Resin composition, light-shielding film, color filter, touch panel, and display device

Abstract

To provide a resin composition excellent in SUS washability, a light shielding film obtained by curing the resin composition, a color filter and a touch panel having the light shielding film as a black matrix, and a display device having the color filter or the touch panel.SOLUTION: A resin composition comprising (A) a soluble resin and (B) a black pigment, wherein a reflectance of a surface of a stainless steel substrate is 10% or more after a substrate with a dried film formed by attaching the resin composition to the surface of the stainless steel substrate and drying the resin composition at a temperature of 23°C and a humidity of 50% for 1 minute is immersed in propylene glycol monomethyl ether acetate for 1 minute.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a resin composition, a light-shielding film obtained by curing the resin composition, and a color filter, a touch panel, and a display device each having the light-shielding film. [Background technology]

[0002] In recent years, with the development of mobile terminals, there has been an increase in display devices with touch panels or liquid crystal panels, etc., for use outdoors or in vehicles. In display devices, a light-shielding film is provided on the outer frame of the touch panel to block light leakage from the periphery of the liquid crystal panel on the back, and a light-shielding film (black matrix) is provided on the liquid crystal panel to suppress light leakage from the screen when black is displayed and to suppress color mixing between adjacent color resists.

[0003] In order to form a light-shielding film (black matrix) for such applications, various photosensitive compositions have been proposed, each containing, for example, a light-shielding black pigment, a binder resin, and, if necessary, a photopolymerization initiator.

[0004] However, pigments such as the black pigment are usually micronized to have very small particle diameters and are insoluble in solvents, making it difficult to say that they are easy to clean once they are deposited. Furthermore, because the particle diameter is very small, they tend to aggregate, which poses problems such as a decrease in the dispersibility of the pigment and the storage stability of pigment dispersions and compositions using the pigment. Using a dispersant in combination with the pigment is considered effective as a method for improving the dispersibility of micronized pigments in pigment dispersions and compositions.

[0005] In recent years, there has been an increasing demand for light-shielding films (black matrices). To achieve this, it has become necessary to add a larger amount of black pigment or the like to the composition than before. Therefore, using a large amount of black pigment or the like raises concerns about the increased likelihood of aggregation and the formation of aggregates. Furthermore, the formation of aggregates not only reduces the properties of the light-shielding film, but also, according to the studies of the present inventors, when producing or using pigment dispersions or compositions containing such black pigments, the dispersions or compositions (or what appear to be aggregates) tend to remain in containers or piping used during the production or use, resulting in poor cleanability even when attempting to wash them with solvents or the like. In particular, there have been concerns about residues and reduced cleanability on stainless steel (SUS), which has been favorably used in the production of such pigment dispersions and compositions. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Japanese Patent Application Laid-Open No. 2014-152263 Summary of the Invention [Problem to be solved by the invention]

[0007] The present invention has been made in consideration of these points, and aims to provide a resin composition that has low residue, particularly on SUS, and excellent cleanability (hereinafter, these may be collectively referred to as "SUS cleanability"), even when a black pigment is used, a light-shielding film obtained by curing the resin composition, a color filter and touch panel having the light-shielding film, and a display device having the color filter or touch panel. Regarding the problems and objectives of the present invention, Patent Document 1 proposes a method for improving the dispersibility of pigments in pigment dispersions (carbon dispersions) by using a specific compound. However, despite the use of this specific compound, the zeta potential of the pigment dispersion is only about -9 mV, which is not sufficient for a pigment dispersion using carbon. Zeta potential indicates the surface potential of particles. Generally, as the absolute value of zeta potential increases, the charge on the particle surface increases. This leads to stronger repulsion between particles with positive or negative potentials, improving the stability of the dispersion. However, as the zeta potential approaches zero, the charge on the particle surface decreases, weakening the repulsive forces between particles, making the dispersion unstable and prone to aggregation. However, there is little knowledge about whether the zeta potential changes depending on the type of black pigment, surface treatment, dispersant amount, etc., or whether this affects the occurrence of aggregates (i.e., dispersibility). Furthermore, as mentioned above, it is not always clear how these factors affect the dispersion, especially when considering SUS cleanability. In other words, the reality is that when actually using the product in the form of a pigment dispersion, etc., we proceed while checking whether or not aggregates occur, and it was quite surprising that a resin composition with good SUS cleaning properties was discovered through such investigations. Therefore, it is also an object of the present invention to provide a method for evaluating the zeta potential and the degree of SUS cleanability of a black pigment through such investigations when developing a resin composition using a black pigment.Furthermore, it is also an object of the present invention to provide a method for evaluating the degree of SUS cleanability by utilizing the degree of removal of a dried film formed on a substrate by a predetermined test method and defining this as the degree of reflectance of the SUS surface. [Means for solving the problem]

[0008] That is, the gist of the present invention is as follows. [1] A resin composition comprising (A) a soluble resin and (B) a black pigment, The resin composition is applied to the surface of a stainless steel substrate, and the substrate with a dried film formed by drying the composition at a temperature of 23°C and a humidity of 50% for 1 minute is immersed in propylene glycol monomethyl ether acetate for 1 minute. The resulting stainless steel substrate has a reflectance of 10% or more. [2] The resin composition according to [1], wherein the (B) black pigment is a black pigment having a zeta potential of −110 to −30 mV as measured by electrophoretic light scattering when measured in a dispersion liquid containing (B1) an organic solvent as a dispersion medium. [3] The resin composition according to [2], wherein the black pigment (B) is one or more selected from the group consisting of carbon black as a black inorganic pigment, and lactam black, perylene black, cyanine black, and aniline black as black organic pigments. [4] The resin composition according to [1], wherein the (B) black pigment is a black pigment having a zeta potential of −10 to +30 mV as measured by electrophoretic light scattering in a dispersion liquid containing (B2) an organic solvent as a dispersion medium. [5] The resin composition according to [4], wherein the black pigment (B) is titanium black. [6] The resin composition according to [1], wherein (A) is an alkali-soluble resin containing an unsaturated group, and further contains (D) a photopolymerizable monomer having at least two unsaturated bonds and (E) a photopolymerization initiator. [7] A light-shielding film obtained by curing the resin composition according to any one of [1] to [6]. [8] A color filter having the light-shielding film according to [7] as a black matrix. [9] A touch panel having the light-shielding film according to [7] as a black matrix.

[10] A display device having the color filter according to [8].

[11] A display device having the touch panel described in [9]. [Effects of the Invention]

[0009] According to the present invention, it is possible to provide a resin composition that is excellent in SUS cleaning ability, a light-shielding film obtained by curing the resin composition, a color filter and a touch panel that have the light-shielding film as a black matrix, and a display device that has the color filter or the touch panel. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, an embodiment of the present invention will be described.

[0011] <Resin composition> The resin composition according to an embodiment of the present invention comprises (A) a soluble resin and (B) a black pigment, and is characterized in that the resin composition is applied to the surface of a stainless steel substrate, and the substrate is dried at a temperature of 23°C and a humidity of 50% for 1 minute to form a dried film. After the substrate is immersed in propylene glycol monomethyl ether acetate for 1 minute, the reflectance of the stainless steel substrate surface is 10% or more.

[0012] That is, by satisfying the above physical properties, the resin composition adhered to the surface of the stainless steel substrate and the dried film of the resin composition can be easily cleaned. Since the better the cleanability, the better the cleanability of the resin composition from the surface of the stainless steel substrate, the reflectance is preferably 25% or more.

[0013] Here, when evaluating these physical properties, known methods can be used to attach the resin composition to the surface of a stainless steel substrate. While not limited to these methods, a preferred example is a method in which the stainless steel substrate is immersed in the resin composition. The immersion conditions are preferably a fixed time (e.g., several seconds), more preferably 1 second, as shown in the Examples below. As a result, a dry film thickness in the range of 10 μm to 1 mm is formed. The reason for using a dry film formed under these specified conditions is that the coating film can be dissolved by washing with propylene glycol monomethyl ether acetate for 1 minute, leaving behind the film that is easily adhered to the stainless steel substrate, allowing for evaluation of cleanability. Furthermore, the reason for evaluating cleanability after immersing the substrate with the dry film in propylene glycol monomethyl ether acetate for 1 minute is that the coating film may not dissolve if the immersion time is shorter than 1 minute, whereas a film thickness of 10 μm to 1 mm sufficiently dissolves the coating.

[0014] The stainless steel used in this evaluation is not limited; austenitic stainless steel, ferritic stainless steel, martensitic stainless steel, duplex stainless steel, etc. can be used. Furthermore, with regard to the surface condition (surface treatment, surface finish, etc.) of the stainless steel (SUS), it is preferable to use SUS with the smoothness of SUS used in equipment, piping, etc., for manufacturing color filters using the pigment dispersion or resin composition of the present invention. The quality of SUS cleanability can be determined by testing using such SUS. For example, among the surface finishes specified in JIS G4305, a surface roughness (Ra) of 0.5 μm or less can be appropriately selected and used by a method that ensures a high level of smoothness equal to or greater than the No. 2B surface finish. In other words, if evaluation is performed using SUS with a surface finish of No. 2B, sufficient SUS cleanability can be obtained even when using SUS with a smoother finish.

[0015] In addition, the resin composition according to the embodiment of the present invention having the above-described properties may preferably be an embodiment in which the following (B1) or (B2) is used as the (B) black pigment.

[0016] That is, the resin composition according to the embodiment of the present invention preferably contains the following components (A) and (B1). (A) Soluble resin. (B1) A black pigment having a zeta potential of −110 to −30 mV as measured by electrophoretic light scattering in a dispersion liquid containing an organic solvent as a dispersion medium.

[0017] Furthermore, the resin composition according to another embodiment of the present invention preferably contains the following components (A) and (B2). (A) Soluble resin. (B2) A black pigment having a zeta potential of −10 to +30 mV as measured by electrophoretic light scattering in a dispersion liquid containing an organic solvent as a dispersion medium. These components may be referred to as component (A), component (B1), component (B2), etc. Each component will be explained below.

[0018] (A) Soluble resin The soluble resin (A) contained in the resin composition of the present invention will be described below.

[0019] The soluble resin (A) can be any resin that is soluble in a solvent and dissolves when mixed with component (B) [component (B1) and / or component (B2)] in a resin composition without forming aggregates. Component (A) can be either thermosetting or photocurable, and can include various resin forms, such as homopolymers, copolymers, and oligomers. Examples of component (A) include (meth)acrylic resins (meaning acrylic resins and / or methacrylic resins, including (meth)acrylic acid), enethiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, and silicone resins. These resins may be used alone or in combination.

[0020] Component (A) is more preferably an unsaturated group-containing alkali-soluble resin that has the above-mentioned properties, an acid value sufficient to impart alkaline developability, and, in combination with the photopolymerizable monomer of component (D) described below, provides appropriate photocurability. Any known unsaturated group-containing alkali-soluble resin can be used without limitation, but the following are more preferred because they can sufficiently enhance the pattern adhesion, pattern linearity, and pattern definition of the cured product.

[0021] A first example of an unsaturated group-containing alkali-soluble resin that can be preferably used as component (A) is an epoxy(meth)acrylate acid adduct obtained by reacting a compound having two or more epoxy groups with (meth)acrylic acid, and then reacting the resulting epoxy(meth)acrylate compound having hydroxy groups with (a) a dicarboxylic acid or tricarboxylic acid or its monoanhydride and / or (b) a tetracarboxylic acid or its dianhydride. Examples of compounds having two or more epoxy groups that can be used to produce the epoxy(meth)acrylate acid adduct include bisphenol-type epoxy compounds and novolac-type epoxy compounds. Specifically, preferred examples include bisphenol-type epoxy compounds represented by the following general formula (I):

[0022] [ka]

[0023] In general formula (I), R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a halogen atom, or a phenyl group; A represents -CO-, -SO2-, -C(CF3)2-, -Si(CH3)2-, -CH2-, -C(CH3)2-, -O-, a fluorene-9,9-diyl group, or a direct bond; l is an integer of 0 to 10. R1, R2, R3, and R4 are preferably hydrogen atoms, and A is preferably a fluorene-9,9-diyl group. Since l typically contains multiple values, its average value is 0 to 10 (not necessarily an integer), but the average value of l is preferably 0 to 3. Hereinafter, the general formula (I) will be described assuming l=0.

[0024] Bisphenol-type epoxy compounds are epoxy compounds having two glycidyl ether groups obtained by reacting bisphenols with epichlorohydrin. This reaction generally involves oligomerization of the diglycidyl ether compound, and therefore includes epoxy compounds containing two or more bisphenol skeletons.

[0025] The bisphenols used in this reaction include bis(4-hydroxyphenyl) ketone, bis(4-hydroxy-3,5-dimethylphenyl) ketone, bis(4-hydroxy-3,5-dichlorophenyl) ketone, bis(4-hydroxyphenyl) sulfone, bis(4-hydroxy-3,5-dimethylphenyl) sulfone, bis(4-hydroxy-3,5-dichlorophenyl) sulfone, bis(4-hydroxyphenyl)hexafluoropropane, bis(4-hydroxy-3,5-dimethylphenyl)hexafluoropropane, bis(4-hydroxy-3,5-dichlorophenyl)hexafluoropropane, bis(4-hydroxyphenyl) 2,2-bis(4-hydroxyphenyl)propane, 2,2-bis(4-hydroxy-3,5-dimethylphenyl)propane, 2,2-bis(4-hydroxy-3,5-dichlorophenyl)propane, 2,2-bis(4-hydroxy-3,5-dichlorophenyl)propane, 2,2-bis(4-hydroxy-3-methylphenyl)propane, 2,2-bis(4-hydroxy-3- chlorophenyl)propane, bis(4-hydroxyphenyl)ether, bis(4-hydroxy-3,5-dimethylphenyl)ether, bis(4-hydroxy-3,5-dichlorophenyl)ether, 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(4-hydroxy-3-methylphenyl)fluorene, 9,9-bis(4-hydroxy-3-chlorophenyl)fluorene, 9, 9-bis(4-hydroxy-3-bromophenyl)fluorene, 9,9-bis(4-hydroxy-3-fluorophenyl)fluorene, 9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene, 9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene, 9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene, 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene, 9,9-bis[4-(2-hydroxyethoxy)phenyl]fluorene, 4,4'-biphenol, 3,3'-biphenol, etc. Among these, bisphenols having a fluorene-9,9-diyl group are particularly preferred.

[0026] The (a) dicarboxylic or tricarboxylic acid monoanhydride to be reacted with the epoxy (meth)acrylate obtained by reacting such an epoxy compound with (meth)acrylic acid may be a chain hydrocarbon dicarboxylic or tricarboxylic acid monoanhydride, an alicyclic dicarboxylic or tricarboxylic acid monoanhydride, or an aromatic dicarboxylic or tricarboxylic acid monoanhydride. Examples of the chain hydrocarbon dicarboxylic or tricarboxylic acid monoanhydride include succinic acid, acetylsuccinic acid, maleic acid, adipic acid, itaconic acid, azelaic acid, citramalic acid, malonic acid, glutaric acid, citric acid, tartaric acid, oxoglutaric acid, pimelic acid, sebacic acid, suberic acid, and diglycolic acid monoanhydrides, and may also be dicarboxylic or tricarboxylic acid monoanhydrides having any substituent introduced therein. Furthermore, examples of the acid monoanhydrides of alicyclic dicarboxylic acids or tricarboxylic acids include acid monoanhydrides such as cyclobutanedicarboxylic acid, cyclopentanedicarboxylic acid, hexahydrophthalic acid, tetrahydrophthalic acid, methyltetrahydrophthalic acid, methylendomethylenetetrahydrophthalic acid, chlorendic acid, hexahydrotrimellitic acid, and norbornanedicarboxylic acid, and may also include acid monoanhydrides of dicarboxylic acids or tricarboxylic acids into which any substituent has been introduced. Furthermore, examples of the acid monoanhydrides of aromatic dicarboxylic acids or tricarboxylic acids include acid monoanhydrides such as phthalic acid, isophthalic acid, trimellitic acid, 1,8-naphthalenedicarboxylic acid, and 2,3-naphthalenedicarboxylic acid, and may also include acid monoanhydrides of dicarboxylic acids or tricarboxylic acids into which any substituent has been introduced.

[0027] The (b) tetracarboxylic acid dianhydride to be reacted with the epoxy (meth)acrylate may be a dianhydride of a chain hydrocarbon tetracarboxylic acid, a dianhydride of an alicyclic tetracarboxylic acid, or a dianhydride of an aromatic tetracarboxylic acid. Examples of the dianhydride of a chain hydrocarbon tetracarboxylic acid include butane tetracarboxylic acid, pentane tetracarboxylic acid, and hexane tetracarboxylic acid, and may also include a dianhydride of a tetracarboxylic acid having an optional substituent introduced therein. Examples of the dianhydride of a alicyclic tetracarboxylic acid include cyclobutane tetracarboxylic acid, cyclopentane tetracarboxylic acid, cyclohexane tetracarboxylic acid, cycloheptane tetracarboxylic acid, and norbornane tetracarboxylic acid, and may also include a dianhydride of a tetracarboxylic acid having an optional substituent introduced therein. Furthermore, examples of the acid dianhydride of an aromatic tetracarboxylic acid include acid dianhydrides such as pyromellitic acid, benzophenone tetracarboxylic acid, biphenyl tetracarboxylic acid, biphenyl ether tetracarboxylic acid, diphenyl sulfone tetracarboxylic acid, naphthalene-1,4,5,8-tetracarboxylic acid, and naphthalene-2,3,6,7-tetracarboxylic acid, and further may be acid dianhydrides of tetracarboxylic acids into which any substituent has been introduced.

[0028] The molar ratio (a) / (b) of (a) a dicarboxylic or tricarboxylic acid monoanhydride to (b) a tetracarboxylic acid dianhydride to be reacted with the epoxy (meth)acrylate is preferably 0.01 or more and 10.0 or less, more preferably 0.02 or more and less than 3.0. When the molar ratio (a) / (b) is within the above range, it is easy to obtain an optimum molecular weight for preparing a photosensitive resin composition having good photopatterning properties, and alkali solubility is not impaired, which is preferable.

[0029] The reaction of an epoxy compound with (meth)acrylic acid and the reaction of the resulting epoxy (meth)acrylate with a polybasic carboxylic acid or its acid anhydride are not particularly limited, and known methods can be employed. For example, they can be produced by methods described in JP-A-8-278629 and JP-A-2008-9401. First, a method for reacting an epoxy compound with (meth)acrylic acid includes adding an equimolar amount of (meth)acrylic acid to a solvent relative to the epoxy groups of the epoxy compound, and then heating and stirring the mixture at 90 to 120°C while blowing in air in the presence of a catalyst (e.g., triethylbenzylammonium chloride, 2,6-diisobutylphenol). Next, a method for reacting an acid anhydride with the hydroxyl groups of the epoxy acrylate compound, the reaction product, includes adding predetermined amounts of an epoxy acrylate compound, an acid dianhydride, and an acid monoanhydride to a solvent, and then heating and stirring the mixture at 90 to 130°C in the presence of a catalyst (e.g., tetraethylammonium bromide, triphenylphosphine). The epoxy acrylate acid adduct obtained by this method has a skeleton of general formula (II).

[0030] [ka]

[0031] In formula (II), R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a halogen atom, or a phenyl group; A represents -CO-, -SO2-, -C(CF3)2-, -Si(CH3)2-, -CH2-, -C(CH3)2-, -O-, a fluorene-9,9-diyl group, or a direct bond; X represents a tetravalent carboxylic acid residue; Y1 and Y2 each independently represent a hydrogen atom or -OC-Z-(COOH)m (wherein Z represents a divalent or trivalent carboxylic acid residue and m represents a number of 1 to 2); and n represents an integer of 1 to 20.

[0032] A second example of an unsaturated group-containing alkali-soluble resin that can be preferably used as component (A) is a copolymer of (meth)acrylic acid, a (meth)acrylic acid ester, etc., and includes a resin having a (meth)acryloyl group and a carboxy group. Examples of such resins include alkali-soluble resins containing polymerizable unsaturated groups that can be obtained by copolymerizing a (meth)acrylic acid ester containing glycidyl (meth)acrylate in a solvent to obtain a copolymer, reacting the copolymer with (meth)acrylic acid, and finally reacting the copolymer with an anhydride of a dicarboxylic acid or tricarboxylic acid. Examples of the copolymer include a copolymer disclosed in Japanese Patent Laid-Open No. 2014-111722, which is composed of 20 to 90 mol% of repeating units derived from diester glycerol in which the hydroxyl groups at both ends are esterified with (meth)acrylic acid, and 10 to 80 mol% of repeating units derived from one or more polymerizable unsaturated compounds copolymerizable therewith, and which has a number average molecular weight (Mn) of 2,000 to 20,000 and an acid value of 35 to 120 mgKOH / g; and a polymerizable unsaturated group-containing alkali-soluble resin disclosed in Japanese Patent Laid-Open No. 2018-141968, which is a polymer having a weight average molecular weight (Mw) of 3,000 to 50,000 and an acid value of 30 to 200 mg / KOH, and which includes units derived from (meth)acrylic acid ester compounds and units having a (meth)acryloyl group and a di- or tricarboxylic acid residue.

[0033] Furthermore, a third example of an unsaturated group-containing alkali-soluble resin that can be preferably used as component (A) is a urethane compound obtained by reacting a polyol compound having an ethylenically unsaturated bond in the molecule as a first component, a diol compound having a carboxyl group in the molecule as a second component, and a diisocyanate compound as a third component. For examples of resins of this type, see JP 2017-76071 A.

[0034] The weight-average molecular weight (Mw) of component (A) is typically preferably 2,000 to 10,000, and more preferably 3,000 to 8,000. If the weight-average molecular weight (Mw) is less than 2,000, the pattern adhesion during development cannot be maintained, making the pattern more susceptible to peeling. If the weight-average molecular weight (Mw) exceeds 10,000, development residues and residual films in unexposed areas are more likely to remain. Furthermore, the acid value of component (A) is preferably in the range of 30 to 200 mgKOH / g. If this value is less than 30 mgKOH / g, alkaline development may not proceed smoothly or special development conditions, such as a strong alkali, may be required. If the value exceeds 200 mgKOH / g, the alkaline developer may penetrate too quickly, making peeling more likely.

[0035] The content of component (A) in the solid content of the resin composition is preferably 1% by mass or more and 50% by mass or less, more preferably 5% by mass or more and 40% by mass or less, and even more preferably 10% by mass or more and 30% by mass or less. The content of component (A) can be adjusted together with component (D) described below, and is preferably adjusted in accordance with the content of the black pigment in component (B) described below [component (B1) and / or component (B2)]. That is, since an increase in the content of the black pigment reduces the contents of components (A) and (D), which may affect curability, developability, etc., it is preferable to adjust the contents of components (A) and (D) in accordance with the content of the black pigment.

[0036] (B) Black pigment The (B) black pigment may be any known component, such as one or more light-shielding materials selected from the group consisting of black organic pigments, mixed-color organic pigments, and black inorganic pigments, but it is preferable to use the following (B1) component and / or (B2) component. As described below, the (B) black pigment may also be considered as a black pigment dispersion.

[0037] (B1) Black pigment Component (B1), a preferred embodiment of the (B) black pigment, is a black pigment having a zeta potential of -110 to -30 mV as measured by electrophoretic light scattering in a dispersion using an organic solvent as the dispersion medium. By using component (B1) with such zeta potential characteristics, a resin composition with excellent SUS cleaning properties can be provided. Since component (B1) has these characteristics and embodiments, it may be interpreted as a black pigment or a black pigment dispersion.

[0038] Here, the organic solvent serving as the dispersion medium is not particularly limited, and examples thereof include organic solvents generally used as dispersion media for black pigments. For example, alcohols such as methanol, ethanol, n-propanol, isopropanol, ethylene glycol, propylene glycol, 3-methoxy-1-butanol, ethylene glycol monobutyl ether, 3-hydroxy-2-butanone, and diacetone alcohol; terpenes such as α- or β-terpineol; ketones such as acetone, methyl ethyl ketone, cyclohexanone, and N-methyl-2-pyrrolidone; aromatic hydrocarbons such as toluene, xylene, and tetramethylbenzene; methyl cellosolve, ethyl cellosolve, methyl carbitol, ethyl carbitol, butyl carbitol, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, propylene glycol monomethyl ether, and propylene glycol. Examples of suitable organic solvents include glycol ethers such as ethanol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, triethylene glycol monomethyl ether, and triethylene glycol monoethyl ether; and esters such as ethyl acetate, butyl acetate, ethyl lactate, 3-methoxybutyl acetate, 3-methoxy-3-butyl acetate, 3-methoxy-3-methyl-1-butyl acetate, 3-methoxypropionate, 3-ethoxypropionate, cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, carbitol acetate, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate. These organic solvents may be used alone or in combination.

[0039] In addition, known dispersants, such as various polymeric dispersants, can be used in the dispersion. Examples of dispersants include, without limitation, known compounds conventionally used in pigment dispersions (compounds commercially available under the names of dispersants, dispersing wetting agents, dispersion promoters, etc.), but examples include cationic polymeric dispersants, anionic polymeric dispersants, nonionic polymeric dispersants, and pigment derivative dispersants (dispersion aids). Cationic polymeric dispersants that have cationic functional groups, such as imidazolyl groups, pyrrolyl groups, pyridyl groups, or primary, secondary, or tertiary amino groups, as adsorption sites for the pigment, and that have an amine value of 1 to 100 mgKOH / g and a number-average molecular weight of 1,000 to 100,000 are particularly suitable. The amount of this dispersant to be added is preferably 1 to 30% by mass of component (B).

[0040] The zeta potential is preferably -110 to -30 mV. Such a zeta potential not only improves the dispersion stability of component (B1), but also provides a resin composition that is free of aggregates, has high dispersion stability, and is excellent in SUS cleaning properties. The lower limit of the zeta potential of component (B1) is more preferably -105 mV or higher, and even more preferably -100 mV or higher. Meanwhile, the upper limit of the zeta potential is more preferably -65 mV or lower, and even more preferably -70 mV or lower.

[0041] Zeta potential generally refers to the potential at the sliding surface, which is the boundary between the ion immobilization layer formed around the fine particles and the ion diffusion layer located outside it. It serves as an index for evaluating the dispersion and aggregation properties of colloids. Generally, as the absolute value of the zeta potential approaches zero, particle aggregation becomes more likely and dispersion stability decreases, while as the absolute value of the zeta potential increases, particle aggregation becomes less likely and dispersion stability tends to improve. In the present invention, the zeta potential is measured by electrophoretic light scattering. This method is preferred because it allows the zeta potential to be calculated by irradiating electrophoretically moving particles with laser light and measuring the frequency shift of the scattered light. More specifically, the zeta potential measured using a zeta potential measuring device under conditions of an applied voltage of 200 V or higher is preferably used as the zeta potential in the present invention. Using a zeta potential measured under these conditions is preferred because it allows particles to electrophoretically move even in organic solvents.

[0042] Here, the component (B1) may be either a black inorganic pigment and / or a black organic pigment depending on the application, etc., as long as it satisfies the above-mentioned zeta potential. One or more of these black inorganic pigments and / or black organic pigments can be used. Examples of black inorganic pigments include carbon black, and metal pigments such as metal oxides, metal nitrides, and metal oxide nitrides containing one or more metal elements selected from the group consisting of Zr, Nb, V, Mn, Fe, Ni, Sn, and Ag. Examples of black organic pigments include lactam black, perylene black, cyanine black, and aniline black. Mixed-color organic pigments, which are pseudo-black pigments obtained by mixing two or more pigments selected from red, blue, green, purple, yellow, cyanine, magenta, etc., can also be used as black organic pigments.

[0043] Among these, black inorganic pigments are preferred from the viewpoints of light-shielding properties, surface smoothness, dispersion stability, compatibility with resins, etc., and carbon black is more preferred.

[0044] The particle size of carbon black is not limited, but considering dispersibility in black matrix formation, for example, the average secondary particle size is usually 300 nm or less, preferably 200 nm or less, and more preferably 150 nm or less. By keeping the particle size within this range, the surface of the coating film becomes smooth. Although there is no lower limit for the average secondary particle size, as the particle size decreases, the surface area increases, making the particles more susceptible to aggregation and sedimentation. Therefore, the average secondary particle size is preferably 5 nm or more, more preferably 10 nm or more, and even more preferably 20 nm or more. The average secondary particle size can be measured using a dynamic light scattering particle size analyzer or a laser diffraction / scattering particle size distribution analyzer.

[0045] Furthermore, the carbon black may be untreated carbon black that has not been subjected to a special surface treatment such as an oxidation treatment or a resin coating treatment, carbon black whose surface has been treated with some kind of oxidizing agent before the dispersion step, or surface-coated carbon black whose surface has been coated with a dye, pigment, resin, or the like.

[0046] In one preferred embodiment, acidic functional groups are provided on the surface by oxidation treatment. While known oxidation methods can be used, it is particularly preferable to provide two or more types of acidic functional groups on the surface by multiple oxidation treatments. The acidic functional groups can improve the dispersibility of carbon black. Examples of oxidation treatments include treatments using ozone gas, nitric acid, sodium hypochlorite, hydrogen peroxide, nitric oxide gas, nitrogen dioxide gas, sulfuric anhydride, fluorine gas, concentrated sulfuric acid, nitric acid, and various peroxides. Examples of acidic functional groups include hydroxyl groups, oxo groups, hydroperoxy groups, carbonyl groups, carboxyl groups, peroxycarboxylic acid groups, aldehyde groups, ketone groups, nitro groups, nitroso groups, amide groups, imide groups, sulfonic acid groups, sulfinic acid groups, sulfenic acid groups, thiocarboxylic acid groups, chlorosyl groups, chloryl groups, perchloryl groups, iodosyl groups, and iodyl groups.

[0047] Although known methods can be used for surface-coated carbon black, the use of carbon black whose surface is coated with a dye is particularly preferred because it satisfies the above-mentioned zeta potential and provides excellent dispersion stability and SUS cleanability. It also enhances the developability of the resin composition and can improve the adhesion to the substrate, fine line reproducibility, and light-shielding properties of the cured film obtained by curing the resin composition.

[0048] The dye may be any dye capable of adsorbing to the surface of the light-shielding material, and may be a basic dye, an acid dye, a direct dye, a reactive dye, or the like. When an acidic functional group is added to the surface of a black pigment (especially carbon black) (oxidation treatment is performed) to enhance its dispersibility, an acid dye (especially an acid dye having a sulfonic acid group or a carboxyl group) that easily interacts with the acidic functional group is preferred. When component (A) has an acidic group, acid dyes or nonionic dyes are preferred over dyes having an amino group or the like in order to suppress reaction with the acidic group. Furthermore, dark-colored dyes are preferred in order to further enhance the light-shielding properties of the cured film.

[0049] Specific examples of the dyes include food coloring dyes such as Food Black No. 1, Food Black No. 2, Food Red No. 40, Food Blue No. 1, and Food Yellow No. 7; acid dyes of various colors such as Bernacid Red 2BMN, Basacid Black X34 (BASF X-34) (manufactured by BASF), Kayanol Red 3BL (manufactured by Nippon Kayaku Company), Dermacarbon 2GT (manufactured by Sandoz); Telon Fast Yellow 4GL-175, BASF Basacid Black SE 0228, Basacid Black X34 (BASF X-34) (manufactured by BASF), Basacid Blue 750 (manufactured by BASF), Bernacid Red (manufactured by Bemcolors, Poughkeepsie, NY), and BASF Basacid Black SE 0228 (manufactured by BASF); Pontamine Brilliant Bond Blue A and other Pontamine Brilliant dyes. Bond Blue A and other Pontamine® dyes (Bayer Chemicals Corporation, Pittsburgh, PA), Cartasol Yellow GTF Presscake (Sandoz, Inc.); Cartasol Yellow GTF Liquid Special 110 (Sandoz, Inc.); Yellow Shade 16948 (Tricon), Direct Brilliant Pink B (Crompton & Knowles), Carta Black 2GT (Sandoz, Inc.), Sirius Supra Yellow GD 167, Cartasol Brilliant Yellow 4GF (Sandoz), Pergasol Yellow CGP (Ciba-Geigy), Pyrazol Black BG (JCI), Diazol Black RN Quad (JCJ), Pontamine Brilliant Bond Blue; Berncolor AYDirect dyes of various colors such as Cibacron Brilliant Red 3B-A (Reactive Red 4) (Aldrich Chemical, Milwaukee, WI), Drimarene Brilliant Red X-2B (Reactive Red 56) (Pylam Products, Inc., Tempe, AZ), Levafix Brilliant Red E-4B, Levafix Brilliant Red F-6BA, and similar dyes available from Levafix® dyes Dystar LP (Charlotte, NC), reactive dyes of various colors such as Procion Red H8B (Reactive Red 31) (JCI America), Neozapon Red 492 (BASF), Orasol Red G (Ciba-Geigy), Aizen Spilon Red C-BH (Hodogaya Chemical Company), Spirit Fast Yellow 3G, and Aizen Spilon Yellow Examples of suitable dyes include oil-soluble dyes such as C-GNH (manufactured by Hodogaya Chemical Company), Orasol Black RL (manufactured by Ciba-Geigy), Orasol Black RLP (manufactured by Ciba-Geigy), Savinyl Black RLS (manufactured by Sandoz), Orasol Blue GN (manufactured by Ciba-Geigy), Luxol Blue MBSN (manufactured by Morton-Thiokol), and Morfast Black Concentrate A (manufactured by Morton-Thiokol). These may be used alone or in combination of two or more.

[0050] The dye content in the dye-coated carbon black is preferably 0.5% to 10% by mass, and more preferably 1% to 7% by mass, based on the total mass of the dye-coated carbon. By ensuring that the amount of dye is not excessive, it is possible to prevent thickening of the resin composition due to excess dye and aggregation due to the excess dye inhibiting the dispersibility of other components.

[0051] The dye may also be laked with a metal or metal salt. By laked, the dye can be fixed to the surface of the black pigment via the metal or metal salt, thereby preventing the above-mentioned effects from being reduced due to the dye's detachment from the surface. Examples of metals include aluminum, magnesium, calcium, strontium, barium, and manganese. Examples of metal salts include the hydrochlorides and sulfates of these metals. The content of the metal or metal salt is preferably at least 0.3 times the molar amount of the dye, more preferably 0.5 times the molar amount, and even more preferably 0.8 times the molar amount.

[0052] The blending ratio of the (B1) component can be determined arbitrarily depending on the desired dispersion stability, SUS washability, light blocking degree, etc., but is preferably 20 to 95 mass % and more preferably 40 to 90 mass % based on the solid content in the resin composition.

[0053] (B2) Black pigment Component (B2), a preferred embodiment of the black pigment (B), is characterized in that it has a zeta potential of -10 to +30 mV as measured by electrophoretic light scattering in a dispersion using an organic solvent as the dispersion medium. As with component (B1), component (B2) having such zeta potential characteristics can be used in another embodiment to provide a resin composition with excellent SUS cleaning properties. Similarly to component (B1), component (B2) has the same characteristics and embodiments, and therefore may be considered a black pigment or a black pigment dispersion.

[0054] By setting the zeta potential to -10 to +30 mV, not only is the dispersion stability of component (B2) improved, but also a resin composition can be provided that is free of aggregates, has high dispersion stability, and is excellent in SUS cleaning properties. The lower limit of the zeta potential of component (B2) is preferably 0 mV or more, and more preferably 5 mV or more. On the other hand, the upper limit of the zeta potential is preferably +25 mV or less, and more preferably +20 mV or less.

[0055] Here, examples of the organic solvent that serves as the dispersion medium in the component (B2) and the dispersants that can be used include the same as those for the component (B1).

[0056] The component (B2) may be any of the above-mentioned black inorganic pigments and / or black organic pigments depending on the application, etc., as long as it satisfies the above-mentioned zeta potential, and one or more of these black inorganic pigments and / or black organic pigments can be used. Of these, titanium black is more preferred from the viewpoints of light-blocking properties, dispersion stability, insulating properties, refractive index, etc., while still satisfying the above-mentioned zeta potential for the component (B2).

[0057] Titanium black is a titanium-containing black inorganic pigment, typically a low-order titanium oxide or titanium oxynitride. Among these, titanium black exhibiting high insulating properties is preferred. Two or more types of titanium black may be used in combination. Methods for producing titanium black include, but are not limited to, a method in which a mixture of titanium dioxide and metallic titanium is heated and reduced in a reducing atmosphere (Japanese Patent Laid-Open Publication No. 49-5432), a method in which ultrafine titanium dioxide obtained by high-temperature hydrolysis of titanium tetrachloride is reduced in a reducing atmosphere containing hydrogen (Japanese Patent Laid-Open Publication No. 57-205322), a method in which titanium dioxide or titanium hydroxide is reduced at high temperatures in the presence of ammonia (Japanese Patent Laid-Open Publication Nos. 60-65069 and 61-201610), and a method in which a vanadium compound is attached to titanium dioxide or titanium hydroxide and then reduced at high temperatures in the presence of ammonia (Japanese Patent Laid-Open Publication No. 61-201610).

[0058] These titanium blacks (titanium-containing black inorganic pigments) may also be inorganic particles whose surfaces are coated with an organic or inorganic compound. Examples of organic compounds used for coating include polyhydric alcohols, alkanolamines or their derivatives, organosilicon compounds (polysiloxanes, silane-based coupling agents, etc.), higher fatty acids or their metal salts, and organometallic compounds (titanium-based coupling agents, aluminum-based coupling agents, etc.). On the other hand, examples of inorganic compounds used for coating include aluminum compounds, silicon compounds, zirconium compounds, tin compounds, titanium compounds, and antimony compounds. The surface coating of these titanium-containing particles can be performed using the method described in JP-A-2006-206891, for example.

[0059] Examples of commercially available titanium black products include Mitsubishi Materials' Titanium Black 10S, 12S, 13M, 13M-T, 13M-C, 13R, 13R-N, and UF8, and Ako Kasei's Tilack D ("Tilack D" is a registered trademark of the company).

[0060] The particle size of titanium black is not limited. However, considering factors such as dispersibility in black matrix formation, the average particle size is typically 300 nm or less, preferably 200 nm or less, more preferably less than 100 nm, and even more preferably 80 nm or less. As the particle size decreases, the distance between particles can be relatively increased, which is thought to contribute to improved insulating properties, lower dielectric constant, and increased volume resistivity when formed into a cured film. While there is no lower limit for the average particle size, as the particle size decreases, the surface area increases, making the particles more susceptible to aggregation and sedimentation. Therefore, a lower limit for the average particle size is preferably 5 nm or more, more preferably 10 nm or more, and even more preferably 20 nm or more. The average particle size can be measured using a dynamic light scattering particle size analyzer or a laser diffraction / scattering particle size distribution analyzer.

[0061] The blending ratio of component (B2) can also be determined arbitrarily depending on the desired dispersion stability, SUS cleanability, light blocking degree, etc., but it is preferably 20 to 95 mass % and more preferably 40 to 90 mass % based on the solid content in the resin composition.

[0062] The resin composition of the present invention may be either thermosetting or photocurable, but as described above, it is a preferred embodiment to use an unsaturated group-containing alkali-soluble resin as component (A), which is a resin with appropriate photocurability, and therefore it is preferred to further include (D) a photopolymerizable monomer having at least two unsaturated bonds and (E) a photopolymerization initiator. Each of these will be explained below.

[0063] (D) Photopolymerizable monomer having at least two unsaturated bonds The component (D) can serve to crosslink molecules of the unsaturated group-containing alkali-soluble resin, which is a preferred embodiment of the component (A). Examples of the component (D) include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, tetramethylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethane tri(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, glycerol (meth)acrylate, and the like. Examples of suitable dendritic polymers include (meth)acrylic acid esters such as glycerol di(meth)acrylate, glycerol tri(meth)acrylate, sorbitol penta(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, sorbitol hexa(meth)acrylate, alkylene oxide-modified hexa(meth)acrylate of phosphazene, and caprolactone-modified dipentaerythritol hexa(meth)acrylate, as well as dendritic polymers having (meth)acroyl groups. One or more of these may be used. Examples of dendritic polymers having (meth)acroyl groups include known dendritic polymers obtained by adding a thiol group in a polyvalent mercapto compound to a portion of the carbon-carbon double bond in the (meth)acroyl group of a polyfunctional (meth)acrylate compound.

[0064] Since the component (D) fulfills the above-mentioned role, it is more preferable to use one having two or more unsaturated bonds (e.g., ethylenically unsaturated bonds) in order to exert its function. Also, it is sufficient that the acrylic equivalent, calculated by dividing the molecular weight of the monomer by the number of (meth)acryloyl groups in one molecule, is 50 to 300.

[0065] The blending ratio of component (D) to component (A) is 50 / 50 to 90 / 10 by mass, preferably 60 / 40 to 80 / 20, in terms of (A) / (D). If the blending ratio of component (A) is less than 50 / 50, the photocured product may become brittle. Furthermore, the low acid value of the coating film in the unexposed areas may reduce solubility in alkaline developers, resulting in jagged and unsharp pattern edges. If the blending ratio of component (A) is more than 90 / 10, the proportion of photoreactive functional groups in the resin may be low, resulting in insufficient formation of crosslinked structures. Furthermore, the acid value of the resin component may be too high, potentially increasing solubility in alkaline developers in the exposed areas. This may result in problems such as the formed pattern being narrower than the target line width or pattern defects.

[0066] (E) Photopolymerization initiator (E) Examples of the photopolymerization initiator include acetophenones such as acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, and benzyl dimethyl ketal; benzophenone, 2-chlorobenzophenone, p,p'-bisdimethylaminobenzophenone, 4,4'-bisdimethylaminobenzophenone (Michler's ketone), 4-phenylbenzophenone, and 4,4'-dichlorobenzophenone; Benzophenones such as hydroxybenzophenone and 4,4'-diethylaminobenzophenone; benzoin ethers such as benzil, benzoin, benzoin methyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; 2-(o-chlorophenyl)-4,5-phenylbiimidazole, 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl)biimidazole, 2-(o-fluorophenyl)-4,5-diphenylbiimidazole, 2-(o-methoxyphenyl)-4,5-diphenylbiimidazole, 2,4, Biimidazole compounds such as 5-triarylbiimidazole and 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2-biimidazole; halomethyldiazole compounds such as 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5-(p-cyanostyryl)-1,3,4-oxadiazole, and 2-trichloromethyl-5-(p-methoxystyryl)-1,3,4-oxadiazole; 2,4,6-tris(trichloromethyl)-1,3,5-triazine, 2-methyl- 4,6-bis(trichloromethyl)-1,3,5-triazine, 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-chlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(3,4,Halomethyl-s-triazine compounds such as 5-trimethoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine and 2-(4-methylthiostyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine; 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(O-benzoyloxime), 1-(4-phenylsulfanylphenyl)butane-1,2-dione-2-oxime-O-benzoate, 1-(4-methylsulfanylphenyl)butane-1,2-Dione-2-oxime-O-acetate, 1-(4-methylsulfanylphenyl)butan-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-bicycloheptyl-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-adamantylmethan-1-one oxime-O-benzoate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol- 3-yl]-adamantylmethan-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-tetrahydrofuranylmethan-1-one oxime-O-benzoate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-tetrahydrofuranylmethan-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-thiophenylmethan-1-one Oxime-O-benzoate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-thiophenylmethane-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-morphonylmethane-1-one oxime-O-benzoate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-morphonylmethane-1-one oxime-O-acetate, 1-[9-ethyl-6-(2 -methylbenzoyl)-9H-carbazol-3-yl]-ethan-1-one oxime-O-bicycloheptanecarboxylate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-ethan-1-one oxime-O-tricyclodecanecarboxylate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-ethan-1-one oxime-O-adamantanecarboxylate, 1-[4-(phenylsulfanyl)phenyl]octane-1,2-Dione = 2-O-benzoyloxime, 1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethanone-O-acetyloxime, (2-methylphenyl)(7-nitro-9,9-dipropyl-9H-fluoren-2-yl)-acetyloxime, Ethanone, 1-[7-(2-methylbenzoyl)-9,9-dipropyl-9H-fluoren-2-yl]-1-(o-acetyloxime), Ethanone, 1-(-9,9-dibutyl-7-nitro-9H-fluoren-2-yl)-1-O-acetate O-Acyloxime compounds such as acetyl oxime, ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(O-acetyl oxime); sulfur compounds such as thioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone; 2-ethyl Anthraquinones such as 1,2-benzanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, and 2,3-diphenylanthraquinone; organic peroxides such as azobisisobutylnitrile, benzoyl peroxide, and cumene peroxide; 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, β-mercaptopropionic acid, 2-ethylhexyl-3-mercaptopropionate, n-octyl-3-mercaptopropionate, and methoxybutyl-3- Mercaptopropionate, stearyl-3-mercaptopropionate, trimethylolpropane tris(3-mercaptopropionate), tris-[(3-mercaptopropionyloxy)-ethyl]-isocyanurate, pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptopropionate), tetraethylene glycol bis(3-mercaptopropionate), dipentaerythritol hexakis(3-mercaptopropionate), 3,Examples of suitable photopolymerization initiators include thiol compounds such as 3'-thiodipropionic acid, dithiodipropionic acid, and laurylthiopropionic acid. Among these, O-acyloxime compounds are preferred because they are more likely to produce a highly sensitive photosensitive resin composition. Two or more of these photopolymerization initiators can also be used. In the present invention, the term "photopolymerization initiator" is used to include sensitizers.

[0067] Alternatively, compounds that do not function as photopolymerization initiators or sensitizers by themselves but can enhance their photopolymerization initiator or sensitizer capabilities when used in combination with the above-mentioned compounds may be added. Examples of such compounds include amine-based compounds that are effective when used in combination with benzophenone. Examples of the amine-based compounds include triethylamine, triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, and 4,4'-bis(ethylmethylamino)benzophenone.

[0068] The amount of component (E) blended is preferably 2 to 40 parts by mass, and more preferably 3 to 30 parts by mass, per 100 parts by mass of the total of components (A) and (D).

[0069] (F) Organic solvent The resin composition of the present invention may contain an organic solvent. The organic solvent may be any of those used in the aforementioned component (B) [component (B1) or (B2)] without any restrictions. The organic solvent used in component (B) [component (B1) or (B2)] becomes part of the component (F).

[0070] <Other ingredients> The resin composition of the present invention can contain an inorganic filler or an organic filler. Known inorganic fillers or organic fillers can be used. When used in the resin composition of the present invention, they may be dispersed in a dispersion liquid using an organic solvent as a dispersion medium, similar to the aforementioned component (B) and the like. As the organic solvent serving as the dispersion medium, the organic solvents used in the aforementioned component (B) and the like can be used without limitation. Furthermore, similar to the aforementioned component (B) and the like, the aforementioned known dispersants and the like can be used.

[0071] Such inorganic or organic fillers are preferably inorganic fillers for reasons of dispersibility, heat resistance, etc. Examples of inorganic fillers that can be used include aluminum oxide, silicon oxide (silica), barium sulfate, calcium sulfate, barium carbonate, calcium carbonate, magnesium carbonate, strontium carbonate, sodium metasilicate, magnesium fluoride, and cryolite. Examples of organic fillers that can be used include polyester-based polymers, polyurethane-based polymers, polyesterurethane-based polymers, polyamide-based polymers, polyesteramide-based polymers, acrylic polymers, cellulose-based polymers, polylactic acid-based polymers, and phenoxy-based polymers.

[0072] The inorganic filler or organic filler is preferably one that can lower the refractive index of the cured film obtained by curing the resin composition. By using such a component, reflection caused by the difference in refractive index between the transparent substrate and the light-shielding film formed thereon can be suppressed, so that reflection can be suppressed without providing a separate anti-reflection film or the like on the substrate, which is preferable.

[0073] The inorganic or organic filler is not particularly limited in terms of its manufacturing method (gas phase reaction, liquid phase reaction) or shape (spherical, non-spherical). It may also be surface-treated with a coupling agent or the like. The average particle size is preferably, for example, 10 nm or more and 1,000 nm or less, and can be measured by the cumulant method using a dynamic light scattering particle size distribution analyzer. The blending ratio is preferably, for example, 1 to 30 mass % relative to the solid content in the resin composition.

[0074] The resin composition of the present invention may also contain an epoxy compound. Any known epoxy compound may be used without limitation. For example, bisphenol A type epoxy compounds, bisphenol F type epoxy compounds, bisphenol fluorene type epoxy compounds, bisnaphthol fluorene type epoxy compounds, diphenyl fluorene type epoxy compounds, phenol novolac type epoxy compounds, cresol novolac type epoxy compounds, phenol aralkyl type epoxy compounds, phenol novolac compounds containing a naphthalene skeleton (e.g., NC-7000L: manufactured by Nippon Kayaku Co., Ltd.), biphenyl type epoxy compounds (e.g., jER YX4000: manufactured by Mitsubishi Chemical Corporation), naphthol aralkyl type epoxy compounds, trisphenolmethane type epoxy compounds (for example, EPPN-501H: manufactured by Nippon Kayaku Co., Ltd.), tetrakisphenolethane type epoxy compounds, glycidyl ethers of polyhydric alcohols, glycidyl esters of polycarboxylic acids, copolymers of monomers having a (meth)acryloyl group containing glycidyl (meth)acrylate as a unit, such as copolymers of methacrylic acid and glycidyl methacrylate, hydrogenated bisphenols, Epoxy compounds having a glycidyl group such as phenol A diglycidyl ether (e.g., Rikaresin HBE-100, manufactured by New Japan Chemical Co., Ltd.), 1,4-cyclohexanedimethanol-bis-3,4-epoxycyclohexanecarboxylate, 2-(3,4-epoxy)cyclohexyl-5,1-spiro(3,4-epoxy)cyclohexyl-m-dioxane (e.g., Araldite CY175, manufactured by Huntsman), bis(3,4-epoxycyclohexylmethyl)adipate (e.g., CYRACURE UVR-6128, manufactured by Dow Chemical Co.), 3',4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (e.g., Celloxide 2021P, manufactured by Daicel Corporation), butanetetracarboxylic acid tetra(3,Examples of epoxy compounds include alicyclic epoxy compounds such as 4-epoxycyclohexylmethyl)-modified ε-caprolactone (e.g., Epolead GT401, manufactured by Daicel Corporation), epoxy compounds having epoxycyclohexyl groups (e.g., HiREM-1, manufactured by Shikoku Chemical Industry Co., Ltd.), polyfunctional epoxy compounds having a dicyclopentadiene skeleton (e.g., HP7200 series, manufactured by DIC Corporation), 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol (e.g., EHPE3150, manufactured by Daicel Corporation), epoxidized polybutadiene (e.g., NISSO-PB JP-100, manufactured by Nippon Soda Co., Ltd.), and epoxy compounds having a silicone skeleton.

[0075] In addition, known curing agents and curing accelerators for the epoxy compounds can also be used. Curing agents include amine compounds, polycarboxylic acid compounds, phenolic resins, amino resins, dicyandiamide, Lewis acid complex compounds, and the like, which contribute to the curing of epoxy resins. Examples of curing accelerators include tertiary amines, quaternary ammonium salts, tertiary phosphines, quaternary phosphonium salts, boric acid esters, Lewis acids, organometallic compounds, imidazoles, and the like, which contribute to the curing of epoxy resins.

[0076] The resin composition of the present invention may further contain additives such as a thermal polymerization inhibitor, an antioxidant, a plasticizer, a filler, a leveling agent, an antifoaming agent, a coupling agent, a surfactant, a viscosity modifier, etc. Examples of the thermal polymerization inhibitor and the antioxidant include hydroquinone, hydroquinone monomethyl ether, pyrogallol, tert-butylcatechol, phenothiazine, and a hindered phenol compound. Examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, and tricresyl phosphate. Examples of the filler include glass fiber. Examples of the antifoaming agent and the leveling agent include silicone-based, fluorine-based, and acrylic compounds. Examples of surfactants include anionic surfactants such as ammonium lauryl sulfate and polyoxyethylene alkyl ether triethanolamine sulfate, cationic surfactants such as stearylamine acetate and lauryl trimethylammonium chloride, amphoteric surfactants such as lauryl dimethylamine oxide and lauryl carboxymethyl hydroxyethyl imidazolium betaine, nonionic surfactants such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether and sorbitan monostearate, silicone surfactants having a polydimethylsiloxane or the like as a main skeleton, and fluorine-based surfactants. Examples of coupling agents include silane coupling agents such as 3-(glycidyloxy)propyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane and 3-ureidopropyltriethoxysilane.

[0077] <Solid content> As described above, the resin composition of the present invention essentially comprises the aforementioned components (A) and (B1) or (B2). It is preferable to use the composition as a photosensitive resin composition, and it preferably contains the aforementioned components (A), (B1) or (B2), (D), (E), and (F) as the main components. The total amount of components (A), (B1) or (B2), (D), and (E) in the solid content excluding the solvent (including monomers that become solid after curing) is preferably 70% by weight, more preferably 80% by weight or more, and even more preferably 90% by weight or more. The amount of component (F) varies depending on the target viscosity, but it is preferable that it be contained in the photosensitive resin composition in the range of 60 to 90% by weight.

[0078] <Light-shielding films, color filters, touch panels and display devices>

[0079] Furthermore, a method for curing the resin composition of the present invention to form a light-shielding film can be achieved, for example, by applying a solution of a photosensitive resin composition containing the above-mentioned components (A), (B1) or (B2), (D), (E), and (F) as main components to a substrate or the like, drying the solvent, and curing by irradiating with light (including ultraviolet light, radiation, etc.). A photomask or the like is used to define areas that are exposed to light and areas that are not, and only the areas that are exposed to light are cured while the other areas are dissolved in an alkaline solution, thereby obtaining the desired pattern.

[0080] Furthermore, a color filter or a touch panel having the light-shielding film of the present invention as a black matrix can be produced, for example, by forming a light-shielding film having a thickness of 1.0 to 2.0 μm on a transparent substrate, and then forming red, blue, and green pixels by photolithography after forming the light-shielding film, or by injecting red, blue, and green inks into the light-shielding film by an inkjet process.

[0081] The light-shielding film of the present invention can also be used as a black column spacer in a liquid crystal display device. For example, a single black resist can be used to form multiple sections with different film thicknesses, one of which can function as a spacer and the other as a black matrix.

[0082] Each step of the method for forming a light-shielding film by coating and drying a composition will now be specifically illustrated.

[0083] The composition can be applied to a substrate by any of the known methods, such as immersion in a solution, spraying, or using a roller coater, land coater, slit coater, or spinner. After applying the composition to a desired thickness using these methods, a coating is formed by removing the solvent (prebaking). Prebaking can be performed by heating in an oven or hot plate, vacuum drying, or a combination of these. The heating temperature and heating time for prebaking can be selected appropriately depending on the solvent used, but it is preferably performed at 80 to 120°C for 1 to 10 minutes.

[0084] Examples of radiation used for exposure include visible light, ultraviolet light, far ultraviolet light, electron beams, and X-rays. The wavelength of the radiation is preferably in the range of 250 to 450 nm. Developers suitable for this alkaline development include aqueous solutions of sodium carbonate, potassium carbonate, potassium hydroxide, diethanolamine, and tetramethylammonium hydroxide. These developers can be selected appropriately depending on the characteristics of the resin layer, and adding a surfactant is also effective if necessary. The development temperature is preferably 20 to 35°C, and fine images can be precisely formed using a commercially available developer or ultrasonic cleaner. After alkaline development, the film is usually washed with water. Examples of development methods that can be used include shower development, spray development, dip (immersion) development, and puddle (puddle) development.

[0085] After development in this manner, a heat treatment (post-baking) is carried out at 180 to 250°C for 20 to 100 minutes. This post-baking is carried out for the purpose of increasing the adhesion between the patterned light-shielding film and the substrate, etc. As with pre-baking, this is carried out by heating using an oven, a hot plate, etc. The patterned light-shielding film of the present invention is formed through various steps using a photolithography method. Then, polymerization or curing (sometimes collectively referred to as curing) is completed by heat, thereby obtaining a light-shielding film having a desired pattern.

[0086] The resin composition of the present invention can be suitably used as a coating material. In particular, color filter inks used in liquid crystal display devices or imaging devices, and light-shielding films formed therefrom, are useful as color filters, black matrices for liquid crystal projection, and the like. Furthermore, the composition of the present invention can be used not only as a color filter ink for color liquid crystal displays, but also as an ink material for color separation or light-shielding in various multicolor display devices, such as organic electroluminescent devices typified by organic electroluminescent devices, color liquid crystal display devices, color facsimiles, and image sensors. The color filter of the present invention can reduce reflection of external light at the interface between the colored layer (including the black resist layer) and the substrate, and, for example, reflection of light emitted from an organic electroluminescent device when used in an organic electroluminescent device. In other words, it can improve contrast in bright areas by reducing reflection of external light, and improve luminous efficiency by improving light extraction efficiency from the light-emitting side. [Example]

[0087] Hereinafter, the embodiments of the present invention will be specifically described based on examples and comparative examples, but the present invention is not limited to these.

[0088] First, synthesis examples of unsaturated group-containing alkali-soluble resins among the soluble resins of component (A) of the present invention are shown below. The resins in the synthesis examples were evaluated as follows.

[0089] [Solid content concentration] The resin content was calculated using the following formula from the weight [W1(g)] after 1 g of the resin solution obtained in the synthesis example was impregnated into a glass filter [weight: W0(g)] and the weight [W2(g)] after heating at 160°C for 2 hours. Solid content concentration (weight%) = 100 × (W2-W0) / (W1-W0)

[0090] [Acid value] The resin solution was dissolved in dioxane and titrated with a 1 / 10N KOH aqueous solution using a potentiometric titrator "COM-1600" (manufactured by Hiranuma Sangyo Co., Ltd.) to determine the content.

[0091] [Molecular weight] Measurement was performed using gel permeation chromatography (GPC) "HLC-8220GPC" (manufactured by Tosoh Corporation, solvent: tetrahydrofuran, columns: TSKgelSuper H-2000 (2 columns) + TSKgelSuper H-3000 (1 column) + TSKgelSuper H-4000 (1 column) + TSKgelSuper H-5000 (1 column) (manufactured by Tosoh Corporation), temperature: 40°C, rate: 0.6 ml / min), and the weight-average molecular weight (Mw) was calculated as a value converted into standard polystyrene (manufactured by Tosoh Corporation, PS-oligomer kit).

[0092] The abbreviations used in the synthesis examples are as follows. AA: acrylic acid BPFE: bisphenolfluorene type epoxy compound (a reaction product of 9,9-bis(4-hydroxyphenyl)fluorene and chloromethyloxirane. In the compound of general formula (I), A is a fluorene-9,9-diyl group, and R1 to R4 are hydrogen atoms.) BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride THPA: 1,2,3,6-tetrahydrophthalic anhydride TPP: Triphenylphosphine PGMEA: Propylene glycol monomethyl ether acetate TEAB: Tetraethylammonium bromide DCPMA: dicyclopentanyl methacrylate GMA: Glycidyl methacrylate St: styrene SA: succinic anhydride AIBN: Azobisisobutyronitrile TDMAMP: Trisdimethylaminomethylphenol TEA: Triethylamine HQ: Hydroquinone

[0093] [Synthesis Example 1] A 500 ml four-neck flask equipped with a reflux condenser was charged with BPFE (50.0 g, 0.10 mol), AA (14.1 g, 0.20 mol), PGMEA (67 g), and TPP (0.26 g) and stirred at 100-105°C for 12 hours to react. Next, BPDA (14.4 g, 0.05 mol) and THPA (7.4 g, 0.05 mol) were charged to the flask and stirred at 120-125°C for 6 hours to obtain unsaturated group-containing alkali-soluble resin (A-1). The solids concentration of the resulting resin solution was 56% by mass, the acid value (solids equivalent) was 96 mg KOH / g, and the Mw by GPC analysis was 3600.

[0094] [Synthesis Example 2] 300.0 g of PGMEA was placed in a 1 L four-neck flask equipped with a reflux condenser, and the atmosphere in the flask was replaced with nitrogen, after which the temperature was raised to 120° C. A monomer mixture (a mixture of 66.1 g (0.3 mol) of DCPMA, 85.3 g (0.6 mol) of GMA, and 10.4 g (0.10 mol) of St dissolved in 10 g of AIBN) was added dropwise to the flask from a dropping funnel over 2 hours, followed by stirring at 120° C. for an additional 2 hours to obtain a copolymer solution. Next, the atmosphere in the flask was replaced with air, and then 43.2 g (0.6 mol) of AA, 0.8 g of TDMAMP, and 0.15 g of HQ were added to the obtained copolymer solution, followed by stirring for 6 hours under heating at 120°C to obtain a polymerizable unsaturated group-containing copolymer solution. To the resulting polymerizable unsaturated group-containing copolymer solution, 59.3 g (0.39 mol) of THPA and 0.5 g of TEA were added and reacted at 120°C for 4 hours to obtain a polymerizable unsaturated group-containing alkali-soluble copolymer resin solution (A)-2. The solids concentration of the resin solution was 48 mass%, the acid value (solids equivalent) was 79 mgKOH / g, and the Mw by GPC analysis was 8500.

[0095] [Preparation Example 1] 1000 g of carbon black (TPX-1099, manufactured by Cabot Corporation) was mixed with water to prepare 10 L of slurry, which was stirred at 95°C for 1 hour, allowed to cool, and then washed with water. This was mixed again with water to prepare 10 L of slurry, to which 42.9 g of 70% nitric acid was added and stirred at 40°C for 4 hours. This was allowed to cool, washed with water, and then mixed again with water to prepare 10 L of slurry. 769.2 g of 13% aqueous sodium hypochlorite solution was added and stirred at 40°C for 6 hours. This was allowed to cool, washed with water, and then mixed again with water to prepare 10 L of slurry. 38.1 g of a 38.4% pure dye (Direct Deep BLACK) was added and stirred at 40°C for 1 hour, after which 10.1 g of aluminum sulfate was added and stirred at 40°C for 1 hour. This was allowed to cool, washed with water, filtered, and dried to obtain dye-coated carbon black.

[0096] The dye-coated carbon black, a polymer dispersant, the alkali-soluble resin obtained in Synthesis Example 1 ((A)-1 below), and PGMEA were mixed and dispersed using a bead mill to obtain carbon black dispersion (B)-1 having a dye-coated carbon black concentration of 25.0 mass %, a polymer dispersant concentration of 2.0 mass %, and an (A)-1 concentration (solid content) of 8.0 mass %.

[0097] (Soluble resin) (A)-1: Unsaturated group-containing alkali-soluble resin solution obtained in Synthesis Example 1 above (A)-2: Solution of unsaturated group-containing alkali-soluble resin obtained in Synthesis Example 2 above (A)-3: Dendrimer-type multifunctional acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd., SIRIUS-501, non-volatile content 50% by mass) (A)-4: Polymethyl methacrylate (PMMA) (Sigma-Aldrich)

[0098] (Black pigment (black pigment dispersion)) (B)-1: PGMEA dispersion containing the dye-coated carbon black obtained in Preparation Example 1 at a concentration of 25.0% by mass, a polymer dispersant at a concentration of 2.0% by mass, and (A)-1 at a concentration (solid content) of 4.0% by mass (solid content 31.0% by mass, average secondary particle diameter of carbon black 110 nm). (B)-2: PGMEA dispersion containing surface-treated carbon black A at a concentration of 25.0% by mass, polymer dispersant at a concentration of 2.0% by mass, and (A)-1 at a concentration (solid content) of 3.0% by mass (solid content 30.0%, average secondary particle diameter of carbon black 108 nm) (B)-3: PGMEA dispersion containing surface-treated carbon black B at a concentration of 25.0% by mass, polymer dispersant at a concentration of 2.0% by mass, and (A)-1 at a concentration (solid content) of 2.0% by mass (solid content 29.0%, average secondary particle diameter of carbon black 112 nm) (B)-4: PGMEA dispersion containing surface-treated carbon black C at a concentration of 25.0% by mass and a polymer dispersant at a concentration of 3.0% by mass (solid content 28.0%, average secondary particle diameter of carbon black 92 nm) (B)-5: PGMEA dispersion containing surface-treated carbon black D at a concentration of 25.0% by mass and polymer dispersant at a concentration of 4.0% by mass (solid content 29.0%, average secondary particle diameter of carbon black 162 nm) (B)-6: PGMEA dispersion with a lactam black (BASF Irgaphor S0100CF) concentration of 15.0% by mass and a dispersant concentration of 4.0% by mass (solid content 19.0%, average lactam black particle size 241 nm) (B)-7: PGMEA dispersion with a titanium black (TiN) concentration of 15.0% by mass and a dispersant concentration of 4.0% by mass (solid content 19.0%, average particle size of titanium black 64 nm) (B)-8: PGMEA dispersion with a carbon black concentration of 25.0 mass% without surface treatment and a dispersant concentration of 5.0 mass% (solid content 30.0%, average secondary particle diameter of carbon black 112 nm)

[0099] The zeta potentials of (B)-1 to (B)-8 measured by the method described below were as follows. (B)-1:-100.5mV (B)-2: -90.1mV (B)-3: -79.9mV (B)-4: -68.0mV (B)-5:-60.7mV (B)-6: -40.7mV (B)-7: +9.2mV (B)-8:-20.2mV

[0100] (Photopolymerizable monomer) (D): A mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate (manufactured by Nippon Kayaku Co., Ltd., trade name DPHA)

[0101] (Photopolymerization initiator) (E)-1: Oxime ester photopolymerization initiator [OXE-02 manufactured by BASF Japan Ltd.] (E)-2: Oxime ester photopolymerization initiator [ADEKA Corporation, NCI-831E]

[0102] (organic solvent) (F)-1: Propylene glycol monomethyl ether acetate (PGMEA) (F)-2: Ethyl lactate (EL) (F)-3: Diethylene glycol dibutyl ether (DBDG)

[0103] (Silane coupling agent) KBE-9007N (Shin-Etsu Chemical Co., Ltd.)

[0104] (surfactant) SH3775M (1% by mass PGMEA solution, manufactured by The Dow Chemical Company)

[0105] [Preparation of Resin Composition] The resin compositions of Examples 1 to 10 and Comparative Example 1 were prepared by blending the ingredients in the proportions shown in Table 1. All values ​​in Table 1 represent parts by mass (solid content) except for (A) soluble resin, (B) black pigment, (F) organic solvent, and surfactant.

[0106] [Table 1]

[0107] [Average particle size, zeta potential] The average particle size and zeta potential were measured using the "ELSZneo" Zeta Potential, Particle Size, and Molecular Weight Measurement System (Otsuka Electronics Co., Ltd.). The average particle size was measured by diluting each dispersion with PGMEA to a particle concentration of 10% by mass, and then calculated using the cumulant method. The zeta potential was measured by electrophoretic light scattering by diluting each dispersion with PGMEA to a particle concentration of 0.01% by mass, and the zeta potential was calculated using the Huckel equation using the following physical properties of the solvent (PGMEA). PGMEA: Viscosity 1.10 (mPa·s), refractive index 1.402, dielectric constant 8.30

[0108] [Evaluation of SUS cleaning ability] (Evaluation method) A SUS substrate having a shape of 0.3 mm thick x 50 mm wide x 50 mm long was prepared by cutting out from a SUS304 stainless steel plate (JIS G4305, No. 2B finish). The SUS substrate was immersed for 1 second in the resin composition of Example 1 shown in Table 1 to adhere the resin composition to the SUS substrate, and then removed and dried for 1 minute under conditions of room temperature of 23°C and humidity of 50%, forming a 50 μm dry film of the resin composition on the surface of the SUS substrate. Next, the SUS substrate with the dry film was immersed in PGMEA and pulled out after 1 minute to check the degree of dissolution (degree of cleaning) of the dry film in the immersed area, and the reflectance of the SUS surface at that location was measured using the following method. Dry films were formed in the same manner for each of the resin compositions of Examples 2 to 10 and Comparative Example 1, and the reflectance of the SUS surface was measured. The evaluation criteria were as follows: The results are shown in Table 1.

[0109] (Evaluation criteria) ◯: The reflectance of the SUS substrate in the resist-immersed area is 25% or more, and the dried film has dissolved to such an extent that the gloss of the SUS substrate surface can be clearly seen. △: The reflectance of the SUS substrate in the resist-immersed area was 10% or more and less than 25%, and the dried film was dissolved to the extent that some of the gloss on the SUS substrate surface could be confirmed. ×: The reflectance of the SUS substrate in the resist-immersed area is less than 10%, and a dried film is attached to the SUS substrate surface to such an extent that the gloss cannot be confirmed.

[0110] (Method for measuring reflectance) The reflectance of the SUS substrate surface was measured using an ultraviolet-visible-infrared spectrophotometer "UH4150" (manufactured by Hitachi High-Tech Science Corporation) under the conditions of a C light source, an incident angle of 2°, and a wavelength range of 380 to 780 nm. [Industrial Applicability]

[0111] According to the present invention, it is possible to provide a resin composition having excellent SUS cleaning properties, a light-shielding film using the resin composition, and a color filter and a touch panel using the light-shielding film as a black matrix. It is also possible to provide various display devices having the color filter and the touch panel.

Claims

1. A resin composition comprising (A) a soluble resin and (B) a black pigment, The resin composition is adhered to the surface of a stainless steel substrate, and dried for 1 minute at a temperature of 23°C and a humidity of 50% to form a dried film-coated substrate, which is then immersed in propylene glycol monomethyl ether acetate for 1 minute. The resulting stainless steel substrate surface has a reflectance of 10% or more.

2. The resin composition according to claim 1, wherein the (B) black pigment is a black pigment having a zeta potential of −110 to −30 mV as measured by an electrophoretic light scattering method when measured in a dispersion liquid containing (B1) an organic solvent as a dispersion medium.

3. 3. The resin composition according to claim 2, wherein the black pigment (B) is one or more selected from the group consisting of carbon black as a black inorganic pigment, and lactam black, perylene black, cyanine black, and aniline black as black organic pigments.

4. The resin composition according to claim 1, wherein the (B) black pigment is a black pigment having a zeta potential of −10 to +30 mV as measured by an electrophoretic light scattering method when measured in a dispersion liquid containing (B2) an organic solvent as a dispersion medium.

5. 5. The resin composition according to claim 4, wherein the black pigment (B) is titanium black.

6. 2. The resin composition according to claim 1, wherein (A) is an unsaturated group-containing alkali-soluble resin, and further comprises (D) a photopolymerizable monomer having at least two unsaturated bonds and (E) a photopolymerization initiator.

7. A light-shielding film obtained by curing the resin composition according to any one of claims 1 to 6.

8. A color filter having the light-shielding film according to claim 7 as a black matrix.

9. A touch panel having the light-shielding film according to claim 7 as a black matrix.

10. A display device comprising the color filter according to claim 8.

11. A display device comprising the touch panel according to claim 9.

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