Exposure apparatus, exposure method, shutter apparatus, and method of manufacturing article

Abstract

To provide an advantageous technique for reducing a damage of shutter blades.SOLUTION: An exposure apparatus that exposes a plurality of shot regions on a substrate has: a shutter mechanism including shutter blades which block exposure light to be made incident on each shot region on the substrate, and drive part which rotatably drives the shutter blades; and a control part which controls the shutter mechanism according to a control mode, where the control mode includes a first mode of adjusting a periodic component for giving a command of rotatably driving the shutter blades to the drive part such that vibration of the shutter blades is suppressed.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present invention relates to an exposure apparatus, an exposure method, a shutter device, and a method for manufacturing an article. [Background technology]

[0002] In a stepper-type exposure device using an ultraviolet lamp, an exposure shutter is used to realize the function of controlling the exposure light and exposure amount (see Patent Document 1). The exposure shutter is composed of a rotating body including shutter blades (light-shielding portion) for blocking the exposure light (light beam) to create a light-shielding state, and an opening for allowing the exposure light to pass through to create an irradiation state.

[0003] An example of exposure shutter driving will be described. First, the exposure shutter (shutter blades and opening) is driven to open from a light-blocking state to an irradiating state. After time has passed since the exposure light was irradiated and the desired exposure amount has been reached, the exposure shutter is driven to close from the irradiating state to the light-blocking state, completing the exposure. The open drive and close drive are drives related to the exposure shutter for transitioning the state of the exposure light, and include drives for rotating and then stopping the exposure shutter. Then, once the exposure is completed, the stage holding the substrate to be exposed is driven to perform the next exposure, and the exposure shutter is driven to open again, starting the exposure. By repeating this drive for a predetermined number of shots, the exposure process is performed to expose each shot area on the substrate. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2020-160165 Summary of the Invention [Problem to be solved by the invention]

[0005] During the exposure process, when the exposure shutter is driven (rotated), the shutter blades may vibrate in a vertical direction different from the direction of rotation. In a light-blocking state, the exposure shutter has a structure in which the gap between the shutter blades and the housing is narrow to prevent light leakage from the outside of the shutter blades. Therefore, if the vibration of the shutter blades in a direction other than the rotation direction becomes large, the shutter blades may come into contact (interfere) with the housing, potentially damaging the shutter blades.

[0006] The present invention has been made in view of the above problems in the prior art, and has as its exemplary object to provide an advantageous technique for reducing damage to shutter blades. [Means for solving the problem]

[0007] In order to achieve the above object, an exposure apparatus as one aspect of the present invention is an exposure apparatus that exposes a plurality of shot areas on a substrate, and has a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate and a drive unit that drives and rotates the shutter blades, and a control unit that controls the shutter mechanism in accordance with a control mode, wherein the control mode includes a first mode in which a periodic component that issues a command to the drive unit to drive and rotate the shutter blades is adjusted so that vibration of the shutter blades is suppressed.

[0008] Further objects and other aspects of the present invention will become apparent from the following description of the embodiments with reference to the accompanying drawings. [Effects of the Invention]

[0009] According to the present invention, for example, it is possible to provide an advantageous technique for reducing damage to shutter blades. [Brief explanation of the drawings]

[0010] [Figure 1] 1 is a schematic diagram showing the configuration of an exposure apparatus according to one aspect of the present invention. [Figure 2]10 is a diagram showing the relationship between the drive state of the shutter mechanism and the illuminance of the exposure light irradiated onto the substrate. FIG. [Figure 3] 10 is a diagram showing the relationship between the drive state of the shutter mechanism and the illuminance of the exposure light irradiated onto the substrate. FIG. [Figure 4] 10 is a diagram showing the relationship between the drive state of the shutter mechanism and the illuminance of the exposure light irradiated onto the substrate. FIG. [Figure 5] 10 is a diagram showing the relationship between the drive state of the shutter mechanism and the illuminance of the exposure light irradiated onto the substrate. FIG. [Figure 6] FIG. 10 is a diagram illustrating an example of a user interface. [Figure 7] 10 is a diagram showing the relationship between the drive state of the shutter mechanism and the illuminance of the exposure light irradiated onto the substrate. FIG. [Figure 8] FIG. 10 is a diagram illustrating an example of natural period change information. [Figure 9] FIG. 2 is a diagram showing the configuration of a measurement unit that measures the natural period of a shutter blade. [Figure 10] 10A and 10B are diagrams illustrating an example of a result obtained by frequency analysis of a sensor signal from a vibration sensor. DETAILED DESCRIPTION OF THE INVENTION

[0011] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the invention according to the claims. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0012] 1 is a schematic diagram showing the configuration of an exposure apparatus 100 according to one aspect of the present invention. Exposure apparatus 100 is a lithography apparatus used in a lithography process, which is a manufacturing process for articles (devices) such as semiconductor elements, liquid crystal display elements, and thin-film magnetic heads, and forms a pattern on a substrate. Exposure apparatus 100 exposes a plurality of shot areas on the substrate via an original (reticle or mask) and transfers the pattern of the original to each shot area.

[0013] 1, the exposure apparatus 100 has an illumination optical system IL that illuminates an original OG with light from a light source unit LS, an original stage OST that holds and drives the original OG, and a projection optical system PO that projects the pattern of the original OG onto a substrate ST. The exposure apparatus 100 also has a substrate stage SST that holds and drives the substrate ST, a control unit 17, a console 25, and a storage unit 30. Note that the configuration of the exposure apparatus 100 shown in FIG. 1 is an example and is not intended to limit the configuration of the exposure apparatus 100.

[0014] The light source unit LS includes an ultraviolet lamp 1 that emits light for exposing a substrate, i.e., exposure light, and an elliptical mirror 2 that collects the exposure light from the ultraviolet lamp 1 and guides it to the illumination optical system IL. In this embodiment, the light source unit LS is configured as a light source unit that can control (change) the illuminance of the exposure light emitted from the light source unit LS by adjusting the power supplied to the ultraviolet lamp 1 and the physical position of the ultraviolet lamp 1 under the control of the control unit 17.

[0015] The illumination optical system IL includes a rotary shutter mechanism 3 that controls the time for illuminating the original OG with exposure light from the light source LS, i.e., controls the incidence of the exposure light on the substrate ST, a lens 4, a half mirror 5, a sensor 8, an A / D converter 12, and an exposure dose counter 16. In this embodiment, the shutter mechanism 3 and the control unit 17 constitute a shutter device.

[0016] The shutter mechanism 3 is composed of a rotor including, for example, three shutter blades 301 that function as light-blocking sections that block light from the light source section LS, and three openings 302 that function as light-transmitting sections that allow exposure light from the light source section LS to pass through. The shutter mechanism 3 also includes a motor 6, an encoder 7, a current driver 10, a frequency / voltage converter (FVC) 11, a servo amplifier 13, a multiplier 14, and a position counter 15.

[0017] The motor 6 is a motor for driving the shutter mechanism 3 and is a drive source for rotating the shutter mechanism 3. In this embodiment, the motor 6 functions as a drive unit that rotates the shutter blades 301 (and the opening 302). The encoder 7 is a detector for detecting the rotation of the shutter mechanism 3.

[0018] A current driver 10 supplies a current to the motor 6 to drive it. An FVC 11 converts a pulse train output from an encoder 7, which is proportional to the shutter speed (rotation speed) of the shutter mechanism 3, into a voltage. A servo amplifier 13 supplies an output proportional to the difference between the actual shutter speed of the shutter mechanism 3 and a secondary command value 24 to the current driver 10 so that the actual shutter speed of the shutter mechanism 3 matches the secondary command value 24 (the shutter speed commanded by the secondary command value 24). A multiplier 14 generates a secondary command value 24 based on a primary command value 21 that commands the shutter speed of the shutter mechanism 3 and gain control data 20. A position counter 15 monitors the rotation position of the shutter mechanism 3 (shutter blade 301) and outputs position data 22.

[0019] In the illumination optical system IL, the exposure light that has passed through the shutter mechanism 3 (opening 302) is incident on the half mirror 5 via the lens 4. A portion of the exposure light that has entered the half mirror 5, specifically the exposure light reflected by the half mirror 5, has the function of detecting the illuminance of the exposure light from the light source unit LS, and is guided to a sensor 8 that measures the amount of exposure light that is incident on the substrate ST, i.e., the exposure light. Here, the exposure amount is defined as the product of the illuminance of the exposure light and the time for which the exposure light is irradiated (integrated exposure amount).

[0020] A / D converter 12 converts into digital data an analog voltage proportional to the illuminance of the exposure light output from sensor 8. Exposure amount counter 16 counts the output from A / D converter 12 to monitor the time integral amount of exposure light incident on sensor 8, i.e., the exposure amount, and outputs exposure amount data 23.

[0021] Console 25 is an input / output device used to operate exposure apparatus 100 (controller 17), and includes, for example, a display, a keyboard, a mouse, etc. In this embodiment, console 25 includes a touch panel that combines a liquid crystal panel (display device) and a touchpad (pointing device), and realizes a graphical user interface (GUI).

[0022] Storage unit 30 includes storage devices such as RAM, ROM, a hard disk, etc. Storage unit 30 stores (contains) programs executed by control unit 17, that is, programs for operating exposure apparatus 100, various information and data, etc.

[0023] Control unit 17 is configured as an information processing device (computer) including a CPU, memory, etc. Control unit 17 comprehensively controls each unit of exposure apparatus 100 to operate exposure apparatus 100 in accordance with a program stored in storage unit 30. Control unit 17 controls the exposure process (exposure method) that exposes multiple shot areas on a substrate. For example, in the exposure process, control unit 17 exposes multiple shot areas on a substrate while controlling shutter mechanism 3 in accordance with a control mode. Here, the control mode is a mode for controlling the driving of shutter mechanism 3, and in this embodiment includes multiple different modes.

[0024] The following is a specific description of the control of the shutter mechanism 3 according to the control mode by the control unit 17. A case where the drive of the shutter mechanism 3 is controlled according to the basic mode, which is a conventional control mode, will be described with reference to Figures 2 and 3.

[0025] 2 is a diagram showing the relationship between the drive state of the shutter mechanism 3 and the illuminance of the exposure light irradiated onto a shot area on a substrate when exposing one shot area on the substrate. Here, it is assumed that drive of the shutter mechanism 3 (rotational drive of the shutter blades 301) starts from a light-blocking state in which the shutter blades 301 of the shutter mechanism 3 completely block the exposure light from the light source unit LS, i.e., from a complete light-blocking position.

[0026] Referring to FIG. 2, the open drive of the shutter mechanism 3 is initiated by issuing a command to the motor 6 to rotate the shutter blade 301. However, after the open drive of the shutter mechanism 3 is initiated, the shutter mechanism 3 does not immediately transition to an irradiation state in which the opening 302 of the shutter mechanism 3 passes the exposure light from the light source LS, i.e., a state in which the shutter blade 301 does not block the exposure light. In other words, even after the open drive of the shutter mechanism 3 is initiated, the light-blocking state continues for a while. When the end of the shutter blade 301 of the shutter mechanism 3 reaches the end of the exposure light from the light source LS, the exposure light gradually begins to pass through the opening 302. Then, when the end of the shutter blade 301 reaches the end opposite the exposure light, the opening 302 transitions to a state in which the exposure light is completely passed, i.e., a irradiation state, and the open drive is completed.

[0027] When irradiation of the shot area on the substrate with exposure light begins, sensor 8 outputs an analog voltage corresponding to the illuminance of the exposure light incident on sensor 8, and this analog voltage is converted into illuminance data via A / D converter 12. The illuminance data output from A / D converter 12 is integrated by exposure amount counter 16 to determine the exposure amount. Figure 2 also shows a graph showing the illuminance of the exposure light during the period in which shutter mechanism 3 is driven (the period from the start of open drive to the completion of close drive). In this graph, the illuminance of the exposure light is taken on the vertical axis, and time is taken on the horizontal axis.

[0028] When time has passed since the exposure light was irradiated onto the shot area on the substrate and the desired exposure amount has been reached, a command is given to the motor 6 to rotate the shutter blades 301, thereby starting the close drive of the shutter mechanism 3. The close drive (rotation drive of the shutter blades 301) starts from an irradiation state in which the shutter mechanism 3 (opening 302) completely passes the exposure light, i.e., from the fully irradiated position. When the end of the shutter blade 301 of the shutter mechanism 3 reaches the end of the exposure light, the exposure light gradually begins to be blocked by the shutter blade 301. Then, when the end of the shutter blade 301 reaches the end on the opposite side of the exposure light, the shutter blade 301 transitions to a light-blocking state in which it completely blocks the exposure light, and the close drive is completed.

[0029] As shown in FIG. 2, the exposure time is defined as the time from when the shutter mechanism 3 starts to be opened until when the shutter mechanism 3 starts to be closed. In this embodiment, the exposure time is defined as a periodic component (time interval) of issuing a command to the motor 6 to rotate the shutter blades 301 while the shot area is being exposed. Specifically, the exposure time is defined as the period (first period) between a command (first command) issued to the motor 6 to rotate the shutter blades 301 from the light-shielded state to the irradiated state and a command (second command) to rotate the shutter blades 301 from the irradiated state to the light-shielded state. Furthermore, when the illuminance of the exposure light during exposure is constant, the exposure time can be calculated by dividing the exposure amount by the illuminance. Hereinafter, the command to rotate the shutter blades 301 from the light-shielded state to the irradiated state, i.e., the command to open the shutter mechanism 3, is referred to as the first command. On the other hand, a command to rotate the shutter blades 301 from the irradiating state to the light blocking state, that is, a command to close the shutter mechanism 3, is referred to as a second command.

[0030] 3 is a diagram showing the relationship between the drive state of the shutter mechanism 3 and the illuminance of the exposure light irradiated onto each shot area on the substrate when two shot areas on the substrate are successively exposed. Referring to FIG. 3, in order to expose each of the two shot areas on the substrate, the shutter mechanism 3 is opened and closed in each shot area, as explained in FIG. 2. When exposure of one of the two shot areas (the previous shot area) is completed, the substrate stage SST holding the substrate ST is step-driven (inter-shot drive) so that the other shot area (the next shot area) is positioned in the exposure area. When the step-driven drive of the substrate stage SST is completed, the shutter mechanism 3 is opened, and exposure of the other shot area begins.

[0031] As shown in FIG. 3, the exposure period is defined as the time from when the shutter mechanism 3 starts to be opened in one shot area until when the shutter mechanism 3 starts to be opened in the other shot area. In this embodiment, the exposure period is defined by the periodic component (time interval) during which a command is given to the motor 6 to rotate the shutter blades 301 while exposing two shot areas. Specifically, the exposure period is defined as the period (second period) between the first command given to the motor 6 while exposing one shot area and the first command given to the motor 6 while exposing the other shot area. The exposure period is determined by the sum of the exposure time for exposing one shot area and the time required for step-driving the substrate stage SST to position the other shot area in the exposure area (step drive time). The step drive time refers to the drive time of the substrate ST required to expose one shot area after the other shot area has been exposed.

[0032] As described above, when the drive (open drive and close drive) of the shutter mechanism 3 is controlled according to the basic mode, which is a conventional control mode, there is a possibility that the shutter blade 301 will vibrate in a direction different from the rotation direction. Here, the direction different from the rotation direction of the shutter blade 301 includes a plurality of mutually different directions, but in this embodiment, it is assumed to be the direction along the rotation axis of the shutter blade 301, i.e., the axial direction. Note that the mode in which the shutter blade 301 vibrates in the axial direction includes two modes: a bending (flexure) mode and a torsion mode, and each of the bending mode and torsion mode of vibration of the shutter blade 301 has a higher-order mode.

[0033] As a result of careful consideration of the shutter mechanism 3, the inventors have found that the vibration of shutter blade 301 is caused by the natural vibration of shutter blade 301, and that the vibration becomes larger as the periodic component (drive period) that drives shutter mechanism 3 approaches the natural period of shutter blade 301. Furthermore, when vibration in a direction different from the rotation direction of shutter blade 301, i.e., vibration in the axial direction of shutter blade 301, becomes larger, there is a high possibility that shutter blade 301 will interfere with the housing of shutter mechanism 3, causing damage to shutter blade 301.

[0034] Therefore, this embodiment provides a technology that is advantageous for suppressing the vibration (amount of vibration) of the shutter blade 301 and reducing damage to the shutter blade 301. For example, by driving the shutter blade 301 at a period that is not an integer multiple of the natural period of the shutter blade 301, the vibration of the shutter blade 301 is suppressed and damage to the shutter blade 301 is reduced. Specifically, a prohibition mode is provided as a control mode that prohibits controlling the drive of the shutter mechanism 3 under a condition (prohibition condition) in which the periodic component of the command given to the motor 6 to rotate the shutter blade 301 is an integer multiple of the natural period of the shutter blade 301. Note that the prohibition mode refers to a mode in which the periodic component of the command given to the motor 6 to rotate the shutter blade 301 is adjusted so that the vibration of the shutter blade 301 is suppressed. Therefore, it is permissible for a part of the periodic component of the command given to the motor 6 to rotate the shutter blade 301 to satisfy the prohibition condition within a range in which the vibration of the shutter blade 301 is suppressed. In this embodiment, the natural period of the shutter blade 301 includes the natural period of at least one of the bending mode and torsion mode of vibration of the shutter blade 301, as described above.

[0035] 4 and 5, a case where the control unit 17 controls the driving of the shutter mechanism 3 in accordance with the prohibition mode, which is the control mode of this embodiment, will be described.

[0036] 4 is a diagram showing the relationship between the drive state of shutter mechanism 3 and the illuminance of exposure light irradiated onto a shot area on a substrate when exposing one shot area on the substrate. Here, in the prohibited mode, the drive of shutter mechanism 3 is prohibited from being controlled under the condition that the first period (time interval) of the first command and second command given to motor 6 during exposure of one shot area, i.e., the exposure time, is an integer multiple of the natural period of shutter blade 301.

[0037] 4, first, the control unit 17 calculates the estimated exposure time T1 by dividing the exposure amount preset in the exposure recipe by the current illuminance E1 of the exposure light detected by the sensor 8. The estimated exposure time T1 is the exposure time estimated from the current illuminance E1 of the exposure light and the preset exposure amount, and corresponds to the first estimated period of the first command and the second command given to the motor 6 while exposing one shot area. Then, if the estimated exposure time T1 is close to an integer multiple of the natural period T of the shutter blade 301, that is, if the prohibition condition is satisfied, the control unit 17 adjusts the estimated exposure time T1 to the exposure time T2 so that the prohibition condition is not satisfied and the preset exposure amount is achieved.

[0038] Specifically, the assumed exposure time T1 is determined to satisfy the prohibition condition if the decimal point of the value obtained by dividing the assumed exposure time T1 by the natural period T of the shutter blade 301 is within a specified range. The current illuminance E1 of the exposure light is changed to illuminance E2 so that the decimal point of the value obtained by dividing the assumed exposure time T1 by the natural period T of the shutter blade 301 is outside the specified range and the exposure amount is a preset value. In this embodiment, the current illuminance E1 of the exposure light is changed to illuminance E2, which is lower than illuminance E1. However, it may also be changed to illuminance E2, which is higher than illuminance E1. This allows the exposure time T2 for exposing one shot area to be set outside the range of an integer multiple of the natural period T of the shutter blade 301, and prohibits the shutter mechanism 3 from being driven under conditions where the exposure time is an integer multiple of the natural period of the shutter blade 301. Therefore, the vibration (amount of vibration) of the shutter blade 301 can be suppressed, reducing damage to the shutter blade 301.

[0039] The illuminance of the exposure light can be changed by adjusting the power supplied to the ultraviolet lamp 1 in the light source unit LS or the physical position of the ultraviolet lamp 1, but this is not limitative. For example, the illuminance of the exposure light can be changed by providing a neutral density (ND) filter in the illumination optical system IL.

[0040] Furthermore, vibration of the shutter blade 301 can be suppressed by setting the exposure time T2 for exposing one shot area to be approximately 10% different from the natural period T of the shutter blade 301. For example, if the natural period T of the shutter blade 301 is 10 msec and the expected exposure time T1 is 21 msec, then T1 / T = 2.1. As described above, since the exposure time T2 is desired to be 10% or more different from the natural period T of the shutter blade 301, it is necessary to adjust the exposure time T2 so that the first decimal place of the value of T2 / T is 2 or greater. Furthermore, to achieve a preset exposure amount, it is necessary to change the current illuminance E1 of the exposure light according to the rate at which the exposure time has been adjusted (changed). Therefore, in the above case, the exposure time T2 should be set to 22 msec, and the illuminance E2 of the exposure light should be set to illuminance E1 × 2 1 / 22.

[0041] 5 is a diagram showing the relationship between the drive state of the shutter mechanism 3 and the illuminance of the exposure light irradiated onto each shot area on the substrate when two shot areas on the substrate are successively exposed. Here, in the prohibited mode, the second period (time interval) of the first command given to the motor 6 while each of the two shot areas is exposed, i.e., the drive of the shutter mechanism 3 is prohibited from being controlled under the condition that the exposure period is an integer multiple of the natural period of the shutter blades 301. Note that the first command given to the motor 6 while each of the two shot areas is exposed includes a first command given to the motor 6 while one shot area is exposed and a first command given to the motor 6 while the other shot area is exposed.

[0042] 5, first, the control unit 17 calculates an assumed exposure period T4 by adding the exposure time T2 and the step drive time T3 of the substrate stage SST obtained from the layout of multiple shot areas on the substrate. The assumed exposure period T4 is an exposure period estimated from the exposure time T2 and the step drive time T3, and corresponds to a second assumed period of a first command given to the motor 6 while exposing one shot area and a first command given to the motor 6 while exposing the other shot area. Then, if the assumed exposure period T4 is close to an integer multiple of the natural period T of the shutter blades 301, that is, if the prohibition condition is satisfied, the control unit 17 adjusts the assumed exposure period T4 to an exposure period T5 so that the prohibition condition is not satisfied and the predetermined exposure amount is achieved.

[0043] Specifically, the assumed exposure period T4 is determined to satisfy the prohibition condition if the decimal point of the value obtained by dividing the assumed exposure period T4 by the natural period T of the shutter blade 301 is within a specified range. The assumed exposure period T4 is then adjusted to the exposure period T5 by changing the step drive time T3 to a step drive time T3' so that the decimal point of the value obtained by dividing the assumed exposure period T4 by the natural period T of the shutter blade 301 is outside the specified range and the exposure amount is a preset value. In this embodiment, the step drive time T3 is changed to a step drive time T3' that is longer than the step drive time T3, but it may also be changed to a step drive time that is shorter than the step drive time T3. This allows the exposure period T5 to be set outside the range of an integer multiple of the natural period T of the shutter blade 301, and prohibits the shutter mechanism 3 from being driven under conditions where the exposure period is an integer multiple of the natural period of the shutter blade 301. This suppresses the vibration (amount of vibration) of the shutter blade 301 and reduces damage to the shutter blade 301.

[0044] The step drive time can be changed by adjusting the drive speed of the substrate stage SST, but this is not the only way to change it. For example, the step drive time can also be changed by providing a waiting time during which the substrate stage SST waits after one shot area has been exposed.

[0045] In the prohibition mode, which is one of the control modes for controlling the drive of the shutter mechanism 3, as described above, there is a possibility of adjusting (correcting) the exposure time and exposure period. Therefore, for example, when it is desired to maintain constant the illuminance of the exposure light and productivity, the basic mode (second mode) is preferable to the prohibition mode (first mode) as the control mode for controlling the drive of the shutter mechanism 3. As described above, the basic mode is a mode in which the periodic component that issues a command to the motor 6 to rotate the shutter blades 301 is adjusted based on the current illuminance of the exposure light and the preset exposure amount, and allows the shutter mechanism 3 to be controlled under the prohibition condition.

[0046] Therefore, in this embodiment, the prohibition mode and the basic mode can be switched by the user selecting a control mode for controlling the drive of the shutter mechanism 3. For example, the control unit 17 provides a user interface via the console 25 that allows the user to select one mode from a plurality of modes including the prohibition mode and the basic mode as the control mode for controlling the drive of the shutter mechanism 3.

[0047] Fig. 6 is a diagram showing an example of a user interface UIF for selecting the prohibition mode or the basic mode as the control mode for controlling the drive of the shutter mechanism 3. Referring to Fig. 6, the user can select the prohibition mode as the control mode for controlling the drive of the shutter mechanism 3 (turn the prohibition mode ON (enabled)) by checking the check box CB. On the other hand, the user can select the basic mode as the control mode for controlling the drive of the shutter mechanism 3 (turn the prohibition mode OFF (disabled)) by leaving the check box CB blank.

[0048] As shown in FIG. 6, the user interface UIF preferably displays (notifies) the difference (change) in productivity between when the prohibition mode is selected and when the basic mode is selected as the control mode, as an indicator for the user to select a control mode. In other words, the user interface UIF may display information regarding the difference between the processing time required to expose the substrate ST when the user selects the prohibition mode and the processing time required to expose the substrate ST when the user selects the basic mode. Here, the information regarding the difference is displayed as the processing time per substrate (e.g., 200 msec) that increases when the prohibition mode is selected compared to the basic mode. The difference in processing time per substrate can be calculated by multiplying the difference in exposure period between the prohibition mode and the basic mode by the number of shot areas on the substrate. Displaying such information on the user interface UIF allows the user to easily confirm (visually recognize) the difference in productivity between when the prohibition mode is selected and when the basic mode is selected as the control mode.

[0049] As described above, in the prohibition mode, if the assumed exposure time T1 is close to an integer multiple of the natural period T of the shutter blade 301, that is, if the prohibition condition is satisfied, the assumed exposure time T1 is adjusted to the exposure time T2 by changing the illuminance of the exposure light. In this case, the processing time required to expose the substrate ST per shot area changes by the time equivalent to T2-T1, and therefore the productivity also changes.

[0050] 7, the processing time (exposure period) for one shot area can be maintained constant by including in advance an adjustment time T6 for adjusting the exposure time in the processing time required to expose the substrate ST and adjusting the exposure time within the range of the adjustment time T6. This makes it possible to realize a prohibition mode, as a control mode for controlling the drive of the shutter mechanism 3, in which the shutter blades 301 are driven at a period that is not an integer multiple of the natural period of the shutter blades 301, without changing productivity. FIG. 7 is a diagram showing the relationship between the drive state of the shutter mechanism 3 and the illuminance of the exposure light irradiated onto each shot area on the substrate when two shot areas on the substrate are exposed consecutively.

[0051] In the prohibition mode, a similar problem occurs with the exposure period. Therefore, it is advisable to include in advance an adjustment time (T6) for adjusting the exposure period in the processing time required to expose the substrate ST, and adjust the exposure period within the range of this adjustment time to maintain a constant processing time for one shot area. This realizes a prohibition mode, as a control mode for controlling the drive of the shutter mechanism 3, in which the shutter blades 301 are driven at a period that is not an integral multiple of the natural period of the shutter blades 301, without changing productivity.

[0052] In this embodiment, information regarding the natural period T of shutter blade 301, which is the target for comparison with assumed exposure time T1 and assumed exposure period T4, is stored in storage unit 30. However, in shutter mechanism 3, shutter blade 301 blocks exposure light, and therefore, shutter blade 301 may thermally deform and change over time (aging). Since aging of shutter mechanism 3 causes a change in the natural period of shutter blade 301, it becomes difficult to drive shutter blade 301 at a period that is not an integral multiple of the natural period of shutter blade 301 in the prohibition mode.

[0053] Therefore, as shown in Fig. 8, along with the natural period of shutter blade 301, natural period change information indicating the relationship between the usage time of shutter mechanism 3 and the natural period of shutter blade 301 is stored in storage unit 30. Then, control unit 17 refers to the natural period change information stored in storage unit 30 according to the usage time of shutter mechanism 3, and updates the natural period of shutter blade 301 stored in storage unit 30. For example, if the usage time of shutter mechanism 3 is T7, the natural period of shutter blade 301 stored in storage unit 30 is updated to T8. In this way, the natural period of shutter blade 301 stored in storage unit 30 is updated as needed according to changes over time in shutter mechanism 3, so that in the prohibition mode, shutter blade 301 can be driven at a period that is not an integer multiple of the natural period of shutter blade 301.

[0054] The usage time of the shutter mechanism 3 corresponds to the drive time of the shutter mechanism 3 and includes, for example, the rotation drive time of the shutter blade 301, the number of rotation drives of the shutter blade 301, and the integrated value (blocking time) of the exposure light blocked by the shutter blade 301. Therefore, the natural period change information includes information indicating the relationship between at least one of the rotation drive time of the shutter blade 301, the number of rotation drives of the shutter blade 301, and the integrated value of the exposure light blocked by the shutter blade 301, and the natural period of the shutter blade 301.

[0055] Furthermore, the information on the change in the natural period may be generated from data obtained by measuring the relationship between the usage time of the shutter mechanism 3 and the natural period of the shutter blade 301 over a long period of time, or may be generated by predicting the change in the long-term natural period from data obtained by measuring such relationship over a short period of time.

[0056] Furthermore, in order to update the natural period of the shutter blade 301 stored in the storage unit 30 with even higher accuracy, a measurement unit 40 that measures the natural period of the shutter blade 301 may be provided, as shown in Fig. 9. In this case, instead of referring to the natural period change information stored in the storage unit 30, the control unit 17 updates the natural period of the shutter blade 301 stored in the storage unit 30 to the natural period of the shutter blade 301 measured by the measurement unit 40. Fig. 9 is a diagram showing the configuration of the measurement unit 40 that measures the natural period of the shutter blade 301.

[0057] Measurement unit 40 includes, for example, a vibration sensor 401 provided in housing 303 of shutter mechanism 3. Vibration sensor 401 detects vibrations of shutter blade 301 and inputs the sensor signal to control unit 17. Vibration sensor 401 may be an acceleration sensor that detects vibrations transmitted from shutter blade 301 to housing 303, or may be an optical sensor that directly detects vibrations of shutter blade 301.

[0058] The control unit 17 performs frequency analysis on the sensor signal input from the vibration sensor 401. FIG. 10 is a diagram showing an example of the results obtained by frequency analyzing the sensor signal from the vibration sensor 401. In FIG. 10, the intensity of the sensor signal is plotted on the vertical axis, and the frequency of the vibration of the shutter blade 301 is plotted on the horizontal axis. Referring to FIG. 10, the control unit 17 calculates the natural period 1 / F of the shutter blade 301 from the intensity peak with respect to the frequency (the reciprocal of the period). Note that, separate from the control unit 17, an analysis unit may be provided in the measurement unit 40 that performs frequency analysis on the sensor signal from the vibration sensor 401 (i.e., based on the vibration of the shutter blade 301) to calculate the natural period 1 / F of the shutter blade 301.

[0059] In this way, by measuring (actually measuring) the natural period 1 / F of the shutter blade 301, the natural period of the shutter blade 301 stored in the storage unit 30 can be accurately updated.

[0060] The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as semiconductor devices, flat panel displays, liquid crystal display devices, and MEMS. This manufacturing method includes the steps of exposing a substrate coated with a photosensitive agent using the exposure apparatus 100 (exposure method) described above and developing the exposed photosensitive agent. The developed photosensitive agent pattern is then used as a mask to perform etching and ion implantation processes on the substrate, forming a circuit pattern on the substrate. These exposure, development, etching, and other processes are repeated to form a circuit pattern consisting of multiple layers on the substrate. In subsequent processes, the substrate on which the circuit pattern has been formed is diced (processed), followed by chip mounting, bonding, and inspection. This manufacturing method may also include other well-known processes (e.g., oxidation, film formation, vapor deposition, doping, planarization, resist stripping, etc.). The method for manufacturing an article according to this embodiment is advantageous over conventional methods in at least one of the performance, quality, productivity, and production cost of the article.

[0061] The disclosure of the present specification includes the following exposure apparatus, exposure method, shutter device, and method for manufacturing an article.

[0062] (Item 1) An exposure apparatus that exposes a plurality of shot areas on a substrate, a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate, and a drive unit that rotationally drives the shutter blades; a control unit that controls the shutter mechanism according to a control mode; and the control modes include a first mode in which a periodic component that issues a command to the drive unit to rotate the shutter blade is adjusted so as to suppress vibration of the shutter blade; An exposure apparatus characterized by:

[0063] (Item 2) the commands include a first command to rotate the shutter blades from a light-blocking state in which the shutter blades block the exposure light to an irradiating state in which the shutter blades do not block the exposure light, and a second command to rotate the shutter blades from the irradiating state to the light-blocking state, the periodic component includes a first period of the first command and the second command given to the driving unit while one shot area among the plurality of shot areas is exposed; 2. The exposure apparatus according to item 1,

[0064] (Item 3) Item 3. The exposure apparatus according to item 2, characterized in that in the first mode, when the condition that a first assumed period of the first command and the second command given to the drive unit during exposure of the one shot area assumed from the current illuminance of the exposure light and a preset exposure amount is an integer multiple of the natural period of the shutter blade is satisfied, the control unit adjusts the first period so that the condition is not met and the predetermined exposure amount is achieved.

[0065] (Item 4) 4. The exposure apparatus according to item 3, wherein the control unit adjusts the first period by changing the current illuminance of the exposure light.

[0066] (Item 5) 5. The exposure apparatus according to item 3 or 4, wherein the control unit determines that the first assumed period satisfies the condition when the decimal point of the value obtained by dividing the first assumed period by the natural period is within a specified range.

[0067] (Item 6) a processing time required to expose the plurality of shot areas includes an adjustment time for adjusting the first period; the control unit adjusts the first period within the range of the adjustment time. 6. The exposure apparatus according to any one of items 3 to 5,

[0068] (Item 7) the commands include a first command to rotate the shutter blades from a light-blocking state in which the shutter blades block the exposure light to an irradiating state in which the shutter blades do not block the exposure light, and a second command to rotate the shutter blades from the irradiating state to the light-blocking state, the periodic component includes, when two shot areas of the plurality of shot areas are continuously exposed, a second period of the first command of the first command and the second command given to the driving unit while one shot area is being exposed, and the first command of the first command and the second command given to the driving unit while the other shot area is being exposed; 3. The exposure apparatus according to item 2,

[0069] (Item 8) 8. The exposure apparatus of item 7, wherein in the first mode, when a condition is satisfied that a second assumed period of the first command given to the drive unit while exposing one of the shot areas and the first command given to the drive unit while exposing the other of the shot areas, which is assumed from the period of the first command and the second command given to the drive unit while exposing one of the shot areas obtained from the current illuminance of the exposure light and a preset exposure amount, and the drive time of the substrate required to expose the other of the shot areas after exposing one of the shot areas obtained from the layout of the multiple shot areas, is an integer multiple of the natural period of the shutter blades, the control unit adjusts the second period so that the second period deviates from the condition and becomes the preset exposure amount.

[0070] (Item 9) 9. The exposure apparatus according to item 8, wherein the control unit adjusts the second period by changing the drive time of the substrate.

[0071] (Item 10) 10. The exposure apparatus according to item 8 or 9, wherein the control unit determines that the second assumed period satisfies the condition when the decimal point of the value obtained by dividing the second assumed period by the natural period is within a specified range.

[0072] (Item 11) a processing time required to expose the plurality of shot areas includes an adjustment time for adjusting the second period; the control unit adjusts the second period within the range of the adjustment time. 11. The exposure apparatus according to any one of items 7 to 10,

[0073] (Item 12) the control mode includes a second mode in which the periodic component is adjusted based on a current illuminance of the exposure light and a preset exposure amount; the control unit provides a user interface that allows a user to select one mode from a plurality of modes including the first mode and the second mode as the control mode. 12. An exposure apparatus according to any one of items 1 to 11, characterized in that:

[0074] (Item 13) Item 13. The exposure apparatus of item 12, wherein the control unit displays, on the user interface, the difference between the processing time required to expose the plurality of shot areas when the user selects the first mode and the processing time required to expose the plurality of shot areas when the user selects the second mode.

[0075] (Item 14) a storage unit that stores the natural period and information indicating a relationship between a usage time of the shutter mechanism and the natural period, the control unit updates the natural period by referring to the information in accordance with the usage time of the shutter mechanism. 9. The exposure apparatus according to item 3 or 8, characterized in that

[0076] (Item 15) Item 15. The exposure apparatus according to item 14, wherein the information includes information indicating the relationship between the natural period and at least one of the rotation drive time of the shutter blade, the number of rotation drives of the shutter blade, and the integrated value of the exposure light blocked by the shutter blade.

[0077] (Item 16) a storage unit that stores the natural period; a measurement unit that measures the natural period; and the control unit updates the natural period stored in the storage unit to the natural period measured by the measurement unit. 9. The exposure apparatus according to item 3 or 8, characterized in that

[0078] (Item 17) The measurement unit a sensor for detecting vibration of the shutter blade; determining the natural period based on the vibration detected by the sensor; 17. The exposure apparatus according to item 16,

[0079] (Item 18) 9. The exposure apparatus according to item 3 or 8, wherein the natural period includes the natural period of at least one of a bending mode and a torsional mode of vibration of the shutter blade.

[0080] (Item 19) An exposure apparatus described in any one of items 1 to 18, characterized in that the first mode is a mode that prohibits controlling the shutter mechanism under the condition that the periodic component is an integer multiple of the natural period of the shutter blade.

[0081] (Item 20) An exposure method comprising: a step of exposing a plurality of shot areas on the substrate while controlling a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate and a drive unit that rotates and drives the shutter blades in accordance with a control mode; the control modes include a first mode in which a periodic component that issues a command to the drive unit to rotate the shutter blade is adjusted so as to suppress vibration of the shutter blade; An exposure method characterized by:

[0082] (Item 21) 1. A shutter device used in an exposure apparatus that exposes a plurality of shot areas on a substrate, comprising: a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate, and a drive unit that rotationally drives the shutter blades; a control unit that controls the shutter mechanism according to a control mode; and the control modes include a first mode in which a periodic component that issues a command to the drive unit to rotate the shutter blade is adjusted so as to suppress vibration of the shutter blade; A shutter device characterized by:

[0083] (Item 22) Item 20. Exposing a substrate using the exposure method according to Item 20; developing the exposed substrate; manufacturing an article from the developed substrate; A method for manufacturing an article, comprising:

[0084] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0085] 3: shutter mechanism 6: motor 17: control unit 100: exposure device 301: shutter blade 302: opening ST: substrate

Claims

1. An exposure apparatus that exposes a plurality of shot areas on a substrate, a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate, and a drive unit that rotationally drives the shutter blades; a control unit that controls the shutter mechanism according to a control mode; and the control modes include a first mode in which a periodic component that issues a command to the drive unit to rotate the shutter blade is adjusted so as to suppress vibration of the shutter blade; An exposure apparatus characterized by:

2. the commands include a first command to rotate the shutter blades from a light-blocking state in which the shutter blades block the exposure light to an irradiating state in which the shutter blades do not block the exposure light, and a second command to rotate the shutter blades from the irradiating state to the light-blocking state, the periodic component includes a first period of the first command and the second command given to the driving unit while one shot area among the plurality of shot areas is exposed; 2. An exposure apparatus according to claim 1.

3. 3. The exposure apparatus according to claim 2, wherein, in the first mode, when a condition is satisfied that a first assumed period of the first command and the second command given to the drive unit during exposure of the one shot area assumed from the current illuminance of the exposure light and a preset exposure amount is an integer multiple of the natural period of the shutter blade, the control unit adjusts the first period so that the first assumed period deviates from the condition and becomes the preset exposure amount.

4. 4. The exposure apparatus according to claim 3, wherein the control unit adjusts the first period by changing the current illuminance of the exposure light.

5. 4. The exposure apparatus according to claim 3, wherein the control unit determines that the first assumed period satisfies the condition when the decimal point of the value obtained by dividing the first assumed period by the natural period is within a specified range.

6. a processing time required to expose the plurality of shot areas includes an adjustment time for adjusting the first period; the control unit adjusts the first period within the range of the adjustment time.

4. The exposure apparatus according to claim 3.

7. the commands include a first command to rotate the shutter blades from a light-blocking state in which the shutter blades block the exposure light to an irradiating state in which the shutter blades do not block the exposure light, and a second command to rotate the shutter blades from the irradiating state to the light-blocking state, the periodic component includes, when two shot areas of the plurality of shot areas are successively exposed, a second period of the first command of the first command and the second command given to the driving unit while one shot area is being exposed, and the first command of the first command and the second command given to the driving unit while the other shot area is being exposed; 3. The exposure apparatus according to claim 2.

8. 8. The exposure apparatus according to claim 7, wherein in the first mode, when a condition is satisfied that a second assumed period of the first command given to the drive unit while exposing one of the shot areas and the first command given to the drive unit while exposing the other of the shot areas, which is assumed from a period between the first command and the second command given to the drive unit while exposing the one of the shot areas obtained from the current illuminance of the exposure light and a preset exposure amount, and a drive time of the substrate required to expose the other of the shot areas after exposing the one of the shot areas obtained from a layout of the multiple shot areas, is an integer multiple of a natural period of the shutter blades, the control unit adjusts the second period so that the second period deviates from the condition and becomes the preset exposure amount.

9. 9. The exposure apparatus according to claim 8, wherein the control unit adjusts the second period by changing a drive time of the substrate.

10. 9. The exposure apparatus according to claim 8, wherein the control unit determines that the second assumed period satisfies the condition when the decimal point of the value obtained by dividing the second assumed period by the natural period is within a specified range.

11. a processing time required to expose the plurality of shot areas includes an adjustment time for adjusting the second period; the control unit adjusts the second period within the range of the adjustment time.

8. An exposure apparatus according to claim 7.

12. the control mode includes a second mode in which the periodic component is adjusted based on a current illuminance of the exposure light and a preset exposure amount; the control unit provides a user interface that allows a user to select one mode from a plurality of modes including the first mode and the second mode as the control mode.

2. An exposure apparatus according to claim 1.

13. 13. The exposure apparatus according to claim 12, wherein the control unit displays, on the user interface, a difference between the processing time required to expose the plurality of shot areas when the user selects the first mode and the processing time required to expose the plurality of shot areas when the user selects the second mode.

14. a storage unit that stores the natural period and information indicating a relationship between a usage time of the shutter mechanism and the natural period, the control unit updates the natural period by referring to the information in accordance with the usage time of the shutter mechanism.

9. An exposure apparatus according to claim 3 or 8.

15. 15. The exposure apparatus according to claim 14, wherein the information includes information indicating the relationship between the natural period and at least one of the rotation drive time of the shutter blade, the number of rotation drives of the shutter blade, and the integrated value of the exposure light blocked by the shutter blade.

16. a storage unit that stores the natural period; a measurement unit that measures the natural period; and the control unit updates the natural period stored in the storage unit to the natural period measured by the measurement unit.

9. An exposure apparatus according to claim 3 or 8.

17. The measurement unit a sensor for detecting vibration of the shutter blade; determining the natural period based on the vibration detected by the sensor; 17. The exposure apparatus according to claim 16.

18. 9. The exposure apparatus according to claim 3, wherein the natural period includes the natural period of at least one of a bending mode and a torsional mode of vibration of the shutter blade.

19. 2. The exposure apparatus according to claim 1, wherein the first mode is a mode that prohibits the shutter mechanism from being controlled under the condition that the periodic component is an integer multiple of the natural period of the shutter blade.

20. An exposure method comprising: a step of exposing a plurality of shot areas on the substrate while controlling a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate and a drive unit that rotates and drives the shutter blades in accordance with a control mode; the control modes include a first mode in which a periodic component that issues a command to the drive unit to rotate the shutter blade is adjusted so as to suppress vibration of the shutter blade; An exposure method characterized by:

21. 1. A shutter device used in an exposure apparatus that exposes a plurality of shot areas on a substrate, comprising: a shutter mechanism including shutter blades that block exposure light incident on each shot area on the substrate, and a drive unit that rotationally drives the shutter blades; a control unit that controls the shutter mechanism according to a control mode; and the control modes include a first mode in which a periodic component that issues a command to the drive unit to rotate the shutter blade is adjusted so as to suppress vibration of the shutter blade; A shutter device characterized by:

22. exposing a substrate using the exposure method according to claim 20; developing the exposed substrate; manufacturing an article from the developed substrate; A method for manufacturing an article, comprising:

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