Substrate processing device and substrate processing method

Abstract

To provide a technique capable of suppressing sticking of a substrate to a boat.SOLUTION: A substrate holder includes a first boat that holds a substrate in a shelf-like manner, and a second boat that is coaxial with the first boat and provided to move up and down relative to the first boat, the second boat holding the substrate in a shelf-like manner. The first boat includes a first bottom plate and a first ceiling plate that are provided to vertically face each other, and a first support column that connects the first bottom plate and the first ceiling plate to each other, the first support column including a first placement surface on which the substrate is placed. The second boat includes a second bottom plate and a second ceiling plate that are provided to vertically face each other, and a second support column that connects the second bottom plate and the second ceiling plate to each other, the second support column including a second placement surface on which the substrate is placed. The second ceiling plate is arranged to overlap the first ceiling plate in a plan view.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to a substrate holder and a substrate processing apparatus. [Background technology]

[0002] There is known an apparatus that houses a boat loaded with a plurality of substrates inside a processing chamber and performs a film formation process on the plurality of substrates (see, for example, Patent Document 1). Patent Document 1 describes a double-structure boat having an inner boat and an outer boat that can be moved independently in the vertical direction. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2018-67582 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique that can prevent a substrate from sticking to a boat. [Means for solving the problem]

[0005] A substrate holder according to one embodiment of the present disclosure comprises a first boat that holds substrates in a shelf-like manner, and a second boat that is coaxial with the first boat and is arranged to rise and fall relatively to the first boat, also holding substrates in a shelf-like manner, wherein the first boat has a first bottom plate and a first top plate arranged opposite each other above and below, and a first support pillar that connects the first bottom plate and the first top plate and includes a first support surface on which a substrate is placed, and the second boat has a second bottom plate and a second top plate arranged opposite each other above and below, and a second support pillar that connects the second bottom plate and the second top plate and includes a second support surface on which a substrate is placed, and the second top plate is arranged to overlap the first top plate in a planar view. [Effects of the Invention]

[0006] According to the present disclosure, it is possible to prevent the substrate from sticking to the boat. [Brief explanation of the drawings]

[0007] [Figure 1] 1 is a cross-sectional view illustrating an example of a substrate processing apparatus according to an embodiment; [Figure 2] FIG. 1 is a perspective view showing an example of a substrate holder; [Figure 3] FIG. 1 is a perspective view showing an example of a substrate holder; [Figure 4] FIG. 1 is a perspective view showing an example of a substrate holder; [Figure 5] 1 is a side view showing an example of a substrate holder; [Figure 6] Top view of the board holder in Figure 3 [Figure 7] Top view of the board holder in Figure 4 [Figure 8] A cross-sectional view showing the positional relationship between the first boat and the second boat [Figure 9] FIG. 1 is a perspective view showing the positional relationship between a first boat and a second boat; [Figure 10] FIG. 10 is a side view showing the substrate holder with the first boat holding the substrate; [Figure 11] FIG. 10 is a side view showing the substrate holder with the substrate held by the second boat; DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding reference numerals are used to designate the same or corresponding members or components, and redundant descriptions will be omitted.

[0009] [Board sticking] When a substrate is placed on a claw provided on a boat and the boat with the substrate placed thereon is placed in a processing vessel and a film is formed on the substrate, the substrate may stick to the claw, particularly when a thick polysilicon film is formed on the substrate.

[0010] One example of a measure to prevent the substrate from sticking to the nail is a technique for forming minute irregularities on the surface of the nail to reduce the contact area between the nail and the substrate. However, if the film formed on the substrate is thick, the substrate may still stick to the nail even when the above technique is applied.

[0011] The present disclosure provides a technology that includes a first boat and a second boat that move up and down relative to each other, and that uses a substrate holder that can transfer substrates between the first boat and the second boat, thereby preventing substrates from sticking to the boat. This will be described in detail below.

[0012] [Substrate Processing Apparatus] An example of a substrate processing apparatus according to an embodiment will be described with reference to Fig. 1. The substrate processing apparatus according to the embodiment is a batch type apparatus that processes a plurality of substrates at once.

[0013] The substrate processing apparatus 1 includes a processing chamber 10, a gas supply unit 30, an exhaust unit 40, a heating unit 50, and a control unit 80.

[0014] The processing vessel 10 has an interior that can be depressurized. The processing vessel 10 accommodates a substrate W. The substrate W is, for example, a semiconductor wafer. The processing vessel 10 includes an inner tube 11 and an outer tube 12. The inner tube 11 has a generally cylindrical shape with a ceiling and an open lower end. The outer tube 12 has a generally cylindrical shape with a ceiling and an open lower end that covers the outside of the inner tube 11. The inner tube 11 and the outer tube 12 are made of a heat-resistant material such as quartz, and are arranged coaxially to form a double-tube structure.

[0015] The ceiling of the inner pipe 11 is, for example, flat. A storage section 13 for storing a gas nozzle is formed on one side of the inner pipe 11 along its longitudinal direction (vertical direction). The storage section 13 is an area within a protrusion 14 formed by protruding part of the side wall of the inner pipe 11 outward.

[0016] A rectangular opening 15 is formed in the side wall of the inner tube 11 opposite the housing portion 13 along its longitudinal direction (vertical direction).

[0017] Opening 15 is a gas exhaust port formed so as to be able to exhaust gas from inside inner tube 11. The length of opening 15 is the same as the length of substrate holder 100, or is a length that extends in both the vertical direction and the vertical direction longer than the length of substrate holder 100.

[0018] The lower end of the processing vessel 10 is supported by a substantially cylindrical manifold 17 made of, for example, stainless steel. A flange 18 is formed at the upper end of the manifold 17, and the lower end of the outer tube 12 is placed on the flange 18 to support it. A seal member 19 such as an O-ring is interposed between the flange 18 and the lower end of the outer tube 12 to keep the inside of the outer tube 12 airtight.

[0019] A substantially annular support member 20 is provided on the inner wall of the upper portion of the manifold 17. The support member 20 supports the lower end of the inner tube 11. A lid 21 is airtightly attached to the opening at the lower end of the manifold 17 via a sealing member 22 such as an O-ring. The lid 21 has a substantially circular plate shape and airtightly closes the opening at the lower end of the processing vessel 10, i.e., the opening of the manifold 17. The lid 21 is made of, for example, stainless steel.

[0020] A rotating shaft 24 that rotatably supports the substrate holder 100 via a sealing member 23 such as a magnetic fluid seal is provided through the center of the lid 21. The lower part of the rotating shaft 24 is rotatably supported by an arm 25a of an elevating mechanism 25 that is a boat elevator.

[0021] An outer support 26 and an inner support 27 are provided at the upper end of the rotation shaft 24. The outer support 26 has a hollow, approximately cylindrical shape. The outer support 26 supports the first boat 110. The inner support 27 has a solid, approximately cylindrical shape and is inserted into the outer support 26. The inner support 27 supports the second boat 120.

[0022] The outer support 26 and the inner support 27 rotate synchronously in response to the rotation of the rotating shaft 24, resulting in the synchronous rotation of the first boat 110 and the second boat 120. In addition, the lid 21, the rotating shaft 24, the outer support 26, the inner support 27, the first boat 110, and the second boat 120 move up and down as a unit in response to the elevation and lowering of the lifting mechanism 25, resulting in the first boat 110 and the second boat 120 being inserted into and removed from the processing vessel 10.

[0023] The inner support 27 is configured to move up and down relative to the outer support 26. This causes the second boat 120 to move up and down relative to the first boat 110.

[0024] The first boat 110 and the second boat 120 constitute a substrate holder 100 that holds a plurality of (for example, 50 to 150) substrates W in a shelf-like manner. The substrate holder 100 will be described in detail later.

[0025] A heat-retaining table 28 is provided on the lid 21. The heat-retaining table 28 keeps the substrate holder 100 warm by preventing the substrate holder 100 from being cooled by heat transfer to the lid 21 side. For example, the heat-retaining table 28 has a configuration in which a plurality of quartz plates are attached to a plurality of supports provided on the lid 21 and are arranged substantially horizontally at intervals in the vertical direction.

[0026] The gas supply unit 30 includes a gas nozzle 31. The gas nozzle 31 is made of, for example, quartz. The gas nozzle 31 is provided inside the inner tube 11 along its longitudinal direction, and its base end is bent into an L-shape and supported so as to penetrate the manifold 17. The gas nozzle 31 has a plurality of gas holes 31h along its longitudinal direction, and discharges processing gas from the plurality of gas holes 31h in the horizontal direction. The plurality of gas holes 31h are arranged, for example, at the same intervals as the intervals between the substrates W supported by the substrate holder 100. The type of processing gas is not limited, and examples thereof include film formation gas, etching gas, and purge gas.

[0027] 1, the gas supply unit 30 includes one gas nozzle 31, but the number of gas nozzles is not limited. For example, the gas supply unit 30 may include multiple gas nozzles. In this case, the multiple gas nozzles may be configured to discharge the same process gas or different process gases.

[0028] The exhaust unit 40 exhausts gas that is discharged from the inner tube 11 through the opening 15 and then discharged from a gas outlet 41 via a space P1 between the inner tube 11 and the outer tube 12. The gas outlet 41 is formed on the side wall of the upper part of the manifold 17, above the support unit 20. An exhaust passage 42 is connected to the gas outlet 41. A pressure adjustment valve 43 and a vacuum pump 44 are sequentially disposed in the exhaust passage 42, so that the inside of the processing vessel 10 can be exhausted.

[0029] The heating part 50 is provided around the outer tube 12. The heating part 50 is provided, for example, on the base plate 29. The heating part 50 has a substantially cylindrical shape so as to cover the outer tube 12. The heating part 50 includes, for example, a heating element, and heats the substrate W in the processing vessel 10.

[0030] The control unit 80 is configured to control the operation of each unit of the substrate processing apparatus 1. The control unit 80 may be, for example, a computer. A computer program for controlling the operation of each unit of the substrate processing apparatus 1 is stored in a storage medium 90. The storage medium 90 may be, for example, a flexible disk, a compact disk, a hard disk, a flash memory, a DVD, or the like.

[0031] [Substrate holder] An example of a substrate holder 100 provided in the substrate processing apparatus 1 of the embodiment will be described with reference to FIGS. 2 to 9. FIG. 2 is a perspective view showing the substrate holder in a state where a second boat is in the process of being attached to a first boat, and FIGS. 3 and 4 are perspective views showing the substrate holder in a state where the second boat has been attached to the first boat. Note that the top plate of the first boat is not shown in FIG. 4. FIG. 5 is a side view showing the substrate holder in a state where the second boat has been attached to the first boat. FIG. 6 is a view of the substrate holder in FIG. 3 seen from above, and FIG. 7 is a view of the substrate holder in FIG. 4 seen from above. FIG. 8 is a cross-sectional view showing the positional relationship between the first boat and the second boat, and FIG. 9 is a perspective view showing the positional relationship between the first boat and the second boat.

[0032] The substrate holder 100 can be housed in the processing chamber 10 and holds a plurality of substrates substantially horizontally with intervals in the vertical direction. The substrate holder 100 has a first boat 110 and a second boat 120.

[0033] The first boat 110 includes a bottom plate 111, a top plate 112, and support columns 113 (113a to 113c). The bottom plate 111, the top plate 112, and the support columns 113 are made of a heat-resistant material such as quartz or silicon carbide.

[0034] The bottom plate 111 is supported by the outer support body 26. The bottom plate 111 has a substantially annular plate shape with an outer diameter larger than the outer diameter of the substrate to be held. The bottom plate 111 may also have a substantially circular plate shape.

[0035] The top plate 112 is provided above the bottom plate 111 and faces the bottom plate 111. The top plate 112 has a substantially annular plate shape with an outer diameter larger than that of the substrate to be held, similar to the bottom plate 111. The top plate 112 may also have a substantially circular plate shape.

[0036] The support pillars 113 have a rod-like shape that extends vertically, and connect the bottom plate 111 and the top plate 112. The three support pillars 113a to 113c have the same length. The support pillars 113a to 113c are provided so that their center points are located on the same arc of a concentric circle. A plurality of grooves 114 are formed in each of the support pillars 113a to 113c at intervals in the vertical direction. The grooves 114 form a mounting surface 115 (FIGS. 10 and 11) on which a substrate is placed. When a substrate is placed on the mounting surface 115, the substrate is held by the support pillars 113.

[0037] In a plan view, the central angle θ1 (FIG. 7) of the arc passing through the center points of the support columns 113b, 113a, and 113c is preferably greater than 180°. This allows the substrate to be stably held even if the center position of the substrate is shifted from the center position of the first boat 110. Furthermore, in a plan view, the central angle θ1 is set to an angle (for example, 220°) or less that does not interfere with the loading of the substrate into the first boat 110.

[0038] The second boat 120 is configured to be attachable to and detachable from the first boat 110 by horizontal movement. The second boat 120 is provided coaxially with the first boat 110 and configured to be able to move up and down relatively to the first boat 110. The second boat 120 includes a bottom plate 121, a top plate 122, and support columns 123 (123a to 123c). The bottom plate 121, the top plate 122, and the support columns 123 are formed of a heat-resistant material such as quartz or silicon carbide.

[0039] The bottom plate 121 is supported by the inner support body 27 and is disposed above the bottom plate 111. The bottom plate 121 has a generally annular plate shape with an outer diameter larger than that of the substrate to be held, and is disposed so as to overlap the bottom plate 111 in a plan view. The bottom plate 121 may also have a generally circular plate shape. Notches 121a to 121c are formed in the outer edge of the bottom plate 121, through which the support columns 113a to 113c are inserted. The notches 121a to 121c are formed so that the bottom plate 121 does not come into contact with the support columns 113a to 113c when the second boat 120 is attached to the first boat 110 by moving the second boat 120 horizontally.

[0040] The top plate 122 is provided above the bottom plate 121 and below the top plate 112, facing the bottom plate 121. Like the bottom plate 121, the top plate 122 has a generally annular plate shape with an outer diameter larger than that of the substrate to be held. Notches 122a to 122c are formed on the outer edge of the top plate 122, through which the support columns 113a to 113c are inserted. The notches 122a to 122c are formed so that the top plate 122 does not come into contact with the support columns 113a to 113c when the second boat 120 is attached to the first boat 110 by horizontally moving it. A recessed surface 122s is formed on the inner edge of the top plate 122. The recessed surface 122s has an upper surface that is lower than the upper surface of the top plate 122, and functions as a mounting surface for mounting a lid (not shown) that covers the opening 122h of the top plate 122. The top plate 122 may have a substantially circular plate shape.

[0041] The support pillars 123 have a rod-like shape extending in the vertical direction and connect the bottom plate 121 and the top plate 122. The three support pillars 123a to 123c have the same length. The support pillars 123a to 123c are provided so that their center points are located on the same arc of the same circle as the center points of the support pillars 113a to 113c. The support pillars 123a to 123c are shorter than the support pillars 113a to 113c. A plurality of grooves 124 are formed in each of the support pillars 123a to 123c at intervals in the vertical direction. The grooves 124 form a mounting surface 125 (FIGS. 10 and 11) on which a substrate is placed. The substrate is held by the support pillars 123 when placed on the mounting surface 125.

[0042] In a plan view, the central angle θ2 (FIG. 7) of the arc passing through the center of support 123b, the center of support 123a, and the center of support 123c is preferably greater than 180°. This allows the substrate to be stably held even if the center position of the substrate is shifted from the center position of second boat 120. Furthermore, in a plan view, the central angle θ2 is set to an angle (for example, 220°) or less that does not interfere with loading the substrate into second boat 120.

[0043] [Delivery of the board] An example of substrate transfer in the substrate holder 100 will be described with reference to Figures 10 and 11. Figure 10 is a side view showing the substrate holder in a state where a substrate is held by a first boat, and Figure 11 is a side view showing the substrate holder in a state where a substrate is held by a second boat.

[0044] 10 , when the first boat 110 holds the substrate W, the second boat 120 is lowered until the position of the placement surface 125 moves lower than the position of the placement surface 115. As a result, the substrate W is placed on the placement surface 115 and separated from the placement surface 125.

[0045] 11, when the second boat 120 holds the substrate W, the second boat 120 is raised until the position of the placement surface 125 is positioned above the position of the placement surface 115. As a result, the substrate W is placed on the placement surface 125 and separated from the placement surface 115.

[0046] For example, when the substrate holder 100 holding the substrate W in the first boat 110 is housed in the processing vessel 10 and a film formation process is performed on the substrate W in the processing vessel 10, the second boat 120 is raised relative to the first boat 110 during the film formation process. As a result, the substrate W held in the first boat 110 is transferred to the second boat 120. Also, with the substrate W held in the second boat 120, the second boat 120 is lowered relative to the first boat 110. As a result, the substrate W held in the second boat 120 is transferred to the first boat 110. By transferring the substrate W between the first boat 110 and the second boat 120 in this way during the film formation process, the substrate W does not remain on the placement surface 115 or the placement surface 125. As a result, it is possible to prevent the substrate W from sticking to the placement surface 115 or the placement surface 125. During the film formation process, the substrates W may be transferred between the first boat 110 and the second boat 120 multiple times.

[0047] In the above embodiment, bottom plate 111, top plate 112, support pillars 113, and mounting surface 115 are examples of a first bottom plate, a first top plate, a first support pillar, and a first mounting surface, respectively. Also, bottom plate 121, top plate 122, support pillars 123, and mounting surface 125 are examples of a second bottom plate, a second top plate, a second support pillar, and a second mounting surface, respectively.

[0048] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive, and the above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims.

[0049] In the above embodiment, a case has been described in which the second boat 120 is configured to rise and fall relative to the first boat 110, but the present disclosure is not limited to this. For example, the first boat 110 may be configured to rise and fall relative to the second boat 120. Furthermore, for example, both the first boat 110 and the second boat 120 may be configured to rise and fall. [Explanation of symbols]

[0050] 100 Substrate holder 110 First Boat 111 Bottom plate 112 Top plate 113 Post 115 Placement surface 120 Second Boat 121 Bottom plate 122 Top plate 123 Post 125 Placement surface

Claims

1. a first boat for holding substrates in a shelf-like manner; a second boat that is coaxial with the first boat and moves up and down relative to the first boat, and that holds substrates in a shelf-like manner; Equipped with the first boat includes a first bottom plate and a first top plate that are provided opposite to each other in the vertical direction, and a first support that connects the first bottom plate and the first top plate and includes a first mounting surface on which a substrate is placed; the second boat includes a second bottom plate and a second top plate that are provided opposite to each other in the vertical direction, and a second support that connects the second bottom plate and the second top plate and includes a second mounting surface on which a substrate is placed; The second top plate is disposed so as to overlap the first top plate in a plan view. Board holder.

2. the second boat transfers the substrate to and from the first boat by raising and lowering the second placement surface relative to the first placement surface; The substrate holder of claim 1 .

3. the first top plate has a substantially annular plate shape or a substantially circular plate shape, The second top plate has a substantially annular or circular plate shape with the same outer diameter as the first top plate.

3. The substrate holder according to claim 1 or 2.

4. The center point of the first support pillar and the center point of the second support pillar are located on the same arc of a concentric circle. The substrate holder according to any one of claims 1 to 3.

5. The second strut is shorter than the first strut. The substrate holder according to any one of claims 1 to 4.

6. the second bottom plate is disposed higher than the first bottom plate, The second top plate is disposed below the first top plate. The substrate holder according to any one of claims 1 to 5.

7. the second bottom plate and the second top plate each have a notch through which the first support column is inserted; The substrate holder according to any one of claims 1 to 6.

8. the second boat is configured to be detachable from the first boat by horizontal movement; The substrate holder according to any one of claims 1 to 7.

9. the first boat and the second boat are configured to rotate synchronously; The substrate holder according to any one of claims 1 to 8.

10. a first boat for holding substrates in a shelf-like manner; a second boat that is coaxial with the first boat and moves up and down relative to the first boat, and that holds substrates in a shelf-like manner; a processing vessel that accommodates the first boat and the second boat; Equipped with the first boat includes a first bottom plate and a first top plate that are provided opposite to each other in the vertical direction, and a first support that connects the first bottom plate and the first top plate and includes a first mounting surface on which a substrate is placed; the second boat includes a second bottom plate and a second top plate that are provided opposite to each other in the vertical direction, and a second support that connects the second bottom plate and the second top plate and includes a second mounting surface on which a substrate is placed; The second top plate is disposed so as to overlap the first top plate in a plan view. Substrate processing equipment.

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