Method for measuring concentration of amine and / or carbonic acid in release agent composition

Abstract

To provide a measurement method capable of improving accuracy of concentration of amine and / or carbonic acid in a release agent composition.SOLUTION: There is provided a method for measuring concentration of amine and / or carbonic acid in a release agent composition, wherein the release agent composition releases a resin mask, contains amine, and can contain alkali and / or carbonic acid other than the amine, the method includes titrating the release agent composition with acid, and when a titration curve obtained by the titration has a first inflection point, a second inflection point and a third inflection point at a pH of 10 or less, includes calculating concentration of the amine and / or carbonic acid in the release agent composition, from acid consumption to the first inflection point, the second inflection point and the third inflection point, and concentration of the alkali when it contains alkali other than the amine.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to a method for measuring the concentration of amine and / or carbonate in a stripper composition for stripping a resin mask, and a method for manufacturing electronic components using the same. [Background technology]

[0002] In recent years, personal computers and various electronic devices have become increasingly power-efficient, faster, and more compact, and the wiring on the package substrates and other components they are equipped with has been getting finer every year. Until now, metal masking has been the primary method used to form such fine wiring and connection terminals such as pillars and bumps, but due to its limited versatility and the difficulty of adapting to the miniaturization of wiring, new methods are being adopted.

[0003] One new method is to use a dry film resist as a thick resin mask instead of a metal mask. This resin mask is finally stripped and removed, and an alkaline stripping composition (strip cleaner) is used for this purpose.

[0004] As an alkaline stripper composition, a mixed solution of an alkali, an organic solvent, etc. is used. It has been reported that such a stripper composition deteriorates due to dissolution of the resist, reaction with carbon dioxide gas in the air, etc., and stripping performance (resin mask removability) decreases. Therefore, various methods for suppressing the deterioration of the stripper composition and extending its life have been investigated. For example, Patent Document 1 has discovered that carbon dioxide gas absorbed into a resist stripping solution is the main cause of reduced resist stripping properties, and proposes a method for managing the resist stripping solution to maintain the carbon dioxide gas concentration in the resist stripping solution at 3% by weight or less. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2003-122029 Summary of the Invention [Problem to be solved by the invention]

[0006] Patent Document 1 lists preferred methods for measuring the carbon dioxide concentration in a resist stripping solution, including measuring with a conductivity meter and measuring with an infrared absorption or infrared sensor, but the measurement methods proposed in Patent Document 1 leave room for improvement in the accuracy of measuring the carbon dioxide concentration. Furthermore, when the stripper composition is recycled, the concentrations of the alkali component and the carbonate present in the stripper composition change, and therefore the stripper composition needs to be replenished or replaced depending on the concentration analysis results. Therefore, a measurement method for more accurately analyzing the concentrations of the stripper composition is required.

[0007] Therefore, the present disclosure provides a measurement method that can improve the accuracy of measuring the concentrations of amines and / or carbonates in a stripper composition, and a method for manufacturing electronic components using the same. [Means for solving the problem]

[0008] In one aspect, the present disclosure relates to a method for measuring the concentration of an amine and / or carbonate in a stripper composition, the stripper composition being for stripping a resin mask and containing an amine and possibly containing an alkali other than the amine and / or carbonate, the method comprising titrating the stripper composition with an acid, and, when a titration curve obtained by the titration has a first inflection point, a second inflection point, and a third inflection point at a pH of 10 or less, calculating the concentration of the amine and / or carbonate in the stripper composition from the amount of acid consumed up to the first inflection point, the second inflection point, and the concentration of the alkali in the stripper composition if an alkali other than the amine is contained.

[0009] In one aspect, the present disclosure relates to a method for producing an electronic component, comprising a step of measuring the concentration of an amine and / or a carbonate in a stripper composition used in a step of stripping a resin mask, using the method for measuring the concentration of an amine and / or a carbonate in a stripper composition of the present disclosure. [Effects of the Invention]

[0010] According to one aspect of the present disclosure, a measurement method can be provided that can improve the accuracy of measuring the concentrations of amines and / or carbonates in a stripper composition. [Brief explanation of the drawings]

[0011] [Figure 1] FIG. 1(A) is a graph showing an example of the relationship (titration curve) between the amount of hydrochloric acid added and pH when no carbon dioxide is present in the stripping agent composition, and FIG. 1(B) is a graph showing an example of the relationship (titration curve) between the amount of hydrochloric acid added and pH when carbon dioxide is present in the stripping agent composition. DETAILED DESCRIPTION OF THE INVENTION

[0012] The present inventors have investigated the relationship between carbonic acid and the titration curve obtained by acid titration, and have found that the inflection points derived from alkalis other than amines do not change regardless of the presence or absence of carbonic acid, but the inflection points derived from amines change (the inflection points increase) in the presence of carbonic acid. Therefore, the present disclosure is based on the finding that the accuracy of measuring the concentrations of amines and / or carbonic acid in a stripper composition can be improved by using multiple inflection points derived from amines that appear at pH 10 or less in acid titration.

[0013] In one aspect, the present disclosure relates to a method for measuring the concentration of an amine and / or carbonate in a stripper composition, the stripper composition being for stripping a resin mask and containing an amine and optionally containing an alkali other than the amine and / or carbonate, the method comprising titrating the stripper composition with an acid, and, when a titration curve obtained by the titration has a first inflection point, a second inflection point, and a third inflection point at a pH of 10 or less, calculating the concentration of the amine and / or carbonate in the stripper composition from the amount of acid consumed up to the first inflection point, the second inflection point, and the concentration of the alkali in the stripper composition if an alkali other than the amine is contained (hereinafter also referred to as the “measurement method of the present disclosure”).

[0014] According to the present disclosure, it is possible to provide a measurement method that can improve the accuracy of measuring the concentrations of amines and / or carbonates in a stripper composition.

[0015] Although the details of the mechanism of action by which the effects of the present disclosure are manifested are still unclear, it is presumed as follows. When a stripper composition containing an amine and carbonic acid is titrated with acid, the amine and carbonic acid combine during the titration, changing the waveform of the titration curve and the detected inflection points associated with the amine. For example, when no carbonic acid is present in the amine-containing stripper composition (carbonic acid concentration: 0 mol / L), titration with 0.5 N hydrochloric acid produces one inflection point associated with the amine at a pH of 10 or less, as shown in Figure 1(A). On the other hand, when carbonic acid is present in the amine-containing stripper composition (carbonic acid concentration: 0.8 mol / L), titration with 0.5 N hydrochloric acid produces three inflection points associated with the amine at a pH of 10 or less, as shown in Figure 1(B). That is, when carbonic acid is present in the amine-containing stripper composition, the number of inflection points associated with the amine that appear at a pH of 10 or less increases from one to three, and the titration volume also changes significantly. Therefore, it is considered difficult to accurately determine the concentrations of the amine and carbonic acid unless analysis is performed based on the titration volume at the appropriate inflection point. Therefore, in the present disclosure, when a titration curve obtained by titrating an amine-containing stripper composition with an acid shows three inflection points (first inflection point, second inflection point, and third inflection point) at a pH of 10 or less, it is believed that the concentration of amine and / or carbon dioxide in the stripper composition can be accurately determined by performing analysis using these three inflection points. However, the present disclosure need not be construed as being limited to this mechanism.

[0016] In the present disclosure, a resin mask is a mask for protecting the surface of a material from treatments such as etching, plating, and heating, that is, a mask that functions as a protective film. In one or more embodiments, the resin mask may be a resist layer after exposure and development processes, a resist layer that has been subjected to at least one of exposure and development processes (hereinafter also referred to as "exposed and / or developed"), or a hardened resist layer. In one or more embodiments, the resin mask is formed using a resist whose physical properties, such as solubility in a developer, change when exposed to light, an electron beam, or the like. Resists are broadly classified into negative and positive types based on how they react with light or an electron beam. Negative resists have the property of decreasing their solubility in a developer when exposed to light, and the exposed portion of a layer containing negative resist (hereinafter also referred to as a "negative resist layer") is used as a resin mask after exposure and development. Positive resists have the property of increasing their solubility in a developer when exposed to light, and the exposed portion of a layer containing positive resist (hereinafter also referred to as a "positive resist layer") is removed after exposure and development, and the unexposed portion is used as a resin mask. By using a resin mask with such properties, fine connections on a circuit board, such as metal wiring, metal pillars, and solder bumps, can be formed. In one or more embodiments, the resin material for forming the resin mask may be a film-like photosensitive resin, a resist film, or a photoresist. A general-purpose resist film may be used.

[0017] The titration method used in the measurement method of the present disclosure includes, for example, potentiometric titration. Here, potentiometric titration is a method for detecting an inflection point of a potential difference curve (titration curve) during titration. For measurement by potentiometric titration, a known measuring device (for example, an automatic potentiometric titrator) can be used. The acid used for titration may be, for example, hydrochloric acid. The titration temperature is not particularly limited and is usually room temperature.

[0018] In the present disclosure, an inflection point refers to a point where a tangent to a titration curve intersects with the titration curve. Inflection points can be determined, for example, by detecting the point where the second derivative of the titration curve changes sign from negative to positive, or by detecting the minimum value of the first derivative of the titration curve. When multiple inflection points (e.g., three inflection points) appear, they are referred to as the first, second, and third inflection points in the order of appearance.

[0019] In the measurement method of the present disclosure, for example, as shown in FIG. 1(B), a titration curve showing the relationship between the amount of acid added by titration and the pH is obtained, and three inflection points due to amines that appear at pH 10 or lower are detected. The concentrations of amines and / or carbonic acid in the stripper composition can be calculated from the amounts of acid consumed up to the first, second, and third inflection points and the concentrations of alkalis other than the amines. In one or more embodiments, the concentration of amine and / or carbonate in the stripper composition can be calculated using the following formula: Amine concentration (mass%) = ((AD × β) + (BD × β)) / 2 / α × M × 100 Carbonate concentration (mol / L) = (CD × β - ((AD × β) + (BD × β)) / 2) × 1000 In the above formula, A represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the first inflection point, B represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the second inflection point, C represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the third inflection point, D represents the concentration (mol / g) of the alkali other than the amine in the stripper composition, α represents the valence of the amine, β represents the valence of the alkali other than the amine, and M represents the molar mass (g / mol) of the amine. Here, the concentration D (mol / g) of alkali other than amines in the stripper composition can be calculated by diluting the stripper composition with alcohol, titrating it with acid, and then calculating from the titration curve showing the relationship between the amount of acid added and pH. When a strong alkali such as tetramethylammonium hydroxide (TMAH) is present as an alkali other than amines, an inflection point due to the strong alkali is detected above pH 10, so there is no change in the number of inflection points due to amines. The stripper composition subjected to measurement may or may not contain an alkali other than amines.

[0020] In the measurement method of the present disclosure, from the viewpoint of accurately measuring the concentrations of amine and / or carbonic acid, it is preferable to perform the titration with an acid after diluting the stripper composition with an aqueous solvent. Thus, in one or more embodiments, the measurement method of the present disclosure includes diluting the stripper composition with an aqueous solvent before titrating the stripper composition with an acid. In one or more embodiments, the measurement method of the present disclosure includes diluting the stripper composition with alcohol and then calculating the concentration of alkali other than amine in the stripper composition by acid titration (analysis using alcohol as a dilution solvent), and diluting the stripper composition with an aqueous solvent and then calculating the concentration of amine and / or carbonate in the stripper composition by acid titration (analysis using water as a dilution solvent).

[0021] [Removal agent composition] The measurement method disclosed herein is a method for measuring the concentration of an amine and / or a carbonate in a stripper composition. In one or more embodiments, the stripper composition is used to strip a resin mask, and contains an amine and may also contain an alkali other than the amine and / or a carbonate.

[0022] (amine) From the viewpoint of resin mask removability, the amine contained in the stripper composition is preferably an alkanolamine, more preferably an alkanolamine having a total of 6 or less carbon atoms, and even more preferably monoethanolamine (MEA). The amine contained in the stripper composition may be one type or a combination of two or more types. The amine concentration (content) in the stripper composition is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 7% by mass or more from the viewpoint of resin mask removability, waste liquid treatability, and suppression of damage to the substrate resin and the substrate metal, and is preferably 20% by mass or less, more preferably 17% by mass or less, and even more preferably 14% by mass or less from the viewpoint of resin mask removability, waste liquid treatability, and suppression of damage to the substrate resin and the substrate metal. More specifically, the amine concentration in the stripper composition is preferably 1% by mass or more and 20% by mass or less, more preferably 3% by mass or more and 17% by mass or less, and even more preferably 7% by mass or more and 14% by mass or less. When two or more amines are used in combination, the amine concentration is the total concentration thereof. The amine concentration in the stripper composition may change during cyclic use or may change due to the influence of carbon dioxide gas. For example, the amine concentration in the stripper composition during operation (use) can be measured more accurately by measuring it using the measurement method of the present disclosure.

[0023] (alkali other than amine) From the viewpoint of resin mask removability, the alkali other than amine contained in the stripper composition is preferably at least one selected from quaternary ammonium hydroxides and inorganic metal hydroxides, more preferably quaternary ammonium hydroxide, and even more preferably tetramethylammonium hydroxide (TMAH). The alkali other than amine may be one type or a combination of two or more types. The concentration (content) of alkali other than amine in the stripper composition is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 3% by mass or more from the viewpoint of resin mask removability, and is preferably 20% by mass or less, more preferably 10% by mass or less, and even more preferably 7% by mass or less from the viewpoint of resin mask removability and waste liquid treatability. When two or more alkalis other than amine are used in combination, the concentration of the alkali other than amine is the total concentration of these alkalis.

[0024] (carbonated) In one or more embodiments, the stripping agent composition contains carbon dioxide, which is derived from carbon dioxide gas in the air. In general, the carbonate concentration (content) in the stripper composition is preferably as low as possible from the viewpoint of resin mask removability. In one or more embodiments, the carbonate concentration is preferably 10 mol / L or less, more preferably 5 mol / L or less, and even more preferably 1 mol / L or less. The carbonate concentration in the stripper composition can be measured more accurately by measuring it using the measurement method of the present disclosure. The carbon dioxide concentration (content) in the stripping composition is preferably 0.1 mol / L or more from the viewpoint of improving ease of handling. In one or more embodiments, if the number of inflection points obtained by titration is less than three, it can be determined that the stripper composition does not contain carbonic acid.

[0025] (water) In one or more embodiments, the stripper composition contains water. In one or more embodiments, examples of water include ion-exchanged water, RO water, distilled water, pure water, and ultrapure water. The content of water in the stripper composition can be the remainder excluding amines, alkalis other than amines, and other components. For example, the content of water in the stripper composition is 60% by mass or more, preferably 70% by mass or more, and more preferably 75% by mass or more, from the viewpoints of improving resin mask removability, reducing the load on wastewater treatment, and suppressing damage to the substrate resin, and is 95% by mass or less, preferably 90% by mass or less, and more preferably 85% by mass or less, from the viewpoint of improving resin mask removability.

[0026] In the present disclosure, the "concentration of each component of the stripper composition" refers to the content of each component at the time of use, i.e., at the time when the stripper composition is first used for cleaning (resin mask removal treatment). In one or more embodiments, the concentration (content) of each component (excluding carbon dioxide) in the stripper composition can be considered to be the blending amount of each component (excluding carbon dioxide) in the stripper composition.

[0027] (Other ingredients) The release agent composition may further contain other components, such as organic solvents, surfactants, chelating agents, thickeners, dispersants, rust inhibitors, polymeric compounds, solubilizers, antioxidants, preservatives, antifoaming agents, and antibacterial agents.

[0028] (pH) From the viewpoint of improving the removability of the resin mask, the pH of the stripping composition is preferably 10 or more, more preferably 12 or more, and even more preferably 13 or more, and from the viewpoint of suppressing damage to the substrate resin, it is preferably 14 or less, more preferably 13.8 or less, and even more preferably 13.6 or less. The pH of the stripping composition is a value at 25°C and can be measured using pH, specifically, by the method described in the Examples.

[0029] The stripping agent composition may be a so-called one-component type in which all components (except carbon dioxide) are premixed and supplied to the market, or may be a so-called two-component type in which components are mixed at the time of use.

[0030] [Method for managing the stripping agent composition] In one aspect, the present disclosure relates to a method for managing a stripper composition (hereinafter also referred to as the "management method of the present disclosure"), which includes a step of measuring the concentration of an amine and / or a carbonate in a stripper composition used in a step of stripping a resin mask using the measurement method of the present disclosure, and managing the stripper composition. Examples of the stripper composition include the stripper composition of the present disclosure described above. The step of managing the stripper composition includes determining whether to replenish or replace the stripper composition based on the amine and / or carbonate concentration in the stripper composition. According to the control method of the present disclosure, the deterioration (lifespan) of the stripping agent composition can be accurately determined and controlled.

[0031] [Electronic component manufacturing method] In one aspect, the present disclosure relates to a method for producing an electronic component (hereinafter also referred to as the "electronic component production method of the present disclosure"), which includes a step of measuring the concentration of an amine and / or a carbonate in a stripper composition used in a step of stripping a resin mask using the measurement method of the present disclosure. Examples of the stripper composition include the stripper composition of the present disclosure described above. In one or more embodiments, the method for producing an electronic component according to the present disclosure includes a step of removing the resin mask from an object to be cleaned to which the resin mask is attached using the stripper composition according to the present disclosure (a stripping step). Examples of the object to be cleaned to which the resin mask is attached include a semiconductor substrate having metal wiring and a resin mask, a semiconductor substrate having an insulating film and a resin mask, and a semiconductor substrate having metal wiring, an insulating film, and a resin mask. According to the method for manufacturing an electronic component of the present disclosure, it is possible to effectively remove a resin mask attached to an electronic component while accurately determining and managing the deterioration (lifespan) of the stripping agent composition, thereby enabling the manufacturing of highly reliable electronic components. [Example]

[0032] The present disclosure will be specifically described below using examples, but the present disclosure is not limited to these examples in any way.

[0033] 1. Preparation of Stripping Compositions of Examples 1 and 2 and Reference Examples 1 and 2 Carbon dioxide is blown into a 25% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) until the pH of the aqueous solution at 25°C reaches 8, thereby preparing an aqueous solution of tetramethylammonium hydrogencarbonate with a carbonate concentration of 2.7 mol / L. The concentration of tetramethylammonium carbonate in the aqueous solution obtained by the above procedure was calculated on the assumption that all of the tetramethylammonium in the 25% by mass TMAH aqueous solution used was converted to tetramethylammonium carbonate. The tetramethylammonium bicarbonate aqueous solution, tetramethylammonium hydroxide (TMAH), monoethanolamine (MEA), and water were mixed to the compositions shown in Table 1 to obtain stripper compositions (pH: 11.8, 13.6) of Examples 1 and 2 and Reference Examples 1 and 2. The concentration of each component listed in Table 1 is the concentration of the active ingredient (% by mass or mol / L) calculated from the blend amount. The following materials were used to prepare the stripper composition: Monoethanolamine (MEA) [Nippon Shokubai Co., Ltd.] Tetramethylammonium hydroxide (TMAH) [Resonac Corporation, 25% by weight aqueous solution] Ethanol [Fujifilm Wako Pure Chemical Industries, Ltd.] Water [pure water with an electrical conductivity of 1 μS / cm or less, produced using the Organo Corporation G-10DSTSET water purification system] The following acids were used for the titration: Hydrochloric acid [Fujifilm Wako Pure Chemical Industries, Ltd., 0.5 mol / L aqueous solution]

[0034] [pH of Stripping Composition] The pH of the stripping composition at 25°C was measured using a pH meter (HM-30G, manufactured by Toa Denpa Kogyo Co., Ltd.), and was the value measured 3 minutes after the electrode of the pH meter was immersed in the cleaning composition.

[0035] [Concentration measurement] Each stripper composition prepared was titrated using an automatic potentiometric titrator (AT-710, manufactured by Kyoto Electronics Manufacturing Co., Ltd.) with a 5 g sample amount and 45 g of water as the dilution solvent (dilution ratio: 10). A titration curve showing the relationship between the amount of acid added and pH was obtained, and three inflection points due to amines that appeared at pH 10 or lower were detected. The three inflection points were determined by detecting the minimum values ​​of the first derivative of the titration curve during the titration using the automatic potentiometric titrator, and were designated the first, second, and third inflection points in order of appearance. The concentrations of monoethanolamine (amine) and carbonate ion (carbonate) in each stripper composition were then calculated using the formulas listed in Table 1. The calculation formulas shown in Table 1 are shown below. <Calculation formula> (1-1): Amine concentration (mass%) = ((AD × β) + (BD × β)) / 2 / α × M × 100 (1-2): Carbonate concentration (mol / L) = (CD × β - ((AD × β) + (BD × β)) / 2) × 1000 (2-1): Amine concentration (mass%) = (AD × β) / α × M × 100 (2-2): Carbonate concentration (mol / L) = (CD × β - (AD × β)) × 1000 (3-1): Amine concentration (mass%) = (BD × β) / α × M × 100 (3-2): Carbonate concentration (mol / L) = (CD × β - (BD × β)) × 1000 In the above formula, A represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the first inflection point, B represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the second inflection point, C represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the third inflection point, D represents the concentration (mol / g) of the alkali other than the amine in the stripper composition, α represents the valence of the amine, β represents the valence of the alkali other than the amine, and M represents the molar mass (g / mol) of the amine.

[0036] [Table 1]

[0037] As shown in Table 1, in Examples 1 and 2, in which the three inflection points derived from amines were used to calculate the concentrations, it was found that MEA (amine) and carbonic acid could be measured more accurately than in Reference Examples 1 and 2, in which the three inflection points derived from amines were not used to calculate the concentrations. [Industrial Applicability]

[0038] According to the present disclosure, a measurement method capable of accurately determining the concentration of amine and / or carbonate in a stripper composition can be provided. Use of the measurement method of the present disclosure makes it possible to improve the performance and reliability of manufactured electronic components, thereby improving the productivity of semiconductor devices.

Claims

1. A method for measuring the concentration of amine and / or carbonate in a stripper composition, comprising: the stripper composition is for stripping a resin mask, contains an amine, and may contain an alkali other than the amine and / or a carbonic acid; titrating the stripper composition with an acid; and when the titration curve obtained by the titration has a first inflection point, a second inflection point, and a third inflection point at a pH of 10 or less, calculating the concentration of the amine and / or carbonic acid in the stripper composition from the amount of acid consumed up to the first inflection point, the second inflection point, and the third inflection point, and, when an alkali other than the amine is contained, the concentration of the alkali. A method for measuring the concentration of amine and / or carbonate in a stripper composition.

2. 2. The method for measuring the concentration of amine and / or carbonate in a stripper composition according to claim 1, wherein the concentration of amine and / or carbonate in the stripper composition is calculated using the following formula: Amine concentration (mass%)=((A−D×β)+(B−D×β)) / 2 / α×M×100 Carbonate concentration (mol / L) = (C - D x β - ((A - D x β) + (B - D x β)) / 2) x 1000 In the above formula, A represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the first inflection point, B represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the second inflection point, C represents the number of moles of acid consumed per 1 g of the stripper composition (mol / g) up to the third inflection point, D represents the concentration (mol / g) of the alkali other than the amine in the stripper composition, α represents the valence of the amine, β represents the valence of the alkali other than the amine, and M represents the molar mass (g / mol) of the amine.

3. 2. The method for measuring the concentration of amine and / or carbonic acid in a stripper composition according to claim 1, comprising diluting the stripper composition with an aqueous solvent before titrating the stripper composition with an acid.

4. The method for measuring the concentration of amine and / or carbonate in a stripper composition according to claim 1, wherein the pH of the stripper composition is 10 or more and 14 or less.

5. 2. The method for measuring the concentration of amine and / or carbonate in a stripper composition according to claim 1, wherein the amine concentration in the stripper composition is 1% by mass or more and 20% by mass or less.

6. 2. The method for measuring the concentration of amine and / or carbonate in a stripper composition according to claim 1, wherein the concentration of the alkali other than the amine in the stripper composition is 1% by mass or more and 20% by mass or less.

7. 7. A method for producing an electronic component, comprising a step of measuring the concentration of amine and / or carbonate in a stripper composition used in a step of stripping a resin mask, using the method for measuring the concentration of amine and / or carbonate in a stripper composition according to any one of claims 1 to 6.

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