ScALN LAMINATE AND ITS MANUFACTURING METHOD
The ScAlN laminate with a strained underlayer stabilizes the wurtzite phase, enabling higher Sc concentrations and improved piezoelectric performance, addressing the underperformance of ScAlN thin films with high Sc content.
JP2025134985AActive Publication Date: 2025-09-17NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY
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Patent Information
- Application Number
- JP2025111555
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2021-05-20
- Filing Date
- 2025-07-01
- Publication Date
- 2025-09-17
- Estimated Expiration
- 2042-04-21
AI Technical Summary
Technical Problem
Existing ScAlN thin films with Sc concentrations above 43 mol% do not exhibit the expected high piezoelectric performance as predicted by theoretical calculations.
Method used
An ScAlN laminate is created with a substrate and an underlayer that introduces strain energy, reducing the stability of the rock salt phase and enhancing the stability of the wurtzite phase, allowing for higher Sc concentrations by ensuring the nearest neighbor interatomic distance of the underlayer is shorter than the a-axis length of the ScAlN thin film.
Benefits of technology
The laminate achieves improved piezoelectric performance by stabilizing the wurtzite phase with higher Sc concentrations, up to 81.5 mol%, resulting in enhanced piezoelectric constants.
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Abstract
To provide an ScAlN laminate with improved piezoelectric performance.SOLUTION: According to an embodiment of the present invention, there is provided an ScAlN laminate including a substrate, an underlayer formed on the substrate, and an ScAlN thin film formed on the underlayer, and the underlayer is composed of any one of yttrium, lutetium, gadolinium, and cerium. According to an embodiment of the present invention, it is possible to provide an ScAlN laminate with improved piezoelectric performance.SELECTED DRAWING: Figure 1
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