Barrier film deposition apparatus

Abstract

To provide a film deposition apparatus having simpler structure.SOLUTION: A barrier film deposition apparatus includes: an electromagnetic wave shield; an outer electrode having a periphery covered with the electromagnetic wave shield; a dielectric layer having a periphery covered with the outer electrode; and an inner electrode arranged in a film deposition chamber provided in the inside of the dielectric layer and extended in the vertical direction. The outer electrode, the dielectric layer and the electromagnetic wave shield are divided into a fixed segment and a movable segment along the vertical direction, and the fixed segment is liftably constituted to the movable segment.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to an apparatus for forming a film having gas barrier properties on the inner surface of a container. [Background technology]

[0002] Gas barrier properties have been imparted to resin containers by forming a thin film (barrier film). The barrier film has gas barrier properties that prevent gas permeation, and an example of such a film is a diamond-like carbon (DLC) thin film. As disclosed in Patent Document 1, for example, a DLC film can be formed by plasma-enhanced chemical vapor deposition (PECVD) method, in which a source gas is decomposed and ionized by plasma generated in a reduced pressure space using a high-frequency electric field, and the ions accelerated by the electric field are caused to collide with the surface of the container.

[0003] The barrier film forming apparatus disclosed in Patent Document 1 includes an internal electrode inserted into a resin container, an external electrode surrounding the resin container, a dielectric layer interposed between the resin container and the external electrode, and an electromagnetic shield surrounding the external electrode. This type of barrier film forming apparatus requires the container to be positioned at a predetermined film formation position inside the external electrode. Therefore, the barrier film forming apparatus includes a conveying mechanism that grips the neck of the container and transports it to the film formation position, and a transport path for transporting the transported container to the film formation position is also provided. Patent Document 1 uses a gripper that can move horizontally and vertically as the transporting mechanism, and the transport path is structured so that the external electrode, dielectric layer, external electrode, and electromagnetic shield are divided into two parts vertically and horizontally. Therefore, the barrier film forming apparatus of Patent Document 1 has a complex structure due to the inclusion of two drive mechanisms: one including a drive source for moving the gripper and the other including a drive source for moving at least one of the two parts. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Patent No. 5355860 Summary of the Invention [Problem to be solved by the invention]

[0005] In view of the above, an object of the present disclosure is to provide a barrier film forming apparatus with a simpler structure. [Means for solving the problem]

[0006] The barrier film forming apparatus of the present disclosure includes: Electromagnetic wave shielding; an external electrode surrounded by an electromagnetic wave shield; a dielectric layer surrounded by the external electrode; an internal electrode extending in a vertical direction and disposed in a film-forming chamber provided inside the dielectric layer; a gripper that grips a container that is a film formation target and is accommodated in the film formation chamber; Equipped with. the external electrode, the dielectric layer, and the electromagnetic wave shield are divided into a fixed segment and a movable segment along the vertical direction; The movable segment is configured to be able to move up and down relative to the fixed segment; The gripper belongs to the moving segment. [Effects of the Invention]

[0007] The barrier film forming apparatus of the present disclosure is divided into a fixed segment and a movable segment along the vertical direction, and the gripper is provided on the movable segment. Therefore, according to the present disclosure, the driving mechanism for the elements for forming the film, such as the external electrode, can be used as the driving mechanism for the gripper, thereby providing a barrier film forming apparatus with a simple structure. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 1 is a front view showing a film forming apparatus according to a first embodiment. [Figure 2] FIG. 2 is a side view showing the film forming apparatus of FIG. [Figure 3] FIG. 2 is a cross-sectional view taken along the line AA in FIG. [Figure 4] FIG. 3 is a cross-sectional view taken along the arrow BB in FIG. 2. [Figure 5] FIG. 2 is a front view showing a fixed segment of the film forming apparatus according to the first embodiment. [Figure 6] FIG. 6 is a side view showing the fixed segment of FIG. 5. [Figure 7] FIG. 6 is a cross-sectional view taken along the line AA in FIG. 5. [Figure 8] 6 and 5. FIG. 7 is a cross-sectional view taken along the line BB in FIG. 6 and a cross-sectional view taken along the line CC in FIG. [Figure 9] FIG. 2 is a front view showing a movable segment of the film forming apparatus according to the embodiment. [Figure 10] FIG. 2 is a side view showing a movable segment of the film forming apparatus according to the embodiment. [Figure 11] FIG. 10 is a cross-sectional view taken along the line AA in FIG. 9. [Figure 12] 6 and 5. FIG. 7 is a cross-sectional view taken along the line BB in FIG. 6 and a cross-sectional view taken along the line CC in FIG. [Figure 13] FIG. 10 is a view showing the film forming apparatus according to the second embodiment, illustrating a state in which a container is supplied to the transfer area while a barrier film is being formed in the film forming area. [Figure 14] 10, showing the state where the containers have been supplied to the transfer area. FIG. [Figure 15] 15 is a diagram showing the state in which the gripper retreats after supplying the container to the transfer area, following FIG. 14. FIG. [Figure 16] 15A and 15B are diagrams showing the movable segment and how the movable segment rises. [Figure 17] 16A and 16B are diagrams showing how the movable segments and the movable segments are interchanged. [Figure 18] 18 is a diagram showing the state of the interchanged movable segments and the state of the movable segments descending, following FIG. 17. [Figure 19] 18, showing how the container after film formation is handed over to the gripper. FIG. [Figure 20] 19 shows how the container after film formation is discharged. FIG. [Figure 21] FIG. 10 is a view showing the film formation apparatus according to the third embodiment, in which a film is formed on a container in a film formation processing section. [Figure 22] 21A and 21B are diagrams showing how a plurality of containers that have completed film formation are discharged. [Figure 23] 23 is a diagram showing a state where a plurality of containers for new film formation are started to be supplied to the film formation processing unit, following FIG. 22. FIG. [Figure 24] 24 is a diagram showing, following FIG. 23, how a plurality of containers in which film formation has been completed are discharged and how a plurality of containers in which new film formation will be performed are supplied. [Figure 25] 25 is a diagram showing the state following FIG. 24 in which the discharge of the container has finished but the supply of new containers continues. [Figure 26] 25 shows a state in which the supply of new containers to the film forming processing unit is completed. [Figure 27] 27 is a diagram showing a state in which a film is being formed on a new container in the film forming unit, following FIG. 26. FIG. DETAILED DESCRIPTION OF THE INVENTION

[0009] Hereinafter, embodiments will be described with reference to the accompanying drawings. The embodiments described below include a first embodiment relating to a first film formation apparatus 1 as a single unit, a second embodiment relating to a second film formation apparatus 2 having two movable segments, and a third embodiment relating to a rotary-type third film formation apparatus 3 having multiple fixed segments and multiple movable segments. Each of the first film formation apparatus 1, the second film formation apparatus 2, and the third film formation apparatus 3 is divided into a fixed segment 1F and a movable segment 1M along the vertical direction V, and the movable segment 1M is provided with a gripper 31 that grips the container PB that is the target of film formation. In addition, each of the first film formation apparatus 1, the second film formation apparatus 2, and the third film formation apparatus 3 has an electromagnetic wave shield 21, which is provided on the outermost side as an electromagnetic wave leakage prevention cover, that constitutes a vacuum chamber.

[0010] [First embodiment: Figs. 1 to 12] The first film forming apparatus 1 forms a barrier film (not shown) on the inner surface of a resin container PB by generating plasma in a reduced pressure space using a high-frequency electric field. The barrier film is a dense film that can suppress gas permeation, such as a carbon film including diamond-like carbon (DLC), a silica film, or the like. The container PB is formed in a bottle shape from a resin material such as polyethylene terephthalate (PET) or polypropylene (PP).

[0011] The first film forming apparatus 1 constitutes part of a production line for, for example, beverage products, detergents, pharmaceuticals, etc., and the container PB is filled with mainly liquid contents. The barrier film applied to the container PB provides the container PB with gas barrier properties that suppress gas permeation and gas adsorption to the container PB, thereby preserving the quality of the contents filled in the container PB. The manner in which gas permeates the container PB includes, for example, when a gas such as oxygen outside the container PB permeates into the container PB, and when a gas such as carbon dioxide inside the container PB permeates out of the container PB.

[0012] [Configuration of the first film forming apparatus 1: see Figures 1, 2, 3, and 4] The first film deposition device 1 is divided into two elements: a fixed segment 1F that performs the function of forming a barrier film, and a movable segment 1M that performs the function of supplying and discharging the container PB. However, a part of the movable segment 1M performs the function of forming a barrier film. The fixed segment 1F is fixed in position throughout all procedures, including the deposition of the barrier film, the supply of the container PB to the deposition element 10, and the discharge of the container PB from the deposition element 10. The movable segment 1M is integrated with the fixed segment 1F during the deposition of the barrier film, but moves up and down to separate from the fixed segment 1F when the container PB is supplied and discharged.

[0013] [Deposition element] The first film formation apparatus 1 includes, as film formation elements for forming a barrier film, an internal electrode 11 disposed inside the container PB during film formation, an external electrode 13 disposed outside the container PB, and a dielectric layer 15 disposed between the internal electrode 11 and the external electrode 13 and inside the external electrode 13. The space inside the dielectric layer 15 is a film formation chamber 17, and the container PB is housed in the film formation chamber 17 during film formation. The first film formation apparatus 1 also includes, as film formation elements, an electrical insulator layer 19 that surrounds the dielectric layer 15, and an electromagnetic wave shield 21 that surrounds the insulator layer 19 and prevents electromagnetic waves from leaking to the outside during film formation. In the first film formation apparatus 1, the electromagnetic wave shield 21 functions as a vacuum chamber for maintaining a vacuum in the film formation chamber 17. The first film formation apparatus 1 also includes, as film formation elements, an exhaust manifold 25 for discharging air present in the film formation chamber 17. The internal electrode 11 , the external electrode 13 , the dielectric layer 15 , the insulating layer 19 and the electromagnetic wave shield 21 are provided on a base 5 , and the exhaust manifold 25 is formed within this base 5 .

[0014] The internal electrode 11, the external electrode 13, the dielectric layer 15, the insulator layer 19 and the electromagnetic wave shield 21 are configured to belong exclusively to the fixed segment 1F, but each part of the external electrode 13, the dielectric layer 15 and the insulator layer 19 is configured to belong to the movable segment 1M.

[0015] [Internal electrodes: see Figures 2, 3, and 4] The internal electrode 11 is formed from a heat-resistant conductive material such as tungsten or stainless steel, and is inserted into the inside of a container PB housed in a film formation chamber 17 surrounded by a dielectric layer 15. The internal electrode 11 is a tubular member arranged along the vertical direction V, and also serves as an introduction pipe for gas containing raw materials for the barrier film. Raw material gas for the barrier film is introduced into the inside of the internal electrode 11 from a raw material gas supply source (not shown), thereby filling the inside of the container PB with the raw material gas. When the barrier film is a DLC film, the raw material gas is, for example, acetylene.

[0016] When the first film deposition apparatus 1 is provided with a source gas inlet separate from the internal electrode 11, the internal electrode 11 does not need to be tubular and may be, for example, a solid rod. In this case, the gas inlet that introduces the source gas into the inside of the container PB does not need to be inserted inside the container PB.

[0017] [External electrode 13: see Figures 1, 2, 3, 4, 8, 10, and 11] The external electrode 13 is made of a conductive material, for example, a metal material such as copper or aluminum, or carbon. The external electrode 13 is connected to a high-frequency power supply via a power supply connection terminal 23 and a matching box, which are provided to penetrate the electromagnetic wave shield 21 and the insulator layer 19. The matching box and high-frequency power supply are not shown in the figure.

[0018] A brief explanation of high frequency power sources will be given below. The high frequency power supply (alternating electric field source) applies a high frequency alternating electric field between the external electrode 13 and the grounded internal electrode 11. Alternatively, the internal electrode 11 may be connected to the high frequency power supply, and the external electrode 13 may be grounded. The output of the high frequency power supply is, for example, 100 to 1000 W, and the frequency band of the alternating electric field generated by the high frequency power supply is, for example, 2.0 MHz to 60 MHz. Frequencies lower or higher than this frequency band can also be used.

[0019] As an example, the outer periphery of the external electrode 13 has a circular shape when viewed from above, and its central axis coincides with the central axis of the internal electrode 11. The external electrode 13 accommodates the container PB to be supplied in an internal film formation chamber 17. The cross section of the container PB is not limited to a circular shape, and may be rectangular or the like in accordance with the planar shape of the container PB.

[0020] As shown in Fig. 8, the external electrode 13 has two parts: a cylindrical side wall 131 in a plan view and a circular top wall 132 that closes the upper part of the side wall 131. However, the side wall 131 and the top wall 132 are not each composed of a single member, but rather, as shown in Figs. 10 and 11, a first side wall 131A that forms part of the side wall 131 belongs to the fixed segment 1F, and a second side wall 131B and the top wall 132 that form the other part of the side wall 131 belong to the movable segment 1M. Both the first side wall 131A and the second side wall 131B are arc-shaped in a plan view, but the central angle of the first side wall 131A is significantly larger than that of the second side wall 131B, and the central angle of the second side wall 131B is approximately a fraction of that of the first side wall 131A. The second side wall 131B and the upper wall 132 constitute a movable segment 1M as a single member, and are raised and lowered in conjunction with the raising and lowering of the movable segment 1M.

[0021] [Dielectric layer 15: see Figures 3, 4, 7, 8, 10, and 12] The dielectric layer 15 is made of a material that generates dielectric polarization when an electrostatic field is applied but does not generate direct current. The dielectric layer 15 is provided inside the external electrode 13 to prevent abnormal discharge when an electric field is applied between the external electrode 13 and the internal electrode 11 and to form a uniform barrier film.

[0022] Similar to the external electrode 13, the dielectric layer 15 is made up of a cylindrical side wall 151 in a plan view and an upper wall 152 that closes the upper end of the side wall 151. Similar to the external electrode 13, the side wall 151 and the upper wall 152 are not made up of a single member, but rather a first side wall 151A that forms part of the side wall 151 belongs to the fixed segment 1F, and a second side wall 151B and the upper wall 152 that form the other part of the side wall 151 belong to the movable segment 1M. Both the first side wall 151A and the second side wall 151B are arc-shaped in a plan view, but the central angle of the first side wall 151A is significantly larger than that of the second side wall 151B, and the central angle of the second side wall 151B is approximately a fraction of that of the first side wall 151A. The second side wall 151B and the upper wall 152 constitute one element of the movable segment 1M as a single member, and are raised and lowered in conjunction with the raising and lowering of the movable segment 1M.

[0023] Since the inner surface of the external electrode 13 is covered with the dielectric layer 15, abnormal discharges resulting from localized peaks in energy level caused by electrons flying out of the external electrode 13 when a high-frequency electric field is applied are suppressed. Even if the dielectric layer 15 exists between the external electrode 13 and the container PB, application of an alternating electric field causes a displacement current to flow in the dielectric layer 15. Similarly, a displacement current also flows in the container PB, which is a dielectric, so that a high-frequency electric field can be applied between the external electrode 13 and the internal electrode 11 via the dielectric layer 15 and the container PB to generate plasma.

[0024] The dielectric layer 15 can be made of an appropriate material having dielectric properties. The dielectric layer 15 functions as an electrical insulator, i.e., no current flows through it when a DC electric field is applied, and a displacement current flows through it when an AC electric field is applied. Furthermore, it is preferable that the dielectric layer 15 be formed from a material that has low dielectric loss, particularly in high-frequency electric fields, and high heat resistance, flame retardancy, and mechanical strength. For this reason, for example, resin materials such as polytetrafluoroethylene (PTFE), perfluoroalkoxyalkane (PFA), rigid vinyl chloride, polycarbonate, and polyether ether ketone (PEEK), or ceramic materials such as aluminum oxide (Al2O3) and steatite (MgO·SiO2) can be used. The dielectric layer 15 is preferably formed from PTFE.

[0025] [Insulator layer 19] The insulating layer 19 fills the gap between the external electrode 13 and the electromagnetic wave shield 21 to provide electrical insulation therebetween. For example, in the film deposition apparatus of Patent Document 1, a gap is provided between the external electrode and the electromagnetic shield, and the external electrode and the electromagnetic shield are electrically insulated by air. This is because the film deposition apparatus of Patent Document 1 functions as a vacuum chamber. In the first film deposition apparatus 1, in order to make the electromagnetic shield 21 function as a vacuum chamber, the gap between the external electrode 13 and the electromagnetic shield 21 becomes a vacuum, making electrical insulation impossible. Therefore, the gap between the external electrode 13 and the electromagnetic shield 21 is filled with an insulator layer 19. The material constituting the insulator layer 19 is arbitrary, and may be, for example, a resin or a ceramic material.

[0026] The insulator layer 19 comprises a first side wall 191 provided inside the side wall 211 of the electromagnetic wave shield 21, a second side wall 192 filling the space between the lifting rod 33 described later and the second peripheral wall 131B, and an upper wall 193 blocking the upper wall 132 of the external electrode 13 from above. The first side wall 191 has an oval shape in a plan view and belongs to the fixed segment 1F. The second side wall 192 and the top wall 193 are fabricated as a single member and belong to the movable segment 1M. The second side wall 192 and the top wall 193 belonging to the movable segment 1M move up and down together with the second side wall 131B and the top wall 132 of the external electrode 13.

[0027] [Electromagnetic wave shield 21: see Figures 7, 8, 11, and 12] The electromagnetic wave shield 21 functions as a cover to prevent electromagnetic wave radiation, and also as a high-frequency earth. The electromagnetic wave shield 21 is formed, for example, in a cylindrical shape from a conductive metal material such as aluminum, stainless steel, copper, or brass. The electromagnetic wave shield 21 covers the entire external electrode 13 while being electrically insulated from the external electrode 13, and is grounded. The electromagnetic wave shield 21 is supported by the external electrode 13 via an insulator layer 19. The electromagnetic wave shield 21 also functions as a chamber that provides a reduced-pressure space in the film formation chamber 17.

[0028] Like the external electrode 13 and the dielectric layer 15, the electromagnetic wave shield 21 comprises a side wall 211 that is oval in plan view and an upper wall 212 that closes the upper end of the side wall 211. The side wall 211 belongs to the fixed segment 1F, and the upper wall 212 belongs to the movable segment 1M. That is, the side wall 211 and the upper wall 212 are fabricated as separate members, the side wall 211 is fixed to a predetermined position on the base 5, and the upper wall 212 is disposed at the top of the movable segment 1M. When a film is formed by the first film formation device 1, the insulator layer 19, the dielectric layer 15, the external electrode 13, and the internal electrode 11 are housed inside the side wall 211 and the upper wall 212, and further, the container PB is housed inside the external electrode 13. The upper wall 212 can be raised and lowered together with the movable segment 1M.

[0029] [Exhaust manifold 25: See Figures 3 and 4] The exhaust manifold 25 is electrically insulated from the external electrode 13 by an insulating member 26, and is connected to a vacuum suction device including a vacuum pump, a vacuum tank, etc. (not shown). With the opening 133 at the lower end of the external electrode 13 closed, the source gas is blown out from the internal electrode 11 while exhausting the gas from the space inside the external electrode 13 through the flow path 251 of the exhaust manifold 25, and a space decompressed to a predetermined vacuum level is created in the film formation chamber 17 including the inside of the container PB. The pressure in the decompressed space is, for example, 5 to 50 Pa.

[0030] [Supply / Exhaust Element (Moving Segment 1M): See Figures 9, 10, 11, and 12] Next, elements that realize the supply and discharge of the container PB in the movable segment 1M will be described. The supply / discharge element 30 includes a gripper 31 that grips the neck of the container PB, and a lifting rod 33 that supports the gripper 31 and can be raised and lowered by a drive source (not shown). The container PB is supported by the gripper 31, for example, by a flange of the neck. The gripper 31 is supported parallel to the horizontal direction (H) and grips the container PB with its drinking spout facing downward, i.e., in an inverted state. The upper end of the lifting rod 33 contacts the upper wall 212, and the two are fixed to each other. The gripper 31 is made of a dielectric material such as a resin material to prevent localized plasma concentration in the film formation chamber 17. The gripper 31 has a pair of gripping claws (not shown) that are configured to be openable and closable.

[0031] The gripper 31 and the lifting rod 33 are disposed at a transfer position above and away from the fixed segment 1F when receiving the container PB to be film-formed from the upstream side or when transferring the container PB after film formation to the downstream side. When forming a barrier film on the container PB, the gripper 31 and the lifting rod 33 are disposed at a film-forming position attached to the fixed segment 1F. The gripper 31 and the lifting rod 33 move back and forth between the transfer position and the film-forming position, thereby receiving a new container PB, forming a barrier film, and transferring the container PB on which the barrier film has been formed.

[0032] Parts of the external electrode 13, the dielectric layer 15, and the insulator layer 19, which are film-forming elements, are attached to the supply / discharge element 30 (gripper 31, lifting rod 33), constituting a movable segment 1M. Specifically, the second side wall 131B and the top wall 132 of the external electrode 13, the second side wall 151B and the top wall 152 of the dielectric layer 15, and the second side wall 192 and the top wall 193 of the insulator layer 19 are attached to the supply / discharge element 30, and these film-forming elements also move up and down as the supply / discharge element 30 moves up and down.

[0033] [Seal structure: See Figure 3] In the first film formation apparatus 1, when the movable segment 1M is attached to the fixed segment 1F and placed at the film formation position, the electromagnetic wave shield 21 functions as a vacuum chamber, and the area inside the electromagnetic wave shield 21, including the film formation chamber 17, is airtightly sealed. When the chamber is evacuated via the exhaust manifold 25, the film formation chamber 17 is maintained in a vacuum state. To achieve this, the first film formation apparatus 1 has a sealing structure, such as a rubber O-ring 24, provided between the side wall 211 and the top wall 212 of the electromagnetic wave shield 21, and a sealing structure, such as an O-ring 24, provided between the side wall 211 and the substrate 5.

[0034] [Effects of the First Embodiment (First Film Forming Apparatus 1)] <First effect> In the first film formation apparatus 1, some of the film formation elements are provided on a movable segment 1M including a gripper 31 and an elevating rod 33 that need to be moved, such as up and down, to supply the container PB. The film formation elements here include the second side wall 131B that is part of the external electrode 13, the second side wall 151B that is part of the dielectric layer 15, the first side wall 191 and the top wall 193 that are part of the insulator layer 19, and the top wall 212 that is part of the electromagnetic wave shield 21. By adopting this configuration, it is possible to eliminate mechanisms for moving the film formation elements and to combine them into one movement mechanism, thereby simplifying the structure of the first film formation apparatus 1.

[0035] <Second effect> In the first film deposition apparatus 1, the electromagnetic wave shield 21 located at the outermost periphery has a side wall 211 that is not divided but is integral, and only the top wall 212 is attached to the movable segment 1M and moves up and down relative to the side wall 211. Therefore, for the electromagnetic wave shield 21 to function as a vacuum chamber, a sealing structure is sufficient between the side wall 211 and the top wall 212, so the number of locations where a sealing structure is required can be reduced. Note that a portion of the side wall 211 can be included in the movable segment 1M, but in that case, a sealing structure must also be provided between the two divided side walls. Furthermore, although the film deposition elements inside the electromagnetic wave shield 21 are divided, a sealing structure does not need to be provided between the divided parts.

[0036] [Second embodiment: Figs. 13 to 20] Next, the second film forming apparatus 2 according to the second embodiment will be described. The second film forming apparatus 2 is equipped with one fixed segment 1F and two movable segments 1M of the first film forming apparatus 1, so that while one movable segment 1M is attached to the fixed segment 1F to form a film on the container PB, the other movable segment 1M can transfer the container PB.

[0037] 13, the second film formation apparatus 2 includes a fixed segment 1F, and a movable segment 1MA and a movable segment 1MB. The fixed segment 1F is fixed in position, but the movable segment 1MA and the movable segment 1MB can move up and down and rotate around a drive shaft 43, allowing the positions of the movable segment 1MA and the movable segment 1MB relative to the fixed segment 1F to be interchanged. To this end, the second film formation apparatus 2 includes an elevation / rotation unit 40 and a container supply / discharge unit 50.

[0038] [Lifting and rotating part 40] The lifting and rotating unit 40 includes a drive source 41, a drive shaft 43 that transmits the output of the drive source 41 and extends in the vertical direction (V), and a support base 45 that is supported by the drive shaft 43 and extends in the horizontal direction H. The drive source 41 can lift and lower the drive shaft 43 and rotate it. As the drive shaft 43 lifts and lowers and rotates, the support base 45 can also lift and lower and rotate.

[0039] On the support base 45, a movable segment 1MA is attached to one side of the drive shaft 43, and a movable segment 1MB is attached to the other side. The movable segment 1MA and the movable segment 1MB are arranged in positions that are point-symmetrical with respect to the drive shaft 43. When one of the movable segment 1MA and the movable segment 1MB is attached to the fixed segment 1F, the other of the movable segment 1MA and the movable segment 1MB is arranged in a position that is point-symmetrical with respect to the fixed segment 1F, with respect to the drive shaft 43. The area where the fixed segment 1F is provided is called the molding area Af, and the area point-symmetrical with respect to the molding area FA and the drive shaft 43 is called the transfer area At. While one of the movable segment 1MA and the movable segment 1MB is forming a barrier film in the molding area FA, the other of the movable segment 1MA and the movable segment 1MB transfers the container PB in the transfer area At.

[0040] The lifting and rotating unit 40 includes a first moving mechanism 47A and a second moving mechanism 47B that move each of the movable segment 1MA and the movable segment 1MB supported on the support base 45 in the horizontal direction H along the support base 45. The first moving mechanism 47A and the second moving mechanism 47B move the movable segment 1MA or the movable segment 1MB toward the container supply and discharge unit 50 when receiving a container PB from the container supply and discharge unit 50 or transferring a container PB to the container supply and discharge unit 50 in the transfer area At. Note that a configuration can also be adopted in which the container supply and discharge unit 50 moves toward the movable segment 1MA or the movable segment 1MB.

[0041] [Container supply / discharge section 50] The container supply / discharge unit 50 delivers or receives the container PB to or from either the movable segment 1MA or the movable segment 1MB arranged in the transfer area At. The container supply / discharge unit 50 can also transport the received container PB downstream. The container supply / discharge unit 50 includes a gripper 51 that grips the container PB to be delivered and a travel path 53 along which the gripper 51 travels, for example, from the front (upstream) to the back (downstream) in the figure. The gripper 51 travels from upstream to downstream along the travel path 53 while gripping the neck of the container PB in an inverted position. The gripper 51 stops at a position corresponding to the delivery area At to deliver and receive the container PB. The container supply / discharge unit 50 can achieve the desired function by forming a linear motor between the gripper 51 and the travel path 53, for example.

[0042] [Barrier film deposition] Hereinafter, the continuous barrier film deposition operation in the second film deposition apparatus 2 will be described with reference to FIGS. [Container transport: see Figure 13] As an example, the film-forming operation described here will begin with the process of transferring container PB2 from gripper 51 to movable segment 1MB located in transfer area At while a film is being formed on container PB1 in molding area Af where movable segment 1MA is attached to fixed segment 1F. In other words, gripper 51 holding container PB2 travels from upstream to transfer area At and stops. At this time, movable segment 1MB is waiting in a retracted position relative to gripper 51. The numbers at the end of the names of the containers PB1, PB2, etc. indicate the order in which the films are formed, and in the following description, the container PB1 is the first to be formed with a film, and the container PB2 is the second to be formed with a film after the container PB1.

[0043] [Gripper 51 moves forward and receives the container: see Figure 14] When the gripper 51 gripping the container PB2 stops in the transfer area At, the second movement mechanism 47B operates to advance the movable segment 1MB to a position where the container PB2 can be received from the gripper 51. Note that, although an example in which the second movement mechanism 47B advances the movable segment 1MB is described here, the gripper 51 can also be advanced relative to the movable segment 1MB to transfer the container PB2. In other words, the advancement of the gripper 51 includes the relative advancement of the gripper 51 with respect to the movable segment 1MB (or the movable segment 1MA). The same applies to the retreat of the gripper 51. At this time, the container PB1 is still undergoing film formation in the forming area Af.

[0044] [Gripper 51 retreats, film formation ends: see Figure 15] When the movable segment 1MB receives the container PB2, the movable segment 1MB retreats to its original position, causing the gripper 51 to retreat relatively. From the retreated position, the gripper 51 waits in the transfer area At to receive the container PB1. For example, film formation on the container PB1 is completed at the timing when the gripper 51 retreats.

[0045] [Moving segment 1MA, moving segment 1MB rise: see Figure 16] When film formation on container PB1 in the molding area Af (movable segment 1MA) is completed and the receiving of container PB2 in the transfer area At (movable segment 1MB) is completed, the drive source 41 of the lifting and rotating unit 40 is driven to raise the drive shaft 43. This raising is performed to a position where the movable segment 1MA and the movable segment 1MB do not overlap with the fixed segment 1F in the horizontal direction H. This is to prevent the movable segment 1MB and the movable segment 1MA from interfering with the fixed segment 1F when the movable segment 1MA and the movable segment 1MB are rotated and reversed. This raised position of the movable segment 1MA and the movable segment 1MB is referred to as the reverse position in relation to the next operation.

[0046] [Inversion of movable segment 1MA and movable segment 1MB: Figure 17] When the movable segment 1MA and the movable segment 1MB are raised to the reversal position Pr, the drive source 41 of the lifting and rotating unit 40 is driven to rotate the drive shaft 43 by 180°. As a result, the movable segment 1MB is positioned at a position corresponding to the molding area Af (fixed segment 1F), and the movable segment 1MA is positioned at a position corresponding to the transfer area At (gripper 51). In other words, the positions of the movable segment 1MA and the movable segment 1MB are reversed, and the positions of the container PB1 and the container PB2 are swapped.

[0047] [Container replacement: Figure 18] Once the positions of container PB1 and container PB2 have been swapped, the drive source 41 of the lifting and rotating unit 40 is driven to lower the movable segment 1MA and movable segment 1MB. As a result, the movable segment 1MB holding container PB2 is attached to the fixed segment 1F, and the movable segment 1MA holding container PB1 is brought face to face with the waiting gripper 51. In this way, container PB2, which is the new target for film formation, is swapped with container PB1, which has completed film formation and is being discharged downstream. Once the movable segment 1MB is attached to the fixed segment 1F, film formation on container PB2 begins.

[0048] [Movement of movable segment 1MA, transfer of container PB1: Figures 19 and 20] During the formation of the barrier film on the container PB2, the first moving mechanism 47A is operated to move the movable segment 1MA forward toward the gripper 51 and to hand over the container PB1 to the gripper 51. The gripper 51 that receives the container PB1 travels downstream and ejects the container PB1. Although not shown, the gripper 51 that grips the container PB3, which is to be coated next after the container PB2, travels from the upstream side to the transfer area At. After that, the same procedure as described above is repeated to continuously coat the containers PB with a barrier film.

[0049] [Effects of the Second Embodiment (Second Film Forming Apparatus 2)] The second film formation device 2 has two movable segments, a movable segment 1MA and a movable segment 1MB, and while one is forming a film, the other can discharge a film-formed container PB and supply a new container PB to be film-formed. Therefore, the second film formation device 2 shortens the time interval between film formation on the preceding container PB and film formation on the following container PB, achieving high film formation efficiency. Moreover, since the second film formation device 2 only requires one fixed segment 1F, its manufacturing costs can be reduced.

[0050] [Third embodiment: Figs. 21 to 27] Next, a third film forming apparatus 3 according to the third embodiment will be described. The third film formation apparatus 3 includes a film formation processing unit 60 having a plurality of first film formation devices 1, e.g., eight first film formation devices 1, each of which is a combination of a fixed segment 1F and a movable segment 1M. The third film formation apparatus 3 further includes a container supply unit 70 that supplies containers PB to be film-formed to the film formation processing unit 60, and a container discharge unit 80 that discharges the containers PB on which a barrier film has been formed in the film formation processing unit 60. The film formation processing unit 60, the container supply unit 70, and the container discharge unit 80 each include a rotary table, which is a so-called rotary-type conveying means, and can supply, form a film on, and discharge containers PB in batches of eight. In other words, the third film formation apparatus 3 can batch process multiple containers PB. The film formation processing unit 60, the container supply unit 70, and the container discharge unit 80 are rotatably supported on a support table 90. The film formation processing unit 60 is supported on the support table 90 so as to be able to move up and down relative to the support table 90.

[0051] [Film forming processing unit 60: see FIGS. 21 and 22] The film forming processing unit 60 includes an elevation rotation unit 61 and, for example, eight movable segments 1M. The movable segments 1M have the same configuration as the movable segments 1M of the first embodiment. The lifting and rotating unit 61 includes a drive source 63, a drive shaft 65 that transmits the output of the drive source 63 and extends in the vertical direction V, a rotary table 67 that is supported by the drive shaft 65 and extends in the horizontal direction H and is circular in plan view, and a fixed table 69 that is provided opposite the rotary table 67 below the vertical direction V. The drive source 63 can lift and lower the drive shaft 65 and rotate it. As the drive shaft 65 lifts and rotates, the rotary table 67 can also lift and lower and rotate. The eight movable segments 1M are written as 1MA, 1MB, 1MC, 1MD, 1ME, 1MF, 1MG, and 1MH as shown in the figure when it is necessary to distinguish between them, but when it is not necessary to distinguish between them, they are collectively referred to as 1M. The same applies to grippers 79 and 89, which will be described later.

[0052] A plurality of (eight) movable segments 1M are arranged at equal intervals in the circumferential direction on the radially outer periphery of the rotary table 67. Each movable segment 1M is suspended downward in the vertical direction V from the rotary table 67. A plurality of (eight) fixed segments 1F are arranged at equal intervals in the circumferential direction on the radially outer periphery of the fixed table 69. Each fixed segment 1F stands upright in the vertical direction V from the fixed table 69.

[0053] A plurality of movable segments 1M held on the rotary table 67 and a plurality of fixed segments 1F held on the fixed table 69 are arranged at the same radial and circumferential positions around the drive shaft 65, and can be attached to each other when the movable segments 1M and fixed segments 1F are in the same phase. As shown in Fig. 21, when the rotary table 67 is lowered to the deposition position, the respective movable segments 1M and the respective fixed segments 1F are attached to each other. As shown in Fig. 22, when the rotary table 67 is raised to the transfer position, the respective movable segments 1M held by the rotary table 67 can rotate together with the rotary table 67 without interfering with the respective fixed segments 1F held by the fixed table 69.

[0054] [Container supply unit 70: see Figures 21 and 22] The container supply unit 70 includes a rotating unit 71 and a plurality of grippers 79, and receives the containers PB transported from the upstream side, and delivers them to the respective movable segments 1M of the film formation processing unit 60 to supply them. do. The rotating unit 71 includes a drive source 73, a drive shaft 75 that transmits the output of the drive source 73 and extends in a vertical direction V, and a rotary table 77 that is supported by the drive shaft 75 and is circular in plan view and extends in a horizontal direction H. The drive source 73 can rotate the drive shaft 75. The rotary table 77 can also rotate in conjunction with the rotation of the drive shaft 65.

[0055] A plurality of grippers 79 are arranged at equal intervals around the circumference of the rotary table 77 on the radially outer periphery thereof. Each gripper 79 is suspended downward in the vertical direction V from the rotary table 67. The grippers 79 are arranged at equal intervals around the circumference of the rotary table 67 except for a portion thereof, and these intervals are equal to the intervals between the movable segments 1M in the film formation processing unit 60. The same applies to the gripper 89 described below.

[0056] [Container discharge unit 80: see Figures 21 and 22] The container discharge unit 80 includes a rotation unit 81 and a plurality of grippers 89, and receives the container PB on which the barrier film has been formed from the film formation processing unit 60, and transports it downstream. do. The rotating unit 81 includes a drive source 83, a drive shaft 85 that transmits the output of the drive source 83 and extends in a vertical direction V, and a rotary table 87 that is supported by the drive shaft 85 and is circular in a plan view and extends in a horizontal direction H. The drive source 83 can rotate the drive shaft 85. The rotation of the drive shaft 85 can rotate the rotary table 87.

[0057] A plurality of grippers 89 are arranged at equal intervals in the circumferential direction on the radially outer periphery of the rotary table 87. Each gripper 89 protrudes outward in the horizontal direction H from the rotary table 87.

[0058] [Barrier film deposition] Hereinafter, the film formation operation of the barrier film by batch processing in the third film formation apparatus 3 will be described with reference to FIGS.

[0059] [Film formation, container supply: Figure 21, Figure 22] 21, barrier film formation is started when a plurality of, for example, eight containers PB1 are attached to a plurality of, for example, eight fixed segments 1F and eight movable segments 1M provided in the film formation processing unit 60. In conjunction with the start of film formation, the next container PB2 to be filmed is supplied from the upstream side to the container supply unit 70 and handed over to the eight grippers 79 of the container supply unit 70. Note that the black arrows in FIG. 21 indicate the supply of the container PB2.

[0060] When the supply and transfer of a predetermined number of containers PB2 to the container supply unit 70 is completed, film formation on the container PB1 in the film formation processing unit 60 is completed. Then, the drive source 63 is driven to raise the rotary table 67 holding the multiple movable segments 1M to the transfer position. The multiple containers PB1 for which film formation has been completed are raised to the transfer position together with their corresponding movable segments 1M and placed there. At this point, the film formation processing unit 60 holds the multiple containers PB1 for which film formation has been completed, and the container supply unit 70 holds the container PB2 to be next to be film-formed. No containers are held in the container discharge unit 80, and it is waiting for the container PB1 to be transferred.

[0061] [Discharge of container PB1: See Figures 22 and 23] When the rotary table 67 is placed at the transfer position, the container PB1 is transferred from the film forming processing unit 60 to the container discharge unit 80, and the container PB2 is transferred from the container supply unit 70 to the film forming processing unit 60. For example, while the turntable 67 of the film forming processing unit 60 is stationary, the turntable 87 is rotated clockwise in the figure, and the gripper 89A involved in the transfer of the container PB1 is first moved to a position corresponding to the stationary movable segment 1MA. Then, the turntable 67 rotates in synchronization with the turntable 87, and the container PB1 is transferred from the movable segment 1MA to the gripper 89A. Thereafter, while the turntable 67 continues to rotate clockwise and the turntable 87 continues to rotate counterclockwise, the container PB1 is transferred from the film forming processing unit 60 to the container discharge unit 80 in the following order: from the movable segment 1MB to the gripper 89B, from the movable segment 1MC to the gripper 89C, from the movable segment 1MD to the gripper 89D, and from the movable segment 1ME to the gripper 89E. The container PB1 transferred to the container discharge unit 80 is then discharged further downstream. In FIG. 23, the black arrows indicate the downstream discharge of the container PB1.

[0062] [Supply of container PB2: See Figures 23 and 24] The turntable 77 is rotated so that the gripper 79A gripping the container PB2 reaches the transfer position at the same time that the movable segment 1MA, which has finished transferring the container PB1, reaches the transfer position. As a result, the container PB2 held by the gripper 79A is transferred to the gripper 31A. By continuing to rotate the turntable 67 and the turntable 77, the container PB2 is transferred from the container supply unit 70 to the film forming processing unit 60 in the following order: from gripper 79B to movable segment 1MB, from gripper 79C to movable segment 1MC, from gripper 79D to movable segment 1MD, and from gripper 79E to movable segment 1ME.

[0063] [Relationship between discharge of container PB1 and supply of container PB2: See Figure 24] In the above, for ease of understanding, the discharge of container PB1 from film forming processing unit 60 to container discharge unit 80 and the supply of container PB2 from container supply unit 70 to film forming processing unit 60 have been described separately, but there are periods when both are performed in parallel. For example, in Figure 24, when container PB2 is transferred from gripper 79A to movable segment 1MA, container PB1 is transferred from movable segment 1MD to gripper 79D.

[0064] [End of discharge of container PB1, continued supply of container PB3: see Figures 25 and 26] When all of the containers PB1 held in the container discharge unit 80 have been discharged downstream, the supply of container PB3 to the container supply unit 70 continues, and when the container PB3 is handed over to the grippers 79A to 79H of the container supply unit 70, the rotation of the turntable 77 of the container supply unit 70 is stopped. At this time, the container PB2 is held by all of the movable segments 1M of the film formation processing unit 60, and the film formation of the container PB2 is complete.

[0065] [Start of deposition on container PB2: See Figure 27] Thereafter, the drive shaft 65 is driven to lower the rotary table 67, and the movable segment 1M is attached to the fixed segment 1F, and deposition of the barrier film on the container PB2 begins. After that, once deposition on the container PB2 is completed, deposition on the containers PB3 and onward continues according to the procedure shown in FIG. 22 and subsequent figures.

[0066] [Effects of the Third Embodiment (Third Film Forming Apparatus 3)] The third film formation device 3 is equipped with multiple first film formation devices 1, so that film formation can be performed on multiple containers PB in a single film formation process. Moreover, by attaching multiple movable segments 1M to the turntable 67, it is possible to receive or transfer the containers PB at high speed while rotating at high speed. Therefore, the third film formation device 3 contributes to improving the efficiency of forming a barrier film on the containers PB.

[0067] In addition to the above, it is possible to select and discard the configurations given in the above embodiments, or to change them to other configurations as appropriate. For example, the present disclosure is not limited to a barrier film forming apparatus having an insulator layer 19 between the electromagnetic wave shield 21 and the external electrode 13. In other words, the fixed segment and the movable segment can be applied to a barrier film forming apparatus in which the external electrode 13 functions as a vacuum chamber.

[0068] [Note] <Appendix 1> an electromagnetic wave shield (21); an external electrode (13) surrounded by an electromagnetic wave shield (21); a dielectric layer (15) whose periphery is covered with the external electrode (13); an internal electrode (11) extending in a vertical direction (V) and disposed in a film-forming chamber (17) provided inside the dielectric layer (15); a gripper (31) for gripping a container (PB) that is a film formation target and is accommodated in the film formation chamber (17); The external electrode (13), the dielectric layer (15), and the electromagnetic wave shield (21) are divided into a fixed segment (1F) and a movable segment (1M) along the vertical direction (V), The movable segment (1M) is configured to be able to rise and fall relative to the fixed segment (1F), The gripper (31) is a barrier film forming device belonging to the movable segment (1M).

[0069] <Appendix 2> In Appendix 1, an insulator layer (19) disposed between the electromagnetic wave shield (21) and the external electrode (13) and covering the periphery of the external electrode (13); The insulating layer (19) is divided into a fixed segment (1F) and a movable segment (1M).

[0070] <Appendix 3> In Appendix 1 or Appendix 2, The electromagnetic wave shield (21) The container has a cylindrical side wall (211) and an upper wall (212) that closes the upper part of the side wall (211), A part of the side wall (211) belongs to the fixed segment (1F), The other part of the side wall (211) and the top wall (212) belong to the movable segment (1M).

[0071] <Appendix 4> In any of Supplementary Notes 1 to 3, The external electrode (13) is The container has a cylindrical side wall (131) and an upper wall (132) that closes the upper part of the side wall (131), A part of the side wall (131) belongs to the fixed segment (1F), The other part of the side wall (131) and the top wall (132) belong to the movable segment (1M).

[0072] <Appendix 5> In any of Supplementary Notes 1 to 4, The dielectric layer (15) is The container has a cylindrical side wall (151) and an upper wall (152) that closes the upper part of the side wall (151), A part of the side wall (151) belongs to the fixed segment (1F), The other part of the side wall (151) and the top wall (152) belong to the movable segment (1M). <Appendix 6> In any of Supplementary Notes 1 to 5, The insulator layer (19) is The container has cylindrical side walls (191, 192) and an upper wall (193) that closes the upper portions of the side walls (191, 192), A part of the side wall (191) belongs to the fixed segment (1F), The other part of the side wall (192) and the top wall (193) belong to the movable segment (1M). <Appendix 7> In any of Supplementary Notes 1 to 6, The electromagnetic wave shield (21) It functions as a vacuum chamber that can maintain a vacuum inside during film formation. A seal is provided between a portion of the side wall (211) belonging to the fixed segment (1F) and the top wall (212) belonging to the movable segment (1M).

[0073] <Appendix 8> In any of Supplementary Notes 1 to 7, The gripper (31) The container (PB) on which the film is to be formed is held in an inverted position.

[0074] <Appendix 9> In any of Supplementary Notes 1 to 8, One fixed segment (1F) and Two movable segments (1MA, 1MB), While one of the movable segments (1MA) and the fixed segment (1F) is forming a barrier film on the container (PB) to be filmed, the other movable segment (1MB) receives a container on which a new barrier film is to be formed or hands over a container (PB) on which a barrier film has already been formed.

[0075] <Appendix 10> In any of Supplementary Notes 1 to 9, n (n: integer) fixed segments (1F) arranged at intervals on the circumference, n (n: integer) movable segments (1M) are arranged corresponding to each fixed segment (1F), a film forming processing unit (60) including a rotary table (67) that holds n movable segments (1M), is movable up and down in a vertical direction (V), and is rotatable around an axis (C); a rotary container supply unit (70) that holds n containers (PB) for forming a barrier film and supplies them to the film forming unit (60); and a rotary container discharge section (80) that receives n containers (PB) on which a barrier film has been formed in the film forming section (60).

[0076] <Appendix 11> an electromagnetic wave shield (21); an external electrode (13) surrounded by an electromagnetic wave shield (21); a dielectric layer (15) whose periphery is covered with the external electrode (13); an internal electrode (11) extending in a vertical direction (V) and disposed in a film-forming chamber (17) provided inside the dielectric layer (15); an insulator layer (19) disposed between the electromagnetic wave shield (21) and the external electrode (13) and covering the periphery of the external electrode (13); The electromagnetic wave shield (21) A barrier film forming device that functions as a vacuum chamber that can maintain a vacuum inside during film formation. [Explanation of symbols]

[0077] 1 First film deposition device 2 Second film deposition device 3 Third film deposition device 1F Fixed Segment 1M, 1MA, 1MB, 1MC, 1MD movable segments 1ME, 1MF, 1MG, 1MH movable segments 5 Base 11 Internal electrode 13 External electrode 131 Side wall 131A 1st side wall 131B 2nd side wall 132 Upper Wall 15 Dielectric Layer 151 Side wall 151A 1st side wall 151B 2nd side wall 152 Upper Wall 17 Deposition chamber 19 Insulator layer 191 First side wall 192 Second Side Wall 193 Upper Wall 21 Electromagnetic Shielding 211 Side wall 212 Upper Wall 23 Power connection terminal 24 O-rings 25 exhaust manifold 30 Supply and exhaust elements 31 Gripper 33 Lifting rod 40 Lifting and rotating section 41 Power Source 43 Drive shaft 45 Support stand 47A 1st movement mechanism 47B 2nd movement mechanism 50 Container supply / discharge section 51 Gripper 53 Running Track 60 Film forming processing section 61 Lifting and rotating part 63 Power Source 65 drive shaft 67 Rotating Table 69 Fixed Table 70 Container supply section 71 Rotating part 73 Power Source 75 drive shaft 77 Rotating Table 79 Gripper 80 Container discharge section 81 Rotating part 83 Power Source 85 drive shaft 87 Rotating Table 89 Gripper Af forming area At transfer area

Claims

1. Electromagnetic wave shielding; an external electrode whose periphery is covered with the electromagnetic wave shield; a dielectric layer whose periphery is covered with the external electrode; an internal electrode extending in a vertical direction and disposed in a film formation chamber provided inside the dielectric layer; a gripper that grips a container that is a film formation target and is accommodated in the film formation chamber, the external electrode, the dielectric layer, and the electromagnetic wave shield are divided into a fixed segment and a movable segment along a vertical direction, The movable segment is configured to be able to move up and down relative to the fixed segment, The barrier film forming apparatus, wherein the gripper belongs to the movable segment.

2. an insulating layer disposed between the electromagnetic wave shield and the external electrode and covering the periphery of the external electrode; The insulator layer is divided into the fixed segment and the movable segment. The barrier film forming apparatus according to claim 1 .

3. The electromagnetic wave shield is The container has a cylindrical side wall and an upper wall that closes an upper portion of the side wall, a portion of the side wall belongs to the fixed segment; the other portion of the side wall and the top wall belong to the movable segment; The barrier film forming apparatus according to claim 1 .

4. The external electrode is The container has a cylindrical side wall and an upper wall that closes an upper portion of the side wall, a portion of the side wall belongs to the fixed segment; the other portion of the side wall and the top wall belong to the movable segment; The barrier film forming apparatus according to claim 1 .

5. The dielectric layer is The container has a cylindrical side wall and an upper wall that closes an upper portion of the side wall, a portion of the side wall belongs to the fixed segment; the other portion of the side wall and the top wall belong to the movable segment; The barrier film forming apparatus according to claim 1 .

6. The insulator layer is The container has a cylindrical side wall and an upper wall that closes an upper portion of the side wall, a portion of the side wall belongs to the fixed segment; the other portion of the side wall and the top wall belong to the movable segment; The barrier film forming apparatus according to claim 2 .

7. The electromagnetic wave shield is It functions as a vacuum chamber that can maintain a vacuum inside during film formation. a seal is provided between a portion of the side wall belonging to the fixed segment and the top wall belonging to the movable segment; The barrier film forming apparatus according to claim 3 .

8. The gripper is The container on which the film is to be formed is held in an inverted position. The barrier film forming apparatus according to claim 1 .

9. One of the fixed segments; two of the movable segments; While one of the movable segment and the fixed segment is forming a barrier film on a container that is a film formation target, the other movable segment receives the container on which the barrier film is to be newly formed or transfers the container on which the barrier film has already been formed. The barrier film forming apparatus according to claim 3 .

10. n (n: integer) fixed segments spaced apart on a circumference; n (n: integer) movable segments arranged corresponding to the fixed segments; a film forming processing unit including a rotary table that holds the n movable segments, is vertically movable, and is rotatable about an axis; a rotary container supply unit that holds n containers for forming a barrier film and supplies them to the film forming processing unit; a rotary container discharge unit that receives the n containers on which the barrier film has been formed in the film forming unit; The barrier film forming apparatus according to claim 3 , comprising:

11. Electromagnetic wave shielding; an external electrode whose periphery is covered with the electromagnetic wave shield; a dielectric layer whose periphery is covered with the external electrode; an internal electrode extending in a vertical direction and disposed in a film formation chamber provided inside the dielectric layer; an insulating layer disposed between the electromagnetic wave shield and the external electrode and covering the periphery of the external electrode; The electromagnetic wave shield is It functions as a vacuum chamber that can maintain a vacuum inside during film deposition. Barrier film forming equipment.

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