided a composition capable of blocking infrared rays over a wide wavelength range and capable of forming a film having excellent heat resistance, light resistance, and moisture resistance. The present invention also provides a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module. [Brief explanation of the drawings]

[0012] [Figure 1] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor. DETAILED DESCRIPTION OF THE INVENTION

[0013] The present invention will be described in detail below. In this specification, the symbol "to" is used to mean that the numerical values ​​before and after it are included as the lower limit and upper limit. In the description of groups (atomic groups) in this specification, when a notation does not specify whether they are substituted or unsubstituted, it encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups without a substituent (unsubstituted alkyl groups) but also alkyl groups with a substituent (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. In this specification, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In this specification, the weight average molecular weight and number average molecular weight are defined as values ​​converted into polystyrene by gel permeation chromatography (GPC) measurement. In this specification, Me in the chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved.

[0014] <Composition> The composition of the present invention comprises: A composition comprising an infrared absorbing dye, a curable compound, and a solvent, The infrared absorbing dye contains a compound represented by formula (1), The compound represented by the formula (1) is characterized in that its solubility in propylene glycol methyl ether acetate at 25°C is less than 500 mg / L.

[0015] According to the present invention, it is possible to form a film that can block infrared rays over a wide wavelength range and that has excellent heat resistance, light resistance, and moisture resistance. The reason for this effect is presumed to be as follows: By using a compound represented by formula (1) with a solubility of less than 500 mg / L in propylene glycol methyl ether acetate at 25°C, it is presumed that associations of the compound represented by formula (1) are easily formed in the film during film formation. It is presumed that the formation of such associations in the film broadens the infrared absorption band, allowing the formation of a film that can block infrared rays over a wide wavelength range. Furthermore, it is presumed that the compound represented by formula (1) has strong intermolecular π-π interactions and van der Waals forces, resulting in a strong crystalline state in the film. It is presumed that this is why a film with excellent heat resistance, light resistance, and moisture resistance was formed.

[0016] The composition of the present invention can be used as a composition for an optical filter. Types of optical filters include infrared cut filters and infrared transmission filters. Since the compound represented by formula (1) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0017] Each component used in the composition of the present invention will be described below.

[0018] <<Infrared absorbing dye>> The composition of the present invention contains an infrared absorbing dye, which is preferably a compound having a maximum absorption wavelength in the wavelength range of 700 to 2000 nm.

[0019] (Specific infrared absorbing dye (compound represented by formula (1)) The infrared absorbing dye contained in the composition of the present invention includes a compound represented by formula (1), and the compound represented by formula (1) has a solubility of less than 500 mg / L in propylene glycol methyl ether acetate at 25° C. Hereinafter, the compound represented by formula (1) exhibiting the above solubility will also be referred to as a specific infrared absorbing dye.

[0020] [ka] In formula (1), L 1 represents an n-valent linking group, R 1 and R 2 each independently represents an alkyl group, an aryl group, or a heteroaryl group, X 1 and X 2 are each independently N or CR X1 represents R X1 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i1 , -SO2R i1 , -OSO2R i1 , a halogen atom, a sulfo group, or a hydroxy group; R i1 represents a substituent, Ar 1 represents an aryl group or a heteroaryl group, Y 1 and Y 2 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y1 R Y2or a metal atom, and R Y1 and R Y2 each independently represents a hydrogen atom or a substituent, R Y1 and R Y2 may be bonded to form a ring, n represents an integer of 2 or more.

[0021] -L 1 About- L in equation (1) 1 represents an n-valent linking group. L 1 The n-valent linking group represented by is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, and a combination of two or more of these groups formed by a single bond, -NR L101 -, -N<, -SO-, -SO2-, -CO-, -O-, -COO-, -OCO-, -S-, -NR L101 CO- or -CONR L101 - and groups bonded via R L101 represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and is preferably a hydrogen atom.

[0022] The aliphatic hydrocarbon group preferably has 1 to 20 carbon atoms, and more preferably 1 to 10 carbon atoms. The aromatic hydrocarbon group may be either a single ring or a condensed ring. The aromatic hydrocarbon group may have a substituent. Examples of the substituent include the groups listed as the substituent T described below. The heterocyclic group may be either a monocyclic ring or a fused ring, but is preferably a fused ring. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 15, more preferably 1 to 10. The heterocyclic group is preferably a nitrogen-containing heterocyclic group. The heterocyclic group may have a substituent. Examples of the substituent include the groups listed as the substituent T described below.

[0023] L 1The n-valent linking group represented by is preferably a group containing at least one selected from an aromatic hydrocarbon group and a heterocyclic group, and more preferably a group containing a heterocyclic group. The heterocyclic ring is preferably a fused ring, more preferably two or more fused rings, and even more preferably three or more fused rings. L 1 The n-valent linking group represented by is preferably a conjugated linking group, more preferably a conjugated linking group containing at least one selected from an aromatic hydrocarbon group and a heterocyclic group, even more preferably a conjugated linking group containing a heterocyclic group, still more preferably a conjugated linking group containing a heterocyclic group having two or more fused rings, and particularly preferably a conjugated linking group containing a heterocyclic group having three or more fused rings. Here, the conjugated linking group means a group in which a conjugated system extends from one bonding position to the other bonding position.

[0024] L 1 The n-valent linking group represented by is preferably a group represented by formula (L-1), formula (L-2) or formula (L-3), and more preferably a group represented by formula (L-1) or formula (L-3). [ka]

[0025] In formula (L-1), A 1 , A 2 and B 1 each independently represents a cyclic structure containing two or more π electrons, m represents an integer of 0 to 4. In formula (L-2), Ar L1 and Ar L2 each independently represents a heterocyclic group; L 10 represents a single bond or a divalent linking group. In formula (L-3), C 1 represents a cyclic structure containing two or more π electrons.

[0026] A in formula (L-1) 1 and A 2The cyclic structure represented by is preferably a 5-membered ring or a 6-membered ring, more preferably a 5-membered ring. B in formula (L-1) 1 The cyclic structure represented by is preferably a 5-membered ring or a 6-membered ring, more preferably a 6-membered ring.

[0027] In formula (L-1), m represents an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 1.

[0028] In formula (L-2), Ar L1 and Ar L2 Examples of the heterocyclic group represented by include the heterocyclic groups described above. In formula (L-2), L 10 The divalent linking group represented by is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -NR L101 -, -SO-, -SO2-, -CO-, -O-, -COO-, -OCO-, -S-, -NR L101 CO-, -CONR L101 - and groups combining two or more of these. L101 represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and is preferably a hydrogen atom.

[0029] C in formula (L-3) 1 The cyclic structure represented by is preferably a 5-membered ring or a 6-membered ring.

[0030] L 1 The formula weight of the n-valent linking group represented by is preferably 60 to 1,000, more preferably 120 to 500, and even more preferably 150 to 300.

[0031] L 1 Specific examples of the n-valent linking group represented by include the groups shown below. In the structural formulas shown below, * represents a bond, Ph represents a phenyl group, and R L1 ~R L8 R each independently represents a hydrogen atom or a substituent. L1 ~R L8Examples of the substituent represented by include the groups exemplified below as the substituent T, and an alkyl group, an aryl group, or a heteroaryl group is preferred. [ka]

[0032] -R 1 and R 2 About- R in Equation (1) 1 and R 2 each independently represents an alkyl group, an aryl group, or a heteroaryl group, and is preferably an aryl group or a heteroaryl group, more preferably an aryl group, because the effects of the present invention can be more significantly obtained and the solubility of the compound can be further reduced.

[0033] R 1 and R 2 The number of carbon atoms in the alkyl group represented by is preferably 1 to 10, more preferably 1 to 7, and further preferably 1 to 5, because this allows the effects of the present invention to be more pronounced and the solubility of the compound to be further reduced. The alkyl group may be linear, branched, or cyclic, and is preferably linear or branched, and more preferably linear. R 1 and R 2 The alkyl group represented by may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described below, such as an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphate group, -NR t1 R t2 , -NR t1 COR t3 , -SR t3 , -SO2R t3 , -OSO2R t3 , -COR t3 , -OCOR t3 or -COOR t3R is preferably a hydroxy group, a halogen atom, an aryl group, or a heteroaryl group, because the effects of the present invention can be more significantly obtained and the solubility of the compound can be further reduced. t1 and R t2 each independently represents a hydrogen atom or a substituent, R t3 represents a substituent. t1 ~R t3 Examples of the substituent represented by include an alkyl group, an aryl group, and a heteroaryl group. The alkyl group is preferably an alkyl group having 5 or less carbon atoms.

[0034] R 1 and R 2 The aryl group represented by the formula (I) preferably has 6 to 40 carbon atoms, more preferably 6 to 30 carbon atoms, and even more preferably 6 to 20 carbon atoms. R 1 and R 2 The aryl group represented by may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described below, such as an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphate group, -NR t1 R t2 , -NR t1 COR t3 , -SR t3 , -SO2R t3 , -OSO2R t3 , -COR t3 , -OCOR t3 or -COOR t3 R is preferably a hydroxy group, a halogen atom, an aryl group, or a heteroaryl group, because the effects of the present invention can be more significantly obtained and the solubility of the compound can be further reduced. t1 and R t2 each independently represents a hydrogen atom or a substituent, R t3 represents a substituent. t1 ~R t3Examples of the substituent represented by include an alkyl group, an aryl group, and a heteroaryl group. The alkyl group is preferably an alkyl group having 5 or less carbon atoms.

[0035] R 1 and R 2 The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 15, more preferably 1 to 10. Types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. The heteroaryl group may be a monocyclic ring or a condensed ring. R 1 and R 2 The heteroaryl group represented by may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described below, such as an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphate group, -NR t1 R t2 , -NR t1 COR t3 , -SR t3 , -SO2R t3 , -OSO2R t3 , -COR t3 , -OCOR t3 or -COOR t3 R is preferably a hydroxy group, a halogen atom, an aryl group, or a heteroaryl group, because the effects of the present invention can be more significantly obtained and the solubility of the compound can be further reduced. t1 and R t2 each independently represents a hydrogen atom or a substituent, R t3 represents a substituent. t1 ~R t3 Examples of the substituent represented by include an alkyl group, an aryl group, and a heteroaryl group. The alkyl group is preferably an alkyl group having 5 or less carbon atoms.

[0036] -X 1 and X 2 - X in equation (1) 1 and X 2 are each independently N or CR X1 represents CR X1 It is preferable that R X1 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i1 , -SO2R i1 , -OSO2R i1 R represents a halogen atom, a sulfo group, or a hydroxy group, and is preferably a cyano group. i1 represents a substituent. i1 The substituent represented by the formula (I) includes an alkyl group, an aryl group, and a heteroaryl group.

[0037] -Ar 1 About- Ar in formula (1) 1 represents an aryl group or a heteroaryl group, and is preferably a heteroaryl group. The aryl group preferably has 6 to 40 carbon atoms, more preferably 6 to 30 carbon atoms, and even more preferably 6 to 20 carbon atoms. The heteroaryl group may be a monocyclic ring, but is preferably a fused ring. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. The heteroatom constituting the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of carbon atoms constituting the ring of the heteroaryl group is preferably 1 to 15, more preferably 1 to 10.

[0038] The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified as the substituent T described below, and are preferably a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, a hydroxy group, an aryl group, a heteroaryl group, or a cyano group.

[0039] The heteroaryl group is preferably a group represented by formula (Har-1) to formula (Har-10) shown below, and more preferably a group represented by formula (Har-1), formula (Har-2), formula (Har-4) or formula (Har-10). [ka]

[0040] In the formula, R a1 ~R a49 Each independently represents a hydrogen atom or a substituent, and * represents a linking hand. a1 ~R a49 Examples of the substituent represented by include the groups exemplified as the substituent T described below, and are preferably a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, a hydroxy group, an aryl group, a heteroaryl group or a cyano group.

[0041] In formula (Har-1), R a1 and R a2 , R a2 and R a3 , R a3 and R a4 may be bonded to each other to form a ring. In formula (Har-2), R a5 and R a6 , R a6 and R a7 , R a7 and R a8 may be bonded to each other to form a ring. In formula (Har-3), R a9 and R a10 , R a10 and R a11 , R a11 and R a12 , R a12 and R a13 may be bonded to each other to form a ring. In formula (Har-4), R a15 and R a16 , R a16 and R a17 , R a17 and R a18may be bonded to each other to form a ring. In formula (Har-5), R a19 and R a20 , R a20 and R a21 , R a21 and R a22 , R a22 and R a23 , R a23 and R a24 may be bonded to each other to form a ring. In formula (Har-6), R a25 and R a26 , R a26 and R a27 may be bonded to each other to form a ring. In formula (Har-7), R a28 and R a29 , R a29 and R a30 , R a30 and R a31 may be bonded to each other to form a ring. In formula (Har-8), R a32 and R a33 , R a33 and R a34 , R a34 and R a35 , R a35 and R a36 , R a36 and R a37 may be bonded to each other to form a ring. In formula (Har-9), R a38 and R a39 , R a39 and R a40 , R a40 and R a41 , R a41 and R a42 , R a42 and R a43 may be bonded to each other to form a ring. In formula (Har-10), R a44 and R a45 , R a45 and R a46 , R a46 and R a47 , R a47 and R a48 , Ra48 and R a49 may be bonded to each other to form a ring.

[0042] In the formulae (Har-1) to (Har-10), the ring formed by bonding the above groups together is preferably a 5-membered ring or a 6-membered ring.

[0043] -Y 1 and Y 2 About- Y in equation (1) 1 and Y 2 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y1 R Y2 or a metal atom, -BR Y1 R Y2 It is preferable that:

[0044] Y 1 and Y 2 The number of carbon atoms in the alkyl group represented by is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, still more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described below.

[0045] Y 1 and Y 2 The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described below.

[0046] Y 1 and Y 2The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 15, more preferably 1 to 10. Types of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. The heteroaryl group may be a monocyclic ring or a condensed ring. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described below.

[0047] Y 1 and Y 2 Examples of the metal atom represented by include magnesium, aluminum, calcium, barium, zinc, tin, vanadium, iron, cobalt, nickel, copper, palladium, iridium and platinum, with aluminum, zinc, vanadium, iron, copper, palladium, iridium or platinum being preferred.

[0048] -BR Y1 R Y2 R in the group represented by Y1 and R Y2 R each independently represents a hydrogen atom or a substituent. Examples of the substituent include the groups listed below for the substituent T. Y1 and R Y2 are each independently preferably a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group, more preferably a halogen atom, an alkyl group, an aryl group, or a heteroaryl group, further preferably a halogen atom, an alkyl group, or an aryl group, and particularly preferably an aryl group.

[0049] R Y1 and R Y2 Examples of the halogen atom represented by include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, with a fluorine atom being preferred. R Y1 and R Y2The number of carbon atoms in the alkyl group and alkoxy group represented by is preferably 1 to 40, more preferably 1 to 30, and even more preferably 1 to 20. The alkyl group and alkoxy group may be linear, branched, or cyclic, but linear or branched is preferred. The alkyl group and alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include an aryl group, a heteroaryl group, and a halogen atom. R Y1 and R Y2 The number of carbon atoms in the alkenyl group represented by is preferably 2 to 40, more preferably 2 to 30, and still more preferably 2 to 20. The alkenyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, and a halogen atom. R Y1 and R Y2 The number of carbon atoms in the aryl group and aryloxy group represented by is preferably 6 to 20, more preferably 6 to 12. The aryl group and aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom. R Y1 and R Y2 The number of carbon atoms constituting the ring of the heteroaryl group and heteroaryloxy group represented by is preferably 1 to 15, more preferably 1 to 10. Examples of heteroatoms constituting the ring of the heteroaryl group and heteroaryloxy group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group and heteroaryloxy group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group and heteroaryloxy group may be a monocyclic ring or a condensed ring. The heteroaryl group and heteroaryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom.

[0050] -BR Y1 R Y2 R of the group represented by Y1 and R Y2may be bonded to each other to form a ring. Examples of the ring formed include structures shown in the following formulae (B-1) to (B-5). In the following, Rb represents a substituent, and Rb 1 ~Rb 4 each independently represents a hydrogen atom or a substituent, b1 to b3 each independently represents an integer of 0 to 4, b4 represents an integer of 0 to 6, and * represents a linking bond. Rb and Rb 1 ~Rb 4 Examples of the substituent represented by include the groups exemplified below as the substituent T, and a halogen atom, an alkyl group or an alkoxy group is preferred. [ka]

[0051] -About n- In formula (1), n ​​represents an integer of 2 or more, preferably an integer of 2 to 4, and more preferably 2.

[0052] -Regarding the Substituent T- Examples of the substituent T include the following groups: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably or an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms). group), acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), carboxylic acid a bamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms),An arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heteroarylsulfinyl group Examples of the substituent include an alkyl group (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxyl group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imido group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, and an imino group. When these groups are further substitutable, they may further have a substituent. Examples of the substituent include the groups described above for the substituent T.

[0053] The specific infrared absorbing dye is preferably a compound represented by formula (2). [ka]

[0054] In formula (2), A 1 , A 2 and B 1 each independently represents a cyclic structure containing two or more π electrons, m represents an integer of 0 to 4; R 3 ~R 6 each independently represents an alkyl group, an aryl group, or a heteroaryl group, X 4 ~X 7 are each independently N or CR X1 represents R X1 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i1, -SO2R i1 , -OSO2R i1 , a halogen atom, a sulfo group, or a hydroxy group; R i1 represents a substituent, Ar 3 and Ar 4 each independently represents an aryl group or a heteroaryl group, Y 3 ~Y 6 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y1 R Y2 or a metal atom, and R Y1 and R Y2 each independently represents a hydrogen atom or a substituent, R Y1 and R Y2 may be bonded to form a ring.

[0055] A in equation (2) 1 , A 2 , B 1 and m is A in formula (L-1). 1 , A 2 , B 1 and m, and the preferred ranges thereof are also the same. R in Equation (2) 3 ~R 6 is the R in equation (1). 1 and R 2 The same applies to the preferred range. X in equation (2) 4 ~X 7 is X in equation (1). 1 and X 2 The same applies to the preferred range. Ar in formula (2) 3 and Ar 4 is the Ar in formula (1). 1 The same applies to the preferred range. Y in equation (2) 3 ~Y 6 is the Y in equation (1). 1 and Y 2 The same applies to the preferred range.

[0056] The specific infrared absorbing dye has a solubility in propylene glycol methyl ether acetate at 25° C. of less than 500 mg / L, preferably 300 mg / L or less, and more preferably 100 mg / L or less.

[0057] The molecular weight of the specific infrared absorbing dye is preferably 800 to 6,000, more preferably 900 to 4,000, and even more preferably 1,000 to 3,000.

[0058] The maximum absorption wavelength of the specific infrared absorbing dye is preferably in the wavelength range of 700 to 1600 nm, more preferably in the wavelength range of 750 to 1400 nm, and even more preferably in the wavelength range of 800 to 1100 nm.

[0059] The absorbance and maximum absorption wavelength of a specific infrared absorbing dye can be determined by dissolving the specific infrared absorbing dye in a solvent to prepare a solution and measuring the absorbance of the solution. Examples of solvents used to prepare the solution include chloroform, dimethyl sulfoxide (DMSO), and tetrahydrofuran (THF). Note that if the specific infrared absorbing dye is a compound that dissolves in chloroform, chloroform is used as the solvent. If the specific infrared absorbing dye is a compound that does not dissolve in chloroform but dissolves in dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF), dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF) is used as the solvent.

[0060] Specific examples of the specific infrared absorbing dye include Pig-001 to Pig-049, which are described in the examples below.

[0061] (Other infrared absorbing dyes) The composition of the present invention may further contain an infrared absorbing dye other than the specific infrared absorbing dye described above. Examples of the other infrared absorbing dye include pyrrolopyrrole compounds, squarylium compounds, croconium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, iminium compounds, quaterrylene compounds, aminium compounds, azo compounds, anthraquinone compounds, porphyrin compounds, oxonol compounds, and hexaphyrin compounds, and the other infrared absorbing dye is preferably at least one selected from pyrrolopyrrole compounds, squarylium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, and naphthalocyanine compounds.

[0062] Examples of pyrrolopyrrole compounds include compounds described in paragraphs 0016 to 0058 of JP 2009-263614 A, compounds described in paragraphs 0037 to 0052 of JP 2011-068731 A, and compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873 A. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169 A, compounds described in paragraph 0040 of WO 2016 / 181987 A, compounds described in JP 2015-176046 A, compounds described in paragraph 0072 of WO 2016 / 190162 A, and compounds described in JP 2016-074649 A. compounds described in paragraphs 0196 to 0228 of JP 2017-067963 A, compounds described in paragraph 0124 of JP 2017-067963 A, compounds described in WO 2017 / 135359 A, compounds described in JP 2017-114956 A, compounds described in Japanese Patent No. 6197940 A, compounds described in WO 2016 / 120166 A, and compounds described in Table 1 of U.S. Pat. No. 11261172 A. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, compounds described in JP 2015-172004 A, compounds described in JP 2015-172102 A, compounds described in JP 2008-088426 A, compounds described in paragraph 0090 of WO 2016 / 190162 A, compounds described in JP 2017-031394 A, compounds described in JP 2021-134350 A, compounds described in WO 2021 / 085372 A, compounds described in paragraphs 0188 to 0192 of WO 2022 / 181422 A, and the like. Examples of croconium compounds include compounds described in JP-A-2017-082029 and compounds described in JP-A-2016-079331.Examples of iminium compounds include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564. Examples of phthalocyanine compounds include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020 / 071470. Examples of the naphthalocyanine compound include the compounds described in paragraph 0093 of JP-A No. 2012-077153 and the compounds described in JP-A No. 2022-173080.

[0063] Other infrared absorbing dyes include squarylium compounds described in JP-A-2017-197437, squarylium compounds described in JP-A-2017-025311, squarylium compounds described in WO 2016 / 154782, squarylium compounds described in Japanese Patent No. 5884953, squarylium compounds described in Japanese Patent No. 6036689, squarylium compounds described in Japanese Patent No. 5810604, squarylium compounds described in paragraphs 0090 to 0107 of WO 2017 / 213047, squarylium compounds described in JP-A-2018-054 pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of JP-A No. 760, pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP-A No. 2018-040955, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP-A No. 2018-002773, squarylium compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of JP-A No. 2018-041047, amide-linked squarylium compounds described in JP-A No. 2017-179131, pyrrole bis-type squarylium skeleton compounds described in JP-A No. 2017-141215 compounds having a hexagonal or croconium skeleton, dihydrocarbazole bis-type squarylium compounds described in JP 2017-082029 A, asymmetric compounds described in paragraphs 0027 to 0114 of JP 2017-068120 A, pyrrole ring-containing compounds (carbazole type) described in JP 2017-067963 A, phthalocyanine compounds described in Japanese Patent No. 6251530 A, compounds described in JP 2019-127549 A, compounds described in WO 2022 / 059619, and compounds described in JP 2022-151682 A Compounds described in JP 2022-188858 A, compounds described in JP 2022-184710 A, compounds described in JP 2022-189736 A, compounds described in WO 2023 / 052770 A, compounds described in JP 2022-189736 A, compounds described in JP 2023-007400 A, compounds described in JP 2023-109541 A, compounds described in JP 2024-047265 A, compounds described in JP 2024-043503 A,Extended-side phthalocyanine described in JP 2021-047255 A, compounds described in WO 2024 / 058103 A, compounds described in JP 2024-071077 A, compounds described in U.S. Patent Application Publication No. 2021 / 0036251 A, compounds described in JP 2024-079641 A, cyanine compounds described in WO 2024 / 106293 A, squarylium compounds described in Korean Patent Registration No. 10-2622663 A, squarylium compounds described in JP 2024-071077 A, cyanine compounds described in WO 2024 / 128016 A, etc. can also be used.

[0064] The content of the infrared absorbing dye in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 1% by mass or more, still more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit of the content of the infrared absorbing dye is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less. The composition of the present invention may contain only one type of infrared absorbing dye, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0065] The content of the specific infrared absorbing dye in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 1% by mass or more, still more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit of the content of the infrared absorbing dye is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less. The composition of the present invention may contain only one type of specific infrared absorbing dye, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0066] When the composition of the present invention contains another infrared absorbing dye, the content of the other infrared absorbing dye is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass, per 100 parts by mass of the specific infrared absorbing dye.

[0067] <<Curable compound>> The composition of the present invention contains a curable compound. Examples of the curable compound include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Preferred are a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and more preferred are a (meth)acryloyloxy group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. Preferred is an epoxy group.

[0068] The curable compound preferably contains at least a resin. The resin preferably contains a graft resin. Examples of the graft resin include a resin having a repeating unit with a graft chain.

[0069] In this specification, the term "graft chain" refers to a polymer chain that branches off from the main chain of a repeating unit. The number of atoms of the graft chain excluding hydrogen atoms is preferably 40 to 10,000, more preferably 50 to 2,000, and even more preferably 60 to 500.

[0070] The graft chain preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, polystyrene structures, polyurethane structures, polyurea structures, and polyamide structures; more preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, and polystyrene structures; even more preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, and poly(meth)acrylic structures; still more preferably contains repeating units of a polyester structure or a polyether structure; and particularly preferably contains repeating units of a polyester structure. The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an alkoxy group, and an alkylthioether group. Among these, from the viewpoint of improving the dispersibility of the pigment, a group having a steric repulsion effect is preferred, and an alkyl group or an alkoxy group having 5 to 30 carbon atoms is more preferred. The alkyl group and alkoxy group may be linear, branched, or cyclic, and linear or branched is preferred.

[0071] The weight-average molecular weight of the repeating unit having a graft chain is preferably 1,000 or more, more preferably 1,000 to 10,000, and even more preferably 1,000 to 7,500. In this specification, the weight-average molecular weight of the repeating unit having a graft chain is a value calculated from the weight-average molecular weight of the raw material monomers used in the polymerization of the repeating unit. For example, the repeating unit having a graft chain can be formed by polymerizing a macromonomer. Here, the macromonomer refers to a polymer compound having a polymerizable group introduced at the polymer terminal. When the repeating unit having a graft chain is formed using a macromonomer, the weight-average molecular weight of the macromonomer corresponds to the repeating unit having a graft chain.

[0072] The graft resin is preferably a resin having a repeating unit having a graft chain and a repeating unit having an acid group.

[0073] The weight-average molecular weight of the graft resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more. The graft resin can be used as a binder or dispersant. For details of the graft resin, please refer to the descriptions in paragraphs 0025 to 0094 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0074] The curable compound contained in the composition of the present invention preferably contains a polymerizable compound. When the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

[0075] (polymerizable compound) Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. A compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

[0076] Examples of resin-type polymerizable compounds include resins containing repeating units having polymerizable groups.

[0077] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2,000,000. The upper limit of the weight-average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight-average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

[0078] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a trifunctional to 15-functional (meth)acrylate compound, more preferably a trifunctional to 6-functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0079] Examples of compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer). Furthermore, examples of compounds having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like can also be used.

[0080] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), and KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0081] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group and a urethane bond (hereinafter also referred to as a polymerizable compound having a urethane bond) as the compound having an ethylenically unsaturated bond-containing group. By using such a compound, the heat resistance of the resulting film can be further improved. The reason for this effect is presumed to be that the urethane bond portion forms a physically crosslinked structure due to intermolecular hydrogen bonding.

[0082] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylates obtained by reacting a (meth)acrylate having a hydroxy group with a polyfunctional isocyanate, and urethane (meth)acrylates obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and then reacting the resulting mixture with a (meth)acrylate having a hydroxy group.

[0083] Examples of the (meth)acrylate having a hydroxy group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxy group-containing polyol polyacrylate.

[0084] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and biuret derivatives, isocyanate nurate derivatives, and trimethylolpropane adducts thereof.

[0085] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A No. 2022-173080 can also be used.

[0086] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0087] As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used.For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, and the contents thereof are incorporated herein.Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0088] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0089] The compound having an ethylenically unsaturated bond-containing group may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0090] Examples of compounds having an ethylenically unsaturated bond-containing group that can be used include polymerizable compounds containing a urethane bond described in JP 2024-070237 A, EBECRYL5129 (manufactured by Daicel-Allnex Co., Ltd.), EBECRYL220 (manufactured by Daicel-Allnex Co., Ltd.), KUA-9N (manufactured by KSM Co., Ltd.), and polymerizable compounds described in JP 2024-085753 A.

[0091] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0092] Examples of the compound having a cyclic ether group include a compound having an epoxy group and a compound having an oxetanyl group, and the compound having an epoxy group is preferred. Examples of the compound having an epoxy group include a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0093] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0094] Examples of compounds having a cyclic ether group that can be used include compounds described in paragraphs 0034 to 0036 of JP 2013-011869 A, compounds described in paragraphs 0147 to 0156 of JP 2014-043556 A, compounds described in paragraphs 0085 to 0092 of JP 2014-089408 A, and compounds described in JP 2017-179172 A.

[0095] Commercially available compounds having a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, and EPPN-502 (all manufactured by ADEKA Corporation), Celloxide 2021P, Celloxide 2081, Celloxide 2083, Celloxide 2085, EHPE3150, and EPOLEAD PB. 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adeka Glycirol Examples of suitable monomers include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (manufactured by NOF Corporation, epoxy group-containing polymers), OXT-101, OXT-121, OXT-212, and OXT-221 (all manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomers), and OXE-10 and OXE-30 (all manufactured by Osaka Organic Chemical Industry Ltd., oxetanyl group-containing monomers).

[0096] Compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs

[0134] to

[0147] of JP 2004-295116 A and paragraphs

[0095] to

[0126] of JP 2014-089408 A can also be used.

[0097] (resin) The composition of the present invention can use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. Resins are blended, for example, for purposes such as dispersing pigments and the like in the composition or as binders. Resins used primarily to disperse pigments and the like in the composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses. Resins having polymerizable groups also fall under the category of polymerizable compounds.

[0098] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0099] Examples of resins include (meth)acrylic resins, epoxy resins, enethiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. These resins may be used alone or in combination of two or more. Norbornene resins are preferred as cyclic olefin resins in terms of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, as the resin, a resin described in paragraphs 0091 to 0099 of WO 2022 / 065215, a blocked polyisocyanate resin described in JP 2016-222891 A, a resin described in JP 2020-122052 A, a resin described in JP 2020-111656 A, a resin described in JP 2020-139021 A, a resin containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in JP 2017-138503 A, a resin described in paragraphs 0199 to 0233 of JP 2020-186373 A, Alkali-soluble resins described in JP 186325 A, resins represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339 A, copolymers containing epoxy groups and acid groups described in International Publication No. 2022 / 030445 A, resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, alkali-soluble resins described in JP 2020-186325 A, resins represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339 A, resins described in JP 2021-134350 A, and copolymers described in JP 2020-041046 A can also be used. Furthermore, resins having a fluorene skeleton can also be preferably used as the resin. Examples of resins having a fluorene skeleton include resins described in U.S. Patent Application Publication No. 2017 / 0102610 A.In addition, as the resin, the resin described in paragraphs 0199 to 0233 of JP 2020-186373 A, the alkali-soluble resin described in JP 2020-186325 A, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339 A, the resin described in JP 2021-134350 A, the resin described in JP 2022-174597 A, the resin described in JP 2024-050148 A, the copolymer described in WO 2024 / 134926 A, and the resin described in JP 2024-088596 A can also be used.

[0100] It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0101] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0102] It is also preferable to use a graft resin as the resin, and examples of the graft resin include those described above.

[0103] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol % or more is preferred, when the total amount of the acid groups and the basic groups is taken as 100 mol %. The acid groups possessed by the acidic dispersant (acidic resin) are preferably carboxy groups. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol % is preferred, when the total amount of the acid groups and the basic groups is taken as 100 mol %. The basic groups possessed by the basic dispersant are preferably amino groups.

[0104] The resin used as the dispersant is also preferably a graft resin.

[0105] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details on polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0106] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

[0107] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0108] Examples of dispersants include resins described in JP 2018-087939 A, block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803 A, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, and acrylamide polymers described in JP 2020-066688 A. Block polymers having arylamide structural units, dispersants described in WO 2016 / 104803, triazine compounds described in Korean Patent Publication No. 10-2017-0129400, dispersants described in JP 2024-050950 A, triazine compounds described in Korean Patent Publication No. 10-2017-0129416, aryl-modified branched reaction products described in JP 2024-510115 A, pigment dispersants described in Chinese Patent Publication No. 109554004, and the like can also be used.

[0109] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0110] The content of the curable compound in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0111] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0112] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0113] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 70% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0114] When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0115] When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0116] When the composition of the present invention contains a graft resin, the content of the graft resin in the total solid content of the composition is preferably 0.1 to 40% by mass. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The content of the graft resin is preferably 1 to 100 parts by mass per 100 parts by mass of the specific infrared absorbing dye. The upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more.

[0117] The composition of the present invention may contain only one type of curable compound or may contain two or more types of curable compounds. When two or more types of curable compounds are contained, the total amount thereof is preferably within the above range.

[0118] <<Solvent>> The composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, see paragraph 0223 of International Publication No. 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable methyl alcohols include ethylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol or 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount can be reduced to 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0119] The metal content of the organic solvent is preferably low. For example, the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, organic solvents with metal contents at the mass ppt (parts per trillion) level may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0120] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0121] The organic solvent may contain isomers (compounds with the same number of atoms but different structures), and may contain only one type of isomer or multiple types of isomers.

[0122] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0123] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0124] <<Pigment derivatives>> The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material that enhances the dispersibility of the pigment in the composition.

[0125] Examples of the pigment derivative include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

[0126] Examples of the dye structure include a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a quinacridone dye structure, an anthraquinone dye structure, a dianthraquinone dye structure, a benzisoindole dye structure, a thiazine indigo dye structure, an azo dye structure, a quinophthalone dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, a dioxazine dye structure, a perylene dye structure, a perinone dye structure, a benzimidazolone dye structure, a benzothiazole dye structure, a benzimidazole dye structure, and a benzoxazole dye structure. A squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a phthalocyanine dye structure, a quinacridone dye structure, or a benzimidazolone dye structure is preferred, and a squarylium dye structure or a pyrrolopyrrole dye structure is more preferred.

[0127] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li + , Na + , K. + etc.), alkaline earth metal ions (Ca 2+ , Mg 2+ Examples of the carboxylic acid amide group include -NHCOR A1 As the sulfonamide group, a group represented by -NHSO2R is preferred. A2 As the imide acid group, a group represented by -SO2NHSO2R is preferred. A3 , -CONHSO2R A4 , -CONHCOR A5 or -SO2NHCOR A6 A group represented by the formula: -SO2NHSO2R is preferred. A3 is more preferable. A1 ~R A6 R each independently represents an alkyl group or an aryl group. A1 ~R A6 The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0128] Examples of basic groups possessed by pigment derivatives include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions. Examples of amino groups include -NR A11 R A12 and a cyclic amino group.

[0129] -NR A11 R A12 In the group represented by A11 and R A12are each independently a hydrogen atom, an alkyl group, or an aryl group, and are preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. Examples of the substituent include the substituent T described above. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include the substituent T described above.

[0130] Examples of the cyclic amino group include a pyrrolidine group, a piperidine group, a piperazine group, and a morpholine group. These groups may further have a substituent. Examples of the substituent include the substituent T described above.

[0131] The pigment derivative is also preferably a compound represented by formula (101). By using the above-mentioned specific infrared absorbing dye in combination with the compound represented by formula (101), the effects of the present invention are more significantly exhibited. [ka] In formula (101), L 101 represents an n-valent linking group, R 101 and R 102 each independently represents an alkyl group, an aryl group, or a heteroaryl group, X 101 and X 102 are each independently N or CR X101 represents R X101 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i101 , -SO2R i101 , -OSO2R i101 , a halogen atom, a sulfo group, or a hydroxy group; R i101 represents a substituent, Ar 101represents an aryl group or a heteroaryl group, Y 101 and Y 102 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y101 R Y102 or a metal atom, and R Y101 and R Y102 each independently represents a hydrogen atom or a substituent, R Y101 and R Y102 may be bonded to form a ring, n represents an integer of 2 or more, L 501 represents a single bond or a linking group with a valence of (s+1), R 501 represents an acid group or a basic group, s represents an integer of 1 to 4, and t represents an integer of 1 or more; L 501 If is a single bond, s is 1, If s is 2 or more, multiple R 501 may be the same or different, If t is 2 or more, multiple R 501 and L 501 may be the same or different.

[0132] L in equation (101) 101 , R 101 , R 102 , X 101 , X 102 , Ar 101 , Y 101 , Y 102 and n is L in Eq. (1). 1 , R 1 , R 2 , X 1 , X 2 , Ar 1 , Y 1 , Y 2 and n have the same meanings and preferred ranges.

[0133] L in equation (101) 501represents a single bond or an (s+1)-valent linking group. Examples of the (s+1)-valent linking group include an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -CO-, -COO-, -OCO-, -SO2-, and -NR L510 -, -N<, -NR L510 CO-, -CONR L510 -, -NR L510 SO2-, -SO2NR L510 - and combinations thereof. L510 represents a hydrogen atom, an alkyl group, or an aryl group.

[0134] The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, still more preferably 1 to 10, and particularly preferably 1 to 5. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, and even more preferably 6 carbon atoms. The heterocyclic group may be either a single ring or a condensed ring. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 15, more preferably 1 to 10. The aliphatic hydrocarbon group, aromatic hydrocarbon group and heterocyclic group may have a substituent, such as an alkyl group or an aryl group.

[0135] R in equation (101) 501 represents an acid group or a basic group. Examples of the acid group and the basic group include those described above.

[0136] In formula (101), s represents an integer of 1 to 4, preferably 1 or 2, and more preferably 1.

[0137] In formula (101), t represents an integer of 1 or more, preferably an integer of 1 to 8, and more preferably an integer of 1 to 4.

[0138] The compound represented by formula (101) is preferably a compound represented by formula (102). [ka] In formula (102), L 101 represents an n-valent linking group, X 101 and X 102 are each independently N or CR X101 represents R X101 is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR i101 , -SO2R i101 , -OSO2R i101 , a halogen atom, a sulfo group, or a hydroxy group; R i101 represents a substituent, Ar 101 represents an aryl group or a heteroaryl group, Y 101 and Y 102 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR Y101 R Y102 or a metal atom, and R Y101 and R Y102 each independently represents a hydrogen atom or a substituent, R Y101 and R Y102 may be bonded to form a ring, n represents an integer of 2 or more, A 501 and A 502 each independently represents a group represented by formula (A-1), t1 and t2 each independently represent an integer of 0 or greater, and at least one of t1 and t2 is an integer of 1 or greater; If t1 is 2 or more, multiple A 501 may be the same or different, If t2 is 2 or more, multiple A 502may be the same or different; [ka] In formula (A-1), * represents a bond. L A501 represents a single bond or a linking group with a valence of (s+1), R A501 represents an acid group or a basic group, s1 represents an integer from 1 to 4, L A501 If is a single bond, s1 is 1, If s1 is 2 or more, multiple R A501 may be the same or different.

[0139] L in equation (102) 101 , X 101 , X 102 , Ar 101 , Y 101 , Y 102 and n is L in Eq. (1). 1 , X 1 , X 2 , Ar 1 , Y 1 , Y 2 and n have the same meanings and preferred ranges.

[0140] In formula (102), t1 and t2 each independently represent an integer of 0 or greater, preferably an integer of 0 to 4, more preferably 0 to 2, even more preferably 1 or 2, and particularly preferably 1.

[0141] L in formula (A-1) A501 and R A501 is the L in equation (101). 501 and R 501 The same applies to the preferred range. In formula (A-1), s1 represents an integer of 1 to 4, preferably 1 or 2, and more preferably 1.

[0142] The group represented by formula (A-1) is preferably a group represented by formula (A-2). [ka] In formula (A-2), * represents a bond. L A502 represents a single bond or a linking group with a valence of (s+1), R A501 represents an acid group or a basic group, s1 represents an integer from 1 to 4, and L A501 If is a single bond, s1 is 1, If s1 is 2 or more, multiple R A501 may be the same or different.

[0143] R in formula (A-2) A501 and s1 is R in formula (A-1) A501 and s1.

[0144] L in formula (A-2) A502 The s+1-valent linking group represented by is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -CO-, -COO-, -OCO-, -SO2-, -NR L510 -, -N<, -NR L510 CO-, -CONR L510 -, -NR L510 SO2-, -SO2NR L510 - and combinations thereof. L510 represents a hydrogen atom, an alkyl group, or an aryl group. The preferred ranges of the aliphatic hydrocarbon group, the aromatic hydrocarbon group, and the heterocyclic group are the same as those described above.

[0145] Specific examples of the compound represented by formula (101) include Syn-001 to Syn-023 described in the Examples below.

[0146] Specific examples of other pigment derivatives include compounds described in paragraphs 0037 to 0054 of WO 2016 / 035695, compounds described in paragraphs 0061 to 0086 of WO 2017 / 146092, compounds described in paragraphs 0017 to 0068 of WO 2018 / 230387, compounds described in paragraphs 0085 to 0099 of WO 2020 / 054718, compounds described in paragraph 0099 of WO 2020 / 054718, compounds described in paragraph 0124 of WO 2022 / 085485, benzimidazolone compounds or salts thereof described in JP 2018-168244 A, compounds having an isoindoline skeleton described in the general formula (1) of Japanese Patent No. 6996282, and the like.

[0147] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. Furthermore, when a compound represented by formula (101) is used as the pigment derivative, the content of the compound represented by formula (101) is preferably 1 to 50 parts by mass relative to 100 parts by mass of the specific infrared absorbing dye. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. The pigment derivative may be used alone or in combination of two or more kinds. When two or more kinds are used, the total amount is preferably in the above range.

[0148] <<Photopolymerization initiator>> When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light in the ultraviolet to visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0149] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, and glyoxylate compounds. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, a glyoxylate compound, or a 3-aryl-substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, a glyoxylate compound, or an acylphosphine compound, and even more preferably an oxime compound. Furthermore, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, and the compounds described in the MATERIAL STAGE 37-60pp, Vol. 19, No. 3, 2019, the photopolymerization initiators described in WO 2018 / 221177, the photopolymerization initiators described in WO 2018 / 110179, the photopolymerization initiators described in JP 2019-043864 A, the photopolymerization initiators described in JP 2019-044030 A, the peroxide-based initiators described in JP 2019-167313 A, An aminoacetophenone-based initiator having an oxazolidine group described in JP-A-2020-055992, an oxime-based photopolymerization initiator described in JP-A-2013-190459, a polymer described in JP-A-2020-172619, a compound represented by formula 1 described in WO 2020 / 152120, a compound described in JP-A-2021-181406, a photopolymerization initiator described in JP-A-2022-013379,Compounds represented by formula (1) described in JP 2022-015747 A, fluorine-containing fluorene oxime ester photoinitiators described in JP 2021-507058 A, initiators described in Chinese Patent Application Publication No. 110764367, initiators described in JP 2022-518535 A, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP 2022-078550 A, compounds described in Korean Patent Publication No. 10-2017-0087330, Compounds described in WO 2022 / 075452, oxime ester compounds described in Chinese Patent Publication No. 110066225, compounds described in Korean Patent Publication No. 10-2022-0076157, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062 of WO 2019 / 013112, oxime ester photopolymerization initiators described in Japanese Patent Publication No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, JP 2023-033 Photopolymerization initiators described in JP-A-2022-515524, initiators described in JP-A-2023-517304, initiators described in Chinese Patent Application Publication No. 114149517, aminoketone compounds described in Chinese Patent Application Publication No. 115925596, compounds described in JP-A-2023-159489, compounds described in JP-A-2023-159487, compounds described in Taiwan Patent Application Publication No. 202336003, compounds described in Chinese Patent Application Publication No. 113527138, and JP-A-2020 Organosilicon compounds described in Korean Patent Publication No. 22-502526, oxime compounds described in Korean Patent Publication No. 10-2017-0009794, photopolymerization initiators described in Korean Patent Publication No. 10-2023-0033862, oxime ester compounds described in Japanese Translation of PCT International Publication No. 2019-519518, multifunctional polymer photopolymerization initiators described in Japanese Translation of PCT International Publication No. 2024-517534, photopolymerization initiators described in International Publication No. 2024 / 085227, compounds described in Japanese Translation of PCT International Publication No. 2024-521379, photopolymerization initiators described in Japanese Translation of PCT International Publication No. 2024-523053,Examples include the oxime ester initiators described in Chinese Patent Application Publication No. 117510396 and the photopolymerization initiators described in Chinese Patent Application Publication No. 111752099.

[0150] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0151] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (manufactured by BASF), etc. Commercially available glyoxylate compounds include Esacure 563 (manufactured by IGM Resins BV).

[0152] Examples of oxime compounds include compounds described in paragraph 0142 of International Publication No. 2022 / 085485, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738, compounds represented by general formula (1) and compounds described in paragraphs 0022 to 0024 of Japanese Patent Publication No. 2021-173858, compounds represented by general formula (1) and compounds described in paragraphs 0117 to 0120 of Japanese Patent Publication No. 2021-170089, and the like. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), etc. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, Irgacure Examples of such initiators include OXE05 (manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR-PBG-358, TR-PBG-365, TR-PBG-380, TR-PBG-610, TR-PBG-A, and TR-PBG-B (manufactured by TRONLY), ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A), and Omnirad1316 (manufactured by IGM Resins BV). In addition, it is also preferable to use, as the oxime compound, a compound that is not colored or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0153] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0154] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0155] [ka] In formula (OX-1), X 1a represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring, R 1a represents a hydrogen atom or an acyl group, R 2a represents an alkyl group or an aryl group, R 3a and R 4a each independently represents a hydrogen atom or an alkyl group, Alk 1 and Alk 2 each independently represents an alkyl group, R 3a and R 4a may be bonded to form a ring, Alk 1 and Alk 2 may be bonded to form a ring, n represents 0 or 1.

[0156] X in formula (OX-1) 1aExamples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded together via a single bond or a linking group, a divalent group in which two or more heterocyclic rings are bonded together via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocyclic ring are bonded together via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings together, heterocyclic groups together, or aromatic rings and heterocyclic rings include -CH2-, -O-, -CO-, -S-, -NR x - and combinations thereof. x represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0157] X in formula (OX-1) 1a is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6). [ka] R in the formula X1 ~R X9 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0158] R X1 ~R X9 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0159] R X1 ~R X9The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0160] R X1 ~R X9 The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0161] R X1 ~R X9 The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0162] R X1 ~R X9 The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0163] R in formula (OX-1) 1a represents a hydrogen atom or an acyl group, and is preferably an acyl group. R 1a The acyl group represented by is -C(O)-R 101 R is preferably a group represented by 101 represents an aryl group or a heterocyclic group, and is preferably an aryl group.

[0164] R101 The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. 101 The aryl group represented by is preferably a phenyl group, a methylphenyl group or a naphthyl group, more preferably a methylphenyl group or a naphthyl group.

[0165] R 101 The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0166] R in formula (OX-1) 2a represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. R 2a The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 2a The alkyl group represented by is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. R 2a The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0167] R in formula (OX-1) 3a and R4a each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. R 3a and R 4a The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 3a and R 4a may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0168] Alk of formula (OX-1) 1 and Alk 2 each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk 1 and Alk 2 may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0169] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0170] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0171] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0172] [ka] In formula (OX-2), R 1b and R 2b each independently represents a substituent, R 3b ~R 7b each independently represents a hydrogen atom or a substituent, and Ar 1b represents an aromatic ring group or a heterocyclic group which may have a substituent; n represents 0 or 1;

[0173] R 1b and R 2b Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0174] R 3b ~R 7b Examples of the substituent represented by include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and aryl group include those described above. R 3b ~R 7b is preferably a hydrogen atom.

[0175] Ar 1b represents an aromatic ring group or a heterocyclic group which may have a substituent, Ar 1b is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0176] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0177] [ka] In formula (OX-3), Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, R 1c ~R 3c each independently represents a substituent, L 1c is a single bond or CR 11c R 12c represents R 11c and R 12c each independently represents a hydrogen atom, an alkyl group, or an aryl group; X 1c represents -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0178] R 1c and R 2cExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. R 2c is preferably an alkyl group having a branched or cyclic structure.

[0179] R 3c Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0180] Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0181] Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0182] k represents 0 or 1, and is preferably 0.

[0183] m represents an integer of 0 to 4, preferably 0 or 1, and more preferably 1.

[0184] Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0185] [ka] [ka] [ka] [ka]

[0186] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g / L using ethyl acetate as a solvent.

[0187] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, resulting in good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, thereby improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0188] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0189] <<Curing agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of JP 2016-075720 A or a compound described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0190] <<Chromatic colorants>> The composition of the present invention can contain a chromatic colorant. Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which an inorganic pigment or an organic-inorganic pigment is partially substituted with an organic chromophore. Substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore makes it easier to design the hue.

[0191] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that are not aggregated.

[0192] The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in an X-ray diffraction spectrum obtained using CuKα radiation as an X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0193] The specific surface area of ​​pigments is 1 to 300 m 2 / g. The lower limit is 10m 2 / g or more, and 2 / g or more is more preferable. The upper limit is 250m 2 / g or less, and 2 / g or less. The specific surface area value can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0194] The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments include those shown below.

[0195] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 178 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine type), 233 (quinoline type), 234 (amino ketone type), 235 (amino ketone type), 236 (amino ketone type), etc. (all yellow pigments), CIPigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments), CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,5 3:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150, 155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (all red pigments), CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type), etc. (all green pigments), CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc. (all purple pigments), CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0196] As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Other green colorants that can be used include the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP 2020-070426 A, and the diarylmethane compounds described in JP 2020-504758 A.

[0197] As the blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0198] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP 2019-073695 A, and the methine dyes described in JP 2019-073696 A can be used.

[0199] As a red colorant, the compound described in paragraph 0034 of WO 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

[0200] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. Furthermore, the dyes can also include thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540.

[0201] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Application Laid-Open No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020 / 174991, isoindoline compounds or salts thereof described in Japanese Patent Application Laid-Open No. 2020-160279, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069442, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730, and compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730. Compounds represented by formula 1 described in Korean Patent Publication No. 0-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-180176, phenothiazine compounds described in Japanese Patent Application Laid-Open No. 2021-187913, halogenated zinc phthalocyanines described in International Publication WO 2022 / 004261, Halide zinc phthalocyanine described in Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, polymer dye described in Korean Patent Publication No. 10-2020-0061793, colorant described in JP 2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP 2020-090676 A, compounds described in JP 2020-055956 A, compounds described in JP 2021-031681 A, compounds described in JP 2022-056354 A, compounds described in U.S. Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP 2018-178039 A,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described on pages 80 to 84 of the Journal of the Japan Color Materials Association (published in 2022), compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2014 / 014906 Compounds described in JP-A-2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP-A-2020-180176, compounds described in JP-A-2023-013209, compounds described in JP-A-2023-013166, xanthene compounds described in WO 2023 / 286526, compounds described in JP-A-2021-155746, compounds described in JP-A-2021-155747, JP-A- Compounds described in JP-A-2021-155748, compounds described in JP-A-2021-155749, compounds described in WO 2018 / 051876, compounds described in JP-A-2020-083981, compounds described in JP-A-2023-056463, compounds described in JP-T-2023-515473, dioxane compounds described in JP-T-2022-549530, pigment preparations described in JP-A-2022-061494, diketopyrrolopyrrole pigments described in JP-A-2023-057917, Diketopyrrolopyrrole compounds described in JP-A-2023-519314, phthalocyanines described in JP-A-2023-080419, quinophthalones described in JP-A-2023-103177, phthalocyanine compounds described in JP-A-2023-103177, isoindoline compounds described in JP-A-2020-026521, squarylium compounds described in Korean Patent Publication No. 10-2023-0043000, squarylium compounds described in Korean Patent Publication No. 10-2023-0050069, diketopyrrolopyrrole compounds described in JP-A-2023-127878,Triarylmethane compounds described in JP 2023-150459 A, triarylmethane compounds described in JP 2023-149735 A, core-shell dyes described in JP 2023-123349 A, xanthene compounds described in JP 2023-543717 A, compounds described in Chinese Patent Application Publication No. 116102441, compounds described in JP 2023-150459 A The compounds described in JP 2023-167345 A, the compounds described in Korean Patent Publication No. 10-2023-0061078 A, the compounds described in JP 2020-183509 A, the colorants described in JP 2020-079395 A, the compounds represented by formula (1) described in U.S. Patent Application Publication No. 2022 / 0119643 A, the compounds described in JP 2023-048989 A Dyes described in JP 2024-014738 A, pigments described in Chinese Patent Application Publication No. 115873417 A, compounds described in JP 2024-043497 A, compounds described in JP 2021-157040 A, azo pigments described in JP 2024-063075 A, compounds described in JP 2022-018967 A, compounds described in JP 2024-057558 A The quinophthalone pigments described in WO 2020 / 170957, the compounds described in Chinese Patent Application Publication No. 117209388, the isoindoline compounds described in JP 2024-079043 A, the phthalocyanine dyes described in Korean Patent Publication No. 10-2022-0026920, the compounds described in WO 2020 / 203514, and the like can also be used. The chromatic colorant may be a rotaxane. The dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures.

[0202] When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

[0203] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of chromatic colorants. Note that, "the composition of the present invention is substantially free of chromatic colorants" means that the content of chromatic colorants in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no chromatic colorants.

[0204] <<Coloring material that transmits infrared light but blocks visible light>> The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

[0205] The coloring material that blocks visible light is preferably a coloring material that absorbs light in the violet to red wavelength region. Furthermore, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Furthermore, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B): (A): Contains two or more chromatic colorants, and forms black by combining two or more chromatic colorants. (B): Contains an organic black colorant.

[0206] Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, CI Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in JP-A Nos. 01-170601 and 02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Color & Chemicals Co., Ltd.

[0207] When black is formed by combining two or more chromatic colorants, the combination of chromatic colorants may be, for example, the following embodiments (1) to (8). (1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant. (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant. (3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant. (4) An embodiment containing a yellow colorant and a purple colorant. (5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant. (6) An embodiment containing a purple colorant and an orange colorant. (7) An embodiment containing a green colorant, a purple colorant, and a red colorant. (8) An embodiment containing a green colorant and a red colorant.

[0208] When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass %. The lower limit is preferably 5 mass % or more, more preferably 10 mass % or more, even more preferably 20 mass % or more, and particularly preferably 30 mass % or more.

[0209] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of coloring materials that block visible light. Here, "the composition of the present invention is substantially free of coloring materials that block visible light" means that the content of coloring materials that block visible light in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no coloring materials that block visible light.

[0210] <<Surfactants>> The composition of the present invention may contain a surfactant. Various surfactants, such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants, can be used as the surfactant. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0211] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0212] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0213] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419 OIL (manufactured by Dow-Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, and KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.), and BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, and BYK-UV3510 (manufactured by BYK-Chemie). Compounds having the following structure can also be used as silicone surfactants. [ka]

[0214] As the surfactant, the polymer described in WO 2021 / 131726, the silicone-containing copolymer described in WO 2024 / 024440, and the silicone-containing copolymer described in WO 2024 / 024441 can also be used.

[0215] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0216] <<Polymerization inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one type of polymerization inhibitor, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0217] <<Silane coupling agent>> The composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of the silane coupling agent include the compound described in paragraph 0177 of WO 2022 / 085485 and the compound described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, and more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0218] <<Ultraviolet absorber>> The composition of the present invention may contain an ultraviolet absorber, such as a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or a dibenzoyl compound. Examples of ultraviolet absorbers include compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, compounds described in paragraphs 0052 to 0072 of JP 2012-208374 A, compounds described in paragraphs 0317 to 0334 of JP 2013-068814 A, compounds described in paragraphs 0061 to 0080 of JP 2016-162946 A, compounds described in paragraphs 0059 to 0076 of WO 2016 / 181987 A, compounds described in paragraphs 0052 and 0074 of WO 2021 / 131355 A, and compounds described in paragraphs 0061 to 0080 of WO 2016 / 181987 A. Compounds described in paragraphs 0022-0024 of JP 2021 / 132247, compounds described in paragraph 0179 of WO 2022 / 085485, reactive triazine UV absorbers described in JP 2021-178918, UV absorbers described in JP 2022-007884, compounds described in Korean Patent Publication No. 10-2022-0014454, compounds described in JP 2023-013321, and compounds described in paragraphs 0049-0059 of Japanese Patent Publication No. 6268967 can also be used. Commercially available UV absorbers include the Tinuvin series and Uvinul series manufactured by BASF. Benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fat (Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0219] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, and ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be any of the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, WO 2017 / 006600, WO 2017 / 164024, and Korean Patent Publication No. 10-2019-0059371. The antioxidant content of the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The composition may contain only one antioxidant, or two or more antioxidants. When two or more antioxidants are contained, the total amount thereof is preferably within the above range.

[0220] <<Other ingredients>> The composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, compounds described in paragraph 0182 of WO 2022 / 085485 can be used. In addition, as chain transfer agents, thiol compounds described in JP 2020-109068 A can be used.

[0221] The composition of the present invention may contain a compound derived from a biomass raw material, a compound containing a radioactive carbon atom, or a compound having a percent modern carbon of 50% or more. The content of the compound derived from a biomass raw material relative to all compounds contained in the composition of the present invention may be 20% by mass or more.

[0222] The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with ion-exchange resins, and purification with inorganic adsorbents such as hydrotalcite.

[0223] From the perspective of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably 0.05 ppb to 500 ppb, and even more preferably 0.1 ppb to 300 ppb, based on the total solids content of the composition. The composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using compounds that can be used as substitutes for perfluoroalkyl sulfonic acids and their salts, and compounds that can be used as substitutes for perfluoroalkyl carboxylic acids and their salts, a composition that is substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts, may be selected. Compounds that can be used as substitutes for restricted compounds include, for example, compounds that are exempt from restrictions due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above content does not preclude the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. The composition of the present invention may contain perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts, within the maximum allowable range.

[0224] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0225] <Containment Container> The container for storing the composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the container.

[0226] <Method for preparing the composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (application) to prepare the composition.

[0227] The preparation of the composition may include a process for dispersing the pigment. Mechanical forces used to disperse the pigment in the process include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. When grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads or increase the bead packing ratio to increase grinding efficiency. After the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, as described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, and in paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details on the materials, equipment, and processing conditions used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The composition may contain 1 to 10,000 ppm of the beads.

[0228] When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. The types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0229] <Membrane> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and can selectively transmit infrared rays of a specific wavelength or more.

[0230] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0231] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is sometimes formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include metal, metal oxide, and black matrix. If necessary, a primer layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0232] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include glass, resin, and other materials. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0233] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0234] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Moreover, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. Furthermore, the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0235] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength of over 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength of over 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength of over 1150 nm.

[0236] The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable that the film of the present invention and a color filter are laminated together to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0237] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication devices (for both transmission and reception), and image display devices.

[0238] <Membrane manufacturing method> The film of the present invention can be produced through a step of applying the composition of the present invention.

[0239] The support may be any of those mentioned above. As a method for applying the composition, known methods such as spin coating can be used. For example, the application method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0240] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0241] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0242] (When forming patterns using photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0243] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0244] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0245] Furthermore, during exposure, light may be irradiated continuously or in pulses (pulse exposure), which is an exposure method in which light is irradiated and paused repeatedly in short cycles (e.g., milliseconds or less).

[0246] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm 2 is preferable, and 0.05 to 1.0 J / cm 2 The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m 2 ~100,000W / m 2 (e.g., 5000W / m 2 , 15000W / m 2 , or 35,000 W / m 2 The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m 2 , oxygen concentration 35% by volume, illuminance 20000W / m 2 etc.

[0247] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removal, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0248] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0249] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to heat the developed film to the above conditions. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0250] (When forming a pattern using dry etching) Pattern formation by dry etching can be performed by applying the composition of the present invention to a support, curing the resulting composition layer to form a cured layer, forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas as a mask. Prebaking is preferably performed to form the photoresist layer. For details about pattern formation by dry etching, see paragraphs 0010 to 0067 of JP 2013-064993 A, the contents of which are incorporated herein by reference.

[0251] <Optical filters> The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

[0252] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040-0070 and 0119-0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255-0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0253] The optical filter of the present invention may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Furthermore, the optical filter may be formed directly on various elements.

[0254] <Solid-state imaging element> The film of the present invention can be used in a solid-state imaging device. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration including the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0255] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area and transfer electrodes made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes exposed; a device protection film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention disposed on the device protection film. Furthermore, the device protection film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film of the present invention (on the side closer to the support), or a light-focusing means disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in spaces partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than the pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A and JP 2014-179577 A.

[0256] <Image display device> The film of the present invention can also be used in image display devices. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display devices to which the present invention can be applied. For example, the present invention can be applied to various types of liquid crystal display devices described in "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks. The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0257] <Infrared sensor> The film of the present invention can also be used in an infrared sensor. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. One embodiment of the infrared sensor will be described below with reference to the drawings.

[0258] In Fig. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0259] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range. There are no particular limitations on the color filter 112, and conventionally known color filters for pixel formation can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this document are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0260] 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0261] <Camera module> The film of the present invention can also be used in a camera module. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, a camera module can be configured to have a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0262] <Light-emitting element> The film of the present invention can also be used in a light-emitting device. The configuration of the light-emitting device is not particularly limited as long as it functions as a light-emitting device, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VICSELs). The film of the present invention may be formed directly on the light-emitting device or may be disposed on the light-emitting path.

[0263] <Optical communication element> The film of the present invention can also be used in optical communication elements. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path. [Example]

[0264] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In the structural formulas shown below, Me is a methyl group, and Ph is a phenyl group.

[0265] <Synthesis example> (Synthesis Example 1) Synthesis of Compound Pig-001 Compound Pig-001 was synthesized according to the following scheme. [ka] [ka]

[0266] -Synthesis of compound (a)- Compound (a) was synthesized according to the method described in Japanese Patent No. 6760805.

[0267] -Synthesis of compound (b)- 10 parts by mass of compound (a), 14 parts by mass of phosphorus oxychloride (FUJIFILM Wako Pure Chemical Industries, Ltd.), and 120 parts by mass of toluene were placed in a flask and stirred at 100°C for 1 hour. After the reaction, 7 parts by mass of water were added and stirred for 1 hour. Subsequently, the target product was extracted using chloroform, and the organic layer was concentrated. The concentrate, 5 parts by mass of 2-(2-benzothiazolyl)acetonitrile, and 10 parts by mass of toluene were placed in a flask and stirred at 100°C for 1 hour. After the reaction, 300 parts by mass of methanol was added at 30°C, and the crystals were filtered off. The obtained crystals were dried with a blower at 50°C to obtain 10 parts by mass of compound (b).

[0268] -Synthesis of compound (c)- 21 parts by mass of compound (b), 4 parts by mass of compound (d), 400 parts by mass of toluene, and 23 parts by mass of phosphorus oxychloride (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were placed in a flask and stirred at 100°C for 1 hour. After the reaction, 500 parts by mass of methanol was added at 30°C, and the crystals were then filtered off. The obtained crystals were dried with a blower at 50°C to obtain 18 parts by mass of compound (c).

[0269] -Synthesis of Compound Pig-001- 10 parts by mass of compound (c), 50 parts by mass of 2-aminoethyl diphenylborinate (Tokyo Chemical Industry Co., Ltd.), 50 parts by mass of titanium tetrachloride, and 200 parts by mass of toluene were placed in a flask and stirred at 100°C for 1 hour. After the reaction, 600 parts by mass of methanol was added at 30°C, and the crystals were then filtered off. The obtained crystals were dried with air at 50°C to obtain 9 parts by mass of compound Pig-001. Mass analysis by MALDI TOF-MASS (time-of-flight mass spectrometry) identified the compound as Pig-001. ·MALDI TOF-MASS:Calc.for [M+H] + :1843.5 found:1843.5

[0270] <Production of pigment dispersion> The pigment, pigment derivative, dispersant, and solvent types listed in the table below were mixed in the parts by weight listed in the dispersion column of the table below, and 230 parts by weight of zirconia beads with a diameter of 0.3 mm were added. The mixture was dispersed for 5 hours using a paint shaker, and the beads were separated by filtration to produce a pigment dispersion with a solids concentration of 20% by weight. The solids concentration of the pigment dispersion was adjusted by the amount of solvent used. The amounts listed in the table are values ​​converted to solids.

[0271] [Table 1]

[0272] [Table 2]

[0273] [Table 3]

[0274] The materials listed in the table above are as follows:

[0275] (pigment) Pig-001 to Pig-049: Compounds with the following structure [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka]

[0276] The solubilities of Pig-001 to Pig-049 in propylene glycol methyl ether acetate at 25°C are as follows.

[0277] [Table 4]

[0278] Pig-101: Compound with the following structure (comparison compound) [ka]

[0279] Pig-201 to Pig-235: Compounds with the following structure (other infrared absorbing dyes) [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka] [ka]

[0280] PB15:6: CI Pigment Blue 15:6 (blue pigment) PY150: CI Pigment Yellow 150 (yellow pigment) PR254: CI Pigment Red 254 (red pigment)

[0281] (pigment derivatives) Syn-001 to Syn-032: Compounds with the following structure

change

change

change

change

change

change

change

change

change

change

change

change

change

change

change

change

[0282] Syn-101 to Syn-104, Syn-201: Compounds with the following structure [ka]

[0283] B-1: Compound of the following structure [ka]

[0284] (dispersant) Dis-001: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 25,000, molecular weight dispersity: 2.0) Dis-002: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 32,000, molecular weight dispersity: 2.5) Dis-003: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 15,000, molecular weight dispersity: 2.8) Dis-004: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 15,000, molecular weight dispersity: 2.0) [ka]

[0285] (solvent) S-001: Propylene glycol monomethyl ether acetate S-002: Propylene glycol monomethyl ether

[0286] <Production of Composition> The materials other than the solvent shown in the table below were mixed in the ratios shown in the table below, and the solvent shown in the table below was added to adjust the solid content concentration to 20 mass %, followed by stirring and filtering through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to produce a composition. The solid content concentration of the composition was adjusted by the amount of solvent added. The amounts listed in the table are values ​​converted to solid content.

[0287] [Table 5] [Table 6]

[0288] [Table 7] [Table 8]

[0289] [Table 9] [Table 10]

[0290] [Table 11] [Table 12]

[0291] Details of the materials indicated by the abbreviations in the table are as follows:

[0292] (pigment dispersion, infrared absorbing pigment) A001 to A084, B1, Y1, Bk1, A101: the above-mentioned pigment dispersions A001 to A084, B1, Y1, Bk1, A101 a-1: Compound having the following structure (solubility in propylene glycol methyl ether acetate at 25°C is 5000 mg / L or more) [ka]

[0293] (resin) B001: Random copolymer of allyl methacrylate and methacrylic acid (molar ratio 50:50, weight average molecular weight 20,000, molecular weight dispersity 2.1) B002: Random copolymer of benzyl methacrylate and methacrylic acid (molar ratio 60 / 40, weight average molecular weight 20,000, molecular weight dispersity 1.9) B003: Resin with the following structure (the numbers attached to the main chain are molar ratios. Weight average molecular weight: 15,000, molecular weight dispersity: 2.1) B004: Resin with the following structure (the numbers attached to the main chain are molar ratios. Weight average molecular weight: 25,000, molecular weight dispersity: 2.2) [ka]

[0294] (Photopolymerization initiator) C-1 and C-2: Compounds with the following structures [ka]

[0295] (polymerizable compound) M-1: Aronix M-305 (manufactured by Toagosei Co., Ltd., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. The pentaerythritol triacrylate content is 55% by mass to 63% by mass.) M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate) M-3: Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid-modified acrylic oligomer)

[0296] (surfactant) F-1: Megafac RS-72-K (DIC Corporation, fluorine-based surfactant) F-2: Compound having the following structure (weight average molecular weight: 14,000, in the following formula, % indicating the proportion of repeating units is mol %) [ka] F-3: KF-6001 (Shin-Etsu Chemical Co., Ltd., carbinol-modified polydimethylsiloxane at both ends, hydroxyl value 62 mg KOH / g)

[0297] (polymerization inhibitor) G-1: p-Methoxyphenol

[0298] (additives) U-1: Uvinul 3050 (manufactured by BASF, ultraviolet absorber) U-2: Tinuvin 477 (BASF, hydroxyphenyltriazine UV absorber) U-3: Tinuvin 326 (BASF, benzotriazole UV absorber)

[0299] (solvent) S-001: Propylene glycol monomethyl ether acetate S-002: Propylene glycol monomethyl ether

[0300] <Membrane production> Each composition was applied to a glass substrate by spin coating and heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed to 1000mJ / cm using an i-line stepper exposure system FPA-3000i5+ (Canon Corporation). 2 The entire surface was exposed to an exposure amount of 1.0 μm. Then, the film was heated at 180° C. for 5 minutes using a hot plate to produce a film with a thickness of 1.0 μm.

[0301] <Evaluation of infrared shielding properties> The transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 1100 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). The average value of the transmittance in the wavelength range of 700 nm or more and less than 850 nm (average transmittance 1) and the average value of the transmittance in the wavelength range of 850 nm or more and less than 1000 nm (average transmittance 2) were calculated, and the infrared shielding ability was evaluated according to the following criteria. A: The average transmittance is less than 5% B: The average transmittance is 5% or more and less than 10% C: The average transmittance is 10% or more and less than 20% D: The average transmittance is 20% or more.

[0302] <Evaluation of light resistance> The transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 600 to 1500 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above-mentioned film was formed was irradiated with 100,000 lux of light (equivalent to 2,000,000 lux·h) using a xenon lamp for 20 hours, and the transmittance of the film after irradiation with the xenon lamp was measured. The change in transmittance (ΔT) in the wavelength range of 600 to 1500 nm for the film before and after irradiation with a xenon lamp was calculated using the following formula, and the light resistance was evaluated based on the value at the wavelength with the largest ΔT among all measured wavelengths according to the following criteria. The smaller the ΔT value, the better the light resistance. Change in transmittance (ΔT) = |Transmittance of film before irradiation with xenon lamp - Transmittance of film after irradiation with xenon lamp| A: ΔT<5% B: 5≦ΔT<10% C: 10≦ΔT%

[0303] <Evaluation of heat resistance> The transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 600 to 1500 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). Next, the glass substrate on which the above film was formed was heated at 265°C for 5 minutes using a hot plate. The change in transmittance (ΔT) in the wavelength range of 600 to 1500 nm for the film before and after heating was calculated using the following formula, and the heat resistance was evaluated based on the value at the wavelength with the largest ΔT among all measured wavelengths using the following criteria. The smaller the ΔT value, the better the heat resistance. Change in transmittance (ΔT) = |Transmittance of film before heating - Transmittance of film after heating| A: ΔT<5% B: 5≦ΔT<10% C: 10≦ΔT%

[0304] <Evaluation of moisture resistance> The transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 600 to 1500 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). This film was placed in an incubator at 85°C and 95% humidity for 6 months and stored therein, whereby a moisture resistance test was conducted. Next, the transmittance of the film after the moisture resistance test was measured. The change in transmittance (ΔT) in the wavelength range of 600 to 1500 nm for the film before and after the moisture resistance test was calculated using the following formula, and the moisture resistance was evaluated based on the value at the wavelength with the largest ΔT among all the measured wavelengths, according to the following criteria. The smaller the ΔT value, the better the moisture resistance. Change in transmittance (ΔT) = |Transmittance of film before humidity test - Transmittance of film after humidity test| A: ΔT<5% B: 5≦ΔT<10% C: 10≦ΔT%

[0305] [Table 13]

[0306] [Table 14]

[0307] As shown in the above table, in the examples, films excellent in infrared shielding properties, light resistance, heat resistance and moisture resistance could be formed. [Explanation of symbols]

[0308] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: flattening layer

Claims

1. A composition comprising an infrared absorbing dye, a curable compound, and a solvent, The infrared absorbing dye contains a compound represented by formula (1), The compound represented by formula (1) has a solubility in propylene glycol methyl ether acetate at 25°C of less than 500 mg / L. Composition; 【Chemical 1】 In formula (1), L １ represents an n-valent linking group, R １ and R ２ each independently represents an alkyl group, an aryl group, or a heteroaryl group, X １ and X ２ are each independently N or C—R Ｘ１ represents R Ｘ１ is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR ｉ１ , -SO ２ R ｉ１ , -OSO ２ R ｉ１ , a halogen atom, a sulfo group, or a hydroxy group; R ｉ１ represents a substituent, Ar １ represents an aryl group or a heteroaryl group, Y １ and Y ２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring, n represents an integer of 2 or more.

2. L of the formula (1) １ The composition according to claim 1 , wherein is a group containing at least one selected from an aromatic hydrocarbon group and a heterocyclic group.

3. The composition according to claim 1 or 2, wherein n in formula (1) is 2.

4. The composition according to claim 1 or 2, wherein the compound represented by formula (1) is a compound represented by formula (2): 【Chemistry 2】 In formula (2), A １ , A ２ and B １ each independently represents a cyclic structure containing two or more π electrons, m represents an integer of 0 to 4; R ３ ~R ６ each independently represents an alkyl group, an aryl group, or a heteroaryl group, X ４ ~X ７ are each independently N or C—R Ｘ１ represents R Ｘ１ is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR ｉ１ , -SO ２ R ｉ１ , -OSO ２ R ｉ１ , a halogen atom, a sulfo group, or a hydroxy group; R ｉ１ represents a substituent, Ar ３ and Ar ４ each independently represents an aryl group or a heteroaryl group, Y ３ ~Y ６ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１ R Ｙ２ or a metal atom, R Ｙ１ and R Ｙ２ each independently represents a hydrogen atom or a substituent, R Ｙ１ and R Ｙ２ may be bonded to form a ring.

5. The composition of claim 1 or 2, wherein the curable compound comprises a graft resin.

6. Further, it contains a pigment derivative, The pigment derivative includes a compound represented by formula (101): A composition according to claim 1 or 2; 【Chemistry 3】 In formula (101), L １０１ represents an n-valent linking group, R １０１ and R １０２ each independently represents an alkyl group, an aryl group, or a heteroaryl group, X １０１ and X １０２ are each independently N or C—R Ｘ１０１ represents R Ｘ１０１ is a cyano group, a nitro group, a carboxyl group, a phosphate group, -SR ｉ１０１ , -SO ２ R ｉ１０１ , -OSO ２ R ｉ１０１ , a halogen atom, a sulfo group, or a hydroxy group; R ｉ１０１ represents a substituent, Ar １０１ represents an aryl group or a heteroaryl group, Y １０１ and Y １０２ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, or —BR Ｙ１０１ R Ｙ１０２ or a metal atom, R Ｙ１０１ and R Ｙ１０２ each independently represents a hydrogen atom or a substituent, R Ｙ１０１ and R Ｙ１０２ may be bonded to form a ring, n represents an integer of 2 or more; L ５０１ represents a single bond or an (s+1)-valent linking group, R ５０１ represents an acid group or a basic group, s represents an integer of 1 to 4, and t represents an integer of 1 or more. L ５０１ is a single bond, s is 1; When s is 2 or more, multiple R ５０１ may be the same or different, When t is 2 or more, multiple R ５０１ and L ５０１ may be the same or different.

7. The composition according to claim 1 or 2, wherein the curable compound comprises a polymerizable compound.

8. The composition according to claim 1 or 2, further comprising a photopolymerization initiator.

9. A film obtained using the composition according to claim 1 or 2.

10. An optical filter comprising the film according to claim 9.

11. A solid-state imaging device comprising the film according to claim 9.

12. An image display device comprising the film according to claim 9.

13. An infrared sensor comprising the film according to claim 9.

14. A camera module comprising the membrane of claim 9.

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